[go: up one dir, main page]

TW343959B - Method and apparatus for forming fused silica by combustion of liquid reactants - Google Patents

Method and apparatus for forming fused silica by combustion of liquid reactants

Info

Publication number
TW343959B
TW343959B TW086100125A TW86100125A TW343959B TW 343959 B TW343959 B TW 343959B TW 086100125 A TW086100125 A TW 086100125A TW 86100125 A TW86100125 A TW 86100125A TW 343959 B TW343959 B TW 343959B
Authority
TW
Taiwan
Prior art keywords
combustion
fused silica
liquid reactants
forming fused
liquid
Prior art date
Application number
TW086100125A
Other languages
English (en)
Inventor
Warren Hawtof Daniel
Lee Henderson Danny
Eugene Smith Greg
Hector Urruti Eric
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21734283&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW343959(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Application granted granted Critical
Publication of TW343959B publication Critical patent/TW343959B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/28—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with integral means for shielding the discharged liquid or other fluent material, e.g. to limit area of spray; with integral means for catching drips or collecting surplus liquid or other fluent material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00157—Controlling the temperature by means of a burner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00159—Controlling the temperature controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/14—Tapered or flared nozzles or ports angled to central burner axis
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/34—Liquid, e.g. mist or aerosol
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/42—Assembly details; Material or dimensions of burner; Manifolds or supports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Silicon Compounds (AREA)
  • Nozzles (AREA)
  • Glass Compositions (AREA)
TW086100125A 1995-12-19 1997-04-07 Method and apparatus for forming fused silica by combustion of liquid reactants TW343959B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US888995P 1995-12-19 1995-12-19

Publications (1)

Publication Number Publication Date
TW343959B true TW343959B (en) 1998-11-01

Family

ID=21734283

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086100125A TW343959B (en) 1995-12-19 1997-04-07 Method and apparatus for forming fused silica by combustion of liquid reactants

Country Status (13)

Country Link
US (1) US6565823B1 (zh)
EP (1) EP0868401B1 (zh)
JP (1) JP4089922B2 (zh)
KR (1) KR100473827B1 (zh)
CN (1) CN1128111C (zh)
AT (1) ATE272573T1 (zh)
AU (1) AU718737B2 (zh)
BR (1) BR9611969A (zh)
CA (1) CA2233021A1 (zh)
DE (1) DE69633066D1 (zh)
TW (1) TW343959B (zh)
UA (1) UA46068C2 (zh)
WO (1) WO1997022553A1 (zh)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6312656B1 (en) * 1995-12-19 2001-11-06 Corning Incorporated Method for forming silica by combustion of liquid reactants using oxygen
CN1232436A (zh) * 1996-10-08 1999-10-20 康宁股份有限公司 抑制硅氧烷原料胶凝的方法和抑制胶凝的原料
CA2288769A1 (en) * 1997-07-08 1999-01-21 Corning Incorporated Germanium chloride and siloxane feedstock for forming silica glass and method
US5979185A (en) * 1997-07-16 1999-11-09 Corning Incorporated Method and apparatus for forming silica by combustion of liquid reactants using a heater
AU727914B2 (en) * 1997-07-21 2001-01-04 Corning Incorporated Method and apparatus for producing low flow rates of feedstock vapors
US6094940A (en) 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
JPH11116247A (ja) * 1997-10-09 1999-04-27 Nikon Corp 合成石英ガラス製造方法
JP4038866B2 (ja) * 1998-03-11 2008-01-30 株式会社ニコン 合成石英ガラス製造方法
KR20010033239A (ko) * 1997-12-19 2001-04-25 알프레드 엘. 미첼슨 금속 산화물 매진을 제조하기 위한 방법 및 버너
EP0978487A3 (en) 1998-08-07 2001-02-21 Corning Incorporated Sealed, nozzle-mix burners for silica deposition
ZA994173B (en) * 1998-08-07 2000-03-06 Corning Inc System and method for plug free delivery of liquid reactants through a burner assembly to form soot for the manufacture of glass.
US6260385B1 (en) * 1998-08-07 2001-07-17 Corning Incorporated Method and burner for forming silica-containing soot
US6705127B1 (en) 1998-10-30 2004-03-16 Corning Incorporated Methods of manufacturing soot for optical fiber preforms and preforms made by the methods
CA2344806A1 (en) * 1998-10-30 2000-05-11 Michael B. Cain Methods of manufacturing soot for optical fiber preforms and preforms made by the methods
US6736633B1 (en) 1998-12-17 2004-05-18 Corning Incorporated Burner manifold apparatus for use in a chemical vapor deposition process
US6336347B1 (en) 1998-12-28 2002-01-08 Pirelli Cavi E Sistemi S.P.A. Process for producing silica by decomposition of an organosilane
GB2346683A (en) * 1999-02-05 2000-08-16 Univ Glasgow Flame hydrolysis deposition burner
WO2000060286A1 (en) 1999-04-06 2000-10-12 Shin-Etsu Chemical Co., Ltd. Burner and combustion furnace for combustion and flame hydrolysis and combustion method
US6418756B1 (en) 2000-01-28 2002-07-16 Corning Incorporated Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
US20030070452A1 (en) * 2001-10-12 2003-04-17 Alcatel Process for online spheroidization of quartz and silica particles
WO2004048261A2 (en) * 2002-11-26 2004-06-10 Cabot Corporation Fumed metal oxide particles and process for producing the same
DE10302914B4 (de) * 2003-01-24 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
FI116619B (fi) * 2004-07-02 2006-01-13 Liekki Oy Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde
KR100975746B1 (ko) * 2004-08-11 2010-08-12 현대중공업 주식회사 프로펠러 및 금속 주조를 위한 통합 압탕가열장치
JP4412485B2 (ja) * 2004-12-10 2010-02-10 信越化学工業株式会社 シリコーンゴムと基材との一体成形複合体及びその製造方法
US20070165308A1 (en) * 2005-12-15 2007-07-19 Jian Wang Optical retarders and methods of making the same
US20090079187A1 (en) * 2007-09-25 2009-03-26 Itt Automotive, Inc. Fluidic coupling with deformable quick connector
KR101256299B1 (ko) * 2008-05-16 2013-04-18 덴키 가가쿠 고교 가부시기가이샤 비정질 실리카질 분말, 그의 제조 방법 및 용도
US8729158B2 (en) * 2008-09-05 2014-05-20 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
US8038971B2 (en) * 2008-09-05 2011-10-18 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
GB2478307A (en) 2010-03-02 2011-09-07 Heraeus Quartz Uk Ltd Manufacture of silica glass
RU2435732C1 (ru) * 2010-05-20 2011-12-10 Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганческих соединений" (ФГУ ГНИИХТЭОС) Устройство и способ получения высокодисперсного диоксида кремния
US8840858B2 (en) * 2011-07-06 2014-09-23 Corning Incorporated Apparatus for mixing vaporized precursor and gas and method therefor
JP6236866B2 (ja) * 2013-05-15 2017-11-29 住友電気工業株式会社 ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー
JP6086168B2 (ja) * 2016-04-01 2017-03-01 住友電気工業株式会社 ガラス微粒子堆積体の製造方法およびガラス母材の製造方法
CN106277750A (zh) * 2016-08-19 2017-01-04 中国建筑材料科学研究总院 石英玻璃的制备方法
KR101880728B1 (ko) 2017-01-06 2018-07-23 배명인 각도 및 길이조절이 가능한 조명장치
JP7659883B2 (ja) * 2021-01-25 2025-04-10 株式会社セイワマシン 溶射装置
JP7792805B2 (ja) * 2022-01-28 2025-12-26 信越石英株式会社 気化装置への液体原料供給システム及び液体原料供給方法

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2272342A (en) 1934-08-27 1942-02-10 Corning Glass Works Method of making a transparent article of silica
US2188121A (en) 1936-12-11 1940-01-23 Corning Glass Works Making articles of fused silica
US2269059A (en) 1938-05-14 1942-01-06 Corning Glass Works Method of preparing finely comminuted oxides
US2239551A (en) 1939-04-22 1941-04-22 Corning Glass Works Method of making sealing glasses and seals for quartz lamps
BE438752A (zh) 1939-04-22
US3117838A (en) 1957-08-02 1964-01-14 Int Standard Electric Corp Manufacture of silica
US3416890A (en) 1965-12-16 1968-12-17 Owens Illinois Inc Process of producing oxides of metals and metalloids
US3489579A (en) 1966-05-25 1970-01-13 Us Army Ablative heat shielding and injection cooling by addition of surface active agents
DE1667044C3 (de) 1967-04-13 1981-01-29 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung feinteiliger Oxide aus Halogeniden
US3698936A (en) 1969-12-19 1972-10-17 Texas Instruments Inc Production of very high purity metal oxide articles
US3666414A (en) 1971-03-15 1972-05-30 Heraeus Schott Quarzschmelze Method of producing transparent or opaque fused silica or glass with a high silicon content
US3883336A (en) 1974-01-11 1975-05-13 Corning Glass Works Method of producing glass in a flame
US4529427A (en) 1977-05-19 1985-07-16 At&T Bell Laboratories Method for making low-loss optical waveguides on an industrial scale
US4165223A (en) 1978-03-06 1979-08-21 Corning Glass Works Method of making dry optical waveguides
US4173305A (en) * 1978-03-10 1979-11-06 Corning Glass Works System for delivering materials to deposition site on optical waveguide blank
JPS54142317A (en) * 1978-04-24 1979-11-06 Hitachi Ltd Production of optical fibers
JPS54145642A (en) 1978-05-09 1979-11-14 Tokushiyu Muki Zairiyou Kenkiy Method of manufacturing heat resisting semiiinorganic compound
JPS5523067A (en) * 1978-08-07 1980-02-19 Nippon Telegr & Teleph Corp <Ntt> Forming method for oxide powder layer for optical fiber
JPS5614438A (en) * 1979-07-18 1981-02-12 Hitachi Ltd Manufacture of optical fiber base material
IT1119362B (it) 1979-09-10 1986-03-10 Cselt Centro Studi Lab Telecom Procedimento ed apparecchiatura per la produzione di preforme per fibre ottiche
CA1166527A (en) 1979-09-26 1984-05-01 Shiro Takahashi Method and apparatus for producing multi-component glass fiber preform
US4366335A (en) * 1981-01-05 1982-12-28 Exxon Research And Engineering Co. Indium oxide/n-silicon heterojunction solar cells
US4436765A (en) * 1981-04-30 1984-03-13 Exxon Research And Engineering Co. Method for forming indium oxide/n-silicon heterojunction solar cells
JPS58213639A (ja) 1982-06-04 1983-12-12 Nippon Telegr & Teleph Corp <Ntt> 光学系ガラスス−トの生成方法
US4501602A (en) 1982-09-15 1985-02-26 Corning Glass Works Process for making sintered glasses and ceramics
US4491604A (en) 1982-12-27 1985-01-01 Lesk Israel A Silicon deposition process
JPS6090838A (ja) 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 光伝送用石英ガラス母材の製造方法
JPS6096591A (ja) * 1983-10-28 1985-05-30 株式会社金門製作所 セラミツク超微粉末の無機材料へのコ−テイング法
JPS60108338A (ja) * 1983-11-15 1985-06-13 Nippon Telegr & Teleph Corp <Ntt> 光フアイバ母材の製造方法
US4810673A (en) 1986-09-18 1989-03-07 Texas Instruments Incorporated Oxide deposition method
JPH01138145A (ja) 1987-08-20 1989-05-31 Shin Etsu Chem Co Ltd 合成石英ガラス部材の製造方法
GB8905966D0 (en) * 1989-03-15 1989-04-26 Tsl Group Plc Improved vitreous silica products
US5108665A (en) 1990-02-16 1992-04-28 Corning Incorporated Enstatite body and method
US5110335A (en) 1990-06-25 1992-05-05 At&T Bell Laboratories Method of glass soot deposition using ultrasonic nozzle
US5152819A (en) 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
DE4106563C2 (de) * 1991-03-01 1999-06-02 Bosch Gmbh Robert Vorrichtung zur elektrostatischen Zerstäubung von Flüssigkeiten
US5170727A (en) * 1991-03-29 1992-12-15 Union Carbide Chemicals & Plastics Technology Corporation Supercritical fluids as diluents in combustion of liquid fuels and waste materials
JP3079395B2 (ja) * 1991-06-26 2000-08-21 三好化成株式会社 有機ケイ素化合物処理顔料、その製法および化粧料
US5458681A (en) * 1991-06-26 1995-10-17 Miyoshi Kasei Co., Ltd. Organosilicon-treated pigment, process for production thereof, and cosmetic made therewith
US5268337A (en) 1991-11-18 1993-12-07 The Johns Hopkins University Ceramic oxide powders and the formation thereof
US5622750A (en) 1994-10-31 1997-04-22 Lucent Technologies Inc. Aerosol process for the manufacture of planar waveguides
US5703191A (en) 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
DE19725955C1 (de) 1997-06-19 1999-01-21 Heraeus Quarzglas Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeignete Vorrichtung
US5979185A (en) * 1997-07-16 1999-11-09 Corning Incorporated Method and apparatus for forming silica by combustion of liquid reactants using a heater

Also Published As

Publication number Publication date
KR20000064466A (ko) 2000-11-06
EP0868401B1 (en) 2004-08-04
EP0868401A4 (en) 1999-03-17
EP0868401A1 (en) 1998-10-07
US6565823B1 (en) 2003-05-20
CN1204299A (zh) 1999-01-06
JP2000502040A (ja) 2000-02-22
WO1997022553A1 (en) 1997-06-26
UA46068C2 (uk) 2002-05-15
ATE272573T1 (de) 2004-08-15
AU718737B2 (en) 2000-04-20
AU1520697A (en) 1997-07-14
CN1128111C (zh) 2003-11-19
CA2233021A1 (en) 1997-06-26
KR100473827B1 (ko) 2005-07-18
JP4089922B2 (ja) 2008-05-28
DE69633066D1 (de) 2004-09-09
BR9611969A (pt) 1999-02-17

Similar Documents

Publication Publication Date Title
TW343959B (en) Method and apparatus for forming fused silica by combustion of liquid reactants
TW352380B (en) Optical-device forming method and apparatus
NZ308875A (en) Method of preparing 3-haloalkyl-1h-pyrazoles
EG20710A (en) Apparatus for biomass production
MX9707021A (es) Receptor de il-7.
WO1996034981A2 (fr) METHODE DE COUPLAGE SPECIFIQUE DE LA COIFFE DE L&#39;EXTREMITE 5&#39; D&#39;UN FRAGMENT D&#39;ARNm ET PREPARATION D&#39;ARNm ET D&#39;ADNc COMPLET
HUP9602685A3 (en) Substituted quinoline-2-carboxylic-amides, process for producing them, their use as medicines and intermediates
DK0810981T3 (da) Fremgangsmåde til fremstilling af et mineraluldsprodukt
ZA964713B (en) Composition, process and apparatus for producing phosphine-containing gas.
CA2366449A1 (en) Method and apparatus for production of amorphous silica from silicon and silicon-containing materials
EP0797046A3 (en) Toroidal vortex combustion for low heating value liquid
AU5047896A (en) Process, and apparatus, for the injection of preheated oxygen into a high temperature reactor
MY113056A (en) Preparation process of ginkgolide b from ginkgolide c
DE3568264D1 (en) Apparatus for the production of metal powder by atomising, using an inert gas or nitrogen
AU8722282A (en) Process for generating synthesis gas
TW349075B (en) Process entailing sol-gel production of silica glass
PL314965A1 (en) Method of transforming bisnoralcohol into bisnoraldehyde
HUP9900770A3 (en) Process and apparatus for producing fuel gas
NZ314504A (en) Method of bending thin sheet, typically methyl methacrylate, by heating at 80 to 200 degrees centigrade for 5 seconds to 10 minutes then bending in vacuum forming station
IL87807A0 (en) Process for producing 4,4&#39;-dibromodiphenyl ether
MY121092A (en) Preparation of tetrahydrofuran
IL83047A0 (en) Monoclonal antibodies to pseudomonas aerigunosa flagella,method and cell line for their production and pharmaceutical compositions containing them
EP0753500A3 (en) Process for the preparation of ethers
HUP9801428A3 (en) Process for preparing prostaglandin e1, e2 and analogs thereof using furylcopper reagents
TW354385B (en) Apparatus adapted to use shape memory member