201211293 六、發明說明： 【發明所屬之技術領域】 本發明係關於濺鍍裝置之靶材安裝機構，詳細言之，係 關於可使圓筒形靶材相對於陰極容易且確實安裝之靶材安 裝機構。 本申請案基於2010年6月28日於日本申請之特願2010-ΐ 46617號主張優先權 ，此處援用其内容。 【先前技術】 例如作為建材用玻璃，Low-E玻璃（低放射玻璃）正在普 及。 此種Low-E玻璃係於玻璃表面成膜金屬薄膜而形成。先 前’於玻璃等之表面形成金屬薄膜時，使用具備平板狀祀 材（以下僅稱作靶材）之磁控濺鍍裝置進行成膜。 但’隨著近年之建材用玻璃之大型化，平板狀乾材中， 以均一厚度於玻璃表面全體成膜金屬膜較困難。 作為以均一厚度於如此大面積之成膜對象物上無不均地 成膜金屬膜之方式，有人提案有使用圓筒形狀之靶材之滅 鍍裝置（例如參照專利文獻1)。又，有圓筒狀靶材比平板狀 靶材之使用效率高之特徵。 使用圓筒形狀靶材之濺鍍裝置係圓筒形靶材以沿著旋轉 軸方向（長度方向）之兩端安裝於陰極電極上。先前，作為 將靶材安裝於陰極電極之構成，例如在與陰極電極扣合之 夾具上，螺旋狀形成剖面為半圓形之槽，且在靶材之端部 亦螺旋狀形成半圓形之槽。然後’揭示有一種連結系統， 157111.doc 201211293 係於任一槽插入圓筒形螺旋環，於另一槽使螺旋環嚙合， 藉此而將靶材安裝於陰極電極上（參照專利文獻。 [先前技術文獻] [專利文獻] [專利文獻1]日本特開20HM00930號公報 [專利文獻2]日本特表2〇〇6_521515號公報 【發明内容】 [發明所欲解決之問題] 但，如上述專利文獻2之連結系統中，將圓筒形乾材安 裝於陰極電極時，由於經由螺旋環扣合靶材與炎具，故安 裝位置易偏差’使乾材之軸心正確地與陰極電極之旋轉中 心對位安裝較困難。因此，妹材易偏心旋轉，侵敍圖案 不穩疋’輕材之哥命較短之問題。 又，例如為對成臈面之-邊為數米等大型被成膜物進行 成膜’而使用長度為數米等之大型靶材之情形中，將靶材 安裝於陰極電極時’需要使用專用工具以較大力使央具旋 轉’靶材之安裝需要極大勞力。 本發明係鑑於上述情況而完成者，其目的係提供一種可 將圓筒形乾材相對於陰極容易且可在正叙安裝位置安裝 之乾材安裝機構。X ’其目的係提供—種使乾材之侵钱圖 案均一，可謀求姆之長壽命化之Μ安裝機構。 [解決問題之技術手段] ()本發月之，態樣係一種乾材安裝冑構，其冑賤鐘裝置中 使用之圓筒形㈣對陰極之連結部可裝拆地安裝； 157111.doc 201211293 前述靶材具備圓筒形基體與覆蓋該基體之靶材，且具有 配置有前述靶材之中央區域、與除該中央區域在兩端側有 前述基體露出之連結區域；於前述陰極之連結部上，形成 内有該連結部與前述連結區域之大致圓筒形夾具；前述連 結部及剛述連結區域在前述夹具内之狀態下，形成於前述 靶材之前述連結區域之第一扣合凸部與形成於前述夾具之 内周面之第二扣合凸部僅沿著前述靶材之圓周方向相對移 動，藉此而扣合。 (2) 根據上述（1)之態樣，較佳為前述第一扣合凸部與前述 第二扣合凸部之扣合所需要之力矩為l(kgf.cm)以上、2〇 (kgf，cm)以下。 (3) 根據上述（1)之態樣，較佳為前述第一扣合凸部與前述 第二扣合凸部之接觸面係前述靶材之圓周方向成短型，前 述靶材之軸方向成長型之形狀。 (4) 根據上述（1)之態樣，較佳為具備發出判斷前述第一扣 〇凸。卩與别述第二扣合凸部之扣合動作已完成之信號之結 構。 、 (5) 根據上述（1)之態樣，較佳為前述第二扣合凸部形成3個 乂上在則述失具之内周面方向之同一線上，亦在將前述 靶材之旋轉軸看作中心之假想圓上，且對於通過前述中心 與前述第二扣合凸部中至少一個之線段，此外之前述第二 扣合凸部軸對稱地配置。 (6) 根據上述（1)之態樣，較佳為進而具備前述陰極之前述 連結部中相對於軸心垂直延伸之部分與前述基體之接觸部 157111.doc 201211293 分上所設之墊圈。 (7) 根據上述（1)之態樣，較佳為進而具備使前述陰極之前 述連結部中相對於轴心垂直延伸之部分與前述基體密接之 固定機構。 (8) 根據上述（1)之態樣，較佳為進而具備前述陰極之前述 連結部中相對於軸心垂直延伸之部分與前述夾具之間隙上 所配置之墊片。 (9) 上述（8)之情形中，較佳為對前述墊片實施表面處理。 [發明之效果] 如上說明，根據上述（1)記載之態樣，於濺鍍裝置之陰 極安裝圓筒形乾材時，將形成於陰極之夾具插入於乾材端 部之連結區域，僅藉由沿著靶材之圓周方向相對移動，而 第一扣合凸部與第二扣合凸部扣合，可相對於陰極安裝圓 筒形靶材。 & 因此，利用第一扣合凸部與第二扣合凸部之扣合，可容 易使陰極之中心與靶材之軸心一致，可以軸心作為旋轉中 心不偏心地使靶材旋轉。藉此，被成膜物與靶材之距離可 遍及靶材之全周變均一，可遍及被成膜物之全面成膜無不 均之均一厚度之皮膜。 • 又，使用大型且有重量之靶材之情形中，安裝靶材時僅 沿著靶材之圓周方向使夹具相對移動，而扣合第二扣合凸 部與第一扣合凸部，可將靶材安裝於陰極上。因此，無需 如先前使用專用工具以較大力使夹具旋轉，即使不使用專 用工具只要以較小力使夾具沿著靶材之圓周方向旋轉即 157111.doc 201211293 可容易將乾材安裝於陰極上。 【實施方式】 以下，參照附圓針對本發明之靶材安裝機構之一實施形 態進行說明4 ’本實施形態係用以更好理解發明主旨而 具體說明者，在無特別指定下則不限定本發明。又以下 說明所使用之圖面為易瞭解本發明之特徵，為方便而有將 成要部之部分放大顯示之情形，各構成要素之尺寸比率等 未必與實際相同。 首先，說明具備本實施形態之靶材安裝機構之磁控濺鍍 裝置（以下稱作濺鍍裝置）。 圖1係顯示濺鍍裝置之構成之縱剖面圖。又，圖2係顯示 含靶材之區域之要部放大立體圖。 減鍍裝置10具備反應室11、陽極12、陰極13、真空泵 17、及Ar氣體供給裝置18 ^反應室U之内部可由真空泵17 減壓’成膜時例如減壓至真空度6 pa左右。 陽極12例如包含複數之平板狀電極。陽極丨2只要經由電 纜與地面電性連接即可。於如此之平板狀電極之陽極12之 一面載置被成膜物，例如玻璃板19» 陰極13構成與後述之靶材21電性連接之端子，經由電纜 與交流（AC)電源裝置14電性連接。又，該陰極13藉由與冷 卻水供給裝置15連接之冷卻水循環管16而抑制成膜時之溫 度上升。201211293 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a target mounting mechanism for a sputtering apparatus, and more particularly to a target mounting that can easily and reliably mount a cylindrical target relative to a cathode mechanism. The present application claims priority based on Japanese Patent Application No. 2010-ΐ46617, filed on Jun. [Prior Art] For example, as a glass for building materials, Low-E glass (low-emitting glass) is being used. Such Low-E glass is formed by forming a metal thin film on the surface of the glass. When a metal thin film is formed on the surface of glass or the like, a film is formed using a magnetron sputtering apparatus having a flat plate material (hereinafter simply referred to as a target). However, with the increase in the size of glass for building materials in recent years, it has been difficult to form a metal film on the entire glass surface with a uniform thickness in a flat dry material. As a method of forming a metal film without unevenness on a film-forming object having a uniform thickness on such a large area, a plate-extruding device using a cylindrical target has been proposed (for example, see Patent Document 1). Further, there is a feature that the cylindrical target is more efficient than the flat target. A sputtering apparatus using a cylindrical shaped target is a cylindrical target attached to the cathode electrode at both ends in the direction of the rotation axis (longitudinal direction). Conventionally, as a configuration in which a target is attached to a cathode electrode, for example, in a jig that is engaged with a cathode electrode, a groove having a semicircular cross section is spirally formed, and a semicircular shape is spirally formed at an end portion of the target material. groove. Then, it was revealed that there is a joint system, 157111.doc 201211293, which is inserted into a cylindrical spiral ring in either groove, and the spiral ring is engaged in the other groove, thereby mounting the target on the cathode electrode (refer to the patent literature. [Patent Document 1] [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. In the connection system of Document 2, when the cylindrical dry material is attached to the cathode electrode, since the target material and the sanitary tool are fastened via the spiral ring, the mounting position is easily deviated, so that the axis of the dry material is correctly rotated with the cathode electrode. It is difficult to install the center. Therefore, the sister material is easy to rotate eccentrically, and the invading pattern is unstable. The problem of the lighter brother's life is shorter. For example, the large-scale film is formed on the side of the surface. In the case where a material is formed into a film and a large target having a length of several meters or the like is used, when the target is mounted on the cathode electrode, it is necessary to use a special tool to rotate the center device with a large force, and the installation of the target requires a lot of labor. In view of the above, the aim of the present invention is to provide a dry material mounting mechanism which can easily mount a cylindrical dry material with respect to a cathode and can be installed at a mounting position. X 'the purpose is to provide a dry material. The pattern of invading money is uniform, and it is possible to find the installation mechanism of the long life of the product. [Technical means to solve the problem] () This month, the aspect is a dry material installation structure, which is used in the cuckoo clock device. The cylindrical (four)-to-cathode connection portion is detachably mounted; 157111.doc 201211293 The target material has a cylindrical base body and a target covering the base body, and has a central region in which the target material is disposed, and a connection region in which the base body is exposed is formed on both end sides; a substantially cylindrical jig having the connection portion and the connection region is formed in the connection portion of the cathode; and the connection portion and the connection region just described are in the jig In a state in which the first engaging convex portion formed in the connecting region of the target and the second engaging convex portion formed on the inner circumferential surface of the jig are relatively moved only in the circumferential direction of the target (2) According to the aspect of the above (1), preferably, the moment required for the engagement of the first engaging convex portion and the second engaging convex portion is 1 (kgf.cm). In the above aspect (1), preferably, the contact surface of the first fastening convex portion and the second fastening convex portion is the circumference of the target material. (4) According to the aspect of the above (1), it is preferable to provide the first buckle protrusion and the second buckle protrusion. (5) According to the aspect of the above (1), preferably, the second fastening convex portion forms three ridges on the inner circumferential surface of the missing device On the same line, also on the imaginary circle in which the rotating axis of the target is regarded as the center, and the line segment passing through at least one of the center and the second engaging convex portion, and the second engaging convex portion axis Symmetrically configured. (6) In the aspect of the above (1), it is preferable to further include a gasket provided in a portion of the connecting portion of the cathode that extends perpendicularly to the axis and a contact portion 157111.doc 201211293 of the substrate. (7) In the aspect of the above (1), it is preferable to further include a fixing means for adhering a portion of the connecting portion which is perpendicular to the axial center of the cathode to the base. (8) In the aspect of the above aspect (1), it is preferable to further include a spacer disposed on a gap between the portion extending perpendicularly to the axial center of the connecting portion of the cathode and the jig. (9) In the case of the above (8), it is preferred to subject the gasket to a surface treatment. [Effects of the Invention] As described above, when the cylindrical dry material is attached to the cathode of the sputtering apparatus according to the aspect described in the above (1), the jig formed on the cathode is inserted into the connection region of the end portion of the dry material, and only the borrowing region is used. The first target engaging projection is engaged with the second engaging convex portion by relative movement in the circumferential direction of the target, and the cylindrical target can be attached with respect to the cathode. & Therefore, by the engagement of the first engaging convex portion and the second engaging convex portion, the center of the cathode can be easily aligned with the axis of the target, and the target can be rotated as the center of rotation without eccentricity. Thereby, the distance between the film-forming object and the target material can be uniform throughout the entire circumference of the target material, and a film having a uniform thickness without unevenness can be formed throughout the film formation. • In the case of using a large and heavy target, when the target is mounted, the clamp is relatively moved only along the circumferential direction of the target, and the second fastening projection and the first fastening projection are engaged. The target is mounted on the cathode. Therefore, it is not necessary to use a special tool to rotate the jig with a large force as before, even if the jig is rotated along the circumference of the target with a small force without using a special tool, 157111.doc 201211293 can easily mount the dry material on the cathode. [Embodiment] Hereinafter, an embodiment of a target attachment mechanism according to the present invention will be described with reference to a circle. The present embodiment is specifically described for better understanding of the gist of the invention, and the present invention is not limited thereto unless otherwise specified. invention. Further, the drawings used in the following description are for easy understanding of the features of the present invention, and for the sake of convenience, the portions of the main parts are enlarged and displayed, and the dimensional ratios of the respective constituent elements and the like are not necessarily the same as the actual ones. First, a magnetron sputtering apparatus (hereinafter referred to as a sputtering apparatus) including the target mounting mechanism of the present embodiment will be described. Fig. 1 is a longitudinal sectional view showing the configuration of a sputtering apparatus. Further, Fig. 2 is an enlarged perspective view showing an essential part of a region including a target. The deplating apparatus 10 includes a reaction chamber 11, an anode 12, a cathode 13, a vacuum pump 17, and an Ar gas supply device 18. The inside of the reaction chamber U can be depressurized by the vacuum pump 17, and when the film is formed, for example, the pressure is reduced to a vacuum of about 6 Pa. The anode 12 includes, for example, a plurality of flat electrodes. The anode crucible 2 may be electrically connected to the ground via a cable. The film formation is placed on one surface of the anode 12 of the flat electrode. For example, the glass plate 19»the cathode 13 constitutes a terminal electrically connected to the target 21 to be described later, and is electrically connected to the alternating current (AC) power supply device 14 via a cable. connection. Further, the cathode 13 is prevented from rising in temperature at the time of film formation by the cooling water circulation pipe 16 connected to the cooling water supply device 15.
Ar氣體供給裝置18經由氣體供給管與反應室11之内部連 接。藉此，成膜時對反應室11内供給作為電漿產生用氣體 157111.doc -8 - 201211293 之Ar氣體。 如圖2所示，靶材21全體形成大致圓筒形。靶材21包含 中空圓筒形之基體（支持管）22 ;及在該基材22之沿著轴心 方向R之中央區域S1，覆蓋基體22之外周面之靶材23。並 除該中央區域S1之兩端側成基體22露出之連結區域82。 基體（支持管）22例如只要以厚度數毫米左右之不鏽鋼管 形成即可。覆蓋基體22之中央區域S1之靶材23只要係以特 定厚度形成欲成膜於被成膜物上之薄膜之材料即可，例如 W、Ti、Ta、Mo、Α1合金等各種金屬材料、矽、銦-錫氧 化物（以下稱作ITO)等。 如此圓筒形靶材21放置於濺锻裝置1〇時，於基體22之内 部配置磁鐵51(參照圖1)。該磁鐵51於乾材23周圍形成磁 場，進行磁控濺鍍。利用如此磁鐵51將電漿封入於祀材21 附近’從而使減鑛速度高速化，且防止乾材之薄膜堆積於 靶材2 1附近。 於乾材21之兩端部即連結區域s 2上電性且機械性連接有 陰極13。該連結區域S2與陰極13之連接係經由形成於陰極 之連結部S3之夹具41而進行。 如此之靶材21例如只要相同者2條並列形成即可。並 且，各個乾材21利用未圖示之馬達而在成膜中以特定之旋 轉速度旋轉" 使用如上構成之濺鍍裝置10’於被成膜物之玻璃i 9之一 面成膜例如金屬薄膜時，首先從Ar氣體供給裝置18對反應 室11内導入Ar氣體，同時利用真空泵17使反應室丨丨内減 157111.doc 201211293 壓’例如將壓力設定成1.3 Pa。接著，使載置有被成膜物 之玻璃19之陽極12與並列配置之2條靶材21、21對向》 然後’從交流（AC)電源裝置14經由陰極13於2條靶材 2 1、21上流動交流電流（AC)。此時以電流在陰極與陽極交 互替換之方式施加於一靶材21與另一靶材21上》 若對靶材21、21施加交流電流（AC)，則反應室11内之Ar 氣體變成輝光放電電漿，產生多數之Ar+離子。然後，該 多數之Ar+離子與連接於陰極π之靶材21之靶材23碰撞。 乾材23藉由該Ar+之碰撞而受濺鍍，靶材23之構成材料之 粒子（濺鍍粒子）堆積於載置於陽極12之玻璃19上。藉此， 可於玻璃19之一面形成含靶材23之構成材料之薄膜。 如此之濺鍍時’藉由以軸心方向R為旋轉中心以特定速 度使把材21、21旋轉’而乾材23以均一厚度減少，且可對 大面積之玻璃19之一面全體形成均一膜厚之薄膜。 (第一實施形態） 圖3係顯示本發明之靶材安裝機構之放大立體圖。又， 圖4係顯示本發明之乾材安裝機構之剖面圖。 在靶材21之兩端部基體22所露出之連結區域82上，沿著 基體22之圓周方向形成第一扣合凸部61。第一扣合凸部6ι 係從基材22之周面22a向外方突出之突起，沿著基體22之 圓周方向Q例如均等地配置於6處。該第一扣合凸部61只要 與基體22—體形成即可。 第一扣合凸部61包含：從基材22之周面22a以較低位置 突出之導人部6la;從該導人部…沿著基體22之圓周方向 157111.doc -10· 201211293 Q，向從周面22a朝外方離開之方向傾斜之傾斜部6lb ;及 與該傾斜部6lb相連’以比傾斜部61b更陡峭角度（大角度） 在從周面22a向外方離開之方向上升（傾斜）之扣止部61c(亦 參照圖5 A之剖面圖）。又，傾斜部61 b從與導入部61 a相連 側向與扣止部61 c相連側，沿著靶材21之軸 心 方向R成寬度 擴大之形狀。 成陰極13之一端之連結部S3上，可旋轉地安裝有夾具 71 °該夾具71形成内有陰極13之連結部S3與靶材21之連結 區域S2之中空之大致圓筒形狀。即，靶材21係中空之内徑 與陰極13之連結部S3或靶材21之連結區域S2之直徑相同或 比其大地形成’安裝靶材21時成覆蓋該等連結部S3或連結 區域S2之形狀。 於夾具71之内周面71 a上，沿著該夾具71之内周方向D形 成第二扣合凸部72。第二扣合凸部72係被支持（固定）於從 内周面71a向夾具71之外側掘下之特定寬度之槽71b之兩側 面之圓筒棒狀構件。槽71b沿著夾具71之内周方向D例如均 等地配置於6處。另一方面，第二扣合凸部72在該等6處槽 71b中每隔1個均等地形成於3處。 槽7lb在第一扣合凸部61與第二扣合凸部72之扣合時， 形成於6處之第一扣合凸部61與該槽71b在内周方向D對 向。然後’ 6處槽71b中形成於3處槽71b之第二扣合凸部72 與第一扣合凸部61滑動且抵接，從而靶材21固定於夾具71 上（乾材21與史具71之扣合如後述）。 夾具71之一端側上形成有含鎖緊螺絲73與螺絲孔74之固 157111.doc 201211293 定機構75。該固定機構75在將夾具71扣合於靶材2i時使 鎖緊螺絲73沿著轴心方向R向靶材21緊固，藉此以夾具71 沿著内周方向D不鬆弛之方式固定。 在形成於對軸心方向垂直擴大之陰極13之連結部S3與夾 具71内面間之間隙τ上，進而設有墊片76。該墊片％係中 心設有貫通陰極13之孔之圓盤狀構件，例如只要由不鏽 鋼鋁等形成即可。墊片76係防止在鎖緊構成固定機構75 之鎖緊螺絲73時，其前端與陰極13之連結部“直接抵接而 受損。 墊片76實施表面處理較佳。例如只要在由鋁形成之墊片 76表面形成氧化鋁皮膜即可。又，例如在由鋁形成之墊片 76表面，形成富有小裂縫等微細凹凸之硬質氧化鋁膜即 可’進而形成複合有微小氟樹脂之皮膜即可。 又，例如使無電解鎳與氟樹脂在處理液中共析於由鐵、 不鏽鋼、銅合金等形成之墊片76之表面，皮膜中均一地含 有相對於容積比30%左右之氟樹脂，成膜後進行熱處理， 形成強固密著有無電解鎳與氟樹脂之皮膜亦可。 再者，例如亦可於由鐵、不鏽鋼、銅合金等形成之墊片 76之表面，將無電解鎳作為基底，進行於該析出成粒子狀 之無電解鎳中複合有氣樹脂之表面處理，形成皮膜。 如此，藉由進行墊片76之表面處理，而可實現墊片76之 耐磨耗性提高、滑動性提高、防止咬合等。 於陰極之連結部S3之端部形成有墊圈77。該塾圈77例 如由鋁或銅合金等形成，藉由與靶材21之基材22之端部抵 157111.doc -12- 201211293 接，將基材22之中空内部保持氣密。 說明如此構成之本發明之靶材安裝機構之作用。 利用本實施形態之靶材安裝機構於濺鍍裝置10之陰極13 安裝圓筒形靶材21時，如圖5A所示，使形成於陰極13之連 結部S3之夾具71與靶材21之基材22露出之連結區域S2靠 近。然後，於夾具71之内部插入基材22之連結區域S2。 將基材22之連結區域S2插入於夾具71之内部後，接著如 圖5B所示’使夾具71繞軸心方向R僅沿著乾材21之圓周方 向Q旋轉。若使夾具71僅沿著圓周方向Q開始旋轉，則形 成於3處槽71b之第二扣合凸部72在第一扣合凸部61之導入 部61 a與内周面71 a之徑方向重疊。該狀態下，由於距離導 入部61a之周面22a之高度較低，因此第二扣合凸部72與第 一扣合凸部61幾乎不相接。 如圖5C〜圖5E所示，若進而使夾具71僅沿著靶材21之圓 周方向Q旋轉，則第二扣合凸部72與朝夹具71之旋轉方向 緩慢變高之方式傾斜之傾斜部61b抵接。因此，第二扣合 凸部72從側面觀察時以正像登上傾斜部61b之方式滑動。 夾具71僅沿著把材21之圓周方向q旋轉，滑動傾斜部6b 時，傾斜部61b從與導入部61a相連之側向與扣止部61c相 連之侧，沿著靶材21之轴心方向R成寬度擴大之形狀，因 此第二扣合凸部72與第一扣合凸部61接觸面積逐漸增加。 另，第二扣合凸部72形成圓柱狀，因此夾具71沿著靶材21 之圓周方向Q順暢地旋轉。 若使失具71進而旋轉，則第二扣合凸部72登上傾斜部 157111.doc •13· 201211293 61b後，與以比傾斜部61b更陡峭角度上升之扣止部61c抵 接。因此，抑制進一步沿著圓周方向q之旋轉。藉此，靶 材21對夾具71扣合。如此扣合狀態下，第一扣合凸部61與 第二扣合凸部72之接觸面B成為靶材21之圓周方向Q為短 側’靶材21之軸心方向（軸方向）R為長側之細長的長方 形。 藉由如此將第一扣合凸部61與第二扣合凸部72之接觸面 抑制為較小，於夹具71之内部插入靶材21之連結區域S2 後’使夹具71僅沿著靶材21之圓周方向Q旋轉，在第二扣 合凸部72與扣止部61c抵接之前必要之旋轉力矩成1 (kgf’cm)以上、20(kgf.cm)以下。藉此，例如作業者不使用 專用工具等而只要由手使夾具71輕鬆旋轉，即可使靶材21 與夹具71扣合。 另一方面，只要係第二扣合凸部72登上傾斜部61b與扣 止部61c抵接時，發出判斷第一扣合凸部61與第二扣合凸 部72之扣合動作已完成之信號之結構即可。例如如此信號 只要為聲音即可。該實施形態中，成為第二扣合凸部了之與 第扣合凸部61之扣止部61c碰撞時產生之接觸音出現之 結構，因此可察覺使夾具71旋轉至特定之扣合位置。藉 此，可防止因夾具71之旋轉不足等所致之扣合不良。 其後，藉由將圖4所示之固定機構75之鎖緊螺絲73沿著 轴心方向R朝向靶材21鎖固，而將陰極13向靶材21按壓， 第一扣合凸部61與槽71b密接，夾具71對靶材21不容易旋 轉。因此，維持第一扣合凸部61與第二扣合凸部^之扣合 157111.doc 14· 201211293 (接觸）狀態。 如上’依據本實施形態之把材安裝機構，於賤鑛裝置10 之陰極13安裝圓筒形靶材21時，將形成於陰極13之夾具71 插入於靶材21之端部之連結區域S2後使之旋轉，僅使第一 扣合凸部61與第二扣合凸部72扣合，即可將圓筒形乾材21 ' 安裝於陰極13上。 又，例如使用長度為數米等大型勒*材之情形中，安裝乾 材21時使夾具71僅沿著圓周方向旋轉，僅使第二扣合凸部 72與第一扣合凸部61扣合，即可將乾材21安裝於陰極13 上。因此’無需如以往使用專用工具以較大力使夾具旋轉 等’即使不使用專用工具而以較小力，例如僅在夾具71之 旋轉力矩為l(kgf.cm)以上、20(kgf.cm)以下之範圍内旋 轉’即可容易將靶材21安裝於陰極13上。 根據上述實施形態’第二扣合凸部72在6處槽7lb中每隔 1個均等地形成於3處。即’如圖6A所示，第二扣合凸部72 形成3個，位在夾具71之内周面71a方向之相同線卩丨上，亦 在將把材21之旋轉軸即軸心方向r看作中心之假想圓μ 上，且相對於通過該中心與第二扣合凸部72之線段L軸對 • 稱地配置。 - 根據如此構成’扣合第一扣合凸部61與第二扣合凸部72 時’可使靶材21之旋轉轴與夾具71之内周面71&中之軸心 正確一致。因此成膜時靶材21不會偏心旋轉，可均一地形 成侵蝕圖案，提高靶材21之壽命。 如圖6B所示，第一扣合凸部在同一線pi上，且亦在假想 157111.doc 15- 201211293 圓P2上，且可以相對於通過該中心與第二扣合凸部“之線 段L轴對稱之方式配置於4處。又，例如如圖6(：所示亦可 在同一線P1上，且亦在假想圓P2上，且以相對於通過該中 心與第二扣合凸部82之線段L轴對稱之方式配置於5處。 因此’利用第一扣合凸部61與第二扣合凸部72之扣合， 可使陰極13之中心與靶材21之軸心容易一致，可將軸心作 為旋轉中心不偏心地使靶材21旋轉。藉此，被成膜物與乾 材21之距離遍及乾材21之全周成均一，可遍及被成膜物之 全面成膜無不均之均一厚度之皮膜。 另，根據上述實施形態’使夾具71相對於靶材21僅沿著 圓周方向Q旋轉扣合’但第一扣合凸部與第二扣合凸部只 要沿者乾材之圓周方向相對移動而扣合即可。即，可取代 夾具使靶材旋動’或使靶材與夾具兩方在圓周方向向互相 不同方向迴動，扣合第一扣合凸部與第二扣合凸部之構 (第二實施形態） 圖7係顯示本發明之靶材安裝機構之其他實施形態之放 大立體圖。又，圖8係相同靶材安裝機構之剖面圖。 根據該實施形態’在靶材21之兩端部基體22露出之連結 區域S2上，沿著基體22之圓周方向形成第一扣合凸部3 1 » 第一扣合凸部3 1係從基材22之周面22a向外方突出之突 起，沿著基體22之圓周方向例如均等地配置於6處。該第 一扣合凸部3 1只要與基體22—體形成即可。The Ar gas supply device 18 is connected to the inside of the reaction chamber 11 via a gas supply pipe. Thereby, Ar gas which is a plasma generating gas 157111.doc -8 - 201211293 is supplied into the reaction chamber 11 at the time of film formation. As shown in FIG. 2, the entire target 21 is formed into a substantially cylindrical shape. The target 21 includes a hollow cylindrical base (support tube) 22 and a target 23 covering the outer peripheral surface of the base 22 in a central portion S1 of the base 22 in the axial direction R. Further, on both end sides of the central portion S1, a joint region 82 in which the base 22 is exposed is formed. The base (support tube) 22 may be formed, for example, by a stainless steel tube having a thickness of about several millimeters. The target material 23 covering the central portion S1 of the substrate 22 may be formed of a material having a specific thickness to form a film formed on the film-formed object, for example, various metal materials such as W, Ti, Ta, Mo, and yttrium alloy, yttrium. Indium-tin oxide (hereinafter referred to as ITO) or the like. When the cylindrical target 21 is placed in the sputtering apparatus 1 , the magnet 51 is placed inside the base 22 (see Fig. 1). The magnet 51 forms a magnetic field around the dry material 23 to perform magnetron sputtering. The magnet 51 is sealed in the vicinity of the coffin 21 by the magnet 51, whereby the descaling speed is increased, and the film of the dry material is prevented from accumulating in the vicinity of the target 21. The cathode 13 is electrically and mechanically connected to the connecting portion s 2 at both ends of the dry material 21. The connection between the connection region S2 and the cathode 13 is performed via the jig 41 formed on the connection portion S3 of the cathode. Such a target 21 may be formed in parallel, for example, in the same manner. Further, each of the dry materials 21 is rotated at a specific rotational speed during film formation by a motor (not shown) " using a sputtering apparatus 10' having the above configuration to form a film, for example, a metal film on one side of the glass i9 of the film formation. At this time, Ar gas is first introduced into the reaction chamber 11 from the Ar gas supply device 18, and the pressure in the reaction chamber is reduced by 157111.doc 201211293 by the vacuum pump 17, for example, the pressure is set to 1.3 Pa. Next, the anode 12 of the glass 19 on which the film formation is placed is opposed to the two targets 21 and 21 arranged side by side, and then "from the alternating current (AC) power supply device 14 via the cathode 13 to the two targets 2 1 , 21 alternating current (AC). At this time, current is applied to one target 21 and the other target 21 in such a manner that the cathode and the anode are alternately replaced." If an alternating current (AC) is applied to the targets 21, 21, the Ar gas in the reaction chamber 11 becomes glow. Discharge the plasma to produce a majority of Ar+ ions. Then, the majority of the Ar+ ions collide with the target 23 attached to the target 21 of the cathode π. The dry material 23 is sputtered by the collision of Ar+, and particles (sputtering particles) of the constituent material of the target 23 are deposited on the glass 19 placed on the anode 12. Thereby, a film containing the constituent material of the target 23 can be formed on one surface of the glass 19. In the case of such sputtering, the dry material 23 is reduced in uniform thickness by rotating the material 21, 21 at a specific speed in the axial direction R as the center of rotation, and a uniform film can be formed on one surface of the large-area glass 19 as a whole. Thick film. (First Embodiment) Fig. 3 is an enlarged perspective view showing a target mounting mechanism of the present invention. Further, Fig. 4 is a cross-sectional view showing the dry material mounting mechanism of the present invention. The first engaging convex portion 61 is formed along the circumferential direction of the base 22 in the joint region 82 where the base 22 of the both ends of the target 21 is exposed. The first engaging convex portion 6ι is a protrusion that protrudes outward from the circumferential surface 22a of the base material 22, and is disposed at six positions in the circumferential direction Q of the base body 22, for example. The first engaging convex portion 61 may be formed integrally with the base body 22. The first fastening convex portion 61 includes a guiding portion 61a protruding from a peripheral surface 22a of the base material 22 at a lower position; from the guiding portion ... along the circumferential direction of the base 22 157111.doc -10·201211293 Q, The inclined portion 61b which is inclined in the direction away from the circumferential surface 22a toward the outside; and the connection with the inclined portion 61b' rises in a direction away from the peripheral surface 22a toward the outer side at a steeper angle (large angle) than the inclined portion 61b ( The inclined portion 61c (see also the cross-sectional view of Fig. 5A). Further, the inclined portion 61b has a shape in which the width is enlarged along the axial direction R of the target 21 from the side connected to the introduction portion 61a toward the fastening portion 61c. A jig 71 is rotatably attached to the connecting portion S3 which is one end of the cathode 13. The jig 71 has a substantially cylindrical shape in which the connecting portion S3 of the cathode 13 and the connecting portion S2 of the target 21 are hollow. In other words, the inner diameter of the hollow portion of the target 21 is the same as or larger than the diameter of the connection portion S3 of the cathode 13 or the connection region S2 of the target member 21, and the connection portion S3 or the connection region S2 is covered when the mounting target 21 is formed. The shape. On the inner circumferential surface 71a of the jig 71, a second engaging convex portion 72 is formed along the inner circumferential direction D of the jig 71. The second engaging convex portion 72 is supported (fixed) to a cylindrical rod-shaped member on both sides of the groove 71b of a specific width which is dug from the inner peripheral surface 71a toward the outer side of the jig 71. The grooves 71b are equally arranged at six locations along the inner circumferential direction D of the jig 71, for example. On the other hand, the second engaging convex portion 72 is equally formed at three places in the six grooves 71b. When the groove 7lb is engaged with the second engaging convex portion 61 and the second engaging convex portion 72, the first engaging convex portion 61 formed at six places faces the groove 71b in the inner circumferential direction D. Then, the second engaging convex portion 72 formed in the three grooves 71b of the six grooves 71b slides and abuts against the first engaging convex portion 61, so that the target 21 is fixed to the jig 71 (dry material 21 and the history tool) The snapping of 71 is as described later). One end side of the jig 71 is formed with a fixing mechanism 75 including a locking screw 73 and a screw hole 74. When the jig 71 is engaged with the target 2i, the fixing mechanism 75 fastens the locking screw 73 to the target 21 along the axial direction R, whereby the jig 71 is fixed so as not to be slack in the inner circumferential direction D. A spacer 76 is further provided on the gap τ formed between the connecting portion S3 of the cathode 13 which is vertically enlarged in the axial direction and the inner surface of the jig 71. The spacer % center is provided with a disk-shaped member that penetrates the hole of the cathode 13, and may be formed of, for example, stainless steel or the like. The spacer 76 prevents the connection portion between the front end and the cathode 13 from being directly abutted and damaged when the locking screw 73 constituting the fixing mechanism 75 is locked. The spacer 76 is preferably surface-treated. For example, as long as it is formed of aluminum The surface of the spacer 76 may be formed of an aluminum oxide film. Further, for example, a hard aluminum oxide film having fine irregularities such as small cracks may be formed on the surface of the spacer 76 formed of aluminum, thereby forming a film in which a fine fluororesin is compounded. Further, for example, the electroless nickel and the fluororesin are eutectoidally deposited on the surface of the spacer 76 formed of iron, stainless steel, copper alloy or the like in the treatment liquid, and the fluororesin is uniformly contained in the coating film with a volume ratio of about 30%. After the film formation, heat treatment is performed to form a film having a strong adhesion of the electroless nickel and the fluororesin. Further, for example, electroless nickel may be used as the substrate on the surface of the spacer 76 formed of iron, stainless steel, copper alloy or the like. The surface of the electroless nickel deposited in the form of particles is combined with a gas resin to form a film. Thus, by performing the surface treatment of the spacer 76, the wear resistance of the spacer 76 can be improved. High, slidability is improved, seizure prevention, etc. A gasket 77 is formed at an end of the cathode connecting portion S3. The coil 77 is formed of, for example, aluminum or a copper alloy, and the end portion of the substrate 22 with the target 21. 157111.doc -12-201211293, the hollow interior of the substrate 22 is kept airtight. The role of the target mounting mechanism of the present invention configured as described above is explained. The target mounting mechanism of the present embodiment is used in the sputtering apparatus 10. When the cylindrical target 21 is attached to the cathode 13, as shown in FIG. 5A, the jig 71 formed on the connecting portion S3 of the cathode 13 is brought close to the connecting region S2 where the substrate 22 of the target 21 is exposed. Then, in the jig 71 The connection region S2 of the substrate 22 is inserted into the inside. After the connection region S2 of the substrate 22 is inserted into the inside of the jig 71, then as shown in FIG. 5B, the clamp 71 is axially oriented along the circumferential direction of the dry material 21 only. When the jig 71 is rotated only in the circumferential direction Q, the second engaging convex portion 72 formed at the three grooves 71b is at the introduction portion 61a and the inner peripheral surface 71a of the first engaging convex portion 61. The radial direction overlaps. In this state, the height of the peripheral surface 22a of the distance introduction portion 61a is low. Therefore, the second engaging convex portion 72 is hardly in contact with the first engaging convex portion 61. As shown in Figs. 5C to 5E, if the jig 71 is further rotated only in the circumferential direction Q of the target 21, the second The engaging convex portion 72 is in contact with the inclined portion 61b that is inclined so as to gradually increase in the rotational direction of the jig 71. Therefore, the second engaging convex portion 72 slides so as to climb up the inclined portion 61b when viewed from the side. The jig 71 is rotated only in the circumferential direction q of the material 21, and when the inclined portion 6b is slid, the inclined portion 61b is directed from the side connected to the introduction portion 61a to the side connected to the locking portion 61c along the axial direction of the target 21. Since R has a shape in which the width is enlarged, the contact area between the second engaging convex portion 72 and the first engaging convex portion 61 is gradually increased. Further, since the second engaging convex portion 72 is formed in a cylindrical shape, the jig 71 smoothly rotates in the circumferential direction Q of the target 21. When the disengagement 71 is further rotated, the second engaging convex portion 72 ascends the inclined portion 157111.doc •13·201211293 61b, and then abuts against the locking portion 61c that rises at a steeper angle than the inclined portion 61b. Therefore, the rotation further along the circumferential direction q is suppressed. Thereby, the target 21 is engaged with the jig 71. In the engaged state, the contact surface B between the first engaging convex portion 61 and the second engaging convex portion 72 becomes the short side of the target 21 in the circumferential direction Q. The axial direction (axial direction) R of the target 21 is The slender rectangle on the long side. By thus suppressing the contact surface between the first engaging convex portion 61 and the second engaging convex portion 72 to be small, the insertion region S2 of the target 21 is inserted into the inside of the jig 71, and the jig 71 is merely along the target. In the circumferential direction Q of 21, the rotation torque required before the second engagement convex portion 72 abuts against the fastening portion 61c is 1 (kgf'cm) or more and 20 (kgf.cm) or less. Thereby, for example, the operator can easily engage the target 21 with the jig 71 by simply rotating the jig 71 by hand without using a special tool or the like. On the other hand, as long as the second engaging convex portion 72 ascends the inclined portion 61b and abuts against the locking portion 61c, it is judged that the fastening action of the first engaging convex portion 61 and the second engaging convex portion 72 is completed. The structure of the signal can be. For example, the signal can be as long as it is sound. In this embodiment, since the contact sound generated when the second engaging convex portion collides with the engaging portion 61c of the engaging convex portion 61 is present, it is possible to detect that the jig 71 is rotated to the specific engaging position. Thereby, it is possible to prevent the fastening failure due to insufficient rotation of the jig 71 or the like. Thereafter, by locking the locking screw 73 of the fixing mechanism 75 shown in FIG. 4 in the axial direction R toward the target 21, the cathode 13 is pressed against the target 21, and the first engaging convex portion 61 and The groove 71b is in close contact, and the jig 71 does not easily rotate against the target 21. Therefore, the state in which the first engaging convex portion 61 and the second engaging convex portion are engaged is maintained 157111.doc 14· 201211293 (contact). As described above, in the material mounting mechanism according to the present embodiment, when the cylindrical target 21 is attached to the cathode 13 of the smelting apparatus 10, the jig 71 formed on the cathode 13 is inserted into the joint region S2 of the end portion of the target 21 By rotating it, only the first fastening convex portion 61 and the second fastening convex portion 72 are engaged, and the cylindrical dry material 21' can be attached to the cathode 13. Further, for example, in the case of using a large-sized material such as several meters in length, when the dry material 21 is attached, the jig 71 is rotated only in the circumferential direction, and only the second engaging convex portion 72 is engaged with the first engaging convex portion 61. The dry material 21 can be mounted on the cathode 13. Therefore, it is not necessary to use a special tool to rotate the jig with a large force as in the past, even if a special force is not used, for example, only the rotation torque of the jig 71 is l (kgf.cm) or more, 20 (kgf.cm). The target 21 can be easily attached to the cathode 13 by rotating 'within the following range'. According to the above embodiment, the second engaging convex portion 72 is formed at three places equally in every six slots 71b. That is, as shown in Fig. 6A, three second engaging convex portions 72 are formed on the same turn in the direction of the inner circumferential surface 71a of the jig 71, and the rotational axis of the material 21, that is, the axial direction r. It is regarded as the center imaginary circle μ, and is disposed symmetrically with respect to the line L axis passing through the center and the second engaging convex portion 72. - When the first engaging convex portion 61 and the second engaging convex portion 72 are engaged as described above, the axis of rotation of the target 21 can be accurately aligned with the axial center of the inner peripheral surface 71 & Therefore, the target 21 does not rotate eccentrically during film formation, and the erosion pattern can be uniformly formed to improve the life of the target 21. As shown in FIG. 6B, the first engaging convex portion is on the same line pi, and is also on the imaginary 157111.doc 15-201211293 circle P2, and may be opposite to the line segment L passing through the center and the second engaging convex portion. The axisymmetric manner is arranged at 4. Further, for example, as shown in FIG. 6 (also on the same line P1, and also on the imaginary circle P2, and with respect to the passing through the center and the second engaging convex portion 82) The line segments are arranged in five L-axis symmetry. Therefore, by the engagement of the first engaging convex portion 61 and the second engaging convex portion 72, the center of the cathode 13 and the axis of the target 21 can be easily aligned. The target 21 can be rotated without eccentricity as the center of rotation, whereby the distance between the film formation and the dry material 21 is uniform throughout the entire circumference of the dry material 21, and the entire film formation can be formed throughout the film formation. According to the above embodiment, the jig 71 is rotated and engaged only in the circumferential direction Q with respect to the target member 21, but the first engaging convex portion and the second engaging convex portion are only required to be dried. The circumferential direction of the material is relatively moved and snapped together. That is, the fixture can be used to rotate the target or to make the target and the fixture The front side of the target attachment mechanism of the present invention is shown in another embodiment of Fig. 8 is a cross-sectional view of the same target mounting mechanism. According to this embodiment, a first buckle is formed along the circumferential direction of the base 22 at the joint region S2 where the base portions 22 of the both ends of the target 21 are exposed. The convex portion 3 1 » the first fastening convex portion 3 1 is a protrusion that protrudes outward from the circumferential surface 22 a of the base material 22 , and is equally disposed, for example, at 6 along the circumferential direction of the base body 22 . The convex portion 3 1 may be formed integrally with the base 22 .
如圖9A所示，第一扣合凸部31例如形成平面觀察大致L 157111.doc -16 - 201211293 字型。如此之第一扣合凸部31具備沿著靶材21之轴心方向 R延伸之第一扣合機構E1 ;沿著靶材21之圓周方向q延伸 之第二扣合機構E2;及在乾材21之圓周方向q大致直角方 向配置之第三扣合機構E3。 成陰極13之一端之連結部S3上，可旋轉地安裝有夾具 41。該夾具41形成為内有陰極13之連結部S3與乾材21之連 結區域S2之中空之大致圓筒形狀。即，靶材21係中空之内 徑與陰極13之連結部S3或乾材21之連結區域S2之直徑相同 或大於其地形成，安裝靶材21時，成為覆蓋該等連結部83 或連結區域S2之形狀。 於夾具41之内周面41a上，沿著内周方向d形成第二扣合 凸部42。第一扣合凸部42係從内周面41a向中心方向突出 之突起，沿著内周方向D例如均等地配置於6處。該第二扣 合凸部42只要與夾具41一體形成即可。 如圖9A所示，第二扣合凸部42例如形成平面觀察大致矩 形。如此之第二扣合凸部42只要以沿著内周方向〇之寬度 W與互相鄰接之第一扣合凸部3丨彼此之間隔相同或小於其 之方式形成即可。 根據如此之構成，第一扣合凸部3丨與第二扣合凸部42在 安裝乾材21時可互相扣合地配置。 於夾具41之一端側形成有含鎖緊螺絲43與螺絲孔44之固 定機構45。該固定機構45在使夾具41與靶材21扣合時，藉 由使鎖緊螺絲43沿著軸心方向R向靶材21緊固，而可使第 一扣合凸部31與第二扣合凸部42密接。 157111.doc -17- 201211293 在陰極13之連結部S3中相對於轴心方向垂直延伸之部分 與夾具41之内面間形成之間隙τ中，進而設有墊片46。該 塾片46係中心設有貫通陰極13之孔之圓盤狀構件，例如只 要由不鏽鋼形成即可。如此之墊片46係防止在鎖緊構成固 定機構45之鎖緊螺絲43時，其前端與陰極13之連結部S3直 接抵接而受損。 於陰極13之連結部S3之端部形成有墊圈47。該墊圈47例 如由銘等形成’藉由與靶材21之基材22之端部抵接，而將 基材22之中空内部保持氣密。 說明具有如此構成之本實施形態之靶材安裝機構之作 用》 利用本實施形態之靶材安裝機構，於濺鍍裝置1〇之陰極 13女裝圓洧形無材21時，如圖9 A所示，使形成於陰極13之 連結部S3之夾具41與靶材21之基材22露出之連結區域S2靠 近。然後，形成於奐具41之各個第二扣合凸部42以通過形 成於基材22之第一扣合凸部3 1彼此之間之方式對位後，於 夾具41之内面插入基材22之連結區域S2。 該插入時，構成第一扣合凸部31之第一扣合機構£1與第 二扣合凸部42之一面L1沿著軸心方向r滑動，且基材22之 連結區域S2插入於夾具41之内部。 如圖9B所示，使夾具41僅沿著靶材21之圓周方向卩旋 轉，第二扣合凸部42之一面^與第一扣合機構扪插入至圓 周方向Q上不重疊之位置後’接著如圖扣所示，使夾具41 沿著乾材2〗之圓周方向Q旋轉。該旋轉時，構成第一扣合 157111.doc • 18 · 201211293 凸邛31之第—扣合機構E2與第二扣合凸部42之另一面l2 一 面沿著圓周方向q滑動，失具41 一面旋轉。 若夹具41旋轉特定量，則第二扣合凸部42之一面L1與構 成第一扣合凸部31之第三扣合機構幻抵接。藉由該第三扣 。機構E3與第二扣合凸部42之抵接，而抑制沿著夾具4 i之 圓周方向之旋轉。 其後，藉由使圖8所示之固定機構45之鎖緊螺絲43沿著 軸心方向R向靶材21緊固，而第一扣合凸部31與第二扣合 凸部42密接，夾具41對靶材21不容易旋轉。 【圖式簡單說明】 圖1係本發明之一實施形態之濺鍍裝置之縱剖面圖。 圖2係顯示相同濺鍍裝置中含靶材之區域之要部放大立 體圖》 圖3係顯示相同實施形態之靶材安裝機構之放大立體 圖。 圖4係顯示相同實施形態之靶材安裝機構之剖面圖。 圖5 A係階段性顯示相同實施形態之靶材之安裝步驟之說 明圖。 圖5B係階段性顯示相同實施形態之乾材之安裝步驟之說 明圖。 圖5C係階段性顯示相同實施形態之靶材之安裝步驟之說 明圖。 圖5D係階段性顯示相同實施形態之靶材之安裝步驟之說 明圖。 1571ll.doc 201211293 圖5E係階段性顯示相同實施形態之靶材之安裝步驟之說 明圖。 圖6A係顯示相同實施形態之第二扣合凸部之配置例之說 明圖。 圖6B係顯不相同實施形態之第二扣合凸部之配置例之說 明圖。 圖6C係顯示相同實施形態之第二扣合凸部之配置例之說 明圖。 圖7係顯示本發明之靶材安裝機構之其他實施形態之放 大立體圖。 圖8係顯示本發明之靶材安裝機構之其他實施形態之剖 面圖。 圖9A係階段性顯示其他實施形態之靶材之安裝步驟之說 明圖β 圖9Β係階段性顯示其他實施形態之靶材之安裝步驟之說 明圖。 圖9C係階段性顯示其他實施形.態之靶材之安裝步驟之說 明圖。 【主要元件符號說明】 10 濺鍍裝置 12 陽極 13 陰極 21 靶材 22 基體 157111.doc •20· 201211293 22a 周面 23 靶材 61 第一扣合凸部 61a 導入部 61b 傾斜部 61c 扣止部 71 夾具 71a 内周面 71b 槽 72 第二扣合凸部 73 鎖緊螺絲 D 内周方向 Q 圓周方向 R 轴心方向 SI 中央區域 S2 連結區域 157111.doc ·21·As shown in FIG. 9A, the first engaging convex portion 31 is formed, for example, in a plane view of substantially L 157111.doc -16 - 201211293 font. The first fastening convex portion 31 has a first fastening mechanism E1 extending along the axial direction R of the target 21, a second fastening mechanism E2 extending along the circumferential direction q of the target 21, and The third fastening mechanism E3 is disposed in the circumferential direction q of the material 21 in a substantially right-angle direction. A jig 41 is rotatably attached to the joint portion S3 which is one end of the cathode 13. The jig 41 is formed in a substantially cylindrical shape in which the connection portion S3 of the cathode 13 and the connection region S2 of the dry material 21 are hollow. In other words, the inner diameter of the hollow portion of the target 21 is the same as or larger than the diameter of the connection portion S3 of the cathode 13 or the connection region S2 of the dry material 21, and when the target 21 is attached, the connection portion 83 or the connection region is covered. The shape of S2. The second engaging convex portion 42 is formed along the inner circumferential direction d on the inner circumferential surface 41a of the jig 41. The first engaging convex portion 42 is a projection that protrudes in the center direction from the inner circumferential surface 41a, and is disposed at six positions in the inner circumferential direction D, for example. The second fastening convex portion 42 may be formed integrally with the jig 41. As shown in Fig. 9A, the second engaging convex portion 42 is formed, for example, in a substantially rectangular shape in plan view. The second engaging convex portion 42 may be formed so that the width W in the inner circumferential direction and the first engaging convex portions 3 adjacent to each other are equal to or smaller than each other. According to this configuration, the first engaging convex portion 3A and the second engaging convex portion 42 can be disposed to be engaged with each other when the dry material 21 is attached. A fixing mechanism 45 including a locking screw 43 and a screw hole 44 is formed on one end side of the jig 41. When the clamp 41 is engaged with the target 21, the fixing mechanism 45 can fasten the locking screw 43 to the target 21 along the axial direction R, so that the first engaging projection 31 and the second buckle can be obtained. The convex portion 42 is in close contact with each other. 157111.doc -17-201211293 A spacer 46 is further provided in a gap τ formed between a portion extending perpendicularly to the axial direction of the connecting portion S3 of the cathode 13 and the inner surface of the jig 41. The cymbal piece 46 is provided with a disk-shaped member penetrating through the hole of the cathode 13 at the center, and for example, it may be formed of stainless steel. Such a gasket 46 prevents the front end of the lock screw 43 constituting the fixing mechanism 45 from being directly abutted against the joint portion S3 of the cathode 13 and being damaged. A gasket 47 is formed at an end of the joint portion S3 of the cathode 13. The gasket 47 is formed, for example, by a member or the like, to keep the hollow interior of the substrate 22 airtight by abutting against the end portion of the substrate 22 of the target 21. The action of the target mounting mechanism of the present embodiment having such a configuration will be described. With the target mounting mechanism of the present embodiment, when the cathode 13 of the sputtering apparatus 1 is rounded, the material 21 is as shown in Fig. 9A. The jig 41 formed on the connection portion S3 of the cathode 13 is brought close to the connection region S2 where the substrate 22 of the target 21 is exposed. Then, each of the second fastening projections 42 formed on the cookware 41 is aligned with each other by the first fastening projections 31 formed on the base material 22, and then the base material 22 is inserted into the inner surface of the clamp 41. The connection area S2. At the time of insertion, the first engaging mechanism £1 constituting the first engaging convex portion 31 and one surface L1 of the second engaging convex portion 42 slide along the axial direction r, and the joint region S2 of the base material 22 is inserted into the jig. The interior of 41. As shown in FIG. 9B, the jig 41 is rotated only in the circumferential direction of the target 21, and one of the second engaging projections 42 is inserted into the position where the first engaging mechanism is not overlapped in the circumferential direction Q. Next, as shown in the figure, the jig 41 is rotated in the circumferential direction Q of the dry material 2 . At the time of the rotation, the first engaging portion 157111.doc • 18 · 201211293 The first engaging mechanism E2 of the tenon 31 and the other surface l2 of the second engaging convex portion 42 slide along the circumferential direction q, and the side of the 41 is lost. Rotate. When the jig 41 is rotated by a certain amount, the one surface L1 of the second engaging convex portion 42 is abutted against the third engaging mechanism constituting the first engaging convex portion 31. With the third buckle. The mechanism E3 abuts against the second engaging convex portion 42, and suppresses the rotation in the circumferential direction of the jig 4i. Thereafter, the locking screw 43 of the fixing mechanism 45 shown in FIG. 8 is fastened to the target 21 along the axial direction R, and the first engaging convex portion 31 and the second engaging convex portion 42 are in close contact with each other. The jig 41 does not easily rotate the target 21. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a longitudinal sectional view showing a sputtering apparatus according to an embodiment of the present invention. Fig. 2 is an enlarged perspective view showing an essential part of a region containing a target in the same sputtering apparatus. Fig. 3 is an enlarged perspective view showing the target mounting mechanism of the same embodiment. Fig. 4 is a cross-sectional view showing the target mounting mechanism of the same embodiment. Fig. 5A is an explanatory view showing the steps of mounting the target of the same embodiment in stages. Fig. 5B is an explanatory view showing the steps of mounting the dry materials of the same embodiment in stages. Fig. 5C is an explanatory view showing the steps of mounting the target of the same embodiment in stages. Fig. 5D is an explanatory view showing the steps of mounting the target of the same embodiment in stages. 1571 ll.doc 201211293 Fig. 5E is an explanatory view showing the steps of mounting the target of the same embodiment in stages. Fig. 6A is an explanatory view showing an arrangement example of the second engaging convex portion of the same embodiment. Fig. 6B is an explanatory view showing an arrangement example of the second engaging convex portions of the different embodiments. Fig. 6C is an explanatory view showing an arrangement example of the second engaging convex portion of the same embodiment. Fig. 7 is an enlarged perspective view showing another embodiment of the target mounting mechanism of the present invention. Fig. 8 is a cross-sectional view showing another embodiment of the target mounting mechanism of the present invention. Fig. 9A is a view showing a step of mounting the target of the other embodiment in a stepwise manner. Fig. 9 is a view showing a step of mounting the target of the other embodiment in stages. Fig. 9C is an explanatory view showing the steps of mounting the targets of other embodiments in a staged manner. [Main component symbol description] 10 Sputtering device 12 Anode 13 Cathode 21 Target 22 Base 157111.doc • 20· 201211293 22a Peripheral surface 23 Target 61 First fastening convex portion 61a Introduction portion 61b Inclined portion 61c Buttoning portion 71 Clamp 71a Inner peripheral surface 71b Groove 72 Second snap projection 73 Locking screw D Inner circumferential direction Q Circumference direction R Axis direction SI Central region S2 Joint region 157111.doc · 21·