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TWI267135B - Polishing method and polishing device, and manufacturing method for semiconductor device - Google Patents

Polishing method and polishing device, and manufacturing method for semiconductor device

Info

Publication number
TWI267135B
TWI267135B TW092113733A TW92113733A TWI267135B TW I267135 B TWI267135 B TW I267135B TW 092113733 A TW092113733 A TW 092113733A TW 92113733 A TW92113733 A TW 92113733A TW I267135 B TWI267135 B TW I267135B
Authority
TW
Taiwan
Prior art keywords
polishing
metal film
electrolyte
potential
present
Prior art date
Application number
TW092113733A
Other languages
English (en)
Other versions
TW200405455A (en
Inventor
Naoki Komai
Takeshi Nogami
Shingo Takahashi
Hiroshi Horikoshi
Kaori Tai
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of TW200405455A publication Critical patent/TW200405455A/zh
Application granted granted Critical
Publication of TWI267135B publication Critical patent/TWI267135B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00—Combined machining
    • B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
    • B23H5/08—Electrolytic grinding
    • H10P52/00—
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • H10P52/203—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
TW092113733A 2002-05-21 2003-05-21 Polishing method and polishing device, and manufacturing method for semiconductor device TWI267135B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002146117A JP2003342800A (ja) 2002-05-21 2002-05-21 研磨方法および研磨装置、並びに半導体装置の製造方法

Publications (2)

Publication Number Publication Date
TW200405455A TW200405455A (en) 2004-04-01
TWI267135B true TWI267135B (en) 2006-11-21

Family

ID=29545109

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092113733A TWI267135B (en) 2002-05-21 2003-05-21 Polishing method and polishing device, and manufacturing method for semiconductor device

Country Status (5)

Country Link
US (1) US20040259365A1 (zh)
JP (1) JP2003342800A (zh)
KR (1) KR20050005389A (zh)
TW (1) TWI267135B (zh)
WO (1) WO2003098673A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356117A (ja) * 2003-05-26 2004-12-16 Ebara Corp 基板処理方法及びその装置
US7998335B2 (en) * 2005-06-13 2011-08-16 Cabot Microelectronics Corporation Controlled electrochemical polishing method
JPWO2007074734A1 (ja) * 2005-12-26 2009-06-04 日立化成工業株式会社 砥粒フリー研磨液及びｃｍｐ研磨方法
JP2007194540A (ja) * 2006-01-23 2007-08-02 Toshiba Corp 半導体装置の製造方法及び研磨装置
CN102453444B (zh) * 2010-10-26 2013-12-04 比亚迪股份有限公司 一种用于非晶合金的抛光液以及一种非晶合金的抛光方法
GB2518387B (en) 2013-09-19 2017-07-12 Dst Innovations Ltd Electronic circuit production
TWI574298B (zh) * 2015-11-10 2017-03-11 Crystalwise Tech Inc Semiconductor wafer surface processing method
CN106711018B (zh) * 2015-11-16 2019-12-10 兆远科技股份有限公司 半导体晶圆表面加工方法
US12398478B2 (en) * 2019-06-11 2025-08-26 Uchicago Argonne, Llc Method and system for preparation of a nanowire composite based on electroplating
CN113118966B (zh) * 2019-12-31 2022-08-16 清华大学 一种用于化学机械抛光的承载头及其使用方法
CN115791912B (zh) * 2022-11-16 2024-07-12 厦门大学 一种半导体摩擦光电化学的测量装置及测量方法
JP2024086347A (ja) * 2022-12-16 2024-06-27 株式会社安永 表面加工方法及び表面加工装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4477329A (en) * 1982-02-05 1984-10-16 Lockheed Corporation Apparatus for maintaining peroxide concentration
JP2671392B2 (ja) * 1988-06-20 1997-10-29 日本電気株式会社 半導体装置の製造方法
JP2569871B2 (ja) * 1990-03-01 1997-01-08 日本電気株式会社 参照電極
JPH0593300A (ja) * 1991-09-30 1993-04-16 Riyouichi Aogaki 電解エツチング方法
US5575707A (en) * 1994-10-11 1996-11-19 Ontrak Systems, Inc. Polishing pad cluster for polishing a semiconductor wafer
US6315883B1 (en) * 1998-10-26 2001-11-13 Novellus Systems, Inc. Electroplanarization of large and small damascene features using diffusion barriers and electropolishing
US6709565B2 (en) * 1998-10-26 2004-03-23 Novellus Systems, Inc. Method and apparatus for uniform electropolishing of damascene ic structures by selective agitation
JP4513145B2 (ja) * 1999-09-07 2010-07-28 ソニー株式会社 半導体装置の製造方法および研磨方法
JP2001102356A (ja) * 1999-09-27 2001-04-13 Jun Kikuchi 表面平坦化処理方法および装置
US6299741B1 (en) * 1999-11-29 2001-10-09 Applied Materials, Inc. Advanced electrolytic polish (AEP) assisted metal wafer planarization method and apparatus
US6379223B1 (en) * 1999-11-29 2002-04-30 Applied Materials, Inc. Method and apparatus for electrochemical-mechanical planarization
US7160176B2 (en) * 2000-08-30 2007-01-09 Micron Technology, Inc. Methods and apparatus for electrically and/or chemically-mechanically removing conductive material from a microelectronic substrate
US6722942B1 (en) * 2001-05-21 2004-04-20 Advanced Micro Devices, Inc. Chemical mechanical polishing with electrochemical control
US6802955B2 (en) * 2002-01-11 2004-10-12 Speedfam-Ipec Corporation Method and apparatus for the electrochemical deposition and planarization of a material on a workpiece surface
AU2003230847A1 (en) * 2002-04-09 2003-10-27 Rensselaer Polytechnic Institute Electrochemical planarization of metal feature surfaces

Also Published As

Publication number Publication date
JP2003342800A (ja) 2003-12-03
US20040259365A1 (en) 2004-12-23
KR20050005389A (ko) 2005-01-13
WO2003098673A1 (en) 2003-11-27
TW200405455A (en) 2004-04-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees