TW201801808A - Cleaning device - Google Patents
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- TW201801808A TW201801808A TW106107999A TW106107999A TW201801808A TW 201801808 A TW201801808 A TW 201801808A TW 106107999 A TW106107999 A TW 106107999A TW 106107999 A TW106107999 A TW 106107999A TW 201801808 A TW201801808 A TW 201801808A
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- H10P72/0414—
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- H10P72/7618—
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- Cleaning Or Drying Semiconductors (AREA)
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Abstract
即使為翹曲激烈的板狀物,亦以簡易構成, 將板狀物的全面良好地洗淨。 Even if it is a warped plate, it has a simple structure. Rinse the plate thoroughly.
洗淨裝置(1)形成為以下構成:具備 有:以外周緣保持板狀物(W)而使其以周方向旋轉的保持手段(10);將旋轉中的板狀物進行洗淨的洗淨手段(20);及對旋轉中的板狀物的上面(Wa)及下面(Wb)的各個噴射洗淨液的洗淨液噴射手段,洗淨手段具有:抵接於板狀物的上面,將板狀物進行洗淨的洗淨構件(23);使洗淨構件以板狀物的徑方向擺動的擺動部(21);及藉由洗淨構件抵接於呈彎曲的板狀物的上面而洗淨構件追隨板狀物的上面的追隨機構(22),抵接於被保持在保持手段的板狀物的上面,藉由洗淨構件,沿著板狀物的上面,洗淨板狀物的上面。 The cleaning device (1) is configured as follows: There are: holding means (10) for holding the plate-like object (W) in the outer periphery and rotating it in the circumferential direction; washing means (20) for washing the plate-like object while it is rotating; and The cleaning liquid spraying means for spraying the cleaning liquid on each of the upper surface (Wa) and the lower surface (Wb) of the object has a cleaning member (a cleaning member for abutting the upper surface of the plate to clean the plate) 23); a swinging part (21) that swings the cleaning member in the radial direction of the plate; and the cleaning member follows the upper surface of the plate by the cleaning member abutting on the curved plate The following mechanism (22) abuts on the upper surface of the plate-shaped object held by the holding means, and cleans the upper surface of the plate-shaped object along the upper surface of the plate-shaped object by washing the member.
Description
本發明係關於洗淨晶圓的洗淨裝置。 The present invention relates to a cleaning device for cleaning wafers.
在以加工裝置所加工的晶圓等板狀物由於會附著污物等加工屑,因此藉由旋轉器裝置等洗淨裝置,洗淨板狀物。以該類洗淨裝置而言,已知一種保持板狀物的外周緣,以非接觸將板狀物的上面及下面進行洗淨者(參照例如專利文獻1)。在專利文獻1所記載的洗淨裝置中,在以把持夾具保持有板狀物的外周緣的3處的狀態下,洗淨液由上方的噴嘴被噴射至板狀物的上面,並且洗淨液由下方的噴嘴被噴射至板狀物的下面,板狀物的上面及下面即被同時洗淨。 Since plate materials such as wafers processed by a processing device adhere to processing debris such as dirt, the plate objects are cleaned by a cleaning device such as a spinner device. For such a cleaning device, there is known a method of cleaning an upper surface and a lower surface of a plate-like object in a non-contact manner while holding the outer periphery of the plate-like object (see, for example, Patent Document 1). In the cleaning device described in Patent Document 1, in a state where the outer periphery of the plate-like object is held at three places by the holding jig, the washing liquid is sprayed onto the upper surface of the plate-like object from an upper nozzle, and the washing is performed. The liquid is sprayed from the nozzle below to the bottom of the plate, and the top and bottom of the plate are simultaneously washed.
此外,以洗淨裝置而言,已知一種為了彌補因由噴嘴噴射洗淨液所致之洗淨力不足,以海綿等擦拭板狀物的上面來進行刷洗洗淨的洗淨裝置(參照例如專利文獻2)。在專利文獻2所記載的洗淨裝置中,對洗淨平台上的板狀物,由上方的噴嘴被噴射洗淨液,筒狀的海綿輥旋轉抵接於板狀物的上面,藉此洗淨板狀物的上面。此時,使用板狀物的直徑以上的海綿輥,板狀物對海綿輥作 相對移動,藉此可使海綿輥抵接於板狀物的上面全體。 In addition, as a cleaning device, in order to compensate for the insufficient cleaning power caused by the spray of the cleaning liquid by a nozzle, a cleaning device that scrubs and cleans the upper surface of a plate with a sponge or the like is known (see, for example, a patent) Reference 2). In the cleaning device described in Patent Document 2, the plate-like object on the washing platform is sprayed with a washing liquid from an upper nozzle, and a cylindrical sponge roller is rotated to abut against the upper surface of the plate-like object, thereby washing the plate-like object. The top of the net plate. At this time, use a sponge roller with a diameter larger than the plate shape. Relative movement allows the sponge roller to abut the entire upper surface of the plate.
[專利文獻1]日本特開平11-031643號公報 [Patent Document 1] Japanese Patent Laid-Open No. 11-031643
[專利文獻2]日本特開2014-110270號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2014-110270
但是,若以保持板狀物的外周緣的洗淨裝置實施使用海綿輥的刷洗洗淨,對於翹曲激烈的板狀物,無法以海綿輥良好地洗淨。亦即,若板狀物的翹曲激烈,海綿輥與板狀物僅有部分抵接,難以將板狀物的全面以海綿輥進行刷洗洗淨。亦考慮配備按照板狀物的翹曲而使海綿輥以鉛直方向上下動的機構,但是有洗淨裝置的裝置構成變得複雜而成本增加的問題。 However, if the cleaning device using a sponge roller is used to clean the outer peripheral edge of the plate-like object, the plate-like object having a large warpage cannot be cleaned well with the sponge roller. That is, if the warpage of the plate-like object is severe, the sponge roller and the plate-like object only partially come into contact with each other, and it is difficult to scrub and wash the entire surface of the plate-like object with the sponge roller. It is also considered to provide a mechanism for moving the sponge roller up and down in a vertical direction in accordance with the warpage of the plate. However, there is a problem that the device configuration of the cleaning device becomes complicated and the cost increases.
本發明係鑑於該情形而完成者,目的在提供即使為翹曲激烈的板狀物,亦可以簡易構成,將板狀物的全面良好地洗淨的洗淨裝置。 The present invention has been made in view of this situation, and an object thereof is to provide a cleaning device that can be easily constructed even if a plate-like object with severe warpage can be cleaned, and the plate-like object can be thoroughly and thoroughly cleaned.
本發明之洗淨裝置係具備有:以外周緣保持板狀物而使板狀物以周方向旋轉的保持手段;將被該保持手段所保持且正在旋轉的板狀物進行洗淨的洗淨手段;及 對被保持在該保持手段的板狀物的上面及下面的各個噴射洗淨液的洗淨液噴射手段,該洗淨裝置之特徵為:該洗淨手段係具備有:抵接於板狀物的上面,將板狀物進行洗淨的洗淨構件;及使該洗淨構件以板狀物的徑方向擺動,並且追隨呈彎曲的板狀物的上面的擺動部,抵接於被保持在該保持手段的板狀物的上面,該洗淨構件沿著板狀物的上面,將板狀物的上面進行洗淨。 The cleaning device of the present invention includes: a holding means for holding the plate-like object on the outer periphery and rotating the plate-like object in the circumferential direction; and a cleaning means for washing the rotating plate-like object held by the holding means. ;and The cleaning device for spraying the cleaning liquid onto each of the upper and lower surfaces of the plate-shaped object held by the holding means is characterized in that the cleaning device is provided with: abutting against the plate-shaped object A cleaning member that cleans the plate-like object; and swings the cleaning member in the radial direction of the plate-like object and follows a swinging portion of the upper surface of the curved plate-like object to abut against being held at In the upper surface of the plate-like object of the holding means, the cleaning member cleans the upper surface of the plate-like object along the upper surface of the plate-like object.
藉由該構成,在板狀物的外周緣被保持的狀態下,洗淨液被噴射至板狀物的上面及下面,並且洗淨構件抵接於板狀物的上面,板狀物即被刷洗洗淨。此時,在板狀物以周方向被旋轉的狀態下,洗淨構件一邊追隨板狀物的上面的彎曲一邊以板狀物的徑方向被擺動,因此可使洗淨構件抵接於板狀物的上面全體。此外,洗淨構件抵接於板狀物的上面,沿著板狀物的上面,洗淨構件的動作被追隨,因此不需要有使洗淨構件以上下方向移動的機構,不會有裝置構成變得複雜的情形。如上所示,即使為翹曲激烈的板狀物,亦可以簡易構成,將板狀物的全面良好地洗淨。 With this configuration, while the outer peripheral edge of the plate-like object is held, the cleaning liquid is sprayed onto the upper and lower surfaces of the plate-like object, and the cleaning member abuts the upper surface of the plate-like object, and the plate-like object is then Wash and wash. At this time, in a state where the plate-like object is rotated in the circumferential direction, the cleaning member is swung in the radial direction of the plate-like object while following the curvature of the upper surface of the plate-like object. Therefore, the cleaning member can be brought into contact with the plate-like object. Above all things. In addition, the cleaning member is in contact with the upper surface of the plate, and the movement of the cleaning member is followed along the upper surface of the plate. Therefore, there is no need to have a mechanism for moving the cleaning member in the up and down direction, and there is no device configuration. The situation becomes complicated. As shown above, even if it is a plate-like object with severe warpage, it can be simply constructed, and the plate-like object can be cleaned well and completely.
在本發明之洗淨裝置中,該擺動部係具備有:被配設在擺動的前端而以鉛直方向導引該洗淨構件的鉛直導件;保持該洗淨構件而且被導引至該鉛直導件的保持具;及將該保持具在被導引至該鉛直導件的狀態下固定在該擺動部的該前端的彈簧,藉由該彈簧進行伸縮,沿著該鉛直導件,該保持具及該洗淨構件上下擺動而追隨呈彎 曲的板狀物的上面。 In the cleaning device of the present invention, the swinging unit is provided with a vertical guide which is arranged at a front end of the swing and guides the cleaning member in a vertical direction; the cleaning member is held and guided to the vertical A retainer of the guide; and a spring fixed to the front end of the swinging portion in a state where the retainer is guided to the vertical guide, the spring expands and contracts along the vertical guide, and the holding And the cleaning member swing up and down and follow the curve Curved plate.
在本發明之洗淨裝置中,具備有:被配設在該擺動部的該前端且鉛直向下延伸的活塞構件;具備有扣合於該活塞構件的凹部且可以鉛直方向驅動的汽缸構件;對該汽缸構件的該凹部內鉛直朝下地噴射壓縮空氣的空氣噴射口;及被配設在該汽缸構件的下面側的該洗淨構件,由該活塞構件的該空氣噴射口,壓縮空氣被噴射至該凹部內且在該凹部內具有空間的狀態下,該洗淨構件抵接於板狀物,沿著該活塞構件,該汽缸構件及該洗淨構件上下擺動而追隨呈彎曲的板狀物的上面。 The cleaning device of the present invention includes: a piston member that is disposed at the front end of the swinging portion and extends vertically downward; and a cylinder member that is engaged with a recessed portion of the piston member and can be driven in the vertical direction; An air injection port for injecting compressed air vertically downward in the recess of the cylinder member; and the cleaning member disposed on a lower side of the cylinder member, and the compressed air is injected from the air injection port of the piston member. In a state where there is space in the recess and the recess has a space, the cleaning member abuts against the plate, and swings up and down along the piston member, the cylinder member, and the cleaning member to follow the curved plate. Above.
藉由本發明,因洗淨構件被壓入至呈彎曲的板狀物的上面,使洗淨構件的動作追隨板狀物的上面,即使為翹曲激烈的板狀物,亦可以簡易構成,將板狀物的全面良好地洗淨。 According to the present invention, since the cleaning member is pressed onto the upper surface of the curved plate-like object, the action of the cleaning member follows the upper surface of the plate-like object. The plate was thoroughly washed thoroughly.
1‧‧‧洗淨裝置 1‧‧‧washing device
10‧‧‧保持手段 10‧‧‧ Means of retention
11‧‧‧夾臂 11‧‧‧ Clamp Arm
12‧‧‧旋轉平台 12‧‧‧ rotating platform
13‧‧‧平台面 13‧‧‧platform surface
14‧‧‧噴射口(洗淨液噴射手段) 14‧‧‧ spraying port (washing liquid spraying means)
15‧‧‧噴射噴嘴(洗淨液噴射手段) 15‧‧‧ spray nozzle (washing liquid spray means)
16、17‧‧‧供給源(洗淨液噴射手段) 16, 17‧‧‧ supply source (washing liquid spraying means)
20、40、60‧‧‧洗淨手段 20, 40, 60 ‧ ‧ ‧ washing means
21、41、61‧‧‧擺動部 21, 41, 61‧‧‧Swing section
22、42、62‧‧‧追隨機構 22, 42, 62‧‧‧ followers
23、43、63‧‧‧洗淨構件 23, 43, 63‧‧‧washing components
25‧‧‧導引板 25‧‧‧Guide Board
26、46、52、66、76‧‧‧縱板部 26, 46, 52, 66, 76‧‧‧ vertical plate department
27、47、53、67、77‧‧‧橫板部 27, 47, 53, 67, 77‧‧‧ horizontal plate department
28‧‧‧鉛直導件 28‧‧‧ vertical guide
29、49、64‧‧‧擺動臂 29, 49, 64‧‧‧ Swing arm
31、51、75‧‧‧保持具板(保持具) 31, 51, 75‧‧‧ holder plate (holder)
32‧‧‧滑件 32‧‧‧ Slider
33、69、78‧‧‧開口 33, 69, 78‧‧‧ opening
35、55‧‧‧彈簧 35, 55‧‧‧ Spring
36、56、81‧‧‧構件保持具(保持具) 36, 56, 81‧‧‧ member holders (holders)
37、57‧‧‧上部保持具 37, 57‧‧‧ Upper holder
38、58‧‧‧下部保持具 38, 58‧‧‧ Lower holder
45、65‧‧‧L字板 45, 65‧‧‧L plate
48、68‧‧‧延長板 48, 68‧‧‧ extension board
71‧‧‧活塞構件 71‧‧‧Piston member
72‧‧‧連接器 72‧‧‧ Connector
73‧‧‧空氣噴射口 73‧‧‧air jet
81‧‧‧構件保持具 81‧‧‧component holder
82‧‧‧構件保持具的凹部 82‧‧‧ Recess of component holder
83‧‧‧上部保持具(汽缸構件) 83‧‧‧ Upper holder (cylinder member)
84‧‧‧下部保持具 84‧‧‧ Lower holder
90‧‧‧洗淨手段 90‧‧‧washing means
91‧‧‧洗淨構件 91‧‧‧washing components
W‧‧‧板狀物 W‧‧‧ Plate
Wa‧‧‧板狀物的上面 The top of Wa‧‧‧ plate
Wb‧‧‧板狀物的下面 Wb‧‧‧ Under the plate
圖1係本實施形態之洗淨裝置的模式圖。 FIG. 1 is a schematic diagram of a cleaning device according to this embodiment.
圖2係藉由比較例之洗淨手段所為之洗淨動作的說明圖。 FIG. 2 is an explanatory diagram of a cleaning operation performed by a cleaning method of a comparative example.
圖3係本實施形態之洗淨手段的斜視圖及側面模式圖。 Fig. 3 is a perspective view and a side schematic view of a cleaning means according to this embodiment.
圖4係顯示藉由本實施形態之洗淨手段所為之洗淨動作之一例的圖。 FIG. 4 is a diagram showing an example of a washing operation performed by the washing means of the present embodiment.
圖5係第1變形例之洗淨手段的斜視圖。 Fig. 5 is a perspective view of a washing means according to a first modification.
圖6係第2變形例之洗淨手段的斜視圖。 Fig. 6 is a perspective view of a washing means according to a second modification.
以下參照所附圖示,說明本實施形態之洗淨裝置。圖1係本實施形態之洗淨裝置的模式圖。其中,以下所示之洗淨裝置係顯示一例者,並非限定於該構成。 Hereinafter, the cleaning device according to this embodiment will be described with reference to the accompanying drawings. FIG. 1 is a schematic diagram of a cleaning device according to this embodiment. However, the cleaning device shown below is an example and is not limited to this structure.
如圖1所示,洗淨裝置1係所謂邊緣夾具式的洗淨裝置,構成為藉由保持加工完畢的板狀物W的外周緣,在使板狀物W由保持手段10的平台面13上浮的狀態下進行洗淨。在洗淨裝置1中,相對平台面13,板狀物W以非接觸被洗淨,因此污物等加工屑難以附著在板狀物W的下面Wb。其中,板狀物W若為成為洗淨對象者即可,亦可為例如矽、砷化鎵等半導體基板、藍寶石、碳化矽等無機材料基板、電子零件所使用的各種陶瓷基板。 As shown in FIG. 1, the cleaning device 1 is a so-called edge-clamp-type cleaning device, and is configured to hold the outer periphery of the processed plate-shaped object W on the platform surface 13 of the holding means 10 by holding the processed plate-shaped object W. Rinse while floating. In the cleaning device 1, the plate-like object W is cleaned in a non-contact manner with respect to the platform surface 13. Therefore, it is difficult for processing debris such as dirt to adhere to the lower surface Wb of the plate-like object W. Among them, the plate-like object W may be a subject to be cleaned, and may be, for example, semiconductor substrates such as silicon and gallium arsenide, inorganic material substrates such as sapphire, silicon carbide, and various ceramic substrates used for electronic parts.
洗淨裝置1的保持手段10係以複數(在本實施形態中為4個)夾臂11保持板狀物W的外周緣,藉由安裝有各夾臂11的旋轉平台12,使板狀物W以周方向旋轉。各夾臂11係可擺動地被連結在旋轉平台12的外周部分,藉由由彈簧或空氣汽缸等所成之開閉機構進行動作。藉由各夾臂11的前端側朝旋轉平台12的內側傾斜,板狀 物W的外周緣即被保持,藉由各夾臂11的前端側朝旋轉平台12的外側傾斜,板狀物W的外周緣即被解放。 The holding means 10 of the cleaning device 1 holds the outer periphery of the plate-shaped object W by a plurality of (four in this embodiment) clamp arms 11, and the plate-shaped object is made by a rotating platform 12 on which each clamp arm 11 is mounted. W rotates in the circumferential direction. Each clamp arm 11 is swingably connected to the outer peripheral portion of the rotary table 12 and is operated by an opening and closing mechanism made of a spring, an air cylinder, or the like. The front end side of each clamp arm 11 is inclined toward the inside of the rotating platform 12 and has a plate shape. The outer peripheral edge of the object W is held, and the front end side of each clamp arm 11 is inclined toward the outside of the rotation platform 12, and the outer peripheral edge of the plate-shaped object W is released.
在旋轉平台12的下部係連結有驅動馬達(未圖示),藉由驅動馬達,旋轉平台12繞鉛直軸旋轉。在旋轉平台12的平台面13的中心係形成有對板狀物W的下面Wb噴射洗淨液的噴射口14。在旋轉平台12的上方係定位有對板狀物W的上面Wa噴射洗淨液的噴射噴嘴15。在噴射口14及噴射噴嘴15連接有洗淨液的供給源16、17,藉由該等噴射口14、噴射噴嘴15、供給源16、17,構成洗淨液噴射手段。此外,在洗淨裝置1設有將被保持在保持手段10的旋轉中的板狀物W進行洗淨的洗淨手段20。 A drive motor (not shown) is connected to the lower portion of the rotary platform 12, and the rotary platform 12 is rotated about a vertical axis by the drive motor. The center of the platform surface 13 of the rotary platform 12 is formed with a spray port 14 for spraying the cleaning liquid on the lower surface Wb of the plate-like object W. An injection nozzle 15 for injecting a cleaning liquid onto the upper surface Wa of the plate-shaped object W is positioned above the rotating platform 12. The spray ports 14 and the spray nozzles 15 are connected to supply sources 16 and 17 of the cleaning liquid, and the spray ports 14, the spray nozzles 15, and the supply sources 16 and 17 constitute a cleaning liquid spraying means. In addition, the washing device 1 is provided with a washing means 20 for washing the plate-like object W held by the holding means 10 while being rotated.
但是,如圖2的比較例所示,一般的洗淨手段90前提為:構成為以水平方向進行刷洗洗淨,板狀物W相對保持手段10(參照圖1)以水平姿勢予以保持。因此,若在板狀物W發生翹曲,無法使洗淨構件91均一地抵接於板狀物W的全面。亦即,在板狀物W的高位置與低位置,洗淨構件91的抵碰情形或海綿部分的壓擠情形會改變,對板狀物W,無法以均一條件進行刷洗洗淨。因此,有污物等加工物殘留在板狀物W的表面之虞。 However, as shown in the comparative example of FIG. 2, the general washing means 90 is premised on that it is configured to perform brush washing in a horizontal direction, and the plate-like object W is held in a horizontal posture relative to the holding means 10 (see FIG. 1). Therefore, if warpage occurs in the plate-like object W, the cleaning member 91 cannot uniformly abut the entire surface of the plate-like object W. That is, in the high position and the low position of the plate-like object W, the collision condition of the cleaning member 91 or the squeezing condition of the sponge part is changed, and the plate-like object W cannot be washed and washed under uniform conditions. Therefore, there is a possibility that processed products such as dirt remain on the surface of the plate-like object W.
此時,亦考慮設置按照板狀物W的翹曲而使洗淨手段90以鉛直方向上下動的機構,但是有必須進行電性控制而洗淨手段90的構造變得複雜的問題。此外,一般在機械式構造上考慮強度而使用金屬製零件,但是有 重量增加且因被使用在洗淨液的藥品而腐蝕之虞。因此,在本實施形態中,當洗淨構件23抵接於板狀物W時,使洗淨構件23的動作追隨板狀物W的上面Wa。此外,使用輕量且抗藥性高的樹脂材料,形成洗淨手段20。 At this time, it is also considered to provide a mechanism for moving the cleaning means 90 up and down in the vertical direction in accordance with the warpage of the plate-like object W. However, there is a problem that the structure of the cleaning means 90 becomes complicated due to electrical control. In addition, metal parts are generally used in consideration of strength in mechanical structures, but there are Increased weight and corrosion due to chemicals used in cleaning solutions. Therefore, in this embodiment, when the cleaning member 23 is in contact with the plate-like object W, the operation of the cleaning member 23 is caused to follow the upper surface Wa of the plate-like object W. In addition, a washing material 20 is formed using a lightweight and highly resistant resin material.
以下參照圖3,詳細說明本實施形態之洗淨手段。圖3係本實施形態之洗淨手段的斜視圖及側面模式圖。其中,分別圖3A顯示洗淨手段的斜視圖,圖3B顯示洗淨手段的側面模式圖。 Hereinafter, the cleaning means of this embodiment will be described in detail with reference to FIG. 3. Fig. 3 is a perspective view and a side schematic view of a cleaning means according to this embodiment. 3A is a perspective view of the cleaning means, and FIG. 3B is a schematic side view of the cleaning means.
如圖3A及圖3B所示,洗淨手段20係構成為:在藉由保持手段10(參照圖1),板狀物W以周方向旋轉的狀態下,以擺動部21使洗淨構件23以板狀物W的徑方向擺動,且使洗淨構件23抵接於板狀物W的上面Wa,將板狀物W的上面Wa進行洗淨。擺動部21的擺動臂29係藉由樹脂材料形成為長形,可旋轉地被軸支在基端側的擺動軸(未圖示)。擺動部21係具備有使洗淨構件23追隨板狀物W的上面Wa的彎曲的追隨機構22。此外,在擺動部21係透過該追隨機構22安裝有被收容在構件保持具36的洗淨構件23。 As shown in FIGS. 3A and 3B, the washing means 20 is configured such that the plate member W is rotated in the circumferential direction by the holding means 10 (see FIG. 1), and the washing member 23 is made by the swinging portion 21. The plate-shaped object W is swung in the radial direction, the cleaning member 23 is brought into contact with the upper surface Wa of the plate-shaped object W, and the upper surface Wa of the plate-shaped object W is washed. The swing arm 29 of the swing section 21 is a swing shaft (not shown) formed in a long shape by a resin material and rotatably supported on the base end side. The swinging portion 21 is provided with a curved following mechanism 22 that causes the cleaning member 23 to follow the upper surface Wa of the plate-like object W. Further, a cleaning member 23 housed in the member holder 36 is attached to the swinging portion 21 through the following mechanism 22.
追隨機構22係使被固定在擺動臂29的前端側的導引板25、及保持洗淨構件23的保持具板(保持具)31以彈簧35相連結而構成。導引板25係藉由樹脂材料的縱板部26與橫板部27,形成為側面視為倒L字狀。在導引板25的縱板部26的前面,以水平方向隔著間隔設有透過保持具板31而以鉛直方向導引洗淨構件23的 一對鉛直導件28。在導引板25的橫板部27的下面係連結有以樹脂材料形成的彈簧35的上端。 The following mechanism 22 is configured by connecting a guide plate 25 fixed to the front end side of the swing arm 29 and a holder plate (holder) 31 holding the cleaning member 23 with a spring 35. The guide plate 25 is formed by a vertical plate portion 26 and a horizontal plate portion 27 made of a resin material, and is formed in an inverted L shape on the side. A front surface of the vertical plate portion 26 of the guide plate 25 is provided at a horizontal direction with an interval therebetween to pass the holder plate 31 to guide the cleaning member 23 in the vertical direction. A pair of vertical guides 28. An upper end of a spring 35 made of a resin material is connected to a lower surface of the horizontal plate portion 27 of the guide plate 25.
保持具板31係以樹脂材料形成為以擺動部21的延長方向延伸的長形狀。在保持具板31的基端側係立設有藉由一對鉛直導件28而被導引成鉛直方向的滑件32,在滑件32的上面係連結有彈簧35的下端。在保持具板31的前端側係形成有可安裝構件保持具(保持具)36的開口33。構件保持具36係由以樹脂材料形成為圓筒狀的上部保持具37、及下部保持具38所構成,透過各保持具的上端側的凸緣部分而被螺止在保持具板31。 The holder plate 31 is formed of a resin material and has an elongated shape extending in the extending direction of the swing portion 21. A slider 32 that is guided in the vertical direction by a pair of vertical guides 28 is erected on the base end side of the holder plate 31, and the lower end of the spring 35 is connected to the upper surface of the slider 32. An opening 33 to which a member holder (holder) 36 can be attached is formed on the front end side of the holder plate 31. The member holder 36 is composed of an upper holder 37 and a lower holder 38 which are formed in a cylindrical shape from a resin material, and is screwed to the holder plate 31 through a flange portion on the upper end side of each holder.
上部保持具37與下部保持具38係使上部保持具37的筒狀部分進入至下部保持具38的筒狀部分的內側而加以組合,在上部保持具37的筒狀部分的下端與下部保持具38的底壁部分之間安裝有洗淨構件23。在下部保持具38的底壁部分係形成有開口39,通過該開口39,洗淨構件23由下部保持具38朝下方突出。洗淨構件23係以PVA(Polyvinyl Alcohol,聚乙烯醇)形成為海綿狀,以上部保持具37的筒狀部分與下部保持具38的底壁部分夾入而被固定在構件保持具36。 The upper holder 37 and the lower holder 38 are combined so that the cylindrical portion of the upper holder 37 enters the inside of the cylindrical portion of the lower holder 38, and the lower end of the cylindrical portion of the upper holder 37 and the lower holder are combined. A cleaning member 23 is mounted between the bottom wall portions of 38. An opening 39 is formed in a bottom wall portion of the lower holder 38, and the cleaning member 23 projects downward from the lower holder 38 through the opening 39. The cleaning member 23 is formed into a sponge shape by PVA (Polyvinyl Alcohol, polyvinyl alcohol). The cylindrical portion of the upper holder 37 and the bottom wall portion of the lower holder 38 are sandwiched and fixed to the member holder 36.
在洗淨手段20中,藉由呈彎曲的板狀物W的上面Wa,被壓入洗淨構件23,洗淨構件23追隨板狀物W的上面Wa的彎曲。亦即,若洗淨構件23抵接於呈彎曲的板狀物W的上面Wa,彈簧35對應板狀物W的彎曲而伸縮,藉此沿著一對鉛直導件28,保持具板31、構件 保持具36、洗淨構件23一體地上下擺動。藉此,在板狀物W以周方向被旋轉的狀態下,洗淨構件23一邊追隨板狀物W的上面Wa的彎曲一邊以板狀物W的徑方向予以擺動,因此洗淨構件23抵接於板狀物W的上面全體。其中,按照板狀物W的種類,使用適當的彈簧常數者,作為彈簧35。 In the cleaning means 20, the upper surface Wa of the plate-shaped object W is pressed into the cleaning member 23, and the cleaning member 23 follows the curvature of the upper surface Wa of the plate-shaped object W. That is, when the cleaning member 23 abuts on the upper surface Wa of the curved plate-like object W, the spring 35 expands and contracts according to the bending of the plate-like object W, thereby holding the fixture plate 31 along the pair of vertical guides 28, member The holder 36 and the washing member 23 are vertically swung integrally. Thereby, in a state where the plate-like object W is rotated in the circumferential direction, the washing member 23 swings in the radial direction of the plate-like object W while following the curvature of the upper surface Wa of the plate-like object W, so the washing member 23 resists. It is connected to the entire upper surface of the plate-like object W. Among them, an appropriate spring constant is used as the spring 35 according to the type of the plate-like object W.
參照圖4,說明藉由洗淨手段所為之洗淨動作。圖4係顯示藉由本實施形態之洗淨手段所為之洗淨動作之一例的圖。其中,分別圖4A顯示板狀物的外周緣側的洗淨狀態,圖4B顯示板狀物的中央側的洗淨狀態。 The washing operation performed by the washing means will be described with reference to FIG. 4. FIG. 4 is a diagram showing an example of a washing operation performed by the washing means of the present embodiment. 4A shows a washing state on the outer peripheral side of the plate, and FIG. 4B shows a washing state on the center of the plate.
如圖4A所示,藉由保持手段10的複數夾臂11,保持板狀物W的外周緣,藉由旋轉平台12,被保持在複數夾臂11的板狀物W以周方向予以旋轉。此外,由旋轉平台12的噴射口14朝向板狀物W的下面Wb噴射洗淨液,並且由旋轉平台12的上方的噴射噴嘴15朝向板狀物W的上面Wa噴射洗淨液。接著,擺動部21在旋轉中的板狀物W的中心與外周緣之間使洗淨構件23擺動,一邊藉由追隨機構22使其追隨板狀物W的彎曲一邊使洗淨構件23抵接於板狀物W的上面全體。 As shown in FIG. 4A, the outer periphery of the plate-shaped object W is held by the plurality of clamping arms 11 of the holding means 10, and the plate-shaped object W held by the plurality of clamping arms 11 is rotated in the circumferential direction by the rotating platform 12. In addition, the cleaning liquid is sprayed toward the lower surface Wb of the plate W from the spray port 14 of the rotary platform 12, and the cleaning liquid is sprayed toward the upper surface Wa of the plate W from the spray nozzle 15 above the rotary platform 12. Next, the swinging part 21 swings the cleaning member 23 between the center of the rotating plate-like object W and the outer periphery, and abuts the cleaning member 23 while following the bending of the plate-like object W by the following mechanism 22 The entire upper surface of the plate-like object W.
此時,板狀物W翹曲成由中央朝向外周緣側變高,因此若洗淨構件23被定位在板狀物W的外周緣側時,洗淨構件23藉由板狀物W的上面Wa而被壓入至上方。藉此,保持具板31的滑件32一邊藉由導引板25的一對鉛直導件28被導引一邊上動,將導引板25與保持具 板31相連結的彈簧35即被收縮。如上所示,在板狀物W的上面Wa的高位置,係抵抗彈簧35的反作用力,洗淨構件23進行上動,藉此使洗淨構件23追隨板狀物W的上面Wa的彎曲。 At this time, the plate-like object W is warped to become higher from the center toward the outer peripheral side. Therefore, when the cleaning member 23 is positioned on the outer-peripheral side of the plate-like object W, the cleaning member 23 passes through the upper surface of the plate-like object W. Wa is pushed upward. Thereby, the slider 32 of the holder plate 31 moves up while being guided by the pair of vertical guides 28 of the guide plate 25, and moves the guide plate 25 and the holder The spring 35 connected to the plate 31 is contracted. As shown above, at a high position of the upper surface Wa of the plate-shaped object W, the washing member 23 is moved upward against the reaction force of the spring 35, thereby causing the cleaning member 23 to follow the bending of the upper surface Wa of the plate-shaped object W.
另一方面,若洗淨構件23被定位在板狀物W的中央側,洗淨構件23藉由彈簧35的反作用力,洗淨構件23被稍微壓回至下方。藉此,保持具板31的滑件32一邊藉由導引板25的一對鉛直導件28被導引一邊下動,將導引板25與保持具板31相連結的彈簧35即被伸長。如上所示,在板狀物W的上面Wa的低位置,係藉由彈簧35的反作用力,以板狀物W的上面Wa的高低差份,洗淨構件23進行下動,藉此使洗淨構件23追隨板狀物W的上面Wa的彎曲。 On the other hand, when the cleaning member 23 is positioned on the center side of the plate-like object W, the cleaning member 23 is slightly pressed down by the reaction force of the spring 35. Thereby, the slider 32 of the holder plate 31 moves down while being guided by the pair of vertical guides 28 of the guide plate 25, and the spring 35 connecting the guide plate 25 and the holder plate 31 is extended. . As shown above, at the low position of the upper surface Wa of the plate-like object W, the cleaning member 23 is moved downward by the reaction force of the spring 35 to move the cleaning member 23 down, thereby causing the washing The net member 23 follows the curvature of the upper surface Wa of the plate-like object W.
如上所示,藉由使洗淨構件23追隨板狀物W的上面Wa的彎曲,使洗淨構件23抵接於板狀物W的上面全體。因此,在板狀物W的高位置與低位置,使洗淨構件23的抵碰情形或海綿部分的擠壓情形大致相同,可對板狀物W,以大致均一的條件進行刷洗洗淨。此外,由於使用抗藥性高的樹脂材料,形成洗淨手段20的全體,因此即使在洗淨液含有藥品的情形下,亦不會如金屬般有洗淨手段20因藥品而腐蝕的情形,與金屬相比較,可更加達成輕量化。 As described above, the cleaning member 23 follows the curvature of the upper surface Wa of the plate-shaped object W, thereby bringing the cleaning member 23 into contact with the entire upper surface of the plate-shaped object W. Therefore, in the high position and the low position of the plate-like object W, the collision condition of the cleaning member 23 or the pressing condition of the sponge part is substantially the same, and the plate-like object W can be scrubbed and washed under substantially uniform conditions. In addition, since a highly resistant resin material is used to form the entire cleaning means 20, even when the cleaning solution contains a drug, the cleaning means 20 does not corrode due to the drug like a metal, and Compared with metal, it can achieve more weight reduction.
如以上所示,在本實施形態之洗淨裝置1中,在保持板狀物W的外周緣的狀態下,洗淨液被噴射 至板狀物W的上面Wa及下面Wb,並且洗淨構件23被抵接於板狀物W的上面Wa,使板狀物W被刷洗洗淨。此時,在板狀物W以周方向旋轉的狀態下,洗淨構件23一邊追隨板狀物W的上面Wa的彎曲一邊以板狀物W的徑方向被擺動,因此可使洗淨構件23抵接於板狀物W的上面全體。此外,洗淨構件23抵接於板狀物W的上面Wa,沿著板狀物W的上面Wa,追隨洗淨構件23的動作,因此不需要有使洗淨構件23朝上下方向移動的機構,不會有裝置構成變得複雜的情形。如上所示,即使為翹曲嚴重的板狀物W,亦可以簡易的構成,將板狀物W的全面良好地洗淨。 As described above, in the cleaning device 1 of this embodiment, the cleaning liquid is sprayed while the outer periphery of the plate-like object W is held. To the upper surface Wa and lower surface Wb of the plate-like object W, the cleaning member 23 is brought into contact with the upper surface Wa of the plate-like object W, and the plate-like object W is washed and washed. At this time, in a state where the plate-like object W is rotated in the circumferential direction, the washing member 23 is swung in the radial direction of the plate-like object W while following the curvature of the upper surface Wa of the plate-like object W, so that the washing member 23 can be made. The entire upper surface of the plate-shaped object W abuts. In addition, the cleaning member 23 is in contact with the upper surface Wa of the plate-like object W, and follows the operation of the cleaning member 23 along the upper surface Wa of the plate-like object W. Therefore, there is no need for a mechanism for moving the cleaning member 23 in the vertical direction. , There is no case where the device configuration becomes complicated. As described above, even if the plate-like object W is severely warped, the plate-like object W can be easily cleaned with a simple structure.
其中,本發明並非限定於上述實施形態,可作各種變更來實施。在上述實施形態中,關於所附圖面所圖示的大小或形狀等,並非限定於此,可在發揮本發明之效果的範圍內作適當變更。此外,只要未脫離本發明之目的的範圍,可適當變更來實施。 However, the present invention is not limited to the above-mentioned embodiment, and various modifications can be implemented. In the above-mentioned embodiment, the size, shape, and the like shown in the drawings are not limited to this, and may be appropriately changed within a range in which the effects of the present invention are exhibited. In addition, as long as it does not deviate from the scope of the object of the present invention, it can be appropriately modified and implemented.
例如,在本實施形態中,係形成為洗淨手段20藉由彈簧35的伸縮,保持具板31以上下方向使其擺動,使被固定在保持具板31的前端的洗淨構件23追隨板狀物W的彎曲的構成,但是並非限定於該構成。洗淨手段20若具備:藉由抵接於呈彎曲的板狀物W的上面,洗淨構件23追隨板狀物W的上面的追隨機構22即可。以下參照圖5及圖6,說明洗淨手段的變形例。其中,在變形例之洗淨手段中,針對與本實施形態相同的構成,係省 略說明。 For example, in this embodiment, the cleaning means 20 is formed by the expansion and contraction of the spring 35 to swing the holder plate 31 up and down, and the cleaning member 23 fixed to the front end of the holder plate 31 follows the plate. The curved configuration of the object W is not limited to this configuration. The cleaning means 20 may be provided with a follower mechanism 22 that follows the upper surface of the plate-shaped object W by abutting on the upper surface of the curved plate-shaped object W. Hereinafter, a modification of the washing means will be described with reference to FIGS. 5 and 6. Among them, in the cleaning method of the modification, the same configuration as the present embodiment is omitted. Slightly explained.
如圖5所示,在第1變形例之洗淨手段40中,擺動部41的追隨機構42係在擺動臂49的前端側透過L字板45安裝有延長板48,將延長板48與構件保持具56以複數(在本實施形態中為3個)彈簧55相連結而構成。L字板45係藉由樹脂材料的縱板部46、及橫板部47,形成為側面視為倒L字狀。在L字板45的橫板部47係固定有以樹脂材料形成的延長板48,在延長板48的下面係連結有以樹脂材料形成的複數彈簧55的上端。 As shown in FIG. 5, in the cleaning method 40 of the first modification, the follower mechanism 42 of the swinging portion 41 is attached to the front end side of the swinging arm 49 through an L-shaped plate 45 to which an extension plate 48 is attached. The holder 56 is constituted by a plurality of (three in this embodiment) springs 55 connected to each other. The L-shaped plate 45 is formed by a vertical plate portion 46 and a horizontal plate portion 47 made of a resin material, and is formed in a side view of an inverted L shape. An extension plate 48 made of a resin material is fixed to the horizontal plate portion 47 of the L-shaped plate 45, and an upper end of a plurality of springs 55 made of a resin material is connected to the lower surface of the extension plate 48.
在L字板45的縱板部46係固定有L字狀的保持具板51的縱板部52,在保持具板51的橫板部53形成有可以鉛直方向導引構件保持具56的開口(未圖示)。構件保持具56的筒狀部分進入至保持具板51的開口,藉由構件保持具56的凸緣部分,可止動地被支持在保持具板51。如上所示,第1變形例之保持具板51並非為如上述本實施形態之保持具板31(參照圖3)般與構件保持具56一體擺動的擺動構件,而是作為構件保持具56的鉛直方向的導件發揮功能。 The vertical plate portion 46 of the L-shaped plate 45 is fixed to the vertical plate portion 52 of the L-shaped holder plate 51, and the horizontal plate portion 53 of the holder plate 51 is formed with an opening for guiding the member holder 56 in the vertical direction. (Not shown). The cylindrical portion of the component holder 56 enters the opening of the holder plate 51, and the flange portion of the component holder 56 is supported on the holder plate 51 so as to be stopped. As described above, the holder plate 51 of the first modification is not a swing member that swings integrally with the member holder 56 like the holder plate 31 (see FIG. 3) of the present embodiment described above, but serves as a member holder 56. The vertical guide functions.
構件保持具56係如上所述由上部保持具57及下部保持具58所構成,在上部保持具57的上面連結有複數彈簧55的下端。複數彈簧55係以由構件保持具56受到均一的力的方式,以構件保持具56的周方向以等間隔配置。此時,由於複數彈簧55位於洗淨構件43與板狀物W的上面Wa的抵接位置的正上方,由抵接位置對複數 彈簧55,抵接時的反作用力被直接傳達。如上所示,在第1變形例之洗淨手段40中,抵接時的反作用力筆直地作用於彈簧55,因此可在構件保持具56擺動時的偏位受到抑制的狀態下,使洗淨構件43的動作追隨呈彎曲的板狀物W的上面Wa。 The member holder 56 is composed of the upper holder 57 and the lower holder 58 as described above, and the lower end of the plurality of springs 55 is connected to the upper surface of the upper holder 57. The plurality of springs 55 are arranged at regular intervals in the circumferential direction of the member holder 56 so that the member holder 56 receives a uniform force. At this time, since the plurality of springs 55 are located directly above the contact position between the cleaning member 43 and the upper surface Wa of the plate-like object W, the plurality of springs 55 are aligned by the contact position. The spring 55 directly transmits the reaction force at the time of contact. As described above, in the cleaning means 40 according to the first modification, since the reaction force at the time of the abutment acts directly on the spring 55, the cleaning can be performed in a state in which the displacement of the member holder 56 during swinging is suppressed. The movement of the member 43 follows the upper surface Wa of the curved plate-shaped object W.
如圖6A及圖6B所示,在第2變形例之洗淨手段60中,擺動部61的追隨機構62在擺動臂64的前端側透過L字板65安裝有延長板68,藉由延長板68的活塞構件71與構件保持具81的凹部82,構成空氣彈簧。L字板65係藉由樹脂材料的縱板部66及橫板部67,形成為側面視為倒L字狀。在L字板65的橫板部67係固定有以樹脂材料形成的延長板68,在延長板68係形成有供安裝以樹脂材料形成的活塞構件71的開口69。 As shown in FIG. 6A and FIG. 6B, in the cleaning means 60 of the second modification, the follower mechanism 62 of the swinging portion 61 is provided with an extension plate 68 through the L-shaped plate 65 at the front end side of the swing arm 64, and the extension plate The piston member 71 of 68 and the recess 82 of the member holder 81 constitute an air spring. The L-shaped plate 65 is formed by a vertical plate portion 66 and a horizontal plate portion 67 made of a resin material, and is formed in a side view of an inverted L shape. An extension plate 68 made of a resin material is fixed to the horizontal plate portion 67 of the L-shaped plate 65, and an opening 69 is formed in the extension plate 68 to attach a piston member 71 made of a resin material.
活塞構件71係筒狀部分由延長板68的開口69鉛直向下延伸,以筒狀部分的基端的凸緣部分被固定在延長板68。在活塞構件71的筒狀部分係形成有空氣流路,在筒狀部分的上端側係透過連接器72連接有壓縮器等。活塞構件71的筒狀部分係進入至構件保持具81的凹部82,在活塞構件71的下端係形成有對凹部82內噴射鉛直朝下的壓縮空氣的空氣噴射口73。藉由來自該空氣噴射口73的壓縮空氣的噴射,調整構件保持具81的凹部82內的壓力。 The cylindrical portion of the piston member 71 extends vertically downward from the opening 69 of the extension plate 68, and the flange portion at the base end of the cylindrical portion is fixed to the extension plate 68. An air flow path is formed in the cylindrical portion of the piston member 71, and a compressor or the like is connected to the upper end side of the cylindrical portion through a connector 72. The cylindrical portion of the piston member 71 enters the recessed portion 82 of the member holder 81, and an air injection port 73 is formed at the lower end of the piston member 71 to inject compressed air vertically downward into the recessed portion 82. The pressure in the recessed portion 82 of the member holder 81 is adjusted by the injection of the compressed air from the air injection port 73.
在L字板65的縱板部66係固定有L字狀的保持具板75的縱板部76,在保持具板75的橫板部77係 形成有可以鉛直方向導引構件保持具81的開口78。構件保持具81的筒狀部分進入至保持具板75的開口78,藉由構件保持具81的凸緣部分,可止動地被支持在保持具板75。如上所示,第2變形例之保持具板75並非為如上述本實施形態之保持具板31(參照圖3)般與構件保持具81一體擺動的擺動構件,而是作為構件保持具81的鉛直方向的導件發揮功能。 The vertical plate portion 66 of the L-shaped plate 65 is fixed to the vertical plate portion 76 of the L-shaped holder plate 75, and the horizontal plate portion 77 of the holder plate 75 is An opening 78 is formed to guide the member holder 81 in the vertical direction. The cylindrical portion of the component holder 81 enters the opening 78 of the holder plate 75, and the flange portion of the component holder 81 is supported on the holder plate 75 in a stopable manner. As described above, the holder plate 75 of the second modification is not a swinging member that swings integrally with the member holder 81 like the holder plate 31 (see FIG. 3) of the present embodiment described above, but serves as a member holder 81. The vertical guide functions.
構件保持具81係如上所述由上部保持具83與下部保持具84所構成,在上部保持具83形成有供活塞構件71的筒狀部分插入的凹部82。如上所示,在第2變形例中,構件保持具81的上部保持具83作為具有活塞構件71所進入的凹部82的汽缸構件來發揮功能。此時,壓縮空氣由活塞構件71的空氣噴射口73被噴射至凹部82內,凹部82的底面與活塞構件71的下面之間的空間的壓力被提高。接著,在具有凹部82內的空間的狀態下,洗淨構件63抵接於板狀物W,藉此一邊壓擠凹部82內的空間一邊沿著活塞構件71,洗淨構件63連同構件保持具81被上下擺動。 The component holder 81 is composed of the upper holder 83 and the lower holder 84 as described above, and the upper holder 83 is formed with the recessed portion 82 into which the cylindrical portion of the piston member 71 is inserted. As described above, in the second modification, the upper holder 83 of the member holder 81 functions as a cylinder member having a recessed portion 82 into which the piston member 71 enters. At this time, compressed air is injected into the recessed portion 82 from the air injection port 73 of the piston member 71, and the pressure in the space between the bottom surface of the recessed portion 82 and the lower surface of the piston member 71 is increased. Next, in a state having the space in the recessed portion 82, the cleaning member 63 abuts against the plate-like object W, thereby pressing the space in the recessed portion 82 along the piston member 71, and the cleaning member 63 together with the member holder 81 was swung up and down.
如上所示,在第2變形例之洗淨手段60中,藉由使用空氣彈簧來取代彈簧,無須使用彈簧等,即可使洗淨構件43的動作追隨呈彎曲的板狀物W的上面Wa。此外,由於在洗淨構件63與板狀物W的上面Wa的抵接位置的正上方,構件保持具81以上下方向擺動,因此抑制構件保持具81擺動時的偏位。其中,凹部82內的壓力 係依板狀物W的種類而被調整為適當的值。 As described above, in the cleaning means 60 of the second modification, an air spring is used instead of a spring, and the operation of the cleaning member 43 can follow the upper surface Wa of the curved plate W without using a spring or the like. . In addition, since the member holder 81 swings in the up and down direction directly above the abutting position of the cleaning member 63 and the upper surface Wa of the plate-like object W, the deviation of the member holder 81 when it swings is suppressed. Among them, the pressure in the recess 82 The value is adjusted to an appropriate value depending on the type of the plate-like object W.
其中,洗淨手段20係除了上述第1、第2變形例之洗淨手段40、60之外,亦考慮其他變形例。例如,亦可形成為由第1變形例之洗淨構件40將保持具板51卸下後的構成,亦可形成為在延長板48透過單一彈簧55而連結構件保持具56的構成。 Among them, the washing means 20 is not only the washing means 40 and 60 of the above-mentioned first and second modified examples, but also other modified examples. For example, it may be a configuration in which the holder plate 51 is removed by the cleaning member 40 of the first modification, or a configuration in which the member holder 56 is connected to the extension plate 48 through a single spring 55.
此外,在本實施形態及各變形例中,洗淨手段20、40、60以由抗藥性高的樹脂材料形成為佳,但是並非限定於該構成。例如亦可由抗藥性高的金屬材料形成,若為未含有藥品的洗淨液,亦可使用抗藥性低的材料。 Moreover, in this embodiment and each modification, although the washing means 20, 40, and 60 are preferably formed from the resin material with high chemical resistance, it is not limited to this structure. For example, it may be formed of a metal material having high chemical resistance, and if it is a cleaning solution that does not contain a drug, a material having low chemical resistance may also be used.
此外,在本實施形態及各變形例中,係形成為保持手段10藉由複數夾臂11來保持板狀物W的外周緣的構成,但是並非限定於該構成。保持手段10若為可保持板狀物W的外周緣的構成即可,例如亦可形成為藉由使複數進退銷抵接於板狀物W的外周緣來保持的構成。 In addition, in this embodiment and each modification, although the holding means 10 hold | maintains the outer peripheral edge of the plate-shaped object W by the several clamp arm 11, it is not limited to this structure. The holding means 10 may be a configuration capable of holding the outer peripheral edge of the plate-like object W, and may be configured to hold the plural advance and retreat pins by contacting the outer peripheral edge of the plate-like object W, for example.
此外,在本實施形態及各變形例中,洗淨液噴射手段以旋轉平台12的噴射口14與噴射噴嘴15所構成,但是並非限定於該構成。洗淨液噴射手段若為可對板狀物W的上面Wa及下面Wb噴射洗淨液的構成即可,例如亦可由設在板狀物W的上方及下方的上下的噴射噴嘴所構成。 In addition, in this embodiment and each modification, the cleaning liquid spraying means is configured by the spraying port 14 and the spraying nozzle 15 of the rotary table 12, but it is not limited to this configuration. The cleaning liquid spraying means may be configured so that the cleaning liquid can be sprayed on the upper surface Wa and the lower surface Wb of the plate-shaped object W, and for example, it may be configured by upper and lower spray nozzles provided above and below the plate-shaped object W.
此外,在本實施形態及各變形例中,洗淨構 件23形成為海綿狀,但是並非限定於該構成。洗淨構件23若為可刷洗洗淨板狀物W者即可,亦可形成為例如刷子狀。 In addition, in this embodiment and each modification, the washing structure The tool 23 is formed in a sponge shape, but is not limited to this configuration. The cleaning member 23 only needs to be capable of brushing and cleaning the plate-like object W, and may be formed into a brush shape, for example.
此外,在本實施形態及各變形例中,係形成為藉由擺動部21使洗淨構件23回旋,使洗淨構件23以板狀物W的徑方向擺動的構成,但是並非限定於該構成。擺動部21若為使洗淨構件23以板狀物W的徑方向擺動的構成即可,例如亦可藉由使洗淨構件23直線移動,使洗淨構件23以板狀物W的徑方向擺動。 In addition, in the present embodiment and each modification, the configuration is such that the cleaning member 23 is rotated by the swinging portion 21 and the cleaning member 23 is swung in the radial direction of the plate-like object W, but it is not limited to this configuration. . The swinging portion 21 may be configured to swing the cleaning member 23 in the radial direction of the plate-like object W. For example, the cleaning member 23 may be moved linearly to make the cleaning member 23 in the radial direction of the plate-like object W. swing.
如以上說明所示,本發明係具有即使為翹曲激烈的板狀物,亦可以簡易構成,將板狀物的全面良好地洗淨的效果,尤其有用於將產生激烈翹曲的板狀物進行洗淨的洗淨裝置。 As described above, the present invention has the effect of easily constructing a plate-like object even if it is a highly warped plate-like object, and it is particularly useful for a plate-like object that is subject to severe warpage. A washing device for washing.
10‧‧‧保持手段 10‧‧‧ Means of retention
11‧‧‧夾臂 11‧‧‧ Clamp Arm
12‧‧‧旋轉平台 12‧‧‧ rotating platform
13‧‧‧平台面 13‧‧‧platform surface
14‧‧‧噴射口(洗淨液噴射手段) 14‧‧‧ spraying port (washing liquid spraying means)
15‧‧‧噴射噴嘴(洗淨液噴射手段) 15‧‧‧ spray nozzle (washing liquid spray means)
16、17‧‧‧供給源(洗淨液噴射手段) 16, 17‧‧‧ supply source (washing liquid spraying means)
20‧‧‧洗淨手段 20‧‧‧washing means
21‧‧‧擺動部 21‧‧‧Swing section
22‧‧‧追隨機構 22‧‧‧ followers
23‧‧‧洗淨構件 23‧‧‧washing components
25‧‧‧導引板 25‧‧‧Guide Board
28‧‧‧鉛直導件 28‧‧‧ vertical guide
31‧‧‧保持具板(保持具) 31‧‧‧Retainer plate (retainer)
32‧‧‧滑件 32‧‧‧ Slider
35‧‧‧彈簧 35‧‧‧Spring
36‧‧‧構件保持具(保持具) 36‧‧‧ component holder (holder)
W‧‧‧板狀物 W‧‧‧ Plate
Wa‧‧‧板狀物的上面 The top of Wa‧‧‧ plate
Wb‧‧‧板狀物的下面 Wb‧‧‧ Under the plate
Claims (3)
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| Application Number | Priority Date | Filing Date | Title |
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| JP2016-084419 | 2016-04-20 | ||
| JP2016084419A JP6661453B2 (en) | 2016-04-20 | 2016-04-20 | Cleaning equipment |
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| Publication Number | Publication Date |
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| TW201801808A true TW201801808A (en) | 2018-01-16 |
| TWI711494B TWI711494B (en) | 2020-12-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106107999A TWI711494B (en) | 2016-04-20 | 2017-03-10 | Washing device |
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| Country | Link |
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| JP (1) | JP6661453B2 (en) |
| KR (1) | KR102264628B1 (en) |
| TW (1) | TWI711494B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108648989A (en) * | 2018-05-16 | 2018-10-12 | 福建北电新材料科技有限公司 | A kind of single crystal silicon carbide substrate wafer cleaning method |
| CN111992268A (en) * | 2020-09-18 | 2020-11-27 | 曲秀芹 | Laboratory test bench |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108538761B (en) * | 2018-04-09 | 2020-11-13 | 绍兴文理学院 | Belt cleaning device is used in processing of photovoltaic board silicon chip |
| JP7632330B2 (en) | 2022-01-31 | 2025-02-19 | 三菱電機株式会社 | Semiconductor manufacturing apparatus and method for manufacturing semiconductor device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69522617T2 (en) * | 1994-06-28 | 2002-07-04 | Ebara Corp., Tokio/Tokyo | Method and device for cleaning workpieces |
| JPH10189512A (en) * | 1996-12-26 | 1998-07-21 | Sony Corp | Substrate cleaning device |
| JP4089837B2 (en) | 1997-07-10 | 2008-05-28 | 株式会社ディスコ | Spinner device |
| JP4111299B2 (en) * | 1999-07-26 | 2008-07-02 | 東京エレクトロン株式会社 | Substrate cleaning tool, substrate cleaning apparatus, and substrate cleaning method |
| US6648979B2 (en) * | 2001-01-24 | 2003-11-18 | International Business Machines Corporation | Apparatus and method for wafer cleaning |
| JP2007250783A (en) * | 2006-03-15 | 2007-09-27 | Dainippon Screen Mfg Co Ltd | Substrate holding and rotating apparatus |
| JP2014110270A (en) | 2012-11-30 | 2014-06-12 | Disco Abrasive Syst Ltd | Cleaning device |
| JP6279276B2 (en) * | 2013-10-03 | 2018-02-14 | 株式会社荏原製作所 | Substrate cleaning apparatus and substrate processing apparatus |
-
2016
- 2016-04-20 JP JP2016084419A patent/JP6661453B2/en active Active
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2017
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108648989A (en) * | 2018-05-16 | 2018-10-12 | 福建北电新材料科技有限公司 | A kind of single crystal silicon carbide substrate wafer cleaning method |
| CN108648989B (en) * | 2018-05-16 | 2020-12-25 | 福建北电新材料科技有限公司 | Method for cleaning single crystal silicon carbide substrate wafer |
| CN111992268A (en) * | 2020-09-18 | 2020-11-27 | 曲秀芹 | Laboratory test bench |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20170120024A (en) | 2017-10-30 |
| JP2017195271A (en) | 2017-10-26 |
| TWI711494B (en) | 2020-12-01 |
| KR102264628B1 (en) | 2021-06-11 |
| JP6661453B2 (en) | 2020-03-11 |
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