TWI347675B - Laterally diffused metal oxide semiconductor transistors - Google Patents
Laterally diffused metal oxide semiconductor transistorsInfo
- Publication number
- TWI347675B TWI347675B TW095145627A TW95145627A TWI347675B TW I347675 B TWI347675 B TW I347675B TW 095145627 A TW095145627 A TW 095145627A TW 95145627 A TW95145627 A TW 95145627A TW I347675 B TWI347675 B TW I347675B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal oxide
- oxide semiconductor
- diffused metal
- semiconductor transistors
- laterally diffused
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/149—Source or drain regions of field-effect devices
- H10D62/151—Source or drain regions of field-effect devices of IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/601—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs
- H10D30/603—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs having asymmetry in the channel direction, e.g. lateral high-voltage MISFETs having drain offset region or extended drain IGFETs [EDMOS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
- H10D62/235—Channel regions of field-effect devices of FETs of IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
- H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
- H10D64/519—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095145627A TWI347675B (en) | 2006-12-07 | 2006-12-07 | Laterally diffused metal oxide semiconductor transistors |
| US11/783,210 US8581344B2 (en) | 2006-12-07 | 2007-04-06 | Laterally diffused metal oxide semiconductor transistors |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095145627A TWI347675B (en) | 2006-12-07 | 2006-12-07 | Laterally diffused metal oxide semiconductor transistors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200826292A TW200826292A (en) | 2008-06-16 |
| TWI347675B true TWI347675B (en) | 2011-08-21 |
Family
ID=39496959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095145627A TWI347675B (en) | 2006-12-07 | 2006-12-07 | Laterally diffused metal oxide semiconductor transistors |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8581344B2 (zh) |
| TW (1) | TWI347675B (zh) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007034800A1 (de) * | 2007-03-26 | 2008-10-02 | X-Fab Dresden Gmbh & Co. Kg | Maskensparende Herstellung komplementärer lateraler Hochvolttransistoren mit RESURF-Struktur |
| US8901648B2 (en) * | 2007-12-17 | 2014-12-02 | Marvell World Trade Ltd. | MOS device with low on-resistance |
| TWI387107B (zh) * | 2009-01-12 | 2013-02-21 | Vanguard Int Semiconduct Corp | 半導體裝置及其製造方法和橫向擴散金氧半電晶體及其製造方法 |
| US8134205B2 (en) * | 2010-01-06 | 2012-03-13 | Ptek Technology Co., Ltd. | Layout structure of power MOS transistor |
| US9461046B1 (en) | 2015-12-18 | 2016-10-04 | Texas Instruments Incorporated | LDMOS device with graded body doping |
| CN116759455A (zh) | 2018-05-25 | 2023-09-15 | 矽力杰半导体技术(杭州)有限公司 | 横向扩散金属氧化物半导体器件和其制造方法 |
| CN108807543B (zh) | 2018-05-25 | 2023-12-15 | 矽力杰半导体技术(杭州)有限公司 | 横向扩散金属氧化物半导体器件及其制造方法 |
| CN108682689B (zh) | 2018-05-25 | 2023-12-01 | 矽力杰半导体技术(杭州)有限公司 | 横向扩散金属氧化物半导体结构和其形成方法 |
| CN108598156A (zh) | 2018-05-29 | 2018-09-28 | 矽力杰半导体技术(杭州)有限公司 | Ldmos晶体管及其制造方法 |
| CN108847423B (zh) | 2018-05-30 | 2022-10-21 | 矽力杰半导体技术(杭州)有限公司 | 半导体器件及其制造方法 |
| CN109346467A (zh) | 2018-08-17 | 2019-02-15 | 矽力杰半导体技术(杭州)有限公司 | 半导体结构、驱动芯片和半导体结构的制造方法 |
| CN109346466B (zh) | 2018-08-17 | 2020-10-16 | 矽力杰半导体技术(杭州)有限公司 | 半导体结构和驱动芯片 |
| CN109326594A (zh) | 2018-08-20 | 2019-02-12 | 矽力杰半导体技术(杭州)有限公司 | 一种半导体晶片 |
| CN111668186B (zh) | 2020-06-08 | 2025-02-18 | 矽力杰半导体技术(杭州)有限公司 | 半导体器件及其制造方法 |
| CN112234094B (zh) | 2020-09-29 | 2022-07-29 | 矽力杰半导体技术(杭州)有限公司 | 金属氧化物半导体器件及其制造方法 |
| CN115241280A (zh) | 2022-07-05 | 2022-10-25 | 矽力杰半导体技术(杭州)有限公司 | 双向开关器件、其终端结构及电子设备 |
| US12464761B2 (en) * | 2022-11-30 | 2025-11-04 | Texas Instruments Incorporated | LOCOS fillet for drain reduced breakdown in high voltage transistors |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3271640A (en) * | 1962-10-11 | 1966-09-06 | Fairchild Camera Instr Co | Semiconductor tetrode |
| JPS4915668B1 (zh) * | 1969-04-15 | 1974-04-16 | ||
| US5539238A (en) * | 1992-09-02 | 1996-07-23 | Texas Instruments Incorporated | Area efficient high voltage Mosfets with vertical resurf drift regions |
| JP3136885B2 (ja) * | 1994-02-02 | 2001-02-19 | 日産自動車株式会社 | パワーmosfet |
| TW392255B (en) | 1999-01-08 | 2000-06-01 | Advanced Power Electronics Cor | Insulated gate semiconductor device with gate bus channel |
| US6306710B1 (en) * | 2000-02-03 | 2001-10-23 | Advanced Micro Devices, Inc. | Fabrication of a gate structures having a longer length toward the top for formation of a rectangular shaped spacer |
| US6798022B1 (en) * | 2003-03-11 | 2004-09-28 | Oki Electric Industry Co., Ltd. | Semiconductor device with improved protection from electrostatic discharge |
| US7074658B2 (en) * | 2003-05-05 | 2006-07-11 | Vanguard International Semiconductor Corporatio | Structure for an LDMOS transistor and fabrication method for thereof |
-
2006
- 2006-12-07 TW TW095145627A patent/TWI347675B/zh active
-
2007
- 2007-04-06 US US11/783,210 patent/US8581344B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US8581344B2 (en) | 2013-11-12 |
| TW200826292A (en) | 2008-06-16 |
| US20080135934A1 (en) | 2008-06-12 |
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