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TW201130009A - Enhanced integrity projection lens assembly - Google Patents

Enhanced integrity projection lens assembly

Info

Publication number
TW201130009A
TW201130009A TW99134564A TW99134564A TW201130009A TW 201130009 A TW201130009 A TW 201130009A TW 99134564 A TW99134564 A TW 99134564A TW 99134564 A TW99134564 A TW 99134564A TW 201130009 A TW201130009 A TW 201130009A
Authority
TW
Taiwan
Prior art keywords
projection lens
lens assembly
enhanced integrity
present
integrity projection
Prior art date
Application number
TW99134564A
Other languages
English (en)
Other versions
TWI492261B (zh
Inventor
Johan Joost Koning
Stijn Willem Herman Steenbrink
Bart Schipper
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from NL2003619A external-priority patent/NL2003619C2/en
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Publication of TW201130009A publication Critical patent/TW201130009A/zh
Application granted granted Critical
Publication of TWI492261B publication Critical patent/TWI492261B/zh

Links

Landscapes

  • Electron Beam Exposure (AREA)
TW099134564A 2009-10-09 2010-10-11 提高完整性的投影透鏡組件 TWI492261B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25033609P 2009-10-09 2009-10-09
NL2003619A NL2003619C2 (en) 2009-10-09 2009-10-09 Projection lens assembly.

Publications (2)

Publication Number Publication Date
TW201130009A true TW201130009A (en) 2011-09-01
TWI492261B TWI492261B (zh) 2015-07-11

Family

ID=50180092

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099134564A TWI492261B (zh) 2009-10-09 2010-10-11 提高完整性的投影透鏡組件

Country Status (1)

Country Link
TW (1) TWI492261B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI798715B (zh) * 2020-06-10 2023-04-11 荷蘭商Asml荷蘭公司 用於支撐經組態以操縱帶電粒子設備中之帶電粒子路徑之裝置的模組及將電光裝置與帶電粒子設備內之帶電粒子束或多光束對準之方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3827359B2 (ja) * 1996-03-19 2006-09-27 富士通株式会社 荷電粒子ビーム露光方法及びその装置
JP4947841B2 (ja) * 2000-03-31 2012-06-06 キヤノン株式会社 荷電粒子線露光装置
EP2434522B8 (en) * 2002-07-16 2014-07-23 Canon Kabushiki Kaisha Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method
WO2006004374A1 (en) * 2004-07-05 2006-01-12 Cebt Co. Ltd. Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
JP2007266525A (ja) * 2006-03-30 2007-10-11 Canon Inc 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
JP5408674B2 (ja) * 2008-02-26 2014-02-05 マッパー・リソグラフィー・アイピー・ビー.ブイ. 投影レンズ構成体

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI798715B (zh) * 2020-06-10 2023-04-11 荷蘭商Asml荷蘭公司 用於支撐經組態以操縱帶電粒子設備中之帶電粒子路徑之裝置的模組及將電光裝置與帶電粒子設備內之帶電粒子束或多光束對準之方法
US11961698B2 (en) 2020-06-10 2024-04-16 Asml Netherlands B.V. Replaceable module for a charged particle apparatus

Also Published As

Publication number Publication date
TWI492261B (zh) 2015-07-11

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