TW201024380A - Inks for ink-jet printing - Google Patents
Inks for ink-jet printing Download PDFInfo
- Publication number
- TW201024380A TW201024380A TW98129445A TW98129445A TW201024380A TW 201024380 A TW201024380 A TW 201024380A TW 98129445 A TW98129445 A TW 98129445A TW 98129445 A TW98129445 A TW 98129445A TW 201024380 A TW201024380 A TW 201024380A
- Authority
- TW
- Taiwan
- Prior art keywords
- acid
- acrylate
- ink
- meth
- inkjet
- Prior art date
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- 239000000976 ink Substances 0.000 title claims description 335
- 238000007641 inkjet printing Methods 0.000 title claims 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 147
- 239000002253 acid Substances 0.000 claims abstract description 130
- 239000004593 Epoxy Substances 0.000 claims abstract description 102
- 238000007747 plating Methods 0.000 claims abstract description 71
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 47
- 238000005530 etching Methods 0.000 claims abstract description 43
- 239000003513 alkali Substances 0.000 claims abstract description 24
- -1 methyl propyl Chemical group 0.000 claims description 163
- 239000000052 vinegar Substances 0.000 claims description 111
- 235000021419 vinegar Nutrition 0.000 claims description 111
- 239000000758 substrate Substances 0.000 claims description 107
- 150000001875 compounds Chemical class 0.000 claims description 93
- 239000000178 monomer Substances 0.000 claims description 78
- 238000000034 method Methods 0.000 claims description 59
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 56
- 239000000203 mixture Substances 0.000 claims description 50
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 40
- CJDPJFRMHVXWPT-UHFFFAOYSA-N barium sulfide Chemical compound [S-2].[Ba+2] CJDPJFRMHVXWPT-UHFFFAOYSA-N 0.000 claims description 37
- 125000004122 cyclic group Chemical group 0.000 claims description 34
- 229920000647 polyepoxide Polymers 0.000 claims description 32
- 239000003822 epoxy resin Substances 0.000 claims description 30
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 29
- 238000006116 polymerization reaction Methods 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 28
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 28
- 239000004094 surface-active agent Substances 0.000 claims description 27
- 150000003254 radicals Chemical class 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 24
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 23
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 23
- 238000011156 evaluation Methods 0.000 claims description 23
- 239000003999 initiator Substances 0.000 claims description 23
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical class C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 claims description 23
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 22
- 239000003112 inhibitor Substances 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 claims description 21
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 21
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 20
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 claims description 19
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 18
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 18
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 17
- 239000002585 base Substances 0.000 claims description 17
- 239000003795 chemical substances by application Substances 0.000 claims description 17
- 239000010931 gold Substances 0.000 claims description 17
- 229950000688 phenothiazine Drugs 0.000 claims description 17
- 230000000052 comparative effect Effects 0.000 claims description 16
- 150000002148 esters Chemical class 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- IBPADELTPKRSCQ-UHFFFAOYSA-N 9h-fluoren-1-yl prop-2-enoate Chemical compound C1C2=CC=CC=C2C2=C1C(OC(=O)C=C)=CC=C2 IBPADELTPKRSCQ-UHFFFAOYSA-N 0.000 claims description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 15
- 229910052737 gold Inorganic materials 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 239000003086 colorant Substances 0.000 claims description 14
- 229920005989 resin Polymers 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 13
- 230000008859 change Effects 0.000 claims description 13
- 239000005011 phenolic resin Substances 0.000 claims description 13
- 239000004848 polyfunctional curative Substances 0.000 claims description 13
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 13
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 12
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 12
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 11
- 150000008064 anhydrides Chemical class 0.000 claims description 11
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 229930185605 Bisphenol Natural products 0.000 claims description 10
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 10
- 150000007519 polyprotic acids Polymers 0.000 claims description 10
- 229910052707 ruthenium Inorganic materials 0.000 claims description 10
- 239000002966 varnish Substances 0.000 claims description 10
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 9
- 239000011889 copper foil Substances 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims description 9
- 239000001384 succinic acid Substances 0.000 claims description 9
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 9
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 claims description 8
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical compound CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 claims description 8
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 claims description 8
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 8
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 150000002923 oximes Chemical class 0.000 claims description 8
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- 239000000376 reactant Substances 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 claims description 7
- DAWJJMYZJQJLPZ-UHFFFAOYSA-N 2-sulfanylprop-2-enoic acid Chemical group OC(=O)C(S)=C DAWJJMYZJQJLPZ-UHFFFAOYSA-N 0.000 claims description 7
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 7
- 239000007983 Tris buffer Substances 0.000 claims description 7
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 229920001577 copolymer Polymers 0.000 claims description 7
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 7
- 239000011976 maleic acid Substances 0.000 claims description 7
- 229920003986 novolac Polymers 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 claims description 7
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 6
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 6
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 claims description 6
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 229920000768 polyamine Polymers 0.000 claims description 6
- 238000007639 printing Methods 0.000 claims description 6
- 238000003860 storage Methods 0.000 claims description 6
- BGKZULDOBMANRY-UHFFFAOYSA-N sulfanyl prop-2-enoate Chemical compound SOC(=O)C=C BGKZULDOBMANRY-UHFFFAOYSA-N 0.000 claims description 6
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 claims description 6
- CFGGNXFNDNQZKD-UHFFFAOYSA-N 2-(9H-fluoren-1-yl)prop-2-enoic acid Chemical compound C1C2=CC=CC=C2C2=C1C(C(=C)C(=O)O)=CC=C2 CFGGNXFNDNQZKD-UHFFFAOYSA-N 0.000 claims description 5
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 claims description 5
- 239000004698 Polyethylene Substances 0.000 claims description 5
- 239000004793 Polystyrene Substances 0.000 claims description 5
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 5
- 150000008065 acid anhydrides Chemical class 0.000 claims description 5
- 150000001299 aldehydes Chemical class 0.000 claims description 5
- 150000001491 aromatic compounds Chemical class 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 5
- 150000004678 hydrides Chemical class 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 5
- 210000004185 liver Anatomy 0.000 claims description 5
- 239000011707 mineral Substances 0.000 claims description 5
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 claims description 5
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 claims description 5
- 238000000206 photolithography Methods 0.000 claims description 5
- 229920000573 polyethylene Polymers 0.000 claims description 5
- 229920002223 polystyrene Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 230000002829 reductive effect Effects 0.000 claims description 5
- 239000000243 solution Substances 0.000 claims description 5
- 229920002554 vinyl polymer Polymers 0.000 claims description 5
- KJTLQQUUPVSXIM-ZCFIWIBFSA-M (R)-mevalonate Chemical compound OCC[C@](O)(C)CC([O-])=O KJTLQQUUPVSXIM-ZCFIWIBFSA-M 0.000 claims description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims description 4
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 claims description 4
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 claims description 4
- FDQQNNZKEJIHMS-UHFFFAOYSA-N 3,4,5-trimethylphenol Chemical compound CC1=CC(O)=CC(C)=C1C FDQQNNZKEJIHMS-UHFFFAOYSA-N 0.000 claims description 4
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 claims description 4
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 claims description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 4
- 229920003319 Araldite® Polymers 0.000 claims description 4
- 239000005711 Benzoic acid Substances 0.000 claims description 4
- 229920002134 Carboxymethyl cellulose Polymers 0.000 claims description 4
- KJTLQQUUPVSXIM-UHFFFAOYSA-N DL-mevalonic acid Natural products OCCC(O)(C)CC(O)=O KJTLQQUUPVSXIM-UHFFFAOYSA-N 0.000 claims description 4
- 239000005977 Ethylene Substances 0.000 claims description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 4
- 235000010948 carboxy methyl cellulose Nutrition 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 4
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 claims description 4
- 229940018557 citraconic acid Drugs 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- BMFYCFSWWDXEPB-UHFFFAOYSA-N cyclohexyl(phenyl)methanone Chemical compound C=1C=CC=CC=1C(=O)C1CCCCC1 BMFYCFSWWDXEPB-UHFFFAOYSA-N 0.000 claims description 4
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 4
- 238000002845 discoloration Methods 0.000 claims description 4
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 claims description 4
- 239000004744 fabric Substances 0.000 claims description 4
- 229940074391 gallic acid Drugs 0.000 claims description 4
- 235000004515 gallic acid Nutrition 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 claims description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims description 4
- 230000004048 modification Effects 0.000 claims description 4
- 238000012986 modification Methods 0.000 claims description 4
- 239000000123 paper Substances 0.000 claims description 4
- 239000000049 pigment Substances 0.000 claims description 4
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 4
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 4
- 239000000047 product Substances 0.000 claims description 4
- 239000001294 propane Substances 0.000 claims description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 claims description 4
- 230000002940 repellent Effects 0.000 claims description 4
- 239000005871 repellent Substances 0.000 claims description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims description 4
- 239000007858 starting material Substances 0.000 claims description 4
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 claims description 4
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 3
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical compound OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 claims description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 3
- 125000006267 biphenyl group Chemical group 0.000 claims description 3
- GGBJHURWWWLEQH-UHFFFAOYSA-N butylcyclohexane Chemical compound CCCCC1CCCCC1 GGBJHURWWWLEQH-UHFFFAOYSA-N 0.000 claims description 3
- 239000001768 carboxy methyl cellulose Substances 0.000 claims description 3
- 239000008112 carboxymethyl-cellulose Substances 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 claims description 3
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011888 foil Substances 0.000 claims description 3
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 150000002466 imines Chemical class 0.000 claims description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 3
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- ZOGLCAJXTCUJEO-UHFFFAOYSA-N C(C=C)(=O)O.C(C1=CC(C(=O)O)=CC=C1)(=O)O Chemical compound C(C=C)(=O)O.C(C1=CC(C(=O)O)=CC=C1)(=O)O ZOGLCAJXTCUJEO-UHFFFAOYSA-N 0.000 description 1
- OMTKBQOPAWJJEZ-UHFFFAOYSA-N C(C=C)(=O)O.C1(=CC=CC=2C3=CC=CC=C3CC12)C1CCCC2=CC3=CC=CC=C3C=C12 Chemical compound C(C=C)(=O)O.C1(=CC=CC=2C3=CC=CC=C3CC12)C1CCCC2=CC3=CC=CC=C3C=C12 OMTKBQOPAWJJEZ-UHFFFAOYSA-N 0.000 description 1
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- PTRNRJYRGNIKQN-UHFFFAOYSA-N C(CCC)C1(C(=O)NC(C1)=O)C1=CC=CC=C1 Chemical compound C(CCC)C1(C(=O)NC(C1)=O)C1=CC=CC=C1 PTRNRJYRGNIKQN-UHFFFAOYSA-N 0.000 description 1
- PJIGJEINZIHMNN-UHFFFAOYSA-N C1(=CC=CC=2C3=CC=CC=C3CC12)C1(OCC1)C1=CC=CC=2C3=CC=CC=C3CC12.C=CC Chemical compound C1(=CC=CC=2C3=CC=CC=C3CC12)C1(OCC1)C1=CC=CC=2C3=CC=CC=C3CC12.C=CC PJIGJEINZIHMNN-UHFFFAOYSA-N 0.000 description 1
- UFNNQSRTOGBBGE-UHFFFAOYSA-N C1(=CC=CC=C1)C=1C(=O)NC(C1)=O.C1=CC=CC=2C3=CC=CC=C3CC12 Chemical compound C1(=CC=CC=C1)C=1C(=O)NC(C1)=O.C1=CC=CC=2C3=CC=CC=C3CC12 UFNNQSRTOGBBGE-UHFFFAOYSA-N 0.000 description 1
- RWYAVGQCVJBKBN-UHFFFAOYSA-N C1(C=CC2=CC=CC=C12)C(=CC(=O)O)C1C=CC2=CC=CC=C12.C(CCC)(O)O Chemical compound C1(C=CC2=CC=CC=C12)C(=CC(=O)O)C1C=CC2=CC=CC=C12.C(CCC)(O)O RWYAVGQCVJBKBN-UHFFFAOYSA-N 0.000 description 1
- CTZCQXPIYRXEJM-UHFFFAOYSA-N CC(C=COCCC1OCC1)C1C=CC2=CC=CC=C12 Chemical compound CC(C=COCCC1OCC1)C1C=CC2=CC=CC=C12 CTZCQXPIYRXEJM-UHFFFAOYSA-N 0.000 description 1
- ACFZWYXIENXRMX-UHFFFAOYSA-N COCC1OCC1.C=CC Chemical compound COCC1OCC1.C=CC ACFZWYXIENXRMX-UHFFFAOYSA-N 0.000 description 1
- 244000166124 Eucalyptus globulus Species 0.000 description 1
- ARXFLUWKJQXYQV-UHFFFAOYSA-N N,N-diphenylpropanimidamide Chemical compound C1(=CC=CC=C1)N(C(CC)=N)C1=CC=CC=C1 ARXFLUWKJQXYQV-UHFFFAOYSA-N 0.000 description 1
- 229930182474 N-glycoside Natural products 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- 244000082204 Phyllostachys viridis Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 229920002732 Polyanhydride Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- UDEWPOVQBGFNGE-UHFFFAOYSA-N benzoic acid n-propyl ester Natural products CCCOC(=O)C1=CC=CC=C1 UDEWPOVQBGFNGE-UHFFFAOYSA-N 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 239000010866 blackwater Substances 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- NZNMSOFKMUBTKW-UHFFFAOYSA-N cyclohexanecarboxylic acid Chemical compound OC(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-N 0.000 description 1
- MAWOHFOSAIXURX-UHFFFAOYSA-N cyclopentylcyclopentane Chemical group C1CCCC1C1CCCC1 MAWOHFOSAIXURX-UHFFFAOYSA-N 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- YPWYKIZLWMBFKH-UHFFFAOYSA-N diamino(diphenyl)phosphanium Chemical compound C=1C=CC=CC=1[P+](N)(N)C1=CC=CC=C1 YPWYKIZLWMBFKH-UHFFFAOYSA-N 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 229940008099 dimethicone Drugs 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- JYMYVPSOAXOLGQ-UHFFFAOYSA-N dioxan-3-ol Chemical compound OC1CCCOO1 JYMYVPSOAXOLGQ-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 230000002327 eosinophilic effect Effects 0.000 description 1
- UPUANNBILBRCST-UHFFFAOYSA-N ethanol;ethene Chemical compound C=C.CCO UPUANNBILBRCST-UHFFFAOYSA-N 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- ZDXPYRJPNDTMRX-UHFFFAOYSA-N glutamine Natural products OC(=O)C(N)CCC(N)=O ZDXPYRJPNDTMRX-UHFFFAOYSA-N 0.000 description 1
- 150000002341 glycosylamines Chemical class 0.000 description 1
- IMHUBDQICZTWKC-UHFFFAOYSA-N heptane;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCCCC IMHUBDQICZTWKC-UHFFFAOYSA-N 0.000 description 1
- OLLMEZGFCPWTGD-UHFFFAOYSA-N hexane;methanol Chemical compound OC.OC.CCCCCC OLLMEZGFCPWTGD-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 1
- GFAZHVHNLUBROE-UHFFFAOYSA-N hydroxymethyl propionaldehyde Natural products CCC(=O)CO GFAZHVHNLUBROE-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- VNCBZCHDEALMMU-UHFFFAOYSA-N methanol 2-methylbut-2-ene Chemical compound CO.CC(C)=CC VNCBZCHDEALMMU-UHFFFAOYSA-N 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- GASFVSRUEBGMDI-UHFFFAOYSA-N n-aminohydroxylamine Chemical compound NNO GASFVSRUEBGMDI-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- BHYJMUFNVQBDRC-UHFFFAOYSA-N n-sulfanylprop-2-enamide Chemical compound SNC(=O)C=C BHYJMUFNVQBDRC-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical compound C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-M phthalate(1-) Chemical compound OC(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-M 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- RIZGKEIRSQLIBK-UHFFFAOYSA-N prop-1-ene-1-thiol Chemical group CC=CS RIZGKEIRSQLIBK-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- AIISZVRFZVBASR-UHFFFAOYSA-N propan-1-ol;propyl acetate Chemical compound CCCO.CCCOC(C)=O AIISZVRFZVBASR-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
- WEZYFYMYMKUAHY-UHFFFAOYSA-N tert-butyl 2,4-dibenzylpiperazine-1-carboxylate Chemical compound C1C(CC=2C=CC=CC=2)N(C(=O)OC(C)(C)C)CCN1CC1=CC=CC=C1 WEZYFYMYMKUAHY-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
201024380 32I3JpIt 六、發明說明: 【發明所屬之技術領域】 本發明是關於一種可利用驗性(alkali)水溶液進行剝 離的喷墨(ink jet)用墨水,更詳細而言,是關於一種適 用於可用作印刷配線板(printed circuit board )等電子電路 基板製作用阻劑(resist)的具有耐蝕刻性的抗蝕劑(etching resist)、或具有耐鑛敷性的抗鑛敷劑(plating resist)等的 喷墨用墨水。 【先前技術】 先前’於印刷配線板、可撓性配線板(flexible print circuit board)、半導體封裝(package)基板等電子電路基 板的製造中’採用使用光阻劑(photoresist )的光微影 (photolithography)法。於利用該光微影法的電子電路基 板的製造方法中,例如於印刷配線板時,於銅箔積層板的 銅箔上形成光阻層,經由光罩等對其表面進行曝光,其後 除去未硬化部分而形成光阻圖案(resist pattem)。接著, 藉由蝕刻除去未被光阻圖案所覆蓋的部分的銅箔,再除去 光阻圖案,藉此可獲得印刷配線板。 然而,上述印刷配線板的製造方法於製作光罩時要花 費較長時’較多費用’故設備投資金額增大。另外,由 於需要使用光罩的圖案曝光,故步驟複雜,操作亦繁雜。 =來’為了解決這些問題’正在開發使用嘴墨方 材料直接塗佈於基板上,而形成光阻圖案的方 ,照日本專利特開昭56-66089號公報(專利文獻 h日本專利特開昭62-181490號公報(專利文獻2)、曰 本專利特開平6_23湖號公報(專利文獻3)、及日本專 利特開平7.131135號公報(專利文獻4))。該方法可不需 要先前所需要的_料,故設備投資金額較少,另外, 就材料的良率較高等方面而言,正受到期待。201024380 32I3JpIt VI. Description of the Invention: [Technical Field] The present invention relates to an ink for ink jet which can be peeled off using an aqueous alkaline solution, and more particularly, An etching resist having an etching resistance for use as a resist for producing an electronic circuit board such as a printed circuit board, or a plating resist having mineral resistance. Inkjet inks. [Prior Art] Previously, 'photolithography using photoresist was employed in the manufacture of electronic circuit boards such as printed wiring boards, flexible print circuit boards, and semiconductor package substrates ( Photolithography) method. In the method of manufacturing an electronic circuit board using the photolithography method, for example, when a wiring board is printed, a photoresist layer is formed on a copper foil of a copper foil laminate, and the surface thereof is exposed through a mask or the like, and then removed. A resist pattern is formed without uncured portions. Next, the copper foil of the portion not covered by the photoresist pattern is removed by etching, and the photoresist pattern is removed, whereby a printed wiring board can be obtained. However, in the method of manufacturing a printed wiring board described above, it takes a long time to manufacture a reticle, and the amount of equipment investment increases. In addition, since the pattern of the photomask is required to be exposed, the steps are complicated and the operation is complicated. In order to solve these problems, a method of directly applying a nozzle ink material to a substrate to form a photoresist pattern is disclosed. Japanese Patent Laid-Open No. Hei 56-66089 (Patent Document H Japanese Patent Special Opening) Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. 7.131135 (Patent Document 4). This method does not require the previously required material, so the equipment investment amount is small, and in addition, it is expected in terms of high material yield.
201024380 上述噴墨法中所使用的光阻材料可列舉抗钱劑、抗鑛 敷劑等,-般要求抗侧具有耐_性的特性,抗鍵敷劑 鑛敷性的特性。迄今為止,可用於喷墨法的光阻材 料提出有各種墨水組成物(參照日本專利制平7_17咖 號公報(專利文獻5)、日本專利特開a·3·7號公 (專利文獻6)、及日本專利特開細5 〇57〇18號公報 利文獻7)),由這些墨水形朗光阻膜不具有充 ^ 刻性或耐鍍敷性以及優異的鹼剝離性。 卞餘 另-方面,使用酸改質環氧丙締酸醋的抗钱 照日本專㈣開㈣·243869號公報(專利文獻(^ 專利特開平1·24獅號公報(專利文獻9)、= 開2003-238653號公報(專利文獻1())、及 ^特 4-謂6 ^公報(專利文獻u)),未有較 方式更低的黏度。 、嘴墨 [專利文獻1]曰本專利特開昭 [專利文獻2]日本專利特開昭 [專利文獻3]曰本專利特開平 [專利文獻4]曰本專利特開平 [專利文獻5]日本專利特開平 56-66089號公報 62-181490號公報 6- 237〇63號公報 7- 131135號公報 7-170053號公報 5 201024380 [專利文獻6]日本專利特開2〇〇4_353〇27號公報 [專利文獻7]日本專利特開2〇〇5 〇57〇18號公報 [專利文獻8]曰本專利特開昭61 243869號公報 [專利文獻9]日本專利特開平1 2426〇9號公報 [專利文獻ίο]日本專利特開2〇〇3_238653號公報 [專利文獻11]日本專利特開2〇〇4 151456號公 【發明内容】 [發明所欲解決之課題] 〇 離性轉抑祕細錄性與驗牵 ==:光_,可形成具有上述特性的❹ [解決問題之手段] 發者等人發現’含有具有特^物性的酸改質環ί 咖时墨衫水从是飾性、以及 並;艮據“ 並可形成可進行驗性剝離的硬化膜,201024380 The photoresist material used in the above inkjet method may, for example, be an anti-money agent, an anti-stranding agent, or the like, and generally requires an anti-side property and an anti-bonding agent mineralization property. Various kinds of ink compositions have been proposed for the photoresist material which can be used for the ink-jet method (refer to Japanese Patent Laid-Open No. Hei 7-17 (No. 5), Japanese Patent Laid-Open No. Hei. Japanese Patent Laid-Open Publication No. Hei. No. 5, No. 57, No. 18, No. 7)), these ink-shaped ray resist films do not have chargeability or plating resistance and excellent alkali peelability. In addition, the other side, the use of acid-modified epoxy propylene vinegar, the anti-money photo Japan special (four) open (four) · 243869 (patent literature (^ patent special Kaiping 1.24 lion bulletin (patent literature 9), = Japanese Laid-Open Patent Publication No. 2003-238653 (Patent Document 1 ()), and Japanese Patent No. 4-6 (Patent Document u)), which has no lower viscosity than that of the method, and the ink of the mouth [Patent Document 1] Japanese Patent Laid-Open (Patent Document 2) Japanese Patent Laid-Open Publication No. [Patent Document No. 3] Japanese Patent Laid-Open Publication No. JP-A No. 56-66089 Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Patent Document 8] Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Patent Document 11] Japanese Patent Laid-Open Publication No. Hei. No. 2 151 456. Deviation-inducing secrets and test-inducing ==: light_, can form the above characteristics ❹ [means to solve the problem] The sender and others found that 'containing acid properties of the modified ring ί The water of the shirt is decorative, and; according to "and can form a hardened film that can be peeled off,
發明。本發明提供如下所述的噴凄 水崎的硬化觀其職方法等。 12 Γ的nr墨水’其含有重量平均分子量為 键及大於^ 1棚於1分子巾具有A於等於2個聚合性雙 鍵大於等於1個羧基的酸改 [2]如上述_狀物认=== 合起始劑(B)。 丹T進芡3頁元冬 [^上^]或[2]所述之喷墨用墨水其中進一步令 有於刀子中具有大於等於1個自域聚合性雙鍵的化名 6 201024380 32133pit 物(C) ο 。[4]如上述[η至[3]中任一項所述之喷墨用墨水,其中 25 C下的黏度小於等於200 mPa.s。 [5] 如上述[η至[4]中任一項所述之噴墨用墨水,其中 上逆酸改質環氧(曱基)丙稀酸酯(Α)具有盼搭清漆型、雙 齡Α型或雙❹型的環氧樹脂骨架。 [6] 如上述[η至[5]中任一項所述之喷墨用墨水,其中 β 这酸改貝環氧(甲基)丙烯酸酯(Α)具有雙紛a型或雙 酚F型的環氧樹脂骨架。 [7] 如上述[1]至[6]中任一項所述之噴墨用墨水,其中 上述酸改質環氧(曱基)丙烯酸醋(A)具有雙盼㈣的環氧 ' 樹脂骨架。 、w[8]如上述[3]所述之噴墨用墨水,其中上述化合物(C) 為單官能單體或二官能單體。 [9] 如上述[3]所述之喷墨用墨水,其中上述化合物(C) ❹ 為具有環狀結構的單官能單體(C1)。 [10] 如上述[3]所述之嘴墨用墨水,其中上述化合物 (c)包含具有環狀結構的單官能單體(ci)與於丨分子 中具有大於等於1個羧基的單體(C2)。 [11] 如上述[10]所述之噴墨用墨水,其中上述單體 (C1)為選自由(甲基)丙烯酸環己醋、(甲基)丙稀酸二環 戊稀醋、(甲基)丙烯酸二環戊烯氧基乙醋、(甲基)丙嫦酸二 環戊醋、(甲基)丙稀酸異$醋、(曱基)丙烯酸四氫糠酯、己 内酯改質(曱基)丙烯酸四氫糠醋、队丙稀醯基嗎啉、队乙 7 201024380 烯基已内醯胺、N-乙烯基吡咯啶酮、環狀三羥甲基丙烷縮 甲醛(甲基)丙烯酸酯、r-丁内酯(甲基)丙烯酸酯、及甲羥 戊酸内酯(甲基)丙烯酸酯所組成族群中的至少丨種化合 物,另外, 上述單體(C2)為選自由(甲基)丙烯酸、(甲基)丙烯 酸二聚物、点·羧乙基(甲基)丙烯酸酯、羧基聚己内酯單 (甲基)丙烯酸酯、琥珀酸單[2_(甲基)丙烯醯氧基乙基]酯、 順丁烯二酸單[2-(曱基)丙烯醯氧基乙基]酯、鄰苯二甲酸酐 與(甲基)丙烯酸羥基乙酯的反應物、及六氫鄰苯二曱酸酐 與(甲基)丙烯酸羥基乙酯的反應物所組成族 種化合物。 [12] —種喷墨用墨水,其包含: 酚F型的酸改質環氧丙烯酸酯,來竹 於等於2個聚合性雙鍵及大於等於i 重量平均分子量為9⑻〜u,嶋的範圍且酸值為⑽ mgKOH/g〜110 mgK0H/g的酚醛清漆型、雙酚a型或雙 (甲基)丙烯酸酯(A);invention. The present invention provides a method of curing the sneeze and the like of the sneeze as described below. 12 Γnr ink 'which contains a weight average molecular weight of a bond and is larger than ^ 1 shed in a molecular towel having A equal to 2 polymerizable double bonds greater than or equal to 1 carboxyl group acid change [2] as described above _ == Starter (B). Dan T is a three-page winter ink [^上^] or [2] inkjet ink which further has a pseudonym of 6 or more self-domain polymerizable double bonds in the knife. 201024380 32133pit (C) ) ο . [4] The ink for inkjet according to any one of [3], wherein the viscosity at 25 C is 200 mPa·s or less. [5] The ink for inkjet according to any one of [4], wherein the upper acid-modified epoxy (fluorenyl) acrylate (Α) has a varnish type and a double age. Epoxy resin skeleton of Α or double ❹ type. [6] The ink for inkjet according to any one of the above [n], wherein the acid-modified epoxy (meth) acrylate (β) has a double a type or a bisphenol F type. Epoxy resin skeleton. [7] The inkjet ink according to any one of [1] to [6] wherein the acid-modified epoxy (fluorenyl)acrylic acid vinegar (A) has a double (4) epoxy resin skeleton . The inkjet ink according to the above [3], wherein the compound (C) is a monofunctional monomer or a difunctional monomer. [9] The ink for inkjet according to [3], wherein the compound (C) ❹ is a monofunctional monomer (C1) having a cyclic structure. [10] The ink for mouth ink according to the above [3], wherein the compound (c) comprises a monofunctional monomer (ci) having a cyclic structure and a monomer having one or more carboxyl groups in the anthracene molecule ( C2). [11] The inkjet ink according to [10] above, wherein the monomer (C1) is selected from the group consisting of cyclohexanone (meth)acrylate, dicyclopentanyl (meth)acrylate, (A) Dialkylpenteneoxyacetate, (meth)propionic acid dicyclopentanacetate, (meth)acrylic acid, vinegar, tetrahydrofurfuryl (meth) acrylate, caprolactone modification (fluorenyl) tetrahydroanthracene acrylate, acrylonitrile, squad 7 201024380 alkenyl decylamine, N-vinylpyrrolidone, cyclic trimethylolpropane formal (methyl) At least a compound of the group consisting of acrylate, r-butyrolactone (meth) acrylate, and mevalonate (meth) acrylate, and the monomer (C2) is selected from ( Methyl)acrylic acid, (meth)acrylic acid dimer, dot carboxyethyl (meth) acrylate, carboxypolycaprolactone mono(meth) acrylate, succinic acid mono [2_(methyl) propylene oxime Oxyethyl]ester, maleic acid mono [2-(indenyl) propylene methoxyethyl] ester, phthalic anhydride and hydroxyethyl (meth) acrylate, and hexahydrogen Phthalic Aromatic compounds Yue anhydride with (meth) acrylate reactant consisting of hydroxyethyl acrylate. [12] An inkjet ink comprising: a phenol F-type acid-modified epoxy acrylate, the bamboo is equal to two polymerizable double bonds and greater than or equal to i, the weight average molecular weight is 9 (8) 〜 u, 嶋 range And a novolak type, bisphenol a type or bis (meth) acrylate (A) having an acid value of (10) mgKOH/g to 110 mgK0H/g;
來作為於1分子中具有大 於1個鲮基的酸改質環氧As an acid-modified epoxy having more than one mercapto group in one molecule
201024380 酚噻嗪來作為聚合抑制劑。 巧:喷墨用/水,其包含: mgK〇H^n〇t!*t 80 m^Hg的雙酚?型的酸改質環氧丙烯酸201024380 Phthathiazine is used as a polymerization inhibitor. Qiao: Inkjet / water, which contains: mgK〇H^n〇t!*t 80 m^Hg of bisphenol? Type acid modified epoxy acrylic
二f作為於!奸巾具有A 於等:V;0縣的較質彻基㈣酸= 始劑(,Β)Γ甲基本甲酿基二苯基氧化膦來作為光聚合起 j為具有環狀結構的單官能單體(C1)的^基丙烯酸 與作為於1分子中具有大於等於1個缓基的單 體()的鄰苯二甲酸單(甲基丙稀酸經基乙醋)的混合物, 來作為於1分子巾具有A於等於i個自由 化合物(C);以及 ^ 酚噻嗪來作為聚合抑制劑。 [14] 一種硬化膜形成方法,其是藉由噴墨方式將如上 述[1]至[13]中任一項所述之噴墨用墨水塗佈於基板上,並 對所塗佈的墨水照射光,藉此形成硬化膜。 ” [15] —種硬化膜,其是利用如上述[14]所述之方法而 得。 ’ [16] 如上述[15]所述之硬化膜’其形成為特定的圖案 狀。 一 [17] —種抗触膜,其是藉由如上述[14]所述之方、去而 [18] —種抗鍍敷膜’其是藉由如上述[Η]所述之方法而 9 201024380 32133pif 得。 [19] 一種基板的製造方法’其包含:藉由如上述^ 所述之方法形成抗蝕膜或抗鍍敷膜的步驟;其後的餘刻歩 騾或鍍敷步驟;及其後的剝離上述膜的步驟。 ' [20] —種電子零件’其是藉由如上述[I%所述之方法 得。 [21] —種顯示元件,其具有如上述[2〇]所述之電子Two f as! The adulterous towel has A and so on: V; 0 county's better base (tetra) acid = starter (, Β) Γ methyl bromodiphenylphosphine oxide as photopolymerization j is a monofunctional structure with a cyclic structure a mixture of a monomer (C1)-based acrylic acid and a phthalic acid mono-(methylacrylic acid-based ethyl acetoacetate) having a monomer (1 or more in one molecule) 1 molecular towel has A equal to i free compounds (C); and phenothiazine as a polymerization inhibitor. [14] A method of forming a cured film by applying an inkjet ink according to any one of the above [1] to [13] onto a substrate by an inkjet method, and coating the applied ink Light is irradiated, thereby forming a cured film. [15] A cured film obtained by the method according to [14] above. [16] The cured film according to [15] above, which is formed into a specific pattern. An anti-touch film which is obtained by the method as described in [14] above, [18] an anti-plating film, which is by the method as described in [Η] above. 9 201024380 32133pif [19] A method of manufacturing a substrate comprising: a step of forming a resist film or a plating resist film by a method as described above; a subsequent ruthenium plating or plating step; and thereafter The step of peeling off the above film. '[20] An electronic component 'which is obtained by the method described in [I% above] [21], which has the display element as described in [2〇] above. electronic
件。 IPieces. I
另外,於本說明書中,為了表示丙烯酸酯與甲基丙$ 酸醋兩者’有以「(甲基)丙烯酸g旨」的方式進行標記的IIn addition, in the present specification, in order to indicate that both acrylate and methacrylic acid vinegar are labeled with "(meth)acrylic acid g"
[發明之效果] 根據本發明的較好態樣的嘴墨用墨水,可提供一種〗 水的喷出性、膜的硬化性、耐蝕刻性、及耐鍍敷性点 可進行鹼剝離的喷墨用墨水。 、[Effects of the Invention] According to a preferred aspect of the present invention, the ink for nozzle ink can provide a sprayable property of water, a hardenability of a film, an etching resistance, and a spray which can be alkali-peeled at a plating resistance point. Ink ink. ,
為讓本發明之上述特徵和優職更鶴緒,下文 舉實施例,並配合所附圖式作詳細說明如下。 【實施方式】 1.本發明的喰|里墨水 本發明的噴墨用墨錢含#重量平均分子 12,_的範圍、且於1分子中具有大於等於2個聚合到In order to make the above-mentioned features and superior functions of the present invention more exemplified, the following embodiments will be described in detail with reference to the accompanying drawings. [Embodiment] 1. Ink of the present invention The ink for inkjet of the present invention contains a range of #weight average molecules 12, _ and has two or more polymerizations in one molecule.
基的酸改質環氧(甲基)丙烯酸醋(A 的喷墨用墨水。另外,本發明的喷墨用墨水可為無色亦3 為有色。 201024380 本發明的喷墨用墨水視需要可含有光聚合起始劑(B) 及/或於1分子中具有大於等於丨個自由基聚合性雙鍵的化 合物(C)。另外,本發明的喷墨用墨水視需要可進一步含 有酚樹脂、環氧樹脂、環氧硬化劑、界面活性劑、著色劑、 聚合抑制劑或溶劑等。 ❹ 本發明的喷墨用墨水較好的是至少含有重量平均分 子量為300〜12,000的範圍、且於!分子中具有大於等二 2個聚合性雙鍵及大於等於丨個羧基的酸改質環氧(甲基) 丙烯酸S旨(A)’光聚合起始劑⑻,及於i分子中具有大 =等於1個自由基聚合性雙鍵的化合物(c);其中,於1 分子中具有大於等於1個自由絲合性魏的化合物 較好的是包含具有環狀結構的單官能單體(C1) 」 是包含具有環狀結構的單官能單體(C1)與於i分 有大於等於1個羧基的單體(C2)。 八 丙烯醢酷 本發明的酸改質環氧(甲基)丙稀酸 :分子量為·〜12,_的範圍、且於i分子)中=3 4於2崎合倾鍵及大於等於1個絲的化=所ΐ 丙烯酸η田i 裟口的 雙鍵,例如可列舉: 稀酸曰基甲基丙烯酸醋 :二酿亞胺基。聚合性雙鍵可為熱聚合性 性’較好岐具有歧合性。 了為光I合 重量丙烯酸醋⑷以聚笨乙烯換算的 為300〜12,_的範圍,較好的是700〜 11 201024380 32133pif 11,500的範圍,更好的是900〜11,〇⑻的範圍,進而好的 是900〜8,000的範圍,尤其好的是9〇〇〜6〇〇()的範圍。 若為該範圍,則耐蝕刻性或耐鍍敷性等膜特性優異,喷射 特性亦良好。另外,所得的硬化膜對驗的溶解性亦良好, 不會出現不溶解成分成為殘渣的情形。 此處,本說明書中的重量平均分子量是使用p〇lymer Laboratories製造的THF系管柱作為管柱,藉由Gpc (gd Θ pemeation Chr0mat0graphy,凝膠渗透層析)法(管柱溫度: 35 C、流速·· 1 ml/min)而求出的值。另外,本說明書中 的市售品的重量平均分子量為目錄刊登值。 酸改質環氧(甲基)丙烯酸酯(A)於丨分子中具有大 於等於2個聚合性雙鍵,較好的聚合性雙鍵的個數與酸 氧(曱基)丙烯酸醋(A)的分子量相關,因此難以僅 I、個數作明確規定,例如較好的是2個〜4〇個,更好的 〜35個,進而好的是2個〜3〇個,尤其好的是2 制料是2個〜15個。絲合㈣鍵的健 =等於2個,則硬倾可取得立咖狀結構,可形成且 及耐蝕刻性的膜。另-方面,若聚合性雙鍵的 ===固,則可降低硬化收縮,故基板與硬化膜 的在接1±良好’ _刻性及_敷性等職性良好。 f外,若以「聚合性雙鍵當量 ===的聚合性雙鍵的個數加= =好的疋200 ( g/當量)〜_ ( 當量)〜⑽量),尤其好的是二: 12 201024380The acid-modified epoxy (meth)acrylic acid vinegar (A inkjet ink of A. The inkjet ink of the present invention may be colorless or 3 colored. 201024380 The inkjet ink of the present invention may optionally contain The photopolymerization initiator (B) and/or the compound (C) having one or more radical polymerizable double bonds in one molecule. The inkjet ink of the present invention may further contain a phenol resin or a ring as needed. An oxygen resin, an epoxy curing agent, a surfactant, a coloring agent, a polymerization inhibitor, a solvent, etc. ❹ The inkjet ink of the present invention preferably contains at least a weight average molecular weight of 300 to 12,000, and a ? molecule An acid-modified epoxy (meth)acrylic acid having a weight greater than two or more polymerizable double bonds and having more than one carboxyl group, (A)' photopolymerization initiator (8), and having a large = equal to i molecule a compound (c) having a radically polymerizable double bond; wherein, in the molecule of 1 or more, a compound having one or less free filamentity, preferably a monofunctional monomer having a cyclic structure (C1) Is a monofunctional monomer having a cyclic structure C1) is a monomer (C2) having one or more carboxyl groups in i. It is an acid-modified epoxy (meth)acrylic acid of the present invention: a molecular weight of ~12, _, and In the i molecule) = 3 4 in the 2 kakissen pour bond and 1 or more filaments = ΐ 丙烯酸 丙烯酸 i i i 裟 的 的 的 的 的 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 丙烯酸 双 双 双Imino group. The polymerizable double bond may have a thermal polymerization property of < For the light I combined weight acrylic vinegar (4) in terms of polystyrene conversion of 300~12, _ range, preferably 700~ 11 201024380 32133pif 11,500 range, better is 900~11, 〇 (8) The range, and thus the better, is in the range of 900 to 8,000, and particularly preferably in the range of 9 〇〇 to 6 〇〇 (). When it is in this range, film properties such as etching resistance and plating resistance are excellent, and ejection characteristics are also good. Further, the obtained cured film was also excellent in solubility in the test, and the insoluble component did not become a residue. Here, the weight average molecular weight in the present specification is a THF-based column manufactured by p〇lymer Laboratories as a column, by Gpc (gd pe pemeation Chr0mat0graphy, gel permeation chromatography) method (column temperature: 35 C, The value obtained by the flow rate··1 ml/min). Further, the weight average molecular weight of the commercially available product in the present specification is a catalogue value. The acid-modified epoxy (meth) acrylate (A) has two or more polymerizable double bonds in the ruthenium molecule, and the number of preferred polymerizable double bonds and the acid oxygen (mercapto) acrylate vinegar (A) The molecular weight is related, so it is difficult to specify only I and the number. For example, it is preferably 2 to 4, and more preferably ~35, and then preferably 2 to 3, especially preferably 2 The material is 2 to 15 pieces. When the number of the silk bond (four) bond is equal to two, the film can be formed into a solid coffee structure and can be formed into an etch-resistant film. On the other hand, when the === solid of the polymerizable double bond, the hardening shrinkage can be lowered, so that the substrate and the cured film are in good contact with each other. In addition, in the case of "polymeric double bond equivalent === number of polymerizable double bonds plus == good 疋200 (g/equivalent)~_(equivalent)~(10) amount, especially good is two: 12 201024380
JziMpir (g/虽里)。所謂聚合性雙鍵當量,是指酸改質環氧(甲基) 7稀酸酯(A)的分子量除以酸改質環氧(甲基)丙烯酸土醋 (A) 1分子中所含的聚合性雙鍵的個數而得的值。 酸改質環氧(甲基)丙烯酸酯(A)於1分子中具有大 於等於1個羧基’較好的羧基的個數亦與酸改質環氧(曱基) 丙烯酸S旨(A)的分子量侧’因此難以僅對其個數作明 讀規定’例如較好的是1個〜4G個,更好的是2個〜35 ❹個,進=好的是2個〜3〇個,尤其好的是2個〜2〇個特 別好的是2個〜15個。若具有至少1個羧基,則可對硬化 臈賦予對鹼性剝離液的剝離性。另一方面,若 小於等^個,則可維持硬化膜的耐鑛敷性 因此,若為這些範圍,則對鹼的溶解性良好,且不會出現 . 於剝離步驟後未溶解成分成為殘渣的情形,另外,耐鍍敷 性及耐蝕刻性等膜特性亦良好,鹼剝離性與耐蝕刻性^耐 鍍敷性的平衡較好。 另外,若以「羧基當量」對酸改質環氧(甲基)丙烯酸 酯(A)中所含的羧基的個數加以說明,則為35〇(g/當量) 〜2000 (g/當量)(酸值相當於3〇 mgKOH/g)’較好的是400 (g/當量)〜9〇〇 (g/當量)(酸 值相當於60 mgKOH/g〜130 mgKOH/g),更好的是45〇(g/ ^篁)〜8〇〇 (g/當量)(酸值相當於70 mgK〇H/g〜120 mgKOH/g),進而好的是500 (岁當量)〜7〇〇 (g/當量)(酸 值相當於80 mgKOH/g〜110 mgKOH/g),尤其好的是53〇 (g/當量)〜660 ( g/當量)(酸值相當於85 mgK〇H/g〜1〇5 13 201024380 32133pif mgKOH/g)。所謂敌基當量,是指酸改質環氧(甲基)丙烯酸 酯(A)的分子量除以酸改質環氧(甲基)丙烯酸酯⑷i 分子中所含的羧基的個數而得的值。 酸改質環氧(甲基)丙烯酸g旨(A)的具體例可列舉: 使具有減的(甲基)_義與環氧化合物反應,再使反 應所得的環氧(甲基與多元酸或多㈣酐 得的物質。 環氧化合物可列舉:苯盼祕清漆型、甲盼祕清漆 型、雙盼A型、雙盼F型、雙盼s型、三苯盼甲院型、四 苯盼乙烧型的魏樹脂等,其幢好的是苯騎搭清漆 型、曱盼紛搭清漆型、雙紛A型、雙盼F型,其中更好的 是雙盼A型、㈣F型’其中尤其好的是雙❹型於財鍛 敷性方面優異,故較好。 具有羧基的(甲基)丙烯酸酯可列舉:(曱基)丙烯酸、(甲 基)丙f酸二聚物、ω-叛基聚己内醋單(甲基)丙烯酸醋、號 拍酸單[2·(甲基)丙婦酿氧基乙基]醋、順丁稀二酸單甲 基),丙烯酿氧基乙基]醋、環己稀_3 4_二甲酸單叫甲基)丙稀 醯氧基乙基]醋、鄰苯二甲酸酐與(曱基)丙稀酸羥基乙醋的 反應物、及六氫鄰笨二甲酸酐與(甲基)丙稀酸減乙 反應物等。 多元酸或多元酸酐可列舉:鄰苯二曱酸、均苯四曱 酸、琥珀酸、偏苯三甲酸、四氫鄰苯二曱酸、六氫鄰苯二 曱酸順丁烯一酸、衣康酸(itaconic acid )、檸康酸 (citraconic acid)、曱基六氫鄰苯二曱酸、六氫偏苯三曱 201024380 32133pif 酸、内亞曱基四氫鄰笨二甲酸、曱基内亞甲基四 曱酸或苯乙烯-順丁烯二酸共聚物等多元酸;鄰笨二: 針、均苯四甲酸二酐、琥拍酸針、偏苯三甲酸軒、鄰 苯二曱酸酐、六氫鄰苯二曱酸酐、順丁烯二酸軒 針、檸康酸酐、甲基六氫鄰苯二曱酸肝、六氣偏笨三=酸 酐、偏苯^甲酸肝、内亞曱基四氫鄰苯二甲酸軒、甲基内 亞曱基四氫鄰苯二曱酸軒或苯乙烯-順丁烯二酸軒共&物 ▲ 等多元酸酐。 本發明十所使用的環氧化合物、具有羧基的(曱基)丙 烯酸酯、多元酸或多元酸酐可為丨種化合物,亦可為大於 等於2種化合物的混合物。 、 酸改質環氧(曱基)丙烯酸酯(A)的市售品可列舉: 日本化藥股份有限公司製造的KAYARAD CCR-1159h (分JziMpir (g/ though). The polymerizable double bond equivalent means the molecular weight of the acid-modified epoxy (methyl) 7 dibasic acid ester (A) divided by the acid-modified epoxy (meth)acrylic acid (A) 1 molecule. A value obtained by the number of polymerizable double bonds. The number of the acid-modified epoxy (meth) acrylate (A) having 1 or more carboxyl groups in one molecule is preferably the same as that of the acid-modified epoxy (fluorenyl) acrylic acid (A). The molecular weight side is therefore difficult to specify only for its number. For example, it is preferably 1 to 4G, more preferably 2 to 35, and preferably = 2 to 3, especially The good is 2 ~ 2 〇 a particularly good is 2 ~ 15. When it has at least one carboxyl group, the hardening enthalpy can be provided to the alkaline peeling liquid. On the other hand, if it is less than or equal to the same, the mineralization resistance of the cured film can be maintained. Therefore, if it is within these ranges, the solubility in alkali is good and does not occur. The undissolved component becomes a residue after the peeling step. In addition, film properties such as plating resistance and etching resistance are also good, and the balance between alkali peeling property and etching resistance and plating resistance is good. Further, when the number of carboxyl groups contained in the acid-modified epoxy (meth) acrylate (A) is described as "carboxy equivalent", it is 35 〇 (g/eq) to 2000 (g/equivalent). (acid value is equivalent to 3 〇 mg KOH / g) 'better 400 (g / equivalent) ~ 9 〇〇 (g / equivalent) (acid value equivalent to 60 mgKOH / g ~ 130 mgKOH / g), better It is 45 〇 (g / ^ 篁) ~ 8 〇〇 (g / equivalent) (acid value is equivalent to 70 mg K 〇 H / g ~ 120 mg KOH / g), and further preferably 500 (year-old equivalent) ~ 7 〇〇 ( g/equivalent) (acid value equivalent to 80 mgKOH/g to 110 mgKOH/g), particularly preferably 53 〇 (g/eq) to 660 (g/eq) (acid value equivalent to 85 mgK〇H/g~ 1〇5 13 201024380 32133pif mgKOH/g). The term "equivalent" refers to the value obtained by dividing the molecular weight of the acid-modified epoxy (meth) acrylate (A) by the number of carboxyl groups contained in the acid-modified epoxy (meth) acrylate (4) i molecule. . Specific examples of the acid-modified epoxy (meth)acrylic acid g (A) include an epoxy (methyl and polybasic acid) obtained by reacting an epoxy group with a reduced (meth)_ meaning and an epoxy compound. Or more (four) anhydride derived substances. Epoxy compounds can be listed: benzene anti-mystery varnish type, a look forward to secret varnish type, double hope A type, double hope F type, double hope s type, triphenyl apron type, tetraphenyl Hope for the type of Wei resin, such as Wei resin, its good building is benzene riding varnish type, hoping to take varnish type, double A type, double hope F type, of which the better is double expectation A type, (four) F type' Among them, it is particularly preferable that the biguanide type is excellent in forging properties, and therefore it is preferable. The (meth)acrylate having a carboxyl group may, for example, be a (meth)acrylic acid, a (meth)propane f acid dimer, or ω. -Rebel-based vinegar single (meth)acrylic acid vinegar, No. succinic acid [2 · (methyl) propylene oxyethyl] vinegar, cis-butanic acid monomethyl), propylene oxy a reaction product of ethyl] vinegar, cycloheximide _3 4 _ dicarboxylic acid, monomethyl, propylene oxyethyl] vinegar, phthalic anhydride and (mercapto) acrylic acid hydroxyethyl vinegar, and Hexahydrophthalic anhydride and Yl) acrylic acid reaction product of acetic Save. Examples of the polybasic acid or polybasic acid anhydride include: phthalic acid, pyromellitic acid, succinic acid, trimellitic acid, tetrahydrophthalic acid, hexahydrophthalic acid, maleic acid, and clothing. Itaconic acid, citraconic acid, mercapto hexahydrophthalic acid, hexahydrotrimellitic acid 201024380 32133pif acid, endo-indenyltetrahydro-o-p-dicarboxylic acid, thiopyrylene a polybasic acid such as methyl tetradecanoic acid or a styrene-maleic acid copolymer; o-stuppy: needle, pyromellitic dianhydride, succinic acid needle, trimellitic acid, phthalic anhydride, Hexahydrophthalic anhydride, maleic acid Xuanzheng, citraconic anhydride, methylhexahydrophthalic acid liver, six gas stupid three=anhydride, partial benzene^carboxylic acid liver, inner sulfhydryl four Hydrogen phthalic acid, methyl endonamidinotetrahydrophthalic acid or styrene-maleic acid Xuan & ▲ and other polyanhydrides. The epoxy compound, the (mercapto) acrylate having a carboxyl group, the polybasic acid or the polybasic acid anhydride used in the tenth invention may be a hydrazine compound or a mixture of two or more compounds. For the commercial product of the acid-modified epoxy (fluorenyl) acrylate (A), KAYARAD CCR-1159h manufactured by Nippon Kayaku Co., Ltd.
子量:7500、酸值:1〇1 mgKOH/g)、KAYARAD CCR-1285H (酸值:82 mgKOH/g )、KAYARAD ZFR-1401H (分子量: 12000、酸值:99 mgKOH/g)、KAYARAD ZFR-1491H (酸 ❿ 值:100 mgKOH/g)、KAYARAD ZFR-1492H (酸值:1〇2 mgKOH/g)、KAYARAD TCR-1310H (分子量:4500、酸 值:104 mgKOH/g) ; Japan U-pica股份有限公司製造的 NEOPOL 8430 (分子量:10000、酸值:88 mgKOH/g)、 NEOPOL 8432 (分子量:8000、酸值:92 mgKOH/g)、 NEOPOL 8470 (分子量:10000、酸值:1〇〇 mgKOH/g)、 NEOPOL 8472 (分子量:7000、酸值:105 mgKOH/g)、 NEOPOL 8475 (分子量:10000、酸值:1〇1 mgKOH/g)、 15 201024380 32133pif NEOPOL 8476 (分子量:5000、酸值:1〇1 mgKOH/g)、 NEOPOL 8477 (分子量:10000、酸值:94 mgK〇H/g)、 NEOPOL 8371、NEOPOL 8316、NEOPOL 8317、NEOPOL 8310 (分子量:looo、酸值:mgKOH/g)等。另外, 本段落中的「分子量」表示重量平均分子量。 若酸改質環氧(甲基)丙烯酸酯(A)的含量為喷墨用 墨水總量的1 wt%〜60 wt% (重量百分比),則耐姓刻性或 耐鑛敷性與驗剝離性及喷射特性的平衡變好,故較好,更 好的是2 wt%〜50 wt%,進而好的是3 wt%〜45 wt%,尤 ❹ 其好的是4 wt%〜40 wt%。 1.2光聚合起始劑(B) 為了對喷墨用墨水賦予光硬化性,其可含有光聚合起 始劑(B)。光聚合起始劑(B)若為藉由紫外線或可見光 線的照射可產生自由基的化合物,則並無特別限定。 光聚合起始劑(B)的具體例可列舉:二苯曱_、米 其勒酮(Michler’s ketone )、4,4,-雙(二乙基胺基)二苯曱酮、 氧雜蒽酮(ttiioxanthone )、硫雜蒽酮(thi〇xanth〇ne )、異 ❹ 丙基氧雜蒽酮、2,4-二乙基硫雜蒽酮、2_乙基蒽酿、苯乙酮、 2-羥基-2-甲基苯丙酮、2-羥基·2-曱基_4,-異丙基苯丙酮、1-經基環己基苯基酮、異丙基安息香鍵、異丁基安息香醚、 2,2-一乙氧基苯乙酮、2,2·二甲氧基_2-苯基苯乙酮、樟腦醌 (camphoroquinone )、苯幷蒽酮(benzanthr〇ne )、2_ 甲基 曱硫基)苯基]-2-嗎琳基丙烧_ι__、2_节基·2_二甲基 私基-1 -(4-嗎琳基苯基)-丁明_1、4-二甲基胺基苯甲酸乙 16 201024380 ^2133ρΐί :二二二”咖醋“叫第三了基過氧基 斂基)一本甲_、3 4,4,_三(第三丁基過 ϋΪ’4己4^(第三丁基過氧基祕)二苯甲綱、3,3,,4,4,_ 一 土過氧基羰基)二苯甲_、3,3'-二(甲氧美_ 基)_4,4,-二(第三丁基 (T乳基^ 、軋基釦基)一本甲酿I、3,4,-二(甲氧基 ❹ ❹ 甘、t _,_一第三丁基過氧基羰基)二苯甲酮、4,4,-二(甲氧 土羰基)-3,3,-二(第三丁基過氧基羰基)二笨曱酮、^辛二 =2·(苯硫基)苯基]、2_(鄰苯甲酿基將)、2_(4,_甲氧基^ 土 4,6-雙(二氣甲基)_均三嗪、2_(3丨,4丨-二甲氧基苯乙 ^基)·Ί(二氣甲基)_均三唤、2_(2’,4,·二甲氧基苯乙烯 ςΗ,6-雙(三氣甲基)_均三喚、2_(2’_甲氧基苯乙烯基)4,6_ 雙(二氯甲—基)_均三嗓、2.(4,·戊氧基苯乙烯基)♦雙(三氯 甲基)-均f嗪、4-[對'沁二(乙氧基羰基甲基)]_2,6二(三氣 曱基)-均三嗪、1,3_雙(三氣甲基)_5_(2,_氣苯基)_均三嗪、^ ,(一氣甲基)·5_(4’_甲氧基苯基)_均三嗪、2_(對二甲基胺基 苯乙烯基)苯幷噁唑、2-(對二甲基胺基苯乙烯基)苯幷噻 唑、2=巯基苯幷噻唑、3,3L羰基雙(7·二乙基胺基香豆素)、 2-(鄰亂本基)-4,4^5,5^四苯基-1,2’-聯咪β坐、2,2'_雙(2-氣苯 基Μ,4’,5,5’-四(4-乙氧基羰基苯基聯咪唑、2,2,_雙 (2,4-二氯苯基)_4,4,,5,5,-四苯基-1,2,-聯咪唑、2,2,-雙(2,4-二 >臭苯基)-4,4’,5,5'-四苯基-1,2,-聯咪唑、2,2’_雙(2,4,6-三氯笨 基)-4,4’,5,5'·四苯基-1,2’-聯咪唑、3-(2-甲基-2-二甲基胺基 丙醯基)咔唑、3,6-雙(2-甲基-2-嗎啉基丙醯基)_9_正十二^ 基咔唾、1-經基環己基苯基酮、雙(7? 5-2,4-環戊二烯_丨_基f 17 201024380 32133pif 雙(2,6_二氣-3-(lH_n比嘻基)_苯基)鈦、雙(2,4,6_三 + 甲醯基)笨基氧化膦、或2,4,6_三甲基苯甲醯基二苯美 鱗0 光聚合起始劑(B)可為1種化合物,亦可為大於 於2種化合物的混合物。光聚合起始劑(B)的含二等 喷墨用墨水總量的〇 5 wt%〜2〇 wt%,則製成 右為 時’對紫外線為高感度,故較好,更好的是1 水 wt% ’進而好的是2 wt%〜20 wt%。 °〜2〇Sub-amount: 7500, acid value: 1〇1 mgKOH/g), KAYARAD CCR-1285H (acid value: 82 mgKOH/g), KAYARAD ZFR-1401H (molecular weight: 12000, acid value: 99 mgKOH/g), KAYARAD ZFR -1491H (acid value: 100 mgKOH/g), KAYARAD ZFR-1492H (acid value: 1〇2 mgKOH/g), KAYARAD TCR-1310H (molecular weight: 4500, acid value: 104 mgKOH/g); Japan U- NEOPOL 8430 (molecular weight: 10000, acid value: 88 mgKOH/g) manufactured by Pica Co., Ltd., NEOPOL 8432 (molecular weight: 8000, acid value: 92 mgKOH/g), NEOPOL 8470 (molecular weight: 10000, acid value: 1〇) 〇mgKOH/g), NEOPOL 8472 (molecular weight: 7000, acid value: 105 mgKOH/g), NEOPOL 8475 (molecular weight: 10000, acid value: 1〇1 mgKOH/g), 15 201024380 32133pif NEOPOL 8476 (molecular weight: 5000, Acid value: 1〇1 mgKOH/g), NEOPOL 8477 (molecular weight: 10000, acid value: 94 mgK〇H/g), NEOPOL 8371, NEOPOL 8316, NEOPOL 8317, NEOPOL 8310 (molecular weight: looo, acid value: mgKOH/ g) Wait. In addition, "molecular weight" in this paragraph means a weight average molecular weight. If the content of the acid-modified epoxy (meth) acrylate (A) is from 1 wt% to 60 wt% (% by weight) based on the total amount of the ink for inkjet, it is resistant to surname or mineralization and peeling The balance of the properties and the spray characteristics is better, so it is better, more preferably 2 wt% to 50 wt%, and further preferably 3 wt% to 45 wt%, especially preferably 4 wt% to 40 wt%. . 1.2 Photopolymerization initiator (B) In order to impart photocurability to the ink for inkjet, it may contain a photopolymerization initiator (B). The photopolymerization initiator (B) is not particularly limited as long as it is a compound which generates a radical by irradiation with ultraviolet rays or visible rays. Specific examples of the photopolymerization initiator (B) include diphenyl hydrazine, Michler's ketone, 4,4,-bis(diethylamino)benzophenone, xanthone (ttiioxanthone), thioxanthone (thi〇xanth〇ne), iso-propyl oxazepinone, 2,4-diethylthiaxanone, 2-ethyl oxime, acetophenone, 2- Hydroxy-2-methylpropiophenone, 2-hydroxy-2-ylindolyl-4,-isopropylpropiophenone, 1-cyclohexyl phenyl ketone, isopropyl benzoin bond, isobutyl benzoin ether, 2 , 2-monoethoxyacetophenone, 2,2. dimethoxy-2-phenylacetophenone, camphoroquinone, benzalthrne, 2_methylsulfonyl Phenyl]-2-morphinylpropene _ι__, 2_knotyl·2_dimethyl-l-yl-1 -(4-morphinylphenyl)-butamine-1,4-dimethyl Aminobenzoic acid B 16 201024380 ^2133ρΐί : 22 22" vinegar "called the third base based on oxygen condensate base" a _, 3 4, 4, _ three (third butyl ϋΪ ϋΪ '4 4^(T-butylperoxy)diphenylmethyl, 3,3,,4,4,_ alkoxycarbonyl)diphenyl-, 3,3'-di(methoxy- Base)_4,4,-two ( Tributyl (T-based, rolling base) a brewing I, 3,4,-bis (methoxy oxime, t _, _ a tert-butylperoxycarbonyl) diphenyl Methyl ketone, 4,4,-bis(methoxycarbocarbonyl)-3,3,-bis(t-butylperoxycarbonyl)dibenzinone, octyl 2=(phenylthio)phenyl ], 2_(o-phenylene), 2_(4,_methoxy^, 4,6-bis(dimethyl)-s-triazine, 2_(3丨,4丨-dimethoxy Phenylethyl) Ί (dimethyl) 均 唤, 2_(2',4,·dimethoxystyrene oxime, 6-bis(trimethyl)methyl _, all three, 2_( 2'_Methoxystyryl) 4,6_bis(dichloromethyl-yl)---tris-, (.4,-pentyloxystyryl) ♦ bis(trichloromethyl)--f Oxazine, 4-[p-'p-bis(ethoxycarbonylmethyl)]_2,6-bis(tris-methyl)-s-triazine, 1,3_bis(trimethyl)methyl-5_(2, qi Phenyl)-s-triazine, ^, (monomethyl)·5_(4'-methoxyphenyl)-s-triazine, 2-(p-dimethylaminostyryl)benzoxazole, 2 -(p-dimethylaminostyryl)benzothiazole, 2=mercaptobenzothiazole, 3,3 L carbonyl bis(7·diethylaminocoumarin), 2-(neighborhood )-4,4^5,5^tetraphenyl-1,2'-linked imipenone, 2,2'-bis (2-phenylphenyl hydrazine, 4',5,5'-tetra (4- Ethoxycarbonylphenylbiimidazole, 2,2,_bis(2,4-dichlorophenyl)_4,4,5,5,-tetraphenyl-1,2,-biimidazole, 2,2 ,-bis(2,4-di>odorophenyl)-4,4',5,5'-tetraphenyl-1,2,-biimidazole, 2,2'-bis (2,4,6 -trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 3-(2-methyl-2-dimethylaminopropionyl)carbazole , 3,6-bis(2-methyl-2-morpholinylpropanyl)_9_n- 12-yl hydrazine, 1-cyclohexyl phenyl ketone, bis (7? 5-2, 4 -cyclopentadiene_丨_yl f 17 201024380 32133pif bis (2,6_digas-3-(lH_n than fluorenyl)-phenyl)titanium, bis(2,4,6_tri+methylmercapto) The stupyl phosphine oxide or the 2,4,6-trimethyl benzhydryl diphenyl smectin 0 photopolymerization initiator (B) may be one compound or a mixture of more than two compounds. The photopolymerization initiator (B) contains 〇5 wt% to 2 〇wt% of the total amount of the second-class inkjet ink, and when it is made to the right, it is high sensitivity to ultraviolet rays, so it is better, and more preferably 1 water wt% 'and further preferably 2 wt% ~ 20 wt%. °~2〇
的化合 為了調整成符合所使用的用途的黏度,噴墨用 子中具有大於等於1個自由基聚合性雙鍵7的: jit) °所謂「自由基聚合性」,是指藉由利用照射光 所產生的自由基(freeradical)而開始聚合的性質。 化合物(〇们分子中具有大於等於1個自 ^性雙鍵,較好的自由基聚合性雙_個數亦與化二In order to adjust the viscosity in accordance with the use to be used, the inkjet device has one or more radical polymerizable double bonds 7 in the ink jet: jit) ° "radical polymerizability" means by using irradiation light The nature of the free radical generated to initiate polymerization. a compound (they have one or more self-bonding double bonds in the molecule, and the preferred radical polymerizable double _ number is also two
i _以僅對其個數作明確規定:例 如較好的疋1個〜6個,更好的是i個〜3個,進而 1個〜2個,尤其好的是1個。 疋 另外,若以「自由基聚合性雙鍵當量」對化合物((n 所3的自由絲合性雙賴她加賴明,則較好的 i〇〇(g/當量)〜500 (g/當量),更好的是13〇(g/ 量^00 (g/當!),尤其好的是15〇 (g/當量)〜3〇〇 (以當 18 201024380 321 όόρΐί 化合物(C)較好的是分子量為100〜1000的範圍, 更好的是150〜500的範圍,進而好的是18〇〜4〇〇的範 尤其好的是200〜300的範圍。 ❹ e 於1分子中具有大於等於丨個自由基聚合性雙鍵的化 合物(C)的具體例可列舉:自由基聚合性雙鍵的個數 ,或多個的單官能單體或多官能單體,尤其好的是單官能 ^或二官能單體’其巾尤其好的是具有環狀結構的單官 能單體(C1)(具有環狀結構及丨個自由基聚合性雙鍵的 ,體)。另外’進而好的是—起包含具有環狀結構的翠 單體(C1)與於1分子中具有大於等…個絲的單體(⑵ (於1分子令具有大於等於1個自由絲合性雙鍵及大於 等於1個羧基的單體)。 、 、具有環狀結構的單官能單體(C1)中的「環狀結構」, 尤其疋4日月a環、雜環 ' 务香環,例如可列舉:環己美、产 J基、環庚基、異祕、三環癸基、四氫糠基"二基, 苯基、萘基、蒽基、或η比咬基。 具有環狀結構的單官能單體(C1)的具體例可列舉: (甲基)丙烯酸環己醋、(甲基)丙烯酸二環戊烯酯、(甲基 烯酸二環戊烯氧基乙酯、(曱基)丙烯酸二環戊酯美 丙烯酸異获醋、(曱基)丙稀酸-4-丁基環己醋、队環己基^ 丁烯二醯亞胺、(曱基)丙烯酸三環[5 2丄〇2,6]癸酯、甲1基 丙烯酸-2-甲基-2-金剛烧酷、(曱基)丙稀酸^甲基金剛烧 醋、(曱基)丙烯酸-2-乙基-2-金剛紅、(曱基)丙婦酸_35_ 二曱基·7_減金剛㈣、3·_小甲基丙騎氧基金剛 19 201024380 32133pif 烧、(甲基)丙稀酸-3-經基-1-金剛炫醋、(甲基)丙烯酸乙基 環戊酯、(曱基)丙烯酸三環[5,2,1,02,6]癸_8-基酯、3,5_二經 基-1-甲基丙烯醯氧基金剛烷、甲基丙烯醯氧基降莰貌甲基 丙烯酸醋、(甲基)丙婦酸四氫糠醋、己内酯改質(甲基)丙稀 酸四氫糠酯、N-丙烯醯基嗎啉、N-乙烯基已内醯胺、泳乙 烯基吡咯啶酮、N-丙烯醯氧基乙基六氫鄰苯二甲醯亞胺、 環狀二經甲基丙燒縮甲搭丙稀酸g旨、丁内醋(甲基)丙婦 酸酯、甲羥戊酸内酯(甲基)丙烯酸酯、環狀醯亞胺^烯酸 醋、Ν_苯基順丁烯二醯亞胺、Ν_環己基順丁稀=酿亞胺、 乙烯基吼啶、(甲基)丙烯酸苯酯、(曱基)丙烯酸苄酯、(甲 基)丙烯酸甲基苯氧基乙酯、(甲基)丙烯酸_2_苯氧基乙酯、 乙烯基甲苯、Ν-苯基順丁烯二醯亞胺、苯乙烯、甲基苯乙 稀、氯甲基苯乙烯、或聚苯乙稀巨單體(邮咖⑽。贿)。 ❹ 其中,尤其是(甲基)丙烯酸環己醋、(甲基)丙稀酸二環 戍烯醋、(曱基)丙烯酸二環戊烯氧基乙醋、(甲基)丙稀酸二 環戊醋、(曱基)丙烯酸異获醋、(甲基)丙烯酸四氫糠醋、己 内醋改質(甲基)丙烯酸四氫糠醋、N_丙婦醯基嗎琳、队乙 烯基己内_、N-乙縣鱗鋼、環狀 甲基)丙細旨 '卜丁内_丙烯酸醋、或甲; 戍,内S旨(曱基旨’由於可霞成符合所使用的用 性或耐鑛敷性,故較好。i _ is only specified for its number: for example, better 疋 1 ~ 6 , more preferably i ~ 3, and then 1 ~ 2, especially good one.疋 In addition, if the compound is ("free radically polymerizable double bond equivalent" to the compound ((the free silk of 3 is doubled to her, the better i 〇〇 (g / equivalent) ~ 500 (g / Equivalent), more preferably 13 〇 (g / amount ^ 00 (g / when!), especially good 15 〇 (g / equivalent) ~ 3 〇〇 (to 18 when 201024380 321 όόρΐί compound (C) better The molecular weight is in the range of 100 to 1000, more preferably in the range of 150 to 500, and further preferably the range of 18 〇 to 4 尤其 is particularly preferably in the range of 200 to 300. ❹ e is greater than 1 molecule Specific examples of the compound (C) which is equal to one radical polymerizable double bond include a number of radically polymerizable double bonds, or a plurality of monofunctional monomers or polyfunctional monomers, particularly preferably monofunctional. ^ or a difunctional monomer' is particularly preferred as a monofunctional monomer (C1) having a cyclic structure (a ring structure and a radically polymerizable double bond). - a monomer comprising a ring-shaped structure (C1) and a monomer having more than one wire in one molecule ((2) (having 1 or more in 1 molecule) a "cyclic structure" in a monofunctional monomer (C1) having a cyclic structure and a ring-shaped double bond and a monomer having one or more carboxyl groups, particularly a ring of a month and a ring of a heterocyclic ring The scented ring may, for example, be cycloheximide, a J-based group, a cycloheptyl group, a heterocyclic group, a tricyclic fluorenyl group, a tetrahydroindenyl group, a diphenyl group, a naphthyl group, a fluorenyl group, or a η ratio bite. Specific examples of the monofunctional monomer (C1) having a cyclic structure include (meth)acrylic acid cyclohexanoic acid, dicyclopentenyl (meth)acrylate, and (methenoic acid dicyclopentene oxide). Ethyl ethyl ester, (cyclo)acrylic acid dicyclopentyl acrylate, acrylic acid, isopropyl vinegar, (fluorenyl) acrylic acid, 4-butylcyclohexan vinegar, cycline, butyl phthalimide, (fluorenyl) Tricyclo[5 2丄〇2,6]decyl acrylate, methacrylic acid-2-methyl-2-gold ruthenium, (mercapto) acrylic acid, methyl genus vinegar, (mercapto) acrylate -2-ethyl-2-adamond red, (fluorenyl) propyl glycerol _35_ dimercapto 7-reduced ruthenium (four), 3 · _ small methyl propyl oxy gold just 19 201024380 32133pif burn, (methyl) Acetate-3-carbyl-1-gold vinegar, (meth) propylene Ethylcyclopentyl ester, tricyclo[5,2,1,02,6]indole-8-yl (meth) acrylate, 3,5-di-propyl-1-methylpropenyloxyadamantane, Methyl propylene oxime oxime methacrylate, (methyl) propyl benzoate tetrahydro hydrazine vinegar, caprolactone modified (meth) propyl tetrahydro phthalate, N- propylene decyl morpholine , N-vinyl decylamine, swimming vinyl pyrrolidone, N-propylene methoxyethyl hexahydrophthalimide, cyclic dimethicone methacrylate丁, butyl vinegar (methyl) propionate, mevalonate (meth) acrylate, cyclic quinone iminoleic acid vinegar, Ν phenyl butyl succinimide, hydrazine _cyclohexyl cis-butadiene = brewed imine, vinyl acridine, phenyl (meth) acrylate, benzyl (meth) acrylate, methyl phenoxy (meth) acrylate, (meth) acrylate _2_phenoxyethyl ester, vinyl toluene, fluorene-phenyl maleimide, styrene, methyl styrene, chloromethyl styrene, or polystyrene macromonomer Coffee (10). bribe). ❹ Among them, especially (meth)acrylic acid cyclohexan vinegar, (meth)acrylic acid dicyclodecene vinegar, (mercapto)acrylic acid dicyclopentenyloxyacetic acid, (meth)acrylic acid bicyclic ring Valeric vinegar, (mercapto) acrylic acid vinegar, (meth)acrylic acid tetrahydroanthraquinone vinegar, caprolactone modified (meth)acrylic acid tetrahydroanthraquinone vinegar, N_C 醯 醯 吗 、 、, team vinyl _, N-B county scale steel, cyclic methyl) propyl fine 'Buddin _ acryl vinegar, or A; 戍, S 旨 曱 曱 曱 由于 由于 由于 由于 由于 由于 由于 可 可It is better to resist mineralization.
孝乂好的疋1個〜4個,更好的是J 20 201024380 個〜3個,進而好的是1個〜2個,特別好的是1個。 另外,若以「羧基當量」對單體(C2)中所含的羧基 的個數加以說明,則較好的是200 (g/當量)〜400 (g/當 量)(酸值相當於140 mgKOH/g〜300 mgKOH/g),更好的 是230(g/當量)〜350(g/當量)(酸值相當於16〇mgK〇H/g 〜250 mgKOH/g),進而好的是250 (g/當量)〜3〇〇 (g/ 當量)(酸值相當於180 mgKOH/g〜210 mgKOH/g)。 的具體例可列舉:(甲基)丙烯酸、(曱基)丙烯酸二聚物、丁 烯酸、α-氣丙烯酸、肉桂酸、順丁烯二酸、反丁烯二酸、 衣康酸、擰康酸、甲基反丁烯二酸(me_nieadd)、万_ ❹ 另外’於1分子中具有大於等於1個羧基的單體(C2) 叛乙基(曱基)丙稀酸g旨、 ω-竣基聚己内酯單(曱基)丙烯酸乂 乂 乂 乂 1 ~ 4, and better is J 20 201024380 ~ 3, and then good is 1 ~ 2, particularly good is 1. Further, when the number of carboxyl groups contained in the monomer (C2) is described by "carboxy equivalent", it is preferably 200 (g/eq) to 400 (g/eq) (the acid value is equivalent to 140 mgKOH). /g~300 mgKOH/g), more preferably 230 (g/equivalent) to 350 (g/equivalent) (acid value equivalent to 16 〇 mg K 〇 H / g to 250 mg KOH / g), and further preferably 250 (g/equivalent) ~3 〇〇 (g/equivalent) (acid value equivalent to 180 mgKOH/g to 210 mgKOH/g). Specific examples thereof include (meth)acrylic acid, (mercapto)acrylic acid dimer, butenoic acid, α-gas acrylic acid, cinnamic acid, maleic acid, fumaric acid, itaconic acid, and screwing. Comic acid, methyl fumaric acid (me_nieadd), 10,000 ❹ ❹ another monomer having 1 or more carboxyl groups in one molecule (C2) bet ethyl (mercapto) acrylic acid g, ω- Mercapto-polycaprolactone mono(indenyl)acrylic acid
、(曱基)丙烯酸二聚物、石, (fluorenyl) acrylic acid dimer, stone
其中,尤其是(甲基)丙烯酸 -叛乙基(甲基)丙稀酸酯、 酯、琥珀酸罝田:&、工从_ 一 21 201024380 32133pif 好,故較好。 另外,除了具有環狀結構的單官能單體(C1)與於^ 分子中具有大於等於1個羧基的單體(C2)以外,於無損 耐蝕刻性或耐鍍敷性的範圍内,亦可含有其他具有自由Ί 聚合性雙鍵的化合物(C3)。 ^ ❹ ❹ 其他具有自由基聚合性雙鍵的化合物(C3)的具體例 可列舉:(甲基)丙烯酸曱酯、(甲基)丙烯酸乙酯、(甲基)丙 烯酸異丙酯、(甲基)丙烯酸異戊酯、(曱基)丙烯酸異丁酯、 (甲基)丙埽酸正TS旨、(曱基)丙烤酸第三丁醋、(甲基)丙曰婦 酸戊醋、(甲基)丙烯酸己醋、(甲基)丙稀酸庚0|、(甲基)丙 烯酸辛酯、(甲基)丙烯酸異辛酯、(曱基)丙烯酸_2乙基己 醋、(甲基)丙稀酸壬醋、(甲基)丙烯酸癸醋、(甲基)丙稀酸 異癸醋、(甲基)丙烯酸十二烧醋、(曱基)丙烯酸月桂醋、(曱 基)丙稀酸硬義、(甲基)丙烯酸_2•誠乙醋、(曱基)丙婦 酸-2-羥基丙醋、(甲基)丙烯酸冰經基丁醋、14環己烧二 甲醇單(甲基)丙烯酸醋、(甲基)_酸_2_曱氧基乙醋、(甲 丙烯酸-2·乙氧基乙醋、(甲基)丙稀酸_3甲氧基丁醋、(甲 基)丙稀酸乙氧基乙氧基乙§旨、(甲基)_酸丁氧基乙醋、 乙—基一乙一醇(甲基)丙烯酸醋、甲氧基二丙二醇(甲基) =缚酸醋、二丙二醇(▼基)丙稀_、二乙二醇單乙醚(f ,)丙烯酸醋、甘油單(曱基)丙婦酸醋、(甲基)丙稀酸三敦 :、酿亞胺(甲基)丙婦酸醋、N•乙稀基甲醯胺 、(曱基) 旨、(甲基)丙婦酸¥環氧環己醋、(甲基) 基縮水甘油s旨、3m(甲基)丙烯醯氧基甲基 22 201024380 όζΐόόρη 氧雜環丁烷、3-乙基-3-(甲基)丙烯醯氧基甲基氧雜環丁 烷、3-甲基-3_(曱基)丙烯醯氧基乙基氧雜環丁烷、3_乙基 -3-(曱基)丙烯醯氧基乙基氧雜環丁烷、對乙烯基苯基_3乙 基氧雜環丁烷-3·基曱基醚、2-苯基_3_(曱基)丙烯醯氧基曱 基氧雜環丁烷、2-三氟曱基_3_(甲基)丙烯醯氧基甲基氧雜 環丁烷、4-二氟甲基-2-(曱基)丙烯醯氧基甲基氧雜環丁 烷、(曱基)丙烯酸(3-乙基-3-氧雜環丁基)曱酯、聚甲基丙烯 ⑩酸曱醋巨單體、(甲基)丙烯醯胺、N,N_二曱基(曱基)丙稀醯 胺、N,N-二乙基(曱基)丙烯醯胺、N,N_:曱基胺基丙基(曱 基)丙烯醯胺、N-異丙基(甲基)丙烯醯胺、或义羥基乙基(甲 基)丙稀酿胺、N,N-二甲基(甲基)丙婦醯胺、N,N_二乙基(甲 基)丙烯酿胺、雙(經基曱基)三環癸燒二(甲基)丙稀酸醋、 • 二環癸烧二甲醇二(甲基)丙騎醋、雙盼A型環氧乙烧改 質二(曱基)丙埽酸醋、雙紛F型環氧乙燒改質二(甲基)丙稀 酸酯、三(2-經基乙基)異三聚氰酸醋三(甲基)丙稀酸醋、三 (2·羥基乙基)異三聚氰酸醋二(甲基)丙缚酸醋、三經甲基丙 烧=(甲基)丙埽酸醋、季戊四醇三(甲基)丙稀酸醋、乙二醇 二(甲基)丙烯酸醋、四乙二醇二(曱基)丙烯酸醋、聚乙二醇 二(甲基)丙烯酸醋、丁二醇二(曱基)丙稀酸醋、U6-己 二醇二(曱細_s|、新戊二醇二(甲基)丙稀酸醋、或三 羥曱基丙烷三氧乙基(曱基)丙烯酸酯。 a於丨、刀子巾具有大於等於1個自由絲合性雙鍵的化 口物(C)可為丨種化合物’亦可為大於等於2種化合物 23 201024380 32133pif 於1分子中具有大於等於1個自由基聚合性雙鍵的單 體(C)的含量若為喷墨用墨水總量的1〇wt%〜9〇wt%, 則可調整成符合所使用的用途的黏度,故較好,若考慮到 與其他特性的平衡,則更好的是10wt%〜80wt%,進而好 的是10 wt%〜70 wt0/。,尤其好的是10 wt%〜60 wt〇/〇。 1^_其他成分 為了提高各種特性,嘴墨用墨水可含有酚樹脂、環氧 樹脂、環氧硬化劑、界面活性劑、著色劑、聚合抑制劑或 溶劑等。 一 ί .4 Ο )盼樹脂 例如為了提高对姓刻性、耐鑛敷性或驗剝離性,嘴墨 用墨水可含有酚樹脂。 龄樹脂可較好地使用:藉由具有酚性羥基的芳香族化 合物與醛(aldehyde)類的縮合反應所得的酚醛清漆樹脂、 乙稀苯盼的均聚物(包括氫化物)、或乙歸苯盼與可與其進 行共聚的化合物的乙烯苯酚系共聚物(包括氫化物)等。 具有酚性羥基的芳香族化合物的具體例可列舉:苯 酚、鄰甲酚、間曱酚、對曱酚、鄰乙基笨酚、間乙基笨酚、 對乙基苯酚、鄰丁基苯酚、間丁基苯酚、對丁基苯酚、鄰 二曱苯酚、2,3-二曱苯酚、2,4-二甲笨酚、2,5_二曱苯酚、 3,4-二曱笨酚、3,5_二曱苯酚、2,3,5_三甲基笨酚、3,4,5_三 甲基苯酚、對笨基苯酚、間苯二酚、對笨二酚、對笨二酚 單甲基醚、鄰苯三酚、雙紛A、雙紛F、含有結烯(terpene) 骨架的二酚、沒食子酸、沒食子酸酯、α_萘酚、或冷-萘 24 201024380 齡。 同樣,醛類可列舉:曱醛、三聚曱醛 (paraformaldehyde )、糠酸(furfural )、苯曱酸、确基苯曱 醛、或乙醛等。 可與乙烯苯酚進行共聚的化合物的具體例可列舉:(曱 基)丙烯酸或其衍生物、苯乙烯或其衍生物、順丁烯二酸 軒、乙酸乙稀酯、或丙埽腈。Among them, especially (meth)acrylic acid - bet ethyl (meth) acrylate, ester, succinic acid field: &, work from _ 21 201024380 32133pif good, it is better. Further, in addition to the monofunctional monomer (C1) having a cyclic structure and the monomer (C2) having one or more carboxyl groups in the molecule, it may be in the range of non-destructive etching resistance or plating resistance. Contains other compounds (C3) having a free 聚合 polymerizable double bond. ^ ❹ 具体 Specific examples of the compound (C3) having a radical polymerizable double bond include decyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, (methyl) ) isoamyl acrylate, isobutyl (meth) acrylate, (methyl) propionic acid, TS, (meth) propane acid, third vinegar, (meth) acetoin, vinegar, ( Methyl acrylate vinegar, (meth) acrylate heptane 0|, octyl (meth) acrylate, isooctyl (meth) acrylate, (mercapto) acrylate 2 ethyl hexanoic acid, (methyl ) acetonic acid vinegar, (meth) acrylate vinegar, (meth) acrylate isophthalic acid vinegar, (meth) acrylate 12 vinegar, (mercapto) acrylic vinegar, (mercapto) propylene Acid hard, (meth)acrylic acid _2• 乙乙醋, (曱基)-propyl benzoate-2-hydroxypropyl vinegar, (meth)acrylic acid ice-based butyl vinegar, 14-ring hexane dimethanol single (A Acrylic vinegar, (meth)-acid _2_methoxy ethoxy vinegar, (methacrylic acid-2 ethoxy ethoxy vinegar, (methyl) acrylic acid _3 methoxy butyl vinegar, (methyl ) ethoxy ethoxy ethoxy b Base)_acid butoxyacetic acid, ethyl acetate-ethyl alcohol (meth)acrylic acid vinegar, methoxydipropylene glycol (methyl) = acidified vinegar, dipropylene glycol (▼-based) propylene _, two ethylene Alcohol monoethyl ether (f,) acrylic vinegar, glycerol mono(indenyl) acetoacetate, (methyl) acrylic acid dansone, yttrium imine (methyl) acetoin vinegar, N• 乙基基Indoleamine, (mercapto), (meth) propyl acetoate, epoxidized cyclohexan vinegar, (meth) glycerol s, s, 3, m, s, s, s, s Butane, 3-ethyl-3-(methyl)propenyloxymethyloxetane, 3-methyl-3(indenyl)propenyloxyethyloxetane, 3_ Ethyl-3-(indenyl)propenyloxyethyloxetane, p-vinylphenyl-3-ethyloxetane-3-yl decyl ether, 2-phenyl_3_( Mercapto) propylene fluorenyl fluorenyl oxetane, 2-trifluorodecyl _3_(methyl) propylene methoxymethyl oxetane, 4-difluoromethyl-2-(曱Acryloxymethyloxetane, (3-ethyl-3-oxetanyl) decyl (meth) acrylate, polymethyl propyl 10 acid vinegar giant monomer, (meth) acrylamide, N, N-dimercapto (mercapto) acrylamide, N, N-diethyl (decyl) acrylamide, N, N_ : mercaptoaminopropyl (mercapto) acrylamide, N-isopropyl (meth) acrylamide, or hydroxyethyl (meth) propylamine, N, N-dimethyl ( Methyl)glycosylamine, N,N-diethyl(meth)acrylamide, bis(transmethyl)tricycloanthracene di(meth)acrylic acid vinegar, • bicyclic teriyaki Methanol di(methyl)propene vinegar, double-presence A-type Ethylene ethoxide modified bis(indenyl)propionate vinegar, double F-type Ethylene ethoxide modified bis(meth) acrylate, Tris(2-p-ethylethyl)iso-cyanuric acid tris(meth)acrylic acid vinegar, tris(2.hydroxyethyl)iso-cyanuric acid bis(methyl) propyl vinegar, three By methyl propyl = (meth) propionate vinegar, pentaerythritol tri (meth) acrylate vinegar, ethylene glycol di (meth) acrylate vinegar, tetraethylene glycol bis(decyl) acrylate vinegar, poly Ethylene glycol di(meth)acrylic acid vinegar, butanediol di(indenyl)acrylic acid vinegar, U6-hexanediol di(曱 fine_s|, neopentyl glycol di(meth)acrylic acid vinegar ,or Yue hydroxyl group trioxyethyl (Yue-yl) acrylate. a 丨 丨 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀 刀When the content of the monomer (C) of the radical polymerizable double bond is from 1% by weight to 9% by weight based on the total amount of the ink for inkjet, it can be adjusted to have a viscosity in accordance with the use of the ink, which is preferable. More preferably, it is 10 wt% to 80 wt%, and further preferably 10 wt% to 70 wt0/, in consideration of balance with other characteristics. Especially good is 10 wt% ~ 60 wt〇 / 〇. 1^_Other components In order to improve various characteristics, the ink for nozzle ink may contain a phenol resin, an epoxy resin, an epoxy hardener, a surfactant, a colorant, a polymerization inhibitor or a solvent. A . .4 Ο ) Resin For example, in order to improve the surname, the mineral resistance or the peelability, the ink for the nozzle ink may contain a phenol resin. The age-receiving resin can be preferably used: a novolac resin obtained by a condensation reaction of an aromatic compound having a phenolic hydroxyl group with an aldehyde, a homopolymer (including a hydride) of ethylene benzene, or a quinone An ethylene phenol-based copolymer (including a hydride) of a compound which can be copolymerized with benzene. Specific examples of the aromatic compound having a phenolic hydroxyl group include phenol, o-cresol, m-cresol, p-nonylphenol, o-ethyl phenol, m-ethyl phenol, p-ethyl phenol, o-butyl phenol, m-Butyl phenol, p-butyl phenol, o-diphenyl phenol, 2,3-dioxanol, 2,4-dimethyl phenol, 2,5-diphenyl phenol, 3,4-diphenyl phenol, 3 , 5_diphenylphenol, 2,3,5-trimethylphenol, 3,4,5-trimethylphenol, p-stylphenol, resorcinol, p-diphenol, p-diphenol Methyl ether, pyrogallol, Shuangyi A, Shuangfeng F, diphenol containing a terpene skeleton, gallic acid, gallic acid ester, α-naphthol, or cold-naphthalene 24 201024380 age. Similarly, examples of the aldehydes include furfural, paraformaldehyde, furfural, benzoic acid, phenyl aldehyde, and acetaldehyde. Specific examples of the compound copolymerizable with vinylphenol include (meth)acrylic acid or a derivative thereof, styrene or a derivative thereof, maleic acid, ethylene acetate, or acrylonitrile.
酚樹脂的具體例可列舉:Resitop PSM-6200 (商品名; 群榮化學股份有限公司製造)、ShonolBRG-555 (商品名; 昭和高分子股份有限公司製造)、MARUKA LYNCURSpecific examples of the phenol resin include Resitop PSM-6200 (trade name; manufactured by Qunrong Chemical Co., Ltd.), Shonol BRG-555 (trade name; manufactured by Showa Polymer Co., Ltd.), and MARUKA LYNCUR
MS-2P、MARUKA LYNCUR CST70、或 MARUKA LYNCUR PHM-C (商品名;丸善石油化學股份有限公司製 造)。 -貝臺用臺枣甲所使用的酚樹脂可為 為大於等於2種化合物的混合物。 酚樹脂的含量若為噴墨用墨水總量的〇5 wt%〜2〇 ,則耐蝕刻性或耐鍍敷性提高,故較好,若考慮 其他特性的平衡,則更好的是G 5 wt%〜1()痛^而二 的是 0.5 wt%〜7 wt%。 (2)環氧辦哨 例如為了提高耐侧性或耐鑛敷 有環氧樹脂。 m墨水可含 環氧樹脂的具體例可列舉··雙 F型環氧概、縮水甘__氧魏 25 201024380 32133pif 脂。 環氧樹脂的具體例可列舉:Epikote 807、Epikote 815、MS-2P, MARUKA LYNCUR CST70, or MARUKA LYNCUR PHM-C (trade name; manufactured by Maruzen Petrochemical Co., Ltd.). - The phenol resin used in the table can be a mixture of two or more compounds. When the content of the phenol resin is 〇5 wt% to 2 Å of the total amount of the ink for inkjet, the etching resistance or the plating resistance is improved, so that it is preferable to consider the balance of other characteristics, and it is more preferable that G 5 is 5 The wt%~1() pain and the second are 0.5 wt% to 7 wt%. (2) Epoxy whistle For example, in order to improve the side resistance or the mineral-resistant coating, there is an epoxy resin. Specific examples of the epoxy resin containing the epoxy resin can be exemplified by the double F-type epoxy, the shrinking water __oxygen 25 201024380 32133pif grease. Specific examples of the epoxy resin include Epikote 807 and Epikote 815.
Epikote 825 ' Epikote 827 ' Epikote 828 ' Epikote 190P ' Epikote 191P (商品名;Yuka Shell Epoxy股份有限公司製 造)’ Epikote 1004'Epikote 1256(商品名;Japan Epoxy Resin 股份有限公司製造),Araldite CY177、Araldite CY184 (商 品名;Japan Ciba Geigy股份有限公司製造),Celloxide 2021P、EHPE-3150 (商品名;Daicel Chemical IndustriesEpikote 825 ' Epikote 827 ' Epikote 828 ' Epikote 190P ' Epikote 191P (trade name; manufactured by Yuka Shell Epoxy Co., Ltd.)' Epikote 1004'Epikote 1256 (trade name; manufactured by Japan Epoxy Resin Co., Ltd.), Araldite CY177, Araldite CY184 (trade name; manufactured by Japan Ciba Geigy Co., Ltd.), Celloxide 2021P, EHPE-3150 (trade name; Daicel Chemical Industries
股份有限公司製造)、或Techmore VG3101L (商品名;三 井化學股份有限公司製造)。 噴墨用墨水中所使用的環氧樹脂可為1種化合物,亦 可為大於等於2種化合物的混合物。 環氧樹脂的含量若為喷墨用墨水總量的i wt%〜2〇 wt% ’則耐蝕刻性或耐鍍敷性提高,故較好更好的加 〜10 wt%,進而好的是1 wt%〜7 wt〇/〇。 -環氣硬彳h _丨Co., Ltd. manufactured, or Techmore VG3101L (trade name; manufactured by Mitsui Chemicals Co., Ltd.). The epoxy resin used in the ink for inkjet may be one compound or a mixture of two or more compounds. If the content of the epoxy resin is i wt% to 2 〇 wt% of the total amount of ink for inkjet, the etching resistance or plating resistance is improved, so it is better to add 〜10 wt%, and further preferably 1 wt% to 7 wt〇/〇. -环气硬彳h _丨
於噴墨用墨水含有環氧樹瞒,例如為了進 ,化膜的耐錄性或耐_性,而可進 ^ 劑。環氧硬化劑較好的是酸針系硬化劑、ί胺St化 及觸媒型硬化劑等。 則t胺系硬化劑、 鄰笨化!的f體例可列舉:順丁烯二酸酐、四氫 奸、六氫偏:-;:鄰苯二甲酸酐、甲基六氫鄰苯二甲酸 或苯乙歸-順丁埽二酸軒共聚物。偏苯二甲酸酐、 26 201024380 32133pif 乙基四^系硬化劑的具體例可列舉:二亞乙基三胺、三亞 聚硫脸此,四亞乙基五胺、二氰基二醯胺(dicyandiamide)、 佛酮二胺聚醯胺樹脂)、_亞胺(ketimine)化合物、異 環己二^、間苯二胺、I3·雙(胺基甲基) 二胺基_3 3,暴乙基旅嗪、M,-二胺基二苯基曱烷、4,4,- 外,觸媒刑、一乙基二苯基甲垸、或二胺基二苯基颯。另 化合物。、硬化劑的具體例可列舉三級胺化合物、或味也 苯三甲X酸^硬化劑的具體例可列舉:鄰苯二曱酸肝、偏 四氫鄰笨二均笨四甲酸二酐、四氫鄰苯二甲酸野、曱基 氣内亞甲其曱,酐、3,6-内亞曱基四氫鄰苯二曱酸酐、六 鄰苯二甲^ :氫鄰苯二甲酸肝、或甲基·3,6内亞甲基四氮 亦可為大二ί水中所使用的環氧硬化劑可為1種化合物, 浐知;等於2種化合物的混合物。 5〇wt;乳=劑的含量若為喷墨用墨水總量的〇.5游。〜 。貝,]耐蝕刻性或耐鍍敷性提高 與其他特性的平衡,則更好㈣雜好右号慮到 好的是。域〜3。:的疋一 界面活性劑 提高對基底基板的潤濕性、及硬⑽的_ 2^,喷墨㈣水可含有界祕_。界面活性劑 y^llieGn)系界面活_、_㈣、界面活性劑、及 虱系界面活性劑等。 队 27 201024380 32133pit 界面活性劑的具體例可列舉:Byk-300、Byk-306、The ink for inkjet contains epoxy eucalyptus, and for example, it is possible to improve the film's resistance to recording or resistance. The epoxy hardener is preferably an acid needle hardener, a glutamine stabilizing agent or a catalyst type hardener. Examples of the t-amine-based hardener and the st-formation include: maleic anhydride, tetrahydromangan, hexahydro-polar:-;: phthalic anhydride, methylhexahydrophthalic acid or benzene Ethylene-cis-butyl phthalate copolymer. Specific examples of the phthalic anhydride, 26 201024380 32133pif ethyl tetra-based hardener include diethylene triamine, triethylene polysulfide, tetraethylene pentamine, dicyanodiamine (dicyandiamide). ), ketone diamine polyamine resin), ketimine compound, isocyclohexane, m-phenylenediamine, I3. bis(aminomethyl)diamine _3 3 Benzoline, M,-diaminodiphenylnonane, 4,4,-, catalyst, monoethyldiphenylformamidine, or diaminodiphenylphosphonium. Another compound. Specific examples of the curing agent include a tertiary amine compound or a benzoic acid X acid curing agent, and examples thereof include phthalic acid liver, tetrahydro hydrogen benzoic acid, and tetracarboxylic acid dianhydride. Hydrogen phthalic acid wild, sulfhydryl-based gas, methylene phthalocyanine, anhydride, 3,6-endo-indenyltetrahydrophthalic anhydride, hexamethylene phthalate: hydrogen phthalate liver, or A The 3,6-methylenetetrazolium may also be an epoxy curing agent used in the water. The epoxy hardener may be one compound, which is a mixture of two compounds. 5〇wt; milk = the content of the agent is 〇.5 swim for the total amount of ink for inkjet. ~. Shell,] Improved etch resistance or plating resistance. Balance with other characteristics is better (4) Good and right. Domain ~3. : The first surfactants improve the wettability to the base substrate, and hard (10) _ 2 ^, inkjet (four) water can contain the secret _. The surfactant y^llieGn) is a surfactant _, _ (four), a surfactant, and a lanthanide surfactant. Team 27 201024380 32133pit Specific examples of surfactants can be listed as Byk-300, Byk-306,
Byk-335、Byk-310、Byk-341、Byk-344、及 Byk-370 (商 品名;Byk-Chemie股份有限公司製造)等矽系界面活性 劑;Byk_354、Byk-358、及 Byk-361 (商品名;Byk-Chemie 股份有限公司製造)等丙烯酸系界面活性劑;DFX-18、Actinic surfactants such as Byk-335, Byk-310, Byk-341, Byk-344, and Byk-370 (trade name; manufactured by Byk-Chemie Co., Ltd.); Byk_354, Byk-358, and Byk-361 ( Acrylic surfactant such as trade name; manufactured by Byk-Chemie Co., Ltd.; DFX-18,
Ftergent 250、或 Ftergent 251 (商品名;Neos 股份有限公 司製造),Megafac F-479 (商品名;DIC股份有限公司製 造)等氟系界面活性劑。 嘴墨用墨水中所使用的界面活性劑可為1種化合物, ® 亦可為大於等於2種化合物的混合物。 界面活性劑的含量若為喷墨用墨水總量的0.001 wt〇/0 〜1 wt%,則硬化膜的膜面均勻性提高,故較好,若考慮 到與其他特性的平衡,則更好的是0.001 wt%〜0.1 wt%, 進而好的是0.001 wt〇/〇〜0.05 wt%。 MX5)荖色劑 例如為了於檢查硬化膜的狀態時容易與基板識別,喷 墨用墨水可含有著色劑。著色劑較好的是染料、顏料。 ◎ 噴墨用墨水中所使用的著色劑可為1種化合物,亦可 為大於等於2種化合物的混合物。 著色劑的含量若為喷墨用墨水總量的〇.丨wt%〜5 wt/°,則容易進行硬化膜的檢查,故較好,若考慮到與其 他特〖生的平衡,則更好的是〇. 1 wt%〜1 wt%,進而好的是 〇1 wt〇/〇〜0.5 wt%。 聚合抑制劑 28 201024380 例如為了提高保存穩定性,喷墨用墨水可含有聚合抑 制劑。聚合抑制劑的具體例可列舉:4-甲氧基笨酚、^ 二酚、或酚噻嗪。於這些中,酚噻嗪即便進行 、本 度的變化亦較小,故較好。 /呆存黏 噴墨用墨水中所使用的聚合抑制劑可為1種化& 亦可為大於等於2種化合物的混合物。 Q物’ 聚合抑制劑的含量若為噴墨用墨水總量的〇 ❹ 〜1 yt% ’則即便進行長期保存黏度的變化亦較小,赠〇 若考慮到與其他特性的平衡,則更好的是故較 0.5赠% ’進而好的是G G1 wt%〜G丨wt%。· W/o〜 溶齑丨 含有=\了,為^勉印刷的黏度,噴墨 冷劑’尤其好的疋彿點為10(rc〜30(rc的。0 =點為酬t:〜3Q(rc的溶_具義可列舉、 ^酉曰、丙酸丁醋、乳酸乙酉旨、經基乙酸甲醋、經^己 =其經基乙酸丁醋、甲氧基乙酸甲醋、甲氧基乙酸 =基乙酸丁醋、乙氧基乙㈣g|、乙氧基乙 >、 =酸甲醋、3-經基丙酸乙醋、3_甲氧基 ;、- 甲氧基㈣乙醋、3-乙氧基内酸甲醋、3_ 自曰夂 2·羥基丙酸甲酯、2_羥基丙酸乙酽 ‘乙酯、 ,丙酸曱酯、2-乙氡基丙酸乙酯、2_羥基曰、 ^甲,、2撼1甲基丙酸乙醋、2-甲氧基甲基 W佩2-甲基丙酸乙崎、丙酮酸甲醋、丙_:二甲 29 201024380 32133pif 丙酮酸丙酯、乙醯乙酸曱酯、乙醯乙酸乙酯、2_側氧丁酸 曱醋、2-側氧丁酸乙酯、二氧陸圜(di〇xane)、乙二醇、 一乙二醇、三乙二醇、丙二醇、二丙二醇、三丙二醇、1,4-丁一醇、乙二醇單異丙基醚、乙二醇單丁基酿、丙二醇單 曱基醚、丙二醇單曱基醚乙酸酯、丙二醇單乙基醚乙酸酯、 丙一醇單丙基_乙酸酯、二丙二醇單乙基醚乙酸酯、二丙 二醇單丁基醚乙酸酯、乙二醇單丁基醚乙酸酯、環己酮、 環戊嗣、二乙二醇單甲基醚、二乙二醇單甲基醚乙酸酯、 二乙二醇單乙基醚、二乙二醇單乙基醚乙酸酯、二乙二醇 〇 單丁基醚、二乙二醇單丁基醚乙酸酯、二乙二醇二甲基鍵、 二乙二醇二乙基醚、二乙二醇甲基乙基醚、曱苯、二曱苯、 苯曱醚、7 _丁内酯、N,N-二曱基乙醯胺、N-曱基-2-吡咯 咬酮、或二曱基口米嗤咬酮(dimethylimidazolidinone)。 噴墨用墨水中所使用的溶劑可為1種化合物,亦可為 大於等於2種化合物的混合物。 溶劑的含量若為噴墨用墨水總量的0.1 wt%〜2Q Wt%,則於噴射中喷嘴不易乾燥,故較好。若考慮到與其 ◎ 他特性的平衡,則更好的是0.1 wt%〜10 wt〇/。,進而好的 是 0.1 wt%〜5 wt%。 1.5喷墨用|水的黏度 若喷墨用墨水利用E型黏度計所測定的25。(:下的黏 度為2mPa.s〜2〇〇mPa.s ’則自噴墨喷頭(head)的塗佈 特性(喷射精度等)變得良好,故較好。25¾下的喷墨用 墨水的黏度更好的是10 mPa.s〜18〇 mPa.s,進而好的是 30 201024380 JZ.1 J^pu 20 mPa. s〜150 mPa.s 0 於使用坑下的黏度大於等於5〇mPa.s的墨水時, 若加溫噴墨喷頭而降低喷出時的黏度,則可實現更加穩定 的噴出。於加熱喷墨噴職行翁時,加熱溫度(較= 是4〇°C〜12〇。〇料用墨水_度較好的是3mpa. s〜30mPa.s ’更好的是5mPa.s〜25mPa.s,尤其好的是 10 mPa.s〜20 mPa.s 0Ftergent 250, or Ftergent 251 (trade name; manufactured by Neos Co., Ltd.), and a fluorine-based surfactant such as Megafac F-479 (trade name; manufactured by DIC Corporation). The surfactant used in the ink for the nozzle ink may be one compound, and the mixture may be a mixture of two or more compounds. When the content of the surfactant is 0.001 wt%/0 to 1 wt% of the total amount of the ink for inkjet, the uniformity of the film surface of the cured film is improved, so that it is preferable to consider the balance with other characteristics. It is 0.001 wt% to 0.1 wt%, and further preferably 0.001 wt〇/〇~0.05 wt%. MX5) Coloring agent For example, in order to check the state of the cured film, it is easy to recognize the substrate, and the ink for ink jet may contain a coloring agent. The colorant is preferably a dye or a pigment. ◎ The coloring agent used in the ink for inkjet may be one compound or a mixture of two or more compounds. When the content of the coloring agent is 〇.丨wt% to 5 wt/° of the total amount of the ink for inkjet, it is easy to inspect the cured film, so it is preferable to consider the balance with other specialties. It is 〇. 1 wt%~1 wt%, and further preferably 〇1 wt〇/〇~0.5 wt%. Polymerization inhibitor 28 201024380 For example, in order to improve storage stability, the ink for inkjet may contain a polymerization inhibitor. Specific examples of the polymerization inhibitor include 4-methoxyphenol, diphenol, or phenothiazine. Among these, phenothiazine is preferred even if the degree of change is small. /Residual adhesion The polymerization inhibitor used in the inkjet ink may be one type of & or a mixture of two or more compounds. If the content of the polymerization inhibitor of Q material is 〇❹ 〜1 yt% of the total amount of ink for inkjet, the change in viscosity after long-term storage is small, and it is better to consider the balance with other characteristics. Therefore, it is better than 0.5%% and further preferably G G1 wt%~G丨wt%. · W/o~ Dissolved 齑丨 contains =\, for the printing of the viscosity, inkjet refrigerant 'especially good as the point is 10 (rc ~ 30 (rc. 0 = point for the reward t: ~ 3Q (The dissolution of rc can be exemplified, ^ 酉曰, butyl vinegar, lactic acid, methyl acetate, methyl acetate, hexanyl acetate, methoxyacetic acid, methoxyacetic acid, methoxy Acetic acid=butyl acetate vinegar, ethoxyethyl (tetra) g|, ethoxylated ethylene>, = acid methyl vinegar, 3-propyl propyl acetonate, 3-methoxy group; - methoxy (tetra) vinegar, 3-ethoxylic acid methyl vinegar, 3_ self 曰夂2·hydroxy propyl propionate, 2-hydroxy hydroxypropionate ethyl ester, decyl propionate, ethyl 2-acetamitopropionate, 2 _ hydroxy hydrazine, ^ A, 2 撼 1 methyl propionate ethyl vinegar, 2- methoxy methyl W pe- 2-methyl propionic acid acetazide, acetone methyl vinegar, propylene _: dimethyl 29 201024380 32133pif pyruvic acid Propyl ester, acetoacetic acid decyl acetate, ethyl acetate ethyl acetate, 2_ oxobutyric acid vinegar, ethyl 2-oxobutanoate, dioxane (di〇xane), ethylene glycol, ethylene glycol Alcohol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,4-butanol, ethylene glycol monoisopropyl ether, ethylene Monobutyl, propylene glycol monodecyl ether, propylene glycol monodecyl ether acetate, propylene glycol monoethyl ether acetate, propanol monopropyl acetate, dipropylene glycol monoethyl ether acetate, Dipropylene glycol monobutyl ether acetate, ethylene glycol monobutyl ether acetate, cyclohexanone, cyclopentanyl, diethylene glycol monomethyl ether, diethylene glycol monomethyl ether acetate, Diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol dimethyl Key, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, toluene, dinonylbenzene, benzoin ether, 7-butyrolactone, N,N-dimercaptoacetamide, N - mercapto-2-pyrrolidone or dimethylimidazolidinone. The solvent used in the ink for inkjet may be one compound or a mixture of two or more compounds. If the content is from 0.1 wt% to 2 Q Wt% of the total amount of the ink for inkjet, the nozzle is not easily dried during the ejection, and it is preferably. If the balance of the characteristics is taken into consideration, it is preferably 0.1 wt%. 10 wt〇 /., and further preferably 0.1 wt% to 5 wt%. 1.5 Inkjet | Water Viscosity If the ink for inkjet is measured by an E-type viscometer of 25. (The viscosity is 2 mPa.s) 〜2〇〇mPa.s' is better because the coating characteristics (ejection accuracy, etc.) of the inkjet head (head) are good, and the viscosity of the inkjet ink of 253⁄4 is more preferably 10 mPa. s~18〇mPa.s, and then 30 is 201024380 JZ.1 J^pu 20 mPa. s~150 mPa.s 0 When using ink with a viscosity of 5〇mPa.s or less under the pit, if it is heated The ink jet head reduces the viscosity at the time of ejection, and a more stable discharge can be achieved. When heating inkjet sprayer, the heating temperature (compared = 4 〇 ° C ~ 12 〇. 〇 用 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ 25mPa.s, especially good 10 mPa.s~20 mPa.s 0
於加溫噴墨噴頭時,若墨水中含有低沸點的溶劑,則 存在溶劑揮發而墨水的黏度上升,而導致噴頭堵塞的情 开>。為了避免此種情形’較好的是墨水不含溶劑,或者即 便含有溶劑,亦為小於等於1〇重量%的較少量。於加溫噴 墨喷頭時,較好的是藉由含有於〗分子中具有大於等於ι ,自由基聚合性雙鍵的化合物⑻來調整黏度。於不加 μ噴墨噴頭時’墨水的黏度可添加小於等於墨水總量的ι〇 重量%的溶劑來進行調整。 保存 嘴墨用墨水若於-20°C〜20t下保存,則黏度變化較 小,且保存穩定性良好。 1·^·^·^·法的喰暴用黑水的塗佈 >本發明的嘴墨用墨水可使用公知的喷墨塗佈方法進 行塗佈嘴墨塗佈方法例如有:將機械能(mechanical Clergy)作用於墨水而使墨水自喷頭嘴出(塗佈)的方 法(所謂壓電(Piezo)方式);以及將熱能作用於墨水, 而塗佈墨水的塗佈方法(所謂氣泡賴(bubble-jet)(註 31 201024380 32133pif 冊商標)方式)等。 藉由使用喷墨塗佑 設定的圖案狀。藉好法’可將喷墨用墨水塗佈成預先 微影法相比, 可降低成I僅於需要的部位塗佈墨水,與光 佈單元(unit) 噴墨用墨水進行塗料較好的塗 納部與塗佈喷頭的塗;」::收納延些墨水的墨水收 ❹ f佈信號相對應的熱能作:於t!單 生墨水液滴的塗佈單元。垄八絲由上述能量而產 熱部具有含有金屬及/或金屬氧化物的發 銘錯(Ζ〇、欽⑺)、錄⑽)、 )等金屬、及這些金>1的氧化物等。 對應_,並藉= ❿ 嘴墨塗佈裝置並祕於塗佈噴頭與墨水收納部相分 、震置’亦可使用這些不可分離而成為一體的裝置。另 卜,墨水收納部除了對塗佈噴頭可分離、或者 成為-體並搭載於托架(carriage)的形態以== 置於裝置的固定部位,經由墨水供給構件例如管體(tube) 而向塗佈喷頭供給墨水的形態。 另外’噴墨的喷出(塗佈)溫度較好的是10。匸〜120 32 201024380 32133pif °C,塗佈溫度下的喷墨用墨水的黏度較好的是2 mpa s〜 200 mPa.s。 3.硬化膜的形成 本發明的硬化膜可於藉由喷墨法將上述噴墨用墨水 塗佈於基板表面後,視需要對墨水照射紫外線或可見光線 等光而獲得。 於照射紫外線時,所照射的紫外線的量依存於噴墨用 φ 墨水的組成’利用Ushi〇 Denki股份有限公司製造的安裝 有受光器UVD-365PD的累計光量計UIT_2〇1進行測定, 較好的是10 mJ/cm2〜1,〇〇〇 mj/cm2左右,更好的是2〇 mJ/cm2〜800 mJ/cm2左右’進而好的是4〇 mJ/cm2〜· mJ/cm2左右。另外,所照射的紫外線的波長較好的是2〇〇 nm〜450nm,更好的是22〇nm〜430nm,進而好的是25〇 nm〜400 nm ° 另外,視需要可進一步對藉由光的照射而硬化的上述 硬化膜進行加熱、烺燒,尤其好的是於1〇(rc〜25〇t:下加 ❹ 熱10分鐘〜60分鐘,更好的是於120X:〜230°C下加熱1〇 分鐘〜60分鐘’進而好的是於15(rc〜2〇(rc下加熱忉分 鐘〜60分鐘。 本發明中可使用的「基板」若為可成為塗佈喷墨用墨 水的對象的基板’則並無特別限制’其形狀並不限於平板 狀,亦可為曲面狀。 另外,基板的材質並無特別限定,例如可列舉:聚對 苯二甲酸乙二酯(PET ’ polyethylene terephthalate)、聚對 33 201024380 32133pif 苯二甲酸丁二酯(ΡΒΤ,polybutylene terephthalate)等聚 醋系樹脂’聚乙烯、聚丙烯等聚烯烴樹脂,聚氯乙烯、氟 樹脂、丙烯酸系樹脂、聚醯胺、聚碳酸酯、聚醯亞胺等塑 膠膜’赛路粉(cellophane)、乙酸酯、金屬箔、聚醯亞胺 與金屬箔的積層膜、具有填充效果的玻璃紙(glassine paper)、羊皮紙(parchment paper)、或者利用聚乙烯、黏 土黏合劑、聚乙烯醇、澱粉、羧基曱基纖維素(CMc, carboxymethyl cellulose )等進行填充處理的紙,玻璃 (glass)。 ❹ 於這些構成基板的物質中,於不對本發明的效果產生 不良影響的範圍内,可進一步含有顏料、染料、抗氧化劑、 抗劣化劑、填充劑、紫外線吸收劑、抗靜電劑及/或防電磁 波劑等添加劑。另外,亦可於基板表面的一部分形成與基 板不同的材質。 ' 基板的用途亦無特別限定,由本發明的喷墨用墨水所 付的硬化膜由於耐姓刻液性、耐鑛敷性、對驗性水溶液的 剝離性優異,因此較好的是用於製造在基板表面具有金屬 ❹ 製電路的電子電路基板等。形成電路的金屬並無特別限 疋,較好的疋金 '銀、銅、紹或氧化銦錫(ΙΤ〇,〖㈤雅Tin Oxide) ° 基板的厚度並無特別限定,通常為1〇 /zm〜2mm左 右根據所使用的目的而進行適當調整,較好的是〆 m〜500 #m,更好的是20 ym〜2〇〇 vm。 亦可視需要於基板的形成硬化膜的面上實施斥水處 34 201024380 jzupii 理、電暈(corona)處理、電漿(plasma)處理、或喷 (blast)處理等易黏接處理,或者於表面設置易黏接層 彩色濾光片(color filter)用保護膜。 5 [實施例] 以下,藉由實施例進一步對本發明進行說明,但 明並不受這些實施例限定。 <喷墨用墨水及形成硬化膜圖案的基板的製作> ❹ 首先,對實驗例1〜5及比較例1〜3的喷墨用墨水及 由其所得的形成硬化膜圖案的基板加以說明。 [實驗例1] 按下述組成比例混合並溶解:作為酸改質環氧(甲基) 丙烯酸酯(A)的酚醛清漆型酸改質環氧丙烯酸酯"即 NEOP〇L8430(商品名;JapanU_pica股份有限公司製造、 重量平均分子量:10000、酸值:88mgK〇H/g),作為光聚 合起始劑(B)的2,4,6-三曱基苯曱醯基二苯基氧化膦即 DAR〇CUR TPO (商品名;Ciba Specialty Chemicals 股份 有限公司製造),於1分子中具有大於等於1個自由基聚合 性雙鍵的化合物(C)中作為具有環狀結構的單官能單體 (C1)的曱基丙烯酸四氫糠酯即SR_2〇3 (商品名; SARTOMER製造、自由基雙鍵當量:17〇 g/當量)、進而 =為於1分子中具有大於等於Η峨基的單體(C2)的鄰 苯二甲酸單(甲基丙歸酸經基乙醋)即(商品名;新中 村化學工業股份有限公司製造、自由基雙鍵當量:280 g/ 當量、羧基當量:28〇g/當量、酸值:2〇〇mgKOH/g),及 35 201024380 32133pif 作為聚合抑制劑的酚噻嗪,然後利用1 的聚四氟乙烯 (PTFE ’ polytetra-fluoroethylene )製薄膜過濾、器(membrane filter)進行過濾,而製備喷墨用墨水i。 (A) NEOPOL 8430 100.00 g (B) TPO 46.90 g (C1) SR-203 175.00 g (C2) CB-1 100.00 g 其他 酚噻嗪 0.21 g 使用E 型黏度計(東機產業股份有限公司製造的 TV-22、以下相同),測定2yc下的喷墨用墨水1的黏度, 結果為87 mPa.s。 將噴墨用墨水1注入至噴墨盒(ink jet cartridge )中, 並將其裝著於喷墨裝置(FUJIFILM Dimatix公司製造的 DMP-2811)中’使用10pl用的噴頭,於喷出電壓(壓電 電壓)為16 V、噴頭溫度為7〇°c、驅動頻率為5 kHz、塗 佈次數為1次的噴出條件下,於在聚醯亞胺上積層銅箔而 成的厚度為35 的銅箔積層板即Vyl〇flex (商品名;❹ 東洋紡績股份有限公司製造)的銅表面上形成特定的圖案。 對將噴墨用墨水丨形成圖案的基板, 以 250 mJ/cm2 的uv曝光量照射波長為365賊的紫外線,使喷墨用墨水 1硬化’藉此獲得形成有厚度為1〇㈣的硬化膜圖案的 基板1。 [實驗例2] 使用雙盼A型酸改質環氧丙稀酸醋即NE〇p〇L 847〇 36 201024380 32133pit (商品名;Japan U-pica股份有限公司製造重旦、, 以 子量:10000、酸值:100 mgKOH/g ),來作為酿抑^平均分 基)丙烯酸酯(A),並設為下述組成比例‘、'、,除此氧(甲 與實驗例1相同的方式製備喷墨用墨水2。 ' W外’ (A) NEOPOL 8470 1〇〇.〇〇 g (B) TPO 50.00 g (Cl) SR-203 200.00 gWhen the inkjet head is heated, if the ink contains a solvent having a low boiling point, the solvent volatilizes and the viscosity of the ink rises, which causes the nozzle to clog. In order to avoid such a situation, it is preferred that the ink contains no solvent or even contains a solvent, and is also a minor amount of less than or equal to 1% by weight. In the case of heating the ink jet head, it is preferred to adjust the viscosity by the compound (8) having a radical polymerizable double bond of ι or more in the molecule. When the μ inkjet head is not applied, the viscosity of the ink can be adjusted by adding a solvent of ι〇% by weight or less based on the total amount of the ink. If the ink for ink is stored at -20 ° C to 20 t, the viscosity change is small and the storage stability is good. Coating of black water by turbulence according to the method of the present invention. The ink for nozzle ink of the present invention can be applied by a known inkjet coating method, for example, by applying mechanical energy. (mechanical Clergy) a method of applying ink to a nozzle from a nozzle (so-called piezoelectric method), and a method of applying thermal energy to the ink to apply the ink (so-called bubble ray) (bubble-jet) (Note 31 201024380 32133pif booklet) method). The pattern shape is set by using inkjet. By the method of applying inkjet ink to the pre-lithographic method, it is possible to reduce the coating of ink to only the desired portion, and to coat the ink with the ink of the unit. Coating with the coating nozzle;":: The ink containing the ink is stored in the ink. The thermal energy corresponding to the f cloth signal is: the coating unit of the t! single ink droplet. The ridges and the heat generating portion have a metal such as faint (Ζ〇, 钦(7)), (10), or the like containing metal and/or metal oxide, and an oxide of the gold > Corresponding _, and borrowing ❿ 嘴 墨 涂布 涂布 涂布 涂布 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 In addition, the ink accommodating portion is placed on a fixed portion of the device in a form in which the coating head can be separated from the coating head or mounted on a carriage, and is placed via an ink supply member such as a tube. The form in which the coating head supplies ink. Further, the ejection (coating) temperature of the ink jet is preferably 10.匸~120 32 201024380 32133pif °C, the viscosity of the inkjet ink at the coating temperature is preferably 2 mpa s to 200 mPa.s. 3. Formation of Cured Film The cured film of the present invention can be obtained by applying the above-described inkjet ink to the surface of the substrate by an inkjet method, and then irradiating the ink with ultraviolet light or visible light as needed. When the ultraviolet ray is irradiated, the amount of the ultraviolet ray to be irradiated is measured by the cumulative photometer UIT_2〇1 equipped with the photodetector UVD-365PD manufactured by Ushi〇Denki Co., Ltd., depending on the composition of the φ ink for inkjet. It is about 10 mJ/cm2 to 1, about 〇〇〇mj/cm2, more preferably about 2〇mJ/cm2 to 800 mJ/cm2, and further preferably about 4〇mJ/cm2 to mJ/cm2. Further, the wavelength of the ultraviolet ray to be irradiated is preferably from 2 〇〇 nm to 450 nm, more preferably from 22 〇 nm to 430 nm, and further preferably from 25 〇 nm to 400 nm °, and further, by light, if necessary The hardened film which is hardened by irradiation is heated and calcined, and particularly preferably at 1 Torr (rc~25 〇t: ❹ heat for 10 minutes to 60 minutes, more preferably at 120X: 〜230 °C) It is heated for 1 minute to 60 minutes. Further, it is preferably 15 (rc~2 〇 (heating in rc for minutes to 60 minutes. The "substrate" which can be used in the present invention is an object which can be used for coating ink for inkjet. The substrate is not particularly limited, and the shape thereof is not limited to a flat plate shape, and may be a curved shape. The material of the substrate is not particularly limited, and examples thereof include polyethylene terephthalate (PET 'ethylene terephthalate). ), poly pair 33 201024380 32133pif butyl phthalate (polybutylene terephthalate) and other polyester resin 'polyethylene, polypropylene and other polyolefin resins, polyvinyl chloride, fluororesin, acrylic resin, polyamine, Polycarbonate, polyimine, etc. Film film 'cellophane, acetate, metal foil, laminated film of polyimide and metal foil, glasse paper with filling effect, parchment paper, or polyethylene, clay Paper, glass, etc., which are filled with a binder, polyvinyl alcohol, starch, carboxymethyl cellulose (CMc, carboxymethyl cellulose), etc. 物质 The substances constituting the substrate do not adversely affect the effects of the present invention. In addition, additives such as a pigment, a dye, an antioxidant, an anti-deterioration agent, a filler, an ultraviolet absorber, an antistatic agent, and/or an electromagnetic wave preventer may be further contained, and a part of the surface of the substrate may be formed differently from the substrate. The material of the substrate is not particularly limited, and the cured film applied by the inkjet ink of the present invention is excellent in resistance to surname, mineralization, and repellent property to an aqueous solution. It is used to manufacture an electronic circuit board or the like having a metal mold circuit on the surface of the substrate. The metal forming the circuit is not particularly limited, and is preferably a crucible. 'Silver, copper, bismuth or indium tin oxide (ΙΤ〇, 〖(五)雅Tin Oxide) ° The thickness of the substrate is not particularly limited, and is usually about 1 〇 / zm ~ 2mm, depending on the purpose of use, it is better to adjust It is 〆m~500#m, more preferably 20 ym~2〇〇vm. It is also possible to implement a water repellent surface on the surface of the substrate where the cured film is formed. 201024380 jzupii, corona treatment, electricity It is easy to bond treatment such as plasma treatment or blast treatment, or a protective film for color filter of easy adhesion layer is provided on the surface. [Examples] Hereinafter, the present invention will be further illustrated by the examples, but they are not limited by these examples. <Production of Inkjet Ink and Substrate Forming Cured Film Pattern> First, the inkjet inks of Experimental Examples 1 to 5 and Comparative Examples 1 to 3 and the substrate on which the cured film pattern was formed were explained. . [Experimental Example 1] Mixed and dissolved in the following composition ratio: a novolak type acid-modified epoxy acrylate as an acid-modified epoxy (meth) acrylate (A) " NEOP® L8430 (trade name; Manufactured by Japan U_pica Co., Ltd., weight average molecular weight: 10000, acid value: 88 mg K 〇 H / g), 2,4,6-trimercaptophenyl phenyl diphenyl phosphine oxide as photopolymerization initiator (B) That is, DAR〇CUR TPO (trade name; manufactured by Ciba Specialty Chemicals Co., Ltd.), a monofunctional monomer having a cyclic structure in the compound (C) having one or more radical polymerizable double bonds in one molecule ( C1) tetrahydrofurfuryl methacrylate, SR_2〇3 (trade name; manufactured by SARTOMER, free radical double bond equivalent: 17〇g/eq), and further = monomer having sulfhydryl group or more in one molecule (C2) phthalic acid mono (methacrylic acid via base ethyl vinegar) (trade name; manufactured by Shin-Nakamura Chemical Co., Ltd., free radical double bond equivalent: 280 g / equivalent, carboxyl equivalent: 28 〇 g/equivalent, acid value: 2〇〇mgKOH/g), and 35 201024380 32133pif Phenothiazine polymerization inhibitor, and the use of polytetrafluoroethylene (PTFE 'polytetra-fluoroethylene) 1 is made of a membrane filter, filter (membrane filter) was filtered, and the prepared inkjet ink i. (A) NEOPOL 8430 100.00 g (B) TPO 46.90 g (C1) SR-203 175.00 g (C2) CB-1 100.00 g Other phenothiazine 0.21 g E-type viscometer (TV manufactured by Toki Sangyo Co., Ltd.) -22, the same applies hereinafter, the viscosity of the inkjet ink 1 at 2 yc was measured and found to be 87 mPa·s. The inkjet ink 1 was injected into an ink jet cartridge, and it was mounted in an inkjet apparatus (DMP-2811 manufactured by FUJIFILM Dimatix Co., Ltd.) using a nozzle for 10 pl at a discharge voltage ( The piezoelectric voltage is 16 V, the nozzle temperature is 7 〇 ° C, the driving frequency is 5 kHz, and the number of coating times is one. The thickness of the copper foil is 35 on the polyimine. A specific pattern is formed on the copper surface of a copper foil laminate, that is, Vyl〇flex (trade name; manufactured by Toyobo Co., Ltd.). The substrate on which the ink jet ink was patterned was irradiated with ultraviolet light having a wavelength of 365 thief at a UV exposure amount of 250 mJ/cm 2 to harden the ink for inkjet 1 thereby obtaining a cured film having a thickness of 1 〇 (four). Patterned substrate 1. [Experimental Example 2] Using double-anti-A type acid-modified epoxy acrylate, NE〇p〇L 847〇36 201024380 32133pit (trade name; made by Japan U-pica Co., Ltd., by sub-quantity: 10000, acid value: 100 mgKOH/g), used as the emulsifier (average fraction) acrylate (A), and set to the following composition ratio ', ', in addition to this oxygen (A is the same as Experimental Example 1 Preparation of inkjet ink 2. 'W outer' (A) NEOPOL 8470 1〇〇.〇〇g (B) TPO 50.00 g (Cl) SR-203 200.00 g
(C2) CB-1 100.00 g 其他 酚°塞唤 0.23 g 使用E型黏度計,測定25°C下的喷墨用墨水2的黏 度,結果為76 mPa · s。 使用喷墨用墨水2,以與實驗例1相同的方法獲得形 成有厚度為10 //m的硬化膜圖案的基板2。 [實驗例3] 使用雙酚F型酸改質環氧丙烯酸酯即NEOPOL 8475 (商品名;Japan U-pica股份有限公司製造、重量平均分 子量:10000、酸值:101 mgKOH/g),來作為酸改質環氧(甲 基)丙烯酸酯(A)’並設為下述組成比例,除此以外,以 與實驗例1相同的方式製備嘴墨用墨水3。 (A) NEOPOL 8475 100.00 g (B) TPO 50.00 g (C1) SR-203 200.00 g (C2) CB-1 100.00 g 其他 盼嗟嗓 0.23 g 37 201024380 32133pif 使用E型黏度計,測定25°C下的噴墨用墨水3的黏 度,結果為80 mPa-s。 使用喷墨用墨水3 ’以與實驗例1相同的方法獲得形 成有厚度為1〇 的硬化膜圖案的基板3。 [實驗例4](C2) CB-1 100.00 g Other Phenol ° call 0.23 g The viscosity of the inkjet ink 2 at 25 ° C was measured using an E-type viscometer and found to be 76 mPa · s. Using the inkjet ink 2, a substrate 2 having a cured film pattern having a thickness of 10 // m was obtained in the same manner as in Experimental Example 1. [Experimental Example 3] Using bisphenol F-type acid-modified epoxy acrylate, NEOPOL 8475 (trade name; manufactured by Japan U-pica Co., Ltd., weight average molecular weight: 10000, acid value: 101 mgKOH/g) was used as The ink for nozzle ink 3 was prepared in the same manner as in Experimental Example 1, except that the acid-modified epoxy (meth) acrylate (A)' was used in the following composition ratio. (A) NEOPOL 8475 100.00 g (B) TPO 50.00 g (C1) SR-203 200.00 g (C2) CB-1 100.00 g Other expectations 0.23 g 37 201024380 32133pif Using an E-type viscometer, measuring at 25 ° C The viscosity of the inkjet ink 3 was 80 mPa-s. Using the inkjet ink 3', a substrate 3 formed with a cured film pattern having a thickness of 1 Å was obtained in the same manner as in Experimental Example 1. [Experimental Example 4]
使用雙酚F型酸改質環氧丙烯酸酯即NE〇P〇L 8476 (商品名;Japan U-pica股份有限公司製造、重量平均分 子量:5000、酸值:101 mgKOH/g),來作為酸改質環氧(曱 基)丙烯酸酯(A),並設為下述組成比例,除此以外,以 與實驗例1相同的方式製備喷墨用墨水4。 (A) NEOPOL8476 100.00 g (B) TPO 42.50 g (Cl) SR-203 140.00 g (⑺ CB-1 100.00 g 其他 酴嘆唤 0.19 gUsing bisphenol F-type acid-modified epoxy acrylate, NE〇P〇L 8476 (trade name; manufactured by Japan U-pica Co., Ltd., weight average molecular weight: 5000, acid value: 101 mgKOH/g), as an acid An inkjet ink 4 was prepared in the same manner as in Experimental Example 1, except that the epoxy (fluorenyl) acrylate (A) was changed to the following composition ratio. (A) NEOPOL8476 100.00 g (B) TPO 42.50 g (Cl) SR-203 140.00 g ((7) CB-1 100.00 g Others 酴 0.1 0.19 g
使用E型黏度計,測定25°C下的噴墨用墨水4的黏 度’結果為102mPa.s。 使用噴墨用墨水4,以與實驗例1相同的方法獲得形 成有厚度為10 /im的硬化膜圖案的基板4。 [實驗例5] 使用雙酚F型酸改質環氧丙烯酸酯即NE〇p〇L 831〇 (商品名;japan U-pica股份有限公司製造、重量平均分 =量1〇0〇、酸值:1〇4 mgK〇H/g) ’來作為酸改質環氧(甲 土)丙稀駿酯(A),並設為下述組成比例,除此以外以 38 201024380 與實驗例1相同的方式製備喷墨用墨水5。 (A) NEOPOL 8310 100.00 g (B) TPO 40.00 g (Cl) SR-203 120.00 g (C2) CB-1 100.00 g 其他 盼D塞喚 0.16 g 使用E型黏度計,測定25¾下的喷墨用墨水5的 ❹ 度’結果為94 mPa · s。 使用噴墨用墨水5,以與實驗例丨相同的方法獲得形 成有厚度為1〇 的硬化膜圖案的基板5。 [比較例1] t使用二季戊四醇六丙烯酸酯與二季戊四醇五丙烯酸 -s及一季戊四醇五丙歸酸醋的琥轴酸衍生物的混合物(酸 =質多官能丙烯酸酯)即TO-2349 (商品名;東亞合成股 ,有限公司製造、酸值:68 mgKOH/g),來替代酸改質環 氧(甲基)丙婦酸醋(A)成分’並設為下述組成比例,除此 以外’以與實驗例1相同的方式製備噴墨用墨水6。 TO-2349 100.00 g (B) TPO 43.75 g (Cl) SR-203 150.00 g (C2) CB-1 100.00 g 其他 酚噻嗪 0.20 g 使用E型黏度計,測定25°C下的噴墨用墨水6的黏 度,結果為94 mPa. s。 39 201024380 32133pif 使用喷墨用墨水6,以與實驗例1相同的方法獲得形 成有厚度為10 /zm的硬化膜圖案的基板6。 [比較例2] 使用具有更大酸值的雙酚F型酸改質環氧丙烯酸酯即 NEOPOL 8477TMA150 (商品名;japan u-pica 股份有限公 司製造、重量平均分子量:10000、酸值:151mgK〇H/g), 來替代酸改質環氧(甲基)丙烯酸酯(A)成分,並設為下述 組成比例,除此以外,以與實驗例i相同的方式製備噴 用墨水7。 NEOPOL 8477TMA150 100.00 g (B) TPO 50.00 g (Cl) SR-203 200.00 g (C2) CB-1 100.00 g 其他 紛嗟e秦 Ω91σ 使用E型黏度計,測定25t:下的喷墨用墨水7的黏 度’結果為119 mPa · s。 使用喷墨用墨水7,以與實驗例1相同的方法獲得形 成有厚度為10 的硬化膜圖案的基板7。 乂 [比較例3] 使用具有更大重量平均分子量的雙酚A型酸改質環 氧丙烯酸酯即KAYARADZAR-1395H(商品名;日本化^ 股份有限公司製造、重量平均分子量··約14〇〇〇、酸值 100 mgKOH/g)’來替代酸改質環氧(曱基)丙烯酸酯 成分’並設為下述組成比例’除此以外,以與實驗例1相 201024380 όΐΐόόρη 同的方式製備喷墨用墨水8。 (B) ZAR-1395H 100.00 g TPO 56.25 g (C1) SR-203 250.00 g (C2) CB-1 100.00 g 其他 紛售嗓 0.25 g 使用Ε型黏度計’測定25°C下的噴墨用墨水8的黏 © 度’結果為105 mPa.s。 使用噴墨用墨水8 ’以與實驗例1相同的方法獲得形 成有厚度為10 "m的硬化膜圖案的基板8。 〈噴墨用墨水及圖案狀硬化膜的評價> 接著’評價喷墨用墨水的噴出性、硬化膜的硬化性、 .耐蝕刻性、耐鍍敷性、及鹼剝離性。各試驗方法如下所述, 將評價結果示於表1中。 羞水的嗜屮.性試驗 鲁 對所得的基板1〜8上的圖案的混亂、印刷的擦痕進 行觀察,評價墨水的喷出性。評價基準如下所述。 ◎:完全無圖案的混亂、印刷的擦痕。 〇:幾乎無圖案的混亂、印刷的擦痕。 △:稍有產生圖案的混亂、印刷的擦痕。 X :圖案的混亂、印刷的擦痕較多。 膜的硬化性試駿: 手指接觸基板表面’並用顯微鏡觀察硬化嫉的表面狀 態。評價基準如下所述。 201024380 32133pif 〇:於硬化膜表面完全無手指接觸的痕跡。 △:於硬化膜表面殘留較少手指接觸的痕跡。 X:手指接觸的痕跡完全殘留於硬化膜表面 耐蝕刻性試驗 、 ° 於50°c下,將基板於13%FeCl3水溶液中浸潰2分鐘, 利用顯微鏡觀察硬化膜的表面狀態。評價基準如下所述。 ◎:於硬化膜上完全無變化。 〇:於硬化膜上見到較少變色,但完全未見到剝落。 △:硬化膜完全變色,亦見到較少剝落。 X:硬化膜完全剝落。 耐鍍敷性試驗 於60°C下,將基板於市售的非電解鍍鎳液(商品名: .Using the E-type viscometer, the viscosity of the inkjet ink 4 at 25 ° C was measured and found to be 102 mPa·s. Using the inkjet ink 4, a substrate 4 formed with a cured film pattern having a thickness of 10 / im was obtained in the same manner as in Experimental Example 1. [Experimental Example 5] bisphenol F-type acid-modified epoxy acrylate, NE〇p〇L 831〇 (trade name; manufactured by japan U-pica Co., Ltd., weight average fraction = amount 1〇0〇, acid value) :1〇4 mgK〇H/g) 'As an acid-modified epoxy (methane) propyl benzoate (A), and set to the following composition ratio, except that 38 201024380 is the same as Experimental Example 1 The inkjet ink 5 was prepared in a manner. (A) NEOPOL 8310 100.00 g (B) TPO 40.00 g (Cl) SR-203 120.00 g (C2) CB-1 100.00 g Others expecting D to call 0.16 g Using an E-type viscometer to measure inkjet ink at 253⁄4 The ❹ degree of 5 results in 94 mPa · s. Using the inkjet ink 5, a substrate 5 formed with a cured film pattern having a thickness of 1 Å was obtained in the same manner as in Experimental Example. [Comparative Example 1] t A mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylic acid-s and a pentaerythritol pentaacetic acid succinic acid derivative (acid = polyfunctional acrylate), that is, TO-2349 (product) Name; East Asia Synthetic Stock Co., Ltd., acid value: 68 mgKOH/g), in place of acid-modified epoxy (methyl) propylene vinegar (A) component' and set as the following composition ratio, 'Inkjet ink 6 was prepared in the same manner as Experimental Example 1. TO-2349 100.00 g (B) TPO 43.75 g (Cl) SR-203 150.00 g (C2) CB-1 100.00 g Other phenothiazine 0.20 g Inkjet ink at 25 ° C was measured using an E-type viscometer 6 The viscosity is 94 mPa.s. 39 201024380 32133pif Using the inkjet ink 6, a substrate 6 having a cured film pattern having a thickness of 10 /zm was obtained in the same manner as in Experimental Example 1. [Comparative Example 2] A bisphenol F type acid-modified epoxy acrylate having a larger acid value, that is, NEOPOL 8477TMA150 (trade name; manufactured by japan u-pica Co., Ltd., weight average molecular weight: 10,000, acid value: 151 mgK 使用) In the same manner as Experimental Example i except that the acid-modified epoxy (meth) acrylate (A) component was used instead of the acid-modified epoxy (meth) acrylate (A) component, the ink for ejection 7 was prepared in the same manner as in Experimental Example i. NEOPOL 8477TMA150 100.00 g (B) TPO 50.00 g (Cl) SR-203 200.00 g (C2) CB-1 100.00 g Others 秦 秦 Ω Ω 91σ Using an E-type viscometer, measure the viscosity of inkjet ink 7 under 25t: 'The result is 119 mPa · s. Using the inkjet ink 7, a substrate 7 formed with a cured film pattern having a thickness of 10 was obtained in the same manner as in Experimental Example 1.比较 [Comparative Example 3] A bisphenol A type acid-modified epoxy acrylate having a larger weight average molecular weight, that is, KAYARADZAR-1395H (trade name; manufactured by Nippon Kasei Co., Ltd., weight average molecular weight·about 14 使用) was used. Spraying in the same manner as in Experimental Example 1 201024380 όΐΐόόρη except that the acid value (100 mgKOH/g) was used instead of the acid-modified epoxy (fluorenyl) acrylate component 'and the composition ratio is as follows'. Ink 8 is used. (B) ZAR-1395H 100.00 g TPO 56.25 g (C1) SR-203 250.00 g (C2) CB-1 100.00 g Others sold 嗓 0.25 g Determination of inkjet ink at 25 ° C using a Ε-type viscometer 8 The viscosity value of the result is 105 mPa.s. Using the inkjet ink 8', a substrate 8 having a cured film pattern having a thickness of 10 " m was obtained in the same manner as in Experimental Example 1. <Evaluation of inkjet ink and pattern-like cured film> Next, the discharge property of the inkjet ink, the curability of the cured film, the etching resistance, the plating resistance, and the alkali peelability were evaluated. Each test method is as follows, and the evaluation results are shown in Table 1. The eosinophilic test of the shame water Lu was observed for the disorder of the pattern on the obtained substrates 1 to 8, and the scratches of the printing, and the discharge property of the ink was evaluated. The evaluation criteria are as follows. ◎: completely without pattern confusion, printed scratches. 〇: There is almost no pattern of confusion, printed scratches. △: There is a slight confusion in the pattern and a scratch on the print. X: The pattern is confusing and the printed scratches are more. The sclerosing test of the film: the finger touches the surface of the substrate ‘ and the surface state of the hardened enamel is observed with a microscope. The evaluation criteria are as follows. 201024380 32133pif 〇: There is no finger contact on the surface of the cured film. △: There are few traces of finger contact remaining on the surface of the cured film. X: Traces of finger contact completely remained on the surface of the cured film. Etching resistance test, ° The substrate was immersed in a 13% FeCl3 aqueous solution at 50 ° C for 2 minutes, and the surface state of the cured film was observed with a microscope. The evaluation criteria are as follows. ◎: There was no change at all on the cured film. 〇: Less discoloration was observed on the cured film, but no peeling was observed at all. △: The cured film was completely discolored, and less peeling was also observed. X: The cured film is completely peeled off. Plating Resistance Test The substrate was placed on a commercially available electroless nickel plating bath at 60 ° C (trade name: .
Nimden NPR-4、Ni濃度為4.5 g/L、上村工業股份有限公 司製造)中浸潰15分鐘,利用顯微鏡觀察硬化膜的表面狀 態。另外,於90°C下’於非電解鍍金液(商品名:Goblite TAM-55、Au濃度為1 g/L、上村工業股份有限公司製造) 中浸潰20分鐘,進行相同的觀察。評價基準如下所述。 ❹ ◎.於硬化膜上完全無變化。 〇··於硬化膜上見到較少變色,但完全未見到剝落。 △:硬化膜完全變色,亦見到較少剝落。 X:硬化膜完全剝落。 鹼剝離性試驗 於50°C下’將評價耐蝕刻性後的基板於濃度為5%的 NaOH水溶液中浸潰1分鐘,利用顯微鏡觀察硬化膜的剥 42 201024380 άζΐόόρηNimden NPR-4, Ni concentration of 4.5 g/L, manufactured by Shangcun Industrial Co., Ltd., was immersed for 15 minutes, and the surface state of the cured film was observed with a microscope. Further, the same observation was carried out by immersing in an electroless gold plating solution (trade name: Goblite TAM-55, Au concentration: 1 g/L, manufactured by Uemura Kogyo Co., Ltd.) at 90 °C for 20 minutes. The evaluation criteria are as follows. ❹ ◎. There is no change on the cured film. 〇·· I saw less discoloration on the cured film, but no peeling was observed at all. △: The cured film was completely discolored, and less peeling was also observed. X: The cured film is completely peeled off. The alkali peeling test was carried out at 50 ° C. The substrate after the evaluation of the etching resistance was immersed in a 5% aqueous solution of NaOH for 1 minute, and the peeling of the cured film was observed by a microscope. 42 201024380 άζΐόόρη
離性。另外,於50°C下,將首先評價耐鍍鎳性,接著,評 價耐鍍金性後的基板於濃度為5%的NaOH水溶液中浸漬J 分鐘,利用顯微鏡觀察硬化膜的剝離性。評價基準如下所 述。 〇:完全剝離。 △:一部分剝離。 X:完全無剝離。 φ [表 1] 實驗例 比較例 1 2 3 4 5 1 2 3 基板編號 基板 1 基板 2 基板 3 基板 4 基板 5 基板 6 基板 7 基板 8 喷出性 〇 〇 〇 ◎ ◎ ◎ 〇 X 硬化性 〇 〇 〇 〇 〇 Δ 〇 一 耐蝕刻性 〇 ◎ ◎ ◎ ◎ 〇 △ — 耐鍍鎳性 〇 〇 ◎ ◎ ◎ 〇 △ 一 耐鍍金性 〇 〇 ◎ ◎ ◎ 〇 △ — 耐蚀刻性評價後 的鹼剝離性 〇 〇 〇 ◎ ◎ X 〇 — 耐鍍敷性評價後 的鹼剝離性 〇 〇 〇 ◎ ◎ X 〇 — 如由表1所示的結果可明確般,於本發明的基板1〜5 中,幾乎未見到圖案的混亂、印刷的擦痕,墨水的喷出性 良好,尤其是基板4、5,完全未見到圖案的混亂、印刷的 擦痕,故較良好。另外,對基板1〜5上的藉由手指接觸的 膜的硬化性進行評價,結果於硬化膜表面完全不殘留手指 43 201024380 32133pif 接觸的痕跡,膜的硬化性良好。 另外’基板1〜5的耐蝕刻性、耐鍍鎳性、耐鍍金性、 及鹼剝離性良好,其中尤其是基板2〜5的对蝕刻性優異, 進而其中尤其是基板3〜5的耐鐘鎳性、及耐鍍金性優異’ 進而其中尤其是基板4、5的驗剝離性優異。 另一方面,關於使用酸改質多官能丙稀酸酯替代酸改 質環氧(甲基)丙烯酸酯(A)成分的比較例1 ’鹼剝離性極 其不良,且藉由驗而完全未剝離。另外,關於使用酸值為 151 mgKOH/g的酸改質環氧丙烯酸酯的比較例2 ’耐蝕刻 性、耐鍍鎳性、耐鍍金性不良。另外,關於使用重量平均 分子量約為14000的酸改質環氧丙烯酸酯的比較例3,基 板8上的印刷圖案的混亂、擦痕較多,無法獲得均勻的膜。 因此’中斷墨水的噴出性以外的評價。 如以上所說明般,根據本發明,可獲得一種墨水的喷 出性、膜的硬化性、耐蝕刻性、及耐鍍敷性的至少一種性 能優異的可進行驗性剝離的喷墨用墨水。 雖然本發明已以實施例揭露如上,然其並非用以限定 本發明’任何所屬技術領域巾具有通常知識者,在不脫離 本發明之㈣賴_ ’當可作些許祕膚,故本 ,明之保,圍當視後附之申請專雜該界定者為準。 【圖式簡單說明】 無 【主要元件符號說明】 益Separation. Further, at 50 °C, the nickel plating resistance was first evaluated, and then the substrate after evaluation of the gold plating resistance was immersed in an aqueous NaOH solution having a concentration of 5% for J minutes, and the peeling property of the cured film was observed by a microscope. The evaluation criteria are as follows. 〇: Completely peeled off. △: Partial peeling. X: No peeling at all. φ [Table 1] Experimental Example Comparative Example 1 2 3 4 5 1 2 3 Substrate No. Substrate 1 Substrate 2 Substrate 3 Substrate 4 Substrate 5 Substrate 6 Substrate 7 Substrate 8 Ejection 〇〇〇 ◎ ◎ 〇 X Hardenability 〇〇 〇〇〇 〇 〇 耐 耐 耐 ◎ ◎ ◎ 〇 〇 一 一 一 一 一 一 一 一 一 一 ◎ ◎ ◎ 〇 △ — alkali peeling after evaluation of etching resistance 〇 〇〇 ◎ ◎ X 〇 - alkali releasability after evaluation of plating resistance ◎ ◎ X 〇 - As is clear from the results shown in Table 1, almost no substrate 1 to 5 of the present invention In the disorder of the pattern and the scratches of the printing, the ejection property of the ink is good, and in particular, the substrates 4 and 5 have no visible pattern turminess and scratches on the printing, and therefore are excellent. Further, the hardenability of the film which was contacted by the fingers on the substrates 1 to 5 was evaluated, and as a result, the contact of the fingers 43 201024380 32133pif was not left at all on the surface of the cured film, and the film was excellent in curability. Further, the substrates 1 to 5 are excellent in etching resistance, nickel plating resistance, gold plating resistance, and alkali peeling property, and particularly, the substrates 2 to 5 are excellent in etching property, and in particular, the clocks of the substrates 3 to 5 are particularly resistant. Excellent in nickel properties and gold plating resistance. Further, among them, in particular, the substrates 4 and 5 are excellent in peelability. On the other hand, in Comparative Example 1 in which an acid-modified polyfunctional acrylate was used in place of the acid-modified epoxy (meth) acrylate (A) component, the alkali peeling property was extremely poor, and it was not peeled off at all by inspection. . Further, Comparative Example 2 using an acid-modified epoxy acrylate having an acid value of 151 mgKOH/g was inferior in etching resistance, nickel plating resistance, and gold plating resistance. Further, in Comparative Example 3 using an acid-modified epoxy acrylate having a weight average molecular weight of about 14,000, the printed pattern on the substrate 8 was confusing and scratched, and a uniform film could not be obtained. Therefore, the evaluation other than the discharge of the ink is interrupted. As described above, according to the present invention, it is possible to obtain an inkjet ink which is excellent in at least one of ink discharge properties, film curability, etching resistance, and plating resistance, and which can be subjected to inspectability. Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Any subject matter of the technical field of the present invention can be used without departing from the invention. Bao, the application for the application of the application is subject to the definition. [Simple diagram description] None [Main component symbol description]
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008283061A JP5315932B2 (en) | 2008-11-04 | 2008-11-04 | Inkjet ink |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201024380A true TW201024380A (en) | 2010-07-01 |
| TWI435918B TWI435918B (en) | 2014-05-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW98129445A TWI435918B (en) | 2008-11-04 | 2009-09-01 | Inks for ink-jet printing |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5315932B2 (en) |
| KR (1) | KR20100050383A (en) |
| TW (1) | TWI435918B (en) |
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| CN102753630A (en) * | 2010-09-24 | 2012-10-24 | 积水化学工业株式会社 | Curable composition for inkjet and method for producing electronic component |
| CN103119109A (en) * | 2010-09-22 | 2013-05-22 | 积水化学工业株式会社 | Curable composition for inkjet and method for producing electronic component |
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| JP5609321B2 (en) * | 2010-06-30 | 2014-10-22 | 東洋インキScホールディングス株式会社 | Active energy ray-curable ink composition |
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-
2008
- 2008-11-04 JP JP2008283061A patent/JP5315932B2/en not_active Expired - Fee Related
-
2009
- 2009-08-27 KR KR20090079741A patent/KR20100050383A/en not_active Ceased
- 2009-09-01 TW TW98129445A patent/TWI435918B/en not_active IP Right Cessation
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| CN103119109B (en) * | 2010-09-22 | 2015-12-09 | 积水化学工业株式会社 | Curable composition for inkjet and method for producing electronic component |
| US9249336B2 (en) | 2010-09-22 | 2016-02-02 | Sekisui Chemical Co., Ltd. | Curable composition for inkjet, and method for producing electronic component |
| TWI577751B (en) * | 2010-09-22 | 2017-04-11 | Sekisui Chemical Co Ltd | A hardening composition for inkjet and a method for manufacturing an electronic component |
| CN102753630A (en) * | 2010-09-24 | 2012-10-24 | 积水化学工业株式会社 | Curable composition for inkjet and method for producing electronic component |
| US10160881B2 (en) | 2010-09-24 | 2018-12-25 | Sekisui Chemical Co., Ltd. | Curable composition for inkjet and method for producing electronic component |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI435918B (en) | 2014-05-01 |
| JP2010111716A (en) | 2010-05-20 |
| KR20100050383A (en) | 2010-05-13 |
| JP5315932B2 (en) | 2013-10-16 |
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| MM4A | Annulment or lapse of patent due to non-payment of fees |