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TWI228382B - Organic flat light-emitting display and its manufacturing process - Google Patents

Organic flat light-emitting display and its manufacturing process Download PDF

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TWI228382B
TWI228382B TW93106774A TW93106774A TWI228382B TW I228382 B TWI228382 B TW I228382B TW 93106774 A TW93106774 A TW 93106774A TW 93106774 A TW93106774 A TW 93106774A TW I228382 B TWI228382 B TW I228382B
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emitting display
matrix
patent application
scope
pattern
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TW93106774A
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TW200531583A (en
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Wen-Jeng Lan
Jin-Jung Jangjian
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Univision Technology Inc
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Abstract

There is provided a visual pixel definition reduce resistance matrix (VPDRRM) organic flat light emitting display. A metal matrix pattern is provided around the anode pattern layer of the organic flat light-emitting display. The metal matrix pattern can be disposed above the edge of the anode pattern layer, at the side edge of the anode pattern layer, or to simultaneously cover the top edge and side edge of the anode pattern layer. Furthermore, the metal matrix pattern is made by material with high electric conductivity and reflectivity, such as gold, silver, aluminum, copper and chromium.

Description

案號 9310R774 1228382Case No. 9310R774 1228382

—A 修正 五、發明說明(1) 【發明所屬之技術領域】 =’X明係有關於一種有機平面發光顯示器及其製程, 尤/、是有關於一種可視晝素定義減少阻抗矩陣(Vlsual Pixel Definition Reduce p ^—A Amendment V. Explanation of the invention (1) [Technical field to which the invention belongs] = 'X Ming is related to an organic flat light-emitting display and its manufacturing process, and in particular, it is related to a visible daylight definition reduction impedance matrix (Vlsual Pixel Definition Reduce p ^

λ ^ . . ^ Kesistance Matrix; YPDRRM )在有機平面發光顯示器的應用。 【先前技術】 隨著可攜式電子產品如丰她 私饰认JL Κ T 手機、數位相機或是個人數位λ ^.. ^ Kesistance Matrix (YPDRRM) in organic flat light-emitting display applications. [Previous technology] With portable electronic products such as Feng She, personal recognition of JL KK T mobile phones, digital cameras or personal digital

助理的晋及,平面顯示器(F 平面顯示器主要包含液晶顯示J =能也:ff要二 及有機電激顯示器等,目前較:、電漿喊不益 本身不會發光,需要加裝背;f晋及的液晶顯示器因液晶 Λ有不利之影響。 反,而對於重量體積及成本 19 8 7年國沐可土衆/入^I、, C0…),在兩:先發表有機發光二極體 19 9 〇年英國劍橋大學發表高分子 發光層的材料、特性及相的積極研發,因此有機 機電激顯示器具有自發光f、p : !有大幅之突破。由於有 優點,因此可望成為主流之平面顯示器圍及廣視角之 第一圖所不者為_ f 圖,該有機發光二極體元件主2 5二極體元件10之剖視 在玻璃基板100上成預包含一玻璃基板1〇〇、 陽極圖案層12 0上之〇τ 1々㈡木層120、主要位在Assistant's promotion, flat display (F flat display mainly includes liquid crystal display J = can also: ff to two and organic electro-active display, etc., currently compared to :, the plasma will not shine itself will not light, you need to install a back; f The liquid crystal display of Jin has adverse effects due to the liquid crystal Λ. On the other hand, the weight, volume and cost of the country ’s LCD can be increased in 1878. In two: the organic light emitting diode was first published. In 1990, the University of Cambridge in the United Kingdom announced the active research and development of materials, properties and phases of polymer light-emitting layers. Therefore, organic electromechanical displays have self-luminous f, p:! Because of its advantages, it is expected that the first picture of the mainstream flat-panel display and wide viewing angle is _f. The cross section of the organic light-emitting diode element main 2 5 diode element 10 is on the glass substrate 100. The upper part contains a glass substrate 100, an anode pattern layer 120 and a ττ 1 alder layer 120, mainly located at

^ L E D發光多層么士才盖]j n -h r\ J^ L E D Emitting Multi-layered Mask)] j n -h r \ J

E D發光層140上之险炻爲彳〇〇夕曰、、、口構140、位在〇L θ 22、及位在陽極圖案層12〇之The risk on the ED light-emitting layer 140 is 彳 〇〇night, 口, 140, located at 0L θ 22, and located at the anode pattern layer 12〇

第5頁 1228382 五、發明說明Page 5 1228382 V. Description of the invention

間作為隔絕用的絕緣區丨6卜其中〇L E D發光多層結構 14 0包含由下而上的電洞傳輸層(HTL 42、發光材料層 (EML)14 4及電子傳輸層(ETL)146。在經由陽極圖案層I” 及陰極層1 2 2通入電流後,電子電洞分別經由電子傳輸層 (ETL、M46及電洞傳輸層(HTL)142在發光材料層(EML)i4j結 合發光。為了定義晝素面積與避免各個晝素(由陽極圖案 層120界定)之間的短路問題,在陽極圖案層12〇之間= 絕緣區1 6 0。 夕队 第 剖視圖 之元件 一側上 抗。如 體元件 用功函 率,如 大的阻 陽極圖 發光效 二A圖所示者為另一習知有機發光二極體元件1 〇之 ,該有機發光二極體元件1 〇與第一圖所示者有相、 ,因此使用類似的元件編號,在陽極圖案層i 2 〇§之4 方具有一金屬導線1 8 0,以降低陽極圖案層i 2 〇之 弟一 B圖所示’該金屬導線18 0係在有機發务一 1 0之上方呈條狀分布。由於陽極圖案層1 2 〇通常 數(work function)較高之材料以提高電洞產$使 可以使用氧化銦錫(I T〇)材料,因此會夏生致 抗,影響發光效率。金屬導線180可使用有較 案層1 2 0小之材料,以降低陽極之整體阻抗,乳旱又 率。 几,提升 苐二圖所示者為另一習知有機發光二極體元件 視圖,該有機發光二極體元件1 〇與第一圖所示者有1 0之剖 元件,因此使用類似的元件編號,為了防止因载子相近之 影響晝素面積的開口率大小,如此圖所示,在陽極注入而 1 2 〇的兩個側面形成金屬導線1 8 0,以防止因載子支固案層 左入而影 1228382 __ 案號93106774_年月日__ 五、發明說明(3) 響晝素面積之開口率’並更進一步提高發光效率。 然而在上述各習知技術中,無法達成同時兼具有效降 低阻抗及界定晝素之發光區域,並可以減少不同顏色之發 光材料層(E M L )之間的互相干擾之效果。 【發明内容】 因此本發明之目的係在於提供一種使用可視晝素定義 減少阻抗矩陣(Visual Pixel Definition Reduce Resistance Matrix; VPDRRM )之有機平面發光顯示器, 其中金屬矩陣圖案可以有效降低阻抗及界定可視晝素之發 光區域’並可以減少不同顏色之發光材料層(EML)之間的 互相干擾。 明之另 方法。 成本發 阻抗矩 示器之 案可位 或是同 陣圖案 銀、症呂 成本發 阻抗矩 程製作 層之邊 . 本發 顯示器之 ' 為達 定義減少 面發光顯 屬矩陣圖 層之侧緣 該金屬矩 可用金、 為達 定義減少 影钱刻製 陽極圖案 一目的係在於提供製作上述有機平面發光 明之上 陣有機 陽極圖 在陽極 時覆蓋 係用導 、銅與 明之上 陣有機 出金屬 緣上方 述目的,本發明提供一種可視晝素 平面發光顯示器,主要係在有機平 案層四周提供金屬矩陣圖案,該金 圖案層之邊緣上方、位在陽極圖案 陽極圖案層之上緣及側緣。再者, 電係數與反射率高之材質製作,如 鉻等材質。 述目的,本發明提供一種可視晝素 平面發光顯示器之製程,可利用微 矩陣圖案,並使金屬矩陣圖案圍繞 及/或側面。As an insulating area for isolation, the LED light emitting multilayer structure 140 includes a hole-transporting layer (HTL 42, a light-emitting material layer (EML) 144, and an electron-transporting layer (ETL) 146) from bottom to top. After the current is passed through the anode pattern layer I "and the cathode layer 1 2 2, the electron holes are combined to emit light through the light-emitting material layer (EML) i4j via the electron-transport layers (ETL, M46 and hole-transport layer (HTL) 142). Defining the area of daylight and avoiding the short circuit between each daylight (defined by the anode pattern layer 120), between the anode pattern layer 120 and the insulation area 1 60. The side of the element in the sectional view of the evening team is resistant. The work function rate of the body element, as shown in the large resistance anode diagram, luminous efficiency, diagram A, is another conventional organic light emitting diode element 10, and the organic light emitting diode element 10 and the first diagram There are phases, and therefore, similar component numbers are used, and a metal wire 1 80 is provided on the fourth side of the anode pattern layer i 2 〇§ to reduce the anode pattern layer i 2 〇 The figure B shows' the metal wire 18 0 is distributed in a strip above the organic service 1 10. Because The electrode pattern layer 1 2 0 usually has a higher work function to increase the hole production. Indium tin oxide (IT0) materials can be used, so it will cause resistance in summer and affect the luminous efficiency. The metal wire 180 can be used. The material is smaller than the case layer 120 to reduce the overall impedance of the anode, and the rate of lactation and drought. A few, the one shown in Figure 2 is a view of another conventional organic light emitting diode element, the organic light emitting diode Element 10 has a cross-section element of 10 as shown in the first figure. Therefore, similar element numbers are used. In order to prevent the aperture ratio of the day element area from being affected by similar carriers, as shown in the figure, the anode implantation and 1 Metal wires 1 8 0 are formed on both sides of 2 〇 to prevent shadowing due to the left entry of the carrier-supported case layer 1228382 __ Case No. 93106774_year month__ V. Description of the invention (3) Opening of the area Rate 'and further improve the luminous efficiency. However, in the above-mentioned conventional technologies, it is not possible to achieve both the effective reduction of impedance and the definition of the luminous area of the daylight, and can reduce the mutual interaction between the luminescent material layers (EML) of different colors. Interference [Summary of the invention] Therefore, an object of the present invention is to provide an organic flat light emitting display using a visual pixel definition reduce resistance matrix (VPDRRM), in which a metal matrix pattern can effectively reduce the impedance and define the visible The light emitting area of the day element can also reduce the mutual interference between the different color light emitting material layers (EML). Another method is clear. The cost of the impedance indicator can be in place or the pattern of silver or the same pattern can be used. The side of the moment production layer. The definition of the display is to reduce the side luminescence of the matrix layer. The metal moment can be made of gold. The purpose of the anode pattern is to reduce the shadow money. The purpose is to provide the above organic plane. The photoluminescence array organic anode map covers the above-mentioned purpose when the anode is used in the anode, and copper and the metal organic array are exposed above the metal edge. The present invention provides a visible day-light flat display, which mainly provides a metal matrix pattern around the organic flat layer Above the edge of the gold pattern layer, a bit The anode layer on the anode patterns patterned edge and the side edges. Furthermore, it is made of materials with high electrical coefficient and reflectivity, such as chromium. For the purposes described, the present invention provides a process for producing a visible daylight flat light-emitting display, which can use a micro-matrix pattern and surround and / or a side of a metal matrix pattern.

第7頁 案號 93106774 1228382 修正Page 7 Case No. 93106774 1228382 Amendment

五、發明說明(4) 【實施方式】 、參見第四A圖,為依據本發明第一較佳具體實 視晝素定義減少阻抗矩陣有機平面發光顯示器2 〇之 σ 圖,该可視晝素定義減少阻抗矩陣有機平面發光顯哭 主要包含一玻璃基板200、在玻璃基板2〇〇上成預定: 陽極圖案層220、主要位在陽極圖案層22〇上之〇L ^ 光多層結構24 0、位在〇L E D發光層24 0上之陰極層2 2 2X 、及位在陽極圖案層2 2 0之間作為隔絕用的隔離層2 g 〇。复 中〇L E D發光多層結構240包含由下而上的電洞傳輸層” (HTL)242、發光材料層(EML) 244及電子傳輪層(ETL) 。在經由陽極圖案層2 2 0及陰極層2 2 2通入電流後,電子電 洞分別經由電子傳輸層(ETL) 246及電洞傳輪層(HTf) 在發光材料層(EML) 244結合發光。為了避免各個晝素之 間的晝素面積開口率大小與短路問題,在陽極圖案層2 2 〇 之間形成絕緣區2 6 0。 ”曰 平面^第四A圖所示,該可視晝素定義減少阻抗矩陣有機 矩陣圖i顯示器20具有在陽極圖案層2 2 0上側周圍之金屬 可視=1280 ’因此分佈在畫素四週之此金屬導線區域(即 笋光i w疋義減少阻抗矩陣);可以用來定義可視晝素之 導線;=:換言之,分佈在晝素四週之此(不透光性)金屬 來避# ί (即可視畫素定義減少阻抗矩陣);功能非僅是用 四週之有機光源向四週非顯示區域溢射,再者分佈在晝素 阻抗矩ί (不透光性)金屬導線區域(即可視晝素定義減少 渾);可以降低外在光源對OLED元件之反射干擾。V. Description of the Invention (4) [Embodiment] Referring to FIG. 4A, it is a σ diagram of the reduced impedance matrix organic flat light-emitting display 2 according to the first preferred embodiment of the present invention. The impedance reduction matrix organic planar light-emitting display device mainly includes a glass substrate 200, which is predetermined on the glass substrate 2000: an anode pattern layer 220, and an optical multi-layer structure 240, which is mainly located on the anode pattern layer 220. The cathode layer 2 2 2X on the LED light emitting layer 24 0 and the isolation layer 2 g as an isolation layer positioned between the anode pattern layer 2 2 0. Fuzhong LED multi-layer structure 240 includes bottom-to-top hole transport layer (HTL) 242, luminescent material layer (EML) 244, and electron wheel layer (ETL). The anode pattern layer 2 2 0 and the cathode After the layer 2 2 2 is energized, the electron holes are combined to emit light through the electron transport layer (ETL) 246 and the hole transfer wheel layer (HTf) in the luminescent material layer (EML) 244. In order to avoid daylight between the various daylight elements The open area ratio of the element area and the short circuit problem form an insulating region 2 6 0 between the anode pattern layer 2 2 0. “Plane ^ As shown in Figure 4A, the visible day element definition reduces the impedance matrix organic matrix diagram i display 20 The metal visible around the upper side of the anode pattern layer 2 2 0 = 1280 'Therefore, the area of the metal wire distributed around the pixel (that is, the light iw meaning reduced impedance matrix); can be used to define the visible day element of the wire; = : In other words, this (opaque) metal is distributed around the day element to avoid # ί (the pixel can be defined to reduce the impedance matrix); the function is not only to use the organic light source around the area to overflow the non-display area around, and then Distribution of the moment of impedance Transmittance) metal wire area (that is, the haze can be reduced depending on the definition of daylight); it can reduce the reflection interference of external light sources on OLED elements.

1228382 _案號 93106774_年月日__ 五、發明說明(5) 此外分佈在畫素四週之此(不透光性)金屬導線區域(即可 視畫素定義減少阻抗矩陣);用以定義可視晝素發光區域 •,可以避免不同EL顏色之發光相互干擾(例如:使用在全彩 R G B S i d e b y S i d e製程時,能阻絕其不同顏色之相互干 擾)。 在第四A圖所示之可視晝素定義減少阻抗矩陣有機平 面發光顯示器20中,三個發光材料層(EML) 244可以發出 不同顏色,例如可以分別發出紅藍綠(R B G )三色,以 達成全彩應用。該金屬矩陣圖案可以避免不同EL顏色之發 光相互干擾,達成更佳的色彩解析度。 如第四B圖,為依據本發明第二較佳具體實例之可視 晝素定義減少阻抗矩陣有機平面發光顯示器2 0之剖面圖, 該可視晝素定義減少阻抗矩陣有機平面發光顯示器2 0主要 元件與第四A圖所示之本發明第一較佳具體實例之可視晝 素定義減少阻抗矩陣有機平面發光顯示器2 0相似,但是該 可視晝素定義減少阻抗矩陣有機平面發光顯示器2 0具有在 陽極圖案層2 2 0周圍之金屬矩陣圖案2 8 0,因此分佈在晝素 四週之此金屬矩陣圖案(即可視晝素定義減少阻抗矩陣), 可以用來定義可視晝素之發光區域。依據此具體實例,可 以更進一步避免外界光線進入此有機平面發光顯示器2 0内 〇 如第四C圖,為依據本發明第三較佳具體實例之可視 晝素定義減少阻抗矩陣有機平面發光顯示器2 0之剖面圖, 該可視畫素定義減少阻抗矩陣有機平面發光顯示器2 0主要1228382 _Case No. 93106774_ Year Month Date__ V. Description of the invention (5) In addition, this (opaque) metal wire area (which can be defined by the pixel to reduce the impedance matrix) is distributed around the pixel; it is used to define the visible Day light emission area •, can avoid the mutual interference of the light emission of different EL colors (for example: when used in the full color RGBS ideby Side process, it can prevent the mutual interference of different colors). In the visible flat element-defining reduced-resistance matrix organic flat light-emitting display 20 shown in FIG. 4A, three light-emitting material layers (EML) 244 may emit different colors, for example, three colors of red, blue, and green (RBG) may be emitted, respectively. Reach full-color applications. The metal matrix pattern can avoid mutual interference of light emission of different EL colors, and achieve better color resolution. FIG. 4B is a cross-sectional view of an organic planar light-emitting display 20 with a reduced impedance matrix according to the second preferred embodiment of the present invention. Similar to the first preferred embodiment of the present invention shown in FIG. 4A, the visible daylight definition reduced impedance matrix organic flat light-emitting display 20 has an anode. The metal matrix pattern 2 8 0 around the pattern layer 2 2 0. Therefore, the metal matrix pattern (that is, the impedance matrix can be reduced according to the definition of the day element) distributed around the day element can be used to define the luminous area of the visible day element. According to this specific example, it is possible to further prevent outside light from entering the organic flat light-emitting display 200. As shown in FIG. A cross-sectional view of 0. The visible pixels define an organic flat light-emitting display with a reduced impedance matrix.

1228382 _案號 93106774_年月日__ 五、發明說明(6) 元件與第四A圖所示之本發明第一較佳具體實例之可視晝 素定義減少阻抗矩陣有機平面發光顯示器2 0相似,但是該 可視晝素定義減少阻抗矩陣有機平面發光顯示器2 0具有在 陽極圖案層22 0周圍之金屬矩陣圖案280,且具有一個較窄 之下侧部份2 8 2。 如第四D圖,為依據本發明第四較佳具體實例之可視 畫素定義減少阻抗矩陣有機平面發光顯示器2 0之剖面圖, 該可視晝素定義減少阻抗矩陣有機平面發光顯示器2 0主要 元件與第四A圖所示之本發明第一較佳具體實例之可視晝 素定義減少阻抗矩陣有機平面發光顯示器2 0相似,但是該 可視晝素定義減少阻抗矩陣有機平面發光顯示器2 0具有在 陽極圖案層2 2 0周圍之金屬矩陣圖案2 8 0,且具有一個漸窄 (tapered)之下側部份2 8 2。此金屬矩陣圖案(即可視晝素 定義減少阻抗矩陣)之材質,可使用導電係數與反射率高 之材質製作;例如:金、銀、鋁、銅與鉻等材質。 參見第四E圖,為本發明可視晝素定義減少阻抗矩陣 有機平面發光顯示器2 0之上視圖,因為金屬矩陣圖案2 8 0 係包圍在陽極圖案層2 2 0周圍,因此可以有效降低阻抗及 界定可視晝素之發光區域,並可以減少不同顏色之發光材 料層(EML)之間的互相干擾。 參見第五A —五F圖,為製作依據本發明第一較佳具 體實例之可視晝素定義減少阻抗矩陣有機平面發光顯示器 2 0之流程圖,包含下列步驟 步驟S 1 0 0 :參見第五A圖,置備一玻璃基板2 0 0並使1228382 _Case No. 93106774_ Year Month Date__ V. Description of the invention (6) Components and the first preferred embodiment of the present invention shown in Figure 4A, the visible daylight definition of the reduced impedance matrix organic flat light-emitting display 2 is similar However, the visible daylight-defining reduced-resistance-matrix organic planar light-emitting display 20 has a metal matrix pattern 280 around the anode pattern layer 22 0 and has a narrow lower side portion 2 8 2. As shown in FIG. 4D, it is a cross-sectional view of an organic flat light-emitting display 20 for reducing the impedance matrix according to the visual pixel definition of the fourth preferred embodiment of the present invention. Similar to the first preferred embodiment of the present invention shown in FIG. 4A, the visible daylight definition reduced impedance matrix organic flat light-emitting display 20 has an anode. The metal matrix pattern 2 8 0 around the pattern layer 2 2 0 has a tapered lower side portion 2 8 2. The material of this metal matrix pattern (that is, the impedance reduction matrix defined by the day element) can be made of materials with high conductivity and reflectivity; for example: gold, silver, aluminum, copper, and chromium. Referring to FIG. 4E, a top view of an organic flat light-emitting display 20 with a reduced impedance matrix according to the present invention can be defined. Since the metal matrix pattern 2 8 0 is surrounded around the anode pattern layer 2 2 0, the impedance can be effectively reduced. Define the luminous area of visible daylight, and can reduce the mutual interference between different color luminescent material layers (EML). Refer to the fifth A-F diagrams for a flow chart of the organic planar light-emitting display 20 for reducing the visible matrices according to the first preferred embodiment of the present invention, including the following steps: Step S 1 0 0: Figure A, provision of a glass substrate 2 0 0 and

第10頁 1228382 _案號93106774_年月日__ 五、發明說明(7) 用D e t e r g e n t等化學藥品與去離子水清洗此玻璃基板2 0 0 ; 接著利用Split ter等機台成長一 ITO薄膜2 2 0以作為陽極。 步驟S102:參見第五B圖,利用Sputter等機台或電 鍍等製程於所得結構上成長一金屬薄膜2 8 0。 步驟S 1 0 4 :參見第五C圖,利用微影蝕刻製程,在金 屬薄膜2 8 0製作出金屬矩陣圖案。 步驟S 1 0 6 :參見第五D圖,利用微影蝕刻製程,製作 ITO薄膜2 2 0圖案 步驟S108:參見第五E圖,先塗佈polyimide等材質 光阻,再利用微影製程,製作絕緣區2 6 0。 步驟S 1 1 0 :參見第五F圖,利用蒸鍍製程,分別成長 t洞傳輸層(HTL) 242、發光材料層(EML) 244、電子傳輸 層(ETL) 24 6及陰極層2 2 2。 • 參見第六A —六F圖,為製作依據本發明另一較佳具 體實例之可視晝素定義減少阻抗矩陣有機平面發光顯示器 2 0之流程圖,包含下列步驟 步驟S 2 0 0 :參見第六A圖,置備一玻璃基板2 0 0並使 用D e t e r g e n t等化學藥品與去離子水清洗此玻璃基板2 0 0 ; 接著利用Spu 11 er等機台成長一 I TO薄膜2 2 0以作為陽極。 步驟S2 0 2 :參見第六B圖,利用微影蝕刻製程,製作ITO 薄膜2 2 0圖案。 步驟S204:參見第六C圖,利用Sputter等機台或電 鍍等製程於所得結構上成長一金屬薄膜。 步驟S 2 0 6 :參見第六D圖,利用微影蝕刻製程,在金Page 101228382 _Case No. 93106774_Year Month and Date__ V. Description of the invention (7) Wash the glass substrate 2 0 0 with chemicals such as Detergent and deionized water; then use an apparatus such as Splitter to grow an ITO film 2 2 0 was used as the anode. Step S102: Referring to FIG. 5B, a metal thin film 280 is grown on the obtained structure by using a machine such as a Sputter or a plating process. Step S 104: Referring to FIG. 5C, a metal matrix pattern is fabricated on the metal thin film 280 using a lithography etching process. Step S 106: refer to the fifth D drawing, and use the lithography etching process to make an ITO film 2 2 0 pattern. Step S108: refer to the fifth E drawing, first apply a photoresist such as polyimide, and then use the lithography process to make Insulation area 2 6 0. Step S 1 1 0: Referring to FIG. 5F, using the evaporation process, a t-hole transport layer (HTL) 242, a luminescent material layer (EML) 244, an electron transport layer (ETL) 24 6 and a cathode layer 2 2 2 are grown respectively. . • Refer to Figures 6A to 6F for a flowchart of making an organic planar light-emitting display 2 of a reduced impedance matrix with visible daylight definition according to another preferred embodiment of the present invention, which includes the following steps: Step S 2 0 0: In Figure 6A, a glass substrate 2000 is prepared, and the glass substrate 200 is cleaned with chemicals such as Detergent and deionized water. Then, an I TO film 2 2 0 is grown using a machine such as Spu 11 er as an anode. Step S2 0 2: Referring to FIG. 6B, a lithographic etching process is used to fabricate a 2 2 0 pattern of the ITO film. Step S204: Referring to FIG. 6C, a metal thin film is grown on the obtained structure by using a machine such as Sputter or a plating process. Step S 2 0 6: Referring to the sixth diagram D, the photolithography etching process is used for

1228382 _案號 93106774_年月日__ 五、發明說明(8) 屬薄膜2 8 0製作出金屬矩陣圖案。 步驟S208:參見第六E圖,先塗佈polyimide等材質 光阻,再利用微影製程,製作絕緣區2 6 0。 步驟S 2 1 0 :參見第六F圖,利用蒸鍍製程,分別成長 電洞傳輸層(HTL) 2 4 2、發光材料層(EML) 244、電子傳輸 層(ETL) 24 6及陰極層2 2 2。 其中,第六圖所示製造程序所製造出PRDDM之元件結 構;由於金屬矩陣圖案可以延伸到與玻璃基板相接觸,對 降低電極導線之阻抗與使0LED元件光源從I TO顯示面射出 之效果較第五圖所示製造程序為佳。 綜上所述本發明之有機平面發光顯示器具有下列優 點: 1 、金屬矩陣圖案可接觸其I TO等透明電極之面上側 邊或兩侧,並呈矩陣狀排列,因此可降低電極導線之阻抗 並用來定義可視晝素之發光區域。 2 、金屬矩陣圖案可避免有機光源向四週非顯示區域 溢射及降低外在光源對0LED元件之反射干擾。 3 、金屬矩陣圖案可以避免不同EL顏色之發光相互干 擾(例如:使用在全彩RGB Side by Side製程時,能阻絕其 不同顏色之相互干擾)。 4、利用此不透光性金屬矩陣圖案可增加光源色彩 純化與灰階效率並增加視角之清晰程度。 本發明之有機平面發光顯示器具有金屬矩陣圖案,可 以有效降低阻抗及界定可視畫素之發光區域,並可以減少1228382 _ Case No. 93106774_ Year Month Date__ V. Description of the invention (8) The metal matrix 2 8 0 is used to make a metal matrix pattern. Step S208: Referring to the sixth figure E, firstly apply a photoresist of a material such as polyimide, and then use a lithography process to produce an insulating region 260. Step S 2 1 0: See FIG. 6F, and use the evaporation process to grow a hole transport layer (HTL) 2 4 2, a light emitting material layer (EML) 244, an electron transport layer (ETL) 24 6 and a cathode layer 2 twenty two. Among them, the PRDDM element structure manufactured by the manufacturing process shown in Figure 6; because the metal matrix pattern can be extended to contact the glass substrate, the effect of reducing the resistance of the electrode lead and causing the 0LED element light source to emit from the I TO display surface The manufacturing process shown in the fifth figure is preferred. To sum up, the organic flat light-emitting display of the present invention has the following advantages: 1. The metal matrix pattern can contact the sides or sides of the transparent electrode such as I TO, and is arranged in a matrix, so the impedance of the electrode lead can be reduced. And used to define the luminous area of visible daylight. 2. The metal matrix pattern can prevent the organic light source from overflowing to the surrounding non-display area and reduce the reflection interference of the external light source to the 0LED element. 3. The metal matrix pattern can avoid the mutual interference of the luminescence of different EL colors (for example: when used in the full-color RGB Side by Side process, it can prevent the mutual interference of different colors). 4. Using this opaque metal matrix pattern can increase the color purification and grayscale efficiency of the light source and increase the clarity of the viewing angle. The organic flat light-emitting display of the present invention has a metal matrix pattern, which can effectively reduce the impedance and define the light-emitting area of visible pixels, and can reduce

第12頁 1228382 _案號 93106774_年月日__ 五、發明說明(9) 不同顏色之發光材料層(EML)之間的互相干擾,確實具有 產業上之進步性,且本發明結構未見於現有全彩有機電激 發光顯示器,因此亦符合新穎性之法規要求,爰乃依法具 文提出申請。Page 128382 _Case No. 93106774_ Year Month Date__ V. Description of the invention (9) The mutual interference between different colors of light-emitting material layers (EML) is indeed industrially advanced, and the structure of the invention is not seen in Existing full-color organic electroluminescent display, therefore also meets the requirements of novelty regulations.

第13頁 1228382 _案號93106774_年月曰 修正_ 圖式簡單說明 (一)圖式部分 第一圖所示者為一習知有機發光二極體元件之剖視圖。 第二A圖所示者為另一習知有機發光二極體元件之剖視圖 圖 。視。程 視 圖可形製 上 視之圖件 之 剖例器元 件之實示體 元 件體顯極 體元具光二 極 體佳發光 二 極較面發 光 二同平機 發光不機有 機發明有明 有機發陣發 中有本矩本 圖 知據抗據 A 習依阻依 二 一為少為 第另圖減圖 為為E 義F 示 者四定五 所 示第素第 圖。所至晝至 B 圖 A A 二 三四 五 第第第 第 光 發 板 機 基 有 璃 明 玻 發 〇 本 〇 據 1 依 - 件 另 元 為。 號體 圖圖 符 極 。F程 表 二 圖六流 代 光 程第程 件 發 流至製 元1機 A 3知有 六 二習ο 第' ([1 件 元 體 極 1 2 0陽極圖案層 1 4 0發光多層結構 1 4 4發光材料層 1 6 0絕緣區 1 2 2陰極層 1 4 2電洞傳輸層 1 4 6電子傳輸層 1 8〇金屬導線Page 13 1228382 _Case No. 93106774_ Year Modification _ Brief description of the drawings (A) Schematic part The first picture shows a cross-sectional view of a conventional organic light emitting diode element. The second figure A is a cross-sectional view of another conventional organic light emitting diode element. As. Process view can be used to form the top view of the example device element. The display element is a body element with a light diode. A light emitting diode is better than a light emitting diode. There is a moment in this graph, the evidence is based on A, Xi Yiyi is the second one, and the second one is less. The second one is the first one, and the other is the first one. From day to day B Figure A A 2345th No. 1st light hair board machine has a glass and glass. 〇 This 〇 According to 1 according to-the other yuan. Number body symbol. F schedule table two diagrams of the six-generation optical path of the first process to send to the machine 1 machine A 3 knows the six or two exercises ο '([1 pieces of body pole 1 2 0 anode pattern layer 1 4 0 light-emitting multilayer structure 1 4 4 Luminous material layer 1 6 0 Insulation area 1 2 2 Cathode layer 1 4 2 Hole transport layer 1 4 6 Electron transport layer 1 80 Metal wire

光 U發 明機 發有 本ο [2 極體元件 2 0 0玻璃基板Light U light generator Hair with this ο [2 polar body element 2 0 0 glass substrate

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Claims (1)

1228382 _案號93106774_年月曰 修正_ 六、申請專利範圍 1 、一種可視畫素定義減少阻抗矩陣有機平面發光顯 示器,包含: 一玻璃基板; 在玻璃基板上呈預定圖案的陽極圖案層; 位在陽極圖案層上之〇L E D發光多層結構; 位在陽極圖案層之間作為隔絕用的絕緣區;及 在陽極圖案層四周之金屬矩陣圖案。 2 、如申請專利範圍第1項之可視晝素定義減少阻抗 矩陣有機平面發光顯示器,其中該金屬矩陣圖案係位在陽 極圖案層之邊緣上方。 3、如申請專利範圍第1項之可視晝素定義減少阻抗 矩陣有機平面發光顯示器,其中該金屬矩陣圖案係位在陽 極圖案層之侧緣。 ‘ 4、如申請專利範圍第1項之可視晝素定義減少阻抗 矩陣有機平面發光顯示器,其中該金屬矩陣圖案係位在陽 極圖案層之邊緣,並覆蓋陽極圖案層之上緣及側緣。 5、 如申請專利範圍第4項之可視晝素定義減少阻抗 矩陣有機平面發光顯示器,其中該金屬矩陣圖案係位在陽 極圖案層之側緣部份為漸窄(t a p e r e d )形狀。 6、 如申請專利範圍第1項之可視晝素定義減少阻抗 矩陣有機平面發光顯示器,其中該陽極為I T〇材質。 7、 如申請專利範圍第1項之可視晝素定義減少阻抗 矩陣有機平面發光顯示器,其中該〇L E D發光多層結構 包含下而上的電洞傳輸層(HTL)、發光材料層(EML)及電子1228382 _Case No. 93106774_ Modification of Year of the Month_ 6. Application for Patent Scope 1. An organic flat light-emitting display with a visible pixel definition to reduce the impedance matrix, comprising: a glass substrate; an anode pattern layer with a predetermined pattern on the glass substrate; 〇LED light emitting multilayer structure on the anode pattern layer; located between the anode pattern layers as an insulating area for isolation; and a metal matrix pattern around the anode pattern layer. 2. The visible daylight-defining matrix organic flat light-emitting display as defined in item 1 of the scope of patent application, wherein the metal matrix pattern is positioned above the edge of the anode pattern layer. 3. The visible daylight-defining matrix organic flat light-emitting display according to the definition of the visible day element in the scope of the patent application, wherein the metal matrix pattern is located at the side edge of the anode pattern layer. ‘4. The visible daylight-defining matrix organic flat light-emitting display as defined in item 1 of the scope of patent application, wherein the metal matrix pattern is located on the edge of the anode pattern layer and covers the upper edge and side edges of the anode pattern layer. 5. As the visible daylight definition of item 4 in the scope of the patent application, the impedance-reduced-matrix organic planar light-emitting display, wherein the metal matrix pattern is tapered (t a p r r d) at the side edge portion of the anode pattern layer. 6. As the visible daylight definition of item 1 of the scope of patent application, the impedance reduction matrix organic flat light-emitting display, wherein the anode is made of I TO. 7. The visible daylight-defining matrix organic flat light-emitting display as defined in the first item of the patent application scope, wherein the OLED light emitting multilayer structure includes a bottom-up hole transport layer (HTL), a light-emitting material layer (EML), and electrons. 第16頁 1228382 _案號 93106774_年月日__ 六、申請專利範圍 傳輸層(ETL)。 8 、如申請專利範圍第1項之可視畫素定義減少阻抗 矩陣有機平面發光顯示器,其中該金屬矩陣圖案係用導電 係數與反射率高之材質製作。 9 、如申請專利範圍第8項之可視晝素定義減少阻抗 矩陣有機平面發光顯示器,其中該金屬矩陣圖案係用金、 銀、鋁、銅與鉻等材質。 1〇、如申請專利範圍第8項之可視晝素定義減少阻 抗矩陣有機平面發光顯示器,其中該〇L E D發光多層結 構可為單色或是多色。 1 1 、一種可視晝素定義減少阻抗矩陣有機平面發光 _示器製作方法,包含下列步驟: 置備一玻璃基板並成長一陽極層薄膜; - 於所得結構上成長一金屬薄膜; 利用微影蝕刻製程,在金屬薄膜製作出金屬矩陣圖案Page 16 1228382 _ Case No. 93106774 _ Month and Day __ VI. Patent Application Scope Transmission Layer (ETL). 8. The visible pixels as defined in the scope of patent application No. 1 define a reduced-resistance matrix organic flat light-emitting display, in which the metal matrix pattern is made of a material with high conductivity and reflectivity. 9. The visible daylight definition as described in item 8 of the patent application, which reduces the impedance. An organic flat light-emitting matrix display, in which the metal matrix pattern is made of gold, silver, aluminum, copper, and chromium. 10. The impedance OLED organic flat light-emitting display according to the visible daylight definition of item 8 in the scope of patent application, wherein the OLED multi-layer structure can be monochromatic or multicolor. 1 1. A method for manufacturing an organic planar light emitting display device with a visible impedance-defining reduction matrix including the following steps: preparing a glass substrate and growing an anode layer film;-growing a metal film on the obtained structure; using a lithography etching process To make a metal matrix pattern on a metal thin film 第17頁 1228382 案號93106774 年 月 曰 修正 六、申請專利範圍 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係位在陽極圖案層之側緣。 1 4、如申請專利範圍第1 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係位在陽極圖案層之邊緣,並覆蓋陽極圖案層之上緣 及側緣。Page 17 1228382 Case No. 93106774 Date of Amendment 6. Scope of Patent Application The manufacturing method of an impedance matrix organic flat light-emitting display, wherein the metal matrix pattern is located at the side edge of the anode pattern layer. 14. The manufacturing method of an organic flat light-emitting display with a reduced impedance matrix as defined by the visible day element definition in item 11 of the scope of patent application, wherein the metal matrix pattern is located on the edge of the anode pattern layer and covers the upper edge and sides of the anode pattern layer edge. 1 5 、如申請專利範圍第1 4項之可視畫素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係位在陽極圖案層之側緣部份為漸窄(t a p e r e d )形 狀。 1 6 、如申請專利範圍第1 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該陽極為I T〇材質。 • 1 7 、如申請專利範圍第1 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該〇L E D 發光多層結構包含下而上的電洞傳輸層(HTL )、發光材料 層(EML)及電子傳輸層(ETL)。15. The method for manufacturing an organic flat light-emitting display of an impedance matrix with a reduced visible pixel definition as described in item 14 of the scope of patent application, wherein the metal matrix pattern is tapered (t a p r e d) at the side edge portion of the anode pattern layer. 16. The method for manufacturing an organic flat light-emitting display with a reduced impedance matrix as described in item 11 of the patent application scope, wherein the anode is made of I TO. • 17. The manufacturing method of an organic planar light-emitting display with a reduced impedance matrix as defined by the visible daylight definition of item 11 in the scope of patent application, wherein the OLED multi-layer structure includes a bottom-up hole transport layer (HTL) and a light-emitting material layer (EML) and electron transport layer (ETL). 1 8 、如申請專利範圍第1 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係用導電係數與反射率高之材質製作。 1 9 、如申請專利範圍第1 8項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係用金、銀、鋁、銅與鉻等材質。 2 0 、如申請專利範圍第1 8項之可視晝素定義減少18. The manufacturing method of the organic matrix light-emitting display of the impedance matrix is reduced according to the visible daylight definition of item 11 in the scope of patent application, wherein the metal matrix pattern is made of a material with high conductivity and high reflectance. 19. The manufacturing method of the organic matrix light-emitting display of the impedance matrix is reduced according to the visible daylight definition of item 18 in the scope of patent application, wherein the metal matrix pattern is made of gold, silver, aluminum, copper, and chromium. 20, if the definition of visible daylight in item 18 of the scope of patent application is reduced 第18頁 1228382 _案號93106774_年月日__ 六、申請專利範圍 阻抗矩陣有機平面發光顯示器製作方法,其中該〇L E D 發光多層結構可為單色或是多色。 2 1 、一種可視晝素定義減少阻抗矩陣有機平面發光 顯示器製作方法,包含下列步驟: 置備一玻璃基板並成長一陽極層薄膜; 利用微影蝕刻製程,製作陽極圖案; ‘ 於所得結構上成長一金屬薄膜; 利用微影蝕刻製程,在金屬薄膜製作出金屬矩陣圖 案,並使金屬矩陣圖案成為圍繞陽極圖案層四周之圖案; 利用微影製程,製作絕緣區;及 製作〇L E D發光多層結構。 2 2 、如申請專利範圍第2 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係位在陽極圖案層之邊緣上方。 2 3 、如申請專利範圍第2 1項之可視畫素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係位在陽極圖案層之側緣。 2 4、如申請專利範圍第2 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係位在陽極圖案層之邊緣,並覆蓋陽極圖案層之上緣 及侧緣。 2 5 、如申請專利範圍第2 4項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係位在陽極圖案層之側緣部份為漸窄(t a p e r e d )形Page 18 1228382 _Case No. 93106774_ Year Month Date__ VI. Patent Application Method Manufacturing method of an impedance matrix organic flat light-emitting display, wherein the OLED multi-layer structure can be single-color or multi-color. 2 1. A method for manufacturing an organic flat light-emitting display with a visible impedance-defining reduced-resistance matrix, including the following steps: preparing a glass substrate and growing an anode layer film; using a lithographic etching process to produce an anode pattern; A metal thin film; a lithographic etching process is used to fabricate a metal matrix pattern on the metal thin film, and the metal matrix pattern is a pattern surrounding the anode pattern layer; a lithographic process is used to fabricate an insulating region; and an LED multi-layered structure is fabricated. 22. The manufacturing method of the organic matrix light-emitting display of the impedance matrix is reduced according to the visible daylight definition of item 21 of the patent application, wherein the metal matrix pattern is positioned above the edge of the anode pattern layer. 23. The method for manufacturing an organic flat light-emitting display with an impedance matrix reduced in accordance with the definition of visible pixels in item 21 of the scope of patent application, wherein the metal matrix pattern is located at a side edge of the anode pattern layer. 24. The manufacturing method of an organic flat light-emitting display with a reduced impedance matrix according to the visible daylight definition of item 21 in the scope of patent application, wherein the metal matrix pattern is located on the edge of the anode pattern layer and covers the upper edge and sides of the anode pattern layer. edge. 25. A method for manufacturing an organic flat light-emitting display of an impedance matrix, such as a reduction in visible daylight definition as described in item 24 of the scope of patent application, wherein the metal matrix pattern is tapered (t a p e r e d) at the side edge portion of the anode pattern layer 第19頁 1228382 _案號93106774_年月日__ 六、申請專利範圍 狀。 2 6 、如申請專利範圍第2 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該陽極為I T〇材質。 2 7 、如申請專利範圍第2 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該〇L E D 發光多層結構包含下而上的電洞傳輸層(HTL)、發光材料 層(EML)及電子傳輸層(ETL)。 2 8 、如申請專利範圍第2 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係用導電係數與反射率高之材質製作。 2 9 、如申請專利範圍第2 8項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該金屬矩陣 圖案係用金、銀、鋁、銅與鉻等材質。 3 0 、如申請專利範圍第2 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中該〇L E D 發光多層結構可為單色或是多色。 3 1 、如申請專利範圍第2 1項之可視晝素定義減少 阻抗矩陣有機平面發光顯示器製作方法,其中更包含設立 一不透明及高反射率陰極之步驟,該不透明及高反射率陰 極可與該金屬矩陣圖案構成一立體遮蔽區域,以使光線僅 由陽極射出。Page 19 1228382 _ Case No. 93106774 _ Month and Day __ Sixth, the scope of patent application. 26. The method for manufacturing an organic flat light-emitting display with a reduced impedance matrix as described in item 21 of the scope of patent application, wherein the anode is made of I T0. 27. The manufacturing method of an organic flat light-emitting display with a reduced impedance matrix as defined by the visible daylight definition of item 21 in the scope of patent application, wherein the OLED multi-layer structure includes a bottom-up hole transport layer (HTL) and a light-emitting material layer ( EML) and electron transport layer (ETL). 28. If the visible daylight definition of item 21 of the patent application scope is reduced, the manufacturing method of the impedance matrix organic flat light-emitting display, wherein the metal matrix pattern is made of a material with high conductivity and high reflectance. 29. If the visible daylight definition of item 28 in the scope of patent application is reduced, the manufacturing method of the impedance matrix organic flat light-emitting display, wherein the metal matrix pattern is made of gold, silver, aluminum, copper, and chromium. 30. A method for manufacturing an organic flat light-emitting display with a reduced impedance matrix such as the visible daylight definition of item 21 in the scope of patent application, wherein the OLED multi-layer light emitting structure may be single-color or multi-color. 31. The method for manufacturing an organic flat light-emitting display with a reduced impedance matrix as defined by the visible day element definition in item 21 of the patent application scope further includes the step of establishing an opaque and high reflectance cathode, which can be connected with the opaque and high reflectance cathode. The metal matrix pattern constitutes a three-dimensional shielding area so that light is emitted only by the anode. 第20頁Page 20
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