TW201606009A - 矽烷系塗布組合物 - Google Patents
矽烷系塗布組合物 Download PDFInfo
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- TW201606009A TW201606009A TW104122801A TW104122801A TW201606009A TW 201606009 A TW201606009 A TW 201606009A TW 104122801 A TW104122801 A TW 104122801A TW 104122801 A TW104122801 A TW 104122801A TW 201606009 A TW201606009 A TW 201606009A
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- decane
- coating composition
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- 239000008199 coating composition Substances 0.000 title claims abstract description 43
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title 1
- 229910000077 silane Inorganic materials 0.000 title 1
- 229920000768 polyamine Polymers 0.000 claims abstract description 41
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 34
- 239000000203 mixture Substances 0.000 claims abstract description 31
- 230000007062 hydrolysis Effects 0.000 claims abstract description 23
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 23
- 239000011817 metal compound particle Substances 0.000 claims abstract description 23
- 150000007524 organic acids Chemical class 0.000 claims abstract description 15
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 11
- 125000006551 perfluoro alkylene group Chemical group 0.000 claims abstract description 7
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 116
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 12
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 229920001281 polyalkylene Polymers 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000002296 dynamic light scattering Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 239000011164 primary particle Substances 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 17
- 239000011248 coating agent Substances 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 9
- 238000003860 storage Methods 0.000 abstract description 8
- 150000001298 alcohols Chemical class 0.000 abstract description 5
- 229920003023 plastic Polymers 0.000 abstract description 5
- 239000004033 plastic Substances 0.000 abstract description 4
- 230000007774 longterm Effects 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 238000012986 modification Methods 0.000 abstract description 2
- 230000004048 modification Effects 0.000 abstract description 2
- 238000004873 anchoring Methods 0.000 abstract 1
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- -1 amino group compound Chemical class 0.000 description 50
- 239000003960 organic solvent Substances 0.000 description 16
- 125000000217 alkyl group Chemical group 0.000 description 15
- 239000003054 catalyst Substances 0.000 description 10
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 10
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 8
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 8
- 238000009833 condensation Methods 0.000 description 8
- 230000005494 condensation Effects 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 150000001412 amines Chemical class 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 6
- 229910052707 ruthenium Inorganic materials 0.000 description 6
- 239000007859 condensation product Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 150000002736 metal compounds Chemical class 0.000 description 5
- 239000005711 Benzoic acid Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 235000010233 benzoic acid Nutrition 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052762 osmium Inorganic materials 0.000 description 3
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 3
- 235000006408 oxalic acid Nutrition 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 2
- SMNDYUVBFMFKNZ-UHFFFAOYSA-N 2-furoic acid Chemical compound OC(=O)C1=CC=CO1 SMNDYUVBFMFKNZ-UHFFFAOYSA-N 0.000 description 2
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- OBKXEAXTFZPCHS-UHFFFAOYSA-N 4-phenylbutyric acid Chemical compound OC(=O)CCCC1=CC=CC=C1 OBKXEAXTFZPCHS-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 2
- 125000005018 aryl alkenyl group Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 2
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- MLIREBYILWEBDM-UHFFFAOYSA-N cyanoacetic acid Chemical compound OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 description 1
- AFENDNXGAFYKQO-VKHMYHEASA-N (S)-2-hydroxybutyric acid Chemical compound CC[C@H](O)C(O)=O AFENDNXGAFYKQO-VKHMYHEASA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- FQDXJYBXPOMIBX-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoro-2-methylpropan-2-ol Chemical compound FC(F)(F)C(O)(C)C(F)(F)F FQDXJYBXPOMIBX-UHFFFAOYSA-N 0.000 description 1
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- OCGWWLDZAFOHGD-UHFFFAOYSA-N 1,1,1-trifluoro-2-methylpropan-2-ol Chemical compound CC(C)(O)C(F)(F)F OCGWWLDZAFOHGD-UHFFFAOYSA-N 0.000 description 1
- NNZZMYIWZFZLHU-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanol Chemical compound OC(F)(F)C(F)(F)F NNZZMYIWZFZLHU-UHFFFAOYSA-N 0.000 description 1
- WBXAHKZHOCTGLP-UHFFFAOYSA-N 1,1,2,2,3,3,3-heptafluoropropan-1-ol Chemical compound OC(F)(F)C(F)(F)C(F)(F)F WBXAHKZHOCTGLP-UHFFFAOYSA-N 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 1
- PSQZJKGXDGNDFP-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)(F)F PSQZJKGXDGNDFP-UHFFFAOYSA-N 0.000 description 1
- WXJFKAZDSQLPBX-UHFFFAOYSA-N 2,2,3,3,4,4,4-heptafluorobutan-1-ol Chemical compound OCC(F)(F)C(F)(F)C(F)(F)F WXJFKAZDSQLPBX-UHFFFAOYSA-N 0.000 description 1
- JUGSKHLZINSXPQ-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluoropentan-1-ol Chemical compound OCC(F)(F)C(F)(F)C(F)(F)C(F)F JUGSKHLZINSXPQ-UHFFFAOYSA-N 0.000 description 1
- JLZVIWSFUPLSOR-UHFFFAOYSA-N 2,3-difluorobenzoic acid Chemical compound OC(=O)C1=CC=CC(F)=C1F JLZVIWSFUPLSOR-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- CABMTIJINOIHOD-UHFFFAOYSA-N 2-[4-methyl-5-oxo-4-(propan-2-yl)-4,5-dihydro-1H-imidazol-2-yl]quinoline-3-carboxylic acid Chemical compound N1C(=O)C(C(C)C)(C)N=C1C1=NC2=CC=CC=C2C=C1C(O)=O CABMTIJINOIHOD-UHFFFAOYSA-N 0.000 description 1
- MONMFXREYOKQTI-UHFFFAOYSA-N 2-bromopropanoic acid Chemical compound CC(Br)C(O)=O MONMFXREYOKQTI-UHFFFAOYSA-N 0.000 description 1
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 1
- SLAMLWHELXOEJZ-UHFFFAOYSA-N 2-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1[N+]([O-])=O SLAMLWHELXOEJZ-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- 150000004941 2-phenylimidazoles Chemical class 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- HDBGBTNNPRCVND-UHFFFAOYSA-N 3,3,3-trifluoropropan-1-ol Chemical compound OCCC(F)(F)F HDBGBTNNPRCVND-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- ANOPCGQVRXJHHD-UHFFFAOYSA-N 3-[3-(3-aminopropyl)-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]propan-1-amine Chemical compound C1OC(CCCN)OCC21COC(CCCN)OC2 ANOPCGQVRXJHHD-UHFFFAOYSA-N 0.000 description 1
- QEYMMOKECZBKAC-UHFFFAOYSA-N 3-chloropropanoic acid Chemical compound OC(=O)CCCl QEYMMOKECZBKAC-UHFFFAOYSA-N 0.000 description 1
- MXNBDFWNYRNIBH-UHFFFAOYSA-N 3-fluorobenzoic acid Chemical compound OC(=O)C1=CC=CC(F)=C1 MXNBDFWNYRNIBH-UHFFFAOYSA-N 0.000 description 1
- AFPHTEQTJZKQAQ-UHFFFAOYSA-N 3-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC([N+]([O-])=O)=C1 AFPHTEQTJZKQAQ-UHFFFAOYSA-N 0.000 description 1
- XMIIGOLPHOKFCH-UHFFFAOYSA-N 3-phenylpropionic acid Chemical compound OC(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-N 0.000 description 1
- KOGSPLLRMRSADR-UHFFFAOYSA-N 4-(2-aminopropan-2-yl)-1-methylcyclohexan-1-amine Chemical compound CC(C)(N)C1CCC(C)(N)CC1 KOGSPLLRMRSADR-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 1
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 1
- JOOXCMJARBKPKM-UHFFFAOYSA-N 4-oxopentanoic acid Chemical compound CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 1
- UGZDZSOMKGGBIG-UHFFFAOYSA-N 5-methyl-1h-imidazol-4-ol Chemical compound CC=1NC=NC=1O UGZDZSOMKGGBIG-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- OUJKZIYSFNAHHZ-UHFFFAOYSA-N 9,10-diphenylanthracene-1,2-diamine Chemical compound NC1=C(C2=C(C3=CC=CC=C3C(=C2C=C1)C1=CC=CC=C1)C1=CC=CC=C1)N OUJKZIYSFNAHHZ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- BGURTEKVZCRPIG-UHFFFAOYSA-N C(C1CO1)OC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(C1CO1)OC(C(OC)(OC)OC)CCCCCCCC BGURTEKVZCRPIG-UHFFFAOYSA-N 0.000 description 1
- JPWPXCRDUOVJAO-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC.C(C1CO1)OCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC.C(C1CO1)OCCCC(C(OCC)(OCC)C)CCCCCCCC JPWPXCRDUOVJAO-UHFFFAOYSA-N 0.000 description 1
- VPLKXGORNUYFBO-UHFFFAOYSA-N C1(CC2C(CC1)O2)CCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C1(CC2C(CC1)O2)CCC(C(OC)(OC)OC)CCCCCCCC VPLKXGORNUYFBO-UHFFFAOYSA-N 0.000 description 1
- NPESBOHCGOLBPI-UHFFFAOYSA-N CC(C(C(C(OC)(OC)OC)(CCCNC(=N)N)C)(C)C)CCCCCC Chemical compound CC(C(C(C(OC)(OC)OC)(CCCNC(=N)N)C)(C)C)CCCCCC NPESBOHCGOLBPI-UHFFFAOYSA-N 0.000 description 1
- IRBVAXFIICJCIA-UHFFFAOYSA-N CC(C(OCC1(COC1)C)(OCC1(COC1)C)OCC1(COC1)C)CCCCCCCC Chemical compound CC(C(OCC1(COC1)C)(OCC1(COC1)C)OCC1(COC1)C)CCCCCCCC IRBVAXFIICJCIA-UHFFFAOYSA-N 0.000 description 1
- YUZGIPQAWWJBTO-UHFFFAOYSA-N CC(C(OCC1CO1)(OCC1CO1)OCC1CO1)CCCCCCCC Chemical compound CC(C(OCC1CO1)(OCC1CO1)OCC1CO1)CCCCCCCC YUZGIPQAWWJBTO-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- ODBLHEXUDAPZAU-ZAFYKAAXSA-N D-threo-isocitric acid Chemical compound OC(=O)[C@H](O)[C@@H](C(O)=O)CC(O)=O ODBLHEXUDAPZAU-ZAFYKAAXSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- WJJMNDUMQPNECX-UHFFFAOYSA-N Dipicolinic acid Natural products OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 240000006927 Foeniculum vulgare Species 0.000 description 1
- 235000004204 Foeniculum vulgare Nutrition 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- ODBLHEXUDAPZAU-FONMRSAGSA-N Isocitric acid Natural products OC(=O)[C@@H](O)[C@H](C(O)=O)CC(O)=O ODBLHEXUDAPZAU-FONMRSAGSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- ILUJQPXNXACGAN-UHFFFAOYSA-N O-methylsalicylic acid Chemical compound COC1=CC=CC=C1C(O)=O ILUJQPXNXACGAN-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- IWYDHOAUDWTVEP-UHFFFAOYSA-N R-2-phenyl-2-hydroxyacetic acid Natural products OC(=O)C(O)C1=CC=CC=C1 IWYDHOAUDWTVEP-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229930182558 Sterol Natural products 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- DQTRUCSKJZOPCX-UHFFFAOYSA-N aniline;formic acid Chemical compound [O-]C=O.[NH3+]C1=CC=CC=C1 DQTRUCSKJZOPCX-UHFFFAOYSA-N 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052795 boron group element Inorganic materials 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052800 carbon group element Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 125000004639 dihydroindenyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 1
- MHPUGCYGQWGLJL-UHFFFAOYSA-N dimethyl pentanoic acid Natural products CC(C)CCCC(O)=O MHPUGCYGQWGLJL-UHFFFAOYSA-N 0.000 description 1
- OREAFAJWWJHCOT-UHFFFAOYSA-N dimethylmalonic acid Chemical compound OC(=O)C(C)(C)C(O)=O OREAFAJWWJHCOT-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical compound CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 125000000879 imine group Chemical group 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-N isocaproic acid Chemical compound CC(C)CCC(O)=O FGKJLKRYENPLQH-UHFFFAOYSA-N 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- 229960002510 mandelic acid Drugs 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- ZBMHRNRRQBUOFQ-UHFFFAOYSA-N methanamine propan-1-amine Chemical compound C(CC)N.CN ZBMHRNRRQBUOFQ-UHFFFAOYSA-N 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- ODGYWRBCQWKSSH-UHFFFAOYSA-N n'-ethylpropane-1,3-diamine Chemical compound CCNCCCN ODGYWRBCQWKSSH-UHFFFAOYSA-N 0.000 description 1
- MDKQJOKKKZNQDG-UHFFFAOYSA-N n,n'-dimethylhexane-1,6-diamine Chemical compound CNCCCCCCNC MDKQJOKKKZNQDG-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- VXPJBVRYAHYMNY-UHFFFAOYSA-N n-methyl-2-[2-(methylamino)ethoxy]ethanamine Chemical compound CNCCOCCNC VXPJBVRYAHYMNY-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000002304 perfume Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229950009215 phenylbutanoic acid Drugs 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000011664 signaling Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- ODBLHEXUDAPZAU-UHFFFAOYSA-N threo-D-isocitric acid Natural products OC(=O)C(O)C(C(O)=O)CC(O)=O ODBLHEXUDAPZAU-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-N trans-cinnamic acid Chemical compound OC(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LEMQFBIYMVUIIG-UHFFFAOYSA-N trifluoroborane;hydrofluoride Chemical compound F.FB(F)F LEMQFBIYMVUIIG-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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Abstract
本發明之課題在於提供一種長期之保存穩定性優異之塗佈組合物,該塗佈組合物可適應於包含塑膠之廣範圍之基材,可表面改質為玻璃狀,可於短時間內製造,且藉由短時間之硬化具有充分之硬度,進而可獲得因投錨效應而密接性優異之塗膜。
本發明使用含有(A)含環氧基之三烷氧基矽烷之水解縮合物、(B)聚胺類、(C)25℃下之pKa為2.0~6.0之範圍之有機酸、或者具有全氟烷基或全氟伸烷基之碳數2~5之醇類、及(D)金屬化合物粒子之組合物。
Description
本發明係關於一種有機矽烷系組合物,尤其關於一種對塑膠基材、金屬基材等之密接性優異,進而保存穩定性優異之組合物。
本案對2014年7月16日所申請之日本專利申請案第2014-146252號主張優先權,此處援用其內容。
聚碳酸酯等透明塑膠成形體充分發揮輕量、易加工性、耐衝擊性等優點,而被廣泛用作無機玻璃製品之替代品,但具有容易被溶劑侵入、較難進行表面改質之缺點。因此,與無機玻璃相比仍有不及之點,自先前以來,不斷進行用以改良該等性質之嘗試。
例如已知:將縮水甘油氧基三甲氧基矽烷於醇中用硝酸水進行水解,進而,添加二伸乙基三胺使之進一步反應,藉由塗佈,可於聚碳酸酯板上形成相當於鉛筆硬度2 H之硬塗膜。(非專利文獻1)
又,已知有如下熱硬化性樹脂組合物,其係將包含通式NH2-R1-NH-R1-NH2(R1表示碳原子6個以下之直鏈及支鏈伸烷基)所表示之胺基化合物、縮水甘油氧基C1-6直鏈或支鏈伸烷基三烷氧基矽烷單體或其聚合物、及四烷氧基矽烷或烷基三烷氧基矽烷之混合物水解而獲得,且已知將其塗佈於金屬表面且藉由加熱使之硬化,可獲得耐磨性、表面硬度、耐化學品性等物性優異之覆膜。又,記載有可使用氫鹵酸、羧酸、磺酸等作為水解觸媒。(專利文獻1)
[專利文獻1]日本專利特開昭55-25469號公報
[非專利文獻1]J. Korean Ind. Eng. Chem., Vol17, No2, April 2006, 170-176.
然而,非專利文獻1中所記載之塗佈組合物存在水解需要24小時之長時間,且塗膜後之硬化需要長達15小時之作業性問題,進而如後述般於其保存穩定性方面亦存在問題。
又,專利文獻1中,記載有過氯酸等強酸作為水解觸媒而較佳,所使用之量為組合物整體之1質量%以下,但關於組合物之長期之保存穩定性並無記載及啟示,又,關於作為底塗層與上層之密接性並無記載及啟示。
本發明係鑒於上述情況而完成者,其目的在於提供一種塗佈組合物,該塗佈組合物可適應於包含塑膠之廣範圍之基材,可表面改質為玻璃狀,可於短時間內製造,進而藉由短時間之硬化具有充分之硬度,可獲得與基材之密接性、或與上層之密接性優異之底塗層等塗膜。
本發明者為解決上述課題而進行銳意研究,結果發現,藉由塗佈包含含環氧基之三烷氧基矽烷水解縮合物、聚胺類、某種特定之有機酸或特定之醇、及金屬化合物粒子之組合物並加以乾燥,可解決上述課題,以至於完成本發明。
即,本發明係關於:(1)
一種矽烷系塗佈組合物,其含有:(A)含環氧基之三烷氧基矽烷之水解縮合物、(B)聚胺類、(C)25℃下之pKa為2.0~6.0之範圍之有機酸、或者具有全氟烷基或全氟伸烷基之碳數2~5之醇類、及(D)金屬化合物粒子;(2)如(1)之矽烷系塗佈組合物,其中含環氧基之三烷氧基矽烷之水解縮合物之藉由動態光散射法所測定之z-平均粒徑為5~50nm之範圍;(3)如(1)之矽烷系塗佈組合物,其中聚胺類係選自由伸烷基聚胺、聚伸烷基聚胺、聚(伸苯基伸烷基)聚胺、及伸環烷基烷基聚胺所組成之群中之至少1種聚胺;(4)如(1)之矽烷系塗佈組合物,其相對於含環氧基之三烷氧基矽烷及/或其水解縮合物中之環氧基1莫耳,於1/(聚胺類1分子中之全部氮原子上之全部氫原子數)莫耳以上且1/(聚胺類1分子中之全部氮原子上之全部氫原子數)之10倍莫耳以下之範圍內使用聚胺類;(5)如(1)之矽烷系塗佈組合物,其相對於聚胺類1莫耳,於0.3~1.2莫耳之範圍內使用pKa為2.0~6.0之範圍之有機酸;(6)如(1)之矽烷系塗佈組合物,其中具有全氟烷基或全氟伸烷基之碳數2~5之醇類為組合物整體之30質量%以上;(7)如(1)之矽烷系塗佈組合物,其進而包含除具有全氟烷基或全氟伸烷基之碳數2~5之醇類以外之碳數1~5之醇及水;(8)如(1)之矽烷系塗佈組合物,其中金屬化合物粒子之金屬元素係選自由矽、鋁、鈦、及鐵所組成之群中之至少1種;(9)如(1)之矽烷系塗佈組合物,其中金屬化合物粒子為氧化矽;(10)如(1)之矽烷系塗佈組合物,其中金屬化合物粒子之平均一次
粒徑為1~500nm;(11)如(1)之矽烷系塗佈組合物,其中金屬化合物粒子包含於組合物之全部固形物成分之20~83質量%之範圍;(12)一種薄膜,其係將如(1)至(11)中任一項所記載之矽烷系塗佈組合物塗佈於基材上並進行室溫乾燥及/或加熱而獲得。
藉由使用本發明之矽烷系塗佈組合物且塗佈於基材上,可於短時間內將基材之表面改質為具有充分之硬度之玻璃狀之表面,進而,可使表面形成微細之凹凸。使用本發明之組合物所獲得之薄膜可用作與設置於其上之樹脂層之密接性優異之底塗層,通常作為用以於密接性較差之基材之表面設置樹脂層之底塗層而有用。
以下,對本發明之含有上述成分(A)、(B)、(C)及(D)之組合物進行詳細敍述。
(A)含環氧基之三烷氧基矽烷之水解縮合物
本發明所使用之含環氧基之三烷氧基矽烷之水解縮合物可將含環氧基之三烷氧基矽烷及/或其水解縮合物作為原料而製造。
含環氧基之三烷氧基矽烷只要為除藉由水解等所變換之官能基部分以外包含環氧基之三烷氧基矽烷,則其結構並無特別限定。
於以通式表示之情形時,可列舉下述式(I)所表示之化合物。
R-Si(OR1)3...(I)
式中,R表示具有環氧基或縮水甘油氧基之烴基,R1表示烷基。
R中,環氧基、或縮水甘油氧基含有1個以上即可,較佳為具有1~3個,亦可包含環氧基、縮水甘油氧基兩者。
作為R之「具有環氧基或縮水甘油氧基之烴基」之「烴基」,可列舉:烷基、環烷基、環烷基烷基、烯基、環烯基、炔基、芳基、芳基烷基、芳基烯基等。作為碳數,較佳為1~30個之範圍,進而較佳為1~10個之範圍。
作為「烷基」,具體而言可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、異戊基、新戊基、正己基、異己基、正庚基、正辛基、正壬基、異壬基、正癸基等、十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷基等。
作為「環烷基」,具體而言可列舉:環丙基、環丁基、環戊基、環己基、環庚基、環辛基等。
「環烷基烷基」係環烷基與烷基鍵結所成之基,較佳為碳數3~10之環烷基與碳數1~10之烷基鍵結所成之基。
作為「烯基」,具體而言可列舉:乙烯基、1-丙烯-1-基、烯丙基、1-丁烯-1-基、2-丁烯-1-基、3-丁烯-1-基、1-丁烯-2-基、3-丁烯-2-基、1-戊烯-1-基、4-戊烯-1-基、1-戊烯-2-基、4-戊烯-2-基、3-甲基-1-丁烯-1-基、1-己烯-1-基、5-己烯-1-基、1-庚烯-1-基、6-庚烯-1-基、1-辛烯-1-基、7-辛烯-1-基、1,3-丁二烯-1-基等。
作為「環烯基」,具體而言可列舉:1-環戊烯-1-基、2-環戊烯-1-基、1-環己烯-1-基、2-環己烯-1-基、3-環己烯-1-基等。
作為「炔基」,具體而言可列舉:乙炔基、1-丙炔-1-基、2-丙炔-1-基、1-丁炔-1-基、3-丁炔-1-基、1-戊炔-1-基、4-戊炔-1-基、1-己炔-1-基、5-己炔-1-基、1-庚炔-1-基、1-辛炔-1-基、7-辛炔-1-基等。
「芳基」意指單環或多環之芳基,於多環芳基之情形時,除完全不飽和環,亦包含具有部分飽和環之基。具體而言可列舉:苯基、萘基、薁基、茚基、二氫茚基、四氫萘基等。
「芳基烷基」係芳基與烷基鍵結所成之基,較佳為碳數6~10之芳基與碳數1~10之烷基鍵結所成之基。
「芳基烯基」係芳基與烯基鍵結所成之基,較佳為碳數6~10之芳基與碳數2~10之烯基鍵結所成之基。
上述「烴基」中亦可具有除環氧基及縮水甘油氧基以外之取代基,作為此種取代基,可列舉:鹵基、烷基、烯基、烷氧基、(甲基)丙烯醯氧基等。
此處,作為鹵基,可列舉:氟基、氯基、溴基、碘基等。
作為烷氧基,可列舉:甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第三丁氧基等。
作為烷基、烯基,可列舉與上述R中之烷基、烯基相同之烴基。
作為R1之「烷基」,可列舉與上述R中之烷基相同之烴基。
上述「烷基」亦可具有取代基,作為此種取代基,可列舉:鹵基、烷氧基、(甲基)丙烯醯氧基等。
作為原料之含環氧基之三烷氧基矽烷或其水解縮合物較佳為縮水甘油氧基烷基三烷氧基矽烷、或縮水甘油氧基烯基烷氧基矽烷。該等可單獨使用1種或混合2種以上而使用。
作為式(I)所表示之化合物,具體而言可列舉:甲基-三縮水甘油氧基矽烷、甲基三(3-甲基-3-氧雜環丁烷甲氧基)矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-縮水甘油氧基-正丙基三甲氧基矽烷、3-縮水甘油氧基-正丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷。
含環氧基之三烷氧基矽烷之水解縮合物可將含環氧基之三烷氧基矽烷及/或其水解縮合物、水、及視需要之矽烷醇縮合觸媒加以混合並攪拌而製備。其混合順序、及攪拌速度並無特別限定,可設定任意之順序、或任意之速度。混合時及攪拌時之溫度並無特別限定,較
佳為於室溫至所使用之溶劑之沸點之範圍進行,進而較佳為於室溫下進行。所謂室溫,於該情形時成為進行混合攪拌之場所之外部大氣溫度,較佳為15~35℃之範圍之溫度。
較佳為於含環氧基之三烷氧基矽烷、水、及視需要之矽烷醇縮合觸媒之全部共存之狀態下,於室溫下攪拌2小時至3小時。於製備中,必要時以有機溶劑或水進行稀釋。
所使用之水之量只要為可使所使用之含環氧基之三烷氧基矽烷及/或其水解縮合物於某種程度上水解縮合之量以上,則並無特別限定,具體而言,相對於所使用之含環氧基之三烷氧基矽烷及/或其水解縮合物1莫耳,較佳為0.5莫耳以上,進而較佳為1.0莫耳以上、2.0莫耳以上、5.0莫耳以上、或10莫耳以上。
所使用之矽烷醇縮合觸媒之量並無特別限定,相對於換算為作為原料之含環氧基之三烷氧基矽烷及/或其水解縮合物中之全部未縮合之三烷氧基矽烷基之量,以莫耳比(矽烷醇縮合觸媒/該矽烷基)計,較佳為0.001~1.0之範圍,進而較佳為0.01~1.0、或0.1~0.5之範圍。
作為矽烷醇縮合觸媒,可列舉:金屬烷氧化物、金屬螯合化合物、有機酸金屬鹽或該等之水解縮合物等金屬化合物,進而具體而言可列舉:四異丙氧基鈦、二異丙氧基鈦雙乙醯丙酮、或其水解縮合物等。
作為矽烷醇縮合觸媒,除上述金屬化合物之外,可列舉酸、鹼等。
作為酸,可列舉有機酸、無機酸,例如作為有機酸,可列舉:乙酸、甲酸、草酸、碳酸、鄰苯二甲酸、三氟乙酸、對甲苯磺酸、甲磺酸等;作為無機酸,可列舉:鹽酸、硝酸、硼酸、氫氟硼酸等。
此處,作為酸,亦包含因光照射而產生酸之光酸產生劑,具體
而言有六氟磷酸二苯基錪、六氟磷酸三苯基鏻等。
作為鹼,可列舉:四甲基胍、四甲基胍基丙基三甲氧基矽烷等強鹼類;脂肪族第一胺類;脂肪族第二胺類;脂肪族第三胺類;脂肪族不飽和胺類;芳香族胺類;二伸乙基三胺、三伸乙基四胺、二乙基胺基丙胺、苯二甲胺、乙二胺、六亞甲基二胺、三乙二胺等聚胺類;該等胺系化合物之與羧酸等之鹽;有機胺之羧酸中和鹽、四級銨鹽;咪唑、2-乙基-4-甲基咪唑、2-苯基-4-甲基-5-羥基咪唑等咪唑類;等。
矽烷醇縮合觸媒可單獨使用1種或組合2種以上而使用。
於本發明之組合物中,就使用聚胺類或咪唑類作為含環氧基之三烷氧基矽烷之硬化劑或硬化促進劑而言,較佳為矽烷醇縮合觸媒亦使用聚胺類或咪唑類。
本發明中所使用之含環氧基之三烷氧基矽烷之水解縮合物較佳為藉由動態光散射法所測定之z-平均粒徑為5~50nm之範圍,進而較佳為5~30nm。於大於50nm之情形時,存在使用壽命較短,於保存穩定性方面產生問題之情況,進而存在塗佈後產生塗佈不均之情況。又,於小於5nm之情形時,存在所獲得之薄膜之硬度變得不充分之情況。
(B)聚胺類
所使用之聚胺類只要為1分子中具有2個以上鍵結有1個以上氫原子之胺基或亞胺基之化合物,則並無特別限定,具體而言可列舉:乙二胺、三亞甲基二胺、四亞甲基二胺、六亞甲基二胺、二伸乙基三胺、三伸乙基四胺、四伸乙基五胺、二伸丙基三胺、甲基胺基丙胺、乙基胺基丙胺、N,N'-二甲基六亞甲基二胺、雙(2-甲基胺基乙基)醚、薄荷烷二胺、異佛爾酮二胺、3,9-雙(3-胺基丙基)-2,4,8,10-四氧螺環(5,5)十一烷加成物、雙(4-胺基環己基)甲烷、鄰苯二胺、間苯二胺、
對苯二胺、二胺基二苯甲烷、二胺基二苯基碸、間苯二甲胺等。該等可單獨使用1種或混合2種以上而使用。其中,較佳為伸烷基聚胺、聚伸烷基聚胺、聚(伸苯基伸烷基)聚胺、及伸環烷基烷基聚胺,尤佳為聚伸烷基聚胺。具體而言可列舉:二伸乙基三胺、三伸乙基四胺、四伸乙基五胺、二伸丙基三胺等。
所使用之聚胺類之量並無特別限定,較佳為相對於含環氧基之三烷氧基矽烷及/或其水解縮合物中之環氧基1莫耳,使用1/(聚胺類1分子中之全部氮原子上之全部氫原子數)莫耳以上,較佳為1/(聚胺類1分子中之全部氮原子上之全部氫原子數)之1.2倍~10倍莫耳之範圍、1.5倍~5倍莫耳之範圍、或1.8倍~2.5倍莫耳之範圍。於少於1/(聚胺類1分子中之全部氮原子上之全部氫原子數)莫耳之情形時,存在硬化不充分,無法獲得較高硬度之膜之情況,於大於1/(聚胺類1分子中之全部氮原子上之全部氫原子數)之10倍莫耳之情形時,存在聚胺類殘存而無法形成充分之硬度之薄膜之情況。
(C)有機酸或具有全氟烷基或全氟伸烷基之碳數2~5之醇類
所使用之有機酸只要為25℃下之pKa為2.0~6.0之範圍、較佳為3.0~5.0之範圍之有機酸,則並無特別限定。具體而言可列舉:甲酸、乙酸、丙酸、丁酸、異丁酸、戊酸、異戊酸、己酸、異己酸、氯乙酸、氟乙酸、溴乙酸、3-氯丙酸、2-溴丙酸、2-羥基丁酸、苯乙酸、苯丙酸、4-苯基丁酸、苯氧乙酸、氰乙酸、草酸、丙二酸、2,2-二甲基丙二酸、己二酸、丁二酸、庚二酸、鄰苯二甲酸、戊二酸、草醯乙酸、檸檬酸、異檸檬酸、環己烷-1,1-二羧酸、酒石酸、鄰茴香酸、間茴香酸、對茴香酸、苯甲酸、鄰氯苯甲酸、間氟苯甲酸、2,3-二氟苯甲酸、鄰硝基苯甲酸、間硝基苯甲酸、對硝基苯甲酸、間胺基苯甲酸、對胺基苯甲酸、水楊酸、鄰苯二甲酸、irophthalic acid、反式桂皮酸、2-呋喃羧酸、乙醛酸、乙醇酸、丁烯酸、乳酸、2-羥基-2-
甲基丙酸、丙酮酸、苦杏仁酸、蘋果酸、乙醯丙酸、2,6-吡啶二羧酸、菸鹼酸等,其中,較佳為脂肪族單羧酸、或者苯甲酸或取代苯甲酸。
所使用之有機酸之量並無特別限定,相對於所使用之聚胺類1莫耳,較佳為0.3~1.2莫耳之範圍,進而較佳為0.5~1.0莫耳、或0.6~0.9莫耳之範圍。
於小於0.3莫耳之情形時,存在矽烷系塗佈組合物之保存穩定性降低之情況,於大於1.2莫耳之情形時,存在無法形成充分之硬度之塗膜之情況。
作為所使用之具有全氟烷基或全氟伸烷基之碳數2~5之醇類(全氟化醇類),具體而言可列舉:2,2,2-三氟乙醇、1,1,2,2,2-五氟乙醇、3,3,3-三氟-1-丙醇、2,2,3,3,3-五氟-1-丙醇、1,1,2,2,3,3,3-七氟-1-丙醇、1,1,1,3,3,3-六氟-2-丙醇、2-三氟甲基-2-丙醇、2-甲基-1,1,1,3,3,3-六氟-2-丙醇、2,2,3,3,4,4,4-七氟-1-丁醇、九氟-第三丁醇、2,2,3,3,4,4,5,5-八氟-1-戊醇等。
所使用之全氟化醇類之使用量並無特別限定,較佳為矽烷系塗佈組合物整體之30質量%以上,進而較佳為40質量%以上。於小於30質量%之情形時,存在組合物之長期保存穩定性降低之情況。
(成分(A)及(B)之調配比率)
矽烷系塗佈組合物中之固形物成分濃度並無特別限定,若考慮薄膜之外觀、塗佈性、硬化性、薄膜之性質、組合物之保存穩定性等,則較佳為使用(A)含環氧基之三烷氧基矽烷之水解縮合物及(B)聚胺類之固形物成分濃度相對於其全部質量成為0.5~50質量%之範圍之量,進而較佳為1.0~30質量%、1.0~20質量%、1.0~10質量%、1.5~5.0質量%、或1.8~3質量%之範圍。於小於0.5質量%之情形時,存在難以將膜均質成膜之情況,於大於50質量%之情形時,存在組合物
之穩定性、薄膜之透明性、外觀、或塗佈性等產生問題之情況。
所使用之有機溶劑及水之量可於能調整至上述固形物成分濃度之範圍內適當決定。
(D)金屬化合物粒子
作為金屬化合物粒子之金屬,具體而言可列舉:矽、鎢、銻、鋯、鋁、鈦、鎂、鐵、錫、鋅、鎘、鎳、銅、鈹、釕、釷、釔、水銀、銫、鉻、鑭、鉛、銦、鈮、鎘、鉍、鎵、鎂等。
作為金屬化合物,具體而言可列舉:氧化矽、氧化鎢、氧化銻、氧化鋯、氧化鋁、氧化鈦、氧化鎂、氧化錫、氧化鋅、氧化鎘、氧化釔、氧化鎳、氧化銅、氧化鈹、氧化釕、氧化釷、氧化水銀、氧化銫、氧化鉻、氧化鉛、氧化銦、氧化鈮、氧化鎘、氧化鉍、氧化鎵(III)、氧化亞鐵等金屬氧化物或氟化鎂等。
其中較佳為包含選自由週期表第4族元素、第5族元素、第13族元素、第14族元素、及第8~10族元素所組成之群中之至少1種金屬元素之金屬化合物粒子,進而較佳為包含選自由矽、鋁、鈦、及鐵所組成之群中之至少1種金屬元素之金屬化合物粒子,進而較佳為包含矽之金屬化合物粒子。
金屬化合物之粒徑並無特別限定,以平均1次粒徑計較佳為1nm~500nm之範圍,進而較佳為10nm~100nm之範圍。
又,金屬化合物粒子之性狀可為溶膠亦可為粉體,通常較佳為使用溶膠。由於溶膠通常為膠體狀之分散液,故而藉由僅與其他成分混合可簡便地製成均勻之分散液,又,因沈澱等而變得不均勻之問題亦較少。
又,可使用藉由矽烷偶合劑等對各金屬化合物粒子之表面進行表面修飾所成者,具體而言可列舉利用烴基等實施過疏水性處理之氧化矽溶膠等。
金屬化合物粒子之含量較佳為組合物中之全部固形物成分之20~83質量%,進而較佳為65~75質量%之範圍。
(溶劑)
矽烷系塗佈組合物為了調整組合物中之固形物成分濃度,可使用有機溶劑。作為此種溶劑,只要為可保持溶液之均勻性、穩定性等之溶劑,則並無特別限定,可列舉:醇類、醚類、酮類、酯類、醯胺類等,較佳為碳數1~5之醇。該等可單獨使用1種或併用2種以上而使用。
作為其他溶劑,較佳為使用水,於此情形時,所使用之有機溶劑較佳為溶解於水之有機溶劑。又,水與有機溶劑之比率較佳為使用各自所需之量後,成為均勻之溶液之量比。於使用碳數1~3之醇等相對良好地溶解於水之有機溶劑之情形時,水與有機溶劑之質量比(水/有機溶劑)較佳為30/70~95/5之範圍,進而較佳為50/50~90/10、60/40~80/20、或65/35~75/25之範圍。
又,於使用碳數4以上之醇等相對難以溶解於水之有機溶劑之情形時,由於水相對於有機溶劑之溶解度較低,故而所使用之水之量較佳為使用三烷氧基矽烷之水解所需之量以上且處於使組合物變得均勻之範圍之量。
(其他組成成分)
於本發明之矽烷系塗佈組合物中,根據其用途,可添加其他成分,作為其他成分,可列舉:各種界面活性劑、染料、顏料、分散材料、撥液材料、增黏材料、香料、抗菌性成分等。
(組合物之製備方法)
本發明之矽烷系塗佈組合物之製備方法並無特別限定,具體而言,可列舉以下方法等。
i)將水、聚胺類、及有機酸或全氟化醇類、以及視需要之有機溶
劑於室溫下混合、攪拌,繼而,添加含環氧基之三烷氧基矽烷及/或其水解縮合物、金屬化合物粒子溶膠或粉末,利用有機溶劑進行稀釋。
ii)將水、含環氧基之三烷氧基矽烷及/或其水解縮合物、聚胺類、以及視需要之有機溶劑於室溫下混合、攪拌,繼而,添加有機酸或全氟化醇類、金屬化合物粒子溶膠或粉末,利用有機溶劑進行稀釋。
iii)將水、含環氧基之三烷氧基矽烷及/或其水解縮合物、聚胺類、有機酸或全氟化醇類、以及視需要之有機溶劑於室溫下混合、攪拌,繼而,添加金屬化合物粒子溶膠或粉末,利用有機溶劑進行稀釋。
攪拌溫度並無特別限定,較佳為室溫至所使用之溶劑之沸點溫度之範圍,進而較佳為於室溫下進行。於該情形時,所謂室溫係成為進行攪拌之場所之外部大氣溫度,較佳為15~35℃之範圍。
(本發明之組合物之使用態樣)
本發明之矽烷系塗佈組合物可利用刷塗、噴霧、浸漬、旋轉塗佈、棒式塗佈、凹版印刷等公知之所有塗裝方法,於基材之表面塗佈上述矽烷系塗佈組合物,藉此形成薄膜。乾燥可藉由室溫乾燥及/或加熱進行。具體而言,於20℃~250℃、較佳為20℃~150℃下進行10秒~24小時、較佳為30秒~10小時左右。
所獲得之薄膜並無特別限定,較佳為超過10nm且為5μm以下。
作為處理本發明之組合物之基材,只要可進行處理則並無特別限定,具體而言可列舉:鐵、不鏽鋼、銅、鋁及其他金屬、陶瓷、水泥、玻璃、聚碳酸酯樹脂、丙烯酸系樹脂、聚醯亞胺樹脂、聚酯樹脂、環氧樹脂、液晶聚合物樹脂、聚醚碸等樹脂基材等,該等基材亦可利用其他塗佈材料塗佈表面。該等之中,尤佳為樹脂基材或金屬基
材。
於由本發明之組合物所形成之薄膜上可進而積層撥液性層等樹脂層或含有金屬系界面活性劑之水解縮合物之層等有機單分子膜等。由於本發明之組合物中包含金屬化合物粒子,故而薄膜表面變得凹凸,與積層膜之密接性提高。
本發明之組合物例如可用於:對熱交換器、熱交換器用散熱片、建築材料、屋頂、窗玻璃、防風玻璃、各種鏡子、塑膠透鏡、透鏡、輪胎、橡膠、磁記錄媒體、半導體材料表面等之處理;對降雪地帶之天線、鐵塔、電氣通信設施、道路交通標識、信號機等之處理;船舶與水之摩擦阻力之減小化;車輛、飛機之機體之污漬附著之防止;各種金屬材料表面或電池材料等之電極之腐蝕之防止;對漁網表面之處理;對密封劑、耐火防水密封劑、車蠟等之添加等。又,處理過本發明之組合物之樹脂基材由於其表面硬質化,故而亦可用作汽車之擋風玻璃等先前使用玻璃之用途之代替品。
以下記載實施例,但本發明之技術範圍並不限定於該等實施例。
[評價方法]
(密接性)
根據JIS K-5400(1999年)中所記載之柵格膠帶剝離試驗法,將基材上之薄膜交叉切割為1mm×1mm之柵格狀,使用透明黏著帶進行剝離試驗。
(表面粗度)
使用掃描式白色干涉儀(VertScan(註冊商標)2.0,Ryoka Systems(股)製造)進行表面粗度之測定。
Sa表示測定區域中之Z(x,y)之絕對值之算術平均。Sq表示測定
區域中之Z(x,y)之均方根。
(撥液性)
使用接觸角測定器(Drop Master 700,協和界面科學公司製造)對薄膜之靜態接觸角進行測定。
[實施例1]~[實施例5]
(矽烷系塗佈組合物之製備)
將2.0g之3-縮水甘油氧基-正丙基三甲氧基矽烷(GPTMS)、0.5g之二伸乙基三胺、0.5g之苯甲酸、70g之水及28g之異丙醇加以混合,於室溫下攪拌2小時,獲得組合物(A-1)。向組合物(A-1)10.0g中分別混合異丙醇分散氧化矽溶膠(固形物成分濃度30%,粒徑70~100nm,商品名:IPA-ST-ZL,日產化學工業公司製造)0.25g、0.5g、1.0g、2.0g、3.0g,獲得矽烷系塗佈組合物(B-1)~(B-5)。
(薄膜之形成)
其次,於PET膜(COSMOSHINE(註冊商標)A4300,東洋紡織公司製造),藉由棒式塗佈將所製備之矽烷系塗佈組合物(B-1)~(B-5)成膜,利用烘箱以100℃加熱、乾燥10分鐘,獲得矽烷系塗佈組合物處理膜(C-1)~(C-5)。將進行(C-1)~(C-5)之密接性、表面粗度之測定所得之結果示於表1。
(有機單分子膜之積層)
對(C-1)~(C-5)之薄膜面進行10分鐘UV臭氧處理(約12000mJ/cm2),進而浸漬於自組裝(self-assembled)單分子膜(SAM)形成溶液(SAMLAY(註冊商標),日本曹達公司製造)中10分鐘,其後,將其表面於烴系清潔劑(NS CLEAN(註冊商標)100,JX Nippon Oil & Energy Corporation製造)中進行超音波清洗,於60℃之烘箱中進行乾燥,獲得SAM處理膜(C-6)~(C-10)。將進行(C-6)~(C-10)之靜態接觸角測定所得之結果示於表1。
根據以上結果,可於PET膜上形成微細之凹凸面,進而可於上述薄膜上積層單分子膜。根據由較高之表面粗度產生之分形效應(fractal effect),觀測到較高之撥液性。
[實施例6]~[實施例10]
對Ni基材浸漬塗佈矽烷系塗佈組合物(B-1)~(B-5),獲得塗佈組合物處理Ni基材(D-1)~(D-5),進行柵格膠帶剝離試驗。將其結果示於表2。
根據以上結果,已知不限於樹脂、金屬,可形成對各種基材之密接性優異之塗膜。
Claims (12)
- 一種矽烷系塗佈組合物,其含有:(A)含環氧基之三烷氧基矽烷之水解縮合物、(B)聚胺類、(C)25℃下之pKa為2.0~6.0之範圍之有機酸、或具有全氟烷基或全氟伸烷基之碳數2~5之醇類、及(D)金屬化合物粒子。
- 如請求項1之矽烷系塗佈組合物,其中含環氧基之三烷氧基矽烷之水解縮合物之藉由動態光散射法所測定之z-平均粒徑為5~50nm之範圍。
- 如請求項1之矽烷系塗佈組合物,其中聚胺類係選自由伸烷基聚胺、聚伸烷基聚胺、聚(伸苯基伸烷基)聚胺、及伸環烷基烷基聚胺所組成之群中之至少1種聚胺。
- 如請求項1之矽烷系塗佈組合物,其相對於含環氧基之三烷氧基矽烷及/或其水解縮合物中之環氧基1莫耳,於1/(聚胺類1分子中之全部氮原子上之全部氫原子數)莫耳以上且1/(聚胺類1分子中之全部氮原子上之全部氫原子數)之10倍莫耳以下之範圍內使用聚胺類。
- 如請求項1之矽烷系塗佈組合物,其相對於聚胺類1莫耳,於0.3~1.2莫耳之範圍內使用pKa為2.0~6.0之範圍之有機酸。
- 如請求項1之矽烷系塗佈組合物,其中具有全氟烷基或全氟伸烷基之碳數2~5之醇類為組合物整體之30質量%以上。
- 如請求項1之矽烷系塗佈組合物,其進而包含除具有全氟烷基或全氟伸烷基之碳數2~5之醇類以外之碳數1~5之醇及水。
- 如請求項1之矽烷系塗佈組合物,其中金屬化合物粒子之金屬元 素係選自由矽、鋁、鈦、及鐵所組成之群中之至少1種。
- 如請求項1之矽烷系塗佈組合物,其中金屬化合物粒子為氧化矽。
- 如請求項1之矽烷系塗佈組合物,其中金屬化合物粒子之平均一次粒徑為1~500nm。
- 如請求項1之矽烷系塗佈組合物,其中金屬化合物粒子包含於組合物之全部固形物成分之20~83質量%之範圍。
- 一種薄膜,其係將如請求項1至11中任一項之矽烷系塗佈組合物塗佈於基材上並進行室溫乾燥及/或加熱而獲得。
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| JPS5525469A (en) * | 1978-08-14 | 1980-02-23 | Japan Atom Energy Res Inst | Thermosetting resin composition |
| JPH07242798A (ja) * | 1994-03-08 | 1995-09-19 | Sekisui Chem Co Ltd | 型内被覆成形用被覆組成物 |
| JP3539486B2 (ja) * | 2000-06-27 | 2004-07-07 | 荒川化学工業株式会社 | コーティング組成物 |
| JP2002129102A (ja) * | 2000-10-27 | 2002-05-09 | Nikon-Essilor Co Ltd | コーティング用組成物及びプラスチック成形物 |
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