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TW201704506A - 使用可變節距編碼孔徑之陰影遮罩對準技術 - Google Patents

使用可變節距編碼孔徑之陰影遮罩對準技術 Download PDF

Info

Publication number
TW201704506A
TW201704506A TW105104805A TW105104805A TW201704506A TW 201704506 A TW201704506 A TW 201704506A TW 105104805 A TW105104805 A TW 105104805A TW 105104805 A TW105104805 A TW 105104805A TW 201704506 A TW201704506 A TW 201704506A
Authority
TW
Taiwan
Prior art keywords
substrate
grid
shadow mask
light
bars
Prior art date
Application number
TW105104805A
Other languages
English (en)
Chinese (zh)
Inventor
信彥 田村
Original Assignee
阿德文泰克全球有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/812,076 external-priority patent/US9580792B2/en
Application filed by 阿德文泰克全球有限公司 filed Critical 阿德文泰克全球有限公司
Publication of TW201704506A publication Critical patent/TW201704506A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • H10P72/57—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Vapour Deposition (AREA)
TW105104805A 2015-07-29 2016-02-18 使用可變節距編碼孔徑之陰影遮罩對準技術 TW201704506A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/812,076 US9580792B2 (en) 2010-06-04 2015-07-29 Shadow mask alignment using variable pitch coded apertures

Publications (1)

Publication Number Publication Date
TW201704506A true TW201704506A (zh) 2017-02-01

Family

ID=57885006

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105104805A TW201704506A (zh) 2015-07-29 2016-02-18 使用可變節距編碼孔徑之陰影遮罩對準技術

Country Status (3)

Country Link
CN (1) CN106399932B (fr)
TW (1) TW201704506A (fr)
WO (1) WO2017019126A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7220030B2 (ja) * 2018-07-25 2023-02-09 株式会社ジャパンディスプレイ マスクユニットの製造装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4211489A (en) * 1978-01-16 1980-07-08 Rca Corporation Photomask alignment system
JPS59220922A (ja) * 1983-05-31 1984-12-12 Toshiba Corp 位置合わせ方法
US20040086639A1 (en) * 2002-09-24 2004-05-06 Grantham Daniel Harrison Patterned thin-film deposition using collimating heated mask asembly
US20050006223A1 (en) * 2003-05-07 2005-01-13 Robert Nichols Sputter deposition masking and methods
JP2008293798A (ja) * 2007-05-24 2008-12-04 Toyota Industries Corp 有機ｅｌ素子の製造方法
US7657999B2 (en) * 2007-10-08 2010-02-09 Advantech Global, Ltd Method of forming an electrical circuit with overlaying integration layer
US9122172B2 (en) * 2010-06-04 2015-09-01 Advantech Global, Ltd Reflection shadow mask alignment using coded apertures
WO2011153016A1 (fr) * 2010-06-04 2011-12-08 Advantech Global, Ltd. Alignement de masque perforé à l'aide d'ouvertures codées
CN103019052B (zh) * 2011-09-23 2015-10-21 中芯国际集成电路制造(北京)有限公司 光刻对准标记以及包含其的掩模板和半导体晶片

Also Published As

Publication number Publication date
CN106399932B (zh) 2020-07-03
WO2017019126A1 (fr) 2017-02-02
CN106399932A (zh) 2017-02-15

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