TW201113245A - Phenolic compound and manufacturing method thereof - Google Patents
Phenolic compound and manufacturing method thereof Download PDFInfo
- Publication number
- TW201113245A TW201113245A TW99124647A TW99124647A TW201113245A TW 201113245 A TW201113245 A TW 201113245A TW 99124647 A TW99124647 A TW 99124647A TW 99124647 A TW99124647 A TW 99124647A TW 201113245 A TW201113245 A TW 201113245A
- Authority
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- Prior art keywords
- compound
- phenol
- present
- substituent
- reacting
- Prior art date
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- 150000002989 phenols Chemical class 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 235
- 150000001875 compounds Chemical class 0.000 claims abstract description 85
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract description 71
- 239000003822 epoxy resin Substances 0.000 claims abstract description 68
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 68
- 238000006243 chemical reaction Methods 0.000 claims abstract description 63
- 238000000034 method Methods 0.000 claims abstract description 32
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 16
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims abstract description 6
- -1 aromatic aldehyde compound Chemical class 0.000 claims description 106
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 100
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 claims description 54
- 125000001424 substituent group Chemical group 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 38
- 239000003054 catalyst Substances 0.000 claims description 29
- 239000004065 semiconductor Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 26
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 20
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 claims description 19
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 19
- 239000003566 sealing material Substances 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 239000003377 acid catalyst Substances 0.000 claims description 11
- 150000001299 aldehydes Chemical class 0.000 claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 150000001491 aromatic compounds Chemical class 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000000047 product Substances 0.000 claims description 8
- 239000000470 constituent Substances 0.000 claims description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 claims 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims 1
- 239000005011 phenolic resin Substances 0.000 claims 1
- 239000013589 supplement Substances 0.000 claims 1
- 150000003934 aromatic aldehydes Chemical class 0.000 abstract description 15
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 49
- 239000011347 resin Substances 0.000 description 49
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 39
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 30
- 239000000523 sample Substances 0.000 description 25
- 239000002966 varnish Substances 0.000 description 23
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 14
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 14
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 10
- 238000009826 distribution Methods 0.000 description 10
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 229920003986 novolac Polymers 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 7
- 230000009477 glass transition Effects 0.000 description 7
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 238000004821 distillation Methods 0.000 description 6
- 238000001879 gelation Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000006386 neutralization reaction Methods 0.000 description 6
- 239000004848 polyfunctional curative Substances 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 5
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000011049 filling Methods 0.000 description 5
- 235000019253 formic acid Nutrition 0.000 description 5
- LBPYPRXFFYUUSI-UHFFFAOYSA-N furan-2-carbaldehyde;hydrate Chemical compound O.O=CC1=CC=CO1 LBPYPRXFFYUUSI-UHFFFAOYSA-N 0.000 description 5
- 238000006068 polycondensation reaction Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- ODLMAHJVESYWTB-UHFFFAOYSA-N propylbenzene Chemical compound CCCC1=CC=CC=C1 ODLMAHJVESYWTB-UHFFFAOYSA-N 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 238000012999 compression bending Methods 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- 244000226021 Anacardium occidentale Species 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- 235000020226 cashew nut Nutrition 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 210000005069 ears Anatomy 0.000 description 2
- MGJURKDLIJVDEO-UHFFFAOYSA-N formaldehyde;hydrate Chemical compound O.O=C MGJURKDLIJVDEO-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 229930015698 phenylpropene Natural products 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- VPHBYBUYWBZLEX-UHFFFAOYSA-N 1,2-dipropylbenzene Chemical compound CCCC1=CC=CC=C1CCC VPHBYBUYWBZLEX-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical group NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical compound COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 1
- QEFMDEFYYCMJPY-UHFFFAOYSA-N 1-(chloromethyl)-2-phenylbenzene Chemical group ClCC1=CC=CC=C1C1=CC=CC=C1 QEFMDEFYYCMJPY-UHFFFAOYSA-N 0.000 description 1
- NUJILYKLNKQOOX-UHFFFAOYSA-N 1-butyl-2-methylbenzene Chemical compound CCCCC1=CC=CC=C1C NUJILYKLNKQOOX-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- DXJSUHWCRYKSIX-UHFFFAOYSA-N 2-(3-sulfanylpropyl)phenol Chemical compound OC1=CC=CC=C1CCCS DXJSUHWCRYKSIX-UHFFFAOYSA-N 0.000 description 1
- ADDZHRRCUWNSCS-UHFFFAOYSA-N 2-Benzofurancarboxaldehyde Chemical compound C1=CC=C2OC(C=O)=CC2=C1 ADDZHRRCUWNSCS-UHFFFAOYSA-N 0.000 description 1
- CCTJHVLTAJTPBV-UHFFFAOYSA-N 2-chloro-1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C(Cl)=CC(=O)C2=C1 CCTJHVLTAJTPBV-UHFFFAOYSA-N 0.000 description 1
- FDIPWBUDOCPIMH-UHFFFAOYSA-N 2-decylphenol Chemical compound CCCCCCCCCCC1=CC=CC=C1O FDIPWBUDOCPIMH-UHFFFAOYSA-N 0.000 description 1
- IGRSQEOIAAGSGS-UHFFFAOYSA-N 2-ethylcyclohexa-2,5-diene-1,4-dione Chemical compound CCC1=CC(=O)C=CC1=O IGRSQEOIAAGSGS-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- NBHAZVWKRHTWRW-UHFFFAOYSA-N 2-propylcyclohexa-2,5-diene-1,4-dione Chemical compound CCCC1=CC(=O)C=CC1=O NBHAZVWKRHTWRW-UHFFFAOYSA-N 0.000 description 1
- LCHYEKKJCUJAKN-UHFFFAOYSA-N 2-propylphenol Chemical compound CCCC1=CC=CC=C1O LCHYEKKJCUJAKN-UHFFFAOYSA-N 0.000 description 1
- OZNLYXKOYORFRP-UHFFFAOYSA-N 3-fluorohexane Chemical compound CCCC(F)CC OZNLYXKOYORFRP-UHFFFAOYSA-N 0.000 description 1
- SWUBGVMYWFGERZ-UHFFFAOYSA-N 3-phenylfuran-2-carbaldehyde Chemical compound O1C=CC(C=2C=CC=CC=2)=C1C=O SWUBGVMYWFGERZ-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 241001674044 Blattodea Species 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000005821 Claisen rearrangement reaction Methods 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 244000166124 Eucalyptus globulus Species 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
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- 244000131316 Panax pseudoginseng Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 241001494479 Pecora Species 0.000 description 1
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- 206010036790 Productive cough Diseases 0.000 description 1
- 101710198277 RNA polymerase sigma factor sigA Proteins 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 241000124033 Salix Species 0.000 description 1
- 206010039740 Screaming Diseases 0.000 description 1
- 229920006328 Styrofoam Polymers 0.000 description 1
- XBDYBAVJXHJMNQ-UHFFFAOYSA-N Tetrahydroanthracene Natural products C1=CC=C2C=C(CCCC3)C3=CC2=C1 XBDYBAVJXHJMNQ-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
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- 125000000746 allylic group Chemical group 0.000 description 1
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- 238000004458 analytical method Methods 0.000 description 1
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- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
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- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- XEKAUTDWPYQNFU-UHFFFAOYSA-N chlorane Chemical compound Cl.Cl.Cl XEKAUTDWPYQNFU-UHFFFAOYSA-N 0.000 description 1
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- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- XGZRAKBCYZIBKP-UHFFFAOYSA-L disodium;dihydroxide Chemical compound [OH-].[OH-].[Na+].[Na+] XGZRAKBCYZIBKP-UHFFFAOYSA-L 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001815 facial effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 150000002220 fluorenes Chemical class 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 125000003976 glyceryl group Chemical group [H]C([*])([H])C(O[H])([H])C(O[H])([H])[H] 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 239000006166 lysate Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TYCNFQDHSREPTJ-UHFFFAOYSA-N oxalic acid;dihydrochloride Chemical compound Cl.Cl.OC(=O)C(O)=O TYCNFQDHSREPTJ-UHFFFAOYSA-N 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 150000007965 phenolic acids Chemical class 0.000 description 1
- QXKWYEJQJWFXOE-UHFFFAOYSA-N phenyl-(2-propylphenyl)methanone Chemical compound CCCC1=CC=CC=C1C(=O)C1=CC=CC=C1 QXKWYEJQJWFXOE-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000008261 styrofoam Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
201113245 ar 六、發明說明: • 【發明所屬之技術領域】 _ 纟發月有關種除作為各種點合劑(binder)、複合物 .(compound)、塗佈材料(c〇ating贴如⑷)、積層材料 (lamnated material)、成型材料(m〇lding 等 的環氧樹脂用硬化劑使用之外,尚可作為環氧化祕清漆 樹脂的原料使用之苯酚(p h e n 〇丨)系化合物。 【先前技術】 以往,於電子材料用,特別是半導體(1C)密封的領域 中’從生產性、成本等面來看,樹脂密封為主流,由於作 業丨生成型性、電氣特性、财濕性、機械特性等優異之故, 現狀主要使用環氧樹脂組成物。此種硬化劑而言,可例舉: 笨紛盼盤清漆樹脂(phen〇i novolac resin)、各種胺類、 酸酐,惟特別是半導體(1C)密封用而言,從耐熱性、信賴 性等面來看,主要使用苯酚酚醛清漆樹脂。 近年來,電子機器的更進一步輕薄短小化、多功能化、 半導體(IC)的尚積體化顯著加速,將封裝件安裝於印刷線 路板(PCB)上時的安裝方式,其主流亦正逐漸從以往的接腳 (pin)插入方式(DIP ’ dual in-1 ine package,雙列直插封 裝)成為表面安裝方式(BGA(bal 1 grid array ’球栅陣列)、 S0P(small out-line package ’ 小外型封裝)、SiP(single in-line package,單列直插封裝)、CSP(chip~scale package,晶片尺寸封裝))。再者,覆晶(fiip chip)安裝 方式已開始適用為有效地高密度安裝的安裝技術,因而亦 322229 5 201113245 逐漸作為此等的密封材料或底部填充材料i】 material)使用。 此等係使用液狀的環氧樹脂與液狀的酸酐、胺 、酿胺 等硬化劑’而作為苯盼祕清漆硬化劑而言,則製作成半 固態或固態的苯紛盼酸清漆樹脂或經溶解於溶劑之苯酚酚 酸清漆樹脂使用。使用此種苯轉膝清漆樹脂之密封材料 當然流動性不佳’而使用溶劑者則因溶劑會含於硬化後之 密封材料中以致對性能造成不良影響。 雖亦嘗試使用酸酐以構成無溶劑之密封劑,惟由於硬 化後的密封劑在熱水的存在,例如壓力鍋(pressure cooker)試驗的條件下發生水解,而所生成之酸即腐蝕鋁等 金屬基板或線路之故,招致耐濕壽命的降低。又,由於胺、 醯胺基具有強的活性(activity)之故,從可靠性的面來看 亦不佳。 於是,作為液狀苯酚酚醛清漆樹脂,揭示有一種烯丙 基笨酚酚搭清漆樹脂(專利文獻1),惟尚有耐熱性不充分 之問題。又,雖揭示有一種三羥基苯基曱烷型的苯酚酚醛 清漆樹脂的烯丙基化物(專利文獻2),惟流動性尚不充 分’而有無法兼具低黏度及硬化物的耐熱性之問題。 [專利文獻1]日本特開2005-075866號公報 [專利文獻2]日本特開平2-91113號公報 [專利文獻3]日本特開2000-169537號公報 再者’揭示有一種併用苯酚系化合物2種以上之财熱 性液狀苯酚酚醛清漆樹脂(專利文獻3),惟從併用苯酚系 322229 6 201113245 • s物2種以上之點來看’由於所得之耐熱性液狀笨盼紛 越/月漆樹月曰的構造會依進行反應時之情況而變動之故,有 .生產時缺乏再雜(reprQdueibility)之問題。 • 【發明内容】 [發明欲解決之課題] 本發明之目的在於解決上述以往的問題點,而提供一 種能發揮於5〇。(:下之低的黏度及低吸濕性並且與環氧樹 脂進行反應硬化時能發揮良好的機械特性之苯齡系化合 物。 [發明之效果] 本發明之苯酚系化合物能發揮於5(TC下之低的黏度 及低吸濕性並且與環氧樹脂進行反應硬化時能發揮良好的 機械特性。 亦即,本發明的苯酚系化合物能在不致於降低吸濕性 及在高溫下的低膨脹性及低變形性(對於彎曲之彈性、斷裂 (breaking)時的位移(diSpiacement)及強度)之下,降低於 50C下之黏度並提升耐熱性(玻璃轉移點)。 [解決課題之手段] 本發明係為了達成上述目的而專心研究之結果所完成 者’具體而δ ’具有下述之構成。 [1]一種笨酚系化合物,係使一般式(6)表示之苯酚、一般 式(7)表示之芳香族醛化合物、與甲醛進行反應而得,且係 由前述苯酚、前述芳香族醛化合物及/或前述曱醛縮聚 (condensation polymerization)而成之苯酚系化合物, 7 322229 201113245 前述反應係藉由下述方法中之任一方法進行: 使前述苯盼、前述芳香族醒·化合物、與前述曱酸藉由 1階段的反應製得前述苯酚系化合物之方法; 使前述苯酚與前述芳香族醛化合物進行反應,然後使 其與前述甲酸·進行反應,而製得前述苯盼系化合物之方 法;或者 使由前述苯酚與前述芳香族醛化合物進行反應而得之 反應生成物、與由前述苯酚與前述曱醛進行反應而得之反 應生成物進行反應,而製得前述笨驗系化合物之方法,並 且, 於前述反應中, 相對於前述甲醛的莫耳數係使用前述芳香族醛化合物 0. 1至4. 0倍莫耳,且 係以使前述苯酚系化合物於5 0 °C下由E型黏度計所得 之旋轉黏度(rotary viscosity)為 0. 01 至 lOOPa · s 之方 式加以調整者201113245 ar VI. Description of the invention: • [Technical field to which the invention belongs] _ 纟 月 有关 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为A phenol (phen 〇丨)-based compound which can be used as a raw material of an epoxidized secret varnish resin, in addition to a cured material or a molding material (a curing agent for an epoxy resin such as m〇lding). [Prior Art] In the field of electronic materials, especially semiconductor (1C) sealing, resin sealing is the mainstream in terms of productivity and cost, and it is excellent in workmanship, electrical properties, richness, and mechanical properties. For this reason, the epoxy resin composition is mainly used in the current situation. For such a hardener, it can be exemplified: phen〇i novolac resin, various amines, acid anhydrides, and especially semiconductors (1C) For the purpose of sealing, phenol novolac resin is mainly used from the viewpoints of heat resistance and reliability. In recent years, electronic devices have become more lightweight, shorter, more multifunctional, and semi-finished. The body (IC) is significantly accelerated, and the mounting method when the package is mounted on a printed circuit board (PCB) is gradually being inserted from the conventional pin (DIP ' dual in- 1 ine package, dual in-line package) is surface mount (BGA (bal 1 grid array 'ball array), SOP (small out-line package 'small package), SiP (single in-line package, single column) In-line package), CSP (chip~scale package). Furthermore, the fiip chip mounting method has been applied to the installation technology for efficient high-density mounting. Therefore, 322229 5 201113245 gradually becomes this. The sealing material or underfill material is used. These are made of a liquid epoxy resin and a liquid acid anhydride, a hardener such as an amine or a chelating amine, and as a benzene anti-clear varnish hardener, a semi-solid or solid benzoic acid varnish resin or It is used as a phenol phenolic acid varnish resin dissolved in a solvent. The sealing material using such a benzene-to-knee varnish resin is of course poor in fluidity, and the solvent is used because the solvent is contained in the hardened sealing material to adversely affect the performance. Although an acid anhydride is also tried to form a solventless sealant, since the hardened sealant is hydrolyzed in the presence of hot water, for example, a pressure cooker test, the generated acid is a metal substrate such as corrosion aluminum. Or the reason of the line, resulting in reduced humidity life. Further, since the amine and the guanamine group have a strong activity, they are not good in terms of reliability. Then, as the liquid phenol novolak resin, an allyl phenol phenol varnish resin (Patent Document 1) has been disclosed, but there is a problem that heat resistance is insufficient. Further, an allylate of a phenol novolak resin of a trihydroxyphenyldecane type (Patent Document 2) has been disclosed, but fluidity is not sufficient enough to have low viscosity and heat resistance of a cured product. problem. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. 2000-169537. For the above-mentioned phenolic phenolic phenol novolak resin (patent document 3), the phenolic 322229 6 201113245 • s 2 or more types are used together. The structure of the moon will change depending on the situation at the time of the reaction, and there is a problem of lack of reprQdueibility during production. [Explanation] [Problems to be Solved by the Invention] An object of the present invention is to solve the above-mentioned conventional problems and to provide one that can be used. (A benzoate-based compound which exhibits good mechanical properties when it is hardened by reaction with an epoxy resin when it is low in viscosity and low in hygroscopicity. [Effect of the Invention] The phenolic compound of the present invention can be used at 5 (TC) The lower viscosity and low moisture absorption and good mechanical properties can be exhibited when reacting with an epoxy resin. That is, the phenol compound of the present invention can not reduce hygroscopicity and low expansion at high temperatures. Properties and low deformability (for the elasticity of bending, the displacement (diSpiacement) and strength at the time of breaking), the viscosity at 50 C is lowered and the heat resistance (glass transition point) is improved. [Means for solving the problem] In the invention, the result of the intensive study in order to achieve the above object is 'specifically, δ' has the following constitution. [1] A phenolic compound, which is a phenol represented by the general formula (6), and a general formula (7) The aromatic aldehyde compound is obtained by reacting with formaldehyde, and is a phenol system obtained by polycondensation of the phenol, the aromatic aldehyde compound, and/or the furfural. Compound, 7 322229 201113245 The above reaction is carried out by any one of the following methods: preparing the phenolic compound by the first-stage reaction of the benzene, the aromatic awake compound, and the citric acid described above. a method of reacting the phenol with the aromatic aldehyde compound and then reacting it with the formic acid to obtain the phenanthrene compound; or reacting the phenol with the aromatic aldehyde compound a reaction product of the reaction product and a reaction product obtained by reacting the phenol with the furfural to obtain the above-mentioned compound, and in the foregoing reaction, the molar number of the formaldehyde至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至至lOOPa · s way to adjust
(式中,f表示0至3的整數,R7表示氫原子、可具有取代 基之碳數1至4的直鏈或分枝狀烷基、可具有取代基之烯 丙基的任一者,如f為2以上時,則各R7可為相同或不相 同), 8 322229 201113245(wherein, f represents an integer of 0 to 3, and R7 represents any of a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, and an allyl group which may have a substituent, If f is 2 or more, each R7 may be the same or different), 8 322229 201113245
(式中,b、c表示0至3的整數,R8可為相同或不相同, 表示氫原子、可具有取代基之碳數1至4的直鏈或分枝狀 烷基、可具有取代基之烯丙基的任一者,如b為2以上時, 則各R8可為相同或不相同h [2]—種苯酚系化合物,係以下述一般式(1)表示之重複單 元及下述一般式(2)表示之重複單元作為主要構成單元之 苯紛系化合物, 前述苯酚系化合物的數平均分子量為4〇〇至6〇〇, 前述苯酚系化合物於50t:下由E型黏度計所得之旋轉 黏度為0. 01至lOOPa . s(wherein b and c represent an integer of 0 to 3, and R8 may be the same or different, and represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, may have a substituent When any of the allyl groups is 2 or more, each R8 may be the same or different h [2]-phenolic compound, and is a repeating unit represented by the following general formula (1) and the following The benzene compound having a repeating unit represented by the formula (2) as a main constituent unit, the number average molecular weight of the phenol compound is 4 〇〇 to 6 〇〇, and the phenol compound is obtained by an E type viscosity meter at 50 t: The rotational viscosity is from 0.01 to lOOPa. s
(式中,a、b、c分別獨立表示〇至3的整數,Rl及R2分別 可具有取代基之碳數1至4的直鏈或分 獨立表示氫原子、 枝狀烧基、可具有取代基之烯丙基的任一者,如&或b為 2以上時,則各R1及各R2可為相同或不相同) 322229 9 201113245(wherein, a, b, and c each independently represent an integer of 〇 to 3, and R1 and R2 each independently have a carbon number of 1 to 4 of a substituent, or a straight-chain or a sub-independently represent a hydrogen atom, a dendritic group, and may have a substitution. Any one of the allyl groups, such as & or b is 2 or more, each R1 and each R2 may be the same or different) 322229 9 201113245
(式中,d表示0至3的整數’ R3表示氫原子、可具有取代 基之碳數1至4的直鏈或分枝狀烷基、可具有取代基之烯 丙基的任一者,如d為2以上時,則在R3可為相同或不相 同)。 [3] —種苯酚系化合物之製造方法,該苯酚系化合物係使一 般式(6-1)表示之苯酚、一般式(7-1)表示之芳香族醛化合 物與曱醛進行反應,而由前述苯酚、前述芳香族醛化合物 及/或前述甲酸·縮聚而成者, 前述苯酚系化合物之製造方法係具有在鹼性觸媒存在 下使前述苯酚與前述芳香族醛化合物進行反應,然後,在 酸觸媒存在下與前述曱酸進行反應之步驟,並且, 於前述步驟中, 相對於前述曱醛的莫耳數係使用前述芳香族醛化合物 0. 1至4. 0倍莫耳,且 係以使前述苯盼系化合物於5 0 °C下由E型黏度計所得 之黏度為0. 01至l〇〇Pa · s之方式加以調整者(wherein d represents an integer of 0 to 3', and R3 represents any of a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, and an allyl group which may have a substituent. If d is 2 or more, it may be the same or different at R3. [3] A method for producing a phenol-based compound, wherein the phenol compound represented by the general formula (6-1) and the aromatic aldehyde compound represented by the general formula (7-1) are reacted with furfural. The phenol, the aromatic aldehyde compound, and/or the formic acid·polycondensation method, wherein the phenol compound is produced by reacting the phenol with the aromatic aldehyde compound in the presence of a basic catalyst, and then 0倍摩尔, and the system is used in the presence of the above-mentioned aldehydes in the presence of the above-mentioned aldehydes. 01至至〇〇Pa · s Adjusted by the viscosity of the above-mentioned benzene-based compound at 50 ° C from the E-type viscometer
(式中’ ί-l表示〇至3的整數,R7-1表示氫原子、可具有 10 322229 201113245 取代基之奴數1至4的直鍵或分枝狀烧基、可具有取代基 之烯丙基的任一者,如ί-l為2以上時,則各可為相 - 同或不相同)’(wherein ' ί - l denotes an integer from 〇 to 3, R 7-1 denotes a hydrogen atom, a direct bond or a branched alkyl group which may have a slave number of 10 322229 201113245, and a olefin having a substituent Any one of the propyl groups, if ί-l is 2 or more, each may be phase-same or different)
(式中’ b-1、c-1表示0至3的整數,rh可為相同或不相 同,表示氫原子、可具有取代基之碳數丨至4的直鏈或分 枝狀烷基、可具有取代基之烯丙基的任一者,如b_i為2 以上時,則各R8—1可為相同或不相同)。 [4] 一種環氧樹脂’其係使前述任—笨酚系化合物與表鹵醇 (epihalohydrin)進行反應而製得者。 [5] -種環氧樹脂組成物,其係含有前述任—㈣、化合物及 環氧樹脂者。 =-=環氧樹脂組成物,其係含有盼樹脂⑽⑽卜μ⑷ (惟,刖述苯酚系化合物除外) ⑺一種環氧樹脂硬化物,其係使樹脂。 而成者。 使則迷環氧樹脂組成物硬化 ⑻-種半導體元件之密封材料、 物所成者。 …、别述環氧樹脂組成 [9] 種半導體元件之底部填 環氧樹脂 組成物所成者。 其係由前述 [10] -種半導體, ^ 月'J述底部 填充材料進行密封音。使用别迷密封材料或 322229 11 201113245 【實施方式】 以下,就本發明内容,加以詳細說明。 本發明之第1苯酚系化合物(以下,亦僅簡稱本發明之 苯酚系化合物、或簡稱苯酚系化合物)係使一般式(6)表示 之苯酚(以下,簡稱本發明中之苯酚)、一般式(7)表示之芳 香族醛化合物(以下,簡稱本發明中之芳香族醛化合物)、 與曱醛(以下,簡稱本發明中之甲醛)進行反應而得之苯酚 系化合物。亦即,本發明之第一種苯酚系化合物係進行前 述反應後,由本發明中之苯酚、本發明中之芳香族醛化合 物及/或本發明中之曱醛進行縮聚而成之苯酚系化合物。 並且,本發明之第1苯酚系化合物係藉由下述方法中 之任一方法進行上述反應; 將本發明中之苯酚、本發明中之芳香族醛化合物、與 本發明中之曱醛藉由1階段的反應製得苯酚系化合物之方 法; 使本發明中之苯酚與本發明中之芳香族醛化合物進行 反應,然後使其與前述曱醛進行反應之方法;或者 使由本發明中之苯酚與本發明中之芳香族醛化合物進 行反應而得之反應生成物、與由本發明中之苯酚與本發明 中之曱醛進行反應而得之反應生成物進行反應之方法,並 且, 於前述反應中, 相對於本發明中之曱醛的莫耳數係使用本發明中之芳 香族醛化合物0. 1至4. 0倍莫耳,且 12 322229 201113245 以使本發明之苯盼系化合物於50°C下之黏度為〇. 〇ι 至lOOPa . s之方式加以調整者。Wherein 'b-1, c-1 represents an integer of 0 to 3, and rh may be the same or different, and represents a hydrogen atom, a linear or branched alkyl group having a carbon number of 丨 to 4 having a substituent, Any one of the allyl groups which may have a substituent, if b_i is 2 or more, each R8-1 may be the same or different. [4] An epoxy resin which is obtained by reacting the above-mentioned phenol-based compound with epihalohydrin. [5] An epoxy resin composition comprising the above-mentioned (IV), a compound and an epoxy resin. =-=Epoxy resin composition containing the desired resin (10) (10) and μ (4) (except for the phenol-based compound) (7) An epoxy resin cured product which is a resin. Founder. The epoxy resin composition is cured (8) - a sealing material of a semiconductor element or a material. ..., the epoxy resin composition [9] The bottom of the semiconductor element is filled with epoxy resin composition. It is sealed by the above-mentioned [10] - semiconductor, ^ month 'J bottom filling material. Use of other sealing materials or 322229 11 201113245 [Embodiment] Hereinafter, the contents of the present invention will be described in detail. The phenol-based compound (hereinafter, simply referred to as a phenol-based compound or a phenol-based compound of the present invention) of the present invention is a phenol represented by the general formula (6) (hereinafter, abbreviated as phenol in the present invention), and a general formula. (7) An aromatic aldehyde compound (hereinafter, abbreviated as an aromatic aldehyde compound in the present invention) and a phenol compound obtained by reacting with furfural (hereinafter, simply referred to as formaldehyde in the present invention). In other words, the first phenol compound of the present invention is a phenol compound obtained by polycondensation of the phenol of the present invention, the aromatic aldehyde compound of the present invention, and/or the furfural of the present invention after the above reaction. Further, the first phenol compound of the present invention is subjected to the above reaction by any of the following methods; the phenol of the present invention, the aromatic aldehyde compound of the present invention, and the furfural of the present invention are used. a method of producing a phenol-based compound by a one-stage reaction; a method of reacting the phenol of the present invention with the aromatic aldehyde compound of the present invention, and then reacting it with the above-mentioned furfural; or by reacting the phenol of the present invention with a reaction product obtained by reacting an aromatic aldehyde compound in the present invention, a reaction product obtained by reacting a phenol of the present invention with a furfural of the present invention, and, in the foregoing reaction, The aldehyde-based compound of the present invention is used in an amount of from 0.1 to 4.0 mol of the aromatic aldehyde compound of the present invention, and 12 322229 201113245 to give the benzoin compound of the present invention at 50 ° C. The viscosity is 〇. 〇ι to lOOPa. The way to adjust it.
OHOH
(式中’ ί表示〇至3的整數。R7表示氫原子、可具有 取代基之碳數1至4的直鏈或分枝狀烷基、可具有取代基 之烯丙基的任一者。如f為2以上時,則各R7可為相同或 不相同)。 R'(wherein 'ί denotes an integer of 〇 to 3. R7 represents any of a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, and an allyl group which may have a substituent. When f is 2 or more, each R7 may be the same or different. R'
(7 ) (式中’ b、C表示0至3的整數。為相同或不相 同,表示氫原子、可具有取代基之碳數1至4的直鏈或分 枝狀烧基、可具有取代基之稀丙基的任 上時,則各R8可為相同衫相同)。 4 乂 本發明之苯酚系化合物, 主要構成單元: 較佳為以下述重複單元作為 由源自本發明中之苯紛之苯_基與源自本發明中之 芳香祕之芳香祕殘基進行縮合(咖densatiQn)而得之 一般式(1)表示之重複單元;及 源自本發明中之苯盼之苯紛殘基與源自本發明中之甲 藤進行縮合而得之—般式⑵表示之f複單元,並且, 通常,由源自本發明中之苯酚之苯齡殘基之一般式⑶ 322229 13 201113245 2之殘基構成為兩末端。此時,本發明中之芳香族路化 :物的莫耳數相對於本發明中之甲㈣莫耳數的比,常與 :般式(1)表示之重鮮元數㈣於—般式⑵表示之重複 單元數的比為實質上相同。(7) (wherein b, C represents an integer of 0 to 3, which is the same or different, and represents a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, may have a substitution When R3 of the base is used, each R8 may be the same as the same shirt). 4 乂 phenol-based compound of the present invention, main constituent unit: It is preferred to condense the benzene group derived from the benzene group derived from the present invention and the aromatic residue derived from the aromatic substance derived from the present invention by the following repeating unit. (Card densatiQn) derived from the repeating unit represented by the general formula (1); and the benzene residue derived from the present invention is condensed with the vine derived from the present invention, and is represented by the general formula (2) f complex unit, and, in general, the residue of the general formula (3) 322229 13 201113245 2 derived from the benzene-n-residue of the phenol derived from the present invention is constituted as both terminals. In this case, the ratio of the number of moles of the aromatic passage in the present invention to the number of moles in the present invention is often the same as the number of the fresh elements represented by the general formula (1) (four). (2) The ratio of the number of repeating units indicated is substantially the same.
(式中,a、b、c分別獨立表示〇至3的整數。Ri及R2 分別獨立表示氫原子、可具有取代基之碳數丨至4的直鍵 或分枝狀炫基、可具有取代基之稀丙基的任-者,如a或 b為2以上時,則各R1及各R2可為相同或不相同)。(wherein, a, b, and c each independently represent an integer of 〇 to 3. Each of Ri and R2 independently represents a hydrogen atom, a straight bond or a branched thio group having a carbon number of 取代 to 4 which may have a substituent, and may have a substitution Any one of the radical propyl groups, if a or b is 2 or more, each R1 and each R2 may be the same or different.
、(式中,d表示〇至3的整數表示氫原子、可具有 取代基之碳數1至4的直鏈或分枝狀烷基、可具有取代基 之烯丙基的H如d為2以上時,則各r3可為相同或 不相同)。(wherein d represents an integer represented by 〇 to 3 represents a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, and an allyl group H which may have a substituent such as d is 2 In the above case, each r3 may be the same or different).
(3) 322229 14 201113245 m • (式中’e表示〇至3的整數。R4表示氫原子、可具有 取代基之碳數1至4的直鏈或分枝狀烷基、可具有取代基 之烯丙基的任一者。如e為2以上時,則各r4可為相同或 - 不相同)。 因而,就本發明中之苯酚的f所作之說明亦適用 於一般式(1)表示之重複單元中的Rl&a、一般式(2)表示 之重複單元中的R3及心以及-般式(3)表示之重複單元中 的R4及e, 就本發明中之芳香族醛的R8、b&c所作之說明亦適 用於一般式(1)表示之重複單元中的R2、b及c, 就本發明中之甲醛所作之說明,亦適用於一般式(2) 表示之重複單元中的甲盤殘基。 本發明之苯酴系化合物,在不損害本發明的效果之範 圍内’可含有能與本發明中之苯紛、本發明中之芳香族酸 及/或本發財之W進行反應,較佳為能進行縮聚反應之 源自其他化合物之殘基。此種重複單元而言,可例舉源自 下述化合物之殘基:4,4, _雙(?氧甲基)聯苯、d __雙 (氯甲基)聯苯、1,4-雙(甲氧甲基)苯、u—雙(氯 萘朌、f朌、苯齡。前述源自其他化合物之殘基的^量係 愈少愈佳、,本發明之苯料化合物t,較佳為5莫耳%以、 下’更佳為2莫耳%以下’再佳為i莫耳%以下,特佳為不 含有此種殘基。並且,較佳為按成為此種含量之方式'、’ 製造本發明之苯齡系化合物時調整本發財之苯齡: 明t之芳香祕化合物、本發明中之Μ以及其他化㈣ 322229 15 201113245 的饋入量。 本發明之第2苯酚系化合物係含於本發明之第1苯酚 系化.合物,並且以一般式(1)表示之重複單元及一般式(2) 表示之重複單元作為主要構成單元之苯酚系化合物, 其數平均分子量為400至600, 其於50°C下之由E型黏度計所得之旋轉黏度為0. 01 至 lOOPa · s 。 本發明之苯酚系化合物之製造方法,該苯酚系化合物 係使一般式(6-1)表示之苯紛、一般式(7-1)表示之芳香族 酸·化合物、與曱酸·進行反應,而由一般式(6-1)表示之苯 酚、一般式(7-1)表示之芳香族醛化合物及/或曱醛縮聚而 成,該製造方法係具有在鹼性觸媒存在下使一般式(6-1) 表示之苯酚與一般式(7-1)表示之芳香族醛化合物進行反 應,然後,在酸觸媒存在下與曱醛進行反應之步驟,並且 於此步驟中, 相對於前述曱醛的莫耳數係使用前述芳香族醛化合物 0. 1至4. 0倍莫耳,且 係以使一般式(6 -1)表示之苯酚系化合物於5 0 °C下由 E型黏度計所得之黏度為0. 01至lOOPa · s之方式加以調 整者。(3) 322229 14 201113245 m • (wherein 'e represents an integer of 〇 to 3. R4 represents a hydrogen atom, a straight or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, may have a substituent Any one of allyl groups. When e is 2 or more, each r4 may be the same or - not the same. Therefore, the description of the phenol of the present invention is also applicable to R3 &a in the repeating unit represented by the general formula (1), R3 and the heart and the general formula in the repeating unit represented by the general formula (2) ( 3) R4 and e in the repeating unit represented, and the description of R8, b&c of the aromatic aldehyde in the present invention is also applicable to R2, b and c in the repeating unit represented by the general formula (1). The description of the formaldehyde in the present invention also applies to the disk residue in the repeating unit represented by the general formula (2). The benzoquinone compound of the present invention may contain a compound which can react with the benzene of the present invention, the aromatic acid of the present invention, and/or the present invention, without departing from the effects of the present invention. Residues derived from other compounds that are capable of undergoing a polycondensation reaction. Such a repeating unit may, for example, be a residue derived from the following compounds: 4,4, bis(?oxymethyl)biphenyl, d__bis(chloromethyl)biphenyl, 1,4- Bis(methoxymethyl)benzene, u-bis(chloronaphthoquinone, f朌, benzene age. The less the amount of residues derived from other compounds mentioned above, the better, the benzene compound t of the present invention Preferably, it is 5 mol% or less, and more preferably 2 mol% or less, and then preferably less than i mol%, and particularly preferably does not contain such a residue. Further, it is preferably in such a manner as to be such a content. ',' When the benzene-aged compound of the present invention is produced, the benzene age of the present invention is adjusted: the aromatic compound of the present invention, the hydrazine of the present invention, and the amount of the other (4) 322229 15 201113245. The second phenol system of the present invention The compound is a phenol-based compound containing a repeating unit represented by the general formula (1) and a repeating unit represented by the general formula (2) as a main constituent unit, and the number average molecular weight thereof is contained in the first phenol-based compound of the present invention. The phenolic system of the present invention has a rotational viscosity of from 0.1 to 100 Pa · s at a temperature of from 50 to 600. In the method for producing a phenol compound, the aromatic acid compound represented by the general formula (6-1) and the aromatic acid compound represented by the general formula (7-1) are reacted with citric acid, and the general formula is (6-1) A phenol, an aromatic aldehyde compound represented by the general formula (7-1), and/or a furfural, which is obtained by a general formula (6-1) in the presence of a basic catalyst. a step of reacting a phenol with an aromatic aldehyde compound represented by the general formula (7-1), and then reacting with furfural in the presence of an acid catalyst, and in this step, relative to the aforementioned furfural The number of ears is from 0. 1 to 4.0 mol of the aromatic aldehyde compound, and the viscosity of the phenol compound represented by the general formula (6-1) at 50 ° C from an E-type viscometer. Adjusted for the way from 0.01 to lOOPa · s.
(式中,f-Ι表示0至3的整數。R7—1表示氫原子、可 16 322229 201113245 具有取代基之碳數1至4的直鏈或分枝狀烷基、可具有取 代基之烯丙基的任一者。如ί-l為2以上時,則各RH可 為相同或不相同)。(wherein, f-Ι represents an integer of 0 to 3. R7-1 represents a hydrogen atom, may be 16 322229 201113245 has a substituent of a carbon number of 1 to 4 of a straight or branched alkyl group, a substituentable alkene Any of the propyl groups. If ί-l is 2 or more, each RH may be the same or different.
(式中,b-1、c-1表示0至3的整數。R8—1可為相同或 不相同,表示氫原子、可具有取代基之碳數1至4的直鏈 或分枝狀烧基、可具有取代基之烯丙基之任一者。如b-1 為2以上時,則各R8_1可為相同或不相同)。 本發明之苯酚系化合物之製造方法係相當使於一般式 (6)表示之本發明中之苯酚與一般式(7)表示之本發明中之 芳香族醛化合物進行反應,然後使其與本發明中之甲醛進 行反應之方法,再者,本發明之苯酚系化合物之製造方法 係相當於使一般式(6)表示之本發明中之苯酚與一般式(7) 表示之本發明中之芳香族醛化合物在鹼性觸媒存在下進行 反應,然後,在酸性觸媒存在下使其與本發明中之曱醛進 行反應之方法。 因而, 就已述或後述之使一般式(6)表示之本發明中之苯盼、 一般式(7)表示之本發明中之芳香族醛化合物、與本發明中 之曱醛進行反應之方法的詳細說明亦適用於就本發明之苯 酚系化合物之製造方法的詳細說明, 就一般式(6)中之R7及f的說明亦適用於就ίΓ1及f-1 17 322229 201113245 的說明, 就一般式(7)中之R8、b及c的說明亦適用於就、 b~l及c-1的說明。 [本發明之第1苯酚系化合物及本發明之製造方法] 本發明卡之苯酚,係如一般式(6)中所記载者般,源自 本發明中之苯酚之較佳殘基,係如一般式(1)、(2)以及(3) 中所記載者般,為如下述之化合物群··於苯環上具有丨個 羥基,而f(亦即,a、d以及e)為2以上時,則各八亦即, R1、R3以及R4)可為相同或不相同,表示氫原子、可具有取 代基之碳數1至4的直鏈或分枝狀烷基、可具有取代基之 稀丙基的任·-者。 此等本發明中之苯酚,單獨使用或混合2種以上使用 時,均不會有任何問題。 具體的本發明中之苯酚而言,可例舉:苯酚、甲酚、 乙基苯酴、丙基苯紛、丁基苯紛、二甲苯盼、丁基甲基苯 紛、烯丙基苯紛、丙婦基苯紛等,從所得苯紛系化合物的 黏度較低的觀點來看,特佳為亦即,a、d、以及 為2且R7(亦即’ Rl、R3、R4以及R7-1)為烯丙基之2-烯丙基 苯酚,亦即,鄰烯丙基笨酚。 將苯盼與鄰晞丙基苯酚混合作為前述苯酚使用時,由 於苯酚之反應性較高之故’有笨酚較鄰烯丙基苯酚更早與 醛化合物進行反應之傾向。因此,如製造f(亦即,a、d、 e以及f_1)為2且R7(亦即,R1、R3 ' R4以及R7-1)為烯丙基 之苯紛系化合物時,較佳為使用 實質上不含有苯酚之鄰烯 18 322229 201113245 丙基苯驗。 於本發明之苯盼系化合物中,形成源自本發明中之笨 -紛之苯紛殘基間的亞甲基交聯基之化合物而言,可較佳例 •舉.本發明中之曱酸。再者,本發明中之曱㈣形態而言, 並不特別加以限制,亦可使用甲盤水溶液、以及聚甲醛 (paraf0rmaidehyde)、三噚烷(tri〇xane)等在酸存在下會 分解形成甲醛之聚合物。 較佳為容易處理之甲醛水溶液,可直接使用市售品的 42%甲酸水溶液。 形成源自本發明中之苯酚之苯酚殘基間的交聯之化合 物的一種之本發明中之芳香族醛化合物,係如一般式(乃 中所記載者般,源自本發明中之芳香族醛化合物之殘基, 較佳為如上述/般式(1)中所記載者般,更佳為如上述一般 式(4)中所記載者般’再佳為如上述一般式(5)中所記載者 般,為如下述之芳香族醛化合物群:於笨環上具有0至3 個羥基,R8及R2表示氫原子、或者取代或非取代的碳原子 數1至4的直键或分枝狀的院基、取代或非取代的烯丙基。 此等本發明中之芳香族酿化合物,單獨使用或混合2 種以上使用時,均不會有任何問題。 具體的本發明中之芳香族盤化合物而言,較佳為可 舉:苯甲醛、柳醛(salicylaldehyde)、對羥基苯曱醛、烯 丙基笨基醛等,更佳為柳搭或笨甲醛’再佳為苯甲醛。 19 322229 201113245(wherein b-1 and c-1 represent an integer of 0 to 3. R8-1 may be the same or different, and represents a hydrogen atom, a linear or branched burning of a carbon number of 1 to 4 which may have a substituent. Any one of the allyl groups which may have a substituent. When b-1 is 2 or more, each R8_1 may be the same or different. The phenol-based compound of the present invention is produced by reacting the phenol of the present invention represented by the general formula (6) with the aromatic aldehyde compound of the present invention represented by the general formula (7), and then reacting it with the present invention. Further, the method for producing a phenol-based compound according to the present invention is equivalent to the phenol of the present invention represented by the general formula (6) and the aromatic compound of the present invention represented by the general formula (7). The aldehyde compound is reacted in the presence of a basic catalyst, and then reacted with furfural in the present invention in the presence of an acidic catalyst. Therefore, the aromatic aldehyde compound of the present invention represented by the general formula (7) and the method of reacting the furfural of the present invention, which are described in the general formula (6), which will be described later or later, are described. The detailed description also applies to the detailed description of the method for producing the phenolic compound of the present invention, and the description of R7 and f in the general formula (6) also applies to the description of ίΓ1 and f-1 17 322229 201113245, The description of R8, b and c in the formula (7) also applies to the descriptions of b, l and c-1. [The first phenol-based compound of the present invention and the production method of the present invention] The phenol of the present invention is a preferred residue derived from the phenol of the present invention as described in the general formula (6). As described in the general formulas (1), (2), and (3), the compound group as described below has a hydroxyl group on the benzene ring, and f (that is, a, d, and e) is When it is 2 or more, each of eight, that is, R1, R3 and R4) may be the same or different, and may represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, and may have a substitution. Any of the radicals of the base. When the phenols of the present invention are used singly or in combination of two or more kinds, there is no problem. Specific examples of the phenol in the present invention include phenol, cresol, ethyl benzoquinone, propyl benzene, butyl benzene, xylene, butyl methyl benzene, allyl benzene, and C. Since the viscosity of the obtained benzene compound is low, it is particularly preferable that a, d, and 2 and R7 (that is, 'Rl, R3, R4, and R7-1) It is an allyl 2-allylphenol, that is, o-allylphenol. When phenpanene is mixed with o-mercaptopropylphenol as the phenol, since the reactivity of phenol is high, there is a tendency that the phenol has a reaction with the aldehyde compound earlier than the allyl phenol. Therefore, when the production of f (that is, a, d, e, and f_1) is 2 and R7 (that is, R1, R3 'R4, and R7-1) is an allyl benzene compound, it is preferably used. It is substantially free of phenolic o-olefins 18 322229 201113245 propyl benzene. In the phenpanic compound of the present invention, a compound derived from a methylene crosslinking group between the stupid and benzene residues in the present invention can be preferably used in the present invention. acid. Further, the form of the crucible (4) in the present invention is not particularly limited, and an aqueous solution of an aluminum plate, a paraformaldehyde, a trioxane or the like may be decomposed to form formaldehyde in the presence of an acid. The polymer. It is preferably an aqueous formaldehyde solution which is easy to handle, and a commercially available 42% aqueous formic acid solution can be used as it is. The aromatic aldehyde compound of the present invention which forms one of the crosslinked compounds derived from the phenol residue of the phenol of the present invention is derived from the aromatic form of the present invention as described in the general formula The residue of the aldehyde compound is preferably as described in the above formula (1), more preferably as described in the above general formula (4), and is preferably as in the above general formula (5). As described, it is an aromatic aldehyde compound group having 0 to 3 hydroxyl groups on a stupid ring, R8 and R2 representing a hydrogen atom, or a substituted or unsubstituted direct bond or fraction having 1 to 4 carbon atoms. The dendritic group, substituted or unsubstituted allyl group. The aromatic brewing compounds of the present invention are used alone or in combination of two or more kinds, and have no problem. The disc compound is preferably a benzaldehyde, a salicylaldehyde, a p-hydroxybenzaldehyde or an allyl strepaldehyde, and more preferably a ruthenium or a paraformaldehyde. 19 322229 201113245
(式中,a表示0至3的整數。R1表示氫原子、可具有 取代基之碳數1至4的直鏈或分枝狀烷基、可具有取代基 之烯丙基的任一者。如a為2以上時,則各R1可為相同或 不相同)。(wherein, a represents an integer of 0 to 3. R1 represents any of a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, and an allyl group which may have a substituent. When a is 2 or more, each R1 may be the same or different.
(式中,a表示0至3的整數。R1表示氫原子、可具有 取代基之碳數1至4的直鏈或分枝狀烷基、可具有取代棊 之烯丙基的任一者。如a為2以上時,則各R1可為相同或 不相同)。 本發明之苯酚系化合物,例如可藉由如下述之製造方 法製得。 可例舉:將本發明中之苯酚、本發明中之芳香族醛化 合物、與本發明中之曱醛,藉由1階段的反應製得本發明 之苯酚系化合物之方法;藉由2階段的反應製得本發明之 苯酚系化合物之方法;及藉由3階段的反應製得本發明之 20 322229 201113245 苯盼系化合物之方法。 ' 前述藉由2階段的反應製得本發明之苯酚系化合物之 - 方法而言,可例舉:首先使本發明中之苯酚與本發明中之 . 芳香族醛化合物進行反應,然後,使其與本發明中之甲醛 進行反應之方法;及首先使本發明中之苯酚與本發明中之 曱醛進行反應,然後,使其與本發明中之芳香族醛化合物 進行反應之方法。 前述藉由3階段的反應製得本發明之苯酚系化合物之 方法而言,可例舉:使由本發明中之苯酚與本發明中之芳 香族醛化合物進行反應而得之反應生成物、與另外由本發 明中之苯酚與本發明中之甲醛進行反應而得之反應生成物 進行反應之3階段的反應。 上述製造方法之中,藉由使本發明中之苯酚與本發明 中之芳香族醛進行反應,然後,使其與本發明中之曱醛進 行反應之2階段的反應製得本發明之苯酚系化合物之方 法,係由於一般式(1)表示之重複單元數的分佈或一般式(2) 表示之重複單元數的分佈狹窄之故較佳。 如藉由上述的2階段的反應製造本發明之苯酚系化合 物時,亦能與於第2階段添加之本發明中之醛化合物一起 添加本發明中之笨盼。 本發明之苯酚系化合物,較佳為一般式(1)表示之重複 單元與一般式(2)表示之重複單元的比例(一般式(1)之重 複單元數/一般式(2)之重複單元數)的平均為0. 1至4. 0, 如一般式(1)表示之重複單元數/一般式(2)表示之重複單 21 322229 201113245 元數未達0.1時,則經混合苯酚系化合物與環氧樹脂而得 之環氧樹脂組成物的玻璃轉移溫度會降低。又另一方面, 如一般式(1)表示之重複單元數/一般式(2)表示之重複單 元數超過4. 0時,則苯酚系化合物及環氧樹脂組成物的黏 度會上升,以致流動性惡化。 特別是,如分子中的一般式(1)表示之重複單元數,較 一般式(2)表示之重複單元數為少時,亦即,一般式(1)表 示之重複單元數/ 一般式(2)表示之重複單元數未達1.0 時,則由於所得苯酚系化合物在50°C下的黏度會降低之故 較佳。 因而,本發明之苯酚系化合物,在使本發明中之苯酚、 本發明中之芳香族醛化合物、與本發明中之甲醛進行反應 時,相對於本發明中之甲醛的莫耳數使用本發明中之芳香 族醛化合物0. 1至4. 0倍莫耳,較佳為0. 1至3. 0倍莫耳, 更佳為0. 1至1. 0倍莫耳。 特別是,以如下述之2階段的反應製造之苯酚系化合 物之製造方法較佳:在鹼性觸媒的存在下預先使本發明中 之苯酚與本發明中之芳香族醛化合物進行反應,反應結束 後使用酸中和鹼性觸媒,接著,在酸觸媒的存在下添加本 發明中之甲醛使其進行反應。 如以此種2階段的反應進行時,則在此種反應所得之 較佳狀態中,一般式(1)表示之重複單元數的分佈或一般式 (2)表示之重複單元數的分佈狹窄,並且容易控制分子量, 結果容易獲得所需要的黏度。 22 322229 201113245 於本發明中之笨酚與本發明中之芳香族醛化合物的反 ' 應中,如使用酸觸媒時,則反應不會充分進行,而有未反 . 應的芳香族醛會殘留之情形。前述未反應之芳香族醛,如 • 將反應生成物進行水洗或蒸餾,即能加以去除。 於本發明之笨酚系化合物的製造中,本發明中之笨 酚、與本發明中之芳香族醛化合物和本發明中之甲醛的合 計之全部醛類的添加比例,較佳為相對於本發明之苯酚^ 莫耳,按使全部盤類成為0.01至〇 4料之方式添加。如 全部義相對於本發明中之苯齡的添加量過少時 子量的苯i系化合物大量生成,當使苯紛系化合物盘^ 樹脂進行反應而製得環氧樹脂硬化物時,有該環氧樹 化物的玻璃轉移點會降低、或機械強度會降低之傾向。又, 如全祕類相對於本發明中之笨紛的添加量過多時’則有 苯酴系化合物_度增高,而處理性惡化 前述鹼性觸媒而言,並不特別。 月少 納、氫氧化鎖、氫氧化辦機二限制,可將氫氧化 雙環[5,4,0]十一稀_7等有機、水去谷液,U-二氮雜 用2種以上之方式使用,特佳為方式料 相對於本發明中之芳香族駿化人物二:液。 鹼性觸媒的使用量為〇· !莫耳 ^勿1莫耳,本發明之 莫耳倍至1.5莫耳倍的範圍M。料倍’較佳為 如鹼性觸媒的使用量過少時Hr c 應的芳香麵化合物會殘留之可能應性不足而有未反 如鹼性觸媒的使用量過多此 吁,反應上雖不會有問題, 322229 23 201113245 惟為中和所使用之酸觸媒的使用量增多,又有在中和時所 生成之鹽的去除步驟上耗費長時間之傾向。 又,假使在第1段的反應使用酸觸媒時,則反應速度. 較緩慢,有未反應的芳香族醛化合物容易殘留之傾向。 於本發明之苯酚系化合物之製造方法中,與鹼性觸媒 的中和劑或曱醛的反應中所用之酸觸媒而言,並不特別加 以限定,惟可使用鹽酸、草酸、硫酸、磷酸、對曱苯磺酸 等周知者。此等酸觸媒可僅使用1種,亦可併用2種以上 使用。從容易去除的觀點來看,上述者之中,特佳為草酸、 鹽酸。 相對於本發明中之苯酚,與本發明中之曱醛的反應中 所用之酸觸媒的使用量較佳為在0. 001至5. 0重量份,更 佳為0. 001至2. 5重量份,再佳為0. 001至2. 0重量份, 再佳為0. 001至1. 0重量份,再佳為0. 001至0. 5重量份, 再佳為0. 001至0. 1重量份的範圍很適合使用。如相對於 本發明中之苯酚,酸觸媒的使用量未達0. 001重量份時, 則有反應速度成為緩慢之傾向,而如超過1. 0重量份時, 則有反應急劇地進行以致難以控制反應之情形。 本發明中之反應條件,雖因所使用之本發明中之苯酚 的構造、及本發明中之芳香族醛化合物與本發明中之曱醛 的使用量的比例而有所不同,惟首先本發明中之苯酚與本 發明中之芳香族醛化合物之間的反應溫度,較佳為70至 160°C,更佳為70至150°C,再佳為90至150°C,再佳為 90至130°C。如前述反應溫度未達70°C時,則反應速度成 24 322229 201113245 為缓慢,而有未反應之芳香族搭化合物容易殘留之傾向。 如前述反應溫度超過16 0 °C時,則難以控制反應,而有難 以安定地製得本發明之笨酚系化合物之傾向。反應時間係 雖因反應溫度或所使用之觸媒種類及量而變動,惟較佳為 1至24小時。 接著,本發明中之苯酚與本發明中之芳香族醛化合物 的反應生成物(該反應生成物中可能含有未反應原料)、與 本發明中之曱醛進行反應的溫度,較佳為50°C至120°C, 特佳為80至110°C。如反應溫度未達50°C時,則反應速度 成為緩慢,而有未反應的曱醛容易殘留之傾向。如反應溫 度超過120°C時,則成為難以控制反應,而有難以安定地 製得本發明之苯酚系化合物之傾向。反應時間係雖因反應 溫度或所使用之觸媒種類及量而變動,惟較佳為1至24 小時。 本發明中之反應壓力,通常,係在常壓下進行者,惟 即使在加壓至減壓下進行,亦不會有任何問題。 本發明中之未反應的苯酚系化合物的去除方法,一般 使用在減壓下或一面吹入惰性氣體一面加熱下,將笨酚蒸 餾以去除至系外之方法。又,酸觸媒之去除’除熱分解或 減壓去除之外,尚可使用水洗等洗淨方法。 本發明之苯酚系化合物,從確保於50°C下之低黏度之 觀點來看,於本發明中之苯酚、本發明中之芳香族醛化合 物、與本發明中之曱醛的上述反應中,本發明之苯酚系化 合物於5(TC下之由E型黏度計所得之旋轉黏度(使用E型(wherein a represents an integer of 0 to 3. R1 represents a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms which may have a substituent, and any of the allyl groups which may have a substituted fluorene. When a is 2 or more, each R1 may be the same or different. The phenolic compound of the present invention can be obtained, for example, by the following production method. The method of obtaining the phenol-based compound of the present invention by the one-stage reaction of the phenol of the present invention, the aromatic aldehyde compound of the present invention, and the furfural of the present invention; A method for producing a phenol-based compound of the present invention; and a method for producing a benzene-based compound of the present invention by a three-stage reaction of 20 322229 201113245. The method for producing a phenol-based compound of the present invention by a two-stage reaction is exemplified by first reacting the phenol of the present invention with the aromatic aldehyde compound of the present invention, and then A method of reacting with the formaldehyde of the present invention; and a method of first reacting the phenol of the present invention with furfural of the present invention, and then reacting it with the aromatic aldehyde compound of the present invention. The method for producing the phenol compound of the present invention by the three-stage reaction may, for example, be a reaction product obtained by reacting the phenol of the present invention with the aromatic aldehyde compound of the present invention, and The three-stage reaction in which the reaction product obtained by the reaction of the phenol of the present invention with the formaldehyde of the present invention is reacted. In the above production method, the phenol system of the present invention is obtained by reacting the phenol of the present invention with the aromatic aldehyde of the present invention and then reacting it with the furfural of the present invention in a two-stage reaction. The method of the compound is preferred because the distribution of the number of repeating units represented by the general formula (1) or the distribution of the number of repeating units represented by the general formula (2) is narrow. When the phenol-based compound of the present invention is produced by the above two-stage reaction, it is also possible to add the hop of the present invention together with the aldehyde compound of the present invention added in the second stage. The phenol compound of the present invention is preferably a ratio of a repeating unit represented by the general formula (1) to a repeating unit represented by the general formula (2) (the number of repeating units of the general formula (1) / the repeating unit of the general formula (2) The average of the number is 0.1 to 4.0, as the number of repeating units represented by the general formula (1) / the repeating formula represented by the general formula (2) 21 322229 201113245 The number of repeating phenolic compounds is less than 0.1 The glass transition temperature of the epoxy resin composition obtained with the epoxy resin is lowered. On the other hand, when the number of repeating units represented by the general formula (1) / the number of repeating units represented by the general formula (2) exceeds 4.0, the viscosity of the phenolic compound and the epoxy resin composition rises, so that the flow Sexual deterioration. In particular, if the number of repeating units represented by the general formula (1) in the molecule is smaller than the number of repeating units represented by the general formula (2), that is, the number of repeating units represented by the general formula (1) / general formula ( 2) When the number of repeating units is less than 1.0, the viscosity of the obtained phenol compound at 50 ° C is preferably lowered. Therefore, when the phenol compound of the present invention reacts the phenol of the present invention, the aromatic aldehyde compound of the present invention, and the formaldehyde of the present invention, the present invention is used with respect to the molar number of formaldehyde in the present invention. 0倍摩尔。 0. 1 to 1. 0倍莫耳,优选为0. 1至1. 0倍摩尔. In particular, it is preferred to produce a phenol-based compound produced by a two-stage reaction as follows: a phenol of the present invention is reacted with an aromatic aldehyde compound of the present invention in advance in the presence of a basic catalyst, and the reaction is carried out. After the end, the acid is neutralized with an alkaline catalyst, and then, the formaldehyde in the present invention is added in the presence of an acid catalyst to carry out a reaction. When the reaction is carried out in such a two-stage reaction, in the preferred state obtained by the reaction, the distribution of the number of repeating units represented by the general formula (1) or the distribution of the number of repeating units represented by the general formula (2) is narrow. And the molecular weight is easily controlled, and as a result, the desired viscosity is easily obtained. 22 322229 201113245 In the anti-phenolic phenolic compound of the present invention and the aromatic aldehyde compound of the present invention, if an acid catalyst is used, the reaction will not proceed sufficiently, and the aromatic aldehyde will be unreacted. Residual situation. The aforementioned unreacted aromatic aldehyde, such as • can be removed by washing or distilling the reaction product. In the production of the phenolic compound of the present invention, the ratio of addition of all of the aldehydes in the present invention to the total of the aldehydes in the aromatic aldehyde compound of the present invention and the formaldehyde in the present invention is preferably relative to the present invention. The phenol of the invention is added in such a manner that all the discs are made of 0.01 to 〇4. When the amount of the benzene-based compound in the present invention is too small, the amount of the benzene-based compound is formed in a large amount, and when the benzene-based compound is reacted to obtain a cured epoxy resin, the ring is obtained. The glass transition point of the oxygen tree will decrease, or the mechanical strength will decrease. In addition, when the amount of addition of the whole secret class to the present invention is too large, the degree of benzoquinone compound is increased, and the handleability is deteriorated. The alkaline catalyst is not particularly preferable. There are two restrictions on the month of sodium, oxyhydroxide, and hydrazine. It can be used to remove organic and water from bicyclo[5,4,0] eleven -7, and U-diazepine. In the manner of use, it is particularly preferred that the method is relative to the aromatic precursor of the present invention: liquid. The amount of the alkaline catalyst used is 〇······················· It is preferable that when the amount of the basic catalyst used is too small, the amount of the aromatic compound which Hr c should remain may be insufficient, and the amount of the alkaline catalyst is not excessive. There will be problems, 322229 23 201113245 However, the use of the acid catalyst used for neutralization increases, and there is a tendency to take a long time in the removal step of the salt formed during neutralization. Further, in the case where an acid catalyst is used for the reaction in the first stage, the reaction rate is slow, and the unreacted aromatic aldehyde compound tends to remain. In the method for producing a phenol-based compound of the present invention, the acid catalyst used in the reaction with the neutralizing agent of the basic catalyst or furfural is not particularly limited, and hydrochloric acid, oxalic acid, sulfuric acid, or the like may be used. Phosphoric acid, p-toluenesulfonic acid and the like are well known. These acid catalysts may be used alone or in combination of two or more. From the viewpoint of easy removal, among the above, oxalic acid and hydrochloric acid are particularly preferred. 001至2. 5。 The 001 to 5.0. 001至0. 00至份。 0. 001至0. 0重量份,更优选为0. 001至1. 0重量份,更优选为0. 001至0. 5重量份,更优选为0. 001至0 The range of 1 part by weight is very suitable for use. For example, when the amount of the acid catalyst used is less than 0.001 part by weight, the reaction rate tends to be slow, and if it exceeds 1.0 part by weight, the reaction proceeds sharply. It is difficult to control the situation of the reaction. The reaction conditions in the present invention differ depending on the structure of the phenol used in the present invention and the ratio of the aromatic aldehyde compound in the present invention to the amount of furfural used in the present invention, but the present invention is first The reaction temperature between the phenol and the aromatic aldehyde compound in the present invention is preferably from 70 to 160 ° C, more preferably from 70 to 150 ° C, still more preferably from 90 to 150 ° C, still more preferably from 90 to 130 ° C. When the reaction temperature is less than 70 ° C, the reaction rate is 24 322229 201113245, and the unreacted aromatic compound tends to remain. When the reaction temperature exceeds 160 ° C, it is difficult to control the reaction, and it is difficult to stably obtain the phenol-based compound of the present invention. The reaction time varies depending on the reaction temperature or the kind and amount of the catalyst to be used, but it is preferably from 1 to 24 hours. Next, the reaction product of the phenol of the present invention with the aromatic aldehyde compound of the present invention (the reaction product may contain an unreacted raw material) and the reaction with the furfural of the present invention are preferably 50°. C to 120 ° C, particularly preferably 80 to 110 ° C. If the reaction temperature is less than 50 ° C, the reaction rate becomes slow, and unreacted furfural tends to remain. When the reaction temperature exceeds 120 °C, it is difficult to control the reaction, and it is difficult to stably obtain the phenol-based compound of the present invention. The reaction time varies depending on the reaction temperature or the kind and amount of the catalyst to be used, but it is preferably from 1 to 24 hours. The reaction pressure in the present invention is usually carried out under normal pressure, but there is no problem even if it is carried out under reduced pressure. The method for removing the unreacted phenol compound in the present invention is generally a method in which the phenol is distilled off to remove the phenol by heating under a reduced pressure or while blowing an inert gas. Further, the removal of the acid catalyst can be carried out by washing or the like in addition to thermal decomposition or pressure reduction. In the above reaction of the phenol of the present invention, the aromatic aldehyde compound of the present invention, and the furfural of the present invention, the phenol compound of the present invention is obtained from the viewpoint of ensuring a low viscosity at 50 ° C. The rotational viscosity of the phenolic compound of the present invention obtained by an E-type viscometer at 5 (using E type)
25 322229 S 201113245 黏度計(東機產業公司製)於試樣溫度5(rc下測定本發明 之苯酚系化合物的試樣約l 2ml而得之旋轉黏度 〇. 01至lOOPa . s,較佳為80Pa . s以下,更佳為7〇pa: s 以下,再佳為60Pa · s以下,較佳為〇 〇1至8〇pa · s,更 佳為o.oi至70Pa.s,更佳為〇1至6〇Pa s,再佳為^ 至5Pa· s’再佳為〇.1至2pa. s之方式調整。 該調整的方法,係如上所述,可例舉:較佳選擇柳駿 及/或本甲酸,更佳選擇苯Μ,作為本發明中之芳香族駿 化合物,相對於本發明中之甲酸的莫耳數將本發明中之芳 香族酸化合物的莫耳數較佳調整為0. 1至3 〇莫耳’更伟 調整為(U至2.0莫耳,再佳調整為〇 41〇莫耳 者其他,如技術領域中具通常知識者所周知般,例如 使如前所述之一般式„ „ 表不之重複早疋數的分佈或一般 式(2)表示之4複單元數的分佈變狹窄之方向調整;或 仃按相對於本發财之料丨莫耳使全部_成為〇. 〇ι 至0.4莫耳之方式添加等調整,以調整本發明之苯紛系化 合物的數平均分子量等。 從使本發明之笨酴系化合物於5『c下之由£型黏度計 所得之旋轉黏度能在上述之較佳範圍内之觀點來看,& 明之笨驗系化合物的數平均分子量,較佳為_至咖, 更佳為450纟550。在此,數平均分子量的測定條件則 於實施例中說明。 由於本發明之苯盼系化合物’於5〇ΐ下之由e型黏产 計所得之旋轉黏度在0. 01至100Pa · s的範圍内時,在^ 322229 26 201113245 .樣溫度50°c下會呈現液體狀態(詳言之,在試樣溫度5(rc 下未結晶化之狀態)之故,在將使用本發明之苯酚系化合物 . 之苯酚酚醛清漆樹脂特別是在半導體元件上進行加工時的 , 流動性成為良好,因而可適合作為半導體元件用的密封材 料或底部填充材料。 [本發明之第2苯酚系化合物] 本發明之第2苯酚系化合物,係以下述重複單元作為 主要構成單元: ‘ —由源自本發明中之苯酚之苯酚殘基與源自本發明中之 芳香族醛之芳香族醛殘基進行縮合而得之一般式(1)表示 之重複單元;及 ' 源自本發明中之苯酚之苯酚殘基與源自本發明中之甲 醛進行縮合而得之一般式(2)表示之重複單元,並且, 通常,由源自本發明中之苯酚之苯酚殘基之一般式(3) 表示之殘基構成為兩末端。 因而,就上述的本發明中之苯酚的^及f的說明亦適 用於一般式⑴、⑷及⑸表示之重複單元中的R1及a、一 般式(2)表*之重複單元MRid、以及―般式⑶表示 之重複單元中的R4及e, 就上述的本發明中之芳香族醛的R8、b及c的說明亦 適用於一般式⑴表示之重複單元中的R2、b及c, 就上述的本發明中之甲醛的說明亦適用於一般式(2) 表示之重複單元中的甲醛殘基。 27 322229 201113245 本發月之第2本紛系化合物的較佳製造方法,係 與本發明之第1苯料、化合物的較佳製造方法同樣者。 本發明之苯酚系化合物,於不損害本發明之效果之範 圍内可3有能與本發明中之苯盼、本發明中之芳香族駿 及/或本發明中之曱搭進行反應,較佳為能進行縮聚反應之 源自八他化合物之殘基。此種重複單元而言n列舉源自 下述化合物之殘基:4,4,-雙(甲氣甲基)聯苯、4, 4,-雙 氯甲基)聯笨、U-雙(甲氧甲基)笨、1,4,-雙(氯曱基) 萘苯盼。前述源自其他化合物之殘基的含 里係愈乂愈佳,本發明之笨紛系化合物中,較佳A 5莫耳% 以下更佳為2莫耳〇/❶以下,再佳為】莫耳%以下,再佳為 不3有此種殘基。並且,較佳為按成為此種含有量之方式, 調整本土月中之笨紛、本發明中之芳香族酸化合物、本發 明中之曱_及其他化合物之饋入量。 本發明之第2苯料、化合物,係從確保於航下之低 =度之觀點來看,其數平均分子量為侧至議較佳 為^至55〇。在此,數平均分子量的敎於 例中說明。 從確保於5(TC下之低的點度之觀點來看,本發明之第 2苯齡系化合物為本發明之第2苯㈣化合物於5代下之 由E型黏度計所得之旋轉點度(使用度計(東機產業 公司製)於試樣溫度航下測定試樣約12ml而得之旋轉 黏度)為0· 01至100Pa · s的呈現液體狀態者。 本發明之第2苯紛系化合物,係於5〇t下之由E型黏 322229 28 201113245 度計所得之旋轉黏度(使用E型黏度計(東機產業公司製) 於試料溫度50°C下測定試樣約1.2ml而得之旋轉黏度)的 - 值,較佳為80Pa . s以下,更佳為70Pa . s以下,再佳為 . 60Pa · s以下,較佳為0. 01至80Pa . s,更佳為0. 01至 70Pa · s,再佳為 0. 1 至 60Pa . s,再佳為 0. 1 至 5Pa . s, 再佳為0. 1至2Pa . s。 該調整之方法,係如上所述,可例舉:較佳選擇柳醛 及/或苯甲醛,更佳選擇苯甲醛,作為本發明中之芳香族醛 化合物,相對於本發明中之曱醛的莫耳數將本發明中之芳 香族醛化合物的莫耳數較佳調整為0. 1至3. 0莫耳,更佳 調整為0. 1至2. 0莫耳,再佳調整為0. 1至1. 0莫耳;或 者其他,如技術領域中具通常知識者所周知般,例如:以 使如前所述之一般式(1)表示之重複單元數的分佈或一般 式(2)表示之重複單元數的分佈變狹窄之方向調整;或者進 行按相對於本發明中之苯酚1莫耳使全部醛類成為0. 01 至0. 4莫耳之方式添加等調整,以調整本發明之苯酚系化 合物的數平均分子量等。 本發明之第2苯酚系化合物於50°C下之由E型黏度計 所得之旋轉黏度,可與本發明之第1苯酚系化合物的情形 同樣,按照下述方式進行:相對於本發明中之曱醛的莫耳 數調整本發明中之芳香族醛化合物的莫耳數;或者其他, 如技術領域中具通常知識者所周知般,例如:以使如前所 述之一般式(1)表示之重複單元數的分佈或一般式(2)表示 之重複單元數的分布變狹窄之方向調整;或者進行按相對 29 322229 201113245 於本發明巾之絲丨莫耳使全料類成為Q Q1u.4莫耳 之方式添加等調整,以調整本發明之苯齡系化合物的平均 分子量。 由於本發明之第2苯盼系化合物,於5代下之由E型 黏度计所得之旋轉黏度在〇 〇1至ι〇〇ρ& · s的範圍内時, 在戈樣恤度50 C下呈現液體狀態(詳言之,在試樣溫度5〇 c下未結晶化之狀態)之故,在將使用本發明之第2苯紛系 化合物之笨紛祕清漆樹脂特別是在半導體元件上進行加 夺的W動成為良好’因而可適合作為半導體用的密封 材料或底部填充材料使用。 、1本發明中所得第1及/或第2苯酴系化合物,可直接 乍為裒氧树月曰的硬化劑使用於黏合劑、塗佈材料、積層材 料:成型材料等用途,亦可藉由與表氯醇(epichi〇r〇hydr in) 進行反應而製作成錢樹脂(以下,簡稱源自本發明之苯紛 系化合物之被氧樹脂)。再者,亦可製作成使用此等之硬化 物。如此方式所得之環氧樹脂,係在將材料在半導體元件 上加工時的流動性良好者,由於熱硬化後可獲得良好的機 故適合作為半導體元件用的密封材料或底部填 充材料使用。 ^ 將本發明之第1及/或第2苯紛系化合物與環氧樹 =較:圭為與源自本發明之苯酚系化合物之環氧樹脂混 。P可製得環氧樹脂組成物。又,在此環氧樹脂組成物 中士亦可添加硬化促進劑或其他添加劑。如此方式所得環 氧树月曰組成物’係在將材料在半導體元件上加工時的流動 322229 30 201113245 性良好者,由於熱硬化後可得 '作為半導體元件用的封止材料特性之故,適合 . 作Ah i 絲部填騎料使用。 作為添加於本發明之第丨及/或 ro ,氧樹脂而言,較佳為源自本發明之笨-° 之裱 氧樹脂’惟作為源自本發明之=土化合物之前述環 外的環氧樹於而古,I你丨與.糸化合物之環氧樹脂以25 322229 S 201113245 Viscosity meter (manufactured by Toki Sangyo Co., Ltd.) The sample of the phenol-based compound of the present invention is measured at a sample temperature of 5 (rc) to obtain a rotational viscosity of 0.1 to 100 Pa.s, preferably 80 Pa. s or less, more preferably 7 〇pa: s or less, preferably 60 Pa·s or less, preferably 〇〇1 to 8 〇pa · s, more preferably o. oi to 70 Pa.s, more preferably 〇1 to 6〇Pa s, then preferably ^ to 5Pa· s' is better for 〇.1 to 2pa. s mode adjustment. The method of adjustment is as described above, which can be exemplified: And/or the present formic acid, more preferably benzoquinone, as the aromatic compound in the present invention, the molar number of the aromatic acid compound in the present invention is preferably adjusted to the molar number of the formic acid in the present invention. 0. 1 to 3 〇 Moer's more tuned to (U to 2.0 Moules, and then better adjusted to 〇41〇 Mo Er others, as is well known in the art, as commonly known in the art, for example The general formula „ „ indicates the distribution of the number of repetitions of the early number or the general formula (2) indicates that the distribution of the number of complex elements of the 4 is narrowed; or财 丨 全部 全部 全部 〇 〇 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 The number average molecular weight of the compound of the compound of the present invention is preferably _ to coffee, more preferably 450 观点, from the viewpoint that the rotational viscosity obtained by the £-type viscometer can be within the above preferred range. 01至100Pa · The rotational viscosity of the benzoin compound of the present invention is 0. 01 to 100 Pa. In the range of s, it will be in a liquid state at a temperature of 50 °c at a temperature of 50 °c (in detail, at a sample temperature of 5 (a state in which it is not crystallized under rc), the present invention will be used. The phenolic novolac resin which is a phenolic compound is excellent in fluidity when it is processed on a semiconductor element, and is suitable as a sealing material or an underfill material for a semiconductor element. [The second phenolic compound of the present invention] this invention The second phenol-based compound has the following repeating unit as a main constituent unit: '- a condensation of a phenol residue derived from the phenol derived from the present invention with an aromatic aldehyde residue derived from the aromatic aldehyde of the present invention a repeating unit represented by the general formula (1); and a repeating unit represented by the general formula (2) obtained by condensing a phenol residue derived from phenol of the present invention with formaldehyde derived from the present invention, and usually The residue represented by the general formula (3) derived from the phenol residue of the phenol in the present invention is composed of both terminals. Thus, the description of the phenol and the phenol of the present invention is also applicable to the general formula (1). R1 and a in the repeating unit represented by (4) and (5), the repeating unit MRid of the general formula (2), and R4 and e in the repeating unit represented by the general formula (3), and the aromatic in the above-described invention The descriptions of R8, b and c of the aldehyde are also applicable to R2, b and c in the repeating unit represented by the general formula (1), and the description of the above-mentioned formaldehyde in the present invention is also applicable to the repeating unit represented by the general formula (2). Formaldehyde residue. 27 322229 201113245 A preferred method for producing the second compound of the present invention is the same as the preferred method for producing the first benzene material or compound of the present invention. The phenol-based compound of the present invention can be reacted with the benzophenone of the present invention, the aromatic aryl group of the present invention and/or the hydrazine of the present invention, without departing from the effects of the present invention. A residue derived from an octane compound which is capable of undergoing a polycondensation reaction. For such a repeating unit, n enumerates residues derived from the following compounds: 4,4,-bis(methylmethyl)biphenyl, 4,4,-dichloromethyl), stupid, U-double (A) Oxymethyl) stupid, 1,4,-bis(chloroindenyl)naphthylbenzene. The above-mentioned residue derived from the residue of the other compound is more and more excellent. Among the compounds of the present invention, preferably, the A 5 mol% or less is more preferably 2 mol 〇 / ❶ or less, and more preferably Less than or equal to the ear, and preferably no such residue. Further, it is preferable to adjust the amount of the aromatic acid compound in the present invention, the aromatic acid compound in the present invention, the 曱_ and other compounds in the present invention in such a manner as to be such a content. In the second benzene material and the compound of the present invention, the number average molecular weight is preferably from 0 to 55 Å from the viewpoint of ensuring a low degree of aeronautical. Here, the number average molecular weight is illustrated in the example. From the viewpoint of ensuring a low point at 5 (TC), the second benzoate compound of the present invention is the rotation point of the second benzene (tetra) compound of the present invention obtained by the E-type viscometer in the fifth generation. (The use of a meter (manufactured by Toki Sangyo Co., Ltd.) to measure a sample of about 12 ml at a sample temperature and obtain a rotational viscosity) of 0 to 01 to 100 Pa · s. The second benzene of the present invention. The compound was subjected to a rotational viscosity obtained by an E-type adhesive 322229 28 201113245 degree at 5 〇t (using an E-type viscometer (manufactured by Toki Sangyo Co., Ltd.) to measure a sample of about 1.2 ml at a sample temperature of 50 ° C. 01至80Pa. s, more preferably 0. 01. The value of the value of the rotational viscosity is preferably 80 Pa. s or less, more preferably 70 Pa. s or less, more preferably 60 Pa · s or less, preferably 0.01 to 80 Pa. s, more preferably 0.11.至更优选为为0. 1至2Pa。 s, preferably 0. 1 to 2Pa. s. The method of adjustment is as described above, for example, to 70 Pa · s. Preferably, benzaldehyde and/or benzaldehyde is selected, and benzaldehyde is more preferably selected as the aromatic aldehyde compound in the present invention, relative to the molar number of furfural in the present invention.至1.1至1. The first embodiment of the present invention is more preferably adjusted to 0. 1 to 1. 0 or other, as is well known in the art, for example, a distribution of the number of repeating units represented by the general formula (1) as described above or a repeating unit represented by the general formula (2) The distribution of the number is narrowed in the direction of the narrowing; or the phenolic compound of the present invention is adjusted so that all the aldehydes are added in an amount of from 0.01 to 0.4 mol per gram of the phenol in the present invention. The number average molecular weight of the second phenolic compound of the present invention obtained by the E-type viscosity meter at 50 ° C can be carried out in the following manner as in the case of the first phenolic compound of the present invention: The number of moles of the aromatic aldehyde compound in the present invention is adjusted with respect to the molar number of furfural in the present invention; or the like, as is well known in the art, for example, to enable The distribution or general formula of the number of repeating units represented by the general formula (1) (2) adjusting the direction in which the distribution of the number of repeating units is narrowed; or adjusting according to the method of adding 29 322229 201113245 to the wire of the present invention to make the whole material class Q Q1u.4 Moh Adjusting the average molecular weight of the benzene-aged compound of the present invention. Due to the second benzoin compound of the present invention, the rotational viscosity obtained by the E-type viscometer in the 5th generation is in the range of 〇〇1 to ι〇〇ρ& In the range, when the liquid state is exhibited at 50 C (in the state where the sample temperature is not crystallized at 5 ° C), the second benzene compound of the present invention will be used. The stupid varnish resin is particularly good in the W-movement which is added to the semiconductor element, and thus can be suitably used as a sealing material or an underfill material for a semiconductor. 1st, the first and/or second benzoquinone-based compound obtained in the present invention can be directly used as a curing agent for the fluorene tree, and can be used for a binder, a coating material, a laminate material, a molding material, or the like. It is produced by reacting with epichlorohydrin (hereinafter referred to as an oxy-resin derived from the benzene compound of the present invention). Further, it is also possible to use a hardened material such as this. The epoxy resin obtained in this manner is excellent in fluidity when the material is processed on a semiconductor element, and is preferably used as a sealing material or a bottom filling material for a semiconductor element because it is excellent in heat curing. ^ The first and/or second benzophenone compound of the present invention is mixed with an epoxy resin which is derived from an epoxy resin derived from the phenol compound of the present invention. P can produce an epoxy resin composition. Further, in the epoxy resin composition, a hardening accelerator or other additives may be added to the sergeant. The epoxy eucalyptus composition obtained in this manner is suitable for the flow of the material on the semiconductor element 322229 30 201113245, and it is suitable for the characteristics of the sealing material for the semiconductor element after the heat curing. Use as an Ah i silk filling material. As the oxime and/or ro added to the present invention, the oxygen resin is preferably a stupid-oxygen resin derived from the present invention as the ring outside the aforementioned ring derived from the soil compound of the present invention. Oxygen trees are ancient and ancient, I
型環氧樹脂:曱:酚醛生二雙酚A型環氧樹脂、雙酚F f氧樹脂、笨驗麟清漆型 %氧樹月曰、三酚基曱烷型環氧 1 水甘油基喊型環氧樹月,、端匕廿:聯本型環氧樹脂等縮 、、w^ 細㈣縣旨、縮水甘 ==氧樹脂、函化環氧樹脂等環氧樹脂等i分子中 用 個以上之環氧樹脂。此等環氧樹脂卿 上使用時’均不會有任何問題。前述環氧 樹脂以外之較佳環氧樹脂而古 产4 姐° 使衣軋紂脂組成物低黏 ==看,可例舉:、於25t下為液體狀態的雙紛A 衣、曰⑨25C下為液體狀態的雙紛F型環氧樹脂。 由於含有源自本發明之苯盼系化合物之環氧樹脂與驗 树脂(惟’本發明之第1及/或第2苯盼系化合物則除外) 之環氧樹脂組成物,係環氧樹脂的黏度為低之故,從環氧 樹脂組成物的黏度亦低之觀點來看較佳。此環氧樹脂組成 物所使狀⑽脂’適合者可例舉:苯_搭清漆樹脂、 甲紛祕清漆樹脂、苯料縣樹脂、聯苯技基樹脂、 *萘酴祕清漆樹脂、腰果(cashew)祕清漆樹脂、稀丙基 苯酴祕清漆樹脂’而更佳為苯㈣酸清漆樹脂、〒齡酚 盤清漆樹脂、苯紛芳燒基樹脂、聯苯芳炫基樹脂、稀丙基 322229 31 201113245 =_清,脂,再佳為笨紛_清漆•一 基樹脂、聯笨芳烷基樹紙5笨酚芳烷 前述硬化促進劑而言漆樹脂。 明之第1及/或第2笨_,合:=:=:本發 二:_#卜前述硬化促_而言'例舉 化合物及其硼鹽、三級 举有機膦 基硼鹽等,惟其中,從硬、’ J"、咪唑類以及其四苯 較佳為於二面或低峨 一 υ卜馮液體狀態的2-乙基-4-甲基咪唑。 行反:第2笨紛系化合物與表氣醇進 __中添===言二:於該苯盼 :等^金屬虱氧化物的存在下,在5Q至15代,較佳為在 主 C的範圍進行1至1〇小時左右之反應之方法。此 =相對於該祕祕清漆樹脂的祕當量,表氯醇的使 置^ 2至15倍莫耳,較佳為2至10倍莫耳。又,相對 於該苯紛祕清漆樹脂馳基當量,所使狀驗金屬氫氧 化物的使用量為〇· 8至I 2倍莫耳,較佳為0.9至LU立 莫耳:就反應後的後處理而言,反應結束後,藉由將過剩 ,表氣醇加以蒸餾去除,並將殘留物溶解於甲基異丁基酮 等有機岭劑中,過濾並水洗以去除無機鹽,接著,餾除有 機溶劑’即可製得目的之環氧樹脂。 肪可藉由將如此方式所得源自本發明之苯酚系化合物之 ¥氧樹脂與-般的祕祕清漆樹脂混合,製得環氧樹脂 、、且成物。又,亦可藉由將由上述所得本發明之第丨及/或第 32 322229 201113245 、2苯_化合物與表氣醇進行反應而得之源自本發明之苯 =化合物之環氧樹脂、與本發明之第丨I或第2苯驗系 . 化合物混合,製得環氧樹脂組成物。 於環氧樹脂組成物中’可依需要而添加&機填充材 =脫模劑、著色劑、偶合劑、阻燃劑等。特於 +導體密封用途時,從提升熱傳導性之觀點來看,較佳為 f機填充材料。此種無機填充材料的例子而言,可舉:非 ^曰性二氧切、結晶性二氧切、氧化銘、㈣辦、碳酸 A、滑石、雲母、硫酸鋇等’惟特佳為非級二氧化石夕、 Γ晶性二氧切等。又,此等添加劑的調配比例,可與周 °的半導體密封用環氧樹脂組成物中之比例相同。 2體密封材料而言,有將半導體轉與電路基板的 間隙及别述半導體元件的周圍加以密封之 ==件與電路基板的間隙加以密封之密封材料i。 」疋後者’則—般簡稱為底部填充材料。於本發明中, 充材料’而密封材料’可為液狀、糊膏(_) ,或片劑(tablet)形狀等固體狀。 藉由使上述之環氧樹脂組成物,例如,在⑽至⑽ :進仃反應錢其硬化,即可製得環氧樹脂硬化物。又, 用上柄氧樹脂組成物㈣半導體而成之半導 述方法製得:使由上述環氧樹脂組辑^ U真充材料流人前述半導體與電路基板的間隙樹 成物硬化之方法,或使由上述環氧樹脂組成物;= 封材料流入前述半導體與電路基板的間隙及前述半導= 322229 33 201113245 圍並使環氧樹脂組成物硬化之方法。 於本發明中,半導體元件的密封,係指:包含使底部 填充材料流入半導體與電路基板的間隙之步驟、與使底部 填充材料進行硬化之步驟者;或包含於半導體元件與電路 基材的間隙及於前述半導體周圍注入密封材料之步驟、與 使密封材料進行硬化之步驟者。 [實施例] 以下’舉出實施例及比較例,藉以更具體地說明本發 明内谷。惟本發明並不受此等實施例所限定。又,本文中 之「份」,表示重量份之意。 [實施例1] 於具備有溫度計、饋入/餾出口、冷卻器以及攪拌機 之玻璃製四口燒瓶中,置入鄰烯丙基苯酚670份(5.0莫 耳)、柳搭30. 5份(〇. 25莫耳),並滴入添加作為鹼性觸媒 之25%氫氧化鈉水溶液4〇份,於11〇艽下進行反應18小時 後’冷卻至30°C。使用25%鹽酸水溶液實施中和,添加42% 曱搭水(formalin)i7. 9份(0.25莫耳)、作為酸性觸媒之 25〇/°鹽酸水溶液2. 0份,並在ll(Tc下進行反應4小時。投 入90 C以上的純水500份,並加以水洗。然後升溫至165 °C並脫水’藉由減壓處理以去除未反應成分。所得液狀苯 盼盼酿清漆樹脂於5(TC下之旋轉黏度為3. 2Pa · s。 [實施例2] 於具備有溫度計、饋入/餾出口、冷卻器以及攪拌器 <玻璃製四口燒瓶中,置入鄰烯丙基苯酚670份(5.0莫 34 322229 201113245 耳)、柳Ik 3 0. 5份(〇. 2 5莫耳),並滴入添加作為驗性觸媒 之25%氫氧化鈉水溶液40份,於ii(Tc下進行反應18小時 •.後’冷卻至30°C。使用25%鹽酸水溶液實施中和,添力σ 42% - 甲路水17. 9份(0. 25莫耳)、作為酸性觸媒之草酸6. γ份, 並在110°C下進行反應10小時。投入9〇。(:以上的純水5〇〇 份,並加以水洗。然後升溫至165。(:並脫水,藉由減壓處 理以去除未反應成分。所得液狀苯酚酚醛清漆樹脂於5〇〇c 下之旋轉黏度為4. OPa . s。 [實施例3] 於具備有溫度計、饋入/餾出口、冷卻器以及搜拌器 之玻璃製四口燒瓶中,添加鄰烯丙基苯酚670份(5. 0莫 耳)、42%曱醛水17. 9份(0. 25莫耳)、作為酸性觸媒之草 酸6. 7份,於l〇〇°c下進行反應8小時後,冷卻至3〇。〇。 然後,滴入添加柳醛30. 5份(0. 25莫耳)、作為鹼性觸媒 之25%氫氧化鈉水溶液60份,並在11 〇°c下進行反應!8 小時’使用25%鹽酸水溶液實施中和,投入9(TC以上的純 水500份,並加以水洗。然後升溫至165°C並脫水,藉由 減壓處理以去除未反應成分。所得液狀苯紛酚醒清漆樹月旨 於50°C下之旋轉黏度為4. 3Pa . s。 [實施例4至7] 除表1及2中所示者以外,其餘則按與實施例1同樣 方式實施。 [實施例8] 於具備有溫度計、饋入/餾出口、冷卻器以及攪拌機 35 322229 201113245 之玻璃製四口燒瓶中,置入鄰烯丙基苯酚670份(5.〇莫 耳)、柳醛18. 3份(0· 15莫耳),並滴入添加作為酸性觸媒 之25%鹽酸水溶液134份,於110°C下進行反應30小時後, 冷卻至30°C。然後,添加42%曱醛水25份(0. 35莫耳), 於100°C下進行反應24小時。於反應生成物中,發現未反 應的柳醛殘留有12%(0. 018莫耳)。 於反應生成物中’投入90°C以上的純水500份,並力口 以水洗。然後,升溫至165°C並脫水,藉由減壓處理以去 除未反應成分。所得液狀苯紛盼酸清漆樹脂於5〇 t下之旋 轉黏度為0. 5Pa · s。 [實施例9] 於具備有溫度計、饋入/餾出口、冷卻器以及授摔器 之玻璃製四口燒瓶中,添加鄰烯丙基笨酚629. 8份(4 7莫 耳)、苯曱酸 38. 5份(0. 36份)’並滴入添加作為驗性觸媒 之50%氳氧化鈉水溶液28. 8份,於1351下進行反鹿18 小時後’冷卻至30°C。使用25%鹽酸水溶液實施中和,添 加42%甲醛水8· 6份(0.12莫耳),作為酸性觸媒之25%: 酸水溶液1.0份’並在l〇〇°C下進行反應1〇小時,再产^ 用2 5 %氫氧化鈉水溶液實施中和,投入9 0 °C以上的純水5 〇 〇 份’並加以水洗。然後升溫至165°C並脫水,藉由減壓户 理以去除未反應成分。所得液狀苯酚酚醛清漆樹脂於 下之旋轉黏度為1. 〇3Pa · s。 [實施例10至13 ] 除表3中所示者以外’其餘則按與實施例9同樣方式 322229 36 201113245 實施。 ' [比較例1] 於f備有溫度計、饋入/鶴出口、冷卻器以及授拌器 之玻璃製四口燒瓶中’添加鄰烯丙基祕㈣份(5 〇莫 ^ W水Π.9軌25料),料雜觸媒之 酉:6.7份,於航下進行反應5小時,投入耽以上的 純水500份,並加以水洗1後升溫至靴並脫水 t減壓處㈣去除未反應齡。轉⑽麵祕清漆; 脂於50 C下之旋轉黏度為〇. ipa · s。 ' [比較例2 ] 除表4中所示者以外, 實施。 其餘則按與實施例1同樣方式 根據先前技術文獻2的實施例,進行聚烯 (polyalkenyl)化合物(參(羥基烯丙基笨基)曱烷型笨酚 酸·清漆樹脂)之合成。 〈參(羥基苯基)曱烷型苯酚酚醛清漆樹脂之合成> 於具備有溫度計、饋入/潑出口、冷卻器以及授掉機 之玻璃製四口燒瓶中,置入苯酚400份(4· 26莫耳)·柳/ 47. 2份(0. 38莫耳)、以及對甲苯磺酸1份,於氮氣氣流^ 在130°C下進行反應’並冷卻至95Ϊ。於25%氫氧化納1^ 溶液中進行中和後’投入90°C以上的純水4〇〇份,並力口、 水洗。然後,將内溫升溫至150°C,藉由減壓_噴蒸汽口从 (steaming)處理以去除未反應成分。所得樹脂為固體,於 150°C 下之溶化黏度(melt viscosity)為 〇 9pa · s。 322229 37 201113245 [比較例3] 〈參(經基稀丙基苯基)甲燒型苯齡酴酿清漆樹脂之合成〉 於’、備有/皿度冲、饋入/館出口、冷卻器以及攪拌機 之玻璃製四口燒瓶中,置人上述中所製造之參(㈣苯基) 甲烧型笨盼祕清漆樹脂⑽份、2-丙醇250份,並進行 檀摔至均勻為止之後,置入氫氧化納40. 7份(1.02莫耳), 再持續㈣1小時。耗費1〇分鐘滴入添加氯化婦丙基796 份(1_02莫耳)後,在阶下進行反應5小時以完成稀丙 基謎化。去除2-丙醇之後,投人赃以上的純水5〇〇份, 將所田產生之食鹽加以水洗。升溫至19『c為止,並脫水, 持續櫈拌6小時,藉以實施克萊森重排(Claisen rearrangement)。所得之樹脂為半固體,於5〇(5(:下之旋轉 黏度為170Pa · s以上者。 [比較例4 ] 於具備有溫度計、饋入/餾出口、冷卻器以及攪拌機 之玻璃製四口燒瓶中,置入鄰烯丙基苯酚629. 8份(4 7莫 耳)、苯曱醛51.4份(〇· 49莫耳),並滴入添加作為鹼性觸 媒之25%氫氧化鈉水溶液77·6份,於135。(:下進行反應18 小時後’冷卻至30°C ’使用25%鹽酸水溶液實施中和,投 入90°C以上的純水5〇〇份,並加以水洗。然後升溫至165 C並脫水’藉由減壓處理以去除未反應成分。所得液狀苯 紛盼酸清漆樹脂於5〇。(:下之旋轉黏度為12. 6Pa · s。 於本發明中所得苯酚系化合物及硬化劑的分析方法, 為如下所述者。 38 322229 201113245 、 ⑴於5(TC下之由e型黏度計所得之點度 • E型黏度計乃使用東機產業公司製TVH型。 ..將試樣約^裝入E型黏度計所附的杯子(cup),並 將:匕杯子以〆皿度5〇c設置在怪溫槽兼送液裝置(加心公 司製 F25-MP)。 …·使用E型黏度計以開始上述試料的旋轉黏度之測量, 並項取田疑轉黏度的指示值穩定時的旋轉黏度的數值。表 中’將該值記載於「E型黏度」的項目。 (2)〇H當量 (概要·使用乙酿氣以進行乙醯化,將過剩的乙酿氯使 用水加以分解,並使用驗以進行滴定之方法) •精確秤取試樣lg,並添加i,4_二极舰使其溶解。 ^確'^'合解後,添加1. 5莫耳/公升之乙醯氣/無水甲笨 〉谷液lOinl,並冷卻至q°c。 •添加吡啶(pyridine)2mi,於6〇±rc的水浴中進行反 應1小時。 .反應後加以冷卻,並添加純水25ml後充分混合,藉以 分解乙醯氯。 •添加丙酮 25ml、及盼酿(phenolphthalein)。 .使用1莫耳/公升的氫氧化鉀水溶液,滴定至試樣溶液 呈現紅紫色為止。 .對空白(blank,無試樣)者,按上述操作同時進行測定。 藉由下述式計算以求得0H當量。 0H 當量[g/eq. ] = (l〇〇〇xW)/(fx(B-A)) 322229 39 201113245 此中,W、f、B、A,各為如下所述。 W.试樣重量[g] f : 1莫耳/公升的氫氧化鉀水溶液的因數=1. 002Epoxy resin: 曱: phenolic dibisphenol A epoxy resin, bisphenol F f oxy resin, stupid varnish type % Oxygen erythraea, trisphenol decane type epoxy 1 glyceryl screaming type Epoxy tree month, end 匕廿: conjugated epoxy resin, etc., w^ fine (four) county purpose, shrinking water == oxygen resin, functional epoxy resin, etc. Epoxy resin. There is no problem with these epoxy resins when used. The preferred epoxy resin other than the above epoxy resin and the ancient product 4 sister ° make the clothing rolling rouge composition low viscosity == look, can be exemplified: in 25t under the liquid state of the double A clothing, 曰 925C A double F-type epoxy resin in a liquid state. An epoxy resin composition containing an epoxy resin derived from the phenpanic compound of the present invention and an epoxy resin (except for the first and/or second benzoin compounds of the present invention) The viscosity is low, and it is preferable from the viewpoint that the viscosity of the epoxy resin composition is also low. The epoxy resin composition may be exemplified by a benzene-setting varnish resin, a viscous varnish resin, a benzene resin, a biphenyl-based resin, a naphthoquinone varnish resin, and a cashew nut ( Cashew) secret varnish resin, propyl benzoquinone varnish resin' and more preferably benzene (tetra) acid varnish resin, phenolic varnish resin, benzene aryl resin, biphenyl aryl resin, propyl 322229 31 201113245 =_clear, fat, and better boring _ varnish • a base resin, phenylene aralkyl paper 5 phenol aralkyl a lacquer resin for the aforementioned hardening accelerator. The first and/or the second stupid _, the combination: =: =: the second hair: _ # 卜 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Among them, from hard, 'J", imidazoles and tetracene thereof are preferably 2-ethyl-4-methylimidazole in a liquid state on both sides or in a lower state. The reverse: the second stupid compound and the gas in the gas into the __中添===言二: in the presence of the benzene: in the presence of metal cerium oxide, in the 5Q to 15 generation, preferably in the main A method in which the range of C is carried out for about 1 to 1 hour. This = relative to the secret equivalent of the secret varnish resin, the amount of epichlorohydrin is from 2 to 15 moles, preferably from 2 to 10 moles. Further, the amount of the metal hydroxide to be used is 〇·8 to I 2 times the molar amount, preferably 0.9 to LU rpm, relative to the benzene varnish resin base equivalent: In the post-treatment, after the reaction is completed, the excess alcohol is distilled off, and the residue is dissolved in an organic ridge agent such as methyl isobutyl ketone, filtered and washed with water to remove inorganic salts, followed by distillation. In addition to the organic solvent, the desired epoxy resin can be obtained. The fat can be obtained by mixing the oxy-resin derived from the phenol-based compound of the present invention with a general secret varnish resin in this manner to obtain an epoxy resin and a product. Further, an epoxy resin derived from the benzene=compound of the present invention obtained by reacting the above-obtained ninth and/or 32 322229 201113245 and 2 benzene compounds of the present invention with a surface alcohol can also be used. Inventive No. I or second benzene test system. Compounds are mixed to obtain an epoxy resin composition. In the epoxy resin composition, 'can be added as needed> machine filler = mold release agent, colorant, coupling agent, flame retardant, and the like. When it is used for the purpose of +conductor sealing, it is preferably a f-machine filling material from the viewpoint of improving thermal conductivity. Examples of such an inorganic filler include non-defective dioxotomy, crystalline dioxotomy, oxidized melody, (four), carbonic acid A, talc, mica, barium sulfate, etc. Oxide dioxide, twinning, etc. Further, the ratio of the additives may be the same as that in the epoxy resin composition for semiconductor sealing. The two-body sealing material includes a sealing material i that seals the gap between the semiconductor and the circuit board and the periphery of the semiconductor element, and seals the gap between the member and the circuit board. The latter is generally referred to as the underfill material. In the present invention, the filling material 'and the sealing material' may be in the form of a solid such as a liquid, a paste (_), or a tablet. The epoxy resin composition can be obtained by, for example, curing the epoxy resin composition, for example, in (10) to (10). Further, a method of semi-conducting a semiconductor resin composition (4) semiconductor is used to obtain a method for hardening a gap between the semiconductor and the circuit substrate by the epoxy resin assembly. Or a method of causing the epoxy resin composition to flow into the gap between the semiconductor and the circuit substrate and the semi-conducting = 322229 33 201113245 and curing the epoxy resin composition. In the present invention, the sealing of the semiconductor element means a step of flowing the underfill material into the gap between the semiconductor and the circuit substrate, and a step of hardening the underfill material; or a gap included in the semiconductor element and the circuit substrate. And a step of injecting a sealing material around the semiconductor and a step of hardening the sealing material. [Examples] Hereinafter, the examples and comparative examples will be described to more specifically illustrate the inner valley of the present invention. However, the invention is not limited by the examples. Also, "parts" in this document means the meaning of parts by weight. [Example 1] In a glass four-necked flask equipped with a thermometer, a feed/distillation port, a cooler, and a stirrer, 670 parts (5.0 mol) of o-allylphenol and 30. 5 parts of 25 25 moles, and 4 parts of a 25% aqueous sodium hydroxide solution added as an alkaline catalyst was added dropwise, and the reaction was carried out at 11 Torr for 18 hours, and then cooled to 30 ° C. 0份下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下下The reaction was carried out for 4 hours, and 500 parts of pure water of 90 C or more was charged and washed with water, and then heated to 165 ° C and dehydrated to remove unreacted components by a reduced pressure treatment. The obtained liquid benzene was varnish resin at 5 (The rotational viscosity at TC was 3.2 Pa·s. [Example 2] O-allylphenol was placed in a four-necked flask equipped with a thermometer, a feed/distillation port, a cooler, and a stirrer. 670 parts (5.0 mo 34 322229 201113245 ears), willow Ik 3 0. 5 parts (〇. 2 5 moles), and added 40 parts of 25% sodium hydroxide solution added as an inert catalyst, at ii (Tc The reaction was carried out for 18 hours. After that, it was cooled to 30 ° C. Neutralization was carried out using a 25% aqueous solution of hydrochloric acid, and the addition force σ 42% - 17.1 parts (0.25 mol), as an acidic catalyst. Oxalic acid 6. γ parts, and the reaction was carried out at 110 ° C for 10 hours, and 9 Torr was added. (: 5 parts of the above pure water was washed with water, and then heated to 165. (: and dehydration, by decompression treatment to remove unreacted components. The obtained liquid phenol novolak resin has a rotational viscosity of 4. OPa.s. [Example 3] 5份(0. 25摩尔) Adding allylic phenol 670 parts (5.0 moles), 42% furfural water 17.9 parts (0. 25 moles) into the glass inlet four-necked flask of the inlet / outlet, the cooler and the mixer. 5份(0. 25摩尔) After the reaction was carried out for 8 hours, the reaction was carried out at a temperature of 3 ° C. After the reaction was carried out for 8 hours. 60 parts of a 25% sodium hydroxide aqueous solution as an alkaline catalyst, and reacted at 11 〇 °c! 8 hours ' neutralized with 25% hydrochloric acid aqueous solution, and put 9 (500 parts of pure water of TC or more, And the viscous viscosity at 50 ° C is 4. 3Pa . s. The viscous viscosity at 50 ° C is 4. 3Pa . s. [Examples 4 to 7] Except for those shown in Tables 1 and 2, the same procedure as in Example 1 was carried out. [Example 8] A thermometer, feed/distillation was provided. Port, cooler and mixer 35 322229 201113245 glass four-necked flask, placed 670 parts of o-allylphenol (5. 〇mol), lysaldehyde 18.3 parts (0·15 mol), and drops 134 parts of a 25% hydrochloric acid aqueous solution added as an acidic catalyst was added, and the reaction was carried out at 110 ° C for 30 hours, and then cooled to 30 ° C. Then, 25 parts of furfural water (25 ml) was added thereto. The reaction was carried out at 100 ° C for 24 hours. In the reaction product, 12% (0. 018 moles) of unreacted salicylaldehyde residue was found. Into the reaction product, 500 parts of pure water of 90 ° C or higher was placed, and the mouth was washed with water. Then, the temperature was raised to 165 ° C and dehydrated, and the unreacted component was removed by a reduced pressure treatment. 5Pa · s. The resulting viscous viscous resin is 0. 5Pa · s. [Example 9] In a glass four-necked flask equipped with a thermometer, a feed/distillation port, a cooler, and a damper, o-allyl phenol 629. 8 parts (4 7 mol), benzoquinone was added. The acid was 38.5 parts (0.36 parts) and was added dropwise to a solution of 28.5% of a 50% aqueous sodium hydroxide solution as an inert catalyst, and after 18 hours of anti-deer under 1351, it was cooled to 30 °C. Neutralization was carried out using a 25% aqueous hydrochloric acid solution, and 8 6 parts of formaldehyde water (8.62 parts) was added as 25% of an acidic catalyst: 1.0 part of an acid aqueous solution and reacted at 1 ° C for 1 hour. The product was neutralized with a 25% aqueous solution of sodium hydroxide, and 5 parts of pure water of 90 ° C or higher was added and washed with water. Then, the temperature was raised to 165 ° C and dehydrated, and the unreacted component was removed by a reduced pressure house. The kinetic viscosity of the obtained liquid phenol novolak resin was 1. 〇3 Pa · s. [Examples 10 to 13] Except for those shown in Table 3, the rest were carried out in the same manner as in Example 9 322229 36 201113245. ' [Comparative Example 1] Adding o-allyl (4) parts to a glass four-necked flask equipped with a thermometer, a feed/heel exit, a cooler, and a stirrer (5 〇 Mo ^ W Π.9 Rail 25 material), material catalyst: 6.7 parts, reacted under air for 5 hours, put 500 parts of pure water above the sputum, and washed with water, then warmed to the boot and dehydrated at the decompression point (4) to remove unreacted age. Turn (10) facial varnish; the rotational viscosity of the fat at 50 C is i. ipa · s. 'Comparative Example 2>> Except as shown in Table 4, it was carried out. The remainder was synthesized in the same manner as in Example 1 according to the example of the prior art document 2, in which a polyalkenyl compound (paraben (hydroxyallylphenyl) decane type phenolic acid varnish resin) was synthesized. <Synthesis of phenol (hydroxyphenyl) decane type phenol novolak resin> 400 parts of phenol was placed in a four-necked glass flask equipped with a thermometer, a feed/spray outlet, a cooler, and a transfer machine (4) · 26 moles · Liu / 47. 2 parts (0.38 moles), and 1 part of p-toluenesulfonic acid, reacted under a nitrogen gas stream at 130 ° C 'cooled to 95 Ϊ. After neutralization in a 25% sodium hydroxide solution, the mixture was poured into 4 parts of pure water at 90 ° C or higher, and washed with water and water. Then, the internal temperature was raised to 150 ° C, and the unreacted component was removed by steaming-steaming. The obtained resin was a solid, and the melt viscosity at 150 ° C was 〇 9 Pa · s. 322229 37 201113245 [Comparative Example 3] <Synthesis of styrene-based styrene resin of benzoate-based styrene resin> In ', with / with a degree of rinsing, feed / hall exit, cooler and In a glass four-necked flask of a stirrer, the ginseng ((tetra)phenyl) which was produced in the above-mentioned manner was placed in a (10) part of a styrofoam resin and 250 parts of 2-propanol, and after the sandalization was evenly distributed, Into the sodium hydroxide 40. 7 parts (1.02 mol), and then continue (four) 1 hour. After adding 796 parts of propyl propyl fluoride (1_02 mol) dropwise for 1 minute, the reaction was carried out for 5 hours under the step to complete the dilute propyl mystery. After the 2-propanol was removed, 5 parts of the pure water above the cockroach was poured, and the salt produced in the field was washed with water. The temperature was raised to 19 °c, dehydrated, and the bench was mixed for 6 hours to implement Claisen rearrangement. The obtained resin was semi-solid, and it was 5 〇 (5 (: the rotational viscosity was 170 Pa · s or more. [Comparative Example 4 ] The glass was provided with a thermometer, a feed/distillation port, a cooler, and a stirrer. In the flask, 629. 8 parts (4 7 moles), 51.4 parts of phenylfurfural (〇·49 moles) were placed, and a 25% aqueous sodium hydroxide solution added as an alkaline catalyst was added dropwise. 77·6 parts, at 135. (: After performing the reaction for 18 hours, 'cooling to 30 ° C', neutralization was carried out using a 25% aqueous hydrochloric acid solution, and 5 parts of pure water at 90 ° C or higher was added and washed with water. The temperature is raised to 165 C and dehydrated. The unreacted component is removed by a reduced pressure. The obtained liquid benzene is expected to have a varnish resin at 5 Å. (The rotational viscosity is 12.6 Pa · s. The phenol obtained in the present invention. The analysis method of the compound and the hardener is as follows: 38 322229 201113245, (1) The point obtained by the e-type viscometer at 5 (TC) The E-type viscometer is a TVH type manufactured by Toki Sangyo Co., Ltd. .. put the sample into the cup attached to the E-type viscometer, and put: 匕 cup to the cup 5 c Set in the strange temperature tank and liquid feeding device (F25-MP made by Jiaxin Company). · Use the E-type viscometer to start the measurement of the rotational viscosity of the above sample, and when the indication value of the suspected turning viscosity is stable The value of the rotational viscosity. In the table, 'this value is listed in the item of "E-type viscosity". (2) 〇H equivalent (summary) Use ethane to make acetonitrile, and use excess B chlorine to decompose with water. And use the test to perform the titration method) • Accurately weigh the sample lg, and add the i, 4_ dipole ship to dissolve it. ^ After the '^' solution, add 1.5 m / liter of B Helium/anhydrous sulphate> sulphate lOinl and cooled to q°c. • Add pyridine 2mi and react in a water bath of 6〇±rc for 1 hour. Cool down after reaction and add 25ml of pure water. After thoroughly mixing, it is used to decompose acetonitrile. • Add 25 ml of acetone and phenolphthalein. Use 1 mol/L of potassium hydroxide solution and titrate until the sample solution is reddish purple. If there is no sample, perform the measurement at the same time as above. Calculated by the following formula 0H equivalent is obtained. 0H equivalent [g/eq.] = (l〇〇〇xW)/(fx(BA)) 322229 39 201113245 Here, W, f, B, and A are each as follows. Sample weight [g] f : 1 mol / liter of potassium hydroxide aqueous solution factor = 1. 002
B :空白測定中所耗費之1莫耳/公升的氫氧化鉀水溶 液的量[ml J A:試料測定中所耗費之1莫耳/公升的氫氧化鉀水溶 液的量[ml ] (3)吸水率之測定 •於模具中,於15(TC下使其硬化5小時,於18〇。(:下使 其硬化8小時,以進行試樣之成型。 尺寸;(Φ50±1)χ(3±0·2)(直徑X厚度;随) •將試樣表面擦拭乾淨’並測定試樣重量。 .將試樣置入100ml的試樣瓶中,並添加純水8〇ml。 .於95°C之熱風循環式乾燥器中,使其吸水24小時。 然後’ k乾燥益取出,浸潰於低溫怪溫水槽 為 25X:。 •冷卻後,將表面所附著之水分擦拭乾淨,並測定重量。 •依下式計算,以求出吸水率(water absQrpti〇n)。 吸水率[%K(B-A)/A)xl〇〇 A .吸水前重量[g] B:吸水後重量[g] (4)玻璃轉移溫度(Tg)之測定 於模具令於15〇〇C下使其硬化5小時並於雜下 <、tM、時之試料’切割成下述尺寸以製作試樣。 322229 40 201113245 尺寸:(50土1)x(40±1)x(l〇〇±l)(縱向X橫向X高度;mm) •測定裝置,將试樣設置於TMA_60(島津(SHIMADZU)製), • 並在N2(氮氣)環境下進行測定。 • .升溫速度;按3^/分鐘之速度測定至350。(:,以求出 反曲點(inflection point)之溫度,作為玻璃轉移溫度 (Tg)。 (5) 膠化時間(gei time)之測定 .將表5至8所記載之環氧樹脂組成物置入試管内,並 /又/貝於150 C的油浴(01i bath)中,按1秒鐘1次的間隔 使用玻璃棒攪拌前述環氧樹脂組成物。測量前述攪拌的阻 力增大之時間作為膠化時間。 (6) 硬化物機械特性(彈性率、位移、強度(應力》之測定 •將經於模具中於丨5〇。(:下使其硬化5小時並於180°C下 使其硬化8小時之試料,切割成下述尺寸以製作試樣。 尺寸:(75±l)x(6±l)x(4±l)(縱向X橫向x厚度;匪) ’則疋襄置’自動綠圖機(aut〇graph)(型號:AG-5000D島 津製) 機頭速度(head speed) : 2. Omm/分鐘,2點間距離: 〇随1於至溫下實施壓縮彎曲試驗(c〇mpressi〇n bending test)。 (7) 數平均分子量之測定 按下述條件,實施凝膠滲透層析(GPC),以求數平均分 子量(Μη)。 *農置:東曹公司製凝膠滲透層析儀(HLC-8020) 41 322229 201113245B: the amount of 1 mol/liter potassium hydroxide aqueous solution consumed in the blank measurement [ml JA: the amount of 1 mol/liter potassium hydroxide aqueous solution consumed in the measurement of the sample [ml] (3) water absorption rate Determination • In the mold, harden it at 15 (TC for 5 hours at 18 〇. (: Let it harden for 8 hours to form the sample. Size; (Φ50 ± 1) χ (3 ± 0 · 2) (diameter X thickness; with) • Wipe the surface of the sample cleanly and measure the weight of the sample. Place the sample in a 100 ml sample vial and add 8 μl of pure water. At 95 ° C In the hot air circulation drier, let it absorb water for 24 hours. Then 'k dry and take out, soak it in the low temperature strange temperature water tank for 25X:. • After cooling, wipe off the moisture attached to the surface and measure the weight. Calculate according to the following formula to determine the water absorption rate (water absQrpti〇n). Water absorption rate [%K(BA)/A)xl〇〇A. Weight before water absorption [g] B: Weight after water absorption [g] (4) The measurement of the glass transition temperature (Tg) was carried out by hardening the mold at 15 ° C for 5 hours, and the sample of the <, tM, time was cut into the following dimensions to prepare a sample. 40 201113245 Dimensions: (50 soil 1) x (40 ± 1) x (l 〇〇 ± l) (longitudinal X lateral X height; mm) • Measuring device, set the sample to TMA_60 (Shimadzu (Shimadzu)) • Measured in a N2 (nitrogen) environment. • Temperature rise rate; measured at a rate of 3^/min to 350. (:, to find the temperature of the inflection point as the glass transition temperature (Tg) (5) Determination of gelation time (gei time). Put the epoxy resin composition described in Tables 5 to 8 into a test tube, and / / / in a 150 C oil bath (01i bath), press 1 The epoxy resin composition was stirred at intervals of one second using a glass rod. The time during which the resistance of the agitation was increased was measured as the gelation time. (6) Mechanical properties of the cured product (elasticity, displacement, strength (stress) measurement • The sample was subjected to 丨5〇 in a mold. (: The sample was allowed to harden for 5 hours and hardened at 180 ° C for 8 hours, and cut into the following dimensions to prepare a sample. Size: (75 ± l) x(6±l)x(4±l) (longitudinal X transverse x thickness; 匪) 'There is an automatic green machine (aut〇graph) (Model: AG-5000D Shimadzu) Head speed: 2. Omm/min, distance between 2 o'clock: 〇Computed with a compression bending test (c〇mpressi〇n bending test). (7) Determination of the number average molecular weight Under the conditions described, gel permeation chromatography (GPC) was carried out to obtain a number average molecular weight (??). *Nongfang: Gelto Permeation Chromatograph (HLC-8020) made by Tosoh Corporation 41 322229 201113245
.管柱(column);串聯方式連結東曹公司製TSKgel G2000HxL 4 支、G3000HxL 及 G4000HxL 各 1 支 •溶析液;四氫呋喃 •溶析液流量;1. 〇ml/分鐘 •管柱溫度;40°C •偵測方法;可見光偵測器(UV(紫外光)) .校準曲線;使用標準聚笨乙烯物質以製作者 將於實施例及比較例中之苯酚系化合物的合成條件、 及所得笨酚系化合物的性狀表示於表1至4中。 又,於表1至4中,n/m構成比例乃表示一般式(1)表 示之重複單元數/一般式(2)表示之重複單元數,亦即,本 發明中之芳香族醛化合物的莫耳數/本發明中之曱醛的莫 耳數。 、 表4中 。— 黏度為固體及半固體’乃表示由於在 C下笨酚系化合物未溶解之故,無法測定黏度之意。 以貫施例及比較例所得苯盼系化合物作為硬化劑,並 氧樹脂及硬化促進劑而製得環氧樹脂組成物。前述 衣氧樹月曰而言,使用日本環氧樹脂 ==!液::氧樹脂,環氧當量—述 甲美^ 。 國化成(股)製2舰(2~乙基-4- 甲土心坐)。前述環氧樹脂組成物 =:,笨__的_量成:::: 將則述環氧樹脂組成物加熱至15(TC後加以炫融 322229 42 201113245 混合,真空去泡後澆鑄於經加熱至l5(rc之模具中,在15〇 使其硬化5小時’在180X:下使其硬化8小時,而製 得環氧樹月旨硬化物。將所得環氧樹脂硬化物的調配及物性 特性’合併表示於表5至8中。 於表5至8中,α 1為在玻壤轉移溫度(Tg)以下的溫度 夺的線%脹係數’而α 2為在玻填轉移溫度(Tg)以上時的線 膨脹係數。於表5至8中,位移係在壓縮彎曲試驗中的試 樣發生斷裂時的位移,而強度係在壓縮彎曲試驗中的應力。 [表1] f~·' ~----_ , 實施例1 實施例2 實施例3 實施例4 合成條件 苯酚化合物 (mol) 鄰烯丙基苯酚 (5.00) 鄰烯丙基笨酚 (5. 00) 鄰烯丙基苯酚 (5.00) 鄰烯丙基苯酚 (5. 00) 芳香族醛化合 物(mol) 柳醛(0. 25) 柳醛(0· 25) 柳醛(0. 25) 柳醛(0. 35) 曱搭(mol) 42%甲醛水 (0.25) 42%甲醛水 (0.25) 42%甲醛水 (0.25) 42%甲醛水 (0.15) 鹼性觸媒種類 氫氧化鈉 氪氧化鈉 氫氧化納 氫氧化鈉 酸觸媒種類 鹽酸 草酸 草酸 鹽酸 n/m構成比例 1.0 1.0 1.0 2.33 性狀 E型黏度 (Pa · s/50°C) 3.2 4.0 4.3 58.1 0H當量 (g/eq) 150 152 142 152 數平均分子量 (-) 500 514 518 549 43 322229 — 實施例5 實施例6 實;^例7 實施例8 合成條件 苯酚化合物 (mol) 鄰烯丙基^" (5.00) 鄰婦丙基苯紛 (4.70) 鄰婦丙基苯齡 (7.50) 鄰烯丙基苯酚 (5. 00) 芳香族裕化合 物(mol) 柳醛(0.15) 柳醛(0· 24) 柳醛(0. 35) 柳酸(0· 15) 曱醛(mol) 42%甲醛水 (0. 35) 42%甲醛水 (0. 25) 42%甲醛水 (0.15) 42%甲醛水 (0. 35) 鹼性觸媒種類 氫氧化鈉^ 氫氧化鈉 氫氧化納 一 酸觸媒種類 鹽酸 鹽酸 鹽酸 鹽酸 n/m構成比例 0.43 0.94 2. 33 0.43 性狀 E型黏度 (Pa · s/50°C) 0.6 3.0 20.0 0.5 0H當量 (g/eq) 171 151 151 166 數平均分羊量 (-) 480 507 510 479 201113245 [表2] [表3] 實施例9 實施例10 實施例11 實施例12 實施例13 合成條件 苯酚化合物 (mol) 鄰烯丙基苯 酚(4.70) 鄰烯丙基苯 酚(4.70) 鄰烯丙基苯 酚(5.00) 鄰烯丙基笨 酚(4.50) 鄰烯丙基笨 酚(3.75) 芳香族醛化 合物(mol) 笨曱醛 (0. 36) 苯曱醛 (0.24) 苯曱醛 (0.25) 苯甲醛 (0.25) 苯甲醛 (0.25) 甲醛(mol) 42%曱醛水 (0.12) 42¾甲醛水 (0.25) 42%曱醛水 (0.25) 42%甲醛水 (0.25) 42%甲醛水_ (0.25) 鹼性觸媒種 類 氫氧化鈉 氪氧化納 氫氧化納 氣氧化納 氫氧化鈉 酸觸媒種類 鹽酸 鹽酸 草酸 草酸 草酸 n/m構成 比例 3.0 0. 94 1.0 1.0 1.0 性狀 E型黏度 (Pa-s/50°C) 1.03 0.49 0.45 0.46 0.63 OH當量 (g/eq) 183 166 168 166 168 數平均分子 量㈠ 502 489 504 503 518 44 322229 201113245 [表4] 比較例1 比較例2 比較例3 比較例4 合成條件 苯酚化合物 (mol) 鄰烯丙基苯酚 (5. 00) 鄰烯丙基苯酚 (5.00) — 鄰烯丙基苯酚 (4. 70) 芳香族醛化合 物(mol) — 柳醛(0. 25) — 笨曱醛(0.36) 甲搭(mol) 42%曱醛水 (0. 25) — — 一 鹼性觸媒種類 — 氫氧化鈉 — 氫氧化鈉 酸觸媒種類 草酸 — — — n/m構成比例 — — — — 性狀 E型黏度 (Pa · s/50°C) 0.1 固體 半固體 12.6 OH當量 (g/eq) 142 134 160 207 數平均分子量 (-) 465 602 608 512 [表5] 實施例1 實施例2 實施例3 實施例4 調配 環氧樹脂(份) 100 100 100 100 苯齡系化合物(份) 80.7 81.7 76.3 81.7 硬化促進劑(份) 0.25 0.25 0.25 0.25 物性 膠化時間 (分/150°C) 10 10 9 9 吸水率(%) 1.5 1.5 1.7 1.4 Tg(°C) 92 92 91 104 a i(ppm) 81 77 86 81 a 2(ppm) 192 192 191 191 彈性率(MPa) 3057 3095 2816 2946 位移(mm) 9 7 10 10 強度(MPa) 117 112 112 118 45 322229 201113245 [表6] 實施例5 實施例6 實施例7 實施例8 調配 環氧樹脂(份) 100 100 100 100 苯酚系化合物(份) 91.9 81.2 81.8 89.3 硬化促進劑(份) 0.25 0.25 0.25 0.50 物性 膠化時間 (分/150°C) 14 10 13 12 吸水率(%) 1.6 1.5 1.4 1.8 Tg(°C) 78 92 98 72 a i(ppm) 84 80 81 67 a 2(ppm) 202 191 193 219 彈性率(MPa) 3085 3040 2981 3153 位移(腿) 5 9 9 8 強度(MPa) 89 115 117 107 [表7] - 實施例9 實施例10 實施例11 實施例12 實施例13 調配 環氧樹脂(份) 100 100 100 100 100 硬化劑(份) 98.4 89.2 90.1 89.2 90.1 2E4MZC%,相對於環氧樹 脂) 0.50 0. 50 0.50 0.50 0.50 物性 膠化時間(分/150°C) 17.2 11.4 11 13 10 吸水率(%) 1.40 1.56 1.47 1.49 1.45 Tg(°C) 102 93 96 96 93 ai(ppm) 71 71 76 75 75 a 2(ppm) 220 187 211 205 214 彈性率(MPa) 2742 2879 2687 2797 2682 位移(mm) 1.7 8.1 8.1 7.9 7.9 強度(MPa) 28 104 103 108 106 46 322229 201113245 [表8 ] 比較例1 比較例2 比較例3 比較例4 調配 環氧樹脂(份) 100 100 100 100 硬化劑(份) 76.3 72.0 89.3 111.3 2Ε4ΜΖ(%,相對於環氧樹 脂) 0.25 0.25 0.50 0. 50 物性 膠化時間(分/150°C) 13 — 12 7. 1 吸水率(%) 1.6 1.5 1.8 1.36 Tg(°C) 67 127 72 104 a:i(ppm) 83 78 67 78 o:2(ppm) 185 184 219 229 彈性率(MPa) 2770 2620 3153 3173 位移(mm) 8 12 8 2.3 強度(MPa) 95 120 107 44 從上述實施例的結果可知,於實施例中所製造之各環 氧樹脂組成物,係有用於作為半導體元件的密封材料或底 部填充材料者。 【圖式簡單說明】 益 【主要元件符號說明】 無 47 322229.column; connected in series with TSKgel G2000HxL 4, G3000HxL and G4000HxL each; • lysate; tetrahydrofuran • solution flow; 1. 〇ml/min • column temperature; 40° C • Detection method; visible light detector (UV (ultraviolet light)). Calibration curve; using standard polystyrene material to prepare the phenolic compound in the examples and comparative examples, and the resulting phenol The properties of the compound are shown in Tables 1 to 4. Further, in Tables 1 to 4, the n/m composition ratio indicates the number of repeating units represented by the general formula (1) / the number of repeating units represented by the general formula (2), that is, the aromatic aldehyde compound of the present invention. Molar number / Molar number of furfural in the present invention. , Table 4 . — Viscosity is solid and semi-solid' means that the viscosity cannot be determined because the phenolic compound is not dissolved in C. The epoxy resin composition was obtained by using the benzene-based compound obtained in the examples and the comparative examples as a curing agent, an oxygen resin and a curing accelerator. For the above-mentioned enamel tree, the use of Japanese epoxy resin ==! liquid:: oxygen resin, epoxy equivalent - said Ami ^. Guohuacheng (share) system 2 ships (2~ethyl-4-jiaxin heart sitting). The foregoing epoxy resin composition =:, stupid__ is:::: The epoxy resin composition is heated to 15 (TC is then mixed with 322229 42 201113245, vacuum defoamed and cast on heated To l5 (in the mold of rc, it is hardened at 15 5 for 5 hours' and hardened at 180X: for 8 hours to obtain an epoxy resin. The blending and physical properties of the obtained epoxy resin cured product 'Merge is shown in Tables 5 to 8. In Tables 5 to 8, α 1 is the line % expansion coefficient of the temperature below the glass transition temperature (Tg) and α 2 is the glass transition temperature (Tg). The linear expansion coefficient at the above. In Tables 5 to 8, the displacement is the displacement at the time of fracture of the specimen in the compression bending test, and the strength is the stress in the compression bending test. [Table 1] f~·' ~ ----_, Example 1 Example 2 Example 3 Example 4 Synthesis conditions Phenol compound (mol) o-allylphenol (5.00) o-allyl phenol (5. 00) o-allylphenol ( 5.00) o-allylphenol (5. 00) aromatic aldehyde compound (mol) salicylaldehyde (0.25) salicylaldehyde (0·25) salicylaldehyde (0.25 mg) salicylaldehyde (0.35) Mol) 42% Aldehyde water (0.25) 42% formalin (0.25) 42% formalin (0.25) 42% formalin (0.15) Alkaline catalyst type sodium hydroxide sodium oxide sodium hydroxide sodium hydroxide acid catalyst type hydrochloric acid oxalic acid Hydrochloric acid n/m composition ratio 1.0 1.0 1.0 2.33 Character E-type viscosity (Pa · s / 50 ° C) 3.2 4.0 4.3 58.1 0H equivalent (g / eq) 150 152 142 152 number average molecular weight (-) 500 514 518 549 43 322229 - Example 5 Example 6 Example; Example 7 Example 8 Synthetic conditions Phenol compound (mol) o-allyl^" (5.00) o-propyl propyl benzene (4.70) o-propyl benzophenone (7.50) O-allylphenol (5. 00) Aromatic compound (mol) Salicylaldehyde (0.15) Salicylaldehyde (0·24) Salicylaldehyde (0.35) Salicylic acid (0·15) Furfural (mol) 42% Formaldehyde water (0. 35) 42% formalin (0. 25) 42% formalin (0.15) 42% formalin (0. 35) Alkaline catalyst type sodium hydroxide ^ sodium hydroxide sodium hydroxide Medium type hydrochloric acid hydrochloric acid hydrochloric acid n/m composition ratio 0.43 0.94 2. 33 0.43 trait E-type viscosity (Pa · s / 50 ° C) 0.6 3.0 20.0 0.5 0H equivalent (g / eq) 171 151 151 166 number average Amount of sheep (-) 480 507 510 479 201113245 [Table 2] [Table 3] Example 9 Example 10 Example 11 Example 12 Example 13 Synthesis conditions Phenol compound (mol) o-allylphenol (4.70) o-olefin Propylphenol (4.70) o-allylphenol (5.00) o-allyl phenol (4.50) o-allyl phenol (3.75) aromatic aldehyde compound (mol) clumaldehyde (0.33) benzofural (0.24) Benzaldehyde (0.25) benzaldehyde (0.25) benzaldehyde (0.25) formaldehyde (mol) 42% furfural water (0.12) 423⁄4 formalin (0.25) 42% furfural water (0.25) 42% formalin ( 0.25) 42% formalin _ (0.25) Alkaline catalyst type sodium hydroxide 氪 纳 氢氧化 氢氧化 氢氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氢氧化钠 氢氧化钠 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 3.0 0 0 0 0 1.0 Character E-type viscosity (Pa-s/50°C) 1.03 0.49 0.45 0.46 0.63 OH equivalent (g/eq) 183 166 168 166 168 Number average molecular weight (I) 502 489 504 503 518 44 322229 201113245 [Table 4] Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Synthesis conditions Phenol compound (mol) o-allylphenol (5.0 00) o-allylphenol (5.00) — o-allylphenol (4. 70) aromatic aldehyde compound (mol) — salicylaldehyde (0.25) — clitofuraldehyde (0.36) methyl (mol) 42% furfural water (0.25) – A type of alkaline catalyst - sodium hydroxide - sodium oxyacid catalyst type oxalic acid - - n / m composition ratio - — — trait E-type viscosity (Pa · s / 50 ° C) 0.1 solid semi-solid 12.6 OH Equivalent (g/eq) 142 134 160 207 Number average molecular weight (-) 465 602 608 512 [Table 5] Example 1 Example 2 Example 3 Example 4 Preparation of epoxy resin (parts) 100 100 100 100 Benzene age system Compound (part) 80.7 81.7 76.3 81.7 Hardening accelerator (parts) 0.25 0.25 0.25 0.25 Physical gelation time (min/150 °C) 10 10 9 9 Water absorption (%) 1.5 1.5 1.7 1.4 Tg(°C) 92 92 91 104 ai (ppm) 81 77 86 81 a 2 (ppm) 192 192 191 191 Elasticity (MPa) 3057 3095 2816 2946 Displacement (mm) 9 7 10 10 Strength (MPa) 117 112 112 118 45 322229 201113245 [Table 6] Example 5 Example 6 Example 7 Example 8 Preparation of epoxy resin (parts) 100 100 100 100 Phenolic compound (part) 91.9 81. 2 81.8 89.3 Hardening accelerator (parts) 0.25 0.25 0.25 0.50 Physical gelation time (min/150 °C) 14 10 13 12 Water absorption (%) 1.6 1.5 1.4 1.8 Tg (°C) 78 92 98 72 ai (ppm) 84 80 81 67 a 2 (ppm) 202 191 193 219 Elasticity (MPa) 3085 3040 2981 3153 Displacement (leg) 5 9 9 8 Strength (MPa) 89 115 117 107 [Table 7] - Example 9 Example 10 Implementation Example 11 Example 12 Example 13 Preparation of epoxy resin (parts) 100 100 100 100 100 Hardener (parts) 98.4 89.2 90.1 89.2 90.1 2E4MZC%, relative to epoxy resin 0.50 0. 50 0.50 0.50 0.50 Physical gelation time (min/150 ° C) 17.2 11.4 11 13 10 Water absorption (%) 1.40 1.56 1.47 1.49 1.45 Tg (°C) 102 93 96 96 93 ai (ppm) 71 71 76 75 75 a 2 (ppm) 220 187 211 205 214 Elasticity (MPa) 2742 2879 2687 2797 2682 Displacement (mm) 1.7 8.1 8.1 7.9 7.9 Strength (MPa) 28 104 103 108 106 46 322229 201113245 [Table 8] Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Preparation ring Oxygen resin (parts) 100 100 100 100 Hardener (parts) 76.3 72.0 89.3 111.3 2Ε4ΜΖ (%, relative to epoxy tree ) 0.25 0.25 0.50 0. 50 Physical gelation time (min/150°C) 13 — 12 7. 1 Water absorption (%) 1.6 1.5 1.8 1.36 Tg(°C) 67 127 72 104 a:i(ppm) 83 78 67 78 o: 2 (ppm) 185 184 219 229 Elasticity (MPa) 2770 2620 3153 3173 Displacement (mm) 8 12 8 2.3 Strength (MPa) 95 120 107 44 From the results of the above examples, it is known in the examples Each of the epoxy resin compositions produced is a sealing material or an underfill material used as a semiconductor element. [Simple description of the diagram] Benefits [Main component symbol description] None 47 322229
Claims (1)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009174150 | 2009-07-27 | ||
| JP2010121542A JP2012193217A (en) | 2009-07-27 | 2010-05-27 | Phenolic compound, and process for producing the same |
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| TW201113245A true TW201113245A (en) | 2011-04-16 |
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| TW99124647A TW201113245A (en) | 2009-07-27 | 2010-07-27 | Phenolic compound and manufacturing method thereof |
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| JP (1) | JP2012193217A (en) |
| TW (1) | TW201113245A (en) |
| WO (1) | WO2011013571A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI659975B (en) * | 2014-03-31 | 2019-05-21 | Meiwa Plastic Industries, Ltd. | Phenol resin, epoxy resin composition containing the phenol resin, cured product of the epoxy resin composition, and semiconductor device having the cured product |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5859420B2 (en) * | 2012-01-04 | 2016-02-10 | 信越化学工業株式会社 | Resist underlayer film material, method for producing resist underlayer film material, and pattern forming method using the resist underlayer film material |
| JP6070020B2 (en) * | 2012-09-28 | 2017-02-01 | 明和化成株式会社 | Method for producing novolac-type phenolic resin, novolac-type phenolic resin, and photoresist composition |
| JP2017105898A (en) * | 2015-12-08 | 2017-06-15 | Dic株式会社 | Epoxy resin, method for producing epoxy resin, curable resin composition and cured product thereof |
| JP6476527B2 (en) * | 2015-12-10 | 2019-03-06 | 群栄化学工業株式会社 | Liquid polyvalent hydroxy resin, production method thereof, curing agent for epoxy resin, epoxy resin composition, cured product thereof and epoxy resin |
| US11478753B2 (en) | 2016-06-29 | 2022-10-25 | Dic Corporation | Hollow fiber membrane module and production method therefor, and epoxy resin used in hollow fiber membrane and production method |
| KR20240151158A (en) * | 2022-02-25 | 2024-10-17 | 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 | Epoxy resin, polyhydroxy resin, epoxy resin composition, and cured epoxy resin, and method for producing polyhydroxy resin |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000169538A (en) * | 1998-12-04 | 2000-06-20 | Meiwa Kasei Kk | Method for producing liquid phenol novolak resin |
| JP3833940B2 (en) * | 2001-01-11 | 2006-10-18 | エア・ウォーター株式会社 | Phenol polymer, process for producing the same, and epoxy resin curing agent using the same |
| JP2002327035A (en) * | 2001-02-28 | 2002-11-15 | Sumikin Chemical Co Ltd | Phenolic polymer, method for producing the same, curing agent for epoxy resin using the same, epoxy resin composition for encapsulating semiconductor, and semiconductor device |
| JP3704081B2 (en) * | 2001-11-30 | 2005-10-05 | エア・ウォーター・ケミカル株式会社 | Epoxy resin, its production method and its use |
| JP2004131636A (en) * | 2002-10-11 | 2004-04-30 | Dainippon Ink & Chem Inc | Epoxy resin composition, prepreg and cured product thereof |
| JP2004339371A (en) * | 2003-05-15 | 2004-12-02 | Nippon Kayaku Co Ltd | Epoxy resin composition and cured product thereof |
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2010
- 2010-05-27 JP JP2010121542A patent/JP2012193217A/en active Pending
- 2010-07-22 WO PCT/JP2010/062357 patent/WO2011013571A1/en not_active Ceased
- 2010-07-27 TW TW99124647A patent/TW201113245A/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI659975B (en) * | 2014-03-31 | 2019-05-21 | Meiwa Plastic Industries, Ltd. | Phenol resin, epoxy resin composition containing the phenol resin, cured product of the epoxy resin composition, and semiconductor device having the cured product |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011013571A1 (en) | 2011-02-03 |
| JP2012193217A (en) | 2012-10-11 |
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