TW201915226A - Electrode frame for electropolishing and electropolishing apparatus comprising same - Google Patents

Abstract

The present invention relates to an electrode frame for electrolytic polishing having a mounting member and an electrolytic polishing apparatus having the same. The electrode frame for electrolytic polishing according to an embodiment of the present invention is an electrode frame used in an electrolytic bath in which an electrolytic polishing object and an accommodation space for containing an electrolytic solution therein are provided. The present invention comprises: an electrode mounting member coupled to at least one protrusion of an electrolytic polishing object; and a first negative electrode frame which is formed in a lattice structure and at least one side thereof which is engaged with the electrode mounting member and spaced apart from the polishing surface of the electrolytic polishing object by predetermined distance.

Description

Electrode frame for electrolytic polishing and electrolytic polishing device therewith

An electrode frame for electrolytic polishing and an electrolytic polishing device therewith are related to an electrolytic polishing device for improving the polishing quality of an electrolytically polished article.

In general, electrolytic polishing is a method in which a metal product dissolved in an electrolytic solution is used as a positive electrode (Anode), and a metal insoluble in an electrolytic solution is used as a negative electrode (Cathode), and the positive electrode and the negative electrode are used. A method of applying a voltage to cause electrolysis to polish the surface of the metal article on the surface of the metal article as the electrolytically polished article.

In order to grind the metal by electrolytic polishing, the electrolytic solution is filled with an electrolytic solution, the metal to be polished is mounted as a positive electrode, the metal not dissolved in the electrolytic solution is mounted as a negative electrode, and then a direct current is applied to the positive electrode and the negative electrode.

After electrolytic polishing, a high-viscosity liquid layer (viscous layer) containing a large amount of metal ions dissolved from the positive electrode surrounds the positive electrode. In the liquid layer saturated with metal ions, the metal is no longer dissolved, forming a high positive electrode potential, and thus actively bonds with oxygen to form an oxide film. At this time, the dissolved metal ions mainly accumulate in the depressed portion of the metal surface, and in the depressed portion, the movement and diffusion of the metal ions are small, the electrical conduction is not smooth, and the metal is not dissolved. On the contrary, in the convex portion of the metal surface, the metal ion layer is formed thin, and thus the current is concentrated, and the metal surface is easily dissolved, and as a whole, the metal surface becomes smooth.

Electrolytic polishing is carried out by an electrolytic polishing apparatus. In the electrolytic polishing apparatus of the prior art, an electrolytically polished article having a positive electrode potential is placed in an electrolytic cell, and the negative electrode plate is disposed apart from the polished surface of the electrolytically polished article. The negative electrode plate should be changed according to the shape of the electrolytically polished article, and thus assembled in the electrolytic cell after being assembled according to the shape of the electrolytically polished article.

The negative electrode plate assembled as described above should be installed in the electrolytic cell in such a manner as not to be in contact with the electrolytically polished article. However, the negative electrode plate can only maintain a predetermined distance and be disposed close to the electrolytically polished object, so that uniform polishing can be achieved and the electrolytic polishing quality can be improved.

However, in the prior art, it is practically impossible to arrange the negative electrode plate so as to maintain a predetermined distance close to the electrolytically polished article.

On the other hand, the inventor of the present application has developed an invention in which a discharge port formed on an electrolytically polished article is uniformly fixed while using a negative electrode holder while bringing the negative electrode plate close to the side of the electrolytically polished article, and is patent-authorized (refer to Korea Authorized patent 10-1183218).

However, electrolytically ground articles have a variety of shapes, and thus occur in the case where there is no placement area such as a discharge port on the electrolytically polished article. Therefore, there has been a technical problem that the negative electrode plate cannot be uniformly mounted while being close to the electrolytically polished article.

Now, as a technique in the prior art, the negative electrode rod is suspended in an electrolytic cell, or a large mesh is formed in the form of a negative electrode mesh, and is suspended in an electrolytic cell to perform electrolytic polishing substantially, but the electrolytic polishing quality or the process efficiency is very low. status.

In addition, when the electroabrasive article has no placement area such as a discharge port, depending on the shape of the electroabrasive article, troubles arise in that the placement area of the negative electrode plate is required to be independently provided each time. Therefore, the time required to set the placement area until electrolytic polishing is performed is quite long, and the problem of an increase in assembly cost occurs. In particular, when the shape of the electrolytically polished article is a relatively complicated structure, the case where the negative electrode frame cannot be disposed on the side of the electrolytically polished article occurs.

Now, as a technique in the prior art, the negative electrode frame is provided with a distance from the object to be polished, and the negative electrode rod is suspended from the electrolytic cell, or a large mesh is formed in the form of a negative electrode mesh, and then suspended in an electrolytic cell to perform electrolytic polishing. However, the negative electrode or the negative electrode mesh cannot be uniformly and closely fixed to the abrasive article member, so that the electrolytic polishing quality or the process efficiency is actually low.

On the other hand, the negative electrode plate of the prior art is supported by a jig as another supporting member, but the distance between the negative electrode plate and the electrolytically polished article is very close to each other, and thus it is difficult to be between the negative electrode plate and the electrolytically polished object. Install fixtures in tight spaces. That is, since the jig is formed of a conductive material, if the jig is in contact with the electrolytically polished article of the positive electrode, it is electrically short-circuited with the negative electrode plate having the negative electrode.

(Technical problem to be solved)

In one embodiment, there is provided an electrode frame for electrolytic polishing in which a negative electrode frame is closely and uniformly attached to one side of an electrolytic polishing article, and an electrolytic polishing device including the same, in an area where there is no additional discharge port.

Further, in still another embodiment, an electrolytic polishing apparatus for preventing an electrical short circuit between a negative electrode plate and an electrolytically polished article due to a jig is provided.

Further, in an embodiment, an electrolytic polishing apparatus for effectively providing a negative electrode frame on the side of an electrolytically polished article without an additional bracket is provided.

Further, in still another embodiment, an electrolytic polishing apparatus for preventing an electrical short circuit between a negative electrode plate and an electrolytically polished article due to a jig is provided.

(means to solve the problem)

In an embodiment, the electrode frame for electrolytic polishing is used as an electrode frame for use in an electrolytic cell equipped with an accommodation space for accommodating an electrolytic abrasive article and an electrolyte, and may include: an electrode placement member coupled to the electrolytic abrasive article At least one or more protrusions; and a first negative electrode frame formed in a lattice structure, one side of at least one of the lattice structures being combined with the electrode placement member, and being spaced apart from the polishing surface of the electrolytic abrasive article Interval configuration.

The electrode placement member may include a first face combined with a projection of the electrolytic abrasive article and a second face joined to the first negative electrode frame.

The electrode placement member may be coupled to the projection of the electrolytically polished article even without using a discharge port.

In addition, in an embodiment, the electrode frame for electrolytic polishing is used as an electrode frame for an electrolytic cell equipped with an accommodating space for accommodating the electrolytic abrasive article and the electrolytic solution, and may include: a negative electrode frame disposed on the electrolytic abrasive article One side of the abrasive surface; and an electrode partitioning member coupled to the negative electrode frame to separate the negative electrode frame from the bottom surface of the electrolytic abrasive article.

The electrode spacing member may include a first electrode spacing member joined to a bottom surface of the electrolytic abrasive article and supporting the negative electrode frame.

The first electrode partitioning member may support the negative electrode frame even without using a discharge port.

In an embodiment, the electrolytic polishing apparatus may include the electrode frame.

(Effect of the invention)

In an embodiment, the electrode placement member that supports the negative electrode frame can be configured by using the projection formed on the electrolytically polished article, thereby having an effective installation even on the electrolytic abrasive article in the region where the discharge port is not provided. The effect of the negative frame.

In addition, in an embodiment, when the same product is subjected to electrolytic polishing, the assembled negative electrode frame can be assembled to the electrode placement member for polishing, thereby having the effect of shortening the time required for mounting and dismounting the negative electrode frame and the polishing time. .

Further, in one embodiment, there is an effect that the negative electrode frame can be easily attached to the entire polished surface of the electrolytically polished article even if one of the bottom portion or the side wall portion of the electrolytically polished article has no projection.

Further, in one embodiment, by arranging the negative electrode frame holder on the electrode placing member, there is an effect that the degree of freedom of the bonding position of the negative electrode frame can be improved and the electrode frame can be efficiently mounted.

Further, in an embodiment, the jig further forms an insulating portion so as to have an effect that a narrow space between the negative electrode frame and the electroabrasive article can be easily mounted.

Further, in an embodiment, by disposing the electrode partitioning member on the negative electrode frame side and arranging the negative electrode frame on the electrolytically polished article, the negative electrode frame can be efficiently disposed inside the electrolytically polished article without the additional bracket. Alternatively, the negative electrode frame can be quickly disposed on the electrolytically polished article, and the efficiency of the electrolytic polishing process can be improved and uniformly arranged, and the quality of the electrolytic polishing can be remarkably improved.

Further, in an embodiment, the lower width of the electrode partitioning member is gradually reduced, and the groove or the hole formed in the bottom of the electrolytically polished article is inserted, thereby having an effect of being able to more effectively fix the negative electrode frame.

In one embodiment, by disposing the electrode partitioning member on the upper portion of the side wall portion of the electroabrasive article, there is an effect that the negative electrode frame can be stably supported while being spaced from the bottom of the electroabrasive article.

Further, in an embodiment, by arranging the electrode separating member not in contact with the bottom of the electrolytic abrasive article, there is an effect that damage due to contact of the electrode separating member with the electrolytic abrasive article can be prevented.

Further, in one embodiment, by using the bracket, there is an effect that the negative electrode frame can be efficiently attached to the inner side and the outer side of the electrolytically polished article.

The embodiments will be described in detail below with reference to the drawings.

1 is an exploded perspective view showing the electrolytic polishing apparatus of the first embodiment, FIG. 2 is a perspective view showing the electrolytic polishing apparatus of the first embodiment, and FIG. 3 is a view showing the state of electrode frame bonding of the electrolytic polishing apparatus of the first embodiment. 4a and 4b are respectively a perspective view showing a jig of the electrolytic polishing apparatus of the first embodiment, and Fig. 5 is a perspective view showing a modification of the negative electrode frame of the electrolytic polishing apparatus of the first embodiment.

In an embodiment, the electrode frame may include a negative electrode frame, but is not limited thereto.

As shown in FIG. 1 and FIG. 2, the electrode frame for electrolytic polishing of the first embodiment can be included as an electrode frame for electrolytic polishing used in the electrolytic cell 100 equipped with an accommodation space for accommodating the electrolytic abrasive article 200 and the electrolytic solution. a plurality of electrode placement members 400 coupled to at least one of the protrusions 210 of the electrolytic abrasive article 200; a negative electrode frame 300 formed in a lattice structure with at least one side and the plurality of electrodes placed The members 400 are coupled to each other at a predetermined interval from the polishing surface of the electrolytic abrasive article 200.

In addition, the electrolytic polishing apparatus of the first embodiment may include an electrolytic cell 100 equipped internally with an accommodating space for the electrolytic abrasive article 200 and the electrolytic solution that accommodates the projections 210 having a predetermined shape formed on the polishing surface; a placement member 400 coupled to at least one of the protrusions of the electrolytic abrasive article 200; a negative electrode frame 300 formed in a lattice structure, one side of the at least one lattice structure and the plurality of electrode placement members 400 The bonding is arranged at a predetermined interval from the polishing surface of the electrolytic abrasive article 200.

In FIG. 1, an example in which the protruding portion 210 is formed on the upper side of the electrolytically polished article 200 is illustrated, but the invention is not limited thereto, and may be formed on the side surface or the lower surface of the electrolytically polished article 200.

The electrolytic cell 100 may be formed in a box shape in which an accommodation space is provided inside. The electrolytic cell 100 may include a cylindrical shape, a polygonal box or a ring shape, but its shape is not limited.

An electrolyte may be filled inside the electrolytic cell 100. As the electrolyte, it may be distilled water (H ₂ O), sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ), chromic acid, sodium nitrate (NaNO ₃ ), sodium chloride (NaCl), At least one selected from the group consisting of glycerol is mixed, but is not limited thereto.

The electrolytic solution can be replaced after the electrolytic polishing of the electrolytically polished article 200 is completed in a state of being filled in the electrolytic cell 100. Unlike this, the electrolyte can flow in and out by means of a pump that is independently formed on one side of the electrolytic cell 100. An electrolyte inflow pipe and an electrolyte outflow pipe may be formed between the electrolytic cell 100 and the pump, and may further include an electrolyte flow rate adjusting unit and a screening program. The screening program filters the residue and foreign matter contained in the electrolyte.

The electrolytic abrasive article 200 can be housed inside the electrolytic cell 100. The electrolytic cell 100 may be sized larger than the electrolytically polished article 200. The electrolytically polished article 200 may have a polygonal plate shape, but is not limited thereto. The electroabrasive article 200 can be a polygonal or cylindrical chamber or box. Electrolytic abrasive article 200 can be a chamber for OLED fabrication. On the other hand, in the case where the electrolytically polished article 200 is a chamber for an OLED or an MOCVD chamber for an LED or the like, there is also a case where the weight is in the range of several hundred kg to several thousand kg (several tons).

In addition, the electrolytically polished article 200 may also be part of a component of the OLED chamber. The electrolytically polished article 200 may have a ring shape formed by a plate, a box shape, or a top and bottom.

The electrolytically polished article 200 is not limited thereto, and all metal materials can be designated as electrolytically polished articles. The electrolytically polished article 200 is immersed in the electrolyte 110. The abrasive surface of the electrolithically abrasive article 200 can include all surfaces of the electroabrasive article 200.

A rectifier may also be disposed on one side of the electrolytic cell 100. The rectifier can be connected to the positive (+) voltage to the electrolytically polished article 200, and the negative (-) voltage can be applied to the negative electrode frame 300. The rectifier can be electrically connected to the electro-grinding article 200 by means of a wire or the like.

The negative electrode frame 300 may be disposed on one side of the polished surface of the electrolytically polished article 200. The negative electrode frame 300 may be disposed uniformly spaced apart from the polishing surface of the electrolytic abrasive article 200 at a predetermined interval. For example, the negative electrode frame 300 and the electrolytically polished article 200 are uniformly spaced apart by a distance of 50 mm ± 20 mm, so that the electrolytic polishing efficiency is improved, and the electrolytic polishing quality is excellent.

The negative electrode frame 300 may include a plate shape of a lattice structure. The negative electrode frame 300 may be a stainless steel material excellent in electrical conductivity and acid resistance, but is not limited thereto. The negative electrode frame 300 may be a bar shape, an L shape, an angular shape, a rod shape, a circular shape, a wire mesh shape, or an orifice plate shape.

The negative electrode frame 300 may include a first negative electrode plate 310 and a second negative electrode plate 330. The first negative electrode plate 310 and the second negative electrode plate 330 may be configured to constitute a lattice structure. The first negative electrode plate 310 may be formed in a bar shape, an L shape, an angular shape, a rod shape, a circular shape, a wire mesh shape, or an orifice metal shape, but is not limited thereto. The first negative electrode plate 310 may be composed of a plurality of plates and configured to be spaced apart from each other.

The second negative electrode plate 330 may be formed in the same shape as the first negative electrode plate 310, but is not limited thereto. The second negative electrode plate 330 may be composed of a plurality of plates and arranged to be spaced apart from each other. The first negative electrode plate 310 and the second negative electrode plate 330 may be disposed to form 90 degrees, but are not limited thereto.

The region where the first negative electrode plate 310 and the second negative electrode plate 330 intersect may be combined by a general assembly device including a rivet (Rivet), a bolt (Bolt), or welding. Unlike this, the region where the first negative electrode plate 310 and the second negative electrode plate 330 intersect may be fixed by means of a C-shaped jig.

Although the structure in which the negative electrode frame 300 has a fixed length has been described above, a negative electrode frame 300 having a variable structure in which the size of the negative electrode frame 300 is increased as the electrolytically polished article 200 is increased may be used.

As shown in FIG. 5, the negative electrode frame 300 may include a first negative electrode plate 310 and a second negative electrode plate 330. The first negative electrode plate 310 and the second negative electrode plate 330 may be configured to constitute a lattice structure.

The first negative electrode plate 310 may be composed of a plurality of brackets, and may be configured in such a manner that its length can be lengthened or reduced. The structure of the second negative electrode plate 330 may be the same as that of the first negative electrode plate 310. Hereinafter, description will be given focusing on the structure of the first negative electrode plate 310.

The first negative electrode plate 310 may be configured to connect a plurality of brackets. The first negative electrode plates 310 may be partially overlapped and moved in directions away from or close to each other. The first negative electrode plate 310 may be composed of three or more brackets, but for the convenience of explanation, the structure in which the first negative electrode plate 310 is constituted by the first bracket 312 and the second bracket 314 connected to the first bracket 312 is centered Be explained.

The first bracket 312 may have an L shape, but is not limited thereto. A portion of the first bracket 312 may be formed to overlap a portion of the second bracket 314. The overlapping area of the first bracket 312 and the second bracket 314 may be supported by means of the C-clamp 500, and the C-clamp 500 disposed in such overlapping regions may be referred to as a third jig.

The first bracket 312 and the second bracket 314 can move in a direction away from or close to each other. The C-clamp 500 can support the first bracket 312 and the second bracket 314 with a force to which the first bracket 312 and the second bracket 314 can move relative to each other. Unlike this, the C-clamp 400 may further apply a fixing force to support the first bracket 312 and the second bracket 314 after moving the first bracket 312 and the second bracket 314.

The second negative electrode plate 330 may include the first bracket 332 and the second bracket 334 as the first negative electrode plate 310. The second negative electrode plate 330 may be formed of a rod-shaped plate, but is not limited thereto. The first bracket 332 of the second negative plate 330 may move in a direction away from or close to the second bracket 334.

The first bracket 332 and the second bracket 334 of the second negative plate 330 may be partially overlapped. The overlapping area of the first bracket 332 and the second bracket 334 of the second negative plate 330 can be supported by means of the C-clamp 500. Therefore, the second negative electrode plate 330 has a variable length.

Returning to Fig. 1, when the negative electrode frame 300 comes into contact with the electrolytically polished article 200 of the positive electrode, a short circuit occurs. In order to prevent this, the negative electrode frame 300 should be configured to be spaced apart from the abrasive surface of the electrolytic abrasive article 200.

Conventionally, the negative electrode frame 300 is fixed to a discharge port formed on the electrolytically polished article 200. However, in the present embodiment, when there is no discharge port on the electrolytically polished article 200, an electrode placement member may be provided for mounting the negative electrode frame 300. 400.

The electrode placement member 400 may include an L shape, a bar shape, an angular shape, and a rod shape, but is not limited thereto.

The electrode placement member 400 may be coupled to one side of the electrolytic abrasive article 200. For example, the electrode placement member 400 may be formed in combination with a reinforcing rib (Rib) formed on the electrolytic abrasive article 200. The electrode placement member 400 may be configured in plurality. Generally, on the electro-grinding article 200, protrusions 210 such as reinforcing ribs, edges, and the like may be formed. In the present embodiment, a structure in which the negative electrode frame 300 is mounted by the projection 210 formed on the electrolytically polished article 200 is proposed.

As shown in FIG. 3, the electrode placement member 400 may be disposed perpendicular to the polishing surface of the electrolytic abrasive article 200. A negative electrode frame 300 is coupled to one side of the electrode placement member 400, and the negative electrode frame 300 may be disposed apart from the polishing surface of the electrolytic abrasive article 200.

The electrode placement member 400 may be formed of a conductive substance. The electrode placement member 400 may be an acid resistant steel plate, aluminum or stainless steel material. The electrode placement member 400 can be positively charged by the projection 2100 of the electrolytically polished article 200 fixed to the positive electrode. Therefore, if the negative electrode frame 300 having the negative electrode is bonded to one side of the electrode placement member 400, an electrical short circuit occurs between the electrode placement member 400 and the negative electrode frame 300.

In order to prevent this, an insulating member 700 may be further disposed between the electrode placement member 400 and the negative electrode frame 300. The insulating member 700 may include any one of PVC, rubber, urethane rubber, and bakelite. The insulating member 700 may be formed wider than the negative electrode frame 300, but is not limited thereto.

On the other hand, the electrode placement member 400 may be formed of an insulating material. If the electrode placement member 400 is formed of an insulating substance, the insulating member 700 disposed between the electrode placement member 400 and the negative electrode frame 300 can be removed.

The electrode placement member 400 can include a first face 410 and a second face 430. The second face 430 of the electrode placement member 400 may be formed by bending a first face 410 of the electrode placement member 400 at a predetermined angle. In the present embodiment, the angle θ1 formed by the first face 410 of the electrode placement member 400 and the second face 430 of the electrode placement member 400 may include 90 degrees, but is not limited thereto.

The first face 410 of the electrode placement member 400 may be coupled to one side of the projection 210 of the electrolytic abrasive article 200. The first surface 410 of the electrode placement member 400 may be fixed by means of the C-clamp 500 in a state of being overlapped and disposed on the projection 210 of the electrolytically polished article. The C-clamp 500 disposed on the first face 410 may be referred to as a first jig, and the C-clamp 500 disposed on the second face 430 may be referred to as a second jig.

The C-clamp 500 may include a fixing portion 510 that is disposed opposite to each other. The fixing portion 510 may be disposed on one side of the electrode placement member 400 that is disposed to overlap and the other side of the protrusion portion 210, and the electrode placement member 400 is stably fixed to the protrusion portion 210. The C-clamp 500 can be formed of a stainless steel material excellent in acid resistance. Unlike the C-shaped jig 500, the fixing portion 510 side may be formed by the insulating portion 520. Since the C-type jig 500 does not permanently fix the negative electrode frame 300 and the electrode placement member 400, if the C-type jig 500 is used, the negative electrode frame 300 and the electrode placement member 400 can be easily mounted and separated. That is, since the mounting position of the electrode placement member 400 differs depending on the shape of the electrolytic abrasive article 200, the C-clamp 500 can easily change the mounting position of the electrode placement member 400 bonded to the negative electrode frame 300.

On the other hand, since the C-clamp 500 is formed of a conductive material, the C-clamp 500 attached to the narrow space between the negative electrode frame 300 and the electrolytically polished article 200 is in contact with the electro-grinding object 200, and the negative electrode frame 300 and the electro-polished object are electropolished. An electrical short circuit will occur between 200s.

In order to prevent this, as shown in FIGS. 4a and 4b, an insulating portion 520 may be further formed on one side of the fixing portion 510 where the negative electrode frame 300 and the electrode placing member 400 are fixed. The fixing portions 510 may be disposed on one side of the first body 540 and the second body 550, respectively. The second body 550 may be formed in a C shape in combination with the first body 540. The first body 540 can be coupled to the second body 550 and moved up and down. Therefore, the fixing portions 510 disposed to face the first body 540 and the second body 550 may be moved in a direction close to each other or away from each other.

The insulating portion 520 may be formed on one side of the fixing portion 510 and in contact with the negative electrode frame 300 and the electrode placement member 400. Therefore, even if the C-type jig 500 is in contact with one side of the electrolytically polished article 200, an electrical short can be prevented between the electrolytically polished article 200 and the negative electrode frame 300. The insulating portion 520 may include a material having elasticity. The insulating portion 520 may include PVC, rubber, urethane rubber, bakelite, or the like, but is not limited thereto.

In addition, a portion of the C-shaped second body 550 may be in contact with one side of the electrolytically polished article 200 or the negative electrode plate. In order to prevent this, an insulating film 550b may be further included on the surface of the second body 550. The inside of the second body 550 may be made of a conductive material 550a in order to maintain rigidity, and an insulating film 550b may be formed on the outer surface of the second body 550.

Further, on the C-clamp 500, a convex portion 530 may be formed in order to maximize the fixing force of the frames joined to each other. The convex portion 530 has an effect of preventing the C-clamp 500 from slipping from the negative electrode frame 300, for example, and preventing the C-clamp 500 from being detached from the negative electrode frame 300.

Although the insulating portion 520 is formed on one side of the fixing portion 510 of the C-shaped jig 500, the fixing portion 520 may be formed of an insulating material to remove the insulating portion 520.

Returning to FIG. 3, the second face 430 of the electrode placement member 400 may be coupled to one side of the first negative electrode plate 310. The first negative electrode plate 310 may be vertically coupled to the electrode placement member 400. The first negative electrode plate 310 may be disposed at a level with the polishing surface of the electrolytic abrasive article 200. The first negative plate 310 may include a first surface 312 and a second surface 314. The second face 314 of the first negative plate 310 may be formed by being bent from the first face 312. The angle θ2 between the first surface 312 and the second surface 314 of the first negative electrode plate 310 may be 90 degrees, but is not limited thereto. The second face 430 of the electrode placement member 410 may be fixed to the first face 312 of the first negative plate 310. The second face 430 of the electrode placement member 400 may be fixed by means of the C-type jig 500 in a state of being overlapped with the first face 312 of the first negative electrode plate 310.

The electrode placement member 400 includes a first face 410 coupled to the projection 210 and a second face 430 coupled to the first negative plate 310 to have an effective combination of the projection 210 and the negative electrode frame 300 in a narrow space. effect.

The electrode frame for electrolytic polishing of the first embodiment and the electrolytic polishing apparatus including the same have the use of the projection 210 formed on the electrolytically polished article 200, thereby having the electrolytic abrasive article 200 in which the negative electrode frame 300 can be efficiently mounted to the unplaced region. Effect.

Referring to FIGS. 1 and 2, respectively, an electrolytic polishing process of the electrolytically polished article 200 is provided. First, the electrode placement member 400 can be attached to the projection 210 formed on the side of the electrolytically polished article 200 by the C-clamp 500. At this time, the electrode placement member 400 may be attached to the plurality of protrusions 210 in such a manner as to support the negative electrode frame 300 in a balanced manner.

Next, the negative electrode frame 300 may be attached to one side of the electrode placement member 400. The negative electrode frame 300 may be mounted in a lattice shape in a state of being coupled to one side of the electrode placement member 400. Unlike this, if the experience of performing electrolytic polishing for the same product has already been in a state in which the negative electrode frame 300 is assembled into a lattice shape, the lattice-shaped negative electrode frame 300 can be easily placed on one side of the electrode placement member 400.

After the electrolytic polishing of the polished surface of the electrolytically polished article 200 is completed, the C-clamp 500 is separated, and the negative electrode frame 300 can be removed from the electrode placement member 400. Next, if the electrode placement member 400 is separated from the electrolytic abrasive article 200, all the steps of the electrolytic polishing can be ended.

Then, if the same product is subjected to electrolytic polishing, it is assembled in reverse order from the above-described order, and the negative electrode is mounted in a short time, which has an effect of shortening the assembly time and the polishing time.

Fig. 6 is a perspective view showing an electrolytic polishing apparatus according to a modification of the first embodiment.

As shown in FIG. 6, the electrolytic polishing apparatus of the first embodiment may include an electrolytic cell 100 which is internally provided with an accommodating space for accommodating the electrolytic abrasive article 200 and the electrolytic solution in which the projections 210 having a predetermined shape are formed; An electrode placement member 400 coupled to at least one of the protrusions 210 of the electrolytic abrasive article 200; a negative electrode frame 300 formed in a lattice structure with one side of the at least one lattice structure and the plurality of electrodes placed The members 400 are coupled to each other at a predetermined interval from the polishing surface of the electrolytic abrasive article 200.

The electrolytic cell 100 may be formed in a box shape in which an accommodation space is provided inside. An electrolyte may be filled inside the electrolytic cell 100. The electrolytic abrasive article 200 can be housed inside the electrolytic cell 100.

The electroabrasive article 200 can include a bottom portion 200a and a sidewall portion 200b. In the drawings, the case where one side wall portion 200b is formed is illustrated, but the present invention is not limited thereto, and a plurality of side wall portions 200b may be formed along the side surface of the bottom portion 200a. Therefore, the electrolytic abrasive article 200 may include a box shape.

The negative electrode frame 300 may include a plate shape of a lattice structure. The negative electrode frame 300 may be a stainless steel material excellent in electrical conductivity and acid resistance, but is not limited thereto. The negative electrode frame 300 may be a bar shape, an L shape, an angular shape, a rod shape, a circular shape, a wire mesh, or an orifice plate shape. The negative electrode frame 300 may include a first negative electrode frame 300a and a second negative electrode frame 300b.

The first negative electrode frame 300a may perform electrolytic polishing of the bottom of the electrolytic abrasive article 200. The first negative electrode frame 300a may be disposed apart from the bottom surface of the electrolytic abrasive article 200. The second negative electrode frame 300b can perform electrolytic polishing on the side wall portion of the electrolytic abrasive article 200. The second negative electrode frame 300b may be disposed apart from the inner side surface of the electrolytic abrasive article 200.

The first negative electrode frame 300a may include a plurality of first negative electrode plates 310a and a plurality of second negative electrode plates 330a. The first negative electrode plate 310a and the second negative electrode plate 330a may be disposed to form a lattice structure. The first negative electrode plate 310a and the second negative electrode plate 330a may be provided to constitute 90 degrees, but are not limited thereto. The configuration of the second negative electrode frame 300b is the same as that of the first negative electrode frame 300a, and thus the description thereof will be omitted.

When the negative electrode frame 300 comes into contact with the electrolytically polished article 200 of the positive electrode, a short circuit occurs. In order to prevent this, the negative electrode frame 300 should be configured to be spaced apart from the abrasive surface of the electrolytic abrasive article 200.

Conventionally, the negative electrode frame 300 is fixed to a discharge port formed on the electrolytically polished article 200. However, in the present embodiment, when there is no discharge port on the electrolytically polished article 200, an electrode placement member may be provided for mounting the negative electrode frame 300. 400.

In the second embodiment, the electrode placement member 400 may be mounted only to the bottom portion 210 of the electroabrasive article 200. When the projections 210 are formed on the bottom portion 200a and the side wall portion 200b of the electrolytically polished article 200, the electrode placement member 400 may be formed on both the bottom portion 200a and the side wall portion 200b of the electrolytic abrasive article 200, and the negative electrode frame 300 may be mounted, but in the In the second embodiment, a case where the protruding portion 210 is formed only on the bottom portion 200a of the electrolytically polished article 200 and the protruding portion is not formed in the side wall portion 200b of the electrolytically polished article 200 will be described.

One side of the electrode placement member 400 may be coupled to one side of the projection 210 of the electrolytic abrasive article 200. The electrode placement member 400 may be coupled to one side of the projection 210 disposed in the edge region of the projection 210 of the electrolytic abrasive article 200.

The electrode placement member 400 can include a first face 410 and a second face 430. The second face 430 of the electrode placement member 400 may be formed by being bent at a fixed angle from the first face 410 of the electrode placement member 400. In the present embodiment, the angle θ1 formed by the first face 410 of the electrode placement member 400 and the second face 430 of the electrode placement member 400 may include 90 degrees, but is not limited thereto.

The other side of the electrode placement member 400 may be combined with the first negative electrode frame 300a. When the electrode placement member 400 is formed of a conductive material, an insulating member 700 may be disposed between the electrode placement member 400 and the first negative electrode frame 300 in order to prevent electrical short between the two. The electrode placement member 400 and the first negative electrode frame 300a can be fixed by the C-type jig 500. Since the C-clamp 500 is formed of a conductive material, the insulating member 700 may be further provided between the C-clamp 500 and the first negative electrode frame 300a.

Although the structure in which the electrode placement member 400 is formed in an L shape has been described above, the present invention is not limited thereto, and may be a bar shape, an angular shape, a rod shape, or a circular plate.

The electrode placement member 400a adjacent to the side wall portion 200b of the electrolytically polished article 200 can be formed long in a manner corresponding to the height of the side wall portion 200b of the electrolytically polished article 200. The electrode placement member 400a adjacent to the side wall portion 200b of the electrolytically polished article 200 may be disposed apart from the polishing surface of the side wall portion 200b of the electrolytic abrasive article 200.

The second negative electrode frame 300b may be disposed between the electrode placement members 210a adjacent to the side wall portion 200b of the electrolytically polished article 200. One side of the second negative electrode frame 300b may be fixed to the electrode placement member 400a by means of a C-type jig 500. Here, the insulating member 700 may be further disposed between the electrode placement member 400 and the second negative electrode frame 300b, and between the second negative electrode frame 300b and the C-type jig 500. Therefore, the second negative electrode frame 300b can effectively perform electrolytic polishing on the side wall polishing surface of the electrolytic abrasive article 200.

The electrode frame for electrolytic polishing of the second embodiment and the electrolytic polishing apparatus including the same have an effect that the negative electrode frame can be used even if one of the bottom portion 200a or the side wall portion 200b of the electrolytic abrasive article 200 does not have the protruding portion 210 300 is easily mounted on the polished surface of the electrolytically polished article 200.

Fig. 7 is an exploded perspective view showing an electrolytic polishing apparatus according to another modification of the first embodiment, and Fig. 8 is a perspective view showing the electrolytic polishing apparatus according to another modification of the first embodiment.

As shown in FIGS. 7 and 8, the electrolytic polishing apparatus according to the modification of the first embodiment may include an electrolytic cell 100 equipped with an electrolytic abrasive article 200 and an electrolytic solution for accommodating the projection 210 having a predetermined shape. a receiving space; a plurality of electrode placement members 400 coupled to at least one of the protrusions 210 of the electrolytic abrasive article 200; a negative electrode frame 300 coupled to one side of the electrode placement member 400; a negative electrode frame 300, It is formed in a lattice structure, and one side of at least one or more lattice structures is coupled to the plurality of negative electrode frame brackets 600, and is disposed at a predetermined interval from the polishing surface of the electrolytic abrasive article 200.

The electrolytic cell 100 may be formed in a box shape in which an accommodation space is provided inside. An electrolyte may be filled inside the electrolytic cell 100. The electrolytic abrasive article 200 can be housed inside the electrolytic cell 100.

The electrolytically polished article 200 may have a polygonal plate shape, but is not limited thereto. All of the metal articles of the electrolytically polished article 200 can be designated as electrolytically polished articles. A projection 210 such as a reinforcing rib, an edge, or the like may be formed on the electrolytic abrasive article 200.

The negative electrode frame 300 may include a plate shape of a lattice structure. The negative electrode frame 300 may be a stainless steel material excellent in electrical conductivity and acid resistance, but is not limited thereto. The negative electrode frame 300 may be a bar shape, an L shape, an angular shape, a rod shape, a circular shape, a wire mesh, or an orifice plate shape.

The negative electrode frame 300 may include a plurality of first negative electrode plates 310 and a plurality of second negative electrode plates 330. The first negative electrode plate 310 and the second negative electrode plate 330 may be disposed to form a lattice structure. The first negative electrode plate 310 and the second negative electrode plate 330 may be disposed to form 90 degrees, but are not limited thereto.

When the negative electrode frame 300 comes into contact with the electrolytically polished article 200 of the positive electrode, a short circuit occurs. In order to prevent this, the negative electrode frame 300 should be configured to be spaced apart from the abrasive surface of the electrolytic abrasive article 200.

Conventionally, the negative electrode frame 300 is fixed to a discharge port formed on the electrolytically polished article 200. However, in the present embodiment, when the electrolytically polished article 200 has no discharge port, the electrode placement member 400 may be provided for mounting the negative electrode frame 300 and Negative frame bracket 600.

The electrode placement member 400 may be coupled to one side of the projection 210 of the electrolytic abrasive article 200. The electrode placement member 400 may include a first face and a second face. The second face of the electrode placement member 400 may be formed by being bent at a predetermined angle from the first face 410 of the electrode placement member 400. The angle θ1 of the first face 410 of the electrode placement member 400 and the second face 430 of the electrode placement member 400 may include 90 degrees, but is not limited thereto. The electrode placement member 400 may be formed to protrude upward. The electrode placement member 400 may be disposed perpendicular to the protrusion 210, but is not limited thereto.

Although the structure in which the electrode placement member 400 is formed in an L shape has been described above, the present invention is not limited thereto, and may be a bar shape, an angular shape, a rod shape, or a circular plate.

The negative electrode frame bracket 600 may be coupled to one side of the electrode placement member 400. The negative electrode frame bracket 600 may be formed of a metal material. When the negative electrode frame bracket 600 is formed of a metal material, an insulating member 700 such as an insulating plate may be further disposed between the electrode placing member 400 and the negative electrode frame bracket 600. The insulating member 700 may be disposed between the electrode placement member 400 and the negative electrode frame bracket 600, between the negative electrode frame bracket 600 and the C-type clamp 500.

The negative electrode frame bracket 600 may be coupled to the second surface 430 of the electrode placement member 400 with the insulating member 700 as a medium, but is not limited thereto. The negative electrode frame bracket 600 may be formed in a shape corresponding to the negative electrode frame 300. The negative electrode frame bracket 600 may be disposed perpendicular to the electrode placement member 400, but is not limited thereto.

The negative electrode frame bracket 600 can be level with the abrasive surface of the electrolytic abrasive article 200 so that the negative electrode frame 300 can maintain a level with the abrasive surface of the electrolytic abrasive article 200. The negative electrode frame bracket 600 can support the end of the negative electrode frame 300. Unlike this, the negative electrode frame bracket 600 may support a certain portion of the negative electrode frame 300.

The negative electrode frame bracket 600 may be formed in an L shape. The negative electrode frame bracket 600 may be configured to include a first side and a second side. The negative electrode frame bracket 600 may include a bar shape, an angular shape, a rod shape, a circular shape, a wire mesh, and an orifice plate in addition to the L shape. The negative electrode frame bracket 600 can be fixed to the negative electrode frame 300 by means of the C-type jig 500. The negative electrode frame bracket 600 can be fixed by means of a C-shaped jig in a state of being overlapped with one side of the negative electrode frame 310.

The negative electrode frame bracket 600 is formed in the same shape as the negative electrode frame 300, and the area in contact with the negative electrode frame 300 is widened, and the effect of further improving the bonding force between the negative electrode frame bracket 600 and the negative electrode frame 300 is obtained.

Further, when the contact area between the negative electrode frame holder 600 and the negative electrode frame 300 is widened, the conductivity is further improved, and the electrolytic polishing efficiency of the electrolytically polished article 200 is improved, and the time required for the electrolytic polishing step can be shortened.

The negative electrode frame bracket 600 may be disposed at a predetermined angle with the electrode placement member 400. The negative electrode frame bracket 600 can be disposed at a predetermined angle with the electrode placement member 400 according to the shape of the negative electrode frame 300, and the negative electrode frame 300 can be effectively coupled to the electrode placement member 400. That is, the electrode placement member 400 does not easily bond the negative electrode frame 300 in accordance with the structure and position of the projection 210 of the electrolytically polished article 200. At this time, if the negative electrode frame holder 600 is disposed on the electrode placement member 400, there is an effect that the degree of freedom of the bonding position of the negative electrode frame 300 can be improved and the negative electrode frame 300 can be efficiently mounted.

In this embodiment, the electrode placement member 400 that supports the negative electrode frame 300 can be configured by using the projection 210 formed on the electrolytically polished article 200, thereby having the electrolithically polished article 200 even in a region where there is no discharge port. The effect of the negative electrode frame 300 can also be effectively installed.

Further, in this embodiment, when the same product is subjected to electrolytic polishing, the assembled negative electrode frame 300 can be assembled to the electrode placement member 400 for polishing, thereby having a time required for shortening the mounting and dismounting of the negative electrode frame 300 and grinding. The effect of time.

Further, in this embodiment, there is an effect that even if one of the bottom portion 200a or the side wall portion 200b of the electrolytically polished article 200 does not have the protruding portion 210, the negative electrode can be easily mounted on the entire polishing surface of the electrolytically polished article 200. Frame 300.

Further, in this embodiment, by disposing the negative electrode frame bracket 600 on the electrode placement member 400, there is an effect that the degree of freedom of the bonding position of the negative electrode frame 300 can be improved and the electrode frame can be efficiently mounted.

9 is a cross-sectional view showing the electrolytic polishing apparatus of the second embodiment, FIG. 10 is a perspective view showing the electrode partitioning member of FIG. 9, and FIG. 11 is a view showing the state in which the electrode partitioning member of FIG. 9 is fixed to the electrolytically polished object. A schematic perspective view of the.

12 to 14 are perspective views showing various structures of the electrode partitioning member of the second embodiment, and Fig. 15 is a perspective view showing a modification of the negative electrode frame of Fig. 9.

As shown in FIG. 9, in this embodiment, the electrode frame is used as an electrode frame which is equipped with an electrolytic cell having an accommodation space for accommodating the electrolytic abrasive article and the electrolytic solution, and may include: a negative electrode frame 3000 disposed in the electrolysis One side of the polished surface of the abrasive article 2000; and an electrode partitioning member 4000 disposed on one side of the negative electrode frame to separate the negative electrode frame from a side surface or a bottom surface of the electrolytic abrasive article.

In addition, the electrolytic polishing apparatus of the second embodiment may include an electrolytic cell 1000 equipped with an accommodation space for accommodating the electrolytic abrasive article 2000 and the electrolytic solution 1100, and a negative electrode frame 3000 disposed on the polishing of the electrolytic abrasive article 2000. One side of the surface; an electrode partitioning member 4000 disposed on one side of the negative electrode frame 3000 to separate the negative electrode frame 3000 from the bottom surface of the electrolytic abrasive article 2000.

The electrolytic cell 1000 may be formed in a box shape in which an accommodation space is provided inside. The electrolytic cell 1000 may include a cylindrical shape, a polygonal box or a ring shape, but the shape thereof is not limited.

The inside of the electrolytic cell 1000 may be filled with an electrolytic solution 1100. As the electrolytic solution 1100, it may be distilled water (H ₂ O), sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ), chromic acid, sodium nitrate (NaNO ₃ ), sodium chloride (NaCl). The at least one selected from the group consisting of glycerol is mixed, but is not limited thereto.

The electrolytic solution 1100 can be replaced after the electrolytic polishing of the electrolytically polished article 2000 is completed in a state of being filled in the electrolytic cell 1000. Unlike this, the electrolyte 1100 can flow in and out by means of a pump that is independently formed on one side of the electrolytic cell 1000. An electrolyte inflow pipe and an electrolyte outflow pipe may be formed between the electrolytic cell 1000 and the pump, and may further include an electrolyte flow rate adjusting unit and a screening program. The screening program filters the residue and foreign matter contained in the electrolyte.

An electrolytic abrasive article 2000 can be housed inside the electrolytic cell 1000. The electrolytic cell 1000 can be formed to be larger than the electrolytically polished article 2000. The electroabrasive article 2000 can be a polygonal or cylindrical chamber or box. Electrolytic abrasive article 2000 can be a chamber for OLED fabrication. In addition, the electrolytically polished article 2000 may also be part of a component of the OLED chamber. The electrolytically polished article 2000 may have a ring shape formed by a plate, a box shape, or a top and bottom. The electrolytically polished article 2000 is not limited thereto, and all metal materials can be designated as electrolytically polished articles. The electrolytically polished article 2000 is immersed in the electrolyte 1100.

Since the electrolytically polished article 2000 has a relatively large weight, it can be accommodated in the accommodation space of the electrolytic cell 1000, for example, in a state of being lifted by a crane or the like. For example, in the case where the electrolytically polished article 2000 is a chamber for an OLED or an MOCVD chamber for an LED or the like, there is also a case where the weight is in the range of several hundred kg to several thousand kg (several tons).

The abrasive surface of the electrolytically polished article 2000 may include the outer side, the inner side, the bottom surface, and the like of the electrolytically polished article 2000.

A rectifier may also be disposed on one side of the electrolytic cell 2000. The rectifier can connect the voltage of the positive electrode (+) to the electrolytically polished object, and can input the voltage of the negative electrode (-) to the negative electrode frame 3000. The rectifier can be electrically connected to the electrolytic abrasive article 2000 by means of a wire or the like.

The negative electrode frame 3000 may be disposed inside and/or outside the electrolytic abrasive article 2000. The negative electrode frame 3000 may be disposed at a predetermined interval from the polishing surface of the electrolytic abrasive article 2000. For example, the negative electrode frame 3000 and the electrolytically polished article 2000 are uniformly spaced apart by a distance of 50 mm ± 20 mm, so that the electrolytic polishing efficiency is improved, and the electrolytic polishing quality is excellent.

The negative electrode frame 3000 may selectively grind the inner side, the outer side, or the bottom surface of the abrasive surface of the electroabrasive article 2000, or may grind all the faces simultaneously. In the present embodiment, a configuration in which the negative electrode frame 3000 is disposed inside the electrolytically polished article 2000 will be described for convenience of explanation.

The negative electrode frame 3000 may include a plate shape of a lattice structure. The negative electrode frame 3000 may be a stainless steel material excellent in electrical conductivity and acid resistance, but is not limited thereto. The negative electrode frame 3000 may be a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, an orifice metal, or a circular plate.

The negative electrode frame 3000 is disposed along the polishing surface of the electrolytically polished article 2000. Therefore, when the shape of the four-sided box in which the upper portion of the electrolytic abrasive article 2000 is opened is formed, the plurality of negative electrode frames 3000 may be formed in a four-sided box shape.

The negative electrode frame 3000 may include a first negative electrode plate 3100 and a second negative electrode plate 3300. The first negative electrode plate 3100 and the second negative electrode plate 3300 may be disposed to constitute a lattice structure. The first negative electrode plate 3100 may be formed in a long rod shape. The first negative electrode plate 3100 may be composed of a plurality of plates and configured to be vertically spaced apart.

The second negative electrode plate 3300 may be formed in a long rod shape. The second negative electrode plate 3300 may be composed of a plurality of plates and arranged side by side. The first negative electrode plate 3100 and the second negative electrode plate 3300 may be disposed to form 90 degrees, but are not limited thereto.

The region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may be riveted by means of screws or the like. Unlike this, the region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may be fixed by means of a C-shaped jig.

Although the structure in which the negative electrode frame 3000 has a fixed length has been described above, a negative electrode frame 3000 having a variable structure in which the size of the negative electrode frame 3000 is increased as the electrolytic abrasive article 2000 is increased can be used.

As shown in FIG. 15, the negative electrode frame 3000 may include a first negative electrode plate 3100 and a second negative electrode plate 3300. The first negative electrode plate 3100 and the second negative electrode plate 3300 may be disposed to constitute a lattice structure.

The first negative electrode plate 3100 may be composed of a plurality of brackets, and may be configured in such a manner that its length can be lengthened or reduced. The structure of the second negative electrode plate 3300 may be the same as that of the first negative electrode plate 3100. Hereinafter, description will be given focusing on the structure of the first negative electrode plate 3100.

The first negative electrode plate 3100 may be configured to connect a plurality of brackets. The first negative electrode plates 3100 may be partially overlapped and moved in a direction away from or close to each other. The first negative electrode plate 3100 may be composed of a plurality of brackets, and for convenience of description, a structure in which the first negative electrode plate 3100 is constituted by the first bracket 3120 and the second bracket 3140 connected to the first bracket 3120 will be mainly described. .

The first bracket 3120 may have an L shape, but is not limited thereto. A portion of the first bracket 3120 may be formed to overlap with a portion of the second bracket 3140. The overlapping area of the first bracket 3120 and the second bracket 3140 can be supported by means of the C-clamp 500. The C-clamp 500 supporting the overlapping area of the first bracket 3120 and the second bracket 3140 may be referred to as a second jig.

The first bracket 3120 and the second bracket 3140 can move in a direction away from or close to each other. The C-clamp 500 can support the first bracket 3120 and the second bracket 3140 with a force to which the first bracket 3120 and the second bracket 3140 can move relative to each other. Unlike this, the C-clamp 500 may further apply a fixing force to support the first bracket 3120 and the second bracket 3140 after moving the first bracket 3120 and the second bracket 3140.

The second negative electrode plate 3300 may include the first bracket 3320 and the second bracket 3340 similarly to the first negative electrode plate 3100. The second negative electrode plate 3300 may be formed of a rod-shaped plate, but is not limited thereto. The first bracket 3320 of the second negative plate 3300 can move in a direction away from or close to the second bracket 3340.

The first bracket 3320 and the second bracket 3340 of the second negative plate 3300 may be partially overlapped. The overlapping area of the first bracket 3320 and the second bracket 3340 of the second negative plate 3300 can be supported by means of the C-clamp 500. Therefore, the second negative electrode plate 3300 has a variable length.

Referring to FIG. 9 again, if the negative electrode frame 3000 comes into contact with the electrolytically polished article 2000 of the positive electrode, a short circuit occurs. In order to prevent this, the negative electrode frame 3000 should be formed to be spaced apart from the bottom surface and the side surface of the electrolytic abrasive article 2000.

In the present embodiment, the electrode partitioning member 4000 may be provided to separate the negative electrode frame 3000 from the bottom surface and the side surface of the electrolytic abrasive article 2000.

The electrode partitioning member 4000 may be coupled to one side of the negative electrode frame 3000. The electrode partitioning member 4000 may be coupled to one side of the lowermost first negative electrode plate 3100. The electrode partitioning member 4000 is bonded to one side of the first negative electrode plate 3100 in such a manner as to protrude downward from the first negative electrode plate 3100. Therefore, the electrode partitioning member 4000 can be in contact with the bottom surface of the electrolytic abrasive article 2000.

The electrode partitioning member 4000 may be coupled to one side of the first negative electrode plate 3100 in such a manner as to protrude laterally from the first negative electrode plate 3100. Therefore, the electrode partitioning member 4000 can be in contact with the side surface of the electrolytic abrasive article 2000.

In order to prevent the negative electrode frame 3000 from being short-circuited with the electrolytic abrasive article 2000 by means of the electrode partitioning member 4000, the electrode spacing member 4000 may be formed of an insulating material. The electrode partition member 4000 may be formed of a material that can withstand the weight of the negative electrode frame 3000 and is highly resistant to acid. The electrode spacing member 4000 may include one of PVC, rubber, urethane rubber, bakelite. The negative electrode frame 3000 and the electrode partitioning member 4000 may be joined by means of a C-type jig 500. The C-clamp 500 incorporating the negative electrode frame 3000 and the electrode partitioning member 4000 may be referred to as a first jig.

Since the C-clamp 500 does not permanently fix the negative electrode frame 3000 and the electrode partitioning member 4000, if the C-clamp 500 is used, the mounting and separation of the negative electrode frame 3000 and the electrode partitioning member 4000 can be easily performed. That is, since the mounting position of the electrode partitioning member 4000 differs depending on the shape of the electrolytic abrasive article 2000, the C-clamp 500 can easily change the mounting position of the electrode partitioning member 4000 bonded to the negative electrode frame 3000. The C-clamp 500 can adopt the structure of Figs. 4a and 4b.

The electrode partitioning members 4000 may be disposed apart from one side and the other side of the first negative electrode plate 3100 disposed at the lowermost side. The electrode partitioning member 4000 can be supported in a balanced manner so that the weight of the negative electrode frame 3000 is not biased in one direction. The number of the electrode partition members 4000 to be mounted is not limited, and may be formed in three or more. The electrode partitioning member 4000 may be formed at a lower portion of the plurality of negative electrode frames 3000 that are disposed apart from the other polishing surface inside the electrolytically polished article 2000.

Further, if the partition member 4000 fixed to the bottom and the side surface of the electrolytically polished article 2000 is attached to the corner portion of the negative electrode frame 3000, the center of the negative electrode frame 3000 can be grasped, and the negative electrode frame 3000 can be attached more firmly.

The electrode partition member 4000 may be formed in an L shape, a bar shape, an angular shape, or a rod shape, but is not limited thereto. Next, the shape of the electrode partition member 4000 will be described as one of the shapes mentioned above. However, the shape of the electrode partitioning member 4000 is not limited to the shape described below.

As shown in FIG. 10, the electrode partitioning member 4000 may be formed such that the lower width becomes smaller. Thereby, the area where the electrode partitioning member 4000 is in contact with the electrolytic abrasive article 2000 can be minimized, and the overall uniform electrolytic polishing quality of the electrolytic abrasive article 2000 can be maintained.

The length L of the electrode partitioning member 4000 may be formed larger than the width W of the electrode partitioning member 4000. The length L of the electrode partitioning member 4000 may be formed to be larger than the width of the first negative electrode plate 3100. Therefore, the electrode partitioning member 4000 may be disposed to protrude toward the lower portion of the first negative electrode plate 3100.

As an example, the length L of the electrode partitioning member 4000 may include 8 cm to 12 cm. The width W of the electrode partitioning member 4000 may include 2 cm to 7 cm. The thickness T of the electrode spacing member 4000 may include 2 nm to 7 nm. The length L, the width W, and the thickness T of the electrode partition member 4000 are not limited thereto.

The electrode partitioning member 4000 may include a first support portion 4100 and a second support portion 4300. The first support portion 4100 may be formed in a quadrangular plate shape, but is not limited thereto. The second support portion 4300 may be formed such that its width becomes smaller toward the lower portion. As an example, the second support portion 4300 may be formed in an inverted triangular shape having a vertex at the lower portion, but is not limited thereto. On the bottom surface of the electrolytically polished article 2000, the surface of one of the side faces of the first support portion 4100 or the face of one of the side faces of the second support portion 4300 can be in surface contact.

As shown in FIG. 11, the apex of the second support portion 4300 may be in contact with the bottom surface or side surface of the electrolytic abrasive article 2000. The electrolytically polished article 2000 may be formed with grooves or holes in the bottom surface depending on its shape. A portion of the electrode spacing member 4000 can be inserted into a slot or aperture 2100 formed in the electrolithically abrasive article 2000. In the groove or hole 2100 formed in the electrolytic abrasive article 2000, the apex region of the second support portion 4300 of the electrode partitioning member 4000 may be inserted and joined. The lower portion of the second support portion 4300 is formed to have a narrow width, and thus a part of the second support portion 4300 can be inserted and coupled regardless of the size of the groove or the hole 2100. Therefore, when the groove or the hole 2100 is present at the bottom of the electrolytically polished article 2000, there is an effect that the negative electrode frame 4000 can be more effectively fixed by the groove or the hole 2100.

Even if the groove or hole 2100 is not formed on the electrolytic abrasive article 2000, since the partition member 4000 contacts and fixes the bottom surface and the side surface of the electrolytic abrasive article 2000, there is an effect that the negative electrode frame 3000 can be mounted more firmly.

The electrode partitioning member 4000 described above may be formed in various shapes. The electrode partitioning member 400 may be formed as shown in FIGS. 12 to 14.

As shown in FIG. 12, the electrode partitioning member 4000 may include an inner side support member 4500 and the outer side support member 4600. The inner side support member 4500 may include a bulge or iron piece for concrete having a hard strength, but is not limited thereto. The inner support member 4500 can increase the hardness of the electrode partition member 4000. The outer support member 4600 may be formed on the surface of the inner support member 4500. The outer support member 4600 can comprise a material of an insulating material. The outer support member 4600 may include an insulating material such as plastic, but is not limited thereto.

As shown in FIG. 13, the electrode partitioning member 4000 may include a first support portion 4100 and a second support portion 4300. The first support portion 4100 may be formed in a quadrangular plate shape, but is not limited thereto. The second support portion 4300 may be formed such that its width becomes smaller toward the lower portion.

The second support portion 4300 may have a trapezoidal shape in which the width of the lower surface is smaller than the width of the upper surface. The lower surface of the second support portion 4300 may be in contact with the bottom surface of the electrolytically polished article. The lower surface of the second support portion 4300 has a wider contact area with the electro-grinding object 2000 than the sharp-edged electrode partition member, and thus has an effect of more effectively supporting the negative electrode frame 3000. When a groove or a hole is formed at the bottom of the electrolytic abrasive article 2000, a portion of the second support portion 4300 may be inserted into a groove or hole of the electrolytic abrasive article 2000.

As shown in FIG. 14, the electrode partitioning member 4000 may include a first support portion 4100 and a second support portion 4300. The first support portion 4100 may be formed in a quadrangular plate shape, but is not limited thereto. The second support portion 4300 may be formed such that its width becomes smaller toward the lower portion.

The second support portion 4300 may be formed such that the lower portion has a rounded corner. The lower surface of the second support portion 4300 may be in contact with the bottom surface of the electrolytic abrasive article 2000. The lower surface of the second support portion 4300 has an effect of preventing scarring in the electroabrasive article when it comes into contact with the electroabrasive article 2000. When a groove or a hole is formed at the bottom of the electrolytic abrasive article 2000, a portion of the second support portion 4300 may be inserted into a groove or hole of the electrolytic abrasive article 2000.

The electrode partitioning member 4000 of the second embodiment is disposed at a lower portion of the negative electrode frame 3000, so that the negative electrode frame 3000 can be efficiently disposed to the electrolytic abrasive article 2000 without the additional bracket.

When the electroabrasive article 2000 is in the shape of a plate such as a door, electrolytic polishing can be performed after being disposed on the upper portion of the electroabrasive article 2000 in a state where the negative electrode frame 3000 is supported by the electrode partitioning member 4000. Next, in a state where the negative electrode frame 3000 is removed, the electrolytic polishing article 2000 is placed upside down, and the negative electrode frame 3000 can be rearranged on the upper portion of the electrolytically polished article. Next, if electrolytic polishing is performed on the electrolytically polished article 2000, there is an effect that the time required for mounting and electrolytic polishing can be shortened.

The structure in which the electrode partitioning member 4000 is in contact with the bottom of the electroabrasive article 2000 has been described above, but differently, the electrode separating member 4000 may be formed in a structure in contact with the side wall portion of the electroabrasive article 2000, so that the negative electrode frame 3000 is electrolyzed. The abrasive surfaces of the abrasive article 2000 are spaced apart.

Referring now to Figures 16 through 19, the construction of the electrolytic polishing apparatus of various embodiments is provided.

Fig. 16 is a cross-sectional view showing a modification of the electrolytic polishing apparatus of the second embodiment.

As shown in FIG. 16, the electrolytic polishing apparatus may include an electrolytic cell 1000 equipped with an accommodating space for accommodating the electrolytic abrasive article 2000 and the electrolyte, and a negative electrode frame 3000 disposed on the polished surface of the electrolytic abrasive article 2000. One side; an electrode partitioning member 4000 disposed on one side of the negative electrode frame 3000 to separate the negative electrode frame 3000 from the bottom surface of the electrolytic abrasive article 2000.

The electrolytic cell 1000 may be formed in a box shape in which an accommodation space is provided inside. The electrolytic cell 1000 may include a cylindrical shape, a polygonal box or a ring shape, but the shape thereof is not limited. The inside of the electrolytic cell 1000 may be filled with an electrolytic solution 1100. As the electrolytic solution 1100, it may be distilled water (H ₂ O), sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ), chromic acid, sodium nitrate (NaNO ₃ ), sodium chloride (NaCl). The at least one selected from the group consisting of glycerol is mixed, but is not limited thereto.

An electrolytic abrasive article 2000 can be housed inside the electrolytic cell 1000. The electrolytically polished article 2000 is immersed in the electrolyte 1100. The abrasive surface of the electrolytically polished article 2000 may include the outer side, the inner side, the bottom surface, and the like of the electroabrasive article. A rectifier may also be disposed outside the electrolytic cell 2000. The rectifier can connect the voltage of the positive electrode (+) to the electrolytically polished object, and can input the voltage of the negative electrode (-) to the negative electrode frame 3000. The rectifier can be electrically connected to the electrolytic abrasive article 2000 by means of a wire or the like.

The negative electrode frame 3000 may be disposed inside and outside the electrolytically polished article 2000. The negative electrode frame 3000 may be disposed at a predetermined interval from the polishing surface of the electrolytic abrasive article 2000. The negative electrode frame 3000 can selectively grind the inner side, the outer side or the bottom surface of the abrasive surface of the electroabrasive article 2000, or grind all the faces. In the present embodiment, a configuration in which the negative electrode frame 3000 is disposed inside the electrolytically polished article 2000 will be described for convenience of explanation.

The negative electrode frame 3000 may include a plate shape of a lattice structure. The negative electrode frame 3000 may be a stainless steel material having excellent electrical conductivity, but is not limited thereto. The negative electrode frame 3000 may be a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, an orifice metal, or a circular plate.

The negative electrode frame 3000 is disposed along the polishing surface of the electrolytically polished article 2000. Therefore, when the shape of the four-sided box in which the upper portion of the electrolytic abrasive article 2000 is opened is formed, the plurality of negative electrode frames 3000 may be formed in a four-sided box shape.

The negative electrode frame 3000 may include a first negative electrode plate 3100 and a second negative electrode plate 3300. The first negative electrode plate 3100 and the second negative electrode plate 3300 are formed in a lattice structure. The first negative electrode plate 3100 may be formed in a long rod shape. The first negative electrode plate 3100 may be composed of a plurality of plates and configured to be vertically spaced apart.

The second negative electrode plate 3300 may be formed in a long rod shape. The second negative electrode plate 3300 may be composed of a plurality of plates and configured to be spaced apart from each other. The first negative electrode plate 3100 and the second negative electrode plate 3300 may be disposed to form 90 degrees, but are not limited thereto.

The region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may be riveted by means of screws or the like. The region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may also be fixed by means of a C-shaped jig.

When the negative electrode frame 3000 comes into contact with the electrolytic abrasive article 2000, a short circuit occurs. In order to prevent this, the negative electrode frame 3000 should be formed to be spaced apart from the side and bottom surfaces of the electrolytically polished article 2000. The side of the electrolytic abrasive article 2000 can adjust the length of the first negative electrode plate 3100 of the negative electrode frame 3000, and is disposed apart from the electrolytic abrasive article 2000.

In the present embodiment, the electrode partitioning member 4000 may be provided to separate the negative electrode frame 3000 from the bottom surface of the electrolytic abrasive article 2000.

The electrode partitioning member 4000 may be formed of an insulating material. The electrode partition member 4000 may be formed of a material that can withstand the weight of the negative electrode frame 3000 and is highly resistant to acid. The electrode spacing member 4000 may include one of PVC, rubber, urethane rubber, bakelite. The electrode partition member 4000 is formed of an insulating material, so that it is possible to prevent the negative electrode frame 3000 from being short-circuited with the electrolysis object 2000 as a positive electrode. The shape of the electrode partitioning member 4000 may have a shape in which the width is narrower toward the lower portion, but is not limited thereto.

The electrode partitioning member 4000 may be coupled to one side of the negative electrode frame 300. The electrode partitioning member 4000 may be coupled to one side of the first negative electrode plate 3100 disposed at the uppermost portion. The electrode partitioning member 4000 may be disposed to overlap the first negative electrode plate 3100 disposed at the uppermost portion. The electrode partitioning member 4000 may be fixed to the first negative electrode plate 3100 disposed at the uppermost side by means of the C-type jig 500.

The length of the first negative electrode plate 3100 disposed at the uppermost portion may be formed longer than the length of the other first negative electrode plates 3100. The first negative electrode plate 3100 disposed at the uppermost portion may be disposed at an upper portion of the side wall portion of the electrolytically polished article 2000. The electrode partitioning member 4000 may be in contact with an upper portion of a side wall portion of the electrolytic abrasive article 2000. The electrode partitioning member 4000 may be disposed in plurality along the upper surface of the side wall portion of the electrolytically polished article 2000.

The electrode partitioning member 4000 has an effect of stably supporting the negative electrode frame 3000 while separating the negative electrode frame 3000 from the bottom of the electrolytic abrasive article 2000.

In addition, the electrode partitioning member 4000 of the second embodiment is not in contact with the bottom of the electrolytic abrasive article 2000, and thus has an effect of preventing damage due to contact of the electrode partitioning member 4000 with the electrolytic abrasive article 2000.

Fig. 17 is a cross-sectional view showing another modification of the electrolytic polishing apparatus of the second embodiment, and Fig. 18 is a perspective view showing a state in which the negative electrode frame of Fig. 17 is coupled to the holder.

As shown in FIG. 17, the electrolytic polishing apparatus according to the modification of the second embodiment may include an electrolytic cell 1000 equipped with an accommodation space for accommodating the electrolytic abrasive article 2000 and the electrolytic solution 1100, and a negative electrode frame 3000 disposed in the One side of the abrasive surface of the electrolytically polished article 2000; a bracket 7000 coupled to one side of the negative electrode frame 3000; and an electrode partitioning member 4000 coupled to one side of the bracket 7000 such that the negative electrode frame 3000 is The bottom surface of the electroabrasive article is spaced apart.

The electrolytic cell 1000 may be formed in a box shape in which an accommodation space is provided inside. The electrolytic cell 1000 may include a cylindrical shape, a polygonal box or a ring shape, but the shape thereof is not limited. The inside of the electrolytic cell 1000 may be filled with an electrolytic solution 1100. As the electrolytic solution 1100, it may be distilled water (H ₂ O), sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ), chromic acid, sodium nitrate (NaNO ₃ ), sodium chloride (NaCl). The at least one selected from the group consisting of glycerol is mixed, but is not limited thereto.

An electrolytic abrasive article 2000 can be housed inside the electrolytic cell 1000. The electrolytically polished article 2000 is immersed in the electrolyte 1100. The abrasive surface of the electrolytically polished article 2000 may include the outer side, the inner side, the bottom surface, and the like of the electrolytically polished article 2000. A rectifier may also be disposed outside the electrolytic cell 1000. The rectifier can connect the voltage of the positive electrode (+) to the electrolytically polished object, and can input the voltage of the negative electrode (-) to the negative electrode frame 3000. The rectifier can be electrically connected to the electrolytic abrasive article 2000 by means of a wire or the like.

The negative electrode frame 3000 may be disposed inside and outside the electrolytically polished article 2000. The negative electrode frame 3000 may be disposed at a predetermined interval from the polishing surface of the electrolytic abrasive article 2000. The negative electrode frame 3000 can selectively grind the inner side, the outer side or the bottom surface of the abrasive surface of the electroabrasive article 2000, or grind all the faces. In the present embodiment, a configuration in which the negative electrode frame 3000 is disposed inside the electrolytically polished article 2000 will be described for convenience of explanation.

The negative electrode frame 3000 may include a plate shape of a lattice structure. The negative electrode frame 3000 may be a stainless steel material having excellent electrical conductivity, but is not limited thereto. The negative electrode frame 3000 may be a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, an orifice metal, or a circular plate.

The negative electrode frame 3000 is disposed along the polishing surface of the electrolytically polished article 200, and thus, when the shape of the four-sided box in which the upper portion of the electrolytic abrasive article 2000 is opened is formed, the plurality of negative electrode frames 3000 may be formed in a four-sided box shape.

The negative electrode frame 3000 may include a first negative electrode plate 3100 and a second negative electrode plate 3300. The first negative electrode plate 3100 and the second negative electrode plate 3300 are formed in a lattice structure. The first negative electrode plate 3100 may be formed in a long rod shape. The first negative electrode plate 3100 may be composed of a plurality of plates and configured to be vertically spaced apart.

The second negative electrode plate 3300 may be formed in a long rod shape. The second negative electrode plate 3300 may be composed of a plurality of plates and configured to be spaced apart from each other. The first negative electrode plate 3100 and the second negative electrode plate 3300 may be disposed to form 90 degrees, but are not limited thereto.

The region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may be riveted by means of screws or the like. The region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may also be fixed by means of a C-shaped jig.

When the negative electrode frame 3000 comes into contact with the electrolytic abrasive article 2000, a short circuit occurs. In order to prevent this, the negative electrode frame 3000 should be formed to be spaced apart from the side and bottom surfaces of the electrolytically polished article 2000. The side of the electrolytically polished article 2000 can adjust the length of the first negative electrode plate 3100 of the negative electrode frame 3000 to be spaced apart from the electrolytically polished article.

The negative electrode frame 3000 may be equipped with the electrode partitioning member 4000 of the present embodiment to be spaced apart from the bottom surface of the electrolytic abrasive article 2000.

The electrode partitioning member 4000 may be formed of an insulating material. The electrode partition member 4000 may be formed of a material that can withstand the weight of the negative electrode frame 3000 and is highly resistant to acid. The electrode spacing member 4000 may include one of PVC, rubber, urethane rubber, bakelite. The electrode partitioning member 4000 is formed of an insulating material, so that the negative electrode frame can be prevented from being short-circuited with the electrolytic object as the positive electrode. The shape of the electrode partitioning member 4000 may have a shape in which the width is narrower toward the lower portion, but is not limited thereto.

The electrode partitioning member 4000 may be disposed on an upper portion of the side wall of the electroabrasive article 2000. On one side of the negative electrode frame 3000, a bracket 7000 may be coupled in order to support the negative electrode frame 3000. The bracket 7000 may be formed in a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, an orifice metal, or a circular shape. The bracket 7000 may be disposed in parallel with the first negative electrode plate 3100. The bracket 7000 may be coupled to the upper side of the second negative plate 3300. The bracket 7000 may be combined with a part or the entirety of the second negative electrode plate 3300. The holder 7000 may be formed long in a manner disposed on the upper portion of the side wall of the electrolytically polished article 2000. The bracket 7000 can be coupled to one side of the electroabrasive article 2000. The bracket 7000 can be formed of a metal material. The holder 7000 may be a positive holder that is connected to the electroabrasive article 2000 for transferring the positive electrode.

An insulating plate 5000 may be further disposed between the bracket 7000 and the negative electrode frame 3000. The negative electrode frame 3000, the insulating plate 5000, and the bracket 7000 can be firmly fixed by the C-clamp 500 in a state of being overlapped. If the bracket 7000 is not connected to the electrolytic abrasive article 2000 but functions as a normal bracket, the insulating plate 5000 between the negative electrode frame 3000 and the bracket 7000 can be removed. In addition, if the bracket 7000 functions as a general bracket, it may be formed of a material of an insulating material.

The electrolytic polishing apparatus according to the modification of the second embodiment has an effect that the negative electrode frame can be efficiently attached to the inner side and the outer side of the electrolytically polished object by the bracket.

Fig. 19 is a cross-sectional view showing another modification of the electrolytic polishing apparatus of the second embodiment. The electrolytic polishing apparatus will be described focusing on a structure in which the negative electrode frame is disposed outside the electrolytic polishing apparatus.

As shown in FIG. 19, the electrolytic polishing apparatus according to another modification of the second embodiment may include: an electrolytic cell 1000 equipped with an accommodating space for accommodating the electrolytic abrasive article 2000 and the electrolytic solution 1100; and a negative electrode frame 3000 disposed at An outer side of the polishing surface of the electrolithically polished article 2000; a bracket 7000 coupled to one side of the negative electrode frame 3000; and an electrode partitioning member 4000 coupled to one side of the bracket 7000 to cause the negative electrode frame 3000 Separated from the bottom surface of the electroabrasive article.

The electrolytic cell 1000 may be formed in a box shape in which an accommodation space is provided inside. The electrolytic cell 1000 may include a cylindrical shape, a polygonal box or a ring shape, but the shape thereof is not limited. The inside of the electrolytic cell 1000 may be filled with an electrolytic solution 1100. As the electrolytic solution 1100, it may be derived from distilled water (H ₂ O), sulfuric acid (H ₂ SO 4 ), phosphoric acid (H ₃ PO ₄ ), chromic acid, sodium nitrate (NaNO ₃ ), sodium chloride (NaCl), At least one selected from the group consisting of glycerol is mixed, but is not limited thereto.

An electrolytic abrasive article 2000 can be housed inside the electrolytic cell 1000. The electrolytically polished article 2000 is immersed in the electrolyte 1100. The abrasive surface of the electrolytically polished article 2000 may include the outer side, the inner side, the bottom surface, and the like of the electrolytically polished article 2000. A rectifier may also be disposed outside the electrolytic cell 1000. The rectifier can connect the voltage of the positive electrode (+) to the electrolytically polished object, and can input the voltage of the negative electrode (-) to the negative electrode frame 3000. The rectifier can be electrically connected to the electrolytic abrasive article 2000 by means of a wire or the like.

The negative electrode frame 3000 may be disposed outside the electrolytic abrasive article 2000. The negative electrode frame 3000 may be disposed at a predetermined interval from the polishing surface on the outer side of the electrolytic abrasive article 2000.

The negative electrode frame 3000 may include a plate shape of a lattice structure. The negative electrode frame 3000 may be a stainless steel material having excellent electrical conductivity, but is not limited thereto. The negative electrode frame 3000 may be a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, an orifice metal, or a circular plate.

The negative electrode frame 3000 is disposed along the polishing surface of the electrolytically polished article 2000. Therefore, when the shape of the four-sided box in which the upper portion of the electrolytic abrasive article 2000 is opened is formed, the plurality of negative electrode frames 3000 may be formed in a four-sided box shape.

The negative electrode frame 3000 may include a first negative electrode plate 3100 and a second negative electrode plate 3300. The first negative electrode plate 3100 and the second negative electrode plate 3300 are formed in a lattice structure. The first negative electrode plate 3100 may be formed in a long rod shape. The first negative electrode plate 3100 may be composed of a plurality of plates and configured to be vertically spaced apart.

The second negative electrode plate 3300 may be formed in a long rod shape. The second negative electrode plate 3300 may be composed of a plurality of plates and configured to be spaced apart from each other. The first negative electrode plate 3100 and the second negative electrode plate 3300 may be disposed to form 90 degrees, but are not limited thereto.

The region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may be riveted by means of screws or the like. The region where the first negative electrode plate 3100 and the second negative electrode plate 3300 intersect may also be fixed by means of a C-shaped jig.

The electrode partitioning member 4000 may be formed of an insulating material. The electrode partition member 4000 may be formed of a material that can withstand the weight of the negative electrode frame 3000 and is highly resistant to acid. The electrode spacing member 4000 may include one of PVC, rubber, urethane rubber, bakelite. The electrode partitioning member 4000 is formed of an insulating material, so that the negative electrode frame 3000 can be prevented from being short-circuited with the electrolytic object 2000 as a positive electrode. The shape of the electrode partitioning member 4000 may have a shape in which the width is narrower toward the lower portion, but is not limited thereto.

The electrode partitioning member 4000 may be disposed on an upper portion of the side wall of the electroabrasive article 2000. On one side of the negative electrode frame 3000, a bracket 7000 may be coupled in order to support the negative electrode frame 3000.

The bracket 7000 can include a first bracket 7100 and a second bracket 7200. The first bracket 7100 may support the negative electrode frame 3000 disposed inside the electrolytic abrasive article 2000. The second bracket 7200 may be disposed perpendicular to the first bracket 7100, but is not limited thereto. The second bracket 7200 may be formed in a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, an orifice metal, or a circular shape.

The second holder 7200 can be coupled to the upper side of the second negative electrode plate 3300 disposed on the outermost side. The second bracket 7200 may be combined with a part or the whole of the second negative electrode plate 3300.

The holder 7000 may be a positive holder that is connected to the electroabrasive article 2000 for transferring the positive electrode. At this time, an insulating plate may be further disposed between the second holder 7200 and the second negative electrode plate 3300. The second negative electrode plate 3300, the insulating plate, and the second holder 7200 can be firmly fixed by the C-clamp 500 in an overlapped state. If the bracket 7000 is not connected to the electrolytic abrasive article 2000 but functions as a normal bracket, the insulating plate between the second negative electrode plate 3300 and the second bracket 7200 can be removed. In addition, if the bracket 7000 functions as a general bracket, it may be formed of a material of an insulating material.

The electrolytic polishing apparatus according to the modification of the second embodiment has an effect that the negative electrode frame 3000 can be efficiently attached to the inner side and the outer side of the electrolytic abrasive article 2000 by means of a bracket.

By arranging the electrode partitioning member 4000 on the side of the negative electrode frame 3000 via an embodiment, the negative electrode frame 3000 is disposed on the electrolytically polished article 2000, so that the negative electrode frame 3000 can be effectively disposed on the electrolytically polished article 2000 without the additional carrier. Internal or external, the negative electrode frame 3000 can be quickly disposed on the electrolytically polished article 2000, and the efficiency of the electrolytic polishing process can be improved while being uniformly and uniformly arranged, and the electrolytic polishing quality can be remarkably improved.

Further, the lower width of the electrode partitioning member 4000 is gradually reduced by an embodiment, and the groove or the hole formed in the bottom of the electrolytically polished article 2000 is inserted, thereby having an effect of being able to more effectively fix the negative electrode frame 3000.

By disposing the electrode partitioning member 4000 on the upper portion of the side wall portion of the electro-grinding article 2000, the effect of stably supporting the negative electrode frame 3000 while separating the negative electrode frame 3000 from the bottom of the electroabrasive article 2000 is provided.

In addition, by arranging the electrode partitioning member 4000 not in contact with the bottom of the electrolytic abrasive article 2000 via an embodiment, there is an effect that damage due to contact of the electrode partitioning member 4000 with the electrolytic abrasive article 2000 can be prevented.

Further, by using the bracket 7000 via an embodiment, there is an effect that the negative electrode frame 3000 can be efficiently attached to the inner side and the outer side of the electrolytically polished article 2000.

100‧‧‧electrolyzer

1000‧‧‧electrolyzer

1100‧‧‧ electrolyte

200‧‧‧Electrically ground objects

200a‧‧‧ bottom

200b‧‧‧ Sidewall

210‧‧‧ protruding parts

2000‧‧‧Electrically ground objects

2100‧‧‧ slots/holes

300‧‧‧negative frame

300a‧‧‧First negative frame

300b‧‧‧second negative frame

310‧‧‧First negative plate

310a‧‧‧First negative plate

312‧‧‧First bracket

314‧‧‧second bracket

330‧‧‧Second negative plate

330a‧‧‧Second negative plate

332‧‧‧First bracket

334‧‧‧second bracket

3000‧‧‧negative frame

3100‧‧‧First negative plate

3120‧‧‧First bracket

3140‧‧‧second bracket

3300‧‧‧Second negative plate

3320‧‧‧First bracket

3340‧‧‧second bracket

400‧‧‧electrode placement member

400a‧‧‧electrode placement member

410‧‧‧ first side

430‧‧‧ second side

4000‧‧‧electrode separating member

4100‧‧‧First support

4300‧‧‧second support

4500‧‧‧Inside support member

4600‧‧‧Outer support members

500‧‧‧ fixture

510‧‧‧Fixed Department

520‧‧‧Insulation

530‧‧‧ convex

540‧‧‧ first subject

550‧‧‧ second subject

550a‧‧‧Electrically conductive substance

550b‧‧‧Insulation film

5000‧‧‧Insulation board

600‧‧‧ bracket

700‧‧‧Insulating components

7000‧‧‧ bracket

7100‧‧‧First bracket

7200‧‧‧second bracket

L‧‧‧ length

T‧‧‧ thickness

W‧‧‧Width

Fig. 1 is an exploded perspective view showing the electrolytic polishing apparatus of the first embodiment. Fig. 2 is a perspective view showing the combination of the electrolytic polishing apparatus of the first embodiment. Fig. 3 is a combined perspective view showing a state in which an electrode frame of the electrolytic polishing apparatus of the first embodiment is joined. [Fig. 4a] - [Fig. 4b] are respectively perspective views showing the jig of the electrolytic polishing apparatus of the first embodiment. Fig. 5 is a perspective view showing a modification of the negative electrode frame of the electrolytic polishing apparatus of the first embodiment. 6] FIG. 8 is a perspective view showing a modification of the electrolytic polishing apparatus of the first embodiment. Fig. 9 is a cross-sectional view showing the electrolytic polishing apparatus of the second embodiment. FIG. 10 is a perspective view showing the electrode partitioning member of FIG. 9. FIG. Fig. 11 is a schematic perspective view showing a state in which the electrode partitioning member of Fig. 9 is fixed to an electrolytically polished article. [Fig. 12] - Fig. 14 are perspective views showing various structures of the electrode partitioning members of the second embodiment, respectively. Fig. 15 is a perspective view showing a modification of the negative electrode frame of Fig. 9 . [Fig. 16] Fig. 17 is a cross-sectional view showing a modification of the electrolytic polishing apparatus of the second embodiment. FIG. 18 is a perspective view showing a state in which the negative electrode frame of FIG. 17 is coupled to a holder. FIG. Fig. 19 is a cross-sectional view showing another modification of the electrolytic polishing apparatus of the second embodiment.

Claims (10)

An electrode frame for electrolytic polishing, the electrode frame being internally provided with an electrolytic cell for accommodating an electrolytic abrasive article and an electrolyte containing space, comprising: an electrode placement member coupled to at least one of the electrolytic abrasive article The protruding portion includes: a first surface coupled to the protruding portion of the electrolytic abrasive article; a second surface coupled to the first negative electrode frame; and the electrode placement member, even if a discharge port is not utilized The protruding portion of the electrolytic abrasive article is combined; and a first negative electrode frame formed by a plurality of lattice structures, wherein at least one of the lattice structure sides is combined with the electrode placement member, and a grinding of the electrolytic abrasive article The faces are separated by an established interval. The electrode frame for electrolytic polishing according to claim 1, wherein the second surface is formed by bending at a predetermined angle with the first surface, and the first surface is formed by the protrusion of the electrolytically polished object and a first The second surface of the electrode placement member is fixed by means of a side of the first negative electrode frame and the second jig. The electrode frame for electrolytic polishing according to claim 2, wherein the electrolytic abrasive article comprises a bottom portion formed with a lower projection portion, and one or more side wall portions formed by bending from the bottom portion to the side surface, further comprising the electrolytic polishing a second negative electrode frame is disposed opposite to the side wall portion of the object; the electrode placement member is formed to extend from the bottom and the side of the electrolytic abrasive article, and the second negative electrode frame is fixed to the electrode placement member. The electrode frame for electrolytic polishing according to claim 2, wherein a negative electrode frame bracket for arranging the first negative electrode frame, the negative electrode frame carrier and the electrode placement member are further disposed on the electrode placement member The first negative electrode frame is overlapped and fixed with the negative electrode frame bracket. The electrode frame for electrolytic polishing according to claim 1, wherein the first negative electrode frame comprises a first negative electrode plate disposed along a first direction and composed of a plurality of brackets, and forming a predetermined angle along the first direction a second negative plate configured in a second direction and composed of a plurality of brackets, the first negative plate includes a first bracket and a second bracket, and the first bracket is partially overlapped with the second bracket, Moving in a direction away from or close to the second bracket. An electrode frame for internally arranging an electrolytic cell for accommodating an electrolytic abrasive article and an electrolyte receiving space, comprising: a negative electrode frame disposed on one side of the polishing surface of the electrolytic abrasive article; and An electrode separating member coupled to the negative electrode frame to partition the negative electrode frame from a bottom surface of the electrolytic abrasive article, the electrode separating member including a first surface joined to the bottom surface of the electrolytic abrasive article and supporting the negative electrode frame The electrode partitioning member that supports the negative electrode frame even without using a discharge port. The electrode frame of claim 6, wherein a groove or a hole is formed in the bottom of the electrolytic abrasive article, the electrode spacing member further comprising a second electrode for the lower portion to be inserted and coupled to the groove or the hole. The member, the width of the lower portion of the second electrode spacing member is gradually reduced. The electrode frame according to claim 6, wherein the electrode separating member comprises a stainless steel material, and an insulating material is coated on a surface of the electrode separating member, and the electrode separating member is disposed to overlap the negative electrode frame by means of a first Fixed by a clamp, the electrolytic abrasive article includes a side wall portion, and the electrode partitioning member is disposed at an upper portion of the side wall portion of the electrolytic abrasive article. The electrode frame according to claim 6, wherein a bracket is further coupled to an upper portion of the negative electrode frame, and the electrode separating member is coupled to one side of the bracket, the electrolytic abrasive article comprising a side wall portion, the electrode separating member An upper portion of the side wall portion coupled to the electrolytic abrasive article is disposed. An electrolytic polishing apparatus comprising the electrode frame of any one of claims 1 to 9.