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TW201203857A - Spike voltage reducing circuit for power transistor and power semiconductor chip with the same - Google Patents

Spike voltage reducing circuit for power transistor and power semiconductor chip with the same Download PDF

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Publication number
TW201203857A
TW201203857A TW99122894A TW99122894A TW201203857A TW 201203857 A TW201203857 A TW 201203857A TW 99122894 A TW99122894 A TW 99122894A TW 99122894 A TW99122894 A TW 99122894A TW 201203857 A TW201203857 A TW 201203857A
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Taiwan
Prior art keywords
voltage
gate
current path
zener diode
terminal
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TW99122894A
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Chinese (zh)
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TWI445305B (en
Inventor
Chung-Ming Leng
Yen-Yuan Chen
Kao-Way Tu
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Niko Semiconductor Co Ltd
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Abstract

A spike voltage reducing circuit formed in a gate contact structure of a power transistor chip is provided. The spike voltage reducing circuit has a first current route and a second current route located between an input end and a gate electrode of the transistor structure. A first resistor is located on the first current route, a second resistor is located on the second current route, and a zener diode is located on the first current route with a forward direction from the input end to the gate electrode. When the potential difference between the input end and the gate electrode reaches the breakdown voltage of the zener diode, the falling slope of the gate voltage signal is decided by the current on the first current route. When the potential difference between the input end and the gate electrode is smaller than the breakdown voltage of the zener diode, the falling slope of the gate voltage signal is decided by the current on the second current route.

Description

201203857 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種突波電壓消除電路,尤其是一 率電晶體之突波電壓消除電路。 、n 【先前技術】 功率電晶體(P〇舊MOSFET)常應用於交直流(AC_ 源轉換器+。過__速率絲會遇到突波(spike)過高所產 生的電磁干擾(EMI)問題。若要降低突波電壓,如第i圖所示, 常用方式是在功率電晶體QG之閘極端G與驅動電路1〇〇之 間,加入一電阻R0用來減緩電晶體Q〇的開關速度,但是 需付出的代價為電晶體QG切鱗的功率雜。尤其對高壓功 率電晶體*言,切換損失(switehing bss)對能量仙效率的影 響非常嚴重。但是’過高的突波賴也會對元件照成傷害。因 此,如何降低突波電壓,但保持一定的能量轉換效率,對高壓 功率電晶體而言非常重要。 其次’現今市面上有很多緩振(snubber)電路設計,可以降 低暫態切換所產生的突波電壓。但是,這些緩振電路需要外加 的電,=電感與電阻元件,使得製作成本也跟著上升。 爰是’本發明提供一種突波電壓消除電路’可結合於功率 電Ba體,以降低突波電壓對於功率電晶體之不利影響。 【發明内容】 、本發明之主要目的係在於提供一種突波電壓消除電路,可 以有效降低突波電壓’同時避免功率電晶體之切換損失過度增 加。 、本發明之另一目的係在於提供一種突波電壓消除電路,可 以整合於功率電晶體晶片,以降低整體之製作成本。 201203857 除雷驗種突波電壓消除電路。此突波電壓消 笛ΐϊ,一t端、一第一電流路捏、一第二電流路徑、一 由铱且、一第二/電阻與一第一齊納二極體(Zener diode)。其 心二路彳ί係位於輸人端與—功率電晶體結構之一閘極 路徑祕位於輸人端與 IS,第:電流路徑上。第二電阻係位於第二電二 i一,第二電阻之電阻值大於第-電阻之電阻值。第-齊 端G體於t電流路徑上,且順向連接於輸入端與閘極 虽輸入端卿極端之壓差大於第一齊納二極體 上二閘之電壓下降速率係大致由第-電流路徑 疋’备輸人端與閘極端之壓差小於第-齊納二極 徑上:定閉極端之電壓下降速率係大致由第二電流路 齊納發波電壓消除電路具有一第二 端與閉極端之壓差小於第一齊納二極體之導 壓上升體=電壓的電壓和時’閘極端之電 盘叫!I迷秘A致由第—電流路徑上之電麟蚊,當輸入端 ϋ體於第—齊納二極體之導通電壓與第二齊納 種具有—突波電壓消除電路之 電I:極!= 、:第一電流路徑、-第二 中,笛L電 第二電阻與一第一齊納二極體。其 門笛路從係位於輸入端與功率電晶體結構之閘極端之 係位於輸人端與功率電晶赌構之閘極端 電^^ I係位於第—電流路徑上。第二電阻係位於第二 值第二電阻之電阻值大於第—電阻之電阻 值第-齊納二極體係位於第一電流路徑上,且順向電性連接 201203857 ==率=趙結構之閉極端之間。當輸入端與閉極端 定,當輸入端與m壓路徑上之電流所決 時,功率電晶體纟士槿夕胡枝A ;第齊、内—極體之崩潰電壓 流路徑上之電流&決定。^之電堡下降速率係大致由第二電 is?多導 =構=為第-電阻,閘極金屬接觸“ ^&曰曰 之第-多晶石夕結構係作為第二電阻。 夕曰曰石夕、,。構間 二齊=:====構具有-第 ° #輸人物_之駐小料—冑 H逮的電壓和時,間極端之 端與間極敵 Α於第::當輸入 致由第-電===定間極㈣ 端係閘極 塾,-第一導電型之第一多晶接觸 ;=構:第二電流路徑係由間極金屬接觸閘y 夕、、口構’直抵閘極多晶石夕結構。其中,第日、1第-多日日 多晶發結構之間形成第一齊納二極體,第三多:曰:“:⑦201203857 VI. Description of the Invention: [Technical Field] The present invention relates to a surge voltage canceling circuit, and more particularly to a surge voltage canceling circuit of a transistor. , n [Prior Art] Power transistors (P 〇 old MOSFET) are often used in AC and DC (AC_ source converter +. Over-__ rate wire will encounter electromagnetic interference (EMI) caused by excessive spike Problem. To reduce the surge voltage, as shown in Figure i, the usual way is to add a resistor R0 between the gate terminal G of the power transistor QG and the driver circuit 1〇〇 to slow the switching of the transistor Q〇. Speed, but the price to pay is the power of the QG dicing of the transistor. Especially for high-voltage power transistors, the switching loss (switehing bss) has a very serious effect on the efficiency of the energy fairy. But the 'too high spur It will damage the components. Therefore, how to reduce the surge voltage, but maintain a certain energy conversion efficiency, is very important for high-voltage power transistors. Secondly, there are many snubber circuit designs available on the market today, which can be reduced. The surge voltage generated by the transient switching. However, these slow-vibration circuits require additional power, = inductance and resistance components, so that the manufacturing cost also increases. The present invention provides a surge voltage cancellation circuit. The utility model relates to a power electric Ba body to reduce the adverse effect of the surge voltage on the power transistor. SUMMARY OF THE INVENTION The main object of the present invention is to provide a surge voltage eliminating circuit, which can effectively reduce the surge voltage while avoiding power. The switching loss of the transistor is excessively increased. Another object of the present invention is to provide a surge voltage eliminating circuit which can be integrated into a power transistor wafer to reduce the overall manufacturing cost. 201203857 De-detection surge voltage eliminating circuit The surge voltage is deflated, a t-terminal, a first current path pinch, a second current path, a second, a second resistor, and a first Zener diode. The second circuit is located at the input end and the power transistor structure. One of the gate paths is located at the input end and the IS, the first: the current path. The second resistance is located at the second electric two, one second, second The resistance value of the resistor is greater than the resistance value of the first resistor. The first-terminal G body is in the t current path, and the voltage difference between the input terminal and the gate is positively greater than the first Zener diode. Upper two The voltage drop rate is substantially equal to the voltage difference between the human terminal and the gate terminal of the first current path 疋'. The voltage drop rate of the fixed-close terminal is substantially the second current path. The wave voltage eliminating circuit has a voltage difference between the second end and the closed end that is smaller than the voltage of the first Zener diode and the voltage of the voltage rise and the voltage of the gate terminal is called "I am a secret." The electric current mosquito on the current path, when the input terminal is connected to the conduction voltage of the first Zener diode and the second Zener has the electric current of the surge voltage elimination circuit: pole!=,: the first current path - In the second, the second resistor of the flute L is electrically connected to a first Zener diode. The gate of the flute is located at the input end and the gate of the power transistor structure is located at the input end and the power is charged. The gate of the gate is located on the first current path. The second resistance is located at the second value. The resistance of the second resistor is greater than the resistance of the first resistor. The first Zener diode system is located on the first current path, and the forward electrical connection is 201203857 == rate = closed of the Zhao structure. Between extremes. When the input terminal and the closed terminal are fixed, when the input terminal and the current on the m-voltage path are determined, the power transistor is gentleman, the singer, the current, and the current in the breakdown voltage flow path of the inner and the inner body. Decide. ^ The electric castle drop rate is roughly determined by the second electric is? multiconductor = structure = the first resistance, the gate metal contacts "^ & 曰曰 第 - polycrystalline 夕 结构 structure as the second resistance.曰石夕,,. Interstructure 2 ====== Constructed with -°°# lose character _ _ _ _ _ _ _ H caught the voltage and time, the extreme end and the end of the enemy: : When the input is caused by the first electric === fixed pole (four) end gate 塾, - the first polymorphic contact of the first conductivity type; = structure: the second current path is connected by the interpolar metal contact y The mouth structure is 'straight to the gate polycrystalline rock eve structure. Among them, the first Zener diode is formed between the first day and the first-day multi-day polycrystalline structure, the third most: 曰: ":7

如圖中所示,第一齊納二極體ZD1係順向連接於輸入端 與閘極端G之間,第二齊納二極體ZD2係反向連接於輸入 端2與閘極端G之間。在方波驅動信號VIN上升之過程,同 時請參照第4圖所示,當方波驅動信號VIN細極電壓信號 VGS之壓差(VIN-VGS)小於第一齊納二極體Zm之導通電壓 ,,二齊納二極體ZD2之崩潰電壓的電壓和vi,第一電流路 徑尚未導通。此時,閘極電壓信號VGS的上升速率主要是取 ^於第二電流路徑上之電流大小,也就是由第二電阻R2所決 定。由於第二電阻R2之電阻值較大,因此’閘極電壓信號VG^ 201203857 ^:電_合於轉半導體 附圖式得精神可以藉由以下的發明詳述及所 【實施方式】 路干i®3 itt發明之突魏_除電路—較佳實施例之電 端IN 一第一圖電中 =’、此突/電壓消除電路2〇〇具有一輸入 弟電阻JU、一第二電阻犯、一第一齊納二極體 接與一第二齊納二極體ZD2。輸入端m係連 波._^電ΪΓ0,例如一脈波調變控制電路,以接收-方 2動3。在輸入端m與功率電晶體結構Q1之閘極端G 哲b 有一第一電流路徑與一第二電流路徑。第一電阻R1、 ,二背納二極體ZDi與第二齊納二極體ZE>2係位於第一電流 徑上。第二電阻R2係位於第二電流路徑上,並且,第二 阻把之電阻值大於第一電阻R1之電阻值。 201203857 會呈現緩步上升的狀態。 隨著方波驅動信號VIN之電壓上升,方波驅動 與閘極電壓信號VGS之壓差(VIN_VGS)也逐漸增大。g ti,當方波驅動信號_與閛極電壓信號VGs懕‘罢 °TiTGS)大於第一齊納二極體ZD1之導通電壓與第二齊納 ^ i崩潰電壓的電壓和v卜第—電流路徑開始導 通。由於第-電阻R1之電阻值明顯小於第二電阻幻: 值,此時,閘極電壓信號VGS的上升速率主要是取決 電流雜上之賴大小,捕是由帛—電阻R1所 因 閘極電壓信號VGS的上升速率會加快。並且 之電阻值越低,閘極電壓信號VGS之上升速率越快。 在時點t2,功率電晶體結構Q〗之閘極與源極間之電容 CGS完全充電’此時,電流開始對米勒電容(刪打哪此 充電。在此充電過程中,閘極電壓信號VGS會大致維持一定。 完成對於錄電容之充賴,_f壓錢VGS才會繼續上 升,直到閘極電壓信號VGS等於輸入端電壓VIN。 、請參照第2圖所示’由於方波驅動信號娜是以相當快 的速度由低電位切換至高電位,在這個過程中,不可避免會產 生感應電流,而導致切換損失。相較之下,請參照第4圖所示’ 本實施例調降閘極電壓信號VGS上升初期的速率。由於感應 電流的大小是正比於閘極電壓信號VGS之上升速度,因此了 本發明可以降低所產生的感應電流,有助於降低切換損失(能 量耗損等於電壓與電流之乘積)。 ' 接下來,在方波驅動信號VIN之下降段中,起初,方波 驅動彳5號VIN與閘極電壓信號VGS之壓差(vgS-VIN)小於第 一齊納一極體ZD1之導通電壓與第二齊納二極體之崩潰 ,壓的電壓和v2,第一電流路徑尚未導通。隨著方波驅動信 號VIN之電位下降’方波驅動信號vjjsj與閘極電壓信號vgs 之壓差(VGS-VIN)逐漸增大。當方波驅動信號νχΝ與閘極電壓 4吕號VGS之壓差(VGS-VIN)大於第一齊納二極體ZD1之導通 201203857 電壓與第二齊納二極體ZD2之崩潰電壓的電壓和v2,第一 流路徑開始導通。此時,閘極電壓信號VGS的下降速率主 取決於第一電流路徑上之電流大小,也就是由第一電阻ri 決定,因此’閘極電壓信號VGS會快速下降。 隨後,在時點t3,當方波驅動信號VIN與閘極電壓 VGS之壓差(VGS-VIN)小於第一齊納二極體ZD1之導通 與第二齊納二極體ZD2之崩潰電壓的電壓和v2的時候, 電流路徑停止導通。此時,閘極電壓信號VGS的上升 由第二電流路徑上之第二電阻R2所決定,因此,間極電 號VGS之下降速度會趨緩。 曰請參照第2圖所示,在電晶體元件之快速開關過程中,在 電晶體元件關斷的瞬間遇到突波(SJ)ike)電壓過高之 雖然降低電晶體元件之開關速度可以緩和突波電壓 ^問,’但部會導致切換損失之增加。她之下,請參昭 實細巾,電晶體元件大致上健:維持其開^速 ’ Μ ’可_免突波電壓Vsp過高的問題, 以防止切換損失過度增加。 之爆斤示’就方波驅動信號VIN朗極電壓信號VGS ίΐί 在間極電壓信狀上升段(缝gedge)中,以一上As shown in the figure, the first Zener diode ZD1 is connected in the forward direction between the input terminal and the gate terminal G, and the second Zener diode ZD2 is connected in the reverse direction between the input terminal 2 and the gate terminal G. . In the process of rising the square wave drive signal VIN, please also refer to FIG. 4, when the square wave drive signal VIN fine voltage signal VGS voltage difference (VIN-VGS) is smaller than the first Zener diode Zm turn-on voltage , the voltage of the breakdown voltage of the two Zener diode ZD2 and vi, the first current path has not been turned on. At this time, the rate of rise of the gate voltage signal VGS is mainly determined by the magnitude of the current on the second current path, that is, determined by the second resistor R2. Since the resistance value of the second resistor R2 is large, the spirit of the gate voltage signal VG^201203857^: electric_combined with the semiconductor drawing can be as follows through the following detailed description of the invention and the method ®3 itt invention of the invention - the circuit - the electric terminal IN of the preferred embodiment - a first figure of electricity = ', the sudden voltage / voltage cancellation circuit 2 〇〇 has an input resistor JU, a second resistance, A first Zener diode is connected to a second Zener diode ZD2. The input terminal m is connected to the wave. _ ^ ΪΓ 0, for example, a pulse modulation control circuit to receive - square 2 motion 3. At the input terminal m and the gate terminal G of the power transistor structure Q1, there is a first current path and a second current path. The first resistor R1, the second anti-nano diode ZDi and the second Zener diode ZE>2 are located on the first current path. The second resistor R2 is located on the second current path, and the resistance of the second resistor is greater than the resistance of the first resistor R1. 201203857 will show a slowly rising state. As the voltage of the square wave drive signal VIN rises, the voltage difference (VIN_VGS) between the square wave drive and the gate voltage signal VGS also gradually increases. g ti, when the square wave drive signal _ and the drain voltage signal VGs 懕 ' ° TiTGS) is greater than the turn-on voltage of the first Zener diode ZD1 and the voltage of the second Zener voltage and the V-first current The path begins to conduct. Since the resistance value of the first resistor R1 is significantly smaller than the second resistor magic value, at this time, the rising rate of the gate voltage signal VGS is mainly determined by the magnitude of the current miscellaneous, and the trapping voltage is due to the gate voltage of the resistor R1. The rate of rise of the signal VGS will increase. And the lower the resistance value, the faster the rising rate of the gate voltage signal VGS. At time t2, the capacitance CGS between the gate and the source of the power transistor structure Q is fully charged. At this time, the current starts to the Miller capacitance (which is charged. In this charging process, the gate voltage signal VGS Will be maintained at a certain level. Completion of the recording capacitors, _f pressure VGS will continue to rise until the gate voltage signal VGS is equal to the input voltage VIN. Please refer to Figure 2 because of the square wave drive signal Na Switching from a low potential to a high potential at a relatively fast speed, in this process, an induced current is inevitably generated, resulting in a switching loss. In contrast, please refer to FIG. 4 to reduce the gate voltage of this embodiment. The initial rate of the signal VGS rises. Since the magnitude of the induced current is proportional to the rising speed of the gate voltage signal VGS, the present invention can reduce the induced current generated and help reduce the switching loss (the energy consumption is equal to the voltage and current). Product). Next, in the falling section of the square wave drive signal VIN, at first, the square wave drive 彳5 VIN and the gate voltage signal VGS have a voltage difference (vgS-VIN) smaller than the first The on-voltage of the one-pole ZD1 and the collapse of the second Zener diode, the voltage of the voltage and the voltage of v2, the first current path has not been turned on. As the potential of the square wave drive signal VIN drops, the square wave drive signal vjjsj and the gate The voltage difference (VGS-VIN) of the voltage signal vgs gradually increases. When the square wave drive signal ν χΝ and the gate voltage 4 LV VGS voltage difference (VGS-VIN) is greater than the first Zener diode ZD1 conduction 201203857 voltage The first flow path starts to conduct with the voltage of the breakdown voltage of the second Zener diode ZD2 and v2. At this time, the falling rate of the gate voltage signal VGS mainly depends on the current on the first current path, that is, by the first A resistor ri determines, so the 'gate voltage signal VGS will drop rapidly. Then, at time t3, when the square wave drive signal VIN and the gate voltage VGS voltage difference (VGS-VIN) is smaller than the first Zener diode ZD1 When the voltage of the breakdown voltage of the second Zener diode ZD2 and the voltage of v2 are turned on, the current path stops conducting. At this time, the rise of the gate voltage signal VGS is determined by the second resistor R2 on the second current path. Therefore, the speed of the declination of the VGS will be Slow down. 参照Please refer to Figure 2, during the fast switching process of the transistor component, the surge (SJ) ike is encountered when the transistor component is turned off. The speed can alleviate the surge voltage, 'but the part will cause an increase in switching losses. Under her, please refer to the real thin towel, the transistor component is generally healthy: maintain its opening speed Μ ’ ‘ can not avoid the surge voltage Vsp too high, to prevent excessive switching losses. The explosion of the square wave indicates that the square wave drive signal VIN is the voltage signal VGS ίΐί in the inter-electrode voltage sigmoid rise (segment gap)

Vl為分界點’纽可區分為碰上升速率較慢 VGS :下降速率f=部份。同樣地,在閘極電壓信號 to致二下降段轉折電壓v2為分 較電壓下降速率較快的部份與電壓下降速率 第1^ = 雜Vl與V2可視實際需要,透過改變 ΐΙΐΛϊ1與第二齊納二極體ZD2之參數來調整。 電路波1 顧除電路另-較佳實施例之 例之突較於第3圖之突波電壓消除電路,本實施 雷^^電_除電路之第—電流路徑上僅且有-第-電阻!u與-第一齊納二極體ZD3。此第一 201203857 亦是,向連接於輸入端IN與功率電晶體結構之閘極端 =波㈣信號上升之過程,_請參照第6圖所示,由 :第-電阻R1之電阻值明顯小於第二電阻Μ ,糊言號vGS之上升逮率主要是取決 =;=第1阻R1所決定。因此 接下來,在方波驅動信號VIN之下降段中, i VGS ^^(VGS-VIN)^^ =納-極體ZD3之崩潰電壓v3 ’第—電流路彳t 隨者^波驅動信號VIN之電钉降,方波驅練號篇與 極電壓信號VGS之避差(VGS_VIN)逐漸增大。在方波驅^ 號:娜之壓差(娜,大於第一“ 一極體ZD3之朋潰電壓v3的時候,第-電 態。此時,閘極電壓信號VGS的下降速率主 電流路徑,大小,也就是由第一電阻R1所==7 閘極電龜號VGS會快速下降。隨後,麵點t4,當方 動信號VIN與閘極電壓信號VGS之壓差(VIN_VGs)下降至 納=體ZD3之崩潰電壓v3的時候,第一電流路徑 知止導通。此時,閘極電壓信號VGS的上升速率改由第二電 第二電阻μ所決定,因此,間極電壓信號“ 之下降速度會趨緩。 第7a與7b圖係第5圖之突波電壓消除電路整合於功率半 ,體晶片一較佳實施例之俯視圖與剖面圖。其中,第、7b圖所 =之剖面圖係對應於第7a圖中之A-A,剖面。圖中顯示功率 半,體晶片之一閘極接觸結構。此閘極接觸結構係連接至功率 電晶體結構之閘極端。圖中之閘極接觸結構之上方與左右兩側 均可延伸連接功率電晶體結構之閘極多晶石夕結構,^通入閘極 電壓信號信號。 & 此閘極接觸結構具有一第一導電型之第一多晶矽結構423 與一第二導電型之第二多晶矽結構425形成於一基材上。 201203857 ^本實施例中,第-導電型即為?型,第 425 2 f ί, i;sn; ,ϊ,-/ 435 ^同樣是第二導電型之間極多晶石夕結構42l。此外,^^ Φ 夕晶矽結構421上覆蓋有一閘極金屬層440,以降低閘極雷 440 於第Πίίϊ第5圖所示’前述閉極金屬接觸墊445即對應 圖中之m,間極多晶石夕結構421即對應於第5 由:構 :ίί二構第4S電Γ徑係由閉極金屬接觸要445,經心 曰石々II接二構425 ’直抵閘極多晶石夕結構42卜其中,第-多 ^多曰日雜構421社第二多晶雜構425係作為第二^ 導體=::第例= 電晶體、Ϊ構之&=接極接觸結構係連接至功率 201203857 屬接7棚’本實關在連接至閘極金 ί 構523與第二多晶雜構525之Vl is the demarcation point' 纽 can be distinguished as the collision rate is slower VGS: the rate of decline f = part. Similarly, in the gate voltage signal to the second falling section, the transition voltage v2 is divided into a faster part of the voltage drop rate and the voltage drop rate is 1^ = the same as Vl and V2 can be seen as actual needs, by changing ΐΙΐΛϊ1 and second The parameters of the nanodiode ZD2 are adjusted. The circuit wave 1 takes the circuit and the example of the preferred embodiment is better than the surge voltage eliminating circuit of FIG. 3, and the first current path of the circuit is only the first-resistor ! u and - first Zener diode ZD3. This first 201203857 is also a process of rising to the gate terminal = wave (four) signal connected to the input terminal IN and the power transistor structure, _ please refer to Fig. 6, by: the resistance value of the first resistor R1 is significantly smaller than the first The second resistance Μ, the increase rate of the vGS vGS is mainly determined by =; = the first resistance R1 is determined. Therefore, in the falling section of the square wave drive signal VIN, i VGS ^^(VGS-VIN)^^ = the breakdown voltage of the nano-polar body ZD3 v3 'the current path 彳t with the wave drive signal VIN The electric nail drop, the square wave drive number and the extreme voltage signal VGS avoidance (VGS_VIN) gradually increase. In the square wave drive ^: Na's pressure difference (Na, greater than the first "one pole body ZD3's plunging voltage v3, the first - state. At this time, the gate voltage signal VGS drop rate main current path, The size, that is, by the first resistor R1 == 7, the gate electric turtle VGS will drop rapidly. Then, at the point t4, when the voltage difference between the square signal VIN and the gate voltage signal VGS (VIN_VGs) drops to nano=body When the breakdown voltage of the ZD3 is v3, the first current path is known to be turned on. At this time, the rising rate of the gate voltage signal VGS is determined by the second electrical second resistor μ, and therefore, the falling speed of the inter-electrode voltage signal will be 7a and 7b are diagrams of the surge voltage cancellation circuit of Fig. 5 integrated in a power half, a top view and a cross-sectional view of a preferred embodiment of the body wafer. wherein the sectional view of Fig. 7b corresponds to AA in Fig. 7a, the cross section shows a power contact half gate contact structure of the bulk wafer. This gate contact structure is connected to the gate terminal of the power transistor structure. Above the gate contact structure in the figure There are many gates on the left and right sides that can be connected to the power transistor structure. The spar structure, the gate voltage signal is input to the gate voltage. The gate contact structure has a first conductivity type first polysilicon structure 423 and a second conductivity type second polysilicon structure 425. On a substrate. 201203857 ^ In this embodiment, the first conductivity type is a type, the second type is 425 2 f ί, i;sn; , ϊ, -/ 435 ^ is also a very polycrystalline between the second conductivity type The stone structure 42l. In addition, the ^^ Φ 矽 矽 structure 421 is covered with a gate metal layer 440 to reduce the gate 440, which is shown in Fig. 5, the aforementioned closed-cell metal contact pad 445 is corresponding to the figure. m, the interpolar polylithic structure 421 corresponds to the fifth: structure: ίί two structure 4S electric Γ diameter system by the closed metal contact 445, the core 曰 々 II 二 二 425 直 直Very polycrystalline stone structure 42. Among them, the first-multi-multi-day 杂 461 423 second polycrystalline heterostructure 425 is used as the second ^ conductor =:: the first case = transistor, Ϊ 之 & = The pole contact structure is connected to the power 201203857. It is connected to the 7 shed 'this solid is connected to the gate gold 523 and the second polycrystalline 525

”矽結構527則是第二導電型:導J 第二插塞535連接第二多 =ΪΪ,一導電型之間極多晶雜 Ϊί=Ϊ構521上覆蓋有一閘極金屬層·。The 矽 structure 527 is of the second conductivity type: the second J plug 535 is connected to the second multi-turn ΪΪ, and the poly-polar 之间 Ϊ Ϊ Ϊ 521 521 521 is covered with a gate metal layer.

於第第3圖所示,前述閘極金屬接觸墊545即對應 入ί T間極多晶卿521即對應二3 rf構 第三多晶石夕結構527、第二多晶石夕結 構525 ’直抵閘極多晶矽結構521^ =45’;由第二 _第52= ^ 石夕結構523與第三多晶石夕結構527之As shown in FIG. 3, the gate metal contact pad 545 corresponds to the inter-electrode 521, which corresponds to the second 3 rf structure, the third polycrystalline structure 527, and the second polycrystalline structure 525 ' Directly to the gate polycrystalline germanium structure 521^=45'; from the second_52th = ^ Shixi structure 523 and the third polycrystalline stone structure 527

^第^日ZD1軸連接於輸人端取朗極端G 1 第二㈣找構525之間形成第 一=_ ZD2反向連接於輸人端m與閘極端G之間^第日日ZD1 axis is connected to the input end to take the extreme G 1 and the second (four) to find the first between the formation 525 = _ ZD2 is connected in reverse between the input end m and the gate end G

與閘極多晶石夕結構521社第二多晶石夕結構 ^隨,祕金屬觸墊545與_多晶石夕 、”。 3之第一多晶石夕結構525係作為第二電阻R2。 綠ίΓ騎提供之突波電壓消除電路,不僅有助於增加效率 電壓,同時也容易整合於神半導體晶片+之閘極 接觸、,,°構中,以簡化外部驅動電路,降低外部驅動電路的成本。 惟以上所述者,僅為本發明之較佳實施例而已, 此限定本發背狀細,即纽依本發”請專·圍 明,明?容所作之簡單的等效變化與修飾,皆仍屬本發 涵盍之範圍内。另外本發明的任一實施例或申請專利範圍不須 12 201203857 【圖式簡單說明】 =1圖顯示_—典型功率電日日日體驅動電路。 ίΐΝ、1圖之突波輕消除電路中,方波驅動作號 =圖_物讓VGS、驗極龍彻無㈣With the gate polycrystalline eve structure 521, the second polycrystalline stone 结构 structure ^, the secret metal touch pad 545 and _ polycrystalline stone, ". 3 of the first polycrystalline stone structure 525 system as the second resistance R2 The surge voltage elimination circuit provided by Green Γ 不仅 not only helps to increase the efficiency voltage, but also is easy to integrate into the gate contact of God Semiconductor wafer +, to simplify the external drive circuit and reduce the external drive circuit. However, the above is only a preferred embodiment of the present invention, and this is limited to the shape of the hair, which is the simple equivalent change made by the New Zealand. And the modifications are still within the scope of this issue. In addition, any embodiment or patent application scope of the present invention does not need to be 12 201203857 [Simple description of the figure] =1 Figure shows the typical power electric day and day body drive circuit. ΐΝ ΐΝ, 1 之 突 轻 轻 轻 轻 轻 轻 突 轻 轻 轻 突 轻 突 突 突 突 突 突 突 突 突 突 突 突 突 突 突 突 突 突

Ϊ圖3。圖躲㈣之贼賴翁電路-錄實_之電路示 第4圖顯示第3圖之突波電壓 =閘極_號VGS、雜極錢彻與錄電Hi 第5圖係本發明之突波電壓消 /+ ^ ^ 示意圖。 電料-較佳實施例之電路 =與7b圖 5圖之突波電壓消除電路整合於 曰曰片一較佳實施例之俯視圖與剖面圖。 手千導體 與8b圖係第3圖之突波電壓消除電路整合於 曰曰片一較佳實施例之俯視圖與剖面圖。 導體 【主要元件符號說明】 驅動電路100 功率電晶體Q0 電阻R0Figure 3. Figure hiding (four) thief Lai Wen circuit - recording _ circuit shown in Figure 4 shows the surge voltage of Figure 3 = gate _ number VGS, hybrid 彻 彻 彻 and recording Hi Hi 5th is the surge of the present invention Voltage cancellation / + ^ ^ Schematic. Electrical Material - Circuit of the Preferred Embodiment = and the surge voltage canceling circuit of Figure 7 is integrated into a top view and a cross-sectional view of a preferred embodiment of the cymbal. The hand-wave conductor and the surge voltage canceling circuit of Fig. 3 of Fig. 8 are integrated into a top view and a cross-sectional view of a preferred embodiment of the die. Conductor [Key component symbol description] Drive circuit 100 Power transistor Q0 Resistance R0

突波電壓消除電路200 輸入端IN 13 201203857 第一電阻R1 第二電阻R2Surge voltage cancellation circuit 200 input terminal IN 13 201203857 first resistor R1 second resistor R2

第一齊納二極體ZD 1,ZD3 第二齊納二極體ZD2 閘極端G 方波驅動信號VIN 閘極電壓信號VGS 功率電晶體結構Q1 基材 410,510 閘極多晶矽結構421,521 第一多晶矽結構423,523 第二多晶矽結構425,525 第三多晶矽結構527 層間介電層430,530 第一插塞433,533 第二插塞435,535 閘極金屬接觸墊445,545 閘極金屬層440,540First Zener diode ZD 1, ZD3 Second Zener diode ZD2 Gate terminal G Square wave drive signal VIN Gate voltage signal VGS Power transistor structure Q1 Substrate 410, 510 Gate polysilicon structure 421, 521 First polysilicon Structure 423, 523 second polysilicon structure 425, 525 third polysilicon structure 527 interlayer dielectric layer 430, 530 first plug 433, 533 second plug 435, 535 gate metal contact pad 445, 545 gate metal layer 440, 540

Claims (1)

201203857 七、申請專利範圍·· 1· 一種具有一突波電壓消除電路之功率半導體晶片,包括·· 一功率電晶體結構,具有一閘極端;以及 一閘極接觸(gate contact)結構,包括: 一輸入端; 一第一電流路徑,位於該輸入端與該閘極端之間; 一第二電流路徑,位於該輸入端與該閘極端之間; 一第一電阻,位於該第一電流路徑上;以及 一第二電阻,位於該第二電流路徑上,該第二電阻之電阻 值大於該第一電阻之電阻值;以及201203857 VII. Patent Application Range··1· A power semiconductor wafer having a surge voltage cancellation circuit, comprising: a power transistor structure having a gate terminal; and a gate contact structure, comprising: An input terminal; a first current path between the input terminal and the gate terminal; a second current path between the input terminal and the gate terminal; a first resistor located on the first current path And a second resistor located on the second current path, the resistance of the second resistor being greater than the resistance of the first resistor; 一第一齊納一極體,位於該第一電流路徑上,且順向連接 於該輸入端與該閘極端之間; f中,當該輸入端與該閘極端之壓差大於該第一齊納二極體之 巧潰電壓時,該閘極端之電壓下降速率係大致由該第一電流路 ,上之電流所決定,當該輸入端與該閘極端之壓差小於該 背納二極體之崩潰電壓時,該閘極端之電壓下降速率係大 該第二電流路徑上之電流所決定。 1項之—種具有_突波電壓消除電路之 ^羊+^?·體晶片’更包括_第二齊納二極體,位於 ======電 Ϊ:輪= =二極趙之崩潰電壓的電壓和時,該閘極端 由該所=極端之電壓上升迷率係大致 :力率ΐ申導1二-種具有一突波電壓消除電路之 該_端係位於一^:=:=於 15 201203857 相鄰之一第一導電型 多晶石夕結構上方,該第 = 夕結構與-第二導電型之第二 與該第二多晶雜構之間,該係位於該第—多晶石夕結構 極多晶魏構,_極 ^ 晶魏獅延伸連接該開 電性連接該第—鶴透過至少—第―插塞_g) 該第二多晶德構,該第°^透過至少—第二插塞電性連接 之該第二多晶雜構 顯糊極多晶梦結構間 多晶石夕結構間之該第二多砂h電阻’該第二插塞與該閘極 4·如申請專利範圍第為該第二電阻。 該第一多晶發結 晶矽層,並且,該第二 功率半_晶片,其令 f具有一突波電麼消除電路之 構與該閑極多晶二多2結構、 功率半導體晶片,其中二上有-突波電壓消除電路之 金屬層,該間極金屬層搞=結構上方覆蓋有-間極 層。 極金屬接觸墊係位於同-個金屬 6·如申請專利範園第2項之一錄百士 功率半導體晶片,其中,^,具有一突波電_除電路之 該間極端係位於—閘極多===係位於—間極金屬接觸塾, 多晶石夕結構與一第一冗型:;日,,:一第二導電型之第三 該第二齊納二極體t 第三多晶雜構之間, 構之間,該第二多晶石夕結構係^ 二多晶矽結 第 多晶矽結 :構係該作第;與;;=結構間冗 該第二多晶德顧作顧極多晶魏構間之 7.如申請專利範圍第6項之一種具有一突波電壓消除電路之 間極金屬接難係透過至少晶魏構,該 多晶透過至少-第二插塞接該第一 201203857 功率半導體晶片,其中,該第一 構、該第三多晶石夕結構與該閉極多該第二多晶石夕結 石夕層,並且,該第三多晶頻構係環繞同—個多晶 第二多晶矽結構係環繞該第三^二 多B曰矽結構,該 8.如申請專利細第6項:_=^匕 功率半導體晶片,其中,該間搞玄;^犬波電壓消除電路之 :屬層,該閘極金屬層與該閘極金茲a first Zener diode is located on the first current path and is connected in the forward direction between the input terminal and the gate terminal; in f, when the voltage difference between the input terminal and the gate terminal is greater than the first When the voltage of the Zener diode collapses, the voltage drop rate of the gate terminal is substantially determined by the current of the first current path, and the voltage difference between the input terminal and the gate terminal is less than the back-off diode When the body collapses voltage, the voltage drop rate of the gate terminal is determined by the current on the second current path. 1 item - a kind of _ surge voltage elimination circuit ^ sheep + ^ · body wafer 'more includes _ second Zener diode, located ====== electric Ϊ: wheel = = two pole Zhao Zhi When the voltage of the breakdown voltage is at the same time, the threshold of the voltage of the gate is increased by the voltage of the voltage terminal. The force rate is estimated to be approximately the same as the voltage of the voltage. The _ terminal system having a surge voltage cancellation circuit is located at a ^:=: </ RTI> at 15 201203857 adjacent to one of the first conductivity type polycrystalline ridge structures, between the first eve structure and the second of the second conductivity type and the second polymorphic structure, the system is located at the first The polycrystalline stone structure is extremely polycrystalline, and the _ pole ^ crystal Wei lion extends to connect the electrically connected connection to the first - the crane passes at least - the first - plug _g) the second polymorphic structure, the first ° ^ The second polysilicon h-resist between the second polycrystalline heterostructure and the gate via the at least-second plug electrically connected to the polysilicon structure 4. If the scope of the patent application is the second resistance. The first polycrystalline crystal 矽 layer, and the second power half _ wafer, which f has a glitch power eliminating circuit structure and the idle pole poly 2 structure, power semiconductor wafer, wherein two There is a metal layer of the surge voltage eliminating circuit, and the inter-metal layer is covered with an interlayer layer. The polar metal contact pad is located in the same metal 6 · as one of the patents in the second section of the patent application, the recording of the power semiconductor chip, wherein, ^, has a surge electric_divide circuit, the extreme system is located at the gate More === is located in the inter-polar metal contact 塾, the polycrystalline stone 结构 structure and a first redundancy type: day,,: a second conductivity type third, the second Zener diode t third Between the crystals, between the structures, the second polycrystalline 夕 系 ^ 二 二 二 二 二 : : : : : : : : : : : : : : : : : : : : : : : : : : : 构 构 构 构 构 构 构 构 构 构7. According to the sixth aspect of the patent application, in the sixth aspect of the invention, there is a surge voltage eliminating circuit in which a polar metal connection is transmitted through at least a crystal structure, and the poly crystal is transmitted through at least a second plug. A 201203857 power semiconductor wafer, wherein the first structure, the third polycrystalline stone structure and the closed-pole more than the second polycrystalline stone layer, and the third polycrystalline frequency structure surrounds the same - a polycrystalline second polycrystalline germanium structure surrounds the third ^2 multi-B structure, as in the sixth application of the patent: _=^匕Of the semiconductor wafer, wherein the inter-engaging Xuan; ^ dogs wave voltage canceling circuits: a metal layer, the gate metal layer and the gate Ginzburg :力率如4r二圍心 1〇·如申請專利範圍第1項之一種f有,突構。 功率半導體晶片,其中,該功率雷⑽ f電除電路之 晶體(MOSFET)結構。 BS、、、°難—金氧半場效電 11. 一種突波電壓消除電路,包括: 一輸入端; 電流路徑,位於該輸人端與—功率電晶體結構之一開極 一第二電流路控,位於該輸入端與該閘極端之間; 一第一電阻,位於該第一電流路經上; 第一電阻’位於料二電流路徑上,該第二電阻之電阻值大 於該第一電阻之電阻值; 一第一齊納二極體,位於該第一電流路徑上,且順向連接於該 輸入端與該閘極端之間;以及 其中,^該輸入端與該閘極端之壓差大於該第一齊納二極體之 ,潰電壓時,該閘極端之電壓下降速率係大致由該第一電流路 徑上之電流所決定,當該輸入端與該閘極端之壓差小於該第一 齊納二極體之崩潰電壓時,該閘極端之電壓下降速率係大致由 該第二電流路徑上之電流所決定。 12·如申請專利範圍第η項之突波電壓消除電路,更包括一第 二齊納二極體’位於該第一電流路徑上,且反向連接於該輸入 17 201203857 端與該閘極端之間,當該輸入端與該閘極端之愿差小於該第一 齊納二極體之導通電壓與該第二齊納二極體之崩潰電壓的電壓 和時,該閘極端之電壓上升速率係大致由該第二電流路徑上之 電流所決定,當該輸入端與該閘極端之壓差大於該第一齊納二 極體之導通雜無第二齊納二極體之黯傾的電壓和時, g極端之電壓上升速率係大致由該第-電流路徑上之電流所 13 ㈣ί申請專利範圍第11項之突波電壓消除電路,其中,今Φ =電壓消除電路係整合於—功率半導體晶片之一閘極^觸^: Force rate such as 4r two circumferences 1〇 · As in the scope of patent application, the first item f has a structure. A power semiconductor wafer in which the power ray (10) f is a circuit (MOSFET) structure of an electric circuit. BS,,, ° ° difficult - gold oxygen half-field power 11. A surge voltage elimination circuit, comprising: an input; a current path, located at the input end and - power transistor structure open one second current path Control, located between the input terminal and the gate terminal; a first resistor located on the first current path; the first resistor 'is located on the current path of the material, the resistance of the second resistor is greater than the first resistor a resistance value; a first Zener diode located on the first current path and connected in the forward direction between the input terminal and the gate terminal; and wherein the voltage difference between the input terminal and the gate terminal When the voltage is collapsed, the voltage drop rate of the gate terminal is substantially determined by the current on the first current path, and when the voltage difference between the input terminal and the gate terminal is less than the first When the breakdown voltage of a Zener diode is reached, the voltage drop rate of the gate terminal is substantially determined by the current on the second current path. 12. The surge voltage canceling circuit of claim n, further comprising a second Zener diode 'located on the first current path and connected in reverse to the input 17 201203857 terminal and the gate terminal When the ratio of the input terminal to the gate terminal is less than the voltage of the first Zener diode and the breakdown voltage of the second Zener diode, the voltage rise rate of the gate terminal is Generally, the current difference between the input terminal and the gate terminal is greater than the voltage of the first Zener diode and the second Zener diode. The voltage rise rate of the g-extreme is substantially caused by the current on the first current path. The surge voltage cancellation circuit of claim 11 is applied to the power semiconductor chip. One of the gates ^ touch ^
TW99122894A 2010-07-12 2010-07-12 Spike voltage reducing circuit for power transistor and power semiconductor chip with the same TWI445305B (en)

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