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TWI347675B - Laterally diffused metal oxide semiconductor transistors - Google Patents

Laterally diffused metal oxide semiconductor transistors

Info

Publication number
TWI347675B
TWI347675B TW095145627A TW95145627A TWI347675B TW I347675 B TWI347675 B TW I347675B TW 095145627 A TW095145627 A TW 095145627A TW 95145627 A TW95145627 A TW 95145627A TW I347675 B TWI347675 B TW I347675B
Authority
TW
Taiwan
Prior art keywords
metal oxide
oxide semiconductor
diffused metal
semiconductor transistors
laterally diffused
Prior art date
Application number
TW095145627A
Other languages
English (en)
Other versions
TW200826292A (en
Inventor
Y S Liu
Original Assignee
Vanguard Int Semiconduct Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vanguard Int Semiconduct Corp filed Critical Vanguard Int Semiconduct Corp
Priority to TW095145627A priority Critical patent/TWI347675B/zh
Priority to US11/783,210 priority patent/US8581344B2/en
Publication of TW200826292A publication Critical patent/TW200826292A/zh
Application granted granted Critical
Publication of TWI347675B publication Critical patent/TWI347675B/zh

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149Source or drain regions of field-effect devices
    • H10D62/151Source or drain regions of field-effect devices of IGFETs 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/601Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs 
    • H10D30/603Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs  having asymmetry in the channel direction, e.g. lateral high-voltage MISFETs having drain offset region or extended drain IGFETs [EDMOS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126Top-view geometrical layouts of the regions or the junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/221Channel regions of field-effect devices of FETs
    • H10D62/235Channel regions of field-effect devices of FETs of IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • H10D64/511Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/519Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
TW095145627A 2006-12-07 2006-12-07 Laterally diffused metal oxide semiconductor transistors TWI347675B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW095145627A TWI347675B (en) 2006-12-07 2006-12-07 Laterally diffused metal oxide semiconductor transistors
US11/783,210 US8581344B2 (en) 2006-12-07 2007-04-06 Laterally diffused metal oxide semiconductor transistors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095145627A TWI347675B (en) 2006-12-07 2006-12-07 Laterally diffused metal oxide semiconductor transistors

Publications (2)

Publication Number Publication Date
TW200826292A TW200826292A (en) 2008-06-16
TWI347675B true TWI347675B (en) 2011-08-21

Family

ID=39496959

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095145627A TWI347675B (en) 2006-12-07 2006-12-07 Laterally diffused metal oxide semiconductor transistors

Country Status (2)

Country Link
US (1) US8581344B2 (zh)
TW (1) TWI347675B (zh)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007034800A1 (de) * 2007-03-26 2008-10-02 X-Fab Dresden Gmbh & Co. Kg Maskensparende Herstellung komplementärer lateraler Hochvolttransistoren mit RESURF-Struktur
US8901648B2 (en) * 2007-12-17 2014-12-02 Marvell World Trade Ltd. MOS device with low on-resistance
TWI387107B (zh) * 2009-01-12 2013-02-21 Vanguard Int Semiconduct Corp 半導體裝置及其製造方法和橫向擴散金氧半電晶體及其製造方法
US8134205B2 (en) * 2010-01-06 2012-03-13 Ptek Technology Co., Ltd. Layout structure of power MOS transistor
US9461046B1 (en) 2015-12-18 2016-10-04 Texas Instruments Incorporated LDMOS device with graded body doping
CN116759455A (zh) 2018-05-25 2023-09-15 矽力杰半导体技术(杭州)有限公司 横向扩散金属氧化物半导体器件和其制造方法
CN108807543B (zh) 2018-05-25 2023-12-15 矽力杰半导体技术(杭州)有限公司 横向扩散金属氧化物半导体器件及其制造方法
CN108682689B (zh) 2018-05-25 2023-12-01 矽力杰半导体技术(杭州)有限公司 横向扩散金属氧化物半导体结构和其形成方法
CN108598156A (zh) 2018-05-29 2018-09-28 矽力杰半导体技术(杭州)有限公司 Ldmos晶体管及其制造方法
CN108847423B (zh) 2018-05-30 2022-10-21 矽力杰半导体技术(杭州)有限公司 半导体器件及其制造方法
CN109346467A (zh) 2018-08-17 2019-02-15 矽力杰半导体技术(杭州)有限公司 半导体结构、驱动芯片和半导体结构的制造方法
CN109346466B (zh) 2018-08-17 2020-10-16 矽力杰半导体技术(杭州)有限公司 半导体结构和驱动芯片
CN109326594A (zh) 2018-08-20 2019-02-12 矽力杰半导体技术(杭州)有限公司 一种半导体晶片
CN111668186B (zh) 2020-06-08 2025-02-18 矽力杰半导体技术(杭州)有限公司 半导体器件及其制造方法
CN112234094B (zh) 2020-09-29 2022-07-29 矽力杰半导体技术(杭州)有限公司 金属氧化物半导体器件及其制造方法
CN115241280A (zh) 2022-07-05 2022-10-25 矽力杰半导体技术(杭州)有限公司 双向开关器件、其终端结构及电子设备
US12464761B2 (en) * 2022-11-30 2025-11-04 Texas Instruments Incorporated LOCOS fillet for drain reduced breakdown in high voltage transistors

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3271640A (en) * 1962-10-11 1966-09-06 Fairchild Camera Instr Co Semiconductor tetrode
JPS4915668B1 (zh) * 1969-04-15 1974-04-16
US5539238A (en) * 1992-09-02 1996-07-23 Texas Instruments Incorporated Area efficient high voltage Mosfets with vertical resurf drift regions
JP3136885B2 (ja) * 1994-02-02 2001-02-19 日産自動車株式会社 パワーmosfet
TW392255B (en) 1999-01-08 2000-06-01 Advanced Power Electronics Cor Insulated gate semiconductor device with gate bus channel
US6306710B1 (en) * 2000-02-03 2001-10-23 Advanced Micro Devices, Inc. Fabrication of a gate structures having a longer length toward the top for formation of a rectangular shaped spacer
US6798022B1 (en) * 2003-03-11 2004-09-28 Oki Electric Industry Co., Ltd. Semiconductor device with improved protection from electrostatic discharge
US7074658B2 (en) * 2003-05-05 2006-07-11 Vanguard International Semiconductor Corporatio Structure for an LDMOS transistor and fabrication method for thereof

Also Published As

Publication number Publication date
US8581344B2 (en) 2013-11-12
TW200826292A (en) 2008-06-16
US20080135934A1 (en) 2008-06-12

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