TW201936879A - Resin composition for sealing - Google Patents
Resin composition for sealing Download PDFInfo
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- TW201936879A TW201936879A TW108106400A TW108106400A TW201936879A TW 201936879 A TW201936879 A TW 201936879A TW 108106400 A TW108106400 A TW 108106400A TW 108106400 A TW108106400 A TW 108106400A TW 201936879 A TW201936879 A TW 201936879A
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- hydrotalcite
- acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/24—Acids; Salts thereof
- C08K3/26—Carbonates; Bicarbonates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
- C08K5/5419—Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/06—Triglycidylisocyanurates
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
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- Chemical Kinetics & Catalysis (AREA)
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- Polymers & Plastics (AREA)
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- Electroluminescent Light Sources (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Sealing Material Composition (AREA)
Abstract
Description
本發明係關於密封用樹脂組成物,特別是關於適合在有機EL(Electroluminescence)元件等之發光元件或太陽能電池等之受光元件等之密封的密封用樹脂組成物。The present invention relates to a resin composition for sealing, and particularly relates to a resin composition for sealing which is suitable for sealing a light-emitting element such as an organic EL (Electroluminescence) element or a light-receiving element such as a solar battery.
有機EL元件係對發光材料使用有機物質之發光元件,由於可得到低電壓且高亮度之發光,近年來備受矚目。然而,有機EL元件對水分極弱,發光材料(發光層)因水分而變質,有降低亮度,或是無法發光,或電極與發光層之界面因水分的影響剝離,或金屬氧化導致高電阻化的問題。因此,為了將元件內部從外氣中之水分遮斷,例如進行以被覆基板上所形成之發光層的全面的方式藉由樹脂組成物形成密封層,來密封有機EL元件。又,為了防止來自有機EL裝置之密封層的邊緣之水分侵入,亦有藉由被稱為壩材料(Dam material)之密封用的樹脂組成物,於邊緣設置密封層的情況。又,亦已知有組合藉由液狀密封材(填充材料(Fill material))之發光層的全面密封與藉由壩材料之邊緣密封的壩(Dam)-填充密封。這般的有機EL元件之密封層中尋求高水分遮斷性(亦稱為阻隔性、耐透濕性)。In the organic EL element, a light-emitting element using an organic substance for a light-emitting material has been attracting attention in recent years because light emission with low voltage and high luminance can be obtained. However, the organic EL element is extremely weak in moisture, and the luminescent material (light-emitting layer) is deteriorated by moisture, and the brightness is lowered or the light is not emitted, or the interface between the electrode and the light-emitting layer is peeled off due to the influence of moisture, or the metal is oxidized to cause high resistance. The problem. Therefore, in order to block the inside of the element from the moisture in the outside air, for example, a sealing layer is formed by a resin composition so as to cover the entire surface of the light-emitting layer formed on the substrate, thereby sealing the organic EL element. Moreover, in order to prevent moisture intrusion from the edge of the sealing layer of the organic EL device, there is a case where a sealing layer is provided on the edge by a resin composition for sealing which is called a Dam material. Further, it is also known to combine a full seal of a luminescent layer by a liquid sealing material (Fill material) with a dam-filled seal sealed by the edge of the dam material. In such a sealing layer of an organic EL device, high moisture barrier properties (also referred to as barrier properties and moisture permeability resistance) are sought.
專利文獻1中提案有作為吸濕劑,係使用水滑石之水分遮斷性優異之密封用樹脂組成物。惟,含有水滑石之樹脂組成物,於製造步驟或流通過程,於樹脂組成物中可逆性滲入水分,有引起有機EL元件等之劣化的課題。作為用以去除滲入此樹脂組成物中之水分之方法,專利文獻2中揭示有藉由併用近紅外線與加熱,以短時間乾燥密封用薄片之方法。然而,在此方法,有在製造過程之步驟數的增加或乾燥設備的導入成為必要的課題。
[先前技術文獻]
[專利文獻]Patent Document 1 proposes a sealing resin composition which is excellent in moisture barrier properties using hydrotalcite as a moisture absorbent. However, the resin composition containing the hydrotalcite reversibly penetrates into the resin composition in the production step or the distribution process, and causes deterioration of the organic EL element or the like. As a method for removing moisture which has penetrated into the resin composition, Patent Document 2 discloses a method of drying a sheet for sealing in a short time by using near-infrared rays and heating. However, in this method, there is an increase in the number of steps in the manufacturing process or introduction of a drying device.
[Previous Technical Literature]
[Patent Literature]
[專利文獻1] WO2015/068787A
[專利文獻2] WO2016/152756A[Patent Document 1] WO2015/068787A
[Patent Document 2] WO2016/152756A
[發明欲解決之課題][Questions to be solved by the invention]
本發明係鑑於如上述之事情而完成者,欲解決的課題,係提供一種水分遮斷性優異,即使於密封步驟前不進行乾燥處理步驟,亦可抑制因滲入樹脂組成物中之水分導致EL元件等之元件的劣化之密封用樹脂組成物。
[用以解決課題之手段]The present invention has been made in view of the above-mentioned problems, and it is an object to be solved to provide an excellent barrier property against moisture, and it is possible to suppress EL caused by penetration of moisture into the resin composition even if the drying treatment step is not performed before the sealing step. A resin composition for sealing which is deteriorated by components such as elements.
[Means to solve the problem]
本發明者們為了解決上述之課題進行努力研究的結果,發現藉由於含有水滑石之密封用樹脂組成物摻合氧化鈣,解決前述課題,而終至完成本發明。亦即,本發明係具有以下之特徵。As a result of intensive studies to solve the above problems, the present inventors have found that the above-mentioned problems are solved by blending calcium oxide with a resin composition for sealing containing hydrotalcite, and the present invention has been completed. That is, the present invention has the following features.
[1] 一種密封用樹脂組成物,其係含有水滑石及氧化鈣。
[2] 如前述[1]所記載之密封用樹脂組成物,其中,相對於水滑石之氧化鈣的比例以質量比為0.1~1。
[3] 如前述[1]或[2]所記載之密封用樹脂組成物,其中,水滑石的含量相對於樹脂組成物之不揮發分100質量%,為10質量%~70質量%。
[4] 如前述[1]~[3]中任一項所記載之密封用樹脂組成物,其係進一步含有選自丙烯酸樹脂及環氧樹脂中至少1種的樹脂。
[5] 如前述[1]~[3]中任一項所記載之密封用樹脂組成物,其係進一步含有至少1種的丙烯酸樹脂。
[6] 如前述[4]或[5]所記載之密封用樹脂組成物,其中,丙烯酸樹脂係包含於1分子中具有3個以上乙烯性不飽和基之化合物。
[7] 如前述[4]~[6]中任一項所記載之密封用樹脂組成物,其中,丙烯酸樹脂係包含於1分子中具有2個以上乙烯性不飽和基及脂環式構造之化合物。
[8] 如前述[6]或[7]所記載之密封用樹脂組成物,其中,乙烯性不飽和基為(甲基)丙烯醯基。
[9] 如前述[7]或[8]所記載之密封用樹脂組成物,其中,於1分子中具有2個以上乙烯性不飽和基及脂環式構造之化合物的量,相對於樹脂組成物全體為5~75質量%。
[10] 如前述[1]~[9]中任一項所記載之密封用樹脂組成物,其中,水滑石為半燒成水滑石。
[11] 如前述[1]~[10]中任一項所記載之密封用樹脂組成物,其係進一步含有自由基聚合起始劑。
[12] 如前述[11]所記載之密封用樹脂組成物,其中,自由基聚合起始劑為光自由基聚合起始劑及/或熱自由基聚合起始劑。
[13] 如前述[11]或[12]所記載之密封用樹脂組成物,其中,自由基聚合起始劑的量,相對於具有乙烯性不飽和基之化合物100質量份,為0.5~10質量份。
[14] 如前述[1]~[13]中任一項所記載之密封用樹脂組成物,其係進一步包含矽烷偶聯劑。
[15] 如前述[1]~[14]中任一項所記載之密封用樹脂組成物,其係液狀。
[16] 如前述[1]~[15]中任一項所記載之密封用樹脂組成物,其係有機EL元件之密封用。
[17] 一種有機EL裝置,其係以如前述[1]~[16]中任一項所記載之密封用樹脂組成物的硬化物密封有機EL元件。
[發明效果][1] A resin composition for sealing comprising hydrotalcite and calcium oxide.
[2] The resin composition for sealing according to the above [1], wherein the ratio of the calcium oxide to the hydrotalcite is 0.1 to 1 by mass.
[3] The resin composition for sealing according to the above [1], wherein the content of the hydrotalcite is from 10% by mass to 70% by mass based on 100% by mass of the nonvolatile content of the resin composition.
[4] The resin composition for sealing according to any one of the above [1] to [3], further comprising a resin selected from at least one of an acrylic resin and an epoxy resin.
[5] The resin composition for sealing according to any one of [1] to [3] further comprising at least one type of acrylic resin.
[6] The resin composition for sealing according to the above [4], wherein the acrylic resin is a compound having three or more ethylenically unsaturated groups in one molecule.
[7] The resin composition for sealing according to any one of the above [4], wherein the acrylic resin contains two or more ethylenically unsaturated groups and an alicyclic structure in one molecule. Compound.
[8] The resin composition for sealing according to the above [6], wherein the ethylenically unsaturated group is a (meth) acrylonitrile group.
[9] The resin composition for sealing according to the above [7], wherein the amount of the compound having two or more ethylenically unsaturated groups and an alicyclic structure in one molecule is relative to the resin composition. The whole of the material is 5 to 75% by mass.
[10] The resin composition for sealing according to any one of the above [1], wherein the hydrotalcite is a semi-fired hydrotalcite.
[11] The resin composition for sealing according to any one of [1] to [10] further comprising a radical polymerization initiator.
[12] The resin composition for sealing according to the above [11], wherein the radical polymerization initiator is a photoradical polymerization initiator and/or a thermal radical polymerization initiator.
[13] The resin composition for sealing according to the above [11], wherein the amount of the radical polymerization initiator is 0.5 to 10 parts by mass based on 100 parts by mass of the compound having an ethylenically unsaturated group. Parts by mass.
[14] The resin composition for sealing according to any one of [1] to [13] further comprising a decane coupling agent.
[15] The resin composition for sealing according to any one of the above [1] to [14], which is liquid.
[16] The resin composition for sealing according to any one of the above [1] to [15], which is used for sealing an organic EL element.
[17] An organic EL device, wherein the organic EL device is sealed with a cured product of the sealing resin composition according to any one of the above [1] to [16].
[Effect of the invention]
根據本發明,可提供一種水分遮斷性優異,即使於密封步驟前不進行乾燥處理步驟,亦可抑制因滲入樹脂組成物中之水分導致EL元件等之元件的劣化之密封用樹脂組成物。According to the present invention, it is possible to provide a sealing resin composition which is excellent in moisture barrier properties and which can prevent deterioration of elements such as EL elements due to moisture permeating into the resin composition, even if the drying treatment step is not performed before the sealing step.
<密封用樹脂組成物>
本發明之密封用樹脂組成物係含有水滑石及氧化鈣。本發明之密封用樹脂組成物可藉由將樹脂、水滑石、氧化鈣及如有必要之其他成分使用捏合輥或回轉混合機等進行混合來製造。<Resin composition for sealing>
The resin composition for sealing of the present invention contains hydrotalcite and calcium oxide. The resin composition for sealing of the present invention can be produced by mixing a resin, hydrotalcite, calcium oxide and, if necessary, other components using a kneading roll or a rotary mixer.
本發明之密封用樹脂組成物,例如使用在半導體、太陽能電池、高亮度LED、LCD、EL元件等之電子零件,較佳為有機EL元件、太陽能電池等之光學半導體之密封。本發明之密封用樹脂組成物,特別適合使用在有機EL元件之密封。具體而言,有機EL元件之發光部的上部適用作為填充材料,及/或於周圍(側部)適用作為壩材料,為了將有機EL元件之發光部從外部保護,可使用本發明之密封用樹脂組成物。The resin composition for sealing of the present invention is used for, for example, an electronic component such as a semiconductor, a solar cell, a high-brightness LED, an LCD, or an EL element, and is preferably an optical semiconductor such as an organic EL element or a solar cell. The sealing resin composition of the present invention is particularly preferably used for sealing an organic EL element. Specifically, the upper portion of the light-emitting portion of the organic EL element is applied as a filler, and/or is applied as a dam material in the periphery (side portion), and the sealing portion of the present invention can be used in order to protect the light-emitting portion of the organic EL element from the outside. Resin composition.
本發明之密封用樹脂組成物,較佳為液狀之密封用樹脂組成物。於此所謂「液狀之密封用樹脂組成物」,係意指於常溫(25℃)及常壓(1氣壓)具有流動性之密封用樹脂組成物。例如,若包含無機填充劑之密封用樹脂組成物,亦於常溫及常壓具有流動性,則相當於在本發明之液狀之密封用樹脂組成物。液狀之密封材(密封用樹脂組成物)與薄膜狀之密封材比較,一般而言,於具有電路之發光元件面的嵌入性、密封面為大面積時之孔隙的抑制、密封層之膜厚調整的容易性、藉由於密封前形成壩,對齊位置所達成之高對準精度等之點變有利的情況較多。The resin composition for sealing of the present invention is preferably a liquid resin composition for sealing. Here, the "resin composition for liquid sealing" means a resin composition for sealing which has fluidity at normal temperature (25 ° C) and normal pressure (1 atmosphere). For example, when the sealing resin composition containing an inorganic filler has fluidity at normal temperature and normal pressure, it corresponds to the liquid sealing resin composition of the present invention. In comparison with a film-like sealing material, a liquid sealing material (resin composition for sealing) is generally used for the embedding property of a surface of a light-emitting element having a circuit, the suppression of voids when the sealing surface is large, and the film of the sealing layer. The ease of thickness adjustment is advantageous because the dam is formed before sealing, and the alignment accuracy achieved by the alignment position is advantageous.
本發明之密封用樹脂組成物期望不包含溶劑等之揮發分。尚,本發明之密封用樹脂組成物包含溶劑等之揮發分時,在各成分的含量基準中未包含溶劑等之揮發分。亦即,本發明之密封用樹脂組物包含揮發分時,所謂各成分的含量基準即「相對於樹脂組成物全體」,係意指「相對於樹脂組成物之不揮發分全體」。The resin composition for sealing of the present invention desirably does not contain a volatile component such as a solvent. When the resin composition for sealing of the present invention contains a volatile component such as a solvent, a volatile component such as a solvent is not included in the content of each component. In other words, when the resin composition for sealing of the present invention contains a volatile component, the term "the total amount of the resin composition" with respect to the content of each component means "the total non-volatile content of the resin composition".
<水滑石>
本發明之密封用樹脂組成物係含有水滑石。水滑石可分類成未燒成水滑石、半燒成水滑石及燒成水滑石,可為該等之任一種,又,可為僅1種,亦可為2種以上。<hydrotalcite>
The resin composition for sealing of the present invention contains hydrotalcite. The hydrotalcite may be classified into an unfired hydrotalcite, a semi-calcined hydrotalcite, and a calcined hydrotalcite, and may be any of these, and may be used alone or in combination of two or more.
未燒成水滑石例如為具有如天然水滑石(Mg6 Al2 (OH)16 CO3 ・4H2 O)所代表之層狀之結晶構造的金屬氫氧化物,例如係由作為基本骨架之層[Mg1-X AlX (OH)2 ]X+ 與中間層[(CO3 )X/2 ・mH2 O]X- 所構成。在本發明之未燒成水滑石係包含合成水滑石等之類水滑石化合物之概念。作為類水滑石化合物,例如可列舉下述式(I)及下述式(II)表示者。The unfired hydrotalcite is, for example, a metal hydroxide having a layered crystal structure represented by natural hydrotalcite (Mg 6 Al 2 (OH) 16 CO 3 · 4H 2 O), for example, a layer as a basic skeleton. [Mg 1-X Al X (OH) 2 ] X+ is composed of an intermediate layer [(CO 3 ) X/2 · mH 2 O] X- . The unfired hydrotalcite of the present invention contains the concept of a hydrotalcite compound such as synthetic hydrotalcite. Examples of the hydrotalcite-like compound include those represented by the following formula (I) and the following formula (II).
(式中,M2+
表示Mg2+
、Zn2+
等之2價金屬離子,M3+
表示Al3+
、Fe3+
等之3價金屬離子,An-
表示CO3 2-
、Cl-
、NO3 -
等之n價陰離子,為0<x<1,0≦m<1,n為正之數)
式(I)中,M2+
較佳為Mg2+
,M3+
較佳為Al3+
,An-
較佳為CO3 2-
。
(wherein, M 2+ represents a divalent metal ion such as Mg 2+ or Zn 2+ , M 3+ represents a trivalent metal ion such as Al 3+ or Fe 3+ , and A n- represents CO 3 2- or Cl. - n-valent anion of NO 3 -, etc., 0 < x < 1, 0 ≦ m < 1, n is a positive number)
In the formula (I), M 2+ is preferably Mg 2+ , M 3+ is preferably Al 3+ , and A n- is preferably CO 3 2- .
(式中,M2+
表示Mg2+
、Zn2+
等之2價金屬離子,An-
表示CO3 2-
、Cl-
、NO3-
等之n價陰離子,x為2以上之正之數,z為2以下之正之數,m為正之數,n為正之數)
式(II)中,M2+
較佳為Mg2+
,An-
較佳為CO3 2-
。
(wherein, M 2+ represents a divalent metal ion such as Mg 2+ or Zn 2+ , A n- represents an n-valent anion such as CO 3 2- , Cl − or NO 3 , and x is a positive number of 2 or more. , z is a positive number below 2, m is a positive number, and n is a positive number)
In the formula (II), M 2+ is preferably Mg 2+ , and A n- is preferably CO 3 2- .
半燒成水滑石係指燒成未燒成水滑石所得之具有層間水的量減少或消失之層狀之結晶構造的金屬氫氧化物。所謂「層間水」,若使用組成式進行說明,係指上述之未燒成的天然水滑石及類水滑石化合物的組成式所記載之「H2 O」。The semi-fired hydrotalcite is a metal hydroxide having a layered crystal structure obtained by firing uncalcined hydrotalcite with a reduced or eliminated amount of interlayer water. The term "interlayer water" as used in the composition formula refers to the "H 2 O" described in the composition formula of the unfired natural hydrotalcite and hydrotalcite-like compound.
另外,燒成水滑石係指燒成未燒成水滑石或半燒成水滑石所得,不僅層間水,羥基亦藉由縮合脫水消失之具有非晶構造的金屬氧化物。Further, the calcined hydrotalcite is a metal oxide having an amorphous structure which is obtained by firing uncalcined hydrotalcite or semi-baked hydrotalcite, and not only inter-layer water but also hydroxyl groups are dehydrated by condensation.
未燒成水滑石、半燒成水滑石及燒成水滑石可藉由飽和吸水率區別。半燒成水滑石之飽和吸水率係1質量%以上未滿20質量%。另外,未燒成水滑石之飽和吸水率為未滿1質量%,燒成水滑石之飽和吸水率為20質量%以上。Unfired hydrotalcite, semi-fired hydrotalcite and calcined hydrotalcite can be distinguished by saturated water absorption. The saturated water absorption rate of the semi-fired hydrotalcite is 1% by mass or more and less than 20% by mass. Further, the saturated water absorption of the unfired hydrotalcite is less than 1% by mass, and the saturated water absorption of the calcined hydrotalcite is 20% by mass or more.
所謂在本發明之「飽和吸水率」,係指將未燒成水滑石、半燒成水滑石或燒成水滑石在天秤量取1.5g,測定初期質量後,於設定在大氣壓下、60℃、90% RH(相對濕度)之小型環境試驗器(Espec公司製SH-222)靜置200小時時之相對於初期質量之質量增加率,可用下述式(i)求出。
飽和吸水率(質量%)
=100×(吸濕後之質量-初期質量)/初期質量 (i)The "saturated water absorption rate" in the present invention means that the unsintered hydrotalcite, the semi-calcined hydrotalcite or the calcined hydrotalcite is measured in an amount of 1.5 g on a scale, and after the initial mass is measured, it is set at atmospheric pressure at 60 ° C. The mass increase rate with respect to the initial mass when the small environmental tester (SH-222 manufactured by Espec Co., Ltd.) of 90% RH (relative humidity) was allowed to stand for 200 hours can be obtained by the following formula (i).
Saturated water absorption (% by mass)
=100×(mass after moisture absorption - initial quality) / initial quality (i)
半燒成水滑石之飽和吸水率較佳為3質量%以上未滿20質量%,更佳為5質量%以上未滿20質量%。The saturated water absorption rate of the semi-fired hydrotalcite is preferably 3% by mass or more and less than 20% by mass, more preferably 5% by mass or more and less than 20% by mass.
又,未燒成水滑石、半燒成水滑石及燒成水滑石可藉由以熱重量分析測定之熱重量減少率區別。半燒成水滑石在280℃之熱重量減少率係未滿15質量%,且在其380℃之熱重量減少率為12質量%以上。另外,未燒成水滑石在280℃之熱重量減少率為15質量%以上,燒成水滑石在380℃之熱重量減少率係未滿12質量%。Further, the unfired hydrotalcite, the semi-fired hydrotalcite, and the calcined hydrotalcite can be distinguished by the thermal weight reduction rate measured by thermogravimetric analysis. The semi-calcined hydrotalcite has a thermal weight reduction rate of less than 15% by mass at 280 ° C and a thermal weight reduction rate of 138 ° C or more at 12% by mass or more. Further, the thermogravimetric reduction rate of the unfired hydrotalcite at 280 ° C was 15% by mass or more, and the thermal weight loss rate of the calcined hydrotalcite at 380 ° C was less than 12% by mass.
熱重量分析係使用日立高科技公司製TG/DTA EXSTAR6300,於鋁製之樣品盤秤量5mg之水滑石,以未覆蓋而打開的狀態,於氮流量200mL/分鐘的環境下,從30℃至550℃以昇溫速度10℃/分鐘的條件進行。熱重量減少率可用下述式(ii)求出。
熱重量減少率(質量%)
=100×(加熱前之質量-達到指定溫度時之質量)/加熱前之質量 (ii)The thermogravimetric analysis was carried out using a TG/DTA EXSTAR 6300 manufactured by Hitachi High-Tech Co., Ltd., and a 5 mg hydrotalcite was weighed in a sample tray made of aluminum, and opened in an uncovered state. From 30 ° C to 550 in a nitrogen flow rate of 200 mL/min. °C was carried out under the conditions of a temperature increase rate of 10 ° C /min. The heat weight reduction rate can be obtained by the following formula (ii).
Thermal weight reduction rate (% by mass)
=100× (mass before heating - mass at the specified temperature) / mass before heating (ii)
又,未燒成水滑石、半燒成水滑石及燒成水滑石可藉由以粉末X光繞射測定之峰值及相對強度比區別。半燒成水滑石表示藉由粉末X光繞射,於2θ為8~18˚附近具有分裂成二個之峰值,或藉由二個峰值之合成而具有肩部之峰值,於低角側所出現之峰值或肩部之繞射強度(=低角側繞射強度)、與高角側所出現之峰值或肩部之繞射強度(=高角側繞射強度)之相對強度比(低角側繞射強度/高角側繞射強度)為0.001~1,000。另外,未燒成水滑石於8~18˚附近僅具有一個峰值,或低角側所出現之峰值或肩部與高角側所出現之峰值或肩部之繞射強度的相對強度比成為前述之範圍外。燒成水滑石於8˚~18˚之區域不具有特徵性峰值,於43˚具有特徵性峰值。粉末X光繞射測定係藉由粉末X光繞射裝置(PANalytical公司製、Empyrean),以對陰極CuKα(1.5405Å)、電壓:45V、電流:40mA、採樣寬度:0.0260˚、掃描速度:0.0657˚/s、測定繞射角範圍(2θ):5.0131~79.9711˚的條件進行。峰值搜索係利用繞射裝置附屬之軟體的峰值搜索功能,可用「最小顯著度:0.50、最小峰值晶片(Minimum peak chip):0.01˚、最大峰值晶片(Maximum peak chip):1.00˚、峰值底寬:2.00˚、方法:2次微分之最小值」的條件進行。Further, the unfired hydrotalcite, the semi-fired hydrotalcite, and the calcined hydrotalcite can be distinguished by the peak and relative intensity ratios measured by powder X-ray diffraction. Semi-calcined hydrotalcite means that by powder X-ray diffraction, it has a peak split into two at 2θ around 8 to 18 ,, or has a shoulder peak by synthesis of two peaks, on the low angle side. The relative intensity ratio of the peak or shoulder diffraction intensity (= low angle side diffraction intensity), the peak appearing at the high angle side, or the diffraction intensity of the shoulder (= high angle side diffraction intensity) (low angle side) The diffraction intensity/high-angle side diffraction intensity is 0.001 to 1,000. In addition, the unfired hydrotalcite has only one peak near 8 to 18 ,, or the peak value appearing on the low angle side or the relative intensity ratio of the peak or the diffraction intensity of the shoulder on the high angle side becomes the aforementioned Out of scope. The calcined hydrotalcite has no characteristic peaks in the area of 8 ̊ to 18 , and a characteristic peak at 43 ̊. The powder X-ray diffraction measurement was performed by a powder X-ray diffraction device (manufactured by PANalytical Co., Ltd., Empyrean), a cathode CuKα (1.5405 Å), a voltage of 45 V, a current of 40 mA, a sampling width of 0.0260 Torr, and a scanning speed of 0.0657. ̊ / s, measurement of the diffraction angle range (2θ): 5.0131 ~ 79.9711 ̊ conditions. The peak search system uses the peak search function of the software attached to the diffractive device. The minimum significance: 0.50, minimum peak chip: 0.01 ̊, maximum peak chip: 1.00 ̊, peak bottom width The condition of :2.00 ̊, method: minimum value of 2 times of differentiation is performed.
水滑石之BET比表面積較佳為1~250m2 /g,更佳為5~200m2 /g。水滑石之BET比表面積依據BET法,使用比表面積測定裝置(Macsorb HM Model 1210 MOUNTECH公司製)使氮氣體吸著在試料表面,可使用BET多點法算出。Hydrotalcite BET specific surface area is preferably 1 ~ 250m 2 / g, more preferably 5 ~ 200m 2 / g. The BET specific surface area of the hydrotalcite was measured by the BET method using a specific surface area measuring apparatus (manufactured by Macsorb HM Model 1210 MOUNTECH Co., Ltd.) to adsorb the nitrogen gas on the surface of the sample, and the BET multipoint method was used.
水滑石之平均粒徑較佳為1~1,000nm,更佳為10~800nm。水滑石之平均粒徑係藉由雷射繞射散射式粒度分布測定(JIS Z 8825),將粒度分布以體積基準作成時之該粒度分布的中位徑。The average particle diameter of the hydrotalcite is preferably from 1 to 1,000 nm, more preferably from 10 to 800 nm. The average particle diameter of the hydrotalcite is determined by a laser diffraction scattering particle size distribution (JIS Z 8825), and the median diameter of the particle size distribution when the particle size distribution is prepared on a volume basis.
水滑石可使用以表面處理劑經表面處理者。作為表面處理所使用之表面處理劑,例如可使用高級脂肪酸、烷基矽烷類、矽烷偶聯劑等,其中,適合為高級脂肪酸、烷基矽烷類。表面處理劑可使用1種或2種以上。Hydrotalcite can be used as a surface treatment agent for surface treatment. As the surface treatment agent used for the surface treatment, for example, a higher fatty acid, a alkyl decane, a decane coupling agent, or the like can be used, and among them, a higher fatty acid or a alkyl decane is preferable. One type or two or more types of surface treatment agents can be used.
作為高級脂肪酸,例如可列舉硬脂酸、褐煤酸、肉荳蔻酸、棕櫚酸等之碳數18以上之高級脂肪酸,其中,較佳為硬脂酸。此等可使用1種或2種以上。Examples of the higher fatty acid include higher fatty acids having 18 or more carbon atoms such as stearic acid, montanic acid, myristic acid, and palmitic acid. Among them, stearic acid is preferred. These may be used alone or in combination of two or more.
作為烷基矽烷類,例如可列舉甲基三甲氧基矽烷、乙基三甲氧基矽烷、己基三甲氧基矽烷、辛基三甲氧基矽烷、癸基三甲氧基矽烷、十八烷基三甲氧基矽烷、二甲基二甲氧基矽烷、辛基三乙氧基矽烷、n-十八烷基二甲基(3-(三甲氧基矽烷基)丙基)氯化銨等。此等可使用1種或2種以上。Examples of the alkyl decanes include methyltrimethoxydecane, ethyltrimethoxydecane, hexyltrimethoxydecane, octyltrimethoxydecane, decyltrimethoxydecane, and octadecyltrimethoxy. Decane, dimethyldimethoxydecane, octyltriethoxydecane, n-octadecyldimethyl(3-(trimethoxydecyl)propyl)ammonium chloride, and the like. These may be used alone or in combination of two or more.
作為矽烷偶聯劑,例如可列舉3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基(二甲氧基)甲基矽烷及2-(3,4-環氧環己基)乙基三甲氧基矽烷等之環氧系矽烷偶聯劑;3-巰基丙基三甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷及11-巰基十一烷基三甲氧基矽烷等之巰基系矽烷偶聯劑;3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-胺基丙基二甲氧基甲基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、N-甲基胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷及N-(2-胺基乙基)-3-胺基丙基二甲氧基甲基矽烷等之胺基系矽烷偶聯劑;3-脲基丙基三乙氧基矽烷等之脲基系矽烷偶聯劑、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷及乙烯基甲基二乙氧基矽烷等之乙烯基系矽烷偶聯劑;p-苯乙烯基三甲氧基矽烷等之苯乙烯基系矽烷偶聯劑;3-丙烯醯氧基丙基三甲氧基矽烷及3-甲基丙烯醯氧基丙基三甲氧基矽烷等之丙烯酸酯系矽烷偶聯劑;3-異氰酸酯丙基三甲氧基矽烷等之異氰酸酯系矽烷偶聯劑、雙(三乙氧基矽烷基丙基)二硫化物、雙(三乙氧基矽烷基丙基)四硫化物等之硫化物系矽烷偶聯劑;苯基三甲氧基矽烷、甲基丙烯醯氧基丙基三甲氧基矽烷、咪唑矽烷、三嗪矽烷等。此等可使用1種或2種以上。Examples of the decane coupling agent include 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, and 3-glycidoxypropyl (dimethyl). Epoxy decane coupling agent of oxy)methyl decane and 2-(3,4-epoxycyclohexyl)ethyltrimethoxy decane; 3-mercaptopropyltrimethoxydecane, 3-mercaptopropyl a decyl decane coupling agent such as triethoxy decane, 3-mercaptopropylmethyldimethoxydecane or 11-decylundecyltrimethoxydecane; 3-aminopropyltrimethoxydecane, 3-Aminopropyltriethoxydecane, 3-aminopropyldimethoxymethylnonane, N-phenyl-3-aminopropyltrimethoxydecane, N-methylaminopropyl Trimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane and N-(2-aminoethyl)-3-aminopropyldimethoxymethyl Amino decane coupling agent such as decane; urea-based decane coupling agent such as 3-ureidopropyltriethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane and vinyl Vinyl decane coupling agent such as bis-ethoxy decane; p-styryl trimethoxy a styrene-based decane coupling agent such as decane; an acrylate-based decane coupling agent such as 3-propenyloxypropyltrimethoxydecane or 3-methylpropoxypropyltrimethoxydecane; a sulfide such as an isocyanate-based decane coupling agent such as isocyanatepropyltrimethoxydecane, bis(triethoxydecylpropyl)disulfide or bis(triethoxydecylpropyl)tetrasulfide A decane coupling agent; phenyltrimethoxydecane, methacryloxypropyltrimethoxydecane, imidazolium, triazine decane, and the like. These may be used alone or in combination of two or more.
水滑石之表面處理例如可藉由邊將未處理之水滑石以混合機在常溫攪拌分散,邊添加噴霧表面處理劑,攪拌5~60分鐘來進行。作為混合機,可使用公知之混合機,例如可列舉V攪拌機、絲帶攪拌機、泡泡錐攪拌機等之攪拌機、亨舍爾攪拌機及混凝土攪拌機等之混合機、球磨機、絞磨機等。又,亦可以球磨機等進行粉碎時,添加前述之高級脂肪酸、烷基矽烷類或矽烷偶聯劑,進行表面處理。表面處理劑之使用量雖因水滑石的種類或表面處理劑的種類等而有所不同,但相對於未被表面處理之水滑石100質量份,較佳為1~10質量份。在本發明,經表面處理之水滑石亦包含在本發明之「水滑石」。The surface treatment of the hydrotalcite can be carried out, for example, by adding the spray surface treatment agent to the untreated hydrotalcite while stirring and dispersing the mixture at room temperature, and stirring for 5 to 60 minutes. As the mixer, a known mixer can be used, and examples thereof include a mixer such as a V mixer, a ribbon mixer, a bubble cone mixer, a mixer such as a Henschel mixer and a concrete mixer, a ball mill, a honing machine, and the like. Further, when pulverizing by a ball mill or the like, the above-mentioned higher fatty acid, alkyldecane or decane coupling agent may be added to carry out surface treatment. The amount of the surface treatment agent used varies depending on the type of the hydrotalcite or the type of the surface treatment agent, and is preferably from 1 to 10 parts by mass based on 100 parts by mass of the hydrotalcite which is not surface-treated. In the present invention, the surface-treated hydrotalcite is also included in the "hydrotalcite" of the present invention.
在本發明之密封用樹脂組成物之水滑石的含量,若能發揮本發明之效果,雖並非被特別限定者,但相對於樹脂組成物之不揮發分100質量%,較佳為10~70質量%,更佳為15~60質量%,再更佳為30~50質量%。水滑石由於吸濕性能優異,若增加其含量,提昇所得之硬化物的水分遮斷性。惟,其含量超過70質量%時,變成有產生樹脂組成物的黏度上昇、因潤濕性降低導致密封對象之基板等與樹脂組成物的密著性降低、降低硬化物的強度而變脆等之問題的傾向。又,藉由水滑石之層間水,由於增多密封層(亦即硬化物)中之水分量,例如在有機EL裝置之製造,因密封層中之水分導致對發光材料(發光層)或電極層之不良影響顯在化,有初期階段之黑點發生增多的懸念。The content of the hydrotalcite of the resin composition for sealing of the present invention is not particularly limited as long as the effect of the present invention is exerted, but the nonvolatile content of the resin composition is preferably 100% by mass, preferably 10 to 70%. The mass % is more preferably 15 to 60% by mass, still more preferably 30 to 50% by mass. Hydrotalcite is excellent in moisture absorption performance, and if it is increased in content, the moisture barrier property of the obtained cured product is improved. However, when the content is more than 70% by mass, the viscosity of the resin composition is increased, and the adhesion between the substrate to be sealed and the like is lowered due to a decrease in wettability, and the strength of the cured product is lowered to become brittle. The tendency of the problem. Further, by the inter-layer water of the hydrotalcite, the amount of water in the sealing layer (that is, the cured product) is increased, for example, in the production of an organic EL device, the luminescent material (light-emitting layer) or the electrode layer is caused by moisture in the sealing layer. The adverse effects are obvious, and there are suspense in which the black spots in the initial stage increase.
作為半燒成水滑石之具體例,例如可列舉「DHT-4C」(協和化學工業公司製、平均粒徑:400nm)、「DHT-4A-2」(協和化學工業公司製、平均粒徑:400nm)等。另外,作為燒成水滑石,例如可列舉「KW-2200」(協和化學工業公司製、平均粒徑:400nm)等,作為未燒成水滑石,例如可列舉「DHT-4A」(協和化學工業公司製、平均粒徑:400nm)等。Specific examples of the semi-calcined hydrotalcite include "DHT-4C" (manufactured by Kyowa Chemical Industry Co., Ltd., average particle diameter: 400 nm), and "DHT-4A-2" (manufactured by Kyowa Chemical Industry Co., Ltd., average particle diameter: 400nm) and so on. In addition, examples of the calcined hydrotalcite include "KW-2200" (manufactured by Kyowa Chemical Industry Co., Ltd., average particle diameter: 400 nm), and examples of the unfired hydrotalcite include "DHT-4A" (Kyowa Chemical Industry Co., Ltd.). Company system, average particle size: 400nm).
<氧化鈣>
本發明之密封用樹脂組成物係含有氧化鈣。本發明之密封用樹脂組成物中之相對於水滑石之氧化鈣的比例若發揮本發明之效果,雖並非被特別限定者,但較佳為以質量比為0.1~1,更佳為以質量比為0.1~0.75,再更佳為以質量比為0.15~0.55。質量比較0.1更低時,變成難以發揮本發明之效果的傾向,質量比較1更高時,變成產生樹脂組成物的含水率增加、水分遮斷性降低等之問題的傾向。<calcium oxide>
The resin composition for sealing of the present invention contains calcium oxide. The ratio of the calcium oxide to the hydrotalcite in the resin composition for sealing of the present invention is not particularly limited as long as the effect of the present invention is exerted, but the mass ratio is preferably 0.1 to 1, more preferably the mass. The ratio is 0.1 to 0.75, and more preferably 0.1 to 0.55 by mass. When the mass ratio is lower than 0.1, the effect of the present invention tends to be insufficient. When the mass ratio is higher, the water content of the resin composition tends to increase, and the water barrier property tends to decrease.
氧化鈣之粒子形態並未特別限定,可使用如略球狀、直方體狀、板狀、纖維之直線形狀、被分枝之分枝形狀。The particle form of the calcium oxide is not particularly limited, and a branched shape such as a slightly spherical shape, a rectangular parallelepiped shape, a plate shape, or a fiber shape, or a branched branch shape can be used.
氧化鈣之平均粒徑較佳為0.1~20μm,更佳為0.1~15μm。氧化鈣之平均粒徑係藉由雷射繞射散射式粒度分布測定(JIS Z 8825),將粒度分布以體積基準作成時之該粒度分布的中位徑。The average particle diameter of the calcium oxide is preferably from 0.1 to 20 μm, more preferably from 0.1 to 15 μm. The average particle diameter of calcium oxide is a median diameter of the particle size distribution when the particle size distribution is prepared on a volume basis by a laser diffraction scattering type particle size distribution measurement (JIS Z 8825).
<構成樹脂組成物之樹脂>
構成本發明之密封用樹脂組成物之樹脂,若為在該領域使用在密封用樹脂組成物者,則並非被特別限定者,雖可使用1種或2種以上,但較佳為選自丙烯酸樹脂及環氧樹脂中之至少1種的樹脂,更佳為至少1種的丙烯酸樹脂。<Resin constituting the resin composition>
The resin constituting the resin composition for sealing of the present invention is not particularly limited as long as it is used for the resin composition for sealing in the field, and one type or two or more types may be used, but it is preferably selected from acrylic acid. The resin of at least one of the resin and the epoxy resin is more preferably at least one type of acrylic resin.
樹脂為丙烯酸樹脂時,本發明之密封用樹脂組成物,例如係含有以下之於1分子中具有2個以上乙烯性不飽和基之化合物(於1分子中具有2個以上(甲基)丙烯醯基之(甲基)丙烯酸酯)及自由基聚合起始劑者。When the resin is an acryl resin, the resin composition for sealing of the present invention contains, for example, a compound having two or more ethylenically unsaturated groups in one molecule (having two or more (meth) acrylonitriles in one molecule). Base (meth) acrylate) and radical polymerization initiators.
<於1分子中具有2個以上乙烯性不飽和基之化合物>
於1分子中具有2個以上乙烯性不飽和基之化合物(以下,有時簡稱「多官能乙烯性不飽和化合物」)可僅1種單獨使用,亦可併用2種以上。多官能乙烯性不飽和化合物於發揮本發明之效果的範圍,可包含環氧基等之其他官能基。尚,包含環氧基之多官能乙烯性不飽和化合物,於本發明並非環氧樹脂,而是被分類成多官能乙烯性不飽和化合物。<Compound having two or more ethylenically unsaturated groups in one molecule>
The compound having two or more ethylenically unsaturated groups in one molecule (hereinafter, abbreviated as "polyfunctional ethylenically unsaturated compound") may be used alone or in combination of two or more. The polyfunctional ethylenically unsaturated compound may contain other functional groups such as an epoxy group in the range in which the effects of the present invention are exerted. Further, the polyfunctional ethylenically unsaturated compound containing an epoxy group is not an epoxy resin in the present invention, but is classified into a polyfunctional ethylenically unsaturated compound.
多官能乙烯性不飽和化合物由於將本發明之密封用樹脂組成物定為液狀,故較佳為液狀。於此所謂「液狀」,係指於常溫(25℃)及常壓(1氣壓)之多官能乙烯性不飽和化合物的狀態。多官能乙烯性不飽和化合物為2種以上之化合物的混合物時,較佳為此等之混合物為液狀。例如,使用固體之多官能乙烯性不飽和化合物與液狀之多官能乙烯性化合物時,較佳為此等化合物之混合物為液狀。The polyfunctional ethylenically unsaturated compound is preferably in a liquid form because the resin composition for sealing of the present invention is made into a liquid form. The term "liquid" as used herein refers to a state of a polyfunctional ethylenically unsaturated compound at normal temperature (25 ° C) and normal pressure (1 atmosphere). When the polyfunctional ethylenically unsaturated compound is a mixture of two or more kinds of compounds, it is preferred that the mixture is liquid. For example, when a solid polyfunctional ethylenically unsaturated compound and a liquid polyfunctional ethylenic compound are used, it is preferred that the mixture of such compounds be in a liquid form.
多官能乙烯性不飽和化合物從形成高密度之交聯構造,且發揮高水分遮斷性的觀點來看,較佳為包含於1分子中具有3個以上乙烯性不飽和基之化合物,更佳為於1分子中具有4個以上乙烯性不飽和基,再更佳為於1分子中具有5個以上乙烯性不飽和基之化合物,特佳為於1分子中具有6個以上乙烯性不飽和基之化合物。在多官能乙烯性不飽和化合物,1分子中所包含之乙烯性不飽和基數的上限雖並未特別限定,但其數較佳為15以下,更佳為12以下,再更佳為10以下。The polyfunctional ethylenically unsaturated compound is preferably a compound having three or more ethylenically unsaturated groups in one molecule, from the viewpoint of forming a high-density crosslinked structure and exhibiting high moisture blocking property. In order to have four or more ethylenically unsaturated groups in one molecule, and more preferably a compound having five or more ethylenically unsaturated groups in one molecule, it is particularly preferable to have six or more ethylenic unsaturation in one molecule. Base compound. In the polyfunctional ethylenically unsaturated compound, the upper limit of the number of ethylenically unsaturated groups contained in one molecule is not particularly limited, but the number thereof is preferably 15 or less, more preferably 12 or less, still more preferably 10 or less.
多官能乙烯性不飽和化合物,從提高水分遮斷性的觀點來看,較佳為包含於1分子中具有2個以上乙烯性不飽和基及脂環式構造之化合物,更佳為於1分子中具有2個乙烯性不飽和基及脂環式構造之化合物。作為脂環式構造,例如可列舉具有碳原子數5~12之脂環式烴環之構造。作為脂環式烴環,例如可列舉三環[5.2.1.02,6 ]癸烷環、莰烷環、異莰烷環、環己烷環、聯環辛烷環、降莰烷環、環癸烷環、金剛烷環、環戊烷環等。可於脂環式構造中具有雜原子。又,脂環式構造可鍵結烷基、烷氧基、伸烷基等之取代基。The polyfunctional ethylenically unsaturated compound is preferably a compound having two or more ethylenically unsaturated groups and an alicyclic structure in one molecule, and more preferably one molecule, from the viewpoint of improving water blocking properties. A compound having two ethylenically unsaturated groups and an alicyclic structure. Examples of the alicyclic structure include a structure having an alicyclic hydrocarbon ring having 5 to 12 carbon atoms. Examples of the alicyclic hydrocarbon ring include a tricyclo[5.2.1.0 2,6 ]decane ring, a decane ring, an isodecane ring, a cyclohexane ring, a bicyclooctane ring, a norbornane ring, and a ring. A decane ring, an adamantane ring, a cyclopentane ring, and the like. It may have a hetero atom in the alicyclic structure. Further, the alicyclic structure may bond a substituent such as an alkyl group, an alkoxy group or an alkylene group.
使用於1分子中具有2個以上乙烯性不飽和基及脂環式構造之化合物(尤其是於1分子中具有2個乙烯性不飽和基及脂環式構造之化合物)時,其含量相對於樹脂組成物全體,較佳為5質量%以上,更佳為10質量%以上,再更佳為15質量%以上,較佳為75質量%以下,更佳為70質量%以下,再更佳為65質量%以下。When used in a compound having two or more ethylenically unsaturated groups and an alicyclic structure in one molecule (especially a compound having two ethylenically unsaturated groups and an alicyclic structure in one molecule), the content thereof is relative to The total amount of the resin composition is preferably 5% by mass or more, more preferably 10% by mass or more, still more preferably 15% by mass or more, more preferably 75% by mass or less, still more preferably 70% by mass or less, and still more preferably 65 mass% or less.
<於1分子中具有3個以上乙烯性不飽和基之化合物>
使用於1分子中具有3個以上乙烯性不飽和基之化合物時,其含量從發揮高水分遮斷性的觀點來看,相對於樹脂組成物全體,較佳為2質量%以上,更佳為3質量%以上,再更佳為4質量%以上,較佳為70質量%以下,更佳為65質量%以下,再更佳為60質量%以下。<Compound having three or more ethylenically unsaturated groups in one molecule>
When the compound having three or more ethylenically unsaturated groups in one molecule is used, the content thereof is preferably 2% by mass or more, more preferably 2% by mass or more, based on the total amount of the resin composition. 3 mass% or more, more preferably 4 mass% or more, preferably 70 mass% or less, more preferably 65 mass% or less, still more preferably 60 mass% or less.
作為乙烯性不飽和基,較佳為(甲基)丙烯醯基。亦即,作為具有乙烯性不飽和基之化合物,較佳為具有(甲基)丙烯醯基之(甲基)丙烯酸酯。本說明書中,所謂「(甲基)丙烯醯基」,係意指「丙烯醯基及/或甲基丙烯醯基」,所謂「(甲基)丙烯酸酯」,係意指「丙烯酸酯及/或甲基丙烯酸酯」。尚,有時將於1分子中具有2個以上(甲基)丙烯醯基之(甲基)丙烯酸酯簡稱為以下「多官能(甲基)丙烯酸酯」。又,有時將於1分子中具有2個(甲基)丙烯醯基之(甲基)丙烯酸酯簡稱為「2官能(甲基)丙烯酸酯」。As the ethylenically unsaturated group, a (meth) acrylonitrile group is preferred. That is, as the compound having an ethylenically unsaturated group, a (meth) acrylate having a (meth) acrylonitrile group is preferred. In the present specification, the term "(meth)acryloyl group" means "acryloyl fluorenyl group and/or methacryl fluorenyl group", and "(meth) acrylate" means "acrylate" and / Or methacrylate." Further, a (meth) acrylate having two or more (meth) acrylonitrile groups in one molecule may be simply referred to as "polyfunctional (meth) acrylate" below. Further, a (meth) acrylate having two (meth) acrylonitrile groups in one molecule may be simply referred to as "bifunctional (meth) acrylate".
作為多官能(甲基)丙烯酸酯,可使用寡聚物。作為寡聚物,例如可列舉以聚酯多元醇與丙烯酸之反應而合成之聚酯寡聚物、具有胺基甲酸酯鍵之胺基甲酸酯寡聚物、以環氧丙基醚與具有丙烯酸或羧基之丙烯酸酯的反應而合成之環氧寡聚物等。As the polyfunctional (meth) acrylate, an oligomer can be used. Examples of the oligomer include a polyester oligomer synthesized by a reaction of a polyester polyol and acrylic acid, a urethane oligomer having a urethane bond, and a glycidyl ether. An epoxy oligomer or the like synthesized by a reaction of an acrylate of an acrylic acid or a carboxyl group.
作為2官能(甲基)丙烯酸酯,例如可列舉Daicel Orneex公司製「DPGDA」(二丙二醇二丙烯酸酯)、「HDDA」(1,6-己烷二醇 二丙烯酸酯)、「TPGDA」(三丙二醇二丙烯酸酯)、「EBECRYL145」(PO改質新戊二醇 二丙烯酸酯)、「EBECRYL150」(改質雙酚A 二丙烯酸酯)、「IRR214-K」(三環癸烷二甲醇 二丙烯酸酯)、「EBECRYL11」(PEG600二丙烯酸酯)、「HPNDA」(新戊二醇 羥基新戊酸酯 二丙烯酸酯)、共榮社化學公司製「LIGHT ESTER EG」(乙二醇 二甲基丙烯酸酯)、「LIGHT ESTER NP-A」(新戊二醇 二甲基丙烯酸酯)、「LIGHT ESTER 2EG」(二乙二醇 二甲基丙烯酸酯)、「LIGHT ESTER 1.6HX」(1,6-己烷二醇 二甲基丙烯酸酯)、「LIGHT ESTER 1.9ND」(1,9-壬烷二醇 二甲基丙烯酸酯)、「LIGHT ESTER G-101P」(甘油二甲基丙烯酸酯)、「LIGHT ESTER BP-2EMK」(雙酚A之EO加成物 二甲基丙烯酸酯)、「LIGHT ACRYLATE NP-A」(新戊二醇 二丙烯酸酯)、「LIGHT ACRYLATE 1.9ND-A」(1,9-壬烷二醇 二丙烯酸酯)、「LIGHT ACRYLATE BP-4EAL」(雙酚A之EO加成物 二丙烯酸酯)、「LIGHT ACRYLATE BP-4PA」(雙酚A之PO加成物 二丙烯酸酯)、新中村化學工業公司製「NK ESTER 701A」(2-羥基-3-甲基丙烯醯基丙基丙烯酸酯)、「NK ESTER A-200」(聚乙二醇#200二丙烯酸酯)、「NK ESTER APG-400」(聚丙二醇#400二丙烯酸酯)、「NK ESTER A-PTMG-65」(聚四亞甲基二醇#650二丙烯酸酯)、「NK ESTER A-1206PE」(聚乙烯聚丙二醇 二丙烯酸酯)、「NK ESTER ESTERA-BPEF」(9,9-雙[4-(2-羥基乙氧基)苯基]茀二丙烯酸酯)、「NK ESTER ESTERA-BPE30」(乙氧基化雙酚A 二丙烯酸酯)、「NK ESTER A-BPP-3」(丙氧基化雙酚A 二丙烯酸酯)、「NK ESTER BG」(1,3-丁烷二醇 二甲基丙烯酸酯)、「NK ESTER 701」(2-羥基-1,3-二甲基丙烯醯氧基丙烷)、「NK ESTER 3PG」(三丙二醇 二甲基丙烯酸酯)、「NK ESTER ESTER酯1206PE」(聚乙烯聚丙二醇 二甲基丙烯酸酯)、「NK ESTER DCP」(三環癸烷二甲醇 二甲基丙烯酸酯)、日本化藥公司製「KAYARAD FM-400」、「KAYARAD HX-220」、「KAYARAD HX-620」(新戊基改質二丙烯酸酯)、「KAYARAD R-604」(二噁烷二醇二丙烯酸酯)、「KAYARAD UX-3204」(於1分子中具有2個丙烯醯基之寡聚物)、大阪有機化學工業公司製「BISCOAT #195」(1,4-丁烷二醇 二丙烯酸酯)、「BISCOAT #540」(雙酚A二環氧丙基醚 丙烯酸加成物)、阿科瑪公司製「CD406」(環己烷二甲醇 二丙烯酸酯)、「SR562」(烷氧基化己烷二醇 二丙烯酸酯)、Daicel Orneex公司製「EBECRYL600」(於1分子中具有2個丙烯醯基之雙酚A型環氧丙烯酸酯)、「EBECRYL210」(於1分子中具有2個丙烯醯基之芳香族胺基甲酸酯寡聚物)、「EBECRYL230」(於1分子中具有2個丙烯醯基之脂肪族胺基甲酸酯寡聚物)、「EBECRYL436」(於1分子中具有2個丙烯醯基之酯寡聚物)、阿科瑪公司製「CN959」(於1分子中具有2個丙烯醯基之胺基甲酸酯寡聚物)、根上工業公司製「Art Resin UN-9000PEP」(於1分子中具有2個丙烯醯基之胺基甲酸酯寡聚物)、「Art Resin UN-333」(於1分子中具有2個丙烯醯基之寡聚物)等。Examples of the bifunctional (meth) acrylate include "DPGDA" (dipropylene glycol diacrylate) manufactured by Daicel Orneex Co., Ltd., "HDDA" (1,6-hexanediol diacrylate), and "TPGDA" (three Propylene glycol diacrylate), "EBECRYL145" (PO modified neopentyl glycol diacrylate), "EBECRYL150" (modified bisphenol A diacrylate), "IRR214-K" (tricyclodecane dimethanol diacrylate Ester), "EBECRYL11" (PEG600 diacrylate), "HPNDA" (neopentyl glycol hydroxypivalate diacrylate), "LIGHT ESTER EG" manufactured by Kyoeisha Chemical Co., Ltd. (ethylene glycol dimethacrylate) Ester), "LIGHT ESTER NP-A" (neopentylene glycol dimethacrylate), "LIGHT ESTER 2EG" (diethylene glycol dimethacrylate), "LIGHT ESTER 1.6HX" (1,6- Hexane diol dimethacrylate), "LIGHT ESTER 1.9ND" (1,9-decanediol dimethacrylate), "LIGHT ESTER G-101P" (glycerol dimethacrylate), " LIGHT ESTER BP-2EMK" (EO addition product dimethacrylate of bisphenol A), "LIGHT ACRYLATE NP-A" (neopentylene glycol diacrylate), "LIGH T ACRYLATE 1.9ND-A" (1,9-nonanediol diacrylate), "LIGHT ACRYLATE BP-4EAL" (EO addition product diacrylate of bisphenol A), "LIGHT ACRYLATE BP-4PA" ( "NK ESTER 701A" (2-hydroxy-3-methylpropenyl propyl acrylate), "NK ESTER A-200" manufactured by Shin-Nakamura Chemical Co., Ltd. PEG Ether APG-400, NK ESTER A-PTMG-65, polytetramethylene glycol #650 diacrylate ), "NK ESTER A-1206PE" (polyethylene polypropylene glycol diacrylate), "NK ESTER ESTERA-BPEF" (9,9-bis[4-(2-hydroxyethoxy)phenyl]indole diacrylate ), "NK ESTER ESTERA-BPE30" (ethoxylated bisphenol A diacrylate), "NK ESTER A-BPP-3" (propoxylated bisphenol A diacrylate), "NK ESTER BG" ( 1,3-butanediol dimethacrylate), "NK ESTER 701" (2-hydroxy-1,3-dimethylpropenyloxypropane), "NK ESTER 3PG" (tripropylene glycol dimethyl) Acrylate), "NK ESTER ESTER Ester 1206PE" (polyethylene polypropylene glycol II) "Acrylate", "NK ESTER DCP" (tricyclodecane dimethanol dimethacrylate), "KAYARAD FM-400" manufactured by Nippon Kayaku Co., Ltd., "KAYARAD HX-220", "KAYARAD HX-620" ( Neopentyl modified diacrylate), "KAYARAD R-604" (dioxane diol diacrylate), "KAYARAD UX-3204" (oligomer having 2 propylene sulfhydryl groups in one molecule), Osaka Chemical Industry Co., Ltd. "BISCOAT #195" (1,4-butanediol diacrylate), "BISCOAT #540" (bisphenol A diglycidyl ether acrylic acid adduct), Arkema "CD406" (cyclohexanedimethanol diacrylate), "SR562" (alkoxylated hexanediol diacrylate), "EBECRYL600" manufactured by Daicel Orneex Co., Ltd. (having 2 acrylonitrile groups in one molecule) Bisphenol A type epoxy acrylate), "EBECRYL210" (an aromatic urethane oligomer having two propylene groups in one molecule), "EBECRYL230" (having two propylene in one molecule) "Ethyl urethane oligomer of sulfhydryl group", "EBECRYL436" (an ester oligomer having two propylene groups in one molecule), "C of Arkema Co., Ltd." N959" (amino acrylate oligomer having two acrylonitrile groups in one molecule), "Art Resin UN-9000PEP" manufactured by Kokuwon Industrial Co., Ltd. (Amino group having two propylene groups in one molecule) An acid ester oligomer), "Art Resin UN-333" (an oligomer having two propylene groups in one molecule), and the like.
作為於1分子中具有3個以上(甲基)丙烯醯基之(甲基)丙烯酸酯,例如可列舉共榮社化學公司製「LIGHT ESTER TMP」(三羥甲基丙烷 三甲基丙烯酸酯)、LIGHT ACRYLATE PE-3A」(季戊四醇 三丙烯酸酯)、「LIGHT ACRYLATE PE-4A」(季戊四醇 四丙烯酸酯)、「LIGHT ACRYLATE DGE-4A」(EO加成物改質二甘油四丙烯酸酯)、Daicel Orneex公司製「PETIA」(季戊四醇 (三/四)丙烯酸酯)、TMPTA(三羥甲基丙烷 三丙烯酸酯)、TMPEOTA(三羥甲基丙烷乙氧基三丙烯酸酯)、「EBECRYL135」(三羥甲基丙烷丙氧基三丙烯酸酯)、「PETA」(季戊四醇 (三/四)丙烯酸酯)、「DPHA」(二季戊四醇 六丙烯酸酯)、新中村化學工業公司製「NK ESTER A-TMPT」(三羥甲基丙烷 三丙烯酸酯)、「NK ESTER A-TMPT-3PO」(丙氧基化三羥甲基丙烷 三丙烯酸酯)、「NK ESTER A-GLY-6E」(乙氧基化甘油 三丙烯酸酯)、「NK ESTER A-GLY-6P」(丙氧基化甘油 三丙烯酸酯)、「NK ESTER A-9300」(參-(2-丙烯醯氧基乙基)異氰脲酸酯)、「NK ESTER A-9200」(雙/參-(2-丙烯醯氧基乙基)異氰脲酸酯)、「NK ESTER A-9300-1CL」(己內酯改質參-(2-丙烯醯氧基乙基)異氰脲酸酯)、「NK ESTER ATM-4EL」(乙氧基化季戊四醇(三/四)丙烯酸酯)、日本化藥公司製「KAYARAD DPCA-20」(6官能丙烯酸酯)、「KAYARAD DPCA-60」(6官能丙烯酸酯)、「T-1420(T)」(4官能丙烯酸酯)、「DPEA-12」(6官能丙烯酸酯)、「KAYARAD DPHA-40H」(於1分子中具有10個丙烯醯基之寡聚物)、大阪有機化學工業公司製「BISCOAT #802」(季戊四醇丙烯酸酯)、「BISCOAT #1000」(樹枝狀分子(Dendrimer)丙烯酸酯)、阿科瑪公司製「CN989NS」(於1分子中具有3個丙烯醯基之脂肪族胺基甲酸酯寡聚物)、「CN9039」(於1分子中具有6個丙烯醯基之脂肪族胺基甲酸酯寡聚物)、根上工業公司製「UN-3320HA」、「UN-3320HC」、「UN-906S」(於1分子中具有6個丙烯醯基之脂肪族胺基甲酸酯寡聚物)、DIC公司製「DICLITE UE-8740」(於1分子中具有3個丙烯醯基之酚酚醛清漆型環氧丙烯酸酯)等。尚,所謂「季戊四醇 (三/四)丙烯酸酯」,係意指季戊四醇三丙烯酸酯及季戊四醇四丙烯酸酯之混合物。其他「(三/四)」等亦為相同之意義。For example, "LIGHT ESTER TMP" (trimethylolpropane trimethacrylate) manufactured by Kyoeisha Chemical Co., Ltd. is used as the (meth) acrylate having three or more (meth) acrylonitrile groups in one molecule. , LIGHT ACRYLATE PE-3A" (pentaerythritol triacrylate), "LIGHT ACRYLATE PE-4A" (pentaerythritol tetraacrylate), "LIGHT ACRYLATE DGE-4A" (EO adduct modified diglycerol tetraacrylate), Daicel "PETIA" (pentaerythritol (tri/tetra) acrylate), TMPTA (trimethylolpropane triacrylate), TMPEOTA (trimethylolpropane ethoxy triacrylate), "EBECRYL135" (trihydroxyl) "Methylpropane propoxy triacrylate", "PETA" (pentaerythritol (tri/tetra) acrylate), "DPHA" (dipentaerythritol hexaacrylate), "NK ESTER A-TMPT" manufactured by Shin-Nakamura Chemical Industry Co., Ltd. ( Trimethylolpropane triacrylate), "NK ESTER A-TMPT-3PO" (propoxylated trimethylolpropane triacrylate), "NK ESTER A-GLY-6E" (ethoxylated glycerol) Acrylate), "NK ESTER A-GLY-6P" (propoxylated triglyceride), "NK ES TER A-9300" (para-(2-propenyloxyethyl) isocyanurate), "NK ESTER A-9200" (bis/gin-(2-propenyloxyethyl) isocyanurate Acid ester), "NK ESTER A-9300-1CL" (caprolactone modified ginseng-(2-propenyloxyethyl) isocyanurate), "NK ESTER ATM-4EL" (ethoxylated) Pentaerythritol (tri/tetra) acrylate), "KAYARAD DPCA-20" (6-functional acrylate) manufactured by Nippon Kayaku Co., Ltd., "KAYARAD DPCA-60" (6-functional acrylate), "T-1420(T)" ( 4-functional acrylate), "DPEA-12" (6-functional acrylate), "KAYARAD DPHA-40H" (oligomer having 10 acrylonitrile groups in one molecule), and "BISCOAT #" manufactured by Osaka Organic Chemical Industry Co., Ltd. 802" (pentaerythritol acrylate), "BISCOAT #1000" (dendrimer acrylate), "CN989NS" manufactured by Arkema Co., Ltd. (an aliphatic carbamic acid having 3 acrylonitrile groups in one molecule) "Ester oligomer"), "CN9039" (an aliphatic urethane oligomer having 6 acrylonitrile groups in one molecule), "UN-3320HA" manufactured by Gensal Industries Co., Ltd., "UN-3320HC", " UN-906S" (6 acrylonitrile in 1 molecule) The aliphatic urethane oligomer), DIC Corporation "DICLITE UE-8740" (a phenolic novolac Bing Xixi three groups of novolak type epoxy acrylate in the molecule) and the like. Further, the term "pentaerythritol (tri/tetra) acrylate" means a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate. Other "(three/four)" and so on are also of the same meaning.
作為具有脂環式構造之多官能(甲基)丙烯酸酯,例如可列舉具有三環[5.2.1.02,6 ]癸烷環構造之Daicel Orneex公司製「IRR214-K」(三環癸烷二甲醇二丙烯酸酯)、三菱氣體化學公司製之1,3-金剛烷二醇二丙烯酸酯等。Examples of the polyfunctional (meth) acrylate having an alicyclic structure include "IRR214-K" (Tricyclodecane II) manufactured by Daicel Orneex Co., Ltd. having a tricyclo[5.2.1.0 2,6 ]decane ring structure. Methanol diacrylate), 1,3-adamantanediol diacrylate manufactured by Mitsubishi Gas Chemical Co., Ltd., and the like.
多官能乙烯性不飽和化合物的含量相對於樹脂組成物全體,較佳為20~78質量%,更佳為25~75質量%,再更佳為30~70質量%。The content of the polyfunctional ethylenically unsaturated compound is preferably from 20 to 78% by mass, more preferably from 25 to 75% by mass, still more preferably from 30 to 70% by mass, based on the total of the resin composition.
<於1分子中具有1個乙烯性不飽和基之化合物>
可含有於1分子中具有1個乙烯性不飽和基之化合物(以下,有時簡稱為「單官能乙烯性不飽和化合物」)。「單官能乙烯性不飽和化合物」如後述,作為稀釋劑有包含在本發明之密封用樹脂組成物的情況。單官能乙烯性不飽和化合物於發揮本發明之效果的範圍,可包含環氧基等之其他官能基。作為這般的化合物,例如可列舉於1分子中具有1個以上環氧基及1個乙烯性不飽和基之化合物。尚,包含環氧基之單官能乙烯性不飽和化合物,於本發明並非環氧樹脂而是被分類成單官能乙烯性不飽和化合物。<Compound having one ethylenically unsaturated group in one molecule>
A compound having one ethylenically unsaturated group in one molecule (hereinafter sometimes referred to simply as "monofunctional ethylenically unsaturated compound") may be contained. The "monofunctional ethylenically unsaturated compound" is a case where it is contained in the sealing resin composition of the present invention as a diluent as will be described later. The monofunctional ethylenically unsaturated compound may include other functional groups such as an epoxy group in the range in which the effects of the present invention are exerted. As such a compound, for example, a compound having one or more epoxy groups and one ethylenically unsaturated group in one molecule can be mentioned. Further, a monofunctional ethylenically unsaturated compound containing an epoxy group is classified as a monofunctional ethylenically unsaturated compound in the present invention instead of an epoxy resin.
作為環氧基及於1分子中具有1個乙烯性不飽和基之化合物的市售品,例如可列舉Daicel Orneex公司製「CYCLOMER M100」(3,4-環氧環己基甲基甲基丙烯酸酯)、「UVACURE1561」(環氧基及於1分子中具有1個丙烯醯基之化合物(含量:78~82質量%)與雙酚A型環氧樹脂(含量:18~22質量%)之混合物)、日本化成公司製「4HBAGE」(4-羥基丁基丙烯酸酯環氧丙基醚)等。As a commercially available product of an epoxy group and a compound having one ethylenic unsaturated group in one molecule, for example, "CYCLOMER M100" (3,4-epoxycyclohexylmethyl methacrylate) manufactured by Daicel Orneex Co., Ltd. ), "UVACURE 1561" (a mixture of an epoxy group and a compound having one propylene fluorenyl group in one molecule (content: 78 to 82% by mass) and a bisphenol A type epoxy resin (content: 18 to 22% by mass) ), "4HBAGE" (4-hydroxybutyl acrylate epoxy propyl ether) manufactured by Nippon Kasei Co., Ltd., and the like.
本發明之密封用樹脂組成物包含單官能乙烯性不飽和化合物時,其含量相對於樹脂組成物全體,較佳為0.5質量%以上,更佳為1質量%以上,再更佳為1.5質量%以上,較佳為55質量%以下,更佳為50質量%以下,再更佳為40質量%以下。When the resin composition for sealing of the present invention contains a monofunctional ethylenically unsaturated compound, the content thereof is preferably 0.5% by mass or more, more preferably 1% by mass or more, and still more preferably 1.5% by mass based on the entire resin composition. The above is preferably 55 mass% or less, more preferably 50 mass% or less, still more preferably 40 mass% or less.
<具有乙烯性不飽和基之化合物>
將上述之「多官能乙烯性不飽和化合物」及「單官能乙烯性不飽和化合物」集中記載為「具有乙烯性不飽和基之化合物」。具有此乙烯性不飽和基之化合物的含量相對於樹脂組成物全體,較佳為30~80質量%,更佳為35~80質量%,再更佳為40~80質量%。<Compounds having an ethylenically unsaturated group>
The above-mentioned "polyfunctional ethylenically unsaturated compound" and "monofunctional ethylenically unsaturated compound" are collectively described as "a compound having an ethylenically unsaturated group". The content of the compound having such an ethylenically unsaturated group is preferably from 30 to 80% by mass, more preferably from 35 to 80% by mass, still more preferably from 40 to 80% by mass, based on the total of the resin composition.
<自由基聚合起始劑>
自由基聚合起始劑可為僅1種,亦可為2種以上。自由基聚合起始劑可為光自由基聚合起始劑,亦可為熱自由基聚合起始劑。亦即,自由基聚合起始劑為光自由基聚合起始劑及/或熱自由基聚合起始劑。自由基聚合起始劑,較佳為光自由基聚合起始劑或熱自由基聚合起始劑。光自由基聚合起始劑及熱自由基聚合起始劑皆可為僅1種,亦可為2種以上。<Free radical polymerization initiator>
The radical polymerization initiator may be used alone or in combination of two or more. The radical polymerization initiator may be a photoradical polymerization initiator or a thermal radical polymerization initiator. That is, the radical polymerization initiator is a photoradical polymerization initiator and/or a thermal radical polymerization initiator. The radical polymerization initiator is preferably a photoradical polymerization initiator or a thermal radical polymerization initiator. The photoradical polymerization initiator and the thermal radical polymerization initiator may be used alone or in combination of two or more.
作為光自由基聚合起始劑,例如可列舉苯乙酮、二乙氧基苯乙酮、2-[4-(甲硫基)甲基-1-苯基]-2-嗎啉基丙酮、安息香、安息香乙基醚、苄基甲基縮酮、二苯甲酮、2-乙基蔥醌、噻噸酮、二乙基噻噸酮、2,4,6-三甲基苯甲醯基二苯基氧化膦、2,4,6-三甲基苯甲醯基二苯基乙氧基氧化膦、雙(2,4,6-三甲基苯甲醯基)苯基氧化膦、2-羥基-2-甲基-1-苯基丙烷-1-酮、4-(2-羥基乙氧基)苯基(2-羥基-2-丙基)酮、1-羥基環己基苯基酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、1-(4-十二烷基苯基)-2-羥基-2-甲基丙烷-1-酮、2-甲基-2-嗎啉基(4-硫代甲基苯基)丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮、N,N’-八亞甲基雙吖啶、丙烯醯基二苯甲酮、2-(苯甲醯氧基亞胺基)-1-[4’-(苯硫基)苯基]-1-辛酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、1-羥基-環己基苯基酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-[4-(2-羥基乙氧基)苯基]-2-甲基-1-丙烷-1-酮、2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基丙烷-1-酮、苯基乙醛酸(Glyoxylic Acid)甲基酯、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮、2-二甲基胺基-2-(4-甲基苄基)-1-(4-嗎啉-4-基苯基)-丁酮、雙(2,4,6-三甲基苯甲醯基)苯基氧化膦、2,4,6-三甲基苯甲醯基-二苯基氧化膦、雙(η5 -2,4-環戊二烯-1-基)-雙(2,6-二氟-3-(1H-吡咯-1-基)苯基)鈦、1-[4-(苯硫基)苯基]-1,2-辛烷二酮 2-(O-苯甲醯肟)、1-[6-(2-甲基苯甲醯基)-9-乙基-9H-咔唑-3-基]乙酮 O-乙醯肟等。Examples of the photoradical polymerization initiator include acetophenone, diethoxyacetophenone, and 2-[4-(methylthio)methyl-1-phenyl]-2-morpholinylacetone. Benzoin, benzoin ethyl ether, benzyl methyl ketal, benzophenone, 2-ethyl onion, thioxanthone, diethyl thioxanthone, 2,4,6-trimethylbenzylidene Diphenylphosphine oxide, 2,4,6-trimethylbenzimidyldiphenylethoxyphosphine oxide, bis(2,4,6-trimethylbenzylidene)phenylphosphine oxide, 2 -hydroxy-2-methyl-1-phenylpropan-1-one, 4-(2-hydroxyethoxy)phenyl(2-hydroxy-2-propyl)one, 1-hydroxycyclohexyl phenyl ketone , 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropane- 1-ketone, 2-methyl-2-morpholinyl (4-thiomethylphenyl)propan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholine Phenylphenyl)-butanone, N,N'-octamethylbisacridine, propylene benzophenone, 2-(benzylideneoxyimido)-1-[4'-(benzene Thio)phenyl]-1-octanone, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy-2 -methyl-1-phenylpropan-1-one, 1 -[4-(2-hydroxyethoxy)phenyl]-2-methyl-1-propan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl) -propenyl)-benzyl]phenyl}-2-methylpropan-1-one, phenylglyoxylic acid methyl ester, 2-methyl-1-[4-(methylthio) Phenyl]-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone, 2-dimethylamine 2-(4-methylbenzyl)-1-(4-morpholin-4-ylphenyl)-butanone, bis(2,4,6-trimethylbenzylidene)phenyl oxide Phosphine, 2,4,6-trimethylbenzylidene-diphenylphosphine oxide, bis(η 5 -2,4-cyclopentadien-1-yl)-bis(2,6-difluoro- 3-(1H-pyrrol-1-yl)phenyl)titanium, 1-[4-(phenylthio)phenyl]-1,2-octanedione 2-(O-benzamide), 1 -[6-(2-Methylbenzylidene)-9-ethyl-9H-indazol-3-yl]ethanone O-acetonitrile.
作為光自由基聚合起始劑之市售品,例如可列舉IGM Resins公司製「Omnirad 651」、「Omnirad 184」、「Omnirad 1173」、「Omnirad 500」、「Omnirad 2959」、「Omnirad 127」、「Omnirad 754」、「Omnirad 907」「Omnirad 369」、「Omnirad 379」、「Omnirad 819」、「Omnirad TPO」、「Omnirad 784」、BASF公司製「Irgacure OXE-01」、「Irgacure OXE-02」、「Irgacure 1173」等。Examples of the commercially available product of the photoradical polymerization initiator include "Omnirad 651", "Omnirad 184", "Omnirad 1173", "Omnirad 500", "Omnirad 2959", and "Omnirad 127" manufactured by IGM Resins. "Omnirad 754", "Omnirad 907", "Omnirad 369", "Omnirad 379", "Omnirad 819", "Omnirad TPO", "Omnirad 784", "Irgacure OXE-01" by BASF, "Irgacure OXE-02" "Irgacure 1173" and so on.
作為熱自由基聚合起始劑,例如可列舉偶氮化合物、有機過氧化物等。
作為偶氮化合物,例如可列舉2,2’-偶氮雙(異丁腈)、2,2’-偶氮雙(2,4-二甲基戊腈)、2,2’-偶氮雙(2-甲基丁腈)、4,4’-偶氮雙(4-氰基戊酸)、2,2’-偶氮雙(2-甲基)二鹽酸鹽、1,1’-偶氮雙(1-乙醯氧基-1-苯基乙烷、1,1’-偶氮雙(環己烷-1-甲腈)、二甲基2,2’-偶氮雙(異丁酸酯)、2,2’-偶氮雙(4-甲氧基-2,4-二甲基戊腈)、2,2’-偶氮雙(2-甲基丙腈)、2,2’-偶氮雙(2-甲基丁腈)、1-[(1-氰基-1-甲基乙基)偶氮]甲醯胺、2-苯基偶氮-4-甲氧基-2,4-二甲基戊腈、二甲基 2,2’-偶氮雙(2-甲基丙酸酯)、2,2’-偶氮雙(N-丁基-2-甲基丙醯胺等。Examples of the thermal radical polymerization initiator include an azo compound, an organic peroxide, and the like.
Examples of the azo compound include 2,2'-azobis(isobutyronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), and 2,2'-azobis. (2-methylbutyronitrile), 4,4'-azobis(4-cyanovaleric acid), 2,2'-azobis(2-methyl)dihydrochloride, 1,1'- Azobis(1-ethenyloxy-1-phenylethane, 1,1'-azobis(cyclohexane-1-carbonitrile), dimethyl 2,2'-azobis (iso) Butyrate), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis(2-methylpropionitrile), 2, 2'-Azobis(2-methylbutyronitrile), 1-[(1-cyano-1-methylethyl)azo]carbamamine, 2-phenylazo-4-methoxy -2,4-dimethylvaleronitrile, dimethyl 2,2'-azobis(2-methylpropionate), 2,2'-azobis(N-butyl-2-methyl Propylamine and the like.
作為有機過氧化物,例如可列舉過氧化苯甲醯基、tert-丁基過氧化氫、異丙苯過氧化氫、二-tert-丁基過氧化物、甲基乙基酮過氧化物、1,1-二(t-己基過氧基)環己烷、2,2-二(t-丁基過氧基)丁烷、n-丁基 4,4-二(t-丁基過氧基)新戊酸酯(Pivalate)、2,2-二(4,4-二(t-丁基過氧基)環己基)丙烷、p-薄荷烷過氧化氫、二異丙氧基苯過氧化物、1,1,3,3-四甲基丁基過氧化氫、異丙苯過氧化氫、t-丁基過氧化氫、二(2-t-丁基過氧基異丙基)苯、二過氧化異丙苯、2,5-二甲基-2,5-二(t-丁基過氧基)己烷、t-丁基過氧化異丙苯、二-t-己基過氧化物、2,5-二甲基-2,5-二(t-丁基過氧基)己烷-3、二異丁醯基過氧化物、二(3,5,5-t-甲基己醯基)過氧化物、二月桂醯基過氧化物、二琥珀酸過氧化物、二(3-甲基苯甲醯基)過氧化物、二苯甲醯基過氧化物、二-n-丙基過氧基碳酸酯、二-異丙基過氧基二碳酸酯、二(4-t-丁基環己基)過氧基碳酸酯、二(2-乙基己基)過氧基碳酸酯、二-sec-丁基過氧基碳酸酯、異丙苯基過氧基新癸酸酯、1,1,3,3-四甲基丁基過氧基新癸酸酯、t-己基過氧基新癸酸酯、t-丁基過氧基新癸酸酯、t-己基過氧基新戊酸酯、t-丁基過氧基新戊酸酯、1,1,3,3-四甲基丁基過氧基-2-乙基己酸酯、2,5-二甲基-2,5-二(t-乙基己醯基過氧基)己烷、t-己基過氧基-2-乙基己酸酯、t-丁基過氧基-2-乙基己酸酯、t-己基過氧基異丙基單碳酸酯、t-丁基過氧基-3,5,5-三甲基己酸酯、t-丁基過氧基月桂酸酯、t-丁基過氧基異丙基單碳酸酯、t-丁基過氧基-2-乙基己基單碳酸酯、t-己基過氧基苯甲酸酯、2,5-二甲基-2,5-二(苯甲醯基過氧基)己烷、t-丁基過氧基乙酸酯、t-丁基過氧基-3-甲基苯甲酸酯與t-丁基過氧基苯甲酸酯之混合物、t-丁基過氧基苯甲酸酯、t-丁基過氧基烯丙基單碳酸酯、3,3’,4,4’-四(t-丁基過氧基羰基)二苯甲酮等。Examples of the organic peroxide include benzoyl peroxide, tert-butyl hydroperoxide, cumene hydroperoxide, di-tert-butyl peroxide, and methyl ethyl ketone peroxide. 1,1-di(t-hexylperoxy)cyclohexane, 2,2-bis(t-butylperoxy)butane, n-butyl 4,4-di(t-butylperoxy) Pivalate, 2,2-bis(4,4-bis(t-butylperoxy)cyclohexyl)propane, p-menthane hydrogen peroxide, diisopropoxybenzene Oxide, 1,1,3,3-tetramethylbutyl hydroperoxide, cumene hydroperoxide, t-butyl hydroperoxide, bis(2-t-butylperoxyisopropyl) Benzene, cumene diperoxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, t-butylperoxybenzene, di-t-hexyl Oxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane-3, diisobutylphosphonate peroxide, bis(3,5,5-t-methylhexyl) Mercapto) peroxide, dilauroyl peroxide, disuccinic acid peroxide, bis(3-methylbenzhydryl) peroxide, benzhydryl peroxide, di-n- Propylperoxycarbonate, di-isopropylperoxydicarbonate, di(4) -t-butylcyclohexyl)peroxycarbonate, di(2-ethylhexyl)peroxycarbonate, di-sec-butylperoxycarbonate, cumene peroxy neodecanoic acid Ester, 1,1,3,3-tetramethylbutylperoxy neodecanoate, t-hexylperoxy neodecanoate, t-butylperoxy neodecanoate, t-hexyl Oxypivalate, t-butylperoxypivalate, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanoate, 2,5-dimethyl Base-2,5-di(t-ethylhexylperoxy)hexane, t-hexylperoxy-2-ethylhexanoate, t-butylperoxy-2-ethylhexyl Acid ester, t-hexylperoxyisopropyl monocarbonate, t-butylperoxy-3,5,5-trimethylhexanoate, t-butylperoxylaurate, t- Butylperoxyisopropylmonocarbonate, t-butylperoxy-2-ethylhexylmonocarbonate, t-hexylperoxybenzoate, 2,5-dimethyl-2, 5-bis(benzimidylperoxy)hexane, t-butylperoxyacetate, t-butylperoxy-3-methylbenzoate and t-butylperoxy a mixture of benzoates, t-butylperoxybenzoate, t-butylperoxyallyl monocarbonate, 3,3',4, 4'-tetrakis(t-butylperoxycarbonyl)benzophenone or the like.
作為熱自由基聚合起始劑之市售品,例如可列舉和光純藥工業公司製「AIBN」(2,2’-偶氮雙(異丁腈))、「V-40」(1,1’-偶氮雙(環己烷-1-甲腈)、「VAm-110」(2,2’-偶氮雙(N-丁基-2-甲基丙醯胺)、「V-601」(二甲基2,2’-偶氮雙(異丁酸酯))、大塚化學公司製「OTAZO-15」(1,1’-偶氮雙(1-乙醯氧基-1-苯基乙烷)、「MAIB」(二甲基2,2’-偶氮雙異丁酸酯)等。For example, "AIBN" (2,2'-azobis(isobutyronitrile)) and "V-40" (1,1) manufactured by Wako Pure Chemical Industries, Ltd., as a commercial product of the thermal radical polymerization initiator. '-Azobis(cyclohexane-1-carbonitrile), "VAm-110" (2,2'-azobis(N-butyl-2-methylpropanamide), "V-601" (Dimethyl 2,2'-azobis(isobutyrate)), "OTAZO-15" manufactured by Otsuka Chemical Co., Ltd. (1,1'-azobis(1-ethenyloxy-1-phenyl) Ethane), "MAIB" (dimethyl 2,2'-azobisisobutyrate), and the like.
自由基聚合起始劑的含量相對於「具有乙烯性不飽和基之化合物」100質量份,較佳為0.5~10質量份,更佳為0.5~8質量份,再更佳為0.5~6質量份。於此,「具有乙烯性不飽和基之化合物」如前述,係包含「多官能乙烯性不飽和化合物」及「單官能乙烯性不飽和化合物」。The content of the radical polymerization initiator is preferably from 0.5 to 10 parts by mass, more preferably from 0.5 to 8 parts by mass, even more preferably from 0.5 to 6 parts by mass, per 100 parts by mass of the "compound having an ethylenically unsaturated group". Share. Here, the "compound having an ethylenically unsaturated group" includes the "polyfunctional ethylenically unsaturated compound" and the "monofunctional ethylenically unsaturated compound" as described above.
使用光自由基聚合起始劑時,其含量相對於「具有乙烯性不飽和基之化合物」100質量份,較佳為0.5~10質量份,更佳為0.5~8質量份,再更佳為0.5~6質量份。When the photo-radical polymerization initiator is used, the content thereof is preferably from 0.5 to 10 parts by mass, more preferably from 0.5 to 8 parts by mass, even more preferably from 100 to 8 parts by mass, more preferably from 100 parts by mass of the "compound having an ethylenically unsaturated group". 0.5 to 6 parts by mass.
使用熱自由基聚合起始劑時,其含量相對於「具有乙烯性不飽和基之化合物」100質量份,較佳為0.5~10質量份,更佳為0.5~8質量份,再更佳為0.5~6質量份。When the thermal radical polymerization initiator is used, the content thereof is preferably from 0.5 to 10 parts by mass, more preferably from 0.5 to 8 parts by mass, even more preferably from 100 to 8 parts by mass, more preferably from 100 parts by mass of the "compound having an ethylenically unsaturated group". 0.5 to 6 parts by mass.
<環氧樹脂>
環氧樹脂可為僅1種,亦可為2種以上。有時將於1分子中具有1個環氧基之環氧樹脂簡稱為「單官能環氧樹脂」,將於1分子中具有2個環氧基之環氧樹脂簡稱為「2官能環氧樹脂」。有時亦將於1分子中具有3個以上環氧基之環氧樹脂同樣簡稱。<Epoxy resin>
The epoxy resin may be used alone or in combination of two or more. An epoxy resin having one epoxy group in one molecule is simply referred to as a "monofunctional epoxy resin", and an epoxy resin having two epoxy groups in one molecule is simply referred to as a "2-functional epoxy resin". "." Epoxy resins having three or more epoxy groups in one molecule are also abbreviated as abbreviations.
如上述,於1分子中具有1個以上環氧基及2個以上乙烯性不飽和基之化合物,由於可用作在本發明之多官能乙烯性不飽和化合物,故於本發明被分類成上述之多官能乙烯性不飽和化合物。又,如上述,於1分子中具有1個以上環氧基及1個乙烯性不飽和基之化合物,於本發明,被分類成單官能乙烯性不飽和化合物。As described above, a compound having one or more epoxy groups and two or more ethylenically unsaturated groups in one molecule is classified into the above-mentioned ones because it can be used as the polyfunctional ethylenically unsaturated compound in the present invention. A polyfunctional ethylenically unsaturated compound. Further, as described above, a compound having one or more epoxy groups and one ethylenically unsaturated group in one molecule is classified into a monofunctional ethylenically unsaturated compound in the present invention.
作為環氧樹脂,例如可列舉氫化環氧樹脂(氫化雙酚A型環氧樹脂、氫化雙酚F型環氧樹脂等)、含有氟之環氧樹脂、鏈狀脂肪族型環氧樹脂、環狀脂肪族型環氧樹脂、雙酚A型環氧樹脂、聯苯型環氧樹脂、聯苯芳烷基型環氧樹脂、萘酚型環氧樹脂、萘型環氧樹脂、雙酚F型環氧樹脂、含有磷之環氧樹脂、雙酚S型環氧樹脂、芳香族環氧丙基胺型環氧樹脂(例如四環氧丙基二胺基二苯基甲烷、三環氧丙基-p-胺基酚、二環氧丙基甲苯胺(Toluidine)、二環氧丙基苯胺等)、脂環式環氧樹脂、酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、具有丁二烯構造之環氧樹脂、雙酚之二環氧丙基醚化物、萘二醇之二環氧丙基醚化物、酚類之二環氧丙基醚化物及醇類之二環氧丙基醚化物,以及此等之環氧樹脂之烷基取代體等。Examples of the epoxy resin include hydrogenated epoxy resin (hydrogenated bisphenol A type epoxy resin, hydrogenated bisphenol F type epoxy resin, etc.), fluorine-containing epoxy resin, chain aliphatic epoxy resin, and ring. Aliphatic epoxy resin, bisphenol A epoxy resin, biphenyl epoxy resin, biphenyl aralkyl epoxy resin, naphthol epoxy resin, naphthalene epoxy resin, bisphenol F Epoxy resin, epoxy resin containing phosphorus, bisphenol S type epoxy resin, aromatic epoxy propyl amine type epoxy resin (for example, tetra-epoxypropyldiaminodiphenylmethane, tri-epoxypropyl group) -p-aminophenol, toluidine, diepoxypropyl aniline, etc., alicyclic epoxy resin, phenol novolak epoxy resin, cresol novolac epoxy resin , bisphenol A novolak type epoxy resin, epoxy resin with butadiene structure, diepoxypropyl etherate of bisphenol, diepoxypropyl etherate of naphthalenediol, phenolic epoxy A propylene ether compound and a diepoxypropyl ether compound of an alcohol, and an alkyl substituent of the epoxy resin or the like.
環氧樹脂之環氧當量從反應性等之觀點來看,較佳為50~1,000,更佳為50~750,再更佳為100~750,特佳為100~500。尚,所謂「環氧當量」,係包含1克當量之環氧基的樹脂之克數(g/eq),依據JIS K 7236所規定之方法測定。The epoxy equivalent of the epoxy resin is preferably from 50 to 1,000, more preferably from 50 to 750, still more preferably from 100 to 750, particularly preferably from 100 to 500, from the viewpoint of reactivity and the like. Further, the "epoxy equivalent" is a number of grams (g/eq) of a resin containing 1 gram equivalent of an epoxy group, and is measured in accordance with the method specified in JIS K 7236.
環氧樹脂較佳為選自氫化環氧樹脂、含有氟之環氧樹脂、鏈狀脂肪族型環氧樹脂及環狀脂肪族型環氧樹脂中之1種以上,更佳為選自氫化環氧樹脂、含有氟之環氧樹脂及環狀脂肪族型環氧樹脂中之1種以上,再更佳為選自氫化環氧樹脂及環狀脂肪族型環氧樹脂中之1種以上。於此,所謂「氫化環氧樹脂」,係意指氫化含有芳香環之環氧樹脂所得之環氧樹脂。氫化環氧樹脂之氫化化率較佳為50%以上,更佳為70%以上。所謂「鏈狀脂肪族型環氧樹脂」,係意指具有直鏈狀或分枝狀之烷基鏈或烷基醚鏈之環氧樹脂,所謂「環狀脂肪族型環氧樹脂」,係意指於分子內具有環狀脂肪族骨架例如環烷烴骨架之環氧樹脂。The epoxy resin is preferably one or more selected from the group consisting of hydrogenated epoxy resins, fluorine-containing epoxy resins, chain aliphatic epoxy resins, and cyclic aliphatic epoxy resins, and more preferably selected from hydrogenated rings. One or more of the oxygen resin, the fluorine-containing epoxy resin, and the cyclic aliphatic epoxy resin are more preferably one or more selected from the group consisting of hydrogenated epoxy resins and cyclic aliphatic epoxy resins. Here, the term "hydrogenated epoxy resin" means an epoxy resin obtained by hydrogenating an epoxy resin containing an aromatic ring. The hydrogenation ratio of the hydrogenated epoxy resin is preferably 50% or more, more preferably 70% or more. The "chain aliphatic epoxy resin" means an epoxy resin having a linear or branched alkyl chain or an alkyl ether chain, and is a "cyclic aliphatic epoxy resin". It means an epoxy resin having a cyclic aliphatic skeleton such as a cycloalkane skeleton in the molecule.
作為氫化雙酚A型環氧樹脂,例如可列舉液狀氫化雙酚A型環氧樹脂(例如「YX8000」(三菱化學公司製、環氧當量:約205)、「DENACOL EX-252」(Nagase ChemteX公司製、環氧當量:約213))、固體氫化雙酚A型環氧樹脂(例如「YX8040」(三菱化學公司製、環氧當量:約1000))。Examples of the hydrogenated bisphenol A type epoxy resin include a liquid hydrogenated bisphenol A type epoxy resin (for example, "YX8000" (manufactured by Mitsubishi Chemical Corporation, epoxy equivalent: about 205), "DENACOL EX-252" (Nagase) Manufactured by ChemteX Co., Ltd., epoxy equivalent: about 213)), solid hydrogenated bisphenol A type epoxy resin (for example, "YX8040" (manufactured by Mitsubishi Chemical Corporation, epoxy equivalent: about 1000)).
含有氟之環氧樹脂例如可使用WO2011/089947所記載之含有氟之環氧樹脂。As the epoxy resin containing fluorine, for example, a fluorine-containing epoxy resin described in WO2011/089947 can be used.
作為鏈狀脂肪族型環氧樹脂,例如可列舉聚甘油聚環氧丙基醚(例如「DENACOL EX-512」、「DENACOL EX-521」、Nagase ChemteX公司製)、季戊四醇聚環氧丙基醚(例如「DENACOL EX-411」、Nagase ChemteX公司製)、二甘油聚環氧丙基醚(例如「DENACOL EX-421」、Nagase ChemteX公司製)、甘油聚環氧丙基醚(例如「DENACOL EX-313」、「DENACOL EX-314」、Nagase ChemteX公司製)、三羥甲基丙烷聚環氧丙基醚(例如「DENACOL EX-321」、Nagase ChemteX公司製)、新戊二醇二環氧丙基醚(例如「DENACOL EX-211」、Nagase ChemteX公司製)、1,6-己烷二醇二環氧丙基醚(例如「DENACOL EX-212」、Nagase ChemteX公司製)、乙二醇二環氧丙基醚(例如「DENACOL EX-810」、「DENACOL EX-811」、Nagase ChemteX公司製)、二乙二醇二環氧丙基醚(例如「DENACOL EX-850」、「DENACOL EX-851」、Nagase ChemteX公司製)、聚乙二醇二環氧丙基醚(例如「DENACOL EX-821」、「DENACOL EX-830」、「DENACOL EX-832」、「DENACOL EX-841」、「DENACOL EX-861」、Nagase ChemteX公司製)、丙二醇二環氧丙基醚(例如「DENACOL EX-911」、Nagase ChemteX公司製)、聚丙二醇二環氧丙基醚(例如「DENACOL EX-941」、「DENACOL EX-920」、「DENACOL EX-931」、Nagase ChemteX公司製)等。Examples of the chain-like aliphatic epoxy resin include polyglycerol polyepoxypropyl ether (for example, "DENACOL EX-512", "DENACOL EX-521", manufactured by Nagase ChemteX), and pentaerythritol polyepoxypropyl ether. (for example, "DENACOL EX-411", manufactured by Nagase ChemteX), diglycerol polyepoxypropyl ether (for example, "DENACOL EX-421", manufactured by Nagase ChemteX), and glycerol polyepoxypropyl ether (for example, "DENACOL EX" -313", "DENACOL EX-314", manufactured by Nagase ChemteX), trimethylolpropane polyepoxypropyl ether (for example, "DENACOL EX-321", manufactured by Nagase ChemteX), neopentyl glycol epoxide Propyl ether (for example, "DENACOL EX-211", manufactured by Nagase ChemteX Co., Ltd.), 1,6-hexanediol diepoxypropyl ether (for example, "DENACOL EX-212", manufactured by Nagase ChemteX Co., Ltd.), ethylene glycol Di-glycidyl ether (eg "DENACOL EX-810", "DENACOL EX-811", manufactured by Nagase ChemteX), diethylene glycol diglycidyl ether (eg "DENACOL EX-850", "DENACOL EX" -851", manufactured by Nagase ChemteX Co., Ltd.), polyethylene glycol diglycidyl ether (eg "DENACOL EX-821", "DENACOL EX-83" 0", "DENACOL EX-832", "DENACOL EX-841", "DENACOL EX-861", manufactured by Nagase ChemteX), propylene glycol diepoxypropyl ether (for example, "DENACOL EX-911", manufactured by Nagase ChemteX ), polypropylene glycol diglycidyl ether (for example, "DENACOL EX-941", "DENACOL EX-920", "DENACOL EX-931", manufactured by Nagase ChemteX).
作為環狀脂肪族型環氧樹脂,例如可列舉大賽璐化學工業公司製「EHPE-3150」等。Examples of the cyclic aliphatic epoxy resin include "EHPE-3150" manufactured by Daicel Chemical Industries, Ltd., and the like.
使用環氧樹脂時,其含量相對於樹脂組成物全體,較佳為5~40質量%,更佳為5~35質量%,再更佳為5~30質量%。When the epoxy resin is used, the content thereof is preferably 5 to 40% by mass, more preferably 5 to 35% by mass, still more preferably 5 to 30% by mass based on the total amount of the resin composition.
<其他成分>
本發明之密封用樹脂組成物於不損害其效果的範圍,可含有與上述之成分不同之其他成分。<Other ingredients>
The resin composition for sealing of the present invention may contain other components different from the above components insofar as the effects are not impaired.
稀釋劑
本發明之密封用樹脂組成物可含有稀釋劑以達成適當之黏度作為液狀密封用樹脂組成物。以E型黏度計於25℃之溫度條件下測定之稀釋劑的黏度,較佳為0.1~5000mPa・s,更佳為0.1~2500mPa・s,再更佳為0.1~1000mPa・s。Diluent The resin composition for sealing of the present invention may contain a diluent to achieve an appropriate viscosity as a resin composition for liquid sealing. The viscosity of the diluent measured by an E-type viscosity meter at a temperature of 25 ° C is preferably 0.1 to 5000 mPa·s, more preferably 0.1 to 2500 mPa·s, still more preferably 0.1 to 1000 mPa·s.
作為稀釋劑,較佳為反應性稀釋劑。作為反應性稀釋劑,較佳為於1分子中具有1個乙烯性不飽和基之化合物(以下,有時簡稱為「單官能乙烯性不飽和化合物」)。As the diluent, a reactive diluent is preferred. The reactive diluent is preferably a compound having one ethylenically unsaturated group in one molecule (hereinafter, simply referred to as a "monofunctional ethylenically unsaturated compound").
尚,在本發明,被分類成「多官能乙烯性不飽和化合物」之於1分子中具有2個乙烯性不飽和基之化合物(以下,有時簡稱為「2官能乙烯性不飽和化合物」),若為上述黏度範圍者,亦有用作反應性稀釋劑的情況。摻合用作反應性稀釋劑之2官能乙烯性不飽和化合物時,不摻合稀釋劑或摻合時亦可將摻合量該部分減低。作為亦可用作稀釋劑之2官能乙烯性不飽和化合物,例如可列舉「DPGDA」(二丙二醇 二丙烯酸酯)、「HDDA」(1,6-己烷二醇 二丙烯酸酯)、「TPGDA」(三丙二醇 二丙烯酸酯)、「EBECRYL145」(PO改質新戊二醇 二丙烯酸酯)、「HPNDA」(新戊二醇 羥基新戊酸酯 二丙烯酸酯)、共榮社化學公司製「LIGHT ESTER NP」(新戊二醇 二甲基丙烯酸酯)、「LIGHT ESTER EG」(乙二醇 二甲基丙烯酸酯)、「LIGHT ESTER 2EG」(二乙二醇 二甲基丙烯酸酯)、「LIGHT ESTER 1.6HX」(1,6-己烷二醇 二甲基丙烯酸酯)、「LIGHT ESTER 1.9ND」(1,9-壬烷二醇 二甲基丙烯酸酯)、「LIGHT ACRYLATE NP-A」(新戊二醇 二丙烯酸酯)、「LIGHT ACRYLATE 1.9ND-A」(1,9-壬烷二醇 二丙烯酸酯)、新中村化學工業公司製「NK ESTER 701A」(2-羥基-3-甲基丙烯醯基丙基丙烯酸酯)、「NK ESTER A-200」(聚乙二醇#200 二丙烯酸酯)、「NK ESTER APG-400」(聚丙二醇#400 二丙烯酸酯)、「NK ESTER BG」(1,3-丁烷二醇二甲基丙烯酸酯)、「NK ESTER 701」(2-羥基-1,3-二甲基丙烯醯氧基丙烷)、「NK ESTER 3PG」(三丙二醇 二甲基丙烯酸酯)、大阪有機化學工業公司製「BISCOAT #195」(1,4-丁烷二醇 二丙烯酸酯)、阿科瑪公司製「SR562」(烷氧基化己烷二醇 二丙烯酸酯)等。作為乙烯性不飽和基,較佳為(甲基)丙烯醯基,反應性稀釋劑尤其是以於1分子中具有1個(甲基)丙烯醯基之(甲基)丙烯酸酯更佳(以下,有時簡稱為「單官能(甲基)丙烯酸酯」)。In the present invention, a compound having two ethylenically unsaturated groups in one molecule (hereinafter, simply referred to as "bifunctional ethylenically unsaturated compound") is classified into a "polyfunctional ethylenically unsaturated compound". If it is the above viscosity range, it is also used as a reactive diluent. When the bifunctional ethylenically unsaturated compound used as the reactive diluent is blended, the blending amount can be reduced without blending the diluent or blending. Examples of the bifunctional ethylenically unsaturated compound which can also be used as a diluent include "DPGDA" (dipropylene glycol diacrylate), "HDDA" (1,6-hexanediol diacrylate), and "TPGDA". (Tripropylene glycol diacrylate), "EBECRYL145" (PO modified neopentyl glycol diacrylate), "HPNDA" (neopentyl glycol hydroxypivalate diacrylate), "LIGHT" ESTER NP" (neopentylene glycol dimethacrylate), "LIGHT ESTER EG" (ethylene glycol dimethacrylate), "LIGHT ESTER 2EG" (diethylene glycol dimethacrylate), "LIGHT ESTER 1.6HX" (1,6-hexanediol dimethacrylate), "LIGHT ESTER 1.9ND" (1,9-decanediol dimethacrylate), "LIGHT ACRYLATE NP-A" ( Neopentyl glycol diacrylate), "LIGHT ACRYLATE 1.9ND-A" (1,9-nonanediol diacrylate), "NK ESTER 701A" (2-hydroxy-3-A) manufactured by Shin-Nakamura Chemical Industry Co., Ltd. Acryl propyl propyl acrylate), "NK ESTER A-200" (polyethylene glycol #200 diacrylate), "NK ESTER APG-400" (polypropylene glycol #400 dipropylene) Ester), "NK ESTER BG" (1,3-butanediol dimethacrylate), "NK ESTER 701" (2-hydroxy-1,3-dimethylpropenyloxypropane), "NK ESTER 3PG" (tripropylene glycol dimethacrylate), "BISCOAT #195" (1,4-butanediol diacrylate) manufactured by Osaka Organic Chemical Industry Co., Ltd., and "SR562" (alkoxy) manufactured by Arkema Co., Ltd. Hexanediol diacrylate) and the like. The ethylenically unsaturated group is preferably a (meth) acrylonitrile group, and the reactive diluent is preferably a (meth) acrylate having one (meth) acryl fluorenyl group in one molecule (hereinafter, , sometimes referred to simply as "monofunctional (meth) acrylate").
作為稀釋劑使用之單官能(甲基)丙烯酸酯,例如可列舉Daicel Orneex公司製、「ODA-N」(辛基/癸基丙烯酸酯,亦即具有長鏈烷基之單官能丙烯酸酯)、「EBECRYL 110」、「EBECRYL 1114」(乙氧基化苯基丙烯酸酯)、共榮社化學公司製「LIGHT ESTER E」(乙基甲基丙烯酸酯)、「LIGHT ESTER NB」(n-丁基甲基丙烯酸酯)、「LIGHT ESTER IB」(異丁基甲基丙烯酸酯)、「LIGHT ESTER TB」(t-丁基甲基丙烯酸酯)、「LIGHT ESTER EH」(2-乙基己基甲基丙烯酸酯)、「LIGHT ESTER ID」(異癸基甲基丙烯酸酯)、「LIGHT ESTER L」(n-月桂基甲基丙烯酸酯)、「LIGHT ESTER S」(n-硬脂基甲基丙烯酸酯)、「LIGHT ESTER CH」(環己基甲基丙烯酸酯)、「LIGHT ESTER THF(1000)」(四氫糠基甲基丙烯酸酯)、「LIGHT ESTER BZ」(苄基甲基丙烯酸酯)、「LIGHT ESTER PO」(苄基苯氧基乙基甲基丙烯酸酯)、「LIGHT ESTER IB-X」(異莰基甲基丙烯酸酯)、「LIGHT ESTER HO-250」(2-羥基乙基甲基丙烯酸酯)、「LIGHT ESTER HOA」(2-羥基乙基丙烯酸酯)、「LIGHT ESTER G」(環氧丙基甲基丙烯酸酯)、「LIGHT ACRYLATE IAA」(異戊基丙烯酸酯,亦即具有分枝烷基之單官能丙烯酸酯)、「LIGHT ACRYLATE S-A」(硬脂基丙烯酸酯)、「LIGHT ACRYLATE EC-A」(乙氧基-二乙二醇丙烯酸酯)、「LIGHT ACRYLATE EHDG-AT」(2-乙基己基-二甘醇丙烯酸酯)、「LIGHT ACRYLATE DPM-A」(甲氧基二丙二醇丙烯酸酯)、「LIGHT ACRYLATE IB-XA」(異莰基甲基丙烯酸酯,亦即具有脂環式基之單官能甲基丙烯酸酯)、「LIGHT ACRYLATE PO-A」(苯氧基乙基丙烯酸酯,亦即具有芳香環之單官能丙烯酸酯)、「LIGHT ACRYLATE P2H-A」(苯氧基二乙二醇丙烯酸酯)、「LIGHT ACRYLATE P-200A」(苯氧基-聚乙二醇丙烯酸酯)、「LIGHT ACRYLATE POB-A」(m-苯氧基苄基丙烯酸酯)、「LIGHT ACRYLATE TFH-A」(四氫糠基丙烯酸酯)、「LIGHT ESTER HOP-A(N)」(2-羥基丙基丙烯酸酯)、「HOA-MS(N)」(2-丙烯醯氧基乙基-琥珀酸)、「環氧酯M-600A」(2-羥基-3-苯氧基丙基丙烯酸酯)、大阪有機化學工業公司製「IDAA」(異癸基丙烯酸酯)、「BISCOAT #155」(環己基丙烯酸酯)、「BISCOAT #160」(苄基丙烯酸酯)、「BISCOAT #150」(四氫糠基丙烯酸酯)、「BISCOAT #190」(乙基卡必醇丙烯酸酯)、「OXE-10」(3-乙基-3-環氧丙烷基甲基丙烯酸酯,亦即具有環氧丙烷環之丙烯酸酯)、「MEDOL-10」(2-甲基-2-乙基-1、3-二氧戊環(Dioxolane)-4-基)甲基丙烯酸酯,亦即具有二氧戊環(Dioxolane)環之丙烯酸酯)、東亞合成公司製「ARONIX M-101A」(酚EO改質丙烯酸酯)、新中村化學工業公司製「NK ESTER A-LEN-10」(乙氧基化o-苯基酚丙烯酸酯)、「NK ESTER EH-4E」(乙氧基化乙基己基聚乙二醇甲基丙烯酸酯)、日立化成公司製「FA-511AS」(二環戊烯基丙烯酸酯)、「FA-512AS」(二環戊烯基氧基乙基丙烯酸酯)、「FA-513AS」(二環戊基丙烯酸酯)、阿科瑪公司製「SR217NS」(4-Tert-丁基環己醇丙烯酸酯)、「SR420NS」(3,3,5-三甲基環己醇丙烯酸酯)、「SR531」(環狀三羥甲基丙烷縮甲醛基丙烯酸酯)、「CD421」(3,3,5-三甲基環己醇甲基丙烯酸酯)、「CD535」(雙環戊二烯基甲基丙烯酸酯)、日本觸媒公司製「VEEA」(丙烯酸2-(2-乙烯氧基乙氧基)乙酯)、「VEEM」(甲基丙烯酸2-(2-乙烯氧基乙氧基)乙酯)等。尚,所謂「辛基/癸基丙烯酸酯」,係意指辛基丙烯酸酯及癸基丙烯酸酯之混合物。Examples of the monofunctional (meth) acrylate used as the diluent include "ODA-N" (octyl/mercapto acrylate, that is, a monofunctional acrylate having a long-chain alkyl group) manufactured by Daicel Orneex Co., Ltd., "EBECRYL 110", "EBECRYL 1114" (ethoxylated phenyl acrylate), "LIGHT ESTER E" (ethyl methacrylate) manufactured by Kyoeisha Chemical Co., Ltd., "LIGHT ESTER NB" (n-butyl methyl group) Acrylate), "LIGHT ESTER IB" (isobutyl methacrylate), "LIGHT ESTER TB" (t-butyl methacrylate), "LIGHT ESTER EH" (2-ethylhexyl methacrylate), "LIGHT ESTER ID" (isodecyl methacrylate), "LIGHT ESTER L" (n-lauryl methacrylate), "LIGHT ESTER S" (n-stearyl methacrylate), "LIGHT ESTER CH" (cyclohexyl methacrylate), "LIGHT ESTER THF (1000)" (tetrahydrofurfuryl methacrylate), "LIGHT ESTER BZ" (benzyl methacrylate), "LIGHT ESTER PO" (benzyl Phenyloxyethyl methacrylate), "LIGHT ESTER IB-X" (isodecyl methacrylate), "LIGHT ESTER HO" -250" (2-hydroxyethyl methacrylate), "LIGHT ESTER HOA" (2-hydroxyethyl acrylate), "LIGHT ESTER G" (epoxypropyl methacrylate), "LIGHT ACRYLATE IAA" (Isoamyl acrylate, that is, a monofunctional acrylate having a branched alkyl group), "LIGHT ACRYLATE SA" (stearyl acrylate), "LIGHT ACRYLATE EC-A" (ethoxy-diethylene) Alcohol acrylate), "LIGHT ACRYLATE EHDG-AT" (2-ethylhexyl-diethylene glycol acrylate), "LIGHT ACRYLATE DPM-A" (methoxydipropylene glycol acrylate), "LIGHT ACRYLATE IB-XA" (isodecyl methacrylate, ie monofunctional methacrylate with alicyclic group), "LIGHT ACRYLATE PO-A" (phenoxyethyl acrylate, ie monofunctional acrylic with aromatic ring) Ester), "LIGHT ACRYLATE P2H-A" (phenoxy diethylene glycol acrylate), "LIGHT ACRYLATE P-200A" (phenoxy-polyethylene glycol acrylate), "LIGHT ACRYLATE POB-A" ( M-phenoxybenzyl acrylate), "LIGHT ACRYLATE TFH-A" (tetrahydrofurfuryl acrylate), "LIGHT ESTER HOP-A(N)" (2-hydroxyl) Acrylate), "HOA-MS(N)" (2-propenyloxyethyl-succinic acid), "epoxy ester M-600A" (2-hydroxy-3-phenoxypropyl acrylate) "IDAA" (isodecyl acrylate), "BISCOAT #155" (cyclohexyl acrylate), "BISCOAT #160" (benzyl acrylate), "BISCOAT #150" (tetrahydrogen) manufactured by Osaka Organic Chemical Industry Co., Ltd. Mercaptoacrylate), "BISCOAT #190" (ethyl carbitol acrylate), "OXE-10" (3-ethyl-3-epoxypropane methacrylate, ie having a propylene oxide ring Acrylate), "MEDOL-10" (2-methyl-2-ethyl-1,3-dioxolane-4-yl)methacrylate, ie having dioxolane ( Dioxolane), "ARONIX M-101A" (phenolic EO modified acrylate) manufactured by Toagosei Co., Ltd., "NK ESTER A-LEN-10" manufactured by Shin-Nakamura Chemical Industry Co., Ltd. (ethoxylated o-benzene) "Acetyl acrylate", "NK ESTER EH-4E" (ethoxylated ethylhexyl polyethylene glycol methacrylate), "FA-511AS" (dicyclopentenyl acrylate) manufactured by Hitachi Chemical Co., Ltd., "FA-512AS" (dicyclopentenyloxyethyl acrylate ), "FA-513AS" (dicyclopentyl acrylate), "SR217NS" manufactured by Arkema Co., Ltd. (4-Tert-butylcyclohexanol acrylate), "SR420NS" (3,3,5-Third Cyclohexanol acrylate), "SR531" (cyclic trimethylolpropane acetal acrylate), "CD421" (3,3,5-trimethylcyclohexanol methacrylate), "CD535 (Dicyclopentadienyl methacrylate), "VEEA" (2-(2-vinyloxyethoxy)ethyl acrylate), "VEEM" (2-(2) methacrylate) -vinyloxyethoxy)ethyl ester) and the like. Further, the term "octyl/mercapto acrylate" means a mixture of octyl acrylate and methacrylate.
作為稀釋劑使用之單官能(甲基)丙烯酸酯,特佳為具有脂環式構造之單官能甲基丙烯酸酯。脂環式構造係與前述同義。作為市售之具有脂環式構造之單官能(甲基)丙烯酸酯,例如可列舉具有莰烷環構造之共榮社化學公司製「LIGHT ESTER IB-X」(異莰基甲基丙烯酸酯)、「LIGHT ACRYLATE IB-XA」(異莰基甲基丙烯酸酯)、具有環己基構造之共榮社化學公司製「LIGHT ESTER CH」(環己基甲基丙烯酸酯)、大阪有機化學工業公司製「BISCOAT #155」(環己基丙烯酸酯)、阿科瑪公司製「SR217NS」(4-Tert-丁基環己醇丙烯酸酯)、「SR420NS」(3,3,5-三甲基環己醇丙烯酸酯)、「CD421」(3,3,5-三甲基環己醇甲基丙烯酸酯)、「CD535」(雙環戊二烯基甲基丙烯酸酯)、具有二環環構造之日立化成公司製「FA-511AS」(二環戊烯基丙烯酸酯)、「FA-512AS」(二環戊烯基氧基乙基丙烯酸酯)、「FA-513AS」(二環戊基丙烯酸酯)、阿科瑪公司製「CD535」(雙環戊二烯基甲基丙烯酸酯)、日本觸媒公司製「VEEA」(丙烯酸2-(2-乙烯氧基乙氧基)乙酯)、「VEEM」(甲基丙烯酸2-(2-乙烯氧基乙氧基)乙酯)等。The monofunctional (meth) acrylate used as a diluent is particularly preferably a monofunctional methacrylate having an alicyclic structure. The alicyclic structure is synonymous with the foregoing. For example, "LIGHT ESTER IB-X" (isodecyl methacrylate) manufactured by Kyoei Chemical Co., Ltd. having a decane ring structure is exemplified as a monofunctional (meth) acrylate having a alicyclic structure. "LIGHT ACRYLATE IB-XA" (isodecyl methacrylate), "LIGHT ESTER CH" (cyclohexyl methacrylate) manufactured by Kyoei Chemical Co., Ltd., which has a cyclohexyl structure, and Osaka Organic Chemical Industry Co., Ltd. BISCOAT #155" (cyclohexyl acrylate), "SR217NS" manufactured by Arkema Co., Ltd. (4-Tert-butylcyclohexanol acrylate), "SR420NS" (3,3,5-trimethylcyclohexanol acrylic acid) Ester), "CD421" (3,3,5-trimethylcyclohexanol methacrylate), "CD535" (biscyclopentadienyl methacrylate), and Hitachi Chemical Co., Ltd. "FA-511AS" (dicyclopentenyl acrylate), "FA-512AS" (dicyclopentenyloxyethyl acrylate), "FA-513AS" (dicyclopentyl acrylate), Arco "CD535" (biscyclopentadienyl methacrylate) manufactured by Nippon Co., Ltd., "VEEA" (2-(2-vinyloxyethoxy)ethyl acrylate) manufactured by Nippon Shokubai Co., Ltd., " VEEM" (2-(2-vinyloxyethoxy)ethyl methacrylate) and the like.
使用稀釋劑時,其含量(包含用作稀釋劑之「2官能乙烯性不飽和化合物」時,亦包含其含量)相對於樹脂組成物全體,較佳為2質量%以上,更佳為5質量%以上,再更佳為10質量%以上,較佳為60質量%以下,更佳為55質量%以下,再更佳為50質量%以下。When a diluent is used, the content (including the content of the "bifunctional ethylenically unsaturated compound" used as a diluent) is preferably 2% by mass or more, and more preferably 5% by mass based on the total amount of the resin composition. More preferably, it is 10% by mass or more, more preferably 60% by mass or less, still more preferably 55% by mass or less, and still more preferably 50% by mass or less.
光陽離子聚合起始劑
本發明之密封用樹脂組成物可含有光陽離子聚合起始劑。光陽離子聚合起始劑可為僅1種,亦可為2種以上。Photocationic polymerization initiator The sealing resin composition of the present invention may contain a photocationic polymerization initiator. The photocationic polymerization initiator may be used alone or in combination of two or more.
作為光陽離子聚合起始劑,例如可列舉芳香族鋶鹽、芳香族碘鎓鹽、芳香族重氮(Diazonium)鹽、芳香族銨鹽、(2,4-環戊二烯-1-基)((1-甲基乙基)苯)-Fe鹽等。Examples of the photocationic polymerization initiator include aromatic sulfonium salts, aromatic iodonium salts, aromatic diazonium salts, aromatic ammonium salts, and (2,4-cyclopentadien-1-yl). ((1-methylethyl)benzene)-Fe salt or the like.
作為芳香族鋶鹽,例如可列舉雙(4-(二苯基二氫硫基(Sulfonio))苯基)硫化物雙六氟磷酸酯、雙(4-(二苯基二氫硫基)苯基)硫化物雙六氟銻酸鹽、雙(4-(二苯基二氫硫基)苯基)硫化物雙四氟硼酸酯、雙(4-(二苯基二氫硫基)苯基)硫化物肆(五氟苯基)硼酸酯、二苯基-4-(苯硫基)苯基鋶六氟磷酸酯、二苯基-4-(苯硫基)苯基鋶六氟銻酸鹽、二苯基-4-(苯硫基)苯基鋶四氟硼酸酯、二苯基-4-(苯硫基)苯基鋶肆(五氟苯基)硼酸酯、三苯基鋶六氟磷酸酯、三苯基鋶六氟銻酸鹽、三苯基鋶四氟硼酸酯、三苯基鋶肆(五氟苯基)硼酸酯、雙(4-(二(4-(2-羥基乙氧基))苯基二氫硫基)苯基)硫化物雙六氟磷酸酯、雙(4-(二(4-(2-羥基乙氧基))苯基二氫硫基)苯基)硫化物雙六氟銻酸鹽、雙(4-(二(4-(2-羥基乙氧基))苯基二氫硫基)苯基)硫化物雙四氟硼酸酯、雙(4-(二(4-(2-羥基乙氧基))苯基二氫硫基)苯基)硫化物肆(五氟苯基)硼酸酯等。Examples of the aromatic onium salt include bis(4-(diphenyldithio)(sulfonio)phenyl)sulfide dihexafluorophosphate and bis(4-(diphenyldihydrothio)benzene. Sulfide dihexafluoroantimonate, bis(4-(diphenyldihydrothio)phenyl) sulfide ditetrafluoroborate, bis(4-(diphenyldihydrothio)benzene Sulfide quinone (pentafluorophenyl) borate, diphenyl-4-(phenylthio)phenylphosphonium hexafluorophosphate, diphenyl-4-(phenylthio)phenylphosphonium hexafluorophosphate Citrate, diphenyl-4-(phenylthio)phenylphosphonium tetrafluoroborate, diphenyl-4-(phenylthio)phenylhydrazine(pentafluorophenyl)borate, three Phenylphosphonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium tetrafluoroborate, triphenylsulfonium (pentafluorophenyl) borate, bis (4-(di) 4-(2-hydroxyethoxy))phenyldihydrothio)phenyl)sulfide dihexafluorophosphate, bis(4-(di(4-(2-hydroxyethoxy))phenyl) Hydrogenthio)phenyl)sulfide dihexafluoroantimonate, bis(4-(di(4-(2-hydroxyethoxy))phenyldihydrothio)phenyl)sulfide bistetrafluoroboron Acid ester, bis(4-(di(4-(2-hydroxyethoxy))phenyldihydrothio)phenyl) sulfide (Pentafluorophenyl) borate.
作為芳香族碘鎓鹽,例如可列舉二苯基碘鎓六氟磷酸酯、二苯基碘鎓六氟銻酸鹽、二苯基碘鎓四氟硼酸酯、二苯基碘鎓肆(五氟苯基)硼酸酯、雙(十二烷基苯基)碘鎓六氟磷酸酯、雙(十二烷基苯基)碘鎓六氟銻酸鹽、雙(十二烷基苯基)碘鎓四氟硼酸酯、雙(十二烷基苯基)碘鎓肆(五氟苯基)硼酸酯、4-甲基苯基-4-(1-甲基乙基)苯基碘鎓六氟磷酸酯、4-甲基苯基-4-(1-甲基乙基)苯基碘鎓六氟銻酸鹽、4-甲基苯基-4-(1-甲基乙基)苯基碘鎓四氟硼酸酯、4-甲基苯基-4-(1-甲基乙基)苯基碘鎓肆(五氟苯基)硼酸酯等。Examples of the aromatic iodonium salt include diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, diphenyliodonium tetrafluoroborate, and diphenyliodonium (five). Fluorophenyl)borate, bis(dodecylphenyl)iodonium hexafluorophosphate, bis(dodecylphenyl)iodonium hexafluoroantimonate, bis(dodecylphenyl) Iodine tetrafluoroborate, bis(dodecylphenyl)iodonium (pentafluorophenyl)borate, 4-methylphenyl-4-(1-methylethyl)phenyl iodide Hexafluorophosphate, 4-methylphenyl-4-(1-methylethyl)phenyliodonium hexafluoroantimonate, 4-methylphenyl-4-(1-methylethyl) Phenyl iodonium tetrafluoroborate, 4-methylphenyl-4-(1-methylethyl)phenyliodonium (pentafluorophenyl) borate, and the like.
作為芳香族重氮鹽,例如可列舉苯基重氮六氟磷酸酯、苯基重氮六氟銻酸鹽、苯基重氮四氟硼酸酯、苯基重氮肆(五氟苯基)硼酸酯等。Examples of the aromatic diazonium salt include phenyldiazonium hexafluorophosphate, phenyldiazonium hexafluoroantimonate, phenyldiazonium tetrafluoroborate, and phenyldiazonium (pentafluorophenyl). Borate esters, etc.
作為芳香族銨鹽,例如可列舉1-苄基-2-氰基吡啶鎓六氟磷酸酯、1-苄基-2-氰基吡啶鎓六氟銻酸鹽、1-苄基-2-氰基吡啶鎓四氟硼酸酯、1-苄基-2-氰基吡啶鎓肆(五氟苯基)硼酸酯、1-(萘基甲基)-2-氰基吡啶鎓六氟磷酸酯、1-(萘基甲基)-2-氰基吡啶鎓六氟銻酸鹽、1-(萘基甲基)-2-氰基吡啶鎓四氟硼酸酯、1-(萘基甲基)-2-氰基吡啶鎓肆(五氟苯基)硼酸酯等。Examples of the aromatic ammonium salt include 1-benzyl-2-cyanopyridinium hexafluorophosphate, 1-benzyl-2-cyanopyridinium hexafluoroantimonate, and 1-benzyl-2-cyanide. Pyridinium tetrafluoroborate, 1-benzyl-2-cyanopyridinium (pentafluorophenyl) borate, 1-(naphthylmethyl)-2-cyanopyridinium hexafluorophosphate , 1-(Naphthylmethyl)-2-cyanopyridinium hexafluoroantimonate, 1-(naphthylmethyl)-2-cyanopyridinium tetrafluoroborate, 1-(naphthylmethyl) -2-cyanopyridinium (pentafluorophenyl) borate or the like.
作為(2,4-環戊二烯-1-基)((1-甲基乙基)苯)-Fe鹽,例如可列舉(2,4-環戊二烯-1-基)((1-甲基乙基)苯)-Fe(II)六氟磷酸酯、(2,4-環戊二烯-1-基)((1-甲基乙基)苯)-Fe(II)六氟銻酸鹽、(2,4-環戊二烯-1-基)((1-甲基乙基)苯)-Fe(II)四氟硼酸酯、(2,4-環戊二烯-1-基)((1-甲基乙基)苯)-Fe(II)肆(五氟苯基)硼酸酯等。As the (2,4-cyclopentadien-1-yl)((1-methylethyl)benzene)-Fe salt, for example, (2,4-cyclopentadien-1-yl) (1) -methylethyl)benzene)-Fe(II) hexafluorophosphate, (2,4-cyclopentadien-1-yl)((1-methylethyl)benzene)-Fe(II) hexafluoro Citrate, (2,4-cyclopentadien-1-yl)((1-methylethyl)benzene)-Fe(II) tetrafluoroborate, (2,4-cyclopentadiene- 1-yl)((1-methylethyl)benzene)-Fe(II)肆(pentafluorophenyl)borate or the like.
作為光陽離子聚合起始劑之市售品,例如可列舉ADEKA公司製「SP-150」、「SP-170」、「SP-082」、「SP-103」、San-Apro 公司製「CPI-100P」、「CPI-101A」、「CPI-200K」、IGM resins公司製「Omnirad 270」、「Omnirad 290」等。For example, "SP-150", "SP-170", "SP-082", "SP-103" manufactured by ADEKA Co., Ltd., and "CPI-" manufactured by San-Apro Co., Ltd. are available as a commercial product of the photo-cationic polymerization initiator. 100P", "CPI-101A", "CPI-200K", "Omnirad 270" and "Omnirad 290" manufactured by IGM resins.
使用光陽離子聚合起始劑時,其含量相對於具有環氧基之化合物的合計(例如,具有環氧基之(甲基)丙烯酸酯及環氧樹脂的合計)100質量份,較佳為0.5~10質量份,更佳為1.0~8質量份,再更佳為2.0~6質量份。When a photocationic polymerization initiator is used, the content thereof is 100 parts by mass, preferably 0.5, based on the total of the epoxy group-containing compound (for example, a total of (meth) acrylate having an epoxy group and an epoxy resin). ~10 parts by mass, more preferably 1.0 to 8 parts by mass, still more preferably 2.0 to 6 parts by mass.
矽烷偶聯劑
本發明之密封用樹脂組成物可含有矽烷偶聯劑。矽烷偶聯劑可為僅1種,亦可為2種以上。The decane coupling agent The sealing resin composition of the present invention may contain a decane coupling agent. The decane coupling agent may be used alone or in combination of two or more.
作為矽烷偶聯劑,例如可列舉3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基(二甲氧基)甲基矽烷及2-(3,4-環氧環己基)乙基三甲氧基矽烷等之環氧系矽烷偶聯劑;3-巰基丙基三甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷及11-巰基十一烷基三甲氧基矽烷等之巰基系矽烷偶聯劑;3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-胺基丙基二甲氧基甲基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、N-甲基胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷及N-(2-胺基乙基)-3-胺基丙基二甲氧基甲基矽烷等之胺基系矽烷偶聯劑;3-脲基丙基三乙氧基矽烷等之脲基系矽烷偶聯劑;乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷及乙烯基甲基二乙氧基矽烷等之乙烯基系矽烷偶聯劑;p-苯乙烯基三甲氧基矽烷等之苯乙烯基系矽烷偶聯劑;3-丙烯醯氧基丙基三甲氧基矽烷及3-甲基丙烯醯氧基丙基三甲氧基矽烷等之丙烯酸酯系矽烷偶聯劑;3-異氰酸酯丙基三甲氧基矽烷等之異氰酸酯系矽烷偶聯劑;雙(三乙氧基矽烷基丙基)二硫化物、雙(三乙氧基矽烷基丙基)四硫化物等之硫化物系矽烷偶聯劑;苯基三甲氧基矽烷、甲基丙烯醯氧基丙基三甲氧基矽烷、咪唑矽烷、三嗪矽烷等。此等當中,較佳為丙烯酸酯系矽烷偶聯劑。Examples of the decane coupling agent include 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, and 3-glycidoxypropyl (dimethyl). Epoxy decane coupling agent of oxy)methyl decane and 2-(3,4-epoxycyclohexyl)ethyltrimethoxy decane; 3-mercaptopropyltrimethoxydecane, 3-mercaptopropyl a decyl decane coupling agent such as triethoxy decane, 3-mercaptopropylmethyldimethoxydecane or 11-decylundecyltrimethoxydecane; 3-aminopropyltrimethoxydecane, 3-Aminopropyltriethoxydecane, 3-aminopropyldimethoxymethylnonane, N-phenyl-3-aminopropyltrimethoxydecane, N-methylaminopropyl Trimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane and N-(2-aminoethyl)-3-aminopropyldimethoxymethyl Amino decane coupling agent such as decane; urea-based decane coupling agent such as 3-ureidopropyltriethoxy decane; vinyl trimethoxy decane, vinyl triethoxy decane and vinyl Vinyl decane coupling agent such as bis-ethoxy decane; p-styryl trimethoxy a styrene-based decane coupling agent such as decane; an acrylate-based decane coupling agent such as 3-propenyloxypropyltrimethoxydecane or 3-methylpropoxypropyltrimethoxydecane; - an isocyanate-based decane coupling agent such as isocyanate propyl trimethoxy decane; a sulfide of bis(triethoxydecylpropyl) disulfide or bis(triethoxydecylpropyl) tetrasulfide; A decane coupling agent; phenyltrimethoxydecane, methacryloxypropyltrimethoxydecane, imidazolium, triazine decane, and the like. Among these, an acrylate-based decane coupling agent is preferred.
作為矽烷偶聯劑之市售品,例如可列舉信越化學公司製「KBM-502」、「KBM-503」、「KBE-502」、「KBE-503」、「KBM-5103」、「KBM-5803」等。For example, "KBM-502", "KBM-503", "KBE-502", "KBE-503", "KBM-5103", "KBM-" manufactured by Shin-Etsu Chemical Co., Ltd. are available as a commercial product of the decane coupling agent. 5803" and so on.
使用矽烷偶聯劑時,其含量相對於樹脂組成物全體,較佳為0.10~5.00質量%,更佳為0.25~3.00質量%,再更佳為0.30~2.00質量%。When the decane coupling agent is used, the content thereof is preferably 0.10 to 5.00% by mass, more preferably 0.25 to 3.00% by mass, still more preferably 0.30 to 2.00% by mass, based on the entire resin composition.
阻聚劑
本發明之密封用樹脂組成物可含有阻聚劑。阻聚劑可為僅1種,亦可為2種以上。Inhibitor The sealing resin composition of the present invention may contain a polymerization inhibitor. The polymerization inhibitor may be used alone or in combination of two or more.
作為阻聚劑,例如可列舉t-丁基氫醌、p-苯醌、氫醌、p-甲氧基酚、N,N-二乙基羥基胺、N-亞硝基-N-苯基羥基胺銨鹽等。作為阻聚劑之市售品,例如可列舉和光純藥工業公司製「Q-1301」、「TBHQ」、「PBQ2」、「DEHA」、「MEHQ」、川崎化成工業公司製「QS-10」等。Examples of the polymerization inhibitor include t-butylhydroquinone, p-benzoquinone, hydroquinone, p-methoxyphenol, N,N-diethylhydroxylamine, and N-nitroso-N-phenyl. Hydroxylamine ammonium salt and the like. As a commercial product of the polymerization inhibitor, "Q-1101", "TBHQ", "PBQ2", "DEHA", "MEHQ", and "QS-10" manufactured by Kawasaki Kasei Kogyo Co., Ltd., are available from Wako Pure Chemical Industries, Ltd. Wait.
使用阻聚劑時,其含量相對於「具有乙烯性不飽和基之化合物」100質量份,較佳為10~200ppm,更佳為50~100ppm。尚,前述「ppm」為質量基準。於此,「具有乙烯性不飽和基之化合物」如前述,係包含「多官能乙烯性不飽和化合物」及「單官能乙烯性不飽和化合物」。When the polymerization inhibitor is used, the content thereof is preferably from 10 to 200 ppm, more preferably from 50 to 100 ppm, per 100 parts by mass of the "compound having an ethylenically unsaturated group". Still, the aforementioned "ppm" is a quality standard. Here, the "compound having an ethylenically unsaturated group" includes the "polyfunctional ethylenically unsaturated compound" and the "monofunctional ethylenically unsaturated compound" as described above.
<有機EL裝置>
以本發明之密封用樹脂組成物的硬化物密封有機EL元件之有機EL裝置,例如可藉由從基板上之有機EL元件之上,塗佈本發明之密封用樹脂組成物後,使該樹脂組成物硬化來製造。<Organic EL device>
In the organic EL device in which the organic EL device is sealed with the cured product of the resin composition for sealing of the present invention, for example, the resin composition for sealing of the present invention can be applied from the organic EL device on the substrate, and then the resin can be applied. The composition is hardened to be manufactured.
本發明之密封用樹脂組成物包含光自由基聚合起始劑時,硬化可藉由對該樹脂組成物照射紫外線來進行。作為用以紫外線照射之裝置,例如可列舉高壓水銀燈、超高壓水銀燈、金屬鹵化物燈、高功率金屬鹵化物燈、低壓水銀燈、LED光源等。紫外線照射時之樹脂組成物的溫度較佳為20~120℃,更佳為25~110℃。紫外線之積算照射量較佳為500~4000mJ/cm2 ,更佳為1000~3500 mJ/cm2 。When the resin composition for sealing of the present invention contains a photoradical polymerization initiator, the curing can be carried out by irradiating the resin composition with ultraviolet rays. Examples of the apparatus for irradiating ultraviolet rays include a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a high power metal halide lamp, a low pressure mercury lamp, an LED light source, and the like. The temperature of the resin composition at the time of ultraviolet irradiation is preferably from 20 to 120 ° C, more preferably from 25 to 110 ° C. The total amount of irradiation of ultraviolet rays is preferably from 500 to 4,000 mJ/cm 2 , more preferably from 1,000 to 3,500 mJ/cm 2 .
本發明之密封用樹脂組成物包含熱自由基聚合起始劑時,硬化可藉由使用乾燥機等加熱該樹脂組成物來進行。加熱溫度較佳為80~120℃,更佳為100~110℃,加熱時間較佳為15~120分鐘,更佳為30~90分鐘。此加熱可於大氣環境下進行,亦可於惰性氣體(例如氮氣體)環境下進行。
[實施例]When the resin composition for sealing of the present invention contains a thermal radical polymerization initiator, the curing can be carried out by heating the resin composition using a dryer or the like. The heating temperature is preferably from 80 to 120 ° C, more preferably from 100 to 110 ° C, and the heating time is preferably from 15 to 120 minutes, more preferably from 30 to 90 minutes. This heating can be carried out in an atmosphere or in an inert gas such as a nitrogen gas atmosphere.
[Examples]
以下,雖列舉實施例更具體說明本發明,但本發明並非因以下之實施例而受到限制者,於適合上述・下述趣旨的範圍當然可適當變更實施,該等亦皆包含在本發明之技術的範圍。
尚,在以下所記載的量之「份」只要沒有特別提及係意指「質量份」。The present invention is not limited by the following examples, but the present invention is not limited by the following examples, and may be appropriately modified and implemented in the scope of the above-mentioned and the following, and these are also included in the present invention. The scope of technology.
In addition, the "parts" of the amounts described below are intended to mean "parts by mass" unless otherwise specified.
<實施例1>
摻合2官能脂環式丙烯酸酯(Daicel Orneex公司製「IRR214-K」)90份、與6官能丙烯酸酯(日本化藥公司製「DPCA-60」)30份、與2官能脂肪族丙烯酸酯(協榮社化學公司製「1.9ND-A」)30份、與阻聚劑(和光純藥公司製「Q-1301」)0.05份、與市售之水滑石A(半燒成水滑石、BET比表面積:13m2
/g、平均粒徑:400nm))90份、與市售之氧化鈣30份(喜多村公司製),以高速回轉混合機均一分散。然後,添加聚合起始劑(BASF公司製「Irgacure 1173」)11份,再度進行分散而得到樹脂組成物。<Example 1>
90 parts of a bifunctional alicyclic acrylate ("IRR214-K" manufactured by Daicel Orneex Co., Ltd.), 30 parts with a 6-functional acrylate ("DPCA-60" manufactured by Nippon Kayaku Co., Ltd.), and a bifunctional aliphatic acrylate 30 parts ("1.9ND-A" manufactured by Xierongshe Chemical Co., Ltd.), 0.05 parts with a polymerization inhibitor ("Q-1301" manufactured by Wako Pure Chemical Industries, Ltd.), and commercially available hydrotalcite A (semi-fired hydrotalcite, BET specific surface area: 13 m 2 /g, average particle diameter: 400 nm)) 90 parts, and 30 parts of commercially available calcium oxide (manufactured by Kitamura Co., Ltd.) were uniformly dispersed by a high-speed rotary mixer. Then, 11 parts of a polymerization initiator ("Irgacure 1173" manufactured by BASF Corporation) was added, and the mixture was further dispersed to obtain a resin composition.
<實施例2>
併用半燒成水滑石A與市售之水滑石D(未燒成水滑石、平均粒徑:400nm),將表1所記載之各成分以指定之摻合比進行攪拌混合,而得到樹脂組成物。<Example 2>
The semi-calcined hydrotalcite A and the commercially available hydrotalcite D (unfired hydrotalcite, average particle diameter: 400 nm) were used, and the components described in Table 1 were stirred and mixed at a predetermined blending ratio to obtain a resin composition. Things.
<實施例3>
併用半燒成水滑石A與市售之水滑石C(燒成水滑石、平均粒徑:400nm),將表1所記載之各成分以指定之摻合比進行攪拌混合,而得到樹脂組成物。<Example 3>
The semi-calcined hydrotalcite A and the commercially available hydrotalcite C (calcined hydrotalcite, average particle diameter: 400 nm) were used, and the components described in Table 1 were stirred and mixed at a predetermined blending ratio to obtain a resin composition. .
<實施例4~6、比較例1~4>
與實施例1同樣進行,將表1所記載之各成分以指定之摻合比進行攪拌混合,而得到實施例4~6、比較例1~4之樹脂組成物。<Examples 4 to 6 and Comparative Examples 1 to 4>
In the same manner as in Example 1, the components described in Table 1 were stirred and mixed at a predetermined blending ratio to obtain the resin compositions of Examples 4 to 6 and Comparative Examples 1 to 4.
<水滑石之吸水率>
將各水滑石在天秤量取1.5g,測定初期質量。於設定在大氣壓下、60℃、90%RH(相對濕度)之小型環境試驗器(Espec公司製SH-222)靜置200小時,測定吸濕後之質量,使用上述式(i)求出飽和吸水率。將結果示於表1。<Water absorption rate of hydrotalcite>
Each hydrotalcite was weighed 1.5 g on Libra, and the initial mass was measured. The sample was placed in a small environmental tester (SH-222 manufactured by Espec Co., Ltd.) at atmospheric pressure, 60 ° C, and 90% RH (relative humidity) for 200 hours, and the mass after moisture absorption was measured, and saturation was obtained using the above formula (i). Water absorption rate. The results are shown in Table 1.
<水滑石之熱重量減少率>
使用日立高科技公司製TG/DTA EXSTAR6300,進行各水滑石之熱重量分析。於AL製之樣品盤秤量水滑石10mg,以未覆蓋而打開的狀態,於氮流量200mL/分鐘的環境下,以10℃/分鐘從30℃昇溫至550℃。使用上述式(ii),求出在280℃及380℃之熱重量減少率。將結果示於表1。<The thermal weight reduction rate of hydrotalcite>
The thermogravimetric analysis of each hydrotalcite was carried out using a TG/DTA EXSTAR 6300 manufactured by Hitachi High-Tech Co., Ltd. The sample disc prepared by AL was weighed 10 mg of hydrotalcite, and was opened without being covered, and was heated from 30 ° C to 550 ° C at 10 ° C / min in an environment of a nitrogen flow rate of 200 mL / min. Using the above formula (ii), the thermal weight reduction rate at 280 ° C and 380 ° C was determined. The results are shown in Table 1.
<粉末X光繞射>
粉末X光繞射之測定係藉由粉末X光繞射裝置(PANalytical公司製、Empyrean),以對陰極CuKα (1.5405Å)、電壓:45V、電流:40mA、採樣寬度:0.0260˚、掃描速度:0.0657˚/s、測定繞射角範圍(2θ):5.0131~79.9711˚的條件進行。峰值搜索係利用繞射裝置附屬之軟體的峰值搜索功能,以「最小顯著度:0.50、最小峰值晶片:0.01˚、最大峰值晶片(Maximum peak chip):1.00˚、峰值底寬:2.00˚、方法:2次微分之最小值」的條件進行。檢出2θ為8~18˚的範圍內所出現之經分裂之二個峰值,或藉由二個峰值的合成具有肩部之峰值,測定低角側所出現之峰值或肩部之繞射強度(=低角側繞射強度)、與高角側所出現之峰值或肩部的繞射強度(=高角側繞射強度),算出相對強度比(=低角側繞射強度/高角側繞射強度)。將結果示於表1。<Powder X-ray diffraction>
The powder X-ray diffraction was measured by a powder X-ray diffraction device (manufactured by PANalytical Co., Ltd., Empyrean), a cathode CuKα (1.5405 Å), a voltage: 45 V, a current: 40 mA, a sampling width: 0.0260 ̊, and a scanning speed: 0.0657 ̊ / s, measurement of the diffraction angle range (2θ): 5.0131 ~ 79.9711 ̊ conditions are carried out. The peak search system uses the peak search function of the software attached to the diffractive device to "minimum saliency: 0.50, minimum peak wafer: 0.01 ̊, maximum peak chip: 1.00 ̊, peak bottom width: 2.00 ̊, method : The condition of the minimum value of 2 times of differentiation is performed. The two peaks of the split appearing in the range of 8 to 18 检 are detected, or the peak of the shoulder is formed by the synthesis of the two peaks, and the peak of the low angle side or the diffraction intensity of the shoulder is measured. (= low angle side diffraction intensity), peak with high angle side or diffraction intensity of shoulder (= high angle side diffraction intensity), calculate relative intensity ratio (= low angle side diffraction intensity / high angle side diffraction strength). The results are shown in Table 1.
由飽和吸水率、熱重量減少率及粉末X光繞射之結果,水滑石A為「半燒成水滑石」,水滑石C為「燒成水滑石」,水滑石D為「未燒成水滑石」。From the results of saturated water absorption, thermal weight reduction, and powder X-ray diffraction, hydrotalcite A is "semi-fired hydrotalcite", hydrotalcite C is "burned hydrotalcite", and hydrotalcite D is "unfired water". talc".
<含水率>
將於實施例及比較例調製之樹脂組成物以80℃之烤箱保管一週後,使用卡爾菲舍爾水分測定裝置(三菱Chemical Analytech公司製、CA-200),測定樹脂組成物中所包含之水分。於130℃之爐內加熱時所檢出之含水率用以下之基準評估。將其結果示於表2。
良好(○):未滿1000ppm
可 (△):1000ppm以上未滿1500ppm
不良(×):1500ppm以上<water content>
The resin composition prepared in the examples and the comparative examples was stored in an oven at 80 ° C for one week, and then the moisture contained in the resin composition was measured using a Karl Fischer moisture measuring device (manufactured by Mitsubishi Chemical Analytech Co., Ltd., CA-200). . The moisture content detected when heated in a furnace at 130 ° C was evaluated on the basis of the following criteria. The results are shown in Table 2.
Good (○): less than 1000ppm
(△): 1000ppm or more and less than 1500ppm
Bad (×): 1500ppm or more
<Ca劣化評估>
於玻璃基板上成膜Ca 200nm後,將經調製之樹脂組成物塗佈在Ca上實施硬化處理。確認於100℃加熱30分鐘後之Ca膜面的劣化有無,用以下之基準評估。將其結果示於表2。
良好(○):無Ca膜面之劣化
不良(×):有Ca膜面之顯著劣化<Ca deterioration evaluation>
After Ca 200 nm was formed on the glass substrate, the prepared resin composition was coated on Ca to carry out a hardening treatment. It was confirmed whether or not the deterioration of the Ca film surface after heating at 100 ° C for 30 minutes was evaluated by the following criteria. The results are shown in Table 2.
Good (○): poor deterioration of the surface of the Ca-free film (×): significant deterioration of the surface of the Ca film
從表2之結果,可確認實施例1~6之組成物皆為含水率低,Ca劣化評估良好,亦即變成可抑制有機EL密封時之初期劣化,可形成通過長時間防止元件之劣化的密封層。From the results of Table 2, it was confirmed that the compositions of Examples 1 to 6 have a low water content, and the Ca deterioration evaluation is good, that is, the initial deterioration at the time of suppressing the organic EL sealing can be suppressed, and deterioration of the element can be prevented by a long period of time. Sealing layer.
<裝置密封試驗>
首先,於附氧化銦錫(ITO)之玻璃基板(GEOMATEC公司製)以發光面積成為4mm2
的方式,形成有機EL元件(有機膜的厚度:110nm、陰極的厚度:10nm)。其次,於有機EL元件上使用化學氣相成長法(CVD法),形成氮化膜(厚度:500nm)。接著,將於實施例1製作之組成物以圍繞在附氮化膜之有機EL元件的周圍的方式塗佈後,從其上重疊無鹼玻璃板,調製層合體(無鹼玻璃板/組成物層/附氮化膜之有機EL元件/附ITO之玻璃基板)。藉由將該層合體於100℃加熱30分鐘使組成物硬化,製造密封有機EL元件之層合體(硬化物的厚度:10μm)。
[產業上之可利用性]<Device Seal Test>
First, an organic EL device (thickness of organic film: 110 nm, thickness of cathode: 10 nm) was formed on a glass substrate (manufactured by GEOMATEC Co., Ltd.) with indium tin oxide (ITO) so that the light-emitting area was 4 mm 2 . Next, a nitride film (thickness: 500 nm) was formed on the organic EL device by a chemical vapor deposition method (CVD method). Next, the composition prepared in Example 1 was applied so as to surround the organic EL element to which the nitride film was attached, and the alkali-free glass plate was superposed thereon to prepare a laminate (alkali-free glass plate/composition) Layer/organic EL element with nitride film/glass substrate with ITO). The composition was cured by heating the laminate at 100 ° C for 30 minutes to produce a laminate of a sealed organic EL element (thickness of the cured product: 10 μm).
[Industrial availability]
本發明之密封用樹脂組成物由於水分遮斷性及有機EL等之元件的劣化抑制優異,故可適合使用在有機EL元件等之發光元件或太陽能電池等之受光元件等之密封用。The sealing resin composition of the present invention is excellent in the deterioration of the moisture-blocking property and the element such as the organic EL. Therefore, it can be suitably used for sealing a light-emitting element such as an organic EL element or a light-receiving element such as a solar cell.
本案係將日本申請之特願2018-033850號作為基礎,其內容全部皆包含在本案說明書。This case is based on the Japanese Patent Application No. 2018-033850, the contents of which are all included in the present specification.
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| TWI862698B (en) * | 2019-09-30 | 2024-11-21 | 日商味之素股份有限公司 | Resin composition and resin sheet |
| CN115768802B (en) * | 2020-09-18 | 2024-08-02 | 三井化学株式会社 | Ultraviolet curable resin composition |
| TW202313837A (en) | 2021-07-01 | 2023-04-01 | 日商味之素股份有限公司 | Sealing composition |
| CN114736552B (en) * | 2022-04-22 | 2022-11-22 | 广东希贵光固化材料有限公司 | UV curing repair water |
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| JPH0381358A (en) * | 1989-08-25 | 1991-04-05 | Denki Kagaku Kogyo Kk | Chlorosulfonated polyethylene composition |
| JP2000226485A (en) * | 1999-02-04 | 2000-08-15 | Sumitomo Bakelite Co Ltd | Vinyl chloride resin composition |
| JP2004091647A (en) * | 2002-08-30 | 2004-03-25 | Kyowa Chem Ind Co Ltd | Blistering inhibitor for use in coating material and method for preventing blistering of coating film |
| US7462651B2 (en) * | 2005-04-04 | 2008-12-09 | National Starch And Chemical Investment Holding Corporation | Radiation-curable desiccant-filled adhesive/sealant |
| WO2011102287A1 (en) * | 2010-02-16 | 2011-08-25 | ダイセル化学工業株式会社 | Curable composition and cured material |
| EP2805997B1 (en) * | 2012-01-16 | 2023-03-08 | Ajinomoto Co., Inc. | Resin composition for sealing |
| JPWO2013125628A1 (en) * | 2012-02-23 | 2015-07-30 | Jsr株式会社 | Resin composition and method for producing hydrogenated conjugated diene block copolymer |
| TW201522592A (en) * | 2013-11-08 | 2015-06-16 | Nippon Kayaku Kk | Sealing resin composition |
| CN105683283A (en) | 2013-11-08 | 2016-06-15 | 味之素株式会社 | Hydrotalcite-containing sealing resin composition and sealing sheet |
| TWI658090B (en) * | 2013-11-08 | 2019-05-01 | Ajinomoto Co., Inc. | Resin composition for sealing and sheet for sealing |
| CN111574928A (en) * | 2014-01-21 | 2020-08-25 | 积水化学工业株式会社 | Optical moisture-curable resin composition, adhesive for electronic parts, and adhesive for display elements |
| JP6853779B2 (en) * | 2014-12-18 | 2021-03-31 | ビーエーエスエフ コーティングス ゲゼルシャフト ミット ベシュレンクテル ハフツングBASF Coatings GmbH | Radiation curable composition containing hydrophilic nanoparticles |
| JP6724900B2 (en) | 2015-03-20 | 2020-07-15 | 味の素株式会社 | Method for manufacturing sealed body |
| JP6821985B2 (en) * | 2015-07-21 | 2021-01-27 | 味の素株式会社 | Resin composition for sealing |
| KR102612145B1 (en) * | 2015-09-30 | 2023-12-12 | 아지노모토 가부시키가이샤 | Resin composition for sealing |
| WO2018181664A1 (en) * | 2017-03-31 | 2018-10-04 | 味の素株式会社 | Sealing composition |
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