TW201439137A - 含有含氟高分支聚合物及矽氧烷寡聚物之硬化性組成物 - Google Patents
含有含氟高分支聚合物及矽氧烷寡聚物之硬化性組成物 Download PDFInfo
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- TW201439137A TW201439137A TW102140092A TW102140092A TW201439137A TW 201439137 A TW201439137 A TW 201439137A TW 102140092 A TW102140092 A TW 102140092A TW 102140092 A TW102140092 A TW 102140092A TW 201439137 A TW201439137 A TW 201439137A
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- 239000000203 mixture Substances 0.000 title claims abstract description 96
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 37
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 239000011737 fluorine Substances 0.000 title claims abstract description 31
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 title claims abstract description 16
- 229920000642 polymer Polymers 0.000 title claims description 49
- 239000000178 monomer Substances 0.000 claims abstract description 57
- 150000001875 compounds Chemical class 0.000 claims abstract description 38
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 28
- 239000010702 perfluoropolyether Substances 0.000 claims abstract description 17
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 8
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 7
- -1 siloxane alkane Chemical class 0.000 claims description 130
- 238000000576 coating method Methods 0.000 claims description 40
- 239000002253 acid Substances 0.000 claims description 37
- 239000011248 coating agent Substances 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 28
- 239000011521 glass Substances 0.000 claims description 27
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 19
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 18
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 18
- PXRMLPZQBFWPCV-UHFFFAOYSA-N dioxasilirane Chemical compound O1O[SiH2]1 PXRMLPZQBFWPCV-UHFFFAOYSA-N 0.000 claims description 14
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 14
- 238000006116 polymerization reaction Methods 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 13
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 230000007062 hydrolysis Effects 0.000 claims description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims description 12
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000000962 organic group Chemical group 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 239000003054 catalyst Substances 0.000 claims description 6
- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 230000003301 hydrolyzing effect Effects 0.000 claims description 6
- 238000009833 condensation Methods 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 239000007869 azo polymerization initiator Substances 0.000 claims description 4
- 230000005494 condensation Effects 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims description 3
- FGVVTMRZYROCTH-UHFFFAOYSA-N pyridine-2-thiol N-oxide Chemical compound [O-][N+]1=CC=CC=C1S FGVVTMRZYROCTH-UHFFFAOYSA-N 0.000 claims 1
- 229960002026 pyrithione Drugs 0.000 claims 1
- 230000000379 polymerizing effect Effects 0.000 abstract description 2
- 229920000587 hyperbranched polymer Polymers 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 78
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 43
- 150000003254 radicals Chemical class 0.000 description 33
- 238000000034 method Methods 0.000 description 32
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 27
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 24
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 23
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 22
- 239000010410 layer Substances 0.000 description 19
- 239000003921 oil Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 15
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 14
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 14
- 229910000420 cerium oxide Inorganic materials 0.000 description 14
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 14
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 14
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 13
- 239000002904 solvent Substances 0.000 description 13
- 229920002554 vinyl polymer Polymers 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 230000003373 anti-fouling effect Effects 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000003960 organic solvent Substances 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- 230000004048 modification Effects 0.000 description 10
- 238000012986 modification Methods 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000011859 microparticle Substances 0.000 description 9
- 235000006408 oxalic acid Nutrition 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 229940052303 ethers for general anesthesia Drugs 0.000 description 8
- 239000003607 modifier Substances 0.000 description 8
- SFLRURCEBYIKSS-UHFFFAOYSA-N n-butyl-2-[[1-(butylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound CCCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCCC SFLRURCEBYIKSS-UHFFFAOYSA-N 0.000 description 8
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 150000002576 ketones Chemical class 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 6
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 5
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 5
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 5
- 239000005642 Oleic acid Substances 0.000 description 5
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 5
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 5
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 5
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 5
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 4
- WJMXTYZCTXTFJM-UHFFFAOYSA-N 1,1,1,2-tetraethoxydecane Chemical compound C(C)OC(C(OCC)(OCC)OCC)CCCCCCCC WJMXTYZCTXTFJM-UHFFFAOYSA-N 0.000 description 4
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- GYSCBCSGKXNZRH-UHFFFAOYSA-N 1-benzothiophene-2-carboxamide Chemical compound C1=CC=C2SC(C(=O)N)=CC2=C1 GYSCBCSGKXNZRH-UHFFFAOYSA-N 0.000 description 4
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- YZXBAPSDXZZRGB-DOFZRALJSA-N arachidonic acid Chemical compound CCCCC\C=C/C\C=C/C\C=C/C\C=C/CCCC(O)=O YZXBAPSDXZZRGB-DOFZRALJSA-N 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 125000006267 biphenyl group Chemical group 0.000 description 4
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 150000004714 phosphonium salts Chemical class 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- IRYBKFGKUNZRSI-UHFFFAOYSA-N Pyrene-1,2-oxide Chemical compound C1=C2C3OC3C=C(C=C3)C2=C2C3=CC=CC2=C1 IRYBKFGKUNZRSI-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 235000011054 acetic acid Nutrition 0.000 description 3
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 3
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 3
- 238000004587 chromatography analysis Methods 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 3
- 235000011167 hydrochloric acid Nutrition 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N p-toluenesulfonic acid Substances CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229920001567 vinyl ester resin Polymers 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 2
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- BXGYYDRIMBPOMN-UHFFFAOYSA-N 2-(hydroxymethoxy)ethoxymethanol Chemical compound OCOCCOCO BXGYYDRIMBPOMN-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- LAIUFBWHERIJIH-UHFFFAOYSA-N 3MC7 Natural products CCCCC(C)CC LAIUFBWHERIJIH-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910018286 SbF 6 Inorganic materials 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- RABVYVVNRHVXPJ-UHFFFAOYSA-N [3-(hydroxymethyl)-1-adamantyl]methanol Chemical compound C1C(C2)CC3CC1(CO)CC2(CO)C3 RABVYVVNRHVXPJ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 229960004050 aminobenzoic acid Drugs 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 230000002086 anti-sebum Effects 0.000 description 2
- 229940114079 arachidonic acid Drugs 0.000 description 2
- 235000021342 arachidonic acid Nutrition 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- 229940092714 benzenesulfonic acid Drugs 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 229960004365 benzoic acid Drugs 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical compound C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- 229960005215 dichloroacetic acid Drugs 0.000 description 2
- 238000007607 die coating method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 229940074391 gallic acid Drugs 0.000 description 2
- 235000004515 gallic acid Nutrition 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 125000003827 glycol group Chemical group 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 235000021313 oleic acid Nutrition 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- 239000000123 paper Substances 0.000 description 2
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000012673 precipitation polymerization Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- QMYDVDBERNLWKB-UHFFFAOYSA-N propane-1,2-diol;hydrate Chemical compound O.CC(O)CO QMYDVDBERNLWKB-UHFFFAOYSA-N 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 229960004889 salicylic acid Drugs 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000010186 staining Methods 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 210000002268 wool Anatomy 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical compound C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- REPVLJRCJUVQFA-UHFFFAOYSA-N (-)-isopinocampheol Natural products C1C(O)C(C)C2C(C)(C)C1C2 REPVLJRCJUVQFA-UHFFFAOYSA-N 0.000 description 1
- OTGGHZUEAWMAAK-UHFFFAOYSA-N (1,1-dimethoxy-1-phenyldecan-2-yl)benzene Chemical compound C1(=CC=CC=C1)C(C(OC)(OC)C1=CC=CC=C1)CCCCCCCC OTGGHZUEAWMAAK-UHFFFAOYSA-N 0.000 description 1
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 1
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- SUOOZFRDMVSBLL-KSBRXOFISA-L (z)-but-2-enedioate;tetramethylazanium Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.[O-]C(=O)\C=C/C([O-])=O SUOOZFRDMVSBLL-KSBRXOFISA-L 0.000 description 1
- AGGJWJFEEKIYOF-UHFFFAOYSA-N 1,1,1-triethoxydecane Chemical compound CCCCCCCCCC(OCC)(OCC)OCC AGGJWJFEEKIYOF-UHFFFAOYSA-N 0.000 description 1
- KYUCWJRUVWJDOF-UHFFFAOYSA-N 1,1,1-trifluoro-4-(triethoxymethyl)dodecane Chemical compound FC(CCC(C(OCC)(OCC)OCC)CCCCCCCC)(F)F KYUCWJRUVWJDOF-UHFFFAOYSA-N 0.000 description 1
- DQGPWNBGAYGUPK-UHFFFAOYSA-N 1,1,1-trifluoro-4-(trimethoxymethyl)dodecane Chemical compound FC(CCC(C(OC)(OC)OC)CCCCCCCC)(F)F DQGPWNBGAYGUPK-UHFFFAOYSA-N 0.000 description 1
- ANBBCZAIOXDZPV-UHFFFAOYSA-N 1,1,1-trimethoxy-2-methyldecane Chemical compound CC(C(OC)(OC)OC)CCCCCCCC ANBBCZAIOXDZPV-UHFFFAOYSA-N 0.000 description 1
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 1
- RHUYHJGZWVXEHW-UHFFFAOYSA-N 1,1-Dimethyhydrazine Chemical compound CN(C)N RHUYHJGZWVXEHW-UHFFFAOYSA-N 0.000 description 1
- GDDPLWAEEWIQKZ-UHFFFAOYSA-N 1,1-diethoxydecane Chemical compound CCCCCCCCCC(OCC)OCC GDDPLWAEEWIQKZ-UHFFFAOYSA-N 0.000 description 1
- WVAFEFUPWRPQSY-UHFFFAOYSA-N 1,2,3-tris(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1C=C WVAFEFUPWRPQSY-UHFFFAOYSA-N 0.000 description 1
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 description 1
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- ZJQIXGGEADDPQB-UHFFFAOYSA-N 1,2-bis(ethenyl)-3,4-dimethylbenzene Chemical group CC1=CC=C(C=C)C(C=C)=C1C ZJQIXGGEADDPQB-UHFFFAOYSA-N 0.000 description 1
- DFEVZXQWFHVLGO-UHFFFAOYSA-N 1,2-bis(ethenyl)-9h-carbazole Chemical compound C1=CC=C2NC3=C(C=C)C(C=C)=CC=C3C2=C1 DFEVZXQWFHVLGO-UHFFFAOYSA-N 0.000 description 1
- SKXCTCCZTWNYMD-UHFFFAOYSA-N 1,2-bis(ethenyl)anthracene Chemical compound C1=CC=CC2=CC3=C(C=C)C(C=C)=CC=C3C=C21 SKXCTCCZTWNYMD-UHFFFAOYSA-N 0.000 description 1
- QLLUAUADIMPKIH-UHFFFAOYSA-N 1,2-bis(ethenyl)naphthalene Chemical compound C1=CC=CC2=C(C=C)C(C=C)=CC=C21 QLLUAUADIMPKIH-UHFFFAOYSA-N 0.000 description 1
- QTYUSOHYEPOHLV-FNORWQNLSA-N 1,3-Octadiene Chemical compound CCCC\C=C\C=C QTYUSOHYEPOHLV-FNORWQNLSA-N 0.000 description 1
- UCBVELLBUAKUNE-UHFFFAOYSA-N 1,3-bis(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)NC(=O)N(CC=C)C1=O UCBVELLBUAKUNE-UHFFFAOYSA-N 0.000 description 1
- YLVACWCCJCZITJ-UHFFFAOYSA-N 1,4-dioxane-2,3-diol Chemical compound OC1OCCOC1O YLVACWCCJCZITJ-UHFFFAOYSA-N 0.000 description 1
- BRBMYNGGGPTKKL-UHFFFAOYSA-N 1,9-decanediol Chemical compound CC(O)CCCCCCCCO BRBMYNGGGPTKKL-UHFFFAOYSA-N 0.000 description 1
- MLKIVXXYTZKNMI-UHFFFAOYSA-N 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one Chemical compound CCCCCCCCCCCCC1=CC=C(C(=O)C(C)(C)O)C=C1 MLKIVXXYTZKNMI-UHFFFAOYSA-N 0.000 description 1
- SAMJGBVVQUEMGC-UHFFFAOYSA-N 1-ethenoxy-2-(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOC=C SAMJGBVVQUEMGC-UHFFFAOYSA-N 0.000 description 1
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 1
- IISHLYLZTYTIJJ-UHFFFAOYSA-N 1-hydroxyethyl 2-methylprop-2-enoate Chemical compound CC(O)OC(=O)C(C)=C IISHLYLZTYTIJJ-UHFFFAOYSA-N 0.000 description 1
- QPAWHGVDCJWYRJ-UHFFFAOYSA-N 1-hydroxypyrrolidine-2,5-dione;trifluoromethanesulfonic acid Chemical compound ON1C(=O)CCC1=O.OS(=O)(=O)C(F)(F)F QPAWHGVDCJWYRJ-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- JNSHJDXBICHABV-UHFFFAOYSA-N 11-oxatetracyclo[7.5.0.02,7.010,12]tetradeca-1(9),2,4,6,13-pentaene Chemical compound C12C(C=CC=3C4=CC=CC=C4CC13)O2 JNSHJDXBICHABV-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- IJQXJNFUDNCYAX-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;ethane-1,2-diol Chemical compound OCCO.OCC(CO)(CO)CO IJQXJNFUDNCYAX-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- GCZWJRLXIPVNLU-UHFFFAOYSA-N 2,2-dimethoxy-3-methylundecane Chemical compound CC(C(OC)(OC)C)CCCCCCCC GCZWJRLXIPVNLU-UHFFFAOYSA-N 0.000 description 1
- FCMUPMSEVHVOSE-UHFFFAOYSA-N 2,3-bis(ethenyl)pyridine Chemical compound C=CC1=CC=CN=C1C=C FCMUPMSEVHVOSE-UHFFFAOYSA-N 0.000 description 1
- WBKHIFPQJKGEOJ-UHFFFAOYSA-N 2,4,6-trimethylbenzohydrazide Chemical compound CC1=CC(C)=C(C(=O)NN)C(C)=C1 WBKHIFPQJKGEOJ-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 1
- QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 1
- KUCWUAFNGCMZDB-UHFFFAOYSA-N 2-amino-3-nitrophenol Chemical compound NC1=C(O)C=CC=C1[N+]([O-])=O KUCWUAFNGCMZDB-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 1
- WHNIMRYJAUUVQJ-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylethanone;4-methylbenzenesulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1.C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 WHNIMRYJAUUVQJ-UHFFFAOYSA-N 0.000 description 1
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- ZEERWUUHFUFJJT-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1.CC(C)(O)C(=O)C1=CC=CC=C1 ZEERWUUHFUFJJT-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- RCEJCSULJQNRQQ-UHFFFAOYSA-N 2-methylbutanenitrile Chemical compound CCC(C)C#N RCEJCSULJQNRQQ-UHFFFAOYSA-N 0.000 description 1
- SDQROPCSKIYYAV-UHFFFAOYSA-N 2-methyloctane-1,8-diol Chemical compound OCC(C)CCCCCCO SDQROPCSKIYYAV-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- YWLREMSERPHDRA-UHFFFAOYSA-N 3,3,3-trifluoropropyl 4-cyano-4-[[2-cyano-5-oxo-5-(3,3,3-trifluoropropoxy)pentan-2-yl]diazenyl]pentanoate Chemical compound FC(F)(F)CCOC(=O)CCC(C)(C#N)N=NC(C)(CCC(=O)OCCC(F)(F)F)C#N YWLREMSERPHDRA-UHFFFAOYSA-N 0.000 description 1
- KRYHOVWBDSAPMX-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,6-nonafluorohexyl 4-cyano-4-[[2-cyano-5-(3,3,4,4,5,5,6,6,6-nonafluorohexoxy)-5-oxopentan-2-yl]diazenyl]pentanoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)CCC(C)(C#N)N=NC(C)(CCC(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C#N KRYHOVWBDSAPMX-UHFFFAOYSA-N 0.000 description 1
- ZFQIHXWUJJFUJG-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl 4-cyano-4-[[2-cyano-5-oxo-5-(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctoxy)pentan-2-yl]diazenyl]pentanoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)CCC(C)(C#N)N=NC(C)(CCC(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C#N ZFQIHXWUJJFUJG-UHFFFAOYSA-N 0.000 description 1
- VPKQPPJQTZJZDB-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)C=C VPKQPPJQTZJZDB-UHFFFAOYSA-N 0.000 description 1
- JJLUWYULIBMDGF-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-hexadecafluorododeca-1,11-diene Chemical compound C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C JJLUWYULIBMDGF-UHFFFAOYSA-N 0.000 description 1
- PDFSXHZXNZCKNF-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8-dodecafluorodeca-1,9-diene Chemical compound C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C PDFSXHZXNZCKNF-UHFFFAOYSA-N 0.000 description 1
- XRSMAKAYKVRPSA-UHFFFAOYSA-N 3,3,4,4,5,5,6,6-octafluoroocta-1,7-diene Chemical compound C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C XRSMAKAYKVRPSA-UHFFFAOYSA-N 0.000 description 1
- LBIHNTAFJVHBLJ-UHFFFAOYSA-N 3-(triethoxymethyl)undec-1-ene Chemical compound C(=C)C(C(OCC)(OCC)OCC)CCCCCCCC LBIHNTAFJVHBLJ-UHFFFAOYSA-N 0.000 description 1
- IIEWMRPKJCXTAD-UHFFFAOYSA-N 3-(trimethoxymethyl)undecane Chemical compound C(C)C(C(OC)(OC)OC)CCCCCCCC IIEWMRPKJCXTAD-UHFFFAOYSA-N 0.000 description 1
- BXAAQNFGSQKPDZ-UHFFFAOYSA-N 3-[1,2,2-tris(prop-2-enoxy)ethoxy]prop-1-ene Chemical compound C=CCOC(OCC=C)C(OCC=C)OCC=C BXAAQNFGSQKPDZ-UHFFFAOYSA-N 0.000 description 1
- PAKGDPSCXSUALC-UHFFFAOYSA-N 3-methylbuta-1,2-diene Chemical compound CC(C)=C=C PAKGDPSCXSUALC-UHFFFAOYSA-N 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- VSZARHUCMHICLD-UHFFFAOYSA-N 4,6-bis(prop-2-enoxy)-1h-1,3,5-triazin-2-one Chemical compound C=CCOC=1N=C(OCC=C)NC(=O)N=1 VSZARHUCMHICLD-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- GNPSQUCXOBDIDY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane Chemical compound C(CCCCCCC)C(C(OC)(OC)OC)CCC GNPSQUCXOBDIDY-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- 229920006310 Asahi-Kasei Polymers 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- IJVPOOTXXAADBT-UHFFFAOYSA-N C(=C)C(C(C1=CC=CC=C1)(C)C=C)CCCCCCCC Chemical compound C(=C)C(C(C1=CC=CC=C1)(C)C=C)CCCCCCCC IJVPOOTXXAADBT-UHFFFAOYSA-N 0.000 description 1
- JZHKIUBMQMDQRG-UHFFFAOYSA-N C(=C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=C)C(C(OC)(OC)OC)CCCCCCCC JZHKIUBMQMDQRG-UHFFFAOYSA-N 0.000 description 1
- VSRNKQMSXIOSIB-UHFFFAOYSA-N C(=C)C1=CC=C(C=C1)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=C)C1=CC=C(C=C1)C(C(OC)(OC)OC)CCCCCCCC VSRNKQMSXIOSIB-UHFFFAOYSA-N 0.000 description 1
- XEXSKPULSFMYGA-UHFFFAOYSA-N C(=C)C1=CC=C(C=C1)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(=C)C1=CC=C(C=C1)C(C(OCC)(OCC)OCC)CCCCCCCC XEXSKPULSFMYGA-UHFFFAOYSA-N 0.000 description 1
- ARDQJHKJFFICAY-UHFFFAOYSA-N C(=CC)OC(=C(CC)O)OCCC Chemical compound C(=CC)OC(=C(CC)O)OCCC ARDQJHKJFFICAY-UHFFFAOYSA-N 0.000 description 1
- SCKUTXQSYXQJEK-UHFFFAOYSA-N C(C)(C)C1=CC=C(C=C1)[Ru]C1=CC=C(C=C1)C Chemical compound C(C)(C)C1=CC=C(C=C1)[Ru]C1=CC=C(C=C1)C SCKUTXQSYXQJEK-UHFFFAOYSA-N 0.000 description 1
- QNGUFVBAHBNZGW-UHFFFAOYSA-N C(C)C(C(OC)(OC)CC)CCCCCCCC Chemical compound C(C)C(C(OC)(OC)CC)CCCCCCCC QNGUFVBAHBNZGW-UHFFFAOYSA-N 0.000 description 1
- XEPAKJGFUVCJOW-UHFFFAOYSA-N C(C)C(C(OCC)(OCC)CC)CCCCCCCC Chemical compound C(C)C(C(OCC)(OCC)CC)CCCCCCCC XEPAKJGFUVCJOW-UHFFFAOYSA-N 0.000 description 1
- SSWJDLJDZKGIKA-UHFFFAOYSA-N C(C)OC(C(C=C)(C=C)OCC)CCCCCCCC Chemical compound C(C)OC(C(C=C)(C=C)OCC)CCCCCCCC SSWJDLJDZKGIKA-UHFFFAOYSA-N 0.000 description 1
- XSKXVSQAFWNWFL-UHFFFAOYSA-N C(C=C)(=O)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C=C)(=O)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC XSKXVSQAFWNWFL-UHFFFAOYSA-N 0.000 description 1
- OFTCDOQQZMYUJW-UHFFFAOYSA-N C(CC)C(C(OC)(OC)CCC)CCCCCCCC Chemical compound C(CC)C(C(OC)(OC)CCC)CCCCCCCC OFTCDOQQZMYUJW-UHFFFAOYSA-N 0.000 description 1
- ZYICQNMJAGPXKS-UHFFFAOYSA-N C(CC)C(C(OCC)(OCC)CCC)CCCCCCCC Chemical compound C(CC)C(C(OCC)(OCC)CCC)CCCCCCCC ZYICQNMJAGPXKS-UHFFFAOYSA-N 0.000 description 1
- XRNDMACZMJPCRX-UHFFFAOYSA-N C(CC)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(CC)C(C(OCC)(OCC)OCC)CCCCCCCC XRNDMACZMJPCRX-UHFFFAOYSA-N 0.000 description 1
- IQUCDIIVDQWENU-UHFFFAOYSA-N C(CCC)C(C(OC)(OC)CCCC)CCCCCCCC Chemical compound C(CCC)C(C(OC)(OC)CCCC)CCCCCCCC IQUCDIIVDQWENU-UHFFFAOYSA-N 0.000 description 1
- GHTQBJZRHNNLIS-UHFFFAOYSA-N C(CCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCC)C(C(OC)(OC)OC)CCCCCCCC GHTQBJZRHNNLIS-UHFFFAOYSA-N 0.000 description 1
- UVPBWKQOKOQWOL-UHFFFAOYSA-N C(CCC)C(C(OCC)(OCC)CCCC)CCCCCCCC Chemical compound C(CCC)C(C(OCC)(OCC)CCCC)CCCCCCCC UVPBWKQOKOQWOL-UHFFFAOYSA-N 0.000 description 1
- FPYZFGNMCPBDBU-UHFFFAOYSA-N C(CCC)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(CCC)C(C(OCC)(OCC)OCC)CCCCCCCC FPYZFGNMCPBDBU-UHFFFAOYSA-N 0.000 description 1
- NCGOVFJQJNGCCU-UHFFFAOYSA-N C(CCCC)C(C(OC)(OC)CCCCC)CCCCCCCC Chemical compound C(CCCC)C(C(OC)(OC)CCCCC)CCCCCCCC NCGOVFJQJNGCCU-UHFFFAOYSA-N 0.000 description 1
- BPDIDNOQBXCJJL-UHFFFAOYSA-N C(CCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCC)C(C(OC)(OC)OC)CCCCCCCC BPDIDNOQBXCJJL-UHFFFAOYSA-N 0.000 description 1
- QYGXFZURPXSVLU-UHFFFAOYSA-N C(CCCC)C(C(OCC)(OCC)CCCCC)CCCCCCCC Chemical compound C(CCCC)C(C(OCC)(OCC)CCCCC)CCCCCCCC QYGXFZURPXSVLU-UHFFFAOYSA-N 0.000 description 1
- RDAJSLMSQSSYML-UHFFFAOYSA-N C(CCCC)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(CCCC)C(C(OCC)(OCC)OCC)CCCCCCCC RDAJSLMSQSSYML-UHFFFAOYSA-N 0.000 description 1
- DKCXIJLUMAOOHX-UHFFFAOYSA-N C(CCCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCC)C(C(OC)(OC)OC)CCCCCCCC DKCXIJLUMAOOHX-UHFFFAOYSA-N 0.000 description 1
- UQZGFMPCWPJARQ-UHFFFAOYSA-N C(CCCCCCCCC)OCCC.C=CC Chemical compound C(CCCCCCCCC)OCCC.C=CC UQZGFMPCWPJARQ-UHFFFAOYSA-N 0.000 description 1
- OIZPSYBLQMNUEY-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(C=C)(C=C)C1=CC=CC=C1)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(C=C)(C=C)C1=CC=CC=C1)CCCCCCCC OIZPSYBLQMNUEY-UHFFFAOYSA-N 0.000 description 1
- STJBWPMXSJHEFV-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OCC)(OCC)C1=CC=CC=C1)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OCC)(OCC)C1=CC=CC=C1)CCCCCCCC STJBWPMXSJHEFV-UHFFFAOYSA-N 0.000 description 1
- WMAZOIVUIWQRKU-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OCC)(OCC)OCC)CCCCCCCC WMAZOIVUIWQRKU-UHFFFAOYSA-N 0.000 description 1
- RQRPZBURPKGITR-UHFFFAOYSA-N CC(=CSCCSCCSC=C(C)C)C Chemical compound CC(=CSCCSCCSC=C(C)C)C RQRPZBURPKGITR-UHFFFAOYSA-N 0.000 description 1
- VWJZVRNVCQROAD-UHFFFAOYSA-N CC(C(C=C)(C=C)C)CCCCCCCC Chemical compound CC(C(C=C)(C=C)C)CCCCCCCC VWJZVRNVCQROAD-UHFFFAOYSA-N 0.000 description 1
- LNEJJQMNHUGXDW-UHFFFAOYSA-N CC(C(OCC)(OCC)C)CCCCCCCC Chemical compound CC(C(OCC)(OCC)C)CCCCCCCC LNEJJQMNHUGXDW-UHFFFAOYSA-N 0.000 description 1
- PZKBIVOXIFYDRI-UHFFFAOYSA-N CC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound CC(C(OCC)(OCC)OCC)CCCCCCCC PZKBIVOXIFYDRI-UHFFFAOYSA-N 0.000 description 1
- UIVXCPGVSFNWLY-UHFFFAOYSA-N CCC=COCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound CCC=COCCCC(C(OC)(OC)C)CCCCCCCC UIVXCPGVSFNWLY-UHFFFAOYSA-N 0.000 description 1
- LOIIKSZNKURMTJ-UHFFFAOYSA-N CCCCCCCCC(CCCOCCC(CCCCCCC)C(=O)C(=C)C)C(OCC)(OCC)OCC Chemical compound CCCCCCCCC(CCCOCCC(CCCCCCC)C(=O)C(=C)C)C(OCC)(OCC)OCC LOIIKSZNKURMTJ-UHFFFAOYSA-N 0.000 description 1
- 235000002566 Capsicum Nutrition 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 241000283070 Equus zebra Species 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- WWFIVRBBFUFLBJ-UHFFFAOYSA-N N(=NC(C)(OC=C)C1=CC=CC=C1)C(C)(C1=CC=CC=C1)OC=C Chemical compound N(=NC(C)(OC=C)C1=CC=CC=C1)C(C)(C1=CC=CC=C1)OC=C WWFIVRBBFUFLBJ-UHFFFAOYSA-N 0.000 description 1
- VIUGGNBHTHHDCR-UHFFFAOYSA-N N(=NC(CNC(CO)(CO)CO)(C)C)C(CNC(CO)(CO)CO)(C)C Chemical compound N(=NC(CNC(CO)(CO)CO)(C)C)C(CNC(CO)(CO)CO)(C)C VIUGGNBHTHHDCR-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- JDRDVOVHTJSPOM-UHFFFAOYSA-N NCSN=NC(C#N)(C)C Chemical compound NCSN=NC(C#N)(C)C JDRDVOVHTJSPOM-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000006002 Pepper Substances 0.000 description 1
- 241000233805 Phoenix Species 0.000 description 1
- 235000016761 Piper aduncum Nutrition 0.000 description 1
- 235000017804 Piper guineense Nutrition 0.000 description 1
- 244000203593 Piper nigrum Species 0.000 description 1
- 235000008184 Piper nigrum Nutrition 0.000 description 1
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- KVMWQFJWSVOSDJ-UHFFFAOYSA-N S-[4-(4-but-2-enoylsulfanylphenyl)sulfanylphenyl] but-2-enethioate Chemical compound CC=CC(=O)SC1=CC=C(SC2=CC=C(SC(=O)C=CC)C=C2)C=C1 KVMWQFJWSVOSDJ-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 102220557642 Sperm acrosome-associated protein 5_D10N_mutation Human genes 0.000 description 1
- LXEKPEMOWBOYRF-UHFFFAOYSA-N [2-[(1-azaniumyl-1-imino-2-methylpropan-2-yl)diazenyl]-2-methylpropanimidoyl]azanium;dichloride Chemical compound Cl.Cl.NC(=N)C(C)(C)N=NC(C)(C)C(N)=N LXEKPEMOWBOYRF-UHFFFAOYSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- MOLCWHCSXCKHAP-UHFFFAOYSA-N adamantane-1,3-diol Chemical compound C1C(C2)CC3CC1(O)CC2(O)C3 MOLCWHCSXCKHAP-UHFFFAOYSA-N 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- VJGNLOIQCWLBJR-UHFFFAOYSA-M benzyl(tributyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CC1=CC=CC=C1 VJGNLOIQCWLBJR-UHFFFAOYSA-M 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- USFRYJRPHFMVBZ-UHFFFAOYSA-M benzyl(triphenyl)phosphanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 USFRYJRPHFMVBZ-UHFFFAOYSA-M 0.000 description 1
- 238000003339 best practice Methods 0.000 description 1
- WPKWPKDNOPEODE-UHFFFAOYSA-N bis(2,4,4-trimethylpentan-2-yl)diazene Chemical compound CC(C)(C)CC(C)(C)N=NC(C)(C)CC(C)(C)C WPKWPKDNOPEODE-UHFFFAOYSA-N 0.000 description 1
- LTCZRDFBRQJZFN-UHFFFAOYSA-N bis(4-tert-butylphenyl)phosphanium trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C(C)(C)(C)C1=CC=C(C=C1)[PH2+]C1=CC=C(C=C1)C(C)(C)C LTCZRDFBRQJZFN-UHFFFAOYSA-N 0.000 description 1
- ORZGJQJXBLFGRP-WAYWQWQTSA-N bis(ethenyl) (z)-but-2-enedioate Chemical compound C=COC(=O)\C=C/C(=O)OC=C ORZGJQJXBLFGRP-WAYWQWQTSA-N 0.000 description 1
- PVESJTCZIRKKLC-UHFFFAOYSA-N bis(ethenyl) 2-methylidenebutanedioate Chemical compound C=COC(=O)CC(=C)C(=O)OC=C PVESJTCZIRKKLC-UHFFFAOYSA-N 0.000 description 1
- PIPBVABVQJZSAB-UHFFFAOYSA-N bis(ethenyl) benzene-1,2-dicarboxylate Chemical compound C=COC(=O)C1=CC=CC=C1C(=O)OC=C PIPBVABVQJZSAB-UHFFFAOYSA-N 0.000 description 1
- FWICIOVOJVNAIJ-UHFFFAOYSA-N bis(ethenyl) benzene-1,3-dicarboxylate Chemical compound C=COC(=O)C1=CC=CC(C(=O)OC=C)=C1 FWICIOVOJVNAIJ-UHFFFAOYSA-N 0.000 description 1
- JZQAAQZDDMEFGZ-UHFFFAOYSA-N bis(ethenyl) hexanedioate Chemical compound C=COC(=O)CCCCC(=O)OC=C JZQAAQZDDMEFGZ-UHFFFAOYSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 description 1
- FPODCVUTIPDRTE-UHFFFAOYSA-N bis(prop-2-enyl) hexanedioate Chemical compound C=CCOC(=O)CCCCC(=O)OCC=C FPODCVUTIPDRTE-UHFFFAOYSA-N 0.000 description 1
- 150000001621 bismuth Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229940116229 borneol Drugs 0.000 description 1
- CKDOCTFBFTVPSN-UHFFFAOYSA-N borneol Natural products C1CC2(C)C(C)CC1C2(C)C CKDOCTFBFTVPSN-UHFFFAOYSA-N 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IKWKJIWDLVYZIY-UHFFFAOYSA-M butyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCC)C1=CC=CC=C1 IKWKJIWDLVYZIY-UHFFFAOYSA-M 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- TUGLVWDSALSXCF-UHFFFAOYSA-N decane;methanol Chemical compound OC.OC.CCCCCCCCCC TUGLVWDSALSXCF-UHFFFAOYSA-N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000012674 dispersion polymerization Methods 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- DTGKSKDOIYIVQL-UHFFFAOYSA-N dl-isoborneol Natural products C1CC2(C)C(O)CC1C2(C)C DTGKSKDOIYIVQL-UHFFFAOYSA-N 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- VIBDJEWPNNCFQO-UHFFFAOYSA-N ethane-1,1,2-triol Chemical compound OCC(O)O VIBDJEWPNNCFQO-UHFFFAOYSA-N 0.000 description 1
- ZSBOTBREDQGUMM-UHFFFAOYSA-N ethane-1,2-diol;2-ethyl-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCCO.CCC(CO)(CO)CO ZSBOTBREDQGUMM-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- JHYNXXDQQHTCHJ-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 JHYNXXDQQHTCHJ-UHFFFAOYSA-M 0.000 description 1
- SLAFUPJSGFVWPP-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;iodide Chemical compound [I-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 SLAFUPJSGFVWPP-UHFFFAOYSA-M 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 235000019197 fats Nutrition 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- MDQRDWAGHRLBPA-UHFFFAOYSA-N fluoroamine Chemical class FN MDQRDWAGHRLBPA-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- PBZROIMXDZTJDF-UHFFFAOYSA-N hepta-1,6-dien-4-one Chemical compound C=CCC(=O)CC=C PBZROIMXDZTJDF-UHFFFAOYSA-N 0.000 description 1
- AHAREKHAZNPPMI-UHFFFAOYSA-N hexa-1,3-diene Chemical compound CCC=CC=C AHAREKHAZNPPMI-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000000266 injurious effect Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 235000013847 iso-butane Nutrition 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- GEJHIUFJTCYNSC-UHFFFAOYSA-N methyl 1-[(1-methoxycarbonylcyclohexyl)diazenyl]cyclohexane-1-carboxylate Chemical compound C1CCCCC1(C(=O)OC)N=NC1(C(=O)OC)CCCCC1 GEJHIUFJTCYNSC-UHFFFAOYSA-N 0.000 description 1
- MOVBJUGHBJJKOW-UHFFFAOYSA-N methyl 2-amino-5-methoxybenzoate Chemical compound COC(=O)C1=CC(OC)=CC=C1N MOVBJUGHBJJKOW-UHFFFAOYSA-N 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- WMRNGPYHLQSTDL-UHFFFAOYSA-N n-cyclohexyl-2-[[1-(cyclohexylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound C1CCCCC1NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC1CCCCC1 WMRNGPYHLQSTDL-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- DBSDMAPJGHBWAL-UHFFFAOYSA-N penta-1,4-dien-3-ylbenzene Chemical compound C=CC(C=C)C1=CC=CC=C1 DBSDMAPJGHBWAL-UHFFFAOYSA-N 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- MILWSGRFEGYSGM-UHFFFAOYSA-N propane-1,2-diol;propane-1,2,3-triol Chemical compound CC(O)CO.OCC(O)CO MILWSGRFEGYSGM-UHFFFAOYSA-N 0.000 description 1
- KGMXPXPXPAAUMD-UHFFFAOYSA-N propane;dihydrochloride Chemical compound Cl.Cl.CCC KGMXPXPXPAAUMD-UHFFFAOYSA-N 0.000 description 1
- XNWSMNKRGNKRKP-UHFFFAOYSA-M propanoate;tetramethylazanium Chemical compound CCC([O-])=O.C[N+](C)(C)C XNWSMNKRGNKRKP-UHFFFAOYSA-M 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 102220262397 rs772216758 Human genes 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 210000002374 sebum Anatomy 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- MRYQZMHVZZSQRT-UHFFFAOYSA-M tetramethylazanium;acetate Chemical compound CC([O-])=O.C[N+](C)(C)C MRYQZMHVZZSQRT-UHFFFAOYSA-M 0.000 description 1
- KJFVITRRNTVAPC-UHFFFAOYSA-L tetramethylazanium;sulfate Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.[O-]S([O-])(=O)=O KJFVITRRNTVAPC-UHFFFAOYSA-L 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- BGQMOFGZRJUORO-UHFFFAOYSA-M tetrapropylammonium bromide Chemical compound [Br-].CCC[N+](CCC)(CCC)CCC BGQMOFGZRJUORO-UHFFFAOYSA-M 0.000 description 1
- FBEVECUEMUUFKM-UHFFFAOYSA-M tetrapropylazanium;chloride Chemical compound [Cl-].CCC[N+](CCC)(CCC)CCC FBEVECUEMUUFKM-UHFFFAOYSA-M 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical class CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- IPILPUZVTYHGIL-UHFFFAOYSA-M tributyl(methyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](C)(CCCC)CCCC IPILPUZVTYHGIL-UHFFFAOYSA-M 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- MQAYPFVXSPHGJM-UHFFFAOYSA-M trimethyl(phenyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)C1=CC=CC=C1 MQAYPFVXSPHGJM-UHFFFAOYSA-M 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- QVTVDJWJGGEOGX-UHFFFAOYSA-N urea;cyanide Chemical compound N#[C-].NC(N)=O QVTVDJWJGGEOGX-UHFFFAOYSA-N 0.000 description 1
- 229960000834 vinyl ether Drugs 0.000 description 1
- 238000004260 weight control Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical class O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
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Abstract
〔課題〕本發明係提供防污性及對玻璃的密著性優異且可形成具有優異的耐擦傷性的硬塗的硬化性組成物。〔解決手段〕含有(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物100質量份、(b)含氟高分支聚合物0.001~1質量份、(c)由全氟聚醚化合物所構成的表面改質劑0.01~40質量份、及(d)因活性能量線而產生自由基的聚合起始劑0.1~25質量份,且前述(b)含氟高分支聚合物為使分子內具有2個以上的自由基聚合性雙鍵的單體A與分子內具有氟烷基及至少1個自由基聚合性雙鍵的單體B,相對該單體A之莫耳數,在5~200mol%量之聚合起始劑C存在下聚合而得到的含氟高分支聚合物之硬化性組成物、由該組成物所得到的硬化膜以及具有使用該組成物得到的硬塗層之層合體。
Description
本發明係關於含有含氟高分支聚合物及矽氧烷寡聚物的硬化性組成物、以及由該硬化性組成物所得到的硬化膜、以及具備由該硬化性組成物所得到的硬塗層的層合體、以及該矽氧烷寡聚物及其製造方法。
聚合物(高分子)材料近年在多種領域日漸被利用。伴隨此,因應各自的領域,作為基質之聚合物的性狀以及其表面或界面之特性變得重要。例如提案藉由使用表面能量低的氟系化合物作為表面改質劑,期待撥水撥油性、防污性、非黏著性、剝離性、脫膜性、平滑性、耐磨耗性、防反射特性、耐藥品性等之有關表面‧界面控制的特性提升。
在LCD(液晶顯示器)、PDP(電漿顯示器)、觸控面板等之各種顯示器表面,使用具備用以防止損傷的硬塗層之各種塑膠薄膜。但,硬塗層易附著指紋痕
跡或髒污,且附著的指紋痕跡或髒污無法簡單除去。因此,有顯示器的影像的視認性顯著受損、顯示器的美觀受損的問題。尤其觸控面板表面為直接被人以手接觸者,極希望指紋痕跡難以附著且在附著的場合容易除去。
提案此般具有硬塗層的薄膜中,以使硬塗層之表面平坦化(平坦、亦即使平滑)且賦予防污性之目的,將矽化合物或氟化合物添加於活性能量線硬化性組成物所構成的硬塗層形成用塗佈液後,形成硬塗層之方法。此等的化合物除防指紋附著性、指紋拭除性等之耐指紋性外,具有平滑性或提升對油性筆等的防污性之機能。
揭示例如藉由搭配含有氟的高分支聚合物與全氟聚醚化合物或矽酮化合物,耐指紋性等之表面特性優異、溶劑拭除耐性優異的硬塗層形成用組成物(專利文獻1)。
另一方面,智慧型手機為代表的具有靜電容量方式的觸控面板機能之顯示器表面,由機能性及設計性面主要採用玻璃。在玻璃表面除防損傷性外,賦予耐指紋性及防污性。但,上述活性能量線硬化性組成物,硬化收縮大外,與玻璃表面不形成化學鍵結,故不具有對玻璃表面之密著性。因此,採取藉由將形成有具有耐指紋性及防污性的硬塗層之薄膜貼附於玻璃表面,而賦予彼等之機能的方法。
又,作為提升由活性能量線硬化性組成物所構成的硬塗層對玻璃表面之密著性之方法,揭示使含羥基多官能丙烯酸酯與烷氧基矽烷化合物之反應物用作為多官
能丙烯酸酯對玻璃的密著性成分之方法(專利文獻2)。
〔專利文獻1〕國際公開第2012/074071號文獻
〔專利文獻2〕日本特開2004-285119號公報
前述專利文獻1揭示的由硬塗層形成用組成物所得到的硬化膜,雖然耐指紋性等之表面特性優,但缺乏對玻璃基板的密著性,要求用作為對智慧型手機等之顯示器表面之硬塗層上進一步的改良。
又如前述,在專利文獻2,揭示使含羥基多官能丙烯酸酯與烷氧基矽烷化合物之反應物作為密著性成分,與熱酸產生劑一起調配於含有多官能丙烯酸酯的硬化性樹脂組成物中之方法,但因多官能丙烯酸酯本身對玻璃不具有密著性,得到的硬塗膜對玻璃無法得到充分密著性為其課題。又,前述反應物雖可藉由酸觸媒被水解而與玻璃表面之矽烷醇基縮合,但該水解物缺乏對多官能丙烯酸酯的分散性,在玻璃基板上進行硬化時有白濁、損及透明性之虞。更且UV硬化的多官能丙烯酸酯之3維硬化膜,在一般的硬塗之膜厚1μm以上發揮優異的耐擦傷性,但在例如膜厚為100nm以下之薄膜,失去體性質、不表現耐擦
傷性。因此,使UV硬化的硬塗以薄膜形成時的耐擦傷性為課題。
本發明者們為了達成上述目的,努力研究之結果,發現由作為硬化性成分之具有自由基聚合性雙鍵的烷氧基矽烷部分水解縮合物、作為耐指紋及防污成分的含氟高分支聚合物、及全氟聚醚所構成的表面改質劑、以及光聚合起始劑所構成的硬化性組成物為耐指紋性、防污性及對玻璃的密著性優異,且可形成具有優異的耐擦傷性的防污性硬塗。
1、一種硬化性組成物,其特徵係含有(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物100質量份、(b)含氟高分支聚合物0.001~1質量份、(c)由全氟聚醚化合物所構成的表面改質劑0.01~40質量份、及(d)因活性能量線而產生自由基的聚合起始劑0.1~25質量份,且前述(b)含氟高分支聚合物為使分子內具有2個以上的自由基聚合性雙鍵的單體A與分子內具有氟烷基及至少1個自由基聚合性雙鍵的單體B在相對該單體A之莫耳數,5~200mol%量之聚合起始劑C存在下聚合而得到的含氟高分支聚合物。
2、如請求項1記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為使下述式〔3〕所表示之烷氧基矽烷D水解縮合而得到的矽氧烷寡聚物,[化1]R3 aSi(OR4)4-a [3](式中,R3為具有自由基聚合性雙鍵的1價有機基,R4為甲基或乙基,a為1或2)。
3、如請求項2記載之硬化性組成物,其中,前述R3為具有乙烯基或(甲基)丙烯基的1價有機基。
4、如請求項3記載之硬化性組成物,其中,前述烷氧基矽烷D為下述式〔4〕所表示之化合物,
(式中,R4與前述式〔3〕中之定義相同,R5為氫原子或甲基,L1為碳原子數1乃至6的伸烷基)。
5、如請求項2乃至請求項4中任一項記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為使前述烷氧基矽烷D與下述式〔5〕所表示之烷氧基矽烷E水解縮合而得到的矽氧烷寡聚物,
[化3]R6 bSi(OR7)4-b [5](式中,R6為可以氟原子取代的碳原子數1乃至6的烷基或苯基,R7為甲基或乙基,b為0乃至2之整數)。
6、如請求項5記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為含前述烷氧基矽烷D單位至少10mol%的矽氧烷寡聚物。
7、如請求項1記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為在全構造單位中至少含有10mol%下述式〔6〕所表示之構造單位的矽氧烷寡聚物,
(式中,L1為碳原子數1乃至6的伸烷基,R4為甲基或乙基,R5為氫原子或甲基)。
8、如請求項1乃至請求項7中任一項記載之硬化性組成物,其中,前述單體A為具有乙烯基或(甲基)丙烯基的任一者或兩者的化合物。
9、如請求項8記載之硬化性組成物,其中,前述單體A為二乙烯基化合物或二(甲基)丙烯酸酯化合物。
10、如請求項1乃至請求項9中任一項記載之硬化性
組成物,其中,前述單體B為至少具有1個乙烯基或(甲基)丙烯基的任一者的化合物。
11、如請求項10記載之硬化性組成物,其中,前述單體B為下述式〔1〕所表示之化合物,
(式中,R1為氫原子或甲基,R2為可以羥基取代的碳原子數2乃至12之氟烷基)。
12、如請求項11記載之硬化性組成物,其中,前述單體B為下述式〔2〕所表示之化合物,
(式中,R1與前述式〔1〕中之定義相同,X為氫原子或氟原子,m為1或2,n為0乃至5之整數)。
13、如請求項1乃至請求項12中任一項記載之硬化性組成物,其中,前述聚合起始劑C為偶氮系聚合起始劑。
14、如請求項1乃至請求項13中任一項記載之硬化性組成物,其中,前述(b)含氟高分支聚合物為使用相對前述單體A為5~300mol%量的前述單體B所得到的高分支聚合物。
15、如請求項1乃至請求項14中任一項記載之硬化性組成物,其中,前述(d)因活性能量線而產生自由基的聚合起始劑為烷基苯乙酮化合物。
16、如請求項1乃至請求項15中任一項記載之硬化性組成物,其中,進而作為水解觸媒,相對前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物的烷氧基矽烷基含有0.0001~10mol%量之(e)酸或酸產生劑。
17、一種硬化膜,其特徵係由請求項1乃至請求項16中任一項記載之硬化性組成物所得到。
18、一種層合體,其係在基材的至少一部份的面具備硬塗層的層合體,且該硬塗層係藉由使請求項1乃至請求項16中任一項記載之硬化性組成物塗佈於基材上並形成塗膜之步驟、對塗膜照射活性能量線並進行硬化的步驟來形成。
19、如請求項18記載之層合體,其係再藉由燒成步驟形成。
20、如請求項18或請求項19記載之層合體,其中,基材為玻璃。
21、如請求項18乃至請求項20中任一項記載之層合體,其中,前述硬塗層具有1nm~50μm之膜厚。
本發明之硬化性組成物,作為其一成分含有特定的含氟高分支聚合物,且該聚合物積極地導入分支構
造,故與線狀高分子比較,分子間纏結少,顯示微粒子的舉動。因此,基質之樹脂中,該氟高分支聚合物易移動至表面,易賦予樹脂表面油性筆耐性等之防污性或撥水‧撥油性。
又在本發明之硬化性組成物,因含有由全氟聚醚化合物所構成的表面改質劑,由該組成物所得到的硬化膜中,可賦予油性筆耐性等之防污性或撥水‧撥油性。
尤其本發明之硬化性組成物含有具有自由基聚合性雙鍵的矽氧烷寡聚物,構成該矽氧烷寡聚物之烷氧基矽烷部分水解縮合物的烷氧基,因酸之水解而轉換為對基板等之玻璃表面的羥基為活性的矽烷醇基。因此,由本發明之硬化性組成物所得到的硬化膜或塗佈層中,變得可與玻璃表面形成化學鍵結,故容易賦予對玻璃的密著性。
進而本發明之塗佈用硬化性組成物,藉由選擇作為聚合起始劑之因活性能量線而產生自由基的聚合起始劑、尤其特定之聚合起始劑,不需在氮環境下之電子線照射的特定的硬化條件,即使在一般硬化條件,亦即,在氮環境下或空氣環境下之紫外線照射亦可形成有上述表面活性的硬化膜。
〔圖1〕圖1為合成例1所得到的F-HBP的13C NMR光譜圖。
本發明之硬化性組成物含有(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物、(b)含氟高分支聚合物、(c)由全氟聚醚化合物所構成的表面改質劑、及(d)因活性能量線而產生自由基的聚合起始劑而構成。
以下先將各(a)乃至(d)成分進行詳述。
上述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物(以下亦僅稱(a)矽氧烷寡聚物),較佳為含有下述式〔3〕所表示之烷氧基矽烷D作為必須之烷氧基矽烷單位,且使其水解縮合而得到的矽氧烷寡聚物為佳。
[化7]R3 aSi(OR4)4-a [3]
式中,R3為具有自由基聚合性雙鍵的1價有機基,R4為甲基或乙基,a為1或2。
又作為上述R3之具有自由基聚合性雙鍵的1價有機基,以具有乙烯基或(甲基)丙烯基的1價有機基較佳。又在本發明,(甲基)丙烯基係指丙烯基與甲基丙
烯基兩者。
上述式〔3〕所表示之烷氧基矽烷D中,以下述式〔4〕所表示之化合物為較佳。
式中,R4與前述式〔3〕中之定義相同,R5為氫原子或甲基,L1為碳原子數1乃至6的伸烷基。
上述L1表示的碳原子數1乃至6的伸烷基方面,可舉例如亞甲基、伸乙基、三亞甲基、甲基伸乙基、四亞甲基、1-甲基三亞甲基、五亞甲基、2,2-二甲基三亞甲基、六亞甲基等。
此等之中,以三亞甲基較佳。
此般烷氧基矽烷D的具體例,可舉例如乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基(甲基)二甲氧基矽烷、3-(甲基)丙烯醯氧基丙基(甲基)二乙氧基矽烷、4-乙烯基苯基三甲氧基矽烷、4-乙烯基苯基三乙氧基矽烷等。
此等之中,以3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷較佳。
又(a)矽氧烷寡聚物以使前述烷氧基矽烷D與下述式〔5〕所表示之烷氧基矽烷E水解縮合而得到的
矽氧烷寡聚物較佳。
[化9]R6 bSi(OR7)4-b [5]
式中,R6為可以氟原子取代的碳原子數1乃至6的烷基或苯基,R7為甲基或乙基,b為0乃至2之整數。
上述R6表示的可以氟原子取代的碳原子數1乃至6的烷基方面,可舉例如甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、異戊基、新戊基、n-己基、環己基等。
此般烷氧基矽烷E的具體例,可舉例如四甲氧基矽烷、四乙氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、3,3,3-三氟丙基三甲氧基矽烷、3,3,3-三氟丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、戊基三甲氧基矽烷、戊基三乙氧基矽烷、己基三甲氧基矽烷、己基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、二丙基二甲氧基矽烷、二丙基二乙氧基矽烷、二丁基二甲氧基矽烷、二丁基二乙氧基矽烷、二戊基二甲氧基矽烷、二戊基二乙氧基矽烷、二己基二甲氧基矽烷、二己基二甲氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷等。
此等之中,以四甲氧基矽烷、四乙氧基矽烷較佳。
(a)矽氧烷寡聚物以全烷氧基矽烷單位中至少含有10mol%前述烷氧基矽烷D單位之矽氧烷寡聚物較佳。
尤其(a)矽氧烷寡聚物,以全構造單位中至少含有10mol%下述式〔6〕所表示之構造單位之矽氧烷寡聚物較佳。
式中,R4、R5及L1與前述式〔4〕中之定義相同。
得到上述(a)矽氧烷寡聚物之方法不特別限制。
例如使含有前述烷氧基矽烷D及依期望的烷氧基矽烷E之烷氧基矽烷在有機溶劑中縮合而得。使烷氧基矽烷聚縮合之方法,可舉例如使烷氧基矽烷在醇或二醇等之溶劑中進行水解‧縮合的方法。此時,水解‧縮合反應可為部分水解及完全水解皆可。完全水解的場合,理論上加入烷氧基矽烷中之全烷氧基的0.5倍莫耳的水即可,但通常以加入比0.5倍莫耳過量量的水較佳。本發明中,上述反應使用的水之量可依期望而適宜選擇,但通常以烷氧基矽烷中之全烷氧基的0.5~2.5倍莫耳者較佳。
又,通常以促進水解‧縮合反應為目的,可使用甲
酸、乙酸、丙酸、丁烷酸、戊烷酸、己烷酸、2-乙基己烷酸、戊烷酸、辛烷酸、壬烷酸、癸烷酸、硬酯酸、油酸、亞油酸、次亞麻油酸、花生烯四酸、草酸、丙二酸、甲基丙二酸、琥珀酸、酒石酸、馬來酸、富馬酸、己二酸、癸二酸、檸檬酸、單氯乙酸、二氯乙酸、三氯乙酸、三氟乙酸、安息香酸、p-胺基安息香酸、水楊酸、没食子酸、苯二甲酸、蜜臘酸、苯磺酸、p-甲苯磺酸等之有機酸;鹽酸、硝酸、硫酸、氟酸、磷酸等之無機酸及其金屬鹽;氨、甲基胺、乙基胺、乙醇胺、三乙基胺等之鹼等之觸媒。此外藉由將溶解有烷氧基矽烷的溶液加熱,更且促進水解‧縮合反應亦為一般的。此時,加熱溫度及加熱時間可依期望適宜選擇。例如,在50℃進行24小時加熱‧攪拌之方法、在迴流下進行1小時加熱‧攪拌之方法等。
又,另外的方法,例如將烷氧基矽烷、溶劑及草酸之混合物加熱後進行聚縮合的方法。具體為預先於醇中加入草酸後作成草酸之醇溶液後,在加熱該溶液狀態將烷氧基矽烷混合之方法。此時,使用的草酸之量,相對烷氧基矽烷具有的全烷氧基之1莫耳以0.2~2莫耳較佳。該方法中之加熱可在液溫50~180℃進行。較佳為不使產生液之蒸發、揮散等,在迴流下進行數十分鐘~十數小時加熱之方法。
本發明之硬化性組成物使用的(a)矽氧烷寡聚物的膠體浸透層析法的聚苯乙烯換算所測定之重量平均分子量(Mw)為100~10,000、較佳為500~5,000。
上述(b)含氟高分支聚合物,為使分子內具有2個以上的自由基聚合性雙鍵的單體A與分子內具有氟烷基及至少1個自由基聚合性雙鍵的單體B,相對該單體A之莫耳數,在5~200mol%量之聚合起始劑C存在下,使聚合而得到的聚合物。
又(b)含氟高分支聚合物在不損及本發明之效果,亦可使不屬於前述單體A及前述單體B的其他單體共聚合。
又(b)含氟高分支聚合物為所謂起始劑斷片混入(IFIRP)型含氟高分支聚合物,於其末端具有聚合使用的聚合起始劑C的斷片。
本發明中,分子內具有2個以上的自由基聚合性雙鍵的單體A以具有乙烯基或(甲基)丙烯基的任一者或兩者為佳,尤以二乙烯基化合物或二(甲基)丙烯酸酯化合物較佳。又在本發明,(甲基)丙烯酸酯化合物係指丙烯酸酯化合物與甲基丙烯酸酯化合物的兩者。例如(甲基)丙烯酸係指丙烯酸與甲基丙烯酸。
此般單體A,可舉例如以下之(A1)乃至(A7)所示的有機化合物為例示。
(A1)乙烯基系烴類:
(A1-1)脂肪族乙烯基系烴類;異戊二烯、丁二烯、3-甲基-1,2-丁二烯、2,3-二甲基-1,3-丁二烯、1,2-聚丁二烯、戊二烯、己二烯、辛二烯等
(A1-2)酯環式乙烯基系烴類;環戊二烯、環己二烯、環辛二烯、原冰片二烯等
(A1-3)芳香族乙烯基系烴類;二乙烯基苯、二乙烯基甲苯、二乙烯基二甲苯、三乙烯基苯、二乙烯基聯苯、二乙烯基萘、二乙烯基芴、二乙烯基咔唑、二乙烯基吡啶等
(A2)乙烯基酯類、烯丙基酯類、乙烯基醚類、烯丙基醚類、乙烯基酮類:
(A2-1)乙烯基酯類;己二酸二乙烯酯、馬來酸二乙烯酯、苯二甲酸二乙烯酯、異苯二甲酸二乙烯酯、衣康酸二乙烯酯、乙烯基(甲基)丙烯酸酯等
(A2-2)烯丙基酯類;馬來酸二烯丙酯、苯二甲酸二烯丙酯、異苯二甲酸二烯丙酯、己二酸二烯丙酯、烯丙基(甲基)丙烯酸酯等
(A2-3)乙烯基醚類;二乙烯基醚、二乙二醇二乙烯基醚、三乙二醇二乙烯基醚等
(A2-4)烯丙基醚類;二烯丙基醚、二烯丙基氧基乙烷、三烯丙基氧基乙烷、四烯丙基氧基乙烷、四烯丙基氧基丙烷、四烯丙基氧基丁烷、四甲基烯丙基氧基乙烷等
(A2-5)乙烯基酮類;二乙烯基酮、二烯丙基酮等
(A3)(甲基)丙烯酸酯類:
乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、新戊基二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二三羥甲基丙烷四(甲基)丙烯酸酯、丙三醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、烷氧基鈦三(甲基)丙烯酸酯、1,6-己烷二醇二(甲基)丙烯酸酯、2-甲基-1,8-辛烷二醇二(甲基)丙烯酸酯、1,9-壬烷二醇二(甲基)丙烯酸酯、1,10-癸烷二醇二(甲基)丙烯酸酯、三環〔5.2.1.02,6〕癸烷二甲醇二(甲基)丙烯酸酯、二噁烷二醇二(甲基)丙烯酸酯、2-羥基-1-丙烯醯氧基-3-甲基丙烯醯基氧基丙烷、2-羥基-1,3-二(甲基)丙烯醯氧基丙烷、9,9-雙〔4-(2-(甲基)丙烯醯氧基乙氧基)苯基〕芴、十一烯氧化乙二醇二(甲基)丙烯酸酯、雙〔4-(甲基)丙烯醯基硫代苯基〕硫化物、雙〔2-(甲基)丙烯醯基硫代乙基〕硫化物、1,3-金剛烷二醇二(甲基)丙烯酸酯、1,3-金剛烷二甲醇二(甲基)丙烯酸酯、芳香族胺基甲酸酯二(甲基)丙烯酸酯、脂肪族胺基甲酸酯二(甲基)丙烯酸酯等
(A4)具有聚烷二醇鏈的乙烯基系化合物:聚乙二醇(分子量300)二(甲基)丙烯酸酯、聚丙二醇(分子量500)二(甲基)丙烯酸酯等
(A5)含氮乙烯基系化合物:二烯丙基胺、二烯丙基異氰脲酸酯、二烯丙基氰脲酸酯、亞甲基雙(甲基)丙烯醯胺、雙馬來醯亞胺等
(A6)含矽乙烯基系化合物:二甲基二乙烯基矽烷、二乙烯基(甲基)苯基矽烷、二苯基二乙烯基矽烷、1,3-二乙烯基-1,1,3,3-四甲基二矽氮烷、1,3-二乙烯基-1,1,3,3-四苯基二矽氮烷、二乙氧基二乙烯基矽烷等
(A7)含氟乙烯基系化合物:1,4-二乙烯基全氟丁烷、1,6-二乙烯基全氟己烷、1,8-二乙烯基全氟辛烷等
此等中較佳者為上述(A1-3)群的芳香族乙烯基系烴類、(A2)群的乙烯基酯類、烯丙基酯類、乙烯基醚類、烯丙基醚類及乙烯基酮類、(A3)群之(甲基)丙烯酸酯類、(A4)群之具有聚烷二醇鏈的乙烯基系化合物、以及(A5)群的含氮乙烯基系化合物。尤佳者為屬於(A1-3)群的二乙烯基苯、屬於(A2)群的苯二甲酸二烯丙酯、屬於(A3)群的乙二醇二(甲基)丙烯酸酯、1,3-金剛烷二甲醇二(甲基)丙烯酸酯、三環〔5.2.1.02,6〕癸烷二甲醇二(甲基)丙烯酸酯、2-羥基-1-丙烯醯氧基-3-甲基丙烯醯基氧基丙烷、脂肪族胺基甲酸酯二(甲基)丙烯酸酯以及屬於(A5)群的亞甲基雙(甲基)丙烯醯胺。此等之中尤以乙二醇二(甲基)丙烯酸酯、脂肪族胺基甲酸酯二(甲基)丙烯酸酯較佳。
本發明中,分子內具有氟烷基及至少1個自由基聚合
性雙鍵的單體B,較佳為具有至少1個乙烯基或(甲基)丙烯基的任一者為佳,尤以前述式〔1〕所表示之化合物為佳、更佳為前述式〔2〕所表示之化合物。
此般單體B,可舉例如2,2,2-三氟乙基(甲基)丙烯酸酯、2,2,3,3,3-五氟丙基(甲基)丙烯酸酯、2-(全氟丁基)乙基(甲基)丙烯酸酯、2-(全氟己基)乙基(甲基)丙烯酸酯、2-(全氟辛基)乙基(甲基)丙烯酸酯、2-(全氟癸基)乙基(甲基)丙烯酸酯、2-(全氟-3-甲基丁基)乙基(甲基)丙烯酸酯、2-(全氟-5-甲基己基)乙基(甲基)丙烯酸酯、2-(全氟-7-甲基辛基)乙基(甲基)丙烯酸酯、2,2,3,3-四氟丙基(甲基)丙烯酸酯、1H,1H,5H-八氟戊基(甲基)丙烯酸酯、1H,1H,7H-十二氟庚基(甲基)丙烯酸酯、1H,1H,9H-十六氟壬基(甲基)丙烯酸酯、1H-1-(三氟甲基)三氟乙基(甲基)丙烯酸酯、1H,1H,3H-六氟丁基(甲基)丙烯酸酯、3-全氟丁基-2-羥基丙基(甲基)丙烯酸酯、3-全氟己基-2-羥基丙基(甲基)丙烯酸酯、3-全氟辛基-2-羥基丙基(甲基)丙烯酸酯、3-(全氟-3-甲基丁基)-2-羥基丙基(甲基)丙烯酸酯、3-(全氟-5-甲基己基)-2-羥基丙基(甲基)丙烯酸酯、3-(全氟-7-甲基辛基)-2-羥基丙基(甲基)丙烯酸酯等。
本發明中,單體B的使用量由反應性或表面改質效果觀點,相對前述單體A之使用莫耳數,使用5~300mol%、尤以10~150mol%之量,更佳為20~100mol%
之量使用較佳。
本發明中,不屬於前述單體A及前述單體B的其他單體,分子內具有1個之自由基聚合性雙鍵的單體則無特別限制,以乙烯基化合物或(甲基)丙烯酸酯化合物較佳。
本發明中,其他單體的使用量,相對前述單體A之使用莫耳數,以5~300mol%之量使用較佳。
作為本發明中之聚合起始劑C,較佳可使用偶氮系聚合起始劑。偶氮系聚合起始劑,可舉例如以下之(1)乃至(5)所示化合物。
(1)偶氮腈化合物:2,2’-偶氮雙異丁腈、2,2’-偶氮雙(2-甲基丁腈)、2,2’-偶氮雙(2,4-二甲基戊腈)、1,1’-偶氮雙(1-環己烷腈)、2,2’-偶氮雙(4-甲氧基-2,4-二甲基戊腈)、2-(胺甲醯基偶氮)異丁腈等
(2)偶氮醯胺化合物:2,2’-偶氮雙{2-甲基-N-〔1,1-雙(羥基甲基)-2-羥基乙基〕丙醯胺}、2,2’-偶氮雙{2-甲基-N-〔2-(1-羥基丁基)〕丙醯胺}、2,2’-偶氮雙〔2-甲基-N-(2-羥基乙基)丙醯胺〕、2,2’-偶氮雙〔N-(2-丙烯基)-2-甲基丙醯
胺〕、2,2’-偶氮雙(N-丁基-2-甲基丙醯胺)、2,2’-偶氮雙(N-環己基-2-甲基丙醯胺)等
(3)環狀偶氮脒化合物:2,2’-偶氮雙〔2-(2-咪唑啉-2-基)丙烷〕二氫氯化物、2,2’-偶氮雙〔2-(2-咪唑啉-2-基)丙烷〕二硫酸酯二水合物、2,2’-偶氮雙〔2-〔1-(2-羥基乙基)-2-咪唑啉-2-基〕丙烷〕二氫氯化物、2,2’-偶氮雙〔2-(2-咪唑啉-2-基)丙烷〕、2,2’-偶氮雙(1-亞胺基-1-吡咯嗪-2-甲基丙烷)二氫氯化物等
(4)偶氮脒化合物:2,2’-偶氮雙(2-甲基丙脒)二氫氯化物、2,2’-偶氮雙〔N-(2-羧基乙基)-2-甲基丙脒〕四水合物等
(5)其他:二甲基2,2’-偶氮雙異丁酯、4,4’-偶氮雙(4-氰基戊酸)、2,2’-偶氮雙(2,4,4-三甲基戊烷)、1,1’-偶氮雙(1-乙醯氧基-1-苯基乙烷)、二甲基1,1’-偶氮雙(1-環己烷羧酸酯)、雙(2-(全氟甲基)乙基)4,4’-偶氮雙(4-氰基戊酸酯)、雙(2-(全氟丁基)乙基)4,4’-偶氮雙(4-氰基戊酸酯)、雙(2-(全氟己基)乙基)4,4’-偶氮雙(4-氰基戊酸酯)等
上述偶氮系聚合起始劑中,由得到的高分支聚合物對前述(a)成分及/或前述(c)成分之分散性及表面改質的觀點,以2,2’-偶氮雙(2-甲基丁腈)或二甲基2,2’-偶氮雙異丁酯為佳、尤以二甲基2,2’-偶氮雙異丁酯
較佳。
前述聚合起始劑C,相對前述單體A之莫耳數,以5~200mol%之量使用,較佳為20~200mol%、更佳為20~150mol%之量被使用。
上述(b)含氟高分支聚合物為使前述單體A及單體B相對此等單體A在特定量之聚合起始劑C存在下聚合而得,作為該聚合方法為公知的方法,可舉例如溶液聚合、分散聚合、沈澱聚合、及塊狀聚合等,其中以溶液聚合或沈澱聚合較佳。特別係由分子量控制點,以藉由在有機溶劑中之溶液聚合實施反應較佳。
此時可使用的有機溶劑,可舉例如苯、甲苯、二甲苯、乙基苯、四氫化萘等之芳香族烴類;n-己烷、n-戊烷、礦物油精、環己烷等之脂肪族或脂環式烴類;氯甲烷、溴甲烷、碘甲烷、亞甲基二氯化物、氯仿、四氯化碳、三氯乙烯、全氯乙烯、鄰二氯苯等之鹵化物類;乙酸乙酯、乙酸丁酯、甲氧基丁基乙酸酯、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇單甲基醚乙酸酯(PGMEA)等之酯類或酯醚類;二乙基醚、四氫呋喃(THF)、1,4-二噁烷、甲基溶纖劑、乙基溶纖劑、丁基溶纖劑、丙二醇單甲基醚(PGME)等之醚類;丙酮、甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、二-n-丁基酮、環己酮等之酮類;甲醇、乙醇、n-丙醇、異丙醇、n-
丁醇、異丁醇、tert-丁醇、2-乙基己基醇、苄基醇、乙二醇等之醇類;N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮(NMP)等之醯胺類;二甲基亞碸(DMSO)等之亞碸類等。此等之有機溶劑可一種單獨使用、或混合二種以上的有機溶劑使用。
此等中較佳為芳香族烴類、鹵化物類、酯類、醚類、酮類、醇類、醯胺類等,尤佳者為苯、甲苯、二甲苯、鄰二氯苯、乙酸乙酯、乙酸丁酯、丙二醇單甲基醚乙酸酯(PGMEA)、丙二醇單甲基醚(PGME)、四氫呋喃(THF)、1,4-二噁烷、甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、甲醇、乙醇、n-丙醇、異丙醇、n-丁醇、異丁醇、tert-丁醇、N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮(NMP)等。
使前述聚合反應在有機溶劑的存在下進行的場合,相對前述單體A之1質量份的前述有機溶劑的質量,通常為5~120質量份、較佳為10~110質量份。
聚合反應在常壓、加壓密閉下、或減壓下進行,由裝置及操作簡便性,以常壓下進行較佳。又,在N2等之不活性氣體環境下進行較佳。
聚合溫度在反應混合物的沸點以下則可任意,但由聚合效率與分子量調節觀點,較佳為50~200℃、進而較佳為80~150℃、80~130℃更佳。
反應時間為隨反應溫度、或單體A、單體B及聚合起始劑C的種類及比例、聚合溶劑種類等而變動者,無法一
概規定,但較佳為30~720分鐘、更佳為40~540分鐘。
聚合反應完畢後,使得到的含氟高分支聚合物以任意方法回收,並因應必要進行洗淨等之後處理。由反應溶液將高分子回收的方法,可舉例如再沈澱等之方法。
上述(b)含氟高分支聚合物的膠體浸透層析法之聚苯乙烯換算所測定的重量平均分子量(Mw)為1,000~400,000、較佳為2,000~200,000。
本發明之硬化性組成物中,上述(b)含氟高分支聚合物,相對前述之(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物100質量份,以0.001~1質量份之量、較佳為以0.005~1質量份之量、尤佳為以0.005~0.5質量份之量使用。
前述(c)由全氟聚醚化合物所構成的表面改質劑,由對前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物之分散性觀點,以單末端或兩末端經有機基改性的全氟聚醚化合物為佳、尤以具有(甲基)丙烯醯基的全氟聚醚化合物較佳。
又,由對前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物之分散性觀點及表面改質效果觀點,以併用單末端經有機基改性的全氟聚醚化合物及兩末端經有機基改性的全氟聚醚化合物較佳。
作為本發明所使用的(c)表面改質劑的具體
例,全氟聚醚化合物方面,以含有-(O-CF2)-、-(O-CF2CF2)-、-(O-CF2CF2CF2)-或-(O-CF2C(CF3)F)-的重複構造之化合物為佳、含此般重複構造的化合物,可舉例如以下者。
‧兩末端醇改性:FOMBLIN(登錄商標)ZDOL 2000、同ZDOL 2500、同ZDOL 4000、同TX、同ZTETRAOL 2000GT、FLUOROLINK(登錄商標)D10H、同E10H〔皆為SOLVAY SPECIALTY POLYMERS公司製〕;‧兩末端胡椒基改性:FOMBLIN(登錄商標)AM2001、同AM3001〔皆為SOLVAY SPECIALTY POLYMERS公司製〕;‧兩末端羧酸改性:FLUOROLINK(登錄商標)C10〔SOLVAY SPECIALTY POLYMERS公司製〕;‧兩末端酯改性:FLUOROLINK(登錄商標)L10H〔SOLVAY SPECIALTY POLYMERS公司製〕;‧兩末端(甲基)丙烯基改性:FLUOROLINK(登錄商標)MD500、同MD700、同5101X、同AD1700〔皆為SOLVAY SPECIALTY POLYMERS公司製〕、CN4000〔Sartomer公司製〕;‧單末端(甲基)丙烯基改性:KY-1203〔信越化學工業(股)製〕、Optool DAC-HP〔大金工業(股)製〕。
此等中,較佳為兩末端(甲基)丙烯基改性或單末端(甲基)丙烯基改性為佳、尤佳者為FLUOROLINK(登
錄商標)MD500、FLUOROLINK(登錄商標)MD700、FLUOROLINK(登錄商標)5101X、FLUOROLINK(登錄商標)AD1700、KY-1203。
本發明之硬化性組成物中,上述(c)表面改質劑,相對前述之(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物100質量份,以0.01~40質量份之量、較佳為以0.05~30質量份之量、尤佳為以0.1~20質量份之量使用。
前述(d)因活性能量線而產生自由基的聚合起始劑,可使用例如烷基苯乙酮類、二苯甲酮類、縮酮類、蒽醌類、噻噸酮類、偶氮化合物、過氧化物、2,3-二烷基二酮化合物類、二硫化物化合物類、秋蘭姆化合物類、氟胺化合物等。其中以使用烷基苯乙酮類、尤其α-羥基烷基苯乙酮類較佳。更具體,可舉例如1-羥基環己基=苯基=酮、2-羥基-1-{4-〔4-(2-羥基-2-甲基丙醯基)苄基〕苯基}-2-甲基丙烷-1-酮、2-甲基-1-〔4-(甲基硫代)苯基〕-2-嗎啉基丙烷-1-酮、苄基二甲基酮、1-(4-十二基苯基)-2-羥基-2-甲基丙烷-1-酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、1-〔4-(2-羥基乙氧基)苯基〕-2-羥基-2-甲基-1-丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-1-丁酮、2-二甲基胺基-2-
〔(4-甲基苯基)甲基〕-1-〔4-(4-嗎啉基)苯基〕-1-丁酮、2,4,6-三甲基苯甲醯二苯基氧化膦、雙(2,4,6-三甲基苯甲醯)苯基氧化膦、2-苯甲醯氧基亞胺基-1-〔4-(苯基硫代)苯基〕辛烷-1-酮、1-{1-〔9-乙基-6-(2-甲基苯甲醯)-9H-咔唑-3-基〕亞乙基胺基氧基}乙酮、二苯甲酮等。此等中,1-羥基環己基=苯基=酮、2-羥基-1-{4-〔4-(2-羥基-2-甲基丙醯基)苄基〕苯基}-2-甲基丙烷-1-酮及2-甲基-1-〔4-(甲基硫代)苯基〕-2-嗎啉基丙烷-1-酮因為少量亦可使電離放射線照射之聚合反應開始、並促進而較佳。此等可一種單獨或二種以上組合使用。此等可以市售品取得。
本發明之硬化性組成物中,前述(d)聚合起始劑,相對前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物之100質量份,以0.1~25質量份之量、較佳為以0.1~20質量份之量、尤佳為以1~20質量份之量使用。
進而本發明之硬化性組成物,進而可含有(e)酸或酸產生劑作為水解觸媒。
作為前述水解觸媒的酸,可舉例如有機酸或無機酸。前述有機酸,可舉例如甲酸、乙酸、丙酸、丁烷酸、戊烷酸、己烷酸、2-乙基己烷酸、戊烷酸、辛烷酸、壬烷酸、癸烷酸、硬酯酸、油酸、亞油酸、次亞麻油酸、
花生烯四酸、草酸、丙二酸、甲基丙二酸、琥珀酸、酒石酸、馬來酸、富馬酸、己二酸、癸二酸、檸檬酸、單氯乙酸、二氯乙酸、三氯乙酸、三氟乙酸、安息香酸、p-胺基安息香酸、水楊酸、没食子酸、苯二甲酸、蜜臘酸、苯磺酸、p-甲苯磺酸等。又前述無機酸,可舉例如鹽酸、硝酸、硫酸、氟酸、磷酸等及此等之金屬鹽。
又作為(e)成分使用酸的場合,藉由併用第4級銨鹽或第4級鏻鹽,可更促進來自矽氧烷寡聚物的烷氧基矽烷基彼此之縮合(溶膠-凝膠反應)、及該烷氧基矽烷基與後述基材之結合。
前述第4級銨鹽,可舉例如四甲基氫氧化銨、四甲基銨氟化物、四甲基銨氯化物、四甲基銨溴化物、四甲基銨硝酸鹽、四甲基銨硫酸鹽、四甲基銨乙酸鹽、四甲基銨丙酸鹽、四甲基銨馬來酸鹽、四乙基銨氯化物、四乙基銨溴化物、四丙基銨氯化物、四丙基銨溴化物、四丁基氫氧化銨、四丁基銨氟化物、四丁基銨氯化物、四丁基銨溴化物、苄基三甲基銨氯化物、苯基三甲基銨氯化物、苄基三乙基銨氯化物、甲基三丁基銨氯化物、苄基三丁基銨氯化物、甲基三辛基銨氯化物等,又前述第4級鏻鹽,可舉例如四丁基鏻溴化物、乙基三苯基鏻溴化物、乙基三苯基鏻碘化物、丁基三苯基鏻溴化物、苄基三苯基鏻氯化物等。
又作為(e)成分使用酸產生劑的場合,可使用芳香族鋶鹽、芳香族鎓鹽、芳香族二偶氮鎓鹽、芳香族銨鹽、η5-環戊二烯基-η6-枯烯基-Fe鹽、芳香族鏻鹽等之
鎓鹽(鎓鹽的對陰離子例,可舉例如BF4 -、PF6 -、AsF6 -及SbF6 -等)所構成的熱酸產生劑、或、雙(4-tert-丁基苯基)鎓三氟甲烷磺酸鹽、三苯基鋶三氟甲烷磺酸鹽等之鎓鹽系光酸產生劑;2-苯基-4,6-雙(三氯甲基)-1,3,5-三嗪等之含鹵化合物系光酸產生劑;安息香對甲苯磺酸酯、N-羥基琥珀醯亞胺三氟甲烷磺酸酯等之磺酸系光酸產生劑等。
作為上述熱酸產生劑,芳香族鋶鹽系的熱酸產生劑,可舉例如雙〔4-(二苯基二氫硫基)苯基〕硫化物雙六氟磷酸鹽、雙〔4-(二苯基二氫硫基)苯基〕硫化物雙六氟銻酸鹽、雙〔4-(二苯基二氫硫基)苯基〕硫化物雙四氟硼酸鹽、雙〔4-(二苯基二氫硫基)苯基〕硫化物四(五氟苯基)硼酸鹽、(2-乙氧基-1-甲基-2-側氧基乙基)甲基-2-萘基鋶六氟磷酸鹽、(2-乙氧基-1-甲基-2-側氧基乙基)甲基-2-萘基鋶六氟銻酸鹽、(2-乙氧基-1-甲基-2-側氧基乙基)甲基-2-萘基鋶四氟硼酸鹽、(2-乙氧基-1-甲基-2-側氧基乙基)甲基-2-萘基鋶四(五氟苯基)硼酸鹽、二苯基=4-(苯基硫代)苯基=鋶六氟磷酸鹽、二苯基=4-(苯基硫代)苯基=鋶六氟銻酸鹽、二苯基=4-(苯基硫代)苯基=鋶四氟硼酸鹽、二苯基=4-(苯基硫代)苯基=鋶四(五氟苯基)硼酸鹽、三苯基鋶六氟磷酸鹽、三苯基鋶六氟銻酸鹽、三苯基鋶四氟硼酸鹽、三苯基鋶四(五氟苯基)硼酸鹽、雙〔4-(二(4-(2-羥基乙氧基)苯基)二氫硫基)苯基〕硫化物
雙六氟磷酸鹽、雙〔4-(二(4-(2-羥基乙氧基)苯基)二氫硫基)苯基〕硫化物雙六氟銻酸鹽、雙〔4-(二(4-(2-羥基乙氧基)苯基)二氫硫基)苯基〕硫化物雙四氟硼酸鹽、雙〔4-(二(4-(2-羥基乙氧基)苯基)二氫硫基)苯基〕硫化物四(五氟苯基)硼酸鹽等。
作為上述熱酸產生劑,芳香族鎓鹽系的熱酸產生劑,可舉例如二苯基錪鎓六氟磷酸鹽、二苯基錪鎓六氟銻酸鹽、二苯基錪鎓四氟硼酸鹽、二苯基錪鎓四(五氟苯基)硼酸鹽、雙(十二基苯基)錪鎓六氟磷酸鹽、雙(十二基苯基)錪鎓六氟銻酸鹽、雙(十二基苯基)錪鎓四氟硼酸鹽、雙(十二基苯基)錪鎓四(五氟苯基)硼酸鹽、(4-甲基苯基)(4-異丙基苯基)錪鎓六氟磷酸鹽、(4-甲基苯基)(4-異丙基苯基)錪鎓六氟銻酸鹽、(4-甲基苯基)(4-異丙基苯基)錪鎓四氟硼酸鹽、(4-甲基苯基)(4-異丙基苯基)錪鎓四(五氟苯基)硼酸鹽等。
作為上述熱酸產生劑,芳香族二偶氮鎓鹽系的熱酸產生劑,可舉例如苯基重氮鎓六氟磷酸鹽、苯基重氮鎓六氟銻酸鹽、苯基重氮鎓四氟硼酸鹽、苯基重氮鎓四(五氟苯基)硼酸鹽等。
作為上述熱酸產生劑,芳香族銨鹽系的熱酸產生劑,可舉例如1-苄基-2-氰基吡啶鎓六氟磷酸鹽、1-苄基-2-氰基吡啶鎓六氟銻酸鹽、1-苄基-2-氰基吡啶鎓四氟硼酸鹽、1-苄基-2-氰基吡啶鎓四(五氟苯基)硼酸
鹽、1-(萘基甲基)-2-氰基吡啶鎓六氟磷酸鹽、1-(萘基甲基)-2-氰基吡啶鎓六氟銻酸鹽、1-(萘基甲基)-2-氰基吡啶鎓四氟硼酸鹽、1-(萘基甲基)-2-氰基吡啶鎓四(五氟苯基)硼酸鹽等。
作為上述熱酸產生劑,可舉例如η5-環戊二烯基-η6-枯烯基-Fe鹽系的熱酸產生劑,可舉例如η5-環戊二烯基-η6-枯烯基-Fe(II)六氟磷酸鹽、η5-環戊二烯基-η6-枯烯基-Fe(II)六氟銻酸鹽、η5-環戊二烯基-η6-枯烯基-Fe(II)四氟硼酸鹽、η5-環戊二烯基-η6-枯烯基-Fe(II)四(五氟苯基)硼酸鹽等。
上述熱酸產生劑可使用上述相異2種類以上的熱酸產生劑。此等之中尤以藉由使用陰離子使用SbF6 -、PF6 -的熱酸產生劑,可促進硬化而較佳。
本發明之硬化性組成物中,含上述(e)酸或酸產生劑的場合,相對前述之(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物的烷氧基矽烷基1mol,以0.0001~10mol%之量、較佳為以0.001~5mol%之量、尤佳為以0.01~2mol%之量使用。
又作為(e)使用酸時,在併用第4級銨鹽或第4級鏻鹽的場合,第4級銨鹽或第4級鏻鹽的添加量相對(a)矽氧烷寡聚物100質量份為0.01~5質量份。
進而本發明之硬化性組成物可含有(f)二氧化矽微
粒子。
在此可使用的二氧化矽微粒子,以其平均粒子徑為1~100nm較佳。平均粒子徑超過100nm,則有以調製的硬化性組成物形成的硬化膜之透明性降低之虞。又在此所謂平均粒子徑係指動的光散射法(DLS)之測定所得到者。
前述二氧化矽微粒子以膠體溶液者為佳,該膠體溶液可為使二氧化矽微粒子分散於分散媒者或可為市售品之膠體二氧化矽。本發明中,藉由硬化性組成物中含有二氧化矽微粒子,可賦予形成的硬化膜之表面形狀或其他的機能。
前述二氧化矽微粒子之分散媒,可舉例如水及有機溶劑,尤其本發明中,以使用分散於有機溶劑的有機二氧化矽溶膠較佳。
在此,分散媒使用的有機溶劑,可舉例如甲醇、異丙醇、丁醇等之醇類;乙二醇、丙基溶纖劑、丙二醇單甲基醚(PGME)、丙二醇單甲基醚乙酸酯(PGMEA)等之二醇類;甲基乙基酮(MEK)、甲基異丁基酮(MIBK)等之酮類;甲苯、二甲苯等之芳香族烴類;N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮(NMP)等之醯胺類;乙酸乙酯、乙酸丁酯、γ-丁內酯等之酯類;四氫呋喃(THF)、1,4-二噁烷等之醚類等。此等之中以醇類、二醇類及酮類較佳。此等有機溶劑可單獨或2種以上混合作為分散媒使用。
含有二氧化矽微粒子的場合,本發明之硬化
性組成物中之(f)二氧化矽微粒子,相對前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物100質量份為5~80質量份、較佳為5~70質量份、尤佳為5~60質量份。
進而本發明之硬化性組成物可含有(g)活性能量線硬化性多官能單體。
前述(g)活性能量線硬化性多官能單體,可舉例如含有2個以上胺基甲酸酯丙烯基系、環氧丙烯基系、各種(甲基)丙烯酸酯系等之(甲基)丙烯基的多官能單體等。
較佳為多官能(甲基)丙烯酸酯化合物及多官能胺基甲酸酯(甲基)丙烯酸酯化合物所成之群所選出之至少1個單體。
此般活性能量線硬化性多官能單體的一例,可舉例如己烷二醇二(甲基)丙烯酸酯、新戊基二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯單硬脂酸酯、雙酚A乙二醇加成物(甲基)丙烯酸酯、雙酚F乙二醇加成物(甲基)丙烯酸酯、三環〔5.2.1.02,6〕癸烷二甲醇二(甲基)丙烯酸酯、三羥基乙基異氰脲酸酯二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基丙烷乙二醇加成物三
(甲基)丙烯酸酯、三羥甲基丙烷丙二醇加成物三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三(甲基)丙烯醯氧基乙基磷酸酯、三羥基乙基異氰脲酸酯三(甲基)丙烯酸酯、改性ε-己內酯三(甲基)丙烯酸酯、三羥甲基丙烷乙氧基三(甲基)丙烯酸酯、甘油丙二醇加成物三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇乙二醇加成物四(甲基)丙烯酸酯、二三羥甲基丙烷四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇單羥基五(甲基)丙烯酸酯、胺基甲酸酯(甲基)丙烯酸酯、環氧(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯、不飽和聚酯等。
本發明之硬化性組成物,可進而含有溶劑作成清漆之形態。
此時可使用的溶劑,可為溶解或分散前述(a)乃至(d)成分以及依期望的(e)成分乃至(g)成分者即可,例如可使用甲苯、二甲苯等之芳香族烴類;乙酸乙酯、乙酸丁酯、乙酸異丁酯、γ-丁內酯、丙酮酸甲酯、丙酮酸乙酯、羥基乙酸乙酯、乳酸乙酯、乳酸丁酯、2-羥基-2-甲基丙酸乙酯、2-羥基-3-甲基丁烷酸甲酯、乙氧基乙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇單甲基醚乙酸酯
(PGMEA)、丙二醇單丙基醚乙酸酯等之酯類或酯醚類;乙二醇單甲基醚、乙二醇單乙基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、丙二醇單甲基醚(PGME)等之醚類;甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環戊酮、環己酮等之酮類;甲醇、乙醇、n-丙醇、異丙醇、n-丁醇、異丁醇、sec-丁醇、tert-丁醇、丙二醇等之醇類;N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮(NMP)等之醯胺類等。此等之溶劑可以單獨或2種以上的組合、或與水之混合溶劑使用。
本發明之硬化性組成物中之固形分濃度為例如0.5~80質量%、1~70質量%、或1~60質量%。在此,固形分係指由硬化性組成物的全成分除去溶劑成分者。
進而在本發明之硬化性組成物中,不損及本發明之效果下,因應必要可適當搭配一般被添加的添加劑、例如光增感劑、聚合抑制劑、聚合起始劑、平坦劑、界面活性劑、密著性賦予劑、可塑劑、紫外線吸收劑、抗氧化劑、儲藏安定劑、防靜電劑、無機填充劑、顏料、染料等。
本發明之上述硬化性組成物,藉由塗佈於基材上使光聚合(硬化),可形成硬化膜或層合體等之成形品。如此
得到的硬化膜亦為本發明之對象。
前述基材,可舉例如塑膠(聚碳酸酯、聚甲基丙烯酸酯、聚苯乙烯、聚酯、聚烯烴、環氧樹脂、三聚氰胺樹脂、三乙醯基纖維素、ABS(丙烯腈-丁二烯-苯乙烯共聚合物)、AS(丙烯腈-苯乙烯共聚合物)、降冰片烯系樹脂等)、金屬、木材、紙、玻璃、二氧化矽、板岩等。此等基材的形狀可為板狀、薄膜狀或3維成形體。
本發明之硬化性組成物的塗佈方法,可適當選擇鑄塗法、旋轉塗佈法、刀塗佈法、浸漬塗佈法、輥塗佈法、棒塗佈法、模具塗佈法、噴塗法、淋幕塗佈法、噴墨法、印刷法(凸版、凹版、平版、網版印刷等)等,其中因可以短時間塗佈,亦可利用揮發性高的溶液,又,由容易進行均勻的塗佈優點,以使用旋轉塗佈法為佳。又,由可簡單進行塗佈且可形成大面積無塗裝不均、平滑的塗膜的優點,以使用輥塗佈法、模具塗佈法、噴塗法為佳。在此所使用的硬化性組成物可使用為前述清漆形態者。又以事前使用孔徑為0.2μm左右之過濾器等將硬化性組成物過濾後,供給塗佈較佳。
塗佈後,較佳為接著以加熱板或烤箱等進行預備乾燥後,照射紫外線等的活性能量線使光硬化。作為活性能量線,可舉例如紫外線、電子線、X線等。作為紫外線照射使用的光源,可舉例如太陽光線、化學燈、低壓水銀燈、高壓水銀燈、金鹵燈、氙氣燈等。
之後,藉由進行後烘烤,具體為使用加熱板、烤箱等
進行加熱,可使聚合及聚縮合結束。
又,塗佈的膜之厚度在乾燥、硬化後中,通常為1nm~50μm、較佳為1nm~20μm。
又由將本發明之上述硬化性組成物塗佈於基材上形成塗膜的步驟、對塗膜照射紫外線等的活性能量線並進行硬化的步驟所形成的在基材的至少一部份的面具備硬塗層的層合體亦為本發明之對象。
在此,關於使用的基材或塗膜方法、紫外線等之能量線照射,同前述<硬化膜>中之基材、塗佈方法、紫外線照射。
較佳為紫外線照射後,以再經過進行燒成(後烘烤)之步驟為佳。燒成步驟通常在50~300℃、5分鐘~72小時中適宜選擇。
又,前述層合體中之基材以玻璃較佳。
又,前述層合體中,硬塗層之膜厚以1nm~50μm為佳、更佳為1nm~20μm。
本發明之硬化性組成物所得到的硬化膜或硬塗層不僅透明性優異,與基板之密著性優異且具有防皮脂‧指紋、髒污拭除性、油性筆耐性等之防污性。
因此,構成本發明之硬化膜或層合體的硬塗層,可作為LCD、PDP、觸控面板等之各種顯示器的表面之硬塗層。
又,本發明中,油性筆耐性係指即使在膜表面以Magic ink(登錄商標)(寺西化學工業(股))或mackee(登錄商標)(zebra(股))等之油性筆畫線的場合,使油性筆跡成為點狀、難以附著油性筆的性質。
以下,舉實施例將本發明更具體說明,但本發明不限於下述之實施例。
又,實施例中試料的調製及物性之分析使用的裝置及條件如下。
裝置:JEOL Datum(股)製 JNM-ECA700
溶劑:CDCl3
基準:CDCl3(77.0ppm)
裝置:東曹(股)製 HLC-8220GPC
管柱:昭和電工(股)製 Shodex(登錄商標)GPC KF-804L、GPC KF-805L
管柱溫度:40℃
溶劑:四氫呋喃
偵測器:RI
裝置:NETZSCH公司製 Photo-DSC 204 F1 Phoenix
(登錄商標)
測定條件:氮環境下
昇溫速度:5℃/分鐘(25~160℃)
裝置:(股)Rigaku製 TG8120
測定條件:空氣環境下
昇溫速度:10℃/分鐘(25~500℃)
裝置:MIKASA(股)製 MS-A100
裝置:As-1(股)製 MH-180CS、MH-3CS
裝置:iGrafx(股)製 H02-L41
裝置:J.A.Woollam公司製 EC-400
裝置:新東科學(股)製 荷重變動型摩擦磨耗試驗機TRIBOGEAR HHS2000
荷重條件:50g
探測器:0.6mmR sapphire pin
測定速度:1mm/秒
裝置:日本電色工業(股)製 NDH5000
裝置:協和界面科學(股)製 DropMaster DM-501
測定溫度:20℃
測定法:將對一個膜進行5次測定測定溶劑附著膜表面5秒後的接觸角,其平均值作為接觸角值。
又,縮寫為以下之意義。
IPDUA:2官能胺基甲酸酯丙烯酸酯〔Daicel‧Cytec(股)製 EBECRYL(登錄商標)4858〕
C6FA:2-(全氟己基)乙基丙烯酸酯〔大金化成品販売(股)製 R-1620)
MAIB:二甲基2,2’-偶氮雙異丁酯〔大塚化學(股)製MAIB〕
MPTES:3-甲基丙烯醯基氧基丙基三乙氧基矽烷〔信越化學工業(股)信越矽酮(登錄商標)KBE-503〕
TEOS:四乙氧基矽烷〔Momentive Performance Materials Japan Inc.(同)製 TSL8124〕
OTEOS:四乙氧基矽烷水解縮合物(重量平均分子量Mw:1,700、分散度:1.4)〔COLCOAT CO.,Ltd製EthylsiliCate48〕
ST:異丙醇分散二氧化矽溶膠〔日產化學工業(股)製IPA-ST-UP、SiO2:15質量%、粒子徑:40~100nm〕
PFPE-1:單末端丙烯基改性全氟聚醚〔信越化學工業(股)製 KY-1203〕
PFPE-2:兩末端丙烯基改性全氟聚醚〔SOLVAY
SPECIALTY POLYMERS公司製 FLUOROLINK(登錄商
標)AD1700〕
PFPE-3:兩末端甲基丙烯基改性全氟聚醚〔SOLVAY SPECIALTY POLYMERS公司製、FLUOROLINK(登錄商標)MD700〕
HCl:1mol/L鹽酸
TAG:熱酸產生劑〔三新化學工業(股)製 San-Aid(登錄商標)SI-60L〕
TMAC:四甲基銨氯化物50質量%水溶液〔Lionakzo (股)製 TMAC-50〕
I2959:1-〔4-(2-羥基乙氧基)苯基〕-2-羥基-2-甲基-1-丙烷-1-酮〔BASF Japan(股)製 Irgacure(登錄商標)2959〕
MIBK:甲基異丁基酮
PGME:丙二醇單甲基醚
THF:四氫呋喃
300mL的反應燒瓶中,加入MIBK54g,邊攪拌邊流入5分鐘氮,至內液迴流為止進行(約116℃)加熱。
另外的100mL的反應燒瓶中,加入作為單體A的IPDUA9.0g(20mmol)、作為單體B的C6FA5.9g(14mmol)、作為聚合起始劑C的MAIB2.3g(10mmol)及MIBK54g,邊攪拌邊流入5分鐘氮進行氮取代,在冰浴進行冷卻至0℃為止。
在前述之300mL反應燒瓶中迴流的MIBK中,從置入有IPDUA、C6FA及MAIB的前述100mL的反應燒瓶,使用滴下幫浦,將內容物花費30分鐘滴下。滴下完畢後,進而進行1小時攪拌。
接著,從該反應液使用旋轉蒸發器將MIBK35g餾去後,加入經冰冷的己烷450g,使聚合物沈澱。該沈澱物以傾析槽進行純化。使得到的粗生成物溶於THF18g,再度添加於經冰冷的己烷450g後,使聚合物沈澱。使該沈澱物以傾析槽進行純化。將得到的聚合物再度溶解於THF18g,進行減壓餾去、真空乾燥,得到白色粉末之目的物(F-HBP)12.0g(收率71%)。
得到的目的物之13C NMR光譜如圖1所示。由13C NMR光譜算出的F-HBP的單位構造組成(莫耳比)為IPDUA單元〔A〕:C6FA單元〔B〕:聚合起始劑單元〔C〕=50:30:20。又,目的物的GPC之聚苯乙烯換算所測定的重量平均分子量Mw為3,900、分散度:Mw(重量平均分子量)/Mn(數平均分子量)為4.2、玻璃轉移溫度Tg為42.8℃、5%重量減少溫度Td5%為273.9℃。
100mL的反應燒瓶中,加入MPTES11.6g及乙醇7.4g,進行5分鐘攪拌。該溶液中,使另外調製的草酸〔關東化學(股)製〕0.04g、水3.2g及乙醇7.4g之混合溶液花費30分鐘滴下。使該溶液進行5分鐘攪拌後,至
內液進行迴流為止進行(約80℃)加熱並進行1小時攪拌。使反應混合物冷卻至30℃為止,得到Si-OLG-1的乙醇溶液。
Si-OLG-1的GPC之聚苯乙烯換算所測定的重量平均分子量Mw為1,200、分散度:Mw/Mn為1.1。
100mL的反應燒瓶中,加入TEOS5.0g、MPTES4.7g及乙醇6.4g,進行5分鐘攪拌。該溶液中,將另外調製的草酸〔關東化學(股)製〕0.04g、水3.2g及乙醇6.4g之混合溶液花費30分鐘滴下。使該溶液進行5分鐘攪拌後,至內液迴流為止進行(約80℃)加熱並進行1小時攪拌。使反應混合物冷卻至30℃為止,得到Si-OLG-2之乙醇溶液。
Si-OLG-2之GPC之聚苯乙烯換算所測定的重量平均分子量Mw為1,300、分散度:Mw/Mn為1.1。
100mL的反應燒瓶中,加入TEOS6.7g、MPTES2.3g及乙醇6.1g,進行5分鐘攪拌。該溶液中,使另外調製的草酸〔關東化學(股)製〕0.04g、水3.2g及乙醇6.1g之混合溶液花費30分鐘滴下。使該溶液進行5分鐘攪拌後,至內液迴流為止進行(約80℃)加熱並進行1小時攪拌。使反應混合物冷卻至30℃為止,得到Si-OLG-3的乙
醇溶液。
Si-OLG-3的GPC之聚苯乙烯換算所測定的重量平均分子量Mw為1,100、分散度:Mw/Mn為1.1。
使以下各成分溶於PGME/水混合溶劑(質量比95/5),調製固形分(硬化性組成物中之溶劑成分以外的全成分)濃度30質量%的硬化性組成物。
(1)矽氧烷寡聚物:合成例2乃至合成例3所製造的Si-OLG-1乃至Si-OLG-2及OTEOS,表1記載者為表1記載之量。
(2)含氟高分支聚合物:合成例1所製造的F-HBP為表1記載之量。
(3)表面改質劑:PFPE-1/PFPE-2/PFPE-3之混合物(質量比5/4/1)為表1記載之量。
(4)酸觸媒:表1記載者為1質量份。但,酸觸媒為HCl的場合,進而TMAC為1質量份(作為四甲基銨氯化物為0.5質量份)。
(5)光聚合起始劑:I2959為表1記載之量。
使該硬化性組成物在室溫(約25℃)進行30分鐘攪拌後,在預先以乙醇進行超音波洗淨的100×100mm之玻璃基板(1.1mm厚)上旋轉塗佈(slope5秒鐘、
2,000rpm×30秒鐘、slope5秒鐘)而得到塗膜。使該塗膜在100℃的加熱板進行3分鐘乾燥。之後,將該塗膜在表1記載之環境下、照射曝光量1,000mJ/cm2之UV光使光硬化,進而大氣下在表1記載之溫度之加熱板進行1小時後烘烤。又在表1中後烘烤溫度記載為「無」者係未進行後烘烤。得到的硬塗膜之厚度各自約1μm。
評估得到的硬塗膜之基板密著性、動摩擦係數、透明性、指紋視認性、指紋拭除性、油性筆耐性以及水及油酸之接觸角。又關於基板密著性、透明性、指紋視認性、指紋拭除性及油性筆耐性,用以下要領實施。結果一併表示於表2。
基板密著性:在硬塗膜,使用GUIDE〔COTEC(股)製 CROSS-CUT GUIDECCI-2〕,切入25格(5×5、2mm間隔)之直角格子圖型,以使用寬12mm之透明膠帶〔日東電工(股)製 玻璃紙膠帶No.29〕的CROSS-CUT法(依據JIS 5600-5-6)進行評估,算出對全25格之不自基板剝離而殘存的格數。
透明性:測定亦包含玻璃基板的硬塗膜之haze,依據以下之基準評估。
指紋視認性:於硬塗膜表面按壓附著有鼻脂的指頭,以目視確認硬塗膜附著的指紋,並用以下之基準評估。
指紋拭除性:將以上述方法附著於硬塗膜的指紋以不
織布擦拭布〔旭化成纖維(股)製 BEMCOT(登錄商標)M-1〕拭除時的拭除性用以下之基準評估。
油性筆耐性:於硬塗膜表面以油性筆〔zebra(股)製 mackee極細(黑)細〕畫線,將所畫線以目視確認並用以下之基準評估。
A:haze值<0.5
B:0.5≦haze值<1.0
C:haze值≧1.0
A:附著的指紋不明顯
B:附著的指紋不太明顯
C:附著的指紋非常明顯
A:不施力可拭除
B:施以輕力可拭除
C:不用力無法拭除
A:油性筆跡成為點狀幾乎無法描畫
B:筆跡斷斷續續無法清楚描畫
C:可畫線
將以實施例1乃至實施例8及比較例1得到的硬塗膜
表面以鋼棉擦拭(荷重250g、來回1,500次)後,將油性筆耐性以及水及油酸之接觸角如前述同樣地評估。結果一併表示於表2。
如表2所示,實施例1乃至實施例8之硬塗膜(厚膜)顯示與玻璃基板之充分密著性且透明性優異。
進而亦具有防皮脂‧指紋,指紋拭除性、油性筆耐性的防污性,即使耐久性試驗後亦具有充分油性筆耐性者。
另一方面,取代本發明之(a)成分:矽氧烷寡聚物,使用不具有自由基聚合性雙鍵的烷氧基矽烷寡聚物(OTEOS)的比較例1的硬塗膜(厚膜)欠缺透明性,在耐久性試驗後有大幅降低油性筆耐性以及接觸角之結果,亦即為缺乏耐久性的結果。
接著,未添加本發明之(b)含氟高分支聚合物(F-HBP)及(c)表面改質劑的比較例2之硬塗膜(厚膜)雖密著性‧透明性可確保,但有欠缺防皮脂‧指紋、指紋拭除性及油性筆耐性之防污性的結果。
將以下各成分溶於PGME/水混合溶劑(質量比95/5),調製固形分(硬化性組成物中之溶劑成分以外的全成分)濃度5質量%的硬化性組成物。
(1)矽氧烷寡聚物:由合成例2乃至合成例4所製造的Si-OLG-1乃至Si-OLG-3及OTEOS,表3記載者為表3記載之量。
(2)二氧化矽微粒子:ST為表3記載之量。
(3)含氟高分支聚合物:合成例1所製造的F-HBP為表3記載之量。
(4)表面改質劑:PFPE-1/PFPE-2/PFPE-3之混合物(質量比5/4/1)為表3記載之量。
(5)酸觸媒:HCl為1質量份及TMAC為1質量份(作為四甲基銨氯化物為0.5質量份)。
(6)光聚合起始劑:I2959為10質量份。
將該硬化性組成物在室溫(約25℃)進行30分鐘攪拌後,在預先以乙醇進行超音波洗淨的100×100mm之玻璃基板(1.1mm厚)上進行旋轉塗佈(slope5秒鐘、2,000rpm×30秒鐘、slope5秒鐘)而得到塗膜。使該塗膜在60℃的加熱板進行3分鐘乾燥。之後,使該塗膜在氮環境下、照射曝光量1,000mJ/cm2之UV光使光硬化,進而在大氣下、180℃的加熱板進行1小時後烘烤。得到的硬塗膜之厚度各自為約60~70nm。
將得到的硬塗膜之基板密著性、動摩擦係數、透明性、指紋視認性、指紋拭除性、油性筆耐性以及水及油酸之接觸角如前述同樣地評估。結果一併表示於表4。
將實施例9乃至實施例13及比較例3所得到的硬塗膜表面以鋼棉摩擦(荷重250g、來回1,500次)後,將透明性及油性筆耐性如前述同樣地評估。結果一併表示於表4。
如表4所示,實施例9乃至實施例13的硬塗膜(薄膜)與上述所示的實施例1乃至實施例8之硬塗膜(厚膜)同樣具有與玻璃基板之充分密著性且透明性優異,進而亦具有防皮脂‧指紋、指紋拭除性、油性筆耐性之防污性。又在耐久性試驗後亦具有充分透明性,油性筆耐性亦優。
另一方面,取代本發明之(a)成分:矽氧烷寡聚物,使用不具有自由基聚合性雙鍵的烷氧基矽烷寡聚物(OTEOS)之比較例3的硬塗膜(薄膜)欠缺透明性,在
耐久性試驗後有油性筆耐性大幅降低、欠缺耐久性的結果。
Claims (21)
- 一種硬化性組成物,其特徵係含有(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物100質量份、(b)含氟高分支聚合物0.001~1質量份、(c)由全氟聚醚化合物所構成的表面改質劑0.01~40質量份、及(d)因活性能量線而產生自由基的聚合起始劑0.1~25質量份,且前述(b)含氟高分支聚合物為使分子內具有2個以上的自由基聚合性雙鍵的單體A與分子內具有氟烷基及至少1個自由基聚合性雙鍵的單體B在相對該單體A之莫耳數,5~200mol%量之聚合起始劑C存在下聚合而得到的含氟高分支聚合物。
- 如請求項1記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為使下述式〔3〕所表示之烷氧基矽烷D水解縮合而得到的矽氧烷寡聚物,[化1]R3 aSi(OR4)4-a [3](式中,R3為具有自由基聚合性雙鍵的1價有機基,R4為甲基或乙基,a為1或2)。
- 如請求項2記載之硬化性組成物,其中,前述R3為具有乙烯基或(甲基)丙烯基的1價有機基。
- 如請求項3記載之硬化性組成物,其中,前述烷氧基矽烷D為下述式〔4〕所表示之化合物,
(式中,R4與前述式〔3〕中之定義相同,R5為氫原子或甲基,L1為碳原子數1乃至6的伸烷基)。 - 如請求項2乃至請求項4中任一項記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為使前述烷氧基矽烷D與下述式〔5〕所表示之烷氧基矽烷E水解縮合而得到的矽氧烷寡聚物,[化3]R6 bSi(OR7)4-b [5](式中,R6為可以氟原子取代的碳原子數1乃至6的烷基或苯基,R7為甲基或乙基,b為0乃至2之整數)。
- 如請求項5記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為含前述烷氧基矽烷D單位至少10mol%的矽氧烷寡聚物。
- 如請求項1記載之硬化性組成物,其中,前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物為在全構造單位中至少含有10mol%下述式〔6〕所表示之構造單位的矽氧烷寡聚物,
(式中,L1為碳原子數1乃至6的伸烷基,R4為甲基或乙基,R5為氫原子或甲基)。 - 如請求項1乃至請求項7中任一項記載之硬化性組成物,其中,前述單體A為具有乙烯基或(甲基)丙烯基的任一者或兩者的化合物。
- 如請求項8記載之硬化性組成物,其中,前述單體A為二乙烯基化合物或二(甲基)丙烯酸酯化合物。
- 如請求項1乃至請求項9中任一項記載之硬化性組成物,其中,前述單體B為至少具有1個乙烯基或(甲基)丙烯基的任一者的化合物。
- 如請求項10記載之硬化性組成物,其中,前述單體B為下述式〔1〕所表示之化合物,
(式中,R1為氫原子或甲基,R2為可以羥基取代的碳原子數2乃至12之氟烷基)。 - 如請求項11記載之硬化性組成物,其中,前述單體B為下述式〔2〕所表示之化合物,
(式中,R1與前述式〔1〕中之定義相同,X為氫原子或氟原子,m為1或2,n為0乃至5之整數)。 - 如請求項1乃至請求項12中任一項記載之硬化性組成物,其中,前述聚合起始劑C為偶氮系聚合起始劑。
- 如請求項1乃至請求項13中任一項記載之硬化性組成物,其中,前述(b)含氟高分支聚合物為使用相對前述單體A為5~300mol%量的前述單體B所得到的高分支聚合物。
- 如請求項1乃至請求項14中任一項記載之硬化性組成物,其中,前述(d)因活性能量線而產生自由基的聚合起始劑為烷基苯乙酮化合物。
- 如請求項1乃至請求項15中任一項記載之硬化性組成物,其中,進而作為水解觸媒,相對前述(a)具有至少1個自由基聚合性雙鍵的矽氧烷寡聚物的烷氧基矽烷基含有0.0001~10mol%量之(e)酸或酸產生劑。
- 一種硬化膜,其特徵係由請求項1乃至請求項16中任一項記載之硬化性組成物所得到。
- 一種層合體,其係在基材的至少一部份的面具備硬塗層的層合體,且該硬塗層係藉由使請求項1乃至請求項16中任一項記載之硬化性組成物塗佈於基材上並形成 塗膜之步驟、對塗膜照射活性能量線並進行硬化的步驟來形成。
- 如請求項18記載之層合體,其係再藉由燒成步驟形成。
- 如請求項18或請求項19記載之層合體,其中,基材為玻璃。
- 如請求項18乃至請求項20中任一項記載之層合體,其中,前述硬塗層具有1nm~50μm之膜厚。
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| JP6453622B2 (ja) * | 2014-11-21 | 2019-01-16 | デクセリアルズ株式会社 | 配線基板の製造方法、及び配線基板 |
| JP6464023B2 (ja) * | 2015-04-24 | 2019-02-06 | 富士フイルム株式会社 | ハードコートフィルム、偏光板、及びタッチパネルディスプレイ |
| KR102385050B1 (ko) * | 2016-03-31 | 2022-04-11 | 닛산 가가쿠 가부시키가이샤 | 피막형성용 조성물 및 그 제조방법 |
| CN109475900B (zh) | 2016-07-15 | 2022-09-02 | 日产自动车株式会社 | 防污结构体前体、防污结构体、表面改性组合物、及表面改性方法 |
| WO2018070426A1 (ja) * | 2016-10-12 | 2018-04-19 | 日産化学工業株式会社 | 防眩性ハードコート積層体 |
| CN106700810B (zh) * | 2016-12-28 | 2019-09-24 | 衢州氟硅技术研究院 | 一种包含四氟乙烯衍生氢氟醚的表面防污处理组合物 |
| TWI791603B (zh) * | 2017-09-01 | 2023-02-11 | 日商日產化學股份有限公司 | 延伸性耐擦傷性之塗布用硬化性組成物 |
| JP7115054B2 (ja) * | 2018-06-13 | 2022-08-09 | 東レ株式会社 | ガラス強化基板 |
| CN109306244A (zh) * | 2018-09-18 | 2019-02-05 | 深圳市派旗纳米技术有限公司 | 一种hf纳米膜及其制备方法 |
| WO2020066993A1 (ja) * | 2018-09-25 | 2020-04-02 | Dic株式会社 | 組成物、硬化物、積層体および耐光性塗料 |
| US11098218B2 (en) * | 2018-09-26 | 2021-08-24 | Apple Inc. | Coatings for electronic devices |
| JP7227738B2 (ja) * | 2018-11-07 | 2023-02-22 | サカタインクス株式会社 | 皮膜形成用組成物、該皮膜形成用組成物を塗工してなるガラス基材、及び、該ガラス基材を用いてなるタッチパネル |
| CN109535967B (zh) * | 2018-11-14 | 2022-01-25 | 常州大学 | 一种环保型高抗冲性能涂料的制备方法 |
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| CN109722089B (zh) * | 2018-12-21 | 2020-10-16 | 上海乘鹰新材料有限公司 | 紫外光固化涂料用抗污助剂 |
| JP7296008B2 (ja) * | 2020-03-25 | 2023-06-21 | 富士フイルム株式会社 | ハードコート層形成用組成物、ハードコートフィルム、ハードコートフィルムを有する物品、画像表示装置、及びハードコートフィルムの製造方法 |
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| Publication number | Publication date |
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| CN104755514A (zh) | 2015-07-01 |
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