TW201930267A - N-methoxyamide compound or salt thereof, and agricultural and horticultural fungicide containing same - Google Patents
N-methoxyamide compound or salt thereof, and agricultural and horticultural fungicide containing same Download PDFInfo
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- TW201930267A TW201930267A TW107146395A TW107146395A TW201930267A TW 201930267 A TW201930267 A TW 201930267A TW 107146395 A TW107146395 A TW 107146395A TW 107146395 A TW107146395 A TW 107146395A TW 201930267 A TW201930267 A TW 201930267A
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- 150000003839 salts Chemical class 0.000 title claims abstract description 38
- 239000000417 fungicide Substances 0.000 title claims abstract description 14
- 230000000855 fungicidal effect Effects 0.000 title claims abstract description 11
- -1 N-methoxyamide compound Chemical class 0.000 title claims description 174
- 150000001875 compounds Chemical class 0.000 claims abstract description 378
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 claims description 86
- 238000000034 method Methods 0.000 claims description 78
- 201000010099 disease Diseases 0.000 claims description 77
- 125000005843 halogen group Chemical group 0.000 claims description 52
- 125000000623 heterocyclic group Chemical group 0.000 claims description 51
- 125000000217 alkyl group Chemical group 0.000 claims description 48
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 26
- 125000003545 alkoxy group Chemical group 0.000 claims description 24
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 24
- 229910052760 oxygen Inorganic materials 0.000 claims description 24
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- 125000001188 haloalkyl group Chemical group 0.000 claims description 17
- 125000004076 pyridyl group Chemical group 0.000 claims description 17
- 125000003342 alkenyl group Chemical group 0.000 claims description 15
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 229910052717 sulfur Inorganic materials 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 125000001424 substituent group Chemical group 0.000 claims description 12
- 239000004480 active ingredient Substances 0.000 claims description 11
- 125000004122 cyclic group Chemical group 0.000 claims description 10
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 9
- 239000002689 soil Substances 0.000 claims description 9
- 125000000304 alkynyl group Chemical group 0.000 claims description 8
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 7
- 229910052727 yttrium Inorganic materials 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 125000002373 5 membered heterocyclic group Chemical group 0.000 claims description 3
- 125000004070 6 membered heterocyclic group Chemical group 0.000 claims description 3
- 150000001924 cycloalkanes Chemical class 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 15
- 244000000003 plant pathogen Species 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 description 283
- 239000002904 solvent Substances 0.000 description 134
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 125
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 90
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 85
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 83
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 80
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 76
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 72
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 70
- 239000002585 base Substances 0.000 description 70
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 69
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- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 66
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 52
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 48
- 239000003795 chemical substances by application Substances 0.000 description 48
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 48
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 42
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- 239000002253 acid Substances 0.000 description 39
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 38
- 230000035484 reaction time Effects 0.000 description 38
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 38
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 36
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 35
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 35
- 239000000203 mixture Substances 0.000 description 34
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 30
- 235000019439 ethyl acetate Nutrition 0.000 description 29
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 28
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 27
- 241000233866 Fungi Species 0.000 description 27
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 26
- 241000123650 Botrytis cinerea Species 0.000 description 25
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 25
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 24
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 23
- DKGAVHZHDRPRBM-UHFFFAOYSA-N tert-butyl alcohol Substances CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 23
- 241000223218 Fusarium Species 0.000 description 22
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 22
- 239000000047 product Substances 0.000 description 22
- 239000008096 xylene Substances 0.000 description 22
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 21
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 21
- HQFQTTNMBUPQAY-UHFFFAOYSA-N cyclobutylhydrazine Chemical compound NNC1CCC1 HQFQTTNMBUPQAY-UHFFFAOYSA-N 0.000 description 21
- 229940113088 dimethylacetamide Drugs 0.000 description 21
- RHUYHJGZWVXEHW-UHFFFAOYSA-N 1,1-Dimethyhydrazine Chemical compound CN(C)N RHUYHJGZWVXEHW-UHFFFAOYSA-N 0.000 description 20
- UHPMCKVQTMMPCG-UHFFFAOYSA-N 5,8-dihydroxy-2-methoxy-6-methyl-7-(2-oxopropyl)naphthalene-1,4-dione Chemical compound CC1=C(CC(C)=O)C(O)=C2C(=O)C(OC)=CC(=O)C2=C1O UHPMCKVQTMMPCG-UHFFFAOYSA-N 0.000 description 20
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 20
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 20
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 20
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 20
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 20
- 229940100198 alkylating agent Drugs 0.000 description 20
- 239000002168 alkylating agent Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 20
- 239000000243 solution Substances 0.000 description 20
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 19
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 19
- 239000003880 polar aprotic solvent Substances 0.000 description 19
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 19
- 241000221785 Erysiphales Species 0.000 description 18
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 18
- 229910052783 alkali metal Inorganic materials 0.000 description 18
- 206010027146 Melanoderma Diseases 0.000 description 17
- 239000003054 catalyst Substances 0.000 description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 17
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 16
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 15
- 150000002576 ketones Chemical class 0.000 description 15
- 238000006722 reduction reaction Methods 0.000 description 15
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 15
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- 241000193830 Bacillus <bacterium> Species 0.000 description 14
- 241000894006 Bacteria Species 0.000 description 14
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 14
- 230000009467 reduction Effects 0.000 description 14
- 241000233679 Peronosporaceae Species 0.000 description 13
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 13
- 239000003153 chemical reaction reagent Substances 0.000 description 13
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- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 13
- 229910000000 metal hydroxide Inorganic materials 0.000 description 13
- 150000004692 metal hydroxides Chemical class 0.000 description 13
- 229910000029 sodium carbonate Inorganic materials 0.000 description 13
- 229910052723 transition metal Inorganic materials 0.000 description 13
- 150000003624 transition metals Chemical class 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 12
- 241000196324 Embryophyta Species 0.000 description 12
- 238000005481 NMR spectroscopy Methods 0.000 description 12
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 12
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- 239000012025 fluorinating agent Substances 0.000 description 12
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- 238000005804 alkylation reaction Methods 0.000 description 10
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- 229910052987 metal hydride Inorganic materials 0.000 description 10
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- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 10
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- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 10
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- DYLDNPYVDMQCFR-UHFFFAOYSA-N thiocyclam hydrochloride Chemical compound Cl.CN(C)C1CSSSC1 DYLDNPYVDMQCFR-UHFFFAOYSA-N 0.000 description 1
- ICTQUFQQEYSGGJ-UHFFFAOYSA-N thiocyclam oxalate Chemical compound OC(=O)C(O)=O.CN(C)C1CSSSC1 ICTQUFQQEYSGGJ-UHFFFAOYSA-N 0.000 description 1
- BAKXBZPQTXCKRR-UHFFFAOYSA-N thiodicarb Chemical compound CSC(C)=NOC(=O)NSNC(=O)ON=C(C)SC BAKXBZPQTXCKRR-UHFFFAOYSA-N 0.000 description 1
- XDLNRRRJZOJTRW-UHFFFAOYSA-N thiohypochlorous acid Chemical compound ClS XDLNRRRJZOJTRW-UHFFFAOYSA-N 0.000 description 1
- OPASCBHCTNRLRM-UHFFFAOYSA-N thiometon Chemical compound CCSCCSP(=S)(OC)OC OPASCBHCTNRLRM-UHFFFAOYSA-N 0.000 description 1
- QGHREAKMXXNCOA-UHFFFAOYSA-N thiophanate-methyl Chemical compound COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC QGHREAKMXXNCOA-UHFFFAOYSA-N 0.000 description 1
- PYNKFIVDSJSNGL-UHFFFAOYSA-N thiosultap Chemical compound OS(=O)(=O)SCC(N(C)C)CSS(O)(=O)=O PYNKFIVDSJSNGL-UHFFFAOYSA-N 0.000 description 1
- MBNMHBAJUNHZRE-UHFFFAOYSA-M thiosultap monosodium Chemical compound [Na+].OS(=O)(=O)SCC(N(C)C)CSS([O-])(=O)=O MBNMHBAJUNHZRE-UHFFFAOYSA-M 0.000 description 1
- VJQYLJSMBWXGDV-UHFFFAOYSA-N tiadinil Chemical compound N1=NSC(C(=O)NC=2C=C(Cl)C(C)=CC=2)=C1C VJQYLJSMBWXGDV-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OBZIQQJJIKNWNO-UHFFFAOYSA-N tolclofos-methyl Chemical compound COP(=S)(OC)OC1=C(Cl)C=C(C)C=C1Cl OBZIQQJJIKNWNO-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- BAZVSMNPJJMILC-UHFFFAOYSA-N triadimenol Chemical compound C1=NC=NN1C(C(O)C(C)(C)C)OC1=CC=C(Cl)C=C1 BAZVSMNPJJMILC-UHFFFAOYSA-N 0.000 description 1
- NKNFWVNSBIXGLL-UHFFFAOYSA-N triazamate Chemical compound CCOC(=O)CSC1=NC(C(C)(C)C)=NN1C(=O)N(C)C NKNFWVNSBIXGLL-UHFFFAOYSA-N 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- NFACJZMKEDPNKN-UHFFFAOYSA-N trichlorfon Chemical compound COP(=O)(OC)C(O)C(Cl)(Cl)Cl NFACJZMKEDPNKN-UHFFFAOYSA-N 0.000 description 1
- QFNFRZHOXWNWAQ-UHFFFAOYSA-N triclopyricarb Chemical compound COC(=O)N(OC)C1=CC=CC=C1COC1=NC(Cl)=C(Cl)C=C1Cl QFNFRZHOXWNWAQ-UHFFFAOYSA-N 0.000 description 1
- DQJCHOQLCLEDLL-UHFFFAOYSA-N tricyclazole Chemical compound CC1=CC=CC2=C1N1C=NN=C1S2 DQJCHOQLCLEDLL-UHFFFAOYSA-N 0.000 description 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- ONCZDRURRATYFI-TVJDWZFNSA-N trifloxystrobin Chemical compound CO\N=C(\C(=O)OC)C1=CC=CC=C1CO\N=C(/C)C1=CC=CC(C(F)(F)F)=C1 ONCZDRURRATYFI-TVJDWZFNSA-N 0.000 description 1
- HSMVPDGQOIQYSR-KGENOOAVSA-N triflumizole Chemical compound C1=CN=CN1C(/COCCC)=N/C1=CC=C(Cl)C=C1C(F)(F)F HSMVPDGQOIQYSR-KGENOOAVSA-N 0.000 description 1
- XAIPTRIXGHTTNT-UHFFFAOYSA-N triflumuron Chemical compound C1=CC(OC(F)(F)F)=CC=C1NC(=O)NC(=O)C1=CC=CC=C1Cl XAIPTRIXGHTTNT-UHFFFAOYSA-N 0.000 description 1
- RROQIUMZODEXOR-UHFFFAOYSA-N triforine Chemical compound O=CNC(C(Cl)(Cl)Cl)N1CCN(C(NC=O)C(Cl)(Cl)Cl)CC1 RROQIUMZODEXOR-UHFFFAOYSA-N 0.000 description 1
- GNMJFQWRASXXMS-UHFFFAOYSA-M trimethyl(phenyl)azanium;bromide Chemical compound [Br-].C[N+](C)(C)C1=CC=CC=C1 GNMJFQWRASXXMS-UHFFFAOYSA-M 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- 239000002383 tung oil Substances 0.000 description 1
- DBHVHTPMRCXCIY-UHFFFAOYSA-N tyclopyrazoflor Chemical compound N1=C(Cl)C(N(C(=O)CCSCCC(F)(F)F)CC)=CN1C1=CC=CN=C1 DBHVHTPMRCXCIY-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000016788 valerian Nutrition 0.000 description 1
- JARYYMUOCXVXNK-IMTORBKUSA-N validamycin Chemical compound N([C@H]1C[C@@H]([C@H]([C@H](O)[C@H]1O)O[C@H]1[C@@H]([C@@H](O)[C@H](O)[C@@H](CO)O1)O)CO)[C@H]1C=C(CO)[C@H](O)[C@H](O)[C@H]1O JARYYMUOCXVXNK-IMTORBKUSA-N 0.000 description 1
- DBXFMOWZRXXBRN-LWKPJOBUSA-N valifenalate Chemical compound CC(C)OC(=O)N[C@@H](C(C)C)C(=O)NC(CC(=O)OC)C1=CC=C(Cl)C=C1 DBXFMOWZRXXBRN-LWKPJOBUSA-N 0.000 description 1
- LESVOLZBIFDZGS-UHFFFAOYSA-N vamidothion Chemical compound CNC(=O)C(C)SCCSP(=O)(OC)OC LESVOLZBIFDZGS-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229940011671 vitamin b6 Drugs 0.000 description 1
- WCJYTPVNMWIZCG-UHFFFAOYSA-N xylylcarb Chemical compound CNC(=O)OC1=CC=C(C)C(C)=C1 WCJYTPVNMWIZCG-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000005943 zeta-Cypermethrin Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/02—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms
- A01N43/04—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom
- A01N43/06—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom five-membered rings
- A01N43/10—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom five-membered rings with sulfur as the ring hetero atom
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/48—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with two nitrogen atoms as the only ring hetero atoms
- A01N43/56—1,2-Diazoles; Hydrogenated 1,2-diazoles
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/48—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with two nitrogen atoms as the only ring hetero atoms
- A01N43/60—1,4-Diazines; Hydrogenated 1,4-diazines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D231/18—One oxygen or sulfur atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D231/18—One oxygen or sulfur atom
- C07D231/20—One oxygen atom attached in position 3 or 5
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D231/38—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
- C07D241/02—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings
- C07D241/10—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D241/14—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D241/24—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/38—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Agronomy & Crop Science (AREA)
- Pest Control & Pesticides (AREA)
- Plant Pathology (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Dentistry (AREA)
- General Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Zoology (AREA)
- Environmental Sciences (AREA)
- Plural Heterocyclic Compounds (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
Description
本發明係關於N-甲氧基醯胺化合物或其鹽及含有該等之農園藝用殺菌劑。The present invention relates to an N-methoxyindoleamine compound or a salt thereof and a horticultural fungicide containing the same.
具有一定之苯甲醯甲基醯胺構造的化合物,已知對各式各樣之有害生物的防除有用。例如,分別於專利文獻1及2中,記載具有作為殺蟲劑、殺蟎劑或殺線蟲劑有用之苯甲醯甲基醯胺構造的化合物,專利文獻3及4中記載具有作為農園藝用殺菌劑有用之苯甲醯甲基醯胺構造的化合物。然而,此等文獻中,後述式(1)之化合物,亦即具有醯胺之氮原子以甲氧基修飾之N-甲氧基醯胺構造及被RB 取代之雜環基的化合物,並未伴隨具體例而記載。Compounds having a certain structure of benzamidine methylguanamine are known to be useful for the control of a wide variety of pests. For example, in Patent Documents 1 and 2, a compound having a structure of benzamidine methyl guanamine useful as an insecticide, an acaricide or a nematicide is described, and Patent Documents 3 and 4 are described as having agricultural and horticultural use. A fungicide useful as a compound of benzamidine methylamine. However, in these documents, the compound of the formula (1) described below, that is, a compound having a methoxy group-modified N-methoxyguanamine structure and a R B- substituted heterocyclic group, has a nitrogen atom of a guanamine. It is not described with specific examples.
專利文獻5中雖記載具有被甲氧基或乙氧基取代之吡唑環之農園藝用殺菌劑,但不具有後述式(1)之「-C(O)-C(Me)2
-」構造。
[先前技術文獻]
[專利文獻]Patent Document 5 describes a agricultural and horticultural fungicide having a pyrazole ring substituted with a methoxy group or an ethoxy group, but does not have "-C(O)-C(Me) 2 -" of the formula (1) described later. structure.
[Previous Technical Literature]
[Patent Literature]
[專利文獻1]國際公開公報WO01/60783
[專利文獻2]國際公開公報WO03/27059
[專利文獻3]國際公開公報WO2006/016708
[專利文獻4]國際公開公報WO2007/069777
[專利文獻5]國際公開公報WO2007/060164[Patent Document 1] International Publication WO 01/60783
[Patent Document 2] International Publication WO03/27059
[Patent Document 3] International Publication WO2006/016708
[Patent Document 4] International Publication WO2007/069777
[Patent Document 5] International Publication WO2007/060164
[發明欲解決之課題][Questions to be solved by the invention]
自以往,為了防除植物病害所提供之多數農園藝用殺菌劑,各自在其光譜或植物病原菌防除效果具有特徵。然而,有對於特定之植物病害,效果不夠充分,或是與預防效果相比較,治療效果稍微劣化,或耐雨性劣化之殘效性比較上較短,藉由施用場面,對於植物病原菌,僅顯示實用上不夠充分之防除效果的情況。據此,正尋求不因施用場面,且對於範圍廣泛之植物病原菌,發揮高度防除效果之農園藝用殺菌劑的創製。
[用以解決課題之手段]Since the past, most agricultural and horticultural fungicides provided for the prevention of plant diseases have their own characteristics in their spectrum or plant pathogen control effects. However, for a specific plant disease, the effect is insufficient, or the treatment effect is slightly deteriorated compared with the preventive effect, or the residual effect of the rain resistance deterioration is relatively short, and the application scene is only practical for the plant pathogenic bacteria. The situation is not enough to prevent the effect. Accordingly, efforts have been made to create agricultural and horticultural fungicides that do not have a high degree of control effect on a wide range of plant pathogenic bacteria.
[Means to solve the problem]
本發明者們為了解決前述之問題點而研究的結果,發現後述式(1)表示之化合物或其鹽對於各種植物病害,表現優異之防除效果的卓見,而完成本發明。In order to solve the above-mentioned problems, the inventors of the present invention have found that the compound represented by the formula (1) or a salt thereof, which exhibits an excellent control effect against various plant diseases, has been completed.
亦即,本發明係關於式(1)表示之化合物或其鹽(以下,亦稱為本發明化合物),將本發明化合物作為有效成分含有之農園藝用殺菌劑及將本發明化合物施用在植物或土壤之防除植物病害之方法。That is, the present invention relates to a compound represented by the formula (1) or a salt thereof (hereinafter, also referred to as a compound of the present invention), a horticultural fungicide containing the compound of the present invention as an active ingredient, and a compound of the present invention applied to a plant. Or the method of controlling soil diseases in the soil.
[式中,A為被RA
取代之苯基或被RA
取代之吡啶基,
B為被RB
取代之雜環基(該雜環基可進一步被1~3個RB’
取代)、
RA
可相同或相異為鹵素原子、可被G1
取代之烷基、烯基、可被G2
取代之炔基、環狀基、硝基、氰基或-LA
-YA
,或可鍵結2個RA
,形成可被Z1
取代之環,
RB
為-LB
-YB
,
RB’
為鹵素原子、烷基、鹵烷基、烷氧基烷基、環烷基或氰基,
LA
為O、S、C(=O)、C(=O)O、C(=O)N(R1
)、OC(=O)、OC(=O)O、N(R1
)、N(R1
)C(=O)、N(R1
)C(=O)O、C(=NR2
)、SO、SO2
或SO2
N(R1
),
YA
為氫原子、可被Z2
取代之烷基、烯基或可被Z3
取代之環狀基,
LB
為O、S、C(=O)、C(=O)O、C(=O)N(R3
)、OC(=O)、N(R3
)、N(R3
)C(=O)、N(R3
)C(=O)O、C(=NR4
)、SO、SO2
或SO2
N(R3
),
YB
為氫原子、可被Z4
取代之烷基、烯基、環烷基、可被Z5
取代之苯基或可被Z5
取代之雜環基,
R1
為氫原子或烷基,
R2
為氫原子、烷基或烷氧基,
R3
為氫原子或烷基,
R4
為氫原子、烷基或烷氧基,
G1
為鹵素原子或烷氧基,
G2
為環烷基或鹵素原子,
Z1
為鹵素原子、烷基、烷氧基或環烷基,
Z2
為鹵素原子、氰基、環烷基或烷氧基,
Z3
為鹵素原子或鹵烷基,
Z4
為鹵素原子、環烷基或烷氧基,
Z5
為鹵素原子、烷基、鹵烷基、環烷基或烷氧基]。
[發明效果][Wherein, A is the substituted phenyl is substituted with the R A or R A pyridyl,
B is a heterocyclic group substituted by R B (the heterocyclic group may be further substituted by 1 to 3 R B' ),
R A may be the same or different in a halogen atom, an alkyl group which may be substituted by G 1 , an alkenyl group, an alkynyl group which may be substituted by G 2 , a cyclic group, a nitro group, a cyano group or -L A -Y A , or Two R A can be bonded to form a ring that can be substituted by Z 1 .
R B is -L B -Y B ,
R B ' is a halogen atom, an alkyl group, a haloalkyl group, an alkoxyalkyl group, a cycloalkyl group or a cyano group.
L A is O, S, C(=O), C(=O)O, C(=O)N(R 1 ), OC(=O), OC(=O)O, N(R 1 ), N(R 1 )C(=O), N(R 1 )C(=O)O, C(=NR 2 ), SO, SO 2 or SO 2 N(R 1 ),
Y A is a hydrogen atom, an alkyl group which may be substituted by Z 2 , an alkenyl group or a cyclic group which may be substituted by Z 3 .
L B is O, S, C(=O), C(=O)O, C(=O)N(R 3 ), OC(=O), N(R 3 ), N(R 3 )C( =O), N(R 3 )C(=O)O, C(=NR 4 ), SO, SO 2 or SO 2 N(R 3 ),
Y B is a hydrogen atom, an alkyl group which may be substituted by Z 4 , an alkenyl group, a cycloalkyl group, a phenyl group which may be substituted by Z 5 or a heterocyclic group which may be substituted by Z 5 ,
R 1 is a hydrogen atom or an alkyl group,
R 2 is a hydrogen atom, an alkyl group or an alkoxy group.
R 3 is a hydrogen atom or an alkyl group,
R 4 is a hydrogen atom, an alkyl group or an alkoxy group.
G 1 is a halogen atom or an alkoxy group,
G 2 is a cycloalkyl group or a halogen atom,
Z 1 is a halogen atom, an alkyl group, an alkoxy group or a cycloalkyl group.
Z 2 is a halogen atom, a cyano group, a cycloalkyl group or an alkoxy group.
Z 3 is a halogen atom or a haloalkyl group,
Z 4 is a halogen atom, a cycloalkyl group or an alkoxy group.
Z 5 is a halogen atom, an alkyl group, a haloalkyl group, a cycloalkyl group or an alkoxy group].
[Effect of the invention]
本發明化合物與類似之以往化合物比較,由於可發揮優異之植物病害的防除效果及滲透傳遞性,故作為農園藝用殺菌劑有用。The compound of the present invention is useful as a fungicide for agricultural and horticultural use because it exhibits an excellent plant disease control effect and osmotic transfer property as compared with a similar conventional compound.
在本說明書,苯基或吡啶基的取代基即RA 之數可為1個,亦可為2個以上(例如2個、3個、4個等)。為2個以上時,RA 可分別相同亦可相異。In the present specification, the number of R A which is a substituent of a phenyl group or a pyridyl group may be one or two or more (for example, two, three, four, etc.). When there are two or more, R A may be the same or different.
在本說明書,作為鹵素原子或作為取代基之鹵素原子,可列舉氟、氯、溴或碘之各原子。作為取代基之鹵素原子之數可為1或2以上,為2個以上時,各鹵素原子可分別相同亦可相異。
又,鹵素原子之取代位置可為任一位置。In the present specification, examples of the halogen atom or a halogen atom as a substituent include each atom of fluorine, chlorine, bromine or iodine. The number of halogen atoms as a substituent may be 1 or 2 or more, and when it is 2 or more, each halogen atom may be the same or different.
Further, the substitution position of the halogen atom may be any position.
在本說明書,作為烷基或烷基部分,例如可列舉如甲基、乙基、丙基、異丙基、n-丁基、異丁基、s-丁基、t-丁基、n-戊基、新戊基、己基、庚基、辛基、壬基、癸基、十一烷基、十二烷基之直鏈或分枝鏈狀的C1 -C12 之基。In the present specification, examples of the alkyl group or the alkyl moiety include, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, a t-butyl group, and an n- group. a linear or branched chain C 1 -C 12 group of a pentyl, neopentyl, hexyl, heptyl, octyl, decyl, decyl, undecyl or dodecyl group.
在本說明書,作為烯基或烯基部分,例如可列舉如乙烯基、1-丙烯基、2-丙烯基、異丙烯基、2-甲基-1-丙烯基、1-甲基-1-丙烯基、2-甲基-2-丙烯基、1-甲基-2-丙烯基、1-丁烯基、2-丁烯基、3-丁烯基、1-戊烯基、2-戊烯基、2-甲基-2-丁烯基、3-甲基-2-丁烯基、1-己烯基、2,3-二甲基-2-丁烯基之直鏈或分枝鏈狀的C2 -C6 之基。In the present specification, examples of the alkenyl or alkenyl moiety include a vinyl group, a 1-propenyl group, a 2-propenyl group, an isopropenyl group, a 2-methyl-1-propenyl group, and a 1-methyl-1- group. Propylene, 2-methyl-2-propenyl, 1-methyl-2-propenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentyl Straight chain or branch of alkenyl, 2-methyl-2-butenyl, 3-methyl-2-butenyl, 1-hexenyl, 2,3-dimethyl-2-butenyl A chain of C 2 -C 6 groups.
在本說明書,作為炔基或炔基部分,例如可列舉如乙炔基、1-丙炔基、2-丙炔基、1-丁炔基、2-丁炔基、3-丁炔基、1-甲基-2-丙炔基、2-甲基-3-丁炔基、1-己炔基、2-己炔基、3-己炔基、4-己炔基、5-己炔基、3,3-二甲基-1-丁炔基之直鏈或分枝鏈狀的C2 -C6 之基。In the present specification, examples of the alkynyl group or alkynyl group include, for example, an ethynyl group, a 1-propynyl group, a 2-propynyl group, a 1-butynyl group, a 2-butynyl group, a 3-butynyl group, and 1 -methyl-2-propynyl, 2-methyl-3-butynyl, 1-hexynyl, 2-hexynyl, 3-hexynyl, 4-hexynyl, 5-hexynyl a linear or branched chain C 2 -C 6 group of 3,3-dimethyl-1-butynyl.
在本說明書,作為環烷基或環烷基部分,例如可列舉如環丙基、環丁基、環戊基、環己基、環庚基、金剛烷基、雙環[1,1,1]戊基之C3 -C10 之基。In the present specification, examples of the cycloalkyl or cycloalkyl moiety include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, an adamantyl group, and a bicyclo[1,1,1] pentyl group. Based on the basis of C 3 -C 10 .
在本說明書,作為環狀基,係意指飽和或不飽和之碳環基或雜環基。所謂碳環基,係作為環原子僅包含碳原子之環狀基,可列舉如環烷基(例如環丙基、環丁基、環戊基、環己基、環庚基、金剛烷基、雙環[1,1,1]戊基等)及芳基(例如苯基、萘基、茚基、二氫茚基等)之C3 -C10 之基。作為雜環基,可列舉含有1~4個選自由O、S及N所成之群組中之至少1種的原子之3~6員之單環式的雜環基(例如如環氧乙烷基、噻喃基(thiiranyl)、氮呾基(azetidinyl)之3員雜環基;如氧呾基(oxetanyl)、硫呾基(thietanyl)、氮呾基之4員雜環基;呋喃基、四氫呋喃基、噻吩基、吡咯基、唑啉基、咯啶基、二氧戊環基、噁唑基、異噁唑基、噻唑基、異噻唑基、咪唑基、咪唑啉基、咪唑啶基、吡唑基、吡唑啉基、吡唑啶基 、三唑基、噁二唑基、噻二唑基、四唑基等之5員雜環基;吡喃基、吡啶基、哌啶基、二噁烷基、噁嗪基、嗎啉基、噻嗪基、噠嗪基、嘧啶基、吡嗪基、哌嗪基,三嗪基、噻喃基、二氫噻喃基、氧硫雜環己烯基(oxathiinyl)等之6員雜環基),以及含有1~4個選自由O、S及N所成之群組中之至少1種的原子之縮合雜環基(例如苯并呋喃基、異苯并呋喃基、二氫苯并呋喃基、二氫異苯并呋喃基、苯并噻吩基、異苯并噻吩基、二氫苯并噻吩基、二氫異苯并噻吩基、四氫苯并噻吩基、吲哚基、異吲哚基、苯并噁唑基、苯并噻唑基、吲唑基、苯并咪唑基、苯并二氧環戊基(benzodioxolanyl)、苯并二噁烷基、苯并哌喃基、苯并二氫哌喃基、異苯并二氫哌喃基、色酮基(chromonyl)、色滿酮基(chromanonyl)、喹啉基、異喹啉基、噌啉基、酞嗪基、喹唑啉基、喹喔啉基、吲嗪基(indolizinyl)、喹嗪基、咪唑并吡啶基、萘啶基、蝶啶基、二氫苯并惡嗪基、二氫苯并噁唑酮基、二氫苯并噁嗪酮基(benzoxazinonyl)、苯并硫氧雜環己基(Benzothioxanyl)等)。In the present specification, the term "cyclic group" means a saturated or unsaturated carbocyclic group or a heterocyclic group. The carbocyclic group is a cyclic group containing only a carbon atom as a ring atom, and examples thereof include a cycloalkyl group (for example, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, an adamantyl group, and a bicyclic ring). [1,1,1]pentyl, etc.) and a C 3 -C 10 group of an aryl group (e.g., phenyl, naphthyl, anthracenyl, indanyl, etc.). Examples of the heterocyclic group include a monocyclic heterocyclic group having 3 to 6 members of one to four atoms selected from the group consisting of O, S and N (for example, epoxy B) a 3-membered heterocyclic group of an alkyl group, a thiiranyl group, or an azetidinyl group; a 4-membered heterocyclic group such as an oxetanyl group, a thietanyl group, or a fluorenyl group; a furyl group; , tetrahydrofuranyl, thienyl, pyrrolyl, oxazolyl, pyridyl, dioxolanyl, oxazolyl, isoxazolyl, thiazolyl, isothiazolyl, imidazolyl, imidazolinyl, imidazolidinyl a 5-membered heterocyclic group such as pyrazolyl, pyrazolinyl, pyrazolyl, triazolyl, oxadiazolyl, thiadiazolyl, tetrazolyl, etc.; pyranyl, pyridyl, piperidinyl , dioxoalkyl, oxazinyl, morpholinyl, thiazinyl, pyridazinyl, pyrimidinyl, pyrazinyl, piperazinyl, triazinyl, thiopyranyl, dihydrothiopyranyl, oxathia a 6-membered heterocyclic group such as oxathiinyl or the like, and a condensed heterocyclic group having 1 to 4 atoms selected from at least one selected from the group consisting of O, S and N (for example, benzoyl) Furanyl, isobenzofuranyl, dihydrobenzofuran , dihydroisobenzofuranyl, benzothienyl, isobenzothiophenyl, dihydrobenzothiophenyl, dihydroisobenzothiophenyl, tetrahydrobenzothiophenyl, fluorenyl, isoindole Benzo, benzoxazolyl, benzothiazolyl, oxazolyl, benzimidazolyl, benzodioxolanyl, benzodioxyl, benzopyranyl, benzodihydrogen Piperyl, isobenzopyrano, chromonyl, chromanonyl, quinolinyl, isoquinolyl, porphyrinyl, pyridazinyl, quinazolinyl, Quinoxalinyl, indolizinyl, quinazolyl, imidazopyridyl, naphthyridinyl, pteridinyl, dihydrobenzoxazinyl, dihydrobenzoxazolone, dihydrobenzo Benzoxazinonyl, Benzothioxanyl, etc.).
作為式(1)中之B表示之雜環基,可使用與作為前述環狀基例示之雜環基相同者。較佳為含有1~4個選自由O、S及N所成之群組中之至少1種的原子之5~6員之雜環基,更具體而言,可列舉以下。
選自由式(B-1)~式(B-18):As the heterocyclic group represented by B in the formula (1), the same as the heterocyclic group exemplified as the above cyclic group can be used. It is preferably a heterocyclic group of 5 to 6 members containing at least one atom selected from the group consisting of O, S and N, and more specifically, the following.
Select freestyle (B-1) ~ formula (B-18):
[式中,RB1
~RB3
中之任一個、RB4
~RB6
中之任一個、RB7
~RB9
中之任一個、RB10
~RB12
中之任一個、RB13
~RB15
中之任一個、RB16
~RB18
中之任一個及RB19
~RB20
中之任一個為-LB
-YB
,殘餘為鹵素原子、烷基、鹵烷基、烷氧基烷基、環烷基或氰基,LB
及YB
係如前述,*表示鍵結位置]表示之5員雜環基及
式(B-101)~式(B-128):[In the formula, any one of R B1 to R B3 , any one of R B4 to R B6 , any one of R B7 to R B9 , any one of R B10 to R B12 , and R B13 to R B15 Any one of R B16 to R B18 and any one of R B19 to R B20 is -L B -Y B , and the residue is a halogen atom, an alkyl group, a haloalkyl group, an alkoxyalkyl group, or a ring. The alkyl group or the cyano group, the L B and Y B groups are as described above, * represents a 5-membered heterocyclic group represented by a bonding position], and the formula (B-101) to the formula (B-128):
[式中,RB101 ~RB104 中之任一個、RB105 ~RB108 中之任一個、RB109 ~RB111 中之任一個、RB112 ~RB114 中之任一個為-LB -YB ,殘餘為鹵素原子、烷基、鹵烷基、烷氧基烷基、環烷基或氰基,LB 及YB 係如前述,*表示鍵結位置]表示之6員雜環基所成之群組中之雜環基。[In the formula, any one of R B101 to R B104 , any one of R B105 to R B108 , any one of R B109 to R B111 , and any one of R B112 to R B114 is -L B -Y B The residue is a halogen atom, an alkyl group, a haloalkyl group, an alkoxyalkyl group, a cycloalkyl group or a cyano group, and L B and Y B are as defined above, and * represents a 6-membered heterocyclic group represented by a bonding position] Heterocyclic groups in the group.
作為B表示之雜環基,有於與「*」鍵結之原子相鄰的原子上具有取代基較佳的情況。The heterocyclic group represented by B may have a substituent in the atom adjacent to the atom to which the "*" is bonded.
在式(1),作為在鍵結2個RA 形成環的態樣之A,可列舉可被Z1 取代之苯并二氧環戊基、苯并二噁烷基、苯并噻唑基、二氫苯并氧硫雜環己烯基(benzoxathiinyl)等。於此,與同一碳原子鍵結之2個Z1 可鍵結形成螺環,作為形成螺環時之A的例,可列舉螺環[苯并[d][1,3]二氧雜環戊烯(Dioxol)-2,1’-環戊烷]-5-基、螺環[苯并[d][1,3]二氧雜環戊烯(Dioxol)-2,1’-環丁烷]-5-基等。In the formula (1), as A in which a ring is formed by bonding two R A groups, a benzodioxanyl group, a benzodioxanyl group, a benzothiazolyl group which may be substituted by Z 1 may be mentioned. Dihydrobenzoxene hexenyl (benzoxathiinyl) and the like. Here, two Z 1 bonded to the same carbon atom may be bonded to form a spiro ring, and examples of A in the case of forming a spiro ring include a spiro ring [benzo[d][1,3]dioxacyclohexane. Dioxol-2,1'-cyclopentan]-5-yl, spiro[benzo[d][1,3]dioxole-2,1'-cyclobutane Alkyl]-5-yl and the like.
作為式(1)之化合物之鹽,若為農業上所容許者,雖都包含,但例如可列舉如鈉鹽、鉀鹽之鹼金屬鹽;如鎂鹽、鈣鹽之鹼土類金屬鹽;如鹽酸鹽、過氯酸鹽、硫酸鹽、硝酸鹽之無機酸鹽;如乙酸鹽、甲烷磺酸鹽之有機酸鹽等。The salt of the compound of the formula (1), if it is acceptable for agriculture, includes, for example, an alkali metal salt such as a sodium salt or a potassium salt; an alkaline earth metal salt such as a magnesium salt or a calcium salt; A mineral acid salt of a hydrochloride, a perchlorate, a sulfate or a nitrate; an organic acid salt such as an acetate or a methanesulfonate.
本發明化合物中,雖存在各種同分異構物、例如光學同分異構物、幾何同分異構物等,但本發明中包含各同分異構物及同分異構物混合物雙方。尚,本發明化合物中,在該技術領域之技術常識的範圍內,亦包含前述者以外之各種同分異構物。In the compound of the present invention, although various isomers such as optical isomers, geometric isomers and the like are present, the present invention includes both the isomers and the mixture of isomers. Further, among the compounds of the present invention, various isomers other than the above are also included within the scope of the technical knowledge in the technical field.
又,雖有因同分異構物的種類,導致成為與記載之構造式不同之化學構造的情況,但若為本發明領域具有通常知識者,由於該等為同分異構物的關係有充分認識,故非常清楚為本發明的範圍內。Further, there are cases in which a chemical structure different from the structural formula described above is caused by the type of the isomer, but if it is a general knowledge in the field of the present invention, the relationship of these isomers is Fully understood, it is well within the scope of the invention.
本發明化合物雖可依以下所示知反應A~K及通常之鹽的製造方法製造,但得到本發明化合物之方法,並不限定於此等之方法。例如,本發明化合物亦可藉由於在A之苯基或吡啶基上之取代基及/或在B之雜環基上之取代基,在本領域,適用周知之各種取代基變換反應(例如水解、氧化、還原、酯化、醯胺化、烷基化等)來製造。又,在本發明化合物之製造,在本領域,如有必要可適用通常所使用之保護及脫保護反應。Although the compound of the present invention can be produced by the following methods for producing the reactions A to K and the usual salts, the method for obtaining the compound of the present invention is not limited thereto. For example, the compounds of the present invention may also be subjected to various substituent conversion reactions (e.g., hydrolysis) in the art by virtue of substituents on the phenyl or pyridyl group of A and/or substituents on the heterocyclic group of B. , oxidation, reduction, esterification, guanidine, alkylation, etc.). Further, in the production of the compound of the present invention, the protection and deprotection reactions which are usually used can be applied in the art if necessary.
反應A
反應A係藉由甲基化式(2)之化合物,得到式(1)之化合物之方法。Reaction A
Reaction A is a method of obtaining a compound of the formula (1) by methylating a compound of the formula (2).
式中之記號係如前述。The symbols in the formula are as described above.
反應A可依一般的甲基化的反應條件進行,通常可於甲基化劑、鹼及溶媒的存在下進行。The reaction A can be carried out under the usual methylation reaction conditions, and can usually be carried out in the presence of a methylating agent, a base and a solvent.
作為甲基化劑,例如可列舉碘化甲烷、溴化甲烷、硫酸二甲酯、三甲基矽烷基重氮甲烷等。甲基化劑相對於式(2)之化合物1當量,可使用1~20當量,期望為1~10當量(當量為莫耳當量,以下相同)。
作為鹼,例如可從如鈉、鉀之鹼金屬;如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類;如吡啶、4-二甲基胺基吡啶之吡啶類;如甲基鋰、n-丁基鋰、鋰二異丙基醯胺、六甲基二矽氮烷鋰之有機鋰化合物等中適當選擇1種或2種以上。鹼相對於式(2)之化合物1當量,可使用1~3當量,期望為1~2當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;如丙酮、甲基乙基酮之酮類;水等中適當選擇1種或2種以上。Examples of the methylating agent include methyl iodide, methyl bromide, dimethyl sulfate, and trimethyldecyl diazomethane. The methylating agent may be used in an amount of from 1 to 20 equivalents per 1 equivalent of the compound of the formula (2), and is desirably from 1 to 10 equivalents (the equivalent is a molar equivalent, the same applies hereinafter).
As the base, for example, an alkali metal such as sodium or potassium; an alkali metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butanolate; a carbonate such as sodium carbonate or potassium carbonate; sodium hydrogencarbonate or potassium hydrogencarbonate; a hydrogencarbonate; a metal hydroxide such as sodium hydroxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; such as monomethylamine, dimethylamine, triethylamine, diisopropyl An amine of ethylamine; a pyridine such as pyridine or 4-dimethylaminopyridine; such as methyl lithium, n-butyl lithium, lithium diisopropyl decylamine, lithium hexamethyldiazepine One or two or more kinds of organic lithium compounds and the like are appropriately selected. The base may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (2).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methyl acetate, acetic acid Esters of ethyl esters; such as methanol, ethanol, propanol, tert-butanol alcohols; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide And a polar aprotic solvent of N-methylpyrrolidone, pyridine, acetonitrile or propionitrile; a ketone such as acetone or methyl ethyl ketone; and one or more selected from water and the like.
反應溫度通常為-78~100℃,期望為0~80℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。The reaction temperature is usually -78 to 100 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
反應A所使用之式(2)之化合物可依後述之反應1-1製造。The compound of the formula (2) used in the reaction A can be produced by the reaction 1-1 described later.
反應B
反應B係將式(3)之化合物與式(4)之化合物進行反應,得到式(1)之化合物之方法。Reaction B
Reaction B is a method of reacting a compound of the formula (3) with a compound of the formula (4) to give a compound of the formula (1).
式中,T為羥基、烷氧基、芳氧基或鹵素,其他記號係如前述。In the formula, T is a hydroxyl group, an alkoxy group, an aryloxy group or a halogen, and other symbols are as described above.
反應B通常可於鹼及溶媒的存在下進行。式(4)之化合物相對於式(3)之化合物1當量,可使用1~3當量,期望為1~2當量。Reaction B can usually be carried out in the presence of a base and a solvent. The compound of the formula (4) can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (3).
鹼例如可從如鈉、鉀之鹼金屬;如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類;如吡啶、4-二甲基胺基吡啶之吡啶類;如甲基鋰、n-丁基鋰、鋰二異丙基醯胺之有機鋰化合物等中適當選擇1種或2種以上。鹼相對於式(3)之化合物1當量,可使用1~3當量,期望為1~2當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;如丙酮、甲基乙基酮之酮類等中適當選擇1種或2種以上。The base may be, for example, an alkali metal such as sodium or potassium; an alkali metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butoxide; a carbonate such as sodium carbonate or potassium carbonate; for example, sodium hydrogencarbonate or potassium hydrogencarbonate. a hydrogen hydride; a metal hydroxide such as sodium hydroxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; such as monomethylamine, dimethylamine, triethylamine, diisopropyl An amine of a base; a pyridine such as pyridine or 4-dimethylaminopyridine; an organic lithium compound such as methyl lithium, n-butyl lithium or lithium diisopropyl decylamine, or the like 2 or more types. The base may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (3).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methyl acetate, acetic acid Ester of ethyl ester; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile, propionitrile A protic solvent, such as acetone or a ketone of methyl ethyl ketone, may be appropriately selected from one or two or more.
反應B如有必要可於脫水縮合劑的存在下進行。作為脫水縮合劑,可列舉N,N’-二環己基碳二亞胺、氯磺醯基異氰酸酯、N,N’-羰基二咪唑、三氟乙酸酐等。脫水縮合劑相對於式(3)之化合物1當量,可使用1~5當量,期望為1~2當量。The reaction B can be carried out in the presence of a dehydrating condensing agent if necessary. The dehydrating condensing agent may, for example, be N,N'-dicyclohexylcarbodiimide, chlorosulfonyl isocyanate, N,N'-carbonyldiimidazole or trifluoroacetic anhydride. The dehydrating condensing agent may be used in an amount of from 1 to 5 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (3).
反應溫度通常為0~100℃,期望為0~50℃,反應時間通常為0.5~48小時左右,期望為1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 0 to 50 ° C, and the reaction time is usually about 0.5 to 48 hours, and is desirably about 1 to 24 hours.
反應B所使用之式(3)之化合物可依後述之反應1-2或反應1-3製造。式(4)之化合物可依以下之反應2-1或公知之方法製造,或可使用市售品。The compound of the formula (3) used in the reaction B can be produced by the reaction 1-2 or the reaction 1-3 described later. The compound of the formula (4) can be produced by the following reaction 2-1 or a known method, or a commercially available product can be used.
反應C
反應C係將式(5)之化合物與式(6)之化合物進行反應,得到式(1)之化合物之方法。Reaction C
Reaction C is a method in which a compound of the formula (5) is reacted with a compound of the formula (6) to give a compound of the formula (1).
式中,X為氯原子、溴原子或碘原子,其他記號係如前述。In the formula, X is a chlorine atom, a bromine atom or an iodine atom, and other symbols are as described above.
反應C通常可於鹼及溶媒的存在下進行。式(6)之化合物相對於式(5)之化合物1當量,可使用1~3當量,期望為1~2當量。The reaction C can usually be carried out in the presence of a base and a solvent. The compound of the formula (6) can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (5).
作為鹼,例如可從如鈉、鉀之鹼金屬;如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類等中適當選擇1種或2種以上。鹼相對於式(5)之化合物,可使用1~3當量,期望為1~2當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;如丙酮、甲基乙基酮之酮類;水等中適當選擇1種或2種以上。As the base, for example, an alkali metal such as sodium or potassium; an alkali metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butoxide; a carbonate such as sodium carbonate or potassium carbonate; such as sodium hydrogencarbonate or hydrogen carbonate; a hydrogen carbonate of potassium; a metal hydroxide such as sodium hydroxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; such as monomethylamine, dimethylamine, triethylamine, diisopropyl One or two or more kinds of the amines of the ethyl ethylamine are appropriately selected. The base can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, based on the compound of the formula (5).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methyl acetate, acetic acid Esters of ethyl esters; such as methanol, ethanol, propanol, tert-butanol alcohols; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide And a polar aprotic solvent of N-methylpyrrolidone, pyridine, acetonitrile or propionitrile; a ketone such as acetone or methyl ethyl ketone; and one or more selected from water and the like.
反應溫度通常為0~100℃,期望為20~80℃,反應時間通常為0.1~48小時左右,期望為1~24小時左右。The reaction temperature is usually from 0 to 100 ° C, desirably from 20 to 80 ° C, and the reaction time is usually from about 0.1 to 48 hours, and is desirably from about 1 to 24 hours.
反應C所使用之式(5)之化合物可依後述之反應1-9製造。式(6)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (5) used in the reaction C can be produced according to the reactions 1 to 9 described later. The compound of the formula (6) can be produced by a known method, or a commercially available product can be used.
反應D
反應D係使用式(7)之化合物,從A1
之RA
為氟之式(1-1)之化合物,變換成A2
之RA
為羥基之式(1-2)之化合物之方法。Reaction D
Reacting a compound of formula D line (7), the R of A 1 A from a compound of formula (1-1) of fluorine, the method is converted into R A A 2 of the formula (1-2) of the hydroxyl groups of the compound.
式中,A1 為被氟取代之苯基或被氟取代之吡啶基,A2 為被羥基取代之苯基或被羥基取代之吡啶基,其他記號係如前述。In the formula, A 1 is a phenyl group substituted by fluorine or a pyridyl group substituted by fluorine, and A 2 is a phenyl group substituted by a hydroxy group or a pyridyl group substituted by a hydroxy group, and other symbols are as described above.
反應D通常可於鹼及溶媒的存在下進行。式(7)之化合物相對於式(1-1)之化合物1當量,可使用1~10當量,期望為1~5當量。Reaction D can usually be carried out in the presence of a base and a solvent. The compound of the formula (7) can be used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (1-1).
鹼例如可從如鈉、鉀之鹼金屬;如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類;如吡啶、4-二甲基胺基吡啶之吡啶類;如甲基鋰、n-丁基鋰、鋰二異丙基醯胺之有機鋰化合物等中適當選擇1種或2種以上。鹼相對於式(1-1)之化合物1當量,可使用1~10當量,期望為1~5當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;如丙酮、甲基乙基酮之酮類等中適當選擇1種或2種以上。The base may be, for example, an alkali metal such as sodium or potassium; an alkali metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butoxide; a carbonate such as sodium carbonate or potassium carbonate; for example, sodium hydrogencarbonate or potassium hydrogencarbonate. a hydrogen hydride; a metal hydroxide such as sodium hydroxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; such as monomethylamine, dimethylamine, triethylamine, diisopropyl An amine of a base; a pyridine such as pyridine or 4-dimethylaminopyridine; an organic lithium compound such as methyl lithium, n-butyl lithium or lithium diisopropyl decylamine, or the like 2 or more types. The base may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (1-1).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methyl acetate, acetic acid Ester of ethyl ester; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile, propionitrile A protic solvent, such as acetone or a ketone of methyl ethyl ketone, may be appropriately selected from one or two or more.
反應溫度通常為0~150℃,期望為50~100℃,反應時間通常為1~24小時左右,期望為1~12小時左右。The reaction temperature is usually 0 to 150 ° C, desirably 50 to 100 ° C, and the reaction time is usually about 1 to 24 hours, and is desirably about 1 to 12 hours.
反應E
反應E係使用式(8)之化合物或式(9)之化合物,將A2
之RA
為羥基之式(1-2)之化合物變換成A3
之RA
為-O-YA1
之式(1-3)之化合物之方法。Reaction E
Reacting a compound of formula E series (8) or the formula (9), the R A A 2 of the compound of formula (1-2) is converted into the hydroxyl groups of A R A 3 is of formula (1 -OY A1 of -3) Method of compound.
式中,A3 為被-O-YA1 取代之苯基或被-O-YA1 取代之吡啶基,YA1 為可被Z2 取代之烷基、烯基或可被Z3 取代之環狀基,其他記號係如前述。Wherein, A 3 is a substituent of the substituted phenyl or -OY A1-pyridinyl -OY A1, Y A1 Z 2 which may be substituted with the alkyl group, alkenyl group, or Z 3 may be substituted with the cyclic group, other The symbol is as described above.
反應E通常可於式(8)之化合物、鹼及溶媒的存在下進行。或依一般的光延反應,可於式(9)之化合物、三苯基膦、偶氮二羧酸二酯及溶媒的存在下進行。式(8)之化合物或式(9)之化合物相對於式(1-2)之化合物1當量,可使用1~3當量,期望為1~2當量。三苯基膦相對於式(1-2)之化合物1當量,可使用1~3當量,期望為1~1.5當量。偶氮二羧酸二酯相對於式(1-2)之化合物1當量,可使用1~3當量,期望為1~1.5當量。The reaction E can usually be carried out in the presence of a compound of the formula (8), a base and a solvent. Or, according to a general photo-stretching reaction, it can carry out in the presence of the compound of the formula (9), triphenylphosphine, azodicarboxylic acid diester, and a solvent. The compound of the formula (8) or the compound of the formula (9) may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (1-2). Triphenylphosphine may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (1-2). The azodicarboxylate diester may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (1-2).
鹼例如可從如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類;如吡啶、4-二甲基胺基吡啶之吡啶類等中適當選擇1種或2種以上。鹼相對於式(1-2)之化合物,可使用1~2當量,期望為1~1.5當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶之極性非質子性溶媒;如乙腈、丙腈、丙烯腈之腈類;如丙酮、甲基乙基酮之酮類;水等中適當選擇1種或2種以上。
作為偶氮二羧酸二酯,例如可使用偶氮二羧酸二乙酯等。The base may, for example, be an alkali metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butylate; a carbonate such as sodium carbonate or potassium carbonate; a hydrogencarbonate such as sodium hydrogencarbonate or potassium hydrogencarbonate; a metal hydroxide of potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; an amine such as monomethylamine, dimethylamine, triethylamine or diisopropylethylamine; One or two or more kinds of pyridines such as 4-dimethylaminopyridine are appropriately selected. The base can be used in an amount of from 1 to 2 equivalents, and desirably from 1 to 1.5 equivalents, based on the compound of the formula (1-2).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methyl acetate, acetic acid Ester of ethyl ester; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, polar aprotic solvent; A nitrile of acetonitrile, propionitrile or acrylonitrile; a ketone of acetone or methyl ethyl ketone; one or more selected from water and the like.
As the azodicarboxylic acid diester, for example, diethyl azodicarboxylate or the like can be used.
反應溫度通常為-30~100℃,期望為0~50℃,反應時間通常為0.1~24小時左右,期望為0.1~12小時左右。The reaction temperature is usually -30 to 100 ° C, desirably 0 to 50 ° C, and the reaction time is usually about 0.1 to 24 hours, and is desirably about 0.1 to 12 hours.
反應E所使用之式(8)及式(9)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (8) and the formula (9) used in the reaction E can be produced by a known method, or a commercially available product can be used.
反應F
反應F係使用式(10)之化合物或式(11)之化合物,將A4
之RA
為X之式(1-4)之化合物變換成A5
之RA
為特定之RA2
之式(1-5)之化合物之方法。Reaction F
Reacting a compound of formula F line (10) or of formula (11), the R A A 4 of the compound of formula (1-4) of the X into A R A 5 R A2 of a particular of the formula ( The method of the compound of 1-5).
式中,A4 為被X取代之苯基或被X取代之吡啶基,A5 為被RA2 取代之苯基或被RA2 取代之吡啶基,RA2 為烷基、鹵烷基、烯基、炔基、環狀基、氰基或-LA1 -YA ,LA1 為O、S、C(=O)、C(=O)O、C(=O)N(R1 )、N(R1 )、N(R1 )C(=O)O、SO、SO2 或SO2 N(R1 ),M為如鎂、鋅之金屬原子或其鹽,或硼酸或其酯之殘基,其他記號係如前述。Wherein, A 4 is a substituent of the phenyl group substituted by X or X-pyridyl, A 5 is substituted with the substituent of R A2 R A2 pyridyl or phenyl, R A2 is alkyl, haloalkyl, alkenyl, Alkyl group, alkynyl group, cyclic group, cyano group or -L A1 -Y A , L A1 is O, S, C(=O), C(=O)O, C(=O)N(R 1 ), N(R 1 ), N(R 1 )C(=O)O, SO, SO 2 or SO 2 N(R 1 ), M is a metal atom such as magnesium or zinc or a salt thereof, or boric acid or an ester thereof Residues, other symbols are as described above.
反應F通常可藉由將式(1-4)之化合物,於過渡金屬觸媒、溶媒及惰性氣體的存在下,如有必要添加鹼,與式(10)之化合物或式(11)之化合物進行反應來進行。The reaction F can be usually carried out by using a compound of the formula (1-4) in the presence of a transition metal catalyst, a solvent and an inert gas, if necessary, adding a base, a compound of the formula (10) or a compound of the formula (11). The reaction is carried out.
作為式(10)之化合物或式(11)之化合物,若能進行反應則並未特別限定,可依公知之方法調製,或可使用市售品。式(10)之化合物或式(11)之化合物相對於式(1-4)之化合物1當量,可使用1~10當量,期望為1~5當量。The compound of the formula (10) or the compound of the formula (11) is not particularly limited as long as it can be reacted, and it can be prepared by a known method, or a commercially available product can be used. The compound of the formula (10) or the compound of the formula (11) may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (1-4).
作為過渡金屬觸媒,可列舉包含鈀、銅、銠、釕、鎳、鈷、鉬等之過渡金屬的觸媒。作為過渡金屬觸媒,可使用有機鹵素化物之交叉偶合反應所使用之公知的各種構造者,於本反應包含鈀之過渡金屬觸媒特別有用。作為包含鈀之過渡金屬觸媒,例如可列舉鈀-碳、氯化鈀、乙酸鈀、二氯雙(乙腈)鈀、雙(二苯亞基(Dibenzylidene)丙酮)鈀、二氯雙(三苯基膦)鈀、肆(三苯基膦)鈀、二氯雙(1,4-雙(二苯基膦基)丁烷)鈀等。又,如有必要可將第3級膦或第3級亞磷酸酯作為配位子使用。作為第3級膦或第3級亞磷酸酯,可列舉三苯基膦、苯基二甲基膦、三-o-甲苯基膦、三-p-甲苯基膦、1,2-雙(二苯基膦基)乙烷、1,3-雙(二苯基膦基)丙烷、1,4-雙(二苯基膦基)丁烷、1,1’-雙(二苯基膦基)二茂鐵、三苯基亞磷酸酯等。過渡金屬觸媒相對於式(1-4)之化合物1當量,可使用0.001~0.5當量,期望為0.05~0.2當量。又,配位子相對於過渡金屬觸媒1當量,通常可使用1~50當量,期望為1~10當量。惟,因反應條件亦可使用此範圍外的量。Examples of the transition metal catalyst include a catalyst containing a transition metal such as palladium, copper, rhodium, ruthenium, nickel, cobalt, or molybdenum. As the transition metal catalyst, various known structures used for the cross-coupling reaction of the organohalide can be used, and a transition metal catalyst containing palladium in the present reaction is particularly useful. Examples of the transition metal catalyst containing palladium include palladium-carbon, palladium chloride, palladium acetate, dichlorobis(acetonitrile)palladium, bis(dibenzylideneacetone)palladium, and dichlorobis(triphenyl). Palladium, ruthenium (triphenylphosphine) palladium, dichlorobis(1,4-bis(diphenylphosphino)butane)palladium, and the like. Further, a third-stage phosphine or a third-order phosphite may be used as a ligand if necessary. As the third-stage phosphine or the third-order phosphite, triphenylphosphine, phenyldimethylphosphine, tri-o-tolylphosphine, tri-p-tolylphosphine, 1,2-bis (two) Phenylphosphino)ethane, 1,3-bis(diphenylphosphino)propane, 1,4-bis(diphenylphosphino)butane, 1,1'-bis(diphenylphosphino) Ferrocene, triphenyl phosphite, and the like. The transition metal catalyst may be used in an amount of from 0.001 to 0.5 equivalents, preferably from 0.05 to 0.2 equivalents, per equivalent of the compound of the formula (1-4). Further, the ligand is usually used in an amount of from 1 to 50 equivalents, preferably from 1 to 10 equivalents, per equivalent of the transition metal catalyst. However, amounts outside this range may also be used depending on the reaction conditions.
作為鹼,例如可列舉如碳酸鈉、碳酸鉀、碳酸銫之鹼金屬碳酸鹽;如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸氫鈉之鹼金屬的碳酸氫鹽;如碳酸鈣之鹼土類金屬的碳酸鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如三乙基胺、二異丙基乙基胺、吡啶、4-(N,N-二甲基胺基)吡啶、咪唑之有機胺類等。鹼相對於式(1-4)之化合物1當量,可使用1~20當量,期望為1~10當量。As the base, for example, an alkali metal carbonate such as sodium carbonate, potassium carbonate or cesium carbonate; an alkali metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butylate; a hydrogencarbonate such as an alkali metal of sodium hydrogencarbonate; a salt; a carbonate of an alkaline earth metal such as calcium carbonate; a metal hydroxide such as sodium hydroxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; such as triethylamine, diisopropylethyl An amine, pyridine, 4-(N,N-dimethylamino)pyridine, an organic amine of imidazole, and the like. The base may be used in an amount of from 1 to 20 equivalents, preferably from 1 to 10 equivalents, per equivalent of the compound of the formula (1-4).
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶之極性非質子性溶媒;如乙腈、丙腈、丙烯腈之腈類;如丙酮、甲基乙基酮之酮類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;水等中適當選擇1種或2種以上。The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methyl acetate, acetic acid Ester of ethyl ester; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, polar aprotic solvent; a nitrile of acetonitrile, propionitrile or acrylonitrile; a ketone such as acetone or methyl ethyl ketone; an alcohol such as methanol, ethanol, propanol or tert-butanol; and one or more selected from water and the like. .
惰性氣體例如可使用氮氣體、氬氣體等。As the inert gas, for example, a nitrogen gas, an argon gas or the like can be used.
反應溫度通常為-100~200℃,期望為-78~100℃,反應時間通常為0.5~96小時左右,期望為1~48小時左右。The reaction temperature is usually -100 to 200 ° C, desirably -78 to 100 ° C, and the reaction time is usually about 0.5 to 96 hours, and is desirably about 1 to 48 hours.
反應G
反應G係藉由式(1-6)之化合物與(鹵)烷基化劑、醯化劑或烷氧基羰基化劑的反應,光延反應或還原的烷基化反應,得到式(1-7)之化合物之方法。Reaction G
The reaction G is obtained by reacting a compound of the formula (1-6) with a (halo)alkylating agent, a oximation agent or an alkoxycarbonylating agent, or a alkylation reaction of a light-reacting reaction or a reduction to obtain a formula (1) 7) The method of the compound.
式中,B1 為被羥基或胺基取代之雜環基(該雜環基可進一步被RB’ 取代),B2 為被-LB1 -YB1 取代之雜環基(該雜環基可進一步被RB’ 取代),LB1 為O、OC(=O)、OC(=O)O、N(R3 )、N(R3 )C(=O)或N(R3 )C(=O)O,YB1 為可被Z4 取代之烷基、烯基或環烷基,其他記號係如前述。In the formula, B 1 is a heterocyclic group substituted with a hydroxyl group or an amine group (the heterocyclic group may be further substituted by RB ' ), and B 2 is a heterocyclic group substituted with -L B1 -Y B1 (the heterocyclic group) Can be further substituted by R B ' ), L B1 is O, OC(=O), OC(=O)O, N(R 3 ), N(R 3 )C(=O) or N(R 3 )C (=O)O, Y B1 is an alkyl group, an alkenyl group or a cycloalkyl group which may be substituted by Z 4 , and other symbols are as described above.
反應G當中,(鹵)烷基化劑、醯化劑或烷氧基羰基化劑的反應通常可於鹼及溶媒的存在下進行。(鹵)烷基化劑、醯化劑或烷氧基羰基化劑相對於式(1-6)之化合物1當量,可使用1~3當量,期望為1~2當量。
或反應G可依一般的光延反應(Mitsunobu reaction),或一般的還原的烷基化反應,於醛、還原劑、酸及溶媒的存在下進行。In the reaction G, the reaction of the (halo)alkylating agent, the deuterating agent or the alkoxycarbonylating agent can be carried out usually in the presence of a base and a solvent. The (halo)alkylating agent, the halogenating agent or the alkoxycarbonylating agent may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (1-6).
Alternatively, the reaction G can be carried out in the presence of an aldehyde, a reducing agent, an acid, and a solvent according to a general Mitsunobu reaction or a general reduction alkylation reaction.
作為鹼及溶媒,可使用於前述反應E所列舉者。
作為(鹵)烷基化劑,例如可列舉如碘化甲烷、溴化甲烷之鹵素化烷基;硫酸二甲酯等之硫酸二烷酯;三甲基矽烷基重氮甲烷;氯二氟甲烷、氯二氟乙酸鈉等。
作為醯化劑,可列舉醯基氯等之酸氯化物;乙酸酐等之酸酐等。
作為烷氧基羰基化劑,可列舉氯甲酸甲酯等之氯甲酸酯等。As the base and the solvent, those used in the above reaction E can be used.
Examples of the (halo)alkylating agent include halogenated alkyl groups such as methyl iodide and methane bromide; dialkyl sulfates such as dimethyl sulfate; trimethylsulfonyl diazomethane; and chlorodifluoromethane. , sodium chlorodifluoroacetate, and the like.
Examples of the halogenating agent include acid chlorides such as mercapto chloride; acid anhydrides such as acetic anhydride; and the like.
Examples of the alkoxycarbonylating agent include chloroformate such as methyl chloroformate.
反應溫度通常為-30~100℃,期望為0~50℃,反應時間通常為0.1~24小時左右,期望為0.1~12小時左右。The reaction temperature is usually -30 to 100 ° C, desirably 0 to 50 ° C, and the reaction time is usually about 0.1 to 24 hours, and is desirably about 0.1 to 12 hours.
光延反應可依前述反應E進行。The smoothing reaction can be carried out in accordance with the aforementioned reaction E.
作為在還原的烷基化反應之醛,例如可使用甲醛、乙醛等。醛相對於式(1-6)之化合物1當量,可使用1~10當量,期望為1~5當量。
作為還原劑,例如可從氰基氫化硼鈉、氫化三乙醯氧基硼鈉等中適當選擇1種或2種以上。還原劑相對於式(1-6)之化合物1當量,可使用1~5當量,期望為1~2當量。
作為酸,例如可使用乙酸等。酸相對於式(1-6)之化合物1當量,可使用1~30當量,期望為1~10當量。
作為溶媒,若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如乙腈、丙腈之腈類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;水等中適當選擇1種或2種以上。
反應溫度通常為0~80℃,期望為0~50℃,反應時間通常為0.1~48小時左右,期望為0.5~24小時左右。As the aldehyde in the reduction alkylation reaction, for example, formaldehyde, acetaldehyde or the like can be used. The aldehyde may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (1-6).
As the reducing agent, for example, one type or two or more types may be appropriately selected from sodium cyanoborohydride, sodium triethoxy borohydride, and the like. The reducing agent may be used in an amount of from 1 to 5 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (1-6).
As the acid, for example, acetic acid or the like can be used. The acid may be used in an amount of from 1 to 30 equivalents, preferably from 1 to 10 equivalents, per equivalent of the compound of the formula (1-6).
As the solvent, any solvent may be used as a solvent inert to the reaction, for example, a nitrile such as acetonitrile or propionitrile; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane. For example, alcohols such as methanol, ethanol, propanol, and tert-butanol; and one or more selected from water and the like.
The reaction temperature is usually 0 to 80 ° C, desirably 0 to 50 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.5 to 24 hours.
反應H
反應H係藉由將式(1-8)之化合物與酸或氟化物進行反應,或藉由接觸還原,得到式(1-6)之化合物之方法。Reaction H
The reaction H is a method of obtaining a compound of the formula (1-6) by reacting a compound of the formula (1-8) with an acid or a fluoride or by contact reduction.
式中,B3 為被-LB2 -YB2 取代之雜環基(該雜環基可進一步被RB’ 取代),LB2 為O或N(R3 ),YB2 為烷基、三烷基矽烷基、烷氧基烷基、芳基烷基、烷氧基羰基或芳基烷氧基羰基,其他記號係如前述。Wherein B 3 is a heterocyclic group substituted by -L B2 -Y B2 (the heterocyclic group may be further substituted by RB ' ), L B2 is O or N(R 3 ), Y B2 is an alkyl group, three Alkylalkyl, alkoxyalkyl, arylalkyl, alkoxycarbonyl or arylalkoxycarbonyl, the other symbols are as described above.
反應H通常可將式(1-8)之化合物於溶媒的存在下,與酸或氟化物進行反應來進行。或依一般的接觸還原,於氫環境下,可藉由將鉑、氧化鉑、鉑黑、雷尼鎳、鈀、鈀碳、銠、銠-氧化鋁等作為觸媒使用來進行。The reaction H can usually be carried out by reacting a compound of the formula (1-8) in the presence of a solvent with an acid or a fluoride. Or, it can be carried out by a general contact reduction in a hydrogen atmosphere by using platinum, platinum oxide, platinum black, Raney nickel, palladium, palladium carbon, rhodium, ruthenium-alumina or the like as a catalyst.
作為溶媒,若能進行反應則並未特別限定,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如己烷、庚烷、石油醚、石油醚、環己烷之脂肪族烴類;如氯仿、二氯甲烷、四氯化碳、1,2-二氯乙烷之鹵素化烴類;如二乙基醚、四氫呋喃、二噁烷等之醚類、乙酸甲酯、乙酸乙酯之酯類;如甲醇、乙醇、丙醇、tert-丁醇之醇類、水及此等之混合溶媒等中適當選擇1種或2種以上。
作為酸,若能進行反應則並未特別限定,可列舉如三溴化硼之路易斯酸;鹽酸、三氟乙酸等之布氏酸(Bronsted acid)等。酸相對於式(1-8)之化合物1當量,可比1~10當量,期望為1~3當量的比例使用。
作為氟化物,若能進行反應則並未特別限定,可列舉氟化四-n-丁基銨、氟化銫等。氟化物相對於式(1-8)之化合物1當量,可以1~10當量,期望為1~3當量的比例使用。The solvent is not particularly limited as long as it can be reacted, for example, aromatic hydrocarbons such as benzene, toluene, xylene, and chlorobenzene; fats such as hexane, heptane, petroleum ether, petroleum ether, and cyclohexane. a hydrocarbon; a halogenated hydrocarbon such as chloroform, dichloromethane, carbon tetrachloride or 1,2-dichloroethane; an ether such as diethyl ether, tetrahydrofuran or dioxane; methyl acetate, An ester of ethyl acetate; one or two or more selected from the group consisting of methanol, ethanol, propanol, tert-butanol alcohol, water, and the like.
The acid is not particularly limited as long as it can be reacted, and examples thereof include a Lewis acid such as boron tribromide; a Bronsted acid such as hydrochloric acid or trifluoroacetic acid; and the like. The acid is used in an amount of from 1 to 10 equivalents, preferably from 1 to 3 equivalents, per equivalent of the compound of the formula (1-8).
The fluoride is not particularly limited as long as it can be reacted, and examples thereof include tetra-n-butylammonium fluoride and cesium fluoride. The fluoride may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 3 equivalents, per equivalent of the compound of the formula (1-8).
反應溫度通常為-30~200℃,期望為0~100℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。The reaction temperature is usually -30 to 200 ° C, desirably 0 to 100 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
反應I
反應I係藉由將A6
之RA
為胺基之式(1-9)之化合物與(鹵)烷基化劑或醯化劑的反應,或還原的烷基化反應,變換成RA
為-LA2
-YA1
之式(1-10)之化合物的方法。Reaction I
Alkylation reaction system I R A A 6 by the reaction of a compound of an alkylating agent or acylation agent, (halo) formula (1-9) of the group is, or reduced, converted into R A A method of a compound of the formula (1-10) of -L A2 -Y A1 .
式中,A6 為被胺基取代之苯基或被胺基取代之吡啶基,A7 為被-LA2 -YA1 取代之苯基或被-LA2 -YA1 取代之吡啶基,LA2 為N(R1 )、N(R1 )C(=O)或N(R1 )C(=O)O,其他記號係如前述。In the formula, A 6 is a phenyl group substituted by an amine group or a pyridyl group substituted by an amine group, and A 7 is a phenyl group substituted by -L A2 -Y A1 or a pyridyl group substituted by -L A2 -Y A1 , L A2 is N(R 1 ), N(R 1 )C(=O) or N(R 1 )C(=O)O, and other symbols are as described above.
反應I當中,(鹵)烷基化劑或醯化劑的反應通常可於鹼及溶媒的存在下進行。又,在反應I之還原的烷基化反應,依一般的還原的烷基化反應,可於醛、還原劑、酸及溶媒的存在下進行。In Reaction I, the reaction of a (halo)alkylating agent or a halogenating agent can be carried out usually in the presence of a base and a solvent. Further, the alkylation reaction of the reduction in the reaction I can be carried out in the presence of an aldehyde, a reducing agent, an acid and a solvent in accordance with a general reduction alkylation reaction.
在反應I,(鹵)烷基化劑或醯化劑的反應及還原的烷基化反應,分別可依前述反應G進行。In the reaction I, the reaction of the (halo)alkylating agent or the deuterating agent and the alkylation reaction of the reduction can be carried out according to the above reaction G, respectively.
反應J
反應J係將式(1-11)之化合物變換成式(1-12)之化合物之方法。Reaction J
Reaction J is a method of converting a compound of the formula (1-11) into a compound of the formula (1-12).
式中,A8 為被與相鄰之碳原子鍵結的2個羥基取代之苯基,A9 為可被Z1 取代之苯并二氧環戊基,其他記號係如前述。In the formula, A 8 is a phenyl group substituted with two hydroxyl groups bonded to an adjacent carbon atom, and A 9 is a benzodioxocyclopentyl group which may be substituted by Z 1 , and other symbols are as described above.
反應J通常可於酮、醛或原酸酯、與酸或脫水劑及溶媒的存在下進行。酮、醛或原酸酯相對於式(1-11)之化合物1當量,可使用1~50當量,期望為1~5當量。
或反應J可於1,1-二溴乙烷或二溴二氟甲烷、鹼及溶媒的存在下進行。1,1-二溴乙烷及二溴二氟甲烷相對於式(1-11)之化合物1當量,可使用1~10當量,期望為1~2當量。The reaction J can usually be carried out in the presence of a ketone, an aldehyde or an orthoester, with an acid or a dehydrating agent and a solvent. The ketone, aldehyde or orthoester may be used in an amount of from 1 to 50 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (1-11).
Or the reaction J can be carried out in the presence of 1,1-dibromoethane or dibromodifluoromethane, a base and a solvent. 1,1-Dibromoethane and dibromodifluoromethane may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (1-11).
作為酮、醛或原酸酯,雖可因應所期望之Z1
適當選擇,但例如可列舉如丙酮、甲基乙基酮、環戊酮之酮;如乙醛、異丁基醛之醛;如原甲酸乙酯、原乙酸乙酯之原酸酯。
作為酸,例如可列舉鹽酸、硫酸、對甲苯磺酸等。作為脫水劑,例如可列舉五氧化二磷等。作為鹼,例如可列舉如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如碳酸鈉、碳酸鉀、碳酸銫之碳酸鹽等。酸相對於式(1-11)之化合物1當量,可使用0.01~5當量,期望為0.05~1當量。脫水劑或鹼相對於式(1-11)之化合物1當量,可使用1~10當量,期望為1~2當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;如乙腈、丙腈、丙烯腈之腈類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮之極性非質子性溶媒等中適當選擇1種或2種以上。The ketone, the aldehyde or the orthoester may be appropriately selected depending on the desired Z 1 , and examples thereof include a ketone such as acetone, methyl ethyl ketone or cyclopentanone; an aldehyde such as acetaldehyde or isobutyl aldehyde; Such as ethyl orthoformate, the original acid ester of ethyl acetate.
Examples of the acid include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, and the like. Examples of the dehydrating agent include phosphorus pentaoxide and the like. The base may, for example, be a metal hydroxide such as sodium hydroxide or potassium hydroxide; or a carbonate such as sodium carbonate, potassium carbonate or cesium carbonate. The acid may be used in an amount of 0.01 to 5 equivalents, preferably 0.05 to 1 equivalent, per equivalent of the compound of the formula (1-11). The dehydrating agent or base may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (1-11).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, An aliphatic hydrocarbon of dichloroethane, trichloroethane, hexane or cyclohexane; an alcohol such as methanol, ethanol, propanol or tert-butanol; a nitrile such as acetonitrile, propionitrile or acrylonitrile; One or more selected from the group consisting of a polar aprotic solvent such as dimethyl sulfoxide, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide or N-methylpyrrolidone .
反應溫度通常為0~150℃,期望為20~100℃,反應時間通常為0.1~48小時左右,期望為1~24小時左右。The reaction temperature is usually 0 to 150 ° C, desirably 20 to 100 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 1 to 24 hours.
反應K
反應K係將式(1-13)之化合物變換成式(1-14)之化合物之方法。Reaction K
Reaction K is a method of converting a compound of the formula (1-13) into a compound of the formula (1-14).
式中,A10 為被烯基或炔基取代之苯基或被烯基或炔基取代之吡啶基,A11 為被烷基取代之苯基或被烷基取代之吡啶基,其他記號係如前述。In the formula, A 10 is a phenyl group substituted by an alkenyl group or an alkynyl group or a pyridyl group substituted by an alkenyl group or an alkynyl group, and A 11 is a phenyl group substituted by an alkyl group or a pyridyl group substituted by an alkyl group, and other symbols are As mentioned above.
反應K可依一般的接觸還原,於氫環境下,藉由將鉑、氧化鉑、鉑黑、雷尼鎳、鈀、鈀碳、銠、銠-氧化鋁等作為觸媒使用來進行。The reaction K can be carried out by a general contact reduction, and is carried out by using platinum, platinum oxide, platinum black, Raney nickel, palladium, palladium carbon, rhodium, ruthenium-alumina or the like as a catalyst in a hydrogen atmosphere.
反應K可依前述反應H所記載之接觸還原進行。The reaction K can be carried out by contact reduction described in the above reaction H.
雖將反應A~K所使用之化合物的製造方法記載於以下,但並非被限定於此等之方法者,此等之化合物可依公知之方法製造,或可使用市售品。The method for producing the compound used in the reactions A to K is described below, but is not limited thereto. These compounds can be produced by a known method, or a commercially available product can be used.
反應1-1
反應1-1係將式(100)之化合物與式(4)之化合物進行反應,得到式(2)之化合物之方法。進而,藉由水解與式(2)之化合物一同得到之式(101)之化合物,可得到式(2)之化合物。Reaction 1-1
Reaction 1-1 is a method of reacting a compound of the formula (100) with a compound of the formula (4) to give a compound of the formula (2). Further, a compound of the formula (2) can be obtained by hydrolyzing a compound of the formula (101) which is obtained together with the compound of the formula (2).
式中之記號係如前述。The symbols in the formula are as described above.
在反應1-1,式(100)之化合物與式(4)之化合物的反應通常可於鹼及溶媒的存在下進行,或如有必要可於脫水縮合劑的存在下進行。
作為鹼、溶媒及脫水縮合劑,可使用於前述反應B所列舉者。式(4)之化合物相對於式(100)之化合物1當量,可使用1~3當量,期望為1~2當量。鹼相對於式(100)之化合物1當量,可使用1~3當量,期望為1~2當量。In Reaction 1-1, the reaction of the compound of the formula (100) with the compound of the formula (4) can be carried out usually in the presence of a base and a solvent, or, if necessary, in the presence of a dehydrating condensing agent.
The base, the solvent, and the dehydrating condensing agent can be used in the above-mentioned reaction B. The compound of the formula (4) can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (100). The base may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (100).
反應溫度通常為0~100℃,期望為0~50℃,反應時間通常為0.5~48小時左右,期望為1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 0 to 50 ° C, and the reaction time is usually about 0.5 to 48 hours, and is desirably about 1 to 24 hours.
在反應1-1,可藉由水解與式(2)之化合物一同得到之式(101)之化合物,對式(2)之化合物導入。
水解可依一般的水解的反應條件進行,通常可於酸或鹼及溶媒的存在下進行。In the reaction 1-1, the compound of the formula (2) can be introduced by hydrolyzing the compound of the formula (101) which is obtained together with the compound of the formula (2).
The hydrolysis can be carried out under the usual hydrolysis reaction conditions, usually in the presence of an acid or a base and a solvent.
作為酸,例如可列舉鹽酸、硫酸等。作為鹼,例如可列舉如氫氧化鈉、氫氧化鉀之金屬氫氧化物等。酸或鹼相對於式(100)之化合物1當量,可使用1~10當量,期望為1~5當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如甲醇、乙醇、丙醇、tert-丁醇之醇類;如乙腈、丙腈、丙烯腈之腈類;如丙酮、甲基乙基酮之酮類;水等中適當選擇1種或2種以上。Examples of the acid include hydrochloric acid, sulfuric acid, and the like. Examples of the base include metal hydroxides such as sodium hydroxide and potassium hydroxide. The acid or base may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (100).
If the solvent is a solvent inert to the reaction, any solvent may be used, for example, an alcohol such as methanol, ethanol, propanol or tert-butanol; a nitrile such as acetonitrile, propionitrile or acrylonitrile; for example, acetone, A A ketone of a ketone group; one or two or more types are appropriately selected from water and the like.
水解之反應溫度通常為0~100℃,期望為20~80℃,反應時間通常為0.1~12小時左右,期望為0.1~1小時左右。The reaction temperature for the hydrolysis is usually from 0 to 100 ° C, desirably from 20 to 80 ° C, and the reaction time is usually from about 0.1 to 12 hours, preferably from about 0.1 to about 1 hour.
反應1-1所使用之式(100)之化合物可依以下之反應1-4或反應1-5製造。式(4)之化合物可依以下之反應2-1或公知之方法製造,或可使用市售品。The compound of the formula (100) used in the reaction 1-1 can be produced by the following Reaction 1-4 or Reaction 1-5. The compound of the formula (4) can be produced by the following reaction 2-1 or a known method, or a commercially available product can be used.
反應1-2
反應1-2係藉由甲基化式(100)之化合物,得到式(3)之化合物之方法。Reaction 1-2
Reaction 1-2 is a method of obtaining a compound of the formula (3) by methylating a compound of the formula (100).
式中之記號係如前述。The symbols in the formula are as described above.
反應1-2可依前述反應A進行。The reaction 1-2 can be carried out in accordance with the aforementioned reaction A.
反應1-3
反應1-3係將式(5)之化合物與O-甲基羥基胺鹽酸鹽進行反應,得到式(3)之化合物之方法。Reaction 1-3
Reaction 1-3 is a method of reacting a compound of the formula (5) with O-methylhydroxylamine hydrochloride to obtain a compound of the formula (3).
式中之記號係如前述。The symbols in the formula are as described above.
反應1-3可依照反應C進行。O-甲基羥基胺鹽酸鹽相對於式(5)之化合物1當量,可使用1~3當量,期望為1~2當量。The reaction 1-3 can be carried out in accordance with the reaction C. The O-methylhydroxylamine hydrochloride can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (5).
反應1-4
反應1-4係還原式(102)之化合物,得到式(100)之化合物之方法。Reaction 1-4
Reaction 1-4 is a method of reducing a compound of the formula (102) to give a compound of the formula (100).
式中之記號係如前述。The symbols in the formula are as described above.
作為還原反應,例如可於氫環境下藉由將氧化鉑、雷尼鎳、鈀-碳、銠等作為觸媒之接觸還原;於由如鐵、鋅之金屬、與如鹽酸、乙酸、氯化銨之酸所構成之反應系的還原來進行。As a reduction reaction, for example, it can be reduced by contact with platinum oxide, Raney nickel, palladium-carbon, ruthenium or the like as a catalyst in a hydrogen atmosphere; in a metal such as iron, zinc, and, for example, hydrochloric acid, acetic acid, chlorination The reduction of the reaction system composed of the ammonium acid is carried out.
反應1-4通常可於溶媒的存在下進行。溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯之芳香族烴類;如己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;如丙酮、甲基乙基酮之酮類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;水等中適當選擇1種或2種以上。Reactions 1-4 can generally be carried out in the presence of a solvent. The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene or xylene; an aliphatic hydrocarbon such as hexane or cyclohexane; such as dioxane or tetrahydrofuran. Ether of diethyl ether or dimethoxyethane; such as esters of methyl acetate and ethyl acetate; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N- a polar aprotic solvent of dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile or propionitrile; ketones such as acetone and methyl ethyl ketone; such as methanol, ethanol, propanol, tert-butanol One or two or more kinds of alcohols are appropriately selected from water and the like.
反應溫度通常為0~150℃,期望為0~80℃,反應時間通常為0.5~96小時左右,期望為0.5~48小時左右。The reaction temperature is usually 0 to 150 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.5 to 96 hours, and is desirably about 0.5 to 48 hours.
前述反應1-4所使用之式(102)之化合物可依以下之反應1-6或反應1-8製造。The compound of the formula (102) used in the above Reaction 1-4 can be produced by the following Reaction 1-6 or Reaction 1-8.
反應1-5
反應1-5係將式(5)之化合物與羥基胺鹽酸鹽進行反應,得到式(100)之化合物之方法。Reaction 1-5
Reaction 1-5 is a method of reacting a compound of the formula (5) with a hydroxylamine hydrochloride to obtain a compound of the formula (100).
式中之記號係如前述。The symbols in the formula are as described above.
反應1-5可依照反應C進行。羥基胺鹽酸鹽相對於式(5)之化合物1當量,可使用1~3當量,期望為1~2當量。The reaction 1-5 can be carried out in accordance with the reaction C. The hydroxylamine hydrochloride can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (5).
反應溫度通常為0~100℃,期望為20~80℃,反應時間通常為0.1~48小時左右,期望為1~24小時左右。The reaction temperature is usually from 0 to 100 ° C, desirably from 20 to 80 ° C, and the reaction time is usually from about 0.1 to 48 hours, and is desirably from about 1 to 24 hours.
反應1-6
反應1-6係氧化式(103)之化合物,得到式(102)之化合物之方法。Reaction 1-6
The reaction of 1-6 is a method of oxidizing a compound of the formula (103) to give a compound of the formula (102).
式中之記號係如前述。The symbols in the formula are as described above.
作為氧化反應,例如可列舉於由鉻酸與硫酸、吡啶、吡啶鎓鹽所構成之反應系的氧化;於由二甲基亞碸與草醯氯所構成之反應系的氧化;於由過釕酸四丙基銨與如N-甲基嗎啉-N-氧化物之共氧化劑所構成之反應系的氧化;藉由戴斯-馬丁氧化劑(Dess-Martin Periodinane)之氧化;藉由二氧化錳之氧化等。Examples of the oxidation reaction include oxidation of a reaction system composed of chromic acid, sulfuric acid, pyridine, and pyridinium salts; oxidation of a reaction system composed of dimethyl sulfoxide and chlorophyll chloride; Oxidation of a reaction system consisting of tetrapropylammonium acid with a co-oxidant such as N-methylmorpholine-N-oxide; oxidation by Dess-Martin Periodinane; by manganese dioxide Oxidation and the like.
反應1-6通常可於溶媒的存在下進行。溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯之芳香族烴類;如四氯化碳、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;如丙酮、甲基乙基酮之酮類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;水等中適當選擇1種或2種以上。Reactions 1-6 can generally be carried out in the presence of a solvent. The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene or xylene; for example, carbon tetrachloride, chloroform, dichloromethane, dichloroethane, trichloro An aliphatic hydrocarbon of ethane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; an ester such as methyl acetate or ethyl acetate; a polar aprotic solvent such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N,N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile or propionitrile; A ketone of methyl ethyl ketone; an alcohol such as methanol, ethanol, propanol or tert-butanol; and one or more selected from water and the like.
反應溫度通常為-78~150℃,期望為-50~80℃,反應時間通常為0.5~96小時左右,期望為0.5~48小時左右。The reaction temperature is usually -78 to 150 ° C, desirably -50 to 80 ° C, and the reaction time is usually about 0.5 to 96 hours, and is desirably about 0.5 to 48 hours.
反應1-6所使用之式(103)之化合物可依以下之反應1-7製造。The compound of the formula (103) used in the reaction 1-6 can be produced by the following reaction 1-7.
反應1-7
反應1-7係將式(104)之化合物與2-硝基丙烷進行反應,得到式(103)之化合物之方法。Reaction 1-7
Reaction 1-7 is a method of reacting a compound of the formula (104) with 2-nitropropane to give a compound of the formula (103).
式中之記號係如前述。The symbols in the formula are as described above.
反應1-7可依一般的硝基醇醛反應進行,通常可於鹼的存在下,如有必要可於溶媒的存在下進行。2-硝基丙烷相對於式(104)之化合物1當量,可使用1~30當量,期望為1~10當量。The reaction 1-7 can be carried out according to a general nitroalcohol reaction, usually in the presence of a base, if necessary in the presence of a solvent. The 2-nitropropane may be used in an amount of from 1 to 30 equivalents, preferably from 1 to 10 equivalents, per equivalent of the compound of the formula (104).
作為鹼,例如可從如鈉、鉀之鹼金屬;如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類;如1,8-二氮雜雙環[5.4.0]十一-7-烯之脒類;如四甲基胍、1,5,7-三氮雜雙環[4.4.0]癸-5-烯之胍類等中適當選擇1種或2種以上。鹼相對於式(104)之化合物1當量,可使用0.1~2當量,期望為0.1~1當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如甲醇、乙醇、丙醇、tert-丁醇之醇類;如乙腈、丙腈、丙烯腈之腈類;如丙酮、甲基乙基酮之酮類;如四氯化碳、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶之極性非質子性溶媒;水等中適當選擇1種或2種以上。As the base, for example, an alkali metal such as sodium or potassium; an alkali metal alkoxide such as sodium methoxide, sodium ethoxide or potassium butoxide; a carbonate such as sodium carbonate or potassium carbonate; such as sodium hydrogencarbonate or hydrogen carbonate; a hydrogen carbonate of potassium; a metal hydroxide such as sodium hydroxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; such as monomethylamine, dimethylamine, triethylamine, diisopropyl Amines of ethyl ethylamine; such as 1,8-diazabicyclo[5.4.0]undec-7-ene; such as tetramethylguanidine, 1,5,7-triazabicyclo[4.4 .0] One or two or more kinds of hydrazine-5-ene are appropriately selected. The base may be used in an amount of 0.1 to 2 equivalents, preferably 0.1 to 1 equivalent, per equivalent of the compound of the formula (104).
If the solvent is a solvent inert to the reaction, any solvent may be used, for example, an alcohol such as methanol, ethanol, propanol or tert-butanol; a nitrile such as acetonitrile, propionitrile or acrylonitrile; for example, acetone, A a ketone of ketoethyl ketone; an aliphatic hydrocarbon such as carbon tetrachloride, chloroform, dichloromethane, dichloroethane, trichloroethane, hexane or cyclohexane; such as dioxane, tetrahydrofuran, An ether of ethyl ether or dimethoxyethane; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine The polar aprotic solvent; one or two or more kinds are appropriately selected from water and the like.
反應溫度通常為0~100℃,期望為20~50℃,反應時間通常為0.1~168小時左右,期望為1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 20 to 50 ° C, and the reaction time is usually about 0.1 to 168 hours, and is desirably about 1 to 24 hours.
反應1-7所使用之式(104)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (104) used in the reaction 1-7 can be produced by a known method, or a commercially available product can be used.
反應1-8
反應1-8係硝基化式(5)之化合物,得到式(102)之化合物之方法。Reaction 1-8
The reaction 1-8 is a method of nitrating a compound of the formula (5) to give a compound of the formula (102).
式中之記號係如前述。The symbols in the formula are as described above.
反應1-8通常可於硝基化劑及溶媒的存在下進行。Reactions 1-8 can generally be carried out in the presence of a nitrating agent and a solvent.
作為硝基化劑,例如可從亞硝酸鈉、亞硝酸鉀等中適當選擇1種或2種以上。硝基化劑相對於式(5)之化合物1當量,可使用1~2當量,期望為1~1.5當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;如丙酮、甲基乙基酮之酮類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;水等中適當選擇1種或2種以上。As the nitrating agent, for example, one type or two or more types may be appropriately selected from sodium nitrite and potassium nitrite. The nitrating agent may be used in an amount of from 1 to 2 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (5).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, chloroform, dichloromethane, dichloroethane An aliphatic hydrocarbon such as trichloroethane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; an ester such as methyl acetate or ethyl acetate a polar aprotic solvent such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile or propionitrile; For example, a ketone of acetone or methyl ethyl ketone; an alcohol such as methanol, ethanol, propanol or tert-butanol; and one or more selected from water and the like.
反應溫度通常為0~150℃,期望為20~50℃,反應時間通常為0.1~96小時左右,期望為0.5~24小時左右。The reaction temperature is usually 0 to 150 ° C, desirably 20 to 50 ° C, and the reaction time is usually about 0.1 to 96 hours, and is desirably about 0.5 to 24 hours.
反應1-9
反應1-9係鹵素化式(105)之化合物,得到式(5)之化合物之方法。Reaction 1-9
Reaction 1-9 is a method of halogenating a compound of formula (105) to give a compound of formula (5).
式中之記號係如前述。The symbols in the formula are as described above.
反應1-9可於鹵素化劑(例如氯化劑、溴化劑或碘化劑)及溶媒的存在下,如有必要可於鹼的存在下進行。鹵素化劑相對於式(105)之化合物1當量,可使用1~2當量,期望為1~1.5當量。The reaction 1-9 can be carried out in the presence of a base in the presence of a halogenating agent (for example, a chlorinating agent, a brominating agent or an iodinating agent) and a solvent. The halogenating agent may be used in an amount of from 1 to 2 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (105).
作為氯化劑,例如可從氯、N-氯琥珀醯亞胺等中適當選擇1種或2種以上,作為溴化劑,例如可從溴、N-溴琥珀酸醯亞胺、三甲基苯基三溴化銨等中適當選擇1種或2種以上,作為碘化劑,例如可從碘、N-碘琥珀醯亞胺等中適當選擇1種或2種以上。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如乙酸甲酯、乙酸乙酯之酯類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶之極性非質子性溶媒;如乙酸、丙酸之有機酸;水等中適當選擇1種或2種以上。
作為鹼,例如可列舉鋰二異丙基醯胺等。鹼相對於式(105)之化合物,可使用1~2當量,期望為1~1.2當量。
於鹼的存在下進行時,通常溶媒可從如四氫呋喃、二乙基醚之醚類中適當選擇1種或2種以上。
反應1-9如有必要可將如乙酸、丙酸之有機酸或如氯化鋁之路易斯酸作為觸媒使用。又,可藉由過剩使用作為觸媒之有機酸,兼作溶媒。As the chlorinating agent, for example, one or two or more kinds of chlorine, N-chlorosuccinimide, and the like can be appropriately selected, and as the brominating agent, for example, bromine, sulfonium imine bromide, or trimethyl group can be used. One or two or more kinds are appropriately selected from the group consisting of phenyl tribromide and the like. The iodinating agent can be appropriately selected from the group consisting of iodine and N-iodosuccinimide, for example, one or two or more.
If the solvent is a solvent inert to the reaction, any solvent may be used, for example, from carbon tetrachloride, methyl chloride, chloroform, dichloromethane, dichloroethane, trichloroethane, hexane, cyclohexane. Aliphatic hydrocarbons; such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane ethers; such as methyl acetate, ethyl acetate esters; such as dimethyl hydrazine, cyclobutyl hydrazine a polar aprotic solvent of dimethylacetamide, N,N-dimethylformamide, N-methylpyrrolidone or pyridine; an organic acid such as acetic acid or propionic acid; one of water or the like 2 or more types.
Examples of the base include lithium diisopropyl decylamine and the like. The base may be used in an amount of from 1 to 2 equivalents, and desirably from 1 to 1.2 equivalents, based on the compound of the formula (105).
When it is carried out in the presence of a base, the solvent can be appropriately selected from one or two or more selected from the group consisting of ethers such as tetrahydrofuran and diethyl ether.
Reactions 1-9 If necessary, an organic acid such as acetic acid, propionic acid or a Lewis acid such as aluminum chloride can be used as a catalyst. Further, it is possible to use as an organic acid as a catalyst in excess, and also serve as a solvent.
反應溫度通常為-100~150℃,期望為-78~110℃,反應時間通常為0.1~48小時左右,期望為0.5~24小時左右。於鹼的存在下進行時,反應溫度通常為-100~0℃,期望為-78~-20℃,反應時間通常為0.1~12小時左右,期望為0.5~6小時左右,又,於酸的存在下進行時,反應溫度通常為0~150℃,期望為20~110℃,反應時間通常為0.1~48小時左右,期望為1~24小時左右。The reaction temperature is usually -100 to 150 ° C, desirably -78 to 110 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.5 to 24 hours. When it is carried out in the presence of a base, the reaction temperature is usually -100 to 0 ° C, desirably -78 to -20 ° C, the reaction time is usually about 0.1 to 12 hours, and it is desirably about 0.5 to 6 hours, and further, in the acid In the presence of the reaction, the reaction temperature is usually from 0 to 150 ° C, desirably from 20 to 110 ° C, and the reaction time is usually from about 0.1 to 48 hours, preferably from about 1 to 24 hours.
反應1-9所使用之式(105)之化合物可依以下之反應1-10~反應1-19製造。The compound of the formula (105) used in the reaction 1-9 can be produced by the following Reaction 1-10 to Reaction 1-19.
反應1-10
反應1-10係藉由式(106)之化合物及式(107)之化合物的佛瑞德-克來福特反應,得到式(105)之化合物之方法。Reaction 1-10
The reaction 1-10 is a method of obtaining a compound of the formula (105) by a Friedel-Crafts reaction of a compound of the formula (106) and a compound of the formula (107).
式中,A’係相當於A之環,其他記號係如前述。In the formula, A' corresponds to the ring of A, and other symbols are as described above.
反應1-10可依一般的佛瑞德-克來福特反應進行,通常可於酸及溶媒的存在下進行。式(107)之化合物相對於式(106)之化合物1當量,可使用1~3當量,期望為1~2當量。
作為酸,例如可從如鹽酸、硫酸之無機酸;如對甲苯磺酸、三氟甲烷磺酸之有機酸;如氯化鋁、氯化鐵、氯化鋅、乙醚合三氟化硼之路易斯酸等中適當選擇1種或2種以上。酸相對於式(106)之化合物,可使用0.1~3當量,期望為1~2當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如乙腈、丙腈、丙烯腈之腈類;如四氯化碳、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶之極性非質子性溶媒等中適當選擇1種或2種以上。The reaction 1-10 can be carried out according to the general Friedel-Crafts reaction, usually in the presence of an acid and a solvent. The compound of the formula (107) can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (106).
As the acid, for example, an inorganic acid such as hydrochloric acid or sulfuric acid; an organic acid such as p-toluenesulfonic acid or trifluoromethanesulfonic acid; or a Lewis such as aluminum chloride, iron chloride, zinc chloride or boron trifluoride etherate. One or two or more kinds are appropriately selected from the group consisting of acids and the like. The acid may be used in an amount of 0.1 to 3 equivalents, and desirably 1 to 2 equivalents based on the compound of the formula (106).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, a nitrile such as acetonitrile, propionitrile or acrylonitrile; for example, carbon tetrachloride, chloroform, dichloromethane, dichloroethane or trichloroethane. An aliphatic hydrocarbon of alkane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl One or two or more kinds are appropriately selected from the group consisting of acetamide, N,N-dimethylformamide, N-methylpyrrolidone, and a polar aprotic solvent of pyridine.
反應溫度通常為0~100℃,期望為0~80℃,反應時間通常為0.1~48小時左右,期望為1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 1 to 24 hours.
反應1-10所使用之式(106)及式(107)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (106) and the formula (107) used in the reaction 1-10 can be produced by a known method, or a commercially available product can be used.
反應1-11
反應1-11係包含氯化或醯胺化式(108)之化合物,得到式(109)之化合物之第1步驟,及將式(109)之化合物與式(110)之化合物進行反應,得到式(105)之化合物之第2步驟的方法。Reaction 1-11
Reaction 1-11 comprises the step of chlorinating or hydrazating a compound of formula (108) to give a compound of formula (109), and reacting a compound of formula (109) with a compound of formula (110) to give A method of the second step of the compound of formula (105).
式中,U為氯原子、二烷基胺基(例如二甲基胺基、二乙基胺基)或N-甲氧基-N-甲基胺基,其他記號係如前述。In the formula, U is a chlorine atom, a dialkylamino group (e.g., dimethylamino group, diethylamino group) or N-methoxy-N-methylamino group, and the other symbols are as described above.
第1步驟
第1步驟為氯化時,可於氯化劑及溶媒的存在下進行,為醯胺化時,可於二烷基胺(例如二甲基胺)或N-甲氧基-N-甲基胺、脫水縮合劑、鹼及溶媒的存在下進行。The first step of the first step is chlorination, which can be carried out in the presence of a chlorinating agent and a solvent. In the case of guanidation, it can be used in a dialkylamine (for example, dimethylamine) or N-methoxy-N. It is carried out in the presence of a methylamine, a dehydrating condensing agent, a base and a solvent.
作為氯化劑,例如可從亞硫醯氯、草醯氯、五氯化磷等中適當選擇1種或2種以上。氯化劑相對於式(108)之化合物1當量,可使用1~3當量,期望為1~2當量。
作為脫水縮合劑、鹼及溶媒,可使用於前述反應B所列舉者。脫水縮合劑相對於式(108)之化合物1當量,可使用1~3當量,期望為1~2當量。鹼相對於式(108)之化合物,可使用1~10當量,期望為1~5當量。As the chlorinating agent, for example, one type or two or more types may be appropriately selected from the group consisting of sulfinium chloride, grass chloroform, and phosphorus pentachloride. The chlorinating agent may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (108).
The dehydrating condensing agent, the base, and the solvent can be used in the above-mentioned reaction B. The dehydrating condensing agent may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (108). The base can be used in an amount of from 1 to 10 equivalents, and desirably from 1 to 5 equivalents, based on the compound of the formula (108).
反應溫度通常為0~100℃,期望為0~80℃,反應時間通常為0.1~48小時左右,期望為1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 1 to 24 hours.
第2步驟
第2步驟通常可於溶媒的存在下,如有必要可於惰性氣體的存在下進行。式(110)之化合物相對於式(108)或式(109)之化合物1當量,可使用1~3當量,期望為1~1.5當量。The second step, the second step, can usually be carried out in the presence of a solvent, if necessary in the presence of an inert gas. The compound of the formula (110) can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (108) or the formula (109).
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如二噁烷、四氫呋喃、二乙基醚之醚類等中適當選擇1種或2種以上。惰性氣體例如可從氮氣體、氬氣體等中適當選擇。The solvent may be any solvent if it is a solvent which is inert to the reaction. For example, one or two or more kinds may be appropriately selected from, for example, an ether such as dioxane, tetrahydrofuran or diethyl ether. The inert gas can be appropriately selected, for example, from a nitrogen gas, an argon gas or the like.
反應溫度通常為-20~100℃,期望為0~50℃,反應時間通常為1~48小時左右,期望為1~20小時左右。The reaction temperature is usually -20 to 100 ° C, desirably 0 to 50 ° C, and the reaction time is usually about 1 to 48 hours, and is desirably about 1 to 20 hours.
反應1-11所使用之式(108)及式(110)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (108) and the formula (110) used in the reaction 1-11 can be produced by a known method, or a commercially available product can be used.
反應1-12
反應1-12係將式(111)之化合物與式(110)之化合物進行反應,得到式(105)之化合物之方法。Reaction 1-12
Reaction 1-12 is a method of reacting a compound of the formula (111) with a compound of the formula (110) to give a compound of the formula (105).
式中之記號係如前述。The symbols in the formula are as described above.
反應1-12通常可於溶媒的存在下,如有必要可於觸媒及惰性氣體的存在下進行。式(110)之化合物相對於式(111)之化合物1當量,可使用1~3當量,期望為1~1.5當量。觸媒相對於式(111)之化合物1當量,可使用0.001~1當量,期望為0.01~0.5當量。The reaction 1-12 can be carried out usually in the presence of a solvent, if necessary in the presence of a catalyst and an inert gas. The compound of the formula (110) can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (111). The catalyst may be used in an amount of from 0.001 to 1 equivalent, and preferably from 0.01 to 0.5 equivalent, per equivalent of the compound of the formula (111).
作為觸媒,例如可列舉碘化銅(I)等。
溶媒及惰性氣體可使用於前述反應1-11之第2步驟所列舉者。Examples of the catalyst include copper iodide (I) and the like.
The solvent and inert gas can be used in the second step of the aforementioned Reactions 1-11.
反應溫度通常為-20~100℃,期望為0~50℃,反應時間通常為1~48小時左右,期望為1~20小時左右。The reaction temperature is usually -20 to 100 ° C, desirably 0 to 50 ° C, and the reaction time is usually about 1 to 48 hours, and is desirably about 1 to 20 hours.
反應1-12所使用之式(111)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (111) used in the reaction 1-12 can be produced by a known method, or a commercially available product can be used.
反應1-13
反應1-13係將式(112)之化合物與式(113)之化合物進行反應,得到式(105)之化合物之方法。Reaction 1-13
Reaction 1-13 is a method of reacting a compound of the formula (112) with a compound of the formula (113) to give a compound of the formula (105).
式中,V為溴原子或碘原子,G為脫離基(例如如氯原子、溴原子之鹵素;如甲氧基、環氧基之烷氧基;如二甲基胺基、二乙基胺基之二烷基胺基;可被N-甲氧基-N-甲基胺基或烷基取代之氮丙啶基等),其他記號係如前述。Wherein V is a bromine atom or an iodine atom, and G is a leaving group (for example, a halogen such as a chlorine atom or a bromine atom; an alkoxy group such as a methoxy group or an epoxy group; such as a dimethylamino group or a diethylamine; A dialkylamino group; an aziridine group which may be substituted with an N-methoxy-N-methylamino group or an alkyl group, and the other symbols are as described above.
反應1-13通常可於有機金屬試藥及溶媒的存在下,或可於金屬鎂、活性化劑及溶媒的存在下,如有必要可於惰性氣體的存在下進行。式(113)之化合物相對於式(112)之化合物1當量,可使用1~3當量,期望為1~1.5當量。
有機金屬試藥可從如甲基鋰、n-丁基鋰之有機鋰化合物;如異丙基氯化鎂之格氏化合物等中適當選擇1種或2種以上。有機金屬試藥相對於式(112)之化合物1當量,可使用1~2當量,期望為1~1.5當量。
金屬鎂相對於式(112)之化合物1當量,可使用1~3當量,期望為1~1.5當量。作為活性化劑,可列舉碘、1,2-二溴乙烷等。活性化劑相對於式(112)之化合物1當量,可使用0.01~1當量,期望為0.05~0.5當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚之醚類等中適當選擇1種或2種以上。
惰性氣體例如可從氮氣體、氬氣體等中適當選擇。The reaction 1-13 can be carried out usually in the presence of an organometallic reagent and a solvent, or in the presence of a magnesium metal, an activating agent and a solvent, if necessary in the presence of an inert gas. The compound of the formula (113) can be used in an amount of from 1 to 3 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (112).
The organometallic reagent can be appropriately selected from one or two or more selected from the group consisting of an organic lithium compound such as methyllithium or n-butyllithium; a grammatic compound such as isopropylmagnesium chloride. The organometallic reagent may be used in an amount of from 1 to 2 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (112).
The metal magnesium may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 1.5 equivalents, per equivalent of the compound of the formula (112). Examples of the activator include iodine and 1,2-dibromoethane. The activator may be used in an amount of 0.01 to 1 equivalent, and preferably 0.05 to 0.5 equivalent, based on 1 equivalent of the compound of the formula (112).
If the solvent is a solvent inert to the reaction, any solvent may be used, for example, an aliphatic hydrocarbon such as hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran or diethyl ether; Kind or more than two.
The inert gas can be appropriately selected, for example, from a nitrogen gas, an argon gas or the like.
反應溫度通常為-100~100℃,期望為-78~80℃,反應時間通常為1~48小時左右,期望為1~20小時左右。The reaction temperature is usually -100 to 100 ° C, desirably -78 to 80 ° C, and the reaction time is usually about 1 to 48 hours, and is desirably about 1 to 20 hours.
反應1-13所使用之式(112)及式(113)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (112) and the formula (113) used in the reaction 1-13 can be produced by a known method, or a commercially available product can be used.
反應1-14
反應1-14係包含使式(104)之化合物及式(110)之化合物進行反應,得到式(114)之化合物之第1步驟,以及氧化式(114)之化合物,得到式(105)之化合物之第2步驟的方法。Reaction 1-14
The reaction 1-14 comprises a first step of reacting a compound of the formula (104) with a compound of the formula (110) to obtain a compound of the formula (114), and a compound of the formula (114) to give a formula (105). The method of the second step of the compound.
式中之記號係如前述。The symbols in the formula are as described above.
第1步驟
第1步驟可依前述反應1-11之第2步驟進行。The first step of the first step can be carried out in accordance with the second step of the above reaction 1-11.
第2步驟
第2步驟可依前述反應1-6進行。The second step and the second step can be carried out in accordance with the above Reactions 1-6.
反應1-15
反應1-15係藉由A12
之RA
為-LA3
-YA2
之式(105-1)之化合物與(鹵)烷基化劑、醯化劑或烷氧基羰基化劑的反應、光延反應或還原的烷基化,變換成A13
之RA
為-LA4
-YA2
之式(105-2)之化合物的方法。Reaction 1-15
Reaction 1-15 is a reaction of a compound of formula (105-1) wherein R A of A 12 is -L A3 -Y A2 with a (halo)alkylating agent, a oximation agent or an alkoxycarbonylating agent, A method of alkylation of a light-extension reaction or reduction to a compound of the formula (105-2) wherein A 13 has a R A of -L A4 -Y A2 .
式中,A12
為被-LA3
-YA2
取代之苯基或被
-LA3
-YA2
取代之吡啶基,LA3
為O、S或N(R1
),A13
為被
-LA4
-YA2
取代之苯基或被-LA4
-YA2
取代之吡啶基,LA4
為O、OC(=O)、OC(=O)O、S、N(R1
)、N(R1
)C(=O)或N(R1
)C(=O)O,其他記號係如前述。Wherein A 12 is a phenyl group substituted by -L A3 -Y A2 or
-L A3 -Y A2 substituted pyridyl group, L A3 is O, S or N(R 1 ), A 13 is
-L A4 -Y A2 substituted phenyl or pyridyl group substituted by -L A4 -Y A2 , L A4 is O, OC(=O), OC(=O)O, S, N(R 1 ), N (R 1 )C(=O) or N(R 1 )C(=O)O, and other symbols are as described above.
反應1-15可依反應G進行。The reaction 1-15 can be carried out according to the reaction G.
反應1-16
反應1-16係包含藉由式(106)之化合物及式(115)之化合物的佛瑞德-克來福特反應,得到式(116)之化合物之第1步驟,及甲基化式(116)之化合物,得到式(105)之化合物之第2步驟的方法。Reaction 1-16
Reaction 1-16 comprises a Friedel-Crafts reaction of a compound of formula (106) and a compound of formula (115) to give a first step of the compound of formula (116), and a methylation formula (116) a compound obtained by the method of the second step of the compound of the formula (105).
式中之記號係如前述。The symbols in the formula are as described above.
第1步驟可依前述反應1-10進行。The first step can be carried out in accordance with the aforementioned Reaction 1-10.
第2步驟可依前述反應A進行。The second step can be carried out in accordance with the aforementioned reaction A.
反應1-17
反應1-17係包含將式(112)之化合物與(117)之化合物進行反應,得到式(114)之化合物之第1步驟,及氧化式(114)之化合物,得到式(105)之化合物之第2步驟的方法。Reaction 1-17
Reaction 1-17 comprises the first step of reacting a compound of formula (112) with a compound of (117) to give a compound of formula (114), and a compound of formula (114) to give a compound of formula (105) The method of the second step.
第1步驟
第1步驟可依前述反應1-13進行。The first step of the first step can be carried out in accordance with the aforementioned reaction 1-13.
第2步驟
第2步驟可依前述反應1-6進行。The second step and the second step can be carried out in accordance with the above Reactions 1-6.
反應1-18
反應1-18係包含使式(104)之化合物及式(118)之化合物進行反應,得到式(119)之化合物之第1步驟,氧化式(119)之化合物,得到式(120)之化合物之第2步驟的方法,以及還原式(120)之化合物,得到式(105)之化合物之第3步驟的方法。Reaction 1-18
Reaction 1-18 comprises the first step of reacting a compound of formula (104) with a compound of formula (118) to provide a compound of formula (119), oxidizing a compound of formula (119) to provide a compound of formula (120) The method of the second step, and the method of reducing the compound of the formula (120), to obtain the third step of the compound of the formula (105).
式中之記號係如前述。The symbols in the formula are as described above.
第1步驟
第1步驟可依前述反應1-11之第2步驟進行。The first step of the first step can be carried out in accordance with the second step of the above reaction 1-11.
第2步驟
第2步驟可依前述反應1-6進行。The second step and the second step can be carried out in accordance with the above Reactions 1-6.
第3步驟
第3步驟可依前述反應H所記載之接觸還原進行。The third step of the third step can be carried out by contact reduction described in the above reaction H.
反應1-19
反應1-19係將A14
之RA
為羥基之式(105-3)之化合物,變換成A15
之RA
為巰基或胺基之式(105-4)之化合物的方法。Reaction 1-19
The reaction 1-19 R A A 14-based compounds of the formula (105-3) of the hydroxyl groups, R A A 15 into the compound of formula (105-4) or the mercapto group of a method.
式中,A14 為被羥基取代之苯基或被羥基取代之吡啶基,A15 為被巰基或胺基取代之苯基或被巰基或胺基取代之吡啶基,其他記號係如前述。In the formula, A 14 is a phenyl group substituted by a hydroxy group or a pyridyl group substituted by a hydroxy group, and A 15 is a phenyl group substituted with a mercapto group or an amine group or a pyridyl group substituted with a mercapto group or an amine group, and other symbols are as described above.
反應1-19可依一般的Froberg・Schönberg反應進行。通常可於鹼及溶媒的存在下,將式(105-3)之化合物與二甲基硫代胺甲醯氯進行反應,接著經由重排反應、水解,得到式(105-4)之化合物。二甲基硫代胺甲醯氯相對於式(105-3)之化合物1當量,可使用1~5當量,期望為1~2當量。
或反應1-19可依一般的Smiles重排反應進行。通常可於鹼及溶媒的存在下,將式(105-3)之化合物與2-溴異丁基醯胺進行反應,接著經由重排反應、水解,得到式(105-4)之化合物。2-溴異丁基醯胺相對於式(105-3)之化合物1當量,可使用1~10當量,期望為1~3當量。
重排反應可於溶媒的存在下進行,水解可依前述反應1-1進行。Reactions 1-19 can be carried out according to the general Froberg Schönberg reaction. The compound of the formula (105-3) can be usually reacted with dimethylthioamine formazan chloride in the presence of a base and a solvent, followed by a rearrangement reaction and hydrolysis to obtain a compound of the formula (105-4). The dimethyl thiocarbamidine chloride may be used in an amount of from 1 to 5 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (105-3).
Or reactions 1-19 can be carried out according to the general Smiles rearrangement reaction. The compound of the formula (105-3) can be usually reacted with 2-bromoisobutylguanamine in the presence of a base and a solvent, followed by a rearrangement reaction and hydrolysis to obtain a compound of the formula (105-4). The 2-bromoisobutylguanamine can be used in an amount of from 1 to 10 equivalents, preferably from 1 to 3 equivalents, per equivalent of the compound of the formula (105-3).
The rearrangement reaction can be carried out in the presence of a solvent, and the hydrolysis can be carried out in accordance with the above reaction 1-1.
在反應1-19,作為鹼,可使用於前述反應1-7所列舉者。鹼相對於式(105-3)之化合物1當量,可使用1~5當量,期望為1~3當量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如乙腈、丙腈、丙烯腈之腈類;如四氯化碳、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶之極性非質子性溶媒;如N,N-二甲基苯胺等中適當選擇1種或2種以上。In Reactions 1-19, as a base, it can be used in the above-mentioned reactions 1-7. The base may be used in an amount of from 1 to 5 equivalents, preferably from 1 to 3 equivalents, per equivalent of the compound of the formula (105-3).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, a nitrile such as acetonitrile, propionitrile or acrylonitrile; for example, carbon tetrachloride, chloroform, dichloromethane, dichloroethane or trichloroethane. An aliphatic hydrocarbon of alkane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl A polar aprotic solvent of acetamide, N,N-dimethylformamide, N-methylpyrrolidone or pyridine; and one or more selected from the group consisting of N,N-dimethylaniline and the like.
反應溫度通常為0~200℃,期望為20~150℃,反應時間通常為1~48小時左右,期望為1~20小時左右。The reaction temperature is usually 0 to 200 ° C, desirably 20 to 150 ° C, and the reaction time is usually about 1 to 48 hours, and is desirably about 1 to 20 hours.
反應2-1
反應2-1係藉由式(4)之化合物當中,溴化或氯化T為羥基之式(4-1)之化合物,得到T為溴原子或氯原子之式(4-2)之化合物的方法。Reaction 2-1
Reaction 2-1 is a compound of the formula (4) wherein a compound of the formula (4) is brominated or chlorinated with T as a hydroxyl group to obtain a compound of the formula (4-2) wherein T is a bromine atom or a chlorine atom. Methods.
式中,B11 為被RB 或硝基取代之雜環基(該雜環基可進一步被RB’ 取代),T1 為溴原子或氯原子,其他記號係如前述。In the formula, B 11 is a heterocyclic group substituted by R B or a nitro group (the heterocyclic group may be further substituted by RB ' ), and T 1 is a bromine atom or a chlorine atom, and other symbols are as described above.
反應2-1通常可藉由將式(4-1)之化合物於溶媒的存在下,與溴化劑或氯化劑進行反應來進行。Reaction 2-1 can usually be carried out by reacting a compound of the formula (4-1) in the presence of a solvent with a brominating agent or a chlorinating agent.
作為溶媒,若能進行反應則並未特別限定,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如己烷、庚烷、石油醚、石油醚、環己烷之脂肪族烴類;如氯仿、二氯甲烷、四氯化碳、1,2-二氯乙烷之鹵素化烴類;如二乙基醚、四氫呋喃、二噁烷等之醚類及此等之混合溶媒等中適當選擇1種或2種以上。
作為溴化劑,若能進行反應則並未特別限定,可列舉磷醯溴等。作為氯化劑,若能進行反應則並未特別限定,可列舉草醯氯、亞硫醯氯、磷醯氯等。溴化劑或氯化劑相對於式(4-1)之化合物1當量,可以1~10當量,期望為1~3當量的比例使用。The solvent is not particularly limited as long as it can be reacted, for example, aromatic hydrocarbons such as benzene, toluene, xylene, and chlorobenzene; fats such as hexane, heptane, petroleum ether, petroleum ether, and cyclohexane. a hydrocarbon; a halogenated hydrocarbon such as chloroform, dichloromethane, carbon tetrachloride, 1,2-dichloroethane; an ether such as diethyl ether, tetrahydrofuran, dioxane, etc. and a mixture thereof One type or two or more types are appropriately selected from the solvent and the like.
The brominating agent is not particularly limited as long as it can carry out the reaction, and examples thereof include phosphorus ruthenium bromide. The chlorinating agent is not particularly limited as long as it can be reacted, and examples thereof include grass chlorochloride, sulfinium chloride, and phosphonium chloride. The brominating agent or the chlorinating agent may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 3 equivalents, per equivalent of the compound of the formula (4-1).
反應2-1亦可添加N,N-二甲基甲醯胺進行。N,N-二甲基甲醯胺相對於式(4-1)之化合物1當量,可以0.01~3當量,期望為0.05~0.3當量的比例使用。Reaction 2-1 can also be carried out by adding N,N-dimethylformamide. N,N-dimethylformamide is used in an amount of 0.01 to 3 equivalents, and preferably 0.05 to 0.3 equivalents, based on 1 equivalent of the compound of the formula (4-1).
反應溫度通常為0~200℃,期望為0~100℃,反應時間通常為0.1~12小時左右。The reaction temperature is usually 0 to 200 ° C, desirably 0 to 100 ° C, and the reaction time is usually about 0.1 to 12 hours.
式(4-1)之化合物可依公知之方法或藉由後述之方法製造,或可使用市售品。作為公知之方法,例如雖可列舉國際公開公報WO1993/11117號、美國專利第5,093,347號等,但並非被限定於此等,若為本發明領域具有通常知識者,可將各式各樣之文獻所記載的一般的合成方法或適當組合該等,適用在本發明。The compound of the formula (4-1) can be produced by a known method or by a method described later, or a commercially available product can be used. As a known method, for example, International Publication No. WO 1993/11117, U.S. Patent No. 5,093,347, and the like are not limited thereto, and various kinds of documents can be used if they have ordinary knowledge in the field of the invention. The general synthetic methods described or the appropriate combinations thereof are suitable for use in the present invention.
反應2-2
反應2-2係將T2
為烷氧基或芳氧基之式(4-3)之化合物與酸或鹼進行反應,得到式(4-1)之化合物之方法。Reaction 2-2
Reaction 2-2 is a method of reacting a compound of the formula (4-3) wherein T 2 is an alkoxy group or an aryloxy group with an acid or a base to give a compound of the formula (4-1).
式中,B11 為被RB 或硝基取代之雜環基(該雜環基可進一步被RB’ 取代),T2 為烷氧基或芳氧基,其他記號係如前述。In the formula, B 11 is a heterocyclic group substituted by R B or a nitro group (the heterocyclic group may be further substituted by RB ' ), and T 2 is an alkoxy group or an aryloxy group, and other symbols are as described above.
反應2-2通常可藉由將式(4-3)之化合物於溶媒的存在下,與酸或鹼進行反應來進行。The reaction 2-2 can usually be carried out by reacting a compound of the formula (4-3) with an acid or a base in the presence of a solvent.
作為酸,若能進行反應則並未特別限定,例如可使用鹽酸、硫酸、三氟乙酸、p-甲苯磺酸等。作為鹼,若能進行反應則並未特別限定,例如可列舉如碳酸鈉、碳酸鉀、碳酸銫之鹼金屬碳酸鹽;如碳酸氫鈉之鹼金屬的碳酸氫鹽;如碳酸鈣之鹼土類金屬的碳酸鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物等。酸或鹼相對於式(4-3)之化合物1當量,可以0.1~20當量,期望為0.1~10當量的比例使用。
作為溶媒,若能進行反應則並未特別限定,例如可從苯、甲苯等之芳香族烴類;如己烷、庚烷之脂肪族烴類;二乙基醚、四氫呋喃、二噁烷等之醚類;甲醇、乙醇等之醇類;氯仿、二氯乙烷、四氯化碳等之鹵素化烴類;水及此等之混合溶媒等中適當選擇1種或2種以上。The acid is not particularly limited as long as it can be reacted. For example, hydrochloric acid, sulfuric acid, trifluoroacetic acid, p-toluenesulfonic acid or the like can be used. The base is not particularly limited as long as it can be reacted, and examples thereof include alkali metal carbonates such as sodium carbonate, potassium carbonate, and cesium carbonate; alkali metal hydrogencarbonates such as sodium hydrogencarbonate; and alkaline earth metals such as calcium carbonate. a carbonate; a metal hydroxide such as sodium hydroxide or potassium hydroxide. The acid or base can be used in an amount of 0.1 to 20 equivalents, and desirably 0.1 to 10 equivalents, per equivalent of the compound of the formula (4-3).
The solvent is not particularly limited as long as it can be reacted, and examples thereof include aromatic hydrocarbons such as benzene and toluene; aliphatic hydrocarbons such as hexane and heptane; diethyl ether, tetrahydrofuran, dioxane, and the like. Ethers; alcohols such as methanol and ethanol; halogenated hydrocarbons such as chloroform, dichloroethane, and carbon tetrachloride; and one or more selected from the group consisting of water and a mixed solvent thereof.
反應溫度通常為0~200℃,期望為0~100℃,反應時間通常為1~48小時左右。The reaction temperature is usually 0 to 200 ° C, desirably 0 to 100 ° C, and the reaction time is usually about 1 to 48 hours.
式(4-3)之化合物可依公知之方法或藉由後述之方法製造,或可使用市售品。作為公知之方法,例如雖可列舉國際公開公報WO2001/23358號、Journal of the American Chemical Society、128卷、5310~5311頁(2006年)、美國專利第5,093,347號、美國專利第5,223,526號等,但並不限定於此等,若為本發明領域具有通常知識者,亦可將各式各樣之文獻所記載的一般的合成方法或適當組合該等,適用在本發明。The compound of the formula (4-3) can be produced by a known method or by a method described later, or a commercially available product can be used. As a known method, for example, International Publication No. WO2001/23358, Journal of the American Chemical Society, Vol. 128, pp. 5310 to 5311 (2006), U.S. Patent No. 5,093,347, U.S. Patent No. 5,223,526, etc., but The present invention is not limited thereto, and those having ordinary knowledge in the field of the invention may be applied to the present invention by a general synthesis method described in various documents or an appropriate combination thereof.
反應2-3
反應2-3係將式(200)之化合物與酸或鹼進行反應,得到式(4-1)之化合物之方法。Reaction 2-3
Reaction 2-3 is a method of reacting a compound of the formula (200) with an acid or a base to obtain a compound of the formula (4-1).
式中之記號係如前述。The symbols in the formula are as described above.
反應2-3通常可藉由將式(200)之化合物於溶媒的存在下,與酸或鹼進行反應來進行。The reaction 2-3 can usually be carried out by reacting a compound of the formula (200) with an acid or a base in the presence of a solvent.
作為酸、鹼及溶媒,可使用於前述反應2-2所列舉者。酸或鹼相對於式(200)之化合物1當量,可以1~20當量,期望為1~10當量的比例使用。As the acid, the base and the solvent, those used in the above reaction 2-2 can be used. The acid or base may be used in an amount of from 1 to 20 equivalents, and desirably from 1 to 10 equivalents, per equivalent of the compound of the formula (200).
反應溫度通常為0~200℃,期望為0~100℃,反應時間通常為1~48小時左右。The reaction temperature is usually 0 to 200 ° C, desirably 0 to 100 ° C, and the reaction time is usually about 1 to 48 hours.
式(200)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (200) can be produced by a known method, or a commercially available product can be used.
反應2-4
反應2-4係藉由氧化式(201)之化合物,得到式(4-1)之化合物之方法。Reaction 2-4
Reaction 2-4 is a method of obtaining a compound of the formula (4-1) by oxidizing a compound of the formula (201).
式中之記號係如前述。The symbols in the formula are as described above.
反應2-4通常可藉由將式(201)之化合物於溶媒的存在下,與氧化劑進行反應來進行。The reaction 2-4 can usually be carried out by reacting a compound of the formula (201) with an oxidizing agent in the presence of a solvent.
作為氧化劑,若能進行反應則並未特別限定,例如可列舉亞氯酸鈉、氧化鉻、二鉻酸吡啶鎓、過錳酸鉀等。氧化劑相對於式(201)之化合物1當量,可以0.01~20當量,期望為0.1~10當量的比例使用。
作為溶媒,若能進行反應則並未特別限定,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如己烷、庚烷、石油醚、石油醚、環己烷之脂肪族烴類;如氯仿、二氯甲烷、四氯化碳、1,2-二氯乙烷之鹵素化烴類;如乙醇、甲醇、丁醇之醇類;水及此等之混合溶媒等中適當選擇1種或2種以上。The oxidizing agent is not particularly limited as long as it can be reacted, and examples thereof include sodium chlorite, chromium oxide, pyridinium dichromate, and potassium permanganate. The oxidizing agent may be used in an amount of 0.01 to 20 equivalents, and preferably 0.1 to 10 equivalents, per equivalent of the compound of the formula (201).
The solvent is not particularly limited as long as it can be reacted, for example, aromatic hydrocarbons such as benzene, toluene, xylene, and chlorobenzene; fats such as hexane, heptane, petroleum ether, petroleum ether, and cyclohexane. a hydrocarbon; a halogenated hydrocarbon such as chloroform, dichloromethane, carbon tetrachloride or 1,2-dichloroethane; an alcohol such as ethanol, methanol or butanol; water and a mixed solvent thereof; One type or two or more types are appropriately selected.
作為反應溫度,通常為-100~100℃,期望為-80~50℃,反應時間通常為1~48小時左右。The reaction temperature is usually -100 to 100 ° C, desirably -80 to 50 ° C, and the reaction time is usually about 1 to 48 hours.
式(201)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (201) can be produced by a known method, or a commercially available product can be used.
反應2-5
反應2-5係將式(202)之化合物變換成式(203)之化合物之方法。Reaction 2-5
Reaction 2-5 is a method of converting a compound of the formula (202) into a compound of the formula (203).
式中,B4 為被X取代之雜環基(該雜環基可進一步被RB1’ 取代),B5 為被Q1 取代之雜環基(該雜環基可進一步被RB1’ 取代),Q1 為烷氧基、芳基烷氧基、鹵烷氧基、烷硫基、烷基胺基、二烷基胺基或芳基烷基胺基,RC 為氫原子、烷氧基或芳基烷氧基,RB1’ 為烷基、鹵烷基、烷氧基烷基、環烷基或氰基,其他記號係如前述。Wherein B 4 is a heterocyclic group substituted by X (the heterocyclic group may be further substituted by R B1 ' ), and B 5 is a heterocyclic group substituted by Q 1 (the heterocyclic group may be further substituted by R B1 ') And Q 1 is an alkoxy group, an arylalkoxy group, a haloalkoxy group, an alkylthio group, an alkylamino group, a dialkylamino group or an arylalkylamino group, and R C is a hydrogen atom or an alkoxy group. Or an alkoxy group, R B1 ' is an alkyl group, a haloalkyl group, an alkoxyalkyl group, a cycloalkyl group or a cyano group, and the other symbols are as described above.
反應2-5可依反應F進行。The reaction 2-5 can be carried out according to the reaction F.
式(202)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (202) can be produced by a known method, or a commercially available product can be used.
反應2-6
反應2-6係將式(204)之化合物變換成式(205)之化合物之方法。Reaction 2-6
Reaction 2-6 is a method of converting a compound of formula (204) to a compound of formula (205).
式中,B6 為被RB 及Q2 取代之雜環基(該雜環基可進一步被RB’ 取代),B7 為被RB 及單氟烷基或烷氧基烷基取代之雜環基(該雜環基可進一步被RB’ 取代),Q2 為被Q3 取代之烷基,Q3 為羥基、氯原子、溴原子、碘原子、硝基、烷基磺酸酯或氟磺酸酯,其他記號係如前述。Wherein B 6 is a heterocyclic group substituted by R B and Q 2 (the heterocyclic group may be further substituted by RB ' ), and B 7 is substituted by R B and a monofluoroalkyl or alkoxyalkyl group. a heterocyclic group (which may be further substituted by RB ' ), Q 2 is an alkyl group substituted by Q 3 , and Q 3 is a hydroxyl group, a chlorine atom, a bromine atom, an iodine atom, a nitro group, an alkyl sulfonate Or fluorosulfonate, other marks are as described above.
反應2-6通常可藉由於鹼及溶媒的存在下,與烷基化劑及氟化劑進行反應來進行。The reaction 2-6 can usually be carried out by reacting with an alkylating agent and a fluorinating agent in the presence of a base and a solvent.
作為烷基化劑,若能進行反應則並未特別限定,例如可列舉如碘化甲烷、溴化甲烷之鹵素化烷基、硫酸二甲酯等之硫酸二烷酯、三甲基矽烷基重氮甲烷等。
作為氟化劑,若能進行反應則並未特別限定,可列舉如氟化銫之氟化物鹽;如氟化四-n-丁基銨等之四級銨鹽;如CRYSTAL FLUOR之脫氧的氟化劑等。
作為鹼,例如可從如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類;如吡啶、4-二甲基胺基吡啶之吡啶類;如甲基鋰、n-丁基鋰、鋰二異丙基醯胺之有機鋰化合物等中適當選擇1種或2種以上。烷基化劑、氟化劑或鹼相對於式(204)之化合物1當量,可以1~20當量,期望為1~10當量的比例使用。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;水及此等之混合溶媒等中適當選擇1種或2種以上。The alkylating agent is not particularly limited as long as it can be reacted, and examples thereof include a dialkyl sulfate such as methyl iodide or a halogenated alkyl group of methyl bromide, and a dimethyl sulfate. Nitrogen methane, etc.
The fluorinating agent is not particularly limited as long as it can carry out the reaction, and examples thereof include a fluoride salt of cesium fluoride; a quaternary ammonium salt such as tetra-n-butylammonium fluoride; and a defluorinated fluorine such as CRYSTAL FLUOR. Chemical agent, etc.
As the base, for example, an alkali metal alkoxide such as sodium methoxide, sodium ethoxide, potassium butoxide of the third stage; a carbonate such as sodium carbonate or potassium carbonate; a hydrogencarbonate such as sodium hydrogencarbonate or potassium hydrogencarbonate; a metal hydroxide of sodium oxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; an amine such as monomethylamine, dimethylamine, triethylamine or diisopropylethylamine; For example, one or two or more selected from the group consisting of pyridine and 4-dimethylaminopyridine pyridine; and an organic lithium compound such as methyllithium, n-butyllithium or lithium diisopropylguanamine. The alkylating agent, the fluorinating agent or the base may be used in an amount of from 1 to 20 equivalents, preferably from 1 to 10 equivalents, per equivalent of the compound of the formula (204).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methanol, ethanol, C Alcohol, tert-butanol alcohols; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile, C The polar aprotic solvent of the nitrile; one or more selected from the group consisting of water and a mixed solvent thereof.
反應溫度通常為0~100℃,期望為0~80℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
式(204)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (204) can be produced by a known method, or a commercially available product can be used.
反應2-7
反應2-7係得到具有氟原子之式(207)之化合物的方法。Reaction 2-7
The reaction 2-7 is a method of obtaining a compound of the formula (207) having a fluorine atom.
式中,B8 為可被Q5 取代,且被RB 取代雜環基(該雜環基可進一步被RB1’ 取代),B9 為被RB 及氟取代之雜環基,Q5 為脫離基(例如氯、溴、碘、硝基、烷基磺酸酯或氟磺酸酯等)、胺基或羥基,RD 為氫、烷氧基、芳氧基、芳基烷氧基、羥基或鹵素,其他記號係如前述。Wherein B 8 is a group which may be substituted by Q 5 and substituted by R B (the heterocyclic group may be further substituted by R B1 ' ), and B 9 is a heterocyclic group substituted by R B and fluorine, Q 5 R- 7 is hydrogen, alkoxy, aryloxy, arylalkoxy, in the case of a detachment group (for example, chlorine, bromine, iodine, nitro, alkyl sulfonate or fluorosulfonate, etc.), an amine group or a hydroxyl group. , hydroxyl or halogen, other symbols are as described above.
在反應2-7,Q5
為脫離基時,通常於溶媒的存在下,可藉由將式(206)之化合物與氟化劑進行反應,得到式(207)之化合物。
作為氟化劑,若能進行反應則並未特別限定,可列舉如氟化銫之氟化物鹽;如氟化四甲基銨、氟化四-n-丁基銨等之四級銨鹽等。氟化劑相對於式(206)之化合物1當量,可以1~20當量,期望為1~10當量的比例使用。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒及此等之混合溶媒等中適當選擇1種或2種以上。
反應溫度通常為0~200℃,期望為20~150℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。In the reaction 2-7, when Q 5 is a leaving group, the compound of the formula (207) can be obtained by reacting a compound of the formula (206) with a fluorinating agent usually in the presence of a solvent.
The fluorinating agent is not particularly limited as long as it can be reacted, and examples thereof include a fluoride salt of cesium fluoride; a quaternary ammonium salt such as tetramethylammonium fluoride or tetra-n-butylammonium fluoride; . The fluorinating agent may be used in an amount of from 1 to 20 equivalents, preferably from 1 to 10 equivalents, per equivalent of the compound of the formula (206).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, An aliphatic hydrocarbon of dichloroethane, trichloroethane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; such as dimethyl hydrazine Suitable for polar aprotic solvents such as cyclobutyl hydrazine, dimethylacetamide, N,N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile and propionitrile, and mixed solvents thereof. One or two or more types are selected.
The reaction temperature is usually 0 to 200 ° C, desirably 20 to 150 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
在反應2-7,Q5
為胺基時,可藉由Balz-Seaman反應,得到式(207)之化合物。此情況下,通常於溶媒的存在下,將式(206)之化合物與亞硝酸鈉及四氟硼酸進行反應。亞硝酸鈉及四氟硼酸相對於式(206)之化合物1當量,可子1~20當量,期望為1~10當量的比例使用。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒及此等之混合溶媒等中適當選擇1種或2種以上。
反應溫度通常為0~200℃,期望為20~150℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。In the reaction 2-7, when Q 5 is an amine group, the compound of the formula (207) can be obtained by a Balz-Seaman reaction. In this case, the compound of the formula (206) is usually reacted with sodium nitrite and tetrafluoroboric acid in the presence of a solvent. Sodium nitrite and tetrafluoroboric acid may be used in an amount of from 1 to 20 equivalents, preferably from 1 to 10 equivalents, per equivalent of the compound of the formula (206).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, An aliphatic hydrocarbon of dichloroethane, trichloroethane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; such as dimethyl hydrazine Suitable for polar aprotic solvents such as cyclobutyl hydrazine, dimethylacetamide, N,N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile and propionitrile, and mixed solvents thereof. One or two or more types are selected.
The reaction temperature is usually 0 to 200 ° C, desirably 20 to 150 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
在反應2-7,Q5
為羥基時,於式(206)之化合物,通常於溶媒的存在下,如有必要於氟化物鹽的存在下,可藉由使脫氧的氟化劑進行反應,得到式(207)之化合物。
脫氧的氟化劑若能進行反應則並未特別限定,可列舉PhenoFluor等。脫氧的氟化劑相對於式(206)之化合物1當量,可以1~20當量,期望為1~10當量的比例使用。
氟化物鹽可列舉氟化鉀、氟化銫等。氟化物鹽相對於式(206)之化合物1當量,可以1~10當量,期望為1~5當量的比例使用。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒及此等之混合溶媒等中適當選擇1種或2種以上。
反應溫度通常為0~200℃,期望為20~150℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。In the case of the reaction 2-7, Q 5 is a hydroxy group, the compound of the formula (206), usually in the presence of a solvent, if necessary in the presence of a fluoride salt, can be reacted by a deoxygenated fluorinating agent. The compound of formula (207) is obtained.
The deoxidizing fluorinating agent is not particularly limited as long as it can react, and examples thereof include PhenoFluor. The deoxidizing fluorinating agent may be used in an amount of from 1 to 20 equivalents, and desirably from 1 to 10 equivalents, per equivalent of the compound of the formula (206).
Examples of the fluoride salt include potassium fluoride and cesium fluoride. The fluoride salt may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (206).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, An aliphatic hydrocarbon of dichloroethane, trichloroethane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; such as dimethyl hydrazine Suitable for polar aprotic solvents such as cyclobutyl hydrazine, dimethylacetamide, N,N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile and propionitrile, and mixed solvents thereof. One or two or more types are selected.
The reaction temperature is usually 0 to 200 ° C, desirably 20 to 150 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
在反應2-7,B8
為可被Q5
取代之雜環基時,通常於溶媒的存在下,如有必要於鹼的存在下,可藉由使親電子的氟化劑進行反應,得到式(207)之化合物。
親電子的氟化劑若能進行反應則並未特別限定,可列舉氟試劑(Selectfluor)、N-氟苯磺醯亞胺等。親電子的氟化劑相對於式(206)之化合物1當量,可以1~20當量,期望為1~10當量的比例使用。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒及此等之混合溶媒等中適當選擇1種或2種以上。
鹼可從如鋰二異丙基醯胺、六甲基二矽基胺鋰之鋰醯胺化合物等中適當選擇1種或2種以上。鹼相對於式(206)之化合物1當量,可以1~5當量,期望為1~2當量的比例使用。
反應溫度通常為-100~200℃,期望為-78~150℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。In the case of the reaction 2-7, B 8 is a heterocyclic group which may be substituted by Q 5 , usually in the presence of a solvent, if necessary in the presence of a base, by reacting an electrophilic fluorinating agent. a compound of formula (207).
The electrophilic fluorinating agent is not particularly limited as long as it can react, and examples thereof include a fluorine reagent (Selectfluor) and N-fluorobenzenesulfonimide. The electrophilic fluorinating agent may be used in an amount of from 1 to 20 equivalents, and desirably from 1 to 10 equivalents, per equivalent of the compound of the formula (206).
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, An aliphatic hydrocarbon of dichloroethane, trichloroethane, hexane or cyclohexane; an ether such as dioxane, tetrahydrofuran, diethyl ether or dimethoxyethane; such as dimethyl hydrazine Suitable for polar aprotic solvents such as cyclobutyl hydrazine, dimethylacetamide, N,N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile and propionitrile, and mixed solvents thereof. One or two or more types are selected.
The base can be appropriately selected from one or two or more selected from the group consisting of lithium diisopropyl decylamine and lithium hexamine hexamethyl amide. The base may be used in an amount of from 1 to 5 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (206).
The reaction temperature is usually -100 to 200 ° C, desirably -78 to 150 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
式(206)之化合物可依公知之方法製造,或可使用市售品。又,式(206)之化合物亦可依照例如Journal of the American Chemical Society、139卷、1452~1455頁(2017年)、Journal of Organic Chemistry、80卷、12137~12145頁(2015年)、Organic Process Research & Development、18卷、1041~1044頁(2014年)等所記載之方法,或依該等之方法製造。The compound of the formula (206) can be produced by a known method, or a commercially available product can be used. Further, the compound of the formula (206) can also be used, for example, in Journal of the American Chemical Society, Vol. 139, pp. 1452-1455 (2017), Journal of Organic Chemistry, Vol. 80, pages 12137 to 12145 (2015), Organic Process. The method described in Research & Development, Vol. 18, pp. 1041 - 1044 (2014), or the like.
反應2-8
反應2-8係(鹵)烷基化或環烷基化式(208)之化合物,變換成式(209)之化合物之方法。Reaction 2-8
Reaction of a 2-8 (halo)alkylated or cycloalkylated compound of formula (208) to a compound of formula (209).
式中,B10 為被RB 取代之具有NH的雜環基(該雜環基可進一步被RB’ 取代),B11 為具有被RB 及(鹵)烷基或環烷基取代之N的雜環基(該雜環基可進一步被RB’ 取代),其他記號係如前述。Wherein B 10 is a heterocyclic group having NH substituted by R B (the heterocyclic group may be further substituted by RB ' ), and B 11 is substituted by R B and (halo)alkyl or cycloalkyl A heterocyclic group of N (the heterocyclic group may be further substituted by RB ' ), and other symbols are as described above.
反應2-8通常於鹼及溶媒的存在下,可藉由於式(208)之化合物,使(鹵)烷基化劑或環烷基化劑進行反應來進行。又,本反應亦可藉由將式(208)之化合物於過渡金屬試藥及溶媒存在下,如有必要添加鹼,與有機金屬試藥進行反應來進行。The reaction 2-8 can be carried out usually by reacting a (halo)alkylating agent or a cycloalkylating agent with a compound of the formula (208) in the presence of a base and a solvent. Further, the reaction can also be carried out by reacting a compound of the formula (208) with a metal-based reagent in the presence of a transition metal reagent and a solvent, if necessary, by adding a base.
作為(鹵)烷基化劑,可使用於前述反應G所列舉者。
作為鹼,例如可從如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;如碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺、二異丙基乙基胺之胺類;如吡啶、4-二甲基胺基吡啶之吡啶類;如甲基鋰、n-丁基鋰、鋰二異丙基醯胺之有機鋰化合物等中適當選擇1種或2種以上。(鹵)烷基化劑或鹼相對於式(208)之化合物1當量,可以1~20當量,期望為1~10當量的比例使用。
作為有機金屬試藥,若能進行反應則並未特別限定,例如可列舉有機硼化合物等。有機金屬試藥可依公知之方法調製,或可使用市售品。有機金屬試藥相對於式(208)之化合物1當量,可使用1~10當量,期望為1~5當量。
作為過渡金屬試藥,可使用交叉偶合反應所使用之公知之各種構造者,本反應中包含銅之過渡金屬試藥特別有用。例如可列舉乙酸銅(II)等。又,如有必要可將二胺作為配位子使用。作為二胺,可列舉N,N,N’,N’-四甲基乙二胺、2、2’-聯吡啶基等。過渡金屬試藥相對於式(208)之化合物1當量,可使用0.1~5當量,期望為0.5~1.5當量。又,配位子相對於過渡金屬觸媒1當量,通常可使用1~10當量,期望為1~5當量。惟,因反應條件亦可使用此範圍外的量。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;水及此等之混合溶媒等中適當選擇1種或2種以上。As the (halo)alkylating agent, those used in the above reaction G can be used.
As the base, for example, an alkali metal alkoxide such as sodium methoxide, sodium ethoxide, potassium butoxide of the third stage; a carbonate such as sodium carbonate or potassium carbonate; a hydrogencarbonate such as sodium hydrogencarbonate or potassium hydrogencarbonate; a metal hydroxide of sodium oxide or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; an amine such as monomethylamine, dimethylamine, triethylamine or diisopropylethylamine; For example, one or two or more selected from the group consisting of pyridine and 4-dimethylaminopyridine pyridine; and an organic lithium compound such as methyllithium, n-butyllithium or lithium diisopropylguanamine. The (halo)alkylating agent or base may be used in an amount of from 1 to 20 equivalents, desirably from 1 to 10 equivalents, per equivalent of the compound of the formula (208).
The organic metal reagent is not particularly limited as long as it can be reacted, and examples thereof include an organic boron compound. The organometallic reagent can be prepared by a known method, or a commercially available product can be used. The organometallic reagent may be used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the compound of the formula (208).
As the transition metal reagent, various known structures used in the cross-coupling reaction can be used, and a transition metal reagent containing copper in the reaction is particularly useful. For example, copper (II) acetate or the like can be mentioned. Further, a diamine can be used as a ligand if necessary. Examples of the diamine include N,N,N',N'-tetramethylethylenediamine, 2,2'-bipyridyl group and the like. The transition metal reagent may be used in an amount of 0.1 to 5 equivalents, preferably 0.5 to 1.5 equivalents, per equivalent of the compound of the formula (208). Further, the ligand is usually used in an amount of from 1 to 10 equivalents, preferably from 1 to 5 equivalents, per equivalent of the transition metal catalyst. However, amounts outside this range may also be used depending on the reaction conditions.
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methanol, ethanol, C Alcohol, tert-butanol alcohols; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile, C The polar aprotic solvent of the nitrile; one or more selected from the group consisting of water and a mixed solvent thereof.
反應溫度通常為0~100℃,期望為0~80℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
式(208)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (208) can be produced by a known method, or a commercially available product can be used.
反應2-9
反應2-9係(鹵)烷基化、矽烷基化、烷氧基烷基化、烷氧基羰基化或芳基烷氧基羰基化式(210)之化合物,變換成式(211)之化合物之方法。Reaction 2-9
Reaction 2-9 (halo)alkylation, oximation, alkoxyalkylation, alkoxycarbonylation or aryl alkoxycarbonylation of a compound of formula (210), converted to formula (211) Method of compound.
式中,B12 為可被-LB2 -YB3 取代之雜環基(該雜環基可進一步被RB’ 取代),YB3 為烷基、鹵烷基、三烷基矽烷基、烷氧基烷基、烷氧基羰基或芳基烷氧基羰基,其他記號係如前述。Wherein B 12 is a heterocyclic group which may be substituted by -L B2 -Y B3 (the heterocyclic group may be further substituted by RB ' ), and Y B3 is an alkyl group, a haloalkyl group, a trialkyl decyl group, an alkane An oxyalkyl group, an alkoxycarbonyl group or an arylalkoxycarbonyl group, the other symbols are as described above.
反應2-9通常可於鹼及溶媒的存在下,藉由於式(210)之化合物,使(鹵)烷基化劑、矽烷基化劑、烷氧基烷基化劑、烷氧基羰基化劑或芳基烷氧基羰基化劑進行反應來進行。(鹵)烷基化劑、矽烷基化劑、烷氧基烷基化劑或鹼相對於式(210)之化合物1當量,可以1~20當量,期望為1~10當量的比例使用。烷氧基羰基化劑或芳基烷氧基羰基化劑相對於式(210)之化合物1當量,可使用1~3當量,期望為1~2當量。Reactions 2-9 can be obtained by the (halo)alkylating agent, the oximation alkylating agent, the alkoxyalkylating agent, the alkoxycarbonyl group by the compound of the formula (210) in the presence of a base and a solvent. The reaction is carried out by reacting a reagent or an aryl alkoxycarbonylating agent. The (halo)alkylating agent, the oximation alkylating agent, the alkoxyalkylating agent or the base may be used in an amount of from 1 to 20 equivalents, preferably from 1 to 10 equivalents, per equivalent of the compound of the formula (210). The alkoxycarbonylating agent or the arylalkoxycarbonylating agent may be used in an amount of from 1 to 3 equivalents, preferably from 1 to 2 equivalents, per equivalent of the compound of the formula (210).
作為(鹵)烷基化劑,可使用於前述反應G所列舉者。
作為矽烷基化劑,可列舉氯三乙基矽烷、氯三異丙基矽烷等。
作為烷氧基烷基化劑,可列舉氯甲基甲基醚等。
作為鹼,例如可從如甲醇鈉、乙醇鈉、第3級丁醇鉀之鹼金屬醇鹽;碳酸鈉、碳酸鉀之碳酸鹽;如碳酸氫鈉、碳酸氫鉀之碳酸氫鹽;如氫氧化鈉、氫氧化鉀之金屬氫氧化物;如氫化鈉、氫化鉀之金屬氫化物;如單甲基胺、二甲基胺、三乙基胺之胺類;如吡啶、4-二甲基胺基吡啶之吡啶類;如甲基鋰、n-丁基鋰、鋰二異丙基醯胺之有機鋰化合物等中適當選擇1種或2種以上。
作為烷氧基羰基化劑,可列舉二碳酸二-tert-丁酯,作為芳基烷氧基羰基化劑,可列舉氯甲酸苄酯等。
溶媒若為對反應為惰性的溶媒則任何溶媒皆可,例如可從如苯、甲苯、二甲苯、氯苯之芳香族烴類;如四氯化碳、氯化甲烷、氯仿、二氯甲烷、二氯乙烷、三氯乙烷、己烷、環己烷之脂肪族烴類;如二噁烷、四氫呋喃、二乙基醚、二甲氧基乙烷之醚類;如甲醇、乙醇、丙醇、tert-丁醇之醇類;如二甲基亞碸、環丁碸、二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基吡咯烷酮、吡啶、乙腈、丙腈之極性非質子性溶媒;水及此等之混合溶媒等中適當選擇1種或2種以上。As the (halo)alkylating agent, those used in the above reaction G can be used.
Examples of the oximation alkylating agent include chlorotriethyl decane and chlorotriisopropyl decane.
Examples of the alkoxyalkylating agent include chloromethyl methyl ether and the like.
As the base, for example, an alkali metal alkoxide such as sodium methoxide, sodium ethoxide, potassium butoxide of the third stage; a carbonate of sodium carbonate or potassium carbonate; a hydrogencarbonate such as sodium hydrogencarbonate or potassium hydrogencarbonate; a metal hydroxide of sodium or potassium hydroxide; a metal hydride such as sodium hydride or potassium hydride; an amine such as monomethylamine, dimethylamine or triethylamine; such as pyridine or 4-dimethylamine The pyridine of the pyridine is one or more selected from the group consisting of an organic lithium compound such as methyllithium, n-butyllithium or lithium diisopropylamine.
Examples of the alkoxycarbonylating agent include di-tert-butyl dicarbonate, and examples of the aryl alkoxycarbonylating agent include benzyl chloroformate.
The solvent may be any solvent if it is a solvent inert to the reaction, for example, an aromatic hydrocarbon such as benzene, toluene, xylene or chlorobenzene; for example, carbon tetrachloride, methyl chloride, chloroform, dichloromethane, Aliphatic hydrocarbons of dichloroethane, trichloroethane, hexane, cyclohexane; ethers such as dioxane, tetrahydrofuran, diethyl ether, dimethoxyethane; such as methanol, ethanol, C Alcohol, tert-butanol alcohols; such as dimethyl hydrazine, cyclobutyl hydrazine, dimethyl acetamide, N, N-dimethylformamide, N-methylpyrrolidone, pyridine, acetonitrile, C The polar aprotic solvent of the nitrile; one or more selected from the group consisting of water and a mixed solvent thereof.
反應溫度通常為0~100℃,期望為0~80℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。The reaction temperature is usually 0 to 100 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
式(210)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (210) can be produced by a known method, or a commercially available product can be used.
反應2-10
反應2-10係氧化式(212)之化合物,得到式(213)之化合物之方法。Reaction 2-10
Reaction 2-10 is a method of oxidizing a compound of formula (212) to give a compound of formula (213).
式中,B13 為被胺基取代之雜環基(該雜環基可進一步被RB’ 取代),B14 為被硝基取代之雜環基(該雜環基可進一步被RB’ 取代),其他記號係如前述。Wherein B 13 is a heterocyclic group substituted with an amine group (the heterocyclic group may be further substituted by RB ' ), and B 14 is a heterocyclic group substituted with a nitro group (the heterocyclic group may be further substituted by R B ' Instead, the other marks are as described above.
反應2-10通常可於氧化劑、酸及溶媒的存在下進行。The reaction 2-10 can usually be carried out in the presence of an oxidizing agent, an acid and a solvent.
作為氧化劑,可從如過硼酸鈉之硼化合物;如五氧化釩、二氧化鈦之金屬氧化物;過氧化氫等中適當選擇1種或2種以上。氧化劑相對於式(212)之化合物1當量,可使用0.01~10當量,期望為0.1~5當量。
作為酸,若能進行反應則並未特別限定,例如可使用鹽酸、硫酸、三氟乙酸、p-甲苯磺酸等。酸相對於式(212)之化合物1當量,可使用1~50當量,期望為1~20當量。
作為溶媒,可使用於前述反應1-6所列舉者。As the oxidizing agent, one or two or more kinds may be appropriately selected from a boron compound such as sodium perborate; a metal oxide such as vanadium pentoxide or titanium dioxide; or hydrogen peroxide. The oxidizing agent may be used in an amount of from 0.01 to 10 equivalents, preferably from 0.1 to 5 equivalents, per equivalent of the compound of the formula (212).
The acid is not particularly limited as long as it can be reacted. For example, hydrochloric acid, sulfuric acid, trifluoroacetic acid, p-toluenesulfonic acid or the like can be used. The acid may be used in an amount of from 1 to 50 equivalents, preferably from 1 to 20 equivalents, per equivalent of the compound of the formula (212).
As the solvent, those used in the above reactions 1-6 can be used.
反應溫度通常為-20~100℃,期望為0~80℃,反應時間通常為0.1~48小時左右,期望為0.1~24小時左右。The reaction temperature is usually -20 to 100 ° C, desirably 0 to 80 ° C, and the reaction time is usually about 0.1 to 48 hours, and is desirably about 0.1 to 24 hours.
式(212)之化合物可依公知之方法製造,或可使用市售品。The compound of the formula (212) can be produced by a known method, or a commercially available product can be used.
本發明化合物作為以低藥量可防除有害菌類之農園藝用殺菌劑的有效成分有用。作為農園藝用殺菌劑使用時,本發明化合物,例如可防除屬於卵菌類(Oomycetes)、子囊菌類(Ascomycetes)、担子菌類(Basidiomycetes)、不完全菌類(Deuteromycetes)等之有害菌類,其中,對屬於子囊菌類(Ascomycetes)、不完全菌類(Deuteromycetes)等之有害菌類的防除特別有效。The compound of the present invention is useful as an active ingredient of a agricultural and horticultural fungicide which can prevent harmful fungi in a low dose. When used as a fungicide for agricultural and horticultural use, the compound of the present invention can prevent harmful fungi belonging to the genus Oomycetes, Ascomycetes, Basidiomycetes, and Deuteromycetes, among them, The control of harmful fungi such as Ascomycetes and Deuteromycetes is particularly effective.
作為前述有害菌類之更具體之例,例如可列舉如以下者等。
作為卵菌類,可列舉如馬鈴薯或蕃茄疫病菌(Phytophthora infestans)、蕃茄灰色疫病菌(Phytophthora capsici)之疫病菌(Phytophthora)屬;如黃瓜霜霉病(Pseudoperonospora cubensis)之露菌病菌(Pseudoperonospora)屬;如葡萄霜霉病(Plasmopara viticola)之單軸黴菌(Plasmopara)屬;如稻苗立枯病菌(Pythium graminicola)、小麥褐色雪腐病菌(Pythium iwayamai)之腐霉菌(Pythium)屬等。More specific examples of the above-mentioned harmful fungi include, for example, the following.
Examples of the oomycetes include Phytophthora infestans, Phytophthora capsici Phytophthora genus, and Pseudoperonospora cubensis genus Pseudoperonospora. Such as Plasmopara viticola genus Plasmopara; such as Pythium graminicola, Pythium iwayamai Pythium genus.
作為子囊菌類,可列舉如小麥白粉病菌(Erysiphe graminis)之白粉菌(Erysiphe)屬;如黃瓜白粉病菌(Sphaerotheca fuliginea)、草莓白粉病菌(Sphaerotheca humuli)之草單囊殼(Sphaerotheca)屬;如葡萄白粉病菌(Uncinula necator)之鈎絲殼(Uncinula)屬;如蘋果白粉病菌(Podosphaera leucotricha)之絲單囊殼(Podosphaera)屬;如豌豆褐紋病菌(Mycosphaerella pinodes)、蘋果黑點病菌(Mycosphaerella pomi)、香蕉葉斑病菌(Mycosphaerella musicola)、柿子圓星落葉病菌(Mycosphaerella nawae)、草莓蛇紋石病菌(Mycosphaerella fragariae)之球腔菌(Mycosphaerella)屬;如蘋果黑星病菌(Venturia inaequalis)、梨黑星病菌(Venturia nashicola)之黑星菌(Venturia)屬;如大麥網斑病菌(Pyrenophora teres)、大麥斑葉病菌(Pyrenophora graminea)之核腔菌(Pyrenophora)屬;如綠豆菌核病菌、黃瓜菌核病菌、甘藍菌核病菌、白菜菌核病菌、胡椒菌核病菌、青椒菌核病菌或洋蔥菌核病菌之各種菌核病菌(Sclerotinia sclerotiorum)、如小麥雪腐大粒菌核病菌(Sclerotinia borealis)、蕃茄小粒菌核病菌(Sclerotinia minor)、苜蓿菌核病菌(Sclerotinia trifoliorum)之核盤菌(Sclerotinia)屬;如花生小菌核病菌(Botryolinia arachidis)之孢盤菌(Botryolinia)屬;如稻芝麻斑病菌(Cochliobolus miyabeanus)之旋孢腔菌(Cochliobolus)屬;如黃瓜藤枯病菌(Didymella bryoniae)之亞隔孢殼(Didymella)屬;如稻馬鹿苗病菌(Gibberella fujikuroi)之赤黴菌(Gibberella)屬;如葡萄黑痘病菌(Elsinoe ampelina)、柑橘瘡痂病菌(Elsinoe fawcettii)之痂囊腔菌(Elsinoe)屬;如柑橘黑點病菌(Diaporthe citri)、葡萄科膨病菌(Diaporthe sp.)之間座殼菌(Diaporthe)屬;如蘋果念珠菌病菌(Monilinia mali)、桃灰色病菌(Monilinia fructicola)之鏈核盤菌(Monilinia)屬;如葡萄晩腐病菌(Glomerella cingulata)之炭疽刺盤孢菌(Glomerella)屬等。Examples of the ascomycetes include Erysiphe genus such as Erysiphe graminis; Sphaerotheca fuliginea; Sphaerotheca humuli; Sphaerotheca genus; The genus Uncinula of Uncinula necator; such as the genus Podosphaera of the genus Podosphaera leucotricha; such as Mycosphaerella pinodes, Mycosphaerella pomi ), Mycosphaerella musicola, Mycosphaerella nawae, Mycosphaerella fragariae, Mycosphaerella; such as Venturia inaequalis, pear black Venturia nashicola of the genus Venturia; such as Pyrenophora teres, Pyrenophora graminea, Pyrenophora; such as Mung sclerotium, Cucumber Nuclear bacterium, Brassica oleracea, Brassica chinensis, S. sclerotium, S. chinensis or Onion Sclerotium Various Sclerotinia sclerotiorum, such as Sclerotinia borealis, Sclerotinia minor, Sclerotinia trifoliorum, Sclerotinia; For example, Botryolinia genus of Botryolinia arachidis; such as the genus Cochliobolus of Cochliobolus miyabeanus; such as the subdivision of the genus Didymella bryoniae Genus of the genus Didymella; for example, Gibberella genus of Gibberella fujikuroi; such as Elsinoe ampelina, Elsinoe fawcettii, Elsinoe Such as Diaporthe citri, Diaporthe sp. between the genus Diaporthe; such as the genus of Monilinia mali and Monilinia fructicola Genus of the genus Monilinia; such as the genus Glomerella of the genus Glomerella cingulata.
作為担子菌類,可列舉如稻紋枯病菌(Rhizoctonia solani)之絲核菌(Rhizoctonia)屬;如小麥裸黑穗病菌(Ustilago nuda)之黑粉菌(Ustilago)屬;如燕麥冠銹病菌(Puccinia coronata)、小麥葉銹病菌(Puccinia recondita)、小麥黃銹病菌(Puccinia striiformis)之柄銹菌(Puccinia)屬;如大豆銹病菌(Phakopsora pachyrhizi)之層銹菌(Phakopsora)屬;如小麥或大麥雪腐小粒菌核病菌(Typhula incarnata, Typhula ishikariensisis)之雪腐菌核菌(Typhula)屬等。Examples of the Basidiomycetes include Rhizoctonia solani Rhizoctonia genus; such as Ustilago nuda, Ustilago genus; such as Oats crown rust fungus ( Puccinia coronata), Puccinia recondita, Puccinia striiformis genus Puccinia; such as Phakopsora pachyrhizi Phakopsora; such as wheat or The genus Typhula of Typhula incarnata (Typhula ishikariensisis) of the barley genus Typhula.
作為不完全菌類,可列舉如小麥穎枯病菌(Septoria nodorum)、小麥葉枯病菌(Septoria tritici)之殼針孢菌(Septoria)屬;如葡萄灰黴病菌、柑橘灰黴病菌、黃瓜灰黴病菌、蕃茄灰黴病菌、草莓灰黴病菌、茄子灰黴病菌、綠豆灰黴病菌、紅豆灰黴病菌、豌豆灰黴病菌、花生灰黴病菌、胡椒灰黴病菌、青椒灰黴病菌、萵苣灰黴病菌、洋蔥灰黴病菌、星辰花灰黴病菌、康乃馨灰黴病菌、玫瑰灰黴病菌、三色堇灰黴病菌或向日葵灰黴病菌之各種灰黴病菌(Botrytis cinerea)、如洋蔥灰腐病菌(Botrytis allii)、引起因洋蔥之葡萄孢屬菌導致之葉枯病的病原菌(Botrytis squamosa, Botrytis byssoidea, Botrytis tulipae)之葡萄孢菌(Botrytis)屬;如小麥赤黴病菌(Fusarium graminearum)、黃瓜鶴見病菌(Fusarium oxysporum)之鐮孢菌(Fusarium)屬、稻瘟病菌(Pyricularia oryzae)之梨孢(Pyricularia)屬;如甜菜褐斑病菌(Cercospora beticola)、柿子角斑病菌(Cercospora kakivola)之尾孢菌(Cercospora)屬;如黃瓜炭疽病菌(Colletotrichum orbiculare)之炭疽刺盤孢菌(Colletotrichum)屬;如蘋果斑點落葉病菌(Alternaria alternata apple pathotype)、梨黑斑病菌(Alternaria alternata Japanese pear pathotype)、馬鈴薯早疫或蕃茄輪紋病菌(Alternaria solani)、甘藍或白菜黑斑病菌(Alternaria brassicae)、甘藍黑煙病菌(Alternaria brassicola)、洋蔥或蔥黑斑病菌(Alternaria porri)之鏈隔孢菌(Alternaria)屬;如甘藍根朽病菌(Phoma lingam)之莖點霉(Phoma)屬;如小麥眼紋病菌(Pseudocercosporella herpotrichoides)之假小尾孢黴(Pseudocercosporella)屬;如葡萄褐斑病菌(Pseudocercospora vitis)之假尾孢菌(Pseudocercospora)屬;如大麥雲形病菌(Rhynchosporium secalis)之雲紋菌(Rhynchosporium)屬;如桃黑星病菌(Cladosporium carpophilum)之枝孢菌(Cladosporium)屬;如桃擬莖點黴腐敗病菌(Phomopsis sp.)之擬莖點黴(Phomopsis)屬;如柿子炭疽病菌(Gloeosporium kaki)之盤長孢黴(Gloeosporium)屬;如蕃茄葉黴病菌(Fulvia fulva)之葉黴病菌(Fulvia)屬;如黃瓜褐斑病菌(Corynespora cassiicola)之棒狀桿孢菌(Corynespora)屬等。Examples of incomplete fungi include, for example, Septoria nodorum, Septoria tritici, and Septoria; such as Botrytis cinerea, Botrytis cinerea, and Botrytis cinerea , Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Peanut Botrytis, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea, Botrytis cinerea Allii), a genus of Botrytis causing leaf blight caused by Botrytis cinerea (Botrytis squamosa, Botrytis byssoidea, Botrytis tulipae); such as Fusarium graminearum, Cucumber (Fusarium oxysporum) of the genus Fusarium, Pyricularia oryzae, Pyricularia; such as Cercospora beticola , Cercospora genus of Cercospora kakivola; Colletotrichum genus such as Colletotrichum orbiculare; such as Alternaria alternata apple pathotype, pear Alternaria alternata Japanese pear pathotype, potato early blight or Alternaria solani, cabbage or Alternaria brassicae, Alternaria brassicola, onion or onion (Alternaria porri) of the genus Alternaria; such as the genus Phoma genus of Phoma lingam; for example, Pseudocercosporella of Pseudocercosporella herpotrichoides Such as Pseudocercospora vitis Pseudocercospora genus; Rhynchosporium secalis Rhynchosporium genus; such as Cladosporium carpophilum Cladosporium carpophilum (Cladosporium) genus; such as Phomopsis sp. Such as Gloeosporium kaki, Gloeosporium; such as Fulvia fulva; Fulvia; such as the rod of Corynespora cassiicola Corynespora genus and the like.
本發明化合物由於可防除前述之各種有害菌類,故可預防性或治療性防除各種病害。尤其是本發明化合物對於農園藝領域成為問題的各種病害,例如對梨孢菌導致之稻瘟病、鐮孢菌導致之馬鹿苗病、旋孢腔菌導致之芝麻斑病、絲核菌導致之紋枯病等之稻之病害;白粉菌導致之白粉病、鐮孢菌導致之赤黴病或冠腐病、柄銹菌導致之銹病、腐霉菌導致之褐色雪腐病、黑粉菌導致之裸黑穗病、假小尾孢黴菌導致之眼紋病、殼針孢菌導致之葉枯病或穎枯病等之麥類之病害;鐮孢菌導致之赤黴病、暗球腔菌導致之斑點病、柄銹菌導致之銹病、Setosphaeria菌導致之煤紋病、旋孢腔菌導致之芝麻斑病、腐霉菌導致之根腐病、黑粉菌導致之黑穗病等之玉米之病害;黑粉菌導致之黑穗病、殼多孢菌導致之葉燒病、柄銹菌導致之銹病、赤黴菌導致之梢頭腐敗病、Caldariomyces菌導致之煙塵病、假尾孢菌導致之葉枯病等之甘蔗之病害等之稻科作物之病害;卵黴菌導致之白粉病、層銹菌導致之銹病、墓蔔露菌病菌導致之霜霉病、疫病菌導致之疫病、炭疽刺盤孢菌導致之炭疽病、核盤菌導致之菌核病、葡萄孢菌導致之灰黴病、鐮孢菌導致之根腐病或立枯病等之豆科作物之病害;鐮孢菌導致之枯萎病、墓蔔露菌病菌導致之霜霉病、鏈隔孢菌導致之黑斑病、莖點霉菌導致之根朽病等之十字花科作物之病害;盤梗黴菌導致之霜霉病、疫病菌導致之疫病、葡萄孢菌導致之灰黴病、核盤菌導致之菌核病、銹孢銹菌導致之銹病等之菊科作物之病害;鏈隔孢菌導致之輪紋病、葉黴病菌導致之葉黴病、疫病菌導致之疫病、葡萄孢菌導致之灰黴病、卵黴菌導致之白粉病、鐮孢菌導致之萎凋病、假尾孢菌導致之煤鰴病等之蕃茄之病害;鏈隔孢菌導致之早疫病、疫病菌導致之疫病、核盤菌導致之菌核病、鐮孢菌導致之乾腐病等之馬鈴薯之病害等之茄科作物之病害;炭疽刺盤孢菌導致之炭疽病、草單囊殼菌導致之白粉病、亞隔孢殼(Didymella)菌導致之藤枯病、露菌病菌導致之霜霉病、疫病菌導致之疫病、棒狀桿孢菌導致之褐斑病、鐮孢菌導致之鶴見病等之葫蘆科作物之病害;墓蔔露菌病菌導致之霜霉病、疫病菌導致之疫病、葡萄孢菌導致之灰黴病、核盤菌導致之菌核病、柄銹菌導致之銹病等之蔥科作物之病害;鏈隔孢菌導致之黑葉枯病或黑斑病、葡萄孢菌導致之灰黴病、核盤菌導致之菌核病、白粉菌導致之白粉病、尾孢菌導致之斑點病等之繖形科作物之病害;葡萄孢菌導致之葉枯病、疫病菌導致之疫病、擬莖點黴菌導致之莖枯病等之百合科作物之病害;墓蔔露菌病菌導致之霜霉病、白粉菌導致之白粉病、絲核菌導致之立枯病等之蓼科作物之病害;鐮孢菌導致之鶴見病、長喙黴菌導致之黑斑病、鏈黴菌導致之立枯病等之旋花科作物之病害;墓蔔露菌病菌導致之霜霉病、疫病菌導致之疫病、葡萄孢菌導致之灰黴病、核盤菌導致之菌核病、卵黴菌導致之白粉病、尾孢菌導致之褐斑病等之藜科作物之病害;痂囊腔菌導致之黑痘病、炭疽刺盤孢菌導致之晩腐病、白粉菌導致之白粉病、單軸黴菌導致之霜霉病、葡萄孢菌導致之灰黴病、假尾孢菌導致之褐斑病、胴枯病菌導致之科膨病等之葡萄科作物之病害;草單囊殼菌導致之白粉病、葡萄孢菌導致之灰黴病、炭疽刺盤孢菌導致之炭疽病、鐮孢菌導致之乾腐病等之草莓之病害;鏈核盤菌導致之念珠菌病、絲單囊殼菌導致之白粉病、鏈隔孢菌導致之斑點落葉病、黑星菌導致之黑星病、炭疽刺盤孢菌導致之炭疽病、褐斑病菌導致之褐斑病、葡萄座腔菌導致之輪紋病、接瓶黴菌導致之煤點病、黏孢殼菌(Gloeodes)導致之煤斑病、球腔菌導致之黑點病等之蘋果之病害;黑星菌導致之黑星病、鏈隔孢菌導致之黑斑病、球針殼菌導致之白粉病、疫病菌導致之疫病、鐮孢菌導致之果實腐敗病等之梨類之病害;鏈核盤菌導致之灰色病、枝孢菌導致之黑星病、擬莖點黴菌導致之擬莖點黴腐敗病等之桃之病害等之薔薇科作物之病害;胴枯病菌導致之黑點病、痂囊腔菌導致之瘡痂病、鐮孢菌導致之鐮孢立枯病等之柑橘之病害等之芸香科作物之病害;盤長孢黴菌導致之炭疽病、尾孢菌導致之落葉病、球針殼菌導致之白粉病、接瓶黴菌導致之煤點病等之柿樹科作物之病害;炭疽刺盤孢菌導致之炭疽病、擬盤多毛孢菌導致之輪斑病、假單胞菌導致之赤燒病、山茶菌導致之餅病等之山茶花科作物之病害;等之植物病害的防除為有效。
又,對鐮孢菌導致之赤黴病或冠腐病、炭疽刺盤孢菌導致之炭疽病、腥黑粉菌導致之腥黑穗病、黑粉菌導致之裸黑穗病、頭芽胞菌導致之條斑病、殼針孢菌導致之穎枯病等之麥類之病害;雙孔孢菌導致之芝麻斑病、炭疽刺盤孢菌導致之炭疽病、鐮孢菌導致之苗立枯病等之玉米之病害;炭疽刺盤孢菌導致之赤腐病、長喙黴菌導致之黑腐病、 指梗黴菌導致之霜霉病等之甘蔗之病害等之稻科作物之病害;尾孢菌導致之紫斑病、墓蔔露菌病菌導致之霜霉病、鐮孢菌導致之立枯病、殼針孢菌導致之褐紋病、胴枯病菌導致之黑點病、炭疽刺盤孢菌導致之炭疽病、Septogloeum菌導致之昏睡病等之大豆之病害等之豆科作物之病害;鏈隔孢菌 蕓苔屬真菌導致之黑斑病、鏈隔孢菌 鏈隔孢菌導致之黑煙病、墓蔔露菌病菌導致之霜霉病、假單胞菌導致之黑斑細菌病、黃單胞菌導致之黑腐病、莖點霉菌導致之根朽病等之甘藍之病害;鏈隔孢菌導致之黑斑病、鐮孢菌導致之枯萎病、黃單胞菌導致之黑腐病等之蘿蔔之病害;鏈隔孢菌導致之黑斑病、黃單胞菌導致之黑腐病、輪黴菌導致之黃化病等之白菜之病害等之十字花科作物之病害;鏈隔孢菌導致之輪紋病、棒桿菌導致之潰瘍病、黃單胞菌導致之斑點細菌病等之蕃茄之病害;鏈隔孢菌導致之褐斑病、擬莖點黴菌導致之褐紋病等之茄子之病害;鏈黴菌導致之瘡痂病、長蠕孢黴菌導致之銀痂病、馬鈴薯粉痂菌(Spongospora)導致之粉狀瘡痂病等之馬鈴薯之病害等茄科作物之病害;鏈隔孢菌導致之黑斑病、假單胞菌導致之斑點細菌病、黃單胞菌導致之褐斑細菌病等之黃瓜之病害等之葫蘆科作物之病害;鏈隔孢菌導致之黑斑病、葡萄孢菌導致之灰腐病或菌絲性腐敗病、鐮孢菌導致之乾腐病、墓蔔露菌病菌導致之霜霉病等之洋蔥之病害等之蔥科作物之病害;鏈隔孢菌導致之黑葉枯病或黑斑病、黃單胞菌導致之斑點細菌病;芹菜之殼針孢菌導致之葉枯病、核盤菌導致之菌核病、假單胞菌導致之葉枯細菌病等之紅蘿蔔之病害等之繖形科作物之病害;墓蔔露菌病菌導致之霜霉病、鐮孢菌導致之萎凋病、炭疽刺盤孢菌導致之炭疽病等之菠菜之病害等之藜科作物之病害;等之種子傳染性病害亦有效。
進而,對因鐮孢菌、腐霉菌、絲核菌、輪黴菌、根腫菌、根串珠黴菌等之有害菌類所引起之土壤病害的防除亦有效。Since the compound of the present invention can prevent various harmful fungi mentioned above, it can prevent or treat various diseases prophylactically or therapeutically. In particular, the compounds of the present invention are various diseases which are problematic in the field of agriculture and horticulture, such as rice blast caused by Pseudomonas, red deer caused by Fusarium, sesame spot caused by Helminthosporium, and sclerotia Diseases of rice such as blight; powdery mildew caused by powdery mildew, scab caused by Fusarium or crown rot, rust caused by rust fungus, brown snow rot caused by rot fungi, naked by black powder Head disease caused by smut, cephalosporin, leaf blight caused by Helminthosporium or blight, and scab caused by Fusarium oxysporum Disease caused by disease, rust caused by rust fungus, coal smut caused by Setosphaeria, sesame spot caused by Helminthosporium, root rot caused by Pythium, smut caused by smut, black smut; black Smut caused by smut, bursal disease caused by S. cerevisiae, rust caused by rust fungus, spoilage caused by Gibberella, dusty path caused by Caldariomyces, leaf blight caused by Pseudomonas aeruginosa, etc. Diseases of rice crops such as diseases of sugar cane; egg mold Powdery mildew caused by bacteria, rust caused by layer rust, downy mildew caused by toad bacillus, blight caused by Phytophthora, anthracnose caused by S. anthracis, Sclerotium caused by Sclerotinia, Grape Diseases of leguminous crops caused by spores, gray rot, root rot or blight caused by Fusarium; blight caused by Fusarium, downy mildew caused by tomb bacillus, spores Diseases caused by bacteria such as black spot disease, root disease caused by stem mold, etc.; downy mildew caused by mold, mildew caused by pathogens, gray mold caused by botrytis, nuclear disk The disease of the Compositae crop caused by the bacterium caused by the bacterium, the rust caused by the rust fungus, the rot disease caused by the bacillus, the leaf mold caused by the leaf mold, the blight caused by the pathogen, the Botrytis Caused by gray mold, powdery mildew caused by egg mold, wilt caused by Fusarium, coal rot caused by Pseudomonas aeruginosa; disease caused by early blight caused by bacteria and pathogen , Sclerotinia sclerotiorum caused by Sclerotinia sclerotiorum, dry rot caused by Fusarium Diseases of Solanaceae crops such as the disease of the potato; anthracnose caused by the genus Aspergillus, the powdery mildew caused by the Phytophthora capsici, the vine blight caused by the genus Didymella, and the bacterium Diseases caused by downy mildew, blight caused by Phytophthora, brown spot caused by Corynebacterium solani, and tsutake crops caused by Fusarium oxysporum; downy mildew and plague caused by toad bacillus Diseases caused by the disease, gray mold caused by Botrytis, sclerotinia caused by Sclerotinia, rust caused by rust fungus, etc.; black leaf blight or black spot caused by Alternaria , the disease of Umbelliferae caused by Botrytis cinerea, Sclerotinia sclerotiorum caused by Sclerotinia, Powdery mildew caused by powdery mildew, Spot disease caused by Cercospora; Bacterial blight caused by Botrytis Diseases caused by plague-causing bacteria, stem blight caused by Pseudomonas sp., etc.; downy mildew caused by toad bacillus, powdery mildew caused by powdery mildew, blight caused by Rhizoctonia The disease of the cockroach crop; the cockroach caused by Fusarium The disease caused by the black spot disease caused by bacteria, the buckwheat crop caused by Streptomyces; the downy mildew caused by the toadstool, the blight caused by the pathogen, the gray mold caused by the botrytis, the nucleus Diseases caused by sclerotium caused by sclerotium, powdery mildew caused by egg mold, brown spot disease caused by cercospora, etc.; black acne caused by sputum bacillus, phlegm caused by sputum Powdery mildew caused by powdery mildew, downy mildew caused by uniptery mildew, gray mold caused by Botrytis, brown spot caused by Pseudomonas aeruginosa, and grape planty caused by bacterial blight Diseases; the disease caused by powdery mildew caused by powdery mildew, the gray mold caused by Botrytis, the anthracnose caused by Fusarium oxysporum, the dry rot caused by Fusarium; the sclerotium Candidiasis, powdery mildew caused by S. monocytogenes, spotted deciduous disease caused by Alternaria alternata, black spot disease caused by black bacillus, anthracnose caused by S. anthracis, brown caused by brown spot Spot disease, ring disease caused by grapevine, and coal spots caused by mold , the disease caused by the coal leaf spot caused by Gloeodes, the black spot disease caused by the bacterium, the black spot disease caused by the black spot, the black spot caused by the bacillus, and the needle shell Pests caused by powdery mildew, blight caused by pathogens, fruit spoilage caused by Fusarium, etc.; gray disease caused by Sclerotinia sclerotiorum, black spot disease caused by Cladosporium, and Pseudomonas spp. a disease of a Rosaceae crop such as a peach disease such as a Pseudomonas sp., a black spot disease caused by a blight fungus, a scab caused by a sputum sac, a Fusarium blight caused by Fusarium, etc. Diseases of fragrant crops such as citrus diseases; anthracnose caused by Helminthosporium, deciduous disease caused by Cercospora, powdery mildew caused by Phytophthora, and coal oleracea caused by mold The disease of the crop; the anthracnose caused by the genus Anthraquinone, the rot disease caused by the genus Trichosporon, the red burning caused by Pseudomonas, the cake caused by the Camellia, etc.; The control of plant diseases is effective.
In addition, scab caused by Fusarium or crown rot, anthracnose caused by Fusarium oxysporum, smut caused by black powder fungus, naked smut caused by smut, black bacillus The disease caused by the leaf spot disease, the blight caused by the genus Aspergillus, the sesame spot caused by the genus Helminthosporium, the anthracnose caused by the genus Aspergillus, and the seedlings caused by Fusarium Diseases of corn such as diseases; diseases of rice crops such as red rot caused by Phytophthora anthracis, black rot caused by moldy mold, and downy mildew caused by Phytophthora; Purple spot disease caused by bacteria, downy mildew caused by toadstool bacteria, blight caused by Fusarium, brown streak caused by Helminthosporium, black spot caused by Fusarium oxysporum, Diseases of legumes caused by the diseases of soybeans such as anthracnose, sleeping sickness caused by Septogloeum bacteria; black spot caused by the fungus Brassica fungus, black smoke caused by Alternaria alternata Disease, toadstool caused by downy mildew, black spot bacterial disease caused by Pseudomonas, Xanthomonas The disease caused by black rot, root disease caused by stem mold, radish caused by bacillus, black spot caused by Fusarium, blight caused by Fusarium, black rot caused by Xanthomonas Diseases; diseases of cruciferous crops such as black spot disease caused by Alternaria, black rot caused by Xanthomonas, yellow cabbage caused by fungus, etc.; Diseases of tomatoes such as ring rot, ulcer disease caused by Corynebacterium, spotted bacterial disease caused by Xanthomonas; disease of eggplant caused by brown spot disease caused by Alternaria alternata, brown streak caused by Pseudomonas spp. Diseases of Solanaceae crops caused by Streptomyces caused by Streptomyces, Mycelium caused by Fusarium oxysporum, Powdery sores caused by Spongospora, and blacks caused by Alternaria Diseases of Cucurbitaceae crops such as spot disease, spotted bacterial disease caused by Pseudomonas, brown spot bacterial disease caused by Xanthomonas, etc.; Black spot caused by Alternaria alternata, Botrytis Gray rot or mycelial spoilage, dry rot caused by Fusarium Diseases of onion crops such as onion diseases caused by downy mildew pathogens; black leaf blight or black spot disease caused by A. oxysporum, spotted bacterial disease caused by Xanthomonas; celery Diseases of Umbelliferae such as leaf blight caused by Phytophthora, Sclerotinia sclerotiorum caused by Sclerotinia, Carrot bacteria caused by Pseudomonas, etc.; The disease caused by downy mildew, the wilt caused by Fusarium, the disease of spinach such as anthracnose caused by Fusarium oxysporum, etc.; and the seed infectious disease is also effective.
Further, it is effective to prevent soil diseases caused by harmful fungi such as Fusarium, Pythium, Rhizoctonia, Fungi, Rhizopus, and Rhizomus.
作為可從各種有害菌類藉由本發明來保護之植物,若為農業上有用者,雖並未特別限制,但例如可列舉稻科作物(稻、小麥、大麥、燕麥、黑麥、玉米、甘蔗等)、豆科作物(大豆、菜豆、紅豆等)、十字花科作物(甘藍、白菜、蘿蔔、蕪菁、青花菜、花椰菜、油菜花、油菜等)、菊科作物(萵苣、牛蒡、春菊等)、茄科作物(馬鈴薯、茄子、蕃茄、青椒、煙草等)、葫蘆科作物(黃瓜、南瓜、甜瓜、西瓜等)、蔥科作物(蔥、韭菜、薤、大蒜等)、繖形科作物(芹菜、紅蘿蔔、香菜等)、百合科作物(百合、鬱金香、蘆筍等)、蓼科(蕎麥等)、旋花科(甘藷等)、藜科作物(菠菜、甜菜等)、葡萄科作物(葡萄等)、薔薇科作物(玫瑰、草莓、蘋果、梨、桃、枇杷、杏仁等)、芸香科作物(蜜柑、檸檬、橙等)、柿樹科作物(柿子等)、山茶花科作物(茶等)、木犀科作物(橄欖、茉莉花等)、錦葵科作物(棉花,可可,秋葵等)、芭蕉科作物(香蕉等)、薑科作物(薑等)、茜草科作物(咖啡樹等)或鳳梨科作物(鳳梨、鳳梨(Ananas)等)。The plant which can be protected by the present invention from various harmful fungi is not particularly limited as long as it is agriculturally useful, and examples thereof include rice crops (rice, wheat, barley, oats, rye, corn, sugar cane, etc.). ), legume crops (soybeans, kidney beans, red beans, etc.), cruciferous crops (cabbage, cabbage, radish, turnip, broccoli, broccoli, rape, rape, etc.), compositae (lettuce, burdock, chrysanthemum, etc.) , Solanaceae crops (potato, eggplant, tomatoes, green peppers, tobacco, etc.), Cucurbitaceae crops (cucumber, pumpkin, melon, watermelon, etc.), onion crops (onions, leeks, alfalfa, garlic, etc.), Umbelliferous crops ( Celery, carrots, parsley, etc.), lily crops (lilies, tulips, asparagus, etc.), medlar (buckwheat, etc.), Convolvulaceae (sweet potato, etc.), sorghum crops (spinach, beets, etc.), grape crops ( Grapes, etc., Rosaceae crops (roses, strawberries, apples, pears, peaches, alfalfa, almonds, etc.), Rutaceae crops (citrus, lemon, orange, etc.), persimmon crops (persimmons, etc.), Camellia crops (tea Etc., Oleaceae crops (olive, jasmine, etc.), Kwai crops (cotton, cocoa, okra, etc.), musa crops (bananas, etc.), ginger crops (ginger, etc.), valerian crops (coffee trees, etc.) or bromeliad crops (banai, pineapple (Ananas), etc.) .
又,本發明化合物相對於苯并咪唑、甲氧基丙烯酸酯(Strobilurin)、二甲醯亞胺、苯基醯胺、麥角固醇生合成阻害劑等之藥劑的各種抵抗性有害菌類的防除亦有效。Further, the compound of the present invention is resistant to various harmful harmful fungi of the agents such as benzimidazole, styrene, dimethyl sulfoxide, phenyl decylamine, ergosterol biosynthesis inhibitor, and the like. Also effective.
進而,本發明化合物由於具有優異之滲透傳遞性,故可藉由將含有本發明化合物之農園藝用殺菌劑施用在土壤,與土壤中之有害菌類的防除同時,亦防除莖葉部之有害菌類。Further, since the compound of the present invention has excellent osmotic transfer property, the agricultural and horticultural fungicide containing the compound of the present invention can be applied to the soil, and the harmful fungi in the soil can be prevented, and the harmful fungi of the stem and leaf portions can be prevented. .
本發明化合物通常雖可混合本發明化合物與各種農業上之輔助劑,製劑成粉劑、粒劑、顆粒可濕性粉劑、可濕性粉劑、水性懸濁劑、油性懸濁劑、水溶劑、乳劑、液劑、糊劑、氣霧劑、微量散布劑等之各種形態使用,但只要能適合本發明的目的,可成為於通常之該領域使用之所有製劑形態。作為製劑所使用之輔助劑,可列舉矽藻土、熟石灰、碳酸鈣、滑石、白碳、高嶺土、膨潤土、高嶺石及絹雲母之混合物、黏土、碳酸鈉、碳酸氫鈉、芒硝、沸石、澱粉等之固型載體;水、甲苯、二甲苯、溶劑石腦油、二噁烷、丙酮、異佛爾酮、甲基異丁基酮、氯苯、環己烷、二甲基亞碸、N,N-二甲基甲醯胺、二甲基乙醯胺、N-甲基-2-吡咯烷酮、醇等之溶劑;如脂肪酸鹽、苯甲酸鹽、烷基磺基琥珀酸鹽、二烷基磺基琥珀酸鹽、聚羧酸鹽、烷基硫酸酯鹽、烷基硫酸鹽、烷基芳基硫酸鹽、烷基二甘醇醚硫酸鹽、醇硫酸酯鹽、烷基磺酸鹽、烷基芳基磺酸鹽、芳基磺酸鹽、木質素磺酸鹽、烷基二苯基醚二磺酸鹽、聚苯乙烯磺酸鹽、烷基磷酸酯鹽、烷基芳基磷酸鹽、苯乙烯基芳基磷酸鹽、聚氧乙烯烷基醚硫酸酯鹽、聚氧乙烯烷基芳基醚硫酸鹽、聚氧乙烯烷基芳基醚硫酸酯鹽、聚氧乙烯烷基醚磷酸鹽、聚氧乙烯烷基芳基磷酸酯鹽、萘磺酸福爾馬林縮合物的鹽之陰離子系的界面活性劑或展著劑;如山梨糖醇脂肪酸酯、甘油脂肪酸酯、脂肪酸聚甘油酯、脂肪酸醇聚甘醇醚、乙炔二醇、乙炔醇、氧化烯嵌段聚合物、聚氧乙烯烷基醚、聚氧乙烯烷基芳基醚、聚氧乙烯苯乙烯基芳基醚、聚氧乙二醇烷基醚、聚乙二醇、聚氧乙烯脂肪酸酯、聚氧乙烯山梨糖醇脂肪酸酯、聚氧乙烯甘油脂肪酸酯、聚氧乙烯硬化蓖麻油、聚氧丙烯脂肪酸酯之非離子系的界面活性劑或展著劑;橄欖油、木棉油、蓖麻油、棕櫚油、山茶油、椰子油、芝麻油、玉米油、米糠油、花生油、棉籽油、大豆油、菜子油、亞麻子油、桐油、液狀石蠟等之植物油或礦物油等。此等輔助劑之各成分只要不偏離本發明的目的,可適當選擇1種或2種以上使用。又,除了前述之輔助劑以外,亦可從於該領域所知悉者當中適當選擇使用,例如亦可使用增量劑、增黏劑、防止沉澱劑、防凍劑、分散安定劑、防護劑、防黴劑等通常所使用之各種輔助劑。本發明化合物與各種輔助劑的摻合比例為0.001:99.999~95:5,期望為0.005:99.995~90:10。於此等製劑實際之使用時,可直接使用,或以水等之稀釋劑稀釋成指定濃度,如有必要可添加各種展著劑(界面活性劑、植物油、礦物油等)使用。The compound of the present invention can be usually mixed with the compound of the present invention and various agricultural adjuvants, and is formulated into a powder, a granule, a granule wettable powder, a wettable powder, an aqueous suspension, an oily suspension, an aqueous solvent, an emulsion. Although various forms such as a liquid preparation, a paste, an aerosol, and a microdispersion agent are used, any formulation form which is generally used in the field can be used as long as it can be suitably used for the purpose of the present invention. Examples of the adjuvant used in the preparation include diatomaceous earth, slaked lime, calcium carbonate, talc, white carbon, kaolin, bentonite, kaolinite and sericite mixture, clay, sodium carbonate, sodium hydrogencarbonate, thenardite, zeolite, and starch. Solid carrier; water, toluene, xylene, solvent naphtha, dioxane, acetone, isophorone, methyl isobutyl ketone, chlorobenzene, cyclohexane, dimethyl hydrazine, N a solvent such as N-dimethylformamide, dimethylacetamide, N-methyl-2-pyrrolidone, or an alcohol; for example, a fatty acid salt, a benzoate, an alkyl sulfosuccinate, a dioxane Sulfosuccinate, polycarboxylate, alkyl sulfate, alkyl sulfate, alkyl aryl sulfate, alkyl diglycol ether sulfate, alcohol sulfate, alkyl sulfonate, Alkyl aryl sulfonate, aryl sulfonate, lignosulfonate, alkyl diphenyl ether disulfonate, polystyrene sulfonate, alkyl phosphate salt, alkyl aryl phosphate Styryl aryl phosphate, polyoxyethylene alkyl ether sulfate salt, polyoxyethylene alkyl aryl ether sulfate, polyoxyethylene alkyl aryl An anionic surfactant or spreading agent of a sulfate salt, a polyoxyethylene alkyl ether phosphate, a polyoxyethylene alkyl aryl phosphate, a salt of a formalin condensate of naphthalene sulfonate; such as sorbose Alcohol fatty acid esters, glycerin fatty acid esters, fatty acid polyglycerides, fatty acid alcohol polyglycol ethers, acetylene glycols, acetylene alcohols, alkylene oxide block polymers, polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl groups Ether, polyoxyethylene styryl aryl ether, polyoxyethylene glycol alkyl ether, polyethylene glycol, polyoxyethylene fatty acid ester, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene glycerin fatty acid ester Polyoxyethylene hardened castor oil, nonionic surfactant or spreading agent of polyoxypropylene fatty acid ester; olive oil, kapok oil, castor oil, palm oil, camellia oil, coconut oil, sesame oil, corn oil, Vegetable oil or mineral oil such as rice bran oil, peanut oil, cottonseed oil, soybean oil, rapeseed oil, linseed oil, tung oil, liquid paraffin, and the like. The components of the above-mentioned auxiliary agents can be used singly or in combination of two or more kinds as long as they do not deviate from the object of the present invention. Further, in addition to the aforementioned adjuvants, it may be appropriately selected from those known in the art, for example, an extender, a tackifier, a precipitant, an antifreeze, a dispersion stabilizer, a protective agent, and an anti-fouling agent may also be used. A variety of adjuvants commonly used for molds and the like. The blending ratio of the compound of the present invention and various adjuvants is from 0.001:99.999 to 95:5, and is desirably from 0.005:99.995 to 90:10. When the preparations are actually used, they may be used as they are, or diluted with a diluent such as water to a specified concentration, and if necessary, various spreading agents (surfactants, vegetable oils, mineral oils, etc.) may be added.
本發明化合物之施用雖因氣象條件、製劑形態、對象作物、施用時期、施用場所、有害菌類的種類或發生狀況、病害的種類或發生狀況等之不同,無法一概規定,但一般而言,於莖葉處理的情況可以0.1~10,000ppm,期望為1~2,000ppm的有效成分濃度施用,其施用適量每1公頃之本發明化合物可成為0.1~50,000g,期望為1~30,000g左右。土壤處理的情況,一般而言,可將每1公頃之本發明化合物施用10~100,000g,期望為200~20,000g。種子處理的情況,一般而言,可將種子每1kg之本發明化合物施用0.001~10g,期望為0.01~1g。The application of the compound of the present invention cannot be generally prescribed due to meteorological conditions, formulation form, target crop, application period, application site, type or occurrence of harmful fungi, type of disease or occurrence state, but generally speaking, The stem and leaf treatment may be applied in an amount of 0.1 to 10,000 ppm, and is desirably 1 to 2,000 ppm, and the compound of the present invention may be used in an amount of 0.1 to 50,000 g per 1 hectare, and desirably about 1 to 30,000 g. In the case of soil treatment, generally, from 1 to 100,000 g, preferably from 200 to 20,000 g, per 1 hectare of the compound of the present invention can be applied. In the case of seed treatment, in general, the seed may be administered in an amount of 0.001 to 10 g per 1 kg of the compound of the present invention, and desirably 0.01 to 1 g.
本發明化合物之各種製劑或其稀釋物的施用,通常為一般所進行之施用方法,亦即,可藉由散布(例如散布、噴霧、墨霧(Misting)、霧化(Atomizing)、散粒、水面施用等)、土壤施用(混入、灌注等)、表面施用(塗布、粉衣、被覆等)等進行。又,亦可藉由所謂超高濃度少量散布法(ultra low volume)施用。在此方法,可含有100%之活性成分。Administration of various formulations of the compounds of the invention, or dilutions thereof, is generally the usual method of administration, that is, by dispersion (eg, dispersion, spray, misting, atomizing, loosening, Water surface application, etc.), soil application (mixing, infusion, etc.), surface application (coating, powder coating, coating, etc.), etc. Alternatively, it can be applied by a so-called ultra low volume. In this method, it may contain 100% of the active ingredient.
本發明化合物可與其他農藥、肥料、防護劑等混用或併用,此情況下有時會顯示更為優異之效果、作用性。作為其他農藥,可列舉除草劑、殺蟲劑、殺蟎劑、殺線蟲劑、殺土壤害蟲劑、殺菌劑、抗病毒劑、引誘劑、抗生物質、植物激素、植物成長調整劑等。尤其是混用或併用本發明化合物、與其他殺菌性有效成分化合物之1種或2種以上的混合殺菌性組成物,有將適用範圍、藥劑處理之時期、防除活性等往較佳之方向改良的情況。尚,本發明化合物與其他殺菌劑的有效成分化合物,即使每個分別製劑者於散布時混合進行使用,亦可將兩者一起製劑來使用。本發明中亦包含這般之混合殺菌性組成物。The compound of the present invention can be used in combination with other pesticides, fertilizers, protective agents, and the like, and in some cases, it may exhibit more excellent effects and workability. Examples of other pesticides include herbicides, insecticides, acaricides, nematicides, soil-killing insecticides, bactericides, antiviral agents, attractants, antibiotics, plant hormones, plant growth regulators, and the like. In particular, a mixed bactericidal composition of one or more of the compounds of the present invention and other bactericidal active ingredient compounds may be used in combination, and the application range, the period of the drug treatment, and the control activity may be improved in a preferred direction. . Further, the compound of the present invention and the active ingredient compound of the other bactericidal agent may be used in combination if they are used by mixing each of the separate preparations. The mixed bactericidal composition as described above is also included in the present invention.
本發明化合物與其他殺菌性有效成分化合物的混合比,雖因氣象條件、製劑形態、對象作物、施用時期、施用場所、有害菌類的種類或發生狀況、病害的種類或發生狀況等之不同無法一概規定,但一般而言可成為1:300~300:1,期望為1:100~100:1。又,作為施用適量每1公頃之總有效成分化合物量,可成為0.1~70,000g,期望為1~30,000g。本發明中,亦包含藉由這般之混合殺菌性組成物的施用之植物病害的防除方法。The mixing ratio of the compound of the present invention and other bactericidal active ingredient compounds may not be uniform due to meteorological conditions, formulation form, target crop, application period, application site, type or occurrence of harmful fungi, type of disease, or occurrence state. The regulation is generally 1:300 to 300:1, and is expected to be 1:100 to 100:1. Further, the amount of the total active ingredient compound per one hectare applied may be 0.1 to 70,000 g, and preferably 1 to 30,000 g. In the present invention, a method of controlling plant diseases by application of such a mixed bactericidal composition is also included.
通過本發明化合物的施用,亦可進一步合併其他農藥例如殺菌劑、殺蟲劑、殺蟎劑、殺線蟲劑、殺土壤害蟲劑、抗病毒劑、引誘劑、除草劑、植物生長調整劑等來處理。By the application of the compound of the present invention, other pesticides such as fungicides, insecticides, acaricides, nematicides, soil-killing agents, antiviral agents, attractants, herbicides, plant growth regulators, etc. may be further combined. deal with.
作為上述其他農藥中之殺菌劑的有效成分化合物(一般名或日本植物防疫協會試驗代碼),例如可從下述之化合物群組中適當選擇。即使是並未特別記載的情況,於此等化合物存在如鹽、烷基酯、光學同分異構物之各種構造同分異構物等時,當然亦包含該等。
如嘧菌胺(mepanipyrim)、嘧黴胺(pyrimethanil)、嘧菌環胺(cyprodinil)之苯胺基嘧啶系化合物;
如滅脫定(ametoctradin)之三唑并嘧啶(Triazolopyrimidine)系化合物;
如氰啶胺(fluazinam)之吡啶胺系化合物;
如三泰芬(triadimefon)、比多農(bitertanol)、氟菌唑(triflumizole)、乙環唑(etaconazole)、丙環唑(propiconazole)、戊菌唑(penconazole)、氟矽唑(flusilazole)、邁克尼(myclobutanil)、環克唑(cyproconazole)、戊唑醇(tebuconazole)、己唑醇(hexaconazole)、順呋醚唑(furconazole-cis)、咪鮮安(prochloraz)、滅特唑(metconazole)、氟環唑(epoxiconazole)、氟醚唑(tetraconazole)、反丁烯二酸噁咪唑(oxpoconazole fumarate)、丙硫菌唑(prothioconazole)、三唑醇(triadimenol)、粉唑醇(flutriafol)、苯醚甲環唑(difenoconazole)、氟喹唑(fluquinconazole)、腈苯唑(fenbuconazole)、糠菌唑(bromuconazole)、烯唑醇(diniconazole)、三環唑(tricyclazole)、矽氟唑(simeconazole)、稻瘟酯(pefurazoate)、種菌唑(ipconazole)、醯胺唑(imibenconazole)、阿扎康唑(azaconazole)、環菌唑(triticonazole)、依滅列(imazalil)、ipfentrifluconazole、氯氟醚菌唑(mefentrifluconazole)之唑系化合物;
如灰蟎猛(quinomethionate)之喹喔啉系化合物;
如代森猛(maneb)、代森鋅(zineb)、代森錳鋅(mancozeb)、聚胺基甲酸酯(polycarbamate)、代森聯(metiram)、丙森鋅(propineb)、福美雙(thiram)之二硫代胺基甲酸酯系化合物;
如四氯苯酞(fthalide)、四氯異苯(chlorothalonil)、五氯硝基苯(quintozene)之有機氯系化合物;
如苯菌靈(benomyl)、甲基硫菌靈(thiophanate-methyl)、多菌靈(carbendazim)、噻菌靈(thiabendazole)、弗貝唑(fuberiazole)之咪唑系化合物;
如霜脲氰(cymoxanil)之氰基乙醯胺系化合物;
如甲霜靈(metalaxyl)、甲霜靈-M(metalaxyl-M;別名精甲霜靈(mefenoxam))、悉霜靈(oxadixyl)、甲呋醯胺(ofurace)、苯霜靈(benalaxyl)、精苯霜靈(benalaxyl-M、別名可瑞西(kiralaxyl、chiralaxyl))、呋霜靈(furalaxyl)、伐利芬(valifenalate)之醯基胺基酸系化合物;
如酯菌胺(cyprofuram)、萎銹靈(carboxin)、氧化萎銹靈(oxycarboxin)、噻呋醯胺(thifluzamide)、啶醯菌胺(boscalid)、環醯菌胺(fenhexamid)、異噻菌胺(isotianil)、噻醯菌胺(tiadinil)、吡瑞氟密得(Pyraziflumid)之苯胺系化合物;
如苯氟醯胺(dichlofluanid)之磺醯胺系化合物;
如氫氧化銅(cupric hydroxide)、有機銅(oxine copper) 、無水硫酸銅、壬基酚磺酸銅、8-羥基喹啉銅、十二烷基苯磺酸雙乙二胺銅絡鹽(II)(別名DBEDC)之銅系化合物;
如疫霜靈鋁(fosetyl-Al)、甲基立枯磷(tolclofos-methyl)、護粒松(edifenphos)、異稻瘟淨(iprobenfos)之有機磷系化合物;
如克菌丹(captan)、四氯丹(captafol)及滅菌丹(folpet)之鄰苯二甲醯亞胺系化合物;
如二甲菌核利(procymidone)、異菌脲(iprodione)、乙烯菌核利(vinclozolin)之二碳二亞胺系化合物;
如福多寧(flutolanil)、滅普寧(mepronil)、麥鏽靈(benodanil)之苯甲醯苯胺系化合物;
如環丙醯菌胺(carpropamid)、雙氯氰菌胺(diclocymet)、矽噻菌胺(silthiopham)、氰菌胺(fenoxanil)之醯胺系化合物;
如苯并烯氟菌唑(benzovindiflupyr)、比沙吩(bixafen)、氟茚唑菌胺(fluindapyr)、氟唑菌醯胺(fluxapyroxad)、福拉比(furametpyr)、吡唑萘菌胺(isopyrazam)、戊苯吡菌胺(penflufen)、吡噻菌胺(penthiopyrad)、氟唑菌醯羥胺(pydiflumetofen)、環丙吡菌胺(sedaxane)、isoflucypram、inpyrfluxam、吡瑞普尼(pyrapropoyne)之吡唑羧醯胺系化合物;
如氟吡菌胺(fluopicolide)、氟吡菌醯胺(fluopyram)、座賽胺(zoxamide)、fluopimomide之苯并醯胺系化合物;
如甲呋醯胺(fenfuram)之糠苯胺(furanilide)系化合物;
如艾索非他滅(isofetamid)之噻吩醯胺系化合物;
如賽福寧(triforine)之哌嗪系化合物;
如比芬諾(pyrifenox)、啶菌唑(pyrisoxazole)、aminopyrifen之吡啶系化合物;
如氯苯嘧啶醇(fenarimol)、富米綜(ferimzone)、尼瑞莫(nuarimol)之嘧啶系化合物;
如苯銹啶(fenpropidin)之哌啶系化合物;
如丁基嗎啉(fenpropimorph)、十三嗎啉(tridemorph)之嗎啉系化合物;
如三苯基氫氧化錫(fentin hydroxide)、三苯基乙酸錫(fentin acetate)之有機錫系化合物;
如戊菌隆(pencycuron)之脲系化合物;
如烯醯嗎啉(dimethomorph)、氟嗎啉(flumorph)、丁吡嗎啉(pyrimorph)、丙森鋅(iprovalicarb)、苯噻菌胺(benthiavalicarb-isopropyl)、曼普胺(mandipropamid)之羧酸醯胺系化合物;
如乙黴威(diethofencarb)之苯基胺基甲酸酯(Carbamate)系化合物;
如咯菌腈(fludioxonil)、拌種咯(fenpiclonil)之氰基吡咯系化合物;
如嘧菌酯(azoxystrobin)、克收欣(kresoxim-methyl)、苯氧菌胺(metominostrobin)、三氟敏(trifloxystrobin)、啶氧菌酯(picoxystrobin)、肟醚菌胺(oryzastrobin)、嘧菌胺(dimoxystrobin)、百克敏(pyraclostrobin)、氟嘧菌酯(fluoxastrobin)、烯肟菌酯(Enestroburin)、唑菌酯(Pyraoxystrobin)、唑胺菌酯(Pyrametostrobin)、丁香菌酯(coumoxystrobin)、亞托敏(enoxastrobin)、烯肟菌胺(fenaminstrobin)、氟菌蟎酯(flufenoxystrobin)、氯啶菌酯(triclopyricarb)、滿得賓(mandestrobin)之甲氧基丙烯酸酯(Strobilurin)系化合物;
如噁唑菌酮(famoxadone)、奧賽普林(oxathiapiprolin)之噁唑啶酮系化合物;
如噻唑菌胺(ethaboxam)之噻唑羧醯胺系化合物;
如咪唑菌酮(fenamidone)之咪唑啉酮系化合物;
如磺菌胺(flusulfamide)之苯磺醯胺系化合物;
如環氟菌胺(cyflufenamid)之肟醚系化合物;
如腈硫醌(dithianon)之蒽醌系化合物;
如美啶卡(meptyldinocap)之巴豆酸系化合物;
如井岡黴素(validamycin)、嘉賜徵素(kasugamycin)、鏈黴素(streptomycin)、保粒黴素(polyoxins)之抗生物質;
如雙胍辛胺(iminoctadine)、多果定(dodine)之胍系化合物;
如特布弗喹(tebufloquin)、快諾芬(quinoxyfen)、quinofumelin、ipflufenoquin之喹啉系化合物;
如氟噻菌淨(flutianil)之四氫噻唑系化合物;
如鹽酸霜黴威(propamocarb hydrochloride)、吡本卡(pyribencarb)、托普洛卡(tolprocarb)之胺基甲酸酯(Carbamate)系化合物;
如皮卡布西(picarbutrazox)、metyltetraprole之四唑系化合物;
如唑磺菌胺(amisulbrom)、氰唑磺菌胺(cyazofamiid)之磺醯胺系化合物;
如苯菌酮(metrafenone)、哌瑞芬酮(pyriofenone)之烯丙基苯基酮系化合物;
如烯丙苯噻唑(probenazole)、二氯苯泰(dichlobentiazox)之苯并噻唑系化合物;
如胺苯吡菌酮(fenpyrazamine)之苯基吡唑系化合物;
如亞賜圃(isoprothiolane)之二硫戊環系化合物;
如fenpicoxamid、florylpicoxamid之甲吡啶醯胺系化合物;
如硫(Sulfur)、石灰硫劑之硫系化合物;
作為其他化合物,如咯喹酮(pyroquilon)、達菌清(diclomezine)、氯化苦(chloropicrin)、棉隆(dazomet)、威百畝(metam-sodium)、丙氧喹啉(proquinazid)、螺環菌胺(spiroxamine)、大芬滅替松(dipymetitrone)等;
如Bacillus amyloliqefaciens strain QST713、Bacillus amyloliqefaciens strain FZB24、Bacillus amyloliqefaciens strain MBI600、Bacillus amyloliqefaciens strain D747、Pseudomonas fluorescens、Bacillus subtilis、Trichoderma atroviride SKT-1之微生物殺菌劑;及如茶樹油(Tea tree oil)之植物萃取物。The active ingredient compound (general name or Japanese Plant Epidemic Prevention Association test code) which is a bactericide of the above-mentioned other pesticides can be suitably selected, for example, from the following group of compounds. Even if it is not specifically described, when such a compound has various structural isomers such as a salt, an alkyl ester or an optical isomer, it is of course included.
An anilinopyrimidine compound such as mepanipyrim, pyrimethanil or cyprodinil;
Such as amidocradin triazolopyrimidine compound;
a pyridylamine compound such as fluazinam;
Such as triadimefon, bitertanol, triflumizole, etaconazole, propiconazole, penconazole, flusilazole, Myclobutanil, cyproconazole, tebuconazole, hexaconazole, furconazole-cis, prochloraz, metconazole , epoxiconazole, tetraconazole, oxpoconazole fumarate, prothioconazole, triadimenol, flurifaol, benzene Difenoconazole, fluquinconazole, fenbuconazole, bromuconazole, diniconazole, tricyclazole, simeconazole, Pefurazoate, ipconazole, imibenconazole, azaconazole, triticonazole, imazalil, ipfentrifluconazole, flufenoxazole Mefentrifluconazole) azole compound;
Such as quinomethionate quinoxaline compound;
Such as maneb, zineb, mancozeb, polycarbamate, metiram, propineb, thiram ( Thiram) dithiocarbamate-based compound;
Such as tetrachlorophenyl fluorene (fthalide), chlorothalonil, quintozene organochlorine compounds;
Such as benomyl (beta), thiophanate-methyl, carbendazim, thiabendazole, fuberiazole imidazole compounds;
a cyanoacetamide compound such as cymoxanil;
Such as metalaxyl, metalaxyl-M (mefenoxam), oxadixyl, ofurace, benaxyl, a sulfhydryl acid compound of benazoxyl-M, kiralaxyl, chiralaxyl, furalaxyl, valifenalate;
Such as cyprofuram, carboxin, oxycarboxin, thifluzamide, boscalid, fenhexamid, isothiazem An aniline compound of the like, isotianil, tiadinil, Pyraziflumid;
a sulfonamide compound such as diflulofluanid;
Such as cupric hydroxide, oxine copper, anhydrous copper sulfate, copper nonylphenol sulfonate, copper hydroxyquinolate, dodecylbenzene sulfonic acid bisethylenediamine copper complex salt (II ) (alias DBEDC) copper compound;
Such as fosetyl-Al, tolclofos-methyl, edifenphos, iprobenfos organophosphorus compounds;
a phthalic acid imine compound such as captan, captafol and folpet;
Such as procymidone, iprodione, vinclozolin dicarbodiimide compound;
Such as flutolanil, mepronil, benodanil, benzanilide-based compounds;
Such as carpropamid, diclocymet, silthiopham, fenoxanil amide compound;
Such as benzovindiflupyr, bixafen, fluindapyr, fluxapyroxad, furametpyr, isopyrazam , penflufen, penthiopyrad, pydiflumetofen, sedaxane, isoflucypram, inpyrfluxam, pyrapropoyne pyrazole Carboxyamide compound;
Such as fluopicolide, fluopyram, zoxamide, fluopimomide benzoguanamine compounds;
a furanilide-based compound such as fenfuram;
a thiopheneamine compound such as isofetamid;
Such as the piperazine compound of triforine;
Such as pyrifenox, pyrisoxazole, aminopyrifen pyridine compounds;
Pyrimidine-based compounds such as fenarimol, ferimzone, and nuarimol;
a piperidine compound such as fenpropidin;
a morpholine-based compound such as fenpropimorph or tridemorph;
An organotin-based compound such as fentin hydroxide or fentin acetate;
a urea compound such as pencycuron;
Such as dimethomorph, flumorph, pyrimorph, iprovalicarb, benthiavalicarb-isopropyl, mandipropamid carboxylic acid Amidoxime compound;
Such as phenylcarbamate (Carbamate) compound of Diethofencarb;
a cyanopyrrole compound such as fludioxonil or fenpiclonil;
Such as azoxystrobin, kresoxim-methyl, metominostrobin, trifloxystrobin, picoxystrobin, oryzastrobin, azoxystrobin Amine (dimoxystrobin), pyraclostrobin, fluoxastrobin, Enestroburin, Pyraoxystrobin, Pyrametostrobin, coumoxystrobin, sub Enoxastrobin, fenaminstrobin, flufenoxystrobin, triclopyricarb, mandestrobin methoxy acrylate (Strobilurin) compound;
Such as famoxadone, oxathiapiprolin oxazolidinone compound;
a thiazole carboamide compound such as ethaboxam;
An imidazolinone compound such as fenamidone;
a benzenesulfonamide compound such as flusulfamide;
An oxime ether compound such as cyflufenamid;
An anthraquinone compound such as dithianon;
a crotonic acid compound such as meptyldinocap;
For example, anti-biomass of validamycin, kasugamycin, streptomycin, and polyoxins;
Such as guanidine (iminoctadine), dodine (dodine) lanthanide compounds;
Such as tebufloquin (tebufloquin), quinoxyfen, quinofumelin, ipflufenoquin quinoline compound;
Such as flutianil tetrahydrothiazole compound;
Such as propamocarb hydrochloride, pyrabencarb, tolprocarb carbamate compound;
Such as picarbutrazox, tetrazole compound of metyltetraprole;
a sulfonamide compound such as amisulbrom or cyazofamiid;
An allyl phenyl ketone compound such as metrafenone or pyrofenone;
Such as benzothiazole-based compounds of probenazole and dichlobentiazox;
a phenylpyrazole compound such as fenpyrazamine;
a dithiolane compound such as isoprothiolane;
Such as fenpicoxamid, florylpicoxamid, a pyridylamine compound;
Such as sulfur (Sulfur), sulfur-based sulfur compounds;
As other compounds, such as pyroquilon, diclomezine, chloropicrin, dazomet, metam-sodium, proquinazid, snail Spiroxamine, dipymetitrone, etc.;
Microbial bactericides such as Bacillus amyloliqefaciens strain QST713, Bacillus amyloliqefaciens strain FZB24, Bacillus amyloliqefaciens strain MBI600, Bacillus amyloliqefaciens strain D747, Pseudomonas fluorescens, Bacillus subtilis, Trichoderma atroviride SKT-1; and plant extracts such as tea tree oil .
作為上述其他農藥中之殺蟲劑、殺蟎劑、殺線蟲劑或殺土壤害蟲劑,亦即殺害蟲劑的有效成分化合物(一般名或日本植物防疫協會試驗代碼),例如可從下述之化合物群組中適當選擇。即使是並未特別記載的情況,於此等化合物存在如鹽、烷基酯、光學同分異構物之各種構造同分異構物等時,當然亦包含該等。
如佈飛松(profenofos)、二氯松(dichlorvos)、芬滅松(fenamiphos)、撲滅松(fenitrothion)、EPN((RS)-(O-ethyl O-4-nitrophenyl phenylphosphonothioate))、大利松(diazinon)、陶斯松(chlorpyrifos)、甲基毒死蜱(chlorpyrifos‐methyl)、歐殺松(acephate)、普硫松(prothiofos)、福賽絕(fosthiazate)、硫線磷(cadusafos)、二硫松(disulfoton)、加福松(isoxathion)、亞芬松(isofenphos)、乙硫磷(ethion)、益多松(etrimfos)、拜裕松(quinalphos)、二甲基乙烯磷(dimethylvinphos)、大滅松(dimethoate)、硫丙磷(sulprofos)、二甲硫吸磷(thiometon)、繁類松(vamidothion)、白克松(pyraclofos)、必芬松(pyridaphenthion)、嘧啶磷甲酯(pirimiphos-methyl)、丙蟲磷(propaphos)、裕必松(phosalone)、褔木松(formothion)、馬拉松(malathion)、四氯乙烯磷(tetrachlorvinphos)、克芬松(chlorfenvinphos)、殺螟腈(cyanophos)、三氯松(trichlorfon)、滅大松(methidathion)、賽達松(phenthoate)、異亞碸磷(oxydeprofos、別名ESP)、谷速松(azinphos-methyl)、芬殺松(fenthion)、庚烯磷(heptenophos)、氯化甲醇(methoxychlor)、帕若提(parathion)、磷蟲威(phosphocarb)、滅多松-S-甲酯(demeton-S-methyl)、亞速靈(monocrotophos)、達馬松(methamidophos)、依米塞松(imicyafos)、帕若提-甲酯(parathion-methyl)、托褔松(terbufos)、福賜米松(phosphamidon)、益滅松(phosmet)、褔瑞松(phorate)之有機磷酸酯系化合物;
如加保利(carbaryl)、安丹(propoxur)、得滅克(aldicarb)、加保扶(carbofuran)、硫敵克(thiodicarb)、納乃得(methomyl)、歐殺滅(oxamyl)、乙硫苯威(ethiofencarb)、比加普(pirimicarb)、丁基滅必蝨(fenobucarb)、丁基加保扶(carbosulfan)、免扶克(benfuracarb)、免敵克(bendiocarb)、呋線威(furathiocarb)、異丙威(isoprocarb)、治滅蝨(metolcarb)、滅爾蝨(xylylcarb)、XMC(3,5-xylyl methylcarbamate)、芬硫克(fenothiocarb)之胺基甲酸酯(Carbamate)系化合物;
如培丹(cartap)、硫賜安(thiocyclam)、硫賜安草酸鹽(thiocyclam oxalate)、硫賜安鹽酸鹽(thiocyclam hydrochloride)、免速達(bensultap)、殺蟲雙(thiosultap)、殺蟲單(monosultap;別名殺蟲雙單鈉(thiosultap-monosodium)、殺蟲雙(bisultap;別名殺蟲雙二鈉(thiosultap-disodium)、多噻烷(polythialan)之沙蠶毒素衍生物;
如大克蟎(dicofol)、四氯殺蟎碸(tetradifon)、安殺番(endosulufan)、得氯蟎(dienochlor)、特地靈(dieldrin)之有機氯系化合物;
如芬佈賜(fenbutatin oxide)、三環錫(cyhexatin)之有機金屬系化合物;
如芬化利(fenvalerate)、百滅靈(permethrin)、賽滅寧(cypermethrin)、α-賽滅寧(alpha-cypermethrin)、ζ-賽滅寧(zeta-cypermethrin)、θ-賽滅寧(theta-cypermethrin)、β-賽滅寧(beta-cypermethrin)、第滅靈(deltamethrin)、三氟氯氰菊酯(cyhalothrin)、γ-三氟氯氰菊酯(gamma-cyhalothrin)、λ-三氟氯氰菊酯(lambda-cyhalothrin)、七氟菊酯(tefluthrin)、κ-汰福寧(kappa-tefluthrin)、依芬寧(ethofenprox)、三氟醚菊酯(flufenprox)、氟氯氰菊酯(cyfluthrin)、β-氟氯氰菊酯(beta-cyfluthrin)、甲氰菊酯(fenpropathrin)、氟氰戊菊酯(flucythrinate)、氟氰胺菊酯(fluvalinate)、乙氰菊酯(cycloprothrin)、除蟲菊素(pyrethrins)、氰戊菊酯(esfenvalerate)、胺菊酯(tetramethrin)、苄呋菊酯(resmethrin)、普提芬布(protrifenbute)、畢芬寧(bifenthrin)、κ-畢芬寧(kappa-bifenthrin)、氟丙菊酯(acrinathrin)、丙烯菊酯(allethrin)、氟胺氰戊菊酯(tau-fluvalinate)、四溴菊酯(tralomethrin)、丙氟菊酯(profluthrin)、甲氧苄氟甲酯(metofluthrin)、甲氧苄氟菊酯單體(epsilon-metofluthrin)、七福司靈(heptafluthrin)、酚丁滅寧(phenothrin)、氯苯菊酯(flumethrin)、沒氟菊酯(momfluorothrin)、甲氧苄氟菊酯單體(epsilon-momfluorothrin)、氟矽菊酯(silafluofen)、右旋反式氯丙炔菊酯(chloroprallethrin)之除蟲菊酯系化合物;
如二福隆(diflubenzuron)、克福隆(chlorfluazuron)、得福隆(teflubenzuron)、氟芬隆(flufenoxuron)、祿芬隆(lufenuron)、諾伐隆(novaluron)、三褔隆(triflumuron)、六褔隆(hexaflumuron)、雙三氟蟲脲(bistrifluron)、諾唯褔隆(noviflumuron)、氟札隆(fluazuron)之苯甲醯基脲系化合物;
如美賜平(methoprene)、百利普芬(pyriproxyfen)、芬諾克(fenoxycarb)、二苯丙醚(diofenolan)之幼年激素類化合物;
如嗒蟎酮(pyridaben)之嗒嗪酮系化合物;
如芬普蟎(fenpyroximate)、芬普尼(fipronil)、乙蟲腈(ethiprole)、乙醯蟲腈(acetoprole)、吡蟲腈(pyrafluprole)、吡瑞蟲腈(pyriprole)、塞比芬(cyenopyrafen)、丁烯氟蟲腈(flufiprole)之吡唑系化合物;
如氟蟲雙醯胺(pyflubumide)、吡蟎胺(tebufenpyrad)、唑蟲醯胺(tolfenpyrad)之吡唑羧醯胺系化合物;
如氯蟲醯胺(chlorantraniliprole)、氰蟲醯胺(cyantraniliprole)、環溴蟲醯胺(cyclaniliprole)、氟氰蟲醯胺(tetraniliprole)、tyclopyrazoflor之吡啶基吡唑系化合物;
如益達胺(imidacloprid)、烯啶蟲胺(nitenpyram)、亞滅培(acetamiprid)、噻蟲啉(thiacloprid)、噻蟲嗪(thiamethoxam)、可尼丁(clothianidin)、尼啶替弗(nidinotefuran)、達特南(dinotefuran)、硝蟲噻嗪(nithiazine)之新菸鹼系化合物;
如得芬諾(tebufenozide)、美芬諾(methoxyfenozide)、可芬諾(chromafenozide)、氯蟲醯肼(halofenozide)之胼系化合物;
如三氟甲吡醚(pyridalyl)、氟尼胺(flonicamid)之吡啶系化合物;
如賜派芬(spirodiclofen)、螺甲蟎酯(spiromesifen)之特窗酸(tetronic acid)系化合物;
如螺蟲乙酯(spirotetramat)、spiropidion之吡咯酮酸(tetramic acid)系化合物;
如嘧蟎酯(fluacrypyrim)、嘧蟎胺(pyriminostrobin)之甲氧基丙烯酸酯(strobilurin)系化合物;
如氟芬林(flufenerim)、嘧蟎醚(pyrimidifen)之吡啶胺系化合物;
如馬拉松(malathion)之有機硫化合物;
如氟芬隆(flufenoxuron)之脲系化合物;
如賽滅淨(cyromazine)之三嗪系化合物;
如愛美松(hydramethylnon)之腙系化合物;
如氟蟲胺(flubendiamide)、溴氟苯胺(broflanilide)、氯氟氰蟲醯胺(cyhalodiamide)之二醯胺系化合物;
如殺蟎隆(diafenthiuron)、滅蟲隆(chloromethiuron)之硫脲系化合物;
如三亞蟎(amitraz)、殺蟲脒(chlordimeform)、伊托明(chloromebuform)之甲脒系化合物;
如吡蚜酮(pymetrozine)、pyrifluquinazone之吡啶偶氮甲鹼(Azomethine)系化合物;
如afoxolaner、氟拉內(fluralaner)、氟米塔麥(fluxametamide)、寵愛食剋(sarolaner)之異噁唑啉系化合物;
又,作為其他化合物,如布酚淨(buprofezin)、噻蟎酮(hexythiazox)、唑蚜威(triazamate)、蟲蟎腈(chlorfenapyr)、茚蟲威(indoxacarb)、亞醌蟎(acequinocyl)、依殺蟎(etoxazole)、1,3-二氯丙烯(1,3-dichloropropene)、苯克提(benclothiaz)、聯苯肼(bifenazate)、毆蟎多(propargite)、克芬蟎(clofentezine)、氰氟蟲腙(metaflumizone)、丁氟蟎酯(cyflumetofen)、芬殺蟎(fenazaquin)、醯胺氟美(amidoflumet)、氟蟲胺(sulfluramid)、愛美松(hydramethylnon)、介乙醛(metaldehyde)、速殺氟(sulfoxaflor)、氟速芬(fluensulfone)、唯布汀(verbutin)、二克滅(dicloromezotiaz)、三氟苯嘧啶(triflumezopyrim)、fluhexafon、替奧沙芬(tioxazafen)、雙丙環蟲酯(afidopyropen)、氟米克(flometoquin)、氟哌二福隆(flupyradifurone)、氯氟氰蟲醯胺(fluazaindolizine)、acynonapyr、benzpyrimoxan、flupyrimin、oxazosulfyl之化合物等。
又,本發明化合物可與下述化合物組合施用。
如Bacillus thuringiensis aizawai、Bacillus thuringiensis kurstaki、Bacillus thuringiensis israelensis、Bacillus thuringiensis japonensis、Bacillus thuringiensis tenebrionis或Bacillus thuringiensis所生成之結晶蛋白毒素、昆蟲病原病毒劑、昆蟲病原絲狀菌劑、線蟲病原絲狀菌劑等之微生物農藥;
如阿巴汀(abamectin)、因滅汀(emamectin benzoate)、伊維菌素(ivermectin)、密滅汀(milbemectin)、倍脈心(milbemycin oxime)、列比美汀(lepimectin)、賜諾殺(spinosad)、司平托列(spinetoram)之抗生物質及半合成抗生物質;
如印楝素(azadirachtin)、毒魚藤素(rotenone)、瑞諾啶(ryanodine)之天然物;
如待乙妥(deet)之忌避劑;
如石蠟油、礦物油(mineral oil)之物理性防除劑。As an insecticide, acaricide, nematicide or soil-killing insecticide in the above other pesticides, that is, an active ingredient compound (general name or Japanese Plant Epidemic Prevention Association test code) for killing insecticides, for example, from the following Appropriate selection in the compound group. Even if it is not specifically described, when such a compound has various structural isomers such as a salt, an alkyl ester or an optical isomer, it is of course included.
Such as profenofos, dichlorvos, fenamiphos, fenitrothion, EPN ((RS)-(O-ethyl O-4-nitrophenyl phenylphosphonothioate), diazinon ), chlorpyrifos, chlorpyrifos-methyl, acephate, prothiofos, fosthiazate, cadusafos, disulfoton , isoxathion, isfenfens, ethion, etrimfos, quinalphos, dimethylvinphos, dimethoate , sulprofos, thiometon, vamidothion, pyraclofos, pyridaphenthion, pirimiphos-methyl, propylidene Propaphos), phosalone, formothion, malathion, tetrachlorvinphos, chlorfenvinphos, cyanophos, trichlorfon , methidathion, phenthoate, oxydeprofos, ESP), azinphos-methyl, fenthion, heptenophos, methoxychlor, parathion, phosphocarb, and letosone - S-methyl ester (demeton-S-methyl), monocrotophos, methamidophos, imicyafos, parathion-methyl, tossone Tertifofos), phosphamidon, phosmet, phorate organophosphate compounds;
Such as carbaryl, propoxur, aldicarb, carbofuran, thiodicarb, methodyl, oxamyl, ethyl sulphide Ethiofencarb, pirimicarb, fenobucarb, carbosulfan, benfuracarb, bendiocarb, furathiocarb ), isoprocarb, metolcarb, xylylcarb, XMC (3,5-xylyl methylcarbamate), fenothiocarb (Carbamate) compounds ;
Such as cartap, thiocyclam, thiocyclam oxalate, thiocyclam hydrochloride, bensultap, thiosultap, kill Monosultap; thiosultap-monosodium, bisultap; thiosultap-disodium, polythialan;
Such as dicofol, tetradifon, endosulufan, dienochlor, dieldrin organochlorine compounds;
Such as fenbutatin oxide, organometallic compounds of cyhexatin;
Such as fenvalerate, permethrin, cypermethrin, alpha-cypermethrin, zeta-cypermethrin, θ-saidingin ( Theta-cypermethrin), beta-cypermethrin, deltamethrin, cyhalothrin, gamma-cyhalothrin, lambda-cyhalothrin ), tefluthrin, kappa-tefluthrin, ethofenprox, flufenprox, cyfluthrin, beta-cyfluthrin (beta-) Cyfluthrin), fenpropathrin, flucythrinate, fluvalinate, cycloprothrin, pyrethrins, fenvalerate Esfenvalerate), tetramethrin, resmethrin, protrifenbute, bifenthrin, kappa-bifenthrin, acrinathrin, acridine Allethrin, tau-fluvalinate, tralmethrin, fenfluthrin (profluthrin), metofluthrin, epsilon-metofluthrin, heptafluthrin, phenothrin, flumethrin Pyrethroid-free compound of momfluorothrin, epsilon-momfluorothrin, silafluofen, chloroprallethrin ;
Such as diflubenzuron, chlorfluazuron, teflubenzuron, flufenoxuron, lufenuron, novaluron, triflumuron, Hexaflumuron, bistrifluron, noviflumuron, fluzuron benzamidine-based compounds;
Juvenile hormone compounds such as methoprene, pyriproxyfen, fenoxycarb, and diofenolan;
a pyridazinone compound such as pyridaben;
Such as fenpyroximate, fipronil, ethiprole, acetoprole, pyrafluprole, pyriprole, cyenopyrafen a pyrazole-based compound of flufiprole;
Such as flufluridum pyflubumide, tebufenpyrad, tolfenpyrad pyrazole carboamide compound;
Such as chlorantraniliprole, cyantraniliprole, cyclaniliprole, tetraniliprole, tyclopyrazoflor pyridylpyrazole compound;
Such as imidacloprid, nitenpyram, acetamiprid, thiacloprid, thiamethoxam, clothianidin, nidinotefuran ), new nicotine compounds of dinotefuran, nithiazine;
Such as tebufenozide, methoxyfenozide, chromafenozide, halofenozide lanthanide compounds;
a pyridine compound such as pyridalyl or flonicamid;
Such as spirodiclofen, spiromesifen tetronic acid compound;
Such as spirotetramat, spiropidion pyrrolic acid (tetramic acid) compounds;
Such as fluacrypyrim, pyrimilastin strobilurin compound;
Such as flufenerim (flufenerim), pyrididin (pyrimidifen) pyridinamine compound;
Organic sulfur compounds such as malathion;
a urea compound such as flufenoxuron;
Such as triazine compounds of cyromazine;
Such as hydramethylnon lanthanide compounds;
Such as flubendiamide, broflanilide, cyhalodiamide diamine compound;
Such as diafenthiuron (diafenthiuron), chloromethiuron thiourea compound;
Such as amitraz, chlordimeform, chloromebuform, a methacrylate compound;
Such as pyridoxine (pymetrozine), pyrifluquinazone pyridine azomethine (Azomethine) compounds;
Such as afoxolaner, fluraraner, flumametamide, and isolazoline-based compounds;
Also, as other compounds, such as buprofezin, hexythiazox, triazamate, chlorfenapyr, indoxacarb, acequinocyl, Etoxazole, 1,3-dichloropropene, benclothiaz, bifenazate, propargite, clofentezine, cyanide Metaflumizone, cyflumetofen, fenazaquin, amidoflumet, sulfluramid, hydramethylnon, metaldehyde, Sulfoxaflor, fluensulfone, verbutin, dicloromeoziaz, triflumezopyrim, fluhexafon, tiooxafen, diclofenac Afidopyropen, flometoquin, flupyradifurone, flurazaindolizine, acynonapyr, benzpyrimoxan, flupyrimin, oxazosulfyl compounds, and the like.
Further, the compound of the present invention can be administered in combination with the following compounds.
For example, Bacillus thuringiensis aizawai, Bacillus thuringiensis kurstaki, Bacillus thuringiensis israelensis, Bacillus thuringiensis japonensis, Bacillus thuringiensis tenebrionis or Bacillus thuringiensis crystal protein toxin, entomopathogenic virus agent, entomopathogenic filamentous fungus, nematode pathogenic filamentous fungus, etc. Microbial pesticides;
Such as abamectin, emamectin benzoate, ivermectin, milbemectin, milbemycin oxime, lepimectin, sinister ( Spinosad), spinetaram antibiotic and semi-synthetic antibiotics;
Such as azadirachtin, rotenone, ryanodine natural products;
Such as the repellent of deet;
Such as paraffin oil, mineral oil, physical control agent.
本發明期望的態樣係如以下。惟,本發明並非被限定於此等者。
[1]一種式(1)表示之化合物或其鹽。
[2]如前述[1]所記載之化合物或其鹽,其中,B為選自由式(B-1)~式(B-18)及式(B-101)~式(B-128)表示之基所成之群組中之雜環基。
[3]如前述[1]所記載之化合物或其鹽,其中,B為選自由式(B-1)~式(B-4)表示之基所成之群組中之雜環基。
[4]如前述[1]所記載之化合物或其鹽,其中,B為式(B-1)或式(B-2)表示之基。
[5]如前述[1]~[4]所記載之化合物或其鹽,其中,RB
為羥基、烷氧基、鹵烷氧基、環烷基烷氧基、烷氧基烷氧基、烯基氧基、環烷基氧基、烷基羰基氧基、烷氧基羰基氧基、烷硫基、胺基、烷基胺基、二烷基胺基;RB’
為鹵素原子或烷基。
[6]如前述[4]所記載之化合物或其鹽,其中,RB1
為 -LB
-YB
,RB2
為烷基、鹵烷基或環烷基,RB3
為鹵素原子。
[7]如前述[4]所記載之化合物或其鹽,其中,RB1
為羥基、烷氧基、鹵烷氧基、環烷基烷氧基、烷氧基烷氧基、烯基氧基、環烷基氧基、烷基羰基氧基、烷氧基羰基氧基、烷硫基、胺基、烷基胺基、二烷基胺基;RB2
為烷基,RB3
為鹵素原子。
[8]如前述[1]~[7]所記載之化合物或其鹽,其中,A為被RA
取代之苯基。
[9]如前述[1]~[7]所記載之化合物或其鹽,其中,A為被相同或相異之2~3個RA
取代之苯基。
[10]如前述[1]~[7]所記載之化合物或其鹽,其中,A為2位及4位之至少一者被RA
取代之苯基。
[11]如前述[1]~[7]所記載之化合物或其鹽,其中,A為鍵結2個RA
而形成之可被Z1
取代之苯并二氧環戊基。
[12]如前述[1]~[9]所記載之化合物或其鹽,其中,RA
為鹵素原子、烷基、鹵烷基或-LA
-YA
。
[13]如前述[1]~[12]所記載之化合物或其鹽,其中,RA
為相同或相異為鹵素原子、烷基、烯基、炔基、環狀基、硝基、氰基或-LA
-YA
,或鍵結2個RA
,可形成可被Z1
取代之環,Z1
為鹵素原子。The desired aspect of the invention is as follows. However, the invention is not limited thereto.
[1] A compound represented by the formula (1) or a salt thereof.
The compound or a salt thereof according to the above [1], wherein B is selected from the group consisting of the formula (B-1) to the formula (B-18) and the formula (B-101) to the formula (B-128). A heterocyclic group in the group formed by the group.
The compound or a salt thereof according to the above [1], wherein B is a heterocyclic group selected from the group consisting of the groups represented by the formulae (B-1) to (B-4).
[4] The compound according to the above [1], wherein B is a group represented by the formula (B-1) or the formula (B-2), or a salt thereof.
[5] The compound according to the above [1] to [4], wherein R B is a hydroxyl group, an alkoxy group, a haloalkoxy group, a cycloalkyl alkoxy group, an alkoxy alkoxy group, or a salt thereof. Alkenyloxy, cycloalkyloxy, alkylcarbonyloxy, alkoxycarbonyloxy, alkylthio, amine, alkylamino, dialkylamino; R B' is a halogen atom or an alkane base.
[6] The compound according to the above [4], wherein R B1 is -L B -Y B , R B2 is an alkyl group, a haloalkyl group or a cycloalkyl group, and R B3 is a halogen atom.
The compound or a salt thereof according to the above [4], wherein R B1 is a hydroxyl group, an alkoxy group, a haloalkoxy group, a cycloalkyl alkoxy group, an alkoxy alkoxy group, or an alkenyloxy group. And a cycloalkyloxy group, an alkylcarbonyloxy group, an alkoxycarbonyloxy group, an alkylthio group, an amine group, an alkylamino group, a dialkylamino group; R B2 is an alkyl group, and R B3 is a halogen atom.
[8] The compound according to the above [1] to [7] or a salt thereof, wherein A is a phenyl group substituted with R A .
[9] The compound according to the above [1] to [7] or a salt thereof, wherein A is a phenyl group substituted by the same or different 2 to 3 R A groups.
[10] The compound according to the above [1] to [7] or a salt thereof, wherein A is a phenyl group in which at least one of the 2 and 4 positions is substituted with R A .
[11] The compound according to the above [1] to [7] or a salt thereof, wherein A is a benzodioxocyclopentyl group which is formed by bonding two R A and which may be substituted with Z 1 .
[12] The compound according to the above [1] to [9], wherein R A is a halogen atom, an alkyl group, a haloalkyl group or a -L A -Y A group, or a salt thereof.
[13] The compound according to the above [1] to [12] wherein R A is the same or different is a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, a cyclic group, a nitro group, a cyano group, or a salt thereof. The group or -L A -Y A , or a bond of 2 R A , forms a ring which can be substituted by Z 1 and Z 1 is a halogen atom.
[14]一種農園藝用殺菌劑,其係將如前述[1]~[13]所記載之化合物或其鹽作為有效成分含有。
[15]一種防除植物病害之方法,其係將如前述[1]~[13]所記載之化合物或其鹽施用在植物或土壤。
[實施例][14] A bactericidal agent for agricultural and horticultural use, which comprises the compound according to the above [1] to [13] or a salt thereof as an active ingredient.
[15] A method for controlling a plant disease, which comprises applying the compound according to the above [1] to [13] or a salt thereof to a plant or soil.
[Examples]
其次,雖記載本發明的實施例,但本發明並非被限定於此等者。Next, although the examples of the invention are described, the invention is not limited thereto.
合成例1:N-(1-(3,4-二氯苯基)-2-甲基-1-氧代丙烷-2-基)-N-甲氧基-1-甲基-3-(甲硫基)-1H-吡唑-4-羧醯胺(化合物No.310)之合成
(1)1-(3,4-二氯苯基)-2-甲基-2-硝基丙烷-1-醇的合成
於3,4-二氯苯并醛(5g)與2-硝基丙烷(10.26ml)之混合物,加入1,5,7-三氮雜雙環[4.4.0]癸-5-烯(TBD、1.19g),在室溫攪拌。24小時後,將反應混合物投入水中,在乙酸乙酯萃取。將有機層以水洗淨,再以無水硫酸鎂乾燥、過濾後,減壓下進行濃縮。將所得之殘渣以管柱層析(溶離液:乙酸乙酯/庚烷)純化,而得到固體之目的物(0.97g)。
1
H NMR (CDCl3
/500MHz):δ(ppm)=7.50 (d, J=2.0 Hz, 1H), 7.45 (d, J=8.0 Hz, 1H), 7.21 (dd, J=8.0, 2.0 Hz, 1H), 5.28 (s, 1H), 2.73 (brs, 1H), 1.57 (s, 3H), 1.46 (s, 3H)。Synthesis Example 1: N-(1-(3,4-dichlorophenyl)-2-methyl-1-oxopropan-2-yl)-N-methoxy-1-methyl-3- ( Synthesis of methylthio)-1H-pyrazole-4-carboxyguanamine (Compound No. 310)
(1) Synthesis of 1-(3,4-dichlorophenyl)-2-methyl-2-nitropropan-1-ol in 3,4-dichlorobenzaldehyde (5g) and 2-nitro A mixture of propane (10.26 ml) was added with 1,5,7-triazabicyclo[4.4.0]non-5-ene (TBD, 1.19 g), and stirred at room temperature. After 24 hours, the reaction mixture was poured into water and extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate and filtered and evaporated. The residue was purified by column chromatography (yield: ethyl acetate /hexane) toield
1 H NMR (CDCl 3 / 500 MHz): δ (ppm) = 7.50 (d, J = 2.0 Hz, 1H), 7.45 (d, J = 8.0 Hz, 1H), 7.21 (dd, J = 8.0, 2.0 Hz, 1H), 5.28 (s, 1H), 2.73 (brs, 1H), 1.57 (s, 3H), 1.46 (s, 3H).
(2)1-(3,4-二氯苯基)-2-甲基-2-硝基丙烷-1-酮的合成
於1-(3,4-二氯苯基)-2-甲基-2-硝基丙烷-1-醇(0.97g)之二氯甲烷(20mL)溶液,加入戴斯-馬丁氧化劑(DMP、1.64g),在室溫攪拌一晩。將反應混合物投入水中,以碳酸氫鈉水溶液中和,濾出不溶物。將濾液在乙酸乙酯萃取,將有機層以水洗淨。以無水硫酸鎂乾燥、過濾後,減壓下進行濃縮。將所得之殘渣以管柱層析(溶離液:乙酸乙酯/庚烷)純化,而得到油狀之目的物(0.78g)。
1
H NMR (CDCl3
/500MHz):δ(ppm)=7.90 (d, J=1.5Hz, 1H), 7.53-7.49 (m, 2H), 1.92 (s, 6H)。(2) Synthesis of 1-(3,4-dichlorophenyl)-2-methyl-2-nitropropan-1-one in 1-(3,4-dichlorophenyl)-2-methyl A solution of 2-nitropropan-1-ol (0.97 g) in methylene chloride (20 mL) was then evaporated. The reaction mixture was poured into water, neutralized with an aqueous sodium hydrogencarbonate solution, and the insoluble material was filtered. The filtrate was extracted with ethyl acetate and the organic layer was washed with water. After drying over anhydrous magnesium sulfate and filtration, it was concentrated under reduced pressure. The residue was purified by column chromatography (yield: ethyl acetate /hexane) toield
1 H NMR (CDCl 3 / 500 MHz): δ (ppm) = 7.90 (d, J = 1.5 Hz, 1H), 7.53-7.49 (m, 2H), 1.92 (s, 6H).
(3)1-(3,4-二氯苯基)-2-(羥基胺基)-2-甲基丙烷-1-酮的合成
於1-(3,4-二氯苯基)-2-甲基-2-硝基丙烷-1-酮(0.76g)與氯化銨(1.55g)之四氫呋喃(10mL)、水(5mL)、乙醇(5mL)之混合溶液,冰水下劃分鋅(0.95g)加入並攪拌。15分鐘後,將反應混合物使用矽鈣石過濾,將所得之濾液投入水中,在乙酸乙酯萃取。將有機層以水洗淨,再以無水硫酸鎂乾燥、過濾後,減壓下進行濃縮。將所得之殘渣以管柱層析(庚烷:乙酸乙酯)純化,而得到固體之目的物(0.48g)。(3) Synthesis of 1-(3,4-dichlorophenyl)-2-(hydroxyamino)-2-methylpropan-1-one in 1-(3,4-dichlorophenyl)-2 a mixed solution of methyl-2-nitropropan-1-one (0.76g) with ammonium chloride (1.55g) in tetrahydrofuran (10mL), water (5mL), ethanol (5mL), and zinc under ice water ( 0.95 g) was added and stirred. After 15 minutes, the reaction mixture was filtered using celite, and the obtained filtrate was poured into water and extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate and filtered and evaporated. The residue was purified by column chromatography (EtOAc:EtOAc)
(4)1-甲基-3-(甲硫基)-1H-吡唑-4-羧酸的合成
使根據美國專利第5,223,526號合成之1-甲基-3-(甲硫基)-1H-吡唑-4-羧酸乙酯(2.67g)懸濁在乙醇(8.46g),加入氫氧化鈉(1.12g)之水(13.4g)溶液,在室溫攪拌13小時。反應結束後,冰水下加入濃鹽酸,使固體析出。過濾、乾燥經析出之固體,而得到固體之目的物(2.15g)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=7.88 (s, 1H), 3.89 (s, 3H), 2.55 (s, 3H)。(4) Synthesis of 1-methyl-3-(methylthio)-1H-pyrazole-4-carboxylic acid 1-methyl-3-(methylthio)-1H synthesized according to U.S. Patent No. 5,223,526 Ethyl pyrazole-4-carboxylate (2.67 g) was suspended in ethanol (8.46 g), and a solution of sodium hydroxide (1.12 g) in water (13.4 g) was added and stirred at room temperature for 13 hours. After the reaction was completed, concentrated hydrochloric acid was added under ice to precipitate a solid. The precipitated solid was filtered and dried to give a solid object (yield: 2.15 g).
1 H NMR (CDCl 3 /300 MHz): δ (ppm) = 7.88 (s, 1H), 3.89 (s, 3H), 2.55 (s, 3H).
(5)N-(1-(3,4-二氯苯基)-2-甲基-1-氧代丙烷-2-基)-N-羥基-1-甲基-3-(甲硫基)-1H-吡唑-4-羧醯胺的合成
於1-甲基-3-(甲硫基)-1H-吡唑-4-羧酸(0.42g)與N,N-二甲基甲醯胺(0.02g)之四氫呋喃(4.45g)溶液,加入草醯氯(0.34g),在室溫攪拌1小時,而得到1-甲基-3-(甲硫基)-1H-吡唑-4-羧醯氯。使所得之羧醯氯溶解在四氫呋喃(2.22g),調製四氫呋喃溶液。而且,於1-(3,4-二氯苯基)-2-(羥基胺基)-2-甲基丙烷-1-酮(0.25g)與三乙基胺(TEA、0.58g)之四氫呋喃溶液(4.43g),加入經調製之羧醯氯的四氫呋喃溶液,在室溫攪拌2小時。反應結束後,加入水在乙酸乙酯萃取,將有機層減壓下進行濃縮。將所得之殘渣以乙醇洗淨,而得到固體之N-(1-(3,4-二氯苯基)-2-甲基-1-氧代丙烷-2-基)-1-甲基-N-((1-甲基-3-(甲硫基)-1H-吡唑-4-羰基)氧基)-3-(甲硫基)-1H-吡唑-4-羧醯胺(0.30g)。將此懸濁於乙醇(7.12g),加入氫氧化鈉(0.11g)之水(4.62g)溶液,在40℃攪拌11小時。反應結束後,加入水在乙酸乙酯萃取。將有機層減壓下進行濃縮,而得到固體之目的物(0.17g)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=8.18 (d, J=2.1 Hz, 1H), 7.93 (dd, J=8.7, 2.1 Hz, 1H), 7.79 (s, 1H), 7.43 (d, J=8.4 Hz, 1H), 7.18 (s, 1H), 3.84 (s, 3H), 2.56 (s, 3H), 1.65 (s, 6H)。(5) N-(1-(3,4-Dichlorophenyl)-2-methyl-1-oxopropan-2-yl)-N-hydroxy-1-methyl-3-(methylthio) Synthesis of -1H-pyrazole-4-carboxyguanamine in 1-methyl-3-(methylthio)-1H-pyrazole-4-carboxylic acid (0.42 g) with N,N-dimethylmethyl A solution of decylamine (0.02 g) in tetrahydrofuran (4.45 g) was added to EtOAc (0.34 g) and stirred at room temperature for one hour to give 1-methyl-3-(methylthio)-1H-pyrazole- 4-carboxyindole chloride. The obtained carboxyindole chloride was dissolved in tetrahydrofuran (2.22 g) to prepare a tetrahydrofuran solution. Furthermore, tetrahydrofuran of 1-(3,4-dichlorophenyl)-2-(hydroxyamino)-2-methylpropan-1-one (0.25 g) and triethylamine (TEA, 0.58 g) A solution (4.43 g) was added to a stirred solution of carboxy chlorobenzene in tetrahydrofuran and stirred at room temperature for 2 hr. After completion of the reaction, water was added to extract with ethyl acetate, and the organic layer was concentrated under reduced pressure. The obtained residue was washed with ethanol to give a solid N-(1-(3,4-dichlorophenyl)-2-methyl-1-oxopropan-2-yl)-1-methyl- N-((1-methyl-3-(methylthio)-1H-pyrazole-4-carbonyl)oxy)-3-(methylthio)-1H-pyrazole-4-carboxamide (0.30 g). This was suspended in ethanol (7.12 g), and a solution of sodium hydroxide (0.11 g) in water (4.62 g) was added, and the mixture was stirred at 40 ° C for 11 hours. After the reaction was completed, water was added and extracted with ethyl acetate. The organic layer was concentrated under reduced pressure to give the title compound (0.17 g).
1 H NMR (CDCl 3 / 300 MHz): δ (ppm) = 8.18 (d, J = 2.1 Hz, 1H), 7.93 (dd, J = 8.7, 2.1 Hz, 1H), 7.79 (s, 1H), 7.43 ( d, J=8.4 Hz, 1H), 7.18 (s, 1H), 3.84 (s, 3H), 2.56 (s, 3H), 1.65 (s, 6H).
(6)N-(1-(3,4-二氯苯基)-2-甲基-1-氧代丙烷-2-基)-N-甲氧基-1-甲基-3-(甲硫基)-1H-吡唑-4-羧醯胺(化合物No.310)之合成
於N-(1-(3,4-二氯苯基)-2-甲基-1-氧代丙烷-2-基)-N-羥基-1-甲基-3-(甲硫基)-1H-吡唑-4-羧醯胺(0.17g)之N,N-二甲基甲醯胺(1.28g)溶液,冰水下加入氫化鈉(0.03g、60%),進行攪拌。5分鐘後,於同溫加入碘化甲烷(0.14g)之N,N-二甲基甲醯胺(0.34g)溶液,在室溫攪拌1.5小時。反應結束後,加入水在乙酸乙酯萃取,將有機層減壓下進行濃縮。將所得之殘渣以庚烷:乙酸乙酯=1:1之混合溶液洗淨,而得到固體之目的物(0.16g、熔點:199~201℃)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=8.14 (d, J=2.1 Hz, 1H), 7.90-7.86 (m, 2H), 7.41 (d, J=8.4 Hz, 1H), 3.93 (s, 3H), 3.89 (s, 3H), 2.42 (s, 3H), 1.68 (brs, 6H)。(6) N-(1-(3,4-Dichlorophenyl)-2-methyl-1-oxopropan-2-yl)-N-methoxy-1-methyl-3-(A) Synthesis of thio)-1H-pyrazole-4-carboxyguanamine (Compound No. 310) to N-(1-(3,4-dichlorophenyl)-2-methyl-1-oxopropane- 2-, N-hydroxy-1-methyl-3-(methylthio)-1H-pyrazole-4-carboxamide (0.17 g) of N,N-dimethylformamide (1.28 g) The solution was added to sodium hydride (0.03 g, 60%) under ice and stirred. After 5 minutes, a solution of methyl iodide (0.14 g) in N,N-dimethylformamide (0.34 g) was added at the same temperature and stirred at room temperature for 1.5 hours. After completion of the reaction, water was added to extract with ethyl acetate, and the organic layer was concentrated under reduced pressure. The obtained residue was washed with a mixed solution of heptane: ethyl acetate = 1:1 to obtain a solid object (0.16 g, melting point: 199 to 201 ° C).
1 H NMR (CDCl 3 / 300 MHz): δ (ppm) = 8.14 (d, J = 2.1 Hz, 1H), 7.90-7.86 (m, 2H), 7.41 (d, J = 8.4 Hz, 1H), 3.93 ( s, 3H), 3.89 (s, 3H), 2.42 (s, 3H), 1.68 (brs, 6H).
合成例2:N-(1-(4-異丙氧基-2-甲基苯基)-2-甲基-1-氧代丙烷-2-基)-N,3-二甲氧基-1-甲基-1H-吡唑-4-羧醯胺(化合物No.259)之合成
(1)2-溴-1-(4-異丙氧基-2-甲基苯基)-2-甲基丙烷-1-酮的合成
於根據日本特開2016-108332號合成之1-(4-異丙氧基-2-甲基苯基)-2-甲基丙烷-1-酮(14.41g)之四氫呋喃(100mL)溶液,加入三甲基苯基三溴化銨(28.87g),於室溫攪拌5小時。反應結束後,過濾反應混合物,將所得之濾液減壓下進行濃縮。將所得之殘渣以管柱層析(溶離液:乙酸乙酯/庚烷)純化,而得到目的物(20.4g)。Synthesis Example 2: N-(1-(4-isopropoxy-2-methylphenyl)-2-methyl-1-oxopropan-2-yl)-N,3-dimethoxy- Synthesis of 1-methyl-1H-pyrazole-4-carboxyguanamine (Compound No. 259)
(1) Synthesis of 2-bromo-1-(4-isopropoxy-2-methylphenyl)-2-methylpropan-1-one as synthesized according to Japanese Laid-Open Patent Publication No. 2016-108332 A solution of 4-isopropoxy-2-methylphenyl)-2-methylpropan-1-one (14.41 g) in tetrahydrofuran (100 mL) was added trimethylphenylammonium bromide (28.87 g). Stir at room temperature for 5 hours. After completion of the reaction, the reaction mixture was filtered, and the obtained filtrate was concentrated under reduced pressure. The obtained residue was purified by column chromatography (yield: ethyl acetate /hexane) to afford (20.4 g).
(2)1-(4-異丙氧基-2-甲基苯基)-2-甲基-2-硝基丙烷-1-酮的合成
於2-溴-1-(4-異丙氧基-2-甲基苯基)-2-甲基丙烷-1-酮(20.4g)之二甲基亞碸(100mL)溶液,加入亞硝酸鈉(7.6g),在室溫攪拌4小時使其反應。加入二甲基亞碸(40mL)在40℃攪拌2小時使其反應。反應結束後,冷卻至室溫加入水,以乙酸乙酯萃取。將合併之有機層以飽和食鹽水洗淨,再以硫酸鈉乾燥,減壓下進行濃縮。將所得之殘渣以管柱層析(庚烷:乙酸乙酯)純化,而得到目的物(19.5g)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=7.31 (d, J=8.7 Hz, 1H), 6.76 (d, J=2.4 Hz, 1H), 6.64 (dd, J=9.0, 2.7 Hz, 1H), 4.63-4.55 (m, 1H), 2.45 (s, 3H), 1.92 (s, 6H), 1.34 (d, J=6.0 Hz, 6H)。(2) Synthesis of 1-(4-isopropoxy-2-methylphenyl)-2-methyl-2-nitropropan-1-one in 2-bromo-1-(4-isopropyloxy) a solution of benzyl-2-methylphenyl)-2-methylpropan-1-one (20.4 g) in dimethyl hydrazine (100 mL), sodium nitrite (7.6 g), and stirred at room temperature for 4 hours. Its reaction. Dimethylhydrazine (40 mL) was added and stirred at 40 ° C for 2 hours to cause a reaction. After completion of the reaction, water was added to room temperature, and extracted with ethyl acetate. The combined organic layers were washed with brine, dried over sodium sulfate and evaporated. The residue was purified by column chromatography (heptane:EtOAc)
1 H NMR (CDCl 3 / 300 MHz): δ (ppm) = 7.31 (d, J = 8.7 Hz, 1H), 6.76 (d, J = 2.4 Hz, 1H), 6.64 (dd, J = 9.0, 2.7 Hz, 1H), 4.63-4.55 (m, 1H), 2.45 (s, 3H), 1.92 (s, 6H), 1.34 (d, J=6.0 Hz, 6H).
(3)2-(羥基胺基)-1-(4-異丙氧基-2-甲基苯基)-2-甲基丙烷-1-酮的合成
以與合成例1(3)同樣的方法,從1-(4-異丙氧基-2-甲基苯基)-2-甲基-2-硝基丙烷-1-酮(1.0g)得到目的物(0.5g)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=7.35 (d, J=8.4 Hz, 1H), 6.73 (d, J=2.4 Hz,1H), 6.67 (dd, J=8.7, 2.7 Hz, 1H), 4.60-4.52 (m, 1H), 2.38 (s, 3H), 1.36 (s, 6H), 1.32 (d, J=6.0 Hz, 6H)。(3) Synthesis of 2-(hydroxyamino)-1-(4-isopropoxy-2-methylphenyl)-2-methylpropan-1-one in the same manner as in Synthesis Example 1 (3) Method, the object compound (0.5 g) was obtained from 1-(4-isopropoxy-2-methylphenyl)-2-methyl-2-nitropropan-1-one (1.0 g).
1 H NMR (CDCl 3 / 300 MHz): δ (ppm) = 7.35 (d, J = 8.4 Hz, 1H), 6.73 (d, J = 2.4 Hz, 1H), 6.67 (dd, J = 8.7, 2.7 Hz, 1H), 4.60-4.52 (m, 1H), 2.38 (s, 3H), 1.36 (s, 6H), 1.32 (d, J=6.0 Hz, 6H).
(4)3-甲氧基-1-甲基-1H-吡唑-4-羧酸乙酯的合成
於根據日本特開2002-348280號合成之3-羥基-1-甲基吡唑-4-羧酸乙酯(10.0g)之N,N-二甲基甲醯胺(150mL)溶液,冰冷下加入氫化鈉(3.53g、60%)並攪拌。15分鐘後,於同溫加入碘化甲烷(16.68g)並攪拌。4小時30分鐘後,於反應混合物加入水,將混合物在乙酸乙酯萃取。將有機層以水洗淨,再以無水硫酸鈉乾燥、過濾後,減壓下進行濃縮。將所得之殘渣以管柱層析(溶離液:乙酸乙酯/庚烷)純化,而得到目的物(8.42g)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=7.66 (s, 1H), 4.27 (q, J=7.2 Hz, 2H), 3.98 (s, 3H), 3.76 (s, 3H), 1.32 (t, J=7.2 Hz, 3H)。(4) Synthesis of ethyl 3-methoxy-1-methyl-1H-pyrazole-4-carboxylate 3-hydroxy-1-methylpyrazole-4 synthesized according to JP-A-2002-348280 A solution of ethyl carboxylate (10.0 g) in N,N-dimethylformamide (150 mL). After 15 minutes, methane iodide (16.68 g) was added at the same temperature and stirred. After 4 hours and 30 minutes, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous sodium sulfate and filtered and evaporated. The residue was purified by column chromatography (liluent: ethyl acetate /hexane) to
1 H NMR (CDCl 3 / 300MHz): δ (ppm) = 7.66 (s, 1H), 4.27 (q, J = 7.2 Hz, 2H), 3.98 (s, 3H), 3.76 (s, 3H), 1.32 ( t, J = 7.2 Hz, 3H).
(5)3-甲氧基-1-甲基-1H-吡唑-4-羧酸的合成
於3-甲氧基-1-甲基-1H-吡唑-4-羧酸乙酯(10.2g),加入氫氧化鈉(2.21g)之乙醇(20mL)、水(250mL)之混合溶液,在50℃攪拌2小時45分鐘。追加氫氧化鈉(0.5g),於同溫進一步攪拌2小時。反應結束後,冷卻至室溫再以乙酸乙酯洗淨。
於水層加入鹽酸,濾取經析出之結晶,並乾燥而得到目的物(5.88g)。
1
H NMR (DMSO-d6/300MHz):δ(ppm)=11.93 (brs, 1H), 8.00 (s, 1H), 3.80 (s, 3H), 3.69 (s, 3H)。(5) Synthesis of 3-methoxy-1-methyl-1H-pyrazole-4-carboxylic acid in ethyl 3-methoxy-1-methyl-1H-pyrazole-4-carboxylate (10.2 g) A mixed solution of sodium hydroxide (2.21 g) in ethanol (20 mL) and water (250 mL) was added and stirred at 50 ° C for 2 hours and 45 minutes. Sodium hydroxide (0.5 g) was added, and the mixture was further stirred at the same temperature for 2 hours. After completion of the reaction, the mixture was cooled to room temperature and washed with ethyl acetate.
Hydrochloric acid was added to the aqueous layer, and the crystals which precipitated were collected by filtration and dried to give the object (5.88 g).
1 H NMR (DMSO-d6 / 300MHz): δ (ppm) = 11.93 (brs, 1H), 8.00 (s, 1H), 3.80 (s, 3H), 3.69 (s, 3H).
(6)N-羥基-N-(1-(4-異丙氧基-2-甲基苯基)-2-甲基-1-氧代丙烷-2-基)-3-甲氧基-1-甲基-1H-吡唑-4-羧醯胺的合成
於3-甲氧基-1-甲基-1H-吡唑-4-羧酸(0.72g)之甲苯(10mL)溶液,加入草醯氯(1.39g)及N,N-二甲基甲醯胺(0.01g),在90℃攪拌1小時。將反應混合溶液減壓下進行濃縮,而得到3-甲氧基-1-甲基-1H-吡唑-4-羧醯氯。使所得之羧醯氯溶解在四氫呋喃(10mL),調製四氫呋喃溶液。而且,於2-(羥基胺基)-1-(4-異丙氧基-2-甲基苯基)-2-甲基丙烷-1-酮(0.55g)之四氫呋喃(20mL)溶液加入三乙基胺(5.8g),再加入經調製之醯氯的四氫呋喃溶液。在室溫攪拌2小時30分鐘。反應結束後,加入水以乙酸乙酯萃取。以飽和食鹽水洗淨後,將有機層以硫酸鈉乾燥,減壓下進行濃縮。使所得之殘渣溶解在乙醇(30mL),於其反應溶液加入2M氫氧化鈉水溶液(30mL),在室溫攪拌13小時30分鐘。反應結束後,加入水以乙酸乙酯萃取。以飽和食鹽水洗淨後,將有機層以硫酸鈉乾燥,減壓下進行濃縮。將所得之殘渣以管柱層析(庚烷:乙酸乙酯)純化,而得到目的物(0.26g)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=7.84 (s, 1H), 7.80 (d, J=8.7 Hz, 1H), 7.54 (s, 1H), 6.71 (d, J=2.4 Hz, 1H), 6.57 (dd, J=8.7, 2.4 Hz, 1H), 4.60-4.52 (m, 1H), 3.98 (s, 3H), 3.65 (s, 3H), 2.46 (s, 3H), 1.67 (s, 6H), 1.31 (d, J=6.0 Hz, 6H)。(6) N-Hydroxy-N-(1-(4-isopropoxy-2-methylphenyl)-2-methyl-1-oxopropan-2-yl)-3-methoxy- Synthesis of 1-methyl-1H-pyrazole-4-carboxamide in a solution of 3-methoxy-1-methyl-1H-pyrazole-4-carboxylic acid (0.72 g) in toluene (10 mL). Grass chloroform (1.39 g) and N,N-dimethylformamide (0.01 g) were stirred at 90 ° C for 1 hour. The reaction mixture solution was concentrated under reduced pressure to give 3-methoxy-1-methyl-1H-pyrazole-4-carboxyindole chloride. The obtained carboxyindole chloride was dissolved in tetrahydrofuran (10 mL) to prepare a tetrahydrofuran solution. Furthermore, a solution of 2-(hydroxyamino)-1-(4-isopropoxy-2-methylphenyl)-2-methylpropan-1-one (0.55 g) in tetrahydrofuran (20 mL) was added in three Ethylamine (5.8 g) was added to a stirred solution of ruthenium chloride in tetrahydrofuran. Stir at room temperature for 2 hours and 30 minutes. After the reaction was completed, water was added and the mixture was extracted with ethyl acetate. After washing with saturated brine, the organic layer was dried over sodium sulfate and evaporated. The obtained residue was dissolved in ethanol (30 mL), and then, the mixture was stirred and evaporated. After the reaction was completed, water was added and the mixture was extracted with ethyl acetate. After washing with saturated brine, the organic layer was dried over sodium sulfate and evaporated. The residue was purified by column chromatography (heptane:EtOAc)
1 H NMR (CDCl 3 /300 MHz): δ (ppm) = 7.84 (s, 1H), 7.80 (d, J = 8.7 Hz, 1H), 7.54 (s, 1H), 6.71 (d, J = 2.4 Hz, 1H), 6.57 (dd, J=8.7, 2.4 Hz, 1H), 4.60-4.52 (m, 1H), 3.98 (s, 3H), 3.65 (s, 3H), 2.46 (s, 3H), 1.67 (s , 6H), 1.31 (d, J=6.0 Hz, 6H).
(7)N-(1-(4-異丙氧基-2-甲基苯基)-2-甲基-1-氧代丙烷-2-基)-N,3-二甲氧基-1-甲基-1H-吡唑-4-羧醯胺(化合物No.259)之合成
於N-羥基-N-(1-(4-異丙氧基-2-甲基苯基)-2-甲基-1-氧代丙烷-2-基)-3-甲氧基-1-甲基-1H-吡唑-4-羧醯胺(0.15g)之N,N-二甲基甲醯胺(10mL)溶液,加入氫化鈉(0.02g、60%)後,再加入碘化甲烷(0.1g)。在室溫攪拌30分鐘使其反應。反應結束後,加入水以乙酸乙酯萃取。將合併之有機層以飽和食鹽水洗淨,再以硫酸鈉乾燥,減壓下進行濃縮。
將所得之殘渣以管柱層析(庚烷:乙酸乙酯)純化,而得到混合物。將所得之混合物以使用胺基二氧化矽之管柱層析(庚烷:乙酸乙酯)純化,而得到目的物(0.146g)。
1
H NMR (CDCl3
/300MHz):δ(ppm)=7.77 (d, J=8.7 Hz, 1H) , 7.63 (s, 1H), 6.67 (d, J=2.4 Hz, 1H) , 6.57 (dd, J=8.7, 2.4 Hz, 1H), 4.58-4.50 (m, 1H), 3.91 (s, 3H), 3.76 (s, 3H), 3.72 (s, 3H), 2.39 (s, 3H), 1.69 (brm, 6H), 1.29 (d, J=6.0 Hz, 6H)。(7) N-(1-(4-Isopropoxy-2-methylphenyl)-2-methyl-1-oxopropan-2-yl)-N,3-dimethoxy-1 Synthesis of methyl-1H-pyrazole-4-carboxyguanamine (Compound No. 259) to N-hydroxy-N-(1-(4-isopropoxy-2-methylphenyl)-2- Methyl-1-oxopropan-2-yl)-3-methoxy-1-methyl-1H-pyrazole-4-carboxamide (0.15 g) of N,N-dimethylformamide (10 mL) solution, after adding sodium hydride (0.02 g, 60%), methane iodide (0.1 g) was added. The mixture was stirred at room temperature for 30 minutes to cause a reaction. After the reaction was completed, water was added and the mixture was extracted with ethyl acetate. The combined organic layers were washed with brine, dried over sodium sulfate and evaporated.
The residue obtained was purified by column chromatography (heptane: ethyl acetate) to give a mixture. The obtained mixture was purified by column chromatography (heptane: ethyl acetate) using ethylamine.
1 H NMR (CDCl 3 / 300 MHz): δ (ppm) = 7.77 (d, J = 8.7 Hz, 1H), 7.63 (s, 1H), 6.67 (d, J = 2.4 Hz, 1H), 6.57 (dd, J=8.7, 2.4 Hz, 1H), 4.58-4.50 (m, 1H), 3.91 (s, 3H), 3.76 (s, 3H), 3.72 (s, 3H), 2.39 (s, 3H), 1.69 (brm , 6H), 1.29 (d, J=6.0 Hz, 6H).
其次,將本發明化合物之代表例具體列舉於第1表。此等化合物可在前述製造方法及前述合成例以及本技術領域,根據公知之方法合成。
表中,No.表示化合物No.。第1表之物性欄所記載之數值為熔點(℃),記載為NMR之化合物於第2表表示1
H-NMR光譜數據。於第1表中之B欄使用之簡稱分別表示以下之取代基。又,Me表示甲基,Et表示乙基,Pr表示n-丙基,iPr表示異丙基,tBu表示第三丁基,Ac表示乙醯基,nBu表示n-丁基,sBu表示第二丁基。Next, a representative example of the compound of the present invention is specifically listed in the first table. These compounds can be synthesized according to known methods in the above production method, the above-mentioned synthesis examples, and the technical field.
In the table, No. indicates a compound No.. The numerical value described in the physical property column of the first table is the melting point (°C), and the compound described as NMR indicates the 1 H-NMR spectrum data in the second table. The abbreviations used in column B of the first table respectively indicate the following substituents. Further, Me represents a methyl group, Et represents an ethyl group, Pr represents an n-propyl group, iPr represents an isopropyl group, tBu represents a third butyl group, Ac represents an ethyl fluorenyl group, nBu represents an n-butyl group, and sBu represents a second butyl group. base.
試驗例1:對於小麥葉枯病之殺菌效果試驗
於包含以二甲基亞碸溶解之本發明化合物的YBG(酵母萃取物、蛋白腖(Bacto Peptone)、甘油)介質,接種小麥葉枯病菌(Septoria tritici)之胞子懸濁液,於室溫培養7天調査生育程度。
將化合物No.4、7、11、16、19、33、37、55、57、89、96、98、100、106、113、123、136、144、156、159、169、172、178、179、182、211、233、237、243、245、253~255、259、267、279、282、286、288、291、306、310、314、321、332、345、351、360、365、370~372、379、387、397、400、429、432、435、453~459、461~472、475~481、484~486、493、495、496、498~508、511、514、518、520~535、539、541~550、552~564、566、567、569、570、572~579、581~589、596~611、613、620、625~629、631、632、636~645、649、650、665、666、675、690、696~698、702、703、717、741、748~752、755~758、764、766、768、769、774、775、781~795、806~809、811~820、823以30ppm將小麥葉枯病菌的生育抑制70%以上。Test Example 1: Bactericidal effect against wheat leaf blight Test YBG (yeast extract, Bacto Peptone, glycerol) medium containing the compound of the present invention dissolved in dimethyl hydrazine, inoculated with wheat leaf blight (Septoria) The cell suspension of tritici) was cultured at room temperature for 7 days to investigate the degree of growth.
Compound No. 4, 7, 11, 16, 19, 33, 37, 55, 57, 89, 96, 98, 100, 106, 113, 123, 136, 144, 156, 159, 169, 172, 178, 179, 182, 211, 233, 237, 243, 245, 253-255, 259, 267, 279, 282, 286, 288, 291, 306, 310, 314, 321, 332, 345, 351, 360, 365, 370-372, 379, 387, 397, 400, 429, 432, 435, 453-459, 461-472, 475-481, 484-486, 493, 495, 496, 498-508, 511, 514, 518, 520-535, 539, 541-550, 552-564, 566, 567, 569, 570, 572-579, 581-589, 596-611, 613, 620, 625-629, 631, 632, 636-645, 649, 650, 665, 666, 675, 690, 696-698, 702, 703, 717, 741, 748-752, 755-758, 764, 766, 768, 769, 774, 775, 781-795, 806~ 809, 811 to 820, and 823 inhibited the growth of wheat leaf blight by more than 70% at 30 ppm.
試驗例2:對於小麥赤黴病之殺菌效果試驗
於包含以二甲基亞碸溶解之本發明化合物的YBA(酵母萃取物、蛋白(Bacto Peptone)、乙酸鈉)介質,接種小麥赤黴病菌(Fusarium graminearum)之胞子懸濁液,以室溫培養3天調査生育程度。
將化合物No.4、11、16、19、33、37、55、57、89、96、98、100、106、113、123、136、144、156、159、169、172、178、179、182、211、224、233、237、243、245、253~255、259、267、279、282、286、288、291、306、310、314、332、345、351、360、365、370~372、379、387、394、397、400、429、432、435、453~458、461~466、468~472、475~481、484~486、493~496、498~508、518、520~540、543~564、566~570、572~580、582~589、596~610、620、625~629、631、632、636~645、649、650、665、666、687~691、696~698、702、703、717、719、741、742、744、748~752、755~758、764、766、768、769、773~775、781~795、806~809、811~820以30ppm將小麥赤黴病菌的生育抑制70%以上。Test Example 2: Bactericidal effect against wheat scab is tested on YBA (yeast extract, protein) containing the compound of the present invention dissolved in dimethyl sulfoxide (Bacto Peptone), sodium acetate) medium, inoculated with a suspension of Fusarium graminearum, and cultured at room temperature for 3 days to investigate the degree of growth.
Compound No. 4, 11, 16, 19, 33, 37, 55, 57, 89, 96, 98, 100, 106, 113, 123, 136, 144, 156, 159, 169, 172, 178, 179, 182, 211, 224, 233, 237, 243, 245, 253-255, 259, 267, 279, 282, 286, 288, 291, 306, 310, 314, 332, 345, 351, 360, 365, 370~ 372, 379, 387, 394, 397, 400, 429, 432, 435, 453-458, 461-466, 468-472, 475-481, 484-486, 493-496, 498-508, 518, 520~ 540, 543-564, 566-570, 572-580, 582-589, 596-610, 620, 625-629, 631, 632, 636-645, 649, 650, 665, 666, 687-691, 696~ 698, 702, 703, 717, 719, 741, 742, 744, 748-752, 755-758, 764, 766, 768, 769, 773-775, 781-795, 806-809, 811-820 will be 30 ppm The growth inhibition of Fusarium graminearum is more than 70%.
試驗例3:對於小麥白粉病之效果試驗
以直徑6cm之乙烯盆栽培小麥,於到達1.5~2.0葉期時,將本發明化合物調製成指定濃度之藥液10mL在噴槍散布。乾燥藥液後(處理當日),灑上白粉病菌(Erysiphe graminis)之分生胞子進行接種,保持在20℃之恆溫室內。於接種7天後從胞子形成面積調査防除率。
將化合物No.4、11、37、98、100、106、113、123、136、144、159、172、243、253、254、259、267、279、282、345、351、365、387、397、421、454~456、461、462、466~468、474、477、481、484、493、494、497、499、503、504、529、531、570、571、573、597、598、600、602~604、606、607、611、637、638、643、675、741、756~758、769以100ppm將小麥白粉病的發病抑制90%以上。Test Example 3: Effect test on wheat powdery mildew Wheat was cultivated in a vinyl pot having a diameter of 6 cm, and when the 1.5 to 2.0 leaf stage was reached, 10 ml of the compound of the present invention was prepared to be dispersed in a spray gun. After the liquid medicine was dried (on the day of treatment), the meristematic cells of Erysiphe graminis were sprinkled and inoculated, and kept in a constant temperature room at 20 °C. The control rate was investigated from the area of cell formation 7 days after the inoculation.
Compound No. 4, 11, 37, 98, 100, 106, 113, 123, 136, 144, 159, 172, 243, 253, 254, 259, 267, 279, 282, 345, 351, 365, 387, 397, 421, 454-456, 461, 462, 466-468, 474, 477, 481, 484, 493, 494, 497, 499, 503, 504, 529, 531, 570, 571, 573, 597, 598, 600, 602 to 604, 606, 607, 611, 637, 638, 643, 675, 741, 756 to 758, and 769 inhibited the onset of wheat powdery mildew by 90% or more at 100 ppm.
試驗例4:對於綠豆灰黴病之效果試驗
以直徑15cm之聚鉢栽培綠豆,於本葉充分展開時,將本發明化合物調製成指定濃度之藥液5mL在噴槍散布。乾燥藥液後(處理當日或隔天),接種含浸以PS(馬鈴薯、蔗糖)介質調製之灰黴病菌(Botrytis cinerea)之分生胞子懸濁液的直徑8mm之紙盤,以多濕條件下保持在20℃之恆溫室內。從接種3日後之病斑長度調査防除率。
將化合物No.19、33、55、57、89、98、113、211、233、237、243、254、259、282、286、372、429、454、462、466、471、472、476、481、503、505、506、508、528、533、561~564、577、583~589、602、637、638、675、696、750~752、769、783、787、788、806~808、811、813、816以25ppm將綠豆灰黴病之發病抑制90%以上。Test Example 4: Effect on mung bean gray mold The mung bean was cultivated with a 15 cm diameter polydip. When the leaf was fully developed, 5 mL of the compound of the present invention was prepared to be dispersed in a spray gun. After drying the liquid (on the day of the treatment or the next day), inoculate a paper disc of 8 mm in diameter containing a coniferous suspension of Botrytis cinerea prepared with PS (potato, sucrose) medium, under humid conditions. Keep in a constant temperature room at 20 °C. The rate of control was investigated from the length of the lesion 3 days after the inoculation.
Compound No. 19, 33, 55, 57, 89, 98, 113, 211, 233, 237, 243, 254, 259, 282, 286, 372, 429, 454, 462, 466, 471, 472, 476, 481, 503, 505, 506, 508, 528, 533, 561-564, 577, 583-589, 602, 637, 638, 675, 696, 750-752, 769, 783, 787, 788, 806-808, 811, 813, and 816 inhibited the onset of mung bean gray mold by more than 90% at 25 ppm.
試驗例5:對於綠豆菌核病之效果試驗
以直徑15cm之聚鉢栽培綠豆,於本葉充分展開時,將本發明化合物調製成指定濃度之藥液5mL在噴槍散布。乾燥藥液後(處理當日或隔天),預先將以PSA(馬鈴薯、蔗糖、洋菜)介質培養之菌核病菌(Sclerotinia sclerotiorum)之菌叢盤(直徑4mm)之菌叢面從上進行接種,以多濕條件下保持在20℃之恆溫室內。從接種3日後之病斑長度調査防除率。
將化合物No.16、19、33、37、55、57、89、98、113、136、144、156、172、211、237、243、253、254、259、279、282、286、291、321、360、365、371、372、379、387、397、429、432、454、457、458、463、464、466~472、475~481、485、496、498~500、503、505~508、514、525、527、528、533、556、558、561~564、569、570、577、578、583~589、599、602、603、606~609、629、637、638、665、666、675、690、696~698、702、719、749~752、755~758、766、768、769、781~788、791~794、806~809、811~813、816、818、819以25ppm將綠豆菌核病的發病抑制90%以上。Test Example 5: Effect on Mung Bean Sclerotium Disease Mung Bean was cultivated with a 15 cm diameter polydip. When the leaf was fully developed, 5 mL of the compound of the present invention was prepared to be dispersed in a spray gun. After drying the drug solution (on the day of the treatment or the next day), the flora surface of the sclerotium disk (4 mm in diameter) of the sclerotinia sclerotiorum cultured in PSA (potato, sucrose, and amaranth) medium is inoculated from above. , kept in a constant temperature room at 20 ° C under humid conditions. The rate of control was investigated from the length of the lesion 3 days after the inoculation.
Compound No. 16, 19, 33, 37, 55, 57, 89, 98, 113, 136, 144, 156, 172, 211, 237, 243, 253, 254, 259, 279, 282, 286, 291, 321, 360, 365, 371, 372, 379, 387, 397, 429, 432, 454, 457, 458, 463, 464, 466-472, 475-481, 485, 496, 498-500, 503, 505~ 508, 514, 525, 527, 528, 533, 556, 558, 561-564, 569, 570, 577, 578, 583-589, 599, 602, 603, 606-609, 629, 637, 638, 665, 666, 675, 690, 696-698, 702, 719, 749-752, 755-758, 766, 768, 769, 781-788, 791-794, 806-809, 811-813, 816, 818, 819 25 ppm inhibited the onset of mung bean disease by more than 90%.
其次,雖記載本發明組成物之製劑例,但摻合比例、劑型等並非僅被限定於記載例者。
製劑例1
(1)式(1)之化合物 20重量份
(2)黏土 72重量份
(3)木質素磺酸蘇打 8重量份
將均一混合以上者作為可濕性粉劑。
製劑例2
(1)式(1)之化合物 5重量份
(2)滑石 95重量份
將均一混合以上者作為粉劑。
製劑例3
(1)式(1)之化合物 20重量份
(2)N,N’-二甲基乙醯胺 20重量份
(3)聚氧乙烯烷基苯基醚 10重量份
(4)二甲苯 50重量份
將均一混合以上者進行溶解作為乳劑。Next, although the preparation examples of the composition of the present invention are described, the blending ratio, the dosage form, and the like are not limited to the description examples.
Formulation Example 1
(1) 20 parts by weight of the compound of the formula (1)
(2) 72 parts by weight of clay
(3) 8 parts by weight of ligninsulfonic acid soda is uniformly mixed as a wettable powder.
Formulation Example 2
(1) 5 parts by weight of the compound of the formula (1)
(2) 95 parts by weight of talc is uniformly mixed as a powder.
Formulation Example 3
(1) 20 parts by weight of the compound of the formula (1)
(2) 20 parts by weight of N,N'-dimethylacetamide
(3) 10 parts by weight of polyoxyethylene alkylphenyl ether
(4) 50 parts by weight of xylene is uniformly mixed or more as an emulsion.
製劑例4
(1)黏土 68重量份
(2)木質素磺酸蘇打 2重量份
(3)聚氧乙烯烷基芳基硫酸鹽 5重量份
(4)微粉二氧化矽 25重量份
將以上之各成分的混合物、與式(1)之化合物以4:1之重量比例混合,作為可濕性粉劑。
製劑例5
(1)式(1)之化合物 50重量份
(2)經氧基化(Oxylated)之聚烷基苯基磷酸鹽
-三乙醇胺 2重量份
(3)聚矽氧 0.2重量份
(4)水 47.8重量份
將均一混合以上者於經粉碎之原液進一步加入均一混合,
(5)聚羧酸鈉 5重量份
(6)無水硫酸鈉 42.8重量份
進行造粒、乾燥,作為顆粒可濕性粉劑。
製劑例6
(1)式(1)之化合物 5重量份
(2)聚氧乙烯辛基苯基醚 1重量份
(3)聚氧乙烯之燐酸酯 0.1重量份
(4)粒狀碳酸鈣 93.9重量份
預先均一混合(1)~(3),以適量之丙酮稀釋後,吹附在(4),去除丙酮作為粒劑。Formulation Example 4
(1) 68 parts by weight of clay
(2) 2 parts by weight of lignin sulfonate soda
(3) 5 parts by weight of polyoxyethylene alkyl aryl sulfate
(4) 25 parts by weight of fine powder of cerium oxide A mixture of the above components and a compound of the formula (1) are mixed in a weight ratio of 4:1 to obtain a wettable powder.
Formulation Example 5
(1) 50 parts by weight of the compound of the formula (1)
(2) Oxylated polyalkylphenyl phosphate
- triethanolamine 2 parts by weight
(3) Polyoxyl 0.2 parts by weight
(4) 47.8 parts by weight of water, which are uniformly mixed or more, and further added to the pulverized stock solution to be uniformly mixed.
(5) 5 parts by weight of sodium polycarboxylate
(6) 42.8 parts by weight of anhydrous sodium sulfate was granulated and dried to obtain a granule wettable powder.
Formulation Example 6
(1) 5 parts by weight of the compound of the formula (1)
(2) 1 part by weight of polyoxyethylene octylphenyl ether
(3) 0.1 parts by weight of polyoxyethylene phthalate
(4) 93.9 parts by weight of granular calcium carbonate was mixed in advance (1) to (3), diluted with an appropriate amount of acetone, and then blown to (4) to remove acetone as a granule.
製劑例7
(1)式(1)之化合物 2.5重量份
(2)N-甲基-2-吡咯烷酮 2.5重量份
(3)大豆油 95.0重量份
將均一混合以上者溶解,作為微量散布劑(ultra low volume formulation)。
製劑例8
(1)式(1)之化合物 20重量份
(2)經氧基化之聚烷基酚磷酸鹽
-三乙醇胺 2重量份
(3)聚矽氧 0.2重量份
(4)三仙膠 0.1重量份
(5)乙二醇 5重量份
(6)水 72.7重量份
將均一混合以上者進行粉碎,作為水性懸濁劑。Formulation Example 7
(1) 2.5 parts by weight of the compound of the formula (1)
(2) N-methyl-2-pyrrolidone 2.5 parts by weight
(3) 95.0 parts by weight of soybean oil was dissolved in a uniform mixture or more as an ultra low volume formulation.
Formulation Example 8
(1) 20 parts by weight of the compound of the formula (1)
(2) Oxylated polyalkylphenol phosphate
- triethanolamine 2 parts by weight
(3) Polyoxyl 0.2 parts by weight
(4) 0.1 parts by weight of Sanxianjiao
(5) 5 parts by weight of ethylene glycol
(6) 72.7 parts by weight of water were uniformly mixed or pulverized as an aqueous suspension.
尚,將2017年12月21日所申請之日本特許出願2017-244784號之說明書、申請專利範圍及摘要之全內引用於此,作為本發明之說明書的揭示而取入者。The specification, the scope of the patent application, and the abstract of the Japanese Patent Application No. Hei.
Claims (11)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-244784 | 2017-12-21 | ||
| JP2017244784A JP2021035913A (en) | 2017-12-21 | 2017-12-21 | N-methoxyamide compound or salt thereof, and agricultural and horticultural fungicide containing the same |
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| TW201930267A true TW201930267A (en) | 2019-08-01 |
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| TW107146395A TW201930267A (en) | 2017-12-21 | 2018-12-21 | N-methoxyamide compound or salt thereof, and agricultural and horticultural fungicide containing same |
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| JP (1) | JP2021035913A (en) |
| TW (1) | TW201930267A (en) |
| WO (1) | WO2019124537A1 (en) |
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| AU2019255310B2 (en) | 2018-04-18 | 2022-11-24 | Constellation Pharmaceuticals, Inc. | Modulators of methyl modifying enzymes, compositions and uses thereof |
| EP3797108B1 (en) | 2018-05-21 | 2022-07-20 | Constellation Pharmaceuticals, Inc. | Modulators of methyl modifying enzymes, compositions and uses thereof |
| EP4003532B1 (en) | 2019-07-24 | 2024-09-04 | Constellation Pharmaceuticals, Inc. | Crystalline forms of 7-chloro-2-(4-(3-methoxyazetidin-1-yl)cyclohexyl)-2,4-dimethyl-n-((6-methyl-4-(methylthio)-2-oxo-1,2-dihydropyridin-3-yl)methyl)benzo[d][1,3]dioxole-5-carboxamide |
| EP4052576A4 (en) * | 2019-10-29 | 2023-10-11 | Shenyang Sinochem Agrochemicals R & D Co., Ltd. | AMIDE COMPOUND CONTAINING A STRUCTURAL FRAGMENT OF SUBSTITUTED ACETOPHENONE, PROCESS THEREOF AND USE THEREOF |
| CA3219084A1 (en) | 2021-07-08 | 2023-01-12 | Ishihara Sangyo Kaisha, Ltd. | Nematicidal composition |
| CN116178263B (en) * | 2022-12-25 | 2024-05-28 | 浙江工业大学 | Nitro-containing pyrazole carboxyl hydroxylamine compounds and preparation method and application thereof |
| WO2024162284A1 (en) * | 2023-01-31 | 2024-08-08 | クミアイ化学工業株式会社 | Pyrazole-4-carboxamide compound and agricultural or horticultural plant disease control agent using same |
| WO2025159046A1 (en) * | 2024-01-22 | 2025-07-31 | 日本曹達株式会社 | Five-member heteroaryl compound and bactericide for agricultural and horticultural use |
| WO2025206280A1 (en) * | 2024-03-29 | 2025-10-02 | クミアイ化学工業株式会社 | N-oxy-pyrazole-5-carboxamide compound, and plant disease control agent for agricultural and horticultural use using same |
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| JP5173126B2 (en) * | 2004-08-12 | 2013-03-27 | 石原産業株式会社 | Bactericidal composition containing acid amide derivative |
| EP1792901A1 (en) * | 2005-11-22 | 2007-06-06 | Bayer CropScience S.A. | N-(1-alkyl-2-phenylethyl)-carboxamide derivatives and use thereof as fungicides |
| JP5068985B2 (en) * | 2005-12-16 | 2012-11-07 | 石原産業株式会社 | Bactericidal composition containing a carboxylic acid amide derivative |
| TWI435863B (en) * | 2006-03-20 | 2014-05-01 | Nihon Nohyaku Co Ltd | N-2-(hetero) arylethylcarboxamide derivative and pest controlling |
| ME01518B (en) * | 2008-12-05 | 2014-04-20 | Syngenta Participations Ag | Novel pyrazole-4-n-alkoxycarboxamides as microbiocides |
| EP2576516B1 (en) * | 2010-06-03 | 2014-12-17 | Bayer Intellectual Property GmbH | N-[(het)arylethyl)]pyrazole(thio)carboxamides and their heterosubstituted analogues |
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- 2018-12-21 TW TW107146395A patent/TW201930267A/en unknown
Also Published As
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| JP2021035913A (en) | 2021-03-04 |
| WO2019124537A1 (en) | 2019-06-27 |
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