TWI297811B - Photosensitive resin composition - Google Patents

Description

1297811 A7 B7 1 V. INSTRUCTION DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive resin composition which can be developed by an alkali solution, which comprises a selected aminoalkyl benzophenone as a photoinitiator. The α-aminoalkylphenone photoinitiator is known from US Pat. No. 5,077,402. In the case of JP 2678684 Β2, as a photoinitiator, the color resist containing 2-benzyl-2-didecylamino-1 -(4-morphine-phenyl-phenyl)butan-1-pyrene The composition was revealed. In WO 98/00759 Α 1 and WO 0068740 Α 1, an alkali developable solder resist composition comprising the photoinitiator is disclosed. A similar alkali developable composition for use in the preparation of a plasma display panel is disclosed in JP 11306964 Α2, JP 11149862 Α2, JP 11072909 Α2, and JP 11065102 Α2. In photopolymerization technology, there are still high reactivity, alkali developable, easy to handle, good developability and high industrial compatibility with such properties as thermal stability and storage stability. The composition of the requirements. Surprisingly, a photosensitive composition is found comprising: (Α) an oligomer or polymer having at least one carboxylic acid group in the molecule and having a molecular weight of 200,000 or less; (Β) at least one light of Formula I Starter compound (please read the notes on the back and fill out this page)

, can I; line 丨 /~\ 11 , 2^ \

(I), where R! is a linear or branched CrC12 alkyl group; R2 is a linear or branched C"C4 alkyl group; the paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 1297811 A7 ___B7 _ V. Description of invention (2) (Please read the note on the back and then fill out this page) r3 and r4 are linear or branched crc8 alkyl groups; and (C) monomer, oligomeric or polymeric compounds It has at least one olefinic double bond, and the composition exhibits unpredictable good properties. Component (A) according to the composition of the present invention is an oligomer or polymer which contains at least one free carboxylic acid group in the molecule. And it has a molecular weight of 200,000 or less. Examples of the appropriate component (A) are polymerizations having a molecular weight of about 2,000 to 200,000 (preferably 2,000 to 150,000, 2,000 to 100,000 or 5,000 to 1 Å, 〇〇〇). (Adhesive). An example of an alkali developable adhesive is a propylene polymer having a carboxylic acid functional group as a pendant group, such as by (meth)acrylic acid, 2-carboxyethyl (meth)acrylic acid. 2-carboxypropyl (meth) propylene Acid, itaconic acid, crotonic acid, maleic acid, monomethyl maleate, monoethyl maleate, monopropyl maleate, monobutyl maleate, maleic acid Benzyl ester, mono(2-ethylhexyl) maleate, monohydroxyethyl maleate, monohydroxypropyl maleate, fumaric acid, fumaric acid monomethyl vinegar, monoethyl fumarate Ester, monopropyl fumarate, monobutyl fumarate, monobenzyl ester fumarate, mono(2-ethylhexyl) fumarate, monoethylidene fumarate, monohydroxypropyl fumarate And an ethylenically unsaturated carboxylic acid of a poly(caprolactone) mono(meth)acrylate and one or more esters selected from mercaptoacrylic acids (such as methyl (meth) methacrylate, (mercapto) Ethyl acrylate, propyl (meth) acrylate, butyl (meth) acrylate, benzyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, hydroxyethyl (methyl) Acrylate, hydroxypropyl (meth) acrylate, glycerol mono (meth) acrylate, tricyclo [5.2.1.02·6] fluoren-8 (meth) acrylate, glycosaminoglycan Base (曱基) C44% paper scale applies to China National Standard (CNS) Α4 specification (210X297 mm) 广3 " 1297811 A7 —_ B7_ V. Description of invention (3) enoate, 2-methyl shrinkage Oil based (mercapto) acrylate, 3,4-epoxybutyl (meth) acrylate and 6,7-epoxyheptyl (fluorenyl) acrylate; maleic acid and fumaric acid esters (such as , maleic acid dimethyl ester, diethyl maleate, maleic acid, monopropyl vinegar, dibutyl vinegar maleate, diphenyl decyl maleate, maleic acid II (2 -ethylhexyl)ester, dihydroxyethyl maleate, dihydroxypropyl maleate, dimethyl fumarate, diethyl fumarate, mono-propyl vinegar fumarate, fumaric acid Base S, dibenzoyl fumarate g, di(2-ethylhexyl) fumarate, dihydroxyethyl fumarate, dihydroxypropyl fumarate; vinyl aromatic compound (such as benzene) Ethylene, α-methyl styrene, vinyl toluene, p-chlorostyrene, ethylene benzyl glycidyl ether; guanamine type unsaturated compound ((methyl) Acrylamide, diacetone acrylamide, hydrazine-methyl propylene decylamine, hydrazine-butoxymethyl acrylamide; and polyolefin-type compounds (such as butadiene, isoprene, gas) Butadiene, etc.), mono-2-[(methyl)allyloxy]ethyl succinate, Ν-phenylmaleimide, maleic anhydride, methacrylonitrile, methyl isopropyl A conventionally known copolymer obtained by copolymerizing monomers of a thin ketone, a vinyl acetate, a vinyl propionate, a vinyl valerate, a polystyrene macromonomer or a polymethyl (meth) acrylate macromonomer. Examples of copolymers are copolymers of acrylates and methacrylates with acrylic acid or methacrylic acid and with styrene or substituted styrenes, sulphuric acid resins (for example, acid varnishes), (poly) styrenes. And a copolymer of hydroxystyrene with an alkyl acrylate, acrylic acid and/or methacrylic acid. Preferred examples of the copolymer are a copolymer of methacrylate/methacrylic acid, a copolymer of benzyl methacrylate/methacrylic acid, a copolymer of methyl methacrylate/ethyl acrylate/methacrylic acid. , methyl paper scale applicable to China National Standard (CNS) Α 4 specifications (210X297 mm) _ _ (please read the note on the back and fill out this page) •, can | : Line _ 1297811 A7 Factory ___B7 _ V. Invention Description (4) Benzyl acrylate/methacrylic acid/styrene copolymer, benzyl methacrylate/methacrylic acid/hydroxyethyl methacrylate copolymer, methyl methacrylate/methacrylic acid butyl Ester/methacrylic acid/styrene copolymer, methyl methacrylate/benzyl methacrylate/methacrylic acid/hydroxyphenyl methacrylate copolymer, methacrylic acid/styrene/methacrylic acid benzene Methyl ester / glycerol monomethacrylate /> copolymer of phenyl maleimide, methyl acrylate / 〇-mercaptocaprolactone monopropyl acrylate / benzophenone / benzyl /methylpropionate / glycerol monomethacrylate / N_phenyl mala The amine copolymer. The polyimine adhesive of the present invention may be a polyimide precursor, such as a 'poly(methionine)) compound, optionally having a photopolymerizable side attached to the backbone or ester group of the molecule. a base, or it may be, for example, an acrylic acid or methacrylic acid having at least one basic group in the molecule, a poly(proline) added thereto, for example, an amino acrylate or an amine group. Methyl acrylate vinegar. Further examples of the component (A) are oligomers or polymers obtained by reacting a saturated or unsaturated polybasic acid anhydride with a reaction product of an epoxy compound and an unsaturated monocarboxylic acid. As the epoxy compound used for this preparation, the most interesting ones are novolac type epoxides and bisphenol type epoxides. The foregoing resin which can be cured by activation can be obtained by reacting a reaction product of an acid varnish type epoxide (as described above) with an unsaturated monocarboxylic acid with a dibasic acid anhydride (such as phthalic anhydride) or an aromatic polycarboxylate. It is obtained by reacting an acid anhydride such as trimellitic anhydride or pyromellitic anhydride. In this case, the resin proves that the first of the above-mentioned anhydrides used in the preparation in the preparation thereof is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) by the koji varnish type epoxy compound and the unsaturated ruthenium paper scale. ) "一"^'一"=' (Please read the notes on the back and fill out this page)

•, I: Line - - Ψ I---I I - 1297811 A7 B7 V. INSTRUCTIONS (5) Each of the hydroxyl groups possessed by the acid reaction product is particularly suitable when it exceeds 0.15 mol. (Please read the precautions on the back and fill out this page.) The acid value of the resin obtained (the acid value is expressed in grams of potassium hydroxide required to neutralize 1 gram of resin) is properly tied to A range of 45 to 160 mg KOH/g (preferably 50 to 140 mg KOH/g). When the amount of the ethylenically unsaturated bond present in the molecular unit of the resin capable of curing is small, photocuring proceeds slowly and desirably uses a novolac type epoxy compound as a raw material. The novolak type epoxy compound is represented by a phenol novolac type epoxy resin and a cresol novolak type epoxy resin. A compound prepared by reacting epigas alcohol with an appropriate phenol resin by a conventional method can be used. The foregoing resin may also be a polycarboxylic acid anhydride (such as benzoquinone tetracarboxylic dianhydride, pyromellitic dianhydride, trimellitic anhydride, and/or a dibasic acid anhydride) and a bisphenol epoxy compound (such as bisphenol). It is prepared by reacting a reaction product of an oxime epoxy resin or a bisphenol A epoxy resin and an unsaturated monocarboxylic acid. Typical examples of the photopolymerizable bisphenol type compound are described in JP 6-1938-Α, JP 7-64281·Α, JP 9-241339-A, JP 9-304929, and JP 10-301276. In order to reduce the viscosity of the ink, it is possible to use a bisphenol quinone type epoxide. Typical examples of the foregoing acid anhydrides are dibasic acid anhydrides such as maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, mercapto hexahydrophthalic anhydride, and intrinsic methyltetrahydroanthracene. Anhydride, methyl-extension mercaptotetrahydrophthalic anhydride, chloric anhydride and methyltetrahydrophthalic anhydride; aromatic polycarboxylic anhydrides such as trimellitic anhydride, pyromellitic anhydride and benzoquinone-tetracarboxylic acid Dihydride, diphenyltetracarboxylic dianhydride, diphenyl ether tetracarboxylic dianhydride, diphenylphosphonium tetracarboxylic dianhydride, hexafluoroisopropylidene dicarboxylic anhydride; and polycarboxylic anhydride derivatives, 44 :3 The paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 1297811 A7 ____B7_ V. Description of invention (6) For example, 5-(2,5-dioxotetrahydrofuranyl)-3-methyl· 3-cyclohexene-1,2-dicarboxylic anhydride. Further examples of component (A) are by means of adding an epoxy group-containing acrylate or methacrylate compound to a copolymer formed from the reaction of an acrylate or methacrylate with acrylic acid or methyl acetoacetate. The reaction product obtained in one part. The copolymer of acrylate and/or methacrylate and acrylic acid and/or methacrylic acid is obtained by copolymerizing one, two or more of acrylate and/or methacrylic acid. A suitable ester is represented by the formula (1): CHj=C-COORb (1) , wherein

Ra is a hydrogen atom or a methyl group,

Rb has 1 to 6 aliphatic hydrocarbon groups which are impeding atoms, and suitable acrylic acid and/or methacrylic acid is represented by the chemical formula (2) · CHj=C-COOH (2) wherein Ra has the same meaning as shown above. The total 1 reaction is carried out according to a routine method such as solution polymerization. Preferably, the molar ratio between the acrylate and/or methacrylate and acrylic acid and/or methacrylic acid is from 30:70 to 70:30. The ester group of each of the acrylate and/or methacrylate may be suitably selected from various aliphatic groups having 1 to 6 carbon atoms. The reaction product is obtained by the addition of the copolymer thus obtained by the following chemical formula (3) indicating that the S% paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 public Chu) (please read the back note first and then fill in the page) ) - Pack - • Order 1297811 A7 _B7__ 5. Inventive Note (7) Obtained with a terminal epoxy group acrylate and / or mercapto acrylate, CH = e-COO - R - < I (3 ° ° , where 1 has the same meaning as described above;

Re is an aliphatic hydrocarbon group or an aromatic hydrocarbon group having 1 to 12 carbon atoms. In order to obtain a reaction product suitable for the present invention, the compound of the formula (3) is added to the monomers of the above chemical formulas (1) and (2) in a proportion of 10 to 40 mol% to provide ultraviolet curable properties of the copolymer. . The reaction product thus obtained preferably has an average molecular weight in the range of 20,000 to 70,000; the softening point is suitably in the range of 35 ° C to 130 ° C, and further examples of the acid value of 50 to 150 Å component (A) are A resin having an alpha, cold-unsaturated double bond in the side chain and having an acid value of 50-200. The photopolymerizable resin, for example, is composed of 70 to 95% by weight of an ethylenically unsaturated acid component and a copolymerizable component thereof. It is a carboxyl group having an acid value of not less than 500 (preferably not less than 600, particularly not less than 620) and a number average molecular weight of 1,000 to 100,000 (preferably 3,000 to 70,000). An addition product formed between a resin and an unsaturated compound having an α,/3-unsaturated double bond and an epoxy group. The content of the ethyl hydrazine unsaturated acid component in the carboxyl group-containing resin of the photopolymerizable resin is 70 to 95% by weight, and therefore, the photopolymerizable resin (Α) cannot be rendered insoluble in water or a diluted aqueous solution, even if it has α The point-unsaturated double bond and the epoxy group-unsaturated compound are added, and their solubility is maintained. Examples of such resins are described in JP 8-339081-Α. -=~~=- A1 This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) (please read the notes on the back and fill out this page)

-, τ: 丨 1297811 A7 -----------__B7___ V. Description of the invention (8) Resin (A) containing a slow-base, for example, 70-95% by weight (preferably 78 88% by weight, and especially go·% by weight of ethylene ethylenically unsaturated acid monomer and 5-30% by weight (preferably 22-12% by weight, and especially 15-20% by weight) The copolymerized monomer is prepared by dissolving in a suitable non-reactive solvent and thermally polymerizing the solution in the presence of a thermal polymerization initiator at 45-120. Therefore, a carboxyl group-containing resin having an acid value of not less than 5 Å and an average molecular weight of 1000,400,000 can be prepared with high safety and high stability. Specific examples of the ethylenically unsaturated monomer suitable for the preparation of the carboxyl group-containing resin (A) include acrylic acid, methacrylic acid, itaconic acid, isaconic acid, angelic acid, icosonic acid, 2-ethylpropionic acid, 3-propylacrylic acid, 3-isopropylpropionic acid, monohydroxyethyl succinate, monohydroxyethyl phthalate, monohydroxyethyl methacrylate, tetrahydrofurfuric acid Monohydroxyethyl acrylate, hexahydrophthalic acid monohydroxyethyl acrylate, acrylic acid dimer, acrylic acid terpolymer, carboxy-polycaprolactone monoacrylate, and deca-carboxy-polycaprolactone monomethacrylic acid ester. Among these monomers, preferred are acrylic acid, methacrylic acid, crotonic acid, methacrylic acid, angelic acid, hydrazine acid, 2-ethylacrylic acid, 3-propylacrylic acid, 3-isopropyl group. Acrylic acid, 6;-rebel-polycaprolactone monocarboxylic acid acrylate, ω-carboxy-polycaprolactone monodecyl acrylate, etc.; and particularly preferably acrylic acid, methacrylic acid, crotonic acid, methacrylic acid , Angelica sinensis, sulphuric acid, 2-ethyl acrylate, 3-propyl acrylate, 3-isopropyl acrylate, ω-carboxy-polycaprolactone monocarboxylic acid acrylate and ω-carboxy-polycaprolactone monomethyl Acrylate. These monomers may be used singly or in combination of two or more. This paper scale applies to Chinese national standard (CN(10)) Α4 specification (210X297 mm) f Please read the notes on the back and fill in this page) '1-------^ . - 装 binding - :线丨1297811 A7 ____B7_ V. INSTRUCTION DESCRIPTION (9) A single system of propylene ester, methacrylic ester, vinyl monomer, styrene type monomer and cyclic ester monomer can be copolymerized as appropriate. Specific examples thereof include 2-hydroxymethyl acrylate, 2-hydroxymethyl methacrylate, 2-hydroxyethyl acrylate vinegar, 2-transethylethyl methacrylate, 2-perylene Propyl acrylate, 2-hydroxypropyl methacrylate, ethylene glycol monomethyl ether acrylate, ethylene glycol monomethyl ether methacrylate, ethylene glycol monoethyl ether acrylate, ethylene glycol Monoethyl ether methacrylate, glycerin acrylate, glycerin methacrylate, dipentaerythritol pentamethyl propanate, dipentaerythritol pentaacrylate, dimercaptoaminoethyl acrylate, dimethylamino Ethyl methacrylate, tetrahydrofurfuryl acrylate, tetrahydrofuranyl methyl propyl acrylate, decyl amide, decyl methacrylate, acrylonitrile, methacryl oxime, methyl acrylate, methyl Methyl acrylate, ethyl acrylate, ethyl propyl acetoacetate, butyl acetonate, butyl acetoacetate, isobutyl propyl acrylate, isobutyl methacrylate, 2-ethylhexyl acrylate Ester, 2-ethylhexylmercaptopropionate, benzyl acrylate, methacrylic acid benzoate , carbic acid carbitol, methacrylic acid carbitol, ε-caprolactone modified tetra-furyl acrylate, ε-caprolactone modified tetrapyranyl methyl propionate , diethylene glycol ethoxy acrylate, isodecyl acrylate, isodecyl methacrylate, octyl acrylate, octyl methacrylate, lauryl acrylate, lauryl methacrylate, propylene glycol Tridecyl ester, tridecyl decyl acrylate, stearyl acrylate, stearyl methacrylate, and the like. These monomers may be used singly or in combination of two or more. Suitable thermal polymerization initiators, for example, 2,2,-azobis-(2,4-dimethylvaleronitrile) (appropriate temperature 45-70 ° C), 2,25-azobis ( Isobutyronitrile) (Can be used for Chinese National Standard (CNS) A4 specification (210X297 mm) · " (Please read the note on the back and fill out this page) Order - : Line — 1297811 A7 B7 V. Description of the invention (use temperature 60-90 ° C), 2,2'-azobis (2-methylisobutyronitrile) (temperature can be used 60-95 ° C), tert-butyl peroctoate ( Use temperature 75-100 ° C), 1,1 '-azo (cyclohexane-1-carbonitrile) (can use temperature 80-110 ° C) or 1-[(1-diazo-1-methyl Base ethyl)azo]-carbenamide (temperature: 95-120 C can be used). Generally, for example, at least one of the compounds is used. The carboxyl group-containing resin obtained by the above method is modified to be lightable. The polymerized resin has a carboxyl group esterified and a side chain thereof having an α,/3-unsaturated double bond, which is esterified with an unsaturated compound having an α,/3-unsaturated double bond and an epoxy group. Suitable compound having an α, θ-unsaturated double bond and an epoxy group The sub-system is as follows. For example, at least one member selected from the group consisting of glycidyl acrylate, glycidyl methacrylate, and a compound of the chemical formula 4, 5, and 6 defined below is used. ?Η3π ?Η3 CH2=C —C—O—C—C—CH2 (4>; \ / ο (Please read the notes on the back and fill out this page) -, OK |

ο II CH2=C—C一 Ο—(CH2) ft·

(5). Where: line 丨

Ri' is hydrogen or methyl, and n' is an integer from 1 to 10;

II

II CH|=0—C—Ο--(CH2)r—C* —Ο 一 C Η

(6) wherein the rule 2' is hydrogen or methyl, and η" is an integer from 1 to 3. Among these compounds, compounds having an alicyclic epoxy group are particularly preferred because these compounds have a carboxy group. The high reactivity of the resin, therefore, the paper size of 廿b is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 public) 1297811 A7 ^_B7_ V. Invention description (11) (Please read the notes on the back and fill out this page. The reaction time can be shortened. These compounds further do not cause gelation in the reaction process, and make it stable to complete the reaction. On the other hand, glycidyl acrylate and methyl acrylate glycidol The ester is advantageous from the viewpoint of sensitivity and thermal resistance because it has a low molecular weight and can produce a high conversion ratio of the g reaction. The photopolymerizable resin obtained by the above method has α in its side chain, a stone-unsaturated double bond having an acid number of 50-200, preferably 70-150, and especially 85-120. Its number average molecular weight is 7,00 (Μ〇, 〇〇〇, and its glass transition point) (hereinafter referred to as Tg) is 30-120 ° C. When photopolymerizable resin is When it is a solder resist, an acid value of not less than 70 is preferable, since other added components can be further added to the composition. The inert organic solvent is used in the completion of the esterification reaction and preparation of the photosensitive resin composition. The unsaturated compound (A) is commercially available, for example, EB3800, EB9692, EB9694, EB9695, EB9696 (UCB Chemicals), KAYARAD TCR1025 (Nippon Kayaku Co., LTD.), NEOPOL 8319 (U-Pica), EA -6340 (Shin Nakamura Chemical Co., Ltd.), ACA200M, ACA250 (Diacel Industries, Ltd.) o is preferably an oligomer or polymer (A) adhesive polymer (particularly (meth)acrylic acid) a copolymer of an ester and (meth)acrylic acid, or a resin obtained by reacting a saturated or unsaturated polybasic acid anhydride with a reaction product of an epoxide and an unsaturated monocarboxylic acid; or a resin containing a carboxyl group and having a, - The composition of the addition product formed between the unsaturated double bond and the epoxy compound of the epoxy group. ____— ----=—Η~=- 4:S|The paper scale is applicable to the Chinese national standard ((10)) Μ specification ( 210X297 mm) Ϊ297811, invention description (12 The photosensitive composition of the invention comprises at least one photoinitiator (B) of the above formula I. The di-CVC! 2 alkyl group is linear or branched, and is r ^ l 匕 10-, i'C8-, CVC6- , CVCV, CVC, η η r η ^ 6 W, c8-c10, cvcv, c4_c8- or C4-C10-. Examples are methyl, ethyl, propyl, propyl, n-butyl, t-butyl, isobutyl, tert-butyl, pentyl, hexyl: pentyl, 2,4,4·trimethyl Amyl, 2-ethylhexyl, octyl, decyl and 12-yard. Cardinal, for example, linear or branched CrC4 alkyl, especially methyl, ethyl, isopropyl, n-propyl, isobutyl and n-butyl, &, for example, methyl, ethyl or The propyl group, especially the ethyl group, and the cores &es, especially the Ci_C4 alkyl groups which are linear or branched, are each methyl group. The preferred compound of formula I is 9 IΛ?η3 Η4·morpholinophenyl]_2·dimethyl_c-C—c—(\ y^CH Βώ Α ^ ί Λ 十分 十分 十分 — — — 十分 十分 十分 十分 十分 十分 十分 十分Amino-2-(4-isopropylindole; n(CH,)2^-propan-1-one (2)rT\,jrv9 ϊ2Η5_7=ν H4-morphine-phenyl]-2_dimethyl 0vjK>c民一〇^3 Amino-2-(4_mercaptophenyl)-butane N(CH3)2 • ketone

(3) P [岔 morpholino stupid]-2-dimethyl()0uN*O"c 〒一一厂厂〇"0Η Amino-2-[4-(2·methylprop-1-yl) -n(CH3)2 2eHs Benzyl]-butan-1-one^ >ΓΛ 9 °\Λ /«\ i-t4·吗琳代phenyl]-2-dimethyl JK=>C Monoamino-2-(4-ethylbenzoinyl)-butane N(CH3)2-1-one^ 〇^Hs M4-morpholinophenyl]-2-diindenyl (9)0-amino- 2-(4-Pro-propylbenzylidene N(CH32)2-salt-l-_a 9-produced H4-morpholinophenyl]-indenyldimethyl(6)0-0^Η·amine ί(4_正Butylbenzyl:-butyl N(CH32)2 alkane-1, Brewing I (4) Paper size applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the notes on the back and fill in the form) Page) ... 丨 订 订 订 ... 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 此 此 此 此 此 此 此 此 此 此 此The appropriate amount of the component (B) is 15 to 100 parts by weight, preferably 3 to 80 parts by weight, based on 1 part by weight of the component. C) contains one or more dilute hydrocarbons a bond, for example, having a low (monomer) or high (oligomer) molecular mass. Examples of monomers containing a double bond are an alkyl group or a ketone-based acrylic acid or methyl methacrylate For example, decyl, ethyl, butyl, 2-ethylhexyl or 2-hydroxyethyl acrylate, isobornyl acrylate, methyl methacrylate or ethyl methacrylate. Other examples are acrylonitrile, acrylamide, methyl propyl amide, N-substituted (methyl) acrylamide, ethyl vinegar (such as vinyl acetate), vinyl ether (such as , isobutyl vinyl ether), acetophenone, fenyl- and halogenated styrene, N-ethylene β 嘻 _, 气 ethylene or partial ethylene. Contains two or more double bonds Examples of the monomer are ethylene glycol, propylene glycol, neopentyl glycol, hexamethylene glycol or bisphenol oxime diacrylate, and 4,4-bis(2-propenyl ethoxy ethoxy) two. Phenylpropanoid, trimethylol triacrylate, pentaerythritol triacrylate or tetraacrylate, vinyl acrylate, divinylbenzene, divinyl amber Acid ester, diallyl phthalate, triallyl ester, triallyl isocyanurate or tris(2-propenylethyl) isocyanurate. Relatively high molecular weight Examples of the polyunsaturated compound (oligomer) are a propionate epoxy resin, an acrylated polyester, a polyester containing a vinyl ether or an epoxy group, and a polyurethane. Polyether. Unsaturated oligomer 4:53⁄4 paper scale for Chinese National Standard (CNS) A4 specification (210X297 public) Factory 16 ' (Please read the note on the back and fill out this page), τ ...线丨1297811 A7 ______B7 V. INSTRUCTION DESCRIPTION (14) Further examples are unsaturated polyester resins which are generally prepared from maleic acid, citric acid and one or more glycols and have about 5 to 3 Torr. The molecular weight. Further, vinyl ether monomers and oligomers, and a maleate-terminated polymer having a polyester, a polyamino phthalate, a polyether, a polyvinyl ether, and an epoxy backbone may also be used. Particularly suitable are oligomers bearing a negative vinyl ether group and mixtures of polymers as described in WO 90/01512. However, copolymers of vinyl ether and maleic acid functional monomers are also suitable. Such unsaturated oligomers may also be referred to as prepolymers. Particularly suitable examples are ethylenically unsaturated carboxylic acids and esters of polyhydric or polyepoxides, and polymers having an ethylenically unsaturated group in the main chain or pendant groups, for example, unsaturated polyesters, polyamines and polyamines. Carbamates and copolymers thereof, containing (meth)acryl-based polymers and copolymers in the side chain, and one or more mixtures of such polymers. Examples of unsaturated carboxylic acids are propionic acid, methacrylic acid, crotonic acid, itaconic acid, cinnamic acid, and unsaturated fatty acids such as linolenic acid or oleic acid. Acrylic acid and mercaptoacrylic acid are preferred. Suitable polyols are aromatic and, in particular, aliphatic and cycloaliphatic polyols. Examples of aromatic polyols are hydroquinone, 4,4,-dihydroxybiphenyl, 2,2-bis(4-hydroxyphenyl)propane, and novolacs and resoles. Examples of polyepoxides are those based on the above polyols, particularly aromatic polyols and surface alcohols. Other suitable polyols are polymers and copolymers containing hydroxyl groups in the polymer chain or pendant groups, for example, polyvinyl alcohols and copolymers thereof, or polyhydroxyalkyl mercapto acrylates or copolymers thereof. Further suitable are polyols having an oligoester having a terminal end group. The paper scale applies to the Chinese National Standard (CNS) M specification (2ΐ〇χ297). “17 - (Please read the note on the back and fill out this page)

_ 订. • 线_ 1297811 DESCRIPTION OF THE INVENTION Examples of the aliphatic and cycloaliphatic polyols are alkylene glycols having preferably 2 to 12 carbon atoms, such as ethylene glycol, ^- or hydrazine, Propylene glycol, 1,2_, 1,3- or 1,4-butanediol, pentanediol, hexanediol, octanediol, undecylene glycol, diethylene glycol, triethylene glycol, preferably It is a 2- to 15-inch knife, such as polyethyl alcohol, 1,3-cyclopentanediol, ι, 2-, or μ-cyclohexanediol, 1,4-dihydroxymethylcyclohexane, Glycerin, tris(hydroxy-hydroxyethyl)amine, dimethylacetone, dimethanol propane, pentaerythritol, dipentaerythritol and sorbitol. The polyol may be partially or fully esterified with an unsaturated carboxylic acid or a different unsaturated carboxylic acid, and in the partial ester, the free hydroxyl group may be modified, for example, etherified or esterified with other carboxylic acids. Examples of vinegar are: triterpene propane triacrylate, trimethylolethane triacrylate, trimethylolpropane tridecyl acrylate, trimethylolethane trimethacrylate, tetramethyl glycol dimercaptopropionic acid Ester, triethylene glycol dimethyl acrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, two Pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tripentaerythritol octaacrylate, pentaerythritol dimethacrylate, pentaerythritol tridecyl acrylate, dipentaerythritol dimethacrylate, dipentaerythritol tetramethyl Acrylate, tripentaerythritol octa methacrylate, pentaerythritol diitaconate, dipentaerythritol triacate, dipentaerythritol pentaconate, dipentaerythritol hexaconate, ethylene glycol diacrylate, 1 , 3-butanediol gray paper scale applicable to Chinese national standard (0^) A4 specification (210X297 mm) (Please read the notes on the back and fill out this page) Order - : 丨 1297811 A7 _______ Β 7___ V. Description of invention (16) Diacrylate, 1,3-butanediol dimethacrylate, hydrazine, 'Dinger Alcoholic itaconate, sorbitol triacrylate, sorbitol tetraacrylate, pentaerythritol modified tripropionate S, sorbitol tetramethyl acrylate vinegar, sorbitol pentapropan acid S, sorbitol hexaacrylate acid, oligo-propyl acrylate and methacrylate, glycerin diacrylate and triacrylate, 1,4-cyclohexane diacetate, with 200 to 1500 molecular weight polyethylene glycol dipropionic acid S and bis-mercapto acrylate vinegar, or a mixture thereof. Also suitable as component (C) is the same or different unsaturated carboxylic acid and preferably having 2 to 6 (particularly 2 to 4) amine groups of aromatic, cycloaliphatic and aliphatic polyamines. The amine. Examples of such polyamines are ethylenediamine, or 1,3-propanediamine, 1,2-, 1,3- or 1,4-butanediamine, iota, 5-pentanediamine, iota, 6- Hexamethylenediamine, octanediamine, dodecanediamine, 14-diaminocyclohexane, isophoronediamine, phenylenediamine, diphenylene diamine, di-stone-aminoethyl ether , di-ethyltriamine, tri-ethyltetramine, bis(y5-aminoethoxy)- or bis(s-aminopropoxy)ethene. Other suitable polyamine-based polymers and copolymers are preferably oligo-amines having an additional amine group in the side chain and an amine end group. Examples of such unsaturated decylamines are methyl bis acrylamide, 1,6-hexamethyl bis decyl decylamine, di-ethyltriamine trimethyl acrylamide, bis(methyl propyl hydrazine) Aminopropyl) Ethylene, stone-methacrylamide, decylethyl propyl acetoacetate and ethoxy-ethyl) ethyl propyl melamine. Suitable unsaturated polyesters and polyamines are derived, for example, from maleic acid and diols or diamines. Some maleic acid can be substituted with other dicarboxylic acids. It can be used with an ethylenically unsaturated comonomer such as styrene. Polyesters and polyamines can also be derived from dicarboxylic acids and ethylene-unsaturated diols or diamines, especially for heterogeneous paper grades. For Chinese National Standard (CNS) Α4 size (210X297 mm) 1297811 Description of invention (derived from A relatively long chain having, for example, 6 to 20 carbon atoms. Examples of polyurethanes are those composed of saturated or unsaturated diisocyanates and unsaturated or, individually, saturated glycols. A polymer having a (fluorenyl) acrylate group is also known. It may be, for example, a reaction product of a novolak-based epoxy resin and (mercapto)acrylic acid, or may be a (meth) group. a homopolymer or copolymer of an acrylated vinyl alcohol or a hydroxyalkyl derivative thereof, or may be a (mercapto) acrylate ester esterified with a hydroxyalkyl (meth) acrylate Polymer and Copolymer 0 The photopolymerizable compound (C) may be used singly or in any desired mixture. It is preferred to use a mixture of polyol (meth) acrylate. Preferably, component (C) has More than two acrylate or methacrylate groups The component (C) as described above may be used singly or in combination of two or more. It is preferably from 5 to 200 parts by weight, preferably from 10 to 15 parts by weight, based on 1 Torr. Further, an optional organic solvent may be added to the composition of the present invention as component (D). Examples of suitable organic solvents are ketones such as ethyl methyl group. Ketone, cyclohexanyl, etc.; aromatic hydrocarbons such as toluene, xylene, tetramethylbenzene, etc.; glycol ethers, such as methyl cellosolve, ethyl cellosolve, butyl cellosolve, benzyl solution Fibril, phenyl cellosolve, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monobutyl ether, triethylene glycol monomethyl ether, etc. Ester, such as ethyl acetate, butyl acetate, ethyl ethoxy propionate and the esterification products of the above glycol ethers, please read the following notes (please fill in this page) -, available |

1297811 V. Description of invention (is) For example, cellosolve acetate vinegar, butyl cellosolve acetate vinegar, carbitol acetate vinegar, butyl carbitol acetate vinegar, propylene glycol monomethyl mycolic acid vinegar; alcohol, such as ethanol: Propyl alcohol, n-butanol, n-hexanol, n-heptanol, n-octanol, ethylene glycol, propylene glycol, etc.; aliphatic hydrocarbons, such as Xinyuan, simmering, etc.; petroleum-based solvents, 2, such as oil, gas, stone Oil, hydrogenated naphtha, solvent naphtha, and the like, and its hydrazine organic solvent are used to dilute the resin so that it can be easily coated. The photopolymerization reaction can also be accelerated by further adding a sensitizer or a co-initiator (as component (8)) which makes the spectrally inductively displaced or broadened. It is, for example, an aromatic compound such as benzoquinone and its derivatives, thiazolone and its derivatives, awake and its derivatives, coumarin and its derivatives and its derivatives' and 3- (fang)醯基伸 methyl) 嗔 porphyrin, rhodamine, off-brain acid, also dynasty, gongyou Danming, red thin red sodium salt, sneer, p bite, for example, 9_ phenyl, 丫唆, 1 , 7_ bis (9-u 丫 base) gamma, 15 bis (9 _ yl) oxime, cyanine and merocyanine dye. Specific examples of such compounds are: 喧 顿 酮 ketone thioxanthone, 2-isopropyl thioxanthone, helium thioxanthone, 2-tertyl thioxanthone, 2,4-diethyl thiophene Tons of ketone, 2,4-dimethylthioxanthone, methoxycarbonylthioxanthone, 2-ethoxycarbonylthioxanthene, 3-(2-methoxyethoxycarbonyl)-嗔 collar_, 4 -butoxycarbonyl 喧t» ketone, butoxymethyl thioxanthone, 1-cyano-3-chlorothioxanthone, ethoxycarbonyl _3 chlorothioxanthone, 1-B Oxycarbonyl-3-ethoxy thioxanthone; μethoxycarbonylaminothioxyl ketone, 1-ethoxymethyl-3-phenylsulfanyl oxime, 3,4-di- [2-(2_Methoxyethoxy)ethoxycarbonyl]•喧 喧 酮 丨, 丨 ethoxylated _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ -21 (Please read the notes on the back and fill out this page) Attack, order -: 丨 1297811 A7 Γ ___ ______ Β 7 ____ V. Invention description (19) (Please read the note on the back and fill out this page) 3_(didecyl-1-morpholinylethyl)-thioxanthone, 2-methyl-6-dimethoxymethyl-thioxanthone, 2-mercapto-6-(l,l- Methoxybenzyl) thioxanthone, 2-morpholinomethylthioxanthone, methylmorpholinomethylthioxanthone, N-allylthioxanthone-3,4-dicarboxyfluorene Imine, N-octylthioxanthone-3,4-dicarboxylimine, N-(l,l,3,3-tetramethylbutyl)-thioxanthone-3,4-dicarboxyfluorene Imine, 1-phenyloxythioxanthene, 6-ethoxycarbonyl-2-methoxythioxanthone, 6-ethoxycarboyl-2-methylthioxanthone, thioxanthonecarboxylic acid Polyethylene glycol ester, 2-hydroxy-3-(3,4-didecyloxy-9H-thioxanthone-2-yloxy)-N,N,N-trimethyl- 1-propane Vapor. 2. Clumsy

:Line I phenyl benzene, 4-phenylphenyl benzene, 4-methoxyphenyl benzene, 4,4,-dimethoxy benzoquinone, 4,4,-dimethylphenyl benzene, 4 , 4, dichlorophenyl benzene, 4, 4, bis (dimethylamino) alum benzene, 4,4,-bis (diethylamino) benzoquinone, 'methyl benzoquinone, 2,4,6-trimethylphenyl benzene, 4-(4-methylthiophenyl benzoquinone, 3,3'-dimethyl-4-methoxybenzoquinone, methyl-2 _Benzyl benzoate, 4-(2-hydroxyethylthio)-benzoquinone, 4-(4-indolylphenylthio)-benzoquinone, 4-abidomethyl-N, N,N-trimethylbenzylammonium methoxide, 2-amino-3-(p-methyl phenoxy)-N,N,yi-trimethyl-i-propane (tetra) chloride monohydrate, 4-( 13_Acrylhydrazine-1,4,7,10,13_pentatridecyl)_Alum Benzene, 4-Benzylmercapto-N,N-Dimethyl_N_[2_(1•Oxygen _2 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ coumarin coumarin coumarin , coumarin 102, coumarin 1〇6, coumarin 138, coumarin M2, coumarin paper scale applicable to China National Standard (CNS) A4 specification (210X297 public Chu) ~ --- 1297811 A7 ____£7_ V. Description of the invention (2G) 153, coumarin 307, coumarin 314, coumarin 314τ, coumarin 334, coumarin 337, fragrance Beanin 500, 3-benzylidene coumarin, 3_benzonitrile-7-methoxy glucoside, 3-benzyl-7-7-dimethoxy geranol, 3 -benzimidyl-5,7-dipropoxycoumarin, 3·benzimidyl-6,8-dichlorocoumarin, 3-benzylidene-6-a-coumarin, 3,3,-diyl-bis[5,7-di(propoxy)-coumarin], 3,3'-mono-bis(7-methoxycoumarin), 3,3, _ Carbonyl bis(7-diethylamino-coumarin), 3-isobutyl coumarin, 3_benzyl-5,7-dimethoxy-coumarin, 3-benzene Methyl ketone _5,7_diethoxy- fragrant sulphate, 3 - mercapto-5,7-dibutoxycoumarin, 3-phenylene ketone-5,7--(曱Oxyethoxy)-coumarin, 3-abidomethyl- 5,7-di(dipropyloxy)coumarin, 3-benzylidene-7-dimethylaminocoumarin , 3_benzimidyl-7·diethylamine coumarin, 3-isobutylmethyl-7-dimethylamine glucoside, 5,7-monomethoxy-3-(1-na Stuffed base) - Coumarin, 5,7-diethoxy-3-(1-naphthyl)-coumarin, 3-benzylidenebenzo[f]coumarin, 7-diethylamino -3-喧 醯 香 coumarin, 3-(4-cyanobenzylidene)_5,7-dimethoxycoumarin, 3-(4-cyanobenzylidene)-5, 7-Dipropoxycoumarin, 7-dimethylamino-3-phenylcoumarin, 7-diethylamino-3-phenylcoumarin, in JP 09-179299-A and A coumarin derivative disclosed in JP 09-325209-A, for example, 7-[{4-gas-6-(diethylamino)-S-triazin-2-yl}amino]-3- Phenyl coumarin; 4· 3-(aryl fluorenyl acetamidine V thiazole 3-mercapto-2-phenylindole hydrazino _0__naphthalene thiazoline, 3-methyl-2 benzoquinone曱-benzothiazole, 3_ethyl 2 -propenylmethyl-methyl-thiazide; 4«Qin paper scale applicable to Chinese national standard (CNsTm specification (210X297 mm) wide 23 ' (please Read the notes on the back and fill out this page)

Ι2978ΐι

'Inventive Notes ( 5. Rhodamine 4-dimethylaminophenylidene rhodamine, 4-diethylaminophenyl benzoyl rhodamine, 3-ethyl-5-(3-octyl- 2-Benzothiazolidine base> Rhodamine derivative, Jp 08-305019A, chemical formula [丨], [2], [7]; 6. Other compounds, benzene, 3-曱 醯 醯 、 、, 4-phenyl ethane benzene, benzophenone, 4, 4, _ bis (monosylamino) oxime, 2- acetyl phthalene, 2-naphthoic acid, tannin Acid derivatives, 9,10-fluorene, hydrazine, hydrazine, amine hydrazine, phenanthrene, phenanthrenequinone, 9-fluorenone, diphenylcycloheptanone, curcumin, xanthone, thiomethlylone, -(4-dimethylaminophenylidene) ketone, for example, 2,5-bis(4-diethylaminophenylidene)cyclopentanone, 2-(4-didecylamino-benzene Fork base)·茚满酬|, 3_(4_ dimethyl-amino-phenyl)-1-indan-5-yl-propyl ketone, 3-phenyl thiosinimide, N- Methyl-3,5-di(ethylsulfanyl)-beneficial imine, N-methyl-3,5-di(ethylthio)-bromide, 吩, 甲基, methyl 喧Anthracene, amine group, for example, N-phenylglycine, ethyl 4-dimethylaminobenzoic acid Ester, butoxyethyl 4-dimethylamino benzoate, 4-didecylamino acetophenone, triethanolamine, decyldiethanolamine, decylaminoethanol, 2-(dimethyl Aminobenzyl)ethyl benzoate, p-dimethylamino benzoate. The action of the amine can be enhanced by the addition of benzene to the aromatic ketone of the benzene type. Examples of amines which can be used as oxygen scavengers a substituted N,N-dialkylaniline as described in EP 339 841. Other accelerators, co-initiators and auto-oxidants are mercaptans, thioethers, disulfides, scale salts, phosphine oxides or phosphines, For example, as described in EP 438123, GB 2180358 and JP Kokai Hei 6-68309. -24- (Please read the note on the back and then fill out this page) Order - ... line segment This paper scale applies to Chinese national standards (CNS M specification (21〇χ297 mm) 1297811 A7 B7 V. Inventive Description (22) In some cases, it is advantageous to use a sensitizer compound mixed with the compound (B). Therefore, another object of the present invention is to provide a a composition comprising, in addition to components (A), (B) and (C), at least one sensitizer compound (E), It is selected from the group consisting of benzoquinone and its derivatives, thioxanthone and its derivatives, hydrazine and its derivatives or coumarin and its derivatives. In addition to the components (A)-(E), photopolymerizable The mixture may contain a thermosetting component (F). An example of the component (F) is a compound having an epoxy group as a thermosetting component. For example, a known compound in a solid or liquid state may be used, and the epoxy compound is used. It is used according to the desired characteristics. For example, when the plating resistance is to be improved, a liquid epoxy resin is used, and when the water resistance is necessary, a large amount of methyl epoxy resin is present on the benzene ring or the cycloalkyl ring. used. Preferred epoxy resins are bisphenol S type epoxy resins, such as BPS-200 manufactured by Nippon Kayaku Co., Ltd., EPX-30 manufactured by ACR Co., and Epicuron EXA manufactured by Dainippon Ink & Chemicals Inc. 1514, etc.; double type A epoxy resin, such as Epicuron N_3050, N-7050, N-9050, manufactured by Dainippon Ink & Chemicals Inc., XAC-5005, GT-7004 prepared by Asahi Kasei Epoxy Co., Ltd. , 6484T, 6099, etc.; bisphenol F type epoxy resin, such as YDF-2004, YDF2007, etc., prepared by Tohto Kasei Co.; diglycidyl phthalate resin, such as Nippon Oil & Fats Co·, Ltd. Prepared Blemmer DGT or the like; heterocyclic epoxy resin such as TEPIC prepared by Nissan Chemical Industries, Ltd., Araldite PT810 manufactured by Asahi Kasei Epoxy Co., Ltd., etc.; bisxylenol type epoxy resin such as Yuka Shell Co. prepared YX-4000, etc.; bisphenol type epoxy resin, such as Yuka Shell Co., like the paper scale applicable to China National Standard (CNS) A4 specification (210X297 mm) (please read the notes on the back and fill in the form) Page) .Book · Line — ±5- 1297811 A7 _ _B7_ V. INSTRUCTIONS (23) (Please read the notes on the back and fill out this page) Prepared YL-6056, etc.; tetraglycidyl xylenol ethane resin, such as prepared by Tohto Kasei Co. ZX-1063, etc.; novolac type epoxy resin, such as EPPN-201, EOCN-103, EOCN_1020, EOCN-1025 and BRRN, manufactured by Nippon Kayaku Co., Ltd., ESN prepared by Asahi Kasei Epoxy Co., Ltd. 278, ECN-292 and ECN-299, Asahi Kasei Epoxy Co., Ltd. prepared GY-1180, ECN-1273 and ECN-1299, Tohto Kasei Co. prepared YDCN-220L, YDCN-220HH, YDCN-702, YDCN-704, YDPN-601 and YDPN-602, Dainipon Ink & Chemicals Inc. Epiculon-673, N-680, N-695, N-770 and N-775; bisphenol A Epoxy resin, such as EPX-80 prepared by Asahi Kasei Epoxy Co., Ltd. (H, EPX-8060 and EPX-8061, Epipiron Ink & Chemicals Inc., Epiculon N-880, etc.; chelate-type ring Oxygen resin, such as Asahi Denka Kogyo Κ·Κ·Prepared ΕΡΧ-49-69 and ΕΡΧ-49-30; glyoxal type epoxy tree Fats such as YDG-414 and the like prepared by Tohto Kasei Co.; amine-containing epoxy resins such as YH-1402 and ST-110 prepared by Tohto Kasei Co., YL-931 and YL prepared by Yuka Shell Co. -933, etc.; rubber modified epoxy resin, such as manufactured by Dainippon Ink & Chemicals Inc., 卩1〇111〇11丁8尺-601, Asahi Denka Kogyo Κ·Κ·Prepared EPX-84-2 And EPX-4061, etc.; a dicyclopentadienic acid type epoxy resin, such as DCE-400 prepared by Sanyo-Kokusaku Pulp Co., Ltd.; an anthrone modified epoxy resin, such as Asahi Denka Kogyo Κ ·Κ·Preparation of X-1359, etc.; E-caprolactone modified epoxy resin, such as Dicel Chemicals, Ltd. Preparation ---- 26- 4S 涿 paper scale applicable to China National Standard (CNS) A4 size (210X297 mm) 1297811 A7 B7 V. Description of invention (24)

Plaque G-402 and G-710, among others. Further, a part of the esterified compound of these epoxy compounds (e.g., esterified by (meth) acrylate) may be used in combination. The preferred thermosetting component is bisphenol A, bisphenol S, bisphenol F or novolac type epoxy compound. The appropriate amount of the thermosetting component (F) to be used in accordance with the present invention is 10 to 150 parts by weight, preferably 20 to 80 parts by weight, based on 100 parts by weight of the component (A). Accordingly, the present invention is also directed to a composition comprising at least one epoxy group-containing compound (F) in addition to components (A), (B) and (C). Furthermore, in addition to the components (A), (B) and (C) and the selective (D) '(E) and (F), various additives (G) (according to the artisanal amount) can be Used in the composition according to the invention. In the photosensitive thermosetting resin composition of the present invention, in order to improve properties such as adhesion, hardness and the like, an inorganic filler (G1) such as barium sulfate, barium titanate, cerium oxide powder or granular cerium oxide may be used if necessary. , anthrone oxide, amorphous vermiculite, talc, clay, magnesium carbonate, calcium carbonate, aluminum oxide, aluminum hydroxide, mica powder, and the like. The proportion of the filler in the composition is from 0 to 60% by weight, preferably from 5 to 40% by weight, based on the photothermographic resin composition. This composition optionally further contains, as component (G2), an epoxy curing accelerator such as an amine compound, an imidazole compound, a carboxylic acid, a phenol, a quaternary ammonium salt or a methanol group-containing compound. The content of the curing agent to be used is 0 to 10% by weight of the photosensitive thermosetting resin composition, preferably 0.05 to 5 4^. The paper size is applicable to the Chinese National Standard (CNS) Α 4 specification (210×297 mm) -: r- J------"-------装------------------ order--------------- Line · (Please read the notes on the back and fill out this page) 1297811 A7 "-____ B7 V. Description of invention (25) Weight %. Examples of further additives (G) are thermal inhibitors, which are used to avoid premature The polymerization reaction is, for example, hydroquinone, hydroquinone derivative, p-nonyloxyphenol, /3-naphthol or a hindered phenol such as 2,6-di-t-butyl-p-cresol. Increased in storage stability in the dark, which may, for example, use a copper compound (for example, copper succinate, copper stearate or copper octoate), a can compound (for example, diphenylphosphine, dibutylphosphine, three Ethyl phosphite, triphenyl phosphite or trityl phosphite), quaternary ammonium compound (for example, tetramethyl chlorinated or dimethyl methyl ammonium hydride) or via amine Derivative (for example, N-diethylhydroxylamine). Excluding atmospheric oxygen during the polymerization reaction, a stone scorpion or similar scorpion-like substance may be added, which has an inappropriate solubility in the polymer, and moves to the surface and forms a transparent surface layer when the polymerization reaction starts, avoiding air ingress. An oxygen-impermeable layer may also be applied. The light stabilizer which may be added in a small amount is a UV absorber, for example, hydroxyphenylbenzotriazole, phenylphenyl-benzoquinone, guanylamine oxalate or hydroxyphenyl three The azole type may be used singly or in a mixture, and may or may not have a hindered amine (HALS). Examples of such ultraviolet absorbers and photosensitizers (G3) are Hi2'-phenylphenyl. - benzotris, for example, 2-(2'-trans-5, methylphenyl)benzotriazole, 2-(3',5'-di-t-butyl-2,-hydroxyl Phenyl) phenylene, 2-(5'-tert-butyl-2'-pyridylphenyl)benzotrisene, 2-(2, thio-5'-(1,1,3, 3-tetramethylbutyl)phenyl)benzotriazine, 2-(3,5,-di-secondbutyl-2'-hydroxyphenyl)-5-chlorobenzotriazole, 2 -(3,-t-butyl-2,-perzino-5-methylphenyl) -5-gas benzotriazine, 2-(3'-second butyl-5,-second 4& gray paper scale applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) IJ..... .Ί-----装------------------ order ------------------ line · (please first Read the notes on the back and fill out this page.) 1297811 A7 ___:__ V. INSTRUCTIONS (26) Butyl-2'-p-phenylene)benzotrisole, 2-(2'-radio-4'- Octyloxyphenyl)benzotriazole, 2-(3,5,-di-third-pentyl-2,-hydroxyphenyl)benzotriazole, 2-(3',5'-double ( α,α-Dimethylbenzyl)-2'-pyridylphenyl)benzotriazole, 2·(3'_Terbutylbutyl-2'-hydroxy-5,-(2-octyloxy) Carbonylethyl)phenylhong chlorobenzotriazole, 2-(3,-t-butyl-5,-[2-(2-ethyl-hexyloxy)-carbonylethyl]-2'-hydroxybenzene 5-) gas benzotriazole, 2-(3,-tert-butyl-2,-hydroxy-5'-(2-methoxycarbonylethyl)phenyl)-5-gas benzotriene Azole, 2(3,-t-butyl-2'-hydroxy-5'-(2-methoxycarbonylethyl)phenyl)-benzotriazole, 2_(3,_t-butyl-2 '-Hydroxy-5,-(2-octyloxy-carbonylethyl)benzene Benzotriazine, 2-(3·indenylbutyl-5'-[2-(2-ethylhexyloxy)methylidene]-2'-pyridylphenyl)benzotriazole, 2-(3,-dodecyl-2,-hydroxy-5,-methylphenyl)benzotriazole and 2-(3,-tert-butyl-2,-hydroxy-5,-(2 a mixture of -isooctyloxycarbonylethyl)phenylbenzotriazole, 2,2,-methyl-bis[4-(l,l,3,3-tetramethylbutyl)-6-benzene And triazol-2-yl-phenol]; 2·[3,-t-butyl-5,-(2-decyloxycarbonylethyl)-2'-hydroxy-phenyl]-benzotriazole and The transesterified product of polyethylene glycol 300; [R-CH2CH2-COO(CH2)3]2- wherein R=3,-t-butyl-4'-hydroxy-5,·2Η_benzotriazole- 2-yl-phenyl. 2. 2-Hydroxybenzoquinone 1, such as 4-hydroxy, 4-methoxy, 4-octyloxy, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, 4, Derivatives of 2,4,-trihydroxy and 2'-hydroxy-4,4'-dimethoxy. 3. An ester of jatrophic acid substituted or unsubstituted, such as 4-tert-butylphenyl salicylate, phenyl salicylate, octylphenyl salicylate, benzoyl fluorenyl Resorcinol, bis(4-t-butylbenzylidene) resorcinol, benzhydryl resorcinol, 2,4-di-t-butylphenyl 3,5-di- The third butyl-47 ta paper scale applies to the Chinese National Standard (CNS) Α4 specification (210X297 mm) (please read the back note and refill this page)

•, I 丨: Line _ 1297811 A7 B7 27 V. INSTRUCTION DESCRIPTION 4-Hydroxybenzoate, cetyl 3,5-di-t-butyl-4-hydroxybenzoate, octadecane Base 3,5_di-t-butylhydroxybenzoate and 2-sheet A (please read the back of the note before refilling this page) base-4,6-di-t-butylphenyl 3, 5-di-t-butylhydroxybenzoate. - Acrylic vinegar _, such as, "· cyano-ys, cold-diphenyl acrylate, methyl α-carbomethoxycinnamate, α _ cyano _ stone _ methyl-p-methoxy cinnamic acid Butyl ester or methyl ester, methyl α-carboxymethoxy-p-methoxycinnamate and Ν-(/3-carbomethoxy-d-cyanovinyl)_2-methyl^. : 丨匕 丨匕 立 立 ,, for example, bis (2,2,6,6-tetramethylpiperidinyl) sebacate, bis (2,2,6,6-tetramethylpiperidinyl) Succinate, bis(1,2,2,6,6-pentamethylpiperidinyl) sebacate, bis(1,2,2,6,6-pentamethylpiperidinyl)-n-butyl Base_3,5_ di-t-butyl-4-hydroxybenzyl malonate, hydrazine hydroxyethyl 2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid Condensation product, team ^_bis(2,2,6,6·tetramethyl-4-piperidinyl)hexa-methyldiamine and 't-octylamino 2,6·dichloro-l , condensation product of 3,5-s-triazine, tris(2,2,6,6-tetramethyl-4-pyridinyl)azintriacetate, tetrakis (2,2,6,6- Tetramethyl)_4_piperidinylbutane tetraester, 1,1'-(1,2-ethanediyl)-bis(3,3,5,5-tetramethyl-piperazinone), 4 -benzimidyl_2,2 M_tetramethylpiperidine, 4_stearyloxyfluorene#, tetramethylpyridinium, dibuji-3,5-di-t-butylbenzyl)malonate, 3_正Octyl-7,7,9,9_tetramethyl-1,3,8-triaza-helix μ, 5]decane-2, 'dione, dioctyloxy-2,2,6,6· Tetramethyl phthalate, azelaic acid vinegar, bis(buoctyloxy-2,2,6,butetramethylpiperidinyl) succinate, hydrazine, hydrazine, _bis (2,2,6 ,6·Tetramethyl_4_piperidinyl)hexamethyldiamine and 4-marine-derived 6·dichloro-purine triterpene condensation 71⁄4 paper scale applicable to China National Standard (CNS) A4 specification ( 210X297 公) 1297811 A7 广____B7 _ V. Description of invention (28) Product, 2-chloro-4,6-bis(4-n-butylamino-2,2,6,6-tetramethylpiperidine a condensation product of 1,3,5-triazine with 1,2-bis(3-aminopropylamino)ethane, 2-gas-4,6-bis(4-n-butylamino) a condensation product of -i,2,2,6,6-pentamethylpiperidinyl)-1,3,5-triazine with 1,2-bis(3-aminopropylamino)ethane, B Mercapto _ 3-dodecyl _7,7,9,9-tetramethyl-1,3,8-triaza-helix [4.5] decane-2,4-diyan|, 3-12 Burning base-ΐ-(2,2,6,6·tetramethyl-4-唆 唆 ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) Ϊl is more than -1,5-dione. 13. oxazamide, for example, 4,4'-dioctyloxyxanthin, 2,2,-diethoxyoxalin, 2,2 '-Di-octyloxy-5,5,-di-t-butylacetolide, 2,2, di(dodecyloxy)-5,5,-di-t-butyl oxalate Benzidine, 2·ethoxy-2′-ethyl-oxaxanthene, n,N,-bis(3-didecylaminopropyl)campamine, 2-ethoxy-5- Tributyl-2,-ethyloxatolepine and its mixture with 2-ethoxy-2,-ethyl-5,4,-di-t-butyldoxafenani, o- and a mixture of -methoxy- and o- and p-ethoxy-disubstituted oxalic anilide. L 2-(2-Phenylphenyl)-1,3,5-triazine, such as 2,4,6-tris(2-hydroxy-4-octyloxyphenyl-1,3,5-tri Oxazine, 2-(2-hydroxy-4-octyloxyphenyl)_4,6-bis(2,4-dimethylphenyl)-l,3,5-triazine, 2-(2,4- Dihydroxyphenyl)-4,6-bis(2,4-dimercaptophenyl)-l,3,5-triazine, 2,4-bis(2-hydroxy-4-propoxy-phenyl )-6-(2,4-dimethylphenyl)·1,3,5-triazine, 2-(2-hydroxy-4-octyloxybenyl)-4,6-bis(4-methyl -phenyl)-1,3,5-triazine, 2-(2-transalkyl-4·dodecyloxyphenyl)-4,6-bis(2,4-didecylphenyl tributazine , 2_[2•hydroxy-4-(2-pyridyl-3-butoxy-propoxy)phenyl]_4,6-bis(2,4·didecyl benzophenone paper scale applicable to Chinese national standards ( CNS) A4 size (210X297 mm) (Please read the note on the back and fill in the nest page) -, can | ... line 丨 1297811 A7 B7 5, invention description (29 base) -1,355-triazine, 2 -[2.hydroxyhydroxybutanyloxypropoxyl), stupyl, 4,6-bis(2,4-dimethylphenyl)-1,3,5-tri. Qin, 2 for twelve silk -/Tridecyl-oxy-(2-pyridylpropyl)oxylhydroxyl-phenyl>4,6_double (2, Dimethyl base)-1,3,5-triazine. I. phosphite and sub-, such as triphenyl phosphite, diphenyl alkyl phosphite, stupid dialkyl phosphorous acid Salt, tris(nonylphenyl) phosphite, trilauryl phosphite, tris(octadecyl)phosphite, di-hardy-mercapto-pentaerythritol phosphite, tri-(2,4-di ·T-butyl phenyl) phosphite, diisodecyl pentaerythritol diphosphite, bis-(2,4-di-t-butylphenyl) pentaerythritol diphosphite, bis-(2,6 _Di-tert-butyl_4_methylphenyl)pentaerythritol diphosphite, bis-isodecyloxypentaerythritol diphosphite, bis(2,4-di-t-butyl-6-methylbenzene Pentaerythritol diphosphite, bis-(2,4,6-tri-tert-butylphenyl)pentaerythritol diphosphite, tristea sorbitol triphosphite, tetra (2,4-di) -T-butylphenyl)-4,4'-bis-phenylene diphosphite, 6-isooctyloxy-2,4,8,1〇-tetra-t-butyl-12H-diphenyl Dioxaphosphocine, 6-fluoro-2,4,8,10-tetra-t-butyl-12-methyldibenzo[山8]-1 , 3,2-dioxaphosphorane, bis(2,4-di-t-butyl-6-methylphenyl)methylphosphite and bis(2,4-di-t-butyl- 6-nonylphenyl)ethyl phosphite. Therefore, the invention also relates to a compound (A), (B) and (C) comprising at least one ultraviolet absorber or light stabilizer compound (G3) Composition 0 Further, if necessary, known additives can be used, such as the known coloring paper scale applicable to China National Standard (CNS) A4 specification (210X297 public sauce) (please read the back note first and then fill out this page) ) — ; 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 978 , carbon black, naphthalene black, etc. Accordingly, the object of the present invention is the composition as described above, which comprises an additional additive (G) selected from the group consisting of inorganic fillers, colorants, dispersants, thermal polymerization inhibitors, thickeners, antifoaming agents, and Dyeing agents, especially inorganic fillers. Further, a chain transfer agent conventionally used in the art can be added to the composition according to the present invention. Examples are thiols, amines and benzothiazoles. The curing method can be assisted by, in particular, adding a component which forms a radical under thermal conditions to color (for example, titanium dioxide), for example, an azo compound such as 2,2,-azobis ( 4-methoxy-2,4-dimethylpentanyl), triazinene, diazo sulfide, penzinylene or peroxy compound, for example, hydrogen peroxide or peroxycarbonate, for example, third Hydrogen peroxide, for example, as described in EP 245,639. The composition according to the invention may comprise as a further additive (g) a photoreducible dye, for example, xanthene, benzoxanthene, benzoxanthene _, thiazine-, penridine ... laverine Or an acridine dye, and/or a trimeric methyl compound, which can be cleaved by radiation. A similar composition is described, for example, in Ep 445624. Further customary additives (G), depending on the intended use, are optical brighteners, wetting agents or leveling aids. To cure the thick and pigmented coating, glass microspheres or comminuted glass fibers are suitably added, for example, as described in us 5013768. The choice of additive (G) depends on the application field and the required properties in this field. 47: The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) - ' - -33 - (Please read the back note first) Fill in this page again)

1297811 A7 ____B7 __ V. Description of invention (31). The above additives are conventional in the art and, therefore, are generally added to individual applications. In some cases, it may be advantageous to use a mixture with a known photoinitiator (B) to form a mixture of the following: camphorquinone, benzoquinone, benzoquinone derivatives. Acetylene, acetophenone derivatives, for example, α-hydroxycycloalkylphenyl ketone or 2-hydroxy-2-methyl-1-phenyl-acetone, dialkoxyethyl fc, α-trans ········································ Ethyl ether and benzoin ketal, for example, dimethyl benzopyrene, phenylglyoxylate and its derivatives, dimer phenylglyoxylate, diethyl phthalate, for example, Phenylbenzenetetracarboxylic acid perester described in EP 126541, monodecylphosphine oxide, for example, (2,4,6-trimercaptobenzylidene)diphenylphosphine oxide, bis-decylphosphine oxide , bis(2,6-dimethoxy-benzylidene)-(2,4,4-trimethyl-phenyl)-phosphine oxide, bis(2,4,6-trimethylbenzene曱醯 ))) phenylphosphine oxide, bis(2,4,6-trimethylphenylhydrazino)_2,4-dipentyloxyphosphino oxide, tridecylphosphine oxide, stain, for example , phenyl_1, 2_ g-dione-2-0-benzoic, 1-phenyl-1,2·propanol-2-yl-ethoxy | carbon-based oxime, halomethyl Triazine, for example, 2-[2-(4.methoxy)- Phenyl)-ethylidene]-4,6-bis-trichloromethyl-[1,3,5]triazine, 2-(4-methoxy-phenyl)-4,6-bis-three Gas methyl-[1,3,5]triazine, 2-(3,4-dimethoxy-phenyl)-4,6-bis-tris-methyl-[1,3,5]triazine 2-mercapto-4,6-bis-tris-methyl-[1,3,5]triazine, 2-(4-N,N-bis(ethoxycarbonylindenyl)aminophenyl) -4,6-bis-tris-methyl-[1,3,5]triazine, 2-(4-methoxy-naphthyl)-4,6-bis-trishydrazinyl [1,3 , 5] Triazine, 2-(1,3-benzodioxan-5-yl)-4,6-bis-trichloromethyl. This paper scale applies to China National Standard (CNS) A4 specification (210X297) (Limited) (Please read the notes on the back and fill out this page) • Order: 丨 1297811 A7 _________B7____ V. Inventions (32) (Please read the notes on the back and fill the page)

[1,3,5]triazine, 2-[2-[4-(phenyloxy)phenyl]vinyl]-4,6-bis-trichloroindolyl-[1,3,5]triazine ,2-[2-(3-methyl-2-furyl)-vinyl M,6-bis-trichloromethyl-[1,3,5]triazine, 2-[2-(5-A Benzyl-2-furyl)-vinyl l·4,6-bis-trichloromethyl-[1,3,5]triazine, 2-[2-(2,4-dimethoxy-phenyl) )_ vinyl]-4,6-bis-trichloromethyl-[1,3,5]triazine, 2_[2-(2-methoxy-phenyl)vinyl]-4,6-double - trimethylmethyl-[1,3,5]triazine, 2-[2-[4-isopropoxy-phenyl]-vinyl]-4,6-bis-tris-methyl-[1 , 3,5]triazine, 2-[2-(3-chloro-4-methoxy-phenyl)vinyl;|-4,6-bis-trichloromethane-[1,3,5]3 Pyrazine, 2-[2-bromo-4-N,N-bis(ethoxycarbonylmethyl)amino-phenyl]-4,6-bis-trichloromethyl]1,3,5]triazine 2-[2-Ga-4-N,N-bis(ethoxymethylidenemethyl)amino-phenyl]-4,6-bis-trichloromethyl-[1,3,5] Oxazine, 2-[3-di-4,_N,N-bis(ethoxycarbonylmethyl)amino-phenyl]-4,6-bis-trichloromethyl-[1,3,5] Pyrazine, 2-helium-4-N,N-bis(ethoxycarbonylmethyl)amino-phenyl]·4,6-bis-tris-methyl-[1,3,5]triazine or Such as G. Buhr, R. Dammel and (: Lindley Polym. Mater. Sci Eng. 61, 269 (1989) and EP 0262788 other halomethyl-triazines; halomethyl-oxazole Starting agents such as those described in US 4,371, 606 and US 4,371, 607; i, 2-, succinct, such as Ε·Α·Bartmann, Synthesis 5, 490 (1993); hexaarylbiimidazole and hexaarylbisimidazole/ a co-initiator system, for example, o-gas hexaphenyl-bis-salt, ferrocene-cationic compound or titanocene, for example, bis(cyclopentadienyl), in combination with 2_Wei basic and 11-salt - bis (2,6-difluoropyrrolyl-phenyl) titanium. If the novel system is used in a hybrid system, in addition to the radical hardener, a cationic photoinitiator, a peroxide compound, such as Benzoyl oxyhydroxide (other suitable peroxides are described in US Patent _________) This paper scale applies to National Standards for Towel Countries (CNS) A4 Specification (210X297 mm) ^—= - 1297811 A7 __B7 V. Description of Invention (33) (Please read the notes on the back and then fill out this page) Line 4, line 19-25, No. 4950581), Aromatic Nickel... Scales - Or iodonium salt as described in U.S. Patent No. 5,950,581, No. 18, pp. 6 to 19, line 10, or cyclopentadienyl-arene-iron (II) complex salt, such as '( 7?-isopropyl basic) (7?5-cyclopentadienyl)-iron (II) hexa-I phosphate, and oxime sulfonate 'for example as described in EP 780729. Further, for example, the σ described in Ep 497531 and EP 441232 is used in combination with the biting iron and the (iso) ringing 纟 纟 salt. Accordingly, the object of the invention is also a composition additionally comprising at least one photoinitiator (Β1). The additional photoinitiator as component (Β1) is generally present in an amount of from 〇 to part by weight (preferably from 3 to 60 parts by weight, based on 1 part by weight of the component (Α)) The amount is added. The present invention is also directed to a component (α), 〇.〇15 to 100 parts by weight of the component (Β), 5 to 200 parts by weight of the component (c) and 〇〇15. Composition of up to 80 parts by weight of the component (Ε). The composition is uniformly applied to the substrate by known coating techniques, such as 'by spin coating, dip coating, doctor blade coating, curtain coating, screen coating, painting, spraying (especially It can be coated by electrophoresis by electrostatic spraying and reverse coating. The photosensitive layer can also be applied to a temporary release support and then applied to the final substrate (e.g., a copper plated circuit board) by layer transfer. The amount of coating (coating thickness) and substrate (layer substrate) properties depend on the intended field of application. The coating thickness generally ranges from about 0.1/zm to more than 1 mm, for example, from 1/m to imm, preferably from 0.3 v to 200/m. After the substrate is coated, the solvent is removed (generally by drying) to the Chinese national standard (10) on the tenth grade paper size. M specification (2) 〇 > 297 public "36 - 1297811 A7 B7 V. DESCRIPTION OF THE INVENTION (34) The photoresist coating is left on the substrate. The term "image" exposure includes a reticle containing a predetermined pattern (eg, a slide, a chrome mask, a stencil mask, or a wire mesh). Exposure, or by laser or beam exposure, which is removed, for example, by computer control on the surface of the coated substrate, and images are produced in this manner. Computer controlled illumination can also be achieved by electron beam. A mask made of liquid crystal, which can be addressed by a pixel to produce a digital image, for example, A. Bertsch, JY Jezequel, JC Andre, Journal of Photochemistry and Photobiology; Chemistry 1997, 107, 275- Page 281 and KP Nicolay are described in Offset Printing 1997, 6, pages 34-37. The sensitivity of the novel composition is generally extended from about 190 nm to 600 nm (UV-visible region). Suitable radiation systems are present, for example, in 曰. Light or from artificial light source Light. Therefore, a large number of very different types of light sources are used. Point sources and arrays ("light blankets") are suitable. Examples are carbon arc lamps, xenon arc lamps, medium-, high-, ultra-high- and low-pressure Mercury lamp, with metal halide dopant (metal-halogen lamp), microwave laser metal vapor lamp, excitation lamp, super-lighting fluorescent tube, fluorescent lamp, argon incandescent lamp, electronic flash, photo giant Lights, light-emitting diodes (LEDs), electron beams, and X-rays. The distance between the lamp and the substrate to be exposed according to the present invention may vary depending on the desired application and the type and output of the lamp, and may be, for example, 2 cm to 150 cm. Laser sources (for example, excimer lasers, such as Krypton F lasers for 248 nm exposure) are also suitable. Lasers in the visible region are also used. Etec & Orbotech (DP-100) The UV-ray exposure system provided by TMDIRECT IMAGING SYSTEM is suitable for direct visualization of ultraviolet lasers without the need for light 4? The paper scale is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 mm) ΎΤ (Please read the back Note: Refill this page) -, τ ;. Line _ 1297811 A7 _______B7 V. Description of the invention (3~~ hood. Therefore, the present invention also provides a polymerization reaction method of a compound containing an ethylenically unsaturated double bond, which comprises electromagnetic radiation having a composition as described above in the range of 190 to 600 nm Irradiation. As already mentioned, the composition can be developed by an aqueous alkali. Particularly suitable aqueous alkali developer solutions are aqueous solutions of tetraalkylammonium hydroxide or alkali metal ruthenate, phosphate, hydroxide and carbonate. . A small amount of wetting agent and/or organic solvent may also be added to such solutions if desired. Examples of typical organic solvents which can be added in small amounts to the developer liquid are cyclohexanone, 2-ethoxyethanol, toluene, acetone and mixtures of such solvents. The composition of the present invention has high sensitivity and good developability and, therefore, is particularly suitable for aqueous developable photoresist applications. It also has good thermal stability. Novel radiation-sensitive compositions have been found to be useful as negative photoresists' which are very sensitive to light and can be visualized in aqueous assay media without swelling. It is suitable as a photoresist for electronic articles, such as plating resists, etch resists (liquid and dry films), solder resists, as color filters for preparing various display applications or for generating an galvanic display. A resist for a structure of a panel and an electroluminescent display for preparing a relief printing, lithography, gravure or screen printing pattern for preparing a relief copy, for example, preparing a braille book for preparation A stamp used for chemical grinding or as a microresistor in the preparation of integrated circuits. The composition can further be used as a light-patternable dielectric layer or coating, packaging materials and barrier coatings for preparing computer chips, printing plates and other electrical or electrical 4:7-paper scales applicable to Chinese national standards ( CNS) A4 size (210X297 mm) C Please read the precautions on the back and then fill out this page}. Ordering Lines - 1297811 A7 _____B7 V. Invention Description (36) Subcomponents. The processing conditions of the possible layer supports and coated substrates can be varied. (Please read the precautions on the back #'filled on this page). Because the photocurable composition according to the present invention has good developability and is sufficiently sensitive to ultraviolet light, it is particularly suitable for preparing color filters. Or a color mosaic system, such as described in EP 320 264. Color filters are commonly used to prepare LC displays, projection systems, and image sensors. Color filters can be used, for example, for television receivers, image monitors or computer monitors and image scanners, flat panel display technologies, and the like. In the method of forming a color filter, red, green, and blue colored materials, dyes, and colorants are added to the photosensitive resin composition of the present invention to provide a photosensitive resin composition of any color on a transparent substrate, and then The self-coating side is exposed through a reticle with a color filter pattern, developed with a suitable alkali developing solution, and heated as needed. This method is repeated to form an image with several colors. The photosensitive resin composition of the present invention, wherein at least one or more pixels are formed on the transparent substrate, and then a side of the transparent substrate on which the image is not formed is exposed. The above image can be used as a hood. In this case, for example, in the case where the overall exposure is applied, the position adjustment of the mask is not required, and the positional slip consideration is removed, and all of the portions on which the pixels are not formed can be cured. Further, in this case, it is possible to develop and remove a portion of the portion of the pixel on which the light mask is not formed. In either case, a gap is not formed between the previously formed pixel and the image 2 formed thereafter, and therefore, the composition of the present invention is suitable for, for example, the color forming material. Specifically, red, green and blue colored materials, dyes & colorants are added to the photosensitive resin composition of the present invention, (iv) imaged, China A4 size (210X297 mm) " 239 3997811 A7 -- --------— B7__ V. INSTRUCTIONS (37) ~ --- The method is repeated to form red, green and blue pixels. Then, a photosensitive resin composition in which, for example, a black coloring material, a dye, and a colorant are added is provided on the entire surface. The overall exposure (or partial exposure via the hood) can be used to: provide a black pixel for all of the pixels between the red, green and blue pixels. The photosensitive resin composition of the present invention can also be used for a layered transparent material in addition to the method in which the photosensitive resin composition is applied to a substrate and dried. That is, the photosensitive resin composition is directly provided on the transparent support in a layer form, preferably on the polyethylene terephthalate film, or an oxygen shielding layer and a peeling layer or a peeling layer and oxygen shielding are provided thereon. Layer of polyethylene terephthalate. Typically, a removable cover sheet made of synthetic resin is laminated thereon for protection during processing. Further, a layered structure may be applied, in which an alkali-soluble thermoplastic resin layer and an intermediate layer are provided on the temporary support, and further, a layer of the photosensitive resin composition is provided thereon (see, for example, Jp 5_ 173320-A) The top cover sheet is removed during use, and the photosensitive resin composition layer is laminated on the permanent support. Thereafter, the peeling is between the interlayers and the temporary support (when the oxygen barrier layer and the release layer are provided), between the release layer and the oxygen barrier layer (when the release layer and the oxygen barrier layer are provided), and temporarily The support and the photosensitive resin composition layer are completed (when the peeling layer or the oxygen shielding layer is not supplied), and the temporary rubber is removed. The photosensitive resin composition is prepared by any of various means for dispersing, such as a three-roll mill, a sand mill, a ball mill, a kneader, and a paint shaker. This composition is generally applied to the Chinese National Standard (CNS) A4 specification (210X297 mm) using such as spray coating, spin coating, and county paper size (please read the back note before refilling this page)

1297811

DESCRIPTION OF THE INVENTION A coating method of roll coating or screen coating is applied to a substrate. Light sources such as mercury lamp or metal halides are typically used for radiation. A glass support, a metal, a ceramic, and a synthetic resin film can be used as a support for a color filter. Glass and synthetic resin films which are transparent and have excellent dimensional stability are particularly preferred. The thickness of the photosensitive resin composition layer of the color filter is generally 1 1 to 1 微米 μm, particularly 0.3 to 5 μm. A diluted aqueous solution of an alkali substance can be used as a developing solution of the photosensitive resin composition of the present invention, and a solution prepared by adding a small amount of a water-miscible organic solvent can also be contained. Examples of suitable materials include metal hydroxides (eg, sodium oxynitride and potassium hydroxide), alkali metal carbonates (eg, sodium carbonate and potassium carbonate), alkali metal hydrogencarbonates (eg, sodium bicarbonate and carbonic acid). Potassium hydrogen hydride, metal citrate (for example, sodium citrate and potassium citrate), alkali metal bismuth citrate (such as 'particulate sodium and potassium hexanoate'), triethanolamine, diethanolamine, monoethanolamine , morphine, tetrahydrogenated hydroxide (for example, tetramethylammonium hydroxide), or trisodium phosphate. The concentration of the test substance is 0.01 to 30% by weight. /. And preferably 8 to 14. Suitable organic solvents which can be mixed with water contain methanol, ethanol, 2-propanoid, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol Mono-n-butyl ether, benzyl alcohol, propyl ketone, methyl ethyl amp; cyclohexanone, ε-caprolactone, τ-butyrolactone, dimethylformamide, dimethyl acetamide, Hexamethylphosphoniumamine, ethyl lactate, lactate, 曰ε-caprolactam and Ν-methylpyrrolidone. Organic solvents that can be mixed with water, and agricultural products (please read the notes on the back and fill out this page).

V. INSTRUCTIONS (39) 1297811 System 〇 1 to 30 weight 0 / 〇. Further, a surfactant known to those skilled in the art can be added. The concentration of the surfactant is preferably from 0.001 to 10% by weight. The developer solution can be used in the form of a bath solution or a spray solution. In order to remove the uncured portion of the photosensitive resin composition layer, a method such as wiping with a rotating brush and wiping with a wet sponge may be combined. Generally, the temperature of the developing solution is preferably at room temperature and in the vicinity of 40. The developing time of the hydrazine may vary depending on the specific kind of the photosensitive resin composition, the alkalinity and temperature of the developing solution, and the kind and concentration of the organic solvent when the organic solution is added. It usually takes 1 sec to 3 minutes. A rinsing step can be applied after the development process. The final heat treatment is preferably carried out after the development treatment. Therefore, the support having a layer of light (hereinafter referred to as a photocured layer) by exposure is heated in an electric furnace and a drier, or the photocured layer is irradiated with an infrared lamp or heated on a hot plate. The heating temperature and time depend on the composition used and the thickness of the layer formed. Generally, the heating is preferably about 12 (Tc to about 26 (rc is carried out for about 5 to about 60 minutes. The colorant which can be included in the composition according to the present invention (including the colored filter resist composition) a color processed by a process, for example, by finely dispersing a colorant in at least one group selected from the group consisting of acrylic resin, ethylene-vinyl acetate copolymer, maleic acid resin, and ethyl cellulose resin a powdery or pasty product made from a resin. The red colorant comprises, for example, a separate enamel type pigment, a separate enamel type colorant, or at least one of them and a diazo type yellow colorant or A mixture of two mouth-shaped yellow pigments, especially C·; [• Red color chores paper scale applicable to China National Standard (CNS) A4 specification (2K) X297 public) (Please read the back Please fill out this page again)

42 1297811 A7 B7 Description of the invention (177, C. I. red pigment 155 alone or at least one element of c·J•red pigment 177, C·I·red pigment 155 and c·J•yellow pigment 83 Or a mixture of c yellow pigments 139 ("c丄," refers to the color index, which is known to those skilled in the art and is publicly available.) Further suitable examples of colorants are c·I·red Colorants 105, 144, 149, 176, 177, 185, 202, 209, 214, 222, 242, 254, 255, 264, 272 and c L yellow colorants 24, 31, 53, 83, 93, 95, 109 , 110, 128, 129, 138, 139, 166 and C·I· orange colorant 43. The green colorant includes, for example, a single toothed ugly coloring material or a diazonium type gamma coloring material or a different a mixture of hydrogen, yellow pigments, especially C·I·green pigments 7 alone, C·I. green pigments 36 alone, C·L green pigments 37 alone or by C·I·green Colorant 7, C·I·Green coloring material 36, C·I·Green coloring material 37, c. j• At least one element of green coloring material 136 and C·I·Coloring coloring material 83 or c·I. Yellow coloring material a mix of 139 Other suitable green colorants are C. I. Green pigments 15 and 25.

An example of a suitable blue colorant is a phthalocyanine type coloring material, which is used alone or in combination with a oxazoline type purple coloring material, for example, C.I. blue coloring material 15:3 and C.I. purple coloring material 23 mixture. Further examples of blue pigments are CL blue 15:3, 15:4, 15:6, 16 and 60, i.e., phthalocyanine C.I. blue pigment 15:3, or phthalocyanine C.I. blue pigment 15:6. Other suitable colorants are c.I. Blue colorants 22, 28, C.I. Purple colorants 14, 19, 23, 29, 32, 37, 177 and C.I. Orange 73. The colorant of the black matrix photopolymerizable composition preferably comprises at least one member selected from the group consisting of carbon black, titanium black, and iron oxide. However, the overall production; Zhu paper scale applies to the Chinese national standard (0^) M specifications (21 〇 x 297 mm) (please read the notes on the back and fill out this page)

I 4· 1297811 A7 B7 V. INSTRUCTIONS (41 A mixture of other pigments with a black appearance can also be used. For example, c丄 black pigments 1 and 7 can be used alone or in combination. (Please read the back Note: Please fill in this page again. For any color, more than two color combinations can be used. It is especially suitable for the color filter application by powder-like processing which is obtained by finely dispersing the above-mentioned color materials in the resin. The colorant concentration in the solid group injury is, for example, in the range of 5% by weight to 5% by weight, particularly in the range of 10% by weight to 50% by weight. It is preferred to have an average particle diameter less than the wavelength of visible light (4 Å to 700 nm), particularly preferably an average color diameter of < 1 〇〇 nm. If necessary, pretreatment of the colorant with a dispersant The colorant is stabilized in the photosensitive composition to improve the dispersion stability of the colorant in the liquid composition. Examples of the dispersing agent are commercially available compounds, for example, as described in JP 1〇-9〇891, for example, EFKA-46, EFKA-45, S 3000, S 5000, S 22000 and S 24000 Preferably, the color filter composition according to the present invention additionally contains at least one addition polymerizable monomer compound. For example, 'the following compounds may be used alone or in combination with other monomers as the invention for the present invention. An addition polymerizable monomer of an unsaturated double bond. Specifically, it contains a third butyl (meth) acrylate, ethylene glycol di(meth) acrylate, and a 2-hydroxy propyl group. Acrylate, triethylene glycol di(meth) acrylate, trimethylolpropane tri(meth) acrylate, 2_ethyl·2-butylpropanol di(meth) acrylate, Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylic acid stupid paper scale applicable to China National Standard (CNS) A4 specification (2ΐ〇χ297 mm 1297811 A7 B7 V. Invention Description (42 δ|, dipentaerythritol penta(indenyl) acrylate, polyoxyethylated triterpene alcohol, tris(meth)acrylate, tris(2-(methyl)propenyloxyethyl) Cyanamide, hydrazine, 4-diisopropenyl-benzene, hydrazine-dihydroxy Benzene (decyl) ruthenium acrylate, decylmethyl diol di(decyl) acrylate, styrene, dipropyl propyl fumarate, triallyl triphenyl hexaphthalate, lauryl (A Acrylate, (meth) acrylamide and xylene bis(meth) acrylamide. Further, a compound having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2 may also be used. -Hydroxypropyl (methyl) propionate and polyethylene glycol mono(methyl) propylene oxime 6) and isocyanate vinegar (such as hexamethylene diisocyanate, toluene) The reaction product of isocyanate and xylene diisocyanate. Particularly preferred are pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate and tris(2-propenyl methoxyethyl)-isocyanurate. In the color filter composition, the total amount of monomers contained in the photopolymerizable composition is preferably from 5 to 80% by weight, particularly from 10 to 7% by weight, based on the total solid components of the composition. For the benchmark. As an adhesive used in the composition of the color filter composition, it is soluble in an aqueous alkali solution and insoluble in water, for example, having one or more acid groups and one or more polymerizable unsaturated bonds in the molecule. a homopolymer of a polymerizable compound, or a copolymer of two or more thereof, and one or more polymerizable groups having one or more unsaturated bonds copolymerizable with such compounds and having no acid groups Copolymers of the compounds can be used. Such compounds may have one or more of one or more low molecular weight compounds having one or more acid groups and one or more polymerizable unsaturated bonds in the molecule. The polymerizable compound which can be copolymerized with this compound and which does not contain acid groups. The paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 public). (Please read the notes on the back and fill the nest. This page)

I 1297811 A7 B7 V. Inventive Note (43) Obtained by polymerization. Examples of acid groups are -COOH group, -S03H group, -S02NHC0- group, phenolic hydroxyl group, -S02NH- group and -CO_NH-CO- group. In the meantime, a polymer compound having a -COOH group is particularly preferable. Examples of the polymerizable compound having one or more acid groups and one or more polymerizable unsaturated bonds in the molecule include the following compounds and the like: acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, ethylene Benzoic acid and cinnamic acid are examples of polymerizable compounds having one or more -COOH groups and one or more polymerizable unsaturated bonds in the molecule. Examples of a polymerizable compound having one or more -S03H groups and one or more polymerizable unsaturated bonds of vinylbenzenesulfonic acid and 2-(meth)acrylamide-methyl-2-methylpropanesulfonic acid . N-methylsulfonyl (meth) acrylamide, N-ethylsulfonyl (decyl) acrylamide, N-phenylsulfonyl (meth) acrylamide and N-(pair- Methylphenylsulfonyl) (meth) acrylamide is an example of a polymerizable compound having one or more -so2nhco- groups and one or more polymerizable unsaturated bonds. Examples of polymerizable compounds having one or more phenolic hydroxyl groups and one or more polymerizable unsaturated bonds in the molecule include hydroxyphenyl (meth) acrylamide, dihydroxy phenyl (meth) acrylamide , hydroxyphenyl-carbonyloxyethyl (meth) acrylate, hydroxyphenyl oxyethyl (meth) acrylate, phenylphenylthioethyl (meth) acrylate, dihydroxy phenyl carbonyl oxygen Ethyl (meth) acrylate, dihydroxy phenyl oxyethyl (fluorenyl) acrylate, and dihydroxy-phenyl thioethyl (meth) acrylate. Examples of polymerizable compounds having one or more -S02NH- groups and one or more polymerizable unsaturated bonds in the molecule include the Chinese National Standard (CNS) A4 on the basis of the chemical formula (a) or (b). Specifications (210X297 public) (Please read the notes on the back and fill out this page)

1297811 A7 B7_ V. Inventive Note (44) Compounds indicated: CH2=CHA1-Y1.A2-S02-NH-A3 (a) (Please read the notes on the back and fill out this page) CH2=CH A4-Y 2 ~ A5-NH-S〇2~ A6 (b) where Yi and Y2 each represent -COO-, -CONA7- or a single bond; A! and A* each represent H or CH3; A2 and A5 each The invention relates to a CrC12 alkylene group, a cycloalkyl group, an extended aryl group or an extended aralkyl group, or a C2-C12 alkylene group having a substituent, which is inserted into an ether group and a thioether group, and the ring is extended. An alkyl group, an aryl group, or a aryl group; each of 3 and 6 represents η, a selectively substituted CrC12 alkyl group, a cycloalkyl group, an aryl group, an aralkyl group; and A7 represents hydrazine, Selectively substituted CrC12 alkyl, cycloalkyl, aryl or aralkyl. The polymerizable compound having one or more -CO-NH-CO- groups and one or more polymerizable unsaturated bonds comprises maleimide and N-propenyl-acrylamide. These polymerizable compounds become a polymer compound containing a -CO-NH-CO- group in which a ring and a main chain are formed by polymerization. Further, a methacrylic acid derivative and an acrylic acid derivative each having a -CO-NH-CO- group may also be used. Such methacrylic acid derivatives and acrylic acid derivatives include, for example, methacrylamide derivatives such as N-ethylmercaptomethyl decylamine, N-propenyl methacrylamide, N-butylidene Acrylamide, N-pentamethylene methacrylate, N-methyl methacrylamide, N-dodecyl methacrylamide, N-benzylidene methacrylate Amine, N-(p-methylbenzylidene)methacrylamide, N-(p-chlorobenzylidene)methacrylamide, N-(naphthyl-carbonyl)methacrylamide , N-(phenylethenyl)-mercaptopropenylamine and 4-methylpropenylamine 3 wood paper scale applicable to China National Standard (CNS) A4 specification (210X297 mm) 1297811 A7 -_ _ B7 , invention description (45) ketoimine 'and propylene amide derivatives with the same substituents (please read the back of the note before you fill out this page). These polymerizable compounds are polymerized into a compound having a -C〇-NH-CO- group in a side chain. Examples of the polymerizable compound having one or more polymerizable unsaturated bonds and having no acid group include a compound having a polymerizable unsaturated bond selected from (meth) acrylate, (meth) acrylamide, propylene. a compound, a vinyl ether, a vinyl ester, a benzoic acid ester and a butyric acid ester, and in particular comprising a (meth)acrylic acid S?' such as a "alkyl" acrylate or a substituted alkyl group ( Methyl) acrylate (for example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (methyl) Acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, cyclohexyl (meth) acrylate, ethyl hexyl (meth) acrylate, octyl (meth) acrylate, Trioctyl (meth) acrylate, gas-ethyl (meth) acrylate, allyl (meth) acrylate, 2-hydroxy-ethyl (meth) acrylate, 2-propyl propyl (Methyl)propionate, 4-butylbutyl (meth) acrylate 2,2-Dimethyl-3-hydroxy-propyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, tridecyl alcohol propane mono (meth) acrylate, pentaerythritol single (A) Acrylate, benzyl (meth) acrylate, methoxy-benzyl (meth) acrylate, gas benzyl (meth) acrylate, furyl (meth) acrylate, tetrahydrofuran Base (meth) acrylate, phenoxyethyl (meth) acrylate and aryl (meth) acrylate (for example, phenyl (meth) acrylate, tolyl (meth) acrylate vinegar and naphthalene (meth) acrylate); (meth) acrylamide, such as (meth) propyl decylamine, N-homoyl (fluorenyl) acrylamide (this alkyl group contains, for example, ... " 1 ' 1 1 .......... ............. " ~ 1 ........ nm ______ Special paper scale applies to Chinese national standards (CNS) A4 size (210X297 mm) _ _ 1297811 A7 ___ B7 _ V. Invention description (46) (Please read the note on the back and fill out this page) Methyl, Ethyl, Propyl, Butyl, Butyl, heptyl, octyl, ethylhexyl, cyclohexyl, hydroxy-ethyl and benzyl), N-aryl (meth) acrylamide (this aryl group contains, for example, phenyl, toluene , nitrophenyl, naphthyl and hydroxyphenyl), N,N-dialkyl (meth) acrylamide (this alkyl group contains, for example, fluorenyl, ethyl, butyl, isobutyl, Ethylhexyl and cyclohexyl), N,N-diaryl(methyl) acrylamide (this aryl group contains, for example, phenyl), N-methyl-N-phenyl(meth) propylene oxime Amine, N-hydroxyethylmethyl (meth) acrylamide, N-2-ethylhydrazinium ethyl-N-ethyl fluorenyl (methyl) acrylamide, N-(phenyl-continued (M) acrylamide and N-(p-methylphenyl hexanyl) (meth) propyl melamine, a propyl compound such as a propyl propyl ester (eg, alkene) Propyl acetate, allyl hexanoate, allyl octanoate, allyl laurate, octyl palmitate, allyl stearate, allyl benzoate, allylic Ethyl acetate and allyl lactate), and 'propyl oxyethanol, A dilute ether such as an alkylene group (this base contains, for example, hexyl, octyl, decyl, ethylhexyl, methoxyethyl, ethoxyethyl, chloroethyl, 1- Mercapto-2,2-dimethylpropyl, 2-ethylbutyl, hydroxyethyl, hydroxyethoxyethyl, dimethylaminoethyl, diethylaminoethyl, butylamine Ethyl ethyl, benzyl and tetrahydrofurfuryl), and vinyl aryl ether (this aryl group includes, for example, phenyl, tolyl, phenyl, 2,4-di-phenyl, Naphthyl and anthracenyl); vinyl esters, such as, for example, vinyl butyrate, vinyl isobutyrate, vinyl tridecyl acetate, ethenyl diethyl-acetate, ethylene side Acid ester, ethylene hexanoate, vinyl gas-acetate, vinyl diacetate, vinyl methoxy acetate, vinyl butoxy acetate, vinyl phenyl acetate Ester, vinyl B 4S spicy paper scale is applicable to China National Standard (CNS) M specification (21〇><297 public Chu>~49 * 1297811 A7 _B7_ V. Invention description (47) (Please read the notes on the back first) Fill in this page again) Sour vinegar, acetaminophen lactic acid vinegar, ethyl phenyl phenyl succinate, vinyl hexyl sulphate, succinic carboxylic acid vinegar, ethyl sulphate, sulphuric acid benzoate, Ethyl tetrachlorobenzoate, and ethyl women's naphthalate. Benzene women, such as phenylethyl women, hospital-based phenyl women (such as 'methyl benzene, dimethyl styrene, trimethyl styrene, ethyl styrene, diethyl styrene, isopropyl Styrene, butyl styrene, hexyl styrene, cyclohexyl styrene, mercapto styrene, benzyl styrene, gas methyl styrene, trifluoromethyl styrene, ethoxymethyl styrene, And ethoxylated nonylstyrene), alkoxystyrene (for example, methoxystyrene, 4-decyloxy-3-mercaptostyrene, and dimethoxystyrene), and a halogen group Styrene (eg, gas styrene, distyrene, tristyrene, tetrastyrene, pentachlorostyrene, bromostyrene, dibromostyrene, iodine, fluorostyrene, trifluorostyrene) , 2-bromo-4-trifluoromethylstyrene, and 4-fluoro-3-trifluoromethylstyrene); crotonate, such as alkyl crotonate (eg, butyl crotonate) Ester, hexyl crotonate, and glycol monobutyrate; dialkyl itaconate (eg, dimethyl itaconate, diethyl itaconate, and dibutyl) Itaconate); dialkyl maleate or fumarate (for example, dimethyl maleate and dibutyl fumarate); and (meth)acrylonitrile. It is also possible to use homo- or co-polymers of hydroxystyrene or novolac type phenol resins, such as 5-poly(hydroxystyrene) and poly(hydroxystyrene-co-vinylcyclohexanol), novolak resins, Cresol novolac resin, and halogenated varnish resin. More particularly, it comprises, for example, a methacrylic acid copolymer, an acrylic copolymer, an itaconic acid copolymer, a butenoic acid copolymer, a maleic anhydride copolymer, for example, styrene as a co-monomer, and Malay Acid paper size applies to China National Standard (CNS) A4 specification (210X297 public) 1297811 A7 B7 V. Invention description (48) (Please read the note on the back and fill out this page) Copolymer, and partial esterification Maleic acid copolymers, each of which is described, for example, in JP 59-44615-B4 ("JP-B4" is used herein to refer to this patent notice), JP 54- 34327-B4, JP-58-12577-B4, and JP 54-25957-B4, JP 59-53836-A, JP 59-71048-A, JP 60-159743-A, JP 60-258539-A, JP 1 -152449-A, JP 2 垂 199403-A and JP 2-199404-A, and the copolymer can be further reacted with an amine, for example, as disclosed in US Pat. No. 5,650, 263, further, a cellulose derivative having a carboxyl group in a side chain. It can be used, and is particularly preferably a copolymer of benzyl (meth) acrylate and (meth) acrylate and benzoyl (meth) acrylate, ( Copolymers of methyl methacrylate and other monomers are described, for example, in U.S. Patent 4,139,391, JP-A-59-44615-B4, JP 60-159743-A, and JP 60-258539. Regarding the carboxylic acid group in the above organic binder polymer, it is possible to react some or all of the carboxylic acid groups with glycidyl (meth) acrylate or epoxy (meth) acrylate to obtain A photopolymerizable organic adhesive polymer for improving photosensitivity, coating film strength, coating solvent and chemical resistance, and adhesion to a substrate. Examples are disclosed in JP 50-34443-Β4 and JP 50-34444-Β4, US 5,153,095, Τ. Kudo et al., J. Appl. Phys, vol. 37 (1998), pp. 3594-3603, US 5677385 and US 5650233 ° Preferably, the organic polymer binder in the color filter composition comprises an alkali soluble copolymer comprising at least one unsaturated organic acid compound as an addition polymerizable monomer unit, such as propylene Acid, methyl acrylate, etc. It is preferred to use a further comonomer as a polymer binder for unsaturated organic materials. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 1297811 A7 __B7 _ V. Invention description (49 ) (Please first Read the notes on the back and fill out this page.) The vinegar compound is as far as 曱, 曱 丙 丙 细, ethyl (methyl) propyl vinegar, benzoyl (meth) acrylate, phenyl晞, etc., to balance properties such as solubility, adhesion rigidity, chemical resistance, and the like. The organic polymeric binder can be a random copolymer or a block copolymer, for example, as described in U.S. Patent 5,368,976. The weight average molecular weight of the adhesive is preferably from 500 to 200,000, for example, from 2,000 to 150,000, more preferably from 2,000 to 100,000. These compounds may be used singly or in combination of two or more. The content of the adhesive in the photosensitive resin composition is preferably from 10 to 95% by weight, more preferably from 15 to 90% by weight, based on the total solid material. Examples of color filter resists, compositions of such resistants, and processing conditions are shown in J. Appl. Phys. 37 (1998) 3594 by T. Kudo et al.; J. Kudo et al. Photopolym· Sci· Technol·Volume 9 (1996) 109; Κ· Kobayashi's Solid State Technol· 1992, pp. S15-S18; US 5368976; US 5800952; US 5882843; US 5879855; US 5866298; US 5863678; JP 06 -230212-A; EP 320264; JP 09-269410-A; JP 10-221843-A; JP 01-090516-A; JP 10-171119-A; US 5821016; US 5847015; US 5882843; US 5719008; EP 881541 Or EP 902327. The photoinitiator of the present invention can be used as a ruthenium resist, for example, as exemplified above, or a partially or completely substituted known photoinitiator in the resist. Those skilled in the art will appreciate that the use of the photoinitiator of the present invention is not limited to the particular adhesive resins, crosslinkers and compositions of the color filter agents described above, but may also be combined with dyes or pigments or latent colors. Any of the polymerizable components of the mixture are used to form a photosensitive color filter ink or a color filter. 433 paper scales are applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 1297811 A7 ___B7_ V. INSTRUCTION DESCRIPTION (50) The present invention also relates to a color filter comprising the composition according to the present invention. Therefore, the object of the present invention is also a color filter prepared by providing red, green and blue pigments (C〇1〇r elemeiU) and a selective black matrix, both of which comprise a photosensitive resin and are disposed on a transparent substrate. A colorant, and a transparent electrode is provided on the surface of the substrate or on the surface of the color filter layer, wherein the photosensitive resin comprises a polyfunctional acrylate monomer, an organic polymer binder, and a photopolymerization initiator as described above. The monomer and adhesive components and suitable colorants are as described above. In the preparation of the color filter, the transparent electrode layer may be applied to the surface of the transparent substrate or may be provided on the surfaces of the red, green and blue pixels and the black matrix. The transparent substrate is, for example, a glass substrate, which may additionally have an electrode layer on its surface. It is preferred to apply a black matrix between the color regions of different colors to improve the contrast of the color filters. Instead of using a photosensitive composition to form a black matrix and patterning (ie, via a suitable mask), the black photosensitive composition is patterned in a photolithographic pattern to form red, green, and blue regions on the separate transparent substrate. Black pattern, in addition to inorganic black substrate. The inorganic black substrate can be patterned by a suitable image method (for example, using a photolithographic pattern by etching a resist, etching an inorganic layer in an area not protected by the etch resist, and then removing the remaining etch resist) A metal (ie, chromium) film is deposited (ie, sputtered) on a transparent substrate. There are many different ways to know how to apply a black matrix to the steps of the color filter preparation process. It may be applied directly to the transparent substrate before forming the red, green and blue color filters as described above, or may be formed after the red, green and blue pixels are formed on the substrate. ' 1 paper scale applies to Chinese national standards (CNs) A4 specifications (210X297 public Chu) ~ ° 53 : -- (Please read the back of the notes and then fill out this page)

1297811 A7 ---- - B7 V. INSTRUCTIONS (51) (Please read the note on the back and fill out this page.) In the different examples of the color filter of the LCD, according to US 5626796, the black matrix can also be It is applied to a substrate relative to a substrate carrying a negative filter element, which is separated by a liquid crystal layer. The right transparent electrode layer is deposited after coating the red, green and blue coloring elements and the selective black matrix, and an additional protective film as a protective layer may be applied to the color filter layer before depositing the electrode layer, for example, Us 565〇263. It will be apparent to those skilled in the art that the photosensitive compositions of the present invention can be used to produce red, green and blue pixels and black matrices for the preparation of color filters regardless of the processing differences described above. The difference between the additional layers that can be applied and the color filter design. The formation of color elements using the compositions according to the invention should not be limited by the different designs and methods of preparation of such color filters. Further, in the color filter, the total solid component of each color may contain an ionic impurity scavenger, for example, an organic compound having an epoxy group. The concentration of the ionic impurity scavenger in the total solid component is generally in the range of from 1% by weight to 1% by weight. Examples of color filters, particularly those relating to the above-described coloring materials and ionic impurity scavengers, are shown in Ep 32 264. It will be appreciated that within the color filter composition described in EP 320264, a photoinitiator in accordance with the present invention can be substituted for the triazine starter compound. The composition according to the present invention may additionally comprise a crosslinker activated by an acid (for example, as described in JP 10 221 843-A) and a compound which generates an acid by heat or by actinic radiation and activates crosslinking. The composition according to the present invention may also comprise a latent colorant which is converted into an excellently dispersed color during heat treatment of the latent colorant containing the photosensitive pattern or coating. Heat treatment can be used after exposure or with a colorant that can form a light image. 4S paper size applies to Chinese national standard (cnS) M specification (210X297 mm) 1297811 A7 -------— _________B7 V. Description of invention (52) "_~"" One~ - After the film is implemented. The latent colorant is a soluble colorant f, which can be converted by, for example, the chemical, &, photolysis or light-induced method described in US Pat. No. 5,879,855 (please read the back note and then fill out this page). Insoluble color. The conversion of the latent colorant can be promoted by adding a compound which generates an acid upon exposure to actinic exposure or by "adding an acidic compound to the composition. Therefore, a color filter resist can also be prepared, which is in the composition according to the present invention. The photosensitive composition of the present invention can be suitably used to form a color filter, but is not limited to this application. The photosensitive composition according to the present invention can be further used for preparing a separator which controls the inside of the liquid crystal display panel. The component gap of the liquid crystal portion. Because the nature of the light transmitted or reacted through the liquid crystal layer in the liquid crystal display depends on the element gap, the thickness correctness and uniformity on the pixel array are important parameters for the performance of the liquid crystal display unit. In the liquid crystal element, the spacing between the substrates in the element is maintained by the sparsely distributed glass or polymer spheres having a diameter of about several micrometers as a spacer between the substrates. The spacers are thus held between the substrates to make the base The distance between the materials is kept constant. This distance is determined by the diameter of the spacers. These spacers ensure a minimum separation between the substrates, ie, they avoid the basis. The distance between the two is reduced. However, it cannot avoid the distance between the substrates being separated from each other, that is, the distance between the substrates. In addition, the method of separating the spheres has the uniformity of the diameter of the divided spheres and the separating spheres on the panel. The difficulty of dispersing the average sentence and the unevenness of one bit and the brightness and/or optical aperture (depending on the position of the spacer on the pixel array area). The liquid crystal display with large image display area has recently attracted more attention. However, the increase in the area of the liquid crystal cell generally produces deformation of the substrate constituting the unit. Liquid crystal-----~~1 "- 1 ·-55___ 43 The paper scale applies to the Chinese National Standard (CNS) A4 specification ( 210X297 公董) ° · Ϊ297811 A7 ~^ ----- B7___ V. Description of the invention (53) The layer structure is easily destroyed by the deformation of the substrate. Therefore, even if the spacer is used to keep the interval between the substrates fixed A liquid crystal display having a large image display area is difficult to implement due to interference of the display. Instead of using the above-described split ball dispersion method, a method of forming a column as a spacer in the element gap is In this method, a resin tube column is formed as a spacer in a region between the pixel array region and the counter electrode to form a specified element gap. Photosensitive materials having adhesive properties of photolithography are conventionally used, for example, The method of preparing the color filter is freely controllable by the position, number and height of the spacers, which is advantageous compared to the conventional method using the spacer ball. In the color liquid crystal display panel, the spacers are It is formed in the non-image area under the black matrix of the color filter element. Therefore, the spacer formed by using the photosensitive composition does not reduce the brightness and the optical aperture. It is used to manufacture the photosensitive layer for the color filter and the spacer. The composition of the present invention is disclosed in Jp 11-174459-A and JP 11-174464-A. As described in the literature, the photosensitive composition, the liquid, and the dry film photoresist are at least an acid-soluble polymer, a radically polymerizable monomer, and a radical initiator. In some cases, thermally crosslinkable components such as epoxides and buffer acids may be additionally included. The step of forming the spacer using the photosensitive composition is as follows: The photosensitive composition is applied to a substrate (e.g., a color filter panel) and exposed to the mask after the substrate is pre-baked. The substrate is then developed with a developer and patterned to form the desired spacer. When the composition contains certain thermosetting components, in general, post-baking is carried out to thermally cure the composition. The photocurable composition according to the present invention is suitable for manufacturing today due to its high sensitivity. The paper size is applicable to the Chinese National Standard (CNS) Μ specification (210X297 mm) (please read the precautions on the back) Fill in this page)

1297811 A7 ______ B7 V. INSTRUCTIONS (54) Separators for liquid crystal displays (described above). The photosensitive composition according to the present invention is also suitable for the preparation of a liquid crystal display (more particularly, a reflective liquid crystal display comprising an active matrix type display having a thin film transistor (TFT) as a switching element and a pure matrix type having no switching elements) An insulating layer or dielectric layer between the layers. In recent years, liquid crystal displays have been widely used for their small thickness and light weight, for example, pocket type television sets and communication terminal devices. A reflective liquid crystal display that does not require the use of a back light is particularly desirable because it is extremely thin and lightweight, and it can significantly reduce power consumption. However, even if the back light is removed from the transmission type color liquid crystal display used today and the light reflection plate is added to the lower surface of the display, it is problematic due to the inefficient use of light, and it is impossible to have practical brightness. As a solution to this problem, various reflective liquid crystal displays have been proposed to promote the efficiency of using light. For example, a reflective liquid crystal display is designed to include a reflective pixel electrode. The reflective liquid crystal display comprises an insulating substrate and an opposite substrate to which the insulating substrate is opened. The space between the substrates is filled with liquid crystal. The gate electrode is formed on the insulating substrate, and the gate electrode and the insulating substrate are covered with a gate film. Then, a semiconductor layer is formed on the gate insulating film on the gate electrode. The source electrode and the drain electrode are also formed on the gate insulating film in contact with the semiconductor layer. The source electrode, the drain electrode, the semiconductor layer, and the gate electrode cooperate with each other to constitute a bottom gate type TFT as a switching element. An interlayer insulating film is formed which covers the source electrode, the drain electrode, the semiconductor layer, and the gate insulating film therebetween. Contact holes are formed throughout the interlayer insulating film on the drain electrode. A pixel electrode made of aluminum is formed on the interlayer insulating film and on the inner side wall of the contact hole. The drain electrode of the TFT is finally passed through the layer. * (4) The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 public interest) 57 (Please read the note on the back and fill in this page)

1297811

DESCRIPTION OF THE INVENTION (Please read the precautions on the back and fill out this page.) The insulating film is in contact with the pixel electrode. The interlayer insulating layer is generally designed to have a roughened surface, whereby the pixel electrode can function as a reflecting plate that diffuses the light to obtain a wider viewing angle (visible angle). With the pixel electrode as a light reflecting plate, the reflective liquid crystal display significantly promotes the efficiency of using light. In the above reflective liquid crystal display, the interlayer insulating film is designed to have convex portions and concave portions by photolithography. In order to form and control the convex and concave portions of the micron-scale fine shape of the surface roughness and to form contact holes, a photolithography method using positive and negative photoresists is used. The compositions according to the invention are particularly suitable for such resists.

I. The photosensitive composition according to the present invention is also suitable for fabricating an array of microscope sheets for liquid crystal display panels, image sensors, and the like. A passive optical component of a microscope microscope that is placed on an active optoelectronic device such as a detector, display, and illumination device (light-emitting diode, lateral and vertical chamber laser) to improve its optical input and output. Quality. The application area is broad and covers areas such as electricity #, information technology, audiovisual services, solar cells, detectors, solid state light sources and optical interconnects. Today's optical systems use a variety of different techniques to achieve efficient coupling between microscope and micro-optics. An array of microscopes is used to focus illumination light onto a pixel area of a non-emissive display device, such as a liquid crystal display device, to increase display brightness for concentrating incident light or as a line for, for example, a facsimile machine or the like. An image forming device on the photoelectric conversion area of the image sensor to improve the sensitivity of the device and to form a printed image on a photosensitive device for a liquid crystal printer or a light emitting diode (LED) printer Imagery. The most common application is to improve the solid-state image sensing device (such as the Chinese National Standard (CNS) A4 specification (210X297 mm) for the size of the paper size. 1297811 A7 - ____B7_ V. Invention Description (56) " Charge Coupling Device (CCD)) The efficiency of the photodetector array. For the detector array, as much as possible of the collection of light per detector element or pixel is required. If a microscope sheet is placed on top of each pixel, the lens collects incident light and concentrates it on an active area that is smaller than the lens size. According to the prior art, the microscope array can be manufactured by various methods; (1) A method for obtaining a convex lens sheet, wherein the lens pattern of the planar structure is drawn on a thermoplastic resin by a conventional photolithography technique, and then a thermoplastic resin It is heated to a temperature south of the softening point of the resin to make it fluid, thereby causing depression at the edge of the pattern (so-called 'return,') (see, for example,

JP 60-38989-A, JP 60-165623-A, JP 61-67003-A and JP 2000-39503-A). In this method, the thermoplastic resin used is photosensitive, and the lens pattern can be obtained by exposing the resin. (2) A method of forming a convex lens based on the following phenomenon: When a photosensitive resin is exposed in a desired pattern by using a aligner, unreacted monomers are moved from an unexposed area to an exposed area, causing the exposed area to expand (see For example, 曰 应用 Applied Physics Association Microscopy Research Group Journal, Optics Workshop, Volume 5, No. 2, pp. 118-123 (1987) and Volume 6, No. 2, pp. 87-92 (1988)). On the upper surface of the support substrate, a photosensitive resin layer is formed. Thereafter, the surface of the photosensitive resin layer is irradiated with light such as a mercury lamp by using an individual mask, and thus the photosensitive resin layer is exposed. Therefore, the exposed portion of the photosensitive resin layer is expanded into a convex lens shape to form a light collecting layer having a plurality of microlenses. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the notes on the back and fill the page)

1297811 A7 B7 V. INSTRUCTIONS (57) (Please read the notes on the back and fill out this page) (3) A method of obtaining a convex lens in which a photosensitive resin is exposed by a near exposure technique in which the photomask is not in contact with the resin. In order to cause blurring of the edge of the pattern, the amount of photochemical reaction product is distributed according to the ambiguity of the edge of the pattern (see, for example, JP 61-153602-A). (4) A method of producing a lens effect in which a photosensitive resin is exposed to light of a specific intensity distribution to form a refractive index distribution pattern depending on light intensity (see, for example, JP 60-72927-A and JP 60-166946-A) ). The photosensitive composition according to the present invention can be used in any of the above methods to form a microscope sheet using a photocurable resin composition. A special type of technique focuses on forming a microscope sheet in a thermoplastic resin such as a photoresist. An example is disclosed in Popovic et al., SPIE 898, pp. 23-25 (1988). This technique (referred to as reflow technique) involves the steps of defining a lens trace within a thermoplastic resin such as photolithography by, for example, photolithography, and thereafter heating the material above it. Reflow temperature. The surface tension causes the photoresist island to be stretched into a spherical cap having a volume equal to the original island before reflow. This cap is a plano-convex lens. The advantage of this technology is the simplicity, reproducibility and possibility of direct integration on top of the illuminating or photodetecting optoelectronic device. In some cases, the protective layer is formed on the patterned lens unit which has a rectangular shape prior to reflow to avoid blurring of the resin islands in the middle without returning to a spherical cap in the reflow step. This protective layer acts as a permanent protective layer. The coating layer is also made of a photosensitive composition. The active energy ray curable composition used to form the cross-section of such lenses is required to have a variety of properties including adhesion to a transparent substrate and appropriate optical properties. A _ ^0 - This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) 1297811 A7 B7 V. Invention description (58) (Please read the note on the back and fill out this page) Lenses with certain photoresists are not desirable for certain applications because of the low optical transmission in the blue end of the optical spectrum. Since the photocurable composition according to the present invention has low yellowing properties (in thermal and photochemical), it is suitable for preparing a microlens array as described above. The novel radiation-sensitive compositions are also suitable for use in photolithography steps of plasma display panel (PDP) preparation methods, particularly barrier ribs, phosphor layers, and image formation methods for electrodes. A PDP is a flat panel display that emits light and emits images and information. Two types, namely, a DC (direct current) type and an AC (alternating current) type, are known by panel construction and operation methods. For example, the principle of a DC-type color PDP is briefly explained. In the DC type color PDP, the space between the two transparent substrates (the general glass plate) is divided into a plurality of minute cells by the lattice barrier ribs placed between the transparent substrates. In individual units, the exhaust gas (such as He or Xe) is sealed. A phosphor layer is formed on the wall behind each unit, which emits three main colors of visible light when excited by ultraviolet rays generated by exhaust gas discharge. On the inner surface of the two substrates, the electrode systems are placed opposite each other across the relevant units. Typically, the cathode system is formed from a film of a transparent electrically conductive material such as NESA glass. When a voltage is applied between the electrodes formed on the front wall and the rear wall, the discharge gas sealed in the cells induces plasma discharge, and causes ultraviolet, blue, and green fluorescent elements to emit light by ultraviolet radiation. And the display produces an image. In the full color display system, a plurality of the above three fluorescent elements of the three main colors of red, blue and green combine to form a pixel. The cells in the DC-type PDP are separated by the lattice barrier ribs of the crystal lattice, and in the AC-type PDP, the paper size is arranged in parallel with each other on the substrate surface, and the Chinese National Standard (CNS) Μ specification is applied ( 210X297 mm) 1297811 A7 B7 V. Description of invention (59) Segmentation of barrier ribs. In either case, the units are separated by barrier ribs. These barrier ribs are used to limit illumination to the fixed area to eliminate false emissions or crosstalk between adjacent discharge units and to ensure an ideal display. The use of one or more layers of materials for monochrome or multi-color image recording or image reproduction (copying, reproduction) has also been found in accordance with the compositions of the present invention. Again, these materials are suitable for color verification systems. In this technique, a composition containing a microcapsule can be applied, and for image formation, heat treatment can be applied after radiation curing. Such systems and techniques and their applications are disclosed, for example, in US 5,376,459. The composition of the present invention is also suitable for forming a composition of a photo-formable pattern of a dielectric layer of a multilayer circuit board fabricated by a sequential assembly method and for preparing a solder mask. Accordingly, the invention is also directed to the inclusion of a photoresist according to the invention. Accordingly, the object of the present invention is also a solder resist comprising the composition as described above. A method of forming an image, for example, a method of preparing a solder mask comprising: (1) a component of the composition as described above is mixed (2) and a composition formed is applied to a substrate ("substrate Coating") (3) The solvent (if present) is evaporated at elevated temperatures (eg, between 80-90 ° C); (4) the coated substrate is exposed to electromagnetic radiation via a negative mask (by (According to the initial acrylate) (5) The sample to be irradiated is washed with an aqueous alkaline solution and thereby removed. j This paper scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the back first) Note: Please fill in this page) ^—62 -=- 1297811 A7 -------— _ B7_ V. Invention Description " —~~ Developed without curing area (6) Sample is thermally cured, for example At a temperature of about 5 〇〇c, the crosslinking between the citric acid and the epoxy component is initiated. This method is another object of the present invention. Another object of the present invention is a process for polymerizing a compound containing an ethylenically unsaturated double bond, which comprises electrophoresis in the range of from 190 to 600 nm or starting with a composition as described above by electron beam or X-ray. A further object of the present invention is to prepare colored and uncolored paints and varnishes, powder coatings, fiber coatings, printing inks, printing plates, adhesives, dental compositions, electronic products using the compositions according to the present invention. Photoresist, such as a plating resist, an etch resist, a liquid and a dried film, a solder resist, for preparing a color filter for various display applications or for producing an electrodisplay panel, an electroluminescent display, and A resisting agent for a structure in a method for preparing an LCD, a color filter material, a composite composition, a packaged electrical component, and a component of an electronic component for manufacturing a magnetic recording material, a micromechanical component, a waveguide, an optical switch, and a plating cover Cover, etch mask, color verification system, fiberglass cable coating, screen printing printing stencil for three-dimensional object fabrication by stereolithography, and as an image recording material, especially for holographic recording , microelectronic circuits, decolorizing materials, decolorizing materials for image recording materials, image recording materials for microcapsules, ultraviolet light and visible A photoresist material for a light laser direct imaging system and a photoresist material as a dielectric layer for forming a sequential buildup layer of a printed circuit board, and a method of preparing a material as described above. Another object of the present invention is a coated substrate which is suitable for at least 34 paper scales in accordance with the Chinese National Standard (CNS) A4 specification (210X297 public 63: --- (please read the back note before refilling) Wo's page), ^τ— 1297811

(1) (2) A composition according to the present invention is coated on the surface, and a method of producing a relief image by photographing the substrate (4), and then the unexposed portion is removed by the developer. The following examples illustrate the invention in a more detailed manner. Unless otherwise indicated, the parts and percentages are based on the rest of the description and the scope of the patent application. If an alkyl group having more than three carbon atoms is referred to without mentioning any particular isomer, it means a normal isomer in each case. The following photoinitiators are used in the examples: • N(CH3)2 卬3 n (〇4 (please read the notes on the back and fill out this page) •, (3) -c_ H2 N(CH3)2 • C_ Ha ?H' CH. (4)

CnhQ^-Bu s2~0^h5 n(ch32)2 Preparation of urethane (benzyl methacrylate-co-methacrylic acid) 24 g of benzyl methacrylate, 6 g of methacrylic acid and hydrazine. 525 grams of azobisisobutyronitrile (AIBN) was dissolved in 90 ml of propylene glycol monomethyl ether 2-acetate (PGMEA). The resulting reaction mixture was placed in a 8 (rc preheated oil bath. After stirring at 80 ° C for 5 hours under nitrogen, the resulting viscous solution was cooled to room temperature and used without further purification. The paper scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 1297811 A7B7 62 V. Description of the invention (body content is about 25%. Benzyl methacrylate: methacrylic acid ratio is 80:20 (by weight) Example 2 developability test of red resist agent 160.0 parts by weight of the copolymer of benzyl methacrylate and methyl methacrylate according to Example 1 40.0 parts by weight 40.0 parts by weight 360.0 parts by weight (please read the back Precautions on this page) bis, pentaerythritol hexaacrylate (DPHA), supplied by UCB Chemicals, IRGAPHOR RED BT-CG (red pigment, supplied by Ciba Specialty Chemicals)

PGMEA This red resist dispersion was prepared by mixing the above components and dispersing using a Paint regulator (SKANDEX). For this dispersion, the photoinitiator to be tested is added. The colored resist was applied to an aluminum substrate by an electric applicator having a wire wound bar. The coated substrate was dried at 80 ° C for 10 minutes. The dried film thickness is about 2/zm. The resist was developed with a 1% aqueous sodium carbonate solution at 30 ° C and using a spray type developer (Walter Lemmen, Model T21). The development time, which is the time at which the resist is completely removed by development, is determined. The lower the value, the more suitable the composition. The photoinitiator used and the results were collected in Table 1. Table 1: Development time of red resists Photoinitiator concentration [parts by weight] Development time [seconds] None - 80 (1) 2.4 115 (1) 6.0 115 (2) 2.4 115 (2) 6.0 120 (3) 2.4 90 (3 6.0 90 (4) 2.4 95 (4) 6.0 100 Example 3 Sensitivity Test Paper Scale Applicable to China National Standard (CNS) ΜSpecification (210X297 mm) 1297811 A7 B7 V. Description of Invention (63) Photocurable Composition Made by mixing the following components: 100.0 parts by weight of acrylated propylene copolymer (ACA200M, supplied by Daicel Industries, Ltd., solid content 50% by weight)

7.5 parts by weight of pentaerythritol hexaacrylate (DPHA), UCB

Chemicals supplied) 50.0 parts by weight of PGMEA, and the photoinitiator to be measured in the amount shown in Table 2 The photoinitiator to be tested was added to the above composition and mixed. The composition was applied to an aluminum plate using an electric applicator with a wire wound bar. The solvent was removed by heating at 80 ° C for 15 minutes in a convection oven. The thickness of the dried film is about 5 // m. In this coating, an acetate film was coated with a standardized test negative film of different optical densities of 21 stages (Stouffei: class wedge). The sample was covered with a second ultraviolet transparent film and pressed onto the metal plate by vacuum. An interference filter was placed on top to select a wavelength of 405 nm. The exposure was performed using a 250 W overpressure mercury lamp (USHIO, USH-250BY) and at a distance of 15 cm. The total exposure dose on the negative film was measured (measured by an optical dynamometer (0RC ultraviolet measurement UV-M02 type with UV-42 detector) of 4000 mJ/cm2. After the exposure, the exposed film was developed with a 1% sodium carbonate aqueous solution at 30 ° C for 1 minute by using a spray type developing device (Walter Lemmen, Model T21). The sensitivity of the starting agent system is described by the indicated maximum number of stages that are retained (i.e., polymerized) after development. The higher the class number, the more sensitive the system being tested. The photoinitiator and test results are shown in Table 2. 5S7 paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) (please read the note on the back and fill in this page) - 口. :线丨1297811 A7 _B7 V. Invention description (64) Table 2 : Sensitivity test result Photoinitiator concentration [parts by weight] 4000J/cm2 Class number after exposure (7) 7.5 3 (7) 11.0 5 (7) 15.0 5 (2) 20.0 7 (4) 7.5 3 (4) 11.0 5 (4) 15.0 5 (4) 20.0 6 (Please read the notes on the back and fill in the nest page) „ -----=~fff~- ]&^ The paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm)

Claims (1)

1297811 95· 12· 13 Rev. 6, Patent Application No. 91116617 Patent Re-examination Patent Application Revision Amendment Date: December 1995 1. A photosensitive composition comprising: (Α) oligomer or polymer, a molecule having at least one acid group in the molecule and having a molecular weight of 200,000 or less; (Β) at least one photoinitiator compound of formula I Wherein R 1 is a linear or branched C 1 -C 12 alkyl group; R 2 is a linear or branched CKC 4 alkyl group; R 3 and R 4 are each a linear or branched Ci-Cs alkyl group; and (C) monomer An oligomeric or polymeric compound having at least one dilute hydrocarbon double bond. 2. The photosensitive composition of claim 1, wherein the compound of the formula I, Ri is linear or branched CkCa alkyl, R2 is methyl, ethyl or propyl, and R3 and heart are each other A linear or branched Cl-C4 alkyl group. 3. The photosensitive composition of claim 1, wherein the compound of the formula I is 1-[4-morpholinophenyl]-2-dimethylamino-2-(4-methylphenyl) Butyl-1-butanone, 1-[4-morphinylphenyl]-2-dimethylamino-2-(4-ethylbenzyl)-butane-1-one, ι -[4.morpholinophenyldimethylamino-2-(4-isopropylbenzyl)-butanone, ι_[4_morphine-phenyl]-2-dimethylamino -2-(4-n-propylbenzyl)-butane-ΐ-g, 68 1297811 VI. Patent Application Marlene Phenyl]-2-dimethylamino-2-[4-(2 -mercaptopropyl)-phenylhydrazinyl]-butane-1-one, 1-[4-morpholinophenyl]-2-dimethylamino-2-(4-n-butylbenzyl) - Butadiene-1. Ketone. 4. The photosensitive composition of claim 1, wherein 'the component (A) has a molecular weight of 2, 〇〇〇-15〇, 〇〇〇. 5. The photosensitive composition of claim 1, wherein in addition to the components (A), (8) and (C), at least one sensitizer compound is included (magic. 6. sensitizing according to claim 1 of the patent scope) a composition comprising, in addition to the components (a), (b) and (C), at least one compound having an epoxy group as the thermosetting component (F). 7. The photosensitive composition of claim 1 Further, in addition to the components (a), (b) and (C), at least one ultraviolet absorber or light stabilizer compound (G3) is additionally contained. 8. The photosensitive composition of claim 1 of the patent scope further The additive (G) is selected from the group consisting of inorganic fillers, colorants, dispersants, thermal polymerization inhibitors, thickeners, anti-foaming agents and leveling agents. A photosensitive composition comprising 0. 015 to 1 part by weight (based on 100 parts by weight of the component (Α)) of a photoinitiator (Β). A method of unsaturated double bond compound comprising electromagnetic radiation at 190 to 600 nm or electron beam or χ The illuminating composition according to any one of the above-mentioned claims, the sensitizing composition of any one of the above-mentioned patents. And uncolored paints and varnishes, powder coatings, fiber coatings, printing inks, printing plates, adhesives, dental compositions, photoresists for electronic products, plating resists, etch resists, liquids and Dry film, solder resist, for preparing color filter for various display applications or for forming a structure of a plasma display panel, an electroluminescent display, and a method for preparing an LCD, a color filter material, a composite composition As a component of packaged electrical components and electronic components for the manufacture of magnetic recording materials, micromechanical parts, waveguides, optical switches, plated masks, etched masks, color verification systems, fiberglass cable coatings Screen printing printing stencil for preparing three-dimensional objects by stereolithography, and as an image recording material for holographic recording, microelectronic circuits, decolorizing materials, a decolorizing material for image recording materials, an image recording material for using a microcapsule, a photoresist material for a direct ultraviolet light and visible light laser image system, and a photoresist for a dielectric layer for forming a sequential buildup layer of a printed circuit board 12. A coated substrate attached to at least one surface to be coated with a photosensitive composition as in claim 1 of the patent application. 13. A method of photographic preparation of a relief image, wherein the patent application scope The coated substrate of item 2 is subjected to imagewise exposure, and then the unexposed portion is removed by the developer. 14. A photoresist comprising the photosensitive composition as claimed in the scope of the patent application. A color filter, comprising a photosensitive group 1297811 as claimed in the scope of the patent application. 16. A color filter by providing red, green and blue pixels and a black matrix (all comprising a photosensitive resin and a colorant) on a transparent substrate and on: a substrate or a surface of the color filter layer It is prepared by providing a transparent electrode comprising a polyfunctional acrylic acid acrylate monomer, an organic polymer adhesive X agent, and a chemical k-photopolymerization initiator as in the photosensitive composition of claim 1 of the patent application.