TW200307179A - Lighting device, exposing device and exposing method - Google Patents

Abstract

A lighting device that improves the fill of light sources of a secondary light source formed on a pupil surface is provided. A fly-eye lens that forms light sources from the beam of an optical integrator is arranged on the light path between the optical integrator and an illumined surface. The fly-eye lens is provided with a first and second fly-eye elements in sequence from the light source side. A cylindrical lens group is formed at a surface at the light source side of the first and second fly-eye elements along a first direction. Another cylindrical lens group is formed at a surface at the illumined surface side of the first and second fly-eye elements along a second direction perpendicular to the first direction.

Description

200307179 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to an illumination optical device, an exposure device, and an exposure method, and more particularly, to an illumination optical device suitable for semiconductor devices, image pickup devices, and liquid crystal displays. Components, thin-film magnetic heads and other micro-equipment exposure devices manufactured by lithography technology. [Prior art] In this typical exposure apparatus, a light beam emitted from a light source enters a fly-eye lens, and a secondary light source composed of a plurality of light sources is formed on a rear focal surface thereof. The light beam from the secondary light source passes through the restriction of the aperture stop near the focal plane on the rear side of the fly-eye lens, and then enters the condenser lens (c ο n d e n s e r 1 e n s). The aperture stop corresponds to a desired lighting condition (exposure condition), and limits the shape or size of the secondary light source to a desired shape or size. A light beam condensed by a condenser lens is superimposed to form a mask with a predetermined pattern. The light transmitted through the mask pattern is imaged on a wafer by a projection optical system. As a result, the reticle pattern is projected (exposed) on the wafer. In addition, the pattern formed on the photomask is highly integrated. In order for the fine pattern to be correctly transferred on the wafer, it is necessary to obtain a uniform illumination distribution on the wafer. In order to improve the imaging performance of the exposure apparatus having the above-mentioned configuration, it is necessary to improve the filling degree of the plurality of light sources constituting the secondary light source formed on the illumination pupil surface. SUMMARY OF THE INVENTION The present invention is to provide an illumination optical device.

11188pif.ptd Page 5 Han 200307179 V. Description of the invention (2) The filling degree of a plurality of light sources formed to improve the secondary light source formed on the pupil surface is improved. Furthermore, an object of the present invention is to provide an exposure device and an exposure method, which can use a lighting optical device with an increased filling degree of a plurality of light sources constituting a secondary light source formed on the illumination pupil surface, and can perform good projection under good imaging performance exposure. In order to solve the problem, the present invention provides an illumination optical device, which is an illumination optical device that illuminates an illuminated surface based on a light beam from a light source; includes an optical integrator arranged in an optical path between the light source and the illuminated surface; In the optical path between the light integrator and the illuminated surface, a fly-eye lens that forms a plurality of light sources based on the light beam from the light integrator is characterized in that the fly-eye lens is provided with a first fly-eye member and a first 2 fly-eye members, a cylindrical lens group aligned in a first direction is formed on a light source side surface of the first fly-eye member and a light source-side surface of the second fly-eye member, and the first fly-eye member is irradiated A cylindrical lens group arranged in a second direction orthogonal to the first direction is formed on the surface-side surface and the surface on the irradiated surface side of the second compound eye member. According to a preferred aspect of the first invention, when the radius of curvature of each cylindrical lens formed on the light source side surface of the first compound eye member is R a, it is formed on the light source side surface of the second compound eye member. The radius of curvature of each cylindrical lens is R b, the radius of curvature of each cylindrical lens formed on the surface side of the irradiated surface of the first compound eye member is R c, and the radius of curvature of each cylindrical lens on the side of the irradiated surface of the second compound eye member is When the radius of curvature of each cylindrical lens formed on the surface is R d 'satisfies 0 · 3 < Rd / Rc < 0.5

11188pif.ptd Page 6 200307179 V. Description of the invention (3) Conditions of 〇-3 < Rb / Ra < 〇-5. In a preferred aspect of the first invention, the first compound eye member has quartz, and the second compound eye member has a crystalline material that is transparent to light having a wavelength of less than 250 nm. Alternatively, the first compound eye member and the second compound eye member have a compound eye member in an area irradiated with light at an energy density of 1 m J / cm 2 or more, and have a property of transmitting light having a wavelength of less than 250 nm. A crystalline material is preferred. The crystalline materials include fluorite, crystal, hafnium fluoride, barium fluoride, fluoride, fluoride, strontium fluoride, beryllium fluoride, sodium fluoride, lithium calcium aluminite, and lithium aluminite. It is preferable to select at least one of the constituent groups. In addition, according to a preferred aspect of the first invention, a positioning mark is formed on the first compound eye member and the second compound eye member to match the positions of the first compound eye member and the second compound eye member. At this time, the positioning mark includes a linear mark formed on the light source side surface of the first compound eye member and the light source side surface of the second compound eye member along the second direction, and on the first compound eye member, It is preferable that the surface on the side of the irradiated surface and the surface on the side of the irradiated surface of the second compound eye member are formed in a linear shape along the first direction. According to a preferred aspect of the first invention, at least one of the entrance pupil plane in or near the first direction of the fly-eye lens and the entrance pupil plane in or near the second direction of the fly-eye lens A correction filter is provided for correcting the illumination distribution of the illuminated surface. At this time, the correction filter and the first compound eye member or the first filter are formed on the correction filter.

11188pif.ptd Page 7 200307179 V. Description of the invention (4) 2 The position of the compound eye member coincides with the position of the 4th in the 9th A 4Φ > when the 4th position, the 2nd positioning mark is provided along the * side. Moreover, such a linear mark is preferable. In the σ μ direction or the second direction, by the better opening energy of the first invention, the surface on the source side and the u light of the second compound eye member ^ the surface on the illuminated side of the light of the first compound eye member and the G ^ f in the first compound eye member

At least one side of the < 2 irradiated surface side of the cylindrical lens group formed on V is 2 mm or less. The distance between the two directions is from to, at least one of the preferred two compound eye members according to the first invention ', ~, the first compound eye member and the first and second illuminated surface, and the movable structure. At this time, it is the control of the illuminance distribution: the control of the 3 ° F or the at least one side of the illuminated surface; the control of the illuminance distribution of the 2 compound eye structure, the control of the size of the first field Or at least one of the irradiated parts, along with the at least one of the two parts and the second compound eye structure, can be moved to form a control uti cover of the illuminance distribution in the second direction: outside, in order to illuminate At least one side is rotatable around the direction of at least one of the = upper member and the second compound eye member; in the second direction, up to ... for-a kind of exposure Y set bowl pull = a photo seed with the i-th invention Exposure device 'The pattern projection exposure of the reticle with its characteristic projection surface configuration = 1 11188 pif.ptd Page 8 200307179 V. Description of the invention (5) Learning system. At this time, by moving the photomask and the photosensitive substrate relative to the projection optical system in a direction optically corresponding to the first direction, the pattern of the photomask is projected and exposed on the photosensitive substrate to Better. Moreover, at this time, it is characterized in that the distance along the first direction of the cylindrical lens group formed on the light source side of the first compound eye member is smaller than the distance along the cylindrical lens group formed on the illuminated surface of the first compound eye member. The pitch in the second direction. In addition, at this time, the distance between the cylindrical lens group formed on the irradiated surface of the first compound eye member along the second direction is a, and the cylindrical lens group formed on the light source side of the first compound eye member is set along When the pitch in the first direction is b, it is preferable that 1 · 2 < a / b < 1 · 3 is satisfied. It is more preferable to satisfy 2 · 6 < a / b < 4.0. The present invention also provides an exposure method characterized in that the photomask is illuminated by the illumination optical device of the first invention, and an image of a pattern formed on the illuminated photomask is projected and exposed on a photosensitive substrate. The present invention is characterized in that an illumination optical device for illuminating an irradiated surface based on a light beam from a light source is provided with an optical path disposed between the light source and the irradiated surface and forming a plurality of light beams from the light source. A fly-eye lens of a light source; the fly-eye lens has a first fly-eye member and a second fly-eye member in this order from the light source side; Cylindrical lens groups arranged in one direction; on the surface on the irradiated surface side of the first compound eye member and the surface on the irradiated surface side of the second compound eye member, arrayed in a second direction orthogonal to the one direction Cylindrical lens group; when set at

11188pif.ptd Page 9 200307179 V. Description of the invention (6) The radius of curvature of each cylindrical lens formed on the light source side surface of the first compound eye member is Ra and formed on the light source side surface of the second compound eye member. The radius of curvature of each cylindrical lens is R b, and the radius of curvature of each cylindrical lens formed on the surface side of the irradiated surface of the first compound eye member is R c, and the surface of the cylindrical lens is on the side of the irradiated surface of the second compound eye member. When the radius of curvature of each of the formed cylindrical lenses is Rd, the condition of 0-3 < Rd / Rc < 〇-5 0-3 < Rb / Ra < 〇-5 is satisfied. A fifth invention of the present invention is characterized in that an illumination optical device for illuminating an illuminated surface based on a light beam from a light source is provided with an optical path disposed between the light source and the illuminated surface based on the light from the light source. The light beam forms a fly-eye lens of a plurality of light sources; the fly-eye lens has a first fly-eye member and a second fly-eye member in order from the light source side; a surface on the light source side of the first fly-eye member and a light source-side surface of the second fly-eye member A cylindrical lens group aligned along the first direction is formed; a surface perpendicular to the 1 direction is formed on a surface on the illuminated surface side of the first compound eye member and a surface on the illuminated surface side of the second compound eye member A cylindrical lens group arranged in the second direction; in the first compound eye member and the second compound eye member, there is a compound eye member in a region irradiated with light at an energy density of 1 m J / cm 2 or more, and has a pair of 2 5 0 A crystalline material that is transmissive to light at wavelengths below nm. The present invention is characterized in that an illumination optical device for illuminating an illuminated surface based on a light beam from a light source is provided with the light source and the light source.

11188pif.ptd Page 10, 200307179 V. Description of the invention (7) The optical path between the illuminated surfaces is composed of a plurality of optical elements arranged along at least one of the first direction and the second direction orthogonal to the first direction. An optical element array and a fly-eye lens arranged in the optical path between the optical element array and the illuminated surface and forming a plurality of light sources based on the light beam from the optical element; the fly-eye lens has a first fly-eye member in order from the light source side And a second compound eye member; a cylindrical lens group aligned in the first direction is formed on a light source side surface of the first compound eye member and a light source side surface of the second compound eye member; A cylindrical lens group aligned in the second direction is formed on the surface on the irradiation surface side and the surface on the irradiation surface side of the second compound eye member. With a preferred aspect of the sixth invention, it is preferable that the optical element array forms a plurality of light sources based on the light beam from the light source. Moreover, in the above-mentioned sixth invention, the optical element array sets the light intensity distribution of the light intensity held in the central region including the optical axis to be smaller than the light intensity distribution of the region around the central region based on the light beam from the light source. The light beam is preferably supplied to the fly-eye lens. In the sixth invention described above, it is preferable to arrange a relay optical system in an optical path between the optical element array and the fly-eye lens. In order to make the above and other objects, features, and advantages of the present invention more comprehensible, a preferred embodiment is described below in detail with the accompanying drawings as follows: [Embodiment] The following description is based on the drawings Embodiments of the invention. FIG. 1 is an illustration of an exposure device provided with an illumination optical device according to an embodiment of the present invention.

11188pif.ptd Page 11 200307179 V. Description of the invention (8) Schematic diagram of the optical device. In FIG. 1, a Z axis is provided along the normal direction of the wafer W, which is a photosensitive substrate, and a Z axis is provided in the wafer plane in a direction parallel to the paper plane in FIG. 1, and is perpendicular to the paper plane in FIG. 1 in the wafer plane. Set the X axis in the direction. In addition, in Fig. 1, the illumination optical device is set to be capable of performing ring-shaped illumination. The exposure apparatus of FIG. 1 includes a light source 1 for supplying exposure light (illumination light), for example, a K r F excimer laser light source for supplying light with a wavelength of 2 4 8 nm or A r for supplying light with a wavelength of 19 3 nm. F excimer laser light source. A substantially parallel light beam emitted from the light source 1 in the Z direction has a rectangular cross section elongated in the X direction, and enters a beam expander 2 composed of a pair of lenses 2 a and 2 b. Each of the lenses 2 a and 2 b has a negative refractive power and a positive refractive power in the paper surface (in the Y Z plane) of FIG. 1, respectively. Therefore, the light beam of the incident beam expander 2 is enlarged in the paper surface of FIG. 1 and is shaped into a light beam having a predetermined rectangular cross-section. The substantially parallel light beam that has passed through the beam expander 2 as the shaping optical system is deflected in the Y direction by the curved mirror 3 and then enters the afocal lens 5 through the diffractive (diffractive) optical element 4. Generally, a diffractive optical element is formed on a glass substrate by forming a step having a distance of about a wavelength of exposure light (illumination light), and has a function of diffracting an incident light beam to a desired angle. Specifically, the diffractive optical element 4 has a function of forming a circular light intensity distribution in a far field (or a Ferranhoffe diffraction region) when a parallel beam having a rectangular cross section is incident. Therefore, by diffracting the light beam of the optical element 4, a circular light is formed at the pupil position of the afocal lens 5.

11188pif.ptd Page 12 200307179 V. Description of the invention (9) Intensity distribution, that is, a beam with a circular cross section. In addition, the diffractive optical element 4 has a structure capable of retreating from the illumination light path. The retraction of the diffractive optical element 4 from the illumination optical path and the setting of the illumination optical path are performed by a drive system 22 that operates based on a command from the control system 21. The afocal lens 5 is configured to continuously change the magnification in a predetermined range while maintaining an afocal system (afocal optical system). The magnification change of the afocal lens 5 is performed by a drive system 23 that operates based on a command from the control system 21. The light beam passing through the afocal lens 5 enters the diffractive optical element 6 for ring-shaped illumination. The afocal lens 5 optically conjugates the divergence origin of the diffractive optical element 4 and the diffractive surface of the diffractive optical element 6. The numerical aperture of a light beam collected at one point on the diffractive surface of the diffractive optical element 6 or a nearby surface thereof varies depending on the magnification of the afocal lens 5. The diffractive optical element 6 for ring-shaped illumination has a function of forming a ring-shaped light intensity distribution in the far field where a parallel light beam is incident. In addition, the diffractive optical element 6 has a structure in which the illuminating light path can be inserted and removed freely and can be switched with the diffractive optical element 60 for quadrupole illumination and the diffractive optical element 61 for circular illumination. The configuration and function of the diffractive optical element 60 for 4-pole illumination and the diffractive optical element 61 for circular illumination will be described later. The diffractive optical element 6 for annular lighting, the diffractive optical element 6 0 for quadrupole lighting, and the diffractive optical element 61 for circular lighting are switched by being driven based on instructions from the control system 21 System 2 4 is performed. The light beam passing through the diffractive optical element 6 enters the zoom lens 7. On zoom

11188pif.ptd Page 13 4-> Cold Λ scale, small, Η »Long k material still praise side peak hum ^ f ^, 200307179 V. Description of the invention (10) The vicinity of the focal surface behind the lens 7, by On the light source side, the incident surface of the miniature fly-eye lens (or fly-eye lens) 8 composed of the first fly-eye member 8 a and the second fly-eye member 8 b in this order (that is, the incident surface of the first fly-eye member 8 a) is positioned. The micro fly's eye lens 8 has a function as a light integrator that forms a plurality of light sources based on an incident light beam. However, the detailed structure and function will be described later. As described above, a light beam from a circular light intensity distribution formed at the pupil position of the afocal lens 5 by the diffractive optical element 4 is emitted from the afocal lens 5 and becomes a light beam having various angular components incident on the diffractive optical element 6. . That is, the diffractive optical element 4 constitutes a light integrator having an angular beam forming function. On the other hand, when the parallel optical beam is incident, the diffractive optical element 6 has a function of forming a circular light intensity distribution in its far field. Therefore, the light beam that has passed through the diffractive optical element 6 forms a field in the shape of a circle around the optical axis A X on the focal surface on the rear side of the zoom lens 7 (and further on the incident surface of the miniature fly-eye lens 8). The outer diameter of the ring-shaped illumination field formed on the incident surface of the miniature fly-eye lens 8 varies depending on the focal distance of the zoom lens 7. In this way, the zoom lens 7 substantially combines the incident surfaces of the diffractive optical element 6 and the miniature fly-eye lens 8 in a Fourier transform relationship. The change in the focal distance of the zoom lens 7 is performed by a drive system 25 that operates based on a command from the control system 21. The light beam incident on the miniature fly-eye lens 8 is two-dimensionally divided, and a plurality of light sources in the shape of a circle are formed on the rear focal plane of the miniature fly-eye lens 8 in the same manner as the field of illumination formed by the incident light beam onto the miniature fly-eye lens 8 ( Hereinafter referred to as `` secondary light source π ''.

11188pif.ptd Page 14 200307179 V. Description of the invention (11) The light beams from the secondary light source in the shape of an annular band formed on the rear focal plane of the miniature fly-eye lens 8 overlap after receiving the light collecting action of the condensing optical system 9. The illumination forms a mask M of a predetermined pattern. The light beam transmitted through the mask M passes through the projection optical system P L to form an image of a mask pattern on the wafer W, which is a photosensitive substrate. In this way, one side of the wafer 1W is driven and controlled in one plane or scanning exposure in a plane (XY plane) orthogonal to the optical axis AX of the projection optical system PL, and the mask M is formed in each exposure area of the wafer W. The patterns are sequentially exposed. In addition, one exposure is based on a so-called step-and-repeat method, which exposes the mask pattern to each exposed area of the wafer at one time. At this time, the shape of the illuminated area on the photomask M is a rectangle close to a square. On the other hand, the scanning exposure is based on the so-called step-and-scan method, which scans the exposure mask pattern while moving the photomask and the wafer to the projection optical system relatively while facing the exposure areas of the wafer. The shape of the illuminated area on the photomask M is a rectangular shape with a short side and a long side ratio of, for example, 1: 3. When the magnification of the afocal lens 5 is changed in this embodiment, the center height (distance from the optical axis AX of the circular centerline) of the ring-shaped secondary light source does not change, but its width (outer diameter (diameter)) And 1/2 of the difference from the inside diameter (diameter). That is, by changing the magnification of the afocal lens 5, the size (outer diameter) and shape (ring ratio: inner diameter / outer diameter) of the endless belt-shaped secondary light source can be changed at the same time. Moreover, when the focal distance of the zoom 7 is changed, the toroidal ratio of the toroidal secondary light source does not change, but the center height and its width change at the same time. That is, by changing the focal distance of the zoom lens 7, it is possible not to change the endless belt.

11188pif.ptd Page 15 200307179 V. Description of the invention (12) The ring ratio of the secondary light source in the shape of (12) changes its outer diameter. Accordingly, in the present embodiment, by appropriately changing the magnification of the afocal lens 5 and the focal distance of the zoom lens 7, it is possible to change only the annulus ratio without changing the outer diameter of the annulus-shaped secondary light source. As described above, the diffractive optical element 6 is configured to be detachable from the illumination light path and can be switched between the diffractive optical element 60 for quadrupole illumination and the diffractive optical element 61 for circular illumination. Next, a description will be given of quadrupole illumination obtained by setting the diffractive optical element 60 instead of the diffractive optical element 6 in the illumination light path. The diffractive optical element 60 for quadrupole illumination has a function of forming a 4-point light intensity distribution in the far field when a parallel light beam is incident. Therefore, by refracting the light beam of the optical element 60, a quadrupole field is formed on the incident surface of the miniature fly-eye lens 8, for example, consisting of four circular fields with the optical axis A X as the center. As a result, a quadrupole-shaped secondary light source similar to the field formed on the incident surface of the miniature fly-eye lens 8 is also formed on the rear focal plane. In the case of four-pole lighting, as in the case of annular lighting, the outer diameter of the four-pole secondary light source can also be changed at the same time by changing the magnification of the afocal lens 5. Diameter) and toroidal ratio (diameter of a circle inscribed on 4 circular surface light sources / diameter of a circle connected to 4 circular surface light sources). In addition, by changing the focal distance of the zoom lens 7, the outer diameter of the quadrupole secondary light source can be changed without changing the ring ratio of the quadrupole secondary light source. As a result, by appropriately changing the magnification of the afocal lens 5 and the focal distance of the zoom lens 7, it is possible to change only the annular band ratio without changing the outer diameter of the quadrupole secondary light source.

11188pif.ptd Page 16 200307179 V. Description of the invention (13) Next, the diffractive optical element 4 is set back from the illumination light path, and the diffractive optical element 6 1 for circular illumination is set instead of the diffractive optical element 6 or 60. The circular illumination obtained in the illumination light path will be described. At this time, a light beam having a rectangular cross section along the optical axis A X enters the afocal lens 5. The light beam incident on the afocal lens 5 is enlarged or reduced according to its magnification. The light beam with a rectangular cross-section is emitted from the afocal lens 5 along the optical axis A X and enters the diffractive optical element 6 1. The diffractive optical element 61 for circular illumination has the function of forming a circular light intensity distribution in the far field when a parallel light beam with a rectangular cross section is incident like the diffractive optical element 4. Therefore, a circular light beam formed by the diffractive optical element 61 is used to form a circular field with the optical axis A X as the center on the incident surface of the miniature fly-eye lens 8 through the zoom lens 7. As a result, a circular secondary light source with the optical axis A X as the center is also formed on the rear focal plane of the miniature fly-eye lens 8. At this time, by changing the magnification of the afocal lens 5 or the focal distance of the zoom lens 7, the outer diameter of the circular secondary light source can be appropriately changed. The following briefly describes the lighting switching operation and the like of this embodiment. First, information on various photomasks which should be sequentially exposed according to a step-and-repeat method or a step-and-scan method is inputted to the control system 2 1 through input means 20 such as a keyboard. The control system 21 stores information on the most appropriate line width (resolution), depth of focus, and other information in the internal storage unit in advance, and responds to input from the input means 20 to the drive system 2 2 to 2 5 Supply appropriate control signals. That is, when the ring is performed based on the most suitable resolution and depth of focus

11188pif.ptd Page 17 200307179 V. Description of the invention (14) When the belt is illuminated, the drive system 24 positions the diffractive optical element 6 for illumination of the ring belt in the illumination light path based on the instruction from the control system 21. Then, in order to obtain a secondary-shaped light source having a desired size (outer diameter) and endless band ratio on the rear focal plane of the miniature fly-eye lens 8, the drive system 2 3 sets no based on a command from the control system 21 1 The magnification of the focus lens 5 is set by the drive system 25 based on a command from the control system 21 to the focus distance of the zoom lens 7. In addition, if necessary, the magnification of the afocal lens 5 is changed by the driving system 23 and the focal distance of the zoom lens 7 is changed by the driving system 25, and the focal point formed on the rear side of the miniature fly-eye lens 8 can be appropriately changed. The size of the ring-shaped secondary light source and the ring ratio. In this way, in the formation of the endless belt-shaped secondary light source, the size of the endless belt-shaped secondary light source and the endless belt ratio can be appropriately changed without substantially losing the light amount, and various endless belt lighting can be performed. When performing 4-pole illumination based on the most appropriate resolution and depth of focus, the drive system 24 positions the diffractive optical element 6 for 4-pole illumination in the illumination light path based on a command from the control system 21. Then, in order to obtain a four-pole secondary light source having a desired size (outer diameter) and a ring-band ratio on the rear focal plane of the miniature fly-eye lens 8, the drive system 2 3 sets no based on a command from the control system 21 1 The magnification of the focus lens 5 is set by the drive system 25 based on a command from the control system 21 to the focus distance of the zoom lens 7. If necessary, the magnification of the afocal lens 5 is changed by using the driving system 23, and the focal distance of the zoom lens 7 is changed by using the driving system 25.

11188pif.ptd Page 18 200307179 V. Description of the invention (15) The size and toroidal ratio of the quadrupole secondary light source formed on the focal surface on the rear side of the miniature fly-eye lens 8 can be appropriately changed. In this way, in the formation of the quadrupole secondary light source, the size and toroid ratio of the quadrupole secondary light source can be appropriately changed without substantially losing the light amount, and various quadrupole lighting can be performed. When normal circular illumination is performed on the basis of the most appropriate resolution and depth of focus, the drive system 22 retreats the diffractive optical element 4 from the illumination light path based on a command from the control system 21. In addition, the drive system 24 positions the diffractive optical element 61 for circular illumination in the illumination light path based on a command from the control system 21. Then, in order to obtain a circular secondary light source of a desired size (outer diameter) on the rear focal plane of the miniature fly-eye lens 8, the drive system 23 sets the magnification of the afocal lens 5 based on a command from the control system 21 The driving system 25 sets the focus distance of the zoom lens 7 based on an instruction from the control system 21. The size of the circular secondary light source formed on the rear focal plane of the miniature fly-eye lens 8 can be appropriately changed by changing the focal distance of the zoom lens 7 as needed by the drive system 25. In this way, in the formation of the circular secondary light source, the σ value (σ value = the outer diameter of the secondary light source / the pupil diameter of the projection optical system or ¢ 7 value = the emission side value of the illumination optical system can be basically not lost. Aperture / Numerical Aperture on the Incident Side of the Projection Optical System) Appropriately changed for various circular illumination. FIG. 2 is a perspective view showing a schematic configuration of the miniature fly-eye lens of FIG. 1. FIG. 3A and 3B are diagrams illustrating the function of the miniature fly-eye lens of FIG. 1. Referring to FIG. 2, the miniature fly-eye lens 8 includes a first fly-eye member 8Π a disposed on a light source side and a second fly-eye member 8 b disposed on a mask side (irradiated surface side).

200307179 V. y Description of the invention (16) Structure 0 Although the first compound eye member 8 a and the second compound eye member 8 b lack the same structure as a whole, the curvature radius of the refractive surface and the material and the like are not necessarily more detailed. 1 Cylindrical lens groups 1 1 a and 1 1 b arranged in the X direction are formed on the light source side surface of the first compound eye member 8 a and the light source side surface of the second compound eye member 8 b respectively. The cylindrical lens groups 1 1 a and 1 1 b formed on the light source side surface of the compound eye member 8 a and the light source side surface of the second compound eye member 8 b have a distance P along the X direction P] C > On the mask side surface 5 of the L compound eye member 8 a and the mask side surface 5 of the second compound eye member 8 b, cylindrical lens groups 1 2 a and 1 2 b arranged in the Z direction are formed, respectively. That is, the surface on the mask side of the first compound eye member 8 a The cylindrical lens groups 1 2 a and 1 2 b formed on the mask-side surface of the second fly-eye member 8 b have a distance p 2 along the Z direction < > In this embodiment, the surface on the light source side The pitch P of the cylindrical lens groups 1 1 a and 1 1 b formed on the upper side is set to be smaller than the pitch p 2 of the cylindrical lens groups 1 2 a and 1 2 b formed on the mask side surface < Moreover, on the light source side surface of the first compound eye member i 3 ί 3 and the light source side surface of the second compound eye member 8 b > linear marks 1 3 a and 1 3 b in the Z direction, respectively It is formed at optically corresponding positions on both sides in the X direction. Similarly, it is linear in the X direction on the mask-side surface of the first compound eye member 8 a and the mask-side surface of the second compound eye member 8 b. The marks 1 4 a and 1 4 b are respectively formed at the optically corresponding positions on both sides in the Z direction. The mask marks 1 3 a 1 3 b 1 4 a 1

11188pif.ptd Page 20, 200307179 V. Description of the invention (π) 4 b is, for example, a linear groove engraved on the substrate constituting the first compound eye member 8 a and the second compound eye member 8 b. Refer to the drawing [3A Regarding the refraction effect of the miniature fly-eye lens 8 in the X direction (that is, the refractive effect of the XY plane), the parallel light beam incident on the miniature fly-eye lens 8 along the optical axis AX is formed on the light source side of the first fly-eye lens 8 a (left side in the figure) ) Of the cylindrical lens group 1 1 aj is divided by the wavefront at a distance P] _ in the X direction. ≫ Then, the light beam j incident on each cylindrical lens of the cylindrical lens group 1 1 a is subjected to light collection on its refractive surface. Rear > a cylindrical lens group 1 1 b formed on the light source side of the second fly-eye member 8 b, wherein the refractive surface of the corresponding cylindrical lens is subjected to light-concentrating action j focused on the rear focal plane 8 of the micro fly-eye lens 8 C on 〇 On the other hand, referring to the figure: 3B j focuses on the Z-direction refraction effect of the miniature fly-eye lens 8 (ie, the refractive effect on the ZY plane), and the parallel light beam incident on the miniature fly-eye lens 8 along the optical axis AX is formed at the first 1 Fly-eye lens 8 a Cylindrical lens group 1 2 on the photomask side (right side in the figure) 1 2 a is wave-separated by a pitch P 2 along the Z direction e >% After the technique:, each of the incident cylindrical lens groups 1 2 a The light beam j of the cylindrical lens is subjected to light collection on its refracting surface. The cylindrical lens group 1 2 b formed on the mask side of the second fly-eye member 8 b is the refractive surface of the corresponding cylindrical lens. The light is focused on the rear focal plane 8 C of the miniature fly-eye lens 8. In addition, the position of the entrance pupil plane in the X direction and the position of the entrance pupil plane in the Z direction of the micro fly lens 8 are different. X-direction entrance pupil The plane is more on the light source side than the entrance pupil plane in the Z direction.

11188pif.ptd Page 21 200307179

Although the miniature fly-eye lens 8 of the sample embodiment is constituted by the first fly-eye member 8 a and the second fly-eye member 8 b arranged along the optical axis a χ space @, the size of the lens will be pi in the X direction, and pi in the Z direction. A conventional fly-eye lens composed of a plurality of lens elements having a size of p2 is arranged vertically and densely, and exhibits the same optical function. & However, in this embodiment, unlike a conventional fly-eye lens in which each refractive surface is formed into a two-dimensional curved surface (spherical shape), the first fly-eye member 8 a and the second fly-eye member 8 b constituting the micro fly-eye lens 8 are formed. Each of the refraction ^ is formed into a one-dimensional curved surface (cylindrical surface shape), so processing is easy and the manufacturing cost can be reduced. Particularly in the case of a miniature fly-eye lens having a minimum pitch P 1 of 2 rn m or less, the effect of reducing the manufacturing cost is significant. Incidentally, the miniature fly-eye lens 8 of this embodiment can be manufactured by, for example, a grinding process, an etching process, a stamping process, or the like. Furthermore, in this embodiment, a diffractive optical element 4 as an optical integrator is arranged in the optical path between the light source 1 and the miniature fly-eye lens 8. Therefore, the angular beam forming action of the diffractive optical element 4 is used to form the micro-fly-eye lens 8. Each light source of the plurality of light sources (secondary light sources) formed by the rear focal plane is enlarged and the interval between the light sources is reduced. As a result, since the present embodiment can improve the filling degree of the multiple light sources constituting the secondary light source formed on the illumination pupil surface (the rear focal plane of the miniature fly-eye lens 8), it is possible to perform good projection with good imaging performance. exposure. In this embodiment, it is most desirable to satisfy the following conditional expressions (1) and (2). 0-3 < Rd / Rc < 0-5 (1)

11188pif.ptd, page 22, for example. '二 200307179 V. Description of the invention (19) 0-3 < Rb / Ra &〇; 5 (2) where R a is formed on the light source side surface of the first compound eye member 8 a The radius of curvature of each cylindrical lens (1 1 a), Rb is the radius of curvature of each cylindrical lens (1 1 b) formed on the light source side surface of the second fly-eye member 8b. In addition, R c is the curvature radius of each cylindrical lens (1 2 a) formed on the mask-side surface of the first fly-eye member 8 a, and R d is formed on the mask-side surface of the second fly-eye member 8 b. The radius of curvature of each cylindrical lens (12b). When the lower limit value of the conditional expression (1) is exceeded, the manufacturing error of the refractive surface (cylindrical lens group 1 2 b) of the mask side of the second fly-eye member 8 b gives the wafer conjugate surface (including the wafer surface). The effect of the illuminance distribution becomes too large, so it is not satisfactory. On the other hand, when the upper limit value of the conditional expression (1) is exceeded, the manufacturing error of the refractive surface (cylindrical lens group 1 lb) of the mask side of the first fly-eye member 8 a gives the illuminance distribution of the conjugate surface of the wafer The effect is too great, so it is unsatisfactory. Similarly, when the lower limit value of the conditional expression (2) is lowered, the manufacturing error of the refractive surface (cylindrical lens group 12a) of the light source side of the second fly-eye member 8b gives the illuminance distribution band of the conjugate surface of the wafer The impact has become too great to be satisfactory. In addition, when the upper limit value of the conditional expression (2) is exceeded, the manufacturing error of the refractive surface (the cylindrical lens group 1 1 a) of the light source side of the first fly-eye member 8 a brings the illumination distribution of the conjugate surface of the wafer. The effect becomes too great to be satisfactory. Furthermore, in this embodiment, the first compound eye member 8a is formed of quartz, and the second compound eye member 8b is formed of a crystal that is transparent to exposure light.

11188pif .ptd Page 23

200307179 V. Description of the invention (20) The material is preferably formed. Here, as a crystalline material that is transmissive to light having a wavelength of less than 250 nm, it is possible to use sapphire, crystal, magnesium oxide, barium fluoride, lithium fluoride, lanthanum fluoride, fluoride gill, fluoride difluoride. , Sodium " Π 3 A " 6: Zhong Yueshao fluorite, L 1 S Γ A 1 F6 (L 1 S Γ A 1 ": Zhong Pinming fluorite crystalline material is also suitable for irradiating light with high energy density. A photon material that is not vulnerable to f. As shown in FIGS. 3A and 3B, in a miniature fly-eye lens, compared with the third fly-eye member 8 a arranged on the light source side, 8 is arranged on the photomask side and 1 fly-eye member 8 b The energy density of light irradiation becomes higher. Therefore, in the i-th compound eye member 8a, which has a lower energy density, the quartz and the manufacturing cost are lower, and in the second compound eye, which has a higher energy density, 开 = 4, 4 materials The transcript and the manufacturing cost are relatively high, but it is difficult to "irradiate the above-mentioned crystalline material which has the characteristics of forming scallop wounds, and for the same reason, the i-th compound eyepiece. The component 8 ... exists by! m " 牛 8 a 和 第The compound eye component of the area where the compound eye is irradiated with light is good using the above-mentioned Λ T chakra degree. When 8 g is more than b, there is an area irradiated with light by 1 m " cm 2 with: 2, 8 pieces of light-emitting area, it is preferable to form the crystalline material described by the compound eyes 8 a Ϊ = f. In the present embodiment, 8 b is used to make the i-th compound eye member Π 8 b: fit, that is, the cylindrical lens group 1 1 a formed on the surface of the second compound eye side of the first compound eye member 8 and in | ? 3 light source < squinting member 8

11188pif.ptd '~' '" --- ··· Page 24 ~~ --- 200307179 V. Description of the invention (21) The cylindrical lens group 1 1 b formed on the light source side surface of b is optically The cylindrical lens group 1 2 a formed on the surface of the mask side of the first compound eye member 8 a and the cylindrical lens group 12 b formed on the surface of the mask side of the second compound eye member 8 b are aligned with each other. Anastomosis is important. In view of this, in the present embodiment, the first compound eye member 8 a and the second compound eye member 8 b are observed along the optical axis AX using an appropriate observation position of a microscope, for example, so that the light source formed on the first compound eye member 8 a is used. The mark 1 3 a on the side surface and the mark 1 3 b on the light source side of the second compound eye member 8 b coincide with each other in the X direction, and the mark on the surface on the mask side of the first compound eye member 8 a 1 4 a and the mark 1 3 b formed on the mask side surface of the second compound eye member 8 b are aligned in the Z direction, and the positions of the first compound eye member 8 a and the second compound eye member 8 b are aligned (calibrated) to be relatively good. FIG. 4 is a view showing a configuration in which a pair of correction filters are provided for the miniature fly-eye lens of FIG. 1. FIG. Fig. 5 and Fig. 6 are schematic diagrams of a configuration and a device of a first correction filter and a second correction filter, respectively. As shown in FIG. 4, this embodiment is provided for correcting the illuminance distribution (illumination unevenness) of the wafer surface (irradiated surface) along the X direction on or near the entrance pupil surface in the X direction of the miniature fly-eye lens 8. The first correction filter (random patterned filter) 1 5 is better. In addition, on or near the entrance pupil surface in the Z direction of the micro fly's eye lens 8, a illuminance distribution (illumination unevenness) of the wafer conjugate surface (irradiated surface) is provided along the Y direction (the same as that of the micro fly's eye lens 8). Z direction corresponds to the optical direction)

11188pif.ptd Page 25 200307179 V. Description of the invention (22) The second correction filter (irregular shape filter) 16 is better. As shown in FIG. 5, the first correction filter 15 has a shape of a parallel plane plate that is the same as the first compound eye member 8 a as a whole. In addition, the light source-side surface (normally one side surface) of the first correction filter 15 corresponds to a cylindrical lens group 1 2 a formed on the light source-side surface of the first compound eye member 8 a. For each cylindrical lens, a rectangular irregular pattern 15 a extending in the Z direction is formed at a pitch p 1 in the X direction. In addition, a linear shape along the Z direction is formed on the light source side surface of the first correction filter 15 to correspond to a pair of marks 1 3 a formed on the light source side surface of the first compound eye member 8 a. As shown in FIG. 6, the pair of marks 1 5 b 〇 The second correction filter 16 also has the form of a parallel plane plate, and on one side thereof, in order to correspond to the light source side of the second compound eye member 8 b Each cylindrical lens of the cylindrical lens group 1 2 b formed on the surface of the lens is formed with a rectangular irregular pattern 16 a elongated in the X direction at a pitch p 2 in the Z direction. In addition, on one of the surfaces of the second correction filter 16, a pair of marks 1 4 a (and further on the second compound eye member 8) are formed so as to correspond to the pair of marks formed on the mask side surface of the first compound eye member 8 a. A pair of marks 1 4 b) formed on the surface on the mask side of b is formed with a pair of marks 16 b in a linear shape along the Z direction. In addition, reference numerals 15 b and 16 b are linear grooves provided on the substrate constituting the first correction filter 15 and the second correction filter 16, for example. In this way, the first correction filter 15 and the second correction filter 16 can achieve a uniform illuminance distribution on the wafer surface (irradiated surface).

11188pif.ptd Page 26, 200307179 V. Description of the invention (23) However, at this time, the positions of the first correction filter 15 and the second correction filter 16 and the first compound eye member 8 a and the second compound eye member 8 b are matched, That is, the cylindrical lens group 1 1 a formed on the light source side surface of the first compound eye member 8 a and the plurality of irregular patterns 1 5 a formed on the light source side surface of the first correction filter 15 Optically coincide with the cylindrical lens group 1 2 a formed on the mask-side surface of the first compound eye member 8 a (and further a cylindrical lens formed on the mask-side surface of the second compound eye member 8 b Group 1 2 b) and the plurality of irregular patterns 16 a formed on the light source side surface of the second correction filter 16 are optically aligned. In view of this, in this embodiment, the first correction filter 15 and the second correction filter 16 and the first compound eye member 8 a and the second compound eye member 8 b are observed along the optical axis AX using a microscope, for example. In order to make the mark 1 3 a formed on the light source side surface of the first compound eye member 8 a and the mark 1 5 b formed on the light source side surface of the first correction filter 15 coincide with each other in the X direction, the first 1 mark on the mask-side surface of the compound eye member 8 a 1 4 a (and further mark 1 4 b on the mask-side surface of the second compound eye member 8 b) and the mark formed on the second correction filter 16 The marks 1 6 b on the light source side are aligned in the Z direction, and the positions of the first correction filter 15 and the second correction filter 16 and the first compound eye member 8 a and the second compound eye member 8 b are aligned (calibrated). Is better. However, in the above description, although the first correction filter 15 is provided on or near the entrance pupil surface in the X direction of the micro fly-eye lens 8, the second correction filter 16 is provided on the entrance pupil surface in the Z direction and the vicinity thereof. , but

11188pif.ptd Page 27 200307179 V. Description of the invention (24) In the case of an exposure device that performs scanning exposure based on a stepwise scanning method, the setting of the second correction filter 16 may be omitted. In other words, in the case of an exposure device that performs the entire exposure in a step-and-repeat manner, it is most desirable to set both the first correction filter 15 and the second correction filter 16. When this embodiment is applied to a scanning exposure type exposure device, the pitch p 1 in the X direction of the cylindrical lens groups 1 1 a and 1 1 b is set smaller than the edges of the cylindrical lens # 1 2 a and 1 2 b. The pitch p 2 in the Z direction, therefore, on the wafer W along the XY plane, an elongated rectangular-shaped exposure area along the Y direction (the direction optically corresponding to the Z direction of the micro fly-eye lens 8) is preliminarily formed. Next, the mask pattern on the wafer W is scanned in the X direction, and finally, a rectangular shape having a size in the Y direction corresponding to the pitch p 2 optically and a size in the X direction corresponding to the moving distance (scanning distance) is formed by scanning exposure. Exposure area. That is, the X direction is a scanning direction, and the Y direction is a non-scanning direction. At this time, the unevenness in the scanning direction on the wafer W, that is, the unevenness in the X direction is reduced by using the averaging effect of the scanning exposure, so the first step for correcting the unevenness in the luminance of the wafer W in the X direction can be omitted. 1 Correct the settings of filter 15. For more detailed configuration and function of the correction filter (irregular pattern filter), refer to, for example, Japanese Patent Laid-Open No. 7-136060. Further, when this embodiment is applied to a scanning exposure type exposure device, the distance p 1 along the X direction of the cylindrical lens group 1 1 a formed on the light source side surface of the first compound eye member 8 a is set to Formed less than

11188pif.ptd Page 28 200307179 V. Description of the invention (25) 1 The cylindrical lens group 1 1 b on the photomask side of the compound eye member 8 a is spaced apart in the Z direction by P 2! A cylindrical lens group 1 1 b having a larger numerical aperture than that of the cylindrical lens group 1 1 a is arranged on the mask side. Therefore, it is possible to achieve an optical design that suppresses aberrations. The cylindrical lens group 1 1 b on the photomask side of 8 a has a distance p2 along the Z direction of a, which is formed on the light source side of the first L compound eye member 8 a along the X The distance between the directions P 1 is b, then: L · 2 < a / b (= P 2 / P 1) < 1 3 • 0 is better and better satisfies 2 · 6 < a / b & lt 4 • 0 〇 In this embodiment, it is preferable that at least one of the first compound eye member 8; a and the second compound eye member 8 b is movable. Specifically, the first Compound eye structure 8 a It is preferable that at least one of the second compound eye member 8 b is a movable structure along the optical axis AX. By this configuration, at least one of the first compound eye member 8 a and the second compound eye member 8 b is made. Moving along the optical axis AX can control the size of the bright area of the illuminated surface (mask surface or wafer surface). At this time, by the refractive surface of the light source side of the compound eye member 8a and At least one of the refractive surfaces on the mask side is introduced with a higher-order non-cylindrical surface corresponding to a higher-order aspheric surface, and the illuminance distribution (especially unevenness) on the illuminated surface can be controlled. The high-order aspheric surface referred to here is an aspheric surface including an aspheric coefficient of 8 times and an aspherical coefficient C 8 and higher. The height perpendicular to the optical axis is set to y from the tangent plane of the vertex of the aspheric surface to the height. The distance along the optical axis of the position on the aspheric surface of y (down

11188pi f.ptd Page 29, 200307179 V. Description of the invention (26) Decrease) is z, the vertex curvature radius is r, the conic coefficient is k, and the aspheric coefficient of η degree is C η, using the following formula ( a). 〔Number 1〕 Z = (y2 / r) / [l + {1— (1 + k) · y2 / r 2} 1/2] + C 4 · y4 + C6 · y6 + C8 · y8 + Cl 0 · y 1 0 + C12 · yl2 + C14 · yl4 + · · · (a) and at least one of the first compound eye member 8 a and the second compound eye member 8 b is movable in at least one of the X direction and the Z direction The constitution is better. With this configuration, at least one of the first compound eye member 8 a and the second compound eye member 8 b can be moved in the X direction or the Z direction (a direction intersecting the optical axis, which is typically a direction orthogonal to the optical axis) to control the irradiation. The size of the illuminated area of the surface and the illumination distribution of the illuminated surface (uneven tilt). In addition, at least one of the first compound eye member 8 a and the second compound eye member 8 b surrounds at least one of the X direction and the Z direction (the periphery of the direction intersecting with the optical axis) is typically around the direction orthogonal to the optical axis ) A rotatable structure is preferred. With this configuration, at least one of the first compound eye member 8 a and the second compound eye member 8 b is rotated around the X direction or the Z direction to control the illuminance distribution on the irradiated pupil surface and further control the telecentricity on the illuminated surface ( te 1 ecentric) (especially telecentricity)

lllSBpif.ptd page 30 200307179 V. Inclined component of invention description (27)). At this time, it is preferable to divide the first compound eye member into a compound eye member with a cylindrical lens group 1 1 a and a compound eye member with a cylindrical shape + 2 1〃1 b and a compound eye member 2 b 4 makes this one eyelet member independently adjustable. In this way, the controllability of the oblique component of the telecentricity of the projected surface can be changed. Moreover, Mi Er, Chu, 1 compound eye member 8 a or the second compound eye member 8 b, the substrate dream 22 ί ΐ i is not a parallel plane as a whole " wedge shape, when: can be used for optical adjustment for its correction. 1 J 进 用 用 第1 compound eye member 8 a and second compound eye member 8 b are on the pelvic side, and are around the Y direction (from the middle of the two which intersects with the optical axis to> one orthogonal to the optical axis, preferably the compound eye σ, which is typical. For the distance from the orthogonal direction), the cylindrical lens group can be rotated to make the first compound eye member 8a and the first compound eye .... The structure is rotated by the structure-square in the γ direction, among which there are 2 compound eye members 8 When the cylindrical lens of b is slightly tilted in the 8 or the Z direction or the Z direction, the 埝 / 埝 error is adjusted to the X direction. In this embodiment, in order to ensure the surface involved, the entire numerical aperture surface of the light beam (the mask surface or the wafer 8) satisfies the sine condition. 2 2 = 丄 Make a miniature fly-eye lens b Refracting surface and light on the light source side] = 2 At least-square of the low $ plane corresponding to the low-order aspheric surface is introduced into the second compound eye member 8 (preferably by early Refractive surfaces on the side

11188pif.ptd Page 31 200307179 V. Description of the invention (28) ^ Spherical low-order non-circular surface), you can set the micro compound eye through f 8 to meet the sine condition. The low-order aspheric surface referred to here is an aspheric surface including an aspheric surface of the sixth order, which has an aspheric coefficient selected as C 6 or lower. Here, while keeping the entire irradiated surface (mask surface, wafer surface, or mask common = grating shadow surface) with uniform illumination, in order to ensure the uniformity of the light > f aperture, It is preferable that the focusing optical system 9 on the hood side meets the sinusoidal condition as compared with the miniature fly-eye lens 8.

If the miniature fly-eye lens 8 is configured to be in a condition other than a sine condition, the beam angle of the beam-of-light 2 type fly-eye lens 8 is tilted (changes the angle with respect to the light), and the surface of the illuminated surface can be adjusted accordingly. The inclination of the illuminance distribution = Bu, uneven slope). Here, because the miniature fly-eye lens 8 is positive S, the above-mentioned correction mirror 15 is used.) == Cheng: 'convex unevenness' may be better, the correction lens 1 ^ D correction, and in this case, The spotlight light wind f ^ miniature fly-eye lens 8 is closer to the side of the illuminated surface, and the academic system 9 satisfies the sine condition. Adjusting the incident light purlin of the miniature fly-eye lens 8 is used in a structure with an angle of 0 pairs or more than that of a criminal, such as 1 2 = U mirror 8 is closer to the light source side and there is a light path paste reflection focal lens 7 f Responsibilities: § Μ Μ ^ The structure of the angle of the brother, the ratio of the diffracted diffracted light and the previous one, the original light path (preferably, the optical path of the zoom lens 7 and the light path) is provided with a parallel plane plate, which The light plate is arranged in a rotating manner to make this parallel surface flow (preferred / ,, oblique structure, placed on the micro fly-eye lens 8 between, ..., the lens 7 and the micro lens 8) On the road, the wedge prism with the pair of rotation axes in the direction of the optical axis changes.

11188pif .ptd surface

Page 32, 200307179 V. Description of the invention (29) A structure that adjusts the relative angles of a pair of wedge-shaped prisms to adjust the overall deflection angle 5 and makes the--part of the zoom lens 7 in a direction that crosses the optical axis (Typically, the optical axis is orthogonal to the direction.) The moving structure can be changed continuously by using methods such as changing the movement of the first fly-eye member 8a, the movement of the second fly-eye member 8b, and the incident angle of the light beam of the miniature fly-eye lens 8. The unevenness of the visibility on the illuminated surface is changed. Regarding the exposure apparatus of each of the above embodiments, the photomask (grating) is illuminated by the illumination optical device (Zhaoming Project), and the projection optical system is used to form the photomask. The pattern for writing is exposed on a photosensitive substrate (exposure process), and micro devices (semiconductor elements, imaging elements, liquid crystal display element thin film magnetic heads, etc.) can be manufactured. An example of a method for obtaining a semiconductor device as a micro device by forming a predetermined circuit pattern on a wafer or the like as a photosensitive substrate by using the exposure apparatus of each of the above-mentioned embodiments is described below. First, in the step of FIG. 7: 30: L, a metal film is deposited on the L batch of wafers. 0 In the following step 3, a metal film is coated on the 1 batch of wafers with light. Resistance. Then, in step 303, the exposure device of each of the above embodiments is used to sequentially expose the images of the pattern on the photomask through the projection optical system to each of the photographic areas on the batch of wafers. Then, in step 304, after the photoresist on the batch of wafers is developed, in step 305, the photoresist pattern on the batch of wafers is used as a photomask to perform a rest operation so that A circuit pattern corresponding to the pattern on the photomask is formed in each shooting area on each wafer. Later, the higher-level circuit diagram is used.

11188pif .ptd Page 33 ^: 1 V ϊφ ^; ^ P: 200307179 V. The description of the invention (30), etc., can be used to manufacture semiconductor devices and other equipment. With the semiconductor device manufacturing method described above, a semiconductor device having an extremely fine circuit pattern can be obtained with good efficiency. Furthermore, the exposure apparatus of each of the above-mentioned embodiments can obtain a liquid crystal display element as a micro device by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a flat plate (glass substrate). An example of the method at this time will be described below with reference to the flowchart in FIG. 8. In FIG. 8, the pattern forming process 401 uses the exposure apparatus of each of the above-mentioned embodiments to transfer and expose the pattern of a photomask onto a photosensitive substrate (a glass substrate coated with a photoresist, etc.), and implements a so-called micro Shadow project. By this lithography process, a predetermined pattern including a plurality of electrodes and the like is formed on a photosensitive substrate. After that, the exposed substrate is subjected to various processes such as a development process, an etching process, and a photoresist peeling process to form a predetermined pattern on the substrate, and is transferred to the lower color filter formation process 402. Next, the color filter formation process 4 2 forms three groups of dots corresponding to R (Red), G (Green), and B (B 1 ue) in a matrix shape, or arranges three band filters of R, G, and B. Color filters are arranged in a plurality of horizontal scanning lines. After the color filter formation process 402, a cell assembly process 403 is performed. The cell assembly process 403 uses a substrate having a predetermined pattern obtained by the pattern formation process and a color filter obtained by the color filter formation process 402 to assemble a liquid crystal panel (liquid crystal element). The cell assembly process 403, for example, injects liquid crystal between a substrate having a predetermined pattern obtained by the pattern formation process 401 and a color filter obtained by the color filter formation process to manufacture a liquid crystal panel (liquid crystal element).

11188pi f.ptd Page 34 200307179 V. Description of the invention (31) After that, through the component assembly process 4 0 4:, install the electric circuit backlight module and other components that perform the display operation of the assembled liquid crystal panel (liquid crystal element). The liquid crystal display element is completed. By the above-mentioned liquid crystal display element manufacturing method, a liquid crystal display element having an extremely fine circuit pattern can be efficiently obtained. In addition, the above-mentioned embodiment has a minimum pitch P 1 of 2 The present invention is applicable to a miniature fly-eye lens having a diameter of less than mm, but is not limited to this. The present invention can also be applied to a normal fly-eye lens having a minimum pitch P 1 exceeding 2 mm. However, in this case, a fly-eye lens should be used as required. An aperture stop (such as various ring-shaped aperture stop, 4-pole aperture stop, circular aperture stop, Λ variable stop, etc.) is provided near the exit surface of the lens. The above-mentioned embodiment is replaced by, for example, the fly-eye lens 8 5 of the Zhaoming optical device described in Japanese Patent Publication No. 2000- 7 5 8 35. The micro fly-eye lens 8 of this embodiment is also applicable. For example, the fly-eye lens 8 5 of the Zhaoming optical device described in Japanese Patent Laying-Open No. 2 01-1 7 6 7 6 6 can also be applied to the miniature fly-eye lens 8 of this embodiment. The fly-eye lens 1 0 0 of the Zhaoming optical device described in the reference No. 10 1 4 1 96 of the European Patent Publication No. 10 1 4 and FIG. 4 is also applicable to the miniature fly-eye lens 8 of this embodiment. In the above-mentioned embodiment, the light collecting optical system 9 as the light guiding optical system collects the light of the white secondary light source in the future. 1 The illumination mask M is superimposed, but it is not limited to this. Light between optical system 9 and reticle M On the road, a field diaphragm (light mask)

11188pif.ptd page 35 200307179 V. Description of invention (32) curtain) and a relay optical system that forms the image of the Zhaoming field diaphragm on the mask M. At this time ^ Flood light optical system! 9 It is possible in the future 1 The light from the secondary light source is superimposed to illuminate the illumination field diaphragm 5 The relay optical system can form an image of the opening (light transmitting portion) of the Zhaoming field diaphragm on the mask M 〇The above embodiment uses K r F excimer laser (wavelength • 248 η m) and A r F excimer laser (wavelength 193 nm) as the exposure light, but is not limited to this. For example, there are 2 5 The present invention is also applicable to exposure light having a wavelength of 0 nm or less. In addition, the embodiment described above uses the projection exposure device provided with an illumination optical device as an example to illustrate the present invention. However, it is very lacking that the present invention can be applied to a substrate other than an illumination mask. General bright optical device for illuminated surface. As described above, the present invention uses a miniature fly-eye lens composed of a pair of fly-eye members formed with a cylindrical lens group as a light integrator for forming a secondary light source on the illumination pupil surface. As a result, it forms a two-dimensional shape with each refracting surface. Curved (spherical) ordinary fly-eye lenses are different. 5 Each refractive surface forms a one-dimensional curved (cylindrical) shape, so it is easy to process, which can reduce manufacturing costs. Furthermore, the present invention is applicable to light sources and miniature fly-eye lenses. The optical integrator 5 is arranged in the optical path between the light sources. Therefore, each light source constituting a plurality of light sources (secondary light sources) formed on the focal surface on the rear side of the miniature fly-eye lens is enlarged, and the distance between the light sources is reduced. The filling degree of the multiple light sources constituting the secondary light source formed on the illumination pupil surface, and good projection exposure under good imaging performance 9 can produce good δ and be prepared.

11188pif.ptd Page 36 200307179 V. Description of the Invention (33) Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art will not depart from the spirit and scope of the present invention. In addition, some changes and retouching can be made, so the scope of protection of the present invention shall be determined by the scope of the attached patent application.

11188pif.ptd Page 37 200307179 Simplified and simple illustrations "Single form 5 Schematic diagrams ~ _ Illustrate the example of a single installation to learn bright photos Shishi Zhifa published in the book is equipped with a schematic oblique mirror through. The outline of the eye diagram is slightly different from the outline of the outline. The position of the outline is 1 and the 2 is the exposure of the 3. The pair of A is 3. 4 The figure shows the function of the lens through the eye. The r-Η diagram is

The mirror filter is fixed to the 1-set mirror-transparent β-x mesh complex micro-IX picture, and the mirror filter is fixed to IX. Figure 5 shows the cotton flow. The outline of the manipulator is provided with a body guide and a semi-finished structure. The mirror-type filter is set to 2 to 6 and it is 6 7. The prepared micro-micrometer is able to achieve 8 diagrams, maps, flow charts, and standard diagrams. Figure 3 source curve light bender 5 7 8 threats: no device / | \ exhibition shot ο spread 6 beams, light 4 6 • mirror, 2 mirrors, reverse lens through the accumulated light κ (\ pieces of elementary science light around 6 pieces of elementary light transmission lens system through the Department of ophthalmic complex light C light lens focusing through the eye 9 complex widget • structure 8 eyes , Double mirror · transparent b focus 8 variable, group, mirror 5 transparent 1 shape, cylindrical label 2 4 IX IX 1 ± 00 IX 1 ± mirror filter correction 6

L P segment hand, enter the mask to lose light · ο Μ 2 round crystal W,, system system, control light, shadow ^ _ 投 2

Lif M mrcMiErl

11188pif.ptd Page 38 200307179 Brief description of the drawing 2 2 ~ 2 5 · Drive system. liBini Page 39 11188pif.ptd

Claims (1)

200307179 VI. Scope of patent application1. An illumination optical device for illuminating an illuminated surface based on a light beam from a light source. The illumination optical device includes a light integrator arranged in an optical path between the light source and the illuminated surface. A fly-eye lens that is arranged in the optical path between the light integrator and the illuminated surface and forms one of a plurality of light sources based on the light beam from the light integrator, is characterized in that the fly-eye lens has a first fly-eye in order from the light source side. And a second compound eye member, the light source side surface of the first compound eye member and the light source side surface of the second compound eye member are formed with cylindrical lens groups aligned in the first direction, and the first compound eye member is irradiated A cylindrical lens group arranged in a second direction orthogonal to the first direction is formed on the surface-side surface and the surface on the irradiated surface side of the second compound eye member. 2 · The illumination optical device according to item 1 of the scope of patent application, characterized in that the radius of curvature of each cylindrical lens formed on the surface of the light source side of the first compound eye member is R a, and in the second The radius of curvature of each cylindrical lens formed on the light source side surface of the compound eye member is R b, the radius of curvature of each cylindrical lens formed on the surface side of the irradiated surface of the first compound eye member is R c, and in the second When the radius of curvature of each cylindrical lens formed by the surface on the irradiated surface side of the compound eye member is R d, the condition of 0 · 3 < R d / R c < 0.5 · 5 〇-3 < Rb / Ra < 〇-5 is satisfied. . 3. The illumination optical device according to item 2 of the scope of the patent application, wherein the first compound eye member has quartz, and the second compound eye member has a crystalline material that is transparent to light having a wavelength of less than 2 50 π in. . 11188pif.ptd Page 40, 200307179 VI. Patent application scope 4 · The illumination optical device according to item 2 of the patent application scope is characterized in that the first compound eye component and the second compound eye component have a length of 1 m. The compound eye component system in an area where the energy density of J / cm 2 or more is irradiated by light is a crystalline material that is transparent to light having a wavelength of less than 250 nm. 5. The illumination optical device according to item 1 of the scope of patent application, wherein the first compound eye member has quartz, and the second compound eye member has a crystalline material that is transmissive to light having a wavelength of less than 250 nm. 6. The lighting optical device according to item 5 of the scope of the patent application, characterized in that the crystal materials include fluorite, crystal, magnesium fluoride, barium fluoride, lithium fluoride, lanthanum fluoride, and gill fluoride. At least one selected from the group consisting of beryllium fluoride, sodium fluoride / lithium mayenite (LI CAF), and lithium saponite (LI SAF). 7. The illumination optical device according to item 1 of the scope of patent application, wherein the first compound eye member and the second compound eye member are irradiated with light at an energy density of 1 m J / cm 2 or more. The compound eye component of the region is a crystalline material that is transparent to light having a wavelength of less than 250 nm. 8 · The illumination optical device according to item 7 of the scope of patent application, characterized in that the crystalline material includes fluorite, crystal, magnesium fluoride, barium fluoride, chain II, hafnium fluoride 1, and fluoride. At least one selected from the group consisting of beryllium fluoride, sodium fluoride, chain CA1 aluminate (LI CAF), and lithium strontium aluminite (LI SAF). 9 · Illumination optics as described in item 7 of the scope of patent application, 11188pif.ptd Page 41 200307179 VI. The scope of patent application is characterized in that: the first compound eye member and the second compound eye member are formed with positioning marks for matching the positions of the first compound eye member and the second compound eye member various. 1 0 · The illumination optical device according to item 7 of the scope of patent application, characterized in that: the incident pupil surface on or near the entrance direction of the fly-eye lens in the first direction and the entrance of the fly-eye lens in the second direction At least one of the pupil surface or its vicinity is provided with a correction filter for correcting the illuminance distribution of the illuminated surface. 1 1 · The illumination optical device according to item 7 of the scope of patent application, characterized in that: a cylindrical lens group formed on a light source side surface of the first compound eye member and a light source side surface of the second compound eye member Of the cylindrical lens group formed along the second direction along the first direction, and the cylindrical lens group formed on the surface on the irradiated surface side of the first compound eye member and the surface on the irradiated surface side of the second compound eye member. At least one of the pitches is 2 mm or less. 1 2 The illumination optical device according to item 7 of the scope of patent application, characterized in that at least one of the first compound eye member and the second compound eye member is movable. 1 3 · The illumination optical device according to item 1 of the scope of patent application, wherein the first compound eye member and the second compound eye member are formed with the first compound eye member and the second compound eye member. Positioning logo. 1 4 · The illumination optical device according to item 13 of the scope of patent application, wherein the positioning mark includes light in the first compound eye member 11188pif.ptd Page 42 200307179 VI. The surface of the source side of the patent application and the light source side of the second compound eye member are linear signs formed in the second direction along the illuminated side of the first compound eye member A linear mark formed along the first direction on the surface of the second compound eye member and the surface on the side to be irradiated. 1 5 · The illumination optical device according to item 13 of the scope of patent application, characterized in that: on or near the entrance pupil plane of the first direction of the fly-eye lens and about the second direction of the fly-eye lens At least one of the entrance pupil surface or its vicinity is provided with a correction filter for correcting the illuminance distribution of the illuminated surface. 16 · The illumination optical device according to item 1 of the scope of patent application, characterized in that: the incident pupil surface on or near the entrance plane of the fly eye lens in the first direction and the entrance of the fly eye lens in the second direction At least one of the pupil surface or its vicinity is provided with a correction filter for correcting the illuminance distribution of the illuminated surface. 1 7 · The illumination optical device according to item 16 of the scope of the patent application, wherein the correction filter is formed with a position for the correction filter to coincide with the position of the first compound eye member or the second compound eye member. The second positioning mark. 1 8 · The illumination optical device according to item 17 of the scope of patent application, wherein the illumination optical device according to claim 9 is characterized in that the second positioning mark is provided along the first direction or the second direction. Directional linear sign. 1 9 · The illumination optical device according to item 1 of the scope of patent application, characterized in that: the surface on the light source side of the first compound eye member and the first 11188pif .ptd Page 43 200307179 VI. Patent application scope 2 The distance in the first direction of the cylindrical lens group formed on the light source side surface of the compound eye member, and the surface on the side of the illuminated surface of the first compound eye member And at least one of the pitches along the second direction of the cylindrical lens group formed on the surface on the irradiated surface side of the second compound eye member is 2 mm or less. 2 0. The illumination optical device according to item 19 of the scope of patent application, wherein at least one of the first compound eye member and the second compound eye member is movable. 2 1 · The illumination optical device according to item 1 of the scope of patent application, wherein at least one of the first compound eye member and the second compound eye member is movable. 2 2 · The illumination optical device according to item 21 of the scope of patent application, wherein the first compound eye member is used for controlling the size of the illuminated area of the illuminated surface or the illumination distribution of the illuminated surface. At least one of the second compound eye member is movable along the optical axis. 2 3 · The illumination optical device according to item 22 of the scope of patent application, wherein the first compound eye member is used for controlling the size of the illuminated area of the illuminated surface or the illumination distribution of the illuminated surface. At least one of the second compound eye member is movable in a direction of at least one of the first direction and the second direction. 2 4 · The illumination optical device according to item 23 of the scope of patent application, characterized in that in order to control the illumination distribution of the pupil plane, at least one of the first compound eye member and the second compound eye member is in The first direction and at least one of the second direction can be rotated around 11188pif .ptd Page 44 200307179 6. The scope of application for patents is transferred. 2 5 · The illumination optical device according to item 22 of the scope of patent application, wherein in order to control the illumination distribution of the pupil surface, at least one of the first compound eye member and the second compound eye member is in Around at least one of the first direction and the second direction is rotatable. 2 6 · The illumination optical device according to item 21 of the scope of patent application, wherein the first compound eye member is used for controlling the size of the illuminated area of the illuminated surface or the illumination distribution of the illuminated surface. At least one of the second compound eye member is movable in a direction of at least one of the first direction and the second direction. 2 7 · The illumination optical device according to item 26 of the scope of patent application, wherein in order to control the illumination distribution of the pupil surface, at least one of the first compound eye member and the second compound eye member is in Around at least one of the first direction and the second direction is rotatable. 2 8 · The illumination optical device according to item 21 of the scope of patent application, wherein in order to control the illumination distribution of the pupil plane, at least one of the first compound eye member and the second compound eye member is in Around at least one of the first direction and the second direction is rotatable. 2 9 · An illumination optical device for illuminating an illuminated surface based on a light beam from a light source, the illumination optical device includes a light integrator disposed in an optical path between the light source and the illuminated surface, and disposed in the Light product 11188pif.ptd Page 45 200307179 VI. Patent application scope __ The light beam of A in the optical path between the splitter and the illuminated surface forms one of multiple light sources. The compound eye is based on the light integrator lens from the light source side. The compound eye 3 L is two signs: the light source side surface of the first compound eye component of the compound eye and the second compound eye component, and the surface is formed with the light source side eye component of the circle Λ brother 2 eye component arranged in the first direction. The surface-side surface and the main and lens groups, the i-th compound side surface is formed with a radiated planar lens group along the second eyelet member, and a circular eyelet member arranged in the direction of the first compound eye member = 2 The surface on the light source side shapes the surface on the source side and the distance between the second complex direction, and the second! Compound eyes: the side of the irradiated surface of the J-shaped lens group along the first and the second compound eyes 3 ^ The surface of the irradiated surface side and the distance between the group and the second direction have a taxi = a cylindrical shape Under the lens. The parent side illuminates the illuminated surface at 30 mm with 2 types of illumination optics at 2 mm. The illumination wind is included in the light beam from the light source to illuminate the light between the surfaces. Included between the light source and the substrate. Illumination surface: the interstitial J instrument, and the light beam arranged in the light product forms one of a plurality of light sources. Based on the light from the light integrator lens, the light source side has the first order from the light source side; it is characterized by the light source side of the compound eye member. 2 compound eye members, the surface of which is arranged along the first direction ^ 2 eye member light source side eye f pieces on the side of the illuminated surface side and the 53 lens group, the first compound side surface is formed along the and The irradiated surface lens group of the 1st ^ 2 compound eye member, the first and the compound eye structure; the cylinders arranged in the K direction and even the 2nd compound eye member among them are 11188pif.ptd page 46 200307179 6. The scope of patent application The least one is movable. 3 1 · An exposure device including the illumination optical device according to any one of claims 1 to 30 of the scope of patent application, and a photomask for placing the illuminated surface The projection pattern is exposed on a projection optical system of a photosensitive substrate. 3 2 · The exposure device according to item 31 of the scope of patent application, characterized in that the photomask and the photosensitive substrate are adapted to the projection optical system in a direction optically corresponding to the first direction. Relatively moving, projecting and exposing the pattern of the photomask to the photosensitive substrate. 3 3 · An exposure method including: illuminating by an illumination optical device according to any one of claims 1 to 30 The process of photomask, the process of projecting and exposing the image of the pattern formed on the illuminated photomask on a photosensitive substrate. 3 4 · The exposure method described in item 3 of the scope of patent application, characterized by: The mask and the photosensitive substrate are relatively moved to the projection optical system in a direction optically corresponding to the first direction, and a pattern of the mask is projected and exposed on the photosensitive substrate. 11188pif.ptd Page 47