JP2013215679A - Ultrapure water production apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an ultrapure water production apparatus capable of suppressing a fluctuation of use amount at a use point and fluctuation of a flow rate of ultrapure water to be produced while stably maintaining an extra-high water quality even during maintenance of each device.SOLUTION: An ultrapure water production apparatus sequentially includes a pretreatment system 11, a primary pure water system 12 and a secondary pure water system 13. In the ultrapure water production apparatus, the primary pure water system 12 comprises a plurality of lines each having a pure water system with the same configuration to which water is individually supplied from a water storage pit 2 storing treatment water of the pretreatment system 11 by a pump P and which includes an ion-exchange resin device 103 and a reverse osmosis membrane device 105 and is configured without the water storage pit interposed. While any one line of the lines is stopped, the other treatment lines can be operated.

Description

The present invention relates to an ultrapure water production apparatus that enables stable production of high-purity ultrapure water and facilitates operation management, and in particular, a large-scale ultrapure water such as 2,000 m ³ / day or more. The present invention relates to an ultrapure water production apparatus suitable for production of pure water.

  Conventionally, ultrapure water used in the manufacturing process of semiconductors and flat panel displays is obtained by sequentially treating raw water such as river water, well water, and industrial water in a pretreatment system, primary pure water system, and secondary pure water system. Manufactured.

In the pretreatment system, clarification of raw water using a filtration device, temperature adjustment of raw water using a heat exchanger, and the like are performed as necessary.
In the primary pure water system, in order to make the treated water treated in the pretreatment system high purity, an activated carbon adsorber, a deionizer using an ion exchange resin, etc., a reverse that removes ionic substances and particle components. Treatment by osmosis membrane device etc. is performed, and further, removal of carbon dioxide and oxygen dissolved in water by deaeration device, removal of organic substances in water by combination of ultraviolet irradiation device and ion exchange polisher, etc., if necessary Done.
In the secondary pure water system, treatment with an ion exchange polisher, an ultrafiltration device, or the like is performed in order to further increase the purity of the pure water treated in the primary pure water system.
The ultrapure water produced in this way is supplied to a use point (hereinafter also referred to as POU).
In addition, wastewater used at the point of use is collected and this collected water is used as raw water.

  Conventional ultrapure water production equipment efficiently flows the unit equipment according to the required conditions for the components and amount of raw water, the daily production of ultrapure water produced, safety management, operation management, cost, etc. It is designed to be arranged in series along. In addition, a method of increasing the continuous pot life of the ion exchange resin and reducing the amount of chemical used is proposed (Patent Documents 1 and 2).

In the primary pure water system, a deionization apparatus such as a regenerative ion exchange resin apparatus is often used, and such a deionization apparatus requires a regeneration process with a frequency of several days to one week. Become.
Even in a device that does not require regeneration treatment, a membrane module such as a reverse osmosis membrane device or an ultraviolet irradiation device requires replacement of a membrane module or a lamp with a frequency of, for example, several months to one year.

  Therefore, in a large-scale ultrapure water production apparatus, a plurality of deionization devices such as ion exchange resin devices, membrane treatment devices such as reverse osmosis membrane devices, and ultraviolet irradiation devices are installed in parallel and primary pure water A water storage pit (large-capacity underground water storage tank) for storing one or more intermediate treated water is installed at the required location of the water system line, and only the target equipment is stopped for regeneration and maintenance inspection. . Meanwhile, in the deionization device that does not change the treatment flow rate, the intermediate treatment water stored in the water storage pit (water storage tank) downstream of the target device is supplied to the subsequent stage to continue the production of ultrapure water. For a film processing apparatus in which a temporary increase is not a problem, a method of increasing the flow rate of the apparatus that is not stopped is employed.

In the secondary pure water system, various water treatment devices are arranged along the flow path on the downstream side of the primary pure water tank.
The ultrapure water that has not been used in the POU is returned to the primary pure water tank in the previous stage.
In the secondary pure water system, the treated ultrapure water is recirculated to the primary pure water tank so that the treatment flow rate is constant, and deterioration of water quality due to increase or decrease of the flow rate is suppressed.

In the primary pure water system, it is necessary to adjust the flow rate of the primary pure water produced according to the increase or decrease in the amount of ultrapure water used in the POU.
As a method of adjusting the flow rate of the produced primary pure water, a method of repeatedly operating and stopping the entire primary pure water system may be employed in a small-scale pure water production apparatus.
However, this method has a problem that it is difficult to improve water quality.
In addition, when the ultrapure water production apparatus is made large-scale, a large flow rate fluctuation at the time of operation / stopping gives a mechanical load (water hammer) to various apparatuses and piping, which may cause the apparatus to break down.

Therefore, in general, in a large-scale ultrapure water production apparatus, a pipe for returning the surplus treated water in any apparatus in the primary pure water system to the previous stage is provided, and the amount of ultrapure water used in the POU When the water content drops, a method is adopted in which the treated water is circulated to adjust the flow rate of the obtained primary pure water.
At this time, by introducing the circulated treated water into the water storage pit provided in the middle of the primary pure water system, the influence of the water hammer on each device can be suppressed.

  Although an attempt has been made to optimize the circulation line as well, from the viewpoint of power consumption and water use rate, it is common to circulate to the immediately preceding water storage pit or water storage tank with a short piping.

On the other hand, as the line width of the semiconductor to be manufactured becomes finer year by year, further high water quality has been strictly demanded. For example, as shown in Non-Patent Document 1, it is required to stably manufacture ultrapure water having an ultrahigh water quality.
However, in the conventional ultrapure water production apparatus as described above, it has become difficult to satisfy such requirements for high water quality.

In recent years, the substrate size has been increased from 200 mm wafers to 300 mm and 450 mm wafers for the purpose of mass production of semiconductor products and reduction of manufacturing costs, and as a result, the entire production line of products has been enlarged.
Since a large amount of ultrapure water is used in the manufacturing plant, the ultrapure water production apparatus is also becoming large-scale.
Therefore, a large water storage pit in which nitrogen gas is sealed in an upper space for temporarily storing treated water in the middle and a large number of devices and pipes is required, and a large site area is required. There is also a problem that operation management and maintenance management are complicated.

  When there is a change in the water level stored in the water storage pit, a large amount of nitrogen is used to seal the upper portion of the water storage pit. In a large-scale apparatus, there is a problem that the amount of use increases and the running cost increases.

JP 2009-240891 JP 2003-190947 A

"Semiconductor Technology Roadmap (ITRS: International Technology Roadmap for Semiconductors) 2010 Edition"

The present invention has been made to solve the above-mentioned problems, and it is an ultrapure water production apparatus that can stably produce ultra-high water quality even at the time of use point fluctuation and maintenance of each apparatus, and can produce at a constant flow rate. The purpose is to provide.
An object of this invention is to provide the ultrapure water manufacturing apparatus which can perform operation management and maintenance easily and can reduce manufacturing cost significantly.

The present inventors have intensively studied for the purpose of stable production of ultrapure water with higher water quality, and show a large-scale ultra-high scale treatment flow rate of 10,000 m ³ / day shown in FIG. 9 described later. In the pure water production apparatus, it is produced when the ultrapure water is circulated through the circulation line A and when the ultrapure water is circulated from the rear water storage pit to the front stage through the circulation line D (for the ultrafiltration device). The concentration of fine particles in ultrapure water (at the outlet) was measured. As a result, when the circulation line A which is the conventional reflux method was used, the water quality fluctuated as shown in FIG. On the other hand, when the circulation line D was used, it discovered that a fluctuation | variation was suppressed like FIG. The variation in water quality as shown in FIG. 7 was acceptable in the conventional small and medium-scale ultrapure water production apparatus.

In the large-scale ultrapure water production apparatus, the present inventors have found that the intermediate treated water is retained and circulated in the water storage pit in the primary pure water system, leading to deterioration of the terminal water quality. A device according to the present invention that enables the stable production of ultrapure water with ultrahigh water quality by knowing that changes in the flow path and fluctuations in the flow rate in the water system cause fluctuations in the quality of the ultrapure water produced. Was completed. In addition, in order to produce a large amount of ultrapure water with ultra high water quality, the treated water is circulated in the previous stage of the primary pure water system, and reprocessing is performed using both the reverse osmosis membrane device and the ion exchange resin device. In the past, it was found that the deterioration of water quality, which has been caused mainly by the fine particles and organic components (TOC) remaining at the ends, was prevented.
6 and 7, the fine particles were measured using an online particle counter.

  The inventors of the present invention configured a series by connecting ion exchange resin apparatuses and reverse osmosis membrane apparatuses that require maintenance and have greatly different operation cycles and methods in series without a water storage pit or water tank. The present invention has invented an apparatus that includes a plurality of such systems and that can operate other systems in a state where any one system is stopped. As a result of enabling operation without stopping the entire pure water system, fluctuations in the flow of pipes and changes in flow paths are minimized, and fluctuations in the quality of manufactured ultrapure water are greatly suppressed. Made possible.

  The ultrapure water production apparatus of the present invention is an ultrapure water production apparatus comprising a pretreatment system, a primary pure water system, and a secondary pure water system in this order, wherein the primary pure water system is the pretreatment system. It consists of a pure water system with the same configuration, including an ion exchange resin device and a reverse osmosis membrane device, with no intervening water pit, which is independently supplied by a pump from a water pit where the treated water is stored. It is a plurality of processing sequences, and another processing sequence can be operated in a state where an arbitrary processing sequence of the series is stopped.

More specifically, in the ultrapure water production apparatus of the present invention, each treatment series of the primary pure water system includes one or more membrane deaeration devices, ion exchange resin devices, and reverse osmosis membrane devices.
In the ultrapure water production apparatus of the present invention, the secondary pure water system includes the primary pure water system and one or more series of pure water systems connected via a water storage tank.
In the ultrapure water production apparatus of the present invention, the flow rate of the produced ultrapure water is 2,000 m ³ / day or more.
In the ultrapure water production apparatus of the present invention, each series of the primary pure water system further includes one or more devices selected from an ultraviolet irradiation device, a chelate resin device, and an activated carbon device.

In the ultrapure water production apparatus according to the present invention, the ion exchange resin device comprises a cation exchange resin device, an anion exchange resin device, a multi-layer ion exchange resin device, a mixed bed ion exchange resin device, and an electric regeneration type ion exchange. One or more devices selected from resin devices.
In the ultrapure water production apparatus of the present invention, each series of the primary pure water system includes a cation exchange resin device, a membrane deaeration device, an anion exchange resin device, and a reverse osmosis membrane device in this order.
In the ultrapure water production apparatus of the present invention, the secondary pure water system includes at least one device selected from an ultraviolet irradiation device, a membrane deaeration device, a polisher, and an ultrafiltration device.
The ultrapure water production apparatus of the present invention is characterized in that maintenance of the apparatuses in the stopped processing series is performed collectively.

The ultrapure water production apparatus of the present invention can stably produce high quality ultrapure water by suppressing fluctuations in the flow rate of the produced ultrapure water.
According to the ultrapure water production apparatus of the present invention, maintenance management can be simplified and production costs can be reduced.
In particular, even in the case of a large-scale ultrapure water production apparatus with a treatment flow rate of 2,000 m ³ / day or more, fluctuations in the flow rate of the produced ultrapure water are suppressed, and a specific resistance value of 18 MΩ · cm or more, 0 .The number of fine particles having a size of 05 μm or more is 200 pcs. / L or less and high-quality ultrapure water having a TOC concentration of 0.5 ppb or less can be stably produced, and maintenance management can be simplified and production costs can be greatly reduced.

It is a figure which shows typically one Embodiment of the ultrapure water manufacturing apparatus of this invention. It is a figure which shows typically one Embodiment of the ultrapure water manufacturing apparatus of this invention. It is a figure which shows typically one Embodiment of the ultrapure water manufacturing apparatus of this invention. 3 is a graph showing changes with time in the quality of ultrapure water obtained in Example 1 and Comparative Example 1. 3 is a graph showing changes with time in the quality of ultrapure water obtained in Example 1 and Comparative Example 1. It is a graph which shows the time-dependent change of the ultrapure water quality at the time of using the circulation line D in the conventional large-scale ultrapure water apparatus. It is a graph which shows the time-dependent change of the ultrapure water quality at the time of using the circulation line A in the conventional large-scale ultrapure water apparatus. It is a figure which shows typically the ultrapure water manufacturing apparatus used for the comparative example of this invention. It is a figure which shows the conventional large-scale ultrapure water apparatus typically. It is a figure which shows typically the piping for a regeneration process in the conventional large-scale ultrapure water manufacturing apparatus.

Hereinafter, the present invention will be described in detail with reference to the drawings. The present invention is not limited to the illustrated ultrapure water device. In FIG. 1 to FIG. 3 and FIG. 8 to FIG. 10, the English characters in each block represent the following meanings.
MF ... microfiltration device, HEX ... heat exchanger, AC ... activated carbon device, SC1, SC2 ... strongly acidic cation exchange resin device, MDG ... membrane degassing device, WA ... weakly basic anion exchange resin device, SA1, SA2 ... Strongly basic anion exchange resin device, RO ... Reverse osmosis membrane device, TOC-UV ... Ultraviolet irradiation device, MB ... Mixed bed type ion exchange resin device, ANP ... Oxidant removing resin device, UF ... Ultrafiltration device, Polisher ... Polisher, POU ... Use point, PIT ... Pit.

As an example of a conventional ultrapure water production apparatus, FIG. 9 shows an ultrapure water production apparatus 90 that produces ultrapure water at a treatment flow rate of 420 m ³ / hour, that is, 10,000 m ³ / day.

  In the apparatus shown in FIG. 9, the pretreatment system 91 selects a water storage pit (PIT) 93, a microfiltration (MF) apparatus, a sand filtration apparatus 901, a heat exchanger (not shown), etc. as appropriate and connects them by piping. Configured. The treated water treated by the pretreatment system 91 (hereinafter also referred to as pretreated water) is stored in the water storage pit 94.

  The primary pure water system includes a heat exchanger (HEX), an activated carbon tower device (AC) 902, a deionizer (SC, WA, SA, MB, etc.) 903, and a deaerator (MDG) after the water storage pit 94. 904, a reverse osmosis membrane device (RO) 905, an ultraviolet irradiation device (TOC-UV) 906, a prefilter (not shown), etc. are connected by piping with a pump or a valve as necessary. .

  The pretreated water is processed by a single pure water system and stored in a pure water tank 97.

  In the primary pure water system of the ultrapure water production apparatus 90 shown in FIG. 9, the activated carbon tower apparatus 902 has a granular or powdery activated carbon of 10,000 L in a container having an inner diameter of 3 to 4 m and a height of 2 to 3 mm. It is configured by connecting 5 to 7 activated carbon apparatus towers that are packed to a certain extent in parallel.

  An ion exchange resin apparatus 903 often used as a deionization apparatus is an ion exchange resin formed by filling various known ion exchange resins of about 6000 to 10,000 L in a container having an inner diameter of 2 to 3 m and a height of 2 to 3 mm. It is configured by connecting 4 to 5 towers in parallel.

Each ion exchange resin tower depends on the amount of impurities in the treated water, design conditions, operating conditions, etc.
Regeneration processing is required once every 2-3 days.

The deaeration device 904 uses a membrane deaeration device in which several tens of hollow fiber membrane modules are connected in parallel. In some cases, an apparatus provided with a plurality of vacuum deaeration towers filled with a filler such as terralet and having an inner diameter of 3 to 4 m and a height of 3 to 4 m is used.
The reverse osmosis membrane device 905 includes a plurality of known modules, each of which includes the same number of modules as 4 to 20 units.

  When the reverse osmosis membrane layer device 905 does not stop the apparatus from the start of operation to replacement and requires adjustment of the processing flow rate, a method of sequentially waiting one to two units among the units is adopted. The module replacement cycle is about six months to three years, depending on operating conditions.

  The ultraviolet irradiation device 906 decomposes live bacteria, bacteria, organic substances, etc. by irradiating with ultraviolet rays.

  The pre-filter is configured by connecting 5 to 7 bag filter modules inserted in a stainless (SUS304) container in parallel.

  The ion exchange resin device 903 and the reverse osmosis membrane device 905 are greatly different in maintenance cycle and method as described above. In order to stably maintain the flow rate and quality of the ultrapure water produced, it is essential to interpose large storage pits 95 and 96 or a storage tank having a buffer function between them.

  In order to adjust the flow rate of the supplied primary pure water, all water treatment devices in the primary pure water device are stopped all at once, and then restarted to discharge the treated water until the water quality becomes stable after the restart. Is required. In particular, in a membrane device, a significant flow rate fluctuation may cause a mechanical load on the membrane and cause the device to fail. In order to solve these problems, circulation line A, circulation line B, and circulation line C are installed as the primary pure water circulation system to maintain the water treatment equipment and change the amount of ultrapure water used in the POU. Sometimes at least one line was used to recirculate excess treated water to the inlet side of each water treatment device. Since the primary pure water has a high water quality above a certain level, it has been performed to return to the nearest water storage pit and water tank as much as possible to improve the efficiency of piping configuration and operation management.

  In the conventional large-scale apparatus illustrated in FIG. 9, the water storage pits 95 and 96 are mainly installed between the ion exchange resin apparatus 903 and the reverse osmosis membrane apparatus 905 to obtain a large amount of high-purity ultrapure water. It was essential.

  The secondary pure water system 92 is a system conventionally used for ultrapure water production.

  In the secondary pure water system, the ultraviolet irradiation device 907 is a scale having 4 to 5 ultraviolet irradiation towers. The polisher 908 has about 7 units of resin filled in a stainless steel (SUS316) vessel having an inner diameter of 1.5 to 2 m and a height of 1.5 to 2.5 m filled with about 3,000 to 5,000 L of resin. . The ultrafiltration device 910 is configured by connecting 60 to 70 hollow fiber membrane modules in parallel.

  In order to reduce the load of removing impurities on each device of the secondary pure water system 92 and extend the life, the treated water (primary pure water) in the primary pure water system is also required to have high water quality. There is a tendency.

In the apparatus shown in FIG. 9, in the secondary pure water system, ultrapure water is circulated using a pipe called a secondary system circle line 92A in order to prevent deterioration of the quality of the ultrapure water, so that the treated flow rate is always constant. Yes. The pure water tank 97 is for smoothly performing this circulation, and has a capacity of about 150 m ³ .

  The storage pits 95 and 96, the pure water tank 97 and each system of the primary pure water system and the secondary pure water system 92 are hermetically sealed and sealed with an inert gas. As the entire ultrapure water production apparatus and each apparatus become larger, the consumption of these inert gases becomes enormous. Furthermore, an increase in the number of maintenances that fluctuates the amount of water stored in the water storage pit increases the consumption of inert gas.

In the ultrapure water production apparatus shown in FIG. 9, for example, nitrogen gas is 0.7 MPa, 4,000 Nm ³ / day, sodium hydroxide is 11,100 kg / day, and hydrochloric acid is 3500 kg / day. In addition, a control system that links all processes, such as adjustment of the amount of water in the water storage pits 95 and 96 or the pure water tank 97, switching of devices and pumps, management of regeneration chemicals, etc., is also required.

FIG. 1 is a diagram schematically showing an ultrapure water production apparatus 10 according to an embodiment of the present invention.
The ultrapure water production apparatus 10 of the present embodiment includes a pretreatment system 11, a primary pure water system 12 connected to the rear stage of the pretreatment system 11 via the water storage pit 2, and a pure water in the rear stage of the primary pure water system 12. A secondary pure water system 13 connected via a water tank 3 is provided. Each system, the water storage pit, the water storage tank, and the pure water tank are connected to each other by piping through a pump P (partially omitted) that enables switching of the flow path and changing the flow rate as necessary. Yes.

The pretreatment system 11 is a system that performs turbidity and temperature adjustment of raw water, and is configured by selecting a microfiltration device, a sand filtration device, an activated carbon device, a heat exchanger, and the like as necessary.
The primary pure water system 12 is a system that removes ionic components and non-ionic components from the treated water in the pretreatment system to increase the purity, such as an activated carbon device, a membrane degassing device, an ion exchange resin device, an ultraviolet irradiation device, etc. Is selected and configured as necessary. In the primary pure water system, primary pure water having a specific resistance value of 10 MΩ · cm or more is produced.
The secondary pure water system 13 is also referred to as a subsystem, and is a system that removes a small amount of ionic components and fine particles in the primary pure water and further increases the purity, and includes an ultraviolet irradiation device, a non-regenerative polisher, and a membrane. A deaeration device, a peroxide decomposition resin device, an ultrafiltration device, and the like are selected and configured as necessary. In the secondary pure water system, ultrapure water having a specific resistance value of 18 MΩ · cm or more and a TOC concentration of 1 ppb or less is produced.

In addition, in this specification, for convenience, the size is expressed as a storage pit, a storage tank, or a pure water tank. However, the size and mode of the storage pit, the storage tank, and the pure water tank may be changed depending on conditions such as a processing flow rate. Can be determined.
In addition, the same code | symbol is attached | subjected to the apparatus which has the same function in each series.

  As raw water, river water used as industrial water, surface water such as lake water, city water, well water, drainage, and the like can be used.

  The pretreatment system 11 of this embodiment is the same as that of a conventionally well-known thing, The structure is not specifically limited, It can change suitably with the quality of raw | natural water.

  The series A of the primary pure water system 12 of the present embodiment is connected to the primary pure water line 1bA connected to the pretreatment tank 2 via a pump P whose flow path can be switched, and the ion exchange resin apparatus 103 and reverse osmosis. The membrane 105 is connected in series by a pipe without passing through a water storage pit or a water storage tank.

  The pump P is not particularly limited as long as it is capable of switching the series that passes water and switching the flow rate in each series. For example, as shown in FIG. 1, a pump P capable of switching the flow rate may be provided at the front stage of each series, and a pump capable of switching both the flow path and the flow rate before the stage of branching to each series. P may be provided.

  The primary deionized water system 12 has the same configuration as the series A, and is configured by connecting two or more series in parallel through the pumps P, each having the same water treatment apparatus as the series A arranged in the same manner. ing.

The primary pure water system of the present embodiment can operate other systems while stopping any one system.
When the variation of the introduction flow rate of the water to be treated to the ion exchange resin apparatus 103 in the other series when the one series is stopped, the quality of the treated water may be deteriorated. It is preferable to provide.
Each series is controlled by the pump P so as to switch the flow path. It is preferable that the second stage of the primary pure water system is provided with means (not shown) for preventing the backflow of treated water.

As the ion exchange resin device 103, an ion exchange resin device filled with various known ion exchange resins can be used. Examples of the ion exchange resin to be filled include strong acid or weak acid cation exchange resin, strong base or weak salt anion exchange resin, and chelate resin, and groups such as powder, granule, membrane, and fiber. A material is appropriately selected and used.
As the ion exchange resin device 103, a cation exchange resin and an anion exchange resin are packed in two layers in the same tower, and a mixed bed type ion exchange resin device (mixed bed type ion exchange resin device ( MB), an electric regeneration type ion exchange resin apparatus, or the like may be used.

As the chelate resin, those containing two or more electron donating elements such as N, S, O, and P as chelate-forming groups with metal ions and the like are used. Examples include iminodiacetic acid type, polyamine type, and glucamine type.
As the chelate resin device, the glucamine type is preferable because it can remove ionic substances such as boron.

  In the ion exchange resin apparatus 103, when the flow rate decreases, the TOC component may be eluted from the ion exchange resin, and when the flow rate increases, the deionization efficiency may decrease. It is preferable to do.

When the treatment flow rate is 2,000 m ³ / day or more as the ion exchange resin device 103, a chemical regeneration type ion exchange resin device may be used to improve the regeneration efficiency and the quality of the obtained ultrapure water. preferable.

The reverse osmosis membrane device 105 includes a pump (not shown) that can adjust the flow rate of the water to be treated in the previous stage. As the reverse osmosis membrane device 105, a known device having a module such as a polyamide system or a cellulose acetate system can be used, and the treated water recovery rate is 85 to 90% from the viewpoint of stability of treated water (permeate) water quality. And constant.
The permeate of the reverse osmosis membrane device 105 is further processed downstream. The concentrated water is returned to the raw water tank or the like by pipes and reprocessed, or reused as scrubber water as necessary.

The reverse osmosis membrane device 105 may include two or more reverse osmosis membrane modules connected in series in order to increase the treated water recovery rate.
You may adjust pH of to-be-processed water to 9.5 or more as needed just before the reverse osmosis membrane apparatus 105. FIG.

A conventionally known water treatment device such as a membrane deaeration device, an activated carbon device, or an ultraviolet irradiation device may be interposed in the primary pure water line 1bA.
As the water treatment apparatus, the water treatment apparatus constituting the above-described conventional primary pure water system can be used, and the number, function, scale, arrangement, etc. of each water treatment apparatus installed in the series A are POU. Can be optimized and configured according to the quality and flow rate of ultrapure water used in

  As the activated carbon tower apparatus, an activated carbon apparatus tower filled with granular or powdered activated carbon is suitable.

  As the ultraviolet irradiation apparatus, an apparatus that irradiates ultraviolet rays having a wavelength of about 185 nm or a wavelength of about 254 nm can be used.

  In the case of using a prefilter, it is preferably constituted by a bag filter module having a nominal pore diameter of 1 μm, for example.

  The primary pure water line 1bA preferably uses a pipe made of SUS, vinyl chloride or the like, and the inner diameter and length of the pipe can be appropriately designed and changed according to the flow rate and quality of the ultrapure water to be produced.

In this embodiment, the flow rate of ultrapure water to be produced is preferably from 2,000 m ³ / day or more, 10,000 m ³ / day or more is particularly preferable. When the flow rate of manufactured ultrapure water is within this range, the influence of fluctuations in the flow rate of manufactured ultrapure water can be suppressed, and high water quality can be stably maintained.

  Each series may be provided with a pipe connecting the series using a joint or a pump at an arbitrary position. Even when the subsequent apparatus is temporarily stopped due to a failure or the like, the operation of the ultrapure water production apparatus can be continued by using the pipe.

  In the primary pure water system 12 of the present embodiment, preferably, primary pure water having a specific resistance value of 15 MΩ · cm or more, more preferably 17 MΩ · cm or more is produced.

The secondary pure water system 13 of the present embodiment includes a heat exchanger, an ultraviolet irradiation device, a peroxide decomposition resin device, a membrane deaeration device, and a mixed bed ion exchange resin device from the upstream side of the secondary pure water line 1c. It includes at least one water treatment device of at least one of a polisher and an ultrafiltration device, and is selected and connected according to the required water quality in the POU. A conventionally well-known thing can be used for each apparatus.
As the ultraviolet irradiation device, an ultraviolet irradiation device having a wavelength of about 185 nm is preferably used.
By using an exchange-type water treatment device that does not regenerate as a mixed-bed ion exchange resin device, membrane deaeration device, and ultrafiltration device, contamination caused by chemicals for the treatment of reclaimed ultrapure water is suppressed. can do.

As a polisher, there are about 3,000 L of oxidant removal resin (trade name: ANP, manufactured by Nomura Micro Science Co., Ltd.), and the inner wall of the tower is lined with resin to remove ultra-trace ion components. What filled resin, for example (brand name: MBGP, Nomura Micro Science Co., Ltd. product) etc., is preferable.
As the ultrafiltration device, it is preferable to use a hollow fiber membrane module made of polysulfone.

In this embodiment, in order to prevent the quality of ultrapure water from deteriorating in the secondary pure water system 13, the secondary circle line 1d similar to the conventional one is used and the pure water tank 3 is installed and manufactured. Circulate ultrapure water.
In order to simplify the maintenance, the secondary pure water system 13 may be configured in the same manner as the primary pure water system 12 by connecting a plurality of series of devices arranged in series.
In the apparatus of the present embodiment, the specific resistance value of ultrapure water discharged from the secondary pure water system is preferably 18.2 MΩ · cm or more.

The apparatus of this embodiment exhibits its effect remarkably when the flow rate of the produced ultrapure water is 2,000 m ³ / day or more.

  In small- and medium-scale ultrapure water production apparatuses, it has been attempted to reuse recyclable chemicals. In the large-scale ultrapure water production apparatus exemplified in FIG. 9, piping for reusing the chemical for recycling is schematically shown in FIG. 10.

In large-scale ultrapure water production equipment, a large amount of chemicals for regeneration is used for regeneration of ion exchange resin equipment and the like. For this reason, it is conceivable to recycle a plurality of resin towers continuously by reusing chemicals for recycling, as is conventionally done in small and medium-scale ultra-pure water production apparatuses. However, in this case, it is necessary to simultaneously stop and regenerate a plurality of resin towers, but the actual regeneration cycle is not the same for each resin tower.
Furthermore, as shown in FIG. 10, in a large-scale ultrapure water production apparatus, a large number of valves, water storage tanks, and pumps are installed in various places, and piping becomes complicated.
Therefore, it has been difficult to realize a method for reusing the chemical for recycling.

By switching the pump P, the apparatus of the present embodiment can treat the water to be treated by passing water to another line in a state where water flow to any one line is stopped.
The devices in the stopped system can perform maintenance collectively. Maintenance may be performed at the maintenance timing of the water treatment apparatus having the highest frequency in the series. What is necessary is just to perform the water treatment apparatus less frequently than this suitably in a maintenance cycle.

  As a maintenance control method for each series, a conductivity meter or a resistivity meter is installed at the outlet of each series to measure conductivity, and when the conductivity exceeds a certain value, There are a method of performing reproduction processing by switching a series to be introduced, and a method of performing reproduction processing by switching a series every predetermined time by installing a timer.

  In a conventional large-scale ultrapure water production system, about 30,000 L each of hydrochloric acid solution and sodium hydroxide solution are used in one regeneration process, and the sodium hydroxide solution is heated to 40 ° C. with steam and used. Many operations are necessary. In the case of a mixed bed type ion exchange resin apparatus, a hydrochloric acid solution or a sodium hydroxide solution is used in the order of thousands to tens of thousands of liters. In the case of a mixed bed type ion exchange resin tower, a step of backwashing prior to the regeneration treatment, separating and regenerating the cation exchange resin and the anion exchange resin, and mixing after regeneration is also necessary.

  FIG. 2 shows piping for performing chemical regeneration treatment of the water treatment apparatus in each series. In the present embodiment, an apparatus that is regenerated with an acidic chemical is connected to the pure water tank 41 through a pipe 201 that introduces and discharges the chemical. An acidic solution tank 205 is installed and connected to the inlet side of the pipe 201 by a pipe 202 via a switchable pump (not shown). The acidic solution is supplied from the acidic solution tank 205 via a switchable pump (not shown) through the pipe 202 and is sucked from the pure water tank 41 by a switchable pump or a suction ejector (E1). Next pure water is supplied.

  In the regeneration treatment with acidic chemicals, a hydrochloric acid solution or the like mixed with primary pure water and diluted with each cation exchange resin device, specifically, a strong acid cation in FIG. The ion exchange resin device (SC2) 130, the strong acid cation exchange resin device (SC1) 122, and the like are collectively passed through the pipe 201 in this order.

The chelate resin device 126 is connected to the pipe 201c via the valve 207 and to the pipe 203c via the valve 208, and the pipe 201c or the pipe 203c can be switched by switching the valve 207 and the valve 208. The pipe 201c and the pipe 203c are connected to the pipe 201 and the pipe 203 by joints or the like, respectively.
The regeneration process of the chelate resin device 126 is performed by switching the valve 207 interposed in the pipe 201c and passing an acidic solution through the pipe. A chelate resin device 126 may be interposed in the middle of the pipe 201 via a valve 207. In this case, the regeneration process can be performed in a batch including the cation exchange resin described above.

  The apparatus to be treated with basic chemicals is connected to the pure water tank 41 by a pipe 203 for introducing and discharging chemicals through a switchable pump (not shown). A basic solution tank 206 is installed as a chemical storage tank, and is connected to the inlet side of the pipe 203 by a pipe 204 through a switchable pump. A basic solution is supplied from the pipe 204 by being sucked by a switchable pump or suction ejector (E2) from the basic solution tank 206, and primary pure water is supplied from the pipe 203 via the switchable pump from the pure water tank 41. Supplied.

In the regeneration treatment with a basic solution, a sodium hydroxide aqueous solution or the like mixed and diluted with primary pure water in the pipe 203 is heated to about 40 ° C. with steam, etc. Ion exchange resin apparatus, specifically, strong basic anion exchange resin apparatus (SA2) 129, strong basic anion exchange resin apparatus (SA1) 125, weak basic anion exchange resin apparatus (WA) 124 in FIG. In this order, the liquid is collectively passed through the pipe 203.
The regeneration process of the chelate resin device 126 is performed by switching the valve 208 interposed in the pipe 203c and passing a basic solution through the pipe.
A chelate resin device 126 may be interposed in the middle of the pipe 203 via a valve 208. In this case, the regeneration process can be performed in a batch including the anion exchange resin described above.

  As described above, in the ultrapure water production apparatus of the present embodiment, the apparatus that needs to be regenerated is aggregated in the series configured without the water storage pits in the primary pure water system, so that FIGS. Compared to the conventional ultrapure water production apparatus as exemplified, the chemicals for recycling can be reduced by 10 to 50% for batch regeneration, piping and pumps can be reduced, and the recycling of chemicals for recycling can be simplified.

In addition, by reducing the number of water storage pits in the primary pure water system, the amount of nitrogen used can be reduced by 20 to 40%, and as a result, the operating cost can be reduced by about 10 to 20%.
Also, if the flow of ultrapure water to be produced is a large-scale ultrapure water system with a scale of 10,000 m ³ / day, the space for one 500 m ³ storage pit, raw water volume 1,000 m ³ / day, waste water volume 1,200 m ³ / day, piping length, valves, joints, pumps, etc. and costs associated with consolidation can be reduced.

Subsequently, ultrapure water was produced using the apparatus of the present invention and a conventional ultrapure water production apparatus.
The devices and conditions used in the examples and comparative examples are as follows.

Raw water: Atsugi City tap water
Pretreatment system 11
Microfiltration device 111: Pressurized PVDF MF module UNA-620A, manufactured by Asahi Kasei Chemicals Corporation.
Heat exchanger 112: Plate heat exchanger, stainless steel, manufactured by Nisaka Manufacturing Co., Ltd.
Water storage tank 21: Capacity 1m ³ , made of polyethylene.

Primary pure water system 12
Activated carbon device 121: Nomura cartridge column NCC-200AC, manufactured by Nomura Micro Science Co., Ltd.
Strong acid cation exchange resin device 122: Duolite C255LFH, container inner diameter φ300 mm, resin amount 80 L, manufactured by Dow Chemical Japan Co., Ltd.
Membrane deaerator 123: Lixel X-40, manufactured by Polypore Corporation.
Weakly basic anion exchange resin device 124: Duolite A378LF, container inner diameter φ300 mm, resin amount 80 L, manufactured by Dow Chemical Japan Co., Ltd.

Strongly basic anion exchange resin apparatus 125: Duolite A113LF, container inner diameter φ300 mm, resin amount 80 L, manufactured by Dow Chemical Japan Co., Ltd.
Chelate resin device 126: CRBT-03, container inner diameter φ300 mm, resin amount 50 L, manufactured by Mitsubishi Chemical Corporation.
Reverse osmosis membrane device 127: Membrane membrane module TMG20-370, manufactured by Toray Industries, Inc.
Ultraviolet irradiation device 128: SUV-ST, manufactured by Nippon Photo Science Co., Ltd.
Strongly basic anion exchange resin device 129: Duolite AGP, container inner diameter φ200 mm, resin amount 32 L, manufactured by Dow Chemical Japan Co., Ltd.
Water storage tank 31: capacity 5m ³ , made of polyethylene.
Water storage tank 51: 5m ³ capacity, made of polyethylene.
Strong acid cation exchange resin device 130: Duolite CGP, container inner diameter φ200 mm, resin amount 32 L, manufactured by Dow Chemical Japan Co., Ltd.
Piping (primary pure water line) 1b: made of hard polyvinyl chloride, inner diameter φ41.6 mm.

Mixed bed type ion exchange resin device 131: Nomura cartridge column NCC-200M, manufactured by Nomura Micro Science Co., Ltd.
Tank (pure water tank) 41: capacity 10 m ³ , glass fiber reinforced plastic, nitrogen filling.
Secondary pure water system 13
Heat exchanger (HEX) 132: plate type heat exchanger, made of titanium, manufactured by Nisaka Manufacturing Co., Ltd.
Ultraviolet irradiation device 133: SUV-ST, manufactured by Nippon Photo Science Co., Ltd.
Peroxide decomposition resin device 134: NCC-200M (ANP), manufactured by Nomura Micro Science Co., Ltd.
Membrane deaerator 135: Lixel X-40, manufactured by Polypore Corporation.
Mixed bed type ion exchange resin device 136: a container lined with polytetrafluoroethylene, filled with 210 L of MBSP in an inner diameter of 400 mm, manufactured by Nomura Micro Science Co., Ltd.
Ultrafiltration device 137: OLT-6036HA, manufactured by Asahi Kasei Chemicals Corporation.

  Piping 1c (piping downstream from the water outlet of the mixed bed type ion exchange resin device 131): inner diameter φ75 mm, made of polyvinylidene fluoride (PVDF).

Regeneration treatment hydrochloric acid container: 35 wt% hydrochloric acid (Asahi Glass Co., Ltd., industrial grade).
Sodium hydroxide container: 25 wt% sodium hydroxide (Asahi Glass Co., Ltd., industrial grade).
Analytical instrument TOC analyzer: A-1000XP, manufactured by Anatel.
Dissolved oxygen meter: MOCA-3600, manufactured by Orbis Fair.
Electric resistivity meter: specific resistance monitor.
Particle counter: Online particle counter (UDI-50, manufactured by PMS).
Silica: atomic absorption photometer.
Boron: Inductively coupled plasma mass spectrometer.
Various metals (Li, Na, K, Zn, Fe, Cu, Ca, Ni, Mg, Mn, Al,
Cr, Co, Ti, Mo, Ba, Pb): Inductively coupled plasma mass spectrometer.
Various ions (Br ⁻ , F ⁻ , NO ₃ ⁻ , Cl ⁻ , NO ₂ ⁻ , PO ₄ ³⁻ , SO ₄ ²⁻ , NH ₄ ⁺ )
: Ion chromatography device.
Hydrogen peroxide: peroxide monitor (NOXIA-L, manufactured by Nomura Micro Science).

Example 1
Ultrapure water was produced using the apparatus shown in FIG.

The ultrapure water production apparatus 30 used in the first embodiment includes a pretreatment system 11 in which a microfiltration device 111 and a heat exchanger 112 are connected in this order, and a water storage tank 21 at the rear stage of the pretreatment system 11. In the water storage tank 21, the series 12A and the series 12B of the primary pure water system are respectively connected to the primary pure water lines 1bA and 1bB via the pumps P1 and P3 capable of switching the flow path and changing the flow rate in the previous stage, respectively. Has been. Series 12A is activated carbon device 121A, strongly acidic cation exchange resin device 122A, membrane degassing device 123A, weakly basic anion exchange resin device 124A, and strongly basic anion exchange from the upstream side of primary pure water line 1bA. A resin device 125A, a chelate resin device 126A, a reverse osmosis membrane device 127A, an ultraviolet irradiation device 128A, a strongly basic anion exchange resin device 129A, and a strongly acidic cation exchange resin device 130A are connected in series by a pipe in this order. Has been. A water storage tank 31 is connected downstream of the strongly acidic cation exchange resin apparatus 130A, and then a mixed bed ion exchange resin apparatus 131 and a pure water tank 41 are connected in this order.
Pumps P2, P4, and P5 capable of adjusting the flow rate are interposed in the upstream stage of the reverse osmosis membrane apparatus 127A and the downstream stage of the mixed bed type ion exchange resin apparatus 131, respectively.
The series 12B is configured by connecting devices similar to the series 12A in series in the same order.

  Downstream of the pure water tank 41, as a secondary pure water system 13, a heat exchanger 132, an ultraviolet irradiation device 133, peroxide decomposition is provided on a pipe 1 c via a pump P 6 capable of adjusting the flow rate of water to be treated. A resin device 134, a membrane deaeration device 135, a mixed bed ion exchange resin device 136, and an ultrafiltration device 137 are connected in series in this order and connected to the POU. Between the POU and the pure water tank 41, a secondary system circle line 1d is constituted by piping.

[Production of pretreated water]
The raw water was introduced into the microfiltration device 111 and then passed through the heat exchanger 112. The temperature of the raw water discharged from the heat exchanger 112 was 25 ° C. This pretreated water was stored in the water storage tank 21.

[Production of primary pure water]
As the primary pure water system, only series A was used in the ultrapure water production apparatus 30 shown in FIG.
Pretreated water was introduced from the water storage tank 21 through the pump P1 to the activated carbon apparatus 121A of the series 12A at a flow rate of 2.1 m ³ / hour and processed. In the reverse osmosis membrane device 127, the flow rate of the treated water was 2.1 m ³ / hour, and the treated water recovery rate was 90%.

  The specific resistance value of treated water (treated water 1) discharged from the strongly acidic cation exchange resin device 130 was measured on the outlet side of the water storage tank 31. The results are shown in Table 1.

The treated water stored in the water storage tank 31 was introduced into the mixed bed type ion exchange resin device 131 through the pump P5 at a flow rate of 1.9 m ³ / hour. In this embodiment, a mixed bed type ion exchange resin device 131 is installed at the rear stage of the water storage tank 31. As shown in Table 1 described later, since the treated water 1 has high water quality, the mixed bed type ion exchange resin device 131 may be non-regenerative. Even in the case of the regenerative type, unlike the ion exchange resin apparatus in the previous stage, the regeneration frequency can be extended to about one month to half a year.

  The treated water (primary pure water) of the mixed bed type ion exchange resin apparatus 131 in this example was introduced into the pure water tank 41.

[Production of secondary pure water]
Subsequently, the primary pure water was introduced into the secondary pure water system 13 for processing. In the heat exchanger 132, the temperature of the discharged treated water was 25 ° C. In the ultrafiltration device 137, the treated water recovery rate was 95%.
The flow rate of the produced ultrapure water was 1.8 m ³ / hour.
The ultrapure water thus obtained was designated as ultrapure water 1.

  About the ultrapure water 1 obtained in Example 1, water quality was measured with said analytical instrument and monitor. The results are shown in Table 1.

From Table 1, it can be seen that the treated water 1 has a specific resistance value of 15 to 17 MΩ · cm, and obtains high water quality required in the manufacturing process of the most advanced semiconductors and flat panels. General primary pure water (pure water) has a specific resistance value of 10 MΩ · cm or more.
Moreover, since the treated water 1 has high water quality, the load of the secondary pure water system can be reduced, and the number and size of each device can be reduced.

Example 2
In the apparatus shown in FIG. 3, series A and series B were used to produce ultrapure water.
First, the pumps P1 and P3 were switched so that the pretreatment water was not passed through the series B and processed using the series A. The devices in the series A and B used those which were reproduced in advance.
The flow rate of the produced ultrapure water (at the outlet of the ultrafiltration device 137) was 1.9 m ³ / hour.

  From the quality of water to be treated, the flow rate, and the amount of resin, it is estimated that sodium ions leak from the strongly acidic cation exchange resin device 122 after 24 hours from the start of water passage after regeneration treatment. Each line stopped the water flow to that line every 24 hours and simultaneously switched the pumps P1 and P3 to start water flow to the other line. While water was passed through one line, the regeneration process was performed on the devices in the other line using the piping shown in FIG. At this time, the following amount of the regenerative chemical is injected into the pipe 201 and the pipe 203 using a pump capable of feeding, and the regenerative chemical is mixed and diluted by interposing a line mixer in the pipe 201 and the pipe 203. The liquid was passed through.

In each regeneration treatment cycle, the hydrochloric acid solution passed for regeneration of the strong acid cation exchange resin device 130 and the strong acid cation exchange resin device 122 had a concentration of 5 wt%, a flow rate of 2.9 L / min, and a total amount of 160 L. .
The hydrochloric acid solution passed for the regeneration of the chelate resin device 126 had a concentration of 5 wt%, a flow rate of 1.75 L / min, and a total amount of 70 L.
The sodium hydroxide solution that was passed through for the regeneration of the strongly basic anion exchange resin device 129, the strongly basic anion exchange resin device 129, the chelate resin device 126, and the weakly basic anion exchange resin device 124 had a temperature of 40. The temperature was 5 ° C., the flow rate was 3.5 L / min, and the total amount was 120 L.

The series A and the series B were switched at the above timing, and ultrapure water production was performed for 168 hours while performing the regeneration process.
The change over time of the quality of the obtained ultrapure water is shown in FIG. 4 for the number of fine particles and in FIG. 5 for the TOC concentration.

Comparative Example 1
The apparatus shown in FIG. 8 was used. In the apparatus in FIG. 3, the activated carbon device 121 to the chelate resin device 126 and the reverse osmosis membrane device 127 to the strong acid cation exchange resin device 130 are each made up of a small series, and each small series is made up of two series in parallel. In addition, pumps P7 to P10 capable of switching the flow path and changing the flow rate are interposed in the previous stage of each small series. A water storage tank 51 similar to the water storage tank 31 is provided between the chelate resin device 126 and the pumps P8 and P10.
Others are the same as those of the apparatus shown in FIG.
The introduction flow rate of the water to be treated into the activated carbon device 121 was 2.1 m ³ / hour, which is the same as in Example 1.
Further, ultrapure water production was performed in the same manner as in Example 1 except that the switching of each small series and the regeneration process were performed as follows.
Ultrapure water production was performed by switching the pumps P7 to P10 so as to pass water to one of the small series and stop water flow to the other. The pumps P7 and P9 were switched every 24 hours, the introduction of the water to be treated into the small series that had been watered was stopped, and the water supply to the other small series was started at the same time. In addition, a specific resistance meter is installed at the outlet of the strongly acidic cation exchange resin device 130, and when the specific resistance value falls below 10 MΩ · cm, the pumps P8 and P10 are switched to the small series that has been passing water. The introduction of water to be treated was stopped, and water flow to the other small series was started at the same time.
While the water flowed to one of the small lines, the regeneration processing of the device in the other small line was performed.
Thus, ultrapure water production was performed for 168 hours.
The flow rate of the produced ultrapure water was 1.9 m ³ / hour.
The time course of the obtained ultrapure water quality is shown in FIG. 4 for the number of fine particles and in FIG. 5 for the TOC concentration. 4 and 5, the solid line indicates Example 1, and the dotted line indicates Comparative Example 1.

  4 and 5, in Example 1, the number of fine particles and the TOC concentration were constant because there was no change in the amount of water and the water quality due to the switching of the system to be stopped and operated. On the other hand, in Comparative Example 1, the quality of the obtained ultrapure water varies. This is because fluctuations in the treated water recovery rate due to fluctuations in the flow rate of treated water in membrane devices such as the reverse osmosis membrane device 127 and ultrafiltration device 137, and from each member constituting the pipe due to fluctuations in the flow rate in the pipe This is thought to be due to fluctuations in the elution component concentration. Ultrapure water having an increased number of fine particles and an increased TOC concentration may affect the yield of products, and is recirculated to the previous stage and reprocessed as necessary.

Example 3 (Large-scale ultrapure water device)
Based on the results obtained in Examples 1 and 2 above, the apparatus shown in FIG. 3, wherein the primary pure water system includes five series similar to series A, and the flow rate of the ultrapure water produced is Table 2 shows the results of designing a large-scale ultrapure water production apparatus of 17,500 m ³ / day and calculating the chemical usage (total value of 35 wt% hydrochloric acid and 25 wt% sodium hydroxide) and nitrogen gas usage. .

Comparative Example 2
Based on the results obtained in Example 2 and Comparative Example 1, the conventional large-scale ultrapure water production apparatus shown in FIG. 9 having a flow rate of produced ultrapure water of 17,500 m ³ / day is designed. Table 2 shows the results of calculation of chemical usage (total value of 35 wt% hydrochloric acid and 25 wt% sodium hydroxide), nitrogen gas usage and cooling water usage.

From Table 2, the amount of chemicals used in Example 3 is reduced by 6,000 kg / day compared to Comparative Example 2. This is because the apparatus is consolidated and the series operation is performed to collectively regenerate the ion exchange resin apparatus. The decrease in the amount of nitrogen gas used is equivalent to one 500m ³ water storage pit.

  DESCRIPTION OF SYMBOLS 10, 20 ... Ultrapure water production apparatus, 11 ... Pretreatment system, 12 ... Primary pure water system, 13 ... Secondary pure water system, 2 ... Water storage pit, 3 ... Pure water tank, 103 ... Ion exchange resin apparatus, 105: Reverse osmosis membrane device.

Claims (9)

In an ultrapure water production apparatus comprising a pretreatment system, a primary pure water system, and a secondary pure water system in this order,
The primary pure water system includes an ion exchange resin device and a reverse osmosis membrane device that are independently supplied by a pump from a water storage pit in which treated water of the pretreatment system is stored, and does not interpose a water storage pit. It is a plurality of processing series consisting of pure water systems with the same configuration,
An ultrapure water production apparatus characterized in that another treatment sequence can be operated in a state where an arbitrary treatment sequence of the series is stopped.   The ultrapure water production apparatus according to claim 1, wherein each treatment series of the primary pure water system includes one or more membrane deaeration devices, ion exchange resin devices, and reverse osmosis membrane devices.   3. The ultrapure water production apparatus according to claim 1, wherein the secondary pure water system is composed of one or more series of pure water systems connected to the primary pure water system via a water storage tank. . The ultrapure water production apparatus according to any one of claims 1 to ³ , wherein the flow rate of the produced ultrapure water is 2,000 m ³ / day or more.   5. The system according to claim 1, wherein each series of the primary pure water system further includes at least one device selected from an ultraviolet irradiation device, a chelate resin device, and an activated carbon device. Ultrapure water production equipment.   The ion exchange resin device is one or more devices selected from a cation exchange resin device, an anion exchange resin device, a multilayer ion exchange resin device, a mixed bed ion exchange resin device, and an electrically regenerative ion exchange resin device. The ultrapure water device according to any one of claims 1 to 5, wherein   Each of the series of the primary pure water system includes a cation exchange resin device, a membrane deaeration device, an anion exchange resin device, and a reverse osmosis membrane device in this order. The ultrapure water production apparatus according to the item.   The said secondary pure water system is provided with 1 or more types of apparatuses chosen from an ultraviolet irradiation device, a membrane deaeration device, a polisher, and an ultrafiltration device, The any one of Claim 1 thru | or 7 characterized by the above-mentioned. Ultrapure water production equipment. The apparatus for producing ultrapure water according to any one of claims 1 to 8, wherein maintenance of the devices in the stopped processing series is collectively performed.

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