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TW201129429A - Ultrasonic cleaning method - Google Patents

Ultrasonic cleaning method

Info

Publication number
TW201129429A
TW201129429A TW099144789A TW99144789A TW201129429A TW 201129429 A TW201129429 A TW 201129429A TW 099144789 A TW099144789 A TW 099144789A TW 99144789 A TW99144789 A TW 99144789A TW 201129429 A TW201129429 A TW 201129429A
Authority
TW
Taiwan
Prior art keywords
cleaning
ultrasonic
cleaned
aforementioned
cleaning method
Prior art date
Application number
TW099144789A
Other languages
Chinese (zh)
Inventor
Hitoshi Kabasawa
Tatsuo Abe
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of TW201129429A publication Critical patent/TW201129429A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H10P70/15—
    • H10P72/0416—

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

Disclosed is an ultrasonic cleaning method that, at the very least, cleans an object to be cleaned by immersing the aforementioned object to be cleaned in cleaning fluid that is within a cleaning tank and transmitting ultrasonic waves generated from an ultrasonic transducer to the cleaning fluid that is within the aforementioned cleaning tank, and is characterized by the cleaning of the object to be cleaned by means of the ultrasonic waves generated by the aforementioned ultrasonic transducer being performed under at least two ultrasonic output conditions. As a result, an ultrasonic cleaning method is provided that resolves the problem of uneven cleaning (missed spots), which has been a problem with ultrasonic cleaning, and that can effectively eliminate particles.
TW099144789A 2010-01-25 2010-12-20 Ultrasonic cleaning method TW201129429A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010012801A JP2011151282A (en) 2010-01-25 2010-01-25 Ultrasonic cleaning method

Publications (1)

Publication Number Publication Date
TW201129429A true TW201129429A (en) 2011-09-01

Family

ID=44306496

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099144789A TW201129429A (en) 2010-01-25 2010-12-20 Ultrasonic cleaning method

Country Status (3)

Country Link
JP (1) JP2011151282A (en)
TW (1) TW201129429A (en)
WO (1) WO2011089673A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5729351B2 (en) * 2012-05-18 2015-06-03 信越半導体株式会社 Semiconductor wafer cleaning method
US20170213705A1 (en) * 2016-01-27 2017-07-27 Applied Materials, Inc. Slit valve gate coating and methods for cleaning slit valve gates
CN112974396B (en) * 2021-01-22 2022-07-22 北京北方华创微电子装备有限公司 Semiconductor cleaning apparatus and wafer cleaning method
CN112992740A (en) * 2021-03-01 2021-06-18 李军平 Cleaning equipment for cutting wafer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02247650A (en) * 1989-03-20 1990-10-03 Hoya Corp Cleaning method
JPH04164324A (en) * 1990-10-29 1992-06-10 Nec Corp Semiconductor manufacturing device
JPH06168928A (en) * 1992-11-30 1994-06-14 Nec Kansai Ltd Wafer cleaning device and cleaning of wafer
JP2007059868A (en) * 2005-07-28 2007-03-08 Dainippon Screen Mfg Co Ltd Substrate processing equipment

Also Published As

Publication number Publication date
WO2011089673A1 (en) 2011-07-28
JP2011151282A (en) 2011-08-04

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