TW201436447A - Piezoelectric converter and flow sensor in which same is used - Google Patents
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Classifications
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/18—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing electrical output from mechanical input, e.g. generators
- H02N2/185—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing electrical output from mechanical input, e.g. generators using fluid streams
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/20—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow
- G01F1/32—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow using swirl flowmeters
- G01F1/3209—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow using swirl flowmeters using Karman vortices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/20—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow
- G01F1/32—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow using swirl flowmeters
- G01F1/3209—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow using swirl flowmeters using Karman vortices
- G01F1/3218—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow using swirl flowmeters using Karman vortices bluff body design
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/20—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow
- G01F1/32—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow using swirl flowmeters
- G01F1/325—Means for detecting quantities used as proxy variables for swirl
- G01F1/3259—Means for detecting quantities used as proxy variables for swirl for detecting fluid pressure oscillations
- G01F1/3266—Means for detecting quantities used as proxy variables for swirl for detecting fluid pressure oscillations by sensing mechanical vibrations
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/16—Measuring force or stress, in general using properties of piezoelectric devices
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/18—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing electrical output from mechanical input, e.g. generators
- H02N2/186—Vibration harvesters
- H02N2/188—Vibration harvesters adapted for resonant operation
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/30—Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
- H10N30/302—Sensors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/30—Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
- H10N30/304—Beam type
- H10N30/306—Cantilevers
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Measuring Volume Flow (AREA)
Abstract
Description
本發明係關於壓電轉換裝置及使用該壓電轉換裝置的流量感測器。 The present invention relates to a piezoelectric conversion device and a flow sensor using the same.
就壓電轉換裝置已有人提案例如圖20A及圖20B所示構成之發電裝置(例如參照日本專利公開2011-91977號公報)。以下將日本專利公開2011-91977號公報稱為文獻1。 In the piezoelectric conversion device, for example, a power generating device having the configuration shown in FIG. 20A and FIG. 20B has been proposed (for example, refer to Japanese Patent Laid-Open Publication No. 2011-91977). Japanese Patent Publication No. 2011-91977 is referred to as Document 1.
此發電裝置包含:懸臂樑形成基板120;以及壓電轉換部124。壓電轉換部124因應於懸臂樑形成基板120之懸臂樑部122的振動而產生交流電壓。懸臂樑形成基板120具有:配重部123,配置於框狀支持部121及支持部121的內側。配重部123係經由懸臂樑部122而受支持部121自由搖擺地支持。壓電轉換部124係在懸臂樑形成基板120的一表面側形成於懸臂樑部122。 The power generating device includes: a cantilever beam forming substrate 120; and a piezoelectric conversion portion 124. The piezoelectric conversion portion 124 generates an AC voltage in response to the vibration of the cantilever portion 122 of the cantilever beam forming substrate 120. The cantilever beam forming substrate 120 has a weight portion 123 and is disposed inside the frame-shaped support portion 121 and the support portion 121. The weight portion 123 is supported by the support portion 121 via the cantilever portion 122 so as to be swingable. The piezoelectric conversion portion 124 is formed on the cantilever portion 122 on one surface side of the cantilever forming substrate 120.
支持部121、懸臂樑部122與配重部123係使用元件形成基板120a來形成。文獻1中記載有將SOI(Silicon on Insulator,絕緣層上矽)基板等作為元件形成基板120a。 The support portion 121, the cantilever portion 122, and the weight portion 123 are formed using the element forming substrate 120a. In Document 1, an SOI (Silicon On Insulator) substrate or the like is used as the element forming substrate 120a.
壓電轉換部124係藉由下部電極124a、壓電層124b、以及上部電極124c來構成。 The piezoelectric conversion portion 124 is configured by a lower electrode 124a, a piezoelectric layer 124b, and an upper electrode 124c.
習知技術中,就具有橋式電路的流量感測器而言,已知有使用加熱器的熱式流量感測器(例如參照日本專利公開2002-310762號公報)。以下將日本專利公開2002-310762號公報稱為文獻2。 In the prior art, a thermal flow sensor using a heater is known as a flow sensor having a bridge circuit (for example, refer to Japanese Patent Laid-Open Publication No. 2002-310762). Japanese Patent Publication No. 2002-310762 is referred to as Document 2.
文獻2中記載有一種熱式流量感測器,係將用於橋式電路的電阻器,與加熱器、電阻測溫計、溫度感測器整合到同一半導體基板上之構成。 Document 2 describes a thermal flow sensor in which a resistor for a bridge circuit is integrated with a heater, a resistance thermometer, and a temperature sensor on the same semiconductor substrate.
又,習知已有人提案將藉由風力使壓電元件振動的發電機構利用作為偵測風速之感測器(例如參照日本專利公開2010-106809號公報)。以下將日本專利公開2010-106809號公報稱為文獻3。 In addition, it has been proposed to use a power generating mechanism that vibrates a piezoelectric element by wind power as a sensor for detecting wind speed (for example, refer to Japanese Patent Laid-Open Publication No. 2010-106809). Japanese Patent Publication No. 2010-106809 is referred to as Document 3.
此發電機構例如圖21所示,包含:壓電元件110;保持體140;受風翼120;連接體130。保持體140固接有壓電元件110。連接體130將受風翼120連接至壓電元件110。連接體130將受風翼120的振動運動等傳達至壓電元件110。另,發電機構係於1個保持體140分別各具有8個壓電元件110、受風翼120及連接體130。 This power generating mechanism includes, for example, a piezoelectric element 110, a holding body 140, a wind receiving blade 120, and a connecting body 130, as shown in FIG. The holding body 140 is fixed to the piezoelectric element 110. The connector 130 connects the wind receiving wing 120 to the piezoelectric element 110. The connecting body 130 transmits the vibration motion or the like of the airfoil 120 to the piezoelectric element 110. Further, the power generation mechanism has eight piezoelectric elements 110, a wind receiving blade 120, and a connecting body 130 in each of the holding bodies 140.
壓電元件110係壓電雙層致動元件。壓電雙層致動元件利用2片PZT系陶瓷板以夾住不鏽鋼的墊板(shim)。 The piezoelectric element 110 is a piezoelectric double layer actuating element. The piezoelectric double-layer actuating element utilizes two PZT-based ceramic plates to sandwich a stainless steel shim.
文獻3舉例顯示平均風速與生成電壓之關係,記載有「平均風速到達7m/sec左右生成電壓為增加,超過之後生成電壓則減少」之內容。 Document 3 shows an example of the relationship between the average wind speed and the generated voltage, and it is described that "the average wind speed reaches an increase in the generated voltage of about 7 m/sec, and the generated voltage decreases after the passage".
又,文獻3記載有一種壓電發電模組,例如包含:發電機構,藉由風力使壓電元件振動;蓄電機構,貯蓄該發電機構所發電的電能量;以及電路,係間歇性自蓄電機構供給電力。又,文獻3記載有無線傳送系統。無線傳送系統定為包含下述構成:無線傳送模組,係自上述的壓電發電模組供給電力,間歇性進行風速之資料傳送。又,文獻3記載有一種風速監視系統,包含:上述無線傳送模組;以及傳送訊號之接收器。 Further, Document 3 discloses a piezoelectric power generation module including, for example, a power generation mechanism that vibrates a piezoelectric element by a wind force, a power storage mechanism that stores electric energy generated by the power generation mechanism, and an electric circuit that is an intermittent self-storage mechanism. Supply electricity. Further, Document 3 describes a wireless transmission system. The wireless transmission system is configured to include a wireless transmission module that supplies electric power from the piezoelectric power generation module described above and intermittently transmits data of wind speed. Further, Document 3 describes a wind speed monitoring system including the wireless transmission module and a receiver for transmitting signals.
另外,熱式流量感測器必須使電流過加熱器,低耗電化很困難。 In addition, the thermal flow sensor must pass current through the heater, which is difficult to reduce power consumption.
又,上述發電機構係推測:藉由產生卡門漩渦(Karman vortex)能賦予壓電元件110持續的振動。但是,上述發電機構中,在壓電元件110以外還必須具有保持體140、連接體130及受風翼120,相對於壓電元件110而言,發電機構將會大型化。因此,利用上述發電機構作為偵測風速之感測器時,難以將偵測風速之感測器小型化。 Further, the power generation mechanism estimates that the piezoelectric element 110 can be continuously vibrated by generating a Karman vortex. However, in the above-described power generating mechanism, the holding body 140, the connecting body 130, and the wind receiving blade 120 are required in addition to the piezoelectric element 110, and the power generating mechanism is increased in size with respect to the piezoelectric element 110. Therefore, when the above-described power generating mechanism is used as the sensor for detecting the wind speed, it is difficult to miniaturize the sensor for detecting the wind speed.
本案發明人設計:藉由流體使上述發電裝置之懸臂樑部122振動而進行發電。所以,本案發明人探討將上述發電裝置配置於流體的流道,利用流體而非外部振動來使發電裝置進行發電。 The inventor of the present invention designed to generate electricity by vibrating the cantilever portion 122 of the power generating device by a fluid. Therefore, the inventors of the present invention have investigated that the power generating device is disposed in a flow path of a fluid, and the power generating device generates power by using a fluid instead of external vibration.
但是,上述發電裝置難以利用流體來進行發電。 However, it is difficult for the above-described power generation device to generate electricity by using a fluid.
所以,本發明之目的在於提供一種壓電轉換裝置及使用該壓電轉換裝置的流量感測器,能進行流體誘發振動,且達到提昇流體誘發振動時的壓電轉換效率。 SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a piezoelectric conversion device and a flow rate sensor using the same that can perform fluid-induced vibration and achieve piezoelectric conversion efficiency when fluid-induced vibration is increased.
本發明之壓電轉換裝置,特徵在於包含:支持部;對向部,與該支持部成對向;以及振動區塊,位於該支持部與該對向部之間。該振動區塊一端固定於該支持部,另一端與該對向部隔開。該振動區塊包含:樑部;配重部;突出部;以及壓電轉換部。樑部,薄於該支持部,受該支持部自由搖擺地支持。該配重部,設在該樑部的前端,厚於該樑部。該突出部,在該配重部朝向與該樑部側相反側突出,且薄於該配重部及該對向部。該壓電轉換部,因應於該樑部之振動而產生交流電壓。該振動區塊翹成該突出部的前端面之法線與該對向部不交叉。藉此,在本發明之壓電轉換裝置中具有能進行流體誘發振動,且達到提升流體誘發振動時的壓電轉換效率之 效果。 A piezoelectric transducer according to the present invention includes: a support portion; an opposite portion facing the support portion; and a vibration block located between the support portion and the opposite portion. One end of the vibration block is fixed to the support portion, and the other end is spaced apart from the opposite portion. The vibration block includes: a beam portion; a weight portion; a protrusion portion; and a piezoelectric conversion portion. The beam portion is thinner than the support portion and is supported by the support portion in a freely swinging manner. The weight portion is provided at a front end of the beam portion and is thicker than the beam portion. The protruding portion protrudes toward the opposite side of the beam portion side from the weight portion, and is thinner than the weight portion and the opposing portion. The piezoelectric conversion unit generates an AC voltage in response to the vibration of the beam portion. The vibration block is warped so that the normal line of the front end face of the protrusion does not intersect the opposite portion. Thereby, in the piezoelectric conversion device of the present invention, it is possible to perform fluid-induced vibration and achieve piezoelectric conversion efficiency when lifting fluid-induced vibration. effect.
該壓電轉換裝置中,宜使該突出部之固有頻率大於該振動區塊之固有頻率。 In the piezoelectric conversion device, it is preferable that the natural frequency of the protruding portion is greater than the natural frequency of the vibration block.
該壓電轉換裝置中,宜使該對向部在與該支持部成對向的對向面和該對向部之厚度方向的一面之間設有傾斜面,該傾斜面使得該突出部與該對向部之距離加長。 In the piezoelectric transducer device, it is preferable that the opposing portion has an inclined surface between the opposing surface facing the supporting portion and a surface in the thickness direction of the opposing portion, the inclined surface making the protruding portion The distance between the opposing portions is lengthened.
該壓電轉換裝置中,宜使該對向部設有往該突出部即第1突出部側突出的第2突出部,且該第2突出部朝向與該第1突出部相反側翹曲。 In the piezoelectric transducer, it is preferable that the opposing portion has a second protruding portion that protrudes toward the first protruding portion side of the protruding portion, and the second protruding portion is warped toward the opposite side of the first protruding portion.
該壓電轉換裝置中,宜使該振動區塊係於該配重部之厚度方向的兩面之中的離該樑部較遠之面形成有凹部。 In the piezoelectric transducer device, it is preferable that the vibration block is formed with a concave portion on a surface farther from the beam portion among the two faces in the thickness direction of the weight portion.
該壓電轉換裝置中,宜使該樑部係由下述者構成:第1矽層;以及第1絕緣膜,形成於該第1矽層之厚度方向的一面側。該第1絕緣膜藉由該第1絕緣膜之壓縮應力而翹曲。該突出部該突出部係藉由下述者構成:第2矽層;以及第2絕緣膜,形成於該第2矽層之厚度方向的一面側。該第2絕緣膜藉由該第2絕緣膜之壓縮應力而翹曲。 In the piezoelectric conversion device, it is preferable that the beam portion is composed of a first ruthenium layer and a first insulating film formed on one surface side in the thickness direction of the first ruthenium layer. The first insulating film is warped by the compressive stress of the first insulating film. The protruding portion is formed by a second layer and a second insulating film formed on one surface side in the thickness direction of the second layer. The second insulating film is warped by the compressive stress of the second insulating film.
該壓電轉換裝置中,宜使該樑部係由下述者構成:第1矽層;以及第1絕緣膜,形成於該第1矽層之厚度方向的一面側。該第1絕緣膜藉由該第1絕緣膜之壓縮應力而翹曲。該第1突出部係藉由下述者構成:第2矽層;以及第2絕緣膜,形成於該第2矽層之厚度方向的一面側。該第2絕緣膜藉由該第2絕緣膜之壓縮應力而翹曲。該第2突出部係由下述者構成:第3矽層;以及第3絕緣膜,形成於該第3矽層之厚度方向的一面側。該第3絕緣膜藉由該第3絕緣膜之拉伸應力而翹曲。 In the piezoelectric conversion device, it is preferable that the beam portion is composed of a first ruthenium layer and a first insulating film formed on one surface side in the thickness direction of the first ruthenium layer. The first insulating film is warped by the compressive stress of the first insulating film. The first protruding portion is configured by a second ruthenium layer and a second insulating film formed on one surface side in the thickness direction of the second ruthenium layer. The second insulating film is warped by the compressive stress of the second insulating film. The second protruding portion is composed of a third insulating layer and a third insulating film formed on one surface side in the thickness direction of the third insulating layer. The third insulating film is warped by the tensile stress of the third insulating film.
該壓電轉換裝置中,宜使該振動區塊中該振動區塊之俯視形狀係矩 形。該振動區塊中該樑部之寬度與該配重部之寬度係相同。該配重部之長度除以該配重部之長度與該樑部之長度的和所得之值係在0.4以上,0.6以下。 In the piezoelectric conversion device, it is preferable to make the top view shape of the vibration block in the vibration block shape. The width of the beam portion in the vibration block is the same as the width of the weight portion. The value obtained by dividing the length of the weight portion by the sum of the length of the weight portion and the length of the beam portion is 0.4 or more and 0.6 or less.
本發明之流量感測器,其特徵在於包含前述壓電轉換裝置;以及偵測部,偵測該壓電轉換部所產生的交流電壓。藉此,在本發明之流量感測器中,因為具有能進行流體誘發振動,且達到提升流體誘發振動時的壓電轉換效率之壓電轉換裝置,所以能達成低耗電化及小型化之效果。 The flow sensor of the present invention is characterized by comprising the piezoelectric conversion device; and a detecting portion for detecting an alternating voltage generated by the piezoelectric conversion portion. Therefore, in the flow rate sensor of the present invention, since the piezoelectric transducer can be used to perform fluid-induced vibration and increase the piezoelectric conversion efficiency when the fluid induces vibration, it is possible to achieve low power consumption and miniaturization. effect.
該流量感測器中宜包含:無線傳送部,間歇性進行包含該偵測部之偵測結果的無線信號之傳送。 The flow sensor preferably includes a wireless transmission unit that intermittently transmits a wireless signal including the detection result of the detection unit.
該流量感測器中,宜包含:蓄電部;以及切換電路。該蓄電部,將該壓電轉換部所產生的交流電壓加以整流並進行蓄電。該切換電路構成為可在下述狀態中進行切換:第1狀態;以及第2狀態。該第1狀態中,使該壓電轉換部與該蓄電部電性連接。該第2狀態中,使該壓電轉換部與該偵測部電性連接。該偵測部及該無線傳送部可將該蓄電部作為電源而運作。 The flow sensor preferably includes: a power storage unit; and a switching circuit. The power storage unit rectifies and stores the AC voltage generated by the piezoelectric conversion unit. The switching circuit is configured to be switchable between a first state and a second state. In the first state, the piezoelectric conversion unit is electrically connected to the power storage unit. In the second state, the piezoelectric conversion unit is electrically connected to the detection unit. The detecting unit and the wireless transmitting unit can operate the power storage unit as a power source.
1‧‧‧壓電轉換裝置 1‧‧‧Piezoelectric conversion device
2‧‧‧偵測部 2‧‧‧Detection Department
5‧‧‧蓄電部 5‧‧‧Power Storage Department
6‧‧‧無線傳送部 6‧‧‧Wireless Transmission Department
7‧‧‧蓄電量監視部 7‧‧‧ Electricity storage monitoring department
9‧‧‧切換電路 9‧‧‧Switching circuit
10‧‧‧基板 10‧‧‧Substrate
10a‧‧‧矽基板 10a‧‧‧矽 substrate
10b‧‧‧埋入氧化膜 10b‧‧‧ buried oxide film
10c‧‧‧矽層 10c‧‧‧ layer
10ca‧‧‧第1矽層 10ca‧‧‧1st floor
10cc‧‧‧第2矽層 10cc‧‧‧2nd layer
10cd‧‧‧第3矽層 10cd‧‧‧3rd layer
10d‧‧‧狹縫 10d‧‧‧slit
10e‧‧‧傾斜面 10e‧‧‧ sloped surface
10f‧‧‧空間 10f‧‧‧ space
10h‧‧‧第1溝槽 10h‧‧‧1st trench
10i‧‧‧第2溝槽 10i‧‧‧2nd trench
11‧‧‧框架部 11‧‧‧Framework
11a‧‧‧支持部 11a‧‧‧Support Department
11b‧‧‧對向部 11b‧‧‧ opposite department
11c‧‧‧連結部 11c‧‧‧Link Department
12‧‧‧振動區塊 12‧‧‧Vibration block
12a‧‧‧樑部 12a‧‧ ‧ Beam Department
12b‧‧‧配重部 12b‧‧‧weight department
12bb‧‧‧凹部 12bb‧‧‧ recess
12c‧‧‧突出部 12c‧‧‧ highlights
12cc‧‧‧前端面 12cc‧‧‧ front end
13‧‧‧第2突出部 13‧‧‧2nd protrusion
14‧‧‧壓電轉換部 14‧‧‧Piezoelectric conversion department
14a‧‧‧第1電極(下部電極) 14a‧‧‧1st electrode (lower electrode)
14b‧‧‧壓電體層 14b‧‧‧piezoelectric layer
14c‧‧‧第2電極(上部電極) 14c‧‧‧2nd electrode (upper electrode)
15‧‧‧流道 15‧‧‧ flow path
16a‧‧‧第1配線 16a‧‧‧1st wiring
16c‧‧‧第2配線 16c‧‧‧2nd wiring
17a‧‧‧第1焊墊電極 17a‧‧‧1st pad electrode
17c‧‧‧第2焊墊電極 17c‧‧‧2nd pad electrode
18a、18b、18c‧‧‧絕緣膜 18a, 18b, 18c‧‧ ‧ insulating film
18aa‧‧‧第1絕緣膜 18aa‧‧‧1st insulating film
18ac‧‧‧第2絕緣膜 18ac‧‧‧2nd insulation film
18cc‧‧‧第3絕緣膜 18cc‧‧‧3rd insulating film
19‧‧‧絕緣層 19‧‧‧Insulation
71‧‧‧無線接收部 71‧‧‧Wireless Receiving Department
72‧‧‧控制部 72‧‧‧Control Department
73‧‧‧電動機 73‧‧‧Electric motor
74‧‧‧風扇 74‧‧‧fan
75‧‧‧運轉開關 75‧‧‧Operation switch
76‧‧‧設定部 76‧‧‧Setting Department
110‧‧‧壓電元件 110‧‧‧Piezoelectric components
120‧‧‧受風翼 120‧‧‧Wind wing
120a‧‧‧元件形成基板 120a‧‧‧Component forming substrate
121‧‧‧支持部 121‧‧‧Support Department
122‧‧‧懸臂樑部 122‧‧‧Cantilever beam
123‧‧‧與配重部 123‧‧‧With the weight department
124‧‧‧壓電轉換部 124‧‧‧Piezoelectric conversion department
124a‧‧‧下部電極 124a‧‧‧lower electrode
124b‧‧‧壓電層 124b‧‧‧Piezoelectric layer
124c‧‧‧上部電極 124c‧‧‧ upper electrode
130‧‧‧連接體 130‧‧‧Connector
140‧‧‧保持體 140‧‧‧ Keeping body
141‧‧‧第1壓電轉換部 141‧‧‧1st piezoelectric transducer
142‧‧‧第2壓電轉換部 142‧‧‧2nd piezoelectric transducer
A1‧‧‧流量感測器 A1‧‧‧Flow Sensor
A2‧‧‧空調機 A2‧‧‧Air conditioner
F1‧‧‧相關例 F1‧‧‧Related cases
F2‧‧‧相關例 F2‧‧‧Related cases
F3‧‧‧相關例 F3‧‧‧Related cases
La‧‧‧長度 La‧‧‧ Length
Lb‧‧‧長度 Lb‧‧‧ length
Ha‧‧‧寬度 Ha‧‧‧Width
Hb‧‧‧寬度 Hb‧‧‧Width
以下更詳細敘述本發明之較佳實施形態。本發明之其他特徵及優點可藉由以下的詳細敘述及附加圖式關聯而進一步更加理解。 Preferred embodiments of the present invention are described in more detail below. Other features and advantages of the present invention will be further understood from the following detailed description and appended claims.
圖1A係實施形態1之壓電轉換裝置的概略俯視圖。圖1B係圖1A之X-X線段概略剖視圖。 Fig. 1A is a schematic plan view of a piezoelectric transducer according to a first embodiment. Fig. 1B is a schematic cross-sectional view taken along line X-X of Fig. 1A.
圖2A~圖2F係說明實施形態1之壓電轉換裝置的製造方法之主要步驟剖視圖。 2A to 2F are cross-sectional views showing main steps of a method of manufacturing the piezoelectric transducer according to the first embodiment.
圖3係實施形態1之壓電轉換裝置的尺寸說明圖。 Fig. 3 is a view showing the size of a piezoelectric transducer according to a first embodiment;
圖4係關於實施形態1之壓電轉換裝置而言,振動區塊之共振頻率與流體誘發振動產生的臨界流速之關係說明圖。 Fig. 4 is a view showing the relationship between the resonance frequency of the vibration block and the critical flow velocity generated by the fluid induced vibration in the piezoelectric conversion device according to the first embodiment.
圖5係實施形態1之壓電轉換裝置的振動特性圖。 Fig. 5 is a graph showing the vibration characteristics of the piezoelectric transducer of the first embodiment.
圖6係實施形態1之壓電轉換裝置的振動特性圖。 Fig. 6 is a graph showing the vibration characteristics of the piezoelectric transducer of the first embodiment.
圖7係實施形態1之壓電轉換裝置的振動特性圖。 Fig. 7 is a graph showing the vibration characteristics of the piezoelectric transducer of the first embodiment.
圖8係顯示實施形態1之壓電轉換裝置中的配重部之比例與共振頻率之變化量的關係之模擬結果。 Fig. 8 is a simulation result showing the relationship between the ratio of the weight portion and the amount of change in the resonance frequency in the piezoelectric transducer of the first embodiment.
圖9A係實施形態1之壓電轉換裝置中的第1變形例之概略俯視圖。圖9B係圖9A之X-X線段概略剖視圖。 Fig. 9A is a schematic plan view showing a first modification of the piezoelectric transducer of the first embodiment. Fig. 9B is a schematic cross-sectional view taken along line X-X of Fig. 9A.
圖10A係實施形態1之壓電轉換裝置中的第2變形例之概略俯視圖。 圖10B係圖10A之X-X線段概略剖視圖。 Fig. 10A is a schematic plan view showing a second modification of the piezoelectric transducer of the first embodiment. Fig. 10B is a schematic cross-sectional view taken along line X-X of Fig. 10A.
圖11係實施形態1之壓電轉換裝置中的第2變形例之尺寸說明圖。 Fig. 11 is a view showing the size of a second modification of the piezoelectric transducer of the first embodiment.
圖12係實施形態1之壓電轉換裝置中的第2變形例之振動特性圖。 Fig. 12 is a vibration characteristic diagram of a second modification of the piezoelectric transducer of the first embodiment.
圖13A係實施形態2之壓電轉換裝置的概略俯視圖。圖13B係圖13A之X-X線段概略剖視圖。 Fig. 13A is a schematic plan view of a piezoelectric transducer according to a second embodiment. Figure 13B is a schematic cross-sectional view taken along line X-X of Figure 13A.
圖14係實施形態3之流量感測器的概略構成圖。 Fig. 14 is a schematic configuration diagram of a flow rate sensor of the third embodiment.
圖15係實施形態3之流量感測器的特性說明圖。 Fig. 15 is a view showing the characteristics of the flow rate sensor of the third embodiment.
圖16係實施形態3之流量感測器的特性說明圖。 Fig. 16 is a characteristic explanatory view of the flow rate sensor of the third embodiment.
圖17係實施形態3之流量感測器中的第1變形例之概略構成圖。 Fig. 17 is a schematic block diagram showing a first modification of the flow rate sensor of the third embodiment.
圖18係實施形態3中的空調管理系統之概略構成圖。 Fig. 18 is a schematic configuration diagram of an air conditioning management system in the third embodiment.
圖19係實施形態3之流量感測器中的第2變形例之概略構成圖。 Fig. 19 is a schematic block diagram showing a second modification of the flow rate sensor of the third embodiment.
圖20A係習知例發電裝置之概略俯視圖。圖20B係圖20A的A-A’線段概略剖視圖。 Fig. 20A is a schematic plan view of a conventional power generating device. Fig. 20B is a schematic cross-sectional view taken along line A-A' of Fig. 20A.
圖21係示意性顯示其他習知例中的發電機構之說明圖。 Fig. 21 is an explanatory view schematically showing a power generating mechanism in another conventional example.
【實施發明之最佳形態】 [Best Mode for Carrying Out the Invention]
(實施形態1) (Embodiment 1)
以下依據圖1來說明本實施形態的壓電轉換裝置1。 The piezoelectric transducer 1 of the present embodiment will be described below with reference to Fig. 1 .
壓電轉換裝置1包含:支持部11a;對向部11b,與支持部11a成對向; 以及振動區塊12,位於支持部11a與對向部11b之間。振動區塊12係一端固定於支持部11a,另一端與對向部11b隔開。藉此,壓電轉換裝置1在振動區塊12的另一端與對向部11b之間形成有流體可通過的流道15。壓電轉換裝置1係構成為支持部11a與對向部11b之相對性位置關係不變。 The piezoelectric conversion device 1 includes a support portion 11a, and the opposite portion 11b is opposed to the support portion 11a. And the vibration block 12 is located between the support portion 11a and the opposite portion 11b. The vibration block 12 is fixed at one end to the support portion 11a, and the other end is spaced apart from the opposite portion 11b. Thereby, the piezoelectric conversion device 1 forms a flow path 15 through which the fluid can pass between the other end of the vibration block 12 and the opposite portion 11b. The piezoelectric transducer 1 is configured such that the relative positional relationship between the support portion 11a and the opposing portion 11b is constant.
振動區塊12包含:樑部12a,受支持部11a自由搖擺地支持;配重部12b,設於樑部12a的前端;突出部12c,在配重部12b朝向與樑部12a側相反側突出;以及壓電轉換部14。所以,突出部12c從配重部12b突出。振動區塊12中,由樑部12a中的支持部11a側之端來構成振動區塊12的一端(固定端),由突出部12c中的前端來構成振動區塊12的另一端(自由端)。 The vibration block 12 includes a beam portion 12a that is supported by the support portion 11a so as to be freely swayable, a weight portion 12b that is provided at the front end of the beam portion 12a, and a protruding portion 12c that protrudes toward the side opposite to the beam portion 12a side of the weight portion 12b. And a piezoelectric conversion portion 14. Therefore, the protruding portion 12c protrudes from the weight portion 12b. In the vibration block 12, one end (fixed end) of the vibration block 12 is constituted by the end of the beam portion 12a on the side of the support portion 11a, and the other end of the vibration block 12 is constituted by the front end in the projecting portion 12c (free end) ).
樑部12a薄於支持部11a。配重部12b厚於樑部12a。又,突出部12c薄於配重部12b及對向部11b。壓電轉換部14因應於振動區塊12的樑部12a之振動而產生交流電壓。振動區塊12翹成突出部12c的前端面12cc之法線與對向部11b不交叉。藉此,壓電轉換裝置1能進行流體誘發振動,且達成提昇流體誘發振動時的壓電轉換效率。流體誘發振動係再將壓電轉換裝置1配置於流場中的狀態等,藉由在流場中流動的流體通過流道15而產生的振動區塊12之振動。此流體誘發振動係自誘發振動。就流體而言,例如有空氣、氣體、空氣與氣體的混合氣體、液體等。流體為氣體時,就流場而言,例如有空調機的供氣導管之內部,或空調機的排氣導管之內部等,並無特別限定。壓電轉換裝置1,相較於不具有配重部12b之情形而言,藉由振動區塊12具有配重部12b,可加大振動區塊12的振動時之慣性力,能加大振動區塊12的振幅。又,壓電轉換裝置1係藉由振動區塊12具有配重部12b,而能在振動區塊12振動時,將集中地使應變產生於樑部12a及壓電轉換部14,能達到提昇壓電轉換效率。又,壓電轉換裝置1藉由振動區塊12具有配重部12b,而能降低振動區塊12的共振頻率,能達到使得振動區塊12開始振動的流體之流速低速化。又,壓電轉換裝置1藉由具有對向部11b,而變得容易從在流道15流動的流體之流束引發振動區塊12之振動。 The beam portion 12a is thinner than the support portion 11a. The weight portion 12b is thicker than the beam portion 12a. Further, the protruding portion 12c is thinner than the weight portion 12b and the opposing portion 11b. The piezoelectric transducer 14 generates an AC voltage in response to the vibration of the beam portion 12a of the vibration block 12. The vibration block 12 is warped so that the normal line of the front end surface 12cc of the protruding portion 12c does not intersect the opposite portion 11b. Thereby, the piezoelectric transducer 1 can perform fluid-induced vibration and achieve piezoelectric conversion efficiency when the fluid-induced vibration is increased. The fluid-induced vibration system is in a state in which the piezoelectric transducer 1 is placed in the flow field, and the vibration of the vibration block 12 generated by the fluid flowing in the flow field through the flow path 15 is generated. This fluid induces vibration to self-induced vibration. As the fluid, there are, for example, air, a gas, a mixed gas of air and gas, a liquid, and the like. When the fluid is a gas, the flow field is not particularly limited, for example, inside the air supply duct of the air conditioner or inside the exhaust duct of the air conditioner. The piezoelectric conversion device 1 can increase the inertial force of the vibration of the vibration block 12 by increasing the vibration force of the vibration block 12 by the vibration portion 12 having the weight portion 12b as compared with the case where the weight portion 12b is not provided. The amplitude of block 12. Further, the piezoelectric transducer 1 has the weight portion 12b by the vibration block 12, and when the vibration block 12 vibrates, the strain is generated in the beam portion 12a and the piezoelectric transducer portion 14 in a concentrated manner, and the lifting can be achieved. Piezoelectric conversion efficiency. Further, the piezoelectric transducer 1 has the weight portion 12b by the vibration block 12, so that the resonance frequency of the vibration block 12 can be reduced, and the flow velocity of the fluid that causes the vibration block 12 to start to vibrate can be reduced. Further, the piezoelectric transducer 1 has the opposing portion 11b, and the vibration of the vibration block 12 is easily caused by the flow of the fluid flowing through the flow path 15.
壓電轉換裝置1宜使突出部12c的固有頻率大於振動區塊12的固有頻率。藉此,壓電轉換裝置1可抑制突出部12c以配重部12b為基點,單獨進行振動,可抑制突出部12c單獨振動所引起的振動能量降低。 The piezoelectric conversion device 1 is preferably such that the natural frequency of the protruding portion 12c is larger than the natural frequency of the vibration block 12. Thereby, the piezoelectric transducer 1 can suppress the protrusion 12c from being oscillated by the weight portion 12b as a base point, and can suppress the vibration energy reduction caused by the vibration of the protrusion 12c alone.
以下詳細說明壓電轉換裝置1的各構成要素。 Each component of the piezoelectric transducer 1 will be described in detail below.
壓電轉換裝置1可利用MEMS(micro electro mechanical systems,微機電系統)之製造技術來製造。 The piezoelectric conversion device 1 can be manufactured using a manufacturing technique of MEMS (micro electro mechanical systems).
壓電轉換裝置1係由基板10來形成支持部11a、對向部11b、樑部12a、配重部12b及突出部12c。壓電轉換裝置1係於基板10的一表面側形成有樑部12a及突出部12c。基板10具有一表面與另一表面。以下將基板10的一表面亦稱為第1表面,基板10的另一表面亦稱為第2表面。 In the piezoelectric transducer 1 , the support portion 11 a , the opposing portion 11 b , the beam portion 12 a , the weight portion 12 b , and the protruding portion 12 c are formed by the substrate 10 . The piezoelectric conversion device 1 is formed with a beam portion 12a and a protruding portion 12c on one surface side of the substrate 10. The substrate 10 has a surface and another surface. Hereinafter, one surface of the substrate 10 is also referred to as a first surface, and the other surface of the substrate 10 is also referred to as a second surface.
壓電轉換裝置1宜包含框狀之框架部11,其具有支持部11a與對向部11b。亦即,壓電轉換裝置1宜係由基板10來形成框架部11、樑部12a、配重部12b及突出部12c。換言之,支持部11a及對向部11b宜藉由框架部11個別的一部分來構成。藉此,壓電轉換裝置1可提高支持部11a與對向部11b之相對位置精度。又,壓電轉換裝置1可提高振動區塊12與對向部11b之相對位置精度。另,以下將框架部11之中,使支持部11a與對向部11b加以連結的2個部位均稱為連結部11c。 The piezoelectric conversion device 1 preferably includes a frame-shaped frame portion 11 having a support portion 11a and an opposite portion 11b. That is, the piezoelectric transducer 1 preferably forms the frame portion 11, the beam portion 12a, the weight portion 12b, and the protruding portion 12c from the substrate 10. In other words, the support portion 11a and the opposing portion 11b are preferably configured by a part of the frame portion 11. Thereby, the piezoelectric transducer 1 can improve the relative positional accuracy of the support portion 11a and the opposing portion 11b. Further, the piezoelectric transducer 1 can improve the relative positional accuracy of the vibration block 12 and the opposing portion 11b. In the following, the two portions of the frame portion 11 that connect the support portion 11a and the opposing portion 11b are referred to as a connecting portion 11c.
基板10例如可使用由形成於矽基板10a上的埋入氧化膜10b以及埋入氧化膜10b上的矽層10c所形成的SOI基板。另,埋入氧化膜10b係由氧化矽膜構成。基板10的第1表面定為(100)面,但不限於(100)面,例如亦可係(110)面。 As the substrate 10, for example, an SOI substrate formed of a buried oxide film 10b formed on the germanium substrate 10a and a germanium layer 10c embedded in the oxide film 10b can be used. Further, the buried oxide film 10b is composed of a hafnium oxide film. The first surface of the substrate 10 is defined as a (100) plane, but is not limited to the (100) plane, and may be, for example, a (110) plane.
支持部11a、對向部11b及各連結部11c可係由SOI基板之中的矽基板10a與埋入氧化膜10b及矽層10c所形成。 The support portion 11a, the opposing portion 11b, and the respective connecting portions 11c may be formed by the tantalum substrate 10a and the buried oxide film 10b and the tantalum layer 10c among the SOI substrates.
樑部12a係由SOI基板之中的矽層10c所形成。樑部12a的厚度尺寸小於支持部11a,具有可撓性。 The beam portion 12a is formed by the tantalum layer 10c among the SOI substrates. The beam portion 12a has a thickness smaller than that of the support portion 11a and has flexibility.
突出部12c係由SOI基板之中的矽層10c所形成,厚度尺寸小於支持部11a及對向部11b。壓電轉換裝置1將突出部12c的長度設定為短於樑部12a的長度,使得突出部12c的固有頻率大於振動區塊12的固有頻率。 The protruding portion 12c is formed of the ruthenium layer 10c among the SOI substrates, and has a thickness smaller than that of the support portion 11a and the opposite portion 11b. The piezoelectric conversion device 1 sets the length of the protruding portion 12c to be shorter than the length of the beam portion 12a such that the natural frequency of the protruding portion 12c is larger than the natural frequency of the vibration block 12.
壓電轉換裝置1將基板10與壓電轉換部14藉由形成於基板10之第1表面側的絕緣膜18a來電性絕緣。絕緣膜18a例如可藉由氧化矽膜來構成。此氧化矽膜係藉由例如熱氧化法來形成,但不限於此,亦可藉由CVD(Chemical Vapor Deposition,化學氣相沉積)法等方式來形成。 The piezoelectric transducer 1 electrically insulates the substrate 10 from the piezoelectric conversion portion 14 by the insulating film 18a formed on the first surface side of the substrate 10. The insulating film 18a can be formed, for example, by a ruthenium oxide film. The ruthenium oxide film is formed by, for example, a thermal oxidation method, but is not limited thereto, and may be formed by a CVD (Chemical Vapor Deposition) method or the like.
壓電轉換裝置1係利用下者來構成樑部12a:矽層10c的一部分;形成於矽層10c之厚度方向的一面側之絕緣膜18a的一部分。在此,絕緣膜18a具有壓縮應力。所以,樑部12a係利用下述者來構成:矽層10c之中構成樑部12a的部位之第1矽層10ca;以及絕緣膜18a之中形成於第1矽層10ca之厚度方向的一面側之部位的第1絕緣膜18aa;且藉由第1絕緣膜18aa的壓縮應力而翹曲。 The piezoelectric transducer 1 is configured to constitute a beam portion 12a: a part of the ruthenium layer 10c, and a part of the insulating film 18a formed on one surface side in the thickness direction of the ruthenium layer 10c. Here, the insulating film 18a has a compressive stress. Therefore, the beam portion 12a is configured by the first layer 10ca of the portion of the layer 10c that constitutes the beam portion 12a, and the one surface of the insulating layer 18a that is formed in the thickness direction of the first layer 10ca. The first insulating film 18aa at the portion is warped by the compressive stress of the first insulating film 18aa.
又,壓電轉換裝置1係利用下述者來構成突出部12c:矽層10c的一部分;以及形成於矽層10c之厚度方向的一面側之絕緣膜18a的一部分。在此,絕緣膜18a具有壓縮應力。所以,突出部12c係利用下述者來構成:矽層10c之中構成突出部12c的部位之第2矽層10cc;以及絕緣膜18a之中形成於第2矽層10cc之厚度方向的一面側之部位的第2絕緣膜18ac;且藉由第2絕緣膜18ac之壓縮應力而翹曲。 Further, the piezoelectric transducer 1 is configured to constitute a protruding portion 12c: a part of the ruthenium layer 10c; and a part of the insulating film 18a formed on one surface side in the thickness direction of the ruthenium layer 10c. Here, the insulating film 18a has a compressive stress. Therefore, the protruding portion 12c is configured by the second 矽 layer 10cc at the portion of the 矽 layer 10c constituting the protruding portion 12c, and the one surface side of the insulating film 18a formed in the thickness direction of the second 矽 layer 10cc. The second insulating film 18ac at the portion is warped by the compressive stress of the second insulating film 18ac.
壓電轉換裝置1中,形成於基板10之第1表面側的絕緣膜18a不僅具有將基板10與壓電轉換部14電性絕緣之功能,還具有使樑部12a及突出部12c翹曲的功能。藉此,壓電轉換裝置1,比起在絕緣膜18a外另外分別於樑部12a及突出部12c形成應力控制用的薄膜之情形而言,可使製造過程 簡化。 In the piezoelectric conversion device 1, the insulating film 18a formed on the first surface side of the substrate 10 not only has a function of electrically insulating the substrate 10 from the piezoelectric conversion portion 14, but also has the beam portion 12a and the protruding portion 12c warped. Features. Thereby, the piezoelectric conversion device 1 can make the manufacturing process as compared with the case where the film for stress control is formed on the beam portion 12a and the protruding portion 12c separately from the insulating film 18a. simplify.
基板10不限於SOI基板,亦可使用單晶矽基板、多晶矽基板、氧化鎂(MgO)基板、金屬基板、玻璃基板、以及聚合物基板等。 The substrate 10 is not limited to the SOI substrate, and a single crystal germanium substrate, a polycrystalline germanium substrate, a magnesium oxide (MgO) substrate, a metal substrate, a glass substrate, a polymer substrate, or the like can be used.
框架部11其框狀的形狀宜採用矩形框狀。亦即,框架部11宜係外周形狀為矩形。另,矩形不僅意指長方形,亦包含正方形。藉此,壓電轉換裝置1可在製造時提昇晶片切割步驟之作業性。在壓電轉換裝置1之製造時,例如首先準備SOI晶圓,作為要成為框架部11、樑部12a、配重部12b及突出部12c之基礎的晶圓。壓電轉換裝置1之製造時,進行於晶圓形成多數壓電轉換裝置1的前步驟,並在後步驟中利用晶片切割步驟來分離成各個壓電轉換裝置1。另,壓電轉換裝置1之製造方法將述於後。 The frame portion 11 preferably has a frame shape and a rectangular frame shape. That is, the frame portion 11 should preferably have a rectangular outer shape. In addition, a rectangle means not only a rectangle but also a square. Thereby, the piezoelectric conversion device 1 can enhance the workability of the wafer cutting step at the time of manufacture. At the time of manufacture of the piezoelectric transducer 1, for example, an SOI wafer is first prepared as a wafer to be the basis of the frame portion 11, the beam portion 12a, the weight portion 12b, and the protruding portion 12c. In the manufacture of the piezoelectric conversion device 1, the previous steps of forming a plurality of piezoelectric conversion devices 1 on a wafer are performed, and in the subsequent steps, the respective piezoelectric conversion devices 1 are separated by a wafer cutting step. Further, the manufacturing method of the piezoelectric conversion device 1 will be described later.
框架部11的內周形狀不限於矩形,亦可係例如矩形以外的多邊形、圓形或楕圓形等形狀。另,框架部11的外周形狀亦可係矩形以外的形狀。 The inner peripheral shape of the frame portion 11 is not limited to a rectangular shape, and may be a shape such as a polygon other than a rectangle, a circle, or an ellipse. Further, the outer peripheral shape of the frame portion 11 may be a shape other than a rectangle.
壓電轉換裝置1將振動區塊12配置於俯視時框架部11之內側。壓電轉換裝置1在基板10形成有於俯視時包圍振動區塊12的U字形之狹縫10d。U字形的狹縫10d係將振動區塊12中與框架部11之連結部位以外的部分,與框架部11空間性隔開。藉此,振動區塊12之俯視形狀形成為矩形。壓電轉換裝置1中,狹縫10d構成流道15。 The piezoelectric transducer 1 arranges the vibration block 12 inside the frame portion 11 in plan view. The piezoelectric conversion device 1 is formed with a U-shaped slit 10d that surrounds the vibration block 12 in a plan view on the substrate 10. The U-shaped slit 10d spatially separates the portion other than the joint portion of the vibration block 12 with the frame portion 11 from the frame portion 11. Thereby, the planar shape of the vibration block 12 is formed in a rectangular shape. In the piezoelectric conversion device 1, the slit 10d constitutes the flow path 15.
壓電轉換部14形成於絕緣膜18a上。壓電轉換部14從樑部12a側起依序具有:第1電極(下部電極)14a、壓電體層14b、及第2電極(上部電極)14c。亦即,壓電轉換部14包含:壓電體層14b;以及第1電極14a、及第2電極14c,從厚度方向的兩側夾著壓電體層14b而成對向。 The piezoelectric conversion portion 14 is formed on the insulating film 18a. The piezoelectric transducer 14 has a first electrode (lower electrode) 14a, a piezoelectric layer 14b, and a second electrode (upper electrode) 14c in this order from the side of the beam portion 12a. In other words, the piezoelectric transducer portion 14 includes the piezoelectric layer 14b, and the first electrode 14a and the second electrode 14c, which are opposed to each other with the piezoelectric layer 14b interposed therebetween from both sides in the thickness direction.
壓電轉換裝置1藉由振動區塊12之振動使得壓電轉換部14的壓電體層14b承受應力,在第2電極14c與第1電極14a產生電荷不平衡,而在壓電轉換部14中產生交流電壓。所以,壓電轉換裝置1係壓電轉換部14利 用壓電材料之壓電效果來產生交流電壓。壓電轉換裝置1可使用作為振動型的發電裝置。 In the piezoelectric transducer device 1, the piezoelectric layer 14b of the piezoelectric transducer portion 14 is subjected to stress by the vibration of the vibration block 12, and a charge imbalance occurs in the second electrode 14c and the first electrode 14a, and in the piezoelectric transducer portion 14 Generate an AC voltage. Therefore, the piezoelectric conversion device 1 is a piezoelectric conversion portion 14 The piezoelectric effect of the piezoelectric material is used to generate an alternating voltage. The piezoelectric conversion device 1 can be used as a vibration type power generation device.
壓電體層14b的平面形狀可形成為矩形。壓電體層14b的平面尺寸設定為略小於第1電極14a的平面尺寸,且略大於第2電極14c的平面尺寸。以下中,將振動區塊12之厚度方向中,第1電極14a、壓電體層14b、與第2電極14c所重疊的區域稱為壓電轉換區域。 The planar shape of the piezoelectric body layer 14b may be formed in a rectangular shape. The planar size of the piezoelectric layer 14b is set to be slightly smaller than the planar size of the first electrode 14a and slightly larger than the planar size of the second electrode 14c. Hereinafter, in the thickness direction of the vibration block 12, the region where the first electrode 14a, the piezoelectric layer 14b, and the second electrode 14c overlap is referred to as a piezoelectric conversion region.
壓電轉換裝置1在俯視時,連結支持部11a與振動區塊12的方向,將壓電轉換區域之支持部11a側的端,對齊於支持部11a與振動區塊12之邊界,即第1邊界。藉此,相較於使壓電轉換區域之支持部11a側的端位於比第1邊界更靠振動區塊12側之情形而言,壓電轉換裝置1可使振動區塊12振動時,應力變大的部分所存在之壓電轉換區域的面積增大,而能提昇壓電轉換效率。 The piezoelectric transducer 1 connects the support portion 11a and the vibration block 12 in a plan view, and aligns the end of the piezoelectric conversion region on the support portion 11a side with the boundary between the support portion 11a and the vibration block 12, that is, the first boundary. Thereby, the piezoelectric transducer 1 can vibrate the vibration block 12 as compared with the case where the end of the piezoelectric conversion region on the support portion 11a side is located closer to the vibration block 12 than the first boundary. The area of the piezoelectric conversion region where the enlarged portion is increased increases the piezoelectric conversion efficiency.
又,壓電轉換裝置1在俯視時,連結支持部11a與振動區塊12的方向,將壓電轉換區域之配重部12b側的端,對齊樑部12a與配重部12b之邊界,即第2邊界。藉此,相較於使壓電轉換區域之配重部12b側的端位於比第2邊界更靠樑部12a側之情形而言,壓電轉換裝置1可使振動區塊12振動時,應力變大的部分所存在之壓電轉換區域的面積增大,而能提昇壓電轉換效率。 Further, the piezoelectric transducer 1 connects the support portion 11a and the vibration block 12 in a plan view, and the end of the piezoelectric conversion region on the side of the weight portion 12b is aligned with the boundary between the beam portion 12a and the weight portion 12b. The second boundary. Thereby, the piezoelectric transducer 1 can vibrate the vibration block 12 as compared with the case where the end on the weight portion 12b side of the piezoelectric conversion region is located closer to the beam portion 12a than the second boundary. The area of the piezoelectric conversion region where the enlarged portion is increased increases the piezoelectric conversion efficiency.
壓電轉換部14所產生的交流電壓成為因應於壓電體層14b之振動的正弦波形之交流電壓。壓電轉換裝置1的壓電轉換部14可藉由流體在流道15流動而產生的自誘發振動來發電。壓電轉換裝置1之共振頻率係由振動區塊12之結構參數及材料等來決定。 The AC voltage generated by the piezoelectric transducer 14 is an AC voltage in response to the sinusoidal waveform of the vibration of the piezoelectric layer 14b. The piezoelectric conversion portion 14 of the piezoelectric conversion device 1 can generate electric power by self-induced vibration generated by the flow of the fluid in the flow path 15. The resonance frequency of the piezoelectric conversion device 1 is determined by the structural parameters, materials, and the like of the vibration block 12.
壓電轉換裝置1在支持部11a中設有第1焊墊電極17a,經由第1配線16a而電性連接於第1電極14a。壓電轉換裝置1在支持部11a中設有第2焊墊電極17c,經由第2配線16c而電性連接於第2電極14c。第1配線16a、 第2配線16c、第1焊墊電極17a及第2焊墊電極17c之材料係採用Au,但不限於Au,亦可係例如Mo、Al、Pt、Ir等。又,第1配線16a、第2配線16c、第1焊墊電極17a及第2焊墊電極17c之材料不限於相同的材料,亦可個別採用不同的材料。 In the piezoelectric transducer device 1, the first pad electrode 17a is provided in the support portion 11a, and is electrically connected to the first electrode 14a via the first wiring 16a. In the piezoelectric transducer device 1, the second pad electrode 17c is provided in the support portion 11a, and is electrically connected to the second electrode 14c via the second wiring 16c. First wiring 16a, The material of the second wiring 16c, the first pad electrode 17a, and the second pad electrode 17c is Au. However, it is not limited to Au, and may be, for example, Mo, Al, Pt, or Ir. Further, the materials of the first wiring 16a, the second wiring 16c, the first pad electrode 17a, and the second pad electrode 17c are not limited to the same material, and different materials may be used individually.
又,第1配線16a、第2配線16c、第1焊墊電極17a及第2焊墊電極17c係由單層構造的金屬層來構成。但第1配線16a、第2配線16c、第1焊墊電極17a及第2焊墊電極17c並不限於由單層構造的金屬層來構成,亦可利用2層以上的多層構造來構成。 Further, the first wiring 16a, the second wiring 16c, the first pad electrode 17a, and the second pad electrode 17c are formed of a metal layer having a single layer structure. However, the first wiring 16a, the second wiring 16c, the first pad electrode 17a, and the second pad electrode 17c are not limited to being formed of a metal layer having a single layer structure, and may be configured by a multilayer structure of two or more layers.
又,壓電轉換裝置1設有:絕緣層19,防止第2配線16c與第1電極14a之短路。絕緣層19係由氧化矽膜來構成。但絕緣層19不限於氧化矽膜,例如亦可由氮化矽膜來構成。 Further, the piezoelectric conversion device 1 is provided with an insulating layer 19 to prevent short-circuiting between the second wiring 16c and the first electrode 14a. The insulating layer 19 is composed of a hafnium oxide film. However, the insulating layer 19 is not limited to the hafnium oxide film, and may be formed, for example, of a tantalum nitride film.
壓電體層14b之壓電材料係採用PZT(Pb(Zr,Ti)O3)。但壓電材料不限於PZT(Pb(Zr,Ti)O3),例如亦可係PZT-PMN(Pb(Mn,Nb)O3)或添加其他不純物的PZT。又,壓電材料亦可係AlN、ZnO、KNN(K0.5Na0.5NbO3)或於KN(KNbO3)、NN(NaNbO3)、KNN添加不純物(例如Li、Nb、Ta、Sb、Cu等)者等。壓電轉換裝置1宜將壓電體層14b藉由壓電薄膜來構成。 The piezoelectric material of the piezoelectric layer 14b is PZT (Pb(Zr, Ti)O 3 ). However, the piezoelectric material is not limited to PZT (Pb(Zr, Ti)O 3 ), and may be, for example, PZT-PMN (Pb(Mn, Nb)O 3 ) or PZT to which other impurities are added. Moreover, the piezoelectric material may be AlN, ZnO, KNN (K 0.5 Na 0.5 NbO 3 ) or added impurities (such as Li, Nb, Ta, Sb, Cu, etc.) to KN (KNbO 3 ), NN (NaNbO 3 ), and KNN. ) and so on. The piezoelectric transducer device 1 preferably has a piezoelectric layer 14b formed of a piezoelectric film.
第1電極14a之材料係採用Pt,但不限於Pt,例如亦可係Au、Al、Ir等。又,第2電極14c之材料係採用Au,但不限於Au,例如亦可係Mo、Al、Pt、Ir等。 The material of the first electrode 14a is Pt, but is not limited to Pt, and may be, for example, Au, Al, Ir or the like. Further, the material of the second electrode 14c is Au, but is not limited to Au, and may be, for example, Mo, Al, Pt, Ir or the like.
壓電轉換裝置1設定第1電極14a之厚度為500nm、壓電體層14b之厚度為3000nm、第2電極14c之厚度為500nm,但此等數值僅係一例,並無特別限定。 The piezoelectric transducer 1 sets the thickness of the first electrode 14a to 500 nm, the thickness of the piezoelectric layer 14b to 3000 nm, and the thickness of the second electrode 14c to 500 nm. However, these numerical values are merely examples and are not particularly limited.
壓電轉換裝置1亦可係於基板10與第1電極14a之間設置緩衝層的構造。緩衝層係用於提昇第1電極14a上的壓電體層14b之結晶性。緩衝層 之材料只要因應於壓電體層14b的壓電材料來適當選擇即可。壓電體層14b之壓電材料為PZT之情況,宜採用例如SrRuO3、(Pb,La)TiO3、PbTiO3、MgO、LaNiO3等。又,緩衝層亦可由例如Pt膜與SrRuO3膜之疊層膜來構成。另,壓電轉換裝置1藉由設置緩衝層,而能提昇壓電體層14b之結晶性。 The piezoelectric conversion device 1 may be a structure in which a buffer layer is provided between the substrate 10 and the first electrode 14a. The buffer layer serves to enhance the crystallinity of the piezoelectric layer 14b on the first electrode 14a. The material of the buffer layer may be appropriately selected in accordance with the piezoelectric material of the piezoelectric layer 14b. In the case where the piezoelectric material of the piezoelectric layer 14b is PZT, for example, SrRuO 3 , (Pb, La)TiO 3 , PbTiO 3 , MgO, LaNiO 3 or the like is preferably used. Further, the buffer layer may be formed of, for example, a laminated film of a Pt film and a SrRuO 3 film. Further, the piezoelectric conversion device 1 can improve the crystallinity of the piezoelectric layer 14b by providing a buffer layer.
壓電轉換裝置1之構成不限於上述例,例如亦可將沿著壓電轉換部14中的樑部12a之寬度方向(圖1A的上下方向)的方向之寬度尺寸縮小,並於1個樑部12a的一面側在上述寬度方向並排設置複數之壓電轉換部14。此時,壓電轉換裝置1可構成為將複數之壓電轉換部14之串聯電路的一端電性連接至第1焊墊電極17a,將串聯電路的另一端電性連接至第2焊墊電極17c。 The configuration of the piezoelectric transducer 1 is not limited to the above-described example. For example, the width of the beam portion 12a in the piezoelectric transducer portion 14 in the width direction (the vertical direction of FIG. 1A) may be reduced in size and applied to one beam. On one surface side of the portion 12a, a plurality of piezoelectric conversion portions 14 are arranged side by side in the width direction. In this case, the piezoelectric conversion device 1 can be configured to electrically connect one end of the series circuit of the plurality of piezoelectric conversion portions 14 to the first pad electrode 17a, and electrically connect the other end of the series circuit to the second pad electrode. 17c.
以下說明壓電轉換裝置1之製造方法。 A method of manufacturing the piezoelectric conversion device 1 will be described below.
於壓電轉換裝置1的製造時,首先,準備由SOI基板所構成的基板10(參照圖2A),其後進行第1步驟。在第1步驟中,利用熱氧化法等,於基板10的第1表面側形成由氧化矽膜所構成的絕緣膜18a,並且於基板10的另一表面,即第2表面側,形成由氧化矽膜所構成的絕緣膜18b(參照圖2B)。在第1步驟中,係採用熱氧化法來作為形成絕緣膜18a及絕緣膜18b的方法,但不限於熱氧化法,亦可採用CVD法等。 At the time of manufacture of the piezoelectric transducer 1, first, the substrate 10 composed of the SOI substrate is prepared (see FIG. 2A), and then the first step is performed. In the first step, an insulating film 18a made of a hafnium oxide film is formed on the first surface side of the substrate 10 by thermal oxidation or the like, and is formed on the other surface of the substrate 10, that is, on the second surface side. An insulating film 18b made of a ruthenium film (see FIG. 2B). In the first step, a thermal oxidation method is employed as the method of forming the insulating film 18a and the insulating film 18b. However, it is not limited to the thermal oxidation method, and a CVD method or the like may be employed.
在壓電轉換裝置1之製造方法中,於第1步驟之後依序進行第2步驟、第3步驟。在第2步驟中,於基板10的第1表面側整面形成第1導電層,作為第1電極14a及第1配線16a之基礎。在第2步驟中,就形成第1導電層的方法而言係採用濺鍍法,但不限於濺鍍法,例如亦可採用CVD法或蒸鍍法等。在第3步驟中,形成作為壓電體層14b之基礎的壓電材料層。在第3步驟中形成壓電材料層的方法係採用濺鍍法,但不限於濺鍍法,例如亦可採用CVD法或溶膠凝膠法等。 In the method of manufacturing the piezoelectric transducer 1, the second step and the third step are sequentially performed after the first step. In the second step, the first conductive layer is formed on the entire surface side of the first surface of the substrate 10 as the basis of the first electrode 14a and the first wiring 16a. In the second step, the sputtering method is used for the method of forming the first conductive layer. However, the sputtering method is not limited thereto, and for example, a CVD method or a vapor deposition method may be employed. In the third step, a piezoelectric material layer which is the basis of the piezoelectric layer 14b is formed. The method of forming the piezoelectric material layer in the third step is a sputtering method, but is not limited to the sputtering method. For example, a CVD method or a sol-gel method may be employed.
在壓電轉換裝置1之製造方法中,於第3步驟之後依序進行第4步驟、第5步驟。在第4步驟中,利用微影技術及蝕刻技術,將壓電材料層圖案化成壓電體層14b之既定形狀。在第5步驟,利用微影技術及蝕刻技術,將第1導電層圖案化成第1電極14a及第1配線16a之既定形狀。 In the method of manufacturing the piezoelectric transducer 1, the fourth step and the fifth step are sequentially performed after the third step. In the fourth step, the piezoelectric material layer is patterned into a predetermined shape of the piezoelectric body layer 14b by a lithography technique and an etching technique. In the fifth step, the first conductive layer is patterned into a predetermined shape of the first electrode 14a and the first wiring 16a by a lithography technique and an etching technique.
在壓電轉換裝置1之製造方法中,於第5步驟之後依序進行第6步驟、第7步驟、第8步驟。在第6步驟中,於基板10的第1表面側形成絕緣層19。在第6步驟中,利用掀離法(lift-off)來形成絕緣層19。在第6步驟中形成絕緣層19的方法不限於掀離法。在第7步驟中,於基板10的第1表面側整面形成第2導電層,作為第2電極14c及第2配線16c之基礎。在第7步驟中形成第2導電層的方法係採用濺鍍法,但不限於濺鍍法,例如亦可採用CVD法或蒸鍍法等。在第8步驟中,利用微影技術及蝕刻技術,將第2導電層圖案化成第2電極14c及第2配線16c之既定形狀(參照圖2C)。 In the method of manufacturing the piezoelectric transducer 1, the sixth step, the seventh step, and the eighth step are sequentially performed after the fifth step. In the sixth step, the insulating layer 19 is formed on the first surface side of the substrate 10. In the sixth step, the insulating layer 19 is formed by lift-off. The method of forming the insulating layer 19 in the sixth step is not limited to the detachment method. In the seventh step, the second conductive layer is formed on the entire surface side of the first surface of the substrate 10 as the basis of the second electrode 14c and the second wiring 16c. Although the method of forming the second conductive layer in the seventh step is a sputtering method, it is not limited to the sputtering method, and for example, a CVD method or a vapor deposition method may be employed. In the eighth step, the second conductive layer is patterned into a predetermined shape of the second electrode 14c and the second wiring 16c by a lithography technique and an etching technique (see FIG. 2C).
在壓電轉換裝置1之製造方法中,於第8步驟之後依序進行第9步驟、第10步驟。在第9步驟中,於基板10的第1表面側整面形成第3導電層,作為第1焊墊電極17a及第2焊墊電極17c之基礎。在第9步驟中形成第3導電層的方法係採用濺鍍法,但不限於濺鍍法,例如亦可採用CVD法或蒸鍍法等。在第10步驟中,利用微影技術及蝕刻技術,將第3導電層圖案化成第1焊墊電極17a及第2焊墊電極17c之既定形狀。在壓電轉換裝置1之製造方法中,亦可利用掀離法來形成第1焊墊電極17a及第2焊墊電極17c,以取代依序進行的第9步驟與第10步驟。又,在壓電轉換裝置1之製造方法中,亦可利用金屬遮罩等,而藉由蒸鍍法等來形成第1焊墊電極17a及第2焊墊電極17c,以取代依序進行的第9步驟與第10步驟。 In the method of manufacturing the piezoelectric transducer 1, the ninth step and the tenth step are sequentially performed after the eighth step. In the ninth step, the third conductive layer is formed on the entire surface side of the first surface of the substrate 10 as the basis of the first pad electrode 17a and the second pad electrode 17c. Although the method of forming the third conductive layer in the ninth step is a sputtering method, it is not limited to the sputtering method, and for example, a CVD method or a vapor deposition method may be employed. In the tenth step, the third conductive layer is patterned into a predetermined shape of the first pad electrode 17a and the second pad electrode 17c by a lithography technique and an etching technique. In the method of manufacturing the piezoelectric transducer 1, the first pad electrode 17a and the second pad electrode 17c may be formed by a lift-off method instead of the ninth step and the tenth step which are sequentially performed. Further, in the method of manufacturing the piezoelectric transducer 1, the first pad electrode 17a and the second pad electrode 17c may be formed by a vapor deposition method or the like by using a metal mask or the like instead of sequentially. Step 9 and step 10.
在壓電轉換裝置1之製造方法中,於第10步驟之後依序進行第11步驟、第12步驟。在第11步驟中,從基板10的第1表面側起,將狹縫10d的預定形成區域蝕刻直到第1既定深度,藉以形成第1溝槽10h(參照圖2D)。狹縫10d之預定形成區域可定為在到第10步驟結束的基板10中,對應於支持部11a、對向部11b、各連結部11c、樑部12a、配重部12b及突出 部12c之部分以外的部位。在第11步驟中,利用微影技術及蝕刻技術等,蝕刻絕緣膜18a及矽層10c,藉以形成第1溝槽10h。在第11步驟的蝕刻宜為採用可垂直深挖之感應耦合電漿型乾蝕刻裝置的乾蝕刻。在第11步驟中,可利用基板10之埋入氧化膜10b來作為蝕刻阻擋層。在第12步驟中,從基板10的第2表面側起,排除對應於支持部11a、對向部11b、各連結部11c及配重部12b的部位,蝕刻直到第2既定深度,藉以形成第2溝槽10i(參照圖2E)。在第12步驟中,利用微影技術及蝕刻技術等,蝕刻絕緣膜18b及矽基板10a,藉以形成第2溝槽10i。在第12步驟之蝕刻宜為使用可垂直深挖的感應耦合電漿型之乾蝕刻裝置的乾蝕刻。在第12步驟中,可利用基板10之埋入氧化膜10b來作為蝕刻阻擋層。壓電轉換裝置1之製造方法亦可使第11步驟與第12步驟之順序相反。 In the method of manufacturing the piezoelectric transducer 1, the eleventh step and the twelfth step are sequentially performed after the tenth step. In the eleventh step, the predetermined formation region of the slit 10d is etched from the first surface side of the substrate 10 to the first predetermined depth, thereby forming the first trench 10h (see FIG. 2D). The predetermined formation region of the slit 10d can be set to correspond to the support portion 11a, the opposing portion 11b, the respective coupling portions 11c, the beam portion 12a, the weight portion 12b, and the projection in the substrate 10 that has been completed in the tenth step. A portion other than the portion of the portion 12c. In the eleventh step, the insulating film 18a and the germanium layer 10c are etched by a lithography technique, an etching technique, or the like to form the first trench 10h. The etching in the eleventh step is preferably dry etching using an inductively coupled plasma type dry etching apparatus which can vertically dig deep. In the eleventh step, the buried oxide film 10b of the substrate 10 can be used as an etching stopper. In the twelfth step, the portions corresponding to the support portion 11a, the opposing portion 11b, the respective connecting portions 11c, and the weight portion 12b are removed from the second surface side of the substrate 10, and are etched up to the second predetermined depth to form the first 2 groove 10i (refer to Fig. 2E). In the twelfth step, the insulating film 18b and the germanium substrate 10a are etched by a lithography technique, an etching technique, or the like to form the second trench 10i. The etching in the twelfth step is preferably dry etching using an inductively coupled plasma type dry etching apparatus which can vertically dig deep. In the twelfth step, the buried oxide film 10b of the substrate 10 can be used as an etching stopper. The manufacturing method of the piezoelectric conversion device 1 can also reverse the order of the eleventh step and the twelfth step.
在壓電轉換裝置1之製造方法中,於第11步驟、第12步驟之後進行第13步驟。在第13步驟中,係將埋入氧化膜10b之中,分別存在於狹縫10d之預定形成區域、樑部12a之預定形成區域及突出部12c之預定形成區域的部分加以蝕刻。壓電轉換裝置1之製造方法係藉由進行第13步驟來形成狹縫10d、樑部12a及突出部12c(參照圖2F)。又,在第13步驟中蝕刻埋入氧化膜10b及絕緣膜18b。在壓電轉換裝置1之製造方法中,藉由進行從第1步驟到第13步驟為止的步驟,獲得壓電轉換裝置1。 In the method of manufacturing the piezoelectric conversion device 1, the thirteenth step is performed after the eleventh step and the twelfth step. In the thirteenth step, the oxide film 10b is buried in the predetermined formation region of the slit 10d, the predetermined formation region of the beam portion 12a, and the portion of the predetermined formation region of the projection portion 12c, and are etched. In the manufacturing method of the piezoelectric transducer 1, the slit 10d, the beam portion 12a, and the protruding portion 12c are formed by performing the thirteenth step (see FIG. 2F). Further, in the thirteenth step, the buried oxide film 10b and the insulating film 18b are etched. In the manufacturing method of the piezoelectric transducer 1, the piezoelectric transducer 1 is obtained by performing the steps from the first step to the thirteenth step.
在壓電轉換裝置1之製造中,能以晶圓層級進行到第13步驟結束為止,而後藉由進行晶片切割步驟來分割成各個壓電轉換裝置1。 In the manufacture of the piezoelectric transducer 1, the wafer level can be completed until the end of the thirteenth step, and then divided into the respective piezoelectric transducers 1 by performing a wafer dicing step.
在壓電轉換裝置1之製造方法中,在第13步驟藉由蝕刻埋入氧化膜10b來形成振動區塊12時,可使振動區塊12翹曲。壓電轉換裝置1藉由絕緣膜18a的內部應力,即壓縮應力,使得振動區塊12翹曲。在壓電轉換裝置1之製造方法中,可藉由於絕緣膜18a之形成時,適當設定絕緣膜18a之製程條件來控制絕緣膜18a的內部應力。絕緣膜18a的內部應力,在例如藉由熱氧化法來形成絕緣膜18a之情形,可藉由適當設定氧化溫度等製程條件來控制。又,絕緣膜18a的內部應力,在例如藉由濺鍍法或CVD法將絕緣 膜18a成膜之情形,可藉由適當設定氣壓或溫度等製程條件來控制。 In the manufacturing method of the piezoelectric conversion device 1, when the vibration block 12 is formed by etching the buried oxide film 10b in the thirteenth step, the vibration block 12 can be warped. The piezoelectric conversion device 1 warps the vibration block 12 by the internal stress of the insulating film 18a, that is, the compressive stress. In the method of manufacturing the piezoelectric conversion device 1, the internal stress of the insulating film 18a can be controlled by appropriately setting the process conditions of the insulating film 18a when the insulating film 18a is formed. The internal stress of the insulating film 18a can be controlled by, for example, setting the insulating film 18a by thermal oxidation. Further, the internal stress of the insulating film 18a is insulated, for example, by sputtering or CVD. The film formation of the film 18a can be controlled by appropriately setting process conditions such as gas pressure or temperature.
壓電轉換裝置1在振動區塊12沒有外部振動或流體等作用的初始狀態下,振動區塊12翹曲成突出部12c之前端面12cc的法線與對向部11b不交叉。振動區塊12因為突出部12c翹曲,所以能使沿著突出部12c之前端面12cc的面,以及沿著與支持部11a對向的對向部11b的面相交叉。在此,振動區塊12翹曲成厚度方向的一面側為凹曲面狀,另一面側為凸曲面狀。 In the initial state in which the vibration block 12 does not have external vibration or fluid or the like, the piezoelectric block 1 is warped so that the normal line of the end surface 12cc before the projection 12c does not intersect the opposite portion 11b. Since the vibrating block 12 is warped by the protruding portion 12c, it is possible to cross the surface of the front end surface 12cc along the protruding portion 12c and the surface of the opposing portion 11b that faces the support portion 11a. Here, the one side of the vibration block 12 in the thickness direction is a concave curved surface, and the other surface side is a convex curved surface.
壓電轉換裝置1係配置成如下方式使用:當欲使振動區塊12進行流體誘發振動時,基板10的第1表面側為流體之上游側,基板10的第2表面側為流體之下游側。換言之,壓電轉換裝置1配置成如下方式使用:對向部11b之厚度方向的一面(圖1B的頂面)側為流體之上游側,對向部11b之厚度方向的另一面(圖1B的底面)側為流體之下游側。在壓電轉換裝置1中,從上游側朝向壓電轉換裝置1流動的流體通過流道15時的流速變快。壓電轉換裝置1在流體之流速變快後,配重部12b、突出部12c及對向部11b所包圍的空間10f之壓力下降,使得突出部12c往靠近對向部11b位移。換言之,壓電轉換裝置1中,突出部12c往空間10f側位移。並且,推測在此壓電轉換裝置1中,突出部12c之厚度方向的兩側之壓力差消失後,由於振動區塊12之彈性力而使得振動區塊12回到原來位置的力會起作用。推測壓電轉換裝置1藉由重複此種動作,使得振動區塊12進行自誘發振動,而在壓電轉換部14產生交流電壓。 The piezoelectric transducer 1 is disposed such that when the vibration block 12 is to be subjected to fluid-induced vibration, the first surface side of the substrate 10 is the upstream side of the fluid, and the second surface side of the substrate 10 is the downstream side of the fluid. . In other words, the piezoelectric conversion device 1 is disposed such that one side (top surface of FIG. 1B) in the thickness direction of the opposing portion 11b is the upstream side of the fluid and the other side in the thickness direction of the opposing portion 11b (FIG. 1B) The bottom side is the downstream side of the fluid. In the piezoelectric conversion device 1, the flow velocity when the fluid flowing from the upstream side toward the piezoelectric conversion device 1 passes through the flow passage 15 becomes faster. In the piezoelectric transducer device 1, after the flow velocity of the fluid is increased, the pressure of the weight portion 12b, the protruding portion 12c, and the space 10f surrounded by the opposing portion 11b is lowered, so that the protruding portion 12c is displaced toward the opposing portion 11b. In other words, in the piezoelectric conversion device 1, the protruding portion 12c is displaced toward the space 10f side. Further, in the piezoelectric transducer device 1, it is presumed that after the pressure difference between the both sides in the thickness direction of the protruding portion 12c disappears, the force of the vibration block 12 returning to the original position due to the elastic force of the vibration block 12 acts. . It is presumed that the piezoelectric transducer 1 repeats such an operation to cause the vibration block 12 to self-induced vibration, and an alternating voltage is generated in the piezoelectric transducer 14.
以上說明的本實施形態之壓電轉換裝置1包含:支持部11a;對向部11b,與支持部11a成對向;以及振動區塊12,位於支持部11a與對向部11b之間,一端固定於支持部11a,另一端與對向部11b隔開。振動區塊12包含:樑部12a;配重部12b;突出部12c;以及壓電轉換部14。樑部12a薄於支持部11a,受支持部11a自由搖擺地支持。配重部12b設於樑部12a之前端,厚於樑部12a。突出部12c朝向與配重部12b中的樑部12a側之相反側突出,且薄於配重部12b及對向部11b。壓電轉換部14因應於樑部12a的振動而產生交流電壓。振動區塊12翹曲成突出部12c的前端面12cc之法 線與對向部11b不交叉。藉此,壓電轉換裝置1能進行流體誘發振動,且達到提昇流體誘發振動時之壓電轉換效率。 The piezoelectric transducer 1 of the present embodiment described above includes a support portion 11a, the opposite portion 11b is opposed to the support portion 11a, and the vibration block 12 is located between the support portion 11a and the opposite portion 11b. It is fixed to the support portion 11a, and the other end is spaced apart from the opposite portion 11b. The vibration block 12 includes a beam portion 12a, a weight portion 12b, a protruding portion 12c, and a piezoelectric conversion portion 14. The beam portion 12a is thinner than the support portion 11a, and the supported portion 11a is supported freely swinging. The weight portion 12b is provided at the front end of the beam portion 12a and thicker than the beam portion 12a. The protruding portion 12c protrudes toward the side opposite to the side of the beam portion 12a in the weight portion 12b, and is thinner than the weight portion 12b and the opposing portion 11b. The piezoelectric transducer 14 generates an AC voltage in response to the vibration of the beam portion 12a. The method in which the vibration block 12 is warped into the front end surface 12cc of the protruding portion 12c The line does not intersect the opposite portion 11b. Thereby, the piezoelectric conversion device 1 can perform fluid-induced vibration and achieve piezoelectric conversion efficiency when the fluid-induced vibration is increased.
此外,本案發明人特地研究的結果,得知有時因為壓電轉換裝置1之結構參數使得在低流速域不會誘發振動。又,本案發明人得知,有時因為壓電轉換裝置1之結構參數,隨著流速增加之振幅增加會達到飽和,使得壓電轉換效率將會飽和。 Further, as a result of a special study by the inventors of the present invention, it has been found that sometimes the vibration is not induced in the low flow velocity region due to the structural parameters of the piezoelectric conversion device 1. Further, the inventors of the present invention have learned that sometimes due to the structural parameters of the piezoelectric transducer 1, the amplitude increases as the flow rate increases, and the piezoelectric conversion efficiency is saturated.
所以,作為振動區塊12之結構參數,如圖3所示,在振動區塊12未翹曲的狀態之俯視時,假定樑部12a之寬度為Ha,配重部12b之寬度為Hb,樑部12a之長度為La,配重部12b之長度為Lb。並且,本案發明人製作複數之壓電轉換裝置1,將樑部12a之寬度Ha與配重部12b之寬度Hb定為相同,並使得將配重部12b之長度Lb除以配重部12b的長度Lb與樑部12a的長度La之和後的值再乘以100後之值不同。以下,將配重部12b之長度Lb除以配重部12b的長度Lb與樑部12a的長度La之和後的值再乘以100後之值,稱為配重部12b的比例R。圖4係集合分別對於各壓電轉換裝置1測定共振頻率及流體誘發振動的發生臨界流速之結果,顯示共振頻率與流體誘發振動的發生臨界流速之關係。流體誘發振動的發生臨界流速係意指能夠發生振動區塊12之自誘發振動的流速之下限值。 Therefore, as the structural parameters of the vibration block 12, as shown in Fig. 3, in the plan view of the state in which the vibration block 12 is not warped, it is assumed that the width of the beam portion 12a is Ha, and the width of the weight portion 12b is Hb, the beam The length of the portion 12a is La, and the length of the weight portion 12b is Lb. Further, the inventors of the present invention produced a plurality of piezoelectric transducers 1, which set the width Ha of the beam portion 12a to the width Hb of the weight portion 12b, and divide the length Lb of the weight portion 12b by the weight portion 12b. The value obtained by multiplying the length Lb by the sum of the lengths La of the beam portions 12a is different from the value obtained by multiplying by 100. Hereinafter, the value obtained by dividing the length Lb of the weight portion 12b by the sum of the length Lb of the weight portion 12b and the length La of the beam portion 12a by 100 is referred to as the ratio R of the weight portion 12b. Fig. 4 is a graph showing the relationship between the resonance frequency and the critical flow velocity at which the fluid-induced vibration is generated by measuring the resonance frequency and the critical flow velocity of the fluid-induced vibration for each piezoelectric transducer 1. The critical flow rate at which the fluid induced vibration occurs is the lower limit of the flow rate at which the self-induced vibration of the vibration block 12 can occur.
本案發明人從圖4得知,發生臨界流速與共振頻率大致呈正比例關係,為了以低流速使振動區塊12進行振動,必須降低振動區塊12之共振頻率。 The inventor of the present invention knows from Fig. 4 that the critical flow velocity is approximately proportional to the resonance frequency, and in order to vibrate the vibration block 12 at a low flow velocity, the resonance frequency of the vibration block 12 must be lowered.
圖5至圖7顯示每種配重部12b之比例R的壓電轉換裝置1之振動特性的測定結果。圖5至圖7中,橫軸為流體之流速,縱軸為振動區塊12之振幅。配重部12b之比例R在La=Lb時成為50%。 5 to 7 show the measurement results of the vibration characteristics of the piezoelectric transducer 1 of the ratio R of each weight portion 12b. In FIGS. 5 to 7, the horizontal axis represents the flow velocity of the fluid, and the vertical axis represents the amplitude of the vibration block 12. The ratio R of the weight portion 12b becomes 50% when La = Lb.
得到圖5之振動特性的壓電轉換裝置1,與得到圖6之振動特性的壓電轉換裝置1,係將樑部12a之寬度Ha及配重部12b之寬度Hb定為相同,配重部12b的長度Lb與樑部12a的長度La之和不同。得到圖6之振動特 性的壓電轉換裝置1,係La+Lb大於得到圖5之振動特性的壓電轉換裝置1者。又,得到圖7之振動特性的壓電轉換裝置1,係樑部12a之寬度Ha及配重部12b之寬度Hb短於得到圖6之振動特性的壓電轉換裝置1者,且係La+Lb大於得到圖6之振動特性的壓電轉換裝置1者。 The piezoelectric transducer 1 having the vibration characteristics of FIG. 5 and the piezoelectric transducer 1 for obtaining the vibration characteristics of FIG. 6 have the same width Ha of the beam portion 12a and the width Hb of the weight portion 12b, and the weight portion The length Lb of 12b is different from the sum of the lengths La of the beam portions 12a. Get the vibration of Figure 6 The piezoelectric conversion device 1 is a system in which La+Lb is larger than the piezoelectric conversion device 1 that obtains the vibration characteristics of FIG. Further, the piezoelectric transducer 1 having the vibration characteristics of FIG. 7 is obtained, and the width Ha of the tie beam portion 12a and the width Hb of the weight portion 12b are shorter than those of the piezoelectric transducer 1 which obtains the vibration characteristics of FIG. Lb is larger than the piezoelectric conversion device 1 which obtains the vibration characteristics of Fig. 6.
另,在圖5中,比例R=20%、50%各者的壓電轉換裝置1之振動區塊12的共振頻率分別係200Hz、170Hz。又,在圖6中,比例R=80%、50%及0%各者的壓電轉換裝置1之振動區塊12的共振頻率分別係150Hz、200Hz及300Hz。又,在圖7中,比例R=35%、65%各者的壓電轉換裝置1之振動區塊12的共振頻率分別係,80Hz、80Hz。 In addition, in FIG. 5, the resonance frequency of the vibration block 12 of the piezoelectric transducer 1 of the ratio R=20%, 50% is 200 Hz and 170 Hz, respectively. Further, in Fig. 6, the resonance frequencies of the vibration blocks 12 of the piezoelectric transducer 1 of the ratio R = 80%, 50%, and 0% are 150 Hz, 200 Hz, and 300 Hz, respectively. Further, in Fig. 7, the resonance frequencies of the vibration blocks 12 of the piezoelectric transducer 1 of the ratio R = 35% and 65% are respectively 80 Hz and 80 Hz.
從圖5至圖7可知,相對於在配重部12b之比例R為50%的壓電轉換裝置1中具有振動區塊12之振幅隨著流速增加而變大的傾向而言,比例R為0%、20%、35%、65%及80%各者的壓電轉換裝置1中具有振動區塊12的振幅隨著流速增加而飽和的傾向。就此點而言,本案發明人認為係因為在比例R為50%之壓電轉換裝置1中,可取得作為產生振動區塊12之復原力的彈性部分之樑部12a的面積,與承受流體流動所致的壓力之振動區塊12全體的面積之平衡。 5 to 7, it is understood that the piezoelectric transformer 1 having a ratio R of 50% in the weight portion 12b has a tendency that the amplitude of the vibration block 12 becomes larger as the flow velocity increases, and the ratio R is In the piezoelectric conversion device 1 of 0%, 20%, 35%, 65%, and 80%, the amplitude of the vibration block 12 tends to be saturated as the flow rate increases. In this regard, the inventors of the present invention considered that the area of the beam portion 12a which is the elastic portion which generates the restoring force of the vibration block 12 can be obtained in the piezoelectric transducer 1 having the ratio R of 50%, and the fluid flow is withstand The balance of the area of the vibration block 12 caused by the pressure.
圖8係顯示:配重部12b之比例R與自比例R為50%時的共振頻率的共振頻率之變化量,兩者關係之模擬結果。模擬係採用有限元素法的模態分析(固有值分析)。 Fig. 8 shows a simulation result of the relationship between the ratio R of the weight portion 12b and the resonance frequency of the resonance frequency when the ratio R is 50%. The simulation system uses modal analysis (inherent value analysis) of the finite element method.
圖8係:Ha=Hb;且La+Lb為固定值時的模擬結果。從圖8可知:壓電轉換裝置1在:Ha=Hb;且La+Lb為固定值,且將配重部12b之比例R定為50%時,共振頻率為最低。並且,如上述方式,為了以更低流速使振動區塊12進行振動,必須降低振動區塊12之共振頻率。換言之,壓電轉換裝置1定為:Ha=Hb;La+Lb為固定值,且將配重部12b之比例R定為50%時,若定為La=Lb,則能使流體誘發振動之發生臨界流速為最慢。又,從圖8而言,若將配重部12b的比例R定為40%以上60%以下,則共振頻 率之變化量為2%以下,配重部12b的質量之差為20%左右,樑部12a的剛性之差為20%左右,可期待與配重部12b之比例R為50%時相同程度之振動特性。 Fig. 8 is a simulation result when Ha = Hb; and La + Lb is a fixed value. As is clear from Fig. 8, the piezoelectric transducer 1 has a resonant frequency at the time when Ha = Hb and La + Lb is a fixed value and the ratio R of the weight portion 12b is 50%. Further, as described above, in order to vibrate the vibration block 12 at a lower flow rate, it is necessary to lower the resonance frequency of the vibration block 12. In other words, the piezoelectric conversion device 1 is defined as: Ha = Hb; La + Lb is a fixed value, and when the ratio R of the weight portion 12b is set to 50%, if La = Lb is determined, the fluid can be induced to vibrate. The critical flow rate is the slowest. Further, from Fig. 8, when the ratio R of the weight portion 12b is set to 40% or more and 60% or less, the resonance frequency is obtained. The amount of change in the rate is 2% or less, the difference in mass of the weight portion 12b is about 20%, and the difference in rigidity of the beam portion 12a is about 20%, and the ratio R to the weight portion 12b is expected to be 50%. Vibration characteristics.
從以上結果可知,壓電轉換裝置1宜係振動區塊12之俯視形狀為矩形,樑部12a之寬度Ha與配重部12b之寬度Hb為相同,且將配重部12b之長度Lb除以配重部12b的長度Lb與樑部12a的長度La之和的值在0.4以上0.6以下。藉此,壓電轉換裝置1能達到使得流體誘發振動之發生臨界流速低速化,且能達到提昇壓電轉換效率。 From the above results, it is understood that the piezoelectric transducer device 1 preferably has a rectangular shape in plan view, the width Ha of the beam portion 12a is the same as the width Hb of the weight portion 12b, and the length Lb of the weight portion 12b is divided by The value of the sum of the length Lb of the weight portion 12b and the length La of the beam portion 12a is 0.4 or more and 0.6 or less. Thereby, the piezoelectric conversion device 1 can achieve a critical flow rate at which the fluid-induced vibration occurs, and the piezoelectric conversion efficiency can be improved.
本實施形態之壓電轉換裝置1的第1變形例如圖9所示,係在下述點與圖1之構成不同:於對向部11b設有傾斜面10e,將突出部12c與對向部11b之距離加長。對向部11b係在:與支持部11a成對向的對向面,和對向部11b之厚度方向的上述一面,兩者之間設有傾斜面10e。藉此,在第1變形例之壓電轉換裝置1中,因為於對向部11b設有傾斜面10e,所以能使流體流道15更有效率地流動,而能提昇從流體能量到振動區塊12之振動能量的轉換效率。所以,第1變形例之壓電轉換裝置1能提升從流體能量轉換為電能量的轉換效率。 The first modification of the piezoelectric transducer 1 of the present embodiment is different from the configuration of FIG. 1 in that, for example, the inclined portion 10e is provided on the opposing portion 11b, and the protruding portion 12c and the opposing portion 11b are provided. The distance is longer. The opposing portion 11b is provided with an inclined surface 10e between the opposing surface facing the supporting portion 11a and the one surface of the opposing portion 11b in the thickness direction. As a result, in the piezoelectric transducer 1 of the first modification, since the inclined surface 10e is provided in the opposing portion 11b, the fluid flow path 15 can be more efficiently flowed, and the fluid energy can be raised to the vibration region. The conversion efficiency of the vibration energy of the block 12. Therefore, the piezoelectric conversion device 1 of the first modification can improve the conversion efficiency from the fluid energy to the electric energy.
本實施形態之壓電轉換裝置1的第2變形例如圖10所示,在下述點與圖1之構成不同:於振動區塊12中,在配重部12b之厚度方向的兩面之中遠離樑部12a的面上,形成有凹部12bb。藉此,相較於圖1之構成而言,在第2變形例之壓電轉換裝置1中可提高振動區塊12之固有頻率,而能對應於流速較快的流體能量來進行振動。另,凹部12bb之形狀並不特別限定。又,凹部12bb之數量不限定為1個,亦可係複數個。 The second modification of the piezoelectric transducer 1 of the present embodiment is different from the configuration of FIG. 1 in the following points: in the vibration block 12, the beam is separated from the beam in both directions of the thickness direction of the weight portion 12b. A concave portion 12bb is formed on the surface of the portion 12a. Thereby, compared with the configuration of FIG. 1, in the piezoelectric transducer 1 of the second modification, the natural frequency of the vibration block 12 can be increased, and vibration can be performed in accordance with the fluid energy having a relatively high flow velocity. Further, the shape of the concave portion 12bb is not particularly limited. Further, the number of the concave portions 12bb is not limited to one, and may be plural.
本案發明人,就壓電轉換裝置1的第2變形例而言,如圖11所示,規定在振動區塊12未翹曲的狀態之俯視時,樑部12a之寬度為Ha,配重部12b之寬度為Hb,樑部12a的長度為La,配重部12b的長度為Lb,來作為振動區塊12之結構參數。 In the second modification of the piezoelectric conversion device 1, as shown in FIG. 11, the inventor of the present invention defines a width of the beam portion 12a in a plan view in a state where the vibration block 12 is not warped, and the weight portion is The width of 12b is Hb, the length of the beam portion 12a is La, and the length of the weight portion 12b is Lb as a structural parameter of the vibration block 12.
圖12係顯示:將樑部12a之寬度Ha及配重部12b之寬度Hb定為相同,將配重部12b之比例R定為50%時,壓電轉換裝置1之第2變形例的振動特性之測定結果。圖12中,橫軸為流體之流速,縱軸為振動區塊12之振幅。振動區塊12之共振頻率係275Hz。得到圖12之振動特性的壓電轉換裝置1之第2變形例,與得到圖5之振動特性的壓電轉換裝置1,係樑部12a之寬度Ha及配重部12b之寬度Hb相同,且La+Lb亦相同。 Fig. 12 shows the vibration of the second modification of the piezoelectric transducer 1 when the width Ha of the beam portion 12a and the width Hb of the weight portion 12b are the same, and the ratio R of the weight portion 12b is 50%. The measurement result of the characteristic. In Fig. 12, the horizontal axis represents the flow velocity of the fluid, and the vertical axis represents the amplitude of the vibration block 12. The resonant frequency of the vibrating block 12 is 275 Hz. The second modification of the piezoelectric transducer 1 that obtains the vibration characteristics of FIG. 12 is the same as the width H of the tie beam portion 12a and the width Hb of the weight portion 12b, and the piezoelectric transducer 1 that obtains the vibration characteristics of FIG. La+Lb is also the same.
在第2變形例中,亦可知藉由與實施形態1之壓電轉換裝置1同樣地將配重部12b之比例R定為50%,而具有振幅隨著流速之增加而增加的傾向。從圖5至圖7及圖12的結果可知,即使共振頻率及流體誘發振動之發生臨界流速因為凹部12bb的有無而產生變化,但只要配重部12b之比例R係50%,即能使振幅隨著流速的增加而增大,而能達到提昇壓電轉換效率。 In the second modification, it is also known that the ratio R of the weight portion 12b is set to 50% in the same manner as in the piezoelectric transducer 1 of the first embodiment, and the amplitude tends to increase as the flow velocity increases. As is clear from the results of FIG. 5 to FIG. 7 and FIG. 12, even if the critical flow rate of the resonance frequency and the fluid-induced vibration changes due to the presence or absence of the concave portion 12bb, the amplitude can be made as long as the ratio R of the weight portion 12b is 50%. As the flow rate increases, the piezoelectric conversion efficiency can be improved.
另,評估獲得上述圖4至圖7及圖12所示測定結果的振動特性時,進行使用圓筒狀風洞的實驗。風洞係內徑為0.1m,長度為2m。在實驗中,於風洞內在風洞的流出口附近配置壓電轉換裝置1,並從風洞的流入口側使用風扇使氣流流入。在此實驗中,將壓電轉換裝置1固定成:支持部11相對於流場呈垂直,並藉由雷射都卜勒振動位移計,來測定振動區塊12之振幅。又在此實驗,係藉由風扇來改變流體之流速。 Further, when the vibration characteristics of the measurement results shown in FIGS. 4 to 7 and FIG. 12 were evaluated, an experiment using a cylindrical wind tunnel was performed. The wind tunnel has an inner diameter of 0.1 m and a length of 2 m. In the experiment, the piezoelectric transducer 1 was placed in the vicinity of the outlet of the wind tunnel in the wind tunnel, and a fan was used to flow the airflow from the inflow side of the wind tunnel. In this experiment, the piezoelectric conversion device 1 was fixed such that the support portion 11 was perpendicular to the flow field, and the amplitude of the vibration block 12 was measured by a laser Doppler vibration displacement meter. Also in this experiment, the flow rate of the fluid is changed by a fan.
第1變形例的壓電轉換裝置1中,亦可於配重部12b設置第2變形例的壓電轉換裝置1之凹部12bb。 In the piezoelectric transducer 1 of the first modification, the recess 12bb of the piezoelectric transducer 1 of the second modification may be provided in the weight portion 12b.
壓電轉換裝置1在使用作為發電裝置時,例如可利用作為致動器、感測器、固態發光元件、無線通信元件與運算元件等的電源。另,就感測器而言,例如有溫度感測器、加速度感測器與壓力感測器等。就固態發光元件而言,例如有發光二極體與半導體雷射等。就運算元件而言,例如有MPU(Micro Processor Unit,微處理器單元)等。 When the piezoelectric conversion device 1 is used as a power generation device, for example, a power source such as an actuator, a sensor, a solid-state light-emitting element, a wireless communication element, an arithmetic element, or the like can be used. In addition, as far as the sensor is concerned, there are, for example, a temperature sensor, an acceleration sensor, a pressure sensor, and the like. Examples of the solid-state light-emitting element include a light-emitting diode and a semiconductor laser. The arithmetic element includes, for example, an MPU (Micro Processor Unit) or the like.
(實施形態2) (Embodiment 2)
以下根據圖13來說明本實施形態之壓電轉換裝置1。本實施形態之壓電轉換裝置1在下述各點不同:於對向部11b設有朝向突出部12c即第1突出部12c側突出的第2突出部13,第2突出部13朝向與第1突出部12c相反側翹曲。另,就與實施形態1同樣的構成要素而言,係標註同樣的符號,並省略說明。 The piezoelectric transducer 1 of the present embodiment will be described below with reference to Fig. 13 . The piezoelectric transducer 1 of the present embodiment differs in that the opposing portion 11b is provided with a second protruding portion 13 that protrudes toward the protruding portion 12c, that is, the first protruding portion 12c, and the second protruding portion 13 faces the first one. The opposite side of the protruding portion 12c is warped. The same components as those in the first embodiment are denoted by the same reference numerals and will not be described.
本實施形態1之壓電轉換裝置1中,在對向部11b中形成於矽層10c上者並非實施形態1中說明之由氧化矽膜所構成的絕緣膜18a,而係由氮化矽膜所構成的絕緣膜18c。 In the piezoelectric transducer 1 of the first embodiment, the insulating layer 18a composed of the yttrium oxide film described in the first embodiment is not formed on the ruthenium layer 10c in the opposing portion 11b, but is a tantalum nitride film. The insulating film 18c is formed.
第2突出部13係藉由下述者構成:第3矽層10cd,矽層10c之中構成第2突出部13的部位;以及第3絕緣膜18cc,絕緣膜18c之中形成於第3矽層10cd之厚度方向的一面側的部位。第2突出部13藉由第3絕緣膜18cc的內部應力即拉伸應力而翹曲。絕緣膜18c的內部應力,例如在藉由濺鍍法與CVD法使絕緣膜18c成膜時,可藉由適當設定氣壓、溫度等製程條件來控制。 The second protruding portion 13 is composed of a third ruthenium layer 10cd, a portion constituting the second protrusion portion 13 among the ruthenium layer 10c, and a third insulating film 18cc formed in the third layer of the insulating film 18c. A portion on one side in the thickness direction of the layer 10cd. The second protruding portion 13 is warped by the internal stress, that is, the tensile stress of the third insulating film 18cc. The internal stress of the insulating film 18c can be controlled by, for example, setting a process condition such as a gas pressure or a temperature when the insulating film 18c is formed by a sputtering method or a CVD method.
在本實施形態之壓電轉換裝置1中,藉由具有上述第2突出部13,使得流體在流道15更有效率地容易流動,而能提昇從流體能量到振動區塊12之振動能量的轉換效率。所以,第1變形例之壓電轉換裝置1能提昇從流體能量轉換成電能量的轉換效率。 In the piezoelectric transducer 1 of the present embodiment, by providing the second projecting portion 13, the fluid can flow more efficiently in the flow path 15, and the vibration energy from the fluid energy to the vibration block 12 can be increased. Conversion efficiency. Therefore, the piezoelectric conversion device 1 of the first modification can improve the conversion efficiency from the fluid energy to the electric energy.
本實施形態之壓電轉換裝置1中,亦可於配重部12b設置實施形態1之第2變形例的壓電轉換裝置1之凹部12bb。 In the piezoelectric transducer 1 of the present embodiment, the concave portion 12bb of the piezoelectric transducer 1 according to the second modification of the first embodiment can be provided in the weight portion 12b.
(實施形態3) (Embodiment 3)
以下根據圖14來說明本實施形態之流量感測器A1。 The flow rate sensor A1 of the present embodiment will be described below with reference to Fig. 14 .
流量感測器A1包含:實施形態1之壓電轉換裝置1;以及偵測部2, 偵測從壓電轉換裝置1之壓電轉換部14輸出的電信號。從壓電轉換部14輸出的電信號係壓電轉換部14所產生的交流電壓。 The flow sensor A1 includes: the piezoelectric conversion device 1 of the first embodiment; and the detecting unit 2, An electric signal output from the piezoelectric conversion portion 14 of the piezoelectric conversion device 1 is detected. The electric signal output from the piezoelectric conversion portion 14 is an alternating voltage generated by the piezoelectric conversion portion 14.
壓電轉換部14所產生的交流電壓成為因應於振動區塊12之振動的正弦波形交流電壓。壓電轉換裝置1係藉由在流道15通過的流體之流動所產生的突出部12c之厚度方向兩側的壓力差,以及振動區塊12之彈性,而可產生自誘發振動,並能因應於流體之流速或流量而產生峰值電壓之絕對值會變化的交流電壓。 The AC voltage generated by the piezoelectric conversion portion 14 becomes a sinusoidal waveform AC voltage in response to the vibration of the vibration block 12. The piezoelectric transducer 1 generates self-induced vibration by the pressure difference on both sides in the thickness direction of the protruding portion 12c generated by the flow of the fluid passing through the flow path 15, and the elasticity of the vibration block 12, and can respond to An alternating voltage at which the absolute value of the peak voltage changes depending on the flow rate or flow rate of the fluid.
就偵測部2中偵測的電信號而言,例如有壓電轉換部14所產生的交流電壓之峰值或頻率等。 The electric signal detected by the detecting unit 2 includes, for example, a peak value or a frequency of an alternating current voltage generated by the piezoelectric converting unit 14.
偵測部2可藉由,例如偵測從壓電轉換部14輸出之交流電壓的峰值電壓之絕對值的峰值保持電路(峰值電壓偵測電路)、控制峰值保持電路的控制電路等來構成。峰值保持電路可構成為包含:整流電路、保持整流電路之輸出最大值的電容器、將電容器保持的電荷加以放電的重置電路、控制重置電路的控制部等。 The detecting unit 2 can be configured by, for example, a peak hold circuit (peak voltage detection circuit) that detects the absolute value of the peak voltage of the AC voltage output from the piezoelectric conversion unit 14, a control circuit that controls the peak hold circuit, and the like. The peak hold circuit may be configured to include a rectifier circuit, a capacitor that holds the maximum value of the output of the rectifier circuit, a reset circuit that discharges the charge held by the capacitor, a control unit that controls the reset circuit, and the like.
藉此,偵測部2能間歇性偵測壓電轉換部14所產生之交流電壓的峰值電壓之絕對值。偵測部2亦可,例如藉由搭載有適當程式的微電腦等來構成控制部,控制部具有記憶表格的記憶體,該表格已將壓電轉換部14所產生的交流電壓之絕對值與流速預先相對應。 Thereby, the detecting unit 2 can intermittently detect the absolute value of the peak voltage of the AC voltage generated by the piezoelectric conversion unit 14. The detecting unit 2 may constitute a control unit by, for example, a microcomputer equipped with an appropriate program, and the control unit may have a memory for storing a table having the absolute value and flow rate of the AC voltage generated by the piezoelectric converting unit 14. Correspond in advance.
在此,壓電轉換部14所產生的交流電壓之峰值的絕對值係隨著流體之流速增加而增加。圖15係顯示由交流電壓之峰值的絕對值所構成的生成電壓與流速之相關例。在圖15中,係顯示3種壓電轉換裝置1各者的相關例F1、F2、F3。3種壓電轉換裝置1係,振動區塊12的長度尺寸相同而振動區塊12之寬度尺寸有所不同。相對上而言,相關例F1為振動區塊12之寬度尺寸較小,相關例F3為振動區塊12之寬度尺寸較大,而相關例F2係振動區塊12之寬度尺寸位於相關例F1與相關例F3中間。從圖15可知,壓 電轉換裝置1若使振動區塊12之寬度尺寸變大,則開始自誘發振動的流速變大,但有生成電壓隨著流速增加而緩慢增加的傾向。所以,壓電轉換裝置1可用於在較寬流速域偵測流速的流量感測器A1。另一方面,壓電轉換裝置1若使振動區塊12之寬度尺寸變小,則開始自誘發振動的流速變小,且具有生成電壓隨著流速增加而急遽增加的傾向。所以,壓電轉換裝置1可用於在較窄流速域偵測流速的流量感測器A1。又,壓電轉換裝置1若使振動區塊12之寬度尺寸變小,因為生成電壓發生飽和現象的流速較低,所以認為適合用於欲維持穩定的生成電壓之情形的發電用途。 Here, the absolute value of the peak value of the alternating current voltage generated by the piezoelectric conversion portion 14 increases as the flow velocity of the fluid increases. Fig. 15 is a diagram showing an example of the correlation between the generated voltage and the flow rate constituted by the absolute value of the peak value of the alternating voltage. In Fig. 15, correlation examples F1, F2, and F3 of each of the three types of piezoelectric transducers 1 are shown. Three types of piezoelectric transducers 1 have the same length dimension of the vibration block 12 and the width dimension of the vibration block 12. It is different. In contrast, the correlation example F1 has a smaller width dimension of the vibration block 12, and the correlation example F3 has a larger width dimension of the vibration block 12, and the width dimension of the vibration block 12 of the related example F2 is located in the correlation example F1 and Related example F3 in the middle. As can be seen from Figure 15, the pressure When the width of the vibration block 12 is increased, the electric power conversion device 1 increases the flow rate of the self-induced vibration, but the generated voltage tends to gradually increase as the flow rate increases. Therefore, the piezoelectric conversion device 1 can be used for the flow sensor A1 that detects the flow rate in a wide flow velocity range. On the other hand, when the piezoelectric transducer device 1 reduces the width dimension of the vibration block 12, the flow velocity at which the self-induced vibration starts is reduced, and the generated voltage tends to increase rapidly as the flow velocity increases. Therefore, the piezoelectric conversion device 1 can be used for the flow sensor A1 that detects the flow rate in a narrow flow velocity range. Further, when the piezoelectric transducer device 1 has a small width dimension of the vibration block 12, since the flow rate at which the generated voltage is saturated is low, it is considered to be suitable for power generation applications in which a stable generated voltage is to be maintained.
又,壓電轉換部14所產生的交流電壓之頻率如圖16所示,隨著流體流速增加而減少。推測此係因為流體之流速增加後,振動區塊12的一面側之壓力增加,振動區塊12進行振動的頻率降低。流速與頻率之關係幾乎係為線性。另,壓電轉換部14所產生的交流電壓之頻率,可藉由例如電壓-頻率轉換電路來偵測。此時,偵測部2亦可為上述控制部具有記憶表格的記憶體,該表格已將壓電轉換部14所產生的交流電壓之頻率與流速預先相對應。已將交流電壓之頻率與流速預先相對應的表格,例如有利用圖16之資料者。 Further, as shown in FIG. 16, the frequency of the alternating voltage generated by the piezoelectric transducer 14 decreases as the fluid flow rate increases. It is presumed that since the flow velocity of the fluid increases, the pressure on one side of the vibration block 12 increases, and the frequency at which the vibration block 12 vibrates decreases. The relationship between flow rate and frequency is almost linear. Further, the frequency of the alternating voltage generated by the piezoelectric converting portion 14 can be detected by, for example, a voltage-frequency converting circuit. At this time, the detecting unit 2 may have a memory in which the control unit has a memory table that has previously matched the frequency of the AC voltage generated by the piezoelectric converting unit 14 with the flow rate. A table in which the frequency of the alternating voltage has been previously associated with the flow rate has been used, for example, using the information of FIG.
以上說明的流量感測器A1包含:壓電轉換裝置1,在承受流體而進行自誘發振動的振動區塊12設有壓電轉換部14;以及偵測部2,偵測從壓電轉換部14輸出的電信號。在此流量感測器A1中,因為不必將電力供給至用於感測流體的壓電轉換部14,所以相較於文獻2中記載的熱式流量感測器而言,可達到低耗電化。又,在此流量感測器A1中,因為具有於承受流體而進行自誘發振動的振動區塊12設置壓電轉換部14的壓電轉換裝置1,相較於文獻3中記載的發電機構而言,能達到小型化。藉此,流量感測器A1能達到低耗電化及小型化。又,流量感測器A1藉由達到低耗電化而能降低維護頻率及成本。 The flow sensor A1 described above includes a piezoelectric transducer 1 in which a piezoelectric transducer 14 is provided in a vibration block 12 that is subjected to self-induced vibration while receiving a fluid, and a detecting portion 2 that detects the piezoelectric transducer 14 output electrical signals. In this flow sensor A1, since it is not necessary to supply electric power to the piezoelectric conversion portion 14 for sensing fluid, low power consumption can be achieved compared to the thermal flow sensor described in Document 2. Chemical. In the flow rate sensor A1, the piezoelectric transducer 1 having the piezoelectric transducer 14 is provided in the vibration block 12 that is subjected to self-induced vibration while receiving a fluid, and is compared with the power generating mechanism described in Document 3. Words can be miniaturized. Thereby, the flow sensor A1 can achieve low power consumption and miniaturization. Moreover, the flow sensor A1 can reduce the maintenance frequency and cost by achieving low power consumption.
又,流量感測器A1可在壓電轉換裝置1中將通過流道15的流體之能量以高效率的方式轉換成振動區塊12之振動能量。所以,流量感測器A1 可提昇流體之流速與流量之偵測精度。 Further, the flow sensor A1 can convert the energy of the fluid passing through the flow path 15 into the vibration energy of the vibration block 12 in the piezoelectric conversion device 1 in a highly efficient manner. Therefore, the flow sensor A1 It can improve the detection accuracy of fluid flow rate and flow rate.
流量感測器A1亦可如圖17所示的第1變形例,構成為包含:無線傳送部6,間歇性進行含有偵測部2之偵測結果的無線信號之傳送。藉此,流量感測器A1可間歇性傳送包含偵測部2之偵測結果的無線信號。所以,流量感測器A1可使設置場所的自由度變高,提高泛用性。又,亦能在利用複數之流量感測器A1的氣流感測器中,藉由適當配置複數之流量感測器A1來調查氣流狀態的分布。另,就無線傳送部6的無線通信規格而言,可採用例如EnOcean(註冊商標)、Zigbee(註冊商標)、Bluetooth(註冊商標)、特定低功率無線電、微弱無線電、Wi-Fi(註冊商標)、UWB(Ultra Wide Band,超寬頻)等,並不特別限定。 As in the first modification shown in FIG. 17, the flow rate sensor A1 may include a wireless transmission unit 6 that intermittently transmits a wireless signal including the detection result of the detection unit 2. Thereby, the flow sensor A1 can intermittently transmit the wireless signal including the detection result of the detecting unit 2. Therefore, the flow sensor A1 can increase the degree of freedom of the installation place and improve the versatility. Further, in the gas flu detector using the plurality of flow sensors A1, the distribution of the airflow state can be investigated by appropriately configuring the plurality of flow sensors A1. In addition, as for the wireless communication standard of the wireless transmission unit 6, for example, EnOcean (registered trademark), Zigbee (registered trademark), Bluetooth (registered trademark), specific low-power radio, weak radio, Wi-Fi (registered trademark) can be used. UWB (Ultra Wide Band) is not particularly limited.
圖18係使用流量感測器A1的空調管理系統之概略構成圖。此空調管理系統中的流量感測器A1包含:蓄電部5,將壓電轉換裝置1所產生的交流電壓加以整流並進行蓄電;以及切換電路9。 Fig. 18 is a schematic configuration diagram of an air conditioning management system using the flow sensor A1. The flow rate sensor A1 in the air conditioning management system includes a power storage unit 5 that rectifies and stores an AC voltage generated by the piezoelectric conversion device 1, and a switching circuit 9.
切換電路9構成為可在以下狀態中進行切換:第1狀態,使壓電轉換部14與蓄電部5電性連接;第2狀態,使壓電轉換部14與偵測部2電性連接。換言之,壓電轉換部14係連接於切換電路9,而切換電路9在以下狀態中進行切換:第1狀態,使壓電轉換部14與蓄電部5電性連接;以及第2狀態,使壓電轉換部14與偵測部2電性連接。又,偵測部2及無線傳送部6能以蓄電部5作為電源而運作。 The switching circuit 9 is configured to be switchable in a state in which the piezoelectric conversion unit 14 and the power storage unit 5 are electrically connected to each other, and in a second state, the piezoelectric conversion unit 14 is electrically connected to the detection unit 2. In other words, the piezoelectric conversion unit 14 is connected to the switching circuit 9, and the switching circuit 9 switches between the piezoelectric transducer 14 and the power storage unit 5 in the first state, and the second state to make the voltage The electrical conversion unit 14 is electrically connected to the detecting unit 2 . Further, the detecting unit 2 and the wireless transmitting unit 6 can operate using the power storage unit 5 as a power source.
流量感測器A1宜包含:開關元件8,設於從蓄電部5往偵測部2及無線傳送部6的電力供給途徑;以及蓄電量監視部7,監視蓄電部5的蓄電量。開關元件8,例如可藉由MOSFET(Metal Oxide Semiconductor Field Effect Transistor,金氧半導體場效電晶體)等來構成。蓄電量監視部7具有將蓄電部5之輸出端間的電壓作為蓄電量來進行監視,並根據蓄電量與預先設定的規定值之比較結果來使開關元件8導通斷開的功能。例如,蓄電量監視部7在蓄電部5之蓄電量到達用於偵測部2及無線傳送部6之驅動的預先 設定之上述規定量後,使開關元件8導通。蓄電量監視部7在低於上述規定量述後,使開關元件8斷開。藉此,偵測部2及無線傳送部6從蓄電部5間歇性地受到電力供給而驅動。 The flow rate sensor A1 preferably includes a switching element 8, a power supply path provided from the power storage unit 5 to the detecting unit 2 and the wireless transmission unit 6, and a power storage amount monitoring unit 7 that monitors the amount of stored electricity of the power storage unit 5. The switching element 8 can be formed, for example, by a MOSFET (Metal Oxide Semiconductor Field Effect Transistor) or the like. The electric storage amount monitoring unit 7 has a function of monitoring the voltage between the output terminals of the electric storage unit 5 as the electric storage amount, and turning on and off the switching element 8 based on the comparison between the electric storage amount and a predetermined value set in advance. For example, the amount of electric power stored in the power storage unit 5 reaches the drive for detecting the detection unit 2 and the wireless transmission unit 6 in advance. After the predetermined amount is set, the switching element 8 is turned on. The electric storage amount monitoring unit 7 turns off the switching element 8 after being lower than the above-described predetermined amount. Thereby, the detecting unit 2 and the wireless transmission unit 6 are intermittently subjected to power supply from the power storage unit 5 and driven.
切換電路9,例如只要蓄電量監視部7控制導通、斷開即可。在此,蓄電量監視部7只要在蓄電部5之蓄電量到達上述規定值時將切換電路9從第1狀態切換成第2狀態即可。 The switching circuit 9 may be, for example, controlled to be turned on or off by the stored electricity amount monitoring unit 7. Here, the electric storage amount monitoring unit 7 may switch the switching circuit 9 from the first state to the second state when the electric storage amount of the electric storage unit 5 reaches the predetermined value.
流量感測器A1,藉由包含切換電路9,能縮短每次蓄電部5充電時蓄電部5之蓄電量到達上述規定值為止的時間。 By including the switching circuit 9, the flow rate sensor A1 can shorten the time until the amount of electric power stored in the power storage unit 5 reaches the predetermined value every time the power storage unit 5 is charged.
蓄電部5,例如可利用下述者來構成:全波整流電路,由將壓電轉換裝置1所產生的交流電壓加以整流的二極體電橋所構成;電容器,連接於全波整流電路的輸出端間。此時,流量感測器A1只要將壓電轉換裝置1的一邊之輸出端連接於全波整流電路的一邊之輸入端,將壓電轉換裝置1的另一邊之輸出端連接於全波整流電路的另一邊之輸入端,並將偵測部2與無線傳送部6連接於電容器的兩端間即可。 The power storage unit 5 can be configured, for example, by a full-wave rectifier circuit including a diode bridge that rectifies an AC voltage generated by the piezoelectric transducer 1, and a capacitor connected to the full-wave rectifier circuit. Between the outputs. At this time, the flow sensor A1 connects the output end of one side of the piezoelectric conversion device 1 to the input end of one side of the full-wave rectifying circuit, and connects the output end of the other side of the piezoelectric conversion device 1 to the full-wave rectifying circuit. The other end of the input terminal and the wireless transmission unit 6 may be connected between the two ends of the capacitor.
蓄電部5,例如可藉由全波倍電壓整流電路來構成。全波倍電壓整流電路可採用,例如將2個二極體之串聯電路與2個電容器之串聯電路並聯連接的構成。換言之,全波倍電壓整流電路可採用將2個二極體與2個電容器加以橋接的構成。蓄電部5係全波倍電壓整流電路之情形,流量感測器A1只要將壓電轉換裝置1的一邊之輸出端連接於2個二極體之串聯電路的兩二極體之連接點,並將壓電轉換裝置1的另一邊之輸出端連接於2個電容器之串聯電路中的兩電容器之連接點即可。並且,流量感測器A1只要將偵測部2與無線傳送部6連接於2個電容器之串聯電路的兩端間即可。 The power storage unit 5 can be configured by, for example, a full-wave voltage doubler rectifier circuit. The full-wave voltage-stabilizing circuit can be configured, for example, by connecting a series circuit of two diodes in parallel with a series circuit of two capacitors. In other words, the full-wave voltage doubler rectifier circuit can be configured by bridging two diodes and two capacitors. In the case where the power storage unit 5 is a full-wave voltage doubler rectifier circuit, the flow rate sensor A1 is connected to the connection point of the two diodes of the two series circuit of the two diodes by the output terminal of the piezoelectric transformer device 1 and The output terminal of the other side of the piezoelectric conversion device 1 may be connected to a connection point of two capacitors in a series circuit of two capacitors. Further, the flow rate sensor A1 may connect the detecting unit 2 and the wireless transmission unit 6 to both ends of a series circuit of two capacitors.
空調管理系統包含:流量感測器A1;以及空調機A2。流量感測器A1係配置於空調機A2之供氣導管(未圖示)或者排氣導管(未圖示)的內部。 The air conditioning management system includes: a flow sensor A1; and an air conditioner A2. The flow sensor A1 is disposed inside an air supply duct (not shown) or an exhaust duct (not shown) of the air conditioner A2.
空調機A2包含:無線接收部71,接收來自無線傳送部6的無線信號;以及控制部72,根據無線接收部71所接收的無線信號來控制風扇74之運轉狀態,以使流體之流量或流速成為目標值。藉此,因為空調管理系統包含可低耗電化及小型化的流量感測器A1,所以能達到空調管理系統全體的低耗電化。 The air conditioner A2 includes a wireless receiving unit 71 that receives a wireless signal from the wireless transmitting unit 6, and a control unit 72 that controls the operating state of the fan 74 based on the wireless signal received by the wireless receiving unit 71 to cause a flow rate or a flow rate of the fluid. Become the target value. In this way, since the air-conditioning management system includes the flow rate sensor A1 that can be reduced in power consumption and miniaturization, it is possible to achieve low power consumption of the entire air-conditioning management system.
空調機A2包含:電動機73,使風扇74旋轉;運轉開關75;控制部72,藉由控制電動機73來控制風扇74之運轉狀態;以及設定部76,根據來自遙控器的遙控信號等來設定流量或流速之目標值。空調機A2藉由使運轉開關75導通,使得控制部72驅動電動機73使風扇74旋轉。控制部72回授控制電動機73之旋轉速度以成為設定部76所設定的流量或者流速之目標值。藉此,空調管理系統可達到節能化。另,控制部72只要將構成定為,例如包含由搭載有適當程式的微電腦等所構成的控制電路、驅動電動機73的驅動電路等即可。 The air conditioner A2 includes a motor 73 that rotates the fan 74, an operation switch 75, a control unit 72 that controls the operation state of the fan 74 by controlling the motor 73, and a setting unit 76 that sets the flow rate based on a remote control signal or the like from the remote controller. Or the target value of the flow rate. The air conditioner A2 is turned on by the operation switch 75, so that the control unit 72 drives the motor 73 to rotate the fan 74. The control unit 72 feedbacks the rotational speed of the motor 73 to be the target value of the flow rate or the flow rate set by the setting unit 76. Thereby, the air conditioning management system can achieve energy saving. In addition, the control unit 72 may include, for example, a control circuit including a microcomputer or the like equipped with an appropriate program, a drive circuit for driving the motor 73, and the like.
本實施形態之流量感測器A1的第2變形例如圖19所示,係壓電轉換裝置1之構成不同。第2變形例之流量感測器A1中的壓電轉換裝置1,就壓電轉換部14而言,包含:第1壓電轉換部141;以及第2壓電轉換部142。第1壓電轉換部141係連接於蓄電部5。第2壓電轉換部142係連接於偵測部2。 The second modification of the flow rate sensor A1 of the present embodiment is different from the configuration of the piezoelectric conversion device 1 as shown in Fig. 19, for example. In the piezoelectric transducer 1 of the flow rate sensor A1 of the second modification, the piezoelectric transducer 14 includes a first piezoelectric transducer 141 and a second piezoelectric transducer 142. The first piezoelectric conversion unit 141 is connected to the power storage unit 5 . The second piezoelectric conversion unit 142 is connected to the detection unit 2 .
壓電轉換裝置1可採用於實施形態1所說明的壓電轉換裝置1中,沿著樑部12a之寬度方向並排設置有2個壓電轉換部14,各壓電轉換部14每者設置第1焊墊電極17a與第2焊墊電極17c的構成。此種情況,只要將一邊的壓電轉換部14定為第1壓電轉換部141、另一邊的壓電轉換部14定為第2壓電轉換部142即可。 In the piezoelectric transducer 1 described in the first embodiment, two piezoelectric transducers 14 are arranged side by side in the width direction of the beam portion 12a, and each of the piezoelectric transducers 14 is provided. 1 pad electrode 17a and second pad electrode 17c. In this case, the piezoelectric conversion unit 14 on one side may be the first piezoelectric conversion unit 141, and the piezoelectric conversion unit 14 on the other side may be the second piezoelectric conversion unit 142.
第2變形例之流量感測器A1因為包含:第1壓電轉換部141,連接於蓄電部5;以及第2壓電轉換部142,連接於偵測部2;所以能以簡單的電路構成,利用偵測部2以偵測從壓電轉換部14輸出的電信號。 The flow rate sensor A1 according to the second modification includes the first piezoelectric conversion unit 141 connected to the power storage unit 5 and the second piezoelectric conversion unit 142 connected to the detection unit 2, so that it can be configured by a simple circuit. The detecting unit 2 is used to detect an electrical signal output from the piezoelectric conversion unit 14.
另,壓電轉換部14之數量不限於2個,亦可係3個以上,只要包含至少第1壓電轉換部141與第2壓電轉換部142各一個即可。又,流量感測器A1亦可定為將具有1個壓電轉換部14的壓電轉換裝置1,並排設置2個的構成。 In addition, the number of the piezoelectric transducers 14 is not limited to two, and may be three or more, and may include at least one of the first piezoelectric transducer 141 and the second piezoelectric transducer 142. Further, the flow rate sensor A1 may be configured such that the piezoelectric transducer 1 having one piezoelectric transducer 14 is provided in parallel.
上述實施形態1與實施形態2等中進行說明的各圖係示意性,各構成要素之大小或厚度各自之比不一定有反映出實物的尺寸比。 Each of the drawings described in the first embodiment, the second embodiment, and the like is schematically illustrated, and the ratio of the size or thickness of each component does not necessarily reflect the size ratio of the physical object.
以上根據實施形態1至實施形態3等來說明本案發明之構成,但本案發明不限於實施形態1至實施形態3之構成,例如,亦可係將實施形態1至實施形態3等的部分構成加以適當組合來構成。又,記載於實施形態1至實施形態3的材料、數值等,僅係舉例顯示較佳者,不限定於此。再者,本案發明可在不脫離其技術思想的範圍內,對於構成加上適當變更。 In the above, the configuration of the present invention is described with reference to the first embodiment to the third embodiment, and the present invention is not limited to the configuration of the first embodiment to the third embodiment. For example, the partial configuration of the first embodiment to the third embodiment may be employed. Constructed by appropriate combination. Further, the materials, numerical values, and the like described in the first to third embodiments are merely preferred, and are not limited thereto. Furthermore, the present invention can be modified as appropriate without departing from the scope of the technical idea.
1‧‧‧壓電轉換裝置 1‧‧‧Piezoelectric conversion device
10‧‧‧基板 10‧‧‧Substrate
10a‧‧‧矽基板 10a‧‧‧矽 substrate
10b‧‧‧埋入氧化膜 10b‧‧‧ buried oxide film
10c‧‧‧矽層 10c‧‧‧ layer
10ca‧‧‧第1矽層 10ca‧‧‧1st floor
10cc‧‧‧第2矽層 10cc‧‧‧2nd layer
10d‧‧‧狹縫 10d‧‧‧slit
10f‧‧‧空間 10f‧‧‧ space
11‧‧‧框架部 11‧‧‧Framework
11a‧‧‧支持部 11a‧‧‧Support Department
11b‧‧‧對向部 11b‧‧‧ opposite department
11c‧‧‧連結部 11c‧‧‧Link Department
12‧‧‧振動區塊 12‧‧‧Vibration block
12a‧‧‧樑部 12a‧‧ ‧ Beam Department
12b‧‧‧配重部 12b‧‧‧weight department
12c‧‧‧突出部 12c‧‧‧ highlights
12cc‧‧‧前端面 12cc‧‧‧ front end
14‧‧‧壓電轉換部 14‧‧‧Piezoelectric conversion department
14a‧‧‧第1電極(下部電極) 14a‧‧‧1st electrode (lower electrode)
14b‧‧‧壓電體層 14b‧‧‧piezoelectric layer
14c‧‧‧第2電極(上部電極) 14c‧‧‧2nd electrode (upper electrode)
15‧‧‧流道 15‧‧‧ flow path
16a‧‧‧第1配線 16a‧‧‧1st wiring
16c‧‧‧第2配線 16c‧‧‧2nd wiring
17a‧‧‧第1焊墊電極 17a‧‧‧1st pad electrode
17c‧‧‧第2焊墊電極 17c‧‧‧2nd pad electrode
18a‧‧‧絕緣膜 18a‧‧‧Insulation film
18aa‧‧‧第1絕緣膜 18aa‧‧‧1st insulating film
18ac‧‧‧第2絕緣膜 18ac‧‧‧2nd insulation film
19‧‧‧絕緣層 19‧‧‧Insulation
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| JP2013138238A JP2014200162A (en) | 2013-03-13 | 2013-07-01 | Piezoelectric conversion device and flow sensor using the same |
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| WO2016167078A1 (en) * | 2015-04-13 | 2016-10-20 | 株式会社村田製作所 | Piezoelectric power generator |
| EP3469455B1 (en) * | 2016-06-09 | 2021-10-06 | Aito BV | Piezoelectric touch device |
| KR20180066787A (en) * | 2016-12-09 | 2018-06-19 | 고쿠리츠다이가쿠호우진 도쿄다이가쿠 | Vibration Energy Harvesting Device based on Stochastic Resonance and Vibration Energy Harvesting System using the same |
| JPWO2019097983A1 (en) * | 2017-11-15 | 2020-10-01 | パナソニックIpマネジメント株式会社 | Vibration power generator and sensor system |
| EP3733312B1 (en) * | 2018-12-27 | 2023-08-23 | Murata Manufacturing Co., Ltd. | Vibrating structure and vibration generating device |
| JP6725092B1 (en) * | 2019-01-21 | 2020-07-15 | 株式会社村田製作所 | Vibrating structure and electronic equipment |
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| JP5655861B2 (en) * | 2010-12-01 | 2015-01-21 | 株式会社村田製作所 | Piezoelectric generator and manufacturing method thereof |
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