TW201823166A - Hydrogen peroxide removal method and apparatus - Google Patents
Hydrogen peroxide removal method and apparatus Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/26—Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups B01J31/02 - B01J31/24
- B01J31/28—Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups B01J31/02 - B01J31/24 of the platinum group metals, iron group metals or copper
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/40—Regeneration or reactivation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J38/00—Regeneration or reactivation of catalysts, in general
- B01J38/48—Liquid treating or treating in liquid phase, e.g. dissolved or suspended
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
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Abstract
Description
[0001] 本發明,是有關於在純水製造過程將水中的過氧化氫去除用的方法及裝置。又,在本發明中,純水是包含超純水。[0001] The present invention relates to a method and an apparatus for removing hydrogen peroxide from water in a pure water production process. In the present invention, pure water includes ultrapure water.
[0002] 半導體、電子材料洗淨用的超純水,是藉由由前處理裝置、一次純水製造裝置、二次純水製造裝置(副系統)所構成的超純水製造設備將原水(工業用水、市水、井水等)處理而被製造。 [0003] 在由凝集、加壓浮上(沈澱)、過濾(膜過濾)裝置等形成的前處理裝置中,進行原水中的懸濁物質和溶膠物質的去除。且,在此過程中也可將高分子系有機物,疏水性有機物等去除。 [0004] 在具備逆滲透膜分離裝置、脫氣裝置及離子交換裝置(混床式或是4床5塔式等)的一次純水製造裝置中,進行原水中的離子和有機成分的去除。又,在逆滲透膜分離裝置中,將鹽類去除,並且將離子性、溶膠性的TOC去除。在離子交換裝置中,進行將鹽類去除並且將藉由離子交換樹脂吸附或是離子交換的TOC成分去除。在脫氣裝置中進行無機系碳(IC)、溶解氧的去除。 [0005] 來自一次純水製造裝置的一次純水,是在副系統,由紫外線(UV)照射裝置、離子交換裝置及限外過濾(UF)膜分離裝置被處理,使超純水被製造。在UV氧化裝置中,藉由由UV燈泡被照射的185nm的UV將TOC有機酸,進一步CO2 分解。藉由分解而生成的有機物及CO2 是由後段的離子交換裝置(通常是混床式離子交換裝置)被去除。在UF膜分離裝置中微粒子被去除,從離子交換裝置流出的離子交換樹脂的碎片等也被去除。如此獲得的超純水被供給至使用點。 [0006] 藉由紫外線氧化裝置中的由紫外線照射所產生的氧化處理,水中的有機物(TOC成分)被分解使有機酸及碳酸發生。此紫外線氧化裝置中的TOC成分的氧化分解機構,是將水氧化分解並生成OH自由基,藉由此OH自由基將TOC成分氧化分解,紫外線照射量是可以將水中的TOC充分地氧化分解地過剩照射。 [0007] 如此紫外線照射量多的情況,由水的分解生成的OH自由基因為成為過剩,所以多餘的OH自由基是藉由會合而生成過氧化氫。生成的過氧化氫,是與後段的混床式離子交換裝置的陰離子交換樹脂接觸並分解,此時,會使離子交換樹脂劣化。隨著此分解,溶解氧也增加。且,由離子交換樹脂的分解而重新生成離子交換樹脂衍生的TOC成分,所獲得的超純水的水質會下降。且,在混床式離子交換裝置通水後也殘留的過氧化氫,會使混床式離子交換裝置的後段的脫氣裝置和UF膜劣化。 [0008] 在專利文獻1中,超純水中的過氧化氫去除方法,是將從超純水製造裝置的紫外線氧化處理裝置被排出的包含過氧化氫的被處理水,與將白金族的金屬奈米溶膠粒子載持在陰離子交換樹脂載體的過氧化氫分解觸媒接觸,將被處理水中的過氧化氫分解至1ppb以下的方法。 [0009] 在專利文獻2中,為了白金系觸媒的劣化抑制,將被處理水由紫外線氧化裝置紫外線氧化處理之後,使用白金系觸媒進行過氧化氫去除處理的純水的製造方法,將朝該紫外線氧化裝置的給水的TOC成為5ppb以下。 [0010] [專利文獻1]日本特開2007-185587號公報 [專利文獻2]日本特開2015-93226號公報 [0011] 如上述,Pt所代表的白金族觸媒,以往是活用在氧化性物質的分解等。在超純水製造系統中,在將在水中包含微量的有機物的分解為目的紫外線氧化過程中,作為副生成物發生的過氧化氫的去除是成為近年來的課題,而進行由將Pt奈米溶膠載持的離子交換樹脂和Pd載持樹脂等所產生的過氧化氫分解處理。 [0012] 藉由此過氧化氫分解處理,雖可以使被處理水中的過氧化氫濃度減少至低於目標濃度(例如1ppb),但是伴隨長時間的使用,觸媒的性能會漸漸地下降。[0002] Ultra-pure water for cleaning semiconductors and electronic materials is made of raw water (Ultra-pure water) by ultra-pure water production equipment consisting of a pretreatment device, a primary pure water production device, and a secondary pure water production device (sub-system). Industrial water, municipal water, well water, etc.). [0003] In a pretreatment device formed by an agglutination, pressure floating (precipitation), filtration (membrane filtration) device, and the like, removal of suspended substances and sol substances in raw water is performed. In addition, polymer organic substances, hydrophobic organic substances, etc. can be removed in this process. [0004] In a primary pure water production apparatus including a reverse osmosis membrane separation device, a degassing device, and an ion exchange device (such as a mixed bed type or a four-bed five-tower type), ions and organic components in raw water are removed. In the reverse osmosis membrane separation device, salts are removed, and ionic and sol-based TOC are removed. The ion exchange device removes salts and removes TOC components adsorbed or ion-exchanged by an ion-exchange resin. The degassing device removes inorganic carbon (IC) and dissolved oxygen. [0005] The primary pure water from the primary pure water manufacturing device is processed in a sub-system by an ultraviolet (UV) irradiation device, an ion exchange device, and an external filtration (UF) membrane separation device, so that ultrapure water is manufactured. In a UV oxidation apparatus, by UV irradiation by a UV 185nm lamp will be an organic acid TOC, CO 2 is further decomposed. The organic matter and CO 2 generated by the decomposition are removed by an ion exchange device (usually a mixed-bed ion exchange device) in the subsequent stage. In the UF membrane separation device, fine particles are removed, and fragments of the ion exchange resin flowing out of the ion exchange device are also removed. The ultrapure water thus obtained is supplied to the point of use. [0006] By an oxidation treatment by ultraviolet irradiation in an ultraviolet oxidizing device, organic substances (TOC components) in water are decomposed to generate organic acids and carbonic acid. The oxidative decomposition mechanism of the TOC component in this ultraviolet oxidizing device is to oxidize and decompose water to generate OH radicals, thereby oxidizing and decomposing the TOC components by the OH radicals, and the amount of ultraviolet radiation can fully oxidize and decompose TOC in water Excessive exposure. [0007] In such a case where there is a large amount of ultraviolet radiation, since OH radicals generated by the decomposition of water become excessive, the excess OH radicals are combined to generate hydrogen peroxide. The generated hydrogen peroxide is in contact with the anion exchange resin of the mixed-bed ion exchange device in the subsequent stage and decomposes, and at this time, the ion exchange resin is deteriorated. With this decomposition, dissolved oxygen also increases. In addition, the TOC component derived from the ion exchange resin is regenerated by the decomposition of the ion exchange resin, and the quality of the ultrapure water obtained is degraded. In addition, the hydrogen peroxide remaining in the mixed-bed ion exchange device after passing water may deteriorate the degassing device and the UF membrane in the later stage of the mixed-bed ion exchange device. [0008] In Patent Document 1, a method for removing hydrogen peroxide in ultrapure water is to treat water containing hydrogen peroxide discharged from an ultraviolet oxidation treatment device of an ultrapure water production device, and A method in which metal nanosol particles are supported on an anion exchange resin carrier by a hydrogen peroxide decomposition catalyst, and the hydrogen peroxide in the treated water is decomposed to 1 ppb or less. [0009] In Patent Document 2, in order to suppress degradation of a platinum-based catalyst, a method for producing pure water in which treated water is subjected to ultraviolet oxidation treatment by an ultraviolet oxidation device and then subjected to hydrogen peroxide removal treatment using a platinum-based catalyst is described. The TOC of the feed water to the ultraviolet oxidizer is 5 ppb or less. [0010] [Patent Document 1] Japanese Patent Laid-Open No. 2007-185587 [Patent Document 2] Japanese Patent Laid-Open No. 2015-93226 [0011] As described above, the platinum catalyst represented by Pt has been conventionally used for oxidizing Decomposition of matter, etc. In the ultrapure water production system, the removal of hydrogen peroxide generated as a by-product in the ultraviolet oxidation process for the purpose of decomposing trace amounts of organic matter in water has become a problem in recent years. Decomposition treatment of hydrogen peroxide generated by sol-supported ion exchange resin, Pd-supported resin, and the like. [0012] Through this hydrogen peroxide decomposition treatment, although the hydrogen peroxide concentration in the water to be treated can be reduced below a target concentration (for example, 1 ppb), the performance of the catalyst gradually decreases with long-term use.
[0013] 本發明的目的是提供一種過氧化氫去除方法及裝置,可抑制白金系觸媒的性能下降,或是使回復,可以長期保持具有充分的觸媒活性的狀態。 [0014] 一般,藉由將流入白金系觸媒裝置的被處理水中的有機物濃度下降,來抑制白金系觸媒的性能下降,但是本發明人是為了進一步抑制性能下降而專心重疊研究的結果而發現,白金系觸媒的性能下降,觸媒表面的氧化也是一因,藉由抑制此觸媒表面的氧化,就可抑制白金系觸媒的性能下降。 [0015] 本發明,是依據這種知識而完成者。 [0016] 本發明的過氧化氫去除方法,是朝具有被並列設置的白金系觸媒充填容器的過氧化氫去除裝置將含過氧化氫水通水將過氧化氫去除的過氧化氫去除方法,進行將含過氧化氫水朝一部分的容器的通水規定期間停止的過氧化氫去除性能回復操作。 [0017] 在本發明的一態樣中,在前述規定時間,朝前述容器供給氮氣體等的非氧化性氣體。 [0018] 在本發明的一態樣中,在前述規定時間,從前述容器將觸媒取出再充填。 [0019] 在本發明的一態樣中,在前述規定時間,朝前述容器將氫溶解水通水。 [0020] 在本發明的一態樣中,前述過氧化氫去除裝置是被設置在超純水製造裝置,在前述規定時間,使朝前述一部分以外的白金系觸媒充填容器的通水量增加。 [0021] 本發明的過氧化氫去除裝置,是具備:被並列設置的白金系觸媒充填容器、及朝各容器將含過氧化氫水通水的含過氧化氫水通水手段、及朝各容器供給非氧化性氣體或是氫溶解水的供給手段、及將朝各容器的含過氧化氫水通水及非氧化性氣體或是氫溶解水供給切換的切換手段。 [發明的效果] [0022] 觸媒,原本不是其本身變化而是降低任何的化學性反應的障壁來促進進行的功能,但是藉由長期被曝在氧化條件下,表面會氧化,其會引起性能下降。 [0023] 白金系觸媒,是強力氧化的話,會成為不可逆的氧化物,但是在可逆的表面氧化的階段中,藉由持續地從氧化狀態開放而回復至原條性能。在本發明中,藉由通水停止而將白金系觸媒持續從氧化狀態開放,使觸媒的性能回復。在此通水停止期間將N2 氣體通氣,且將白金系觸媒從容器取出再充填,且在通水停止後,藉由將氫溶解水通水,使過氧化氫分解性能進一步有效地回復。 [0024] 觸媒劣化的原因,是除了由白金族觸媒本身的表面氧化所產生的變質以外,也有由被包含於被處理水中的有機物等的不純物所產生的污染。且,也有基材也就是載體(例如離子交換樹脂)本身的劣化。因此,被處理水中的不純物減少,且過氧化氫濃度是比較高的情況時,因為氧化是成為性能下降的主原因,所以本發明是特別有效。 [0025] 依據本發明的話,不需要將白金系觸媒交換成新品,可以將白金系觸媒的有效期間延長。 [0026] 將白金系觸媒充填容器複數個並列設置,將性能回復處理在一部分的容器實施期間,藉由依序反覆提高朝其他的容器的通水流量的通水切換操作,就可以將所期的處理水質及水量一邊維持一邊長期進行過氧化氫分解處理。[0013] An object of the present invention is to provide a method and a device for removing hydrogen peroxide, which can suppress the degradation of the performance of a platinum-based catalyst, or restore it, and can maintain a state with sufficient catalyst activity for a long time. [0014] Generally, the decrease in the performance of platinum-based catalysts is suppressed by reducing the concentration of organic substances flowing into the treated water of the platinum-based catalyst device. However, the inventors focused on the results of overlapping studies to further suppress the performance degradation. It was found that the performance of the platinum-based catalyst is reduced, and the oxidation of the catalyst surface is also a cause. By suppressing the oxidation of the catalyst surface, the performance of the platinum-based catalyst can be suppressed. [0015] The present invention has been completed based on such knowledge. [0016] The method for removing hydrogen peroxide according to the present invention is a method for removing hydrogen peroxide by passing hydrogen peroxide-containing water through water to a hydrogen peroxide removal device having a platinum catalyst filling container arranged in parallel. Then, the operation of restoring hydrogen peroxide removal performance to stop the passage of hydrogen peroxide-containing water toward a part of the container for a predetermined period of time is performed. [0017] In one aspect of the present invention, a non-oxidizing gas such as a nitrogen gas is supplied to the container at the predetermined time. [0018] In one aspect of the present invention, the catalyst is removed from the container and refilled at the predetermined time. [0019] In one aspect of the present invention, hydrogen-dissolved water is passed through the container at the predetermined time. [0020] In one aspect of the present invention, the hydrogen peroxide removing device is installed in an ultrapure water producing device, and increases a water flow amount to a platinum-based catalyst filling container other than the part at the predetermined time. [0021] A hydrogen peroxide removing device of the present invention includes a platinum catalyst filling container arranged in parallel, a hydrogen peroxide-containing water passing means for passing hydrogen peroxide-containing water to each container, and a Supply means for supplying non-oxidizing gas or hydrogen-dissolved water to each container, and switching means for switching supply of hydrogen peroxide-containing water and non-oxidizing gas or hydrogen-dissolved water to each container. [Effect of the invention] [0022] The catalyst is not a change in itself, but a barrier to reduce any chemical reaction to promote the function, but by long-term exposure to oxidation conditions, the surface will oxidize, which will cause performance decline. [0023] Platinum-based catalysts are irreversible oxides if they are strongly oxidized, but in the stage of reversible surface oxidation, they return to their original properties by continuously opening from the oxidized state. In the present invention, the platinum-based catalyst is continuously opened from the oxidized state by stopping the water flow to restore the performance of the catalyst. During this stoppage of water flow, aerate N 2 gas, and remove the platinum catalyst from the container and fill it. After the stoppage of water flow, hydrogen peroxide dissolves water to pass through the water to further restore the hydrogen peroxide decomposition performance. . [0024] The cause of the catalyst deterioration is contamination caused by impurities such as organic substances contained in the water to be treated, in addition to the deterioration caused by the surface oxidation of the platinum group catalyst itself. In addition, there is also degradation of the substrate, that is, the carrier (for example, an ion exchange resin) itself. Therefore, when the impurities in the water to be treated are reduced and the hydrogen peroxide concentration is relatively high, the present invention is particularly effective because oxidation is the main cause of performance degradation. [0025] According to the present invention, there is no need to exchange platinum catalysts for new products, and the validity period of platinum catalysts can be extended. [0026] A plurality of platinum-type catalyst filling containers are arranged in parallel, and performance recovery processing is performed during a part of the container implementation. By sequentially increasing the water flow switching operation to other containers, the desired water flow can be changed. The long-term hydrogen peroxide decomposition treatment is performed while maintaining the quality and quantity of the treated water.
[0028] 以下,對於本發明進一步詳細說明。 [0029] 本發明的過氧化氫去除方法及裝置,是使用在超純水製造過程最佳。在超純水製造過程中,如前述,來自一次純水製造裝置的一次純水是由副系統被處理使超純水被製造。在副系統中,將一次純水由紫外線氧化裝置處理之後,由具有白金系觸媒的過氧化氫去除裝置進行過氧化氫去除處理,接著朝非再生離子交換裝置、膜式脫氣裝置、UF膜裝置通水。 [0030] TOC成分是藉由紫外線氧化裝置中的紫外線氧化處理被氧化分解,生成有機酸及碳酸,並且發生過氧化氫。在本發明中,將來自紫外線氧化裝置的流出水朝過氧化氫去除裝置通水將過氧化氫去除。此過氧化氫去除裝置,是採用將白金系觸媒充填在容器者。白金系觸媒,是白金系金屬的溶膠粒子,特別是將奈米溶膠粒子載持在載體者較佳。 [0031] 白金系金屬,可以舉例釕、銠、鈀、鋨、銥及白金。這些的白金族金屬,是可以將1種單獨使用,將2種以上組合使用也可以,作為2種以上的合金使用也可以,或是不將天然產出的混合物的精製品分離成單體地使用也可以。在這些之中,白金、鈀、白金/鈀合金的單獨或是這些的2種以上的混合物,因為觸媒活性強所以可以特別最佳使用。 [0032] 將白金系金屬的奈米溶膠粒子製造的方法沒有特別限制,例如,可以舉例金屬鹽還原反應法、燃燒法等。在這些之中,金屬鹽還原反應法,是製造容易,因為可以獲得穩定的品質的金屬奈米溶膠粒子所以可以最佳使用。 [0033] 白金系金屬的奈米溶膠粒子的平均粒子徑較佳是1~50nm,更佳是1.2~20nm,進一步較佳是1.4~5nm。此粒徑是從電子顯微鏡攝像獲得的值。 [0034] 將白金系金屬奈米溶膠粒子載持的載體,是例如,可以舉例氧化鎂、二氧化鈦、氧化鋁、二氧化矽-氧化鋁、氧化鋯、活性碳、沸石、矽藻土土、離子交換樹脂等。在這些之中,陰離子交換樹脂可以特別最佳使用。白金系金屬奈米溶膠粒子,是具有雙電層,因為負地帶電,所以穩定地被載持在陰離子交換樹脂而不易剝離。被載持在陰離子交換樹脂的白金系金屬奈米溶膠粒子,是顯示對於過氧化氫的分解去除強的觸媒活性。陰離子交換樹脂的交換基,是OH形較佳。OH形陰離子交換樹脂,是樹脂表面成為鹼性,促進過氧化氫的分解。 [0035] 白金系金屬奈米溶膠粒子朝陰離子交換樹脂的載持量,是0.01~0.2重量%較佳,0.04~0.1重量%更佳。 [0036] 水中的過氧化氫,是藉由將含過氧化氫水接觸將白金系金屬奈米溶膠粒子載持在載體的過氧化氫分解觸媒,藉由2H2
O2
→2H2
O+O2
的反應而被分解。 [0037] 朝含過氧化氫水的白金系觸媒充填容器的通水速度,是空間速度SV100~2,000h-1
較佳,300~1,500h-1
更佳。白金系觸媒,因為過氧化氫的分解速度是非常地快,所以SV即使是100h-1
以上,過氧化氫也可充分地被分解。但是,SV是超過2,000h-1
的話,通水的壓力損失過大,並且過氧化氫的分解去除有可能成為不充分。 [0038] 參照第1圖及第2圖說明本發明的過氧化氫去除方法及裝置的具體例。 [0039] 在第1圖中,白金系觸媒被充填的圓柱21~25是複數條(在圖示中為5條)被並列設置。上述紫外線照射裝置流出水等的含過氧化氫水是從配管1透過閥11~15朝圓柱21~25被通水。來自圓柱21~25的流出水,是透過閥31~35及集合配管2被取出。 [0040] 由朝5條圓柱21~25並列通水的要領進行處理。在處理水劣化的徵兆被認定的時點,對於朝如第1圖(b)的1條圓柱(在第1圖(b)中為圓柱21)的通水,藉由將閥11、31關閉而停止,將暫時殘留的4條圓柱22~25的通水量各別增加25%來進行確保處理水量的並列運轉。 [0041] 對於將通水停止的圓柱21,藉由施加: (1)一定期間靜置。 (2)由N2
氣體等的非氧化性氣體將圓柱內的氣氛置換。 (3)將白金系觸媒一旦拔出,較佳是在超純水中浸漬規定時間(較佳是1日以上,特別是2~10日程度)保管之後,再充填。 (4)將氫溶解水通水。 以上其中任一或二以上的組合的處理使過氧化氫分解性能回復。 [0042] 其後,較佳是朝此圓柱21試驗地通水,確認處理水質是良好之後,將閥11、31打開將朝圓柱21的通水再開。其後,對於其他的圓柱22~25也同樣地依序進行性能回復操作,將性能返回至良好的狀態。 [0043] 對於5條圓柱21~25全部的回復處理完成之後,返回至原本的標準流量的5條並列通水。 [0044] 第2圖是顯示可取代閥11~15而設置三方閥41~45,可取代閥31~35而設置三方閥51~55,朝各圓柱21~25將N2
氣體或是氫溶解水藉由三方閥31~35、51~55的切換操作而可供給的過氧化氫去除裝置。 [0045] 在三方閥41~45的第3通口中,連接有從配管60分岐的配管61~65。三方閥51~55的第3通口,是透過分岐配管71~75與排出用配管70連接。從配管60將N2
氣體或是氫溶解水供給至圓柱21~25的其中任一,將其流出氣體或是氫溶解水從配管70排出。 [0046] 朝具備如第1、2圖並列的5條圓柱21~25的過氧化氫去除裝置的各圓柱21~25均等地使標準的SV由400/h通水的情況,1條是進入回復處理而成為4條並列通水(例如第1圖(b))的話,各圓柱的SV是增大至500/h。這對於處理水質維持的面不佳。但是,白金系樹脂的過氧化氫分解壽命(不施加回復處理的情況)只有數年,對於此,因為回復處理是1條最長為1週間程度,所以在各圓柱增加25%的負擔的話,最長4週間程度。在此,朝陸續地性能回復了的圓柱的通水因為是被再開,所以維持過氧化氫去除裝置整體處理水量(SV500/h)並不困難。 [0047] 在第1、2圖中將5條圓柱並列設置,但是將6條圓柱並列設置,將其中的1條依序停歇(性能回復操作),時常由5條圓柱通水運轉也可以。 [0048] 此情況時,由規定時間(規定的過氧化氫負荷)超過時將1條停止,將未同時使用的1條開始通水的要領,各容器皆整體的5/6的時間是通水,1/6的時間是停止的間歇運轉)依順旋轉的旋轉木馬輪式的運用,就可以充餘地運轉是。 [0049] 依據本發明人的實驗結果的話,認定以下的事。 (1)將被處理水朝白金系觸媒充填容器的通水在規定時間停止之後將通水再開的話,過氧化氫分解性能可回復。停止時間愈長,其回復程度愈高。 (2)在被處理水朝白金系觸媒充填容器的通水停止中加上藉由N2
氣體通氣從該容器內將O2
排除的操作的話,過氧化氫分解性能是比(1)更短時間回復。 (3)在被處理水朝白金系觸媒充填容器的通水停止中一旦將白金系觸媒從容器拔出,規定時間,在超純水中保管之後重新充填並通水再開的話,過氧化氫分解性能是比上述(1)及(2)更短時間回復。 (4)將被處理水朝白金系觸媒充填容器的通水停止之後,將氫溶解水通水的話,過氧化氫分解性能是比上述(1)~(3)更短時間回復。 [0050] 上述實施例是本發明的一例,本發明是上述以外的實施例也可以。例如圓柱不限定於5條。 [實施例] [0051] [參考例] 超純水製造裝置,是準備第3圖所示者。此超純水製造裝置81,是由前處理裝置82、一次純水製造裝置83、及二次純水製造裝置(副系統)84的3段的裝置所構成。在此超純水製造裝置81的前處理裝置82中,是被施加由原水W的過濾、凝集沈澱、精密過濾膜所產生的前處理。 [0052] 一次純水製造裝置83,是具有:前處理水W1的槽桶85、及逆滲透(RO)膜裝置86、及紫外線(UV)氧化裝置87、及再生型離子交換裝置(混床式或是4床5塔式等)88、及膜式脫氣裝置89。 [0053] 副系統84,是由:將由一次純水製造裝置83被製造的一次純水W2貯留的副槽桶91、及將從此副槽桶91透過無圖示的泵被配送的一次純水W2處理的紫外線氧化裝置92、及白金族金屬觸媒樹脂塔93、及膜式脫氣裝置94、及非再生型混床式離子交換裝置95、及作為膜過濾裝置的限外過濾(UF)膜96所構成。由限外過濾(UF)膜96將微粒子去除而作成超純水W3,將其供給至使用點97,將未使用的超純水朝副槽桶91還流。 [0054] 將平均粒子徑3.5nm的白金奈米溶膠粒子,由0.07重量%的載持量載持在強鹼性凝膠(膠狀物)型陰離子交換樹脂,調製了載持了白金族的金屬奈米粒子的陰離子交換樹脂作為白金族金屬觸媒樹脂。 [0055] 在第3圖所示的裝置構成的超純水製造裝置81中,使用上述的白金族金屬觸媒樹脂將白金族金屬觸媒樹脂塔93構成將超純水W3製造,測量了副系統84的白金族金屬觸媒樹脂塔93的入口水及出口水的過氧化氫濃度(初期)。將結果如表1所示。且,測量了將此超純水製造裝置81的運轉持續長時間(30日)之後的白金族金屬觸媒樹脂塔93的出口水的過氧化氫濃度(末期)。將結果配合表1顯示。 [0056] 為了測量過氧化氫濃度,在酚酞4.8mg、硫酸銅(無水)8mg及氫氧化鈉48mg添加硫酸鈉(無水)成為10g,調製了微量過氧化氫濃度定量用試藥。在試驗水10mL添加該試藥0.5g並溶解,在室溫10分鐘靜置之後,測量552nm中的吸光度,依據此測量值將過氧化氫濃度算出。 [0057] [表1]
[0070][0070]
W‧‧‧原水W‧‧‧ raw water
W1‧‧‧前處理水W1‧‧‧ pre-treated water
W2‧‧‧一次純水W2‧‧‧Pure water
W3‧‧‧超純水W3‧‧‧ ultra pure water
1‧‧‧配管1‧‧‧Piping
2‧‧‧集合配管2‧‧‧collection piping
11~15、31~35‧‧‧閥11 ~ 15, 31 ~ 35‧‧‧valve
21~25‧‧‧圓柱21 ~ 25‧‧‧Column
41~45、51~55‧‧‧三方閥41 ~ 45、51 ~ 55‧‧‧Three-way valve
61~65‧‧‧配管61 ~ 65‧‧‧Piping
70‧‧‧排出用配管70‧‧‧ discharge pipe
71~75‧‧‧分岐配管71 ~ 75‧‧‧ branch manifold
81‧‧‧超純水製造裝置81‧‧‧Ultra-pure water manufacturing equipment
82‧‧‧前處理裝置82‧‧‧Pre-treatment device
83‧‧‧一次純水製造裝置83‧‧‧Pure water manufacturing equipment
84‧‧‧副系統84‧‧‧ Subsystem
85‧‧‧槽桶85‧‧‧ tank
86‧‧‧膜裝置86‧‧‧ membrane device
87‧‧‧氧化裝置87‧‧‧oxidation device
89‧‧‧脫氣裝置89‧‧‧ degassing device
91‧‧‧副槽桶91‧‧‧ Deputy tank
92‧‧‧紫外線氧化裝置92‧‧‧ultraviolet oxidation device
93‧‧‧白金族金屬觸媒樹脂塔93‧‧‧Platinum metal catalyst resin tower
94‧‧‧脫氣裝置94‧‧‧ degassing device
95‧‧‧離子交換裝置95‧‧‧ ion exchange device
96‧‧‧限外過濾(UF)膜96‧‧‧External Filter (UF) Membrane
97‧‧‧使用點97‧‧‧points of use
[0027] [第1圖]本發明方法的說明圖。 [第2圖]本發明裝置的一例的說明圖。 [第3圖]超純水製造裝置的系統圖。[0027] [FIG. 1] An explanatory diagram of the method of the present invention. [Fig. 2] An explanatory diagram of an example of the device of the present invention.第 [Figure 3] System diagram of ultrapure water production equipment.
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| TW201930200A (en) | 2019-08-01 |
| CN111183118B (en) | 2021-10-22 |
| KR20200096485A (en) | 2020-08-12 |
| JP6451824B2 (en) | 2019-01-16 |
| KR102340160B1 (en) | 2021-12-15 |
| JP2018108577A (en) | 2018-07-12 |
| WO2019116653A1 (en) | 2019-06-20 |
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