1232355 A7 B7___ 五、發明說明（） 發明之技術領域 (請先閱讀背面之注意事項再填寫本頁) 本發明係有關在基板上曝光識別碼的曝光裝置，尤其是 有關曝光數個識別碼的曝光裝置，其係使用於對液^製= 步驟等使用之玻璃基板等基板的各項處理執行履歷管理及 品質管理。 先前技術 通系在液晶面板的製造步驟中，於玻璃基板上塗佈特定 的樹脂時’係分別以圖案曝光裝置進行電路圖案曝光，以 識別曝光裝置進行基板識別碼及面板識別碼等曝光·，以周 邊曝光裝置進行基板周邊部分不需光阻之部分的曝光，並 於曝光完成後，以顯像裝置進行顯像。 繼續從完成特定處理的一片玻璃基板製作一片或數片液 晶面板。 該玻璃基板50上標示有基板識別，用於識別 所示的基柢’並利用在履歷管理及品質管理等上，以提高 各項處理及整個製造線的成品率。此外，爲求在一片玻璃 基板5 0分割成數片液晶面板5 1後仍然能夠識別，標示有附 加液晶面板5 1之排列號碼等的面板識別碼5丨a，及標示有 用於判定切斷位置的切斷位置識別碼5 〇 b，使用在切斷數 片液晶面板5 1。 經濟部智慧財產局員工消費合作社印製 該基板識別碼5 0 a、切斷位置識別碼5 0 b及面板識別碼 51a等多標示在玻璃基板5〇的周圍部。 該基板識別碼5 0 a、切斷位置識別碼5 0 b及面板識別碼 5 1 a的標示僅爲其中一種實施例，其名稱及數量等當然會 -4- 本紙張尺度適用中國國家標準(CNS)A4規格（210 x 297公釐） 1232355 經濟部智慧財產局員工消費合作社印製 A7 B7 發明說明（2) 有所改變。 基板識別碼5 0 a、切斷位置識別碼5 0 b及面板識別碼5 1 a 等識別碼的曝光，係在曝光單元固定的狀態下，藉由N C控 制來移動承載玻璃基板的枱，於玻璃基板上的特定位置使 用曝光識別碼的曝光裝置。 此外，曝光玻璃基板50上周邊部分52之不需光阻部分的 周邊曝光裝置，係使用與上述曝光裝置不同之曝光裝置或 是將其組合的曝光裝置，在曝光單元固定的狀態下，藉由 N C控制來移動承載玻璃基板—的枱，於玻璃基板上的特定位 置曝光識別碼。 因此，係使用數個曝光裝置，反覆移動枱及進行曝光操 作，來曝光數個識別碼。 發明所欲解決之課題 上述的曝光裝置，若玻璃基板大型化，欲從一片玻璃基 板製作數；t液晶面板時，會產生面板識別碼的數量增加及 曝光該識別碼費時等的問題，同時，以固定曝光單元，移 動承載玻璃基板的枱來構成時，也會因枱的移動範圍大， 而造成整個裝置過大的問題。 因。而嘗試開發出一種曝光裝置，其係設置標準的固定曝 光早TC30及可移動曝光單元3丨，移動承載玻璃基板之枱來 ^光，及没置數個單元3 2，每一個單元係由用於安裝曝光 單元的^塊及導軌所形成，移動承載玻璃基板之枱來曝 光。 此種曝域置的作業效率雖然比先前的曝光裝置提高若 -5- 本紙張尺度適用中國國家標準ία^)Α4規格（21^ (請先閱讀背面之注意事項再填寫本頁) 297公釐） 1232355 A7 _______ _ B7___ 五、發明說明（）1232355 A7 B7___ V. Description of the invention () Technical field of the invention (please read the precautions on the back before filling this page) The present invention relates to an exposure device that exposes an identification code on a substrate, and particularly relates to the exposure of several identification codes The device is used to perform history management and quality management on various processes of substrates such as glass substrates used in liquid manufacturing steps. In the prior art, when a specific resin is coated on a glass substrate in the manufacturing steps of a liquid crystal panel, the circuit pattern exposure is performed by a pattern exposure device, and the exposure device performs exposure such as a substrate identification code and a panel identification code. A peripheral exposure device is used to expose the peripheral portion of the substrate that does not require photoresist, and after the exposure is completed, it is developed by a developing device. Continue to make one or several liquid crystal panels from a glass substrate that has completed a specific process. The glass substrate 50 is marked with a substrate identification for identifying the substrates shown and used for history management and quality management to improve the yield of various processes and the entire manufacturing line. In addition, in order to be able to recognize even after a glass substrate 50 is divided into a plurality of liquid crystal panels 51, a panel identification code 5 丨 a marked with an array number of the liquid crystal panel 51 and the like, and a label for determining a cutting position are marked. The cutting position identification code 5 〇b is used to cut several liquid crystal panels 51. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The substrate identification code 50 a, cut-off position identification code 50 b, and panel identification code 51a are often marked on the periphery of the glass substrate 50. The identification of the substrate identification code 50a, the cutting position identification code 50b, and the panel identification code 51a are only one of the examples, and the name and quantity thereof are of course 4- CNS) A4 specification (210 x 297 mm) 1232355 Printed A7 B7 printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (2) Changes have been made. The exposure of the identification codes such as the substrate identification code 5 0 a, the cutting position identification code 5 0 b, and the panel identification code 5 1 a is performed under the fixed state of the exposure unit, and the stage carrying the glass substrate is moved by NC control. An exposure device using an exposure identification code at a specific position on a glass substrate. In addition, the peripheral exposure device that exposes the photoresist-free portion of the peripheral portion 52 on the glass substrate 50 is an exposure device that is different from the above exposure device or a combination of them. In the state where the exposure unit is fixed, The NC control moves the stage carrying the glass substrate, and exposes the identification code at a specific position on the glass substrate. Therefore, a number of exposure devices are used, the mobile station is repeatedly used, and an exposure operation is performed to expose a plurality of identification codes. Problems to be Solved by the Invention If the above-mentioned exposure device has a large glass substrate, it is necessary to make a number of glass substrates. When a liquid crystal panel is used, problems such as an increase in the number of panel identification codes and time-consuming exposure of the identification codes are caused. When a fixed exposure unit is used to move the stage carrying the glass substrate, the entire moving range of the stage is large, which causes the problem that the entire device is too large. because. And try to develop an exposure device, which is equipped with a standard fixed exposure early TC30 and a movable exposure unit 3 丨, moving a table carrying a glass substrate to light, and several units 32 are not placed, each unit is used by It is formed by the block and the guide rail on which the exposure unit is installed, and the stage carrying the glass substrate is moved to expose. Although the operating efficiency of this exposure area is higher than the previous exposure device, if this paper size applies the Chinese national standard ία ^) Α4 size (21 ^ (Please read the precautions on the back before filling this page) 297 mm ) 1232355 A7 _______ _ B7___ 5. Description of the invention ()
干’但疋如圖5及圖6所示，久g異水留—A q U /Tf 7F，各曝光早兀的移動範圍（L i， L2)仍有限制，無法達到預期的作業效率。 晴裝--- (請先閱讀背面之注意事項再填寫本頁) 此外，由於係移動承載玻璃基板的枱，因此，A法解決 整個裝置過大的問題。 此外，迷有必須備有用於曝光基板周邊部之不需光阻部 分I周邊曝光裝置與曝光識別碼之曝光裝置的問題。 本發明之目的，在提供一種曝光裝置，可以於短時間内 在特足的位置曝光數個識別碼，而且縮小整個裝置的 積。 — " 課題之解決手段 本發明之曝光裝置的特徵，如申請專利範圍第1項所揭示 的，係分別設置可以移動的數個曝光單元，用於在塗佈有 感光材料的基板上曝光識別碼。 此外，本發明之曝光裝置如申請專利範圍第2項所揭示 的，可以由在基板上設置可以移動，用於周邊曝光的周邊 曝光單元來構成。However, as shown in Fig. 5 and Fig. 6, for a long time and different water retention-AqU / Tf7F, the movement range (L i, L2) of each exposure is still limited, and the expected operating efficiency cannot be achieved. Clear installation --- (Please read the precautions on the back before filling out this page.) In addition, since the stage that carries the glass substrate is moved, method A solves the problem of oversize the entire device. In addition, there is a problem that it is necessary to provide an exposure device for exposing a peripheral portion of the substrate without a photoresist portion I and an exposure device for an identification code. An object of the present invention is to provide an exposure device that can expose several identification codes at a sufficient position in a short time, and reduce the overall device area. — &Quot; Solution to the problem The characteristics of the exposure device of the present invention, as disclosed in item 1 of the scope of patent application, are provided with a plurality of movable exposure units, respectively, for exposure identification on a substrate coated with a photosensitive material. code. In addition, the exposure apparatus of the present invention, as disclosed in item 2 of the scope of patent application, may be constituted by providing a peripheral exposure unit which is movable on the substrate for peripheral exposure.
本發明之曝光裝置的基板，如申請專利範圍第3項所揭示 的’可以採用液晶用玻璃基板。 經濟部智慧財產局員工消費合作社印製 此外’如申請專利範圍第4項所揭示之本發明曝光裝置的 周邊曝光單元，可以設置在固定導軌或移動導軌中至少一 個導軌上來構成。 如申請專利範圍第5項所揭示，本發明之曝光裝置的特徵 馬具備：枱，其係承載基板；一對導軌，其係設置在上述 括的上方位置；數個滑塊，其係可以沿著上述導執移動； -6- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1232355 Α7 Β7 五、發明說明（） 及曝光單元，其係對安裝在個滑塊上的識別碼進行曝光。 (請先閱讀背面之注意事項再填寫本頁) 此外，本發明之曝光裝置的構成，可以定子，其係具有 向特定方向延伸的推進用場磁；及磁性資訊磁化組件來形 成申請專利範圍第6項之導軌·，可以設置在活動元件上的 磁頭，其係使具有電樞線圈之活動元件與磁性資訊磁化組 件相對’來形成安裝在上述導執上之滑塊；並將移動導 執’其係使安裝其上之申請專利範圍第7項的曝光單元安 裝用滑塊自由移動；與滑塊一體結合，該滑塊係安裝在配 置成與該移動導軌於水平方佝交叉的固定導執上，且可以 自由移動。 發明之實施形態 圖1爲顯示本發明之曝光裝置構成的概略斜視圖，曝光裝 置係设置成沿著基座（B a s e)(圖上未顯示）上所形成的導執 自由移動’其構成具備：枱1，其係以水平狀態承載玻璃 基板50 ;藤光機構2，其係設置在基座（圖上未顯示）上， 位於該枱1的上方，對基板識別碼5 〇 a、切斷位置識別碼$ 〇 及面板識別碼5 1 a之全部或任一個進行曝光；及周邊曝光 機構3，其係對基板周邊部不必要光阻的部分進行曝光。 經濟部智慧財產局員工消費合作社印製 枱1使用承載玻璃基板的面採平面構成，連接減壓源的減 壓吸附用孔採貫穿構成，支撑用銷採凸出的構成者，或是 使用具有固定玻璃基板侧面之機構的構成者，使玻璃基板 5 0處於水平狀態或垂直狀態。 此外，枱1的構成採用在水平方向之前後方向（γ方向）與 左右方向（X方向），或在垂直方向的上下方向（ζ方向）與左 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1232355 A7 B7 五、發明說明（ 右方向（X方向）可以自由移動、旋轉及可以在垂直方向升 降0 才口 1上放置破璃基板5 0的位置偏差時，測定位置偏差 量，旋轉枱1，或是向前後方向（Y方向）與左右方向（X方向） 移動來凋整位置的偏差。此外，在枱i上可設置如L形狀的 定位導板（Guide)將玻璃基板50卡在該導板内加以定位。 曝光機構2包含：固定導軌扣i、4_2，其係以托架（圖上 未顯不）支撑呈水平狀態，該托架在水平方向與基座（圖上 未顯不）距離特定的間隔；滑塊5 _ 1、5 _ 2，其係安裝在該 固定導執4-1、4-2上，沿左右方向（X方向）自由移動；移 動導執6 ’其係以結合組件7 - 1、7 · 2安裝在該滑塊5 - 1、 5 - 2上；滑塊8 - 1、s - 2、8 - 3，其係安裝在該移動導軌6 上’沿前後方向（Υ方向）自由移動；曝光單元9-i、9-2、 9 - 3 ’其係以焦點調整手段丨〇 ·丨、1 〇 · 2、i 〇 _ 3安裝在該滑 塊8-1、8〜2、8-3上，可以沿垂直方向（z方向）移動；及 紫外線光源手段1 1 · 1、1 i · 2、1 ^ 3，其係以光纖等的光 導 12-1、12-2、12-3 結合該曝光單元 9-1、9-2、9-3。 安裝在固定導執4上自由移動的滑塊5及移動導軌6的單 元組件數量，視面板識別碼5 1 a的數量來適切設定，使各 單元組件可以在特定的位置上移動。 此外，安裝在移動導執6上自由移動之滑塊8的數量，也 視面板識別碼的數量來適切設定，使各滑塊8可以在特定 的位置上移動。 上述之固定導執4(4-1、4-2)及移動導軌6，係使用由定 8- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） (請先閱讀背面之注意事項再填寫本頁) 訂· ·The substrate of the exposure apparatus of the present invention may be a glass substrate for a liquid crystal, as disclosed in item 3 of the scope of patent application. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs In addition, the peripheral exposure unit of the exposure device of the present invention disclosed in item 4 of the scope of patent application may be provided on at least one of a fixed rail or a movable rail. As disclosed in item 5 of the scope of the patent application, the characteristic horse of the exposure device of the present invention is provided with: a table, which is a carrier substrate; a pair of guide rails, which are arranged at the above positions; and a plurality of sliders, which can be moved along the With the guidance mentioned above; -6- This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) 1232355 Α7 Β7 V. Description of the invention () and exposure unit, which is mounted on a slider Identification code for exposure. (Please read the precautions on the back before filling this page) In addition, the exposure device of the present invention can be composed of a stator, which has a field magnet for propulsion extending in a specific direction; and a magnetic information magnetization component to form the scope of patent application. The guide rail of item 6 can be a magnetic head that can be installed on a movable element. The movable element with an armature coil is opposed to a magnetic information magnetization component to form a slider mounted on the above-mentioned guide; and the guide is moved. It is used to freely move the slider for the exposure unit installation on which the patent application scope item 7 is installed; integrated with the slider, the slider is mounted on a fixed guide configured to intersect the moving guide rail at a horizontal position. Up and can move freely. Embodiment of the Invention FIG. 1 is a schematic perspective view showing the structure of an exposure apparatus of the present invention. The exposure apparatus is provided to move freely along a guide formed on a base (not shown). : Table 1, which carries the glass substrate 50 in a horizontal state; Fujiko mechanism 2, which is set on the base (not shown in the figure), is located above the table 1, and the substrate identification code 50a, cutting position All or any of the identification code $ 〇 and the panel identification code 5 1 a are exposed; and the peripheral exposure mechanism 3 is for exposing a portion of the peripheral portion of the substrate that is not necessary for photoresist. The Intellectual Property Bureau employee consumer cooperative print station 1 of the Ministry of Economic Affairs uses a flat surface bearing glass substrate, a decompression suction hole connected to a decompression source, a through hole structure, and a support pin that has a convex structure, or a structure with a protruding pin. The constituent of the mechanism that fixes the side of the glass substrate makes the glass substrate 50 in a horizontal state or a vertical state. In addition, the configuration of the table 1 adopts the front and back direction (γ direction) and the left and right direction (X direction) in the horizontal direction, or the up and down direction (ζ direction) and the left and right paper dimensions in accordance with the Chinese National Standard (CNS) A4. (210 X 297 mm) 1232355 A7 B7 V. Description of the invention (Right direction (X direction) can be freely moved, rotated, and can be lifted and lowered vertically. The amount of deviation, the rotary table 1, or the forward and backward direction (Y direction) and left and right direction (X direction) to adjust the position deviation. In addition, on the table i can be set as an L-shaped positioning guide (Guide) The glass substrate 50 is clamped in the guide plate for positioning. The exposure mechanism 2 includes: fixed rail buckles i, 4_2, which are supported by a bracket (not shown in the figure) in a horizontal state, and the bracket is horizontally aligned with the base. (Not shown in the figure) a specific distance; the sliders 5 _ 1, 5 _ 2 are mounted on the fixed guides 4-1, 4-2, and move freely in the left and right direction (X direction); move Instructor 6 'It is a combination of components 7-1, 7 · 2 is installed on the sliders 5-1, 5-2; sliders 8-1, s-2, 8-3, which are installed on the moving guide 6 'to move freely in the front-rear direction (Υ direction); Exposure units 9-i, 9-2, 9-3 'It is the focus adjustment means 丨 〇 · 丨, 1 〇 · 2, i 〇_ 3 are mounted on the sliders 8-1, 8 ~ 2, 8-3 Can be moved in the vertical direction (z direction); and the ultraviolet light source means 1 1 · 1, 1 i · 2, 1 ^ 3, which is combined with a light guide 12-1, 12-2, 12-3 of an optical fiber, etc. Exposure units 9-1, 9-2, 9-3. The number of unit components installed on the fixed guide 4 freely moving slider 5 and moving guide 6 is appropriately set depending on the number of panel identification code 5 1 a, so that Each unit component can be moved at a specific position. In addition, the number of sliders 8 installed on the mobile guide 6 can be set appropriately according to the number of panel identification codes, so that each slider 8 can be at a specific position. The above-mentioned fixed guide 4 (4-1, 4-2) and moving guide 6 are used by 8- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 public love) (Please Read first (Read the notes on the back and fill in this page) Order
經濟部智慧財產局員工消費合作社印製 1232355 A7 B7 五、發明說明（6 ) 子，其係具有向特定方向延伸的推進用場磁（沿長度方向， N極與S極等間距時交互磁化的磁鐵）；及磁性資訊磁化组 (請先閱讀背面之注意事項再填寫本頁) 件（編碼圖）所形成者，滑塊”5」、夂2)與滑塊8(84、8_2 、8-3)使用由磁頭，其係可以形成、刪除、讀取設置在活 動元件内的磁性資訊（位置檢測、速度控制等編碼資訊/， 使具有電樞線圈的活動元件與磁性資訊磁化部相對所形成 者。 滑塊5、8可以藉由螺旋進給機構（其構成與焦點調整機構 10相同），其具備螺軸及旋入該螺軸上的螺帽來移動，取 代以上述的線性馬達機構來移動，當然並不限定於這些移 動機構。 曝光單元9，如圖2所示，在端部上具有光導12的連接 4，其構成係容納：聚光鏡1 4，其係使光線在安裝於焦點 调整手段1 0内之曝光箱（C a s e ) 1 3内成概略平行狀態；滤 光器1 5，唭係衰減不需要之波長的光線；射入光偏光板 1 6 ’其係使特定光線穿透；光罩（Reticie) 1 7，其係顯示任 思的文4*及圖形；射出光偏光板1 8，其係使特定的光線穿 透；半透明反射鏡、棱鏡等的分光鏡1 9 ;及投影鏡2 〇等。 經濟部智慧財產局員工消費合作社印製 該曝光單元9内設有CCD相機2 1，其係自分光鏡1 9取得 圖像’自玻璃基板5 0或枱1之表面反射的光線係自投影鏡 20射入，並以分光鏡1 9改變角度，射入CCD相機2 1，該 圖像顯示在電視機（圖上未顯示）上。並與預先設定的資料 比對，進行焦點調整及光罩的位置調整等，將圖像資料自 該CCD相機2 1送至控制裝置（圖上未顯示）。 度適用中國國家標準(CNS)A4規格（210 X 297公釐） 1232355 Α7 Β7 五 經濟部智慧財產局員工消費合作社印製 發明說明（） 此外’顯示在電視機上的圖像，可以由作業人員觀察， 並以人工操作來進行焦點調整及光罩的位置調整等。 不需要確認焦點及曝光位置，不需要進行焦點及光罩的 位置調整等時，可以省略CCD相機2 1。 該曝光單元9的構成並不限定於此，其構成還可以設置遮 光罩’其係用於限制以光導元件1 2傳送之光線的照射範 圍；也可以將紫外線的光源手段i丨一體設置在曝光單元9 内0 焦點調整手段1 〇 ( 1 〇 · 1、-丨〇 _ 2、1 0 _ 3 )包含：活動組 件，其係用於安裝曝光單元9的曝光箱，該曝光單元9係沿 著形成在滑塊8上之導軌做垂直移動，·螺軸，其係驅動用 的脈衝馬達與端部結合，以托架呈垂直狀態安裝在滑塊 8(8-1、8·2、8-3)上自由旋轉；及螺帽，其係旋入該螺軸 上，同時安裝在曝光單元安裝用組件上。 也可以使用以球狀螺軸及旋入球狀螺軸之螺帽所構成者 來取代該螺軸及螺帽。 其構成可以採用不設置該焦點調整手段1 〇，直接將曝光 單元9安裝在滑塊8上，也可以藉由多關節機構，將曝光單 元9安裝在滑塊8上。 此外，當然也可以採用不設置焦點調整手段1 〇，使（骨塊 5可以垂直移動的構成，使固定導軌4可以垂直（Ζ方向）移 動的構成，使枱1可以垂直移動的構成。 周邊曝光機構3包含：滑塊22(22-1、22-2)，其係安裝 在固定導軌4(4-1、4-2)上，可以自由移動；活動台 -10- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） ---- -裝---- (請先閱讀背面之注意事頊存填寫本買〕Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1232355 A7 B7 V. Description of Invention (6), which has a propulsion field magnet that extends in a specific direction (in the length direction, the N and S poles are alternately magnetized when they are equally spaced) Magnets); and magnetic information magnetization group (please read the precautions on the back before filling this page), the slider ("5", 夂 2) and slider 8 (84, 8_2, 8- 3) Use a magnetic head, which can form, delete, and read magnetic information (position detection, speed control and other coded information) provided in the moving element. It is formed by moving the element with an armature coil and the magnetic information magnetization part. The sliders 5 and 8 can be moved by a screw feed mechanism (the structure is the same as that of the focus adjustment mechanism 10), which includes a screw shaft and a nut screwed onto the screw shaft, instead of using the linear motor mechanism described above. The movement is, of course, not limited to these moving mechanisms. The exposure unit 9, as shown in FIG. 2, has a connection 4 of the light guide 12 on its end, and its structure is to accommodate: a condenser lens 14, which is used to adjust the light when it is mounted on the focus Means 1 0 The inside exposure box (Case) 1 3 is roughly parallel inside; the filter 15 is a system that attenuates light of an unnecessary wavelength; the incident light polarizing plate 16 is used to penetrate a specific light; the photomask (Reticie) 17 which displays Ren Si's article 4 * and graphics; outgoing light polarizing plate 18 which allows specific light to penetrate; beam splitters 19 such as translucent mirrors and prisms; and projection mirrors 2 〇 etc. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the exposure unit 9 is provided with a CCD camera 21, which is obtained from the spectroscope 19, and the light is reflected from the surface of the glass substrate 50 or the stage 1. It is incident from the projection mirror 20 and changes the angle with the beam splitter 19 and enters the CCD camera 21, and the image is displayed on a television (not shown in the figure). It is compared with the preset data to perform the focus. Adjustment and adjustment of the position of the reticle, etc., send the image data from the CCD camera 21 to the control device (not shown in the figure). The degree applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1232355 Α7 Β7 Five Inventions Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economy () The image displayed on the TV can be observed by the operator, and the focus adjustment and position adjustment of the mask can be performed manually. It is not necessary to confirm the focus and exposure position, and it is not necessary to adjust the position of the focus and mask. In this case, the CCD camera 21 can be omitted. The configuration of the exposure unit 9 is not limited to this, and a hood can also be provided. The hood is used to limit the irradiation range of the light transmitted by the light guide element 12; The light source means i 丨 is integrally provided in the exposure unit 9 0 The focus adjustment means 1 〇 (1 〇 · 1,-丨 〇_ 2, 1 0 _ 3) includes: a movable component, which is used to install the exposure of the exposure unit 9 The exposure unit 9 is vertically moved along the guide rail formed on the slider 8. The screw shaft is a driving pulse motor combined with the end, and is mounted on the slider 8 in a vertical state. -1, 8 · 2, 8-3); and a nut, which is screwed onto the screw shaft, and is simultaneously mounted on the exposure unit mounting assembly. Instead of the screw shaft and the nut, a ball screw shaft and a nut screwed into the ball screw shaft may be used. The configuration may be such that the exposure unit 9 is directly mounted on the slider 8 without providing the focus adjustment means 10, or the exposure unit 9 may be mounted on the slider 8 by a multi-joint mechanism. In addition, of course, it is also possible to adopt a configuration in which the focus adjustment means 10 is not provided so that (the bone mass 5 can be moved vertically, the fixed guide rail 4 can be moved vertically (Z direction), and the stage 1 can be moved vertically. Peripheral exposure The mechanism 3 includes: a slider 22 (22-1, 22-2), which is mounted on a fixed guide rail 4 (4-1, 4-2) and can move freely; a movable table-10- this paper size is applicable to the country of China Standard (CNS) A4 specification (210 X 297 public love) ---- -install ---- (Please read the precautions on the back first, save and fill in this purchase)
1232355 A7 經濟部智慧財產局員工消費合作社印製 B7__— - _ 五、發明說明（） 2 3 (2 3 - 1、23-2)，其係設有導軌及滑塊，並安裝在滑塊 22(22-1、22-2)上；及曝光單元 24(24-1、24-2)，其係 安裝在活動台23(23-1、23_2)上。 滑塊22的構成與滑塊5相同。 圖1中所示的滑塊5與滑塊2 2雖是分別獨立的，不過有時 也結合在一起。 活動台2 3之導軌的構成與固定導軌4相同，滑塊的構成 與滑塊5相同。 曝光單元2 4係採用與曝光-單元9相同的組件來形成，不 過其構成也可以使紫外線避開固定導軌4來照射。 此外’曝光單元2 4係以焦點調整手段（圖上未顯示）做垂 直移動。 玻璃基板識別碼5 0 a位於周圍之兩端部以外的位置（概略 中央部），以上述的周邊曝光機構3不易曝光時，則設置另 一種周邊曝光機構，其包含：移動導執，其係安裝在固定 導執4上，可以沿X方向自由移動；滑塊，其係安裝在該移 動導執上，可以沿γ方向自由移動；及曝光單元，其係以 焦點碉整手段安裝在該滑塊上，在沒有枱丨的移動操作等 下，仍可以有效進行曝光。 上述的各滑塊5、8、2 2等，係藉由相位同步控制等的 N C控制來移動。 上述光源手段1 1之紫外線的發光時間、發光間隔，滑塊 5 8、2 2的移動速度、移動量，及焦點調整手段丨〇之步 進馬達的旋轉量，係藉由具備輸入功能、記憶功能、比較 (請先閱讀背面之注意事項再填寫本頁)1232355 A7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs B7 __—-_ V. Description of the invention () 2 3 (2 3-1, 23-2), which is equipped with guide rails and sliders, and is mounted on slider 22 (22-1, 22-2); and an exposure unit 24 (24-1, 24-2), which is mounted on a movable table 23 (23-1, 23_2). The configuration of the slider 22 is the same as that of the slider 5. Although the slider 5 and the slider 22 shown in Fig. 1 are independent, they are sometimes combined. The configuration of the guide rails of the movable table 23 is the same as that of the fixed rail 4, and the configuration of the slider is the same as that of the slider 5. The exposure unit 24 is formed by using the same components as the exposure unit 9; however, the exposure unit 24 can be irradiated with ultraviolet rays avoiding the fixed guide rail 4. In addition, the 'exposure unit 24' is vertically moved by means of focus adjustment (not shown). The glass substrate identification code 50a is located at a position other than the two ends of the surroundings (the approximate central part). When the above-mentioned peripheral exposure mechanism 3 is difficult to expose, another peripheral exposure mechanism is provided, which includes: a moving guide, which is Installed on the fixed guide 4 and can move freely in the X direction; the slider is mounted on the moving guide and can move freely in the γ direction; and the exposure unit is mounted on the slide by means of focus correction On the block, the exposure can still be performed effectively without the movement operation of the stage. The above-mentioned sliders 5, 8, 22, etc. are moved by the NC control such as the phase synchronization control. The above-mentioned light source means 11's ultraviolet light emitting time and light emitting interval, the speed and amount of movement of the sliders 5 and 22, and the rotation amount of the stepping motor of the focus adjusting means 丨 are equipped with an input function and memory Function, comparison (please read the notes on the back before filling this page)
In I 裝In I equipment
-11 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 297公釐） 1232355-11-This paper size applies to Chinese National Standard (CNS) A4 (210 297 mm) 1232355
五、發明說明（ ，算功能及操作指令功能等功能的電㈣㈣裝上未 頭示）來控制。 將坡璃I板50放進上述括，及將完成曝光之玻璃基 50,出的操作，係由作業人員利用破璃基板搬移機器 人、梭式搬移機構及滾筒輸送機等進行人工作業。 玻璃基板50放在上述曝光裝置的以上就定位後，曝光 機構2的滑塊5按照控制裝置（圖上未顯示）的輸出信號，向 X方向的特定位置移動，同時，滑塊8-1、8_2、8_3分別 向Y方向的特定位置移動，曝光單元9]、9_2、Μ移動 至面板識別碼50a的曝光位置時，焦點調整手段㈠的脈衝 馬達裕知'控制裝置（圖上未顯示）的輸出信號操作，曝光單 元9移動至特定照射高度的位置。此時，光源手段"小 H-2、11-3按照控制裝置（圖上未顯示）的輸出信號操作， 發射紫外線以形成特定的文字㈣像。該紫外線照射在玻 璃基板50上，該反射光射aCCD相機21時，確認該面板識 別碼5 la的焦點狀態及曝光位置，當曝光單元9的焦點有偏 差時，所對應之焦點調整手段1〇的脈衝馬達即正轉或逆轉 來升降曝光單元9，以進行對焦，當曝光單元9的曝光位置 偏差時，所對應的滑塊8則移動來修正曝光位置。各曝光 單元9-1、9-2、9-3藉由這些操作完成設定後，光源手段 1 1 - 1、1 1 - 2、1 1 - 3操作，進行面板識別碼5 i a、切斷位置 識別碼5 1 b及基板識別碼5 〇 a等的曝光。 上述滑塊5開始移動的同時，或是曝光單元9進行曝光操 作後，滑塊2 2向X方向的特定位置（玻璃基板5〇的端部）移 -12 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝 一SJI· 經濟部智慧財產局員工消費合作社印製 1232355 A7 B7 10 五、發明說明（） 動，同時活動台2 3的滑塊向Y方向移動，曝光單元2 4 - 1、 24-2移動至玻璃基板50周邊部不需光阻部52的曝光位 置。此時，爲使光源手段（圖上未顯示）按照控制裝置（圖上 未顯示）的輸出信號操作，以形成特定的圖像，與上述曝光 單元9同樣的進行對焦及定位操作後，對周邊不需光阻部 52(玻璃基板50的兩端部）進行曝光。進行該玻璃基板5〇兩 端部的曝光時，枱1旋轉9 0。，對剩餘之周邊不需光阻部·-5 2進行曝光。 該周邊曝光機構3的曝光單元24-1、24-2與曝光機構2 的曝光單元9同樣的係向X方向與Y方向移動來構成時，才台 1處於固定狀態，曝光單元2 4 · 1、2 4 - 2則向X方向與Y方 向移動，對玻璃基板50的周邊部進行曝光。 對圖4所示的玻璃基板50設置三個曝光單元9-1、9-2、 9 - 3時，於第一行的面板識別碼5 1 a進行曝光時，則移動枱 1或滑塊5 ★依序進行第二行及第三行面板識別碼5 1 a的曝 光。 該曝光單元9對應所有面板識別碼5 1 a設置時，則幾乎同 時進行全部的曝光。 如圖3所示，上述之曝光單元9_1、9-2、9-3的移動範圍 (L1〜L3)，比先前之曝光裝置的移動範圍（L1，L2)大，同 時可以快速移動曝光位置，縮短曝光時間。 上述的實施例係説明液晶用之玻璃基板的曝光，不過本 發明的曝光裝置也適用於需要曝光識別碼的基板，且材 質、形狀等並無特別限制。 -13- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） •裝--- (請先閱讀背面之注意事項再填寫本頁) 訂： 經濟部智慧財產局員工消費合作社印製 !232355 經濟部智慧財產局員工消費合作社印製 A7 五、發明說明（ 發明之效果 由於本發明〈曝光裝置的構成，係如申請專利額第1項 所述，分別設置可以移動的數個曝光單a，用於在塗佈有 感光材料的基板上曝光識別碼，因此可以在短時間内於玻 璃基板的任何位置上對識別碼進行曝光，同時可以縮小整 個裝置的體積。 '如本發明心曝光裝置的構成，如申請專利範圍第2項所 述，係設置可以移動之周邊曝光單元，對基板周邊部不需 光阻4刀進仃曝光時，可以不需要設置用於周邊曝光的曝 光裝置，並可以同時對識別碼與基板周邊部進行曝光，以 提高作業效率。 如本發明之曝光裝置的基板爲申請專利範圍第3項之液晶 用玻璃基板時，可以在短時間内於玻璃基板上對基板識別 碼、面板識別碼等識別碼進行曝光，若在固定導執或移動 導執之至少一個導軌上設置如申請專利範圍第4項的周邊 曝光單元來構成時，可以確實達到申請專利範圍第2項的 效果，同時可以縮小整個裝置的體積。 此外，由於本發明之曝光裝置，如申請專利範圍第5項所 述，具備··枱，其係承載基板；一對導軌，其係設置在上 述枱的上方位置；數個滑塊，其係可以沿著上述導軌移 動；及曝光單元，其係用於對安裝在個滑塊上的識別碼進 行曝光，因此可以確實達到申請專利範圍第丨項的效果。 此外，本發明之曝光裝置的構成，係以定子，其係具有 向特定方向延伸的推進用場磁；及磁性資訊磁化組件來形 14- 本紙張尺度適用中國國豕標準（CNS)A4規格（210 X 297公髮） (請先閱讀背面之注意事項再填寫本頁)V. Description of the invention (The electronic equipment of functions such as calculation function and operation instruction function are not shown on the head) for control. The operation of putting the sloped glass I plate 50 into the above brackets and the exposed glass substrate 50 is performed manually by the operator using a broken glass substrate to move the robot, a shuttle transfer mechanism, a roller conveyor, and the like. After the glass substrate 50 is positioned above the exposure device, the slider 5 of the exposure mechanism 2 moves to a specific position in the X direction according to the output signal of the control device (not shown in the figure). At the same time, the slider 8-1, 8_2, 8_3 respectively move to a specific position in the Y direction, and when the exposure units 9], 9_2, and M move to the exposure position of the panel identification code 50a, the pulse motor Yuzhi 'control device (not shown in the figure) of the focus adjustment means The output signal is operated, and the exposure unit 9 is moved to a position of a specific irradiation height. At this time, the light source means "small H-2, 11-3" operate according to the output signal of the control device (not shown in the figure), and emit ultraviolet rays to form a specific text image. When the ultraviolet light is irradiated on the glass substrate 50 and the reflected light is incident on the aCCD camera 21, the focus state and exposure position of the panel identification code 5a are confirmed. When the focus of the exposure unit 9 is deviated, the corresponding focus adjustment means 1 The pulse motor is rotated forward or backward to raise and lower the exposure unit 9 for focusing. When the exposure position of the exposure unit 9 deviates, the corresponding slider 8 moves to correct the exposure position. After setting the exposure units 9-1, 9-2, and 9-3 through these operations, the light source means 1 1-1, 1 1-2, 1 1-3 are operated, and the panel identification code 5 ia and the cutting position are performed. Exposure of the identification code 5 1 b and the substrate identification code 50a. At the same time as the slider 5 starts to move, or after the exposure unit 9 performs the exposure operation, the slider 22 moves to a specific position in the X direction (the end of the glass substrate 50) -12 This paper size applies to Chinese national standards (CNS ) A4 size (210 X 297 mm) (Please read the precautions on the back before filling out this page) Install a SJI · Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs 1232355 A7 B7 10 The slider of the movable table 23 is moved in the Y direction, and the exposure units 2 4-1 and 24-2 are moved to the exposure position of the peripheral portion of the glass substrate 50 without the photoresist portion 52. At this time, in order for the light source means (not shown in the figure) to operate according to the output signal of the control device (not shown in the figure) to form a specific image, the focus and positioning operations are performed in the same manner as the exposure unit 9 described above, and the surroundings are then adjusted. No photoresist portion 52 (both ends of the glass substrate 50) is required for exposure. When exposing both ends of the glass substrate 50, the stage 1 is rotated 90. , No photoresistive part · -5 2 is required for the remaining periphery. When the exposure units 24-1 and 24-2 of the peripheral exposure mechanism 3 are configured to move in the X direction and the Y direction in the same manner as the exposure unit 9 of the exposure mechanism 2, only the stage 1 is in a fixed state, and the exposure unit 2 4 · 1 And 2 4-2 move in the X direction and the Y direction to expose the peripheral portion of the glass substrate 50. When three exposure units 9-1, 9-2, 9-3 are provided to the glass substrate 50 shown in FIG. 4, when the panel identification code 5 1a of the first row is exposed, the mobile stage 1 or the slider 5 ★ Expose the panel identification code 5 1 a in the second and third rows in order. When the exposure unit 9 is set corresponding to all the panel identification codes 5 1 a, the entire exposure is performed almost simultaneously. As shown in FIG. 3, the moving range (L1 ~ L3) of the above-mentioned exposure units 9_1, 9-2, and 9-3 is larger than the moving range (L1, L2) of the previous exposure device, and at the same time, the exposure position can be moved quickly. Reduce exposure time. The above embodiments describe the exposure of a glass substrate for liquid crystal, but the exposure device of the present invention is also applicable to a substrate that requires an identification code, and the material, shape, and the like are not particularly limited. -13- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) • Packing --- (Please read the precautions on the back before filling out this page) Printed! 232355 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7. 5. Description of the invention The exposure sheet a is used for exposing the identification code on the substrate coated with the photosensitive material, so the identification code can be exposed at any position on the glass substrate in a short time, and the size of the entire device can be reduced. The structure of the cardiac exposure device, as described in item 2 of the scope of the patent application, is provided with a peripheral exposure unit that can be moved. When a photoresist is not required to perform a 4-knife exposure on the periphery of the substrate, it is not necessary to set an exposure for peripheral exposure. Device, and can simultaneously expose the identification code and the periphery of the substrate to improve work efficiency. For example, the substrate of the exposure device of the present invention is in the scope of patent application In the case of the glass substrate for liquid crystal of 3 items, the identification codes such as the substrate identification code and the panel identification code can be exposed on the glass substrate in a short time. If it is set on at least one guide rail of a fixed guide or a mobile guide, such as a patent application When the peripheral exposure unit of the fourth item is configured, the effect of the second item of the patent application range can be reliably achieved, and the size of the entire device can be reduced. In addition, the exposure device of the present invention is as described in the fifth item of the patent application range. It has a stage, which is a carrier substrate; a pair of guide rails, which are provided above the stage; a plurality of sliders, which can be moved along the guide rails; and an exposure unit, which is used for mounting on the The identification code on each slider is exposed, so it can definitely achieve the effect of the scope of patent application. In addition, the structure of the exposure device of the present invention is a stator, which has a field magnet for propulsion extending in a specific direction; And magnetic information magnetized components to shape 14- This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 public) (Please read the note on the back first (Fill in this page again)
1232355 A7 B7 五、發明説明（12 成申請專利範圍第6項之導軌；係以設置在活動元件上的磁 頭’其係使具有電樞線圈之活動元件與磁性資訊磁化組件 相對，來形成安裝在上述導軌上之滑塊時，可以確實且於 短時間内使曝光單元移動至特定位置；並將移動導軌，其 係使安裝其上之申請專利範圍第7項的曝光單元安裝用滑塊 自由移動；與滑塊一體結合，該滑塊係安裝在配置成與該 移動導軌於水平方向交叉的固定導軌上，且可以自由移動 時，可以使曝光單元同時向水平方向的前後方向及左右方 向移動，可以在短時間内移動曝光單元。 圖式之簡要說明 圖1為本發明之曝光裝置構成之一種實施例的概略斜視 圖。 圖2為圖1中之曝光單元部分的概略剖面圖。 圖3為本發明之曝光裝置中之曝光單元移動範圍的簡圖。 圖4為以本發明之曝光裝置進行曝光之玻璃基板一種實施 例的簡圖。 圖5為先前曝光裝置之曝光單元的移動範圍簡圖。 圖6為先如之其他曝光裝置之曝光單元的移動範圍簡圖。 符號說明 1 括 2 曝光機構 3 周邊曝光機構 4、 4-1、4-2 固定導軌 5、 5-1、5-2、8、8-1、8-2、8·3、22、22-1、22-2 滑塊 6 移動導軌 尺度適 1Γ中國Α4 規格(210^^------ 1232355 A7 B7 五、發明說明（ 13 -1 -2 結合組件 9、 9-1、 9-2、 9-3 10、 10-1、 10-2、 10-3 1 1、1 1 - 1、11-2、1 1 -3 12 、 12_1 、 12_2 、 12_3 13 曝光箱 14 聚光鏡 15 遽光鏡 16、18 偏光板 17 光罩 19 分光鏡 20 投影鏡 2 1 CCD相機 2 3 活動台 50 玻璃基板 5 1 液晶面板 50a 基板識別碼 5 0b 切斷位置識別碼 5 1 a 面板識別碼 5 2 周邊曝光邵分 24、24 - 1、24-2 曝光單元 焦點調整手段 光源手段 光導 經濟部智慧財產局員工消費合作社印製 16- (請先閱讀背面之注意事項再填寫本頁)1232355 A7 B7 V. Description of the invention (12% of the patent application for the 6th guide rail; the magnetic head is provided on the moving element, which makes the moving element with the armature coil opposite the magnetic information magnetization component to form the When the slider on the guide rail is used, the exposure unit can be moved to a specific position reliably and in a short time; and the moving guide rail is used to freely move the slider for mounting the exposure unit mounted on the patent application No. 7 mounted thereon. ; Integrated with the slider, which is mounted on a fixed rail that is configured to intersect the moving rail in the horizontal direction, and when it can move freely, the exposure unit can be moved to the horizontal front-back direction and left-right direction at the same time. The exposure unit can be moved in a short time. Brief description of the drawings FIG. 1 is a schematic perspective view of an embodiment of an exposure device structure of the present invention. FIG. 2 is a schematic cross-sectional view of an exposure unit portion in FIG. 1. FIG. The schematic diagram of the moving range of the exposure unit in the exposure device of the present invention. Fig. 4 is a glass substrate for exposure by the exposure device of the present invention. A schematic diagram of the embodiment. Fig. 5 is a schematic diagram of the moving range of the exposure unit of the previous exposure device. Fig. 6 is a schematic diagram of the moving range of the exposure unit of the other exposure device as described above. Explanation of symbols 1 Including 2 exposure mechanism 3 Peripheral exposure mechanism 4, 4-1, 4-2 Fixed guide rails 5, 5-1, 5-2, 8, 8-1, 8-2, 8 · 3, 22, 22-1, 22-2 Slider 6 Move guide rail scale Suitable for 1Γ China A4 specifications (210 ^^ ------ 1232355 A7 B7 V. Description of the invention (13 -1 -2 combined with components 9, 9-1, 9-2, 9-3 10, 10-1, 10 -2, 10-3 1 1, 1 1-1, 11-2, 1 1 -3 12, 12_1, 12_2, 12_3 13 Exposure box 14 Condenser 15 Mirror 16, 18 Polarizer 17 Photomask 19 Beamsplitter 20 Projection mirror 2 1 CCD camera 2 3 Mobile stage 50 Glass substrate 5 1 LCD panel 50a Substrate identification code 5 0b Cut-off position identification code 5 1 a Panel identification code 5 2 Peripheral exposure Shao 24, 24-1, 24-2 exposure Unit Focus Adjustment Means Light Source Means Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economics and Light (printed 16- (Please read the precautions on the back before filling this page)
本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)