TW201316435A - Semiconductor processing device and gas spray head cooling plate thereof - Google Patents
Semiconductor processing device and gas spray head cooling plate thereof Download PDFInfo
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- TW201316435A TW201316435A TW101129379A TW101129379A TW201316435A TW 201316435 A TW201316435 A TW 201316435A TW 101129379 A TW101129379 A TW 101129379A TW 101129379 A TW101129379 A TW 101129379A TW 201316435 A TW201316435 A TW 201316435A
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- 238000001816 cooling Methods 0.000 title claims abstract description 134
- 238000012545 processing Methods 0.000 title claims abstract description 21
- 239000004065 semiconductor Substances 0.000 title claims abstract description 8
- 239000007921 spray Substances 0.000 title claims abstract description 6
- 239000000110 cooling liquid Substances 0.000 claims abstract description 14
- 238000000926 separation method Methods 0.000 claims abstract description 13
- 239000002826 coolant Substances 0.000 claims description 231
- 239000007789 gas Substances 0.000 claims description 143
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 44
- 238000000638 solvent extraction Methods 0.000 claims description 23
- 230000003247 decreasing effect Effects 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 2
- 238000005192 partition Methods 0.000 claims description 2
- 239000012495 reaction gas Substances 0.000 claims description 2
- 108091006146 Channels Proteins 0.000 description 21
- 238000000034 method Methods 0.000 description 12
- 238000003466 welding Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 11
- 230000000903 blocking effect Effects 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Abstract
Description
本發明是關於一種利用氣體加工器件的半導體設備,特別是關於一種可對氣體進行冷卻的氣體噴淋頭冷卻板及一種包括該氣體噴淋頭冷卻板的半導體處理設備。 The present invention relates to a semiconductor device using a gas processing device, and more particularly to a gas shower head cooling plate capable of cooling a gas and a semiconductor processing apparatus including the gas shower head cooling plate.
氣體噴淋頭用於向多種製造工藝如化學氣相沉積(CVD)、金屬有機氣相沉積(MOCVD)提供所需的一種或多種氣體。在許多情況下,為了避免氣體噴淋頭內部氣體可能發生的化學反應,必須對氣體噴淋頭進行冷卻。專利檔US20100170438公開了一種氣體噴淋頭,如圖1所示,該氣體噴淋頭包括上部1、下氣體分佈器部件2,其中下氣體分佈器部件2由多個厚度為1mm的結構化的盤組成,一個結構化的盤設置在另一個上,這樣多個累積在一起的結構化地盤最後經過高溫高壓擴散結合連接在一起。如圖2所示,下氣體分佈器部件2包括與氣體容積8相連的氣體出口通道7、與氣體容積9相連的氣體出口通道10、冷卻水腔14,其中氣體出口通道7由多個結構化的盤上的刻蝕小孔累積形成,其在下氣體分佈器部件表面的分佈密度為10-20個/平方釐米,氣體容積9由B區域中的結構化的盤上的連接板(未圖示)之間的空間組成,該連接板通過刻蝕形成,氣體出口通道10由多個結構化的盤上的經刻蝕形成的環形盤上的孔累積形成,冷卻水腔14由D區域中的結構化的盤上的連接板(未圖示)之間的空間組成,該連接板通過刻蝕形成。 Gas showerheads are used to provide the desired one or more gases to a variety of manufacturing processes such as chemical vapor deposition (CVD), metal organic vapor phase deposition (MOCVD). In many cases, the gas showerhead must be cooled in order to avoid possible chemical reactions in the gas inside the gas showerhead. Patent document US Pat. No. 6,100,170, 438 discloses a gas showerhead, as shown in Fig. 1, which comprises an upper part 1, a lower gas distributor part 2, wherein the lower gas distributor part 2 is composed of a plurality of structured thicknesses of 1 mm The disc consists of a structured disc placed on the other such that a plurality of stacked structured mats are finally joined together by high temperature and high pressure diffusion bonding. As shown in Fig. 2, the lower gas distributor component 2 comprises a gas outlet channel 7 connected to the gas volume 8, a gas outlet channel 10 connected to the gas volume 9, and a cooling water chamber 14, wherein the gas outlet channel 7 is structured by a plurality of The etched apertures on the disk are cumulatively formed with a distribution density of 10-20 cells per square centimeter on the surface of the lower gas distributor component, and the gas volume 9 is connected by a structured plate on the disk in the B zone (not shown) Between the space composition, the web is formed by etching, and the gas outlet channel 10 is formed by the accumulation of holes in the etched annular disk on the plurality of structured disks, the cooling water chamber 14 being in the D region. A space is formed between the connecting plates (not shown) on the structured disk, which is formed by etching.
由上可知,該氣體噴淋頭同時包括氣體分佈裝置、氣體冷卻裝置,且兩者焊接成一體,一旦損壞只能整體更換,無法對部分部件進行更換或維修;該氣體噴淋頭結構非常複雜,其內部的許多結構需由刻蝕工藝形成,增加了製造成本;其多個結構化的盤之間是通過高溫高壓擴散焊接連接在一起,該工藝耗費時間過長、複雜,另一方面,該氣體噴淋頭的氣體出口通道、冷卻水腔存在多處焊縫,加之氣體出口通道的分佈密度非常大,一旦發生冷卻液洩漏,將無法實現冷卻功能。 As can be seen from the above, the gas shower head includes a gas distribution device and a gas cooling device, and the two are welded together. Once the damage can only be replaced as a whole, some parts cannot be replaced or repaired; the structure of the gas shower head is very complicated. Many of the internal structures need to be formed by an etching process, which increases the manufacturing cost; the plurality of structured disks are connected together by high temperature and high pressure diffusion welding, which is time consuming and complicated, and on the other hand, There are multiple welds in the gas outlet passage and the cooling water chamber of the gas shower head, and the distribution density of the gas outlet passage is very large. Once the coolant leaks, the cooling function cannot be achieved.
本發明的目的在於提供一種結構簡單、製造方便、冷卻效果好的氣體噴淋頭冷卻板,其可以安裝在氣體噴淋頭上從而實現對氣體進行冷卻,一旦氣體噴淋頭或氣體噴淋頭冷卻板損壞,可以實現局部更換或維修,不致整個裝置報廢。 The object of the present invention is to provide a gas shower head cooling plate which is simple in structure, convenient in manufacture and good in cooling effect, and can be installed on a gas shower head to cool the gas once the gas shower head or the gas shower head is cooled. If the board is damaged, partial replacement or repair can be achieved without the entire device being scrapped.
為實現上述目的,本發明提供了一種氣體噴淋頭冷卻板,包括:底板;側壁,所述側壁與所述底板連接形成第一空間;所述第一空間內的底板上設有若干冷卻液分隔裝置,相鄰的所述冷卻液分隔裝置之間形成冷卻液通道,所述冷卻液分隔裝置上設有垂直於底板並適於使氣體通過的通孔。 In order to achieve the above object, the present invention provides a gas shower head cooling plate, comprising: a bottom plate; a side wall, the side wall is connected with the bottom plate to form a first space; and a plurality of coolants are arranged on the bottom plate in the first space. The partitioning means forms a coolant passage between the adjacent coolant separating means, and the coolant separating means is provided with a through hole perpendicular to the bottom plate and adapted to pass the gas.
可選的,所述氣體噴淋頭冷卻板包括基體與蓋板,所述基體包括底板、側壁,所述蓋板適於與所述基體相配合以密封所述第一空間。 Optionally, the gas shower head cooling plate comprises a base body and a cover plate, the base body comprises a bottom plate and a side wall, and the cover plate is adapted to cooperate with the base body to seal the first space.
可選的,所述蓋板上表面或所述側壁上設有適於通向所述第一空間的冷卻液進口、冷卻液出口。 Optionally, the upper surface of the cover plate or the side wall is provided with a coolant inlet and a coolant outlet adapted to open to the first space.
可選的,所述蓋板上設有數量與所述冷卻液分隔裝置相等並貫穿所述蓋板上表面、蓋板下表面的槽,所述冷卻液分隔裝置嵌套安裝在所述槽內。 Optionally, the cover plate is provided with a slot equal to the coolant separating device and extending through the upper surface of the cover plate and the lower surface of the cover plate, and the coolant separating device is nested and installed in the slot. .
可選的,另包括與所述底板相交設置的第一擋水板、第二擋水板,所述第一擋水板、第二擋水板的高度延伸至所述蓋板下表面,所述第一擋水板、第二擋水板將所述第一空間分為第一邊緣冷卻區、第二邊緣冷卻區及位於中央的第二空間,所述冷卻液分隔裝置分佈在所述第二空間內,所述第二空間相對的兩端分別具有與第一邊緣冷卻區相連通的冷卻液總入口、與第二邊緣冷卻區相連通的冷卻液總出口。 Optionally, the method further includes a first water baffle and a second water baffle disposed at the intersection of the bottom plate, and the height of the first water baffle and the second water baffle extends to the lower surface of the cover plate. The first water baffle and the second water baffle divide the first space into a first edge cooling zone, a second edge cooling zone, and a second space located at a center, wherein the coolant partitioning device is distributed in the first In the two spaces, the opposite ends of the second space respectively have a total coolant inlet connected to the first edge cooling zone and a total coolant outlet connected to the second edge cooling zone.
可選的,每列所述冷卻液分隔裝置包括至少一段分隔單元,沿冷卻液通道方向的相鄰兩段所述分隔單元之間存在間隙。 Optionally, each column of the coolant partitioning device comprises at least one segment of separation unit, and a gap exists between the two adjacent sections of the partitioning unit along the direction of the coolant channel.
可選的,所述冷卻液分隔裝置沿所述冷卻液進口、冷卻液出口排列方向分佈在所述底板上,從中間的所述冷卻液通道到兩邊的所述冷卻液通道,所述冷卻液通道的寬度依次增大。 Optionally, the coolant partitioning device is distributed on the bottom plate along the coolant inlet and the coolant outlet array direction, and the coolant channel from the middle to the coolant channel on both sides, the coolant The width of the channel increases in turn.
可選的,所述側壁與所述冷卻液分隔裝置的端部之間存在適於使冷卻液通過的縫隙,所述縫隙的大小使通過每條冷卻液通道的冷卻液流量相等。 Optionally, a gap is formed between the side wall and the end of the coolant separating device for passing the coolant, and the slit is sized to equal the flow of the coolant through each of the coolant channels.
可選的,所述冷卻液分隔裝置沿所述冷卻液總入口、冷卻液總出口排列方向分佈在所述底板上,從中間的所述冷卻液通道到兩邊的所述冷卻液通道,所述冷卻液通道的寬度依次增大,所述第一擋水板、第二擋水板與所述冷卻液分隔裝置的端部之間存在適於使冷卻液通過的縫隙,所述縫隙的大小使通過每條冷卻液通道的冷卻液流量相等。 Optionally, the coolant separating device is distributed on the bottom plate along the direction of the total coolant inlet and the total outlet of the coolant, and the coolant channel from the middle to the coolant channel on both sides, The width of the coolant passage is sequentially increased, and a gap suitable for passing the coolant is formed between the first flap, the second flap and the end of the coolant partition, the size of the slit being The coolant flow through each coolant channel is equal.
可選的,從中間的所述冷卻液分隔裝置到兩邊的所述冷卻液分隔裝置,所述冷卻液分隔裝置的長度依次減小,所述冷卻液進口、冷卻液出口或所述冷卻液總入口、冷卻液總出口設在最長的冷卻液分隔裝置的兩端。 Optionally, from the middle of the coolant separating device to the coolant separating device on both sides, the length of the coolant separating device is sequentially decreased, and the coolant inlet, the coolant outlet or the total coolant The inlet and coolant outlets are located at the ends of the longest coolant separator.
可選的,所述冷卻液進口位於所述第一邊緣冷卻區的遠離所述冷卻液總入口的一端,所述冷卻液出口位於所述第二邊緣冷卻區的遠離所述冷卻液總出口的一端。 Optionally, the coolant inlet is located at an end of the first edge cooling zone remote from the total coolant inlet, and the coolant outlet is located at a distance from the total coolant outlet of the second edge cooling zone. One end.
可選的,所述側壁包括位於所述側壁內表面的且沿所述側壁厚度方向延伸的臺階結構,所述臺階結構的高度延伸至所述蓋板下表面。 Optionally, the sidewall comprises a step structure on an inner surface of the sidewall and extending in a thickness direction of the sidewall, the height of the step structure extending to a lower surface of the cover.
可選的,所述冷卻液分隔裝置包括連接成一體的形狀相似的第一平臺、第二平臺,所述第一平臺的縱截面尺寸大於所述第二平臺的縱截面尺寸,且所述第二平臺位於所述第一平臺上方的居中位置;所述第一平臺的高度延伸至所述蓋板下表面。 Optionally, the coolant separating device comprises a first platform and a second platform which are connected in a similar shape, the longitudinal section of the first platform is larger than the longitudinal section of the second platform, and the first The second platform is located at a centered position above the first platform; the height of the first platform extends to a lower surface of the cover.
可選的,所述基體與所述蓋板之間焊接連接。 Optionally, a solder joint is connected between the base body and the cover plate.
可選的,所述通孔在所述冷卻液分隔裝置上均勻分佈。 Optionally, the through holes are evenly distributed on the coolant separator.
可選的,所述冷卻液分隔裝置與所述底板一體形成。 Optionally, the coolant separating device is integrally formed with the bottom plate.
在上述氣體噴淋頭冷卻板的基礎上,本發明還提供一種半導體處理設備,包括:處理腔室;位於所述處理腔室內並用於支撐待處理工藝件的基座;氣體噴淋頭,所述氣體噴淋頭上包括多個適於噴灑反應氣體到所述處理腔室內的氣體噴口;如上所述的氣體噴淋頭冷卻板,其安裝到氣體噴淋頭上,並使氣體噴淋頭冷卻板面對所述基座,其中所述冷 卻液分隔裝置上的通孔與所述氣體噴淋頭的氣體噴口相對應。 Based on the gas shower head cooling plate described above, the present invention further provides a semiconductor processing apparatus comprising: a processing chamber; a susceptor located in the processing chamber for supporting a workpiece to be processed; a gas shower head, The gas shower head includes a plurality of gas nozzles adapted to spray the reaction gas into the processing chamber; the gas shower head cooling plate as described above is mounted on the gas shower head, and the gas shower head cooling plate is Facing the pedestal, wherein the cold The through hole in the liquid separation device corresponds to the gas nozzle of the gas shower head.
與現有技術相比,本發明具有以下優點:一、氣體噴淋頭冷卻板可以安裝在氣體噴淋頭上從而實現對氣體的冷卻,由於兩者是單獨形成,一旦整個裝置損壞,可以更換或維修局部構件不致整個裝置報廢,節省了成本;二、氣體噴淋頭冷卻板的所有結構可通過機械加工工藝形成,此工藝成熟,成本較低;三、氣體噴淋頭冷卻板的冷卻結構簡單、冷卻效果好,其包括蓋板、基體,通過在基體內設置多個間隔分佈的冷卻液分隔裝置,可形成適於使冷卻液通過的冷卻液通道,冷卻液分隔裝置上設有適於使氣體通過的通孔,從而實現氣體噴淋頭冷卻板對氣體的均勻冷卻功能;四、氣體噴淋頭冷卻板的氣孔處不存在焊縫,消除了氣孔漏水的潛在可能,且蓋板與底板之間焊接連接,此加工工藝成熟、加工過程簡單,冷卻液洩漏處可實現再修復。本發明所採用的具體實施例,將藉由以下之實施例及附呈圖式作進一步之說明。 Compared with the prior art, the present invention has the following advantages: 1. The gas shower head cooling plate can be installed on the gas shower head to achieve cooling of the gas. Since the two are formed separately, once the entire device is damaged, it can be replaced or repaired. The partial components do not cause the entire device to be scrapped, which saves the cost; Second, all the structures of the gas shower head cooling plate can be formed by a mechanical processing process, the process is mature and the cost is low; Third, the cooling structure of the gas shower head cooling plate is simple, The cooling effect is good, and includes a cover plate and a base body, and a plurality of spaced-apart coolant liquid separation devices are disposed in the base body to form a coolant passage suitable for passing the coolant, and the coolant separation device is provided with a gas suitable for the gas Passing through holes, thereby achieving uniform cooling of the gas shower head cooling plate; Fourth, there is no weld at the air hole of the gas shower head cooling plate, eliminating the potential leakage of the air hole, and the cover plate and the bottom plate The welding process is mature, the processing process is mature, the processing process is simple, and the coolant leakage can be repaired. The specific embodiments of the present invention will be further described by the following examples and the accompanying drawings.
本發明提供了一種氣體噴淋頭冷卻板,其可以安裝在氣體噴淋頭上從而實現對氣體進行冷卻,一旦氣體噴淋頭或氣體噴淋頭冷卻板損壞,可以實現局部更換或維修,不致整個裝置報廢。 The invention provides a gas shower head cooling plate which can be installed on a gas shower head to cool the gas. Once the gas shower head or the gas shower head cooling plate is damaged, partial replacement or maintenance can be realized without the whole The device is scrapped.
本發明中的氣體噴淋頭冷卻板包括蓋板、基體,蓋板與基體構成一封閉空間,通過在基體內設置多個間隔分佈的冷卻液分隔裝置,可形成適於使冷卻液通過的冷卻液通道,冷卻液分隔裝置上設有適於使氣體通過的通 孔,從而實現氣體噴淋頭冷卻板對氣體的冷卻功能。 The gas shower head cooling plate of the present invention comprises a cover plate and a base body, and the cover plate and the base body form a closed space, and a plurality of spaced apart cooling liquid separating devices are arranged in the base body to form a cooling suitable for passing the cooling liquid. a liquid passage, and a coolant partitioning device is provided with a passage suitable for passing gas The hole, thereby achieving the gas cooling function of the gas shower head cooling plate.
下面將結合本發明實施例中的附圖,對本發明實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例僅僅是本發明一部分實施例,而不是全部的實施例。基於本發明中的實施例,本領域普通技術人員在沒有做出創造性勞動前提下所獲得的所有其他實施例,都屬於本發明保護的範圍。 The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of the embodiments of the present invention, but not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative efforts are within the scope of the present invention.
本發明中氣體噴淋頭冷卻板10’的形狀為任意一方便加工、適於與氣體噴淋頭配合使用的形狀。具體的,氣體噴淋頭冷卻板10’的形狀大體呈圓柱形;另外,整個氣體噴淋頭冷卻板10’可通過機械加工工藝形成。 The shape of the gas shower head cooling plate 10' of the present invention is any shape that is convenient for processing and suitable for use with a gas shower head. Specifically, the gas shower head cooling plate 10' is generally cylindrical in shape; in addition, the entire gas shower head cooling plate 10' can be formed by a machining process.
如圖3、圖7、圖8所示,氣體噴淋頭冷卻板10’包括蓋板11、基體21,其中,蓋板11上設有多個貫穿蓋板上表面12、蓋板下表面13的槽17,基體21內設有若干冷卻液分隔裝置30,蓋板11與基體21配合安裝時,冷卻液分隔裝置30嵌套安裝在槽17內,即槽17的形狀、排列需與冷卻液分隔裝置30保持一致,蓋板11與基體21連接形成一封閉空間。具體的,蓋板11與基體21之間通過焊接連接在一起,焊接工藝可以是傳統的氬弧焊、電子束焊、鐳射焊、釺焊等。 As shown in FIG. 3, FIG. 7, and FIG. 8, the gas shower head cooling plate 10' includes a cover plate 11 and a base body 21, wherein the cover plate 11 is provided with a plurality of through cover upper surface 12 and a cover lower surface 13 The tank 17 is provided with a plurality of coolant separating devices 30. When the cover plate 11 is fitted with the base body 21, the coolant separating device 30 is nested in the groove 17, that is, the shape and arrangement of the grooves 17 and the coolant are required. The partitioning device 30 is kept in agreement, and the cover plate 11 is connected to the base body 21 to form a closed space. Specifically, the cover 11 and the base 21 are connected together by welding, and the welding process may be conventional argon arc welding, electron beam welding, laser welding, brazing, and the like.
如圖8所示,基體21包括底板22、側壁20,側壁20與底板22連接形成第一空間。具體的,如圖6所示,基體21的底板22、側壁20可以一體成型。側壁20包括位於側壁20內表面(圖中所示)的且連接底板22的沿側壁20厚度方向延伸的臺階結構201,臺階結構201的高度延伸至蓋板下表面13,這樣的結構使臺階結構201與第一擋水板24、第二擋水板25一起支撐蓋板11,增加整個氣體噴淋頭冷卻板10’的強度,且便於蓋板11 與基體21之間進行焊接。 As shown in FIG. 8, the base body 21 includes a bottom plate 22 and side walls 20, and the side walls 20 are connected to the bottom plate 22 to form a first space. Specifically, as shown in FIG. 6, the bottom plate 22 and the side wall 20 of the base 21 may be integrally formed. The side wall 20 includes a step structure 201 on the inner surface of the side wall 20 (shown in the drawing) and extending in the thickness direction of the side wall 20 of the connecting bottom plate 22, the height of the step structure 201 extending to the lower surface 13 of the cover plate, such a structure makes the step structure 201 supports the cover plate 11 together with the first water baffle 24 and the second water baffle 25, increasing the strength of the entire gas shower head cooling plate 10', and facilitating the cover plate 11 Welding is performed with the base body 21.
如圖8、圖9所示,底板22上的第一空間內設有垂直於底板22的、且其高度延伸至氣體噴淋頭冷卻板10’蓋板下表面13的第一擋水板24、第二擋水板25。第一擋水板24、第二擋水板25將第一空間劃分為第一邊緣冷卻區28、第二邊緣冷卻區29及位於中央的第二空間。具體的,第一擋水板24、第二擋水板25的一端與側壁20固定連接,底板22、第一擋水板24及與第一擋水板24相對的部分側壁20形成第一邊緣冷卻區28;底板22、第二擋水板25及與第二擋水板25相對的部分側壁20形成第二邊緣冷卻區29;第一擋水板24、第二擋水板25與底板22形成第二空間,且該空間相對的兩端具有兩個開口,該開口作為連通第一邊緣冷卻區28的冷卻液總入口26、連通第二邊緣冷卻區29的冷卻液總出口27,即,冷卻液在第一邊緣冷卻區28流動並在第一擋水板24的阻擋作用下,冷卻液流至冷卻液總入口26,之後冷卻液流過冷卻液分隔裝置30並在第一擋水板24、第二擋水板25的阻擋作用下冷卻液匯入冷卻液總出口27。因為第一擋水板24、第二擋水板25與蓋板下表面13緊密接觸,因此第一邊緣冷卻區28、第二邊緣冷卻區29的冷卻液不會向其他區域洩漏,實現更佳的冷卻效果。 As shown in FIG. 8 and FIG. 9, the first space on the bottom plate 22 is provided with a first water deflector 24 perpendicular to the bottom plate 22 and extending to the lower surface 13 of the gas shower head cooling plate 10' cover. The second water flap 25 is provided. The first water baffle 24 and the second water baffle 25 divide the first space into a first edge cooling zone 28, a second edge cooling zone 29, and a second space located at the center. Specifically, one end of the first water baffle 24 and the second water baffle 25 are fixedly connected to the side wall 20, and the bottom plate 22, the first water baffle 24 and a portion of the side wall 20 opposite to the first water baffle 24 form a first edge. The cooling zone 28; the bottom plate 22, the second water baffle 25 and a portion of the side wall 20 opposite to the second water baffle 25 form a second edge cooling zone 29; the first water baffle 24, the second baffle 25 and the bottom plate 22 Forming a second space, and the opposite ends of the space have two openings as a total coolant inlet 26 communicating with the first edge cooling zone 28 and a total coolant outlet 27 communicating with the second edge cooling zone 29, ie, The coolant flows in the first edge cooling zone 28 and under the blocking action of the first baffle 24, the coolant flows to the coolant total inlet 26, after which the coolant flows through the coolant separator 30 and is in the first baffle 24. The cooling liquid is discharged into the total coolant outlet 27 by the blocking action of the second water retaining plate 25. Since the first water baffle 24 and the second water baffle 25 are in close contact with the lower surface 13 of the cover plate, the coolant of the first edge cooling zone 28 and the second edge cooling zone 29 does not leak to other areas, thereby achieving better performance. Cooling effect.
如圖7、圖8所示,底板22上的第二空間內設有數量與槽17數量相等的冷卻液分隔裝置30,冷卻液分隔裝置30的形狀與槽17的形狀相似,且兩者之間存在間隙,以便冷卻液分隔裝置30可以嵌入槽17中並進行焊接連接。槽17、冷卻液分隔裝置30的形狀為任意一適於進行機械加工的形狀,但考慮到冷卻液分隔裝置 30與槽17之間的連接方式為焊接連接,根據焊接的工藝特點可知,兩個焊接件的焊縫不宜含有尖角,槽17、冷卻液分隔裝置30的兩端呈半圓形,中間呈矩形。當然,槽17、冷卻液分隔裝置30的形狀可以為其他不含有尖角的形狀。 As shown in FIG. 7 and FIG. 8, the second space on the bottom plate 22 is provided with a coolant separation device 30 having the same number as the number of the grooves 17. The shape of the coolant separation device 30 is similar to the shape of the groove 17, and both There is a gap therebetween so that the coolant separator 30 can be embedded in the groove 17 and welded. The shape of the tank 17 and the coolant separator 30 is any shape suitable for machining, but considering the coolant separator The connection between the 30 and the groove 17 is a welded connection. According to the welding process characteristics, the weld of the two welded parts should not contain sharp corners, and the ends of the groove 17 and the coolant separating device 30 are semicircular, and the middle is rectangle. Of course, the shape of the groove 17 and the coolant partitioning device 30 may be other shapes that do not contain sharp corners.
具體的,如圖8所示,冷卻液分隔裝置30包括連接成一體的形狀相似的第一平臺311、第二平臺312,第一平臺311的縱截面尺寸大於第二平臺312的縱截面尺寸,且第二平臺312位於第一平臺311上方的居中位置,第一平臺311的高度延伸至蓋板下表面13,結合圖6所示,這樣的結構使第一平臺311可以與第一擋水板24、第二擋水板25一起支撐位於其上的蓋板11,增加整個氣體噴淋頭冷卻板10’的強度,且便於蓋板11中的槽17與基體21中的冷卻液分隔裝置30之間進行焊接。 Specifically, as shown in FIG. 8 , the coolant partitioning device 30 includes a first platform 311 and a second platform 312 which are connected in a similar shape, and the longitudinal section of the first platform 311 is larger than the longitudinal section of the second platform 312 . And the second platform 312 is located at a centered position above the first platform 311, and the height of the first platform 311 extends to the lower surface 13 of the cover plate. As shown in FIG. 6, such a structure enables the first platform 311 to be combined with the first water deflector. 24. The second water deflector 25 together supports the cover plate 11 thereon, increasing the strength of the entire gas shower head cooling plate 10', and facilitating the groove 17 in the cover plate 11 and the coolant separating device 30 in the base body 21. Welding between them.
如圖8所示,相鄰的冷卻液分隔裝置30之間形成冷卻液通道31,使冷卻液可以在冷卻液通道31間流動。冷卻液分隔裝置30在底板22上的分佈形式為任意一適於實現對氣體均勻冷卻的分佈形式。具體的,冷卻液分隔裝置30沿冷卻液總入口26、冷卻液總出口27排列方向分佈在底板22上,且從中間的冷卻液分隔裝置30到兩邊的冷卻液分隔裝置30,冷卻液分隔裝置30的長度依次減小,即從最左側或最右側(圖中所示)的冷卻液分隔裝置30到位於最中間(圖中所示)的冷卻液分隔裝置30,冷卻液分隔裝置30的長度依次增大,為了實現均勻冷卻,冷卻液總入口26、冷卻液總出口27需分別設在最長的冷卻液分隔裝置30的兩端。為了使冷卻液能較多的從位於第二空間邊緣區域的冷卻液 通道31通過從而實現均勻冷卻,可以採用兩種手段,一方面,所有冷卻液通道31中,從中間的冷卻液通道31到兩邊的冷卻液通道31,冷卻液通道31的寬度依次增加,即從最左側或最右側(圖中所示)的冷卻液通道31到位於最中間(圖中所示)的冷卻液通道31,冷卻液通道31的寬度依次減小;另一方面,每一列冷卻液分隔裝置30中可以包括多段具有相同結構的分隔單元,即每一列冷卻液分隔裝置30可以是連續的,也可以是間斷的(圖中未示出),每一列冷卻液分隔裝置30中的多段分隔單元之間存在間隙以使冷卻液在此間隙處形成冷卻液分流,以使冷卻液流向多個方向。需要說明的是,相鄰冷卻液通道31之間間距的大小並不受附圖的限制。 As shown in FIG. 8, a coolant passage 31 is formed between the adjacent coolant partitioning devices 30 so that the coolant can flow between the coolant passages 31. The distribution of the coolant separator 30 on the bottom plate 22 is any form suitable for achieving uniform cooling of the gas. Specifically, the coolant separating device 30 is distributed on the bottom plate 22 along the cooling total inlet 26 and the cooling liquid total outlet 27, and from the intermediate coolant separating device 30 to the coolant separating devices 30 on both sides, the coolant separating device The length of 30 is sequentially decreased, that is, from the coolant partitioning device 30 on the leftmost or rightmost side (shown in the drawing) to the coolant separator 30 in the middle (shown in the drawing), the length of the coolant separator 30 In order to achieve uniform cooling, the total coolant inlet 26 and the total coolant outlet 27 are respectively disposed at both ends of the longest coolant separator 30. In order to make the coolant more energy from the coolant located in the edge region of the second space By means of the passage 31 to achieve uniform cooling, two means can be used. On the one hand, in all the coolant passages 31, from the intermediate coolant passage 31 to the coolant passages 31 on both sides, the width of the coolant passage 31 is sequentially increased, that is, from The coolant channel 31 on the leftmost or rightmost side (shown in the figure) to the coolant channel 31 in the middle (shown in the figure), the width of the coolant channel 31 is sequentially decreased; on the other hand, each column of coolant The partitioning device 30 may include a plurality of partitioning units having the same structure, that is, each column of the coolant separating device 30 may be continuous or intermittent (not shown), and each of the columns of the coolant separating device 30 There is a gap between the separation units to allow the coolant to form a coolant split at this gap to allow the coolant to flow in multiple directions. It should be noted that the size of the spacing between adjacent coolant passages 31 is not limited by the drawings.
如圖8、圖9所示,第一擋水板24、第二擋水板25與冷卻液分隔裝置30的端部之間存在縫隙,以使冷卻液可以通過縫隙流向冷卻液通道31。因此,針對上述冷卻液分隔裝置30的排列方式,第一擋水板24、第二擋水板25的形狀優選為鐮刀形。具體的,其與冷卻液分隔裝置30相對的部分為弧形,以使冷卻液分隔裝置30端部與第一擋水板24、第二擋水板25之間存在縫隙,與底板22的側壁20相連的部分為直線形。為了實現氣體分佈器的均勻冷卻,該縫隙的大小需使通過每條冷卻液通道31的冷卻液流量相等。具體的,該縫隙的大小可以通過計算與實驗獲得。 As shown in FIGS. 8 and 9, a gap exists between the first water baffle 24, the second water baffle 25, and the end of the coolant separator 30 so that the coolant can flow through the slit to the coolant passage 31. Therefore, the shape of the first water baffle plate 24 and the second water baffle plate 25 is preferably a sickle shape with respect to the arrangement of the above-described coolant partitioning device 30. Specifically, the portion opposite to the coolant separating device 30 is curved so that there is a gap between the end of the coolant separating device 30 and the first water blocking plate 24 and the second water blocking plate 25, and the side wall of the bottom plate 22 The 20 connected parts are linear. In order to achieve uniform cooling of the gas distributor, the gap is sized such that the flow of coolant through each of the coolant passages 31 is equal. Specifically, the size of the slit can be obtained by calculation and experiment.
第一擋水板24、第二擋水板25與冷卻液分隔裝置30之間的佈局形式以上述實施例及附圖給出,但這並不能對本發明的保護範圍構成限制,任何一冷卻液分隔裝置30與擋水板之間存在間隙的且使冷卻液以均勻流 量通過該間隙的佈局形式均在本發明的保護範圍之內。 The layout between the first water baffle 24, the second water baffle 25 and the coolant partitioning device 30 is given in the above embodiments and the drawings, but this does not limit the scope of protection of the present invention, any coolant There is a gap between the partitioning device 30 and the water deflector and the coolant is uniformly flowed The layout of the amount through the gap is within the scope of the present invention.
如圖3、圖8、圖9所示,冷卻液分隔裝置30上設有適於使氣體通過的通孔32,該通孔32通過鑽孔形成。為了使氣體能均勻冷卻,具體的,通孔32在冷卻液分隔裝置30上均勻分佈。 As shown in FIGS. 3, 8, and 9, the coolant separator 30 is provided with a through hole 32 adapted to pass a gas, and the through hole 32 is formed by drilling. In order to allow the gas to be uniformly cooled, in particular, the through holes 32 are evenly distributed on the coolant separator 30.
如圖5所示,底板22對應通孔32的位置設有氣孔33,具體的,如圖6所示,氣孔33可以與通孔32在同一加工步驟中形成。 As shown in FIG. 5, the bottom plate 22 is provided with a gas hole 33 at a position corresponding to the through hole 32. Specifically, as shown in FIG. 6, the air hole 33 may be formed in the same processing step as the through hole 32.
如圖7所示,氣體噴淋頭冷卻板10’還包括通向基體21的冷卻液進口15、冷卻液出口16,冷卻液通過冷卻液進口15流入,經過冷卻液通道31實現對氣體冷卻後,冷卻液通過冷卻液出口16流出。兩者既可以設置在蓋板上表面12,也可以設置在基體21的側壁20上,具體的實施方式需根據與該氣體噴淋頭冷卻板10’配合使用的氣體噴淋頭而定。具體的,冷卻液進口15、冷卻液出口16設置在蓋板上表面12。 As shown in FIG. 7, the gas shower head cooling plate 10' further includes a coolant inlet 15 and a coolant outlet 16 leading to the base 21, and the coolant flows in through the coolant inlet 15, and is cooled by the coolant passage 31. The coolant flows out through the coolant outlet 16. Both may be provided on the upper surface 12 of the cover or on the side wall 20 of the base 21, and the specific embodiment is dependent on the gas shower used in conjunction with the gas shower head cooling plate 10'. Specifically, the coolant inlet 15 and the coolant outlet 16 are disposed on the upper surface 12 of the cover.
冷卻液進口15、冷卻液出口16的結構可根據實際應用條件,即與該氣體噴淋頭冷卻板10’配合的氣體噴淋頭來設置。具體的,冷卻液進口15、冷卻液出口16的結構為一空心管。 The structure of the coolant inlet 15 and the coolant outlet 16 can be set according to the actual application conditions, i.e., the gas shower head fitted to the gas shower head cooling plate 10'. Specifically, the structure of the coolant inlet 15 and the coolant outlet 16 is a hollow tube.
如圖9所示,冷卻液進口15、冷卻液出口16分別通向基體21的第一邊緣冷卻區28、第二邊緣冷卻區29。這樣,冷卻液從冷卻液進口15流向第一邊緣冷卻區28,再經過冷卻液通道31流向第二邊緣冷卻區29,最後從冷卻液出口16流出。更具體的,冷卻液進口15、冷卻液出口16位於第一邊緣冷卻區28、第二邊緣冷卻區29的遠離冷卻液總入口26、冷卻液總出口27的一端,以實現更佳的冷卻效果。當然,根據該氣體噴淋頭 冷卻板10’的實際應用場合,冷卻液進口15、冷卻液出口16的位置可以隨作調整。 As shown in FIG. 9, the coolant inlet 15 and the coolant outlet 16 lead to the first edge cooling zone 28 and the second edge cooling zone 29 of the base 21, respectively. Thus, the coolant flows from the coolant inlet 15 to the first edge cooling zone 28, then through the coolant channel 31 to the second edge cooling zone 29, and finally out of the coolant outlet 16. More specifically, the coolant inlet 15 and the coolant outlet 16 are located at the end of the first edge cooling zone 28, the second edge cooling zone 29 away from the total coolant inlet 26, and the total coolant outlet 27 for better cooling. . Of course, according to the gas sprinkler In the practical application of the cooling plate 10', the positions of the coolant inlet 15 and the coolant outlet 16 can be adjusted accordingly.
需要說明的是,由於蓋板11與基體21之間焊接連接,為了使蓋板11與基體21之間形成的焊縫具有較大的強度,蓋板11、側壁20的厚度應根據採用的焊接工藝而定,使其滿足焊接工藝要求。 It should be noted that, due to the welded connection between the cover 11 and the base 21, in order to make the weld formed between the cover 11 and the base 21 have greater strength, the thickness of the cover 11 and the side wall 20 should be based on the welding used. Depending on the process, it meets the welding process requirements.
綜上所述,如圖9所示,本發明中的氣體噴淋頭冷卻板10’的氣體冷卻原理如下:冷卻液從冷卻液進口15流入,在第一擋水板24的阻擋作用下,冷卻液在第一邊緣冷卻區28流動,使第一邊緣冷卻區28冷卻;隨後,冷卻液進入冷卻液總入口26,並通過第一擋水板24、第二擋水板25與冷卻液分隔裝置30兩端之間的縫隙流向冷卻液分隔裝置30之間形成的冷卻液通道31,該縫隙的大小使每條冷卻液通道31的冷卻液流量相等,當每列冷卻液分隔裝置30包括多段分隔單元時,冷卻液經過冷卻液通道31時會在分隔單元之間的間隙形成分流,流向多個方向,這樣氣體噴淋頭冷卻板10’中的氣體得到了均勻冷卻;流過冷卻液通道31的冷卻液匯入冷卻液總出口27,並在第二擋水板25的阻擋作用下沿著第二邊緣冷卻區29流動,使第二邊緣冷卻區29得到冷卻,最後,冷卻液流向冷卻液流出口16並從冷卻液流出口16流出。至此,整個氣體的冷卻過程結束。 In summary, as shown in FIG. 9, the gas cooling principle of the gas shower head cooling plate 10' in the present invention is as follows: the coolant flows in from the coolant inlet 15, under the blocking action of the first water deflector 24, The coolant flows in the first edge cooling zone 28 to cool the first edge cooling zone 28; subsequently, the coolant enters the coolant total inlet 26 and is separated from the coolant by the first baffle 24 and the second baffle 25. The gap between the ends of the device 30 flows to the coolant passage 31 formed between the coolant separators 30, the gap being sized such that the coolant flow rate of each coolant passage 31 is equal, when each column of the coolant separator 30 includes a plurality of sections When the unit is separated, the coolant passes through the coolant passage 31 to form a split between the gaps between the partitioning units, and flows in a plurality of directions, so that the gas in the gas shower head cooling plate 10' is uniformly cooled; flowing through the coolant passage The cooling liquid of 31 flows into the total coolant outlet 27, and flows along the second edge cooling zone 29 under the blocking action of the second water deflector 25, so that the second edge cooling zone 29 is cooled, and finally, the cooling liquid flows to the cooling. Liquid outflow 16 and flows out from the cooling liquid outlet 16. At this point, the cooling process of the entire gas is over.
上述實施例中氣體噴淋頭冷卻板10’的基體21內設置第一擋水板24、第二擋水板25,其與側壁20、蓋板11可以形成第一邊緣冷卻區28、第二邊緣冷卻區29,可對氣體噴淋頭冷卻板10’的邊緣區域進行冷卻,使其冷卻效果更好。 The first water baffle 24 and the second water baffle 25 are disposed in the base 21 of the gas shower head cooling plate 10' in the above embodiment, and the side wall 20 and the cover plate 11 may form a first edge cooling zone 28 and a second The edge cooling zone 29 cools the edge region of the gas showerhead cooling plate 10' for better cooling.
本發明中氣體噴淋頭冷卻板10’還可由以下結構構成,並能解決上述氣體噴淋頭冷卻板所要解決的技術問題。 The gas shower head cooling plate 10' of the present invention can also be constructed by the following structure, and can solve the technical problem to be solved by the above-described gas shower head cooling plate.
它與上述氣體噴淋頭冷卻板的區別在於,基體21內未設置第一擋水板24、第二擋水板25。相應的,側壁20與冷卻液分隔裝置30端部之間存在適於使冷卻液通過的縫隙,該縫隙的大小使通過每條冷卻液通道31的冷卻液流量相等,並且冷卻液分隔裝置30沿冷卻液進口15、冷卻液出口16排列方向分佈在底板22上,從中間的冷卻液通道31到兩邊的冷卻液通道31,冷卻液通道31的寬度依次增大,從中間的冷卻液分隔裝置30到兩邊的冷卻液分隔裝置30冷卻液分隔裝置30的長度依次減小,為了實現均勻冷卻,相應的冷卻液入口15、冷卻液出口16直接設置在最長的冷卻液分隔裝置30的端部附近。 It differs from the gas shower head cooling plate described above in that the first water baffle 24 and the second water baffle 25 are not disposed in the base body 21. Correspondingly, there is a gap between the side wall 20 and the end of the coolant separating device 30 for allowing the coolant to pass through, the gap being sized such that the flow rate of the coolant passing through each of the coolant channels 31 is equal, and the coolant separating device 30 is along The coolant inlet 15 and the coolant outlet 16 are arranged in the direction of the bottom plate 22, and the width of the coolant passage 31 is sequentially increased from the intermediate coolant passage 31 to the coolant passages 31 on both sides, and the coolant separation device 30 from the middle The lengths of the coolant separators 30 to the coolant partitioning devices 30 on both sides are sequentially decreased, and in order to achieve uniform cooling, the corresponding coolant inlets 15 and coolant outlets 16 are directly disposed near the ends of the longest coolant separators 30.
本發明中的氣體噴淋頭冷卻板10’可應用於半導體加工領域,如化學氣相沉積(CVD)、金屬有機化學氣相沉積(MOCVD)等,另外它還可以應用於其它需要氣體噴淋頭且該氣體需要冷卻的領域。 The gas shower head cooling plate 10' of the present invention can be applied to the field of semiconductor processing, such as chemical vapor deposition (CVD), metal organic chemical vapor deposition (MOCVD), etc., and it can also be applied to other applications requiring gas spraying. The head and the area where the gas needs to be cooled.
進一步地,本發明還提供了一種半導體處理設備,其包括:處理腔室、位於所述處理腔室內並用於支撐待處理工藝件的基座、如上所述的氣體噴淋頭冷卻板10’,其安裝到氣體噴淋頭上,並使氣體噴淋頭冷卻板10’面對所述基座,其中冷卻液分隔裝置上的通孔32與所述氣體噴淋頭的氣體噴口相對應。 Further, the present invention also provides a semiconductor processing apparatus comprising: a processing chamber, a susceptor located in the processing chamber for supporting a workpiece to be processed, a gas shower head cooling plate 10' as described above, It is mounted to the gas shower head with the gas shower head cooling plate 10' facing the base, wherein the through holes 32 in the coolant separator correspond to the gas nozzles of the gas shower head.
對所公開的實施例的上述說明,使本領域專業技術人員能夠實現或使用本發明。對這些實施例的多種修改對本領域的專業技術人員來說將是顯而易見的,本文中 所定義的一般原理可以在不脫離本發明的精神或範圍的情況下,在其它實施例中實現。因此,本發明將不會被限制于本文所示的這些實施例,而是要符合與本文所公開的原理和新穎特點相一致的最寬的範圍。 The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments will be apparent to those skilled in the art, in this context. The general principles defined may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention is not to be limited to the embodiments shown herein, but the scope of the invention is to be accorded
1‧‧‧上部 1‧‧‧ upper
2‧‧‧下氣體分佈器部件 2‧‧‧ gas distributor parts
7‧‧‧氣體出口通道 7‧‧‧ gas export channel
8‧‧‧氣體容積 8‧‧‧ gas volume
9‧‧‧氣體容積 9‧‧‧ gas volume
10‧‧‧氣體出口通道 10‧‧‧ gas export channel
10’‧‧‧氣體噴淋頭冷卻板 10'‧‧‧ gas sprinkler cooling plate
11‧‧‧蓋板 11‧‧‧ Cover
12‧‧‧蓋板上表面 12‧‧‧ Upper surface of the cover
13‧‧‧蓋板下表面 13‧‧‧ Cover lower surface
14‧‧‧冷卻水腔 14‧‧‧Cooling water chamber
15‧‧‧冷卻液進口 15‧‧‧Coolant inlet
16‧‧‧冷卻液出口 16‧‧‧ Coolant outlet
17‧‧‧槽 17‧‧‧ slots
20‧‧‧側壁 20‧‧‧ side wall
201‧‧‧臺階結構 201‧‧‧step structure
21‧‧‧基體 21‧‧‧ base
22‧‧‧底板 22‧‧‧floor
24‧‧‧第一擋水板 24‧‧‧First flap
25‧‧‧第二擋水板 25‧‧‧ second baffle
26‧‧‧冷卻液總入口 26‧‧‧Total coolant inlet
27‧‧‧冷卻液總出口 27‧‧‧Total coolant outlet
28‧‧‧第一邊緣冷卻區 28‧‧‧First edge cooling zone
29‧‧‧第二邊緣冷卻區 29‧‧‧Second edge cooling zone
30‧‧‧冷卻液分隔裝置 30‧‧‧Cooling separator
31‧‧‧冷卻液通道 31‧‧‧Solution channel
311‧‧‧第一平臺 311‧‧‧ first platform
312‧‧‧第二平臺 312‧‧‧ Second platform
32‧‧‧通孔 32‧‧‧through hole
33‧‧‧氣孔 33‧‧‧ stomata
圖1是現有技術中一種氣體噴淋頭的剖面圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing a gas shower head of the prior art.
圖2是圖1的局部放大圖。 Fig. 2 is a partial enlarged view of Fig. 1;
圖3是本發明提供的氣體噴淋頭冷卻板實施例中氣體噴淋頭冷卻板的俯視圖。 3 is a top plan view of a gas shower head cooling plate in the embodiment of the gas shower head cooling plate provided by the present invention.
圖4是本發明提供的氣體噴淋頭冷卻板實施例中氣體噴淋頭冷卻板的側視圖。 4 is a side view of a gas shower head cooling plate in the embodiment of the gas shower head cooling plate provided by the present invention.
圖5是本發明提供的氣體噴淋頭冷卻板實施例中氣體噴淋頭冷卻板的仰視圖。 Figure 5 is a bottom plan view of the gas shower head cooling plate of the gas shower head cooling plate embodiment provided by the present invention.
圖6是圖3所示氣體噴淋頭冷卻板沿A-A截面的局部剖視圖。 Figure 6 is a partial cross-sectional view of the gas shower head cooling plate of Figure 3 taken along the line A-A.
圖7是圖3所示氣體噴淋頭冷卻板爆炸圖中的所述蓋板的立體圖。 Figure 7 is a perspective view of the cover plate in the exploded view of the gas shower head cooling plate of Figure 3.
圖8是圖3所示氣體噴淋頭冷卻板爆炸圖中的所述基體的立體圖。 Figure 8 is a perspective view of the base body in the exploded view of the gas shower head cooling plate of Figure 3.
圖9是圖3所示氣體噴淋頭冷卻板的冷卻原理圖。 Figure 9 is a schematic view showing the cooling of the gas shower head cooling plate shown in Figure 3.
15‧‧‧冷卻液進口 15‧‧‧Coolant inlet
16‧‧‧冷卻液出口 16‧‧‧ Coolant outlet
24‧‧‧第一擋水板 24‧‧‧First flap
25‧‧‧第二擋水板 25‧‧‧ second baffle
26‧‧‧冷卻液總入口 26‧‧‧Total coolant inlet
27‧‧‧冷卻液總出口 27‧‧‧Total coolant outlet
28‧‧‧第一邊緣冷卻區 28‧‧‧First edge cooling zone
29‧‧‧第二邊緣冷卻區 29‧‧‧Second edge cooling zone
30‧‧‧冷卻液分隔裝置 30‧‧‧Cooling separator
31‧‧‧冷卻液通道 31‧‧‧Solution channel
32‧‧‧通孔 32‧‧‧through hole
Claims (17)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110282861 CN102345112B (en) | 2011-09-22 | 2011-09-22 | Semiconductor processing device and gas spray head cooling plate thereof |
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| Publication Number | Publication Date |
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| TW201316435A true TW201316435A (en) | 2013-04-16 |
| TWI488249B TWI488249B (en) | 2015-06-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW101129379A TW201316435A (en) | 2011-09-22 | 2012-08-14 | Semiconductor processing device and gas spray head cooling plate thereof |
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| Country | Link |
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| CN (1) | CN102345112B (en) |
| TW (1) | TW201316435A (en) |
Cited By (1)
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|---|---|---|---|---|
| TWI676224B (en) * | 2016-06-07 | 2019-11-01 | 日本發條股份有限公司 | Cooling unit and method for manufacturing cooling unit |
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| CN103367510A (en) * | 2012-03-30 | 2013-10-23 | 生阳新材料科技有限公司 | Cooling plate |
| CN103276371B (en) * | 2013-03-26 | 2015-12-09 | 中晟光电设备(上海)有限公司 | The diffuser of CVD equipment, refrigerating unit and method of cooling |
| TW201623681A (en) * | 2014-12-26 | 2016-07-01 | Advanced Micro Fab Equip Inc | Gas spraying head and deposition device |
| CN108054245A (en) * | 2018-01-11 | 2018-05-18 | 常州比太黑硅科技有限公司 | A kind of dry method etching device technological reaction chamber |
| CN207987325U (en) * | 2018-02-28 | 2018-10-19 | 北京铂阳顶荣光伏科技有限公司 | A kind of cooling system |
| CN116454003A (en) * | 2018-04-05 | 2023-07-18 | 朗姆研究公司 | Electrostatic chuck with cooling gas region and corresponding grooves and monopolar electrostatic clamping electrode mode |
| CN110310909B (en) * | 2019-07-15 | 2021-12-17 | 北京北方华创微电子装备有限公司 | Cooling device and heat treatment device |
| EP4200901A1 (en) | 2020-08-18 | 2023-06-28 | Mattson Technology, Inc. | Rapid thermal processing system with cooling system |
| CN112665261A (en) * | 2020-12-17 | 2021-04-16 | 湖南新中意食品有限公司 | A sterilizing equipment for jelly production |
| CN114040636A (en) * | 2021-10-13 | 2022-02-11 | 宁波安信数控技术有限公司 | Cooling plate structure of liquid cooling driver |
| CN114171437B (en) * | 2021-12-01 | 2025-05-23 | 北京北方华创微电子装备有限公司 | Cooling device for semiconductor process chamber and semiconductor process chamber |
| CN114043302B (en) * | 2021-12-06 | 2022-07-01 | 东莞市巨冈机械工业有限公司 | Five-axis machine tool rotary table with damping structure |
| CN114893477A (en) * | 2022-06-01 | 2022-08-12 | 北京北方华创微电子装备有限公司 | Semiconductor process equipment and gas homogenizing device thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH08218171A (en) * | 1995-02-08 | 1996-08-27 | Nippon Sanso Kk | Shower head type CVD equipment |
| JP5231117B2 (en) * | 2008-07-24 | 2013-07-10 | 株式会社ニューフレアテクノロジー | Film forming apparatus and film forming method |
| KR101062462B1 (en) * | 2009-07-28 | 2011-09-05 | 엘아이지에이디피 주식회사 | Shower head and chemical vapor deposition apparatus comprising the same |
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2011
- 2011-09-22 CN CN 201110282861 patent/CN102345112B/en active Active
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| TWI676224B (en) * | 2016-06-07 | 2019-11-01 | 日本發條股份有限公司 | Cooling unit and method for manufacturing cooling unit |
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| Publication number | Publication date |
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| CN102345112A (en) | 2012-02-08 |
| TWI488249B (en) | 2015-06-11 |
| CN102345112B (en) | 2013-08-21 |
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