1240701 玖、發明說明： 發明所屬之技術領域 本發明主要應用於超純水之進一步純化，尤其關於一 種將具有總可氧化碳（TOC)含量為數個至100 ppb的超純水 進一步純化至TOC含量低於1 ppb以下的方法。 先前技術 隨著奈米製程產業如奈米電子、奈米材料、奈米礙管、 奈米微機電及微量分析之發展，對於超純水及超純氣體之 潔淨度要求將愈嚴格。以超純水的規格為例，依據美國半 導體協會（SEMATECH)制訂之 International Technology Roadmap for Semiconductor (ITRS)中關於奈米電子製程線 寬與水質的趨勢預測被列於表一。表一中資料顯示超純水 中的總有機碳（total organic carbon，TOC)、細菌、微顆粒、 離子含里隨著製程線寬縮減而降低。其中以有機物質（以 TOC表示）的去除是水質純化技術中最難克服的，因為有機 污染的去除牽涉及不同相態之間的轉換，其可能以溶解態 或是顆粒型態存在，同時水中的溶氧量、金屬等物質會影 響其去除之效率。一般現行之超純水系統及設計，去除有 機雜質之單元主要為逆滲透單元與T0C_UV單元，而新式 製程製造廠如12吋晶圓廠之超純水系統仿照8吋晶圓廠設 計，設計流程主要包含一前處理系統包含如混凝、砂濾、 多重過濾器等；一初級處理系統包含逆滲透、真空脫氣塔、 紫外線殺菌器、混床去離子塔、過遽器等；及一精鍊純化 !24〇7〇ι 循％包含熱交換器、紫外線氧化器、 哭β 玍雊子父換樹脂 时、精密過濾器、超過濾器等。此系統只包含一個循環， 產水之TOC值最佳可純化至i ppb，水中雜質之去除主 發生於前處理及初級處理系統階段，而精鍊循環可對水=1240701 发明 Description of the invention: TECHNICAL FIELD OF THE INVENTION The present invention is mainly applied to the further purification of ultrapure water, and more particularly to a method for further purifying ultrapure water with a total oxidizable carbon (TOC) content of several to 100 ppb to the TOC content Methods below 1 ppb. Previous technology With the development of nano-process industries such as nano-electronics, nano-materials, nano-tubes, nano-electromechanical and micro-analysis, the requirements for the cleanliness of ultra-pure water and ultra-pure gases will become stricter. Taking the specifications of ultrapure water as an example, the forecast of the trend of nanometer electronic process line width and water quality according to the International Technology Roadmap for Semiconductor (ITRS) formulated by the US Semiconductor Association (SEMATECH) is listed in Table 1. The data in Table 1 shows that total organic carbon (TOC), bacteria, microparticles, and ion content in ultrapure water decrease with decreasing process line width. Among them, the removal of organic substances (represented by TOC) is the most difficult to overcome in water purification technology, because the removal of organic pollution involves the conversion between different phase states, which may exist in a dissolved or particulate form, and at the same time in water The amount of dissolved oxygen, metals and other substances will affect its removal efficiency. Generally, the current ultra-pure water system and design. The units that remove organic impurities are mainly reverse osmosis units and TOC_UV units. The ultra-pure water system in new process manufacturing plants, such as 12-inch fabs, imitates the design and design process of 8-inch fabs. It mainly includes a pre-treatment system including coagulation, sand filtration, multiple filters, etc .; a primary treatment system includes reverse osmosis, vacuum degassing tower, ultraviolet sterilizer, mixed bed deionization tower, sparger, etc .; and a refining Purified! 2407% by cycle contains heat exchanger, ultraviolet oxidizer, crying β 玍 雊 father when changing resin, precision filter, ultra-filter and so on. This system contains only one cycle. The TOC value of the produced water can be purified to i ppb. The removal of impurities in the water mainly occurs in the pre-treatment and primary treatment system stages. The refining cycle can treat water =
剩餘雜質再進行微量的去除，但主要目的為維持曾L 由於目刖系統並無法再對水質進行純化，故本發曰、 針對水中微量有機物質去除技術進行純化系統與方法之= 發0The remaining impurities are removed in a small amount, but the main purpose is to maintain the Zeng L. Since the eyewater system can no longer purify the water, this post states that the purification system and method for the removal of trace organic substances in water = Fat 0
-— _ 表- 西元年 技術節點 TOC (ppb) 美國專利6579445 B2號揭示生產水質電阻值 218.0MQ.cm及總有機碳含量^；^^之超純水系統，主要包 含元件為雙重housing，一個uv反應器在雙重h〇using 中，一個微過濾器於雙重housing及出口電阻值量測點間， 此處之雙重housing内包含2個槽體，槽體内的處理元件 為氧化還原合金處理、煙媒/椰殼/催化劑附著之活性碳、混 床。 美國專利2002/0134722A1號揭示一生產超純水系統， 包含UV反應器及離子交換樹脂純化超純水，於離子交換 樹脂之後設一氧化物破壞單元將水中的氧化物降解成溶 氧，之後一迴路控制量測氧化物破壞單元前後之溶氧，而 1240701 回饋控制UV反應器之UV照度。 申請人於我國專利申請第9013083 1號案揭示一個處 理含有機物廢水之流程與系統。此系統包含紫外光/臭氧 (UV/ozone)氧化去除模組，或一個或數個去除模組串聯，此 串聯可連續或不連續。一個UV/ozone氧化去除模組主要包 括臭氧產生器、臭氧吸入器、臭氧溶解槽、臭氧破壞裝置、 紫外線（UV)反應槽及迴流管路。UV/ozone氧化去除模組的 效率由迴流水比例、臭氧濃度、及紫外線強度所控制。該 案的内容藉由參考方式被併入本案。 發明内容 本發明的一主要目的在於去除超純水中微量有機物 質’以符合未來半導體製程對水質TOC的要求。 本案發明人發現超純水中微量有機物質的去除必須藉 助臭氧接觸及紫外光照射的多個循環串聯處理才能將水中 的總可氧化碳（TOC)含量降低至lppb以下的程度。較佳 的，在第一個循環進一步對紫外線照射之後的水施予離子 交換處理。選擇性的，每一個循環可進一步包含對經過紫 外光照射後的水進行脫氣處理，以去除水中的溶氧、二氧 化碳及揮發性有機物方法 實施方式 本發明揭示一種超純水微量有機物質之去除方法， 含下列步驟： 1240701 a) 將—總可氧化碳（T〇C)含量低於i 〇〇 ppb(十億分之一） 的超純水與臭氧接觸，並且紫外光照射所獲得之臭氧水； b) 將步驟a)經過紫外光照射後的臭氧水進行脫氣處， 理’以去除水中的溶氧、二氧化碳及揮發性有機物； 〇將步驟b)經過脫氣處理後的水與一離子吸附單元接 觸’而使得水中的T〇c量降低；及 d)以步驟c)經過離子吸附單元接觸後的水為進料，依 序重覆臭氧接觸及紫外光照射直到水中的TOC小於一預定 值該預疋值可以為1 ppb，0.5 ppb或〇.2 ppb。 較佳的，步驟d)進-步包含在接續進行的臭氧接觸及 紫外光照射的任兩個循環之間加入脫氣處理及/或離子吸 附單元處理。 較佳的，該離子吸附單元為離子交換樹脂。更佳的， 該離子交換樹脂包含陽離子交換樹脂及陰離子交換樹脂。 較佳的’該離子吸附單元包含電解形式之去離子設備。 較佳的，該水與臭氧接觸包含水與一臭氧來源氣體混 合’而形成臭氧濃度介於1〇_1〇〇〇ppb的臭氧水。 較佳的’該脫氣處理包含抽真空及/或通過脫氣膜組。 本發明提出-包含前處理（pretreatment)系統A;包含循 環B及循環C的本發明超純水純化系統，及選擇性的一附加 純化循環D，如圖一所示。 口 個進水1此處進水主要為自來水，或自來水與回收 自半導體製程的回收水之混合水源，經過前處理系統A進行 前處理。冑處理系統八内包括軟化單元、砂濾或多重過濾 1240701 器、活性碳吸附單元、脫氣塔與強鹼/弱酸/強酸型離子交換 樹脂單元之組合（一般設計為2床3塔或3床4塔或4床5塔 等）、加壓馬達及逆滲透膜單元等。前處理系統A可有效去 除95〜99%無機類物質、微細顆粒、細菌與有機物質等不純 物，提高後續的純化單元之處理效率。、經前處理系統八後流 至一内襯抗氧化低有機物質溶出之穩定材質（如pvDF、 pFA、鐵弗龍等）之儲存槽2，此儲存槽需有氮氣填封，以 防止外界二氧化碳及微顆粒進入影響水質。經由馬達3由儲 存槽2抽送水至紫外線氧化器4。紫外線氧化器4内之紫外線 燈官-般為低壓汞燈，例如具有一波長185nm_254 ·的低 壓汞燈，經過脫氣單元5，可去除水中溶氧、二氧化碳及揮 發性^機物。經過混合強酸型陽離子交換樹脂及強驗型陰 子又換;feN日之混床或為具相同功能之電解型去離子單元 6。從單元6出來的處理後水一部分迴流至一臭氧產生器8, 產生含溶解態臭氧之超純水再回至儲存槽2與與前處理後 之水混合，構成循環B。儲存槽2中的混合水 A的出水稀釋，含^ 』处埋糸統 休“ 0C ;農度，當進入循環中的紫 生活臭氧”外線照射可產 化i 生極间的風氧自由基’可較單獨紫外線氧化及臭氧氧 更有效率去除有機類物質。 時間，提高有機物質去除率二:…加臭氧停留 控制，且餘一 $ 此迴流比例調整藉由閥門7 (“至—抗氧化低有機物質溶出之轉定材質 (如PVDF、PFA、鐵弗 穩、疋材負 9需有氮氣填封。龍内襯之儲存槽9,此儲存槽 1240701 從儲存槽9經馬達10加壓送至紫外線氧化器丨丨，再流至 :純化元件12。純化元件12可為脫氣單元及/或離子交換單 元等或其組合，或甚至省略不用。之後一部分迴流經臭氧 產生此迴流比例調整藉由閥門13控制’其餘的部分 再流至一抗氧化低有機物質溶出之穩定材質（如pvDF、 PFA、鐵弗龍等）内襯之儲存槽15，此儲存槽i5需有氮氣填 封以上早70/凡件9至14構成循環c ^當此循環c中的純化 元件12若為脫氣單元與離子交換處理單元，則此猶環c流程 設計與循環B相同。 從儲存槽15經加壓馬達16輪送至熱交換器17。以熱交 換益17调整水溫後，進入紫外線氧化器18，經過離子交換 樹：混床19,脫氣單元20,再進入超過滤單元21。由超過 濾單元2 1机出的處理後水的一部分迴流經臭氧產生器Μ， 其餘的部分則送至超純水使用端24。此迴流比例調整藉由 閥門22控制。以上15至23構成循環d。此循環d的主要目的 為繼續對水中微量雜f再進行純化，並維持超純水質之穩 定。 本毛月的另一較佳具體實施例所完成的超純水中微 里有機物的去除系統，與圖一所示者類似包含該前處理 (pretreatmem)系統A，循環B及循環c，及選擇性的循環〇(未 不於圖一中）’但是包含複數個串聯的循環B^Bn及複數個串 聯的循環(^(^處，其巾n&m為正整數，且n+m>2。 循環B及循環c設計之依據為下列實施例： 1240701 實施例一： 於圖一中的馬達3與紫外線氧化器4之間的管線持續注 入種半導體製程常見之界面活性劑NCW，使進水具有75 ppb濃度之NCW。本實施例之測試為完全迴流，經處理過後 之水源完全回至儲存槽2。經過紫外線照射後，總有機碳 (toc)去除率約為8〜10%。本實施例於離子交換單元6後再 加設一套離子交換樹脂單元，此循環共有二套離子交換樹 脂單兀以進行離子交換樹脂單元之驗證。經過第一個離子 交換單元後toc去除效率約為46〜54%，穩定去除T〇c量為 35〜40 ppb。經過第二個離子交換單元後T〇c去除效率僅為 842%，T0C去除量為7·5〜95ppb。由上可知有機物質經紫 外線氧化後解離成離子態之有機物質經第一個離子交換單 疋其吸附效率相當高，但之後第二個離子交換單元其吸附 能力明顯低於第一個離子交換單元，顯示可被吸附之氧化 產物早於第一個離子交換單元被去除。經過6〇分鐘之觀 察，第一個及第二個離子交換單元的吸附量穩定。但在此 循環中紫外線氧化器4前所量測之T0C值仍持續增加，顯示 紫外線氧化器4氧化後之衍生氧化產物中有一部份無法被 離子交換單元吸附而累積。之後停止注射Ncw，值快 速下降，經過140分鐘之循環時間T〇c降至3·3 ppb，但是， 其間第一個及第二個離子交換單元之去除量幾乎為零，有 機物之去除實質上全是利用紫外線氧化方式達成。故於第 一個循環設計於紫外線氧化器後安裝一個離子交換單元， 即可將能被以離子交換方式移除的紫外線氧化衍生產物有 11 1240701 放率的移除，之後則以高級氧化技術紫外線處理或紫外線/ 臭氧處理來移除未能被離子交換方式移除的有機物。 實施例二： 於圖一中的馬達3與紫外線氧化器4之間的管線持續注 入種半導體製程常見之界面活性劑NCW，使進水具有1 〇 ppb濃度之NCW。本實施例之測試為完全迴流，經離子交換 單元6處理過後之水源完全回至儲存槽2。經過紫外線照射 後，總有機碳（TOC)去除率約為18〜20%。本實施例於離子 父換早7G 6後再加設一套離子交換樹脂單元，此循環共有二 套離子交換樹脂單元以進行離子交換樹脂單元之驗證。經 過第一個離子交換單元後TOC去除效率約為62%，穩定去除 TOC里為6.2〜6.6 ppb。經過第二個離子交換單元後T〇c去除 效率僅為2.8〜3〇/〇，T0C去除量為〇·3 ppb。由上可知有機物 質、、&兔外線氧化後解離成離子態之有機物質經第一個離子 又換單元其吸附效率相當高，但之後第二個離子交換單元 其吸附能力明顯低於第一個離子交換單元，顯示可被吸附 之氧化產物早於第一個離子交換單元被去除。經過Μ分鐘 之觀不第個及第二個離子交換單元的吸附量穩定。但 在此循％中备、外線氧化器4前所量測之T〇c值仍持續增 加，顯不i外線氧化器4氧化後之衍生氧化產物中有一部份 無法被離子交換單元吸附而累積。之後停止注射NCW，T0C ，快速下降，經過25分鐘之循環時間，降至21 ppb，但 疋其間第一個及第二個離子交換單元之去除量幾乎為 12 1240701 零，有機物之去除實質 上全是利肖紫外線氧 化方式達成。 圖式簡單說明 圖一依本發明的—# 水中微量有機物之去除系 較佳具體實施例而完成的一種超純 系統的示意方塊圖 圖二依本發明的另一較佳具體實施例而完成的_種超 純水中微量有機物之去除系統的示意方塊圖。 主要元件之符號說明 1.·進水；2、9、15··儲存槽；3、10··馬達；4、11、18·· 紫外線氧化器；5、20··脫氣單元；6··去離子單元；7、U、 22··閥門；8、14、23··臭氧產生器；12··純化元件；16··加 壓馬達；17··熱交換器；19··樹脂混床；21·.超過;慮單元； 24··超純水使用端 13-— _ Table-TOC (ppb) in the first year of the United States Patent No. 6759445 B2 reveals the production of water quality resistance value 218.0MQ.cm and total organic carbon content ^; ^ ^ ultrapure water system, mainly including components for dual housing, one In the double reactor, a micro filter is used between the double housing and the outlet resistance measurement point. The double housing here contains 2 tanks. The processing elements in the tank are redox alloy treatment, Activated carbon, mixed bed with cigarette / coconut shell / catalyst attached. U.S. Patent No. 2002 / 0134722A1 discloses a system for producing ultrapure water, which includes a UV reactor and an ion exchange resin to purify ultrapure water. An oxide destruction unit is provided after the ion exchange resin to degrade oxides in the water into dissolved oxygen. The loop control measures the dissolved oxygen before and after the oxide destruction unit, and the 1240701 feedback controls the UV illumination of the UV reactor. The applicant disclosed in Chinese Patent Application No. 9013083 1 a process and system for treating organic matter-containing wastewater. This system contains UV / ozone oxidation removal modules, or one or several removal modules in series, which can be continuous or discontinuous. A UV / ozone oxidation removal module mainly includes an ozone generator, an ozone inhaler, an ozone dissolution tank, an ozone destruction device, an ultraviolet (UV) reaction tank, and a return line. The efficiency of the UV / ozone oxidation removal module is controlled by the ratio of reflux water, ozone concentration, and ultraviolet intensity. The contents of the case are incorporated into the case by reference. SUMMARY OF THE INVENTION A main object of the present invention is to remove trace organic substances in ultrapure water 'in order to meet the TOC requirements for water quality in future semiconductor processes. The inventor of the present case found that the removal of trace organic substances in ultrapure water must be treated in series by multiple cycles of ozone exposure and ultraviolet light irradiation to reduce the total oxidizable carbon (TOC) content in the water to a level below lppb. Preferably, the water after the ultraviolet irradiation is further subjected to ion exchange treatment in the first cycle. Optionally, each cycle may further include degassing the water after being irradiated with ultraviolet light to remove dissolved oxygen, carbon dioxide, and volatile organic compounds in the water. Embodiments The present invention discloses a method for removing trace organic substances in ultrapure water. The method comprises the following steps: 1240701 a) contacting ultrapure water with a total oxidizable carbon (TOC) content of less than 100 ppm (billionths) with ozone, and irradiating the obtained ozone with ultraviolet light Water; b) deaeration of the ozone water after step a) after ultraviolet light treatment, to remove dissolved oxygen, carbon dioxide and volatile organic compounds in the water; o the water after step b) deaeration treatment and a Ion adsorption unit contacted 'to reduce the amount of Toc in the water; and d) using step c) after the water contacted by the ion adsorption unit as the feed, repeat the ozone contact and ultraviolet irradiation in sequence until the TOC in the water is less than one The predetermined value may be 1 ppb, 0.5 ppb, or 0.2 ppb. Preferably, step d) further comprises adding a degassing treatment and / or an ion adsorption unit treatment between any two cycles of successive ozone exposure and ultraviolet light irradiation. Preferably, the ion adsorption unit is an ion exchange resin. More preferably, the ion exchange resin includes a cation exchange resin and an anion exchange resin. Preferably, the ion adsorption unit comprises a deionization device in an electrolytic form. Preferably, the contacting of water with ozone comprises mixing water with an ozone source gas' to form ozone water having an ozone concentration of 10-100 ppb. Preferably, the degassing treatment includes evacuating and / or passing through a degassing membrane module. The present invention proposes-including a pretreatment system A; the ultrapure water purification system of the present invention including a cycle B and a cycle C, and optionally an additional purification cycle D, as shown in Fig. 1. The inlet water 1 here is mainly tap water, or a mixed water source of tap water and recycled water recovered from the semiconductor process, and undergoes pre-treatment through pre-treatment system A.胄 The treatment system 8 includes a softening unit, sand filter or multiple filtration 1240701, activated carbon adsorption unit, degassing tower and strong alkali / weak acid / strong acid type ion exchange resin unit combination (generally designed as 2 bed 3 tower or 3 bed 4 towers, 4 beds, 5 towers, etc.), pressurized motors and reverse osmosis membrane units. Pretreatment system A can effectively remove 95 to 99% of impurities such as inorganic substances, fine particles, bacteria and organic substances, and improve the processing efficiency of subsequent purification units. 2. After the pretreatment system, it flows to a storage tank 2 lined with a stable material (such as pvDF, pFA, Teflon, etc.) lined with anti-oxidation and low organic substances. This storage tank must be sealed with nitrogen to prevent external carbon dioxide. And the entry of fine particles affects water quality. Water is pumped from the storage tank 2 to the ultraviolet oxidizer 4 via the motor 3. The ultraviolet lamp in the ultraviolet oxidizer 4 is generally a low-pressure mercury lamp. For example, a low-pressure mercury lamp with a wavelength of 185 nm_254 · can pass through the degassing unit 5 to remove dissolved oxygen, carbon dioxide, and volatile organic substances in the water. After mixing the strong acid type cation exchange resin and the strong test type, it is changed again; the mixed bed of feN may be an electrolytic deionization unit with the same function. A part of the treated water from the unit 6 is returned to an ozone generator 8 to generate ultrapure water containing dissolved ozone, and then returned to the storage tank 2 and mixed with the pretreated water to form a cycle B. The effluent of the mixed water A in the storage tank 2 is diluted, and ^ ^ is buried at 0C; the agricultural level, when the purple living ozone enters the cycle, the external irradiation can produce wind oxygen free radicals between the biogenic i's. It can remove organic substances more efficiently than ultraviolet oxidation and ozone oxygen alone. Time, to improve the removal rate of organic matter 2: Add ozone retention control, and the remaining one $ This recirculation ratio is adjusted by valve 7 ("to-anti-oxidation low organic matter dissolution of the transition material (such as PVDF, PFA, Teflon stabilized Nine materials must be sealed with nitrogen. The storage tank 9 lined with dragons, this storage tank 1240701 is sent from the storage tank 9 to the ultraviolet oxidizer under pressure by the motor 10, and then flows to: purification element 12. purification element 12 can be a degassing unit and / or an ion exchange unit, etc. or a combination thereof, or even omitted. After that, a part of the reflux is generated by ozone. This reflux ratio is adjusted by the valve 13 'and the rest is flowed to an antioxidant low organic substance. Dissolved stable material (such as pvDF, PFA, Teflon, etc.) lined storage tank 15, this storage tank i5 needs to be filled with nitrogen above 70 / everything 9 to 14 to form a cycle c ^ When this cycle c If the purification element 12 is a degassing unit and an ion-exchange processing unit, the design of this still-c process is the same as that of the cycle B. It is sent from the storage tank 15 to the heat exchanger 17 via the pressure motor 16 by the wheel. The water is adjusted by the heat exchange benefit 17 After the temperature, enter the ultraviolet oxidizer 18 After the ion exchange tree: mixed bed 19, degassing unit 20, and then enters the ultrafiltration unit 21. A part of the treated water from the ultrafiltration unit 21 is returned to the ozone generator M, and the rest is sent to ultrapure Water use end 24. This reflux ratio adjustment is controlled by valve 22. The above 15 to 23 constitute cycle d. The main purpose of this cycle d is to continue to purify trace impurities in water and maintain the stability of ultrapure water. The system for removing organic matter in micropure water in another preferred embodiment of the month is similar to that shown in FIG. 1 and includes the pretreatmem system A, cycle B and cycle c, and selective Cycle 0 (not shown in Figure 1) 'but includes a plurality of serially connected cycles B ^ Bn and a plurality of serially connected cycles (^ (^, where n & m is a positive integer, and n + m > 2. The design of B and cycle c is based on the following examples: 1240701 Example 1: The pipeline between the motor 3 and the ultraviolet oxidizer 4 in FIG. 1 is continuously injected with the surfactant NCW, which is a common semiconductor process, so that the water inlet has 75 ppb concentration of NCW. Measurement of this example For complete reflux, the treated water source is completely returned to the storage tank 2. After UV irradiation, the total organic carbon (toc) removal rate is about 8 to 10%. In this embodiment, a set is added after the ion exchange unit 6 Ion exchange resin unit. There are two sets of ion exchange resin units in this cycle to verify the ion exchange resin unit. After the first ion exchange unit, the toc removal efficiency is about 46 ~ 54%, and the stable removal of Toc is 35. ～ 40 ppb. After the second ion exchange unit, the removal efficiency of Toc is only 842%, and the removal amount of TOC is 7.5 ~ 95 ppb. It can be seen from the above that the organic substances are dissociated into ionic organic substances after ultraviolet oxidation. The adsorption efficiency of an ion exchange unit is quite high, but the adsorption capacity of the second ion exchange unit is significantly lower than that of the first ion exchange unit, indicating that the oxidation products that can be adsorbed are removed earlier than the first ion exchange unit. . After 60 minutes of observation, the adsorption capacity of the first and second ion exchange units was stable. However, in this cycle, the TOC value measured before the ultraviolet oxidizer 4 continued to increase, indicating that a part of the derivative oxidation products after the oxidation of the ultraviolet oxidizer 4 could not be absorbed by the ion exchange unit and accumulated. After that, the injection of Ncw was stopped, and the value decreased rapidly. After 140 minutes of circulation time, Toc decreased to 3 · 3 ppb. However, the removal of the first and second ion exchange units was almost zero, and the removal of organic matter was essentially All are achieved by ultraviolet oxidation. Therefore, in the first cycle design, an ion exchange unit is installed after the ultraviolet oxidizer, which can remove the ultraviolet oxidation derivative products that can be removed by ion exchange with a rate of 11 1240701, and then use advanced oxidation technology UV Treatment or UV / ozone treatment to remove organics that cannot be removed by ion exchange. Embodiment 2: The pipeline between the motor 3 and the ultraviolet oxidizer 4 in FIG. 1 is continuously injected with NCW, a surfactant commonly used in semiconductor processes, so that the inlet water has a NCW with a concentration of 10 ppb. The test in this embodiment is a complete reflux, and the water source treated by the ion exchange unit 6 is completely returned to the storage tank 2. After UV irradiation, the total organic carbon (TOC) removal rate is about 18 to 20%. In this embodiment, a set of ion exchange resin units is added after the ion father is changed to 7G 6 early. In this cycle, there are two sets of ion exchange resin units for verification of the ion exchange resin units. After the first ion exchange unit, the removal efficiency of TOC is about 62%, and the stable removal of TOC is 6.2 ~ 6.6 ppb. After the second ion exchange unit, the removal efficiency of Toc is only 2.8 ~ 3〇 / 〇, and the amount of TOC removal is 0.3 ppb. From the above, it can be seen that the organic substance, & rabbit outer wire is dissociated into ionic organic substance after the first ion exchange unit has a very high adsorption efficiency, but the second ion exchange unit has a significantly lower adsorption capacity than the first An ion exchange unit shows that the oxidation products that can be adsorbed are removed earlier than the first ion exchange unit. After M minutes, the adsorption capacity of the first and second ion exchange units was stable. However, in this case, the Toc value measured before the external oxidizer 4 continues to increase. It is obvious that some of the derivative oxidation products after the external oxidizer 4 is oxidized cannot be adsorbed and accumulated by the ion exchange unit. . After that, the injection of NCW and T0C was stopped, and fell rapidly. After a cycle time of 25 minutes, it dropped to 21 ppb, but the removal amount of the first and second ion exchange units was almost 12 1240701. The removal of organic matter was substantially complete. It is achieved by Li Shaw UV oxidation method. Brief description of the drawings: Figure 1 is a schematic block diagram of an ultra-pure system completed according to the preferred embodiment of the present invention for the removal of trace organic matter in water. Figure 2 is completed according to another preferred embodiment of the present invention. _ A schematic block diagram of a removal system of trace organics in ultrapure water. Explanation of symbols of main components 1. Water inlet; 2, 9, 15 ... Storage tanks; 3, 10 ... Motors; 4, 11, 18 ... UV oxidizers; 5, 20 ... Degassing units; 6 ... · Deionization unit; 7, U, 22 · · Valves; 8, 14, 23 · · Ozone generator; 12 · · Purification element; 16 · · Pressurized motor; 17 · · Heat exchanger; 19 · · Resin mix Bed; 21 ·. Over; Consideration unit; 24 ·· Ultra-pure water use end 13