TW201814334A - 近紅外線截止濾波器、固體攝像元件、照相機模組及圖像顯示裝置 - Google Patents
近紅外線截止濾波器、固體攝像元件、照相機模組及圖像顯示裝置 Download PDFInfo
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- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000003564 thiocarbonyl compounds Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
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- FYYVSJNJBYOWRN-UHFFFAOYSA-N trifluoro(trifluoromethylsulfonylsulfanylsulfonyl)methane Chemical compound FC(S(=O)(=O)SS(=O)(=O)C(F)(F)F)(F)F FYYVSJNJBYOWRN-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-N trifluoroacetic acid Substances OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- IWZLBIVZPIDURM-UHFFFAOYSA-N trimethoxy(3-prop-1-enoxypropyl)silane Chemical compound CO[Si](OC)(OC)CCCOC=CC IWZLBIVZPIDURM-UHFFFAOYSA-N 0.000 description 1
- GFKCWAROGHMSTC-UHFFFAOYSA-N trimethoxy(6-trimethoxysilylhexyl)silane Chemical compound CO[Si](OC)(OC)CCCCCC[Si](OC)(OC)OC GFKCWAROGHMSTC-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical class Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B11/00—Filters or other obturators specially adapted for photographic purposes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Optical Filters (AREA)
- Blocking Light For Cameras (AREA)
- Camera Bodies And Camera Details Or Accessories (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-184023 | 2016-09-21 | ||
| JP2016184023 | 2016-09-21 | ||
| JP2016203439 | 2016-10-17 | ||
| JP2016-203439 | 2016-10-17 | ||
| JP2016217752 | 2016-11-08 | ||
| JP2016-217752 | 2016-11-08 |
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| TW (1) | TW201814334A (ja) |
| WO (1) | WO2018055880A1 (ja) |
Cited By (2)
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| TWI868801B (zh) * | 2022-07-19 | 2025-01-01 | 南韓商Ｌｍｓ股份有限公司 | 光學濾波器材料層 |
| TWI873524B (zh) * | 2018-04-27 | 2025-02-21 | 日商日本板硝子股份有限公司 | 濾光器及濾光器用組成物 |
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| JP2022156603A (ja) * | 2021-03-31 | 2022-10-14 | 三菱ケミカル株式会社 | 樹脂組成物、フィルム、積層フィルムおよび機能性フィルム |
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| JP2007094191A (ja) * | 2005-09-29 | 2007-04-12 | Dainippon Printing Co Ltd | フラットディスプレイ用耐衝撃吸収材、プラズマディスプレイ用光学フィルタ、プラズマディスプレイパネル、及びフラットディスプレイ用耐衝撃吸収材の製造方法 |
| WO2010119683A1 (ja) * | 2009-04-14 | 2010-10-21 | 株式会社日本触媒 | 近赤外線吸収粘着剤組成物 |
| JP2012116940A (ja) * | 2010-11-30 | 2012-06-21 | Dainippon Printing Co Ltd | 粘着剤組成物およびプラズマディスプレイ用複合フィルタ |
| JP6230479B2 (ja) * | 2014-04-30 | 2017-11-15 | 富士フイルム株式会社 | 近赤外線カットフィルタおよびその製造方法、カメラモジュールおよびその製造方法、緩衝層形成用組成物、ならびに、積層体およびその製造方法 |
| JP6094525B2 (ja) * | 2014-04-30 | 2017-03-15 | コニカミノルタ株式会社 | 画像形成方法 |
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- 2017-07-13 JP JP2018540650A patent/JP6717955B2/ja not_active Expired - Fee Related
- 2017-07-24 TW TW106124672A patent/TW201814334A/zh unknown
Cited By (2)
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|---|---|---|---|---|
| TWI873524B (zh) * | 2018-04-27 | 2025-02-21 | 日商日本板硝子股份有限公司 | 濾光器及濾光器用組成物 |
| TWI868801B (zh) * | 2022-07-19 | 2025-01-01 | 南韓商Ｌｍｓ股份有限公司 | 光學濾波器材料層 |
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| JPWO2018055880A1 (ja) | 2019-06-24 |
| WO2018055880A1 (ja) | 2018-03-29 |
| JP6717955B2 (ja) | 2020-07-08 |
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