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TW201202844A - Radiation sensitive resin composition, cured film, method for forming cured film, and display element - Google Patents

Radiation sensitive resin composition, cured film, method for forming cured film, and display element Download PDF

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Publication number
TW201202844A
TW201202844A TW100119335A TW100119335A TW201202844A TW 201202844 A TW201202844 A TW 201202844A TW 100119335 A TW100119335 A TW 100119335A TW 100119335 A TW100119335 A TW 100119335A TW 201202844 A TW201202844 A TW 201202844A
Authority
TW
Taiwan
Prior art keywords
group
compound
film
mass
radiation
Prior art date
Application number
TW100119335A
Other languages
English (en)
Chinese (zh)
Inventor
Eiji Yoneda
Nobuhiro Nishi
Seiichirou Kodama
Katsumi Inomata
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW201202844A publication Critical patent/TW201202844A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • H10P76/204—
    • H10P76/2041—

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
TW100119335A 2010-06-03 2011-06-02 Radiation sensitive resin composition, cured film, method for forming cured film, and display element TW201202844A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010127939A JP5471851B2 (ja) 2010-06-03 2010-06-03 感放射線性樹脂組成物、硬化膜、硬化膜の形成方法、及び表示素子

Publications (1)

Publication Number Publication Date
TW201202844A true TW201202844A (en) 2012-01-16

Family

ID=45052272

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100119335A TW201202844A (en) 2010-06-03 2011-06-02 Radiation sensitive resin composition, cured film, method for forming cured film, and display element

Country Status (4)

Country Link
JP (1) JP5471851B2 (ja)
KR (1) KR101853729B1 (ja)
CN (1) CN102269932B (ja)
TW (1) TW201202844A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201214033A (en) * 2010-06-17 2012-04-01 Sumitomo Chemical Co Photosensitive resin composition
JP6022847B2 (ja) * 2012-03-28 2016-11-09 東京応化工業株式会社 絶縁膜形成用感光性樹脂組成物、絶縁膜、及び絶縁膜の形成方法
CN103365087B (zh) * 2012-03-28 2019-03-08 东京应化工业株式会社 绝缘膜形成用感光性树脂组合物、绝缘膜、以及绝缘膜的形成方法
JP6350335B2 (ja) * 2014-02-27 2018-07-04 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6327173B2 (ja) * 2014-02-27 2018-05-23 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
TWI731895B (zh) 2015-12-08 2021-07-01 日商富士軟片股份有限公司 感放射線性樹脂組成物、硬化膜、圖案形成方法、固體攝影元件及影像顯示裝置
JP7560954B2 (ja) * 2020-04-10 2024-10-03 東京応化工業株式会社 感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005024659A (ja) * 2003-06-30 2005-01-27 Taiyo Ink Mfg Ltd 硬化性組成物
JP2007023254A (ja) * 2005-06-14 2007-02-01 Fujifilm Corp 硬化促進剤、熱硬化性樹脂組成物、感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
JP2007079114A (ja) * 2005-09-14 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
JP2007106886A (ja) * 2005-10-13 2007-04-26 Fujifilm Corp 硬化促進剤、熱硬化性樹脂組成物、感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
JP4895034B2 (ja) * 2006-05-24 2012-03-14 Ｊｓｒ株式会社 感放射線性樹脂組成物、スペーサーおよびその形成方法
CN101093355B (zh) * 2006-06-23 2013-07-10 富士胶片株式会社 化合物、感光性组合物、固化性组合物、滤色器用固化性组合物、滤色器、及其制造方法
JP4846484B2 (ja) * 2006-08-11 2011-12-28 富士フイルム株式会社 光硬化性着色組成物及びそれを用いたカラーフィルタ
JP4689553B2 (ja) * 2006-08-11 2011-05-25 富士フイルム株式会社 光硬化性着色組成物及びそれを用いたカラーフィルタ
JP5198816B2 (ja) * 2007-08-31 2013-05-15 株式会社日本触媒 側鎖含有重合体の製造方法

Also Published As

Publication number Publication date
CN102269932B (zh) 2015-03-25
JP5471851B2 (ja) 2014-04-16
KR101853729B1 (ko) 2018-05-02
JP2011253110A (ja) 2011-12-15
KR20110132984A (ko) 2011-12-09
CN102269932A (zh) 2011-12-07

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