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TWI268533B - Coating film forming apparatus and coating film forming method - Google Patents

Coating film forming apparatus and coating film forming method

Info

Publication number
TWI268533B
TWI268533B TW093141371A TW93141371A TWI268533B TW I268533 B TWI268533 B TW I268533B TW 093141371 A TW093141371 A TW 093141371A TW 93141371 A TW93141371 A TW 93141371A TW I268533 B TWI268533 B TW I268533B
Authority
TW
Taiwan
Prior art keywords
film forming
coating film
substrate
stage
gas
Prior art date
Application number
TW093141371A
Other languages
Chinese (zh)
Other versions
TW200527493A (en
Inventor
Tsuyoshi Yamasaki
Kazuhito Miyazaki
Kiyohisa Tatetama
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200527493A publication Critical patent/TW200527493A/en
Application granted granted Critical
Publication of TWI268533B publication Critical patent/TWI268533B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B66—HOISTING; LIFTING; HAULING
    • B66F—HOISTING, LIFTING, HAULING OR PUSHING, NOT OTHERWISE PROVIDED FOR, e.g. DEVICES WHICH APPLY A LIFTING OR PUSHING FORCE DIRECTLY TO THE SURFACE OF A LOAD
    • B66F17/00—Safety devices, e.g. for limiting or indicating lifting force
    • B66F17/006—Safety devices, e.g. for limiting or indicating lifting force for working platforms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B66—HOISTING; LIFTING; HAULING
    • B66F—HOISTING, LIFTING, HAULING OR PUSHING, NOT OTHERWISE PROVIDED FOR, e.g. DEVICES WHICH APPLY A LIFTING OR PUSHING FORCE DIRECTLY TO THE SURFACE OF A LOAD
    • B66F11/00—Lifting devices specially adapted for particular uses not otherwise provided for
    • B66F11/04—Lifting devices specially adapted for particular uses not otherwise provided for for movable platforms or cabins, e.g. on vehicles, permitting workmen to place themselves in any desired position for carrying out required operations
    • B66F11/044—Working platforms suspended from booms

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geology (AREA)
  • Mechanical Engineering (AREA)
  • Structural Engineering (AREA)
  • Coating Apparatus (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The coating film forming apparatus and the coating film forming method of controlling the generation of the transcript mark on the surface of the substrate and preventing the particle from adhering to the back of the substrate is offered. Resist coating processor (CT) 23a have stage 12 in which two or more gas jet entrances 16a to jet the gas were installed, substrate transportation mechanism 13 transported LCD substrate G in the direction of X on the stage 12 and resist supply nozzle 14 that supplies the resist liquid to the surface of LCD substrate G that moves on the stage 12. LCD substrate G is transported on the stage 12 with substrate transportation mechanism 13 while having floated from the surface of stage 12 with the gas jetted from gas jet entrance 16a in the horizontal posture.
TW093141371A 2004-02-05 2004-12-30 Coating film forming apparatus and coating film forming method TWI268533B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004029031A JP4049751B2 (en) 2004-02-05 2004-02-05 Coating film forming device

Publications (2)

Publication Number Publication Date
TW200527493A TW200527493A (en) 2005-08-16
TWI268533B true TWI268533B (en) 2006-12-11

Family

ID=34879177

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093141371A TWI268533B (en) 2004-02-05 2004-12-30 Coating film forming apparatus and coating film forming method

Country Status (4)

Country Link
JP (1) JP4049751B2 (en)
KR (1) KR101061707B1 (en)
CN (1) CN1318151C (en)
TW (1) TWI268533B (en)

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JP4413789B2 (en) * 2005-01-24 2010-02-10 東京エレクトロン株式会社 Stage device and coating treatment device
JP4634265B2 (en) * 2005-09-27 2011-02-16 東京エレクトロン株式会社 Coating method and coating apparatus
JP4884871B2 (en) * 2006-07-27 2012-02-29 東京エレクトロン株式会社 Coating method and coating apparatus
US8012744B2 (en) 2006-10-13 2011-09-06 Theranos, Inc. Reducing optical interference in a fluidic device
JP4743716B2 (en) * 2007-03-06 2011-08-10 東京エレクトロン株式会社 Substrate processing equipment
JP5303125B2 (en) * 2007-07-24 2013-10-02 東京応化工業株式会社 Coating apparatus and coating method
JP5188759B2 (en) * 2007-08-07 2013-04-24 東京応化工業株式会社 Coating apparatus and coating method
JP2009043829A (en) * 2007-08-07 2009-02-26 Tokyo Ohka Kogyo Co Ltd Coating apparatus and coating method
JP4942589B2 (en) * 2007-08-30 2012-05-30 東京応化工業株式会社 Coating apparatus and coating method
JP4541396B2 (en) 2007-11-02 2010-09-08 東京エレクトロン株式会社 Coating film forming apparatus, substrate transport method, and storage medium
JP4495752B2 (en) * 2007-11-06 2010-07-07 東京エレクトロン株式会社 Substrate processing apparatus and coating apparatus
JP5169162B2 (en) * 2007-11-14 2013-03-27 凸版印刷株式会社 Colored photoresist coating method and coating apparatus
CN101502822B (en) * 2008-02-04 2012-05-30 联华电子股份有限公司 Nozzle calibration device and nozzle calibration method
JP5315013B2 (en) * 2008-02-05 2013-10-16 オリンパス株式会社 Substrate transport apparatus and substrate transport method
KR101431146B1 (en) * 2008-05-09 2014-08-18 주식회사 디엠에스 Chemical solution dispensing device
JP2011056335A (en) * 2009-09-07 2011-03-24 Toray Eng Co Ltd Apparatus for pre-drying and method of pre-drying
JP5550882B2 (en) * 2009-10-19 2014-07-16 東京応化工業株式会社 Coating device
JP2011165691A (en) * 2010-02-04 2011-08-25 Tokyo Electron Ltd Reduced pressure drying method and reduced pressure drying device
JP2011213435A (en) * 2010-03-31 2011-10-27 Toray Eng Co Ltd Carrying device and applying system
CN101856647B (en) * 2010-05-14 2012-08-29 方刚 Automatic coating machine
KR101179736B1 (en) 2010-06-24 2012-09-04 주식회사 나래나노텍 An Improved Floating Stage and A Substrate Floating Unit and A Coating Apparatus Having the Same
KR102193251B1 (en) * 2011-05-13 2020-12-22 가부시키가이샤 니콘 Substrate-replacement device
JP5789416B2 (en) 2011-06-03 2015-10-07 東京応化工業株式会社 Coating apparatus and coating method
KR101818070B1 (en) 2012-01-18 2018-01-12 주식회사 케이씨텍 Substrate treating apparatus
JP6095394B2 (en) * 2013-02-13 2017-03-15 東レエンジニアリング株式会社 Substrate processing system and substrate processing method
CN104051562B (en) * 2013-03-13 2017-02-08 北京北方微电子基地设备工艺研究中心有限责任公司 Silicon chip surface treatment apparatus
JP5778224B2 (en) * 2013-08-19 2015-09-16 東京応化工業株式会社 Coating device
CN103771719B (en) * 2014-01-16 2015-09-09 北京京东方光电科技有限公司 a coating device
KR101570169B1 (en) 2014-05-09 2015-11-20 세메스 주식회사 apparatus for forming photo alignment film
JP6592019B2 (en) * 2014-07-18 2019-10-16 カティーバ， インコーポレイテッド Gas enclosure system and method utilizing multi-zone circulation and filtration
JP6689595B2 (en) * 2015-11-20 2020-04-28 Ａｉメカテック株式会社 Coating device and coating method
KR102295115B1 (en) 2016-09-30 2021-08-27 가부시키가이샤 니콘 A conveyance apparatus, an exposure apparatus, an exposure method, the manufacturing method of a flat panel display, a device manufacturing method, and a conveyance method
JP6860356B2 (en) * 2017-01-20 2021-04-14 株式会社Ｓｃｒｅｅｎホールディングス Coating device and coating method
JP6860379B2 (en) * 2017-03-03 2021-04-14 株式会社Ｓｃｒｅｅｎホールディングス Coating device and coating method
JP6855334B2 (en) * 2017-06-22 2021-04-07 東レエンジニアリング株式会社 Substrate processing equipment and substrate processing method
CN107457154A (en) * 2017-09-20 2017-12-12 大碇电脑配件(上海)有限公司 A kind of four axle dispensing boards
KR102134271B1 (en) * 2018-04-25 2020-07-15 세메스 주식회사 Apparatus for processing substrate
JP7232596B2 (en) * 2018-08-30 2023-03-03 東京エレクトロン株式会社 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
KR102134272B1 (en) * 2018-09-17 2020-07-15 세메스 주식회사 Floating type Substrate Transferring Apparatus
CN111483235A (en) * 2019-06-21 2020-08-04 广东聚华印刷显示技术有限公司 Inkjet printing method and inkjet printing apparatus for light emitting device
CN110802000B (en) * 2019-11-08 2020-12-29 武汉城市职业学院 Robot is paintd in ration play oil of lubricating oil
CN111215264A (en) * 2020-01-16 2020-06-02 重庆奥丽特建材有限公司 Negative oxygen ion high crystal plate spraying device and control method thereof
KR102134274B1 (en) * 2020-03-10 2020-07-15 세메스 주식회사 Apparatus for processing substrate
JP2021150351A (en) * 2020-03-17 2021-09-27 東レエンジニアリング株式会社 Substrate floating transport device

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JP3245813B2 (en) * 1996-11-27 2002-01-15 東京エレクトロン株式会社 Coating film forming equipment
JP2000062950A (en) * 1998-08-19 2000-02-29 Daiichi Shisetsu Kogyo Kk Flotation apparatus
JP2000191137A (en) 1998-12-28 2000-07-11 Nippon Electric Glass Co Ltd Non contact carrier device of plate article
JP2002181714A (en) * 2000-12-19 2002-06-26 Ishikawajima Harima Heavy Ind Co Ltd Sheet inspection equipment
JP2002346463A (en) 2001-05-24 2002-12-03 Toppan Printing Co Ltd Veneer coating equipment
JP4130552B2 (en) * 2002-03-22 2008-08-06 株式会社ブイ・テクノロジー Glass substrate inspection equipment
JP2003290697A (en) 2002-04-02 2003-10-14 Toppan Printing Co Ltd Single plate continuous coating device

Also Published As

Publication number Publication date
CN1651155A (en) 2005-08-10
KR101061707B1 (en) 2011-09-01
CN1318151C (en) 2007-05-30
JP4049751B2 (en) 2008-02-20
JP2005223119A (en) 2005-08-18
TW200527493A (en) 2005-08-16
KR20050079637A (en) 2005-08-10

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees