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TW201337009A - Palladium mesh alloy wire without plating thereon and method manufacturing the same - Google Patents

Palladium mesh alloy wire without plating thereon and method manufacturing the same Download PDF

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TW201337009A
TW201337009A TW102117450A TW102117450A TW201337009A TW 201337009 A TW201337009 A TW 201337009A TW 102117450 A TW102117450 A TW 102117450A TW 102117450 A TW102117450 A TW 102117450A TW 201337009 A TW201337009 A TW 201337009A
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palladium
silver
wire
alloy wire
plating
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TW102117450A
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TWI429769B (en
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Truan-Sheng Lui
Fei-Yi Hung
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Truan-Sheng Lui
Fei-Yi Hung
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Abstract

The invention relates to a palladium mesh alloy wire without plating thereon and a method manufacturing the same. The manufacturing method comprises the following steps: plating a palladium layer with the thickness of 5-120nm on a surface of a silver baseline, heating it up to 600-800 DEG C and maintaining the temperature for not more than 4 hours so that the palladium on the surface is thermally diffused into the grain boundary grid of the silver baseline to form a grain-boundary band containing palladium. The wire consists of the silver base and grain-boundary band containing palladium. Comparing to the known silver based bonding wire, it has better hardness of the ball, strength of the neck and density of the fusing current. More particularly, it has excellent weather resistance. The invention can be applied to LED manufacturing process directly without using protective gas. Thus it has low impedance and can avoid the application problems of the crooked ball, low strength of the neck and short preservation time caused form the solidification and segregation when the known bonding wires are used.

Description

無鍍層鈀網合金線及其製造方法 Uncoated palladium mesh alloy wire and manufacturing method thereof

本發明係有關於一種無鍍層鈀網合金線及其製造方法,尤其是指一種無表面鍍層之銀或銀合金封裝導線,不僅可解決傳統銀線於形成銲球的同時必需加入保護氣體所產生的問題和降低線材冶金偏析,亦具有較佳之熔斷電流密度與抗氧化功效者。 The invention relates to an uncoated palladium mesh alloy wire and a manufacturing method thereof, in particular to a silver or silver alloy packaged wire without surface plating, which can not only solve the problem that a conventional silver wire must be added with a shielding gas while forming a solder ball. The problem and the reduction of wire metallurgy segregation also have better melting current density and antioxidant effect.

按,低電阻率是一般電子產品封裝導線的基本要求,而對於高速運作及高頻的積體電路元件而言(例如:高速放大器、震盪器、電源管理積體電路、以及高速通訊元件等),為了避免訊號延遲(signal delaying)及串音干擾(cross talk interference),對導線的電阻率要求更為嚴格;此外,為了確保產品在長時間及嚴苛條件下能夠維持正常壽命與功能(耐候性),可靠度的考量也極為重要;因此,封裝產業需要能夠兼顧低阻抗且高信賴的打線接合線材。 According to the low electrical resistivity, it is a basic requirement for general electronic product packaging wires, and for high-speed operation and high-frequency integrated circuit components (such as high-speed amplifiers, oscillators, power management integrated circuits, and high-speed communication components, etc.) In order to avoid signal delaying and cross talk interference, the resistivity of the wire is more stringent; in addition, to ensure that the product can maintain normal life and function under long-term and severe conditions (weathering Sexuality, reliability considerations are also extremely important; therefore, the packaging industry needs to be able to combine low-impedance and high-reliability wire bonding wires.

目前常見的封裝導線,有金線、銅線、銀線、合金線等,以銀線為例,銀是在所有材料中電阻率最低的元素,然純銀線在鋁墊上打線接合時也會生成脆性的介金屬化合物(Ag2 Al或Ag4Al);此外,純銀線在含水氣的封裝材料內部很容易發生電解離子遷移現象(ionmigration),亦即,純銀在含水氣環境會經由電流作用水解溶出銀離子,再與氧反應成為不穩定的氧化銀(AgO),此氧化銀因而會進行去氧化作用(deoxidize)形成銀原子,並向正極成長出樹葉紋理狀(leaf vein)的銀鬚,最後造成正負電極的短路;因此,目前純銀線並無法提供業界所需之成球性與穩定性;因此有業者以銀為主的合金線(例如包括銅、鉑、錳、鉻、金等元素)作為封裝導線,但所形 成的線材仍無法兼具低阻抗及高可靠度的性質。 At present, common package wires include gold wire, copper wire, silver wire, alloy wire, etc. Taking silver wire as an example, silver is the lowest resistivity element among all materials, and pure silver wire is also generated when wire bonding is performed on the aluminum pad. Brittle intermetallic compound (Ag 2 Al or Ag 4 Al); in addition, pure silver wire is prone to ion migration in an aqueous gas encapsulating material, that is, pure silver is hydrolyzed by an electric current in an aqueous gas environment. The silver ions are eluted and reacted with oxygen to become unstable silver oxide (AgO), which deoxidizes to form silver atoms, and grows the leaves of the leaf veins to the positive electrode. Finally, the short circuit of the positive and negative electrodes is caused; therefore, the current pure silver wire does not provide the spheroidality and stability required by the industry; therefore, there are silver-based alloy wires (including elements such as copper, platinum, manganese, chromium, gold, etc.). As a packaged wire, the formed wire still cannot have both low impedance and high reliability.

此外,為了解決純銀接合線亦氧化的問題,有業者提出於其表面鍍上其他金屬鍍層以改善易氧化及腐蝕的方法,請一併參閱新日鐵高新材料股份有限公司與日鐵微金屬股份有限公司所申請一系列有關半導體裝置用合接線之中華民國發明專利,公告第I342809所揭露之『半導體裝置用合接線』、公告第I364806所揭露之『半導體裝置用合接線』、公告第I364806所揭露之『半導體用接合導線』、公開第201107499之『半導體用銅合金接合線』、公開第201140718之『半導體用銅接合線及其接合構造』以及公開第201230903之『複數層銅接合線的接合構造』;上述前案之接合線結構大抵皆係於一芯材(可為銅、金、銀等金屬所構成)表面設有一表皮層(可為鈀、釕、銠、鉑,以及銀所構成),導致上述之接合線於實際實施使用時常產生下述缺失:(a)因鍍金屬的線材其表面具有一表皮層,使得硬度偏高,且製程電流控制不易,常導致鍍層厚度不均,造成封裝過程整體產出率差、良率偏低;(b)銀或銀合金鍍上鈀層於燒球成型(electric frame off,EFO)時,因表面之鈀層使得成球(free air ball,FAB)之球心硬度過硬,造成銲球上方頸部之強度不足,於打線(wire bonding,WB)後,常發生頸部斷裂問題,進而導致接合界面剝離的問題發生;且鈀元素在銲球中也具偏析問題,該球部組織差異大影響打線條件。 In addition, in order to solve the problem of oxidation of pure silver bonding wire, some companies have proposed to apply other metal plating on the surface to improve the method of oxidation and corrosion. Please refer to Nippon Steel High-tech Materials Co., Ltd. and Nippon Steel Micro Metals Co., Ltd. Co., Ltd. has applied for a series of wirings for semiconductor devices, the Republic of China invention patent, the "connection wire for semiconductor devices" disclosed in the announcement No. I342809, the "connection wire for semiconductor devices" disclosed in the announcement No. I364806, and the publication No. I364806 The "semiconductor bonding wire" disclosed in Japanese Patent Publication No. 201107499, the "copper bonding wire for semiconductors" of the publication No. 201107418, the "copper bonding wire for semiconductors and the bonding structure thereof", and the bonding of the plurality of copper bonding wires of the publication No. 201230903 The structure of the bonding wire of the above-mentioned prior case is generally formed by a surface layer (which may be composed of palladium, rhodium, ruthenium, platinum, and silver) on a surface of a core material (which may be composed of a metal such as copper, gold or silver). The resulting bonding wire often causes the following defects when actually used: (a) the metal-plated wire has a skin on its surface The layer makes the hardness higher, and the process current control is not easy, which often leads to uneven thickness of the plating layer, resulting in poor overall output rate and low yield in the packaging process; (b) silver or silver alloy plating palladium layer on the ball forming ( When electric frame off (EFO), the palladium layer on the surface makes the core of the free air ball (FAB) hard, resulting in insufficient strength of the neck above the solder ball. After wire bonding (WB), often The problem of neck fracture occurs, which leads to the problem of peeling of the joint interface; and the palladium element also has a segregation problem in the solder ball, and the difference in the structure of the ball portion greatly affects the wire bonding condition.

此外,一般打線接合線材於端部熔融形成銲球的同時,係利用一輸氣裝置持續地供應保護氣體(例如氮、氬或氮氫混合氣),以保護銲球成形,其中之氮、氬氣可包覆保護銲球避免氧化,而氮氫混合氣中的氫氣更可還原銲球上已氧化之部份,有助於保護銲球之成型,最後,再將連接有銲線之銲球接合於晶粒或載體之銲墊上;然,保護氣體的使用不僅增加製造成本,且當保護氣體控制不當,造成流量不穩或紊流,會導致銲球燒球異常,使得進行打線製程後之品質異常,造成電性和界面強度不足等問題;且當純銀或銀合金接合線於無保護氣體的環境下係不具成球性,無法達到LED封裝產業製程可靠度的品質要求。 In addition, generally, the wire bonding wire is melted at the end to form a solder ball, and a gas supply device is continuously supplied with a shielding gas (for example, a mixture of nitrogen, argon or nitrogen-hydrogen) to protect the solder ball, wherein nitrogen and argon are formed. The gas can be coated to protect the solder ball from oxidation, and the hydrogen in the nitrogen-hydrogen mixture can reduce the oxidized portion of the solder ball, which helps to protect the solder ball. Finally, the solder ball is connected to the solder ball. Bonded to the pad of the die or carrier; however, the use of the shielding gas not only increases the manufacturing cost, but also causes improper flow or turbulence when the shielding gas is improperly controlled, which may cause the ball to burn abnormally, so that the wire bonding process is performed. The quality is abnormal, causing problems such as insufficient electrical properties and interface strength; and when the pure silver or silver alloy bonding wire is not spherical in the environment without protective gas, the quality requirement of the process reliability of the LED packaging industry cannot be achieved.

今,發明人即是鑑於上述現有封裝用之接合線在實際實施上仍具有多處之缺失,於是乃一本孜孜不倦之精神,並藉由其豐富之專業知識及多年之實務經驗所輔佐,而加以改善,並據此研創出本發明。 Nowadays, the inventor is in view of the fact that the above-mentioned existing bonding wire for packaging has many defects in practical implementation, so it is a tireless spirit, and with its rich professional knowledge and years of practical experience, Improvements have been made and the present invention has been developed based on this.

本發明主要目的為提供一種無鍍層鈀網合金線及其製造方法,尤其是指一種無表面鍍層之銀或銀合金封裝導線,不僅有較佳之球部硬度、頸部强度以及熔斷電流密度外,亦可解決傳統銀線於形成銲球的同時必需加入保護氣體所產生的問題。 The main object of the present invention is to provide an uncoated palladium mesh alloy wire and a manufacturing method thereof, in particular to a silver or silver alloy packaged wire without surface plating, which not only has better ball hardness, neck strength and fusing current density, but also has a better ball hardness, neck strength and fusing current density. It can also solve the problem that the traditional silver wire must be added to the protective gas while forming the solder ball.

為了達到上述實施目的,本發明人提出一種無鍍層鈀網合金線及其製造方法,其製造方法係於一銀基線表面鍍上5nm~120nm之鈀層後,加熱至600~800℃之溫度,持續該溫度不超過4小時,使鈀元素完全熱擴散至銀基線晶界網格中形成含鈀晶界帶;其中,使鈀元素完全熱擴散之溫度較佳係為720℃;藉此,與習知接合線相較下,本發明由於鈀粒子完全固態擴散至銀基線晶界網格內,不僅能保有低電阻性,燒球後亦具有較小的球部硬度;經打線製程後,可避免如傳統常發生於頸部斷裂問題,進而導致接合界面剝離的問題發生,且導線內的電子可順利通過鈀網晶界而藉由銀晶粒直接傳輸,因而具有較低的電阻率,相較非純銀線具有較大的熔斷電流密度;同時,本發明之無鍍層鈀網合金線可避免傳統之接合銀線易氧化的缺失,於大氣潔淨環境中其抗氧化性亦達21天以上;再者,無鍍層鈀網合金線在無保護氣體之環境下,其實驗結果證實仍具良好的成球性,不僅可減少封裝製造成本,且亦無須顧及保護氣體的流量控制,降低製程上會影響品質的因素。 In order to achieve the above-mentioned object, the present inventors propose an uncoated palladium mesh alloy wire and a method for fabricating the same, which are produced by plating a palladium layer of 5 nm to 120 nm on a silver substrate surface and heating to a temperature of 600 to 800 ° C. The temperature is continued for less than 4 hours, and the palladium element is completely thermally diffused into the silver base grain boundary grid to form a palladium-containing grain boundary zone; wherein the temperature at which the palladium element is completely thermally diffused is preferably 720 ° C; thereby, Compared with the conventional bonding wire, the present invention not only can maintain low electrical resistance due to the complete solid state diffusion of the palladium particles into the silver-baseline grain boundary grid, but also has a small ball hardness after burning the ball; Avoiding the problem of neck fracture as usual, which leads to the problem of joint interface peeling, and the electrons in the wire can pass through the palladium mesh grain boundary and directly transfer through the silver crystal grain, thus having a lower resistivity. Compared with the non-pure silver wire, it has a large fusing current density; at the same time, the uncoated palladium mesh alloy wire of the invention can avoid the oxidative loss of the conventional bonded silver wire, and the oxidation resistance is also 21 days in an air clean environment. Furthermore, the uncoated palladium mesh alloy wire is in the absence of a protective gas environment, and the experimental results prove that it still has good sphericity, which not only reduces the manufacturing cost of the package, but also does not need to take into account the flow control of the shielding gas, and reduces the process. Factors that affect quality.

在本發明的另一實施例中,銀基線之成分可包含有1~5wt.%的金元素,較佳為3wt.%的金元素;藉此,以具有更佳的球部硬度與熔斷電流密度。 In another embodiment of the present invention, the composition of the silver base may comprise 1 to 5 wt.% of a gold element, preferably 3 wt.% of a gold element; thereby, having a better ball hardness and a fusing current density.

第一圖:本發明實施例1之無鍍層鈀網合金線其熱處理後鈀元素完全擴散至銀基線晶界網格內之顯微鏡組織圖 The first figure: the microscopic organization diagram of the palladium element completely diffused into the silver basement grain boundary grid after the heat treatment of the uncoated palladium mesh alloy wire of the embodiment 1 of the present invention

第二圖:本發明實施例2之無鍍層鈀網合金線其熱處理後鈀 元素完全擴散至銀基線晶界網格內之顯微鏡組織圖 Second: Palladium-free alloy line of the second embodiment of the present invention Microscopic organization of the element completely diffused into the silver-baseline grain boundary grid

本發明之目的及其結構功能上的優點,將依據以下圖面所示之結構,配合具體實施例予以說明,俾使審查委員能對本發明有更深入且具體之瞭解。 The object of the present invention and its structural and functional advantages will be explained in conjunction with the specific embodiments according to the structure shown in the following drawings, so that the reviewing committee can have a more in-depth and specific understanding of the present invention.

首先,本發明之無鍍層鈀網合金線係適用於IC封裝、LED封裝等之電子工業零件之封裝導線;其具體實施例1之製造方法係於一銀基線表面鍍上5nm~120nm之鈀層後,加熱至600~800℃之溫度,持續該溫度至多4小時,使鈀元素完全熱擴散至銀基線晶界網格內,藉此形成含鈀之晶界帶,使得本發明之無鍍層鈀網合金線係由銀基地與含鈀網格晶界帶所組成,與習知銀系接合線相較下,具有較佳之球部硬度、頸部强度以及熔斷電流密度,更具有極佳耐候性;請參閱第一圖所示,為本發明實施例1之無鍍層鈀網合金線其鈀元素完全熱擴散至銀基線晶界網格中之顯微鏡組織圖;其中,較佳之加熱溫度係為720℃;請參閱下表所示,其係於銀基線(18μm)表面鍍上厚度分別為5nm、60nm、120nm以及140nm的鈀層,加熱至720℃時,持續30分、1小時、2小時、3小時以及4小時後,於銀基線表面量測鈀層殘留厚度的實驗數據表;可清楚得知,厚度為5nm~120nm之鈀層,在溫度為720℃持續30分~4小時後,銀基線表面的鈀層將完全擴散至銀基線晶界網格內,亦即表面無鈀層的殘留。 First, the uncoated palladium mesh alloy wire of the present invention is suitable for packaged wires of electronic industrial parts such as IC packages and LED packages; the manufacturing method of the specific embodiment 1 is to apply a palladium layer of 5 nm to 120 nm on a silver base surface. Thereafter, heating to a temperature of 600-800 ° C, continuing the temperature for up to 4 hours, completely diffusing the palladium element into the silver base grain boundary grid, thereby forming a palladium-containing grain boundary band, so that the uncoated palladium of the present invention The mesh alloy wire system is composed of a silver base and a palladium-containing grid grain boundary band. Compared with the conventional silver bond wire, it has better ball hardness, neck strength and fusing current density, and has excellent weather resistance; Referring to the first figure, it is a microscopic organization diagram of the uncoated palladium mesh alloy wire of the first embodiment of the present invention, wherein the palladium element is completely thermally diffused into the silver base grain boundary grid; wherein the preferred heating temperature is 720 ° C; Please refer to the table below, which is plated with a palladium layer with a thickness of 5 nm, 60 nm, 120 nm and 140 nm on the silver baseline (18 μm), and heated to 720 ° C for 30 minutes, 1 hour, 2 hours, 3 hours. And after 4 hours, on the silver baseline surface The experimental data sheet for measuring the residual thickness of the palladium layer; it can be clearly seen that the palladium layer having a thickness of 5 nm to 120 nm, after a temperature of 720 ° C for 30 minutes to 4 hours, the palladium layer on the silver baseline surface will completely diffuse to the silver base crystal. Within the boundary grid, that is, the residue of the surface without palladium.

此外,本發明之無鍍層鈀網合金線其銀基線之成分可包含有1~5wt.%的金元素,較佳係包含有3wt.%的金元素;而此具體實施例2於銀基線表面鍍上厚度分別為5nm、60nm、120nm以及140nm的鈀層,加熱至720℃時,持續30分、1小時、2小時、3小時以及4小時後,於銀基線表面量測鈀層厚度的實驗數據表如下表所示;可清楚得知,厚度為5nm~120nm之鈀層,在溫度為720℃持續30分~4小時後,包含有3wt.%金元素之銀基線表面的鈀層亦將完全擴散至銀基線晶界網格內,亦即表面無鈀層的殘留,請一併參閱第二圖所示,為本發明實施例2之無鍍層鈀網合金線其鈀元素完全熱擴散至銀基線晶界網格中之顯微鏡組織圖。 In addition, the unplated palladium mesh alloy wire of the present invention may have a silver baseline component of 1 to 5 wt. % gold element, preferably contains 3wt. % of the gold element; and in this embodiment 2, a palladium layer having a thickness of 5 nm, 60 nm, 120 nm, and 140 nm is plated on the surface of the silver base, and is heated to 720 ° C for 30 minutes, 1 hour, 2 hours, 3 hours, and After 4 hours, the experimental data table for measuring the thickness of the palladium layer on the silver baseline surface is shown in the following table; it can be clearly seen that the palladium layer having a thickness of 5 nm to 120 nm is contained at a temperature of 720 ° C for 30 minutes to 4 hours. There are 3wt. The palladium layer on the base surface of the silver element of the gold element will also completely diffuse into the silver-baseline grain boundary grid, that is, the residue of the surface without palladium layer. Please refer to the second figure together, which is the second embodiment of the present invention. The plated palladium mesh alloy wire has its palladium element completely thermally diffused into the microstructure of the silver basement grain boundary grid.

接著,藉由下述傳統封裝用接合線與具體實際實施例1和2的比較應用,可進一步證明本發明之製程可實際應用之範圍,但不意欲以任何形式限制本發明之範圍:下表為環境中持續地供應保護氣體(例如氮、氬或氮氫混合氣),其接合線以保護銲球成形於端部熔融形成銲球的實驗數據對照表;由表中可知在具保護氣體的環境下形成銲球,所有樣品的成球性均可被接受(OK);針對球部硬度而言,係使用維克氏(Vicker)硬度機測量樣品銲球之球部硬度,結果顯示本實施例1、2所形成之銲球其硬度皆比非純銀線明顯較小,其可理解地,當含鈀被覆層未擴散或未完全擴散至芯線基地時,接合線之端部於燒球成型為銲球後,銲球所含的鈀金屬大多聚積於靠近頸部處,造成鈀偏析,導致頸部成為接合線結構強度 之相對弱點,而易於此處發生斷裂問題;反觀本發明其鍍鈀層完全熱擴散至銀基線晶界網格內,因此球心硬度明顯較小,以便打線製程後,可避免如傳統常發生於頸部斷裂問題,進而導致接合界面剝離的問題發生;如同實驗結果,本實施例1、2所形成之銲球其頸部強度皆比其他接合線明顯較大;值得注意的,在此所述的頸部強度,其測試方法是將接合線的頸部以一固定裝置(例如一微細夾具)夾掣,並於接合線對應銲球的另一端以一拉伸裝置朝遠離銲球方向進行拉伸,藉以測試接合線其頸部的降伏強度;再者,由於鈀粒子完全擴散至銀基線晶界網格內,因此導線內的電子可通過鈀網晶界而藉由銀晶粒傳輸,具有較低的電阻率,因而相較非純銀線具有較大的熔斷電流密度;值得注意的,包含有3wt.%金元素之銀基線所製成的無鍍層鈀網合金線係具有更佳的球部硬度與熔斷電流密度。 Next, the range of practical application of the process of the present invention can be further proved by the following comparative application of the conventional package bonding wire to the specific practical examples 1 and 2, but is not intended to limit the scope of the invention in any form: For the continuous supply of protective gas (such as nitrogen, argon or nitrogen-hydrogen mixture) in the environment, the bonding wire is used to protect the solder ball formed at the end and melt to form a solder ball. The experimental data comparison table; The ball is formed under the environment, and the sphericity of all the samples can be accepted (OK). For the hardness of the ball, the hardness of the ball of the sample ball is measured by a Vicker hardness machine. The solder balls formed in Examples 1 and 2 are significantly smaller in hardness than the non-pure silver wires. It is understood that when the palladium-containing coating layer is not diffused or not completely diffused to the core base, the ends of the bonding wires are formed by burning balls. After soldering the ball, the palladium metal contained in the solder ball mostly accumulates near the neck, causing segregation of palladium, resulting in the neck becoming the strength of the bonding wire structure. The relative weakness is easy to break here; in contrast, the palladium-plated layer of the present invention completely thermally diffuses into the silver-baseline grain boundary grid, so the core hardness is significantly smaller, so that it can be avoided as usual after the wire-laying process In the neck fracture problem, the problem of joint interface peeling occurs; as a result of the experiment, the weld strength of the solder balls formed in the first and second embodiments is significantly larger than that of other bonding wires; The strength of the neck is measured by clamping the neck of the bonding wire with a fixing device (for example, a micro jig), and at the other end of the bonding wire corresponding to the solder ball, with a stretching device facing away from the solder ball. Stretching, thereby testing the strength of the neck of the bonding wire; furthermore, since the palladium particles are completely diffused into the silver-baseline grain boundary grid, electrons in the wire can be transported by the silver crystal grains through the palladium network grain boundaries. It has a lower resistivity and thus has a larger fuse current density than a non-pure silver wire; notably, it contains 3wt. The uncoated palladium mesh alloy wire made of the silver base of the gold element has better ball hardness and fusing current density.

接著,當環境中無供應保護氣體時,下表顯示上述樣品形成銲球的實驗數據對照表;由表中可知,供應保護氣體對於純銀線、Ag+Au+Pd合金線以及鍍鈀層合金的成球性是有顯著影響的,而本發明之無鍍層鈀網合金線在無保護氣體之環境下,仍具良好的成球性,亦即本發明無須保護氣體可直接應用在LED製程,不僅兼顧低阻抗且可避免習知接合線於實施使用時因凝固偏析所造成歪球,頸部強度低等應用問題;此外,本發明亦具有較佳之抗氧化能力,於室溫下皆達到大於21天無氧化 之功效,解決習知接合線保存時間短的問題。 Next, when there is no supply of shielding gas in the environment, the following table shows a comparison table of experimental data for forming the solder balls of the above samples; as can be seen from the table, the supply of shielding gas to the pure silver wire, the Ag+Au+Pd alloy wire, and the palladium plating alloy The sphericity has a significant effect, and the uncoated palladium mesh alloy wire of the present invention still has good sphericity in the absence of a protective gas atmosphere, that is, the present invention can be directly applied to the LED process without requiring a protective gas, not only Considering low impedance and avoiding the application problems of the conventional bonding wire caused by solidification segregation during the use, the neck strength is low, etc. In addition, the present invention also has better oxidation resistance and reaches more than 21 at room temperature. No oxidation in days The effect of solving the problem of short retention time of the conventional bonding wire.

再者,請參閱下表,係為說明針對上述樣品於具有保護氣體環境下打線成球,並觀察於溫度150℃,經2000hrs的抗高溫儲藏(high temperature storage,HTS)測試下,其樣品接線與基板之間的介金屬氧化物(intermetallic Compound,IMC)狀況;可明顯得知,本實施例1、2之IMC厚度明顯較薄,進而增強界面剝離強度與銲球接合剪力強度,而具有良好的接合可靠性。 In addition, please refer to the following table to illustrate the sample wiring for the above samples in a protective gas atmosphere, and observe the temperature at 150 ° C, 2000 Hz high temperature storage (HTS) test The intermetallic compound (IMC) condition between the substrate and the substrate; it can be clearly seen that the thickness of the IMC of the first embodiment and the second embodiment is significantly thinner, thereby enhancing the interfacial peel strength and the solder ball joint shear strength, and Good joint reliability.

由上述之實施說明可知,本發明與現有技術相較之下,本發 明具有以下優點: It can be seen from the above description of the implementation that the present invention is compared with the prior art. Ming has the following advantages:

1.本發明藉由熱處理將銀基線表面之鈀層完全擴散至銀基線晶界網格內,與習知銀系接合線相較下,本發明係具有較佳之球部硬度、頸部強度以及熔斷電流密度,不僅兼顧低阻抗且可避免習知接合線於實施使用時常造成頸部斷裂,導致接合界面剝離的問題發生。 1. The present invention completely diffuses the palladium layer on the silver baseline surface into the silver baseline grain boundary grid by heat treatment. Compared with the conventional silver bond wire, the present invention has better ball hardness, neck strength and fusing current. The density not only balances the low impedance, but also avoids the problem that the conventional bonding wire often causes the neck to break when it is used, resulting in the problem of peeling of the joint interface.

2.本發明之無鍍層鈀網合金線在無保護氣體之環境下,仍具良好的成球性,不僅減少製造成本,且亦無須顧及保護氣體的流量控制,降低製程上會影響品質的因素。 2. The uncoated palladium mesh alloy wire of the invention still has good spheroidality in the environment without protective gas, which not only reduces the manufacturing cost, but also does not need to take into account the flow control of the shielding gas, and reduces the factors affecting the quality in the process. .

3.本發明無須保護氣體可直接應用在LED製程,不僅兼顧低阻抗且可避免習知接合線於實施使用時因凝固偏析所造成歪球,頸部強度低,甚至保存時間短等應用問題。 3. The invention can be directly applied to the LED process without protecting gas, and not only the low impedance but also the application problems of the conventional bonding wire caused by solidification segregation during the use, the neck strength is low, and even the storage time is short.

綜上所述,本發明之無鍍層鈀網合金線及其製造方法,的確能藉由上述所揭露之實施例,達到所預期之使用功效,且本發明亦未曾公開於申請前,誠已完全符合專利法之規定與要求。爰依法提出發明專利之申請,懇請惠予審查,並賜准專利,則實感德便。 In summary, the uncoated palladium mesh alloy wire of the present invention and the method of manufacturing the same can achieve the intended use efficiency by the above-disclosed embodiments, and the present invention has not been disclosed before the application, and has been completely completed. Meet the requirements and requirements of the Patent Law.爰Issuing an application for a patent for invention in accordance with the law, and asking for a review, and granting a patent, is truly sensible.

惟,上述所揭之圖示及說明,僅為本發明之較佳實施例,非為限定本發明之保護範圍;大凡熟悉該項技藝之人士,其所依本發明之特徵範疇,所作之其它等效變化或修飾,皆應視為不脫離本發明之設計範疇。 The illustrations and descriptions of the present invention are merely preferred embodiments of the present invention, and are not intended to limit the scope of the present invention; those skilled in the art, which are characterized by the scope of the present invention, Equivalent variations or modifications are considered to be within the scope of the design of the invention.

Claims (5)

一種無鍍層鈀網合金線之製造方法,係於一銀基線表面鍍上5nm~120nm之鈀層後,加熱至600~800℃之溫度,持續該溫度不超過4小時,使鈀元素完全熱擴散至銀基線晶界網格表面,藉此形成含鈀之晶界帶。 The invention discloses a method for manufacturing an uncoated palladium mesh alloy wire by plating a palladium layer of 5 nm to 120 nm on a silver base surface, heating to a temperature of 600 to 800 ° C, and maintaining the temperature for no more than 4 hours, so that the palladium element is completely thermally diffused. The surface of the silver grain boundary grain boundary is formed, thereby forming a palladium-containing grain boundary zone. 如申請專利範圍第1項所述之無鍍層鈀網合金線之製造方法,其中銀基線之成分係包含有1~5wt.%的金元素。 The method for manufacturing an uncoated palladium mesh alloy wire according to claim 1, wherein the component of the silver base comprises 1 to 5 wt.% of a gold element. 如申請專利範圍第2項所述之無鍍層鈀網合金線之製造方法,其中銀基線之成分係包含有3wt.%的金元素。 The method for producing an uncoated palladium mesh alloy wire according to claim 2, wherein the composition of the silver base line comprises 3 wt.% of a gold element. 如申請專利範圍第1項所述之無鍍層鈀網合金線之製造方法,其中使鈀元素完全熱擴散至銀基線晶界網格內之溫度係為720℃。 The method for producing an uncoated palladium mesh alloy wire according to claim 1, wherein the temperature at which the palladium element is completely thermally diffused into the silver base grain boundary grid is 720 °C. 一種藉由如申請專利範圍第1至4項中任一項所述之方法製備之無鍍層鈀網合金線。 An uncoated palladium mesh alloy wire prepared by the method of any one of claims 1 to 4.
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Publication number Priority date Publication date Assignee Title
TWI500788B (en) * 2013-12-10 2015-09-21 Truan Sheng Lui Unplated copper wire with wear resistance corrosion resistance properties and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI500788B (en) * 2013-12-10 2015-09-21 Truan Sheng Lui Unplated copper wire with wear resistance corrosion resistance properties and manufacturing method thereof

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