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TW201130009A - Enhanced integrity projection lens assembly - Google Patents

Enhanced integrity projection lens assembly

Info

Publication number
TW201130009A
TW201130009A TW99134564A TW99134564A TW201130009A TW 201130009 A TW201130009 A TW 201130009A TW 99134564 A TW99134564 A TW 99134564A TW 99134564 A TW99134564 A TW 99134564A TW 201130009 A TW201130009 A TW 201130009A
Authority
TW
Taiwan
Prior art keywords
projection lens
lens assembly
enhanced integrity
present
integrity projection
Prior art date
Application number
TW99134564A
Other languages
Chinese (zh)
Other versions
TWI492261B (en
Inventor
Johan Joost Koning
Stijn Willem Herman Steenbrink
Bart Schipper
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from NL2003619A external-priority patent/NL2003619C2/en
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Publication of TW201130009A publication Critical patent/TW201130009A/en
Application granted granted Critical
Publication of TWI492261B publication Critical patent/TWI492261B/en

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
TW099134564A 2009-10-09 2010-10-11 Enhanced integrity projection lens assembly TWI492261B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25033609P 2009-10-09 2009-10-09
NL2003619A NL2003619C2 (en) 2009-10-09 2009-10-09 Projection lens assembly.

Publications (2)

Publication Number Publication Date
TW201130009A true TW201130009A (en) 2011-09-01
TWI492261B TWI492261B (en) 2015-07-11

Family

ID=50180092

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099134564A TWI492261B (en) 2009-10-09 2010-10-11 Enhanced integrity projection lens assembly

Country Status (1)

Country Link
TW (1) TWI492261B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI798715B (en) * 2020-06-10 2023-04-11 荷蘭商Ａｓｍｌ荷蘭公司 Module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus and method of aligning an electron-optical device with charged particle beam, or multi-beam, within a charged particle apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3827359B2 (en) * 1996-03-19 2006-09-27 富士通株式会社 Charged particle beam exposure method and apparatus
JP4947841B2 (en) * 2000-03-31 2012-06-06 キヤノン株式会社 Charged particle beam exposure system
EP2434522B8 (en) * 2002-07-16 2014-07-23 Canon Kabushiki Kaisha Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method
WO2006004374A1 (en) * 2004-07-05 2006-01-12 Cebt Co. Ltd. Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
JP2007266525A (en) * 2006-03-30 2007-10-11 Canon Inc Charged particle beam lens array, and charged particle beam exposure apparatus using the charged particle beam lens array
JP5408674B2 (en) * 2008-02-26 2014-02-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． Projection lens construction

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI798715B (en) * 2020-06-10 2023-04-11 荷蘭商Ａｓｍｌ荷蘭公司 Module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus and method of aligning an electron-optical device with charged particle beam, or multi-beam, within a charged particle apparatus
US11961698B2 (en) 2020-06-10 2024-04-16 Asml Netherlands B.V. Replaceable module for a charged particle apparatus

Also Published As

Publication number Publication date
TWI492261B (en) 2015-07-11

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