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TWI263690B - Evaporation coating apparatus - Google Patents

Evaporation coating apparatus

Info

Publication number
TWI263690B
TWI263690B TW93100292A TW93100292A TWI263690B TW I263690 B TWI263690 B TW I263690B TW 93100292 A TW93100292 A TW 93100292A TW 93100292 A TW93100292 A TW 93100292A TW I263690 B TWI263690 B TW I263690B
Authority
TW
Taiwan
Prior art keywords
evaporation
coating apparatus
different
evaporation coating
targets
Prior art date
Application number
TW93100292A
Other languages
English (en)
Other versions
TW200523380A (en
Inventor
Jyi-Tydn Jyh
Jian-Chuan Chang
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW93100292A priority Critical patent/TWI263690B/zh
Publication of TW200523380A publication Critical patent/TW200523380A/zh
Application granted granted Critical
Publication of TWI263690B publication Critical patent/TWI263690B/zh

Links

Landscapes

  • Physical Vapour Deposition (AREA)
TW93100292A 2004-01-06 2004-01-06 Evaporation coating apparatus TWI263690B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93100292A TWI263690B (en) 2004-01-06 2004-01-06 Evaporation coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93100292A TWI263690B (en) 2004-01-06 2004-01-06 Evaporation coating apparatus

Publications (2)

Publication Number Publication Date
TW200523380A TW200523380A (en) 2005-07-16
TWI263690B true TWI263690B (en) 2006-10-11

Family

ID=37967124

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93100292A TWI263690B (en) 2004-01-06 2004-01-06 Evaporation coating apparatus

Country Status (1)

Country Link
TW (1) TWI263690B (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI456081B (zh) * 2009-12-31 2014-10-11 Samsung Display Co Ltd 蒸鍍裝置
US8986783B2 (en) 2009-11-30 2015-03-24 Samsung Display Co., Ltd. Method of forming thin film from multiple deposition sources
TWI661067B (zh) * 2013-10-24 2019-06-01 日立造船股份有限公司 真空蒸鍍裝置用岐管

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4001296B2 (ja) * 2005-08-25 2007-10-31 トッキ株式会社 有機材料の真空蒸着方法およびその装置
CN114231912A (zh) * 2021-12-30 2022-03-25 武汉天马微电子有限公司 一种蒸镀装置及其控制方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8986783B2 (en) 2009-11-30 2015-03-24 Samsung Display Co., Ltd. Method of forming thin film from multiple deposition sources
TWI456081B (zh) * 2009-12-31 2014-10-11 Samsung Display Co Ltd 蒸鍍裝置
TWI661067B (zh) * 2013-10-24 2019-06-01 日立造船股份有限公司 真空蒸鍍裝置用岐管

Also Published As

Publication number Publication date
TW200523380A (en) 2005-07-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees