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TW201819192A - Multilayer film - Google Patents

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Publication number
TW201819192A
TW201819192A TW106116070A TW106116070A TW201819192A TW 201819192 A TW201819192 A TW 201819192A TW 106116070 A TW106116070 A TW 106116070A TW 106116070 A TW106116070 A TW 106116070A TW 201819192 A TW201819192 A TW 201819192A
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layer
block copolymer
polymer
multilayer film
weight
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TW106116070A
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Chinese (zh)
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松田弘明
原內洋輔
周宏晃
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日本瑞翁股份有限公司
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Publication of TW201819192A publication Critical patent/TW201819192A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/04Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising vinyl aromatic monomers and conjugated dienes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Graft Or Block Polymers (AREA)
  • Polarising Elements (AREA)

Abstract

The purpose of the present invention is to provide a multilayer film which has low birefringence, excellent ultraviolet light shielding performance, excellent water vapor blocking performance and high surface hardness, while being not susceptible to scratches, and which is suitable as a protective film for polarizing plates. A multilayer film according to the present invention comprises: a layer (e) which contains a resin composition (E) that is obtained by blending 1.0-15.0 parts by weight of an ultraviolet absorbent per 100 parts by weight of a specific block copolymer hydride (D); a resin layer (f) which is laminated on at least one surface of the layer (e) and contains a specific thermoplastic resin (F); and a hard coat layer (h) which is laminated on a surface of at least one resin layer (f), said surface being on the reverse side of the surface that is in contact with the layer (e).

Description

多層膜    Multilayer film   

本發明係有關於一種多層膜,其係將特定的熱可塑性樹脂層及硬塗層層積在含有樹脂組成物之層而成,其中該樹脂組成物,係在特定嵌段共聚物氫化物中調配紫外線吸收劑。 The present invention relates to a multilayer film which is formed by laminating a specific thermoplastic resin layer and a hard coat layer on a layer containing a resin composition, wherein the resin composition is a specific block copolymer hydride Blend UV absorber.

已揭示將含有以源自芳香族乙烯系化合物的結構單元作為主成分之聚合物嵌段、及含有源自鏈狀共軛二烯化合物的結構單元之聚合物嵌段之嵌段共聚物的芳香環及源自二烯的雙鍵氫化而成之嵌段共聚物氫化物,係具有優異的透明性、低雙折射性、耐熱性、低吸濕性等;以及藉由將該物押出成型而得到的薄膜,作為液晶顯示裝置的偏光膜、相位差膜等的光學薄膜為有用的(專利文獻1~5)。 The aromaticity of a block copolymer including a polymer block containing a structural unit derived from an aromatic vinyl compound as a main component and a polymer block containing a structural unit derived from a chain conjugated diene compound has been disclosed. A hydrogenated block copolymer obtained by hydrogenating a ring and a diene-derived double bond has excellent transparency, low birefringence, heat resistance, and low hygroscopicity, etc .; The obtained film is useful as an optical film such as a polarizing film or a retardation film of a liquid crystal display device (Patent Documents 1 to 5).

在液晶顯示裝置,係將偏光膜配置在形成液晶面板表面之玻璃基板的兩側。通常的偏光膜,係在含有聚乙烯醇系薄膜及碘等的二色性材料之偏光片的兩側,貼合使用三乙酸纖維素等之偏光片保護膜而構成。 In a liquid crystal display device, a polarizing film is disposed on both sides of a glass substrate forming a surface of a liquid crystal panel. A normal polarizing film is formed by bonding a polarizing film protective film such as cellulose triacetate on both sides of a polarizer containing a dichroic material such as a polyvinyl alcohol film and iodine.

因為上述偏光片保護膜,被照射到紫外線時,促進分解且引起強度低落之同時,有因變色致使透明度低落之問題。因此為了防止偏光片因紫外線而引起劣化之目的,認為偏 光片保護膜具有紫外線吸收性能為必要的。作為對偏光片保護膜賦予紫外線吸收性能之方法,通常的方法,係在作為偏光片保護膜之三乙酸纖維素膜中添加紫外線吸收劑。 The above-mentioned polarizer protective film, when irradiated with ultraviolet rays, promotes decomposition and causes a decrease in strength, and at the same time, there is a problem in that transparency is lowered due to discoloration. Therefore, in order to prevent the polarizer from being deteriorated by ultraviolet rays, it is considered necessary that the polarizer protective film has ultraviolet absorbing properties. As a method for imparting ultraviolet absorbing performance to a polarizer protective film, a general method is to add an ultraviolet absorbent to a cellulose triacetate film as a polarizer protective film.

但是,三乙酸纖維素之耐濕熱性為不充分,將三乙酸纖維素膜使用作為偏光片保護膜之偏光板,在高溫或高濕下使用時,有偏光度、色相等作為偏光板的性能低落之問題。 However, the cellulose triacetate has insufficient moisture and heat resistance. When a cellulose triacetate film is used as a polarizer for a polarizer protective film, when used under high temperature or high humidity, it has the same performance as a polarizer. The problem of depression.

另一方面,專利文獻6、7係揭示一種多層膜,其係由在特定嵌段共聚物氫化物調配紫外線吸收劑而成之中間層、及不含有紫外線吸收劑之外層所構成,雙折射較小且具有優異的紫外線遮蔽性能、耐衝撃性,而且表面缺陷較少且面狀優異。 On the other hand, Patent Documents 6 and 7 disclose a multilayer film which is composed of an intermediate layer in which a specific block copolymer hydride is blended with an ultraviolet absorber, and an outer layer not containing an ultraviolet absorber. It is small and has excellent ultraviolet shielding performance, impact resistance, and has few surface defects and excellent planarity.

為了防止在操作時和保存、搬運時含有嵌段共聚物氫化物之薄膜產生傷痕等,專利文獻6係揭示一種多層膜,其係層積含有聚酯、聚碳酸酯、聚丙烯、氫化降莰烯聚合物及甲基丙烯酸酯系聚合物等的其它樹脂之保護層而成。又,專利文獻6記載,該多層膜係在將含有嵌段共聚物氫化物之薄膜使用在目標光學用途時,將含有其它樹脂之保護層剝離而除去。 In order to prevent scratches and the like of a film containing a block copolymer hydride during operation, storage, and transportation, Patent Document 6 discloses a multilayer film whose layered layer contains polyester, polycarbonate, polypropylene, and hydrogenated hydrogen. Protective layer of other resins such as olefin polymer and methacrylate polymer. In addition, Patent Document 6 describes that when a multilayer film containing a block copolymer hydride is used for a target optical application, a protective layer containing another resin is peeled off and removed.

而且,專利文獻6亦記載,能夠在含有嵌段共聚物氫化物之薄膜層積硬塗層。 Further, Patent Document 6 describes that a hard coat layer can be laminated on a film containing a block copolymer hydride.

但是,但是使用專利文獻6所揭示之含有特定嵌段共聚物氫化物的薄膜而得到的光學薄膜,係有表面硬度較低且容易負傷之問題。又,將硬塗層直接層積在此含有嵌段共聚物氫化物之薄膜時,有表面硬度無法充分地提高之情形。 However, the optical film obtained by using the film containing a specific block copolymer hydride disclosed in Patent Document 6 has a problem that the surface hardness is low and it is easy to be injured. When the hard coat layer is directly laminated on the film containing the block copolymer hydride, the surface hardness may not be sufficiently improved.

又,專利文獻7記載一種多層膜,其係在將烷氧 矽基導入至特定嵌段共聚物氫化物而成之改性嵌段共聚物氫化物,層積由以特定量調配紫外線吸收劑而成的樹脂組成物所形成之層。又,專利文獻7亦記載,在該文獻所記載的多層膜,係具有優異的紫外線吸收性能及機械強度且表面缺陷較少,而適合於面狀優異的光學薄膜。 Further, Patent Document 7 describes a multilayer film which is a modified block copolymer hydrogenated product in which an alkoxysilyl group is introduced into a specific block copolymer hydrogenated product, and the laminate is formed by blending a UV absorber in a specific amount. A layer formed by the formed resin composition. In addition, Patent Document 7 also describes that the multilayer film described in this document has excellent ultraviolet absorption performance and mechanical strength, and has few surface defects, and is suitable for an optical film having excellent planarity.

但是,使用專利文獻7所揭示之含有嵌段共聚物氫化物所得到的光學薄膜,係有薄膜的表面硬度較低且容易負傷之問題。 However, the optical film obtained by using the block copolymer hydride disclosed in Patent Document 7 has a problem that the surface hardness of the film is low and the film is easily damaged.

如以上,為了將先前習知的含有嵌段共聚物氫化物的薄膜,使用在液晶顯示器的表面側作為偏光片保護膜,必須提高薄膜的表面硬度來防止負傷。 As described above, in order to use a conventionally known film containing a block copolymer hydride as a polarizer protective film on the surface side of a liquid crystal display, it is necessary to increase the surface hardness of the film to prevent injury.

先前技術文獻     Prior art literature     專利文獻     Patent literature    

[專利文獻1]日本特開2002-105151號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2002-105151

[專利文獻2]日本特開2003-114329號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2003-114329

[專利文獻3]日本特開2006-195242號公報 [Patent Document 3] Japanese Patent Laid-Open No. 2006-195242

[專利文獻4]國際公開第2009/067290號 [Patent Document 4] International Publication No. 2009/067290

[專利文獻5]國際公開第2009/137278號 [Patent Document 5] International Publication No. 2009/137278

[專利文獻6]日本特開2011-13378號公報 [Patent Document 6] Japanese Patent Laid-Open No. 2011-13378

[專利文獻7]國際公開第2015/105127號 [Patent Document 7] International Publication No. 2015/105127

本發明係鑒於此種實際情況而進行,其目的係提 供一種雙折射較小、具有優異的紫外線遮蔽性能及水蒸氣遮蔽性、表面硬度較高、不容易負傷且適合於偏光板保護膜之多層膜。 The present invention has been made in view of such a practical situation, and an object thereof is to provide a multilayer having a small birefringence, excellent ultraviolet shielding performance and water vapor shielding property, high surface hardness, less susceptibility to injury, and suitable for a polarizing plate protective film. membrane.

為了解決上述課題,本發明者等專心研討之結果,發現藉由在含有樹脂組成物(該樹脂組成物係在特定嵌段共聚物氫化物調配預定量的紫外線吸收劑而成)之層(以下,有稱為「層(e)」之情形),層積含有表面硬度良好且透明的其它熱可塑性樹脂之層(以下,有稱為「樹脂層(f)」之情形),而且在樹脂層(f)的表面層積硬塗層(以下,有稱為「硬塗層(h)」之情形),能夠得到一種雙折射較小、具有優異的紫外線遮蔽性能及水蒸氣遮蔽性且經改良表面耐負傷性之多層膜,而完成了本發明。 In order to solve the above-mentioned problems, the present inventors and others have conducted intensive studies and found that a layer containing the resin composition (the resin composition is prepared by blending a predetermined amount of an ultraviolet absorber with a specific block copolymer hydride) (hereinafter In some cases, it is called "layer (e)"), and a layer containing other thermoplastic resins with good surface hardness and transparency (hereinafter referred to as "resin layer (f)") is laminated, and in the resin layer (f) The surface is laminated with a hard coat layer (hereinafter, sometimes referred to as "hard coat layer (h)"), which has a small birefringence, excellent ultraviolet shielding performance and water vapor shielding performance, and is improved. A multilayer film having a surface scratch resistance has completed the present invention.

如此,依照本發明,能夠提供下述(1)~(3)的多層膜。 As described above, according to the present invention, the following multilayer films (1) to (3) can be provided.

(1)一種多層膜,其特徵在於包含:(i)層(e),其係含有相對於嵌段共聚物氫化物(D)100重量份,調配紫外線吸收劑1.0重量份以上、15.0重量份以下而成之樹脂組成物(E),其中該嵌段共聚物氫化物(D)係含有以源自芳香族乙烯系化合物的結構單元作為主成分之至少2個聚合物嵌段(A)、及以源自鏈狀共軛二烯化合物的結構單元作為主成分之至少1個聚合物嵌段(B)之嵌段共聚物,將總聚合物嵌段(A)及總聚合物嵌段(B)在嵌段共聚物(C)所佔有之重量分率設為wA及wB時,將wA與wB之比wA:wB為60:40~90:10之嵌 段共聚物(C)的主鏈及側鏈的碳-碳不飽和鍵及芳香環的碳-碳不飽和鍵的90%以上氫化而成;(ii)樹脂層(f),其係含有層積在層(e)的一面或兩面之熱可塑性樹脂(F),其中熱可塑性樹脂(F)係選自由聚酯、環烯烴聚合物、聚苯乙烯、苯乙烯共聚物及(甲基)丙烯酸酯(共)聚合物所組成群組之1種類以上;及(iii)硬塗層(h),其係層積在至少一個樹脂層(f)之與層(e)鄰接之面為相反側的面。 (1) A multilayer film comprising: (i) layer (e), which contains 100 parts by weight of the block copolymer hydride (D), and contains 1.0 part by weight or more and 15.0 parts by weight of an ultraviolet absorber. The resin composition (E) formed as follows, wherein the hydrogenated block copolymer (D) contains at least two polymer blocks (A) containing a structural unit derived from an aromatic vinyl compound as a main component, And a block copolymer having at least one polymer block (B) having a structural unit derived from a chain conjugated diene compound as a main component, the total polymer block (A) and the total polymer block ( B) When the weight fraction occupied by the block copolymer (C) is set to wA and wB, the ratio of wA to wB wA: wB is 60:40 to 90:10. Chains and side chains of carbon-carbon unsaturated bonds and aromatic ring carbon-carbon unsaturated bonds of more than 90% of hydrogenation; (ii) resin layer (f), which is laminated on the side of layer (e) Or two-sided thermoplastic resin (F), wherein the thermoplastic resin (F) is selected from the group consisting of polyester, cycloolefin polymer, polystyrene, styrene copolymer, and (meth) acrylate (co) polymer group The above type 1; and (iii) a hard coat layer (h), which is based on at least one laminate (e) adjacent to the surface of the resin layer (f) with the surface opposite layer.

(2)如(1)所述之多層膜,其特徵在於其中前述嵌段共聚物(C)係重量平均分子量(Mw)為40,000以上、100,000以下,同時以源自芳香族乙烯系化合物的結構單元作為主成分之2個聚合物嵌段(A1)及聚合物嵌段(A2)係各自形成嵌段共聚物(C)的兩末端,而且聚合物嵌段(A1)的重量平均分子量Mw(A1)為20,000以上、80,000以下,聚合物嵌段(A2)的重量平均分子量Mw(A2)為4,000以上、7,000以下。 (2) The multilayer film according to (1), wherein the block copolymer (C) has a weight average molecular weight (Mw) of 40,000 or more and 100,000 or less, and has a structure derived from an aromatic vinyl compound The two polymer blocks (A 1 ) and the polymer block (A 2 ) as a main component each form both ends of the block copolymer (C), and the weight of the polymer block (A 1 ) is averaged. molecular weight Mw (a 1) is 20,000 or more, 80,000 or less, the polymer block (a 2) weight average molecular weight Mw of (a 2) of 4,000 or more and 7,000 or less.

(3)如(1)或(2)所述之多層膜,其中層積有硬塗層(h)之面之JIS K 5600-5-4規定的刮痕硬度為H以上。 (3) The multilayer film according to (1) or (2), in which the scratch hardness specified in JIS K 5600-5-4 of the surface on which the hard coat layer (h) is laminated is H or more.

依照本發明,能夠提供一種雙折射較小、具有優異的紫外線遮蔽性能及水蒸氣遮蔽性,且經改良表面耐負傷性之適合於光學用膜之含有特定的嵌段共聚物氫化物之多層膜。 According to the present invention, it is possible to provide a multilayer film containing a specific block copolymer hydride, which is suitable for an optical film, and has a small birefringence, excellent ultraviolet shielding properties and water vapor shielding properties, and improved surface damage resistance. .

用以實施發明之形態     Forms used to implement the invention    

本發明的多層膜係包含:層(e),其係使用含有預定嵌段共聚物氫化物(D)及紫外線吸收劑之樹脂組成物(E)而形成;樹脂層(f),其係層積在層(e)的至少一面,含有預定熱可塑性樹脂(F);及硬塗層(h),其係層積在至少一個樹脂層(f)之與層(e)接觸之面為相反側的面。 The multilayer film system of the present invention includes a layer (e) formed using a resin composition (E) containing a predetermined block copolymer hydride (D) and an ultraviolet absorber; and a resin layer (f), which is a system layer It is laminated on at least one side of the layer (e), and contains a predetermined thermoplastic resin (F); and a hard coat layer (h), which is laminated on the opposite side of the at least one resin layer (f) that is in contact with the layer (e) Side face.

以下,將本發明分項成為1)嵌段共聚物氫化物(D)、2)樹脂組成物(E)、3)熱可塑性樹脂(F)、及4)多層膜而詳細地說明。 Hereinafter, the present invention will be described in detail 1) a block copolymer hydrogenate (D), 2) a resin composition (E), 3) a thermoplastic resin (F), and 4) a multilayer film.

1)嵌段共聚物氫化物(D) 1) Block copolymer hydride (D)

在本發明的多層膜,使用於形成層(e)之嵌段共聚物氫化物,係將按預定重量比率含有以源自芳香族乙烯系化合物的結構單元作為主成分之至少2個聚合物嵌段(A)、及以源自鏈狀共軛二烯化合物的結構單元作為主成分之至少1個聚合物嵌段(B)之特定嵌段共聚物(C)(以下,有稱為「嵌段共聚物(C)」之情形)的主鏈及側鏈的碳-碳不飽和鍵及芳香環的碳-碳不飽和鍵,進行氫化而得到之高分子(以下,有稱為「嵌段共聚物氫化物(D)」之情形)。 In the multilayer film of the present invention, the hydrogenated block copolymer used to form the layer (e) contains at least two polymers containing a structural unit derived from an aromatic vinyl compound as a main component in a predetermined weight ratio. Segment (A), and a specific block copolymer (C) (hereinafter referred to as "embedded") containing at least one polymer block (B) as a main component of a structural unit derived from a chain conjugated diene compound (In the case of the "block copolymer (C)"), a polymer obtained by hydrogenating the carbon-carbon unsaturated bond in the main chain and the side chain and the carbon-carbon unsaturated bond in the aromatic ring (hereinafter referred to as "block" Copolymer hydride (D) ").

[聚合物嵌段(A)] [Polymer Block (A)]

共聚物嵌段(A)係以源自芳香族乙烯系化合物的結構單元作為主成分者。聚合物嵌段(A)中之源自芳香族乙烯系化合物的結構單元的含量,係通常90重量%以上,以95重量%以上為佳,較佳為99重量%以上,而且為100重量%以下。聚合物嵌段(A)中之源自芳香族乙烯系化合物的結構單元之含量為上 述範圍時,因為本發明的多層膜之耐熱性變高,乃是較佳。 The copolymer block (A) is one having a structural unit derived from an aromatic vinyl compound as a main component. The content of the structural unit derived from the aromatic vinyl compound in the polymer block (A) is usually 90% by weight or more, preferably 95% by weight or more, more preferably 99% by weight or more, and 100% by weight the following. When the content of the structural unit derived from the aromatic vinyl compound in the polymer block (A) is within the above range, it is preferable because the heat resistance of the multilayer film of the present invention is increased.

又,聚合物嵌段(A)亦可含有源自芳香族乙烯系化合物的結構單元以外的結構單元。作為聚合物嵌段(A)中之源自芳香族乙烯系化合物的結構單元以外的結構單元,可列舉出源自鏈狀共軛二烯的結構單元及/或源自其它乙烯系化合物的結構單元。聚合物嵌段(A)中之源自芳香族乙烯系化合物的結構單元以外的結構單元之含量,係通常10重量%以下,以5重量%以下為佳,較佳為1重量%以下。 The polymer block (A) may contain a structural unit other than a structural unit derived from an aromatic vinyl compound. Examples of the structural unit other than the structural unit derived from the aromatic vinyl compound in the polymer block (A) include a structural unit derived from a chain conjugated diene and / or a structure derived from another vinyl compound. unit. The content of structural units other than the structural unit derived from the aromatic vinyl compound in the polymer block (A) is usually 10% by weight or less, preferably 5% by weight or less, and more preferably 1% by weight or less.

又,在複數個聚合物嵌段(A)各自所含有的結構單元之種類及含量,可互相相同亦可不同。 The types and contents of the structural units contained in the plurality of polymer blocks (A) may be the same as or different from each other.

又,複數個聚合物嵌段(A)的重量平均分子量,可互相相同亦可不同。例如形成嵌段共聚物(C)的兩末端之聚合物嵌段(A1)及聚合物嵌段(A2)的重量平均分子量,可互相相同亦可不同。而且,將聚合物嵌段(A1)及聚合物嵌段(A2)的重量平均分子量各自設為Mw(A1)及Mw(A2)時,將嵌段共聚物(C)的重量平均分子量設為特定範圍之情況,能夠藉由在能夠維持嵌段共聚物氫化物(D)的機械強度之範圍內,減小Mw(A1)及Mw(A2)的一方(例如Mw(A2))而增大另一方(例如Mw(A1)),來提高在所得到的嵌段共聚物氫化物(D)的黏彈性特性之儲存彈性模數。藉此,因為能夠提高本發明的多層膜之表面硬度,乃是較佳。 The weight average molecular weights of the plurality of polymer blocks (A) may be the same as or different from each other. For example, the weight average molecular weights of the polymer block (A 1 ) and the polymer block (A 2 ) forming both ends of the block copolymer (C) may be the same as or different from each other. When the weight average molecular weights of the polymer block (A 1 ) and the polymer block (A 2 ) are each Mw (A 1 ) and Mw (A 2 ), the weight of the block copolymer (C) is set. When the average molecular weight is in a specific range, one of Mw (A 1 ) and Mw (A 2 ) (for example, Mw ( A 2 )) and increase the other (for example, Mw (A 1 )) to increase the storage elastic modulus of the viscoelastic properties of the obtained block copolymer hydride (D). This is because it is possible to improve the surface hardness of the multilayer film of the present invention.

從得到上述效果之觀點而言,Mw(A1)係以20,000以上、80,000以下為佳,較佳為23,000以上、65,000以下,更佳為25,000以上、55,000以下,Mw(A2)係以4,000以上、 7,000以下為佳,較佳為4,200以上、6,000以下,更佳為4,500以上、5,500以下。 From the viewpoint of obtaining the above effects, Mw (A 1 ) is preferably 20,000 or more and 80,000 or less, more preferably 23,000 or more and 65,000 or less, more preferably 25,000 or more and 55,000 or less, and Mw (A 2 ) is 4,000. The above is preferably 7,000 or less, more preferably 4,200 or more and 6,000 or less, and more preferably 4,500 or more and 5,500 or less.

[聚合物嵌段(B)] [Polymer Block (B)]

聚合物嵌段(B)係以源自鏈狀共軛二烯化合物的結構單元作為主成分者。聚合物嵌段(B)中之源自鏈狀共軛二烯化合物的結構單元之含量,係通常90重量%以上,以95重量%以上為佳,較佳為99重量%以上,而且為100重量%以下。聚合物嵌段B中之源自鏈狀共軛二烯化合物的結構單元之含量為上述範圍時,因為本發明的多層膜係具有柔軟性且耐衝撃性變為良好,乃是較佳。 The polymer block (B) includes a structural unit derived from a chain conjugated diene compound as a main component. The content of the structural unit derived from the chain conjugated diene compound in the polymer block (B) is usually 90% by weight or more, preferably 95% by weight or more, more preferably 99% by weight or more, and 100 % By weight or less. When the content of the structural unit derived from the chain-like conjugated diene compound in the polymer block B is in the above range, it is preferable because the multilayer film of the present invention has flexibility and has good impact resistance.

又,聚合物嵌段(B)亦可含有源自鏈狀共軛二烯化合物的結構單元以外的結構單元。作為聚合物嵌段(B)中之源自鏈狀共軛二烯化合物的結構單元以外之成分,可列舉出源自芳香族乙烯系化合物的結構單元及/或源自其它乙烯系化合物的結構單元。聚合物嵌段(B)中之源自鏈狀共軛二烯化合物的結構單元以外的結構單元之含量,係通常10重量%以下,以5重量%以下為佳,較佳為1重量%以下。 Moreover, the polymer block (B) may contain a structural unit other than the structural unit derived from a chain conjugated diene compound. Examples of the component other than the structural unit derived from the chain-like conjugated diene compound in the polymer block (B) include a structural unit derived from an aromatic vinyl compound and / or a structure derived from another vinyl compound. unit. The content of structural units other than the structural unit derived from the chain conjugated diene compound in the polymer block (B) is usually 10% by weight or less, preferably 5% by weight or less, and more preferably 1% by weight or less .

而且,聚合物嵌段(B)為複數個時,在複數個聚合物嵌段(B)各自所含有的結構單元之種類及含量可互相相同亦可不同。又,複數個聚合物嵌段(B)的重量平均分子量可互相相同亦可不同。 When there are a plurality of polymer blocks (B), the types and contents of the structural units contained in the plurality of polymer blocks (B) may be the same as or different from each other. The weight average molecular weights of the plurality of polymer blocks (B) may be the same as or different from each other.

在此,聚合物嵌段(B)中之源自鏈狀共軛二烯化合物的結構單元(及聚合物嵌段(A)中任意地含有之源自鏈狀共軛二烯化合物的結構單元),係依照在鏈狀共軛二烯化合物的 聚合反應之鏈狀共軛二烯化合物的反應部位,可為源自1,2-加成聚合的結構單元、源自3,4-加成聚合的結構單元、及源自1,4-加成聚合的結構單元之任一種。 Here, the structural unit derived from the chain conjugated diene compound in the polymer block (B) (and the structural unit derived from the chain conjugated diene compound arbitrarily contained in the polymer block (A) ), According to the reaction site of the chain conjugated diene compound in the polymerization reaction of the chain conjugated diene compound, may be a structural unit derived from 1,2-addition polymerization, derived from 3,4-addition Any of a structural unit to be polymerized and a structural unit derived from 1,4-addition polymerization.

使鏈狀共軛二烯化合物加成聚合時,依照鏈狀共軛二烯化合物的聚合反應部位,而形成源自1,2-加成聚合的重複單元、源自3,4-加成聚合的重複單元、及源自1,4-加成聚合的重複單元之任一種。例如,使用異戊二烯作為鏈狀共軛二烯化合物時,藉由1,2-加成聚合而形成(1-甲基-1-乙烯基)伸乙基表示之重複單元,藉由3,4-加成聚合而形成1-異丙烯基伸乙基表示之重複單元,藉由1,4-加成聚合而形成2-甲基-2-伸丁烯基表示之重複單元。 When the chain conjugated diene compound is subjected to addition polymerization, a repeating unit derived from 1,2-addition polymerization and 3,4-addition polymerization are formed according to the polymerization reaction site of the chain conjugated diene compound. Any one of the repeating units derived from 1,4- and 1,4-addition polymerization. For example, when isoprene is used as the chain conjugated diene compound, a repeating unit represented by (1-methyl-1-vinyl) ethene is formed by 1,2-addition polymerization, and 3 1,4-addition polymerization forms a repeating unit represented by 1-isopropenylethylene, and 1,4-addition polymerization forms a repeating unit represented by 2-methyl-2-butenyl.

聚合物嵌段(B)(及聚合物嵌段(A))中之源自鏈狀共軛二烯化合物的重複單元中之1,2-加成聚合、3,4-加成聚合、及1,4-加成聚合而成之重複單元的比例,係能夠使用紅外線分析法且藉由Morello(莫雷洛)法來算出。 1,2-addition polymerization, 3,4-addition polymerization of the repeating unit derived from the chain-like conjugated diene compound in the polymer block (B) (and the polymer block (A)), and The proportion of repeating units formed by 1,4-addition polymerization can be calculated by using the infrared analysis method and the Morello method.

例如使用異戊二烯作為鏈狀共軛二烯化合物時,所謂源自1,2-加成聚合的結構單元,係下述式(1)表示之結構單元。 For example, when isoprene is used as the chain conjugated diene compound, the structural unit derived from 1,2-addition polymerization is a structural unit represented by the following formula (1).

所謂源自3,4-加成聚合的結構單元,係下述式(2)表示之結構單元。 The structural unit derived from 3,4-addition polymerization is a structural unit represented by the following formula (2).

[化2] [Chemical 2]

又,所謂源自1,4-加成聚合的結構單元,係下述式(3a)或式(3b)表示之結構單元。 The structural unit derived from 1,4-addition polymerization is a structural unit represented by the following formula (3a) or formula (3b).

[芳香族乙烯系化合物] [Aromatic vinyl compound]

在此,作為在上述聚合物嵌段(A)的形成及任意地形成上述聚合物嵌段(B)所使用之芳香族乙烯系化合物,可列舉出苯乙烯;α-甲基苯乙烯、2-甲基苯乙烯、3-甲基苯乙烯、4-甲基苯乙烯、2,4-二異丙基苯乙烯、2,4-二甲基苯乙烯、4-第三丁基苯乙烯、5-第三丁基-2-甲基苯乙烯等具有以烷基作為取代基之苯乙烯類;4-一氯苯乙烯、二氯苯乙烯、4-一氟苯乙烯等具有鹵素原子作為取代基之苯乙烯類;4-甲氧基苯乙烯、3,5-二甲氧基苯乙烯等具有以烷氧基作為取代基之苯乙烯類;4-苯基苯乙烯等具有以芳基作為取代基之苯乙烯類等。該等之中,從吸濕性的觀點而言,以不具有極性基者為佳,從工業上取得容易性而言,係以苯乙烯為特佳。 Here, examples of the aromatic vinyl compound used in the formation of the polymer block (A) and the optional formation of the polymer block (B) include styrene; α-methylstyrene, 2 -Methylstyrene, 3-methylstyrene, 4-methylstyrene, 2,4-diisopropylstyrene, 2,4-dimethylstyrene, 4-tert-butylstyrene, 5-third butyl-2-methylstyrene and other styrenes having an alkyl group as a substituent; 4-monochlorostyrene, dichlorostyrene, 4-monofluorostyrene and the like having a halogen atom as a substituent Styrenes such as 4-methoxystyrene, 3,5-dimethoxystyrene, and the like having alkoxy groups as substituents; 4-phenylstyrenes and the like having aryl groups as substituents Substituents such as styrene. Among these, from the viewpoint of hygroscopicity, those having no polar group are preferred, and from the viewpoint of industrial availability, styrene is particularly preferred.

[鏈狀共軛二烯系化合物] [Chain conjugated diene compound]

又,作為在上述聚合物嵌段(B)的形成及任意地形成上述 聚合物嵌段(A)所使用之鏈狀共軛二烯系化合物,從吸濕性的觀點而言,係以不具有極性基者為佳。作為不具有極性基的鏈狀共軛二烯系化合物,例如可列舉出1,3-丁二烯、異戊二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯等。該等之中,從工業上取得容易性而言,以1,3-丁二烯、異戊二烯為特佳。 In addition, as the chain conjugated diene-based compound used in the formation of the polymer block (B) and the arbitrary formation of the polymer block (A), it is not necessary from the viewpoint of hygroscopicity. Those with a polar base are preferred. Examples of the chain conjugated diene-based compound having no polar group include 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, and 1, 3-pentadiene and the like. Among these, in terms of industrial availability, 1,3-butadiene and isoprene are particularly preferred.

(其它的乙烯系化合物) (Other vinyl compounds)

而且,在聚合物嵌段(A)及/或聚合物嵌段(B)的形成,作為任意地使用之芳香族乙烯系化合物及鏈狀共軛二烯系化合物以外的乙烯系化合物(其它的乙烯系化合物),可列舉出鏈狀烯烴、環狀烯烴、鏈狀乙烯系化合物、環狀乙烯系化合物、不飽和的環狀酸酐、及不飽和醯亞胺化合物等。該等乙烯系化合物,亦可具有腈基、烷氧基羰基、羧基或鹵素原子作為取代基。該等之中,從吸濕性的觀點而言,係以不具有極性基者為佳,以鏈狀烯烴及環狀烯烴為較佳。作為適合的乙烯系化合物之具體例,可列舉出乙烯、丙烯、1-丁烯、1-戊烯、1-己烯、1-庚烯、1-辛烯、1-壬烯、1-癸烯、1-十二烯、1-二十烯、4-甲基-1-戊烯、4,6-二甲基-1-庚烯等的鏈狀烯烴;乙烯基環己烷等的環狀烯烴等,以鏈狀烯烴為更佳,以乙烯、丙烯為特佳。 In addition, in the formation of the polymer block (A) and / or the polymer block (B), as the aromatic vinyl compound and the chain-shaped conjugated diene compound, the vinyl compound (other Ethylene compounds) include chain olefins, cyclic olefins, chain vinyl compounds, cyclic vinyl compounds, unsaturated cyclic acid anhydrides, and unsaturated fluorinimine compounds. These vinyl compounds may have a nitrile group, an alkoxycarbonyl group, a carboxyl group, or a halogen atom as a substituent. Among these, from the viewpoint of hygroscopicity, those having no polar group are preferred, and chain olefins and cyclic olefins are more preferred. Specific examples of suitable vinyl compounds include ethylene, propylene, 1-butene, 1-pentene, 1-hexene, 1-heptene, 1-octene, 1-nonene, and 1-decene. Alkenes, 1-dodecene, 1-icosene, 4-methyl-1-pentene, 4,6-dimethyl-1-heptene and other chain olefins; rings such as vinyl cyclohexane As the olefins, chain olefins are more preferred, and ethylene and propylene are particularly preferred.

[嵌段共聚物(C)] [Block copolymer (C)]

嵌段共聚物(C)中的聚合物嵌段(A)之數目,係至少2個,通常3個以下,較佳為2個。又,嵌段共聚物(C)中的聚合物嵌段(B)之數目,係至少1個,通常2個以下,較佳為1個。嵌段共聚物(C)的嵌段形態,可為鏈狀型嵌段亦可為輻射型嵌段,因為具有優異的機械強度,以鏈狀型嵌段為佳。 The number of polymer blocks (A) in the block copolymer (C) is at least two, usually three or less, and preferably two. The number of polymer blocks (B) in the block copolymer (C) is at least one, usually two or less, and preferably one. The block morphology of the block copolymer (C) may be a chain block or a radiation block, because it has excellent mechanical strength, and a chain block is preferred.

在此,嵌段共聚物(C)的較佳形態,係聚合物嵌段(A1)及聚合物嵌段(A2)鍵結在聚合物嵌段(B)的兩端而成之三嵌段共聚物(A1)-(B)-(A2)、以及聚合物嵌段(B1)及聚合物嵌段(B2)鍵結在聚合物嵌段(A3)兩端,而且在聚合物嵌段(B1)及聚合物嵌段(B2)的另一端(亦即未鍵結在聚合物嵌段(A3)之側的端部),各自鍵結有聚合物嵌段(A1)及聚合物嵌段(A2)而成之五嵌段共聚物(A1)-(B1)-(A3)-(B2)-(A2)。該等之中,從耐熱性、成型加工性及機械強度的觀點而言,係以三嵌段共聚物為最佳。 Here, the preferred form of the block copolymer (C) is a polymer block (A 1 ) and a polymer block (A 2 ) bonded to both ends of the polymer block (B). The block copolymer (A 1 )-(B)-(A 2 ), and the polymer block (B 1 ) and the polymer block (B 2 ) are bonded at both ends of the polymer block (A 3 ), Furthermore, at the other end of the polymer block (B 1 ) and the polymer block (B 2 ) (that is, the end that is not bonded to the side of the polymer block (A 3 )), a polymer is bonded to each of them. the block (A 1) and the polymer block (A 2) made of pentablock copolymer (A 1) - (B 1 ) - (A 3) - (B 2) - (A 2). Among these, a triblock copolymer is most preferable from the viewpoints of heat resistance, moldability, and mechanical strength.

將總聚合物嵌段(A)在嵌段共聚物(C)所佔有的重量分率設為wA(重量%),將總聚合物嵌段(B)在嵌段共聚物(C)所佔有的重量分率設為wB(重量%)時,wA與wB之比wA:wB必須為60:40~90:10,以65:35~88:12為佳,較佳為70:30~85:15。wA太大時,在本發明所使用的嵌段共聚物氫化物(D)的機械強度及柔軟性低落,且多層膜有容易產生裂紋之虞。又,wA太小時,製成多層膜時亦有表面硬度不充分之虞。 Let the weight fraction of the total polymer block (A) in the block copolymer (C) be wA (% by weight), and the total polymer block (B) in the block copolymer (C). When the weight fraction is set to wB (% by weight), the ratio of wA to wB wA: wB must be 60: 40 ~ 90: 10, preferably 65: 35 ~ 88: 12, more preferably 70: 30 ~ 85 : 15. When wA is too large, the mechanical strength and flexibility of the block copolymer hydride (D) used in the present invention are reduced, and the multilayer film may be liable to crack. When wA is too small, the surface hardness may be insufficient when the multilayer film is formed.

嵌段共聚物(C)的分子量,係藉由以四氫呋喃(THF)作為溶劑之凝膠滲透層析法(GPC)所測定之聚苯乙烯換算的重量平均分子量(Mw),通常為40,000以上、100,000以下,以45,000以上、80,000以下為佳,較佳為50,000以上、70,000以下。又,嵌段共聚物(C)的分子量分布(Mw/Mn),係以3以下為佳,較佳為2以下,特佳為1.5以下。 The molecular weight of the block copolymer (C) is a polystyrene-equivalent weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent, and is usually 40,000 or more, 100,000 or less, preferably 45,000 or more and 80,000 or less, and more preferably 50,000 or more and 70,000 or less. The molecular weight distribution (Mw / Mn) of the block copolymer (C) is preferably 3 or less, more preferably 2 or less, and particularly preferably 1.5 or less.

嵌段共聚物(C)的Mw為40,000以上時,在所得到的嵌段共聚物氫化物(D)的黏彈性特性之儲存彈性模數不會過 度地降低,製成本發明的多層膜時能夠充分地確保表面硬度。另一方面,嵌段共聚物(C)的Mw為100,000以下時,所得到的嵌段共聚物氫化物(D)的熔融黏度不會過度地變高,能夠抑制起因於在熔融成型溫度因熱分解而生成低分子量物致使嵌段共聚物氫化物(D)成型體的儲存彈性模數低落,且能夠充分地確保本發明的多層膜之表面硬度。 When the Mw of the block copolymer (C) is 40,000 or more, the storage elastic modulus of the viscoelastic properties of the obtained block copolymer hydride (D) does not decrease excessively, and it is possible to produce the multilayer film of the present invention. Fully ensure surface hardness. On the other hand, when the Mw of the block copolymer (C) is 100,000 or less, the melt viscosity of the obtained block copolymer hydride (D) does not become excessively high, and it can be suppressed from being caused by heat at the melt molding temperature. Decomposition to produce a low-molecular-weight substance causes the storage elastic modulus of the block copolymer hydride (D) molded article to decrease, and it is possible to sufficiently secure the surface hardness of the multilayer film of the present invention.

作為嵌段共聚物(C)的製造方法,能夠採用先前習知作為嵌段共聚物的製造方法之方法。尤其是使用活性陰離子聚合等的方法,使以芳香族乙烯系化合物作為主成分之單體與以鏈狀共軛二烯系化合物作為主成分之單體交替地聚合之方法為有利的。使用該方法時,亦容易將Mw(A1)及Mw(A2)控制成為所需要的不同大小。 As a method for producing the block copolymer (C), a method conventionally known as a method for producing a block copolymer can be adopted. In particular, it is advantageous to use a method such as living anion polymerization in which a monomer having an aromatic vinyl compound as a main component and a monomer having a chain conjugated diene compound as a main component are alternately polymerized. When using this method, it is also easy to control Mw (A 1 ) and Mw (A 2 ) to different sizes as required.

[嵌段共聚物氫化物(D)] [Block copolymer hydride (D)]

嵌段共聚物氫化物(D),係將上述嵌段共聚物(C)的主鏈及側鏈的碳-碳不飽和鍵、及芳香環的碳-碳不飽和鍵進行氫化得到者。其氫化率必須為90%以上,以97%以上為佳,較佳為99%以上。 The block copolymer hydride (D) is obtained by hydrogenating the carbon-carbon unsaturated bond of the main chain and the side chain of the block copolymer (C) and the carbon-carbon unsaturated bond of the aromatic ring. The hydrogenation rate must be 90% or more, preferably 97% or more, and more preferably 99% or more.

又,嵌段共聚物(C)的主鏈及側鏈的碳-碳不飽和鍵之氫化率,係以97%以上為佳,以99%以上為較佳。又,嵌段共聚物(C)的芳香環的碳-碳不飽和鍵之氫化率,係以97%以上為佳,以99%以上為較佳。 The hydrogenation rate of the carbon-carbon unsaturated bond in the main chain and the side chain of the block copolymer (C) is preferably 97% or more, and more preferably 99% or more. The carbon-carbon unsaturated bond hydrogenation rate of the aromatic ring of the block copolymer (C) is preferably 97% or more, and more preferably 99% or more.

氫化率越高所成型的薄膜之耐光性、耐熱性越良好。嵌段共聚物氫化物(D)之氫化率,係能夠藉由1H-NMR測定來求取。 The higher the hydrogenation rate, the better the light resistance and heat resistance of the formed film. The hydrogenation rate of the block copolymer hydride (D) can be determined by 1 H-NMR measurement.

在此,嵌段共聚物(C)的不飽和鍵之氫化方法、反 應形態等係沒有特別限定,依照習知的方法進行即可,以能夠提高氫化率且聚合物鏈切斷反應較少的氫化方法為佳。作為此種氫化方法,例如能夠舉出在國際公開第2011/096389號、國際公開第2012/043708號等所記載的方法。 Here, the method for hydrogenating the unsaturated bond of the block copolymer (C), the reaction form, and the like are not particularly limited, and may be performed in accordance with a conventional method. A hydrogenation method is preferred. Examples of such a hydrogenation method include methods described in International Publication No. 2011/096389, International Publication No. 2012/043708, and the like.

使用上述的方法而得到的嵌段共聚物氫化物(D),係將氫化觸媒及/或聚合觸媒從含有嵌段共聚物氫化物(D)之反應溶液除去後,能夠從反應溶液回收。所回收的嵌段共聚物氫化物(D)之形態係不被限定,通常為製成丸粒形狀而能夠提供隨後的薄膜成型加工。 The block copolymer hydride (D) obtained by the method described above can be recovered from the reaction solution after removing the hydrogenation catalyst and / or the polymerization catalyst from the reaction solution containing the block copolymer hydride (D). . The morphology of the recovered block copolymer hydride (D) is not limited, and it is usually formed into a pellet shape to enable subsequent film forming processing.

嵌段共聚物氫化物(D)的分子量,係藉由以THF作為溶劑之GPC測定之聚苯乙烯換算的重量平均分子量(Mw),通常為40,000以上、100,000以下,以45,000以上、80,000以下為佳,較佳為50,000以上、70,000以下。 The molecular weight of the block copolymer hydride (D) is a weight average molecular weight (Mw) in terms of polystyrene measured by GPC using THF as a solvent, and is usually 40,000 or more and 100,000 or less, and 45,000 or more and 80,000 or less as Preferably, it is preferably 50,000 or more and 70,000 or less.

又,嵌段共聚物氫化物(D)的分子量分布(Mw/Mn)係以3以下為佳,較佳為2以下,特佳為1.5以下。Mw及Mw/Mn為上述範圍時,能夠維持成型後的薄膜之耐熱性和機械強度。 The molecular weight distribution (Mw / Mn) of the block copolymer hydride (D) is preferably 3 or less, more preferably 2 or less, and particularly preferably 1.5 or less. When Mw and Mw / Mn are in the above ranges, the heat resistance and mechanical strength of the film after molding can be maintained.

又,在本發明所使用的嵌段共聚物氫化物(D),係例如亦可為使用國際公開第2001/070833號、國際公開第2012/043708號所記載的方法等而導入有酸酐基、烷氧矽基等的官能基之嵌段共聚物氫化物(D)。 In addition, the block copolymer hydride (D) used in the present invention can be introduced with an acid anhydride group, for example, by using a method described in International Publication No. 2001/070833 and International Publication No. 2012/043708. A hydrogenated block copolymer (D) of a functional group such as an alkoxysilyl group.

2)樹脂組成物(E) 2) Resin composition (E)

在本發明所使用的樹脂組成物,係相對於上述的嵌段共聚物氫化物(D)100重量份,調配1.0重量份以上、15.0重量份以下、良好為2.0重量份以上、12.0重量份以下、較佳為3.0重 量份以上、9.0重量份以下的紫外線吸收劑而得到之組成物(以下,有稱為「樹脂組成物(E)」之情形)。紫外線吸收劑的調配量為此範圍內時,製成光學用薄膜時,能夠有效率地將紫外線隔離,而且能夠維持可見光區域的透明性且不會使色調變差,乃是較佳。 The resin composition used in the present invention is prepared in an amount of 1.0 part by weight or more and 15.0 parts by weight or less, preferably 2.0 parts by weight or more and 12.0 parts by weight or less based on 100 parts by weight of the block copolymer hydride (D). It is preferably a composition obtained from an ultraviolet absorber of 3.0 parts by weight or more and 9.0 parts by weight or less (hereinafter, referred to as a "resin composition (E)"). When the blending amount of the ultraviolet absorber is within this range, it is preferable to efficiently isolate ultraviolet rays when forming an optical film, and to maintain transparency in the visible light region without deteriorating hue.

在本發明的多層膜,含有前述樹脂組成物(E)之層(e),從紫外線遮蔽的觀點而言,在波長380nm的透射率係以8%以下為佳,以4%以下為更佳,以1%以下為特佳。 In the multilayer film of the present invention, the layer (e) containing the resin composition (E) has a transmittance at a wavelength of 380 nm of 8% or less, and more preferably 4% or less from the viewpoint of ultraviolet shielding. It is particularly preferred to be less than 1%.

作為在本發明所使用的紫外線吸收劑,例如可列舉出2,4-二羥基二苯基酮、2-羥基-4-甲氧基二苯基酮、2-羥基-4-甲氧基二苯基酮-5-磺酸三水合物、2-羥基-4-辛氧基二苯基酮、4-十二氧基-2-羥基二苯基酮、4-苄氧基-2-羥基二苯基酮、2,2’,4,4’-四羥基二苯基酮、2,2’-二羥基-4,4’-二甲氧基二苯基酮等的二苯基酮系紫外線吸收劑;柳酸苯酯、2-羥基苯甲酸4-第三丁基苯酯、2-羥基苯甲酸苯酯、4-羥基苯甲酸2,4-二-第三丁基苯基-3,5-二-第三丁酯、4-羥基苯甲酸十六基-3,5-二-第三丁基酯等的柳酸系紫外線吸收劑;2-(5-氯-2H-苯并三唑-2-基)-6-第三丁基-對甲酚、2-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)苯酚、2-(2-羥基-5-甲基苯基)2H-苯并三唑、2-(3-第三丁基-2-羥基-5-甲基苯基)-5-氯-2H-苯并三唑、2-(3,5-二-第三丁基-2-羥基苯基)-5-氯-2H-苯并三唑、2-(3,5-二-第三丁基-2-羥基苯基)-2H-苯并三唑、2-(3,5-二異丙苯基-2-羥基苯基)-2H-苯并三唑、5-氯-2-(3,5-二-第三丁基-2-羥基苯基)-2H-苯并三唑、2-(3,5-二-第三戊基-2-羥基苯基)-2H-苯并三唑、2-(2-羥基 -5-第三辛基苯基)-2H-苯并三唑、2-(2-羥基-4-辛基苯基)-2H-苯并三唑、2-(2H-苯并三唑-2-基)-4-甲基-6-(3,4,5,6-四氫酞基甲基)苯酚、2,2’-亞甲基雙[4-(1,1,3,3-四甲基丁基)-6-[(2H-苯并三唑-2-基)苯酚]]等的苯并三唑系紫外線吸收劑;2-[4,6-雙(2,4-二甲基苯基)-1,3,5-三嗪-2-基]-5-(辛氧基)苯酚、2,4-雙[2-羥基-4-丁氧基苯基]-6-(2,4-二丁氧基苯基)-1,3,5-三嗪等的三嗪系紫外線吸收劑等。該等可單獨使用1種,亦可併用2種以上。該等之中,就對優異的紫外線吸收性(特別是在波長380nm附近的紫外線吸收性)而言,係以2-(3-第三丁基-2-羥基-5-甲基苯基)-5-氯-2H-苯并三唑、2,2’-亞甲基雙[4-(1,1,3,3-四甲基丁基)-6-[(2H-苯并三唑-2-基)苯酚]]、2-(5-氯-2H-苯并三唑-2-基)-6-第三丁基-對甲酚、2-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)苯酚等為佳。 Examples of the ultraviolet absorber used in the present invention include 2,4-dihydroxydiphenyl ketone, 2-hydroxy-4-methoxydiphenyl ketone, and 2-hydroxy-4-methoxydiphenyl ketone. Phenylketone-5-sulfonic acid trihydrate, 2-hydroxy-4-octyloxydiphenylketone, 4-dodecyloxy-2-hydroxydiphenylketone, 4-benzyloxy-2-hydroxy Diphenyl ketones such as diphenyl ketone, 2,2 ', 4,4'-tetrahydroxydiphenyl ketone, 2,2'-dihydroxy-4,4'-dimethoxydiphenyl ketone, etc. Ultraviolet absorber; phenylsalicylate, 4-tert-butyl phenyl 2-hydroxybenzoate, 2-tert-phenyl benzoate, 2,4-di-tert-butyl phenyl-3 Salicylic acid-based ultraviolet absorbers such as 1,5-di-tert-butyl ester, cetyl-3,5-di-tert-butyl ester of 4-hydroxybenzoate; 2- (5-chloro-2H-benzo Triazol-2-yl) -6-tert-butyl-p-cresol, 2- (2H-benzotriazol-2-yl) -4- (1,1,3,3-tetramethylbutyl ) Phenol, 2- (2-hydroxy-5-methylphenyl) 2H-benzotriazole, 2- (3-third-butyl-2-hydroxy-5-methylphenyl) -5-chloro- 2H-benzotriazole, 2- (3,5-di-third-butyl-2-hydroxyphenyl) -5-chloro-2H-benzotriazole, 2- (3,5-di-third Butyl-2-hydroxyphenyl) -2H- Benzotriazole, 2- (3,5-dicumyl-2-hydroxyphenyl) -2H-benzotriazole, 5-chloro-2- (3,5-di-tert-butyl-2 -Hydroxyphenyl) -2H-benzotriazole, 2- (3,5-di-tertiarypentyl-2-hydroxyphenyl) -2H-benzotriazole, 2- (2-hydroxy-5- Third octylphenyl) -2H-benzotriazole, 2- (2-hydroxy-4-octylphenyl) -2H-benzotriazole, 2- (2H-benzotriazol-2-yl ) -4-methyl-6- (3,4,5,6-tetrahydrophthaloylmethyl) phenol, 2,2'-methylenebis [4- (1,1,3,3-tetramethyl Benzyl) -6-[(2H-benzotriazol-2-yl) phenol]] and other benzotriazole-based ultraviolet absorbers; 2- [4,6-bis (2,4-dimethyl (Phenyl) -1,3,5-triazin-2-yl] -5- (octyloxy) phenol, 2,4-bis [2-hydroxy-4-butoxyphenyl] -6- (2 , 4-dibutoxyphenyl) -1,3,5-triazine and other triazine-based ultraviolet absorbers. These may be used individually by 1 type, and may use 2 or more types together. Among these, 2- (3-third-butyl-2-hydroxy-5-methylphenyl) is used for excellent ultraviolet absorption (particularly, ultraviolet absorption near a wavelength of 380 nm). -5-chloro-2H-benzotriazole, 2,2'-methylenebis [4- (1,1,3,3-tetramethylbutyl) -6-[(2H-benzotriazole -2-yl) phenol]], 2- (5-chloro-2H-benzotriazol-2-yl) -6-third butyl-p-cresol, 2- (2H-benzotriazole-2 -Yl) -4- (1,1,3,3-tetramethylbutyl) phenol and the like are preferred.

前述樹脂組成物(E),能夠調配紫外線吸收劑以外的其它調配劑。作為其它調配劑,可列舉出光安定劑、抗氧化劑、抗黏結劑等。該等可單獨1種、或併用2種以上而調配。 The said resin composition (E) can mix | blend a formulation other than a ultraviolet absorber. Examples of other formulation agents include light stabilizers, antioxidants, and anti-adhesive agents. These can be prepared individually by 1 type or in combination of 2 or more types.

作為光安定劑,係以受阻胺系光安定劑為佳。作為受阻胺系光安定劑,例如可列舉出在分子結構中具有3,5-二-第三丁基-4-羥基苯基、2,2,6,6-四甲基哌啶基、或1,2,2,6,6-五甲基-4-哌啶基等之化合物。 As the light stabilizer, a hindered amine light stabilizer is preferred. Examples of the hindered amine-based light stabilizer include 3,5-di-third-butyl-4-hydroxyphenyl in a molecular structure, 2,2,6,6-tetramethylpiperidinyl, or 1,2,2,6,6-pentamethyl-4-piperidinyl and other compounds.

作為抗氧化劑,可列舉出磷系抗氧化劑、酚系抗氧化劑、硫系抗氧化劑等。 Examples of the antioxidant include a phosphorus-based antioxidant, a phenol-based antioxidant, and a sulfur-based antioxidant.

作為抗氧化劑的具體例,可列舉出新戊四醇.肆[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、2,2-硫基-二伸乙雙[3-(3,5-二- 第三丁基-4-羥苯基)丙酸酯]、十八基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯、3,9-雙{2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基]-1,1-二甲基乙基}-2,4,8,10-四氧雜螺[5,5]十一烷、1,3,5-三甲基-2,4,6-參(3,5-二-第三丁基-4-羥基苄基)苯等。 Specific examples of the antioxidant include neopentyl alcohol. [3- (3,5-Di-tertiarybutyl-4-hydroxyphenyl) propionate], 2,2-thio-diethylene glycol [3- (3,5-di-third Butyl-4-hydroxyphenyl) propionate], octadecyl-3- (3,5-di-third-butyl-4-hydroxyphenyl) propionate, 3,9-bis {2- [3- (3-Third-butyl-4-hydroxy-5-methylphenyl) propanyloxy] -1,1-dimethylethyl} -2,4,8,10-tetraoxa Spiro [5,5] undecane, 1,3,5-trimethyl-2,4,6-ginseng (3,5-di-third-butyl-4-hydroxybenzyl) benzene and the like.

又,使用抗氧化劑時,其調配量係相對於嵌段共聚物氫化物(D)100重量份,通常為0.01重量份以上、1重量份以下,以0.05重量份以上、0.9重量份以下為佳,較佳為0.1重量份以上、0.8重量份以下。抗氧化劑的量為此範圍時,因為樹脂組成物(E)的耐熱安定性優異,乃是較佳。 When an antioxidant is used, the blending amount is usually 0.01 parts by weight or more and 1 part by weight or less, preferably 0.05 parts by weight or more and 0.9 parts by weight or less based on 100 parts by weight of the block copolymer hydride (D). It is preferably 0.1 part by weight or more and 0.8 part by weight or less. When the amount of the antioxidant is within this range, it is preferable because the resin composition (E) is excellent in heat resistance and stability.

又,除了抗氧化劑以外之其它調配劑的調配量,係相對於嵌段共聚物氫化物(D)100重量份,通常為0.01重量份以上、1重量份以下,以0.05重量份以上、0.9重量份以下為佳,較佳為0.1重量份以上、0.8重量份以下。 In addition, the blending amount of other blending agents other than the antioxidant is usually 0.01 parts by weight or more and 1 part by weight or less, based on 100 parts by weight of the block copolymer hydride (D), 0.05 parts by weight or more and 0.9 parts by weight. It is preferably not more than 0.1 parts by weight, and more preferably not less than 0.1 parts by weight and not more than 0.8 parts by weight.

作為在嵌段共聚物氫化物(D)調配紫外線吸收劑及任意地使用的其它調配劑而製造樹脂組成物(E)之方法,例如可列舉出在嵌段共聚物氫化物(D)中,混合紫外線吸收劑及任意地其它調配劑後,使用雙軸混煉機、輥機、布拉本德混合機(Brabender mixer)、押出機等使嵌段共聚物氫化物(D)成為熔融狀態而進行均勻地混煉之方法。 Examples of the method for producing the resin composition (E) by blending an ultraviolet absorber with the block copolymer hydride (D) and any other formulations arbitrarily include, for example, the block copolymer hydride (D), After mixing the ultraviolet absorber and any other formulations, the block copolymer hydride (D) is brought into a molten state using a biaxial kneader, a roll mill, a Brabender mixer, an extruder, etc. Method of uniformly mixing.

3)熱可塑性樹脂(F) 3) Thermoplastic resin (F)

在本發明所使用的熱可塑性樹脂(以下,有稱為「熱可塑性樹脂(F)」之情形),係用以形成層積在含有上述樹脂組成物(E)之層(e)的一面或兩面之樹脂層(f),來提高多層膜的表面硬度之樹脂。 The thermoplastic resin (hereinafter referred to as a "thermoplastic resin (F)") used in the present invention is used to form a layer or a layer laminated on the side (e) containing the resin composition (E) or Resin layer (f) on both sides to improve the surface hardness of the multilayer film.

作為熱可塑性樹脂(F),係以具有優異的透明性且表面硬度較高的樹脂為佳。作為熱可塑性樹脂(F)的具體例,可列舉出聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等的聚酯;降莰烯系多環單體類的開環複分解聚合物氫化物、降莰烯及/或降莰烯系多環單體類與乙烯的加成共聚物等的環烯烴聚合物;聚苯乙烯;苯乙烯.甲基丙烯酸酯共聚物、苯乙烯.丙烯腈共聚物等的苯乙烯共聚物(苯乙烯與其它單體的共聚物);聚甲基丙烯酸甲酯、甲基丙烯酸酯(共)聚合物等的(甲基)丙烯酸酯(共)聚合物。該等可單獨使用1種,亦可併用2種以上。 The thermoplastic resin (F) is preferably a resin having excellent transparency and high surface hardness. Specific examples of the thermoplastic resin (F) include polyesters such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; norbornene-based polycyclic Cycloolefin polymers such as ring-opening metathesis polymers of monomers, norbornene and / or norbornene-based polycyclic monomers and addition copolymers of ethylene; polystyrene; styrene. Methacrylate copolymer, styrene. Styrene copolymers such as acrylonitrile copolymers (copolymers of styrene and other monomers); (meth) acrylate (co) polymerization of polymethyl methacrylate, methacrylate (co) polymers, etc. Thing. These may be used individually by 1 type, and may use 2 or more types together.

又,在本發明,所謂「(甲基)丙烯酸酯(共)聚合物」,係意味著使用1種類的(甲基)丙烯酸酯而得到的同元聚合物及/或使用複數種類的(甲基)丙烯酸酯而得到的共聚物。 In the present invention, the "(meth) acrylate (co) polymer" means a homopolymer obtained by using one type of (meth) acrylate and / or using a plurality of types (a Acrylate) copolymer.

而且,在本發明,所謂「甲基丙烯酸酯(共)聚合物」,係意味著使用1種類的甲基丙烯酸酯而得到的同元聚合物、及/或使用複數種類的甲基丙烯酸酯而得到的共聚物。 In the present invention, the "methacrylate (co) polymer" means a homopolymer obtained by using one type of methacrylate and / or a plurality of types of methacrylate The copolymer obtained.

而且,在本發明,所謂「(甲基)丙烯醯基」,係意味著丙烯醯基及/或甲基丙烯醯基。 In addition, in the present invention, "(meth) acrylfluorenyl" means acrylfluorenyl and / or methacrylfluorenyl.

該等之中,成型為薄膜時,除了改善表面硬度以外,從低雙折射性的觀點而言,係以環烯烴聚合物及/或甲基丙烯酸酯(共)聚合物為佳,從防濕性的觀點而言,係以環烯烴聚合物、聚苯乙烯及/或苯乙烯共聚物為佳。該等熱可塑性樹脂(F),係例如能夠利用工業上市售的樹脂。 Among these, in addition to improving the surface hardness when molding into a thin film, a cycloolefin polymer and / or a methacrylate (co) polymer is preferred from the viewpoint of low birefringence, and it is moisture-proof In terms of performance, a cycloolefin polymer, polystyrene, and / or a styrene copolymer is preferred. These thermoplastic resins (F) are, for example, resins that can be used commercially.

4)多層膜 4) multilayer film

本發明的多層膜,其特徵在於包含:層(e);樹脂層(f),其係層積在層(e)的一面或兩面;及硬塗層(h),其係層積在至少一個樹脂層(f)之與前述層(e)接觸的面為相反側的面。 The multilayer film of the present invention is characterized by comprising: a layer (e); a resin layer (f), which is laminated on one or both sides of the layer (e); and a hard coat layer (h), which is laminated on at least The surface of one resin layer (f) that is in contact with the layer (e) is the surface on the opposite side.

[層(e)] [Layer (e)]

層(e)係使用樹脂組成物(E)而形成之層,為透明、雙折射較小且具有優異的水蒸氣遮蔽性,而且具有遮蔽紫外線的功能之層。 The layer (e) is a layer formed using the resin composition (E), and is a layer which is transparent, has low birefringence, has excellent water vapor shielding properties, and has a function of shielding ultraviolet rays.

層(e)的厚度,係通常10μm以上、150μm以下,以15μm以上、100μm以下為佳,較佳為20μm以上、50μm以下。使層(e)的厚度成為前述範圍的下限以上時,例如在使用作為偏光片的保護膜時,水蒸氣遮蔽性良好。而且防止偏光膜的破損等之操作性提升。另一方面,藉由使層(e)的厚度成為前述範圍的上限以下,因為能夠抑制偏光膜全體的厚度,乃是較佳。 The thickness of the layer (e) is usually 10 μm or more and 150 μm or less, preferably 15 μm or more and 100 μm or less, and more preferably 20 μm or more and 50 μm or less. When the thickness of the layer (e) is greater than or equal to the lower limit of the aforementioned range, for example, when a protective film as a polarizer is used, the water vapor shielding property is good. In addition, operability for preventing damage to the polarizing film is improved. On the other hand, it is preferable that the thickness of the layer (e) be equal to or less than the upper limit of the aforementioned range because the thickness of the entire polarizing film can be suppressed.

[樹脂層(f)] [Resin layer (f)]

樹脂層(f)係含有熱可塑性樹脂(F)之層。在樹脂層(f)中之熱可塑性樹脂(F)的含量,係通常95重量%以上,以97重量%以上為佳,較佳為99重量%以上,為100重量%以下。 The resin layer (f) is a layer containing a thermoplastic resin (F). The content of the thermoplastic resin (F) in the resin layer (f) is usually 95% by weight or more, preferably 97% by weight or more, more preferably 99% by weight or more and 100% by weight or less.

作為樹脂層(f)中之熱可塑性樹脂(F)以外的成分,可列舉出光安定劑、抗氧化劑、抗黏結劑等。該等具體例,可列舉出與能夠調配在前述樹脂組成物(E)已列出者同樣物。而且,該等可單獨使用1種,亦可併用2種以上。 Examples of components other than the thermoplastic resin (F) in the resin layer (f) include a light stabilizer, an antioxidant, and an anti-adhesive agent. As these specific examples, the thing similar to what can be mix | blended with the said resin composition (E) can be mentioned. Moreover, these may be used individually by 1 type, and may use 2 or more types together.

樹脂層(f)係層積在層(e)的一面或兩面,來改善多層膜的機械強度、柔軟性,而且達成改善多層膜的表面負傷性之任務。又,在多層膜的熔融押出成型時,藉由樹脂層(f)以接 觸鑄造滾筒的方式成型,能夠防止鑄造滾筒的污染附著,且能夠得到表面缺陷為較少且面狀優異的適合於光學用薄膜之多層膜。 The resin layer (f) is laminated on one or both sides of the layer (e) to improve the mechanical strength and flexibility of the multilayer film, and to achieve the task of improving the surface damage of the multilayer film. In addition, when the multilayer film is melt-extruded, the resin layer (f) is formed so as to be in contact with the casting drum, thereby preventing contamination and adhesion of the casting drum, and being suitable for optics with fewer surface defects and excellent planarity. Multilayer film with thin film.

樹脂層(f)的厚度,係通常為0.5μm以上、40μm以下,以1.0μm以上、30μm以下為佳,較佳為1.5μm以上、20μm以下。藉由使樹脂層(f)的厚度成為前述範圍的下限以上,能夠使改善多層膜的表面負傷性之效果充分地顯現。又,藉由使樹脂層(f)的厚度成為前述範圍的上限以下,多層膜的全體厚度不會變為太厚。 The thickness of the resin layer (f) is usually 0.5 μm or more and 40 μm or less, preferably 1.0 μm or more and 30 μm or less, and more preferably 1.5 μm or more and 20 μm or less. By setting the thickness of the resin layer (f) to be equal to or more than the lower limit of the aforementioned range, the effect of improving the surface flawability of the multilayer film can be sufficiently exhibited. Moreover, by making the thickness of the resin layer (f) below the upper limit of the aforementioned range, the entire thickness of the multilayer film does not become too thick.

在此,本發明的多層膜亦可在層(e)與樹脂層(f)之間,進一步具有接著劑層(g)。 Here, the multilayer film of the present invention may further include an adhesive layer (g) between the layer (e) and the resin layer (f).

作為接著劑層(g),從接著性、透明性、低雙折射性、及耐熱性的觀點而言,例如能夠適合使用由可使用在本發明的多層膜的層(e)之導入有烷氧矽基及/或酸酐基之嵌段共聚物氫化物(D)所構成之層。又,使用由上述嵌段共聚物氫化物(D)所構成之層作為接著劑層(g)時,該層係以不含有紫外線吸收劑為佳。 As the adhesive layer (g), from the viewpoints of adhesiveness, transparency, low birefringence, and heat resistance, for example, an alkane introduced from the layer (e) that can be used in the multilayer film of the present invention can be suitably used. A layer composed of an oxysilane-based and / or anhydride-based block copolymer hydride (D). When a layer composed of the block copolymer hydride (D) is used as the adhesive layer (g), it is preferable that the layer does not contain an ultraviolet absorber.

本發明的多層膜係具有接著劑層(g)時,接著劑層(g)的厚度係通常為0.5μm以上、10μm以下,以1μm以上、7μm以下為佳,較佳為1.5μm以上、5μm以下。 When the multilayer film of the present invention has an adhesive layer (g), the thickness of the adhesive layer (g) is usually 0.5 μm or more and 10 μm or less, preferably 1 μm or more and 7 μm or less, and more preferably 1.5 μm or more and 5 μm. the following.

[硬塗層(h)] [Hard Coating (h)]

本發明的多層膜係為了防止表面損傷,而在樹脂層(f)之與層(e)接觸之面為相反側的面形成有硬塗層(h)。藉由層積硬塗層(h),能夠進一步提高多層膜的表面硬度、耐負傷性。 In order to prevent surface damage, the multilayer film of the present invention has a hard coat layer (h) formed on the surface of the resin layer (f) in contact with the layer (e) on the opposite side. By laminating the hard coat layer (h), it is possible to further improve the surface hardness and scratch resistance of the multilayer film.

在此,硬塗層(h)係能夠使用硬塗劑(以下,有稱為「硬塗 劑(H)」之情形)。硬塗劑(H)係含有硬塗材料且任意地含有填料及其它添加劑。 Here, the hard coat layer (h) can be a hard coat agent (hereinafter, sometimes referred to as a "hard coat agent (H)"). The hard coating agent (H) contains a hard coating material and optionally a filler and other additives.

作為硬塗材料,可列舉出有機聚矽氧系、三聚氰胺系、環氧系、丙烯酸系、胺甲酸乙酯丙烯酸酯系等的有機硬塗材料、二氧化矽(SiO2)等的無機硬塗材料。該等可單獨使用1種,亦可併用2種以上。其中,以有機聚矽氧烷系等的有機聚矽氧系、多官能丙烯酸酯系等的丙烯酸系有機硬塗材料為佳。而且,因為接著力良好且硬塗層的生產性良好,以多官能丙烯酸酯系等的丙烯酸系硬塗材料為特佳。 Examples of the hard coating material include organic hard coating materials such as organic polysiloxane, melamine, epoxy, acrylic, and urethane acrylate, and inorganic hard coatings such as silicon dioxide (SiO 2 ). material. These may be used individually by 1 type, and may use 2 or more types together. Among these, an acrylic organic hard coating material such as an organic polysiloxane-based organic polysiloxane-based or a polyfunctional acrylate-based acrylic resin is preferred. In addition, since the adhesive force is good and the productivity of the hard coat layer is good, an acrylic hard coat material such as a polyfunctional acrylate is particularly preferred.

作為填料,可列舉出氧化鈦、氧化鋯、氧化鋅、氧化錫、氧化鈰、五氧化二銻(Sb2O5)、摻雜有錫之氧化銦(ITO)、摻雜有銻之氧化錫(IZO)、摻雜有鋁之氧化鋅(AZO)、摻雜有氟之氧化錫(FTO)。該等可單獨使用1種,亦可併用2種以上。 Examples of the filler include titanium oxide, zirconia, zinc oxide, tin oxide, cerium oxide, antimony pentoxide (Sb 2 O 5 ), tin-doped indium oxide (ITO), and antimony-doped tin oxide (IZO), aluminum-doped zinc oxide (AZO), fluorine-doped tin oxide (FTO). These may be used individually by 1 type, and may use 2 or more types together.

作為其它添加劑,可列舉出光聚合起始劑、抗氧化劑、紫外線吸收劑、光安定劑、抗靜電劑、調平劑、消泡劑等的各種添加劑。該等可單獨使用1種,亦可併用2種以上。 Examples of the other additives include various additives such as a photopolymerization initiator, an antioxidant, an ultraviolet absorber, a light stabilizer, an antistatic agent, a leveling agent, and an antifoaming agent. These may be used individually by 1 type, and may use 2 or more types together.

又,硬塗劑(H)中的填料之含量,係相對於硬塗材料100重量份,以100重量份以上、500重量份以下為佳,以150重量份以上、400重量份以下為較佳。又,硬塗劑(H)中的光聚合起始劑之含量,係相對於硬塗材料(特別是有機硬塗材料)100重量份,以0.1重量份以上、10重量份以下為佳,以0.5重量份以上、5重量份以下為較佳。 The content of the filler in the hard coating agent (H) is preferably 100 parts by weight or more and 500 parts by weight or less based on 100 parts by weight of the hard coating material, and more preferably 150 parts by weight or more and 400 parts by weight or less. . The content of the photopolymerization initiator in the hard coating agent (H) is preferably 0.1 parts by weight or more and 10 parts by weight or less based on 100 parts by weight of the hard coating material (especially the organic hard coating material). More preferably, it is 0.5 weight part or more and 5 weight part or less.

硬塗層(h)的厚度係沒有特別限定,通常1μm以上、10μm以下,以2μm以上、8μm以下為佳,較佳為3μm以 上、6μm以下程度。 The thickness of the hard coat layer (h) is not particularly limited, but it is usually 1 m or more and 10 m or less, preferably 2 m or more and 8 m or less, and more preferably 3 m or more and 6 m or less.

在本發明的多層膜,藉由在層(e)的表面層積樹脂層(f),進而在樹脂層(f)的最表面層積硬塗層(h),能夠將依據JIS K566-5-4方法所測定的刮痕硬度(鉛筆法)改善至H以上,較佳為2H以上。 By laminating the resin layer (f) on the surface of the layer (e) and the hard coat layer (h) on the outermost surface of the resin layer (f) in the multilayer film of the present invention, it is possible to conform to JIS K566-5 The scratch hardness (pencil method) measured by the -4 method is improved to H or more, and preferably 2H or more.

[多層膜之製造方法] [Manufacturing method of multilayer film]

本發明的多層膜之製造方法係沒有特別限制,能夠應用通常製造多層膜之方法。例如,首先將具有層(e)及樹脂層(f)但不具有硬塗層(h)的薄膜(以下,有稱為「積層膜(m)」之情形)成型之後,藉由在所得到的積層膜(m)的樹脂層(f)之與層(e)接觸的面為相反側的面成膜形成硬塗層(h),而能夠得到本發明的多層膜。 The manufacturing method of the multilayer film of this invention is not specifically limited, The method of manufacturing a multilayer film normally can be applied. For example, first, a film having a layer (e) and a resin layer (f) but not a hard coat layer (h) (hereinafter referred to as a "laminated film (m)") is formed, and then obtained by The surface of the resin layer (f) of the multilayer film (m) that is in contact with the layer (e) is formed on the opposite side to form a hard coat layer (h), and the multilayer film of the present invention can be obtained.

作為應用在積層膜(m)的製造方法之成型法,例如能夠應用2種3層多層共押出成型法;亦包含接著劑層(g)之3種5層多層共押出成型法;在使用熔融押出成型法等而成型之含有熱可塑性樹脂(F)之薄膜(樹脂層(f))上,將樹脂組成物(E)熔融押出而成為2種2層或2種3層的積層膜之押出貼合成型法;成為亦包含接著劑層(g)之3種3層或3種5層的積層膜之押出貼合成型法等。 As the molding method applied to the manufacturing method of the laminated film (m), for example, two kinds of three-layer multilayer co-extrusion molding methods can be applied; the three kinds of five-layer multilayer co-extrusion molding methods including the adhesive layer (g) can also be used; The resin composition (E) is melt-extruded on a film (resin layer (f)) containing a thermoplastic resin (F) formed by an extrusion molding method or the like to extrude two or two layers or two or three layers of a laminated film. Lamination method: a method of extruding a lamination method which is a laminated film including three kinds of three layers or three kinds of five layers of an adhesive layer (g).

在任一種成型法,為了防止鑄造滾筒的污染附著,係以樹脂層(f)接觸鑄造滾筒且層(e)不直接接觸鑄造滾筒之方式進行押出成型為佳。 In any molding method, in order to prevent contamination of the casting drum, it is preferable to perform extrusion molding in such a manner that the resin layer (f) contacts the casting drum and the layer (e) does not directly contact the casting drum.

薄片的成型條件,係依照成型方法而適當地選擇,例如使用熔融押出成型法時,樹脂溫度係、通常為180℃ 以上、250℃以下,以190℃以上、240℃以下為佳,較佳是在200℃以上、230℃以下的範圍適當地選擇。樹脂溫度太低時流動性變差,所成型的多層薄片之表面平滑性容易低落。而且薄片的押出速度無法提升而工業生產性有較差之傾向。樹脂溫度太高時,嵌段共聚物氫化物(D)的熱安定性變為不良,且所得到的多層膜之機械強度有低落之虞。 The molding conditions of the sheet are appropriately selected according to the molding method. For example, when the melt extrusion molding method is used, the resin temperature is usually 180 ° C or higher and 250 ° C or lower, and preferably 190 ° C or higher and 240 ° C or lower. It is appropriately selected in a range of 200 ° C or higher and 230 ° C or lower. When the resin temperature is too low, the fluidity becomes poor, and the smoothness of the surface of the formed multilayer sheet is liable to decrease. Moreover, the sheet extrusion speed cannot be improved, and the industrial productivity tends to be poor. When the resin temperature is too high, the thermal stability of the block copolymer hydride (D) becomes poor, and the mechanical strength of the obtained multilayer film may decrease.

在本發明,使樹脂組成物(E)及熱可塑性樹脂(F)在押出機內熔融且從安裝在該押出機之擠壓模擠出之前,以使熔融狀態的樹脂通過齒輪幫浦和過濾器為佳。藉由使用齒輪幫浦,能夠使樹脂的押出量之均勻性提升且使厚度不均減低。而且藉由使用過濾器將樹脂中的異物除去,能夠得到無缺陷且具有優異的外觀之適合於光學用途之多層膜。 In the present invention, before the resin composition (E) and the thermoplastic resin (F) are melted in an extruder and extruded from an extrusion die installed in the extruder, the molten resin is passed through a gear pump and a filter. Better. By using a gear pump, the uniformity of the resin extrusion amount can be improved and the thickness unevenness can be reduced. Furthermore, by removing foreign matter in the resin by using a filter, a multilayer film suitable for optical applications without defects and having an excellent appearance can be obtained.

其次,成膜形成硬塗層(h)。作為成膜形成硬塗層(h)之方法,係沒有特別限制,能夠採用習知的方法。例如塗佈含有丙烯酸系硬塗材料之硬塗劑(H)且藉由紫外線、電子射線等而使其交聯硬化、或塗佈含有聚矽氧系、三聚氰胺系、及/或環氧系的硬塗材料之硬塗劑(H)且使其熱硬化來進行。 Next, a film is formed to form a hard coat layer (h). The method for forming the film to form the hard coat layer (h) is not particularly limited, and a known method can be adopted. For example, a hard coating agent (H) containing an acrylic hard coating material is applied and cross-linked and hardened by ultraviolet rays, electron beams, or the like, or a silicone-based, melamine-based, and / or epoxy-based coating agent is applied. The hard coating material (H) is hard-cured and is thermally cured.

作為本發明的多層膜之層結構,具體而言可列舉出下列,但是不被該等限定。 Specific examples of the layer structure of the multilayer film of the present invention include the following, but are not limited thereto.

硬塗層(h)/樹脂層(f)/層(e)、硬塗層(h)/樹脂層(f)/接著劑層(g)/層(e)、硬塗層(h)/樹脂層(f)/層(e)/樹脂層(f)、硬塗層(h)/樹脂層(f)/接著劑層(g)/層(e)/接著劑層(g)/樹脂層(f) Hard coat layer (h) / resin layer (f) / layer (e), hard coat layer (h) / resin layer (f) / adhesive layer (g) / layer (e), hard coat layer (h) / Resin layer (f) / layer (e) / resin layer (f), hard coat layer (h) / resin layer (f) / adhesive layer (g) / layer (e) / adhesive layer (g) / resin Layer (f)

本發明的多層膜係面內相位差(Re)值為小且雙折射為小者。本發明的多層膜之雙折射為小,例如能夠從使用本 申請案說明書的實施例所記載的方法測定而得到的面內相位差(Re)值,係以3nm以下為佳,較佳為1nm以下來確認。 The multilayer film of the present invention has a small in-plane retardation (Re) value and a small birefringence. The birefringence of the multilayer film of the present invention is small. For example, the in-plane retardation (Re) value that can be measured by a method described in the examples of the specification of the present application is preferably 3 nm or less, and more preferably 1 nm. Check it out below.

又,本發明的多層膜係具有優異的紫外線遮蔽性能。本發明的多層膜具有優異的紫外線遮蔽性能,例如能夠從使用本申請案說明書的實施例所記載的方法測定而得到之在波長380nm的多層膜之光線透射率,係以1%以下為佳,較佳為0.5%以下,在波長300nm的多層膜之光線透射率,係以0.5%以下為佳,較佳為0.1%以下來確認。 The multilayer film of the present invention has excellent ultraviolet shielding performance. The multilayer film of the present invention has excellent ultraviolet shielding performance. For example, the light transmittance of the multilayer film at a wavelength of 380 nm, which can be measured by using the method described in the examples of the specification of the present application, is preferably 1% or less. It is preferably 0.5% or less, and the light transmittance of the multilayer film having a wavelength of 300 nm is preferably 0.5% or less, and more preferably 0.1% or less for confirmation.

而且,本發明的多層膜係具有優異的水蒸氣遮蔽性。本發明的多層膜具有優異的水蒸氣遮斷性,例如能夠從使用本申請案說明書的實施例所記載的方法測定而得到的透濕度,係以8g/m2.24h以下為佳,較佳為2g/m2.24h以下來確認。 The multilayer film of the present invention has excellent water vapor shielding properties. The multilayer film of the present invention has excellent water vapor blocking properties. For example, the water vapor transmission rate measured by a method described in an example of the specification of the present application is 8 g / m 2 . It is preferably below 24h, more preferably 2g / m 2 . Please confirm within 24h.

又,本發明的多層膜亦具有優異的表面耐負傷性。本發明的多層膜具有優異的表面耐負傷性,例如能夠從使用本申請案說明書之實施例所記載的方法測定而得到的刮痕硬度(鉛筆法),係以H以上為佳,較佳為2H以上來確認。 In addition, the multilayer film of the present invention also has excellent surface damage resistance. The multilayer film of the present invention has excellent surface damage resistance. For example, the scratch hardness (pencil method) that can be measured from the method described in the examples of the specification of the present application is preferably H or more, and more preferably 2H or more to confirm.

[本發明的多層膜之用途] [Use of the multilayer film of the present invention]

本發明的多層膜係如上述,因為具有優異的紫外線遮蔽性能及表面耐負傷性,所以能夠適合使用作為偏光板保護膜。又,本發明的多層膜係除了偏光板保護膜用途以外,例如亦能夠使用在屋頂材料、天花板材料、壁材、窗戶材料等的汽車、建築物、農業溫室等的用途;醫藥品、食品、飲料水等的保護膜用途;亮度提升薄膜、透明導電膜、觸控面板用基板、液晶基板、光擴散片、稜鏡片等的液晶顯示裝置等所使用的構件用 途;層積在玻璃板、透明塑膠版等的表面、或介於複數片玻璃板、透明塑膠板等之間之紫外線遮蔽物品用途等。 As described above, the multilayer film of the present invention can be suitably used as a polarizing plate protective film because it has excellent ultraviolet shielding performance and surface damage resistance. In addition, the multilayer film of the present invention can be used in applications such as roofing materials, ceiling materials, wall materials, window materials, automobiles, buildings, agricultural greenhouses, and the like, in addition to polarizing plate protective film applications; pharmaceuticals, foods, Application of protective films such as drinking water; use of components such as liquid crystal display devices such as brightness enhancement films, transparent conductive films, substrates for touch panels, liquid crystal substrates, light diffusion sheets, and cymbals; laminated on glass plates, transparent The surface of plastic plates, etc., or the use of ultraviolet shielding materials between multiple glass plates, transparent plastic plates, etc.

實施例     Examples    

邊揭示實施例邊更詳細地說明本發明,但是本發明係完全不被以下的實施例限定。而且「份」及「%」係只要未預先告知,就是重量基準。 The present invention will be described in more detail while the examples are disclosed, but the present invention is not limited to the following examples at all. In addition, "part" and "%" are based on weight as long as they are not notified in advance.

在本實施例之評價,係使用以下方法而進行。 The evaluation in this example was performed using the following method.

(1)重量平均分子量(Mw)及分子量分布(Mw/Mn)     (1) Weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn)    

嵌段共聚物及嵌段共聚物氫化物的分子量,係使用以THF作為洗滌液之GPC(TOSOH公司製、商品名「HLC8020GPC」),設為標準聚苯乙烯換算值且於38℃測定。 The molecular weights of the block copolymer and the block copolymer hydride were measured at 38 ° C. using GPC (manufactured by TOSOH Corporation, trade name “HLC8020GPC”) using THF as a washing solution, and using standard polystyrene conversion values.

又,嵌段共聚物中的特定聚合物嵌段之重量平均分子量,係將該嵌段共聚物的重量平均分子量設為MwX,將在該嵌段共聚物,該特定聚合物嵌段所佔有的重量分率設為wY(重量%),依照下述式而算出。又,特定聚合物嵌段的重量分率wY(重量%),係從形成該聚合物嵌段所使用的單體之添加量、及在聚合結束階段的聚合轉化率算出。 The weight average molecular weight of the specific polymer block in the block copolymer refers to the weight average molecular weight of the block copolymer as MwX. The weight fraction was set to wY (% by weight), and was calculated according to the following formula. The weight fraction wY (% by weight) of the specific polymer block is calculated from the amount of the monomers used to form the polymer block and the polymerization conversion rate at the end of the polymerization.

聚合物嵌段的重量平均分子量=MwX×wY/100 Weight average molecular weight of polymer block = MwX × wY / 100

(2)氫化率     (2) hydrogenation rate    

嵌段共聚物氫化物的主鏈、側鏈及芳香環之氫化率(莫耳%),係測定嵌段共聚物氫化物及前驅物之嵌段共聚物的1H-NMR光譜而算出。 The hydrogenation rates (mole%) of the main chain, side chain, and aromatic ring of the block copolymer hydride are calculated by measuring the 1 H-NMR spectrum of the block copolymer hydride and precursor block copolymer.

(3)多層膜的雙折射     (3) Birefringence of multilayer film    

自動雙折射計使用(王子計量機器公司製、商品名 「KOBLA-21ADH」),在多層膜的寬度方向以50mm間隔且在200mm範圍測定面內相位差(Re)。將全部測定結果平均而作為多層膜的面內相位差(Re)值。Re之值越小,雙折射越小。 An automatic birefringence meter ("KOBLA-21ADH" manufactured by Oji Metrology Co., Ltd.) was used, and the in-plane retardation (Re) was measured in the width direction of the multilayer film at intervals of 50 mm and within a range of 200 mm. All the measurement results were averaged and used as the in-plane retardation (Re) value of the multilayer film. The smaller the value of Re, the smaller the birefringence.

(4)多層膜的紫外線遮蔽性能     (4) UV shielding performance of multilayer films    

使用紫外可見分光光度計(日本分光公司製、商品名「V-570」),在紫外線區域的波長380nm及300nm測定多層膜的光線透射率。光線透射率越小,紫外線遮蔽性能越優異。 The ultraviolet-visible spectrophotometer (manufactured by JASCO Corporation, trade name "V-570") was used to measure the light transmittance of the multilayer film at wavelengths of 380 nm and 300 nm in the ultraviolet region. The smaller the light transmittance, the better the ultraviolet shielding performance.

(5)多層膜的水蒸氣遮蔽性     (5) Water vapor shielding property of multilayer film    

將多層膜作為測試片,依據JIS K 7129(A法),在溫度40℃、濕度90%RH的條件下,使用水蒸氣透過度測試器(LYSSY公司製、商品名「L80-5000型」)而測定透濕度。透濕度為越小,水蒸氣遮蔽性越優異。 Using a multilayer film as a test piece, a water vapor transmission tester (manufactured by LYSSY, trade name "L80-5000") was used in accordance with JIS K 7129 (Method A) under conditions of a temperature of 40 ° C and a humidity of 90% RH. The moisture permeability was measured. The smaller the moisture permeability is, the better the water vapor shielding property is.

(6)多層膜的表面的耐負傷性     (6) Injury resistance of the surface of the multilayer film    

將多層膜作為測試片,依據JIS K 5600-5-4,而測定在溫度23℃之刮痕硬度(鉛筆法)。評價係將刮痕硬度為2H以上的情況判定為良好(X),將H以上的情況判定為容許(Y),將小於H的情況判定為不充分(Z)。 A multilayer film was used as a test piece, and the scratch hardness at a temperature of 23 ° C. (pencil method) was measured in accordance with JIS K 5600-5-4. The evaluation system judged the case where the scratch hardness was 2H or more as good (X), the case where H was more than as allowable (Y), and the case where it was less than H as insufficient (Z).

[製造例1]嵌段共聚物氫化物(D1)的製造 [Production Example 1] Production of block copolymer hydride (D 1 )

[嵌段共聚物(C1)] [Block copolymer (C 1 )]

在內部充分地經氮氣取代的具備攪拌裝置之反應器,添加脫水環己烷300份、作為芳香族乙烯系化合物的脫水苯乙烯73.0份、及正二丁醚0.475份。將全部內容物在60℃邊攪拌邊添加正丁基鋰的15%環己烷溶液0.75份,而使聚合開始。正丁基鋰溶液的滴下結束後,進一步在60℃攪拌全部內容物60 分鐘。在該時點藉由氣體層析法而測定之聚合轉化率為99.5%。 In a reactor equipped with a stirring device sufficiently substituted with nitrogen inside, 300 parts of dehydrated cyclohexane, 73.0 parts of dehydrated styrene as an aromatic vinyl compound, and 0.475 parts of n-dibutyl ether were added. 0.75 parts of a 15% cyclohexane solution of n-butyllithium was added to the entire contents while stirring at 60 ° C to start polymerization. After the dropping of the n-butyllithium solution was completed, the entire contents were further stirred at 60 ° C for 60 minutes. The polymerization conversion rate measured by gas chromatography at this point was 99.5%.

其次,在反應液添加作為鏈狀共軛二烯化合物之脫水異戊二烯18.0份,在該狀態下繼續攪拌30分鐘。在該時點之聚合轉化率為99.5%。隨後,進一步添加作為芳香族乙烯系化合物的脫水苯乙烯9.0份,且攪拌60分鐘。在該時點之聚合轉化率為大約100%。在此,在反應混合物添加異丙醇0.5份而使反應停止。所得到的聚合物溶液中所含有之依照以下的順序具有由源自苯乙烯的結構單元所構成之聚合物嵌段(A1)、由源自異戊二烯的結構單元所構成之聚合物嵌段(B)、由源自苯乙烯的結構單元所構成之聚合物嵌段(A2)而成之嵌段共聚物(C1)的重量平均分子量(Mw)為57,300,分子量分布(Mw/Mn)為1.03,wA1:wB:wA2=73:18:9。又,聚合物嵌段(A1)的重量平均分子量Mw(A1)為41,600,聚合物嵌段(A2)的重量平均分子量Mw(A2)為5,200。 Next, 18.0 parts of dehydrated isoprene as a chain conjugated diene compound was added to the reaction solution, and stirring was continued for 30 minutes in this state. The polymerization conversion rate at this point was 99.5%. Subsequently, 9.0 parts of dehydrated styrene as an aromatic vinyl compound was further added and stirred for 60 minutes. The polymerization conversion at this point was about 100%. Here, 0.5 part of isopropyl alcohol was added to the reaction mixture to stop the reaction. The obtained polymer solution contained a polymer block (A 1 ) composed of a structural unit derived from styrene and a polymer composed of a structural unit derived from isoprene in the following order. The weight average molecular weight (Mw) of the block (B) and the block copolymer (C 1 ) composed of the polymer block (A 2 ) composed of a structural unit derived from styrene was 57,300, and the molecular weight distribution (Mw / Mn) was 1.03, wA 1 : wB: wA 2 = 73: 18: 9. Further, polymer block (A 1) weight average molecular weight Mw (A 1) was 41,600, the polymer block (A 2) weight average molecular weight Mw of (A 2) was 5,200.

[嵌段共聚物氫化物(D1)] [Block copolymer hydride (D 1 )]

其次,將上述聚合物溶液移送至具備攪拌裝置之耐壓反應器,添加作為氫化觸媒之矽藻土負載型鎳觸媒(日揮觸媒化成公司製、商品名「E22U」、鎳負載量60%)8.0份及脫水環己烷100份且進行混合。將耐壓反應器內部以氫氣取代,而且邊攪拌溶液邊供給氫氣,在溫度190℃、壓力4.5MPa進行氫化反應6小時。氫化反應後的嵌段共聚物氫化物(D1)之重量平均分子量(Mw)為60,700,分子量分布(Mw/Mn)為1.04。 Next, the polymer solution was transferred to a pressure-resistant reactor equipped with a stirring device, and a diatomite-supported nickel catalyst (produced by Nippon Kasei Kasei Kasei Co., Ltd., trade name "E22U", nickel loading amount 60) was added as a hydrogenation catalyst. %) 8.0 parts and dehydrated cyclohexane 100 parts and mixed. The pressure-resistant reactor was replaced with hydrogen, and hydrogen was supplied while stirring the solution, and a hydrogenation reaction was performed at a temperature of 190 ° C and a pressure of 4.5 MPa for 6 hours. The weight average molecular weight (Mw) of the hydrogenated block copolymer (D 1 ) after the hydrogenation reaction was 60,700, and the molecular weight distribution (Mw / Mn) was 1.04.

氫化反應結束後,將反應溶液過濾而除去氫化觸媒後,添加溶解有酚系抗氧化劑之新戊四醇.肆[3-(3,5-二-第三 丁基-4-羥基苯基)丙酸酯](KOYO化學研究所公司製、商品名「Songnox1010」)0.1份而成之二甲苯溶液1.0份,且使經過氫化反應的聚合物溶解。 After the hydrogenation reaction is completed, the reaction solution is filtered to remove the hydrogenation catalyst, and neopentyl alcohol in which a phenolic antioxidant is dissolved is added. 1.0 part of xylene solution prepared from 0.1 part of [3- (3,5-di-third-butyl-4-hydroxyphenyl) propionate] (manufactured by KOYO Chemical Research Institute, trade name "Songnox1010") And dissolve the polymer after the hydrogenation reaction.

其次,將添加二甲苯溶液後之上述溶液,使用圓筒型濃縮乾燥器(日立製作所公司製、商品名「KONTRO」),藉由在溫度260℃、壓力0.001MPa以下的條件下進行濃縮乾燥,而將溶劑之環己烷及二甲苯、以及其它揮發成分從該溶液除去。將該濃縮操作連續進行,將得到的熔融聚合物,藉由連結至上述圓筒型濃縮乾燥器之具備孔徑5μm的不鏽鋼製燒結過濾器之聚合物過濾裝置(富士FILTER公司製),在溫度260℃進行過濾。過濾後,將熔融聚合物從模具押出成為股線狀。而且,押出後藉由冷卻且使用製粒機而製造嵌段共聚物氫化物(D1)的丸粒95份。 Next, the above solution after adding the xylene solution was concentrated and dried under the conditions of a temperature of 260 ° C. and a pressure of 0.001 MPa or less using a cylindrical concentration dryer (manufactured by Hitachi, Ltd., trade name “KONTRO”), The solvent such as cyclohexane and xylene, and other volatile components were removed from the solution. This concentration operation was continuously performed, and the obtained molten polymer was passed through a polymer filtration device (manufactured by Fuji Film Co., Ltd.) equipped with a sintered filter made of stainless steel having a pore size of 5 μm, which was connected to the above-mentioned cylindrical concentration dryer, at a temperature of 260. Filter at ℃. After filtration, the molten polymer was extruded from the mold into strands. After extrusion, 95 parts of pellets of the block copolymer hydride (D 1 ) were produced by cooling and using a granulator.

所得到的丸粒狀嵌段共聚物氫化物(D1)的重量平均分子量(Mw)為60,100,分子量分布(Mw/Mn)為1.10,氫化率為大約100%(99%以上)。 The weight average molecular weight (Mw) of the obtained pelletized block copolymer hydrogenated product (D 1 ) was 60,100, the molecular weight distribution (Mw / Mn) was 1.10, and the hydrogenation rate was approximately 100% (99% or more).

[製造例2]嵌段共聚物氫化物(D2)的製造 [Production Example 2] Production of block copolymer hydride (D 2 )

[嵌段共聚物(C2)] [Block copolymer (C 2 )]

除了將脫水苯乙烯及脫水異戊二烯分成3次,依照以下的順序添加脫水苯乙烯66.0份、脫水異戊二烯25.0份及脫水苯乙烯9.0份以外,係與製造例1同樣地進行聚合反應,以及使反應停止。在所得到的聚合物溶液中所含有依照以下的順序具有由源自苯乙烯的結構單元所構成之聚合物嵌段(A1)、由源自異戊二烯的結構單元所構成之聚合物嵌段(B)、由源自苯乙烯 的結構單元所構成之聚合物嵌段(A2)而成之嵌段共聚物(C2)的重量平均分子量(Mw)為56,200,分子量分布(Mw/Mn)為1.02,wA1:wB:wA2=66:25:9。又,聚合物嵌段(A1)的重量平均分子量Mw(A1)為36,900,聚合物嵌段(A2)的重量平均分子量Mw(A2)為5,100。 Polymerization was carried out in the same manner as in Production Example 1 except that dehydrated styrene and dehydrated isoprene were divided into three times, and 66.0 parts of dehydrated styrene, 25.0 parts of dehydrated isoprene, and 9.0 parts of dehydrated styrene were added in the following order. Reaction, and stop the reaction. The obtained polymer solution contained a polymer having a polymer block (A 1 ) composed of a structural unit derived from styrene and a polymer composed of a structural unit derived from isoprene in the following order. The weight average molecular weight (Mw) of the block (B) and the block copolymer (C 2 ) composed of the polymer block (A 2 ) composed of a structural unit derived from styrene was 56,200, and the molecular weight distribution (Mw / Mn) was 1.02, wA 1 : wB: wA 2 = 66: 25: 9. Further, polymer block (A 1) weight average molecular weight Mw (A 1) was 36,900, the polymer block (A 2) weight average molecular weight Mw of (A 2) of 5,100.

[嵌段共聚物氫化物(D2)] [Block copolymer hydride (D 2 )]

其次,將上述聚合物溶液與製造例1同樣地進行而進行氫化反應。氫化反應後的嵌段共聚物氫化物(D2)之重量平均分子量(Mw)為59,500,分子量分布(Mw/Mn)為1.03。 Next, the polymer solution was subjected to a hydrogenation reaction in the same manner as in Production Example 1. The weight average molecular weight (Mw) of the hydrogenated block copolymer (D 2 ) after the hydrogenation reaction was 59,500, and the molecular weight distribution (Mw / Mn) was 1.03.

氫化反應結束後,與製造例1同樣地添加酚系抗氧化劑後,進行濃縮乾燥而製造嵌段共聚物氫化物(D2)的丸粒94份。所得到的丸粒狀嵌段共聚物氫化物(D2)之重量平均分子量(Mw)為58,900,分子量分布(Mw/Mn)為1.08,氫化率為大約100%(99%以上)。 After the completion of the hydrogenation reaction, after adding a phenolic antioxidant in the same manner as in Production Example 1, it was concentrated and dried to produce 94 parts of pellets of a block copolymer hydrogenated product (D 2 ). The weight average molecular weight (Mw) of the obtained pelletized block copolymer hydrogenated product (D 2 ) was 58,900, the molecular weight distribution (Mw / Mn) was 1.08, and the hydrogenation rate was about 100% (99% or more).

[製造例3]嵌段共聚物氫化物(D3)的製造 [Production Example 3] Production of Block Copolymer Hydrogenate (D 3 )

[嵌段共聚物(C3)] [Block copolymer (C 3 )]

除了將脫水苯乙烯及脫水異戊二烯分成3次,依照以下的順序添加脫水苯乙烯57.0份、脫水異戊二烯18.0份及脫水苯乙烯25.0份以外,係與製造例1同樣地進行聚合反應,以及使反應停止。在所得到的聚合物溶液中所含有依照以下的順序具有由源自苯乙烯的結構單元所構成之聚合物嵌段(A1)、由源自異戊二烯的結構單元所構成之聚合物嵌段(B)、由源自苯乙烯的結構單元所構成之聚合物嵌段(A2)而成之嵌段共聚物(C3)的重量平均分子量(Mw)為56,200,分子量分布(Mw/Mn)為 1.02,wA1:wB:wA2=57:18:25。又,聚合物嵌段(A1)的重量平均分子量Mw(A1)為31,900,聚合物嵌段(A2)的重量平均分子量Mw(A2)為14,100。 Polymerization was carried out in the same manner as in Production Example 1 except that dehydrated styrene and dehydrated isoprene were divided into three times, and 57.0 parts of dehydrated styrene, 18.0 parts of dehydrated isoprene, and 25.0 parts of dehydrated styrene were added in the following order. Reaction, and stop the reaction. The obtained polymer solution contained a polymer having a polymer block (A 1 ) composed of a structural unit derived from styrene and a polymer composed of a structural unit derived from isoprene in the following order. The weight average molecular weight (Mw) of the block (B) and the block copolymer (C 3 ) composed of the polymer block (A 2 ) composed of a structural unit derived from styrene is 56,200, and the molecular weight distribution (Mw / Mn) was 1.02, wA 1 : wB: wA 2 = 57: 18: 25. Further, polymer block (A 1) weight average molecular weight Mw (A 1) was 31,900, the polymer block (A 2) weight average molecular weight Mw of (A 2) was 14,100.

[嵌段共聚物氫化物(D3)] [Block copolymer hydride (D 3 )]

其次,將上述聚合物溶液與製造例1同樣地進行而進行氫化反應。氫化反應後的嵌段共聚物氫化物(D3)之重量平均分子量(Mw)為60,300,分子量分布(Mw/Mn)為1.04。 Next, the polymer solution was subjected to a hydrogenation reaction in the same manner as in Production Example 1. The weight average molecular weight (Mw) of the hydrogenated block copolymer (D 3 ) after the hydrogenation reaction was 60,300, and the molecular weight distribution (Mw / Mn) was 1.04.

氫化反應結束後,與製造例1同樣地添加酚系抗氧化劑後,進行濃縮乾燥而製造嵌段共聚物氫化物(D3)的丸粒95份。所得到的丸粒狀嵌段共聚物氫化物(D3)之重量平均分子量(Mw)為59,000,分子量分布(Mw/Mn)為1.06,氫化率為大約100%(99%以上)。 After the completion of the hydrogenation reaction, after adding a phenolic antioxidant in the same manner as in Production Example 1, it was concentrated and dried to produce 95 parts of pellets of a block copolymer hydrogenated product (D 3 ). The weight average molecular weight (Mw) of the obtained pelletized block copolymer hydrogenated product (D 3 ) was 59,000, the molecular weight distribution (Mw / Mn) was 1.06, and the hydrogenation rate was approximately 100% (99% or more).

[製造例4]嵌段共聚物氫化物(D4)的製造 [Production Example 4] Production of block copolymer hydride (D 4 )

[嵌段共聚物(C4)] [Block copolymer (C 4 )]

除了將脫水苯乙烯及脫水異戊二烯分成3次,依照以下的順序添加脫水苯乙烯41.0份、脫水異戊二烯18.0份及脫水苯乙烯41.0份以外,係與製造例1同樣地進行聚合反應,以及使反應停止。在所得到的聚合物溶液中所含有依照以下的順序具有由源自苯乙烯的結構單元所構成之聚合物嵌段(A1)、由源自異戊二烯的結構單元所構成之聚合物嵌段(B)、由源自苯乙烯的結構單元所構成之聚合物嵌段(A2)而成之嵌段共聚物(C4)的重量平均分子量(Mw)為56,700,分子量分布(Mw/Mn)為1.02,wA1:wB:wA2=41:18:41。又,聚合物嵌段(A1)的重量平均分子量Mw(A1)為23,100,聚合物嵌段(A2)的重量平均 分子量Mw(A2)為23,300。 Polymerization was performed in the same manner as in Production Example 1 except that the dehydrated styrene and dehydrated isoprene were divided into three times, and 41.0 parts of dehydrated styrene, 18.0 parts of dehydrated isoprene, and 41.0 parts of dehydrated styrene were added in the following order. Reaction, and stop the reaction. The obtained polymer solution contained a polymer having a polymer block (A 1 ) composed of a structural unit derived from styrene and a polymer composed of a structural unit derived from isoprene in the following order. The weight average molecular weight (Mw) of the block (B) and the block copolymer (C 4 ) composed of the polymer block (A 2 ) composed of a structural unit derived from styrene was 56,700, and the molecular weight distribution (Mw / Mn) was 1.02, wA 1 : wB: wA 2 = 41: 18: 41. Further, polymer block (A 1) weight average molecular weight Mw (A 1) was 23,100, the polymer block (A 2) weight average molecular weight Mw of (A 2) was 23,300.

[嵌段共聚物氫化物(D4)] [Block copolymer hydride (D 4 )]

其次,將上述聚合物溶液與製造例1同樣地進行而進行氫化反應。氫化反應後的嵌段共聚物氫化物(D4)之重量平均分子量(Mw)為60,100,分子量分布(Mw/Mn)為1.07。 Next, the polymer solution was subjected to a hydrogenation reaction in the same manner as in Production Example 1. The weight average molecular weight (Mw) of the hydrogenated block copolymer (D 4 ) after the hydrogenation reaction was 60,100, and the molecular weight distribution (Mw / Mn) was 1.07.

氫化反應結束後,與製造例1同樣地添加酚系抗氧化劑後,進行濃縮乾燥而製造嵌段共聚物氫化物(D4)的丸粒93份。所得到的丸粒狀嵌段共聚物氫化物(D4)之重量平均分子量(Mw)為59,500,分子量分布(Mw/Mn)為1.07,氫化率為大約100%(99%以上)。 After the completion of the hydrogenation reaction, a phenol-based antioxidant was added in the same manner as in Production Example 1, and then concentrated and dried to produce 93 parts of pellets of a block copolymer hydrogenate (D 4 ). The weight average molecular weight (Mw) of the obtained pelletized block copolymer hydrogenated product (D 4 ) was 59,500, the molecular weight distribution (Mw / Mn) was 1.07, and the hydrogenation rate was approximately 100% (99% or more).

[製造例5]硬塗劑(H1)的製造 [Production Example 5] Production of Hard Coating Agent (H 1 )

在有機硬塗材料之含有丙烯醯基的寡聚物(日本合成化學工業公司製、商品名「UV-1700B」)100份,添加導電性微粒子(填料)之Sb2O5粒子(觸媒化成工業公司製、數量平均粒徑30nm)250份、光擴散劑(無機硬塗材料)之SiO2粒子(CI化成公司製、數量平均粒徑300nm)3份、及光聚合起始劑(CIBA.SPECIALTY.CHEMICALS公司製、商品名「IRGACURE(註冊商標)184」)2份,而且添加甲基丙烯醯基改性二甲基聚矽氧油(信越化學工業公司製、商品名「X-22-164A」)1份,藉由使用攪拌機以2000rpm攪拌5分鐘而製造硬塗劑(H1)。 Sb 2 O 5 particles (catalyzed into a catalyst) 250 parts by industrial company, number average particle size 30nm), 3 parts by light diffusion agent (inorganic hard coating material) SiO2 particles (manufactured by CI Kasei Co., Ltd., number average particle size 300nm), and photopolymerization initiator (CIBA.SPECIALTY .2 parts manufactured by CHEMICALS, trade name "IRGACURE (registered trademark) 184"), and methacrylfluorene-modified dimethyl polysiloxane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "X-22-164A ”) 1 part, and a hard coating agent (H 1 ) was produced by stirring at 2000 rpm for 5 minutes using a stirrer.

[製造例6]樹脂組成物(E1)的製造 [Production Example 6] Production of Resin Composition (E 1 )

在製造例1所製造的嵌段共聚物氫化物(D1)100份,添加紫外線吸收劑之(2-(5-氯-2H-苯并三唑-2-基)-6-第三丁基-對甲酚(UVA1)(住友化學公司製、商品名「SUMlSORB(註冊商 標)300」)6.0份且均勻地混合。將所得到的混合物使用雙軸押出機,在樹脂溫度210℃擠出。擠出後進行冷卻,其次使用製粒機進行切割而製造樹脂組成物(E1)的丸粒97份。將所製造的樹脂組成物(E1)之明細彙總顯示在表1。 100 parts of the hydrogenated block copolymer (D 1 ) produced in Production Example 1 was added with (2- (5-chloro-2H-benzotriazol-2-yl) -6-tert-butyl) as an ultraviolet absorber. 6.0 parts of base-p-cresol (UVA 1 ) (manufactured by Sumitomo Chemical Co., Ltd., trade name "SUMlSORB (registered trademark) 300") and uniformly mixed. The obtained mixture was extruded at a resin temperature of 210 ° C using a biaxial extruder out. after cooling the extrudate, followed by cutting pelletizer manufactured by the resin composition (E 1) 97 parts of the pellets. the resin composition for producing (E 1) summary of the detail shown in table 1.

[製造例7~10]樹脂組成物(E2)~(E5)的製造 [Production Examples 7 to 10] Production of Resin Compositions (E 2 ) to (E 5 )

除了各自使用製造例1~製造例4所製造的嵌段共聚物氫化物(D1)~(D4),在嵌段共聚物氫化物(D)100份,將紫外線吸收劑之2-(5-氯-2H-苯并三唑-2-基)-6.第三丁基-對甲酚(UVA1)及/或2-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)苯酚(UVA2)(住友化學公司製、商品名「SUMISORB(註冊商標)340」),以表1記載的量添加以外,係與製造例6同樣地進行而製造樹脂組成物(E2)~(E5)的丸粒。將所製造的樹脂組成物(E2)~(E5)之明細彙總顯示在表1。 Except that the block copolymer hydrides (D 1 ) to (D 4 ) produced in Production Examples 1 to 4 were used, 100 parts of the block copolymer hydride (D) was used. 5-chloro-2H-benzotriazol-2-yl) -6. Tert-butyl-p-cresol (UVA 1 ) and / or 2- (2H-benzotriazol-2-yl) -4- (1,1,3,3-tetramethylbutyl) phenol (UVA 2 ) (manufactured by Sumitomo Chemical Co., Ltd. under the trade name "SUMISORB (registered trademark) 340") was added in addition to the amount described in Table 1, and is related to manufacturing Example 6 was performed in the same manner to produce pellets of the resin compositions (E 2 ) to (E 5 ). A summary of the manufactured resin compositions (E 2 ) to (E 5 ) is shown in Table 1.

(實施例1)多層膜(m1h1) (Example 1) Multilayer film (m 1 h 1 )

[積層膜(m1)的製造] [Manufacture of laminated film (m 1 )]

使用樹脂組成物(E1)的丸粒、及作為熱可塑性樹脂之開環複分解聚合物氫化聚合物(F1)(日本ZEON公司製、商品名 「ZEONEX(註冊商標)690R」、玻璃轉移溫度136℃)的丸粒,而製造形成含有樹脂組成物(E1)之層(e1)為中間層、含有開環複分解聚合物氫化聚合物(F1)之樹脂層(f1)為表層之2種3層的積層膜(m1)。 Pellets using a resin composition (E 1 ), and a ring-opening metathesis polymer hydrogenated polymer (F 1 ) as a thermoplastic resin (manufactured by Japan Zeon Corporation, trade name "ZEONEX (registered trademark) 690R", glass transition temperature) 136 deg.] C) of the pellets produced resin composition is formed comprising (E 1) of the intermediate layer layer (e 1), for the complex containing the ring-opening (F 1) of the resin layer (f 1) for the decomposition of the polymer hydrogenated polymer skin Two kinds of three-layer laminated film (m 1 ).

具體而言,積層膜(m1)的製造,係使用具有具備20mmΦ的螺桿之單軸押出機2機之T型模具式2種3層薄膜成型機(T型模具寬度300mm)、及具備鏡面鑄造滾筒之薄片牽引機。而且積層薄膜的製造條件係設為樹脂組成物(E1)的樹脂溫度220℃、開環複分解聚合物氫化聚合物(F1)的樹脂溫度250℃、T型模具溫度250℃、鑄造滾筒溫度80℃。 Specifically, the laminated film (m 1 ) is manufactured by using a T-die type two-layer three-layer film forming machine (T-die width 300 mm) using a uniaxial extruder 2 machine with a screw having a diameter of 20 mm and a mirror surface. Thin film pulling machine for casting drum. The manufacturing conditions of the laminated film are set to a resin temperature of 220 ° C for the resin composition (E 1 ), a resin temperature of 250 ° C for the ring-opening metathesis polymer hydrogenated polymer (F 1 ), a T-die temperature of 250 ° C, and a casting drum temperature 80 ° C.

所製造的積層膜(m1)係具有(f1)/(e1)/(f1)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。 The manufactured multilayer film (m 1 ) has a three-layer structure of (f 1 ) / (e 1 ) / (f 1 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm).

[具有硬塗層(h1)之多層膜(m1h1)的製造] [Manufacture of a multilayer film (m 1 h 1 ) with a hard coating layer (h 1 )]

將製造例5所得到的硬塗劑(H1)使用桿塗佈器塗佈在上述所得到的積層膜(m1)之一面。塗佈後,使用紫外線照射機,在波長300~390nm的範圍以累計光量成為200mJ/cm2之方式進行照射紫外線。藉由該紫外線照射使硬塗劑(H1)硬化而形成厚度3μm的硬塗層(h1),來製造在一面層積有硬塗層(h)之多層膜(m1h1)。 The hard coating agent (H 1 ) obtained in Production Example 5 was applied to one surface of the obtained laminated film (m 1 ) using a rod coater. After the application, an ultraviolet ray was used to irradiate ultraviolet rays in a range of wavelengths of 300 to 390 nm so that the cumulative light amount became 200 mJ / cm 2 . The hard coating agent (H 1 ) is hardened by this ultraviolet irradiation to form a hard coating layer (h 1 ) having a thickness of 3 μm, thereby manufacturing a multilayer film (m 1 h 1 ) in which a hard coating layer (h) is laminated on one surface.

所製造的多層膜(m1h1),係具有(f1)/(e1)/(f1)/(h1)的4層結構,寬度為230mm、總厚度為43μm(各層厚度:10μm/20μm/10μm/3μm)。 The manufactured multilayer film (m 1 h 1 ) has a 4-layer structure of (f 1 ) / (e 1 ) / (f 1 ) / (h 1 ), with a width of 230 mm and a total thickness of 43 μm (thickness of each layer: 10 μm / 20 μm / 10 μm / 3 μm).

使用所製造的多層膜(m1h1),而進行測定薄膜的面內相位差(Re)、在紫外線區域的光線透射率、透濕度、及表面 刮痕硬度。 Using the produced multilayer film (m 1 h 1 ), the in-plane retardation (Re) of the film, light transmittance in the ultraviolet region, moisture permeability, and surface scratch hardness were measured.

其結果,面內相位差(Re)為0.9nm,光線透射率在380nm為2.3%、在300nm為0.0%,透濕度為1.6g/m2.24h。Re(雙折射)、光線透射率(紫外線遮蔽性能)、透濕度(水蒸氣遮蔽性)係任一者均為充分小的值。又,表面刮痕硬度為2H且評價為良好(X)。將評價結果彙總而記載在表2。 As a result, the in-plane retardation (Re) was 0.9 nm, the light transmittance was 2.3% at 380 nm, 0.0% at 300 nm, and the water vapor transmission rate was 1.6 g / m 2 . 24h. Re (birefringence), light transmittance (ultraviolet shielding performance), and water vapor transmission (water vapor shielding) are all sufficiently small values. The surface scratch hardness was 2H and evaluated as good (X). The evaluation results are summarized and described in Table 2.

(實施例2)多層膜(m2h1) (Example 2) Multilayer film (m 2 h 1 )

[積層膜(m2)的製造] [Manufacture of laminated film (m 2 )]

除了使用樹脂組成物(E2)的丸粒代替樹脂組成物(E1)以外,係與實施例1同樣地進行而製造形成含有樹脂組成物(E2)之層(e2)為中間層、含有開環複分解聚合物氫化聚合物(F1)之樹脂層(f1)為表層之2種3層的積層膜(m2)。 A layer (e 2 ) containing a resin composition (E 2 ) was produced as an intermediate layer in the same manner as in Example 1 except that pellets of the resin composition (E 2 ) were used instead of the resin composition (E 1 ). The resin layer (f 1 ) containing the ring-opening metathesis polymer hydrogenated polymer (F 1 ) is a two-layer, three-layer laminated film (m 2 ) of a surface layer.

所製造的積層膜(m2)係具有(f1)/(e2)/(f1)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。 The produced multilayer film (m 2 ) had a three-layer structure of (f 1 ) / (e 2 ) / (f 1 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm).

[具有硬塗層(h1)之多層膜(m2h1)的製造] [Manufacturing of multilayer film (m 2 h 1 ) with hard coat layer (h 1 )]

除了使用積層膜(m2)代替積層膜(m1)以外,係與實施例1同樣地進行而製造在一面層積有硬塗層(h1)之多層膜(m2h1)。 Except for using the laminated film (m 2) instead of the laminated film (m 1) except that system as in Example 1 in the same manner produced a multilayer film (m 2 h 1) one surface layer laminated on the hard coat layer (H 1) of.

所製造的多層膜(m2h1)係具有(f1)/(e2)/(f1)/(h1)的4層結構,寬度為230mm,總厚度為43μm(各層厚度:10μm/20μm/10μm/3μm)。 The manufactured multilayer film (m 2 h 1 ) has a 4-layer structure of (f 1 ) / (e 2 ) / (f 1 ) / (h 1 ), with a width of 230 mm and a total thickness of 43 μm (thickness of each layer: 10 μm / 20μm / 10μm / 3μm).

使用所製造的多層膜(m2h1)而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而記載在表2。 The produced multilayer film (m 2 h 1 ) was used to evaluate birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface scratch resistance. The evaluation results are summarized and described in Table 2.

(實施例3)多層膜(m3h1) (Example 3) Multilayer film (m 3 h 1 )

[積層膜(m3)的製造] [Manufacture of laminated film (m 3 )]

除了使用聚苯乙烯(F2)(PS Japan公司製、「PSJ-POLYSTYRENE(註冊商標)HF77」)代替開環複分解聚合物氫化聚合物(F1)作為熱可塑性樹脂以外,係與實施例1同樣地進行而製造形成含有樹脂組成物(E1)之層(e1)為中間層、含有聚苯乙烯(F2)之樹脂層(f2)為表層之2種3層的積層膜(m3)。 Except that polystyrene (F 2 ) (manufactured by PS Japan, "PSJ-POLYSTYRENE (registered trademark) HF77") was used instead of the ring-opening metathesis polymer hydrogenated polymer (F 1 ) as the thermoplastic resin, it was the same as Example 1 same manner as two kinds of three-layer laminated film of the surface layer (formed is manufactured (E 1) of the layer (e 1) an intermediate layer comprising a resin composition, comprising polystyrene (F 2) of the resin layer (f 2) is m 3 ).

所製造的積層膜(m3)係具有(f2)/(e1)/(f2)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。 The produced multilayer film (m 3 ) has a three-layer structure of (f 2 ) / (e 1 ) / (f 2 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm).

[具有硬塗層(h1)之多層膜(m3h1)的製造] [Manufacturing of a multilayer film (m 3 h 1 ) with a hard coating layer (h 1 )]

除了使用積層膜(m3)代替積層膜(m1)以外,係與實施例1同樣地進行而製造在一面層積有硬塗層(h1)之多層膜(m3h1)。所製造的多層膜(m3h1)係具有(f2)/(e1)/(f2)/(h1)的4層結構,寬度為230mm,總厚度為43μm(各層厚度:10μm/20μm/10μm/3μm)。使用所製造的多層膜(m3h1)而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而記載在表2。 Except for using the laminated film (m 3) instead of the laminated film (m 1) except that system and the embodiment same manner as Example 1 is manufactured in a multilayer film on one side laminated with a hard coat layer (H 1) of the (m 3 h 1). The manufactured multilayer film (m 3 h 1 ) has a 4-layer structure of (f 2 ) / (e 1 ) / (f 2 ) / (h 1 ), with a width of 230 mm and a total thickness of 43 μm (thickness of each layer: 10 μm / 20μm / 10μm / 3μm). The produced multilayer film (m 3 h 1 ) was used to evaluate birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface scratch resistance. The evaluation results are summarized and described in Table 2.

(實施例4)多層膜(m4h1) (Example 4) Multilayer film (m 4 h 1 )

[積層膜(m4)的製造] [Manufacture of laminated film (m 4 )]

除了使用樹脂組成物(E3)代替樹脂組成物(E1)以外,係與實施例1同樣地進行而製造形成含有樹脂組成物(E3)之層(e3)為中間層、含有開環複分解聚合物氫化聚合物(F1)之樹脂層(f1)為表層之2種3層的積層膜(m4)。 Except that the resin composition (E 3 ) was used instead of the resin composition (E 1 ), a layer (e 3 ) containing the resin composition (E 3 ) was formed as an intermediate layer and produced in the same manner as in Example 1. The resin layer (f 1 ) of the cyclic metathesis polymer hydrogenated polymer (F 1 ) is a two-layer, three-layer laminated film (m 4 ) of a surface layer.

所製造的積層膜(m4)係具有(f1)/(e3)/(f1)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。 The manufactured multilayer film (m 4 ) had a three-layer structure of (f 1 ) / (e 3 ) / (f 1 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm).

[具有硬塗層(h1)之多層膜(m4h1)的製造] [Manufacture of a multilayer film (m 4 h 1 ) with a hard coating layer (h 1 )]

除了使用積層膜(m4)代替積層膜(m1)以外,係與實施例1同樣地進行而製造在一面層積有硬塗層(h1)之多層膜(m4h1)。所製造的多層膜(m4h1)係具有(f1)/(e3)/(f1)/(h1)的4層結構,寬度為230mm,總厚度為43μm(各層厚度:10μm/20μm/10μm/3μm)。使用所製造的多層膜(m3h1)而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而記載在表2。 (M 4) instead of the laminated film (m 1) except for using the laminated film other than Department in Example 1 was carried out to manufacture the multilayer film (m 4 h 1) one surface layer laminated on the hard coat layer (H 1) of. The manufactured multilayer film (m 4 h 1 ) has a 4-layer structure of (f 1 ) / (e 3 ) / (f 1 ) / (h 1 ), with a width of 230 mm and a total thickness of 43 μm (thickness of each layer: 10 μm / 20μm / 10μm / 3μm). The produced multilayer film (m 3 h 1 ) was used to evaluate birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface scratch resistance. The evaluation results are summarized and described in Table 2.

(實施例5)多層膜(m5h1) (Example 5) Multilayer film (m 5 h 1 )

[積層膜(m5)的製造] [Manufacture of laminated film (m 5 )]

除了使用樹脂組成物(E4)代替樹脂組成物(E1)以外,係與實施例1同樣地進行而製造形成含有樹脂組成物(E4)之層(e4)為中間層、含有開環複分解聚合物氫化聚合物(F1)之樹脂層(f1)為表層之2種3層的積層膜(m5)。 Except that the resin composition (E 4 ) was used instead of the resin composition (E 1 ), a layer (e 4 ) containing the resin composition (E 4 ) was formed as an intermediate layer and manufactured to form a layer containing the resin composition (E 4 ) in the same manner as in Example 1. The resin layer (f 1 ) of the cyclic metathesis polymer hydrogenated polymer (F 1 ) is a two-layer, three-layer laminated film (m 5 ) of a surface layer.

所製造的積層膜(m5)係具有(f1)/(e4)/(f1)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。 The manufactured multilayer film (m 5 ) had a three-layer structure of (f 1 ) / (e 4 ) / (f 1 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm).

[具有硬塗層(h1)之多層膜(m5h1)的製造] [Manufacture of a multilayer film (m 5 h 1 ) with a hard coating layer (h 1 )]

除了使用積層膜(m5)代替積層膜(m1)以外,係與實施例1同樣地進行而製造在一面層積有硬塗層(h1)之多層膜(m5h1)。所製造的多層膜(m5h1)係具有(f1)/(e4)/(f1)/(h1)的4層結構,寬度為230mm,總厚度為43μm(各層厚度:10μm/20μm/10μm/3μm)。 Except for using the laminated film (m 5) laminated film (m 1) was used instead of, based in Example 1 was carried out to manufacture a multilayer film on one side laminated with a hard coat layer (H 1) of the (m 5 h 1). The manufactured multilayer film (m 5 h 1 ) has a 4-layer structure of (f 1 ) / (e 4 ) / (f 1 ) / (h 1 ), with a width of 230 mm and a total thickness of 43 μm (thickness of each layer: 10 μm / 20μm / 10μm / 3μm).

使用所製造的多層膜(m5h1),而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而 記載在表2。 The produced multilayer film (m 5 h 1 ) was used to evaluate birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface scratch resistance. The evaluation results are summarized and described in Table 2.

(實施例6)多層膜(m6h1) (Example 6) Multilayer film (m 6 h 1 )

[積層膜(m6)的製造] [Manufacture of laminated film (m 6 )]

除了使用樹脂組成物(E5)代替樹脂組成物(E1)以外,係與實施例1同樣地進行而製造形成含有樹脂組成物(E5)之層(e5)為中間層、含有開環複分解聚合物氫化聚合物(F1)之樹脂層(f1)為表層之2種3層的積層膜(m6)。 Except that the resin composition (E 5 ) was used instead of the resin composition (E 1 ), a layer (e 5 ) containing the resin composition (E 5 ) was formed as an intermediate layer and manufactured to form a layer containing the resin composition (E 5 ) in the same manner as in Example 1. The resin layer (f 1 ) of the cyclic metathesis polymer hydrogenated polymer (F 1 ) is a two-layer, three-layer laminated film (m 6 ) of a surface layer.

所製造的積層膜(m6)係具有(f1)/(e5)/(f1)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。 The produced multilayer film (m 6 ) had a three-layer structure of (f 1 ) / (e 5 ) / (f 1 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm).

[具有硬塗層(h1)之多層膜(m6h1)的製造] [Manufacture of a multilayer film (m 6 h 1 ) with a hard coating layer (h 1 )]

除了使用積層膜(m6)代替積層膜(m1)以外,係與實施例1同樣地進行而製造在一面層積有硬塗層(h1)之多層膜(m6h1)。所製造的多層膜(m6h1)係具有(f1)/(e5)/(f1)/(h1)的4層結構,寬度為230mm,總厚度為43μm(各層厚度:10μm/20μm/10μm/3μm)。 Except for using the laminated film (m 6) instead of the laminated film (m 1) except that system as in Example 1 in the same manner and manufactured in a multilayer film on one side laminated with a hard coat layer (H 1) of the (m 6 h 1). The manufactured multilayer film (m 6 h 1 ) has a 4-layer structure of (f 1 ) / (e 5 ) / (f 1 ) / (h 1 ), with a width of 230 mm and a total thickness of 43 μm (thickness of each layer: 10 μm / 20μm / 10μm / 3μm).

使用所製造的多層膜(m6h1)而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而記載在表2。 The manufactured multilayer film (m 6 h 1 ) was used to evaluate birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface scratch resistance. The evaluation results are summarized and described in Table 2.

(比較例1)積層膜(m1) (Comparative Example 1) Laminated film (m 1 )

使用未層積硬塗層(h)之實施例1所製造之2種3層的積層膜(m1),而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而記載在表2。 The two types of three-layer laminated film (m 1 ) produced in Example 1 with no laminated hard coat layer (h) were used to evaluate birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface damage resistance. The evaluation results are summarized and described in Table 2.

(比較例2)積層膜(m7) (Comparative Example 2) Laminated film (m 7 )

[積層膜(m7)的製造] [Manufacture of laminated film (m 7 )]

除了使用製造例1的嵌段共聚物氫化物(D1)代替開環複分解聚合物氫化聚合物(F1)作為熱可塑性樹脂以外,係與實施例1同樣地進行而製造形成含有樹脂組成物(E1)之層(e1)為中間層、含有嵌段共聚物氫化物(D1)之樹脂層(d1)為表層之2種3層的積層膜(m7)。 A resin-containing composition was produced in the same manner as in Example 1 except that the hydrogenated block copolymer (D 1 ) of Production Example 1 was used instead of the ring-opening metathesis polymer hydrogenated polymer (F 1 ) as the thermoplastic resin. (E 1) of the layer (e 1) an intermediate layer, comprising the hydrogenated block copolymer (D 1) of the resin layer (d 1) of two kinds of three-layer laminated film of the surface layer (m 7).

所製造的積層膜(m7)係具有(d1)/(e1)/(d1)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。使用未層積硬塗層(h)而製造的積層膜(m7),進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而記載在表2。 The produced multilayer film (m 7 ) has a three-layer structure of (d 1 ) / (e 1 ) / (d 1 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm). The laminated film (m 7 ) produced using the unlaminated hard coat layer (h) was evaluated for birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface scratch resistance. The evaluation results are summarized and described in Table 2.

(比較例3)多層膜(m7h1) (Comparative Example 3) Multilayer film (m 7 h 1 )

[具有硬塗層(h1)之多層膜(m7h1)的製造] [Manufacture of a multilayer film (m 7 h 1 ) with a hard coat layer (h 1 )]

除了使用比較例2所製造的積層膜(m7)以外,係與實施例1同樣地進行而製造在一面層積有硬塗層(h1)之多層膜(m7h1)。所製造的多層膜(m7h1)係具有(d1)/(e1)/(d1)(h1)的4層結構,寬度為230mm,總厚度為43μm(各層厚度:10μm/20μm/10μm/3μm)。 A multilayer film (m 7 h 1 ) having a hard coat layer (h 1 ) laminated on one surface was produced in the same manner as in Example 1 except that the laminated film (m 7 ) produced in Comparative Example 2 was used. The manufactured multilayer film (m 7 h 1 ) has a 4-layer structure of (d 1 ) / (e 1 ) / (d 1 ) (h 1 ), with a width of 230 mm and a total thickness of 43 μm (thickness of each layer: 10 μm / 20 μm / 10 μm / 3 μm).

使用所製造的多層膜(m7h1)而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性、表面耐負傷性。將評價結果彙總而記載在表2。 The produced multilayer film (m 7 h 1 ) was used to evaluate birefringence, ultraviolet shielding performance, water vapor shielding performance, and surface scratch resistance. The evaluation results are summarized and described in Table 2.

(比較例4)積層膜(m8) (Comparative example 4) laminated film (m 8 )

[積層膜(m8)的製造] [Manufacture of laminated film (m 8 )]

除了使用樹脂組成物(E4)代替樹脂組成物(E1),使用製造例4所製造的嵌段共聚物氫化物(D4)代替開環複分解聚合物氫 化聚合物(F1)作為熱可塑性樹脂以外,係與實施例1同樣地進行,而製造形成含有樹脂組成物(E4)之層(e4)為中間層、含有嵌段共聚物氫化物(D4)之樹脂層(d4)為表層之2種3層的積層膜(m8)。 Instead of using the resin composition (E 4 ) instead of the resin composition (E 1 ), the block copolymer hydride (D 4 ) produced in Production Example 4 was used instead of the ring-opening metathesis polymer hydrogenated polymer (F 1 ) as heat. other than a thermoplastic resin, based in the same manner as in Example 1, is formed is manufactured (D 4) of the resin layer of the resin composition (E 4) of layer (e 4) an intermediate layer, containing a hydrogenated block copolymer comprising (d 4 ) Two kinds of three-layer laminated film (m 8 ) as the surface layer.

所製造的積層膜(m8)係具有(d4)/(e4)/(d4)的3層結構,寬度為230mm,總厚度為40μm(各層厚度:10μm/20μm/10μm)。 The manufactured multilayer film (m 8 ) had a three-layer structure of (d 4 ) / (e 4 ) / (d 4 ), with a width of 230 mm and a total thickness of 40 μm (thickness of each layer: 10 μm / 20 μm / 10 μm).

使用未層積硬塗層(h)而製造的積層膜(m8),而進行評價雙折射、紫外線遮蔽性能、水蒸氣遮蔽性(透濕度)、表面耐負傷性。將評價結果彙總而記載在表2。 The laminated film (m 8 ) produced using the unlaminated hard coat layer (h) was evaluated for birefringence, ultraviolet shielding performance, water vapor shielding performance (moisture permeability), and surface damage resistance. The evaluation results are summarized and described in Table 2.

從本實施例及比較例的結果得知以下情形。 From the results of this example and comparative example, the following cases are known.

將含有樹脂組成物(E)(該樹脂組成物(E)係在嵌段共聚物氫化物(D)調配紫外線吸收劑而成)之層(e)作為中間層,而且在此層積含有嵌段共聚物氫化物(D)之樹脂層(d)作為表層而成之積層膜,係容易負傷(比較例2、4)。雖然透濕度較低且雙折射優異而為最小,但是表面的刮痕硬度較低而為6B以下。 A layer (e) containing a resin composition (E) (the resin composition (E) is prepared by blending a block copolymer hydride (D) with an ultraviolet absorber)) is used as an intermediate layer, and an intercalation layer is contained in this layer. The laminated film in which the resin layer (d) of the segment copolymer hydride (D) is used as a surface layer is easily damaged (Comparative Examples 2, 4). Although the moisture permeability is low and the birefringence is excellent and minimized, the scratch hardness of the surface is low and is 6B or less.

將含有樹脂組成物(E)(該樹脂組成物(E)係在嵌段共聚物氫化物(D)調配紫外線吸收劑而成)之層(e)作為中間層,而且在將含有嵌段共聚物氫化物(D)之樹脂層(d)作為表層之積層膜的表面,進一步層積有硬塗層(h)的情況,仍然容易負傷而不充分(比較例3)。雖然透濕度較低且雙折射優異而為最小,但是表面的刮痕硬度只有B左右而無法提高。 A layer (e) containing a resin composition (E) (the resin composition (E) is prepared by blending a block copolymer hydride (D) with an ultraviolet absorber)) as an intermediate layer, and the block containing copolymer is copolymerized. When the resin layer (d) of the hydride (D) is used as the surface of the laminated film of the surface layer and the hard coat layer (h) is further laminated, it is still easy to be injured and insufficient (Comparative Example 3). Although the moisture permeability is low and the birefringence is excellent and minimized, the scratch hardness of the surface is only about B and cannot be improved.

將含有樹脂組成物(E)(該樹脂組成物(E)係在嵌段共聚物氫化物(D)調配紫外線吸收劑而成)之層(e)作為中間層,在此層積含有單獨的表面刮痕硬度為B的熱可塑性樹脂(F)亦即開環複分解聚合物氫化聚合物之樹脂層(f)而成為積層膜之情況,耐負傷性為不充分(比較例1)。雖然透濕度為最低且雙折射亦較小而良好,但是表面刮痕硬度為2B而容易負傷。相較於以嵌段共聚物氫化物(D)作為表層之積層膜(比較例2、4),雖然表面刮痕硬度變高,但是不充分。 A layer (e) containing a resin composition (E) (the resin composition (E) is prepared by blending an ultraviolet absorber with a block copolymer hydride (D)) as an intermediate layer, and a single layer In the case where the thermoplastic resin (F) having a surface scratch hardness of B, that is, the resin layer (f) of the ring-opening metathesis polymer hydrogenated polymer becomes a laminated film, the scratch resistance is insufficient (Comparative Example 1). Although the moisture permeability is the lowest and the birefringence is small and good, the surface scratch hardness is 2B and it is easy to be injured. Compared with the laminated film (Comparative Examples 2 and 4) using the block copolymer hydride (D) as the surface layer, although the surface scratch hardness became higher, it was insufficient.

將含有樹脂組成物(E)(該樹脂組成物(E)係在嵌段共聚物氫化物(D)調配紫外線吸收劑而成)之層(e)作為中間層,在此層積含有熱可塑性樹脂(F)的開環複分解聚合物氫化聚合物之樹脂層(f),進而在表面層積硬塗層(h)之情況,耐負 傷性係成為能夠容許的水準以上(實施例1、2、4、5)。透濕度為最低且雙折射亦較小而良好,而且表面刮痕硬度亦變高至H~2H左右為止。 A layer (e) containing a resin composition (E) (the resin composition (E) is prepared by blending an ultraviolet absorber with a block copolymer hydride (D)) as an intermediate layer, and the layer contains thermoplasticity When the resin layer (f) of the ring-opening metathesis polymer hydrogenated polymer of the resin (F) is further laminated with a hard coat layer (h) on the surface, the damage resistance is above an allowable level (Examples 1 and 2) , 4, 5). The moisture permeability is the lowest, the birefringence is small and good, and the surface scratch hardness also increases to about H ~ 2H.

將含有樹脂組成物(E)(該樹脂組成物(E)係在嵌段共聚物氫化物(D)調配紫外線吸收劑而成)之層(e)作為中間層,在此層積含有熱可塑性樹脂(F)的聚苯乙烯之樹脂層(f),進而在表面層積硬塗層(h)之情況,耐負傷性係能夠大大地改善(實施例3)。雖然透濕度變高,但是相對於三乙酸纖維素膜,為非常低的值,雖然雙折射變大,但是使用在液晶顯示器的最表面側時為充分地能夠容許,表面刮痕硬度係變高至3H左右。 A layer (e) containing a resin composition (E) (the resin composition (E) is prepared by blending an ultraviolet absorber with a block copolymer hydride (D)) as an intermediate layer, and the layer contains thermoplasticity When the resin layer (f) of the resin (F) is further laminated with the hard coat layer (h) on the surface, the damage resistance can be greatly improved (Example 3). Although the moisture permeability is higher, it is a very low value compared to the cellulose triacetate film. Although the birefringence is increased, it is sufficiently tolerable when used on the outermost surface side of a liquid crystal display, and the surface scratch hardness is increased. To about 3H.

在本發明所使用的嵌段共聚物氫化物(D)之中,使嵌段共聚物(C)的重量平均分子量Mw成為大約相同時,在能夠維持嵌段共聚物氫化物(D)的機械強度之範圍內,藉由減小Mw(A2)而增大Mw(A1),使Mw(A1)與Mw(A2)成為甚大不同之非對稱的三嵌段共聚物,本發明的多層膜係能夠進一步提高表面刮痕硬度(將實施例1、4與實施例5、6進行比較時)。 In the block copolymer hydride (D) used in the present invention, when the weight average molecular weight Mw of the block copolymer (C) is approximately the same, the mechanism capable of maintaining the block copolymer hydride (D) is maintained. Within the range of strength, by increasing Mw (A 1 ) and decreasing Mw (A 2 ), Mw (A 1 ) and Mw (A 2 ) become very different asymmetric triblock copolymers. The present invention The multilayer film system can further improve the surface scratch hardness (when Examples 1 and 4 are compared with Examples 5 and 6).

產業上之可利用性     Industrial availability    

本發明的多層膜,係雙折射較小且具有優異的紫外線遮蔽性能及水蒸氣遮蔽性,而且含有經改良表面耐負傷性的特定嵌段共聚物氫化物之多層膜,作為偏光膜的偏光片保護膜等的光學用薄膜為有用的。 The multilayer film of the present invention is a multilayer film having a small birefringence, excellent ultraviolet shielding performance and water vapor shielding properties, and a specific block copolymer hydride with improved surface damage resistance, and is a polarizer for a polarizing film Optical films, such as a protective film, are useful.

Claims (3)

一種多層膜,其特徵在於包含:(i)層(e),其係含有相對於嵌段共聚物氫化物(D)100重量份,調配紫外線吸收劑1.0重量份以上且15.0重量份以下而成之樹脂組成物(E),其中該嵌段共聚物氫化物(D)係含有以源自芳香族乙烯系化合物的結構單元作為主成分之至少2個聚合物嵌段(A)、及以源自鏈狀共軛二烯化合物的結構單元作為主成分之至少1個聚合物嵌段(B)之嵌段共聚物的嵌段共聚物(C),將總聚合物嵌段(A)及總聚合物嵌段(B)在嵌段共聚物(C)所佔有之重量分率設為wA及wB時,將wA與wB之比wA:wB為60:40~90:10之嵌段共聚物(C)的主鏈及側鏈的碳-碳不飽和鍵及芳香環的碳-碳不飽和鍵的90%以上氫化而成;(ii)樹脂層(f),其係含有層積在該層(e)的至少一面或兩面之特定熱可塑性樹脂(F),其中該特定熱可塑性樹脂(F)係選自由聚酯、環烯烴聚合物、聚苯乙烯、苯乙烯共聚物及(甲基)丙烯酸酯(共)聚合物所組成群組之1種類以上;及(iii)硬塗層(h),其係層積在至少一樹脂層(f)之與層(e)接觸之面為相反側的面。     A multilayer film comprising: (i) layer (e), which comprises 100 parts by weight of a block copolymer hydride (D), and is prepared by blending an ultraviolet absorber of 1.0 part by weight or more and 15.0 parts by weight or less. Resin composition (E), wherein the block copolymer hydride (D) contains at least two polymer blocks (A) having a structural unit derived from an aromatic vinyl compound as a main component, and a source A block copolymer (C) of a block copolymer of a self-chain conjugated diene compound having at least one polymer block (B) as a main component, and a total polymer block (A) and a total block When the weight fraction of the polymer block (B) in the block copolymer (C) is set to wA and wB, the block copolymer in which the ratio wA to wB is 60:40 to 90:10 (C) More than 90% of the carbon-carbon unsaturated bonds of the main chain and side chains and the carbon-carbon unsaturated bonds of the aromatic ring are hydrogenated; (ii) the resin layer (f), which contains Specific thermoplastic resin (F) on at least one or both sides of layer (e), wherein the specific thermoplastic resin (F) is selected from the group consisting of polyester, cycloolefin polymer, polystyrene, styrene copolymer, and (methyl ) More than one type of group consisting of acrylate (co) polymers; and (iii) Hard coating (h), which is laminated on the surface of at least one resin layer (f) in contact with layer (e) as Opposite side face.     如申請專利範圍第1項所述之多層膜,其中前述嵌段共聚物(C)係重量平均分子量(Mw)為40,000以上且100,000以下,同時以源自芳香族乙烯系化合物的結構單元作為主成分之2個聚合物嵌段(A 1)及聚合物嵌段(A 2)係各自形成嵌段共聚物(C)的兩末端,而且聚合物嵌段(A 1)的重量平均分子量Mw(A 1)為20,000以上且80,000以下,聚合物嵌段(A 2)的重量平均分子量 Mw(A 2)為4,000以上且7,000以下。 The multilayer film according to item 1 of the scope of patent application, wherein the block copolymer (C) has a weight average molecular weight (Mw) of 40,000 to 100,000, and a structural unit derived from an aromatic vinyl compound is used as a main component The two polymer blocks (A 1 ) and the polymer blocks (A 2 ) of the components each form both ends of the block copolymer (C), and the weight average molecular weight Mw of the polymer block (A 1 ) ( a 1) is 20,000 or more and 80,000 or less, the polymer block (a 2) weight average molecular weight Mw of (a 2) is 4,000 or more and 7,000 or less. 如申請專利範圍第1或2項所述之多層膜,其中層積有前述硬塗層(h)之面之JIS K 5600-5-4規定的刮擦硬度為H以上。     The multilayer film according to item 1 or 2 of the scope of the patent application, wherein the scratch hardness of JIS K 5600-5-4 of the surface on which the aforementioned hard coat layer (h) is laminated is H or more.    
TW106116070A 2016-05-16 2017-05-16 Multilayer film TW201819192A (en)

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