TWI288963B - Holder device for plated substance in physical vapor deposition sputtering machine - Google Patents

Abstract

The invention provides a holder device for plated substance in physical vapor deposition sputtering machine. The holder device is installed in the interior of a sputtering machine for holding the plated substance. It comprises a transmission mechanism and a fastening mechanism. The transmission mechanism has a stationary shaft and a transmission component connected with the stationary shaft. The fastening mechanism has a revolving spindle non-parallelly installed with the stationary shaft of transmission mechanism, a supporting arm for holding the revolving spindle, and a turntable component to drive the revolving spindle and the supporting arm to perform the rotating motion around the transmission mechanism. Both ends of the revolving spindle are connected with a rotating component and a fixed stand separately. It can produce slanted rotation for the fixed stand by rotating the transmission component and the rotating component cooperatively. It can sputter the nano-ions uniformly and continuously onto the surface of plated substance. It can increase the surface hardness and the mechanical properties such as wear-resistance of the plated substance and extend the service life.

Description

1288963

BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a physical gas holding device, and more particularly to a vapor deposition machine. The solid part of the deposition of the deposition vaporizer is used for solidifying the object to be plated. [Prior Art] At present, the vapor deposi coating is applied on the surface treatment to increase the life, and how the surface of the plating has become the conventional one. The physical public country patent announcement shall include a fixed shaft, which is used for the slewing movement (Sputtering). However, it is used in the actual use of upright rotation, rice ions, and this jewelry, tableware, knife 'has A large number of use of the material, PVD) to the heat of the object, such nano-Ion to significantly increase the industry's related people vapor deposition vaporizer 5 1 2 1 81 revealed the fixed axis and most parallel rotation Above the shaft, the plating is inserted and held, and the nano ions that are also self-rotating are known to have physical vapor deposition. The following physical vapor deposition tools, tools, and molds are used to make the substrate. Vapor deposition (physica-coated surface for nano-resistance, surface hardness, and continuous uniformity of slope mechanical properties and prolonged use of the object to be studied Positioning, 'where the object to be plated is fixed on the fixed shaft and is provided with a tapered fixing seat thereon, and the fixing seat is moved around, so that the sputtering target is covered on the surface of the object to be plated. The mineralizer is held by the minerals. Because the vapor deposition temperature of the fixed coating process is low in a discontinuous manner, the ion length of the element 1 is not covered by the main axis of the Chinese device. Hit. The device, the pedestal is covered with expansion

Page 5 1288963 V. Description of invention (2)

The effect of the combination of the dispersion causes the coating thickness of the object to be plated to be uneven and the bonding property is poor. In addition, for the elongated or slightly larger objects to be plated, the objects to be plated will be shielded from each other, and the ionic particles are caused. It causes undesirable phenomena such as uneven adhesion; in addition, since the nano-ion is dropped downward in a parabolic manner, the ions in the upper region of the bonded object are adsorbed (A ds 0 rpti 〇n), while the lower portion is only The thickness of the coating layer is very uneven, and the thickness of the coating layer forming the object to be plated is seriously uneven. Moreover, since the fixing base rotates around the fixed axis, it also rotates by itself, thus making the structure of the holding device quite complicated. 'And the manufacturing costs can not be effectively reduced. Therefore, the inventor has felt the above problems and years of experience in the industry, and focused on the problems that can be improved. He is concentrating on research and practical application. In the spirit of excellence, he finally proposes a reasonable and effective design. The present invention is the above problem. SUMMARY OF THE INVENTION The main object of the present invention is to provide a physical vapor deposition deposition apparatus for a substrate holding device, a pothole brake field m~I shell...敕#,, into ^ Eight series use the fixed axis and the rotating axis are non-parallel 5 and set 'and 々 々 固 固 # # # # # # # # # # # # # # # # # # # AU AU AU AU AU AU AU AU AU AU AU AU AU AU AU AU AU AU It is evenly coated on the surface of the mineral, ^ ^ , ^ ^ , to increase the mechanical properties such as surface hardness and wear resistance of the material and prolong the service life. For the above purpose, the present invention is a plating object holding device of the plating machine, and the holding device is placed at a position of a metal for holding the mineral, and the inside of the machine is equipped with a transmission mechanism. , having a fixed shaft and a transmission connected to the fixed shaft

1288963 V. INSTRUCTIONS (3) Components; and row configuration, with - fixed station with the transmission mechanism: ί 择 择 择 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 绕 — — — — — — — — — — — — - Fixed: The disc member is used in the transfer to achieve the above purpose. The pressure produces a slanting Φ [Embodiment] The features and technical contents of the present invention are shown in the accompanying drawings, and the accompanying drawings are only provided; ~ ° Brother, the use of the examples shown in the first, second and third diagrams of the Ming and Qing dynasty to apply to the combination of the steamer,; the mineral holding device of the first-deposited steamer, Solid; kind of 乂 气相 气相 内部 内部 , , , , 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 根 内部 内部 内部 内部 内部 内部 内部 内部The mechanism 1 2, wherein: the person right: 2 mechanism 11 is fixed on the inner top surface of the vapor deposition machine, and the package 2 is fixed by m11. 1 and a transmission element 112 connected to the fixed shaft 111, Γ ^ ^ 糸The longitudinal direction is vertically disposed, and the transmission element 112 can be a component or device that provides rotation, such as a helical gear or a tapered cone. The fixing mechanism 12 includes a rotating shaft 121 disposed non-parallel to the fixed shaft lu of the transmission mechanism u, and a supporting arm for holding the rotating shaft 121.

Page 7 1288963 V. Description of the Invention (4) A "--- 122 and a rotating rotating shaft 121 and the branch arm 122 are rotated around the transmission mechanism ,, the rotating rotating plate member 123; the rotating shaft 121 and The angle within the fixed axis ηι is between 5. ~90. Between, where the inner corner is at 15. ~ ";; two good, the two ends of the rotating shaft 1 2 1 are respectively connected to a rotating member 1 2 4 and a fixed seat 125 ^, the rotating member 124 is coupled with the transmission member 112 to rotate the solid The socket 1 2 5 is capable of producing a tilting rotational motion, and the rotating member 14 can also be a component or device that provides rotation, such as a helical gear or a tapered cone. ^ The fixed seat 25 (as shown in the third figure) The chassis 1251 includes a chassis 1251, a first insertion tray 1252, a second insertion tray 1253, and a ring body 1254. The center of the chassis 1 2 5 is interlocked with the rotating shaft 1 2 1 and is respectively disposed above the chassis There is a first insert 丨252 and a second insert 1 2 53, and the ring body 1 2 54 is around the outer periphery of the chassis 1251, the first insert 1252 and the second insert 1253, and is mounted on the chassis 1251. A space 丨 2 5 5 is formed between the first platter 1252 and the first platter 1252 and the second platter 1 2 5 3 . The first platter 1 2 5 2 and the second platter are respectively formed. 1 2 5 3 is respectively provided with a plurality of insertion holes 1 2 5 6 and 1256 ' and the insertion holes 1256 and 1256 of the insertion holes 1252 and 1253 are correspondingly arranged. It can be firmly inserted into the 'plug holes 1256, 1256' of the fixed socket 1 2 5 . Further, a plurality of perforations 1 2 57 , 1 2 5 7 are respectively opened on the chassis 1251 and the ring body 1254. In order to improve the process quality of the object to be plated, the plate member 123 is composed of a circular turntable 1231 and a rotating shaft 1 232 connected to the bottom of the turntable 1231. Constructed at the periphery of the turntable 1231

Page 8 Ϊ288963

: There is a support arm i22, and the rotating shaft 1 232 is connected to the 薏 (not shown in the figure, and is electrically connected to a bias power supply, ^ Temple drive installer, invention instructions (5) can be used when milling Knife, drill bit (needle) or 1 he: inserting size knife tool and other objects are inserted and fixed in the fixed; different shapes, with arc power supply 3, splash, and the g 鳗 inlet 6 and gas extraction Device 7, the arc: clothing 5, rolling arc grab 31, and the ion device 5 is transmitted as - 'j', heart 'state 3 connected with a device 7 is a - pump, two or two m other gas is extracted... Between the use of the ion device 5 to shoot out = wash = to, the arc grab 31 to the nano-ion from the splash money 4 to throw away: / set a 5: auxiliary, after the arc operation #顺芸太^: do _ The smaller the refinement of the person, and the fixed seat 1 2 5 is tilted and rotated in the direction of the drop so that the 4 non-ion ions are evenly and continuously coated on the surface of the object to be plated, the most Then, the nitrogen and carbon gases are introduced from the gas inlet 6, and the plating can be completed by the application. 杳 Please refer to the fourth and fifth figures, respectively, which are the fixed seats of the present invention. The fixed embodiment and the further embodiment of the combination of the cross-sectional view, in addition to the type of the above embodiment, the fixed seat 25 can be a chassis 1251, a topless than the chassis 1251 a plug 1252 and a ring body 1 254 disposed around the outer periphery of the chassis 1251 and the first insert 1 252, at the bottom i 1 2 5 1 , the first insert 1 2 5 2 and the ring body 1 2 5 4 is formed with a space 1 255, and a plurality of insertion holes 1 2 56 are disposed on the first tray 1 252, and the

Page 9 1288963 V. Description of the Invention (6) The chassis 1251 is provided with a plurality of perforations 1 257, and a plurality of grooves 1 2 58 are respectively associated with the respective insertion holes 1 2 5 6 Corresponding settings, so that the object to be plated is fixed (as shown in the fourth figure). Further, for various objects of different shapes or sizes, a plurality of protrusions 1 259 and a perforation 1 257 may be directly extended on the chassis 1 251, and the protrusions 1 259 are provided with holes. Connected by money object (as shown in the fifth figure).

Referring to the sixth figure, the combination diagram of the keying machine, in addition to the single-group setting of the present invention, may also be rotated by the plurality of fixing mechanisms 12 at equal intervals, and each of the fixings is in operation. The force balance and the physical vapor deposition steaming of the present invention can improve various disadvantages of the conventional use, and the seat system rotates in a slanting manner, and can be smoothly dropped and placed on the surface of the object to be coated to make the coating thickness of the object to be plated uniform and the device The structure is simple, and the manufacturing cost is low. The holding device of the present invention is not affected by the extensive use of the iron material, and the use of the present invention has not been seen in the same kind of production. In the various publications, the second embodiment of the present invention is fully applicable to the steaming fastening mechanism 12, which may be constituted by the above-mentioned implementation group fixing mechanism 12, and each of the installations 'is entangled around the transmission mechanism. 125 produces a rotational motion to increase production speed. The object holding device of the plating machine not only has the following advantages: the nanometer ion is covered in a continuous manner to support the nano-ion parabolic method, and the bonding property is good; in addition, the invention is inexpensive and maintenance The aspect is also quite easy; it is limited to different shapes, configurations, dimensions and scope of application. The physical properties of the physical vapor deposition vapor deposition machine, the novelty and the advancement of the product, and the public use of the product, the patent application requirements are not seen before the application.

Page 10 129896. V. OBJECTS OF THE INVENTION (7) The above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto; therefore, the scope and invention of the invention according to the present invention The simple equivalent changes and modifications made to the contents of the specification are still within the scope of the invention. ►

Page 11 1288963 Brief Description of the Drawings [Simple Description of the Drawings] The first drawing is a schematic diagram of the combination of the first embodiment of the present invention applied to an evaporation machine. The second drawing is a diagram showing the state of use of the first embodiment of the present invention applied to an evaporation machine. The third figure is a sectional view of the combination of the fixed seat and the object to be plated in the second figure. Figure 4 is a cross-sectional view showing another embodiment of the fixing base of the present invention. Figure 5 is a cross-sectional view showing another embodiment of the fixing base of the present invention. Fig. 6 is a schematic view showing the combination of the second embodiment of the present invention applied to an evaporation machine. DESCRIPTION OF KEY SYMBOLS] The present invention] Fixed shaft 111 Fixing mechanism 12 Support arm 122 Turntable 1231 Rotating member 1 2 4 Chassis 1251 Second insert 1 2 5 3 Space 1 2 5 5 Perforation 1 2 5 7,1 2 5 7 'Column 1 2 5 9 Holding device 1 Transmission mechanism 11 Transmission element 11 2 Rotary shaft 1 21 Turntable member 1 2 3 Rotary shaft 1 2 3 2 Mounting bracket 1 2 5 First insert 1 2 5 2 Ring body 1254 Plug Hole 1 2 5 6,1 2 5 6 ' groove 1258

Page 12 1288963 Brief description of the diagram Bias power supply 2 Arc power supply 3 Arc gun 31 Sputter target 4 Ion device 5 Gas inlet 6 Gas extraction device 7

Page 13

Claims (1)

1288963 VI. Patent Application Range 1. 'A physical gas phase holding device is installed in a steaming comprising: an element; a non-flat moving rotating member, which is plated in a straight shape on the rotating member. Rotating 4. Rotating any of the conveyors that are rotated 5· and the shafts that are less/solidally set and the rotating system and the transfer motion are held by the application. Depending on the application holding axis, the application holds the shaft depending on the application. According to the application structure, the two-acting component of the rotating shaft arm of the connecting mechanism, the patented device, the patented device, the angled patent device, the refreshing patent device, the patent fan/child 瘵 plating machine a plating holding device, the inside of the plating machine is used for holding the object to be plated, and has a fixed shaft and a transmission connected to the fixed shaft. The fixed vehicle having the transmission mechanism is three-one for holding the rotating shaft. The support arm and the turntable end of the rotary motion of the t-transmission mechanism are respectively connected to a rotating member and a fixed seat, and the mutual cooperation rotates, so that the fixed seat generates the physical gas phase as described in item L. In the deposition vapor deposition machine, the fixed shaft of the transmission mechanism is in the form of a longitudinal lead. The physical vapor deposition evaporation described in item 1 wherein the fixed axis of the transmission mechanism is fixed to 5. ~90. between. Forming the physical vapor deposition evaporation described in item 3, wherein the fixed shaft and the fixing mechanism of the transmission mechanism are between 15. ~45. between. The physical vapor deposition vapor deposition machine according to Item 1, wherein the transmission component is a helical vapor or a tapered cone wheel, and the physical vapor deposition vapor deposition machine described in item 1 is used. 9. According to the application of the plated material solid perforation. I 〇·依申 The object to be plated is fixed. The second insert is inserted between the two discs. II. The mineral is solid and the first plug is set accordingly. 12·Ishen's object to be plated solid 12896963 6. The patented scope ^1^ is a clock holding device, wherein the fixed seat of the tamping mechanism comprises a chassis, a set above the chassis and formed between the chassis and the chassis The first insert of the space and a ring are disposed on the ring body of the chassis and the first insert. 7. The substrate holding device of the physical vapor deposition vapor deposition machine according to claim 6, wherein the first/plug is provided with a plurality of insertion holes, and the chassis is provided with a plurality of concave portions. The groove system is corresponding to the insertion hole. < 8 The clock object holding device of the physical vapor deposition vapor deposition machine according to claim 6, wherein the third insertion hole is provided with a plurality of insertion holes, and the chassis is provided with a majority A stud is disposed corresponding to the insertion hole. The physical vapor deposition vapor deposition device according to the sixth aspect of the invention, wherein the physical vapor deposition vapor deposition device according to item 6 of the patent scope is separately provided on the chassis and the ring body. The fixing base further includes a second insert between the first insert and the chassis, and is formed with a space between the chassis and the first. Please refer to the physical gas phase described in the first paragraph of the patent; the device has a plurality of plugs on the second plug: a plurality of plug holes are also provided on the disc. The object described in item 1 of the patent scope is ¥ # -^ ^ i + β m β虱 phase deposition vapor deposition machine holding device, ... the fixing mechanism is a complex array setting, each Page 15 1288963 Page 16