TW201015239A - Illumination optical system, exposure apparatus, and device manufacturing method - Google Patents

Abstract

An illumination optical system for applying light from a light source (1) to illuminate a target illuminated face (M, W) is provided. The illuminating optical system contains: a distribution forming optical system (3, 4, 7, 8), including an optical integrator (8), for forming a pupil luminous intensity distribution in an illumination pupil disposed behind the optical integrator (8); and a light shielding unit (9, 91, 92) disposed at a location closely before or behind the illumination pupil to attenuate the light projected toward a point on the target face. The light shielding unit is disposed in a manner that the shielding efficiency of the light shielding unit at a point on a periphery in a predetermined direction (Y direction) along which the light is projected to the target face is higher than the shielding efficiency at a point on the periphery in the other direction.

Description

201015239 〇" / / j_uf.doc VI. Description of the Invention: [Technical Field] The present invention relates to an illumination optical system, an exposure apparatus, and a component manufacturing method. More specifically, the present invention relates to an illumination An optical system is suitable for an exposure apparatus for manufacturing a component such as a semiconductor element, an image pickup element, a liquid crystal display element, a thin film magnetic head or the like by a lithography step. [Prior Art] ® In such a typical exposure apparatus, The light emitted from the light source is formed as a secondary light source (generally an illumination light pupil) as a substantially surface light source formed of a plurality of light sources via a fly eye iens as an optical integrator Light intensity distribution. Hereinafter, the light intensity distribution in the illumination pupil is referred to as "the pupil intensity distribution". Moreover, the illumination pupil is defined as an illuminated surface by the action of an illumination system between the illumination pupil and the illuminated surface (a mask or a wafer in the case of an exposure device). It becomes the position of the F〇urier O transform surface of the illumination pupil. The light from the one-person light source is condensed by a condensing lens (consider iens), and the reticle forming the predetermined pattern is superimposed and illuminated. The light that has passed through the reticle is crystallized via the projection optical system. Imaging on the circle to expose (transfer) the reticle and the projection onto the wafer. After the pattern formed on the reticle is highly integrated, in order to accurately transfer the fine pattern onto the wafer 曰It is indispensable to obtain a uniform illuminance distribution on the circle. In order to accurately transfer the fine pattern of the reticle onto the wafer, the 201015239 JZZ/ /pu.doc has the following techniques: for example, forming a band or multipole The pupil intensity distribution of the shape (dipole, quadrupole, etc.) is such that the focus depth and the resolution of the projection optical system are improved (refer to the patent ^^^. [Patent Document] [Patent Document 1] US Patent Publication No. 2006/0055834, regardless of the shape of the pupil intensity distribution formed in the illumination pupil, as if it were on the wafer to be the final wafer. In the intensity distribution associated with each point, The light that is out of the optical axis and leaves a pair of spaced regions in a predetermined direction is too large. The case may be exposed to a desired position and is exposed. '1 SUMMARY OF THE INVENTION [0009] It is an object of the present invention to provide a The illumination optical system, which is adjusted in the light (four) degree distribution of the points on the illuminated surface, in the scale light, and in the direction of the radial direction - the difference in the light intensity difference of the area is provided by using the following Illumination optics, and exposure device with good exposure under suitable lighting conditions, = illumination optical system can be used to produce light in the knives of the points (4) on the Φ In order to solve the above problem, the first aspect of the present invention provides an illumination light system that illuminates an illuminated surface with light from a light source, in order to solve the above problem. The levy consists of: /, temple

201015239 / jjif.doc distribution forming optics # integrator further enclosing the integrator in the rear side, and in the optical dimming member configuration = forming the pupil intensity distribution; and the position, facing the above-mentioned illuminated or positive The rear light-reducing member is dimmed by the light of the following point; the light toward the surface to be irradiated is reduced by one point of the light reduction ratio of the light-reducing member light The light rate is large. In the second aspect of the present invention, the second aspect of the present invention provides light of the source, and is irradiated with light, and is illuminated by light, and is characterized by: The integration system 'includes an optical integrator and forms a pupil intensity distribution in the illumination pupil of the optical product; and the position m is f ί _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The optical axis of the illumination optical system is horizontally oriented, a first dimension in the VL^° direction, and a second dimension that is larger than the first dimension and in the second direction orthogonal to the first direction. The second direction intersects the optical axis of the illumination optical system. According to a third aspect of the present invention, there is provided an illumination optical system for reciprocating a surface of a light source, comprising: a cloth forming optical system including an optical integrator, and a pupil intensity distribution is formed in the illumination pupil on the rear side; and a position where the dimming member 'is disposed in front of or behind the illumination pupil' dimming light at one point toward the illuminated surface; 7 201015239 〇/pxx.doc Line switching 'The direction of the entrance surface between the above-mentioned first potential and the second posture along the predetermined side: the ratio of the potential to the upper edge r, the above-mentioned dimming member pair is stopped toward the other periphery The light-receiving phase is large, and the second posture is a dimming of the light at the above-mentioned point of the periphery of the light-reducing member with respect to the dimming rate of the light at the dimming rate. The component pair is directed toward the upper source: the illuminated surface is illuminated, and the special feature is to form a silk secret from the light j, the pure solution integral $, and the light _ degree distribution is formed in the pupil; the sigh position ii threat frequency County _ directly in front or directly behind = the optical axis of the optical system is carried out = ~ knife Fu knocking the J size of joint 1, and the size of the second direction is perpendicular to the first direction, i.e. along = 2 and the dimmer and the member may be rotatable about the axis in the first direction〗. The second aspect of the present invention provides a illuminating optical system that illuminates an illuminated surface with light of a source, and is characterized by comprising: a nine-p distribution forming light (four) system including a silk integrator, and Forming a pupil intensity distribution in an illumination pupil on a rear side of the optical integrator; and a variable portion that is obtainable with respect to a first pupil intensity distribution associated with a light beam reaching a first point on the illuminated surface, The intensity distribution of the second touch 201015239 32277pii.doc associated with the light beam reaching the second point on the illuminating surface different from the above-described second point is changed. According to a sixth aspect of the present invention, there is provided an exposure apparatus comprising: a unit for illuminating a predetermined pattern! The photograph of the third, fourth, or fifth form is exposed to the sensory substrate. The fourth aspect of the invention provides a method for producing a device, characterized in that the exposure step is exposed to the photosensitive substrate by using an exposure apparatus of a sixth aspect; and the predetermined pattern is further provided. a developing step of developing the above-described predetermined image plate, and forming a shape and a predetermined pattern on the surface of the photosensitive substrate; and a first cover layer surface of the 〃~, via the light _ pair The above-mentioned photosensitive substrate table [Effect of the invention] The illumination optical system according to the invention includes a member, and the light-reducing member is disposed in front of the optical 穑 ” 减 先 先 τ τ 么 么 么 么 + + + + 刀 刀 刀Further, the position of the rear side of the illumination pupil is (7), and the position of the light-reducing member is dimmed. The dimming member is compared with the direction of the pair of dimming members in the predetermined direction of the first irradiation surface, and the dimming is performed. The dimming rate of the light toward the other side = / point two is larger, and the dimming rate of the light at one point of the second posture is higher than that of the point, and the pair of the one facing the one on the periphery Compared with the reduction rate, the dimming member pair faces the above-mentioned 9 20 on the other periphery 1015239

/ /pn.d〇C The light dimming rate at 1 point is small. In this case, the light-reducing member realizes a plurality of dimming characteristics in which the dimming rate changes in accordance with various aspects along a predetermined direction of the illuminated surface in the following manner. Therefore, in the illumination optical system according to the above aspect, under the plurality of dimming actions of the light-reducing member, the intensity of the pupil associated with each point on the illuminated surface can be in the cloth and the optical axis is held in a predetermined direction. The light intensity difference of a pair of regions spaced apart from each other is adjusted. Further, in the exposure apparatus of the present invention, the illumination optical system can be used to perform good exposure under appropriate illumination conditions, thereby producing a good component in which the illumination optical system is associated with each point on the spot on which the spot is illuminated. In the pupil intensity distribution, the light intensity difference between the regions in which the optical axis is lost and the distance is spaced apart in a predetermined direction is adjusted. The above described features and advantages of the present invention will become more apparent from the description of the appended claims. [Embodiment] An embodiment of the present invention will be described based on the drawings. Fig. 丨 is a view schematically showing the configuration of an exposure apparatus according to an embodiment of the present invention. In FIG. 1, the Z-axis is set along the normal direction of the exposure surface (transfer surface) of the wafer % of the photosensitive substrate, and is parallel to the plane of the paper of FIG. 1 in the exposure surface of the wafer w. The Y axis is set, and the X axis is set in a direction perpendicular to the paper surface of FIG. 1 in the exposure surface of the wafer 1. Referring to Fig. 1, in the exposure apparatus of the present embodiment, an exposure light beam is supplied from the light source i (the illumination light is used as the light source 丨, and for example, an ArF excimer laser light source that supplies light of a wavelength of 193 nm or a KrF excimer laser light source that supplies light of a wavelength of 248 nm, etc. The light beam emitted from the light source ι 201015239 / /pif.doc is passed through the shaping optical system 2 J2, for example, via a diffractive optical element 3 for ring illumination : a... lens (af〇eal lens) 4. The afocal lens 4 is set to have its front side position == uniform, and its rear side focus position and the surrounding element 3 are based on the exposure formed on the substrate. The beam (illumination) is formed by the step of the wavelength of the spoon, and has the effect of making the incident light: angle diffraction. Specifically, the diffraction 1 learning 3 for the ring illumination has the following Wei, That is, when a flat-shaped beam having a rectangular cross section is shot, the light intensity distribution in the far-field (or the F_h〇fer diffraction region) is formed in the far field (the F-h〇fer diffraction region). a substantially parallel beam of diffractive optical element 3, in a focusless lens After the ring-shaped light intensity distribution is formed on the step surface of 4, it is emitted from the afocal lens 4 in an angular distribution of the ring-shaped lens. The light passing through the afocal lens bucket can be used to change the reading (^ = illumination optical system A zoom lens of the reticle side numerical aperture / reticle side numerical aperture of the projection optical system) and a human eye to a micro fly's eye lens (or fly eye lens) 8 as an optical integrator 8. Micro fly-eye lens 8 The optical element is composed of, for example, a plurality of microlenses having a positive refractive index and a densely arranged refracting power, and is formed by forming a microlens group by performing a parallel plane etching process. Each of the tiny lenses of the lens is smaller than the lens elements constituting the fly-eye lens. Moreover, the micro fly-eye lens is different from the ship lens formed by the mirrors of the 11 201015239 /pil.doc, which is isolated from each other. The two are not isolated from each other. However, in terms of the longitudinal and horizontal arrangement of the lens element having the positive folding force, the micro fly-eye lens and the compound eye are transparent. Similarly, it is an optical integrator of a wavefront type (divisi〇n 〇f wavefr〇nt) type. The structure of such a micro fly-eye lens 8 is disclosed, for example, in U.S. Patent No. 6741394. For example, a cylindrical (cyUndrical) micro fly-eye lens can be used as the micro fly's eye lens 8. The configuration and action of the columnar micro fly's eye lens are disclosed, for example, in U.S. Patent No. 6,913,373. The teachings of Japanese Patent No. 6741394 and Japanese Patent No. 6913373. The position of the predetermined surface 5 is disposed in the vicinity of the front focus position of the variable focal length lens 7 or the front focus position, and the incident surface of the micro fly-eye lens 8 is disposed at the rear focus position of the variable focal length lens 7 or Near the back focus position. In other words, the variable focal length lens 7 will define the face 5 &

The incident surface of the fly-eye lens 8 is substantially arranged to have a Fourier transform relationship. The pupil plane of the afocal lens 4 and the incident surface of the micro fly's eye lens 8 are arranged to be optically substantially conjugate. Therefore, in the same manner as the pupil plane of the afocal lens 4, an eyeglass-shaped field centering on the optical axis 形成 is formed on the incident surface of the micro-folding lens 8. The overall shape of the band-shaped field is similarly changed depending on the focal length of the variable focal length lens _7. The incident surface of each of the microlenses of the micro fly-eye lens 8 (that is, the unit wavefront discrimination surface) is, for example, a rectangular shape having a long side along the z direction and a short side along the X direction, and is on the photomask M 12201015239 The shape of the illumination area to be formed (and thus the shape of the exposed area to be formed on the wafer w) is similarly rectangular. The light beam incident on the micro fly's eye lens 8 is two-dimensionally divided, and is formed on the rear focus surface of the micro fly-eye lens 8 or the position near the rear focus surface (and thus the position of the illumination pupil). A primary light source having substantially the same light intensity distribution in the field of view formed on the incident surface of the micro fly's eye lens 8, that is, a secondary light source formed of a ring-shaped substantially surface light source centered on the optical axis AX (light)瞳 intensity distribution). A light-shielding 9 is disposed in the vicinity of the rear focal plane of the micro fly's eye lens 8 or in the vicinity of the rear focal plane. The configuration and action of the shading unit 9 will be described below. Further, in the vicinity of the rear focal plane or the rear focal plane of the micro fly-eye lens 8, an illumination aperture I (optional) is disposed as needed (the aperturest aperture is not shown). An annular band-shaped aperture portion (transmission portion) corresponding to the endless belt-shaped secondary light source. The illumination aperture stop is configured to be detachable from the illumination optical path, and is configured to be capable of being different from the aperture portion having a different size and shape. A plurality of aperture stops are switched. As the aperture method of the aperture stop, for example, a well-known turret or slide method can be used. The illumination aperture stop is disposed at an entrance pupil plane of the projection optical system PL to be described below, and is optically substantially in a common position, and defines a range that contributes to illumination of the primary light source. ^The light passing through the micro fly-eye lens 8 and the light-shielding unit 9 is superimposed on the mask mask 11 (mask biin(j) by the concentrating photonic system 1 由此. Thus, the light as the illumination field stop The cover mask u is formed in a rectangular shape corresponding to the shape and focal length of the microlens of the micro fly-eye lens 8. The rectangular aperture portion (transmission portion) passing through the mask mask 11 is formed. First, the mask 形成 formed with a predetermined pattern is superimposed for a month via the imaging optical system 12' formed by the front lens group 12a and the rear lens group 12b. That is, the imaging optical system 12 has a mask. The image of the rectangular aperture portion of the obstructor 11 is formed on the mask 。. The pattern to be transferred is formed on the maskless enamel on the Mt. A rectangular (slit-like) pattern region having a long side and having a short side along the X direction is illuminated. Light that has passed through the pattern region of the mask 经由 is held on the wafer platform WS via the projection optical system pL. Wafer pattern formed on the wafer (photosensitive substrate) w The image of the case, that is, the rectangular illumination area on the reticle, is also a rectangular shape having a long side along the γ direction and a short side along the X direction on the wafer W. A pattern image is formed in the light area of the still exposure region. Exposure is based on the so-called step-scan (clear and _) square and the plane of the system PL and the light | ^ Αχ orthogonal plane (light leveling, along the X direction (scanning direction) to make the mask Μ 曰 = The circle also scans the exposure mask pattern even if the mask Μ is moved in synchronization with the wafer w. (Scanning y: 台 ^ 有 有 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( As described above, the formed light w is irradiated by the micro fly-eye lens 8 (the second cover of the set JJ is subjected to Kohler illumination (K〇hIer 201015239 32277 pif.doc illumination). The position of the secondary light source is optically conjugate with the position of the aperture stop AS of the projection optical system PL, so that the formation surface of the secondary light source can be referred to as the illumination light surface of the illumination optical system (2 to 12). The 'irradiation surface' of the illumination surface (the surface on which the light is disposed) or the projection optical system PL is included as the surface on which the wafer W is disposed in consideration of the illumination optical system. &The inner blade transform surface. ❹ ❹ Furthermore, the so-called pupil intensity distribution refers to the lighting sound preparation 1 2) illumination light _, or light intensity distribution (brightness distribution) on the surface of the (four) pupil plane optically shared. When the micro-ship lens 8 ^ wavefront region score is relatively large, micro Wei Wei 8 The overall light intensity distribution formed on the surface of the person, and the distribution of the money (the intensity distribution of the pupil) show a high correlation. Therefore, the human face and the projection of the micro fly-eye lens 8 can also be used. The light intensity distribution on the surface of the forest is also called the pupil intensity distribution. In the configuration of the ® 1, the diffractive optical member 3, the wireless mirror 4, and the lens 7 and 8 can be distributed. In the optical system, the distribution forms the pupil eye lens 8 and the pupil intensity distribution is formed in the _ 瞳 瞳 - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - The diffractive optical element for diffractive optical element pole illumination is used to enter the bungee illumination. The multi-quadrupole and the human pole material are all in a two-pole shape and a % offset distribution. Therefore, the light beam passing through the diffractive optical element for the multi-pole illumination 15 201015239 /pn.doc forms a plurality of predetermined shapes (circular arcs) centered on the optical axis anthropomorphism on the incident surface of the micro fly-eye lens 8 A multi-polar field formed by the field of the shape, the shape of the circle, etc. As a result, in the vicinity of the rear focal plane or the rear focal plane of the micro fly's eye lens 8, a multipolar secondary light source similar to the field formed on the incident surface is formed. Further, instead of the diffractive optical element 3 for the endless belt illumination, a circular or optical diffractive optical element (not shown) can be set in the illumination optical path, thereby performing normal circular illumination. The diffractive optical element for circular illumination has a function of forming a circular light intensity distribution on the far field when a parallel beam having a rectangular cross section is incident. Therefore, the light beam passing through the diffractive optical element for circular illumination forms a circular field of illumination on the incident surface of the micro fly's eye lens 8, for example, centered on the optical axis AX. As a result, a circular secondary light source having the same shape as the field formed on the incident surface is formed in the vicinity of the rear focal plane or the rear focal plane of the micro fly's eye lens 8. Further, instead of the diffractive optical element 3 for the endless belt illumination, a diffractive optical element (not shown) having appropriate characteristics can be set in the illumination light path, thereby performing various forms of anamorphic illumination. As the switching method of the diffractive optical element 3, for example, a well-known turret method, a sliding method, or the like can be used. Further, such a diffractive optical element is disclosed in, for example, U.S. Patent No. 5,850,300 and U.S. Patent Publication No. 2008/0074746. Here, the teachings of U.S. Patent No. 5,850,300 and U.S. Patent Publication No. 2008/0074746 are incorporated herein by reference. 16 ii.doc 201015239 In the following description, 4 is useful for understanding that the effect of the present embodiment is effective on the rear focus surface of the micro fly-eye lens 8 or the rear side focus production and production is as follows: The quadrupole light shown is once light source 20). Further, the pair of light blocking members 91 20 are directly rearward of the light shielding unit 9 (four)-shaped four-pole (four) light (four) degree distribution soil # \ surface. In the following description, the term "lighting ❹ 2" is used to mean the illumination aperture of the rear difficult surface of the micro fly's eye lens 8 or the vicinity of the rear focus surface. Referring to Fig. 2, a substantially planar light source of a pair of 3T-shaped circles spaced apart in the x direction from the optical axis AX of the quadrupole optically intense arc formed on the illumination pupil (hereinafter simply referred to as "face" The light source ") 2 is a pair of substantially planar light sources 20c and 20d which are spaced apart in the Z direction by the optical axis AX. Further, the direction in the illumination pupil is the rectangular micro-transparent short-side direction of the micro fly-eye lens 8, and corresponds to the circle W. The Z direction of the heart, the 瞳 light towel is the microscopic long-direction direction of the moment of the micro fly-eye lens 8, and corresponds to

The scanning direction of the wafer W is orthogonal to the scanning orthogonal direction (crystal W_^Y direction). In the wide view 3, a rectangular static exposure region ER having a long side in the γ direction and a short side in the Χ direction is formed on the wafer w, and is corresponding to the static exposure area ER. The mask is covered with a rectangular shaped area (shown). Here, the four-pole light formed by the light in the illuminating pupil in the illuminating pupil is barely distributed and is substantially independent of each other depending on the position of the incident point. 17 201015239 jzz / / Pu.doc = 5 has 5: The light intensity of each surface light source in a quadrupole-like pupil intensity distribution varies depending on the position of the incident point. As an example of the comparison, it is considered that the light incident on the peripheral points p2 and p3 in the still exposure region ER forms a quadrupole schematically shown in FIG. 4 and FIG. 5 in the illumination pupil. The intensity distribution of the pupil. In other words, as shown in FIG. 4, the quadrupole pupil intensity distribution 22 formed by the light passing through the center P1 in the stationary exposure region ER and at the point P2 around the space in the +Y direction is as shown in FIG. Surface light sources 22&, 22b and

The light intensities of 22d are substantially equal to each other' and the light intensity of the surface light source 22e is greater than that of the other surface light sources. Further, in the quadrupole pupil intensity distribution 23 formed by the light passing through the center point ρ in the still exposure region ER and spaced apart at the point P3 in the -Y direction, as shown in FIG. The light intensities of the light sources 23a, 23b, and 23c are substantially equal to each other, and the light intensity of the surface light source 23d is greater than the light intensity of the other surface light sources. Thus, if in the pupil intensity distribution associated with each point on the wafer w, the optical axis is clamped in the z direction (and scanned)

When the difference in light intensity between the pair of regions spaced apart in the orthogonal direction (the direction corresponding to the γ direction on the wafer W) is too large, the exposure region is exposed (in the case of the examples shown in FIGS. 4 and 5). The pattern exposed on the lower side corresponding to the peripheral points p2 and p3 may deviate from the desired position. In the present embodiment, the light shielding unit 9 is provided as an adjustment mechanism for sandwiching the optical axis AX in the pupil intensity distributions 22 and 23 associated with the peripheral points and P3, and the pair of surface light sources 22 are spaced apart in the Z direction. (: and 22 (1 18 201015239 / /pif.doc surface light source 23e and the difference between the light intensity is carried out \m2 6 ^ : ® # 90 ; f cover member 9 92; installed in each light-shielding member 91, 9 ff The rotation shaft 93 extending in the X direction; the portion 4 that rotates the rotation shaft 93 rotatably supports the support portion % of the rotation shaft. The rotation center controlled by the rotation of the rotation shaft 93 of the movement portion 94 ❹ The driving portion 94 and the supporting portion 95 are mounted thin and ▲ are arranged at intervals in the two directions. The parallel planar plate having a rectangular outer shape is as shown in FIG. 2; and the optical axis is lost in the ζ direction. The interval--==20e and the way the applied light works. The unit 9 does not face the quadrupole formed on the illumination pupil. The opposite side of the light source AX is spaced apart in the X direction. 20a and 20b work. = Light sheet, according to the posture from the rotation control system % _ (4) That is, each mask: two masks = a rectangular unit wave frontal surface of the micro-eye lens 8 = a rotation axis 93 extending in the side direction (X direction) and a rotation of the 。 的 plane. The short side direction having the __section' and the disc $ is the surface, that is, the Χ direction extends in parallel. The early position wave 19 201015239 32277pif.doc FIGS. 7 and 8 are diagrams for explaining the shading 7 and FIG. 8 for The figure has the same function as the light-shielding members 91 and 92, and the f-light structure=97 is shown, and in the single posture of each characteristic posture, the posture is as follows: In the case of the sound J, it is used in the middle of the cross section of the cross section of the shading member (X direction) (the section along the yz plane) of the shading member in Fig. 7 (the direction of the town) 〇 area:: two: two::: the center of the static exposure part on the wafer w is simple, the light, __==== the light blocked by the path (four) less m thing "=== the peripheral point in the area ER P2, p3 light, that is, light

The light at the peripheral points P2, P3 of the Q^ portion is incident at a relatively large incident angle with respect to the XZ plane on the end face on the pupil side of the light shielding member, and therefore the amount of light blocked by the light shielding member 97 Relatively more. Further, in order to simplify the description, the peripheral point m corresponding to the inner point P2 of the still exposure region £11 is set to the side of the reticle u # hole rear side +Z direction side, and the still exposure area is made]£]1 The peripheral point P3' corresponding to the inner peripheral point is located on the _Z direction side. Further, in Fig. 7, only the light indicating the potential center point P1' and the peripheral point P2· is shielded by the light shielding member 97, but it is clear that the light reaches the peripheral point! The light of >3 also reaches the peripheral point p2, and the light is also shielded by the light shielding member 97. 20 ix'.doc 201015239 The axis is only set to be from the parallel position, in the case of ft w as shown in Fig. 8). The light of the center point η of the situation, that is, the still exposure area of = =: 1: the portion of the portion blocked by the light-shielding member 97 reaches the still exposure i^ERt 报. The periphery of the hole (4) of the cover η is the most part of the light. Further, the circle is omitted, and the === rotation only, and the posture, that is, the center point ρ of the aperture portion of the second cover mask 11 is blocked by the member 97. ==Multiple and - Figure 2 is used to reduce the dimming source of the light-shielding unit composed of the member. Figure 9 shows the size of the light-shielding unit of Figure 9 for the pair of surface lights. As an example in Fig. 9, 笫]t ==== shading structure (4) is set to '=;: Γ light source dimming effect is very small and work 1 21 201015239 / pi /.doc to the elongated extended shadow area z The width dimension in the direction schematically indicates the magnitude of the light-off effect of the light shielding unit 9. Further, as shown in the left side of FIG. 10, in the quadrupole pupil intensity distribution associated with the peripheral point P2, the light-reducing action of the first light-shielding member 91 on the surface light source 22c is relatively large, and the second light-shielding member 92 is opposite to the surface light source 22d. The dimming effect is very small. Further, as shown in the right side of FIG. 1A, in the quadrupole pupil intensity distribution associated with the peripheral point P3, the first light blocking member 91 has a relatively large dimming effect on the surface light source 23c, and the second light blocking member 92 is opposite to the light source. The 23d has the largest dimming effect. Referring to Fig. 9, reference numeral B3 denotes a point along the outermost edge of the surface light source 2〇c (21c to 23c) along the Z direction (refer to Fig. 2), and reference numeral 34 denotes a surface light source 2〇d (21d). ～23d) The point at the outermost edge along the z direction (see Figure 2). Further, a point along the outermost edge in the X direction of the surface light source 20a (21a 3a) is indicated by a reference symbol Bi, and reference is made to the point of the outermost edge of the surface light source 20b (21b to 23b) along the X direction. As described above, the light from the surface light sources 20a (21a to 23a) and the surface light sources 2Ab (21b to 23b) is not affected by the light reduction effect of the light shielding unit 9. Further, as shown in FIG. 11, the first light-shielding member 91 is set to the -^-rotation posture, and the second light-weight member % is set to the quadrupole-shaped neon intensity distribution of the + (four) rotation posture avoiding the broadcast P1 (four), the first The dimming action of the opposite side source 2le of the piece 91 and the dimming action of the second shading member closing white r4 m are relatively large. The first light-shielding member 91 is opposite to the peripheral point p2, and the second light-shielding member 92 is opposite to the surface light source 22d by 22 201015239 JZZ / /pif.doc. In the distribution related to the peripheral point P3, the first eigen member 91 has a small intensity of the (4) source 23e, and the second light-shielding member 92 has a large effect on the surface 丨 曰 曰 、 、 、 、 、 、 、 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 23 'When the first light blocking member 91 is turned. When the second light-shielding member is fierce and the second light-shielding member is in a +-position, the four-pole-shaped production and the eight-drinking rotational posture light-blocking member 91 are opposite to the surface light source 21c. , Dijon _ Reduced first action, and 2nd ❹ ❹ 92 The light reduction effect of the opposite light source is relatively large. The quadrupole-shaped pupil intensity distribution with the periphery, the first! The light-reducing effect of the light-shielding member 91 on the opposite side = melon is very small, and the second light-shielding member % is the largest dimming_to the surface light source. Period Miscellaneous P3 _ of the four ^ 瞳 distribution, the first! The light-shielding member 91 has a dimming power of the surface light source 23e, and the second light-shielding member 92 has a very small light-reducing effect on the surface light source 23d. In this way, by setting, for example, the rotation posture of the second light-shielding member 91 and the appropriate _θ of the parallel posture, the second light-shielding member 92 is replaced by an appropriate between the + (four) rotation posture and the parallel posture. The light of FIG. 4 and FIG. 5 existing between the pair of surface light sources 22c and 22d spaced apart in the direction of the optical axis ΑΧκΖ and between the pair of surface light sources 23c and 23d in the +π rotation posture The intensity difference is adjusted. Specifically, when the first light blocking member 91 of the light shielding unit 9 is in the rotational posture of _0 and the second light blocking member 92 is in the rotational posture of +Θ1, as shown in FIG. 13, the pupil intensity associated with the peripheral point P2 In the distribution 22, the light from the surface light sources 22a and 22b is not affected by the light reduction effect of the light shielding unit 23, so the light intensity thereof is not changed. The f from the surface light source is affected by the dimming of the shading unit 9, and its light intensity is relatively greatly reduced. The light from the surface light source 22d is affected by the light-reducing effect of the light-shielding unit 9, but the intensity is only light and low. The filament has a pupil intensity distribution 22 associated with the peripheral point P2 adjusted by the light shielding 9, wherein the light intensity of the surface light source 22c' spaced apart in the Z direction is substantially the same as the light intensity of the surface light source 22d' scale. Alternatively, the difference in light intensity between the surface light source 1 and the surface light source 22d' is adjusted to a desired light intensity difference. Further, as shown in Fig. 14, in the pupil intensity distribution 23 associated with the peripheral point P3, the light from the surface light sources 23a and 23b is not affected by the light-reducing action of the light-shielding unit 9, and therefore the light intensity is not changed. The light from the surface light source 23c is affected by the dimming action of the light shielding unit 9, but its light intensity is only slightly lowered. The light from the surface light source 23d is affected by the dimming action of the light shielding unit 9, and the light intensity thereof is relatively largely lowered. As a result, in the pupil intensity distribution 23 related to the peripheral point p3 adjusted by the light shielding unit 9, the light intensity of the surface light source 23cl which is spaced apart in the Z direction and the light intensity of the surface light source 23d are substantially equal. Alternatively, the difference between the light intensity of the surface light source 23c and the light intensity of the surface light source 23d1 is adjusted to a desired light intensity difference. Further, the difference between the light intensity of the surface light source 22c1 and the light intensity of the surface light source 22d, and the difference between the light intensity of the surface light source 23c' and the light intensity of the surface light source 23d' are adjusted to a desired light intensity difference. It is based on the measurement result of the pupil intensity distribution measuring device (not shown). The pupil intensity distribution measuring device pair is based on, for example, light passing through the projection optical system PL at the projection light 24 201015239 ill! /plf.doc The pupil intensity distribution on the pupil plane of the system PL is measured. The pupil intensity distribution measuring device includes a charge_"Uhafge__pled device, CCD" imaging unit, and the intensity distribution of the point on the image plane of the projection optical system pL (human incidence to each spot line in the projection optical system PL) The CCD imaging unit has an imaging surface that is disposed at an optically coplanar position with respect to the pupil position of the projection optical system. The CCD imaging unit has an imaging surface that is optically coplanar with the pupil position of the projection optical system. For the detailed configuration and function of the measuring device, refer to US Pat. No. 2008/0030707, etc. Δ Hanging specifically, the measurement result of the diaphragm intensity distribution measuring device is supplied to a control unit (not shown). The pupil intensity distribution measuring device ^ measures the output, and outputs a finger to the rotation control system 96 of the shading unit 9 so as to distribute the pupil intensity of the pupil plane of the projection optically pure PL. The rotation control system 96 is based on The position of the finger-shielding member 9 of the control unit 92, the difference in light intensity of the surface light source 22c, the light intensity of 22d', and the light intensity of the surface light source 23ci and the light intensity of the surface light The difference is adjusted to the required difference in light intensity. In the present embodiment, each of the light blocking members Μ and % constituting the light shielding unit 9 has a point in the static exposure ER on the wafer w which is the final illuminated surface. In addition, each of the light shielding members % and % is configured to continuously change the posture between the rotation posture (the second posture) and the rotation posture of the + ,, and the up posture i is the first posture. Is the light-reducing ratio of the light-shielding member toward the point P2 at the periphery of the Y-direction in the still-exposure region ER, and the light member is opposite to the other. The dimming rate of the light in the rotating posture 3 is large, and the dimming rate of the light of the above-mentioned J is smaller than that of the light-shielding member toward the peripheral point. Specifically, when the light-shielding member 9 rate is from the periphery two = posture, the light-shielding member 9; the rotation monotonously decreases. Moreover, the posture of the light-shielding single & side = 2 = peripheral (four) 92 is the rotation-to-shaping member 9i And being controlled independently. Therefore, the Zhao and n potentials are under the unit of each other. According to the seeding, the Y direction in the shading is now, and the dimming rate is the variable area according to the static exposure area of the multi/^, and the first point of 1 w Dan (for example, the peripheral point Ρ2) I; relative to the reaching of the knives on the illuminated surface, and changing the intensity distribution of the second pupil reaching the (fourth) face @first 曈 intensity m off. Now the illumination optical system of the form of 录, Γ ( (2~ (1) Including the actual exposure 1st (four) light-shielding unit 9', that is, the static change along the wafer w, the reduction rate occurs in accordance with various aspects of the illumination optical system of the present embodiment (2 to (1), by masking the early 7 〇9 ❹ : ::: r 瞳 瞳 intensity distribution, ^ (d) between a pair of regions (in the example of Figure 4 and Figure 2010 201015239 / pif.doc between a pair of surface light sources 22c and 22d, and a pair of surface light sources The difference in light intensity between 23c and 23d is adjusted. Further, the exposure apparatus (2 to ws) of the present M shape can perform good exposure under appropriate illumination conditions corresponding to the fine pattern of the mask M, using the illumination optical system (2 to 12), and further light can be used. The fineness of the cover 案 is spread over the entire exposure area and faithfully transferred to the desired position on the wafer jv, wherein the illumination optical secret (2 to 12) is on the wafer W. The light intensity difference between the respective points in the still exposure area ER is adjusted by the light intensity distribution sheet and the optical axis 失 in the direction of the ¥ direction. In the present embodiment, it is considered that the light amount distribution on the wafer (irradiated surface) W is affected by, for example, the dimming action (adjustment action) of the light shielding unit 9. In this case, the illuminance distribution in the still exposure region ER or the shape of the still exposure region (illumination region) ER can be changed by the action of the light amount distribution adjustment unit having a well-known configuration. Specifically, as the light amount distribution adjusting unit that changes the illuminance distribution, the Japanese Patent Laid-Open No. 2001-313250 and the Japanese Patent Laid-Open No. 2002-100561 (and the corresponding US Patent No. 677135 以及) The composition and method disclosed in No. 6927836). In addition, as the cloth adjustment unit, the light amount of the shape of the illumination area is changed, and the configuration disclosed in the specification of the International Patent Publication No. WO-2005/_326 (and the corresponding US Patent Publication No. 2007/0014112) can be used. method. Here, the teachings of U.S. Patent Nos. 677,135 and 6,927,836, and U.S. Patent Publication No. 2007/0014112 are incorporated by reference. Further, in the above embodiment, the pair of light-shielding structures L^92 of the light-shielding unit 9 are configured to change the posture in the rotation posture of +6> and the (four) rotation posture. However, the present invention is not limited thereto, and the pair of masks may be configured to be, for example, a honey in a + (four) rotation posture and a parallel posture; a second rotation between a rotation posture and a rotation posture and a parallel posture; The posture is continuously changed between postures.鳇 鳇 :: ί. It is also possible to switch between a pair of light-shielding structures to be switchable between the rotational positions, or to switch between +. The relationship between the plurality of postures of the rotation posture of $ and ^ is performed, and the shading unit is formed by the early part. The state of the posture is u: the member is configured to rotate in +θ and the rotation of β: ground = potential two The second rotation between the line postures = the continuous rotation posture: the light between the postures of the more than 10 postures and the (4) rotation posture is the configuration of the point toward the one surface to be illuminated. In the first posture (in the upper c 2 posture c in the range of %, the female or the 旋转 rotation posture) and the first rotation posture) 例如ίϊ, for example, the rotation posture of the θ or the inter-cutting switch The above-mentioned first posture is a point on the periphery of the dimming carrying member 28"i'.doc 201015239 〇=direction of irradiation _ along a predetermined direction (in the above-described embodiment). The dimming rate of the light of p2 or 3) in the form is smaller than the dimming rate of the light of the dimming member toward the other periphery (P3 or p2 in the above embodiment) The posture is a dimming rate of light with respect to the above-mentioned i point on the periphery of the dimming member pair, and the dimming member pair faces the other-periphery Extinction of light is small on the one point. In this case, the dimming member has ... The direction in which the optical axis 照明 of the illumination optical system is transversely cut is the rectangular cross-section of the light-shielding member Μ 1 = i 疋 is larger than the second rule and the second edge The direction (the horizontal long dimension of the moment of the light shielding member in the above embodiment) can be around the 丨h and this is reduced first; the axis can be orthogonal to the first direction (in the above implementation & The middle rotates around the axis in the X direction. In the above embodiment, the light-reducing member can be regarded as a light-shielding member. The light-transmitting member is a light-shielding member having a transmittance of 0, but a transmittance of greater than 〇 and less than 10 G% of a light-shielding member having a prescribed transparency. The light-shielding ribbed towel is configured to make the posture of the pair of mask members 9 of the shading unit 9 to be mobilized. However, it is also possible to limit the rotation of the members 91 and 92 to the θ) respectively, or to rotate the posture of the second and second parallel rotations and the parallel posture. The second rotation between the rotation posture of -Θ (or +θ) and the flat posture of the flat 29 201015239 322/vpii.doc is the shading unit 9, and the rotation of the 1 and the single-body shading member is first The member is fixedly set to the immediate rotation of +Θ, an important/suitable rotational posture in the present invention. The light-reducing member that dims the light, the light that is directed toward one point on the surface to be irradiated is the light in the direction of the γ direction in the form of the illuminating surface in the gamma direction (in the above-described manner, P2 or P3) : f, 1, point (one point on the side in the above embodiment (in the above embodiment, the light is slightly smaller toward the other circumference. In this case, the light reduction is: J t: 2) The optical axis of the optical system of the illuminating system is "the size of the 帛1", which is the light-shielding structure in the embodiment: the direction of the five knives, that is, the first direction (in the upward direction), and the second fiscal, The second dimension of the surface in the direction of the short side is perpendicular to the first dimension and the longitudinal direction of the cross section of the first shape is the same as the shape of the rectangle of the light shielding member. The pupil intensity distribution 2 〇 picking: i is disposed by the light-shielding unit 9 which is configured by the pair of light-shielding members 91 and 92, but is not limited thereto. Further, in the above-described two aspects, the length of the light shielding member 9 constituting the light shielding unit 9 is arranged in the direction of the short direction of the rectangular unit wavefront discrimination surface of the micro fly's eye lens 8. However, the present invention is not limited thereto, and the length direction of the mask may be slightly inclined in the short-side direction of the unit wavefront. Further, in the above embodiment, by the outer shape 30

201015239 jzz / /pif.doc "Shade 形状 形状 形状 形状 形状 形状 形状 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 构成 遮光 构成 遮光 遮光 遮光 遮光 遮光 遮光 遮光 遮光 遮光 遮光The shape, the number, and the configuration of the constituents of the silk unit are recorded. (4) The first component, in the above description, the deformation illumination of the intensity distribution in the illumination pupil For example, quadrupole illumination is used; however, it is explained. However, it is not limited to four poles ==: ring illumination with a ring-shaped aperture intensity distribution, and other multi-pole light (four degrees) The multipole of the distribution _ etc. The same effect is obtained by applying the present invention. α / χβ In the description, the rear focal plane of the micro fly-eye lens 8 is directly behind the illumination pupil near the rear focal plane. The light shielding member of the light shielding unit 9 is disposed. However, the light shielding member may be disposed directly in front of the illumination pupil of the rear focus surface of the micro fly-eye lens 8 or the vicinity of the rear focus surface. Also available in the micro-flip eye lens 8 A light blocking member is disposed directly in front of or behind the illumination pupil between the front lens group 12a and the rear lens group 12b of the imaging optical system 12, directly in front of or behind the other illumination pupils on the rear side. When the light shielding member is disposed at the position of the illumination pupil, since the light shielding member has a width dimension along the direction of the light vehicle, the light shielding member can be disposed immediately before and immediately behind the illumination pupil. The exposure apparatus of the above embodiment 'This is a group of sub-systems and subsystems including the various components listed in the patent application scope of this application, to ensure the specified mechanical precision, electrical precision, and optical 31 201015239 322/ypiI.doc accuracy. In order to ensure these various precisions, various optical systems are used to adjust optical precision before and after the assembly, and various mechanical systems are used to achieve mechanical precision adjustment for various electrical systems. In order to achieve electrical precision adjustment, the assembly steps of assembling the exposure device with various subsystems include 'various The mechanical connection of the systems to each other, the wiring connection of the circuit, the piping connection of the pneumatic circuit, etc. Before the assembly steps of assembling the exposure devices by such various subsystems, of course, the respective assembly steps of the respective subsystems are used. After the assembly step of assembling the exposure apparatus is completed, comprehensive adjustment is performed to ensure various precisions as the entire exposure apparatus. Further, it is preferable to clean the room (cleanr〇〇m) which is managed in temperature and cleanliness. In the manufacturing apparatus of the above-described embodiment, a method of manufacturing an element using the exposure apparatus of the above-described embodiment will be described. Fig. 15 is a flowchart showing a manufacturing procedure of the semiconductor element. A metal film is deposited on the wafer W which is a substrate for semiconductor reading (step _), and a photoresist (photoresist) as a photosensitive material is applied onto the vapor-deposited metal film (step S42). Next, using the pattern formed on the above-described embodiment, the pattern formed on the M is transferred to each exposure irradiation region on the P-day Y (step S44 • exposure step), and the wafer is transferred after the transfer is completed. Development of w, that is, development of a photoresist to which a pattern is transferred (step S46: development step). Thereafter, a photoresist pattern (like pattern) generated on the surface of the wafer W by the step S46 is used as a mask, and the surface of the wafer % is subjected to processing such as a surname (step 32 201015239 nz / /pif .doc Step S48 ··Processing steps). Here, the exposure of the so-called photoresist pattern is performed on the surface of the wafer w by the photoresist which is transferred to the unevenness of the shape corresponding to the photoresist by the above-described embodiment layer. In the step S48, the process of the two walks including the wafer w of the wafer w is at least squared. Further, in the step S44, the film formation Φ is a transfer of the pattern of the light device pattern by the wafer arm coated with the photoresist. The substrate, i.e., the board P, is shown in Fig. 16 which is a flowchart showing a liquid crystal cell such as a liquid crystal display element. As shown in FIG. 16, the manufacturing steps of the liquid crystal element: manufacturing = lamp pattern forming step (step S5G), color filter (coffee step forming step (step $52), cell (five) 丨) assembly step (step slave and module assembly) Step (Step S56). In the pattern forming step of step S5G, a predetermined pattern such as a circuit pattern and an electrode pattern is formed on the glass substrate coated with the photoresist as the plate p by using the exposure apparatus of the above embodiment. . The forming step includes: an exposure step of transferring the pattern to the photoresist layer using the exposure 1 of the above embodiment; and a developing step of performing development of the pattern ρ on which the pattern is transferred, that is, performing on the glass substrate Development of the photoresist layer to form a photoresist layer having a shape corresponding to the pattern; and a processing step of processing the surface of the glass substrate via the developed photoresist layer. In the color filter forming step of the cardiac step S 5 2, the following color filter and light sheet are formed, and the color filter is arranged in a matrix in a plurality of lines and feet: 33 201015239 jzz / /pn.doc red ), a group of three dots corresponding to G (Green), B (Blue, blue), or three stripes of r, G, and B arranged in the horizontal scanning direction. Group of filters. In the cell assembly step of step S54, the liquid crystal panel (liquid crystal cell) is assembled using the glass substrate in which the predetermined pattern is formed by the step S5, and the color filter formed in the step S52. Specifically, for example, a liquid crystal panel is formed by injecting a liquid crystal between a glass substrate and a color filter. In the module assembly step of the step S56, various components such as a circuit for causing the liquid crystal panel to perform a display operation and a backlight are mounted on the liquid crystal panel assembled in the step S54. Further, the present invention is not limited to application to an exposure apparatus for manufacturing a semiconductor element, and can be widely applied to, for example, a liquid crystal display element formed on a square glass plate or a display device such as a plasma display. An exposure apparatus and an exposure apparatus for manufacturing various elements such as an imaging element (CCD or the like), a jnicro machine, a thin flm magnetic head, and a deoxyribonucleic acid (DNA) wafer. Further, the present invention is also applicable to an exposure step (exposure apparatus) when a photomask (a photomask, a singe mask, etc.) in which a mask pattern of various elements is formed is produced by a photolithography step. Further, in the above embodiment, ArF excimer laser light (wavelength: 193 nm) or KrF excimer laser light (wavelength: 248 nm) is used as the exposure light beam, but the invention is not limited thereto, and other mines may be used. The present invention is applied to a light source, such as an F2 laser source that supplies laser light having a wavelength of 157 nm. 34 201015239

/ /pix.d〇C The exposure of the shovel of the bamboo stalks ' s step scale m = ϊ: The medium exposure device is _ set here, * (10) the pattern of the first hood is exposed. However, there is no limit to ^ Tepandrepeat) 晶 ( (4) The first device is the action of repeating the trap of the mask :: person, * (〇ne-Sh〇te-implicit) 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰Or =; apply the invention, but not limited to illumination = although..., the invention has disclosed the above === technology, and has the usual knowledge == invention material n!! In addition, this configuration is a view schematically showing an exposure apparatus of a real surface of the present invention. Fig. 2 is a view showing a tonnage-shaped secondary light source formed by a surface of a bright light wipe. Fig. 3 shows a crystal Fig. 4 of the rectangular still exposure region formed on the circle is a view for explaining the properties of the quadrupole pupil intensity distribution formed by the peripheral light incident on the stationary exposure region. 35, 201015239 /pu.doc FIG. 5 A diagram showing the behavior of a peak-shaped pupil intensity distribution formed by p-light incident at a peripheral point in a still exposure region. Fig. 6 is a view schematically showing a configuration of a masking unit. Fig. 7 is a view showing a basic operation of each of the light blocking members. Fig. 8 is a second view for explaining a basic function of each of the light blocking members. Half 彳 +: Under-twist: Shading when the piece is set to Μ in the rotation position: Yuan = Lu's minus 9 yao-shah pair - the opposite-side light source turning position will show the first opaque member set to - θ. It is assumed that the light-shielding effect in the case of the +0-spinning posture is 70 pairs of the light-reducing action of the pair of faces. The rotation of the m-member is set to the rotation of the unit pin tf surface I. The light-shielding member 3 is further rotated by 4 FIG. 13 is a view schematically showing a state in which the pupil intensity distribution of the peripheral point 1 is adjusted by the light shielding means as shown in FIG. The value of the semiconductor element is adjusted by the light shielding unit, and the light s intensity is adjusted by the light shielding unit. Fig. 15 is a flowchart showing the manufacturing procedure of the semiconductor element. 6. It is a manufacturing step of a g element such as a display element or the like [Description of main component symbols] 36 201 015239, _____ 丄 doc I : Light source 2: shaping optical system 3: diffractive optical element 4: afocal lens 5: prescribed surface 7: variable focal length lens 8: micro fly-eye lens (optical integrator) 9: shading unit G 10 : concentrating optical system II: reticle 12: imaging optical system 12a: front lens group 12b: rear lens group 20, 22, 22', 23, 23': pupil intensity distribution (secondary light source 20a to 20d, 21a to 21d, 22a to 22d, 22c', 22d', 23a, 23d, 23c', 23d': surface light source @992: light shielding member 93: rotating shaft 94: driving portion 95: supporting portion 96 : Rotation control system 97: shading member AS: aperture stop AX: optical axis 37 201015239 / / pij_.doc B1 : point B2 of the outermost edge along the X direction of the surface light source 20a (21a to 23a): surface light source 20b Point B3 of the outermost edge along the X direction of (21b to 23b): point B4 of the outermost edge along the Z direction of the surface light source 20c (21c to 23c): along the surface light source 20d (21d to 23d) The outermost point of the Z direction

ER : Still exposure area Μ : Photomask MS : Mask platform P1 , ΡΓ : Center point P2 , P3 , P2 ' , P3 ' : Peripheral point PL : Projection optical system W : Wafer WS : Wafer platform

Θ: incident angle X, Y, Z: axis S40~S48, S50~S56: Step 38

Claims (1)

L.doc 201015239 VII. Patent application scope: ^Ming's February optical system, which uses the light from the light source to make the light into the illuminated surface, which is characterized by:: cloth 1 into the first learning system, including optical integral ^, and the integrator forms a pupil intensity distribution in the illumination pupil on the rear side; the position of the learning element is arranged directly in front of or behind the (4) pupil, and "light at 1 o'clock on the illuminated surface" The light is dimmed, and the light is arranged in the following position, that is, the light at the 1st point on the periphery of the dimming surface of the light-reducing member light. (4) The illuminating optical system described in the first aspect of the invention is applied to the illuminating optical system according to the first aspect of the invention, wherein the light-reducing rate of the member has a plate shape and is disposed with the potential of the light-reducing member. The periphery is monotonously enlarged toward the other periphery. The optical system described in the second aspect of the patent, wherein the shape is read by the above-mentioned rule, (4) having an elongated moment, the member is along the above The optical axis of the illumination optics and the surface A parallel plane having a rectangular cross-sectional surface is extended toward the big fortune. The i feature is formed by the light from the light source to form an optical system 'including an optical integrator' with respect to the illuminated surface and 201015239 The integrator forms a pupil intensity distribution in the illumination pupil on the rear side; and the dimming member is disposed in the first dimension of the horizontal direction in the horizontal direction of the optical axis disposed directly in front of or behind the illumination pupil. And a dimension larger than the first dimension in the second direction orthogonal to the first direction, that is, a second dimension intersecting the optical axis of the illumination optical system. The illumination optical system, the large one-piece-periphery=: the entanglement includes the light from the light source and the illuminating surface of the eight-dimensional optical system, including the silk integrator, and is formed in the light and the light And the position of the light-reducing member is configured to be in the i-th position: the switching of the above-mentioned first posture is the same as the above-mentioned dimming: square The second light-receiving member has a pair of light-reducing members facing the other periphery, and the second posture is the first one of the light-receiving members on the light-emitting point In contrast, the above ext = two = t pif.doc 201015239 on the upper U? The dimming rate of light at 1 point is small. • The above-mentioned light-reducing member is constructed in the above-mentioned fourth embodiment in which the posture is continuously changed, as in the sixth item of the application. t, the upper m posture, the Γ / the ship (4) 6 items, the illumination optical system, the light-reducing member has a plate shape, and in the first posture of θit, the dimming rate of the light-reducing member is from the above Peripheral and monotonously large in the periphery of the above; = the dimming rate of the member from the above-peripheral toward the above-mentioned other - 9 wide application of the scope of the illumination optical system described in the eighth aspect of the invention, having a slender moment The optical member extends substantially parallel to the short-side direction of the unit wavefront-affecting surface along the optical axis of the illumination light (four) and the parallel-shaped flat-shaped cross section extending in the Ο. 10. The system according to claim 9, wherein the earthening member is configured to be rotatable about an axis extending in a direction of a short side of the unit wavefront distinguishing surface. 11--A kind of illumination light (4) is illuminating the illuminated surface with light from a light source, and is characterized in that: the f-cloth forming optical system includes an optical integrator, and is more rearward than the optical product The pupil intensity distribution is formed in the illumination pupil; and the position of the front illumination or the rear direction of the bright pupil is 41. The position of the first illumination optical system in the first direction is transversely intersected with the upper jaw. The direction is positive and the axis is larger than the first dimension and the dimming member is rotatable about the axis of the size 2 and the second dimension. And the direction and the second direction orthogonal to the illumination optical system according to Item 11 of the patent application, wherein the direction of the entrance surface between the first posture and the second posture is 1 along the direction of the regulation The circumferential H-light member pair faces the above-mentioned ratio, and the dimming rate of the light-reducing member to the point of the side of the J-direction is shown in the first paragraph to the 12th item. The county of the present invention is characterized in that the illumination optical system may include a plurality of positioning modes of the light-reducing member according to any one of the above items, wherein the pair of illumination elements are Light that sandwiches the optical axis of the illumination optical system and is spaced apart in the predetermined direction functions. 15. The 42 201015239 ozz / /pif.doc illumination optical line according to any one of claims 1 to 14, further comprising a light quantity distribution adjustment unit, wherein the light quantity is more than the above-mentioned illuminated surface The illuminance distribution or the shape of the illumination region formed above. n Among them, as in the illumination optical system described in claim 15 of the patent application, the influence of the (4) storage member on the surface of the face on the above-mentioned illuminated surface. ❹ ϋ ϋ ϋ f f f 明 明 明 明 明 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学Forming a pupil intensity distribution in the illumination pupil; and the variable portion 'changes and reaches the illumination intensity distribution i with respect to the =: i-th pupil intensity distribution reaching the second point on the illuminated surface The illuminating optical system according to claim 17, wherein the bright variable portion includes a light-reducing member, and the ray-receiving member is disposed in the above two or positive At the rear position, the light that is directed to one point on the illuminated surface is dimmed; and the 隹~up ί light-reducing member is configured to be in a position between the first posture and the second posture. The light-reducing rate of the light of the light-receiving member pair toward the i-point on the other periphery of the light-reducing member of the light-receiving member toward the other side of the predetermined direction of the above-mentioned direction; 2010 201020239 32277 pii; Doc ί二=The second posture is the same as the above light reduction Toward the periphery of said one: light attenuation rate compared with disabilities, the light reducing member smaller reduction rate of the light on the periphery of one point of light toward the attack on the other. The illumination optical bright light according to Item 17 or Item 18 of the patent application scope, wherein the light-reducing member is disposed at a position of the front side or the rear side of the above-mentioned nine-warm light, and has an optical system of eight parts The direction in which the optical axis is transversely cut, that is, the first inch in the θ direction, and the dimension larger than the first dimension and along the ith direction, ie, the second dimension, and the dimming member can surround The first direction and the second direction are orthogonal to each other and rotate. The projection optical system group in which the 阑=== and the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ 22--exposure device, characterized in that: the scope of the application for illumination is as follows: the center: the base plate, the optical system, and (4) I* + as stated in claim 22 of the patent scope The exposure device includes a method of forming an image of the predetermined trapped pattern on the sensing substrate: == 44 201015239 όζζ / /pif.doc system 'and making the above-mentioned regulations with respect to the projection (four) And the photosensitive substrate > 'α is relatively moved in the scanning direction to project and expose the predetermined pattern onto the sensory substrate. 24. The exposure apparatus of claim 23, wherein the scanning direction corresponds to a direction orthogonal to the predetermined direction. 25. A method of manufacturing a component, characterized in that: ???exposure step of exposing said prescribed job to a photosensitive substrate using an exposure apparatus as described in any one of claims 22 to 24; a developing step of forming a photomask layer corresponding to the predetermined image on the photosensitive substrate on which the predetermined pattern is transferred is formed on a surface of the photosensitive substrate; and/processing step 'via the photomask layer pair The surface of the above-mentioned sense substrate is processed. ❹ 45