TW201426958A - Stacked package device and manufacturing method thereof - Google Patents
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Abstract
Description
本發明有關於一種堆疊式封裝件,且特別是有關於具有導電線路的堆疊式封裝件。 The present invention relates to a stacked package, and more particularly to a stacked package having conductive traces.
目前的半導體元件堆疊式封裝件的結構包括晶片堆疊結構(Die Stacking)以及封裝式堆疊結構(Package Stacking),為提高整體半導體元件的線路密度以及減少封裝的體積,通常半導體元件堆疊式封裝件採用三維垂直堆疊(Vertically Integrated Circuits,VIC)的結合方式進行整合。 The structure of the current semiconductor component stacked package includes Die Stacking and Package Stacking. In order to improve the line density of the entire semiconductor component and reduce the package size, the semiconductor component stacked package is generally used. Integration of three-dimensional vertical stacking (VIC).
關於現有的三維垂直堆疊的結合方式,常見的晶元堆疊結構是使用矽穿孔(Through Silicon Via,TSV)半導體製程技術,在各晶粒或是晶片上製作貫孔(via),再將導電材料填入貫孔中以形成內部垂直導電線路,最後再將晶圓加以堆疊以及結合(bonding)。另外,封裝式堆疊(Package Stacking)中,通常採用錫球或是錫柱作為各層電路板之間的內部導電線路,而每層電路板皆配置有多個電子元件,接著再進行封膠據以製成封裝結構。 Regarding the existing three-dimensional vertical stacking method, a common wafer stacking structure is to use a through-silicon via (TSV) semiconductor process technology to form vias on each die or wafer, and then conductive materials. The vias are filled in to form internal vertical conductive traces, and finally the wafers are stacked and bonded. In addition, in package stacking, solder balls or tin pillars are usually used as internal conductive lines between the layers of the circuit boards, and each layer of the circuit board is provided with a plurality of electronic components, and then the sealing is performed. Made into a package structure.
一般而言,在導通堆疊式封裝件中,各層的半導體元件的導電線路皆位於堆疊式封裝件的內部。隨著堆疊式封裝件的輕薄化,導電線路的設計也越趨密集化以及複雜化,因此使得堆疊式封裝件的封裝結構與製造方法趨於繁複,而製造難度也提高。 In general, in a turn-on stacked package, the conductive traces of the semiconductor elements of each layer are located inside the stacked package. With the thinning and thinning of the stacked packages, the design of the conductive lines is becoming more dense and complicated, so that the package structure and the manufacturing method of the stacked packages tend to be complicated, and the manufacturing difficulty is also improved.
本發明實施例提供一種堆疊式封裝件,其所具有的導 電帶可以電性連接不同的半導體元件。 Embodiments of the present invention provide a stacked package having a guide The electrical tape can be electrically connected to different semiconductor components.
本發明實施例提供一種堆疊式封裝件,所述堆疊式封裝件包括基板、堆疊結構以及至少一導電帶。堆疊結構位於基板上,堆疊結構具有一頂面以及多面側壁,且堆疊結構包括多個導電圖案層,其中側壁裸露出導電圖案層。導電帶配置於側壁上,而且導電帶與其中至少兩層導電圖案層電性連接。 Embodiments of the present invention provide a stacked package including a substrate, a stacked structure, and at least one conductive strip. The stacked structure is located on the substrate, the stacked structure has a top surface and a multi-faceted sidewall, and the stacked structure comprises a plurality of conductive pattern layers, wherein the sidewalls expose the conductive pattern layer. The conductive strip is disposed on the sidewall, and the conductive strip is electrically connected to at least two conductive pattern layers therein.
本發明實施例提供一種堆疊式封裝件的製造方法,用以改進現有對於堆疊式封裝件的電性連接的製程。 Embodiments of the present invention provide a method of fabricating a stacked package to improve the existing process for electrically connecting the stacked packages.
本發明實施例提供一種堆疊式封裝件的製造方法,所述堆疊式封裝件的製造方法包括形成堆疊結構於基板上,所述堆疊結構具有一頂面以及多面側壁,且堆疊結構包括多個導電圖案層,其中側壁裸露出導電圖案層。將堆疊結構進行圖案化處理,據以形成至少一導電帶,其中導電帶位於側壁上並且連接其中至少二層導電圖案層。 Embodiments of the present invention provide a method of fabricating a stacked package, the method of manufacturing the stacked package including forming a stacked structure on a substrate, the stacked structure having a top surface and a multi-sided sidewall, and the stacked structure includes a plurality of conductive layers a pattern layer in which the sidewalls expose a conductive pattern layer. The stacked structure is patterned to form at least one conductive strip, wherein the conductive strip is on the sidewall and connects at least two of the conductive pattern layers therein.
綜上所述,所述堆疊式封裝件具有導電帶,透過導電帶的長度、數量以及分佈位置的變化,使得導電帶能作為堆疊結構的電性連結,進而簡化封裝結構以及其製造方法。由於導電帶配置於堆疊結構的側壁上,並且連接於側壁所裸露出的至少二層導電圖案層,因此半導體元件彼此之間得以透過導電帶而電性連接,而可以簡化封裝的製程結構。 In summary, the stacked package has a conductive strip, and the length, the number, and the distribution position of the conductive strip are changed, so that the conductive strip can be electrically connected as a stacked structure, thereby simplifying the package structure and the manufacturing method thereof. Since the conductive strips are disposed on the sidewalls of the stacked structure and are connected to at least two conductive pattern layers exposed by the sidewalls, the semiconductor elements are electrically connected to each other through the conductive strips, thereby simplifying the process structure of the package.
為使能更進一步瞭解本發明之特徵及技術內容,請參閱以下有關本發明之詳細說明與附圖,但是此等說明與所附圖式僅係用來說明本發明,而非對本發明的權利範圍作任何的限制。 The detailed description of the present invention and the accompanying drawings are to be understood by the claims The scope is subject to any restrictions.
在隨附圖式中展示一些例示性實施例,而在下文將參閱隨 附圖式以更充分地描述各種例示性實施例。值得說明的是,本發明概念可能以許多不同形式來體現,且不應解釋為限於本文中所闡述之例示性實施例。具體來說,提供諸等例示性實施例使得本發明將為詳盡且完整,且將向熟習此項技術者充分傳達本發明概念的範疇。在每一圖式中,可為了清楚明確而誇示層及區之大小及相對大小,而且類似數字指示類似元件。 Some illustrative embodiments are shown in the accompanying drawings and will be referred to hereinafter The drawings are to more fully describe the various exemplary embodiments. It should be noted that the inventive concept may be embodied in many different forms and should not be construed as being limited to the illustrative embodiments set forth herein. In particular, the present invention is to be construed as being illustrative and not restrictive. In each of the figures, the size and relative sizes of the layers and regions may be exaggerated for clarity and clarity, and like numerals indicate similar elements.
雖然本文中可能使用術語第一、第二、第三等來描述各種元件,但此等元件不應受此等術語限制。此等術語乃用以區分一元件與另一元件,因此,下文論述之第一元件可稱為第二元件而不偏離本發明概念之教示。另外,本文中可能使用術語「及/或」,此乃指示包括相關聯之列出項目中之任一者及一或多者之所有組合。 Although the terms first, second, third, etc. may be used herein to describe various elements, such elements are not limited by the terms. The terms are used to distinguish one element from another, and thus the first element discussed below may be referred to as a second element without departing from the teachings of the inventive concept. In addition, the term "and/or" may be used herein to indicate that it includes all of the associated listed items and all combinations of one or more.
本發明的堆疊式封裝件可以是一種應用於半導體元件的封裝結構。堆疊式封裝件以側壁上的導電帶作為半導體元件之間的電性連結,以簡化封裝的製程結構以及方法流程。本發明的堆疊式封裝件包括多種實施例,而本發明其中一實施例的堆疊式封裝件的堆疊結構可以是多個晶片或多個電路板組件呈現立體堆疊排列。以下將配合圖1A至圖2來說明上述堆疊式封裝件。 The stacked package of the present invention may be a package structure applied to a semiconductor element. The stacked package uses the conductive strips on the sidewalls as electrical connections between the semiconductor components to simplify the process structure and method flow of the package. The stacked package of the present invention includes various embodiments, and the stacked structure of the stacked package of one embodiment of the present invention may be a plurality of wafers or a plurality of circuit board assemblies exhibiting a three-dimensional stacked arrangement. The above stacked package will be described below with reference to FIGS. 1A to 2 .
圖1A為本發明實施例的堆疊式封裝件的俯視示意圖,圖1B是圖1A中沿線P-P剖面所繪示的剖面示意圖。請參閱圖1A與圖1B,堆疊式封裝件100包括基板110、堆疊結構120以及導電帶130。堆疊結構120配置於基板110上方,導電帶130配置於堆疊結構120的側壁124,透過導電帶130的分佈,堆疊結構120中不同層的半導體元件122之間得以電性連接。 1A is a top plan view of a stacked package according to an embodiment of the present invention, and FIG. 1B is a cross-sectional view taken along line P-P of FIG. 1A. Referring to FIGS. 1A and 1B , the stacked package 100 includes a substrate 110 , a stacked structure 120 , and a conductive strip 130 . The stack structure 120 is disposed above the substrate 110. The conductive strips 130 are disposed on the sidewalls 124 of the stack structure 120. The semiconductor strips 122 of the different layers of the stack structure 120 are electrically connected through the distribution of the conductive strips 130.
堆疊結構120配置於基板110上,於實務上,基板110可用來作為電路及電子元件所配置的載體,亦即尚未配置晶片/電子元件的晶片載板或是電路基板。基板110上配置有接墊(Pad)及線路(trace),而基板110的材料通常是環氧樹脂(Epoxy resin)、氰脂樹脂核心薄板(Cyanate ester core,CE core)、或者是雙順丁稀二酸醯亞胺核心薄板(Bismaleimide core,BMI core)等材料。不過,本發明並不限定基板110的材料。 The stack structure 120 is disposed on the substrate 110. In practice, the substrate 110 can be used as a carrier for the circuit and the electronic component, that is, a wafer carrier or a circuit substrate on which the chip/electronic component is not disposed. A pad (pad) and a trace are disposed on the substrate 110, and the material of the substrate 110 is usually an epoxy resin, a Cyanate ester core (CE core), or a double-butadiene. Material such as Bismaleimide core (BMI core). However, the present invention does not limit the material of the substrate 110.
堆疊結構120具有一面頂面122以及多面側壁124。每一面側壁124皆與頂面122連接且圍繞於頂面122周圍。此外,於此實施例中,側壁124的數量是四面,不過,本發明並不限定側壁的數量。 The stacked structure 120 has a top surface 122 and a multi-sided sidewall 124. Each side wall 124 is coupled to the top surface 122 and surrounds the top surface 122. Further, in this embodiment, the number of the side walls 124 is four sides, however, the present invention does not limit the number of side walls.
堆疊結構120包括多個導電圖案層126以及多個半導體元件128a、128b、128c及128d。導電圖案層126位於半導體元件128a、128b、128c及128d上,而半導體元件128a、128b、128c及128d彼此層疊排列。詳細來說,半導體元件128a、128b、128c及128d皆具有第一表面S1以及相對第一表面S1的第二表面S2,而每一導電圖案層126分別配置於每一半導體元件128的第一表面S1上以形成電路層。第一表面S1位於另一個的半導體元件128的第二表面S2下方,舉例而言,半導體元件128b的第一表面S1位於半導體元件128a的第二表面的下方。不過,導電圖案層126亦可以配置於第一表面S1及/或第二表面S2上,本發明並不以此為限。 The stacked structure 120 includes a plurality of conductive pattern layers 126 and a plurality of semiconductor elements 128a, 128b, 128c, and 128d. The conductive pattern layer 126 is on the semiconductor elements 128a, 128b, 128c, and 128d, and the semiconductor elements 128a, 128b, 128c, and 128d are stacked on each other. In detail, the semiconductor elements 128a, 128b, 128c, and 128d each have a first surface S1 and a second surface S2 opposite to the first surface S1, and each of the conductive pattern layers 126 is disposed on the first surface of each of the semiconductor elements 128, respectively. S1 is formed to form a circuit layer. The first surface S1 is located below the second surface S2 of the other semiconductor component 128. For example, the first surface S1 of the semiconductor component 128b is located below the second surface of the semiconductor component 128a. However, the conductive pattern layer 126 may also be disposed on the first surface S1 and/or the second surface S2, and the invention is not limited thereto.
值得注意的是,導電圖案層126為重新佈線層(redistribution layer,RDL),用以使配置於半導體元件128的線路得以重新配置於半導體元件128的邊緣。導電圖案 層126包括第一圖案層P1以及第二圖案層P2,第一圖案層P1為接墊(Pad),第二圖案層P2為線路(trace),其中第二圖案層P2與第一圖案層P1相連。據此,電信號可經由導電圖案層126輸入至半導體元件128,以及從半導體元件128輸出。 It should be noted that the conductive pattern layer 126 is a redistribution layer (RDL) for reconfiguring the wiring disposed on the semiconductor element 128 at the edge of the semiconductor element 128. Conductive pattern The layer 126 includes a first pattern layer P1 and a second pattern layer P2, the first pattern layer P1 is a pad, and the second pattern layer P2 is a trace, wherein the second pattern layer P2 and the first pattern layer P1 Connected. Accordingly, an electrical signal can be input to and output from the semiconductor element 128 via the conductive pattern layer 126.
另外,於本實施例中,半導體元件128可以包括各種類型,亦即這些半導體元件128的種類可以不需完全相同。多個半導體元件128可以是不同的電子元件,例如是晶片、電容、電感或者是電路板組件(circuit board assembly)等。半導體元件128的種類可以彼此不相同,而圖1B以半導體元件128a、128b、128c及128d表示。不過,本發明並不對半導體元件128的數量以及種類加以限定。 In addition, in the present embodiment, the semiconductor elements 128 may include various types, that is, the types of the semiconductor elements 128 may not necessarily be identical. The plurality of semiconductor components 128 can be different electronic components such as a wafer, a capacitor, an inductor, or a circuit board assembly or the like. The types of the semiconductor elements 128 may be different from each other, and FIG. 1B is represented by the semiconductor elements 128a, 128b, 128c, and 128d. However, the present invention does not limit the number and type of semiconductor elements 128.
堆疊結構120包括多個絕緣層127,每一絕緣層127皆配置於相鄰兩個半導體元件128之間。絕緣層127用以避免導電圖案層126之間產生不必要的電性連接或是短路等情形,而且絕緣層127也可用以保護與接合這些半導體元件128。絕緣層127配置於各半導體元件128之間,使堆疊結構120的外觀得以呈現立體層疊樣貌。堆疊結構120的頂面122上配置有導電圖案層126,而每面側壁124皆裸露出位於這些半導體元件128之間的導電圖案層126。 The stacked structure 120 includes a plurality of insulating layers 127, each of which is disposed between two adjacent semiconductor elements 128. The insulating layer 127 is used to avoid unnecessary electrical connection or short circuit between the conductive pattern layers 126, and the insulating layer 127 can also be used to protect and bond the semiconductor elements 128. The insulating layer 127 is disposed between the respective semiconductor elements 128, so that the appearance of the stacked structure 120 is stereoscopically stacked. A conductive pattern layer 126 is disposed on the top surface 122 of the stacked structure 120, and each side sidewall 124 exposes the conductive pattern layer 126 between the semiconductor elements 128.
值得說明的是,絕緣層127可以是黏晶膠,用以接合各晶片,例如是薄膜型黏晶膠層(Die Attach Film,DAF)、銀膠等。此外,絕緣層127也可以是可以由具黏性的預浸材料層(Preimpregnated Material)來形成,其中預浸材料層例如是玻璃纖維預浸材(Glass fiber prepreg)、碳纖維預浸材(Carbon fiber prepreg)或環氧樹脂(Epoxy resin)等材料,用 以接合各封裝模組。 It should be noted that the insulating layer 127 may be a die bond adhesive for bonding the respective wafers, such as a die attach adhesive layer (DAF), silver paste, or the like. In addition, the insulating layer 127 may also be formed of a viscous preimpregnated material layer, such as a glass fiber prepreg, a carbon fiber prepreg (Carbon fiber). Prepreg) or epoxy resin (Epoxy resin), etc. To join the various package modules.
導電帶130配置於側壁124上,且導電帶130與側壁124所裸露出的至少相鄰兩層導電圖案層126相連接,進而半導體元件128彼此之間得以透過導電帶130而電性連接。不過,於其他實施例中,為了不同的電性連接考量,導電帶130也可以配置於頂面122及基板110上。舉例來說,半導體元件128a為一電路板組件,其上具有多個元件,而導電帶130可以配置在這些元件上,以電性連接所述多個元件。 The conductive strips 130 are disposed on the sidewalls 124, and the conductive strips 130 are connected to at least two adjacent conductive pattern layers 126 exposed by the sidewalls 124, and the semiconductor elements 128 are electrically connected to each other through the conductive strips 130. However, in other embodiments, the conductive strips 130 may also be disposed on the top surface 122 and the substrate 110 for different electrical connection considerations. For example, the semiconductor component 128a is a circuit board assembly having a plurality of components thereon, and the conductive tape 130 may be disposed on the components to electrically connect the plurality of components.
為了因應不同的電性連接設計的堆疊式封裝件,可以依產品需求而自行設計導電帶130的長度、數量以及分佈位置。以圖1B為例,在所有導電帶130中,有的導電帶130可以是由半導體元件128a的導電圖案層126延伸至基板110的接墊及線路,因此半導體元件128a得以與基板110電性連接。有的導電帶130也可以是由半導體元件128b的導電圖案層126延伸至半導體元件128c的導電圖案層126,因此半導體元件128b得以與半導體元件128c電性連接。不過,本發明並不對導電帶的形狀、數量以及分佈位置加以限定。 In order to meet the different electrical connection design of the stacked package, the length, number and distribution position of the conductive strip 130 can be designed according to the requirements of the product. As shown in FIG. 1B , in all the conductive strips 130 , the conductive strips 130 may be pads and lines extending from the conductive pattern layer 126 of the semiconductor device 128 a to the substrate 110 , so that the semiconductor device 128 a is electrically connected to the substrate 110 . . The conductive strip 130 may also be extended from the conductive pattern layer 126 of the semiconductor element 128b to the conductive pattern layer 126 of the semiconductor element 128c, so that the semiconductor element 128b is electrically connected to the semiconductor element 128c. However, the present invention does not limit the shape, number, and distribution of the conductive strips.
堆疊式封裝件100可以更包括模封層140,模封層140覆蓋堆疊結構120與導電帶130,且模封層140亦覆蓋於基板110上。一般而言,模封層140為封膠體,用以包覆堆疊結構120,減少堆疊結構120受到外力、濕氣或溫度的不良影響或受到其他物質的侵蝕。模封層140可以是高分子材料,例如是環氧模封化合物(Epoxy Molding Compound,EMC)、聚醯亞胺(Polyimide,PI)、酚醛樹脂(Phenolics)或是矽樹脂(Silicones)等,以轉移成形方式(transfer molding)覆蓋於堆疊結構120之上。此外,模封層140也可以是陶瓷材料。不過,本發明 並不對模封層的材料加以限定。 The stacked package 100 may further include a molding layer 140 covering the stacked structure 120 and the conductive strip 130, and the molding layer 140 also covers the substrate 110. Generally, the encapsulation layer 140 is an encapsulant for covering the stacked structure 120, which reduces the stack structure 120 from being adversely affected by external force, moisture or temperature or being attacked by other substances. The mold sealing layer 140 may be a polymer material, such as an epoxy resin compound (EMC), polyimide (PI), phenolic resin (Phenolics) or silicone resin (Silicones), etc. Transfer molding covers the stacked structure 120. Further, the mold layer 140 may also be a ceramic material. However, the present invention The material of the molding layer is not limited.
另外,依據各堆疊式封裝件的產品需求,堆疊式封裝件100可以更包括導電層150,導電層150覆蓋於模封層140之上。導電層150作為電磁遮蔽(Electromagnetic Interference,EMI)層,用以降低電磁干擾效應與射頻干擾效應。導電層150可以是金屬材料,例如是銅、鋁或是銀化鎳等材料。導電層150也可以是導電高分子材料,例如,聚苯胺(Polyaniline,PAn)、聚砒咯(Pclypyrrcle,PYy)或是聚賽吩(Polythiophene,PTh)等材料。不過,本發明並不限定導電層150的材料。 In addition, the stacked package 100 may further include a conductive layer 150 overlying the mold layer 140 according to product requirements of each stacked package. The conductive layer 150 acts as an Electromagnetic Interference (EMI) layer to reduce electromagnetic interference effects and radio frequency interference effects. The conductive layer 150 may be a metal material such as copper, aluminum or silver nickel. The conductive layer 150 may also be a conductive polymer material, for example, polyaniline (PAn), polypyrrole (PYy) or polythiophene (PTh). However, the present invention does not limit the material of the conductive layer 150.
圖2A~2E分別是本發明實施例的堆疊式封裝件的製造方法於各步驟所形成的半成品之示意圖。接著,請依序配合圖2A~2E來參閱。 2A-2E are schematic views of a semi-finished product formed in each step of the method for manufacturing a stacked package according to an embodiment of the present invention. Next, please refer to Figure 2A~2E in order.
首先,提供基板110,並於基板110上配置一堆疊結構120。請參閱圖2A,具體來說,提供半導體元件128d,而半導體元件128d具有第一表面S1以及相對第一表面S1的第二表面S2。將半導體元件128d配置於基板110上並與基板110電性連接。 First, a substrate 110 is provided, and a stacked structure 120 is disposed on the substrate 110. Referring to FIG. 2A, in particular, a semiconductor component 128d is provided, and the semiconductor component 128d has a first surface S1 and a second surface S2 opposite the first surface S1. The semiconductor element 128d is disposed on the substrate 110 and electrically connected to the substrate 110.
詳細而言,先透過重新佈線半導體元件128a、128b、128c及128d,以改變原先所製作的設計半導體元件128a、128b、128c及128d的線路(trace)及接墊(pad)。詳細而言首先,先以微影製程(Photolithography)定義欲重新配置的導電圖案,再利用電鍍及/或蝕刻製作出導電圖案層126,從而使半導體元件128a、128b、128c及128d上的線路得以重新配置於半導體元件128a、128b、128c及128d及其邊緣上,以形成導電圖案層126。導電圖案層126配置於每個半導體元件128a、128b、128c及128d 的第一表面S1上。承上述,導電圖案層126為一重新佈線層,而第一圖案層P1為接墊(Pad),第二圖案層P2為線路(trace)。 In detail, the traces and pads of the originally designed semiconductor elements 128a, 128b, 128c, and 128d are changed by rewiring the semiconductor elements 128a, 128b, 128c, and 128d. In detail, first, a conductive pattern to be reconfigured is defined by Photolithography, and then a conductive pattern layer 126 is formed by plating and/or etching, thereby enabling wiring on the semiconductor elements 128a, 128b, 128c, and 128d. The semiconductor elements 128a, 128b, 128c, and 128d and their edges are reconfigured to form a conductive pattern layer 126. The conductive pattern layer 126 is disposed on each of the semiconductor elements 128a, 128b, 128c, and 128d On the first surface S1. In the above, the conductive pattern layer 126 is a rewiring layer, and the first pattern layer P1 is a pad and the second pattern layer P2 is a trace.
其後,可以使用薄膜型黏晶膠層、銀膠或者是樹脂將其中一半導體元件128d的第二表面S2貼附於基板110上。另外,也可以使用表面接著技術(SMT),於基板110上附著錫膏製作焊錫點,進行元件定位後,接著以迴悍(Reflow)的方式使得半導體元件128d電性連接於基板110上。不過,本發明並不對半導體元件128d的黏附方式加以限定。 Thereafter, the second surface S2 of one of the semiconductor elements 128d may be attached to the substrate 110 using a film type adhesive layer, silver paste or resin. Alternatively, a surface soldering technique (SMT) may be used to deposit a solder paste on the substrate 110 to form a solder spot, and after the device is positioned, the semiconductor device 128d is electrically connected to the substrate 110 by reflow. However, the present invention does not limit the manner in which the semiconductor element 128d is adhered.
請參閱圖2B,將多個絕緣層127黏附於各半導體元件128之間,絕緣層127配置於其中一半導體元件128的第一表面S1上,並且附著於另一半導體元件128的第二表面S2,以疊合每個半導體元件128,進而形成堆疊結構120。詳細而言,在黏附絕緣層127的過程中,首先,將絕緣層127配置在半導體元件128d之上,其中半導體元件128d上配置有導電圖案層126,再將半導體元件128c配置於位於半導體元件128d上的絕緣層127之上,而後再於半導體元件128c上配置絕緣層127。依此形式,將半導體元件128a、128b、128c及128d皆配置於基板110上。接著,進行壓合的流程,以使得將半導體元件128黏合在一起,並且形成堆疊結構120。值得注意的是,絕緣層127也可以是黏晶膠,且本發明並不限定形成堆疊結構120的方法。 Referring to FIG. 2B, a plurality of insulating layers 127 are adhered between the respective semiconductor elements 128. The insulating layer 127 is disposed on the first surface S1 of one of the semiconductor elements 128 and attached to the second surface S2 of the other semiconductor element 128. To overlap each of the semiconductor elements 128, thereby forming a stacked structure 120. In detail, in the process of adhering the insulating layer 127, first, the insulating layer 127 is disposed over the semiconductor element 128d, wherein the conductive element layer 126 is disposed on the semiconductor element 128d, and the semiconductor element 128c is disposed on the semiconductor element 128d. On the upper insulating layer 127, an insulating layer 127 is then disposed on the semiconductor element 128c. In this form, the semiconductor elements 128a, 128b, 128c, and 128d are all disposed on the substrate 110. Next, a process of pressing is performed so that the semiconductor elements 128 are bonded together, and the stacked structure 120 is formed. It should be noted that the insulating layer 127 may also be a die bond, and the present invention does not limit the method of forming the stacked structure 120.
接著,請參閱圖2C,將遮罩160覆蓋於堆疊結構120上。遮罩160具有多個開口162,而開口162可設置於遮罩160的頂面以及側面。開口162用以裸露出位於頂面122及側壁124的導電圖案層126。值得說明的是,這些開口162的形狀通常為長條狀,而且可以依據不同的電性連接考量而自行設 計開口162的長度、數量以及分佈位置,從而能夠將所欲裸露的導電圖案層126的位置露出。舉例而言,開口162可以是由遮罩160的頂面延伸至基板110的位置,從而裸露出堆疊結構120的側壁124的導電圖案層126以及基板110的接墊,或者遮罩160的頂面可以不設有任何開口162,而僅於遮罩的側面形成開口162。不過,本發明並不對開口162的設計加以限定。 Next, referring to FIG. 2C, the mask 160 is overlaid on the stacked structure 120. The mask 160 has a plurality of openings 162, and the openings 162 may be disposed on the top and sides of the mask 160. The opening 162 is used to expose the conductive pattern layer 126 on the top surface 122 and the sidewalls 124. It should be noted that the shapes of the openings 162 are usually long and can be set according to different electrical connection considerations. The length, number, and distribution position of the openings 162 are measured so that the position of the conductive pattern layer 126 to be exposed can be exposed. For example, the opening 162 may be a position extending from the top surface of the mask 160 to the substrate 110 such that the conductive pattern layer 126 of the sidewall 124 of the stacked structure 120 and the pads of the substrate 110 are exposed, or the top surface of the mask 160 There may be no openings 162 provided, but only the sides 162 are formed on the sides of the mask. However, the present invention does not limit the design of the opening 162.
隨後,形成一導電材料於遮罩160上,而此導電材料不僅附著於遮罩160的外表面,也會透過開口162的形狀而附著於堆疊結構120上,據以形成導電帶130。詳細而言,透過噴塗(Spraying)、濺鍍(Sputtering)、離子鍍(Ion Plating)或者是蒸鍍(Evaporation Deposition)等製程,將導電材料沉積於遮罩160上。 Subsequently, a conductive material is formed on the mask 160, and the conductive material not only adheres to the outer surface of the mask 160 but also adheres to the stacked structure 120 through the shape of the opening 162, thereby forming the conductive strip 130. In detail, a conductive material is deposited on the mask 160 by a process such as spraying, sputtering, Ion Plating, or evaporation deposition.
請參閱圖2D,取下遮罩160,即可於堆疊結構120的頂面122以及側壁124上形成導電帶130。值得注意的是,導電帶130的厚度可依照沉積導電材料的時間長短來進行控制。另外,導電帶130的材料為金屬,例如是鋁、銅或銀等。然而,本發明並不限定導電帶130的鍍膜方法以及材料。經由上述步驟,堆疊式封裝件基本上已形成。 Referring to FIG. 2D, the mask 160 is removed to form the conductive strip 130 on the top surface 122 of the stacked structure 120 and the sidewalls 124. It is worth noting that the thickness of the conductive strip 130 can be controlled in accordance with the length of time the conductive material is deposited. In addition, the material of the conductive tape 130 is a metal such as aluminum, copper or silver. However, the present invention does not limit the plating method and material of the conductive tape 130. Through the above steps, the stacked package is substantially formed.
請參閱圖2E,形成模封層140,其覆蓋於堆疊結構120、導電帶130與基板110之上。模封層140的材料選擇需考慮熱膨脹係數,以降低於基板110發生翹曲變形的情形。模封層140可以是高分子材料,例如是環氧模封化合物(Epoxy Molding Compound,EMC)、聚醯亞胺(Polyimide,PI)、酚醛樹脂(Phenolics)或是矽樹脂(Silicones)等,而模封層140可利用轉移成形方式(transfer molding)製作。詳細而言,先將堆疊式封裝件置入模穴中,將欲填充的高分子材料在預熱箱加熱軟 化後,接著利用加壓傳送的方式使融熔態的高分子材料進入澆道(runner)以及模穴,經冷卻熟化及折膠後模封層140即覆蓋於堆疊結構120之上。此外,模封層140也可以是陶瓷材料,經燒結之後形成模封層140。不過,本發明並不對模封層140的材料以及製作方式加以限定。 Referring to FIG. 2E, a molding layer 140 is formed overlying the stacked structure 120, the conductive strip 130, and the substrate 110. The material selection of the mold layer 140 needs to take into account the coefficient of thermal expansion to reduce the occurrence of warping deformation of the substrate 110. The mold sealing layer 140 may be a polymer material, such as an epoxy resin compound (EMC), a polyimide (PI), a phenolic resin (Phenolics), or a silicone resin (Silicones). The mold layer 140 can be fabricated by transfer molding. In detail, the stacked package is first placed in the cavity, and the polymer material to be filled is heated in the preheating box. After the oxidation, the molten polymer material is introduced into the runner and the cavity by means of pressurized transfer, and the mold layer 140 is overlaid on the stacked structure 120 after being cooled and aged. In addition, the mold layer 140 may also be a ceramic material that is formed into a mold layer 140 after sintering. However, the present invention does not limit the material of the mold layer 140 and the manner in which it is made.
請再次參閱圖1B,導電層150形成於模封層140上。導電層150可以是金屬材料,並且可用噴塗(spraying)或濺鍍(sputtering)方式製作於模封層140上。此外,導電層150也可以是導電高分子材料。不過,導電層150的材料以及製作方式僅為說明,並非限定本發明。 Referring again to FIG. 1B, a conductive layer 150 is formed on the mold layer 140. The conductive layer 150 may be a metal material and may be formed on the mold layer 140 by spraying or sputtering. Further, the conductive layer 150 may also be a conductive polymer material. However, the material and manufacturing method of the conductive layer 150 are merely illustrative and are not intended to limit the invention.
綜上所述,本發明實施例提供一種具有導電帶的堆疊式封裝件,透過導電帶的長度、數量以及分佈位置的變化,使得導電帶能作為堆疊結構的電性連結,進而簡化封裝結構以及製造方法。由於導電帶配置於堆疊結構的側壁上,並且連結與其中一些側壁所裸露出的導電圖案層,因此半導體元件彼此之間得以透過導電帶而電性連接,而可以簡化封裝的製程結構。 In summary, the embodiments of the present invention provide a stacked package having a conductive strip, and the length, the number, and the position of the conductive strip are changed, so that the conductive strip can be electrically connected as a stacked structure, thereby simplifying the package structure and Production method. Since the conductive strips are disposed on the sidewalls of the stacked structure and are bonded to the conductive pattern layers exposed by some of the sidewalls, the semiconductor elements are electrically connected to each other through the conductive strips, and the process structure of the package can be simplified.
除此之外,本發明實施例提供堆疊式封裝件的形成方法,透過覆蓋一具有開口的遮罩於堆疊結構上,再沉積一導電材料於所述遮罩上,而導電材料得以透過開口而形成導電帶於堆疊結構上,因此,可以簡化封裝的方法流程。 In addition, embodiments of the present invention provide a method for forming a stacked package by covering a stacked structure with a mask, and then depositing a conductive material on the mask, and the conductive material is allowed to pass through the opening. The conductive strip is formed on the stacked structure, and therefore, the method flow of the package can be simplified.
以上所述僅為本發明的實施例,其並非用以限定本發明的專利保護範圍。任何熟習相像技藝者,在不脫離本發明的精神與範圍內,所作的更動及潤飾的等效替換,仍為本發明的專利保護範圍內。 The above is only an embodiment of the present invention, and is not intended to limit the scope of the invention. It is still within the scope of patent protection of the present invention to make any substitutions and modifications of the modifications made by those skilled in the art without departing from the spirit and scope of the invention.
100‧‧‧堆疊式封裝件 100‧‧‧Stacked package
110‧‧‧基板 110‧‧‧Substrate
120‧‧‧堆疊結構 120‧‧‧Stack structure
122‧‧‧頂面 122‧‧‧ top surface
124‧‧‧側壁 124‧‧‧ side wall
126‧‧‧導電圖案層 126‧‧‧conductive pattern layer
127‧‧‧絕緣層 127‧‧‧Insulation
128a、128b、128c、128d‧‧‧半導體元件 128a, 128b, 128c, 128d‧‧‧ semiconductor components
130‧‧‧導電帶 130‧‧‧ Conductive tape
140‧‧‧模封層 140‧‧•mold layer
150‧‧‧導電層 150‧‧‧ Conductive layer
160‧‧‧遮罩 160‧‧‧ mask
162‧‧‧開口 162‧‧‧ openings
P1‧‧‧第一圖案層 P1‧‧‧ first pattern layer
P2‧‧‧第二圖案層 P2‧‧‧ second pattern layer
S1‧‧‧第一表面 S1‧‧‧ first surface
S2‧‧‧第二表面 S2‧‧‧ second surface
圖1A是本發明實施例的堆疊式封裝件的俯視示意圖。 FIG. 1A is a top plan view of a stacked package according to an embodiment of the invention.
圖1B是圖1A中沿線P-P剖面所繪示的剖面示意圖。 1B is a schematic cross-sectional view taken along line P-P of FIG. 1A.
圖2A~2E是圖1B中的堆疊式封裝件的製造方法於各步驟所形成的半成品之示意圖 2A-2E are schematic views of a semi-finished product formed in each step of the method for manufacturing the stacked package of FIG. 1B;
100‧‧‧堆疊式封裝件 100‧‧‧Stacked package
110‧‧‧基板 110‧‧‧Substrate
120‧‧‧堆疊結構 120‧‧‧Stack structure
122‧‧‧頂面 122‧‧‧ top surface
124‧‧‧側壁 124‧‧‧ side wall
126‧‧‧導電圖案層 126‧‧‧conductive pattern layer
127‧‧‧絕緣層 127‧‧‧Insulation
128a、128b、128c、128d‧‧‧半導體元件 128a, 128b, 128c, 128d‧‧‧ semiconductor components
130‧‧‧導電帶 130‧‧‧ Conductive tape
140‧‧‧模封層 140‧‧•mold layer
150‧‧‧導電層 150‧‧‧ Conductive layer
S1‧‧‧第一表面 S1‧‧‧ first surface
S2‧‧‧第二表面 S2‧‧‧ second surface
Claims (14)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101148349A TW201426958A (en) | 2012-12-19 | 2012-12-19 | Stacked package device and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101148349A TW201426958A (en) | 2012-12-19 | 2012-12-19 | Stacked package device and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201426958A true TW201426958A (en) | 2014-07-01 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| TW101148349A TW201426958A (en) | 2012-12-19 | 2012-12-19 | Stacked package device and manufacturing method thereof |
Country Status (1)
| Country | Link |
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| TW (1) | TW201426958A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI581394B (en) * | 2015-10-20 | 2017-05-01 | 力成科技股份有限公司 | Carrier board |
| TWI628760B (en) * | 2016-02-17 | 2018-07-01 | 美光科技公司 | Apparatus and method for internal thermal diffusion of encapsulated semiconductor dies |
-
2012
- 2012-12-19 TW TW101148349A patent/TW201426958A/en unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI581394B (en) * | 2015-10-20 | 2017-05-01 | 力成科技股份有限公司 | Carrier board |
| TWI628760B (en) * | 2016-02-17 | 2018-07-01 | 美光科技公司 | Apparatus and method for internal thermal diffusion of encapsulated semiconductor dies |
| US11329026B2 (en) | 2016-02-17 | 2022-05-10 | Micron Technology, Inc. | Apparatuses and methods for internal heat spreading for packaged semiconductor die |
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