本發明之自發光感光樹脂包含光致發光量子點、光聚合化合物、光聚合引發劑、鹼性可溶性樹脂、UV吸收劑及溶劑。 下面詳細說明自發光感光樹脂如下。光致發光 量子點
本發明之自發光感光樹脂包含光致發光量子點粒子。 量子點(QD：Quantum Dot)為奈米大小之半導體物質。原子形成分子，而分子構成稱為分子簇之小的分子集合體，進而形成奈米粒子。具體地，當此種奈米粒子帶有半導體特性時，稱為量子點。量子點自外部受到能量而達到激發狀態時，自發地發射對應於相應能帶隙之能量。 本發明之感光樹脂組合物包含上述光致發光量子點粒子，因此由其製造之彩色濾光片可通過光照射而發光(光致發光)。此外，由於發射具有顏色之光，因此色彩再現性更優異，且由於光致發光使得光向全方向發射，因此亦能夠改善視角。 根據本發明之量子點粒子只要為由光之刺激而發光的量子點粒子即不受特別限制，例如可選自由II-VI族半導體化合物、III-V族半導體化合物、IV-VI族半導體化合物、IV族元素或包含其之化合物及其組合組成之群中。其可單獨使用或以二種以上混合使用。 該II-VI族半導體化合物可選自如下群中：選自由CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe及其混合物組成之群中的二元素化合物；選自由CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe及其混合物組成之群中的三元素化合物；以及選自由CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe及其混合物組成之群中的四元素化合物。該III-V族半導體化合物可選自如下群中：選自由GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb及其混合物組成之群中的二元素化合物；選自由GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP及其混合物組成之群中的三元素化合物；以及選自由GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb及其混合物組成之群中的四元素化合物。該IV-VI族半導體化合物可選自如下群中：選自由SnS、SnSe、SnTe、PbS、PbSe、PbTe及其混合物組成之群中的二元素化合物；選自由SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe及其混合物組成之群中的三元素化合物；以及SnPbSSe、SnPbSeTe、SnPbSTe及其混合物組成之群中的四元素化合物。該IV族元素或包含其之化合物可選自如下群中：選自由Si、Ge及其混合物組成之群中的元素；以及選自由SiC、SiGe及其混合物組成之群中的二元素化合物。 量子點粒子可為均質(homogeneous)單一結構；核-殼(core-shell)、梯度(gradient)結構等二重結構；或其混合結構。 核-殼(core-shell)結構中，分別構成核(core)及殼(shell)之物質可為由上面提及的互不相同之半導體化合物構成。例如，該核可為包含選自由CdSe、CdS、ZnS、ZnSe、CdTe、CdSeTe、CdZnS、PbSe、AgInZnS及ZnO組成之群中之一種以上的物質，但不限於此。該殼可為選自由CdSe、ZnSe、ZnS、ZnTe、CdTe、PbS、TiO、SrSe及HgSe組成之群中之一種以上的物質，但不限於此。 如同現有之彩色濾光片製造中使用的著色感光樹脂組合物為了色彩之顯示而包含紅、綠、藍著色劑，光致發光量子點粒子亦可分類為紅量子點粒子、綠量子點粒子及藍量子點粒子，而根據本發明之量子點粒子可為紅量子點粒子、綠量子點粒子或藍量子點粒子。 量子點粒子可藉由濕化學法、有機金屬化學蒸鍍法或分子束磊晶法而合成。 濕化學法為在有機溶劑中加入前體物質使粒子生長之方法。當結晶在生長時，有機溶劑自然地在量子點結晶表面配位且起到分散劑之作用，從而調節結晶之生長，因此相比有機金屬化學蒸鍍(MOCVD, metal organic chemical vapor deposition)或分子束磊晶(MBE, molecular beam epitaxy)等氣相蒸鍍法，能夠藉由更便宜之工序來控制奈米粒子之生長。 根據本發明之光致發光量子點粒子的含量不受特別限制，例如，較佳為自發光感光樹脂固體成分總重量之3至80重量%，更佳為5至70重量%。若量子點粒子之含量小於上述範圍時，則發光效率可能會甚微；若大於上述範圍時，則使得其他組分之含量相對地不足，從而存在難以形成像素圖案之問題。光聚合化合物
本發明之自發光感光樹脂中含有的光聚合化合物為借助光或後述之光聚合引發劑的作用而能夠聚合的化合物，可舉例為單官能單體、雙官能單體、其他多官能單體等。 單官能單體之具體例可為壬基苯基卡必醇丙烯酸酯(nonylphenyl carbitol acrylate)、丙烯酸2-羥基-3-苯氧基丙酯(2-hydroxy-3-phenoxypropyl acrylate)、2-乙基己基卡必醇丙烯酸酯、丙烯酸-2-羥乙酯、N-乙烯基吡咯烷酮等。 雙官能單體之具體例可為1,6-己二醇二甲基丙烯酸酯(1,6-hexanediol dimethacrylate)、乙二醇二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、三乙二醇二甲基丙烯酸酯、雙酚A之雙[2-(丙烯醯氧基)乙基]醚(bis[2-(acryloyloxy)ethyl]ether)、3-甲基戊二醇二甲基丙烯酸酯(3-methylpentandiol dimethacrylate)等。 其他多官能團單體之具體例可為三羥甲基丙烷三甲基丙烯酸酯、季戊四醇三甲基丙烯酸酯(pentaerythritol trimethacrylate)、季戊四醇四甲基丙烯酸酯(pentaerythritol tetramethacrylate)、聚二季戊四醇五甲基丙烯酸酯(dipentaerythritol pentamethacrylate)、聚二季戊四醇六甲基丙烯酸酯(dipentaerythritol hexamethacrylate)等。較佳使用其中的雙官能以上之多官能單體。 相對於自發光感光樹脂中之固體成分，該光聚合化合物之含量較佳在5至50質量%範圍內，更佳在7至45質量%範圍內。當光聚合化合物之含量在上述範圍以內時，能夠使得像素部的強度或平滑性良好。光聚合引發劑
本發明之自發光感光樹脂中含有的光聚合引發劑不受特別限制，可為選自由三嗪類化合物、苯乙酮類化合物、聯咪唑類化合物及肟化合物組成之群中之一種以上的化合物。含有該光聚合引發劑之自發光感光樹脂具有高敏感度，而使用該組合物形成之像素其像素部具有良好的強度或圖案性。 此外，較佳與光聚合引發劑一同使用光聚合引發輔助劑，含有其之自發光感光樹脂具有更高的敏感度，若使用該組合物形成彩色濾光片，能夠提高生產性。 三嗪類化合物例如可為2,4-雙(三氯甲基)-6-(4-甲氧基苯基)-1,3,5-三嗪、2,4-雙(三氯甲基)-6-(4-甲氧基萘基)-1,3,5-三嗪、2,4-雙(三氯甲基)-6-胡椒基-1,3,5-三嗪、2,4-雙(三氯甲基)-6-(4-甲氧基苯乙烯基)-1,3,5-三嗪、2,4-雙(三氯甲基)-6-[2-(5-甲基呋喃-2-基)乙烯基]-1,3,5-三嗪、2,4-雙(三氯甲基)-6-[2-(呋喃-2-基)乙烯基]-1,3,5-三嗪、2,4-雙(三氯甲基)-6-[2-(4-二乙胺基-2-甲基苯基)乙烯基]-1,3,5-三嗪、2,4-雙(三氯甲基)-6-[2-(3,4-二甲氧基苯基)乙烯基]-1,3,5-三嗪等。 苯乙酮類化合物可為例如二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、苯偶醯二甲基縮酮(Benzil Dimethyl Ketal)、2-羥基-1-[4-(2-羥基乙氧基)苯基]-2-甲基丙烷-1-酮、1-羥基環己烷苯酮、2-甲基-1-(4-甲基硫代苯基)-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲胺基-1-(4-嗎啉基苯基)丁烷-1-酮、2-羥基-2-甲基-1-[4-(1-甲基乙烯基)苯基]丙烷-1-酮之低聚體等。此外，可舉例為由下列化學式1表示之化合物。 [化學式1]上述化學式1中，R1至R4相同或不相同，各自獨立地表示氫原子、鹵素原子、羥基、經C1~C12烷基取代的或未取代之苯基、經C1~C12烷基取代或未取代之苄基或經C1~C12烷基取代或未取代之萘基。 上述化學式1表示之化合物的種類不受特別限制，具體地可舉例為2-甲基-2-胺基(4-嗎啉基苯基)乙烷-1-酮、2-乙基-2-胺基(4-嗎啉基苯基)乙烷-1-酮、2-丙基-2-胺基(4-嗎啉基苯基)乙烷-1-酮、2-丁基-2-胺基(4-嗎啉基苯基)乙烷-1-酮、2-甲基-2-胺基(4-嗎啉基苯基)丙烷-1-酮、2-甲基-2-胺基(4-嗎啉基苯基)丁烷-1-酮, 2-乙基-2-胺基(4-嗎啉基苯基)丙烷-1-酮、2-乙基-2-胺基(4-嗎啉基苯基)丁烷-1-酮、2-甲基-2-甲基胺基(4-嗎啉基苯基)丙烷-1-酮、2-甲基-2-二甲胺基(4-嗎啉基苯基)丙烷-1-酮、2-甲基-2-二乙胺基(4-嗎啉基苯基)丙烷-1-酮等。 該聯咪唑化合物可舉例為2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(烷氧基苯基)聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(三烷氧基苯基)聯咪唑、4,4',5,5'位置之苯基經烷氧羰基取代的咪唑化合物等。其中較佳使用2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑。 該肟化合物可舉例為下列化學式之化合物。此外，在不影響本發明效果的情況下，可進一步包含此項技術常用之其他光聚合引發劑等。其他光聚合引發劑可舉例為安息香類化合物、二苯甲酮類化合物、噻噸酮類化合物、蒽類化合物等。其可分別單獨使用或以二種以上組合使用。 安息香類化合物可舉例為安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚等。 二苯甲酮化合物可舉例為二苯甲酮、鄰苯甲醯苯甲酸甲酯、4-苯基二苯甲酮、4-苯甲醯-4'-甲基二苯硫醚、3,3',4,4'-四(叔丁基過氧羰基)二苯甲酮、2,4,6-三甲基二苯甲酮、4,4'-二(N,N'-二甲胺基)-二苯甲酮等。 噻噸酮類化合物可舉例為2-異丙基噻噸酮、2,4-二乙基噻噸酮、2,4-二氯噻噸酮、1-氯-4-丙氧基噻噸酮等。 蒽類化合物可舉例為9,10-二甲氧基蒽、2-乙基-9,10-二甲氧基蒽、9,10-二乙氧基蒽、2-乙基-9,10-二乙氧基蒽等。 此外，其他光聚合引發劑可舉例為2,4,6-三甲基苯甲醯基二苯基氧化膦、10-丁基-2-氯吖啶酮、2-乙基蒽醌、苄基、9,10-菲醌、樟腦醌、苯甲醯甲酸甲酯(Methyl phenylglyoxylate)、二茂鈦化合物等。 此外，本發明中可與光聚合引發劑組合使用之光聚合引發輔助劑較佳使用選自由胺化合物、羧酸化合物等組成之群中之一種以上的化合物。 光聚合引發輔助劑中之胺化合物的具體例可為三乙醇胺、甲基二乙醇胺、三異丙醇胺等脂肪族胺化合物；4-二甲胺基苯甲酸甲酯、4-二甲胺基苯甲酸乙酯、4-二甲胺基苯甲酸異戊酯、4-二甲胺基苯甲酸2-乙基己酯、苯甲酸2-二甲胺基乙酯、N,N-二甲基對甲苯胺、4,4'-雙(二甲胺基)二苯甲酮(統稱：米希勒酮)、4,4'-雙(二乙胺基)二苯甲酮等的芳族胺化合物。胺化合物較佳使用芳族胺化合物。 羧酸化合物可舉例為苯硫代乙酸、甲基苯基硫代乙酸、乙基苯硫代乙酸、甲基乙基苯硫代乙酸、二甲基苯基硫代乙酸、甲氧基苯基硫代乙酸、二甲氧基苯基硫代乙酸、氯苯基硫代乙酸、二氯苯基硫代乙酸、N-苯基甘胺酸、苯氧乙酸、萘基硫代乙酸、N-萘基甘胺酸、萘氧基乙酸等芳族雜乙酸類。 以總固體成分為基準，本發明之自發光感光樹脂組合物中光聚合引發劑的含量較佳為0.1至20質量%，更佳為1至10質量%。該光聚合引發劑之使用量在上述範圍以內時，自發光感光樹脂具有高敏感度，像素部之強度或該像素部表面之平滑性優異。 此外，以上述之基準，光聚合引發輔助劑之使用量較佳為0.1至20質量%，更佳為1至10質量%。若該光聚合引發輔助劑之使用量在上述範圍之內時，則自發光感光樹脂的敏感度效率更高，且能夠提高使用該組合物形成之彩色濾光片的生產性。鹼性可溶性樹脂
鹼性可溶性樹脂包含具有羧基之乙烯類不飽和單體而聚合。此為在形成圖案時之顯影處理工序中，對於所利用之鹼性顯影液賦予可溶性的成分。 具有羧基之乙烯類不飽和單體不受特別限制，可舉例為丙烯酸、甲基丙烯酸、丁烯酸等單羧酸類；富馬酸、中康酸、衣康酸等二羧酸類及其酐類；ω-羧基聚己內酯單(甲基)丙烯酸酯等在兩末端具有羧基及羥基之聚合物的單(甲基)丙烯酸酯類等，較佳可為丙烯酸及甲基丙烯酸。其可單獨使用或者以二種以上混合使用。 根據本發明之鹼性可溶性樹脂可為進一步與能夠與上述單體共聚之至少一種其他單體聚合而成的。例如可為苯乙烯、乙烯基甲苯、甲基苯乙烯、對氯苯乙烯、鄰甲氧基苯乙烯、間甲氧基苯乙烯、對甲氧基苯乙烯、鄰乙烯基苄基甲基醚(o-vinyl benzyl methyl ether)、間乙烯基苄基甲基醚(m-vinyl benzyl methyl ether)、對乙烯基苄基甲基醚(p-vinyl benzyl methyl ether)、鄰乙烯基苄基縮水甘油醚、間乙烯基苄基縮水甘油醚、對乙烯基苄基縮水甘油醚等芳族乙烯化合物；N-環己基馬來醯亞胺、N-苄基馬來醯亞胺、N-苯基馬來醯亞胺、N-鄰羥基苯基馬來醯亞胺、N-間羥基苯基馬來醯亞胺、N-對羥基苯基馬來醯亞胺、N-鄰甲基苯基馬來醯亞胺、N-間甲基苯基馬來醯亞胺、N-對甲基苯基馬來醯亞胺、N-鄰甲氧基苯基馬來醯亞胺、N-間甲氧基苯基馬來醯亞胺、N-對甲氧基苯基馬來醯亞胺等N-取代馬來醯亞胺類化合物；甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸正丙酯、甲基丙烯酸異丙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸仲丁酯、甲基丙烯酸叔丁酯等甲基丙烯酸烷基酯類；甲基丙烯酸環戊基酯、甲基丙烯酸環己基酯、甲基丙烯酸2-甲基環己基酯、甲基丙烯酸三環[5.2.1.02,6]癸-8-基酯、甲基丙烯酸2-二環戊氧基乙酯、甲基丙烯酸異冰片酯等脂環族甲基丙烯酸酯類；甲基丙烯酸苯酯、甲基丙烯酸苄酯等芳基甲基丙烯酸酯類；3-(甲基丙烯醯氧甲基)辛烷、3-(甲基丙烯醯氧甲基)-3-乙基辛烷、3-(甲基丙烯醯氧甲基)-2-三氟甲基辛烷、3-(甲基丙烯醯氧甲基)-2-苯基辛烷、2-(甲基丙烯醯氧甲基)辛烷、2-(甲基丙烯醯氧甲基)-4-三氟甲基辛烷等不飽和辛烷化合物等。其可單獨使用或以二種以上混合使用。 本發明說明書中甲基丙烯酸係指丙烯酸或甲基丙烯酸。 根據本發明之鹼性可溶性樹脂的含量不受特別限制，例如較佳為感光樹脂組合物固體成分總重量之5至80重量%，更佳為10至70重量%。當鹼性可溶性樹脂之含量在上述範圍內時，使得在顯影液中之溶解性充分而容易形成圖案，且在顯影時防止曝光部之像素部分的膜減少，從而使得非像素部分之遺漏性良好。UV 吸收劑
本發明中UV吸收劑不僅調節圖案之尺寸，亦使得量子點之光維持率保持在高水平。 已知UV吸收劑通常係在由於感光樹脂組合物之最小線寬偏差(CD bias)增加而無法形成微細圖案的時候使用。此時CD係指圖案的陽刻部分，CD偏差係指所形成之圖案的大小大於期望形成之掩膜圖案的大小的程度。若添加UV吸收劑，則能夠吸收部分UV從而減低繞射引起之CD偏差，從而能夠形成所需之圖案。 與此同時，量子點由於脆弱之耐熱性而在彩色濾光片製造工序中難以維持高發光強度。此時，若添加UV吸收劑，則在經過多次的後烘焙(Post-bake)後仍能夠維持高發光強度。 根據本發明之UV吸收劑可包含苯并三唑類、三嗪類、二苯甲酮UV吸收劑中之一種以上，較佳使用三嗪類化合物。 苯并三唑類UV吸收劑可使用公知之化合物。具體可較佳為3-[3-叔丁基-4-羥基-5-(5-氯-2H-苯并三唑-2-基)苯基]丙酸辛酯、3-(3-叔丁基-4-羥基-5-(5-氯-2H-苯并三唑-2-基)苯基)丙酸2-乙基己酯、[3-[3-(2H-苯并三唑-2-基)-5-(1,1-甲基乙基)-4-羥基苯基]-1-氧丙基]-w-[3-[3-(2H-苯并三唑-2-基)-5-(1,1-二甲基乙基)-4-羥基苯基]-1-氧代丙氧基]聚(氧基-1,2-乙二基)、(3-(3-(2H-苯并三唑-2-基)-5-(1,1-二甲基乙基)-4-羥基苯基)-1-氧丙基)-羥基聚(氧基-1,2-乙二基)、2-(3-叔丁基-2-羥基-5-甲基苯基)-5-氯-2H-苯并三唑、2-(2H-苯并三唑-2-基)-4,6-二叔戊基苯酚、3-(2H-苯并三唑基)-5-(1,1-二甲基乙基)-4-羥基-苯氧基丙酸辛酯、2-(2H-苯并三唑-2-基)-4,6-雙(1-甲基-1-苯基乙基)苯酚、2-(2H-苯并三唑-2-基)-6-(1-甲基-1-苯基乙基)-4-(1,1,3,3-四甲基丁基)苯酚等。 三嗪類UV吸收劑可使用公知之化合物。具體可為2-(4,6-二甲基-1,3,5-三嗪-2-基)-5-((己基)氧基)-苯酚、2-(4-(2-羥基-3-十三烷氧基丙基)氧基)-2-羥基苯基)-4,6-雙(2,4-二甲基苯基)-1,3,5-三嗪、2-(4-(2-羥基-3-二癸烷氧基丙基)氧)-2-羥基苯基)-4,6-雙(2,4-二甲基苯基)-1,3,5-三嗪、2-(2-羥基-4-(3-(2-乙基己基-1-氧基)-2-羥基丙基氧)苯基)-4,6-雙(2,4-二甲基苯基)-1,3,5-三嗪、2,2'-[6-(2,4-二丁氧基苯基)-1,3,5-三嗪-2,4-二基]雙(5-丁氧基苯酚)、2-{4-[4,6-二(4-聯苯基)-1,3,5-三嗪-2-基]-3-羥基苯氧基}丙酸6-甲基庚酯等。 二苯甲酮UV吸收劑可使用公知之化合物。具體可為2-羥基-4-n-辛氧基二苯甲酮、2-羥基-4-甲氧基二苯甲酮等。 以組合物固體成分總重量為基準，該UV吸收劑之含量較佳為0.025至5重量%。當UV吸收劑含量為上述範圍以內時，吸收劑效果可提高，在不妨礙光引發劑作用的情況下可形成良好的圖案。溶劑
本發明之自發光感光樹脂中含有的溶劑不受特別限制，可為此項技術中通常使用之有機溶劑。 具體可舉例為乙二醇單甲醚、乙二醇單乙醚、乙二醇單丙醚、乙二醇單丁醚等乙二醇單烷基醚類；二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇二丙醚、二乙二醇二丁醚等二乙二醇二烷基醚類；乙酸甲氧乙酯、乙酸乙氧乙酯等乙二醇烷基醚乙酸酯類；丙二醇單甲醚等丙二醇二烷基醚類；丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯、乙酸甲氧基丁酯、乙酸甲氧基戊酯等亞烷基乙二醇烷基醚乙酸酯類；苯、甲苯、二甲苯、均三甲苯等芳香烴類；甲基乙基酮、丙酮、甲基戊酮、甲基異丁酮、環己酮等酮類；乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、甘油等醇類； 3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯等酯類；γ-丁內酯等環狀酯類等。其可單獨使用或以二種以上混合使用。 上述溶劑根據塗覆方法或裝置而具有不同之黏度，因此適當調整溶劑之含量，以使具有上述組成之自發光感光樹脂的濃度為10至50重量%，較佳為10至30重量%。 根據本發明之溶劑的含量不受特別限制，例如可為自發光感光樹脂總重量的60至90重量%，較佳為70至85重量%。當溶劑之含量在上述範圍內時，塗覆性良好。彩色濾光片
此外，本發明提供用上述自發光感光樹脂製造之彩色濾光片。 本發明之彩色濾光片適用於圖像顯示裝置時，圖像顯示裝置之光源的光使其發光，因此能夠實現更優異之發光效率。此外，由於發射具有顏色之光，因此色彩再現性更優異，且由於光致發光使得光向全方向發射，從而可改善視角。 更具體地，包含彩色濾光片之通常圖像顯示裝置中，白色光透過彩色濾光片後呈現顏色，在此過程中光之一部分由彩色濾光片吸收，從而可能降低發光效率。但包含使用根據本發明之自發光感光樹脂製造的彩色濾光片時，光源之光使得彩色濾光片進行自發光，因此能夠實現優異之發光效率。 彩色濾光片包括基板及形成在上述基板上部之圖案層。 基板可為彩色濾光片自身基板，或可為顯示設備等上設置彩色濾光片之部位，不受特別限制。該基板可為玻璃、矽(Si)、矽氧化物(SiOx
)或高分子基板，上述高分子基板可為聚醚碸(polyethersulfone，PES)或聚碳酸酯(polycarbonate，PC)等。 圖案層為包含本發明之自發光感光樹脂的層，可為塗覆該自發光感光樹脂後以預定之圖案進行曝光、顯影及熱固化而形成的層。 該自發光感光樹脂形成之圖案層可具有含有紅量子點粒子之紅色圖案層、含有綠量子點粒子之綠色圖案層及含有藍量子點粒子之藍色圖案層。當光照射時，紅色圖案層發射紅光，綠色圖案層發射綠光，藍色圖案層發射藍光。 此時，其適用於圖像顯示裝置時，光源發出之光不受特別限制，考慮到更優異之色彩再現性，可使用藍光之光源。 根據本發明一實施例，該圖案層可僅設置紅色圖案層、綠色圖案層及藍色圖案層中的2種顏色的圖案層。此時該圖案層亦具備不含有量子點粒子之透明圖案層。 僅設置有2種顏色之圖案層時，可使用發射沒有包含的其他顏色波長之光的光源。例如，當包含紅色圖案層及綠色圖案層時，可使用發射藍光之光源。此種情況下，紅量子點發射紅光，綠量子點發射綠光，而藍光直接透過透明圖案層以呈現藍色。 包含如上所述之基板及圖案層的彩色濾光片，亦可包括在各個圖案之間形成之隔壁，亦可包括黑矩陣。此外，亦可包括形成於彩色濾光片圖案層上部之保護膜。圖像顯示裝置
此外，本發明提供包含上述彩色濾光片之圖像顯示裝置。 本發明之彩色濾光片不僅適用於通常之液晶顯示裝置，亦可適用於電致發光顯示裝置、等離子顯示裝置、場致發射顯示裝置等各種圖像顯示裝置。 本發明之圖像顯示裝置可具備包括含有紅量子點粒子之紅色圖案層、含有綠量子點粒子之綠色圖案層及含有藍量子點粒子之藍圖案層的彩色濾光片。此時，當適用於圖像顯示裝置時，對光源發射之光沒有特別限制，但考慮到跟更優異之色彩再現性，較佳使用發射藍光之光源。 根據本發明之另一實施例，本發明之圖像顯示裝置可具備僅包括紅色圖案層、綠色圖案層及藍色圖案層中之2種顏色的圖案層的彩色濾光片。此時，該彩色濾光片亦具備不含量子點粒子之透明圖案層。 僅設置有2種顏色的圖案層時，可使用發射沒有包含的其他顏色波長之光的光源。例如，包含紅色圖案層及綠色圖案層的情況時，可使用發射藍光之光源。此種情況下，紅量子點發射紅光，綠量子點發射綠光，而藍光直接透過透明圖案層而呈現藍色。 本發明之圖像顯示裝置發光率優異而呈現高亮度，色彩再現性優異，且具有寬之視角。 下面藉由實施例詳細說明本發明。但以下實施例僅為了更具體說明本發明，本發明之範疇並不由此等實施例限定。下列實施例可在本發明之範疇內由熟習此項技術者進行適當之修訂、變更。製造例 1 ： CdSe( 作為核 )/ZnS( 作為殼 ) 結構之光致發光綠量子點粒子 A 的合成
將CdO(0.4 mmol)及乙酸鋅(Zinc acetate)(4 mmol)、油酸(Oleic acid)(5.5 mL)與1-十八烯(1-Octadecene)(20 mL)一同放入反應器，加熱至150℃進行反應。隨後為了移除油酸經鋅取代而生成之乙酸(acetic acid)，將上述反應物在100 mTorr之真空下放置20分鐘。隨後，加熱至310℃獲得透明混合物，在310℃維持20分鐘，接著在裝有Cd(OA)2
及Zn(OA)2
溶液之反應器中迅速注入將0.4 mmol之Se粉末及2.3 mmol之S粉末溶解於3 ml之三正辛基氧膦(trioctylphosphine)中而得的Se及S溶液。在310℃下生長由此獲得之混合物5分鐘後，利用冰浴(ice bath)中斷生長。隨後，用乙醇沈澱，利用離心分離機分離量子點，剩下之雜質用氯仿(chloroform)及乙醇洗滌，最終獲得用油酸穩定化的分散有核粒徑及殼厚度及值為3至5 nm之粒子的CdSe(核)/ZnS(殼)結構之量子點粒子A。製造例 2 ：鹼性可溶性樹脂 (D) 之合成
準備攪拌器、溫度計回流冷凝管、滴落液及具有氮氣導入管之燒瓶。將N-苄基馬來醯亞胺45重量份、甲基丙烯酸45重量份、甲基丙烯酸三環癸基酯10重量份、過氧化叔丁基-2-乙基己酸酯4重量份、丙二醇單甲醚乙酸酯(以下稱為PGMEA)40重量份投入後攪拌混合，由此準備單體滴落液。將正十二烷基硫醇6重量份、PGMEA 24重量份加入後攪拌混合，由此準備鏈轉移劑滴落液。隨後，將395重量份PGMEA導入燒瓶且將燒瓶內之氛圍自空氣轉變為氮氣後，進行攪拌之同時將燒瓶之溫度升溫至90℃。接著，開始滴落單體滴落液及鏈轉移劑滴落液。在維持90℃之條件下分別進行2小時之滴落，且在1小時後升溫至110℃維持3小時後，導入氣體導入管，開始氧氣/氮氣=5/95(v/v)混合氣體之吹泡。接著，將甲基丙烯酸縮水甘油酯10重量份、2,2'-亞甲基雙(4-甲基-6-叔丁基苯酚) 0.4重量份、三乙胺0.8重量份投入燒瓶中，且在110℃繼續反應8小時，隨後冷卻至室溫，獲得固體成分29.1重量%、中均分子量32000、酸值為114 mgKOH/g之鹼性可溶性樹脂。實施例 1~10 及比較例 1 ：自發光感光樹脂的製備
按照下表1記載之重量比混合各成分，用丙二醇單甲醚乙酸酯稀釋以使總固體成分為20重量%，充分攪拌獲得自發光感光樹脂。 [表1] 彩色濾光片 ( 玻璃基板 ) 製造例
利用上述實施例1~10及比較例1製造之自發光感光樹脂製造彩色濾光片。即，將上述各個自發光感光樹脂使用旋塗法塗覆在玻璃基板上，放置於加熱板上在100℃溫度下維持3分鐘，形成薄膜。接著在上述薄膜上放置具有20 mm×20 mm正方形透光圖案及具有1 μm~100 μm的線/空間圖案之試驗光掩膜，與試驗光掩膜相隔100 μm的情況下照射紫外線。 此時，紫外線光源使用由牛尾電機株式會社(USHIO INC.)製造之超高壓水銀燈(商品名：USH-250D)，在大氣氛圍下，以200 mJ/cm2
之曝光量(365 nm)進行光照射，沒有使用特別之光學過濾器。將上述照射紫外線之薄膜浸漬在pH為10.5之KOH水溶液顯影液中80秒後，進行顯影。將該包覆有薄膜之玻璃板使用蒸餾水洗滌後，吹入氮氣進行乾燥，且在150℃之加熱箱中加熱10分鐘，由此製造彩色濾光片圖案。上述製造之自發光彩色濾光片的薄膜厚度為3.0 μm。圖案精密度測定
使用OM(光學顯微鏡)設備(ECLIPSE LV100POL，尼康(NIKON)公司)測定上述使用自發光感光樹脂製造之彩色濾光片中藉由經設計以成為100 μm之線/空間圖案掩膜而獲得的圖案的尺寸。比較圖案掩膜中形成之透光圖案的寬及彩色濾光片圖案的寬(測定的圖案之寬)，計算圖案之誤差。即，圖案誤差由下列式求得。 圖案誤差(Δ)=(透光圖案的寬，100 μm)-(測定的圖案之寬) 圖案誤差值大於20 μm時，難以形成微細圖案，因此難以實現微細像素，具有負值時可能會導致工藝不良。發光強度 (Intensity) 之測定
對於上述形成有自發光像素之彩色濾光片中以20 mm×20 mm正方形圖案形成的圖案部，利用365 nm管型4W UV照射儀(VL-4LC，VILBER LOURMAT公司)測定光變換區域，且利用分光儀(由海洋光學(Ocean Optics)公司製造)測定實施例1~10及比較例在550 nm區域之光強度。在230℃下進行60分鐘之後烘焙(hard bake)，且測定後烘焙之前及之後的強度，相對於比較例之發光維持率示於表2中。 [表2]
參照上表2，由於實施例1至實施例5及實施例8至實施例10使用UV吸收劑，因此能夠實現微細圖案，且相對於比較例1而言，在後烘焙之後亦能夠抑制量子點氧化，從而能夠使發光強度維持得更高，尤其為，對於包含三嗪類UV吸收劑之實施例3、4、8及10，能夠確認具有更加優異之發光強度維持特性。 此外，實施例6及實施例7為相對於固體成分總重量而言之UV吸收劑含量高於0.025重量%的情況，此時可確認不影響發光強度維持率及線幅調節。亦可確認當UV吸收劑含量低於5%時，對發光強度維持率雖然有很大效果，但發現存在線幅大大減少之問題。The self-luminous photosensitive resin of the present invention contains a photoluminescence quantum dot, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, a UV absorber, and a solvent. The self-luminous photosensitive resin will be described in detail below. Photoluminescence Quantum Dots The self-luminous photosensitive resin of the present invention contains photoluminescent quantum dot particles. Quantum Dots (QD: Quantum Dot) are semiconductor materials of nanometer size. Atoms form molecules, and molecules form a small collection of molecules called molecular clusters, which in turn form nanoparticles. Specifically, when such nanoparticles have semiconductor properties, they are called quantum dots. When the quantum dots are energized from the outside to reach an excited state, the energy corresponding to the corresponding band gap is spontaneously emitted. Since the photosensitive resin composition of the present invention contains the above-mentioned photoluminescence quantum dot particles, the color filter produced therefrom can emit light by photoirradiation (photoluminescence). Further, since light having color is emitted, color reproducibility is more excellent, and since light is emitted in all directions due to photoluminescence, the viewing angle can also be improved. The quantum dot particles according to the present invention are not particularly limited as long as they are light-stimulated by quantum light, and for example, a Group II-VI semiconductor compound, a III-V semiconductor compound, an IV-VI semiconductor compound, A group consisting of a Group IV element or a compound comprising the same and a combination thereof. They may be used singly or in combination of two or more. The Group II-VI semiconductor compound may be selected from the group consisting of a two-element compound selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; selected from CdSeS a three-element compound in a group consisting of CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof; and selected from CdZnSeS a four-element compound in a group consisting of CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof. The III-V semiconductor compound may be selected from the group consisting of a two-element compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof. a three-element compound selected from the group consisting of: GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof; and selected from GaAlNAs a four-element compound in a group consisting of GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof. The IV-VI semiconductor compound may be selected from the group consisting of a two-element compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe a three-element compound in a group consisting of PbSTe, SnPbS, SnPbSe, SnPbTe, and a mixture thereof; and a four-element compound in a group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and a mixture thereof. The Group IV element or a compound comprising the same may be selected from the group consisting of: an element selected from the group consisting of Si, Ge, and mixtures thereof; and a two-element compound selected from the group consisting of SiC, SiGe, and mixtures thereof. The quantum dot particles may be a homogenous single structure; a core-shell, a gradient structure, or the like; or a mixed structure thereof. In the core-shell structure, the substances constituting the core and the shell, respectively, may be composed of mutually different semiconductor compounds mentioned above. For example, the core may be one or more selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may be one or more selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto. The colored photosensitive resin composition used in the manufacture of the conventional color filter includes red, green, and blue colorants for color display, and the photoluminescent quantum dot particles can also be classified into red quantum dot particles, green quantum dot particles, and The blue quantum dot particles, and the quantum dot particles according to the present invention may be red quantum dot particles, green quantum dot particles or blue quantum dot particles. The quantum dot particles can be synthesized by a wet chemical method, an organometallic chemical vapor deposition method, or a molecular beam epitaxy method. The wet chemical method is a method in which a precursor substance is added to an organic solvent to grow particles. When the crystal is growing, the organic solvent naturally coordinates on the surface of the quantum dot crystal and acts as a dispersing agent to adjust the growth of the crystal, thus compared to metal organic chemical vapor deposition (MOCVD) or molecular A vapor phase vapor deposition method such as MBE (Molecular Beam Epitaxy) can control the growth of nanoparticle particles by a cheaper process. The content of the photoluminescence quantum dot particles according to the present invention is not particularly limited, and is, for example, preferably from 3 to 80% by weight, more preferably from 5 to 70% by weight based on the total mass of the solid content of the self-luminous photosensitive resin. If the content of the quantum dot particles is less than the above range, the luminous efficiency may be slightly small; if it is larger than the above range, the content of the other components is relatively insufficient, so that there is a problem that it is difficult to form a pixel pattern. Photopolymerizable compound The photopolymerizable compound contained in the self-luminous photosensitive resin of the present invention is a compound which can be polymerized by the action of light or a photopolymerization initiator to be described later, and examples thereof include a monofunctional monomer, a difunctional monomer, and other polyfunctional compounds. Monomers, etc. A specific example of the monofunctional monomer may be nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-B. Hexyl carbitol acrylate, 2-hydroxyethyl acrylate, N-vinyl pyrrolidone, and the like. Specific examples of the difunctional monomer may be 1,6-hexanediol dimethacrylate, ethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, and the like. Ethylene glycol dimethacrylate, bis[2-(acryloyloxy)ethyl]ether, bis[2-(acryloyloxy)ethyl]ether, 3-methylpentanediol dimethyl Acetate (3-methylpentandiol dimethacrylate) and the like. Specific examples of other polyfunctional monomers may be trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, polydipentaerythritol pentamethacrylate. Dipentaerythritol pentamethacrylate, dipentaerythritol hexamethacrylate, and the like. It is preferred to use a difunctional or higher polyfunctional monomer therein. The content of the photopolymerizable compound is preferably in the range of from 5 to 50% by mass, more preferably from 7 to 45% by mass, based on the solid content in the self-luminous photosensitive resin. When the content of the photopolymerizable compound is within the above range, the strength or smoothness of the pixel portion can be improved. Photoinitiator The photopolymerization initiator contained in the self-luminous photosensitive resin of the present invention is not particularly limited, and may be selected from the group consisting of a triazine compound, an acetophenone compound, a biimidazole compound, and a hydrazine compound. More than one compound. The self-luminous photosensitive resin containing the photopolymerization initiator has high sensitivity, and the pixel formed using the composition has a pixel portion having good strength or pattern property. Further, it is preferred to use a photopolymerization initiating auxiliary together with a photopolymerization initiator, and the self-luminous photosensitive resin containing the same has higher sensitivity, and if the composition is used to form a color filter, productivity can be improved. The triazine compound can be, for example, 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl). - 6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperidin-1,3,5-triazine, 2 ,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2- (5-methylfuran-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)vinyl -1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)vinyl]-1,3 , 5-triazine, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl]-1,3,5-triazine, and the like. The acetophenone compound may be, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, Benzil Dimethyl Ketal, 2 -hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexane-benzophenone, 2-methyl-1-(4-methyl) Thiophenyl)-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butan-1-one, 2- An oligomer or the like of hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one. Further, a compound represented by the following Chemical Formula 1 can be exemplified. [Chemical Formula 1] In the above Chemical Formula 1, R1 to R4 are the same or different and each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a C1-C12 alkyl-substituted or unsubstituted phenyl group, or a C1-C12 alkyl group substituted or unsubstituted. a benzyl group or a naphthyl group substituted or unsubstituted with a C1 to C12 alkyl group. The kind of the compound represented by the above Chemical Formula 1 is not particularly limited, and specifically, 2-methyl-2-amino (4-morpholinylphenyl)ethane-1-one, 2-ethyl-2- Amino (4-morpholinylphenyl)ethane-1-one, 2-propyl-2-amino (4-morpholinylphenyl)ethane-1-one, 2-butyl-2- Amino (4-morpholinylphenyl)ethane-1-one, 2-methyl-2-amino (4-morpholinylphenyl)propan-1-one, 2-methyl-2-amine (4-morpholinylphenyl)butan-1-one, 2-ethyl-2-amino (4-morpholinylphenyl)propan-1-one, 2-ethyl-2-amino (4-morpholinylphenyl)butan-1-one, 2-methyl-2-methylamino (4-morpholinylphenyl)propan-1-one, 2-methyl-2-di Methylamino (4-morpholinylphenyl)propan-1-one, 2-methyl-2-diethylamino (4-morpholinylphenyl)propan-1-one, and the like. The biimidazole compound can be exemplified by 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichloro Phenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxybenzene) Bismuthimide, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(trialkoxyphenyl)biimidazole, 4,4',5,5' An imidazole compound or the like in which a phenyl group is substituted with an alkoxycarbonyl group. Among them, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl) is preferably used. -4,4',5,5'-tetraphenylbiimidazole. The hydrazine compound can be exemplified by a compound of the following chemical formula. Further, other photopolymerization initiators and the like which are commonly used in the art may be further included without affecting the effects of the present invention. Other photopolymerization initiators may, for example, be benzoin compounds, benzophenone compounds, thioxanthone compounds, anthraquinone compounds and the like. They may be used alone or in combination of two or more. The benzoin compound can be exemplified by benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether and the like. The benzophenone compound can be exemplified by benzophenone, methyl phthalic acid benzoate, 4-phenyl benzophenone, 4-benzylidene-4'-methyl diphenyl sulfide, 3, 3 ',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, 4,4'-di(N,N'-dimethylamine Base) - benzophenone and the like. The thioxanthone compound can be exemplified by 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone. Wait. The quinone compound can be exemplified by 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10- Diethoxy hydrazine and the like. Further, other photopolymerization initiators may, for example, be 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, 10-butyl-2-chloroacridone, 2-ethylhydrazine, benzyl 9,10-phenanthrenequinone, camphorquinone, methyl ethyl phenylglyoxylate, ferrocene compound, and the like. Further, in the photopolymerization initiation aid which can be used in combination with the photopolymerization initiator in the invention, it is preferred to use one or more compounds selected from the group consisting of an amine compound, a carboxylic acid compound and the like. Specific examples of the amine compound in the photopolymerization initiating auxiliary agent may be an aliphatic amine compound such as triethanolamine, methyldiethanolamine or triisopropanolamine; methyl 4-dimethylaminobenzoate or 4-dimethylamino group. Ethyl benzoate, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N,N-dimethyl Aromatic amines such as p-toluidine, 4,4'-bis(dimethylamino)benzophenone (collectively: Michlerone), 4,4'-bis(diethylamino)benzophenone Compound. The amine compound is preferably an aromatic amine compound. The carboxylic acid compound can be exemplified by phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylsulfuric acid. Acetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthyl An aromatic heteroacetic acid such as glycine or naphthyloxyacetic acid. The content of the photopolymerization initiator in the self-luminous photosensitive resin composition of the present invention is preferably from 0.1 to 20% by mass, more preferably from 1 to 10% by mass, based on the total solid content. When the amount of the photopolymerization initiator used is within the above range, the self-luminous photosensitive resin has high sensitivity, and the strength of the pixel portion or the smoothness of the surface of the pixel portion is excellent. Further, on the basis of the above, the photopolymerization initiating auxiliary agent is preferably used in an amount of from 0.1 to 20% by mass, more preferably from 1 to 10% by mass. When the amount of the photopolymerization initiating auxiliary agent used is within the above range, the sensitivity of the self-luminous photosensitive resin is higher, and the productivity of the color filter formed using the composition can be improved. Alkaline Soluble Resin The alkali soluble resin is polymerized by containing an ethylenically unsaturated monomer having a carboxyl group. This is a component which imparts solubility to the used alkaline developing solution in the development treatment process at the time of pattern formation. The ethylenically unsaturated monomer having a carboxyl group is not particularly limited, and examples thereof include monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; and dicarboxylic acids such as fumaric acid, mesaconic acid, and itaconic acid, and anhydrides thereof. A mono(meth)acrylate or the like having a polymer having a carboxyl group and a hydroxyl group at both terminals, such as ω-carboxypolycaprolactone mono(meth)acrylate, may preferably be acrylic acid or methacrylic acid. They may be used singly or in combination of two or more. The alkali-soluble resin according to the present invention may be further polymerized with at least one other monomer copolymerizable with the above monomer. For example, it may be styrene, vinyl toluene, methyl styrene, p-chlorostyrene, o-methoxy styrene, m-methoxy styrene, p-methoxy styrene, o-vinyl benzyl methyl ether ( O-vinyl benzyl methyl ether), m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinylbenzyl glycidyl ether , an aromatic vinyl compound such as m-vinylbenzyl glycidyl ether or p-vinylbenzyl glycidyl ether; N-cyclohexylmaleimide, N-benzyl maleimide, N-phenyl mala Yttrium, N-o-hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N-p-hydroxyphenylmaleimide, N-o-methylphenyl-malay Imine, N-m-methylphenylmaleimide, N-p-methylphenylmaleimide, N-o-methoxyphenylmaleimide, N-m-methoxybenzene N-substituted maleimide compounds such as carbamazepine and N-p-methoxyphenylmaleimide; methyl methacrylate, ethyl methacrylate, n-propyl methacrylate Isopropyl methacrylate , alkyl methacrylate such as n-butyl methacrylate, isobutyl methacrylate, sec-butyl methacrylate or t-butyl methacrylate; cyclopentyl methacrylate, cyclohexyl methacrylate Ester, 2-methylcyclohexyl methacrylate, tricyclo[5.2.1.02,6]non-8-yl methacrylate, 2-dicyclopentyloxyethyl methacrylate, isobornyl methacrylate Alicyclic methacrylates such as esters; aryl methacrylates such as phenyl methacrylate and benzyl methacrylate; 3-(methacryloxymethyl)octane, 3-(methyl Propylene oxime methyl)-3-ethyloctane, 3-(methacrylofluorenyloxymethyl)-2-trifluoromethyloctane, 3-(methacrylomethoxymethyl)-2-benzene An unsaturated octane compound such as octane, 2-(methacrylomethoxymethyl)octane or 2-(methacrylomethoxymethyl)-4-trifluoromethyloctane. They may be used singly or in combination of two or more. In the specification of the present invention, methacrylic acid means acrylic acid or methacrylic acid. The content of the alkali-soluble resin according to the present invention is not particularly limited, and is, for example, preferably from 5 to 80% by weight, more preferably from 10 to 70% by weight based on the total mass of the solid content of the photosensitive resin composition. When the content of the alkali-soluble resin is within the above range, the solubility in the developer is sufficiently made to easily form a pattern, and the film of the pixel portion of the exposed portion is prevented from being reduced at the time of development, so that the leakage of the non-pixel portion is good. . UV Absorber In the present invention, the UV absorber not only adjusts the size of the pattern, but also maintains the light maintenance rate of the quantum dots at a high level. It is known that a UV absorber is usually used when a fine pattern cannot be formed due to an increase in the minimum line width deviation (CD bias) of the photosensitive resin composition. At this time, CD means a positive portion of the pattern, and CD deviation means that the size of the formed pattern is larger than the size of the mask pattern to be formed. When a UV absorber is added, part of the UV can be absorbed to reduce the CD deviation caused by the diffraction, so that a desired pattern can be formed. At the same time, the quantum dots are difficult to maintain high luminous intensity in the color filter manufacturing process due to the fragile heat resistance. At this time, if a UV absorber is added, high luminous intensity can be maintained even after a plurality of post-bakes. The UV absorber according to the present invention may contain one or more of a benzotriazole, a triazine or a benzophenone UV absorber, and a triazine compound is preferably used. As the benzotriazole-based UV absorber, a known compound can be used. Specifically, it is preferably 3-[3-tert-butyl-4-hydroxy-5-(5-chloro-2H-benzotriazol-2-yl)phenyl]propanoate octyl ester, 3-(3-tert-butyl) 2-ethylhexyl 4-hydroxy-5-(5-chloro-2H-benzotriazol-2-yl)phenyl)propanoate, [3-[3-(2H-benzotriazole-) 2-yl)-5-(1,1-methylethyl)-4-hydroxyphenyl]-1-oxopropyl]-w-[3-[3-(2H-benzotriazol-2- 5-(1,1-dimethylethyl)-4-hydroxyphenyl]-1-oxopropoxy]poly(oxy-1,2-ethanediyl), (3-( 3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyphenyl)-1-oxopropyl)-hydroxypoly(oxy-1) ,2-ethanediyl), 2-(3-tert-butyl-2-hydroxy-5-methylphenyl)-5-chloro-2H-benzotriazole, 2-(2H-benzotriazole- 2-yl)-4,6-di-tert-amylphenol, 3-(2H-benzotriazolyl)-5-(1,1-dimethylethyl)-4-hydroxy-phenoxypropanoate Ester, 2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol, 2-(2H-benzotriazol-2-yl 6-(1-Methyl-1-phenylethyl)-4-(1,1,3,3-tetramethylbutyl)phenol and the like. As the triazine-based UV absorber, a known compound can be used. Specifically, it can be 2-(4,6-dimethyl-1,3,5-triazin-2-yl)-5-((hexyl)oxy)-phenol, 2-(4-(2-hydroxy-) 3-tridecyloxypropyl)oxy)-2-hydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-( 4-(2-hydroxy-3-dioxyloxypropyl)oxy)-2-hydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5- Triazine, 2-(2-hydroxy-4-(3-(2-ethylhexyl-1-oxy)-2-hydroxypropyloxy)phenyl)-4,6-bis(2,4-di Methylphenyl)-1,3,5-triazine, 2,2'-[6-(2,4-dibutoxyphenyl)-1,3,5-triazine-2,4-di Bis(5-butoxyphenol), 2-{4-[4,6-bis(4-biphenylyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy Base} 6-methylheptyl propionate and the like. As the benzophenone UV absorber, a known compound can be used. Specifically, it may be 2-hydroxy-4-n-octyloxybenzophenone, 2-hydroxy-4-methoxybenzophenone or the like. The content of the UV absorber is preferably from 0.025 to 5% by weight based on the total weight of the solid component of the composition. When the content of the UV absorber is within the above range, the effect of the absorbent can be improved, and a good pattern can be formed without hindering the action of the photoinitiator. Solvent The solvent contained in the self-luminous photosensitive resin of the present invention is not particularly limited and may be an organic solvent generally used in the art. Specific examples thereof include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, and the like, ethylene glycol monoalkyl ethers; diethylene glycol dimethyl ether, diethyl Diethylene glycol dialkyl ethers such as diol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetate such as methoxyethyl acetate or ethoxyethyl acetate Ester; propylene glycol monomethyl ether and other propylene glycol dialkyl ethers; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, methoxy acetate Alkylene glycol alkyl ether acetates such as esters; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene; methyl ethyl ketone, acetone, methyl pentanone, methyl isobutyl ketone, ring Ketones such as ketone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerol; ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, etc. Esters; cyclic esters such as γ-butyrolactone. They may be used singly or in combination of two or more. The above solvent has a different viscosity depending on the coating method or apparatus, and therefore the content of the solvent is appropriately adjusted so that the concentration of the self-luminous photosensitive resin having the above composition is from 10 to 50% by weight, preferably from 10 to 30% by weight. The content of the solvent according to the present invention is not particularly limited and may be, for example, 60 to 90% by weight, preferably 70 to 85% by weight based on the total weight of the self-luminous photosensitive resin. When the content of the solvent is within the above range, the coatability is good. Color Filter Further, the present invention provides a color filter manufactured using the above self-luminous photosensitive resin. When the color filter of the present invention is applied to an image display device, light of a light source of the image display device emits light, so that more excellent light-emitting efficiency can be achieved. Further, since light having color is emitted, color reproducibility is more excellent, and light is emitted in all directions due to photoluminescence, whereby the viewing angle can be improved. More specifically, in a typical image display device including a color filter, white light passes through the color filter to exhibit a color, and a part of the light is absorbed by the color filter in the process, thereby possibly reducing luminous efficiency. However, when the color filter manufactured using the self-luminous photosensitive resin according to the present invention is included, the light of the light source causes the color filter to self-illuminate, so that excellent luminous efficiency can be achieved. The color filter includes a substrate and a pattern layer formed on an upper portion of the substrate. The substrate may be a color filter own substrate, or may be a portion where a color filter is provided on a display device or the like, and is not particularly limited. The substrate may be glass, germanium (Si), germanium oxide (SiO x ) or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC). The pattern layer is a layer containing the self-luminous photosensitive resin of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin, exposing, developing, and thermally curing in a predetermined pattern. The pattern layer formed of the self-luminous photosensitive resin may have a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. When the light is irradiated, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light. At this time, when it is applied to an image display device, the light emitted from the light source is not particularly limited, and a blue light source can be used in consideration of more excellent color reproducibility. According to an embodiment of the present invention, the pattern layer may be provided with only two color pattern layers of a red pattern layer, a green pattern layer, and a blue pattern layer. At this time, the pattern layer also has a transparent pattern layer containing no quantum dot particles. When only a pattern layer of two colors is provided, a light source that emits light of other color wavelengths not included may be used. For example, when a red pattern layer and a green pattern layer are included, a light source that emits blue light can be used. In this case, the red quantum dots emit red light, the green quantum dots emit green light, and the blue light directly passes through the transparent pattern layer to appear blue. The color filter including the substrate and the pattern layer as described above may also include a partition wall formed between the respective patterns, and may also include a black matrix. Further, a protective film formed on the upper portion of the color filter pattern layer may be included. Image Display Device Further, the present invention provides an image display device including the above color filter. The color filter of the present invention is applicable not only to a general liquid crystal display device but also to various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device. The image display device of the present invention may be provided with a color filter including a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. At this time, when applied to an image display device, there is no particular limitation on the light emitted from the light source, but it is preferable to use a light source that emits blue light in consideration of more excellent color reproducibility. According to another embodiment of the present invention, an image display device of the present invention may be provided with a color filter including only a pattern layer of two of a red pattern layer, a green pattern layer, and a blue pattern layer. At this time, the color filter also has a transparent pattern layer containing no quantum dot particles. When only a pattern layer of two colors is provided, a light source that emits light of other color wavelengths not included may be used. For example, in the case of a red pattern layer and a green pattern layer, a light source that emits blue light can be used. In this case, the red quantum dots emit red light, the green quantum dots emit green light, and the blue light directly passes through the transparent pattern layer to appear blue. The image display device of the present invention is excellent in luminosity, exhibits high luminance, is excellent in color reproducibility, and has a wide viewing angle. The invention will now be described in detail by way of examples. However, the following examples are merely illustrative of the invention, and the scope of the invention is not limited by the examples. The following examples are to be appropriately modified and changed by those skilled in the art within the scope of the present invention. Production Example 1 : Synthesis of photoluminescence green quantum dot particles A of CdSe ( as a core ) / ZnS ( as a shell ) structure CdO (0.4 mmol) and zinc acetate (4 mmol), oleic acid (Oleic acid) (5.5 mL) was placed in a reactor together with 1-octadecene (20 mL) and heated to 150 ° C for reaction. Subsequently, in order to remove the acetic acid formed by the substitution of zinc by oleic acid, the above reactant was allowed to stand under a vacuum of 100 mTorr for 20 minutes. Subsequently, heating to 310 ° C to obtain a transparent mixture, maintained at 310 ° C for 20 minutes, followed by rapid injection of 0.4 mmol of Se powder and 2.3 mmol of S in a reactor containing Cd (OA) 2 and Zn (OA) 2 solution. A solution of Se and S obtained by dissolving the powder in 3 ml of trioctylphosphine. After the mixture thus obtained was grown at 310 ° C for 5 minutes, growth was interrupted by an ice bath. Subsequently, the precipitate is precipitated with ethanol, and the quantum dots are separated by a centrifugal separator, and the remaining impurities are washed with chloroform and ethanol to obtain a dispersed nucleus particle size and shell thickness stabilized by oleic acid and having a value of 3 to 5 nm. The quantum dot particle A of the CdSe (core) / ZnS (shell) structure of the particle. Production Example 2 : Synthesis of Basic Soluble Resin (D) A stirrer, a thermometer reflux condenser, a dropping liquid, and a flask having a nitrogen introduction tube were prepared. 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, and 4 parts by weight of t-butyl-2-ethylhexanoate, 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA) was added and stirred and mixed to prepare a monomer dripping liquid. 6 parts by weight of n-dodecyl mercaptan and 24 parts by weight of PGMEA were added, and the mixture was stirred and mixed to prepare a chain transfer agent dripping liquid. Subsequently, 395 parts by weight of PGMEA was introduced into the flask and the atmosphere in the flask was changed from air to nitrogen, and the temperature of the flask was raised to 90 ° C while stirring. Next, the monomer drop and the chain transfer agent drip were started to drip. The mixture was allowed to drip for 2 hours while maintaining the temperature at 90 ° C, and after heating to 110 ° C for 1 hour after 1 hour, the gas introduction tube was introduced to start the oxygen/nitrogen=5/95 (v/v) mixed gas. Blowing. Next, 10 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-tert-butylphenol), and 0.8 parts by weight of triethylamine were placed in a flask, and The reaction was continued at 110 ° C for 8 hours, and then cooled to room temperature to obtain an alkali-soluble resin having a solid content of 29.1% by weight, a medium average molecular weight of 32,000, and an acid value of 114 mgKOH/g. Examples 1 to 10 and Comparative Example 1 : Preparation of Self-Photosensitive Photosensitive Resin Each component was mixed in a weight ratio as described in Table 1 below, and diluted with propylene glycol monomethyl ether acetate to have a total solid content of 20% by weight, and sufficiently stirred. Self-luminous photosensitive resin. [Table 1] Color filter ( glass substrate ) production example A color filter was produced using the self-luminous photosensitive resins produced in the above Examples 1 to 10 and Comparative Example 1. Namely, each of the above self-luminous photosensitive resins was applied onto a glass substrate by spin coating, and placed on a hot plate at a temperature of 100 ° C for 3 minutes to form a film. Next, a test light mask having a square light transmission pattern of 20 mm × 20 mm and a line/space pattern of 1 μm to 100 μm was placed on the above film, and ultraviolet rays were irradiated with the test photomask at a distance of 100 μm. At this time, the ultraviolet light source was an ultrahigh pressure mercury lamp (trade name: USH-250D) manufactured by USHIO INC., and the light was irradiated at 200 mJ/cm 2 (365 nm) in an atmospheric atmosphere. Irradiation, no special optical filters were used. The film irradiated with ultraviolet rays was immersed in a developing solution of KOH aqueous solution having a pH of 10.5 for 80 seconds, and then developed. The glass plate coated with the film was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C for 10 minutes, thereby producing a color filter pattern. The film thickness of the self-luminous color filter manufactured above was 3.0 μm. Pattern precision measurement Using an OM (Optical Microscope) apparatus (ECLIPSE LV100POL, NIKON), the above-described color filter prepared using a self-luminous photosensitive resin was designed to have a line/space pattern mask of 100 μm. And the size of the obtained pattern. The width of the light-transmissive pattern formed in the pattern mask and the width of the color filter pattern (the width of the measured pattern) are compared, and the error of the pattern is calculated. That is, the pattern error is obtained by the following formula. Pattern error (Δ) = (width of light transmission pattern, 100 μm) - (width of measured pattern) When the pattern error value is larger than 20 μm, it is difficult to form a fine pattern, so it is difficult to realize fine pixels, which may cause a negative value Poor process. Measuring the luminescence intensity (Intensity) of the above-described color filter pattern is formed from the portion of the pixel to 20 mm × 20 mm square pattern formed by the tube-type 365 nm 4W UV irradiator (VL-4LC, VILBER LOURMAT Company The light conversion region was measured, and the light intensities in the regions of Examples 1 to 10 and Comparative Examples in the 550 nm region were measured by a spectrometer (manufactured by Ocean Optics Co., Ltd.). The hard bake was performed at 230 ° C for 60 minutes, and the intensity before and after the post-baking was measured, and the luminescence maintenance ratio with respect to the comparative example is shown in Table 2. [Table 2] Referring to the above Table 2, since the UV absorbers were used in Examples 1 to 5 and Examples 8 to 10, it was possible to realize a fine pattern, and it was also possible to suppress quantum dots after post-baking with respect to Comparative Example 1. Oxidation makes it possible to maintain the luminescence intensity higher. In particular, in Examples 3, 4, 8 and 10 containing a triazine-based UV absorber, it was confirmed that the luminescence intensity maintenance characteristics were more excellent. Further, in Example 6 and Example 7, the content of the UV absorber was higher than 0.025% by weight based on the total weight of the solid content, and it was confirmed at this time that the luminous intensity maintenance ratio and the wire width adjustment were not affected. It has also been confirmed that when the content of the UV absorber is less than 5%, although the luminous intensity maintenance ratio is greatly effective, it is found that there is a problem that the linear width is greatly reduced.