201131141201131141
I 六、發明說明： ' 【發明所屬之技術領域】 本發明係關於一種量測方法，尤指一種干涉系統之量 測方法。 【先前技術】 在量測技術之領域中，有非常多的量測方法被廣泛的 運用，干涉系統即為其中一種，一般來說，干涉系統可以 • 被運用來量測待測物的二維與三維表面形貌。 請參閱第一圖，第一圖係為待測物之示意圖。白光干 涉系統係應用光干涉原理，先以白光照明系統透過準直透 鏡發射平行光，並經過45度分光鏡反射後進入干涉顯微物 鏡，而顯微物鏡會將入射光分成兩道光，一道經由參考鏡 面反射，另一道則經由置放於掃描平台上的待測物100反 射，最後二道反射光再度重合並因光程差不同產生干涉， 干涉影像再經45度分光鏡、成像物鏡聚焦而成像於影像感 鲁測裝置。 藉由干涉顯微物鏡或掃描平台沿垂直掃描路徑D1的 移動，使影像感測裝置能接收到一系列由不同光程差所產 生之干涉影像，而電腦即可對所有的干涉影像中的每一像 素點進行分析，以得到待測物100之表面形貌。 請參閱第二圖，第二圖係為具有干涉條紋之二維形貌 圖像。雖然白光干涉系統在量測待測物100時，可以經由 上述的分析方式得到待測物1〇〇的表面形貌高度資訊，並 201131141 藉由高度資訊得到待測物100的三維形貌圖像，然而，由 物鏡在聚焦時會產生干涉現象，造成影像感測 、斤接收到的—維形貌圖像了 G含有干涉條紋s，無法清 邊的力辨待測物1 〇〇的形貌邊界。 的門：習=t為了解決二維形貌圖像10含有干涉條紋S Γ兩種方式，其中一種方式是在干涉系統 複數計涉影像，並由複數張干涉影像 ί置二位詈：〇的二維形貌圖像後’再藉由調整影像感測 、 置到—逼反射光不會產生光干涉之處，以避免二 ==像10中含有干涉條紋S，然而此-量測方細 像與二維形貌圖像IG係藉由不同的掃 ^過^別取仔’因此此—量财法較傳統的 的稷雜。 張干2旦=里測方法係於干涉系統藉由垂直掃描獲得複數 、㈣象’亚由複數張干涉影像得到待測物丨⑻的三 rm，再將干涉顯微物鏡更料料涉賴微物 含有干、.牛=干/的產生，並藉以避免二維形貌圖像10中 法不僅而此一量測方法相較於傳統的量測方 顧=餘的掃描流程，且需要多製備一組非干涉的 顯檨物鏡，亦增加了硬體的成本。 【發明内容】 種干涉系統之量測 本發明所欲解決之技術問題與目的： 緣此，本發明之主要目的係提供一 201131141 . 方法，此量測方法之目的在於不增加硬體成本與擷取待測 ' 物影像流程的情況之下，得到不含干涉條紋的待測物之二 維形貌圖像。 本發明解決問題之技術手段： 一種干涉系統之量測方法係用以於干涉系統沿垂直掃 描路徑對待測物進行垂直掃描，並在該垂直掃描路徑的複 數個掃描高度依序分別產生複數張干涉影像後，藉以利用 • 這些干涉影像以產生二維形貌圖像，此量測方法係包括以 下步驟：對各干涉影像中的每一個像素點取樣，以得到每 一干涉影像之干涉區域面積，並利用干涉影像所對應之掃 描高度與干涉區域面積建立高度-干涉面積對應比資訊；利 用高度-干涉面積對應比資訊，在這些干涉影像所對應之干 涉區域面積中擷取相對峰值，藉以擷取相對峰值所對應之 掃描高度，並將其定義為特徵高度；以及擷取特徵高度與 鄰近特徵高度上下各一第一預定張數之干涉影像進行疊 ®合，以產生二維形貌圖像。 本發明對照先前技術之功效： 相較於習知之干涉系統量測方法，本發明於干涉系統 藉由垂直掃描獲得複數張干涉影像後，可以直接透過這些 干涉影像獲得不含干涉條紋的待測物的二維形貌圖像，不 需要增加硬體成本或者進行額外的擷取待測物影像流程， 不僅節省成本，且量測過程亦較為簡便。 201131141 本發明所採用的具體實施例，將藉由以下之實施例及 圖式作進一步之說明。 【實施方式】 本發明係關於一種一種量測方法，尤指一種干涉系統 ，量測方法。以下茲列舉一較佳實施例以說明本發明，然 热白此項技蟄者皆知此僅為一舉例，而並非用以限定發明 本身。有關此較佳實施例之内容詳述如下。 請先參閱第-圖，第一圖係為待測物之示意圖。本發 明之干涉系統之量測方法制以於干涉系統沿垂直掃描路 控D1對待測物1GG進行垂直掃描，並在垂直掃描路徑m 的複數個掃描高度依序分別產生複數張干涉影像後，藉以 利用這些干涉影像以產生二維形_像；其中，干涉系统 =類對於本發明之量測方法並沒有影響，干涉系統可以 干:儀、Mi—。11白光干涉儀、Linnik白光 干’v儀或者其他常見之干涉儀。 資三圖’第三圖係為高度-干涉面積對應比 ^、本發明之干涉系統之量測方法係包括數個步驟，首 每一 各干涉影像中的每—個像素點取樣，以得到 積積建並利用每-干涉影像所對 _^心:=建：高二=:應 頂面11佔了上相固\ 幻由於待測物_的 對應比資”，ίΓ 積’因此於高度_干涉面積 、。中了頁面U所對應的掃描高度及鄰近掃描高度 201131141 了相!大的面積’而本實施例中為了方便操 ,了、’可以將母一知描㊅度所對應的干涉 不為百分比狀態。 積‘肩 接著，利用高度·干涉面積對應比資訊，在這忠 ，所對應之這些干涉區域面積中擷取—個相對峰值，= rr相料值所對應之掃描高度，並將其㈣為贿高 ϋ第四圖與第五圖，第四圖係為干涉系統於—個 ^波已鞄圍中的掃描取樣點示意圖 :=像::取部份干涉影像進行疊合之示意 度m之後’ g卩可自所有干涉影像中# 度H1與鄰近特徵高度出上下各 付问 像進行數值處理，以產生 "^之干涉影 座王一，·隹形貌圖像，而於本實施例中 於本實施例令之較佳者，苦二：像宜合處理’此外， 對待測物1〇〇進行垂直掃4=:垂直掃描路裡D1 個干涉波包之範圍内產描路徑叫的- 以言之，即曰乂一伽 疋張數之干涉影像，換 在一個干涉波包之範圍内進行了第H 數的取樣，那麼上述的第一 丁了第一預夂張 第二預定張數。 預疋張數可以是相等於-半之 請同時參考第六圖，第 形貌圖像示意圖。舉例而言：二步條紋之二維 在件到特徵高度Hi後，即可自所杆涉影像ί擷取= 201131141 高度HI所對應之干涉影像Ibase，並將干涉影像Ibase與 鄰近特徵高度H1上下各5張之干涉影像II〜110進行疊加， 以得到不含干涉條紋的二維形貌圖像Ieng。 此外，於本實施例中之較佳者，將干涉影像Ibase與干 涉影像II〜110進行疊加之過程，其主要目的在於將每一干 涉影像II〜110與干涉影像Ibase在每一個像素點的灰階值 差異，疊加至二維形貌圖像Ieng相對應的像素點，並將二 維形貌圖像Ieng像素點的灰階值除以一個干涉波包内之取 • 樣點數，在本實施例中即是除以11，來使二維形貌圖像Ieng 的灰階範圍正規化，即可利用多張干涉影像製作出不含干 涉條紋的二維形貌圖像Ieng。 綜合以上所述，相較於習知之干涉系統量測方法，本 發明於干涉系統藉由垂直掃描獲得複數張干涉影像後，可 以直接透過這些干涉影像獲得不含干涉條紋的待測物的二 維形貌圖像Ieng，並不需要增加硬體成本或者進行額外的 擷取待測物影像流程，不僅節省成本，且量測過程亦較為 •簡便。 此外，本發明之干涉系統之量測方法並不侷限於對一 特徵高度H1進行干涉影像的疊加動作，以上述實施例而 言，待測物100係具有一個凹槽，因此在第三圖之高度-干 涉面積對應比資訊中可以清楚發現，在另一掃描高度處亦 具有相對峰值，因此該相對峰值亦對應了 一個特徵高度 H2，本量測方法可以對特徵高度H2所對應之干涉影像與 對特徵高度H2上下各一第一預定張數之干涉影像進行疊 201131141 -加，即可獲得待測物於特徵高度H2處的不含干涉條紋之 二維形貌圖像；更進一步來說，當待測物100具有二個以 上的特徵高度H1與H2時，亦可將特徵高度H1與H2所 對應之干涉影像以及所有特徵高度H1與H2上下各一第一 預定張數之干涉影像進行疊加，以獲得另一不含干涉條紋 之二維形貌圖像。 藉由以上較佳具體實施例之詳述，係希望能更加清楚 描述本發明之特徵與精神，而並非以上述所揭露的較佳具 • 體實施例來對本發明之範疇加以限制。相反地，其目的是 希望能涵蓋各種改變及具相等性的安排於本發明所欲申請 之專利範圍的範轉内。 【圖式簡單說明】. 第一圖係為待測物之示意圖； 第二圖係為具有干涉條紋之二維形貌圖像； 第三圖係為高度-干涉面積對應比資訊； ® 第四圖係為干涉系統於一個干涉波包範圍中的掃描取樣 點不意圖， 第五圖係為自所有干涉影像中擷取部份干涉影像進行疊 合之示意圖；以及 第六圖係為不含干涉條紋之二維形貌圖像示意圖。 【主要元件符號說明】 待測物100 201131141 頂面11 垂直掃描路徑D1 二維形貌圖像10 干涉影像Ibas 干涉影像II〜110 二維形貌圖像Ieng 干涉條紋S 特徵高度HI、H2I. Description of the invention: 'Technical field to which the invention pertains>> The present invention relates to a measurement method, and more particularly to a measurement method of an interference system. [Prior Art] In the field of measurement technology, there are many measurement methods widely used, and an interference system is one of them. In general, an interference system can be used to measure the two-dimensionality of a test object. With a three-dimensional surface topography. Please refer to the first figure, the first picture is a schematic diagram of the object to be tested. The white light interferometry system applies the principle of optical interference. First, the white light illumination system emits parallel light through the collimating lens, and after 45-degree spectroscopic reflection, it enters the interference microscope objective lens, and the microscope objective beam divides the incident light into two lights, one through Referring to the specular reflection, the other is reflected by the object to be tested 100 placed on the scanning platform, and the last two reflected lights are again combined to cause interference due to different optical path differences, and the interference image is then focused by a 45-degree beam splitter and an imaging objective lens. Imaged in the image sensing device. By interfering with the movement of the microscope objective or the scanning platform along the vertical scanning path D1, the image sensing device can receive a series of interference images generated by different optical path differences, and the computer can be used for each of the interference images. A pixel is analyzed to obtain a surface topography of the object 100 to be tested. Please refer to the second figure, which is a two-dimensional topographic image with interference fringes. Although the white light interference system measures the object to be tested 100, the surface topography height information of the object to be tested can be obtained through the above analysis method, and the three-dimensional topographic image of the object to be tested 100 is obtained by the height information 201131141. However, when the objective lens is in focus, interference will occur, resulting in image sensing, and the image received by the jin - the shape of the image. G contains the interference fringe s, and the force that cannot be cleared can distinguish the shape of the object to be tested. boundary. The door: Xi = t in order to solve the two-dimensional topographic image 10 contains interference fringes S Γ two ways, one of which is in the interference system multiple counts the image, and the multiple interference images are placed in two places: 〇 After the two-dimensional shape image is 'received by the image, the reflected light does not produce light interference, so as to avoid the interference fringe S in the image of the second == 10, however, this measurement Like the two-dimensional image IG, the IG system is different from the traditional one by using different sweeps. Zhang Gan 2 denier = Li test method is based on the interferometric system to obtain the complex number by vertical scanning, and (4) to obtain the three rm of the object to be tested (8) by the sub-multiple interference image, and then the interference microscope objective lens is more involved. The object contains dry, bovine = dry / generated, and borrowed to avoid the two-dimensional image of the image 10 not only this measurement method compared to the traditional measurement method = the remaining scanning process, and requires more preparation A set of non-interfering display lenses also adds to the cost of the hardware. SUMMARY OF THE INVENTION Measurement of Interferometric Systems The technical problems and objects to be solved by the present invention are: Accordingly, the main object of the present invention is to provide a method of 201131141. The purpose of the measurement method is to increase the cost and the cost of the hardware. Under the condition of the image processing of the object to be measured, a two-dimensional topographic image of the object to be tested without interference fringes is obtained. The technical means for solving the problem of the present invention: The measuring method of the interference system is for vertically scanning the object to be tested along the vertical scanning path of the interference system, and sequentially generating a plurality of interferences at a plurality of scanning heights of the vertical scanning path. After the image, the interference images are used to generate a two-dimensional topographic image. The measurement method includes the following steps: sampling each pixel in each interference image to obtain an interference region area of each interference image. The height-interference area corresponding ratio information is established by using the scanning height corresponding to the interference image and the interference area area; and the height-interference area corresponding ratio information is used to obtain relative peaks in the interference area corresponding to the interference images, so as to capture The scan height corresponding to the peak value is defined as the feature height; and the interference image height is extracted from the interference image of the first predetermined number of the top and bottom of the adjacent feature height to generate a two-dimensional topographic image. The present invention compares the effects of the prior art: Compared with the conventional interference system measurement method, the present invention can obtain a plurality of interference images without interference fringes directly after obtaining a plurality of interference images by vertical scanning in the interference system. The two-dimensional shape image does not require an increase in hardware cost or an additional process of capturing the image of the object to be tested, which not only saves cost, but also makes the measurement process relatively simple. 201131141 The specific embodiments of the present invention will be further described by the following embodiments and drawings. [Embodiment] The present invention relates to a measurement method, and more particularly to an interference system and a measurement method. In the following, a preferred embodiment will be described to illustrate the invention, and it is to be understood by those skilled in the art that this invention is not intended to limit the invention itself. The contents of this preferred embodiment are detailed below. Please refer to the first figure, the first picture is a schematic diagram of the object to be tested. The measuring method of the interference system of the present invention is such that the interference system vertically scans the object to be tested 1GG along the vertical scanning path D1, and sequentially generates a plurality of interference images in a plurality of scanning heights of the vertical scanning path m, respectively. These interference images are utilized to generate a two-dimensional image; wherein the interference system = class has no effect on the measurement method of the present invention, and the interference system can be dry: instrument, Mi-. 11 white light interferometer, Linnik white light dry 'v instrument or other common interferometer. The third figure is the height-interference area correspondence ratio. The measurement method of the interference system of the present invention includes several steps, and each pixel in each of the first interference images is sampled to obtain a product. Accumulate and use each interference image to the _^ heart: = build: high two =: the top surface 11 should occupy the upper phase solid \ phantom due to the corresponding ratio of the object to be tested _, ί Γ product ', therefore height _ interference In the area, the scan height corresponding to the page U and the adjacent scan height 201131141 have a large area. In this embodiment, for the convenience of operation, the interference corresponding to the sixth degree can be Percentage state. Product's shoulder, using the height-interference area correspondence ratio information, in this loyalty, corresponding to the area of these interference areas, take a relative peak, = rr phase material corresponding to the scanning height, and (4) The fourth and fifth figures for bribery, the fourth picture is a schematic diagram of the scanning sampling points of the interference system in the vicinity of the wave: = image:: the degree of superimposition of partial interference images After m 'g卩 can be from all interference images #度H1 and proximity The height of the upper and lower questions is numerically processed to produce an image of the interference of the image of the image of the image of the image of the image. In this embodiment, the preferred embodiment of the present invention is: Like the appropriate processing 'In addition, the vertical measurement of the object to be measured 1 4 4 =: vertical scanning path within the range of D1 interference wave packet called the production path called - in other words, the number of 曰乂 疋 疋Interfering with the image, and performing the sampling of the Hth number within the range of an interference wave packet, then the first predetermined number of the first pre-twisted second predetermined number of sheets. The number of pre-twisted sheets may be equal to - half of the request At the same time, refer to the sixth figure, the schematic diagram of the topographic image. For example: the two-dimensional stripe of the two-dimensional stripe after the feature height Hi, can be taken from the image of the rod = = = 201131141 height HI corresponding interference image Ibase, and superimposes the interference image Ibase with the interference images II to 110 of each of the upper and lower feature heights H1 to obtain a two-dimensional topographic image Ieng without interference fringes. Further, it is preferable in this embodiment. The interference image Ibase is superimposed with the interference images II to 110. The main purpose of the process is to superimpose the grayscale value difference of each interference image II~110 and the interference image Ibase at each pixel point, and superimpose it on the pixel corresponding to the two-dimensional topographic image Ieng, and the two-dimensional shape The grayscale value of the image Ieng pixel is divided by the number of samples in an interference wave packet, which is divided by 11 in this embodiment to normalize the grayscale range of the two-dimensional topographic image Ieng. The two-dimensional topographic image Ieng without interference fringes can be created by using multiple interference images. According to the above-mentioned interference system measurement method, the present invention obtains plural images by vertical scanning in the interference system. After interfering with the image, the two-dimensional topographic image Ieng of the object to be tested without the interference fringe can be directly obtained through the interference image, and the hardware cost is not required or an additional image process of the object to be tested is not required, thereby saving cost. And the measurement process is also relatively simple. In addition, the measuring method of the interference system of the present invention is not limited to the superimposing action of the interference image on a feature height H1. In the above embodiment, the object to be tested 100 has a groove, so in the third figure The height-interference area correspondence ratio information can be clearly found, and the relative peak value also has a relative peak value at another scanning height. Therefore, the relative peak value also corresponds to a feature height H2, and the measurement method can correspond to the interference image corresponding to the feature height H2. The interference image of the first predetermined number of sheets above and below the feature height H2 is stacked 201131141 - plus, so that the two-dimensional topographic image of the object to be tested at the feature height H2 without interference fringes is obtained; further, When the object to be tested 100 has two or more feature heights H1 and H2, the interference images corresponding to the feature heights H1 and H2 and the interference images of all the first predetermined numbers of the upper and lower heights H1 and H2 may be superimposed. To obtain another two-dimensional topographic image without interference fringes. The features and spirit of the present invention are intended to be more apparent from the detailed description of the preferred embodiments. On the contrary, the intention is to cover various modifications and equivalent arrangements within the scope of the invention as claimed. [Simple diagram of the diagram] The first diagram is a schematic diagram of the object to be tested; the second diagram is a two-dimensional image with interference fringes; the third diagram is the height-interference area correspondence ratio information; The figure is a schematic view of the scanning sampling point of the interference system in an interference wave packet range, and the fifth picture is a schematic diagram of superimposing partial interference images from all the interference images; and the sixth picture is without interference. Schematic diagram of the two-dimensional shape of the stripe. [Main component symbol description] DUT 100 201131141 Top surface 11 Vertical scanning path D1 Two-dimensional topographic image 10 Interference image Ibas Interference image II~110 Two-dimensional topographic image Ieng Interference fringe S Characteristic height HI, H2