TW201130009A - Enhanced integrity projection lens assembly - Google Patents
Enhanced integrity projection lens assemblyInfo
- Publication number
- TW201130009A TW201130009A TW99134564A TW99134564A TW201130009A TW 201130009 A TW201130009 A TW 201130009A TW 99134564 A TW99134564 A TW 99134564A TW 99134564 A TW99134564 A TW 99134564A TW 201130009 A TW201130009 A TW 201130009A
- Authority
- TW
- Taiwan
- Prior art keywords
- projection lens
- lens assembly
- enhanced integrity
- present
- integrity projection
- Prior art date
Links
Landscapes
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US25033609P | 2009-10-09 | 2009-10-09 | |
| NL2003619A NL2003619C2 (en) | 2009-10-09 | 2009-10-09 | Projection lens assembly. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201130009A true TW201130009A (en) | 2011-09-01 |
| TWI492261B TWI492261B (zh) | 2015-07-11 |
Family
ID=50180092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099134564A TWI492261B (zh) | 2009-10-09 | 2010-10-11 | 提高完整性的投影透鏡組件 |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI492261B (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI798715B (zh) * | 2020-06-10 | 2023-04-11 | 荷蘭商Asml荷蘭公司 | 用於支撐經組態以操縱帶電粒子設備中之帶電粒子路徑之裝置的模組及將電光裝置與帶電粒子設備內之帶電粒子束或多光束對準之方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3827359B2 (ja) * | 1996-03-19 | 2006-09-27 | 富士通株式会社 | 荷電粒子ビーム露光方法及びその装置 |
| JP4947841B2 (ja) * | 2000-03-31 | 2012-06-06 | キヤノン株式会社 | 荷電粒子線露光装置 |
| EP2434522B8 (en) * | 2002-07-16 | 2014-07-23 | Canon Kabushiki Kaisha | Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| WO2006004374A1 (en) * | 2004-07-05 | 2006-01-12 | Cebt Co. Ltd. | Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same |
| JP2007266525A (ja) * | 2006-03-30 | 2007-10-11 | Canon Inc | 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置 |
| JP5408674B2 (ja) * | 2008-02-26 | 2014-02-05 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | 投影レンズ構成体 |
-
2010
- 2010-10-11 TW TW099134564A patent/TWI492261B/zh active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI798715B (zh) * | 2020-06-10 | 2023-04-11 | 荷蘭商Asml荷蘭公司 | 用於支撐經組態以操縱帶電粒子設備中之帶電粒子路徑之裝置的模組及將電光裝置與帶電粒子設備內之帶電粒子束或多光束對準之方法 |
| US11961698B2 (en) | 2020-06-10 | 2024-04-16 | Asml Netherlands B.V. | Replaceable module for a charged particle apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI492261B (zh) | 2015-07-11 |
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