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TW202404930A - Abating unwanted emulsion polymerization during extractive distillation of conjugated diene monomers - Google Patents

Abating unwanted emulsion polymerization during extractive distillation of conjugated diene monomers Download PDF

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TW202404930A
TW202404930A TW112110924A TW112110924A TW202404930A TW 202404930 A TW202404930 A TW 202404930A TW 112110924 A TW112110924 A TW 112110924A TW 112110924 A TW112110924 A TW 112110924A TW 202404930 A TW202404930 A TW 202404930A
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tetramethylpiperidin
oxy
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butyl
methyl
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習正興
佩卓 喬治 卡瓦略 坎波斯
黛比 羅莎娜
強納森 瑪西爾
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美商藝康美國公司
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Abstract

Inhibitor compositions for abating undesirable emulsion polymerization during processing of hydrocarbon stream laden with reactive vinylic monomers are provided. The polymerization inhibitor compositions include at least a first inhibitor compound having a stable nitroxide radical and a second inhibitor including phenylenediamine. Methods of inhibiting the polymerization of monomers using the compositions of the disclosure are also provided. The methods of inhibiting polymerization of monomers include a step of adding a composition of the disclosure to a process stream. The process stream includes an ethylenically unsaturated monomer that is suspended in the bulk-phase and highly polar solvents as distractive distillation solvents.

Description

在共軛二烯單體之萃取蒸餾期間減少非所要之乳化聚合Reduce undesired emulsion polymerization during extractive distillation of conjugated diene monomers

本揭露大致上關於包括聚合抑制劑之摻合物的組成物及使用其之方法。更具體而言,本揭露關於包括至少一種具有穩定的氮氧自由基(nitroxide radical)之化合物及苯二胺的組成物,其可用於抑制烯系不飽和單體之乳化聚合。The present disclosure generally relates to compositions including blends of polymerization inhibitors and methods of using the same. More specifically, the present disclosure relates to a composition including at least one compound with stable nitroxide radical and phenylenediamine, which can be used to inhibit the emulsion polymerization of ethylenically unsaturated monomers.

烯系不飽和單體之製造一般包含三個階段:反應、粗產物回收、及通過分餾之產物純化。在升高溫度下執行之蒸餾操作經常涉及回收及純化階段。烯系不飽和單體(諸如苯乙烯、丁二烯、異戊二烯、二乙烯基苯、環戊二烯、二環戊二烯、乙酸乙烯酯、丙烯酸酯、及甲基丙烯酸酯單體)存在於粗製程流(crude process stream)中或於藉由各種化學工業製程製造之精製產品中。然而,該等單體具有高反應性,尤其在升高溫度下、在氧氣存在下、或當與金屬氧化物表面接觸時。因此,此等單體類型極易通過自由基聚合發生非所欲聚合。此問題係嚴重的,尤其在升高溫度下及在聚合起始劑(諸如有機過氧化物)存在下。所得聚合物可能有問題且導致設備「積汙(fouling)」及產品汙染及消耗。一旦所得聚合物在加工階段期間從溶液中沉澱出來並沉積至設備表面上,生產效率就會降低。由於製程設備之積汙,必須暫停操作,以機械方式清潔設備及/或移除非所欲聚合物。操作停止導致操作者重大的財務損失。聚合物亦可能作為可溶性產物汙染物保留在溶液中。汙染可能需要額外的加工步驟,以自最終產物組成物流或儲存之產物中移除汙染物聚合物。以上提及之所有問題已使得勢必要開發及使用在線(online)化學清潔程序以減輕積汙,並藉以消除財務上代價高昂的操作停機。The manufacture of ethylenically unsaturated monomers generally involves three stages: reaction, crude product recovery, and product purification by fractionation. Distillation operations performed at elevated temperatures often involve recovery and purification stages. Ethylenically unsaturated monomers (such as styrene, butadiene, isoprene, divinylbenzene, cyclopentadiene, dicyclopentadiene, vinyl acetate, acrylate, and methacrylate monomers ) found in crude process streams or in refined products manufactured by various chemical industry processes. However, these monomers are highly reactive, especially at elevated temperatures, in the presence of oxygen, or when in contact with metal oxide surfaces. Therefore, these monomer types are highly susceptible to undesired polymerization via free radical polymerization. This problem is serious, especially at elevated temperatures and in the presence of polymerization initiators such as organic peroxides. The resulting polymer can be problematic and lead to equipment "fouling" and product contamination and consumption. Once the resulting polymer precipitates out of solution and deposits onto equipment surfaces during the processing stages, production efficiency is reduced. Due to contamination of process equipment, operations must be suspended to mechanically clean the equipment and/or remove undesired polymers. The cessation of operations resulted in significant financial losses for the operator. Polymers may also remain in solution as soluble product contaminants. Contamination may require additional processing steps to remove the contaminating polymer from the final product component stream or stored product. All of the issues mentioned above have necessitated the development and use of online chemical cleaning processes to reduce fouling and thereby eliminate financially costly operational downtime.

此等單體之過早聚合通常藉由給予能夠消除或顯著降低單體之過早聚合的聚合抑制劑來減少。習知聚合抑制劑包括可有效地清除以碳為中心之自由基(carbon-centered radical)的穩定自由基。Premature polymerization of such monomers is usually reduced by administering polymerization inhibitors capable of eliminating or significantly reducing premature polymerization of the monomers. Conventional polymerization inhibitors include stable free radicals that can effectively scavenge carbon-centered radicals.

在反應性共軛二烯單體(諸如丁二烯及異戊二烯)之萃取蒸餾期間,所述之低極性單體係懸浮於整體相(bulk-phase)及高極性溶劑中,如N,N-二甲基甲醯胺(DMF)、N-甲基吡咯啶酮(NMP)、及乙腈。除非使用有效的抑制劑,否則分散之單體會經歷非所要之自由基聚合。此導致積汙,其將造成生產損失及非預期停機。During the extractive distillation of reactive conjugated diene monomers such as butadiene and isoprene, the low polarity monomer system is suspended in a bulk-phase and a highly polar solvent such as N , N-dimethylformamide (DMF), N-methylpyrrolidone (NMP), and acetonitrile. Unless effective inhibitors are used, the dispersed monomers will undergo undesirable free radical polymerization. This leads to contamination, which can cause production losses and unanticipated downtime.

習知聚合抑制劑,諸如4-羥基-2,2,6,6-四甲基哌啶-1-氧自由基(HTEMPO)及4-側氧基-2,2,6,6-四甲基哌啶-1-氧自由基(OTEMPO),係實質上分散至該整體相中,且少部分在該反應性單體之非極性液滴中,這使其在防止乳化聚合時不起作用。Conventional polymerization inhibitors, such as 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl radical (HTEMPO) and 4-side oxy-2,2,6,6-tetramethyl Piperidin-1-oxyl radical (OTEMPO) is substantially dispersed in the overall phase, and a small part is in the non-polar droplets of the reactive monomer, which makes it ineffective in preventing emulsion polymerization. .

提供一種用於抑制單體聚合之組成物。該組成物包括包含穩定的氮氧自由基之第一抑制劑化合物,及包含苯二胺之第二抑制劑化合物。A composition for inhibiting monomer polymerization is provided. The composition includes a first inhibitor compound including stable nitroxide radicals, and a second inhibitor compound including phenylenediamine.

在一些態樣中,第一抑制劑化合物具有式(I): (I) 其中R 1係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, the first inhibitor compound has Formula (I): (I) wherein R 1 is a C 1 -C 22 alkyl or aryl group, wherein the alkyl and aryl groups are optionally substituted with one or more C 1 -C 22 alkyl or aryl groups.

在一些態樣中,第一抑制劑係選自由下列所組成之群組:1-氧自由基-2,2,6,6-四甲基胡椒鹼-4-醇;4-甲氧基-2,2,6,6-四甲基哌啶-1-氧基;4-乙氧基-2,2,6,6-四甲基哌啶-1-氧基;4-丙氧基-2,2,6,6-四甲基哌啶-1-氧基;4-丁氧基-2,2,6,6-四甲基哌啶-1-氧基;4-戊氧基-2,2,6,6-四甲基哌啶-1-氧基;4-己氧基-2,2,6,6-四甲基哌啶-1-氧基;4-庚氧基-2,2,6,6-四甲基哌啶-1-氧基;4-辛氧基-2,2,6,6-四甲基哌啶-1-氧基;4-壬氧基-2,2,6,6-四甲基哌啶-1-氧基;4-癸氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十一烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十二烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十三烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十四烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十五烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十六烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十七烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十八烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十九烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-癸氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十一烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十二烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-(苯氧基)2,2,6,6-四甲基哌啶-1-氧基;4-(苄氧基)-2,2,6,6-四甲基哌啶-1-氧基;2,2,6,6-四甲基-4-(萘-2-基氧基)哌啶-1-氧基;及其任何組合。In some aspects, the first inhibitor is selected from the group consisting of: 1-oxyl-2,2,6,6-tetramethylpiperine-4-ol; 4-methoxy- 2,2,6,6-tetramethylpiperidin-1-oxy; 4-ethoxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-propoxy- 2,2,6,6-tetramethylpiperidin-1-oxy; 4-butoxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-pentyloxy- 2,2,6,6-tetramethylpiperidin-1-oxy; 4-hexyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-heptyloxy- 2,2,6,6-tetramethylpiperidin-1-oxy; 4-octyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-nonyloxy- 2,2,6,6-tetramethylpiperidin-1-oxy; 4-decyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-undecyloxy Base-2,2,6,6-tetramethylpiperidin-1-oxy; 4-dodecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4- Tridecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-tetradecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy base; 4-pentadecyloxy-2,2,6,6-tetramethylpiperidine-1-oxy; 4-hexadecyloxy-2,2,6,6-tetramethylpiperidine -1-oxy; 4-heptadecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-octadecyloxy-2,2,6,6-tetramethyl Methylpiperidin-1-oxy; 4-nonadecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-decyloxy-2,2,6,6 -Tetramethylpiperidin-1-oxy; 4-eicosyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-eicosyloxy-2, 2,6,6-tetramethylpiperidin-1-oxy; 4-docosyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-(phenoxy base) 2,2,6,6-tetramethylpiperidin-1-oxyl; 4-(benzyloxy)-2,2,6,6-tetramethylpiperidin-1-oxyl; 2, 2,6,6-tetramethyl-4-(naphth-2-yloxy)piperidin-1-oxy; and any combination thereof.

在一些態樣中,第一抑制劑係式III之化合物: (III) 其中R 3係–O•或–OH;且R 4係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, the first inhibitor is a compound of Formula III: (III) wherein R 3 is –O• or –OH; and R 4 is C 1 -C 22 alkyl or aryl, wherein the alkyl and aryl groups are optionally modified by one or more C 1 -C 22 alkyl substituted by aryl or aryl groups.

在一些態樣中,第一抑制劑係選自由下列所組成之群組:1-氧自由基-2,2,6,6-四甲基哌啶-4-基乙酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基丙酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基丁酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基戊酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基己酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基庚酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基辛酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基壬酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基癸酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基十一酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基十二酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基2-乙基己酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基硬脂酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基苯甲酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基棕櫚酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基二十二酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基4-三級丁基苯甲酸酯;及其任何組合。In some aspects, the first inhibitor is selected from the group consisting of: 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yl acetate; 1-oxyradical Free radical-2,2,6,6-tetramethylpiperidin-4-yl butyrate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yl butyrate ;1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl valerate;1-oxyl radical-2,2,6,6-tetramethylpiperidin-4- Hepanoate; 1-Oxyl-2,2,6,6-tetramethylpiperidin-4-ylheptanoate; 1-Oxyl-2,2,6,6-tetramethylpiperidin Din-4-yloctanoate; 1-Oxyl-2,2,6,6-tetramethylpiperidin-4-ylnonanoate; 1-Oxyl-2,2,6,6- Tetramethylpiperidin-4-yl decanoate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yl undecanoate; 1-oxyradical-2,2 ,6,6-tetramethylpiperidin-4-yl dodecanoate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl 2-ethylhexanoate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl stearate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4- 1-oxyl benzoate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl palmitate; 1-oxyl radical-2,2,6,6-tetramethyl Piperidin-4-yl behenate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yl 4-tertiary butyl benzoate; and any combination thereof .

在一些態樣中,第二抑制劑化合物係式(IV)或式(V)之苯二胺: , (IV)                     (V) 其中X 1及X 2獨立地係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, the second inhibitor compound is a phenylenediamine of formula (IV) or formula (V): , (IV) ( V ) wherein X 1 and Aryl substitution.

在一些態樣中,X 1及X 2獨立地係C 1-C 22烷基或苯基,其中該烷基及苯基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects , X 1 and replace.

在一些態樣中,X 1及X 2係獨立地C 1-C 10烷基或苯基,其中該烷基及該苯基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, X1 and X2 are independently C1 - C10 alkyl or phenyl, wherein the alkyl and the phenyl are optionally separated by one or more C1 - C22 alkyl or aryl groups. base substitution.

在一些態樣中,X 1及X 2獨立地係C 1-C 5烷基或苯基,其中該烷基及苯基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects , X 1 and replace.

在一些態樣中,第二抑制劑係選自由下列所組成之群組:1,2-苯二胺、1,4-苯二胺、N,N'-二-甲基-對苯二胺、N,N'-二-二級丁基-1,4-苯二胺、N,N'-二-1,4-二甲基戊基-1,4-苯二胺、N,N'-二-乙醯基-1,4-苯二胺、N-三級丁基-N'-苯基-1,4-苯二胺、N,N'-二-苯基-1,4-苯二胺、及其任何組合。In some aspects, the second inhibitor is selected from the group consisting of: 1,2-phenylenediamine, 1,4-phenylenediamine, N,N'-di-methyl-p-phenylenediamine , N,N'-di-secondary butyl-1,4-phenylenediamine, N,N'-di-1,4-dimethylpentyl-1,4-phenylenediamine, N,N' -Di-ethyl-1,4-phenylenediamine, N-tertiary butyl-N'-phenyl-1,4-phenylenediamine, N,N'-di-phenyl-1,4- Phenylenediamine, and any combination thereof.

在一些態樣中,第一抑制劑化合物以約0.01重量%至約80重量%之濃度存在於組成物中。In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 80% by weight.

在一些態樣中,第二抑制劑化合物以約0.01重量%至約50重量%之濃度存在於組成物中。In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01% to about 50% by weight.

在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約100:1至約1:100。In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 100:1 to about 1:100.

在一些態樣中,組成物進一步包含有機溶劑。In some aspects, the composition further includes an organic solvent.

在一些態樣中,組成物進一步包含選自由下列所組成之群組的烯系不飽和單體:乙酸乙烯酯、丙烯腈、丙烯酸酯、甲基丙烯酸酯、1,3-丁二烯、苯乙烯、異戊二烯、丙烯酸、甲基丙烯酸、及其任何組合。In some aspects, the composition further includes an ethylenically unsaturated monomer selected from the group consisting of: vinyl acetate, acrylonitrile, acrylate, methacrylate, 1,3-butadiene, benzene Ethylene, isoprene, acrylic acid, methacrylic acid, and any combination thereof.

提供一種抑制單體聚合之方法。該方法包括將一組成物添加至一萃取蒸餾製程中之一製程流。該組成物包含:第一抑制劑化合物,其包含穩定的氮氧自由基;及第二抑制劑化合物,其包含苯二胺。該製程流包含微胞。Provide a method to inhibit monomer polymerization. The method includes adding a composition to a process stream in an extractive distillation process. The composition includes: a first inhibitor compound including a stable nitroxide radical; and a second inhibitor compound including phenylenediamine. This process flow contains microcells.

在一些態樣中,該製程流包括一單體。In some aspects, the process flow includes a monomer.

在一些態樣中,該製程流包括選自DMF (N,N-二甲基甲醯胺)/糠醛、NMP (N-甲基吡咯啶酮)、乙腈、及其混合物之溶劑。有時,分層現象或微胞會在萃取蒸餾製程中發生。兩種不互溶層形成:一非極性單體層及一極性溶劑層。In some aspects, the process stream includes a solvent selected from the group consisting of DMF (N,N-dimethylformamide)/furfural, NMP (N-methylpyrrolidone), acetonitrile, and mixtures thereof. Sometimes, stratification or microcells can occur during the extractive distillation process. Two immiscible layers are formed: a non-polar monomer layer and a polar solvent layer.

在一些態樣中,相較於該至少一種極性萃取蒸餾溶劑,該烯系不飽和單體更大程度地分配成該至少一種非極性蒸餾溶劑中之一者。In some aspects, the ethylenically unsaturated monomer partitions to a greater extent into one of the at least one non-polar distillation solvent than into the at least one polar extractive distillation solvent.

在一些態樣中,該抑制劑調配物具有自該極性溶劑層分配成該單體層以抑制兩層中過早乳化聚合的能力。In some aspects, the inhibitor formulation has the ability to partition from the polar solvent layer into the monomer layer to inhibit premature emulsion polymerization in both layers.

在一些態樣中,該製程流進一步包含至少一種極性萃取蒸餾溶劑及至少一種非極性萃取蒸餾溶劑,該至少一種非極性萃取蒸餾溶劑包含至少一種烯系不飽和單體。In some aspects, the process stream further includes at least one polar extractive distillation solvent and at least one non-polar extractive distillation solvent, the at least one non-polar extractive distillation solvent comprising at least one ethylenically unsaturated monomer.

在一些態樣中,該至少一種極性萃取蒸餾溶劑及該至少一種非極性萃取蒸餾溶劑係彼此不互溶。In some aspects, the at least one polar extractive distillation solvent and the at least one non-polar extractive distillation solvent are immiscible with each other.

在一些態樣中,相較於該至少一種極性萃取蒸餾溶劑,該第一抑制劑或該第二抑制劑更大程度地分配成至少一種非極性萃取蒸餾溶劑。In some aspects, the first inhibitor or the second inhibitor partitions to a greater extent into at least one non-polar extractive distillation solvent than into the at least one polar extractive distillation solvent.

在一些態樣中,該至少一種非極性萃取蒸餾溶劑係糠醛、四氫呋喃、戊烷、己烷、庚烷、辛烷、壬烷、癸烷、十一烷、十二烷、十三烷、十四烷、苯、甲苯、乙苯、乙基甲苯、二氯甲烷、四氯甲烷、戊烯、己烯、庚烯、辛烯、壬烯、癸烯、十一烯、十二烯、十三烯、十四烯、環戊烷、環戊烯、環己烷、環己烯、二環戊烷、環戊二烯、二環戊二烯、乙酸乙酯、丙酸乙酯、丁酸乙酯、戊酸乙酯、己酸乙酯、庚酸乙酯、乙基、壬酸酯、癸酸乙酯、十一酸乙酯、十二酸乙酯、十三酸乙酯、十四酸乙酯、十五酸乙酯、十六酸乙酯、十八烯酸乙酯、二十二酸乙酯、乙酸甲酯、丙酸甲酯、丁酸甲酯、戊酸甲酯、己酸甲酯、庚酸甲酯、甲基、壬酸酯、癸酸甲酯、十一酸甲酯、十二酸甲酯、十三酸甲酯、十四酸甲酯、十五酸甲酯、十六酸甲酯、十八烯酸甲酯、二十二酸甲酯、乙酸丙酯、丙酸丙酯、丁酸丙酯、戊酸丙酯、己酸丙酯、庚酸丙酯、丙基、壬酸酯、癸酸丙酯、十一酸丙酯、十二酸丙酯、十三酸丙酯、十四酸丙酯、十五酸丙酯、十六酸丙酯、十八烯酸丙酯、二十二酸丙酯、乙酸丁酯、丙酸丁酯、丁酸丁酯、戊酸丁酯、己酸丁酯、庚酸丁酯、丁基、壬酸酯、癸酸丁酯、十一酸丁酯、十二酸丁酯、十三酸丁酯、十四酸丁酯、十五酸丁酯、十六酸丁酯、十八烯酸丁酯、二十二酸丁酯、乙酸己酯、丙酸己酯、丁酸己酯、戊酸己酯、己酸己酯、庚酸己酯、己基、壬酸酯、癸酸己酯、十一酸己酯、十二酸己酯、十三酸己酯、十四酸己酯、十五酸己酯、十六酸己酯、十八烯酸己酯、二十二酸己酯、乙酸辛酯、丙酸辛酯、丁酸辛酯、戊酸辛酯、己酸辛酯、庚酸辛酯、辛基、壬酸酯、癸酸辛酯、十一酸辛酯、十二酸辛酯、十三酸辛酯、十四酸辛酯、十五酸辛酯、十六酸辛酯、十八烯酸辛酯、二十二酸辛酯、及其任何組合。In some aspects, the at least one non-polar extractive distillation solvent is furfural, tetrahydrofuran, pentane, hexane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, Tetrakane, benzene, toluene, ethylbenzene, ethyltoluene, methylene chloride, tetrachloromethane, pentene, hexene, heptene, octene, nonene, decene, undecene, dodecene, thirteen Alkene, tetradecene, cyclopentane, cyclopentene, cyclohexane, cyclohexene, dicyclopentane, cyclopentadiene, dicyclopentadiene, ethyl acetate, ethyl propionate, ethyl butyrate Ester, ethyl valerate, ethyl caproate, ethyl enanthate, ethyl, nonanoate, ethyl caprate, ethyl undecanoate, ethyl dodecanoate, ethyl tridecanoate, tetradecanoate Ethyl ester, ethyl pentadecanoate, ethyl hexadecanoate, ethyl octadecenoate, ethyl behenate, methyl acetate, methyl propionate, methyl butyrate, methyl valerate, caproic acid Methyl ester, methyl enanthate, methyl, nonanoate, methyl caprate, methyl undecanoate, methyl dodecanoate, methyl tridecanoate, methyl myristate, methyl pentadecanoate, Methyl hexadecanoate, methyl octadecenoate, methyl behenate, propyl acetate, propyl propionate, propyl butyrate, propyl valerate, propyl caproate, propyl enanthate, propyl Base, nonanoate, propyl caprate, propyl undecanoate, propyl dodecanoate, propyl tridecanoate, propyl myristate, propyl pentadecanoate, propyl hexadecanoate, octadecene Propyl acid, propyl behenate, butyl acetate, butyl propionate, butyl butyrate, butyl valerate, butyl hexanoate, butyl enanthate, butyl, nonanoate, butyl decanoate Ester, butyl undecanoate, butyl dodecanoate, butyl tridecanoate, butyl myristate, butyl pentadecanoate, butyl hexadecanoate, butyl octadecenoate, butyl behenate Ester, hexyl acetate, hexyl propionate, hexyl butyrate, hexyl valerate, hexyl hexanoate, hexyl enanthate, hexyl, nonanoate, hexyl caprate, hexyl undecanoate, dodecanate Hexyl acid, hexyl tridecanoate, hexyl myristate, hexyl pentadecanoate, hexyl hexadecanoate, hexyl octadecenoate, hexyl behenate, octyl acetate, octyl propionate, Octyl butyrate, octyl valerate, octyl caproate, octyl enanthate, octyl, nonanoate, octyl caprate, octyl undecanoate, octyl dodecanoate, octyl tridecanoate, octyl myristate, pentadecanoate Octyl acid, octyl hexadecanoate, octyl octadecenoate, octyl behenate, and any combination thereof.

在一些態樣中,該至少一種非極性萃取蒸餾溶劑係烷烴、烯烴、環烷烴、環烯烴、芳基、烷基芳基、芳基烷基、有機酯、醚、環狀醚、及/或所屬技術領域中已知之其他非極性溶劑。In some aspects, the at least one non-polar extractive distillation solvent is an alkane, an alkene, a cycloalkane, a cycloalkene, an aryl, an alkylaryl, an arylalkyl, an organic ester, an ether, a cyclic ether, and/or Other non-polar solvents known in the art.

在一些態樣中,該至少一種非極性萃取蒸餾溶劑係選自由下列所組成之群組:乙酸乙烯酯、丙烯腈、丙烯酸酯、甲基丙烯酸酯、1,3-丁二烯、苯乙烯、異戊二烯、環戊二烯、二環戊二烯、丙烯酸、甲基丙烯酸、及其任何組合。In some aspects, the at least one non-polar extractive distillation solvent is selected from the group consisting of: vinyl acetate, acrylonitrile, acrylate, methacrylate, 1,3-butadiene, styrene, Isoprene, cyclopentadiene, dicyclopentadiene, acrylic acid, methacrylic acid, and any combination thereof.

在一些態樣中,該至少一種極性萃取蒸餾溶劑係選自N,N-二甲基甲醯胺、糠醛、N-甲基吡咯啶酮、乙腈、水、及其組合。In some aspects, the at least one polar extractive distillation solvent is selected from the group consisting of N,N-dimethylformamide, furfural, N-methylpyrrolidone, acetonitrile, water, and combinations thereof.

在一些態樣中,單體係烯系不飽和單體。In some aspects, the monomer is an ethylenically unsaturated monomer.

在一些態樣中,將組成物添加至製程流中,使得第一抑制劑化合物之濃度係約0.1 ppm至約10,000 ppm。In some aspects, the composition is added to the process stream such that the concentration of the first inhibitor compound is from about 0.1 ppm to about 10,000 ppm.

在一些態樣中,將組成物添加至製程流中,使得第二抑制劑化合物之濃度係約0.1 ppm至約10,000 ppm。In some aspects, the composition is added to the process stream such that the concentration of the second inhibitor compound is from about 0.1 ppm to about 10,000 ppm.

在一些態樣中,單體係選自由下列所組成之群組:乙酸乙烯酯、丙烯腈、丙烯酸酯、甲基丙烯酸酯、1,3-丁二烯、苯乙烯、二乙烯基苯、異戊二烯、環戊二烯、二環戊二烯、丙烯酸、甲基丙烯酸、及其任何組合。In some aspects, the monosystem is selected from the group consisting of: vinyl acetate, acrylonitrile, acrylate, methacrylate, 1,3-butadiene, styrene, divinylbenzene, iso Pentadiene, cyclopentadiene, dicyclopentadiene, acrylic acid, methacrylic acid, and any combination thereof.

前文已相當廣泛地概述本發明之特徵及技術優勢,以便可更好地理解以下實施方式。下文將描述本發明之額外特徵及優勢,其形成本申請案之申請專利範圍之主題。所屬技術領域中具有通常知識者應理解,所揭示之概念及具體態樣可容易地用作修改或設計用於進行本揭露之相同目的之其他態樣的基礎。所屬技術領域中具有通常知識者亦應意識到,此類等效態樣不背離如在隨附申請專利範圍中所闡述之本揭露之精神及範疇。The foregoing has given a rather broad overview of the features and technical advantages of the present invention in order to better understand the following embodiments. Additional features and advantages of the invention will be described hereinafter which form the subject of the patent claims of the present application. It should be understood by those of ordinary skill in the art that the conception and specific aspects disclosed may be readily utilized as a basis for modifying or designing other aspects for carrying out the same purposes of the present disclosure. Those of ordinary skill in the art should also realize that such equivalents do not depart from the spirit and scope of the present disclosure as set forth in the accompanying patent claims.

本揭露之各種態樣係描述於下。態樣之各種元件的關係及功能可參照以下實施方式更充分地理解。然而,態樣不限於本文所明確描述者,且應理解的是,在某些情況下,可能省略對於理解本文所揭示之態樣而言不必要的細節,諸如例如習知合成及/或調配。Various aspects of this disclosure are described below. The relationships and functions of various components of the aspect can be more fully understood with reference to the following embodiments. However, aspects are not limited to those expressly described herein, and it is understood that in some cases, details unnecessary to understanding the aspects disclosed herein may be omitted, such as, for example, conventional synthesis and/or formulation. .

在反應性共軛二烯單體之萃取蒸餾期間,乳化聚合可發生,導致非所要之積汙。需要可有效防止乳化聚合之聚合抑制劑。本文所揭示之組合物及方法可防止或減少乳化聚合。During the extractive distillation of reactive conjugated diene monomers, emulsion polymerization can occur, resulting in undesirable fouling. There is a need for polymerization inhibitors that can effectively prevent emulsion polymerization. The compositions and methods disclosed herein prevent or reduce emulsion polymerization.

提供一種抑制單體聚合之方法。該方法包括將一組成物添加至一萃取蒸餾製程中之一製程流。該組成物包含包含穩定的氮氧自由基之第一抑制劑化合物,及包含苯二胺之第二抑制劑化合物。該製程流包含微胞。Provide a method to inhibit monomer polymerization. The method includes adding a composition to a process stream in an extractive distillation process. The composition includes a first inhibitor compound including stable nitroxide radicals, and a second inhibitor compound including phenylenediamine. This process flow contains microcells.

如本文中所使用,「微胞(micelles)」係指兩親分子之聚集。微胞係在不同量之兩種不互溶液體攪動時形成,使得該較少之液體係分散至整體液體中成為液滴。該分散液滴構成微胞,而該整體液體係連續相。As used herein, "micelles" refer to aggregates of amphiphilic molecules. Microcells are formed when two immiscible liquids in different amounts are stirred, causing the smaller liquid system to disperse into the overall liquid to form droplets. The dispersed droplets constitute microcells, and the bulk liquid system is a continuous phase.

本揭露關於包括聚合抑制劑之摻合物的組成物及使用其以抑制烯系不飽和單體之聚合之方法。本揭露之聚合抑制劑組成物包括至少一種具有熱穩定及化學穩定的氮氧自由基之化合物及苯二胺。聚合抑制劑組成物可係多種組分之摻合物,包括前述具有穩定的氮氧自由基之化合物及苯二胺以外的組分。The present disclosure relates to compositions including blends of polymerization inhibitors and methods of using the same to inhibit the polymerization of ethylenically unsaturated monomers. The polymerization inhibitor composition of the present disclosure includes at least one compound with thermally and chemically stable nitroxide radicals and phenylenediamine. The polymerization inhibitor composition can be a blend of multiple components, including the aforementioned compounds with stable nitroxide radicals and components other than phenylenediamine.

在可聚合單體存在下,「聚合抑制劑(polymerization inhibitor)」在停機條件下之誘導時間期間抑制此等單體之聚合。在聚合抑制劑完全消耗後之誘導時間過去之後,聚合物的形成係以與聚合抑制劑完全不存在之情況下相同的速率發生。In the presence of polymerizable monomers, a "polymerization inhibitor" inhibits the polymerization of these monomers during the induction time under shutdown conditions. After the induction time has elapsed after the polymerization inhibitor has been completely consumed, polymer formation occurs at the same rate as in the complete absence of the polymerization inhibitor.

通常可將聚合抑制劑及聚合阻滯劑視為「抗聚合劑(antipolymerant)」,其係可抑制或減少自一或多種可自由基聚合化合物形成聚合物的化合物。Polymerization inhibitors and polymerization retarders can generally be considered "antipolymerants", which are compounds that inhibit or reduce the formation of polymers from one or more radically polymerizable compounds.

用語「積汙(fouling)」係指形成聚合物、預聚物、寡聚物、及/或其他物質,其在設備操作的條件下將變得不溶於流中及/或自流中沉澱出並沉積於設備上。繼而,本揭露之抑制劑組成物可稱為「防積汙(antifouling)」,因其抑制或減少汙垢聚合物的形成。 本揭露之組成物 The term "fouling" means the formation of polymers, prepolymers, oligomers, and/or other substances that, under the conditions under which the equipment is operated, will become insoluble in the stream and/or precipitate out of the stream and deposited on equipment. In turn, the inhibitor composition of the present disclosure may be referred to as "antifouling" because it inhibits or reduces the formation of fouling polymers. Composition of the present disclosure

本揭露關於用於抑制單體聚合之組成物,其中組成物包括具有穩定的氮氧自由基之第一抑制劑化合物及第二抑制劑化合物苯二胺。在一些態樣中,本文所使用之組成物尤其可用於蒸餾塔中之高苛刻度條件。在一些態樣中,組成物係用於抑制單體聚合,其中單體係烯系不飽和單體。例如,本揭露之組成物可用於抑制烯系不飽和單體之聚合,單體包括但不限於乙酸乙烯酯、丙烯腈、丙烯酸酯、甲基丙烯酸酯、1,3-丁二烯、苯乙烯、異戊二烯、丙烯酸、(甲基)丙烯酸、及其組合。The present disclosure relates to a composition for inhibiting monomer polymerization, wherein the composition includes a first inhibitor compound having stable nitroxide radicals and a second inhibitor compound phenylenediamine. In some aspects, the compositions used herein are particularly useful in the high-severity conditions found in distillation columns. In some aspects, the composition is used to inhibit polymerization of a monomer, wherein the monomer is an ethylenically unsaturated monomer. For example, the composition of the present disclosure can be used to inhibit the polymerization of ethylenically unsaturated monomers, including but not limited to vinyl acetate, acrylonitrile, acrylate, methacrylate, 1,3-butadiene, styrene , isoprene, acrylic acid, (meth)acrylic acid, and combinations thereof.

在一些態樣中,本揭露之組成物可用於在高苛刻度操作條件下抑制烯系不飽和單體之聚合。In some aspects, the compositions of the present disclosure can be used to inhibit the polymerization of ethylenically unsaturated monomers under highly severe operating conditions.

在一些態樣中,具有穩定的氮氧自由基之第一抑制劑化合物係式(I)之化合物: (I) 其中R 1係H、C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、C 1-C 22環烷基、芳基、–C 1-C 22伸烷基、–C(O)(C 1-C 22烷基)、–C(O)(C 1-C 22烯基)、–C(O)(C 1-C 22炔基)、–C(O)(C 1-C 22環烷基)、–C(O)(芳基)、或–C(O)(C 1-C 22伸烷基芳基),其中該烷基、環烷基、及芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。 In some aspects, the first inhibitor compound having a stable nitroxide radical is a compound of formula (I): (I) wherein R 1 is H, C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, C 1 -C 22 cycloalkyl, aryl, –C 1 -C 22 Alkylene, -C(O)(C 1 -C 22 alkyl), -C(O)(C 1 -C 22 alkenyl), -C(O)(C 1 -C 22 alkynyl), –C(O)(C 1 -C 22 cycloalkyl), –C(O)(aryl), or –C(O)(C 1 -C 22 alkylene aryl), wherein the alkyl, Cycloalkyl, and aryl groups are optionally substituted with one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl groups.

用語「芳基(aryl)」係指具有總共五至十四個環碳原子之單環、雙環(稠合)、及三環(稠合或螺環)烴環系統,其中系統中之至少一個環係芳族,且其中系統中之各環含有3至7個環碳原子。用語「芳基」可與用語「芳基環(aryl ring)」互換使用。The term "aryl" refers to monocyclic, bicyclic (fused), and tricyclic (fused or spiro) hydrocarbon ring systems having a total of five to fourteen ring carbon atoms, in which at least one of the The ring system is aromatic, and each ring in the system contains 3 to 7 ring carbon atoms. The term "aryl" is used interchangeably with the term "aryl ring".

在某些態樣中,R 1係–C(O)(C 1-C 22烷基)、–C(O)(C 1-C 22烯基)、–C(O)(C 1-C 22炔基)、–C(O)(C 1-C 22環烷基)、–C(O)(芳基)、或–C(O)(C 1-C 22伸烷基芳基),其中該烷基、環烷基、及芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、及芳基取代。 In some aspects, R 1 is –C(O)(C 1 -C 22 alkyl), –C(O)(C 1 -C 22 alkenyl), –C(O)(C 1 -C 22 alkynyl), –C(O)(C 1 -C 22 cycloalkyl), –C(O)(aryl), or –C(O)(C 1 -C 22 alkylene aryl), wherein the alkyl, cycloalkyl, and aryl groups are optionally substituted with one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, and aryl groups.

在一些態樣中,R1係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, R1 is C 1 -C 22 alkyl or aryl, wherein the alkyl and aryl groups are optionally substituted with one or more C 1 -C 22 alkyl or aryl groups.

在一些態樣中,R 1係H。在一些態樣中,R 1係C 1-C 22烷基。在一些態樣中,R 1係C 1-C 22烯基。在一些態樣中,R 1係C 1-C 22炔基。在一些態樣中,R 1係C 1-C 22環烷基,其中該環烷基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 1係芳基,其中該芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 1係–C 1-C 22伸烷基芳基,其中該芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 1係–C(O)(C 1-C 22烷基)。在一些態樣中,R 1係–C(O)(C 1-C 12烷基)。在一些態樣中,R 1係–C(O)(C 1-C 6烷基)。在一些態樣中,R 1係–C(O)(甲基)。在一些態樣中,R 1係–C(O)(乙基)。在一些態樣中,R 1係–C(O)(丙基)。在一些態樣中,R 1係–C(O)(丁基)。在一些態樣中,R 1係–C(O)(C 1-C 22烯基)。在一些態樣中,R 1係–C(O)(C 1-C 22炔基)。在一些態樣中,R 1係–C(O)(C 1-C 22環烷基),其中該環烷基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 1係–C(O)(芳基),其中該芳基係可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 1係–C(O)(C 1-C 22伸烷基芳基),其中該芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。 In some aspects, R1 is H. In some aspects, R 1 is C 1 -C 22 alkyl. In some aspects, R 1 is C 1 -C 22 alkenyl. In some aspects, R 1 is C 1 -C 22 alkynyl. In some aspects, R 1 is C 1 -C 22 cycloalkyl, wherein the cycloalkyl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 - C 22 alkynyl or aryl substitution. In some aspects, R 1 is aryl, wherein the aryl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl base substitution. In some aspects, R 1 is -C 1 -C 22 alkylene aryl, wherein the aryl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl or aryl substitution. In some aspects, R 1 is -C(O)(C 1 -C 22 alkyl). In some aspects, R 1 is -C(O)(C 1 -C 12 alkyl). In some aspects, R 1 is –C(O)(C 1 -C 6 alkyl). In some aspects, R 1 is –C(O)(methyl). In some aspects, R 1 is –C(O)(ethyl). In some aspects, R 1 is –C(O)(propyl). In some aspects, R 1 is –C(O)(butyl). In some aspects, R 1 is -C(O)(C 1 -C 22 alkenyl). In some aspects, R 1 is –C(O)(C 1 -C 22 alkynyl). In some aspects, R 1 is -C(O)(C 1 -C 22 cycloalkyl), wherein the cycloalkyl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl substitution. In some aspects, R 1 is -C(O)(aryl), wherein the aryl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl or aryl substitution. In some aspects, R 1 is -C(O)(C 1 -C 22 alkylene aryl), wherein the aryl is optionally modified by one or more C 1 -C 22 alkyl, C 1 - C 22 alkenyl, C 1 -C 22 alkynyl, or aryl substitution.

式(I)之化合物之實例包括但不限於1-氧自由基-2,2,6,6-四甲基胡椒鹼-4-醇;4-甲氧基-2,2,6,6-四甲基哌啶-1-氧基;4-乙氧基-2,2,6,6-四甲基哌啶-1-氧基;4-丙氧基-2,2,6,6-四甲基哌啶-1-氧基;4-丁氧基-2,2,6,6-四甲基哌啶-1-氧基;4-戊氧基-2,2,6,6-四甲基哌啶-1-氧基;4-己氧基-2,2,6,6-四甲基哌啶-1-氧基;4-庚氧基-2,2,6,6-四甲基哌啶-1-氧基;4-辛氧基-2,2,6,6-四甲基哌啶-1-氧基;4-壬氧基-2,2,6,6-四甲基哌啶-1-氧基;4-癸氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十一烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十二烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十三烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十四烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十五烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十六烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十七烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十八烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十九烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-癸氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十一烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十二烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-(苯氧基)2,2,6,6-四甲基哌啶-1-氧基;4-(苄氧基)-2,2,6,6-四甲基哌啶-1-氧基;或2,2,6,6-四甲基-4-(萘-2-基氧基)哌啶-1-氧基。Examples of compounds of formula (I) include, but are not limited to, 1-oxyl-2,2,6,6-tetramethylpiperine-4-ol; 4-methoxy-2,2,6,6- Tetramethylpiperidine-1-oxy; 4-ethoxy-2,2,6,6-tetramethylpiperidine-1-oxy; 4-propoxy-2,2,6,6- Tetramethylpiperidin-1-oxy; 4-butoxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-pentyloxy-2,2,6,6- Tetramethylpiperidin-1-oxy; 4-hexyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-heptyloxy-2,2,6,6- Tetramethylpiperidin-1-oxy; 4-octyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-nonyloxy-2,2,6,6- Tetramethylpiperidin-1-oxy; 4-decyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-undecyloxy-2,2,6, 6-tetramethylpiperidin-1-oxy; 4-dodecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-tridecyloxy-2, 2,6,6-tetramethylpiperidin-1-oxy; 4-tetradecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-pentadecyloxy Base-2,2,6,6-tetramethylpiperidin-1-oxy; 4-hexadecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4- Heptadecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-octadecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy base; 4-nonadecyloxy-2,2,6,6-tetramethylpiperidine-1-oxy; 4-decyloxy-2,2,6,6-tetramethylpiperidine-1 -oxy; 4-eicosyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-eicosyloxy-2,2,6,6-tetramethyl piperidin-1-oxy; 4-docosyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-(phenoxy)2,2,6, 6-tetramethylpiperidin-1-oxy; 4-(benzyloxy)-2,2,6,6-tetramethylpiperidin-1-oxy; or 2,2,6,6-tetramethyl Methyl-4-(naphth-2-yloxy)piperidin-1-oxy.

在其他態樣中,第一抑制劑化合物具有式(II): , (II) 其中R 2係選自H、C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、C 1-C 22環烷基、芳基、–C 1-C 22伸烷基、–C(O)(C 1-C 22烷基)、–C(O)(C 1-C 22烯基)、–C(O)(C 1-C 22炔基)、–C(O)(C 1-C 22環烷基)、–C(O)(芳基)、及–C(O)(C 1-C 22伸烷基),其中該烷基、伸烷基、環烷基、及芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。 In other aspects, the first inhibitor compound has formula (II): , (II) wherein R 2 is selected from H, C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, C 1 -C 22 cycloalkyl, aryl, –C 1 -C 22 alkylene, –C(O)(C 1 -C 22 alkyl), –C(O)(C 1 -C 22 alkenyl), –C(O)(C 1 -C 22 alkyne base), –C(O)(C 1 -C 22 cycloalkyl), –C(O)(aryl), and –C(O)(C 1 -C 22 alkylene), wherein the alkyl , alkylene, cycloalkyl, and aryl groups are optionally substituted with one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl groups.

在某些態樣中,R 2係–C(O)(C 1-C 22烷基)、–C(O)(C 1-C 22烯基)、–C(O)(C 1-C 22炔基)、–C(O)(C 1-C 22環烷基)、–C(O)(芳基)、及–C(O)(C 1-C 22伸烷基),其中該烷基、伸烷基、環烷基、及芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。 In some aspects, R 2 is –C(O)(C 1 -C 22 alkyl), –C(O)(C 1 -C 22 alkenyl), –C(O)(C 1 -C 22 alkynyl), –C(O)(C 1 -C 22 cycloalkyl), –C(O)(aryl), and –C(O)(C 1 -C 22 alkylene), where the Alkyl, alkylene, cycloalkyl, and aryl groups are optionally substituted with one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl groups .

在一些態樣中,R 2係H。在一些態樣中,R 2係C 1-C 22烷基。在一些態樣中,R 2係C 1-C 22烯基。在一些態樣中,R 2係C 1-C 22炔基。在一些態樣中,R 2係C 1-C 22環烷基,其中該環烷基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 2係芳基,其中該芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 2係–C 1-C 22伸烷基,其中該伸烷基可選地經芳基取代,該芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 2係–C(O)(C 1-C 22烷基)。在一些態樣中,R 2係–C(O)(C 1-C 12烷基)。在一些態樣中,R 2係–C(O)(C 1-C 6烷基)。在一些態樣中,R 2係–C(O)(甲基)。在一些態樣中,R 2係–C(O)(乙基)。在一些態樣中,R 2係–C(O)(丙基)。在一些態樣中,R 2係–C(O)(丁基)。在一些態樣中,R 2係–C(O)(C 1-C 22烯基)。在一些態樣中,R 2係–C(O)(C 1-C 22炔基)。在一些態樣中,R 2係–C(O)(C 1-C 22環烷基),其中該環烷基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 2係–C(O)(芳基),其中該芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。在一些態樣中,R 2係–C(O)(C 1-C 22伸烷基),其中該伸烷基可選地經芳基取代,該芳基可選地經一或多個C 1-C 22烷基、C 1-C 22烯基、C 1-C 22炔基、或芳基取代。 In some aspects, R2 is H. In some aspects, R 2 is C 1 -C 22 alkyl. In some aspects, R 2 is C 1 -C 22 alkenyl. In some aspects, R 2 is C 1 -C 22 alkynyl. In some aspects, R 2 is C 1 -C 22 cycloalkyl, wherein the cycloalkyl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 - C 22 alkynyl or aryl substitution. In some aspects, R 2 is aryl, wherein the aryl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl base substitution. In some aspects, R 2 is -C 1 -C 22 alkylene, wherein the alkylene is optionally substituted with aryl, the aryl is optionally substituted with one or more C 1 -C 22 alkyl , C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl substitution. In some aspects, R 2 is –C(O)(C 1 -C 22 alkyl). In some aspects, R 2 is –C(O)(C 1 -C 12 alkyl). In some aspects, R 2 is –C(O)(C 1 -C 6 alkyl). In some aspects, R 2 is –C(O)(methyl). In some aspects, R 2 is –C(O)(ethyl). In some aspects, R 2 is –C(O)(propyl). In some aspects, R 2 is –C(O)(butyl). In some aspects, R 2 is –C(O)(C 1 -C 22 alkenyl). In some aspects, R 2 is –C(O)(C 1 -C 22 alkynyl). In some aspects, R 2 is -C(O)(C 1 -C 22 cycloalkyl), wherein the cycloalkyl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl substitution. In some aspects, R 2 is -C(O)(aryl), wherein the aryl is optionally modified by one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 - C 22 alkynyl or aryl substitution. In some aspects, R 2 is -C(O)(C 1 -C 22 alkylene), wherein the alkylene is optionally substituted with an aryl, the aryl is optionally substituted with one or more C 1 -C 22 alkyl, C 1 -C 22 alkenyl, C 1 -C 22 alkynyl, or aryl substitution.

在一些態樣中,式(II)之化合物係2,2,6,6-四甲基胡椒鹼-1,4-二醇;4-甲氧基-2,2,6,6-四甲基哌啶-1-醇;4-乙氧基-2,2,6,6-四甲基哌啶-1-醇;4-丙氧基-2,2,6,6-四甲基哌啶-1-醇;4-丁氧基-2,2,6,6-四甲基哌啶-1-醇;4-戊氧基-2,2,6,6-四甲基哌啶-1-醇;4-己氧基-2,2,6,6-四甲基哌啶-1-醇;4-庚氧基-2,2,6,6-四甲基哌啶-1-醇;4-辛氧基-2,2,6,6-四甲基哌啶-1-醇;4-壬氧基-2,2,6,6-四甲基哌啶-1-醇;4-癸氧基-2,2,6,6-四甲基哌啶-1-醇;4-十一烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十二烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十三烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十四烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十五烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十六烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十七烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十八烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-十九烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-癸氧基-2,2,6,6-四甲基哌啶-1-醇;4-二十烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-二十一烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-二十二烷氧基-2,2,6,6-四甲基哌啶-1-醇;4-(苯氧基)-2,2,6,6-四甲基哌啶-1-醇;4-(苄氧基)-2,2,6,6-四甲基哌啶-1-醇;或2,2,6,6-四甲基-4-(萘-2-基氧基)哌啶-1-醇。In some aspects, the compound of formula (II) is 2,2,6,6-tetramethylpiperine-1,4-diol; 4-methoxy-2,2,6,6-tetramethyl piperidin-1-ol; 4-ethoxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-propoxy-2,2,6,6-tetramethylpiperidin-1-ol Din-1-ol; 4-butoxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-pentoxy-2,2,6,6-tetramethylpiperidin- 1-alcohol; 4-hexyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-heptyloxy-2,2,6,6-tetramethylpiperidin-1- Alcohol; 4-octyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-nonyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-Decanoxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-Undecyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-Dodecyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-Tridecyloxy-2,2,6,6-tetramethylpiperidin-1- Alcohol; 4-tetradecyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-pentadecyloxy-2,2,6,6-tetramethylpiperidin- 1-alcohol; 4-hexadecyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-heptadecyloxy-2,2,6,6-tetramethylpiperidin-1-ol 4-octadecyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-nonadecyloxy-2,2,6,6-tetramethyl piperidin-1-ol; 4-decyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-eicosyloxy-2,2,6,6-tetramethyl piperidin-1-ol; 4-docosanoxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-docosanoxy-2,2,6, 6-Tetramethylpiperidin-1-ol; 4-(phenoxy)-2,2,6,6-tetramethylpiperidin-1-ol; 4-(benzyloxy)-2,2, 6,6-tetramethylpiperidin-1-ol; or 2,2,6,6-tetramethyl-4-(naphth-2-yloxy)piperidin-1-ol.

在某些態樣中,本揭露之組成物分別包括式(I)及式(II)之化合物,其中R 1及R 2係相同的。例如,在一些態樣中,本揭露之組成物分別包括式(I)及式(II)之化合物,其中R 1及R 2各自獨立地係–C(O)(C 1-C 22烷基)。在某些態樣中,本揭露之組成物分別包括式(I)及式(II)之第一及第二抑制劑化合物,其中R 1及R 2係不同的。 In some aspects, the compositions of the present disclosure include compounds of formula (I) and formula (II) respectively, wherein R 1 and R 2 are the same. For example, in some aspects, the compositions of the present disclosure include compounds of formula (I) and formula (II) respectively, wherein R 1 and R 2 are each independently -C(O)(C 1 -C 22 alkyl ). In some aspects, compositions of the present disclosure include first and second inhibitor compounds of Formula (I) and Formula (II), respectively, wherein R 1 and R 2 are different.

本文所揭示之具有羥胺之式(II)之化合物相較於對應的氮氧化物(式(I)之化合物)具有益處,諸如提供額外聚合抑制之能力,如將於下更充分地解釋。產生氮氧化物之羥胺的一般合成途徑係用還原試劑如下還原其對應的氮氧化物: The compounds of formula (II) with hydroxylamine disclosed herein have benefits over the corresponding nitrogen oxides (compounds of formula (I)), such as the ability to provide additional polymerization inhibition, as will be explained more fully below. The general synthesis pathway of hydroxylamine that produces nitrogen oxides is to use a reducing reagent to reduce its corresponding nitrogen oxides as follows:

當存在以碳為中心及以氧為中心之自由基起始劑時,氮氧化物之羥胺相較於對應的氮氧化物具有提供額外聚合抑制之潛力。此係解釋如下: When carbon-centered and oxygen-centered free radical initiators are present, the hydroxylamine of the nitrogen oxide has the potential to provide additional polymerization inhibition compared to the corresponding nitrogen oxide. This system is explained as follows:

由於化合物中氮氧化物之羥胺的弱NO-H鍵,氮氧化物之羥胺係優異的氫供體,且因此係高效的抗氧化劑。作為抗氧化劑,氮氧化物之羥胺容易與以氧為中心之自由基(諸如過氧化物自由基)反應,同時其被轉化成其對應的氮氧化物。氮氧化物通常因其優越的抑制能力而被稱為最有效的抑制劑,其通過以接近擴散控制速率清除以碳為中心之自由基。此速率較酚類化合物快數個量級。然而,其動力學優勢不總是有利的。例如,當以氧為中心之自由基作為主要自由基存在時,其可能失去其優勢。與氮氧化物有關之另一問題係其通過非抑制作用的消耗及其與製程流組分或其他抑制劑添加劑的非所要反應。因此,為達給定的抑制功效,經常需要高氮氧化物抑制劑劑量,藉以使其之使用在經濟上沒有吸引力或甚至不可行。Due to the weak NO-H bond of the hydroxylamine of the nitrogen oxide in the compound, the hydroxylamine of the nitrogen oxide is an excellent hydrogen donor and therefore a highly efficient antioxidant. As an antioxidant, hydroxylamine of nitrogen oxides readily reacts with oxygen-centered free radicals (such as peroxide radicals) and is simultaneously converted into its corresponding nitrogen oxides. Nitrogen oxides are often called the most effective inhibitors due to their superior inhibitory capabilities by scavenging carbon-centered free radicals at a nearly diffusion-controlled rate. This rate is several orders of magnitude faster than that of phenolic compounds. However, its kinetic advantages are not always beneficial. For example, oxygen-centered radicals may lose their advantage when present as the dominant radical. Another problem associated with nitrogen oxides is their consumption through non-inhibitory effects and their undesirable reactions with process stream components or other inhibitor additives. Therefore, to achieve a given inhibitory efficacy, high NOx inhibitor doses are often required, thereby making their use economically unattractive or even unfeasible.

在本質上,當以氧為中心之自由基及以碳為中心之自由基兩者皆存在時,氮氧化物之各羥胺等同於一個氫供體加上一個氮氧化物抗聚合劑,此係由氮氧化物之羥胺提供之有吸引力的動機。亦即,氮氧化物之一個羥胺能夠消除一個以氧為中心之自由基及一個以碳為中心之自由基,而氮氧化物僅能夠消除以碳為中心之自由基。In essence, when both oxygen-centered free radicals and carbon-centered free radicals are present, each hydroxylamine of the nitrogen oxide is equivalent to a hydrogen donor plus a nitrogen oxide antipolymerization agent. This system Attractive motivation provided by hydroxylamine of nitrogen oxides. That is, a hydroxylamine of nitrogen oxides can eliminate an oxygen-centered free radical and a carbon-centered free radical, while nitrogen oxides can only eliminate carbon-centered free radicals.

在一些態樣中,第一抑制劑係式III之化合物: (III) 其中R 3係–O•或–OH;且R 4係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, the first inhibitor is a compound of Formula III: (III) wherein R 3 is –O• or –OH; and R 4 is C 1 -C 22 alkyl or aryl, wherein the alkyl and aryl groups are optionally modified by one or more C 1 -C 22 alkyl substituted by aryl or aryl groups.

在一些態樣中,R 3係–O•。在一些態樣中,R 3係–OH。 In some aspects, R 3 is –O•. In some aspects, R 3 is –OH.

在一些態樣中,R 4係C 1-C 22烷基,其可選地經一或多個C 1-C 22烷基或芳基取代。在一些態樣中,R 4係芳基,其可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, R 4 is C 1 -C 22 alkyl, optionally substituted with one or more C 1 -C 22 alkyl or aryl groups. In some aspects, R 4 is aryl, optionally substituted with one or more C 1 -C 22 alkyl or aryl groups.

式(III)之化合物之實例包括但不限於1-氧自由基-2,2,6,6-四甲基哌啶-4-基乙酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基丙酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基丁酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基戊酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基己酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基庚酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基辛酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基壬酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基癸酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基十一酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基十二酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基2-乙基己酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基硬脂酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基苯甲酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基棕櫚酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基二十二酸酯;或1-氧自由基-2,2,6,6-四甲基哌啶-4-基4-三級丁基苯甲酸酯。Examples of compounds of formula (III) include, but are not limited to, 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl acetate; 1-oxyl radical-2,2,6 ,6-Tetramethylpiperidin-4-yl propionate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl butyrate; 1-oxyl radical-2 ,2,6,6-tetramethylpiperidin-4-ylvalerate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-ylhexanoate; 1-oxygen Free radical-2,2,6,6-tetramethylpiperidin-4-ylheptanoate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yloctanoate ;1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-ylnonanoate;1-oxyl radical-2,2,6,6-tetramethylpiperidin-4- 1-oxyl decanoate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl undecanoate; 1-oxyl radical-2,2,6,6-tetramethyl Piperidin-4-yl dodecanoate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yl 2-ethylhexanoate; 1-oxyradical-2, 2,6,6-tetramethylpiperidin-4-yl stearate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl benzoate; 1- Oxygen radical-2,2,6,6-tetramethylpiperidin-4-yl palmitate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yl 20 Diacid ester; or 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl 4-tertiary butyl benzoate.

在一些態樣中,第二抑制劑化合物係式(IV)或式(V)之苯二胺: , (IV)                     (V) 其中X 1及X 2獨立地係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 In some aspects, the second inhibitor compound is a phenylenediamine of formula (IV) or formula (V): , (IV) ( V ) wherein X 1 and Aryl substitution.

在一些態樣中,第二抑制劑化合物係式(IV)之苯二胺。在一些態樣中,第二抑制劑化合物係式(V)之苯二胺。In some aspects, the second inhibitor compound is a phenylenediamine of formula (IV). In some aspects, the second inhibitor compound is a phenylenediamine of formula (V).

苯二胺之實例包括但不限於1,2-苯二胺、1,4-苯二胺、N,N'-二-甲基-對苯二胺、N,N'-二-二級丁基-1,4-苯二胺、N,N'-二-1,4-二甲基戊基-1,4-苯二胺、N,N'-二-乙醯基-1,4-苯二胺、N-三級丁基-N'-苯基-1,4-苯二胺、及N,N'-二-苯基-1,4-苯二胺。Examples of phenylenediamines include, but are not limited to, 1,2-phenylenediamine, 1,4-phenylenediamine, N,N'-di-methyl-p-phenylenediamine, N,N'-di-butylene diamine Phenyl-1,4-phenylenediamine, N,N'-di-1,4-dimethylpentyl-1,4-phenylenediamine, N,N'-di-acetyl-1,4- Phenylenediamine, N-tertiary butyl-N'-phenyl-1,4-phenylenediamine, and N,N'-di-phenyl-1,4-phenylenediamine.

在一些態樣中,組合物包括2,2',6,6'-四甲基哌啶基-1-氧自由基及烷基取代的1,4-苯二胺。In some aspects, the composition includes 2,2',6,6'-tetramethylpiperidinyl-1-oxyl radical and alkyl-substituted 1,4-phenylenediamine.

在一些態樣中,組成物基本上由第一抑制劑化合物及第二抑制劑化合物所組成。在其他態樣中,組成物由有機溶劑、第一抑制劑、及第二抑制劑所組成。In some aspects, the composition consists essentially of a first inhibitor compound and a second inhibitor compound. In other aspects, the composition consists of an organic solvent, a first inhibitor, and a second inhibitor.

在一些態樣中,第一抑制劑化合物以約0.01重量%至約80重量%之濃度存在於組成物中。在一些態樣中,第一抑制劑化合物以約0.01重量%至約70重量%之濃度存在於組成物中。在一些態樣中,第一抑制劑化合物以約0.01重量%至約60重量%之濃度存在於組成物中。在一些態樣中,第一抑制劑化合物以約0.01重量%至約50重量%之濃度存在於組成物中。在一些態樣中,第一抑制劑化合物以約0.01重量%至約40重量%之濃度存在於組成物中。在一些態樣中,第一抑制劑化合物以約0.01重量%至約30重量%之濃度存在於組成物中。在一些態樣中,第一抑制劑化合物以約0.01重量%至約20重量%之濃度存在於組成物中。在一些態樣中,第一抑制劑化合物以約0.01重量%至約10重量%之濃度存在於組成物中。In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 80% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 70% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 60% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 50% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 40% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 30% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 20% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01% to about 10% by weight.

例如,在某些態樣中,第一抑制劑化合物以約0.01重量%、約0.1重量%、約1重量%、約5重量%、約10重量%、約15重量%、約20重量%、約25%重量%、約30重量%、約35重量%、約40重量%、約45重量%、約50重量%、約55重量%、約60重量%、約65重量%、約70重量%、約75重量%、或約80重量%之濃度存在於組成物中。For example, in certain aspects, the first inhibitor compound is present at about 0.01% by weight, about 0.1% by weight, about 1% by weight, about 5% by weight, about 10% by weight, about 15% by weight, about 20% by weight, About 25% by weight, about 30% by weight, about 35% by weight, about 40% by weight, about 45% by weight, about 50% by weight, about 55% by weight, about 60% by weight, about 65% by weight, about 70% by weight , is present in the composition at a concentration of about 75% by weight, or about 80% by weight.

在一些態樣中,第二抑制劑化合物以約0.01重量%至約50重量%之濃度存在於組成物中。在一些態樣中,第二抑制劑化合物以約0.01重量%至約40重量%之濃度存在於組成物中。在一些態樣中,第二抑制劑化合物以約0.01重量%至約30重量%之濃度存在於組成物中。在一些態樣中,第二抑制劑化合物以約0.01重量%至約20重量%之濃度存在於組成物中。在一些態樣中,第二抑制劑化合物以約0.01重量%至約10重量%之濃度存在於組成物中。In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01% to about 50% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01% to about 40% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01% to about 30% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01% to about 20% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01% to about 10% by weight.

例如,在某些態樣中,第二抑制劑化合物以約0.01重量%、約0.1重量%、約1重量%、約5重量%、約10重量%、約15重量%、約20重量%、約25%重量%、約30重量%、約35重量%、約40重量%、約45重量%、或約50重量%之濃度存在於組成物中。For example, in some aspects, the second inhibitor compound is present at about 0.01% by weight, about 0.1% by weight, about 1% by weight, about 5% by weight, about 10% by weight, about 15% by weight, about 20% by weight, A concentration of about 25%, about 30%, about 35%, about 40%, about 45%, or about 50% by weight is present in the composition.

在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約100:1至約1:100。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約90:1至約1:90。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約80:1至約1:80。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約70:1至約1:70。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約60:1至約1:60。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約50:1至約1:50。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約40:1至約1:40。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約30:1至約1:30。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約20:1至約1:20。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約10:1至約1:10。在一些態樣中,第一抑制劑化合物與第二抑制劑化合物之莫耳比係約1:1。In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 100:1 to about 1:100. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 90:1 to about 1:90. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 80:1 to about 1:80. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 70:1 to about 1:70. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 60:1 to about 1:60. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 50:1 to about 1:50. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 40:1 to about 1:40. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 30:1 to about 1:30. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 20:1 to about 1:20. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 10:1 to about 1:10. In some aspects, the molar ratio of the first inhibitor compound to the second inhibitor compound is about 1:1.

在一些態樣中,組成物亦包括一或多種選自由下列所組成之群組的額外化合物:2,2,6,6-四甲基哌啶-1-氧自由基;2,2,6,6-四甲基哌啶-1-醇;4-羥基-2,2,6,6-四甲基哌啶-1-氧自由基;4-羥基-2,2,6,6-四甲基哌啶-1-醇;4-側氧基-2,2,6,6-四甲基哌啶-1-氧自由基;4-側氧基-2,2,6,6-四甲基哌啶-1-醇;4-乙醯氧基-2,2,6,6-四甲基哌啶-1-氧自由基;4-乙醯氧基-2,2,6,6-四甲基哌啶-1-醇;4-丙醯氧基-2,2,6,6-四甲基哌啶-1-氧自由基;4-丙醯氧基-2,2,6,6-四甲基哌啶-1-醇;及雙((2,2,6,6-四甲基哌啶-1-氧自由基)-4-基)草酸酯。在一些態樣中,組成物亦包括2,2,6,6-四甲基哌啶-1-氧自由基。在一些態樣中,組成物亦包括2,2,6,6-四甲基哌啶-1-醇。在一些態樣中,組成物亦包括4-羥基-2,2,6,6-四甲基哌啶-1-氧自由基。在一些態樣中,組成物亦包括4-羥基-2,2,6,6-四甲基哌啶-1-醇。在一些態樣中,組成物亦包括4-側氧基-2,2,6,6-四甲基哌啶-1-氧自由基。在一些態樣中,組成物亦包括4-側氧基-2,2,6,6-四甲基哌啶-1-醇。在一些態樣中,組成物亦包括4-乙醯氧基-2,2,6,6-四甲基哌啶-1-氧自由基。在一些態樣中,組成物亦包括4-乙醯氧基-2,2,6,6-四甲基哌啶-1-醇。在一些態樣中,組成物亦包括4-丙醯氧基-2,2,6,6-四甲基哌啶-1-氧自由基。在一些態樣中,組成物亦包括4-丙醯氧基-2,2,6,6-四甲基哌啶-1-醇。在一些態樣中,組成物亦包括雙((2,2,6,6-四甲基哌啶-1-氧自由基)-4-基)草酸酯。In some aspects, the composition also includes one or more additional compounds selected from the group consisting of: 2,2,6,6-tetramethylpiperidin-1-oxyl radical; 2,2,6 ,6-tetramethylpiperidin-1-ol; 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-oxyl radical; 4-hydroxy-2,2,6,6-tetramethyl Methylpiperidin-1-ol; 4-side oxy-2,2,6,6-tetramethylpiperidin-1-oxyl radical; 4-side oxy-2,2,6,6-tetramethyl Methylpiperidin-1-ol; 4-acetyloxy-2,2,6,6-tetramethylpiperidin-1-oxyl radical; 4-acetyloxy-2,2,6,6 -Tetramethylpiperidin-1-ol; 4-propyloxy-2,2,6,6-tetramethylpiperidin-1-oxyl radical; 4-propyloxy-2,2,6 , 6-tetramethylpiperidin-1-ol; and bis((2,2,6,6-tetramethylpiperidin-1-oxyl radical)-4-yl)oxalate. In some aspects, the composition also includes 2,2,6,6-tetramethylpiperidin-1-oxyl radical. In some aspects, the composition also includes 2,2,6,6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl radical. In some aspects, the composition also includes 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-side oxy-2,2,6,6-tetramethylpiperidine-1-oxyl radical. In some aspects, the composition also includes 4-side oxy-2,2,6,6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-acetyloxy-2,2,6,6-tetramethylpiperidin-1-oxyl radical. In some aspects, the composition also includes 4-acetyloxy-2,2,6,6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-propionyloxy-2,2,6,6-tetramethylpiperidin-1-oxyl radical. In some aspects, the composition also includes 4-propionyloxy-2,2,6,6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes bis((2,2,6,6-tetramethylpiperidin-1-oxyl radical)-4-yl)oxalate.

組成物亦可以可選地包括一或多種有機溶劑。所屬技術領域中具有通常知識者將理解的是,有許多與本揭露之組成物相容的有機溶劑。例如,在一些態樣中,一或多種有機溶劑係選自乙酸乙烯酯、酞酸二甲酯、二甲基甲醯胺、甲苯、二甲苯、高級芳族石腦油(highly aromatic naphtha)、乙腈、乙酸乙酯、丙酮、二氯甲烷、四氫呋喃、己烷、二甲基亞碸、N-甲基-2-吡咯啶酮、及其組合。在某些態樣中,組成物亦包括乙酸乙烯酯。在某些態樣中,組成物亦包括酞酸二甲酯。在某些態樣中,組成物亦包括二甲基甲醯胺。在某些態樣中,組成物亦包括甲苯。在某些態樣中,組成物亦包括二甲苯。在某些態樣中,組成物亦包括高級芳族石腦油。在某些態樣中,組成物亦包括乙腈。The composition may also optionally include one or more organic solvents. One of ordinary skill in the art will appreciate that there are many organic solvents that are compatible with the compositions of the present disclosure. For example, in some aspects, one or more organic solvents are selected from vinyl acetate, dimethyl phthalate, dimethylformamide, toluene, xylene, highly aromatic naphtha, Acetonitrile, ethyl acetate, acetone, methylene chloride, tetrahydrofuran, hexane, dimethylstyrene, N-methyl-2-pyrrolidone, and combinations thereof. In some aspects, the composition also includes vinyl acetate. In some aspects, the composition also includes dimethyl phthalate. In some aspects, the composition also includes dimethylformamide. In some aspects, the composition also includes toluene. In some aspects, the composition also includes xylene. In some aspects, the composition also includes higher aromatic naphtha. In some aspects, the composition also includes acetonitrile.

在一些態樣中,組成物亦包括一或多種烯系不飽和單體。所屬技術領域中具有通常知識者將理解的是,有許多與本揭露之組成物相容的烯系不飽和單體。例如,在一些態樣中,一或多種烯系不飽和單體係選自乙酸乙烯酯、丙烯腈、丙烯酸酯、甲基丙烯酸酯、1,3-丁二烯、苯乙烯、異戊二烯、(甲基)丙烯酸、及其組合。在某些態樣中,組成物亦包括乙酸乙烯酯。在某些態樣中,組成物亦包括丙烯腈。在某些態樣中,組成物亦包括丙烯酸酯。在某些態樣中,組成物亦包括甲基丙烯酸酯。在某些態樣中,組成物亦包括1,3-丁二烯。在某些態樣中,組成物亦包括苯乙烯。在某些態樣中,組成物亦包括異戊二烯。在某些態樣中,組成物亦包括(甲基)丙烯酸。In some aspects, the composition also includes one or more ethylenically unsaturated monomers. One of ordinary skill in the art will appreciate that there are many ethylenically unsaturated monomers that are compatible with the compositions of the present disclosure. For example, in some aspects, one or more ethylenically unsaturated monosystems are selected from vinyl acetate, acrylonitrile, acrylates, methacrylates, 1,3-butadiene, styrene, isoprene , (meth)acrylic acid, and combinations thereof. In some aspects, the composition also includes vinyl acetate. In some aspects, the composition also includes acrylonitrile. In some aspects, the composition also includes acrylates. In some aspects, the composition also includes methacrylate. In some aspects, the composition also includes 1,3-butadiene. In some aspects, the composition also includes styrene. In some aspects, the composition also includes isoprene. In some aspects, the composition also includes (meth)acrylic acid.

在一些態樣中,本文所揭示之組成物不包括4-羥基-2,2,6,6-四甲基哌啶-1-氧自由基。在一些態樣中,本文所揭示之組成物不包括4-側氧基-2,2,6,6-四甲基哌啶-1-氧自由基。在一些態樣中,未添加4-羥基-2,2,6,6-四甲基哌啶-1-氧自由基及4-側氧基-2,2,6,6-四甲基哌啶-1-氧自由基至烯系不飽和單體。In some aspects, compositions disclosed herein do not include the 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-oxyl radical. In some aspects, the compositions disclosed herein do not include the 4-side oxy-2,2,6,6-tetramethylpiperidine-1-oxyl radical. In some aspects, 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl radical and 4-side oxy-2,2,6,6-tetramethylpiperidine are not added dimethyl-1-oxyl radical to ethylenically unsaturated monomer.

本揭露亦關於抑制單體之聚合之方法,其包括將本揭露之組成物添加至單體中。在一些態樣中,將有效量的本揭露之組成物添加至單體中,其中有效量係足以抑制單體之聚合的任何量。該製程流包括一單體及微胞。The present disclosure also relates to methods of inhibiting polymerization of monomers, which include adding the compositions of the present disclosure to the monomers. In some aspects, an effective amount of a composition of the present disclosure is added to the monomer, where an effective amount is any amount sufficient to inhibit polymerization of the monomer. The process flow includes a monomer and microcells.

在一些態樣中,單體係烯系不飽和單體。在一些態樣中,揭示單體係選自下列的烯系不飽和單體:乙酸乙烯酯、丙烯腈、丙烯酸酯、甲基丙烯酸酯、1,3-丁二烯、苯乙烯、二乙烯基苯、異戊二烯、環戊二烯、二環戊二烯、丙烯酸、(甲基)丙烯酸、及其組合。在一些態樣中,本文所揭示之方法可用於抑制乙酸乙烯酯之聚合。在一些態樣中,本文所揭示之方法可用於抑制丙烯腈之聚合。在一些態樣中,本文所揭示之方法可用於抑制丙烯酸酯之聚合。在一些態樣中,本文所揭示之方法可用於抑制甲基丙烯酸酯之聚合。在一些態樣中,本文所揭示之方法可用於抑制1,3-丁二烯之聚合。在一些態樣中,本文所揭示之方法可用於抑制苯乙烯之聚合。在一些態樣中,本文所揭示之方法可用於抑制異戊二烯之聚合。在一些態樣中,本文所揭示之方法可用於抑制丙烯酸之聚合。在一些態樣中,本文所揭示之方法可用於抑制(甲基)丙烯酸之聚合。In some aspects, the monomer is an ethylenically unsaturated monomer. In some aspects, it is disclosed that the monosystem is an ethylenically unsaturated monomer selected from the following: vinyl acetate, acrylonitrile, acrylate, methacrylate, 1,3-butadiene, styrene, divinyl Benzene, isoprene, cyclopentadiene, dicyclopentadiene, acrylic acid, (meth)acrylic acid, and combinations thereof. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of vinyl acetate. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of acrylonitrile. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of acrylates. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of methacrylates. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of 1,3-butadiene. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of styrene. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of isoprene. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of acrylic acid. In some aspects, the methods disclosed herein can be used to inhibit the polymerization of (meth)acrylic acid.

可手動或自動將本揭露之組成物添加至流體中。亦可連續地及/或間歇地添加組成物。自動添加可通過使用化學注射泵完成。化學注射泵可經編程以以特定時間間隔將特定量的聚合抑制劑組成物、或其任何組分添加至流體中。在替代態樣中,可手動控制化學注射泵以將特定量的聚合抑制劑組成物、或其任何組分添加至流體中。將本文所揭示之聚合抑制劑組成物添加至單體中將因此抑制單體之聚合。The compositions of the present disclosure can be added to the fluid manually or automatically. The composition may also be added continuously and/or intermittently. Automatic addition can be accomplished using a chemical syringe pump. The chemical syringe pump can be programmed to add specific amounts of the polymerization inhibitor composition, or any component thereof, to the fluid at specific time intervals. In an alternative aspect, the chemical syringe pump can be manually controlled to add a specific amount of the polymerization inhibitor composition, or any component thereof, to the fluid. Addition of the polymerization inhibitor compositions disclosed herein to the monomer will thereby inhibit polymerization of the monomer.

在一些態樣中,單體係以純液體提供。在其他態樣中,單體係提供於溶液內,此後稱為「單體溶液」。In some aspects, the monosystem is provided as a pure liquid. In other aspects, the monomer system is provided in a solution, hereafter referred to as a "monomer solution."

在一些態樣中,單體溶液亦包括一或多種選自酸、有機溶劑、水、及其組合的額外組分。例如,在一些態樣中,單體溶液包括一或多種選自下列的有機溶劑:乙酸乙烯酯、酞酸二甲酯、二甲基甲醯胺、甲苯、乙基甲苯、二甲苯、高級芳族石腦油、乙腈、乙酸乙酯、丙酮、二氯甲烷、四氫呋喃、己烷、二甲基亞碸、N-甲基-2-吡咯啶酮、及其組合。在一些態樣中,單體溶液包括一或多種選自下列的酸:鹽酸、氫氟酸、氫溴酸、氫碘酸、硝酸、磷酸、硫酸、硼酸、過氯酸、甲酸、乙酸、丙酸、丁酸、戊酸、己酸、醋酸、辛酸、十一酸、月桂酸、草酸、丙二酸、琥珀酸、戊二酸、己二酸、庚二酸、及辛二酸。在一些態樣中,單體溶液包括水。In some aspects, the monomer solution also includes one or more additional components selected from acids, organic solvents, water, and combinations thereof. For example, in some aspects, the monomer solution includes one or more organic solvents selected from the group consisting of: vinyl acetate, dimethyl phthalate, dimethylformamide, toluene, ethyltoluene, xylene, higher aromatics Naphtha, acetonitrile, ethyl acetate, acetone, methylene chloride, tetrahydrofuran, hexane, dimethylstyrene, N-methyl-2-pyrrolidinone, and combinations thereof. In some aspects, the monomer solution includes one or more acids selected from: hydrochloric acid, hydrofluoric acid, hydrobromic acid, hydroiodic acid, nitric acid, phosphoric acid, sulfuric acid, boric acid, perchloric acid, formic acid, acetic acid, propionic acid acid, butyric acid, valeric acid, caproic acid, acetic acid, caprylic acid, undecanoic acid, lauric acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, and suberic acid. In some aspects, the monomer solution includes water.

在一些態樣中,將組成物添加至單體中,使得第一抑制劑化合物之濃度係約0.1 ppm至約10,000 ppm。在一些態樣中,將組成物添加至單體中,使得第一抑制劑化合物之濃度係約0.1 ppm至約5,000 ppm。在一些態樣中,將組成物添加至單體中,使得第一抑制劑化合物之濃度係約0.1 ppm至約1,000 ppm。在一些態樣中,將組成物添加至單體中,使得第一抑制劑化合物之濃度係約0.1 ppm至約500 ppm。In some aspects, the composition is added to the monomer such that the concentration of the first inhibitor compound is from about 0.1 ppm to about 10,000 ppm. In some aspects, the composition is added to the monomer such that the concentration of the first inhibitor compound is from about 0.1 ppm to about 5,000 ppm. In some aspects, the composition is added to the monomer such that the concentration of the first inhibitor compound is from about 0.1 ppm to about 1,000 ppm. In some aspects, the composition is added to the monomer such that the concentration of the first inhibitor compound is from about 0.1 ppm to about 500 ppm.

在一些態樣中,將組成物添加至單體中,使得第二抑制劑化合物之濃度係約0.1 ppm至約10,000 ppm。在一些態樣中,將組成物添加至單體中,使得第二抑制劑化合物之濃度係約0.1 ppm至約5,000 ppm。在一些態樣中,將組成物添加至單體中,使得第二抑制劑化合物之濃度係約0.1 ppm至約1,000 ppm。在一些態樣中,將組成物添加至單體中,使得第二抑制劑化合物之濃度係約0.1 ppm至約500 ppm。In some aspects, the composition is added to the monomer such that the concentration of the second inhibitor compound is from about 0.1 ppm to about 10,000 ppm. In some aspects, the composition is added to the monomer such that the concentration of the second inhibitor compound is from about 0.1 ppm to about 5,000 ppm. In some aspects, the composition is added to the monomer such that the concentration of the second inhibitor compound is from about 0.1 ppm to about 1,000 ppm. In some aspects, the composition is added to the monomer such that the concentration of the second inhibitor compound is from about 0.1 ppm to about 500 ppm.

本揭露之方法可用於在萃取製程期間抑制單體之過早聚合。在萃取製程期間,溶劑係用於分開組分。該萃取溶劑及該烴層之間的極性差異導致乳化形成,從而增加乳化聚合之風險。The methods of the present disclosure can be used to inhibit premature polymerization of monomers during the extraction process. During the extraction process, solvents are used to separate the components. The difference in polarity between the extraction solvent and the hydrocarbon layer causes emulsion formation, thereby increasing the risk of emulsion polymerization.

萃取溶劑之實例包括但不限於二甲基甲醯胺(DMF)、糠醛、乙腈、N-甲基-2-吡咯啶酮、及其類似物。Examples of extraction solvents include, but are not limited to, dimethylformamide (DMF), furfural, acetonitrile, N-methyl-2-pyrrolidone, and the like.

本揭露之方法亦可用於在製造及純化製程期間預防苯乙烯之過早聚合。The methods of the present disclosure can also be used to prevent premature polymerization of styrene during manufacturing and purification processes.

本揭露之方法亦可用於丁二烯萃取製程中。此效用源於極性有機相與非極性有機相之間的平衡分配係數。The disclosed method can also be used in the butadiene extraction process. This utility results from the equilibrium partition coefficient between polar and non-polar organic phases.

在一些態樣中,將本文所揭示之組成物用於烯烴之蒸餾純化中。例如,可將組成物在進入蒸餾單元之前添加至製程流中,或可將組成物在蒸餾單元中添加至製程流中。 實例 實例1:分配係數 In some aspects, the compositions disclosed herein are used in the distillative purification of olefins. For example, the composition may be added to the process stream before entering the distillation unit, or the composition may be added to the process stream in the distillation unit. Example Example 1: Distribution coefficient

比較現今產業利用之化學品(HTEMPO及OTEMPO)與本揭露之組成物來進行測試。HTEMPO 1之酯係4-乙醯氧基-2,2'6,6'-四甲基哌啶基-1-氧自由基。HTEMPO 2之酯係4-丙醯基-2,2'6,6'-四甲基哌啶基-1-氧自由基。PDA係二-二級-丁基-4,4'-苯二胺。Tests were conducted comparing chemicals currently used in industry (HTEMPO and OTEMPO) with the compositions of the present disclosure. The ester of HTEMPO 1 is 4-acetyloxy-2,2'6,6'-tetramethylpiperidinyl-1-oxyl radical. The ester of HTEMPO 2 is 4-propyl-2,2'6,6'-tetramethylpiperidinyl-1-oxyl radical. PDA is di-secondary-butyl-4,4'-phenylenediamine.

表1顯示不同溶劑組合之間的若干測試之分配係數。 表1 聚合抑制劑(PI) DMF與己烷之間的分配係數 HTEMPO 95:5 HTEMPO 1之酯 82:18 HTEMPO 2之酯 77:23 OTEMPO 97:3 聚合抑制劑(PI) 甲苯與水之間的分配係數 HTEMPO 18:82 HTEMPO 1之酯 92:8 HTEMPO 2之酯 97:3 實例2:95℃下在DMF中之異戊二烯聚合測試 Table 1 shows the partition coefficients for several tests between different solvent combinations. Table 1 Polymerization Inhibitor (PI) Partition coefficient between DMF and hexane HTEMPO 95:5 HTEMPO 1 ester 82:18 HTEMPO 2 ester 77:23 OTEMPO 97:3 Polymerization Inhibitor (PI) Partition coefficient between toluene and water HTEMPO 18:82 HTEMPO 1 ester 92:8 HTEMPO 2 ester 97:3 Example 2: Isoprene polymerization test in DMF at 95°C

使商用異戊二烯通過氧化鋁管柱,以移除穩定劑4-三級-丁鄰苯二酚。將0.2 g活性聚合抑制劑、40 mL庚烷、40 mL DMF、及攪拌棒裝入100 mL罐子。在室溫下攪拌上述混合物30分鐘,並靜置10分鐘。Commercial isoprene was passed through an alumina column to remove the stabilizer 4-tert-butyrocatechol. Place 0.2 g of active polymerization inhibitor, 40 mL of heptane, 40 mL of DMF, and stirring rod into a 100 mL jar. The mixture was stirred at room temperature for 30 minutes and allowed to stand for 10 minutes.

DMF相測試:將先前靜置之兩層混合物之0.2 mL底層、1 mL偶氮二異丁腈(AIBN) (0.0004 g/mL)溶液、50 g異戊二烯裝入100 mL罐子。添加DMF以製作出總重量為100 g之溶液。將約10 ml之上述混合物以攪拌棒添加至12個壓力管中,並加熱至95℃。30分鐘後,且此後每隔30分鐘,自塊中取出兩個管,且藉由在冰浴中冷卻來淬滅聚合反應。立即用甲苯稀釋冷卻的聚合物溶液。藉由濁度方法判定液體中之可溶性聚合物。DMF phase test: Put 0.2 mL of the bottom layer of the two-layer mixture that was previously allowed to stand, 1 mL of azobisisobutyronitrile (AIBN) (0.0004 g/mL) solution, and 50 g of isoprene into a 100 mL jar. Add DMF to make a solution with a total weight of 100 g. Approximately 10 ml of the above mixture was added to 12 pressure tubes using a stirring rod and heated to 95°C. After 30 minutes, and every 30 minutes thereafter, both tubes were removed from the block and the polymerization reaction was quenched by cooling in an ice bath. The cooled polymer solution was immediately diluted with toluene. Determination of soluble polymers in liquids by turbidity method.

圖1顯示:相較於習知聚合抑制劑HTEMPO及OTEMPO,本揭露之組成物顯著降低異戊二烯聚合。另外,圖1顯示穩定的氮氧自由基及苯二胺之組合導致協同作用。Figure 1 shows that compared to conventional polymerization inhibitors HTEMPO and OTEMPO, the composition of the present disclosure significantly reduces isoprene polymerization. In addition, Figure 1 shows that the combination of stable nitroxide radicals and phenylenediamine results in a synergistic effect.

在圖1及圖2中,「原型產品1」係約22 wt.%之4-乙醯氧基TEMPO、約5至8 wt.%之HTEMPO、HTEMPOH、及4-乙醯氧基TEMPO之羥胺、及約70%之DMF,「原型產品2」係「原型產品1」加上PDA,「商用產品」係10%之HTEMPO水溶液,且「PDA」係如先前所定義。 實例3:95℃下在庚烷中之異戊二烯聚合測試 In Figures 1 and 2, "Prototype Product 1" is about 22 wt.% of 4-acetyloxy TEMPO, about 5 to 8 wt.% of HTEMPO, HTEMPOH, and hydroxylamine of 4-acetyloxy TEMPO , and about 70% DMF, "Prototype Product 2" is "Prototype Product 1" plus PDA, "Commercial Product" is 10% HTEMPO aqueous solution, and "PDA" is as previously defined. Example 3: Isoprene polymerization test in heptane at 95°C

庚烷相:將先前靜置之兩層混合物之5.0 mL頂層、1 mL之AIBN(0.0004 g/mL)溶液、50 g異戊二烯裝入100 mL罐子。添加庚烷以製作出總重量為100 g之溶液。將約13 ml之上述混合物以攪拌棒添加至12個壓力管中,並加熱至95℃。30分鐘後,且此後每隔30分鐘,自塊中取出兩個管,且藉由在冰浴中冷卻來淬滅聚合反應。立即用甲苯稀釋冷卻的聚合物溶液。藉由濁度方法判定液體中之可溶性聚合物。結果可見於圖2中。用以產生圖2中之趨勢線的資料可見於表2中。 表2:用於圖2之庚烷相中之聚合生長資料(以聚異戊二烯之w/w%計) 時間 原型產品1(僅氮氧化物) 商用產品 原型產品2(PDA加上氮氧化物) PDA 0 0 0 0 0 30 0.00% 0.01% 0.00% 0.10% 60 0.00% 0.06% 0.00% 0.24% 90 0.00% 0.17% 0.00% 0.45% 120 0.00% 0.23% 0.00% 0.83% 180 0.00% 0.44% 0.00% 1.05% 240 0.00% 0.48% 0.00% 1.20% Heptane phase: Put 5.0 mL of the top layer of the two-layer mixture that was previously allowed to stand, 1 mL of AIBN (0.0004 g/mL) solution, and 50 g of isoprene into a 100 mL jar. Heptane was added to make a total weight of 100 g solution. Approximately 13 ml of the above mixture was added to 12 pressure tubes using a stirring rod and heated to 95°C. After 30 minutes, and every 30 minutes thereafter, both tubes were removed from the block and the polymerization reaction was quenched by cooling in an ice bath. The cooled polymer solution was immediately diluted with toluene. Determination of soluble polymers in liquids by turbidity method. The results can be seen in Figure 2. The data used to generate the trend lines in Figure 2 can be found in Table 2. Table 2: Polymerization growth data (based on w/w% of polyisoprene) used in the heptane phase of Figure 2 time Prototype product 1 (nitrogen oxide only) Commercial products Prototype product 2 (PDA plus NOx) PDAs 0 0 0 0 0 30 0.00% 0.01% 0.00% 0.10% 60 0.00% 0.06% 0.00% 0.24% 90 0.00% 0.17% 0.00% 0.45% 120 0.00% 0.23% 0.00% 0.83% 180 0.00% 0.44% 0.00% 1.05% 240 0.00% 0.48% 0.00% 1.20%

本文所揭示及請求保護之所有組成物及方法可鑑於本揭露而無需過度實驗下製作及執行。儘管本發明可以許多不同形式實施,但在本文中詳細描述本發明之具體較佳態樣。本揭露係本發明之原理的示例,且不意欲將本發明限於所說明之特定態樣。此外,除非有明確的相反說明,否則用語「一(a/an)」之使用係意欲包括「至少一個/種(at least one)」或「一或多個/種(one or more)」。舉例來說,「一抑制劑」係意欲包括「至少一種抑制劑」或「一或多種抑制劑」。All compositions and methods disclosed and claimed herein can be made and performed without undue experimentation in light of the present disclosure. While this invention may be embodied in many different forms, specific preferred aspects of the invention are described in detail herein. This disclosure is illustrative of the principles of the invention and is not intended to limit the invention to the specific aspects illustrated. Furthermore, unless expressly stated to the contrary, use of the term "a/an" is intended to include "at least one" or "one or more". For example, "an inhibitor" is intended to include "at least one inhibitor" or "one or more inhibitors."

任何以絕對用語或近似用語給出之範圍意欲涵蓋兩者,且本文所使用之任何定義意欲為闡明性而非限制性。儘管闡述本發明之廣泛範疇的數值範圍及參數係近似值,但應儘可能精確地記述具體實例中所闡述之數值。然而,任何數值固有地含有因其各別測試測量中得出的標準偏差所必然產生之某些誤差。此外,本文所揭示之所有範圍應理解為涵蓋其中納入的任何及所有子範圍(包括所有分數及整數值)。Any range given in absolute terms or approximate terms is intended to encompass both, and any definitions used herein are intended to be illustrative rather than restrictive. Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the invention are approximations, the numerical values set forth in the specific examples are intended to be stated as precisely as possible. Any numerical value, however, inherently contains certain errors necessarily resulting from the standard deviation found in their respective testing measurements. Furthermore, all ranges disclosed herein should be understood to encompass any and all subranges incorporated therein (including all fractional and integer values).

本文所揭示之任何組成物可包含下列、由下列所組成、或基本上由下列所組成:本文所揭示之任何元素、組分、及/或成分或本文所揭示之元素、組分、或成分中之二或更多者之任何組合。Any composition disclosed herein may comprise, consist of, or consist essentially of any of the elements, components, and/or ingredients disclosed herein or any of the elements, components, or ingredients disclosed herein. Any combination of two or more of them.

本文所揭示之任何方法可包含下列、由下列所組成、或基本上由下列所組成:本文所揭示之任何方法步驟或本文所揭示之方法步驟中之二或更多者之任何組合。Any method disclosed herein may comprise, consist of, or consist essentially of: any method step disclosed herein, or any combination of two or more of the method steps disclosed herein.

與「包括(including)」、「含有(containing)」、或「其特徵在於(characterized by)」同義之連接詞「包含(comprising)」係包括性或開放式的且不排除額外未列舉之元件、組分、成分、及/或方法步驟。The conjunction "comprising" which is synonymous with "including", "containing", or "characterized by" is inclusive or open-ended and does not exclude additional unrecited elements. , components, ingredients, and/or method steps.

連接詞「由……所組成(consisting of)」排除申請專利範圍中未指明之任何元件、組分、成分、及/或方法步驟。The conjunction "consisting of" excludes any elements, components, ingredients, and/or method steps not specified in the scope of the patent application.

連接詞「基本上由……所組成(consisting essentially of)」將申請專利範圍之範疇限制為所指明之元件、組分、成分、及/或步驟、以及不實質影響所請求保護之發明之(多個)基本及新穎特徵者。The connective "consisting essentially of" limits the scope of the patent application to the specified elements, components, ingredients, and/or steps and those that do not substantially affect the claimed invention ( Multiple) basic and novel features.

如本文所使用,用語「約(about)」係指引用值在由其各別測試測量中得出的標準偏差產生之誤差內,且若無法判定該等誤差,則「約」可指例如在引用值之5%內。As used herein, the term "about" means that the quoted value is within the error resulting from the standard deviation derived from their respective test measurements, and if such errors cannot be determined, then "about" may mean, for example, that within Within 5% of the quoted value.

此外,本發明涵蓋一些或所有本文所述之各種態樣之任何及所有可能的組合。亦應理解的是,對本文所述之目前較佳態樣的各種改變及修改對所屬技術領域中具有通常知識者而言將為顯而易見的。此類改變及修改可在不背離本發明之精神及範疇下且在不削弱其預期優勢下進行。因此,預期所述改變及修改由所附申請專利範圍涵蓋。Furthermore, the present invention encompasses any and all possible combinations of some or all of the various aspects described herein. It is also to be understood that various changes and modifications to the presently preferred aspects described herein will be apparent to those of ordinary skill in the art. Such changes and modifications may be made without departing from the spirit and scope of the invention and without impairing its intended advantages. Accordingly, it is intended that the changes and modifications described are covered by the appended claims.

without

下文具體參照附圖來描述本發明之實施方式。 [圖1]顯示95℃下在DMF中之異戊二烯聚合。 [圖2]顯示95℃下在庚烷中之異戊二烯聚合。 Embodiments of the present invention are described below with specific reference to the accompanying drawings. [Fig. 1] shows polymerization of isoprene in DMF at 95°C. [Fig. 2] shows polymerization of isoprene in heptane at 95°C.

Claims (20)

一種抑制單體聚合之方法,其包含:  將一組成物添加至一萃取蒸餾製程中之一製程流, 其中該組成物包含:第一抑制劑化合物,其包含穩定的氮氧自由基;及第二抑制劑化合物,其包含苯二胺, 其中該製程流包含微胞。 A method of inhibiting monomer polymerization, comprising: adding a composition to a process stream in an extractive distillation process, Wherein the composition includes: a first inhibitor compound, which contains stable nitroxide radicals; and a second inhibitor compound, which contains phenylenediamine, The process flow includes microcells. 如請求項1之方法,其中該第一抑制劑化合物具有式(I): (I) 其中R 1係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 The method of claim 1, wherein the first inhibitor compound has formula (I): (I) wherein R 1 is a C 1 -C 22 alkyl or aryl group, wherein the alkyl and aryl groups are optionally substituted with one or more C 1 -C 22 alkyl or aryl groups. 如請求項1或請求項2之方法,其中該第一抑制劑係選自由下列所組成之群組:1-氧自由基-2,2,6,6-四甲基胡椒鹼-4-醇;4-甲氧基-2,2,6,6-四甲基哌啶-1-氧基;4-乙氧基-2,2,6,6-四甲基哌啶-1-氧基;4-丙氧基-2,2,6,6-四甲基哌啶-1-氧基;4-丁氧基-2,2,6,6-四甲基哌啶-1-氧基;4-戊氧基-2,2,6,6-四甲基哌啶-1-氧基;4-己氧基-2,2,6,6-四甲基哌啶-1-氧基;4-庚氧基-2,2,6,6-四甲基哌啶-1-氧基;4-辛氧基-2,2,6,6-四甲基哌啶-1-氧基;4-壬氧基-2,2,6,6-四甲基哌啶-1-氧基;4-癸氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十一烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十二烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十三烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十四烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十五烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十六烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十七烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十八烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-十九烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-癸氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十一烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-二十二烷氧基-2,2,6,6-四甲基哌啶-1-氧基;4-(苯氧基)2,2,6,6-四甲基哌啶-1-氧基;4-(苄氧基)-2,2,6,6-四甲基哌啶-1-氧基;2,2,6,6-四甲基-4-(萘-2-基氧基)哌啶-1-氧基;及其任何組合。The method of claim 1 or claim 2, wherein the first inhibitor is selected from the group consisting of: 1-oxyl radical-2,2,6,6-tetramethylpiperine-4-ol ; 4-methoxy-2,2,6,6-tetramethylpiperidine-1-oxy; 4-ethoxy-2,2,6,6-tetramethylpiperidine-1-oxy ; 4-propoxy-2,2,6,6-tetramethylpiperidine-1-oxy; 4-butoxy-2,2,6,6-tetramethylpiperidine-1-oxy ; 4-pentyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-hexyloxy-2,2,6,6-tetramethylpiperidin-1-oxy ; 4-heptyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-octyloxy-2,2,6,6-tetramethylpiperidin-1-oxy ; 4-Nonyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-decyloxy-2,2,6,6-tetramethylpiperidin-1-oxy ;4-Undecyloxy-2,2,6,6-tetramethylpiperidine-1-oxy;4-Dodecyloxy-2,2,6,6-tetramethylpiperidine- 1-oxy; 4-tridecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-tetradecyloxy-2,2,6,6-tetramethyl piperidin-1-oxy; 4-pentadecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-hexadecyloxy-2,2,6, 6-tetramethylpiperidin-1-oxy; 4-heptadecanyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-octadecyloxy-2, 2,6,6-tetramethylpiperidin-1-oxy; 4-nonadecyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-decyloxy- 2,2,6,6-tetramethylpiperidin-1-oxy; 4-eicosyloxy-2,2,6,6-tetramethylpiperidin-1-oxy; 4-eicosyloxy Monoalkoxy-2,2,6,6-tetramethylpiperidine-1-oxy; 4-docosyloxy-2,2,6,6-tetramethylpiperidine-1-oxy base; 4-(phenoxy)2,2,6,6-tetramethylpiperidine-1-oxy; 4-(benzyloxy)-2,2,6,6-tetramethylpiperidine- 1-oxy; 2,2,6,6-tetramethyl-4-(naphth-2-yloxy)piperidin-1-oxy; and any combination thereof. 如請求項1之方法,其中該第一抑制劑係式III之化合物: (III) 其中R 3係–O•或–OH;且R 4係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 The method of claim 1, wherein the first inhibitor is a compound of formula III: (III) wherein R 3 is –O• or –OH; and R 4 is C 1 -C 22 alkyl or aryl, wherein the alkyl and aryl groups are optionally modified by one or more C 1 -C 22 alkyl substituted by aryl or aryl groups. 如請求項4之方法,其中該第一抑制劑係選自由下列所組成之群組:1-氧自由基-2,2,6,6-四甲基哌啶-4-基乙酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基丙酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基丁酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基戊酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基己酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基庚酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基辛酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基壬酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基癸酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基十一酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基十二酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基2-乙基己酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基硬脂酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基苯甲酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基棕櫚酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基二十二酸酯;1-氧自由基-2,2,6,6-四甲基哌啶-4-基4-三級丁基苯甲酸酯;及其任何組合。The method of claim 4, wherein the first inhibitor is selected from the group consisting of: 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl acetate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl propionate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl Butyrate; 1-Oxyl-2,2,6,6-tetramethylpiperidin-4-ylvalerate; 1-Oxyl-2,2,6,6-tetramethylpiperidine -4-ylhexanoate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-ylheptanoate; 1-oxyl radical-2,2,6,6-tetramethyl Methylpiperidin-4-yloctanoate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-ylnonanoate; 1-oxyradical-2,2,6 ,6-tetramethylpiperidin-4-yl decanoate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl undecanoate; 1-oxyl radical- 2,2,6,6-tetramethylpiperidin-4-yl dodecanoate; 1-oxyradical-2,2,6,6-tetramethylpiperidin-4-yl 2-ethylhexane Acid ester; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl stearate; 1-oxyl radical-2,2,6,6-tetramethylpiperidine -4-yl benzoate; 1-oxyl radical-2,2,6,6-tetramethylpiperidin-4-yl palmitate; 1-oxyl radical-2,2,6,6- Tetramethylpiperidin-4-yl behenate; 1-Oxyl-2,2,6,6-tetramethylpiperidin-4-yl 4-tertiary butyl benzoate; and any combination thereof. 如請求項1至5中任一項之方法,其中該第二抑制劑化合物係式(IV)或式(IV)之苯二胺: , (IV)                      (V) 其中X 1及X 2獨立地係C 1-C 22烷基或芳基,其中該烷基及芳基可選地經一或多個C 1-C 22烷基或芳基取代。 The method of any one of claims 1 to 5, wherein the second inhibitor compound is formula (IV) or a phenylenediamine of formula (IV): , (IV) ( V ) wherein X 1 and Aryl substitution. 如請求項1至6中任一項之方法,其中該第二抑制劑係選自由下列所組成之群組:1,2-苯二胺、1,4-苯二胺、N,N'-二-甲基-對苯二胺、N,N'-二-二級丁基-1,4-苯二胺、N,N'-二-1,4-二甲基戊基-1,4-苯二胺、N,N'-二-乙醯基-1,4-苯二胺、N-三級丁基-N'-苯基-1,4-苯二胺、N,N'-二-苯基-1,4-苯二胺、及其任何組合。The method of any one of claims 1 to 6, wherein the second inhibitor is selected from the group consisting of: 1,2-phenylenediamine, 1,4-phenylenediamine, N,N'- Di-methyl-p-phenylenediamine, N,N'-di-secondary butyl-1,4-phenylenediamine, N,N'-di-1,4-dimethylpentyl-1,4 -Phenylenediamine, N,N'-di-ethyl-1,4-phenylenediamine, N-tertiary butyl-N'-phenyl-1,4-phenylenediamine, N,N'- Di-phenyl-1,4-phenylenediamine, and any combination thereof. 如請求項1至7中任一項之方法,其中該第一抑制劑化合物係以約0.01重量%至約80重量%之濃度存在於該組成物中。The method of any one of claims 1 to 7, wherein the first inhibitor compound is present in the composition at a concentration of about 0.01% by weight to about 80% by weight. 如請求項1至8中任一項之方法,其中該第二抑制劑化合物係以約0.01重量%至約50重量%之濃度存在於該組成物中。The method of any one of claims 1 to 8, wherein the second inhibitor compound is present in the composition at a concentration of about 0.01% by weight to about 50% by weight. 如請求項1至9中任一項之方法,其中該第一抑制劑化合物與該第二抑制劑化合物之莫耳比係約100:1至約1:100。The method of any one of claims 1 to 9, wherein the molar ratio of the first inhibitor compound to the second inhibitor compound is from about 100:1 to about 1:100. 如請求項1至10中任一項之方法,其中該組成物進一步包含有機溶劑。The method of any one of claims 1 to 10, wherein the composition further contains an organic solvent. 如請求項1至11中任一項之方法,其中該製程流進一步包含選自由下列所組成之群組的烯系不飽和單體:乙酸乙烯酯、丙烯腈、丙烯酸酯、甲基丙烯酸酯、1,3-丁二烯、苯乙烯、異戊二烯、環戊二烯、二環戊二烯、丙烯酸、甲基丙烯酸、及其任何組合。The method of any one of claims 1 to 11, wherein the process stream further comprises an ethylenically unsaturated monomer selected from the group consisting of: vinyl acetate, acrylonitrile, acrylate, methacrylate, 1,3-butadiene, styrene, isoprene, cyclopentadiene, dicyclopentadiene, acrylic acid, methacrylic acid, and any combination thereof. 如請求項12之方法,其中該製程流進一步包含至少一種極性萃取蒸餾溶劑及至少一種非極性萃取蒸餾溶劑,該烯系不飽和單體存在於該至少一種非極性萃取蒸餾溶劑中。The method of claim 12, wherein the process stream further includes at least one polar extractive distillation solvent and at least one non-polar extractive distillation solvent, and the ethylenically unsaturated monomer is present in the at least one non-polar extractive distillation solvent. 如請求項13之方法,其中該至少一種極性萃取蒸餾溶劑及該至少一種非極性萃取蒸餾溶劑係彼此不互溶,該烯系不飽和單體存在於該至少一種非極性萃取蒸餾溶劑中。The method of claim 13, wherein the at least one polar extractive distillation solvent and the at least one non-polar extractive distillation solvent are immiscible with each other, and the ethylenically unsaturated monomer is present in the at least one non-polar extractive distillation solvent. 如請求項13之方法,其中相較於該至少一種極性萃取蒸餾溶劑,該烯系不飽和單體更大程度地分配成該至少一種非極性蒸餾溶劑中之一者。The method of claim 13, wherein the ethylenically unsaturated monomer partitions to a greater extent into one of the at least one non-polar distillation solvent than into the at least one polar extractive distillation solvent. 如請求項15之方法,其中相較於該至少一種極性萃取蒸餾溶劑,該第一抑制劑或該第二抑制劑更大程度地分配成該至少一種非極性萃取蒸餾溶劑。The method of claim 15, wherein the first inhibitor or the second inhibitor partitions to a greater extent into the at least one non-polar extractive distillation solvent than into the at least one polar extractive distillation solvent. 如請求項13至16中任一項之方法,其中該至少一種非極性萃取蒸餾溶劑係選自由下列所組成之群組:糠醛、乙酸乙烯酯、丙烯腈、1,3-丁二烯、苯乙烯、異戊二烯、環戊二烯、二環戊二烯、丙烯酸、甲基丙烯酸、四氫呋喃、戊烷、己烷、庚烷、辛烷、壬烷、癸烷、十一烷、十二烷、十三烷、十四烷、苯、甲苯、乙苯、乙基甲苯、二氯甲烷、四氯甲烷、戊烯、己烯、庚烯、辛烯、壬烯、癸烯、十一烯、十二烯、十三烯、十四烯、環戊烷、環戊烯、環己烷、環己烯、二環戊烷、環戊二烯、二環戊二烯、乙酸乙酯、丙酸乙酯、丁酸乙酯、戊酸乙酯、己酸乙酯、庚酸乙酯、乙基、壬酸酯、癸酸乙酯、十一酸乙酯、十二酸乙酯、十三酸乙酯、十四酸乙酯、十五酸乙酯、十六酸乙酯、十八烯酸乙酯、二十二酸乙酯、乙酸甲酯、丙酸甲酯、丁酸甲酯、戊酸甲酯、己酸甲酯、庚酸甲酯、甲基、壬酸酯、癸酸甲酯、十一酸甲酯、十二酸甲酯、十三酸甲酯、十四酸甲酯、十五酸甲酯、十六酸甲酯、十八烯酸甲酯、二十二酸甲酯、乙酸丙酯、丙酸丙酯、丁酸丙酯、戊酸丙酯、己酸丙酯、庚酸丙酯、丙基、壬酸酯、癸酸丙酯、十一酸丙酯、十二酸丙酯、十三酸丙酯、十四酸丙酯、十五酸丙酯、十六酸丙酯、十八烯酸丙酯、二十二酸丙酯、乙酸丁酯、丙酸丁酯、丁酸丁酯、戊酸丁酯、己酸丁酯、庚酸丁酯、丁基、壬酸酯、癸酸丁酯、十一酸丁酯、十二酸丁酯、十三酸丁酯、十四酸丁酯、十五酸丁酯、十六酸丁酯、十八烯酸丁酯、二十二酸丁酯、乙酸己酯、丙酸己酯、丁酸己酯、戊酸己酯、己酸己酯、庚酸己酯、己基、壬酸酯、癸酸己酯、十一酸己酯、十二酸己酯、十三酸己酯、十四酸己酯、十五酸己酯、十六酸己酯、十八烯酸己酯、二十二酸己酯、乙酸辛酯、丙酸辛酯、丁酸辛酯、戊酸辛酯、己酸辛酯、庚酸辛酯、辛基、壬酸酯、癸酸辛酯、十一酸辛酯、十二酸辛酯、十三酸辛酯、十四酸辛酯、十五酸辛酯、十六酸辛酯、十八烯酸辛酯、二十二酸辛酯、及其任何組合。The method of any one of claims 13 to 16, wherein the at least one non-polar extractive distillation solvent is selected from the group consisting of: furfural, vinyl acetate, acrylonitrile, 1,3-butadiene, benzene Ethylene, isoprene, cyclopentadiene, dicyclopentadiene, acrylic acid, methacrylic acid, tetrahydrofuran, pentane, hexane, heptane, octane, nonane, decane, undecane, dodecane Alkane, tridecane, tetradecane, benzene, toluene, ethylbenzene, ethyltoluene, methylene chloride, tetrachloromethane, pentene, hexene, heptene, octene, nonene, decene, undecene , dodecene, tridecene, tetradecene, cyclopentane, cyclopentene, cyclohexane, cyclohexene, dicyclopentane, cyclopentadiene, dicyclopentadiene, ethyl acetate, propylene Ethyl ester, ethyl butyrate, ethyl valerate, ethyl hexanoate, ethyl enanthate, ethyl, nonanoate, ethyl caprate, ethyl undecanoate, ethyl dodecanoate, thirteen Ethyl acid ester, ethyl myristate, ethyl pentadecanoate, ethyl hexadecanoate, ethyl octadecenoate, ethyl behenate, methyl acetate, methyl propionate, methyl butyrate, Methyl valerate, methyl caproate, methyl enanthate, methyl, nonanoate, methyl caprate, methyl undecanoate, methyl dodecanoate, methyl tridecanoate, methyl myristate , Methyl pentadecanoate, methyl hexadecanoate, methyl octadecenoate, methyl behenate, propyl acetate, propyl propionate, propyl butyrate, propyl valerate, propyl caproate , propyl heptanoate, propyl, nonanoate, propyl caprate, propyl undecanoate, propyl dodecanoate, propyl tridecanoate, propyl myristate, propyl pentadecanoate, hexadecanoate Propyl acid, propyl octacrylate, propyl behenate, butyl acetate, butyl propionate, butyl butyrate, butyl valerate, butyl caproate, butyl enanthate, butyl, Peyronanoate, butyl caprate, butyl undecanoate, butyl dodecanoate, butyl tridecanoate, butyl myristate, butyl pentadecanoate, butyl hexadecanoate, butyl octadecenoate Ester, butyl behenate, hexyl acetate, hexyl propionate, hexyl butyrate, hexyl valerate, hexyl hexanoate, hexyl enanthate, hexyl, nonanoate, hexyl decanoate, Hexyl monoate, hexyl dodecanoate, hexyl tridecanoate, hexyl myristate, hexyl pentadecanoate, hexyl hexadecanoate, hexyl octadecenoate, hexyl behenate, acetic acid Octyl ester, octyl propionate, octyl butyrate, octyl valerate, octyl hexanoate, octyl enanthate, octyl, nonanoate, octyl caprate, octyl undecanoate, octyl dodecanoate, octyl tridecanoate, Octyl myristate, octyl pentadecanoate, octyl hexadecanoate, octyl octadecenoate, octyl behenate, and any combination thereof. 如請求項13至17中任一項之方法,其中該至少一種極性萃取蒸餾溶劑係選自N,N-二甲基甲醯胺、糠醛、N-甲基吡咯啶酮、乙腈、水、及其組合。The method of any one of claims 13 to 17, wherein the at least one polar extractive distillation solvent is selected from the group consisting of N,N-dimethylformamide, furfural, N-methylpyrrolidone, acetonitrile, water, and its combination. 如請求項1至18中任一項之方法,其中將該組成物添加至該製程流中,使得該第一抑制劑化合物之濃度係約0.1 ppm至約10,000 ppm。The method of any one of claims 1 to 18, wherein the composition is added to the process stream such that the concentration of the first inhibitor compound is from about 0.1 ppm to about 10,000 ppm. 如請求項1至19中任一項之方法,其中將該組成物添加至該製程流中,使得該第二抑制劑化合物之濃度係約0.1 ppm至約10,000 ppm。The method of any one of claims 1 to 19, wherein the composition is added to the process stream such that the concentration of the second inhibitor compound is from about 0.1 ppm to about 10,000 ppm.
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