TW201002136A - Manufacturing method of organic electroluminescence element, organic electroluminescence element and display device - Google Patents
Manufacturing method of organic electroluminescence element, organic electroluminescence element and display device Download PDFInfo
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
- H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
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Abstract
Description
201002136 D 1 uu^pil.doc 六、發明說明: 【發明所屬之技術領域】 本發明關於一種有機電致發光元件201002136 D 1 uu^pil.doc VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to an organic electroluminescent element
Electro-Luminescence Element,以卞,古士 v Urganic 的製造方法、使用該製造方^有^ 件、以及包含上述有機EL元件的顯示裝置。機EL元 【先前技術】 & 眾所周知,有機EL元件的基本結 (雜或者陰極)、第二電極(陰極或者陽:括二電J 該些電極_有機發光層。上述結 於 =層而相對向的電極間流通電流, 板,tUf用有機EL兀件的顯示裝置中使用顯示面 於該經圖Hd述弟一電極形成為微細的圖案’且 形成光_壁是11由在上述第—賴圖案上 (Photolithography) 化$成。於由多個隔離壁包圍之内部,露出 蓥極,且該區域成為像素區域。 的方法各像素區域形成膜厚為100 nm左右的有機發光層 作、雨a有使用真空蒸錢(vacuum evaPorati〇n )法的方法’ 吊而s ’因能高精度且高效地形成層(成膜),故使用 4 201002136 3iUU2pit.doc 濕塗膜(wet coating)法。該濕塗膜法中’將有機發光材 料溶解於溶射*製成塗佈;^,且雜塗麵選擇^地余 佈於上述像素區域。該選擇性塗佈巾,可使用凸版印刷法= 喷墨印刷(inkjetprinting)法等的印刷法(例如& 文獻1)。 一、 專利文獻1 :日本專利特開2006-286243妒公郝 利文獻1中所述,對像素區域,利用凸版印刷法 發光油墨而形成有機發光層的方法,能夠高效地 衣仏有機EL兀件,但經過本發明者等人的研究可知,尚 存在以下欲解決的問題。 士而:= :目的在於:為了防止不同像素間流通電 :及氣絕緣性(以下’有時稱作絕緣性); ^使各像素區域内能保持塗佈液,從而可利用塗佈法 有機發光層。為了使像素間確實保持 的像素區域,較好的是使隔離壁的寬度尺寸 =破上述相反的要求,則隔離壁經設計且形成 二;^且劃分成面積儘量大的像素區域。若自 的Ϊ狀:由:離以文獻1中雖對隔離壁 但所得的理想,域的形狀為形狀無評細記載, 有角部的關面較平70件中,像素區域形成為不具 所包圍的像素區域形狀。其原因在於’於由隔離壁 為具有角部的形狀的情形時,當向 201002136 j I UU2piI.doc 塗:油墨時,有機發光油墨有可能無 法到ft卩而導致角部殘留有未塗佈區域。 Λ ίΐ上所述像素區域中殘留有未塗佈區域,則像素區 域内=存在未被有機發光層覆蓋的部分,從而可能會導致 該像素區域發光不良。因此,先前的有機EL元件中,將 ί隔離壁成的像素區域軸絲角部的職。結果, 實際設計的像素區域會比理想像素區域的佔據面積小,立 等相至的面積找由設成平緩的内壁面而減少的角部的面 積。 顯 上述問題特別是於使用噴墨印刷法作為印刷法時較明 另外’例如主動矩陣(activematrix)型有機EL元件 中,理想的是如圖1所示,薄膜電晶體(Thin Film TFT)元件與配線(未圖示)被絕緣性隔離壁 1覆盍,该絕緣性隔_丨除外的區域形成為像素。 於由隔離壁1劃分成的像素區域2的底面上,露出 極3 ’從而構成像素電極3a。像素區域相對於有機豇二 件的配置輯的比例^扣率),較好的是儘量高。= 在於,開ϋ率越高則單位面積的發光崎越大,结果 提高具有多個有機EL元件的裝置整體的發光量。口犯 由隔離壁1劃分成的像素區域2的形狀較 希 蓋除TFT讀之外的儘量大的面積。若依據 ^覆 計,則像素區域2如圖1所示,多數情 、、‘皁表设 或橢圓形等單純的形狀,而是矩形的二形The Electro-Luminescence Element is a display device including the above-described organic EL element, which is manufactured by the method of using the Uruguic v Urganic. EL element [Prior Art] & It is known that the basic junction (hetero or cathode) of the organic EL element, the second electrode (cathode or anode: the second electrode J of the electrode - organic light-emitting layer. The current flows between the electrodes, the plate, the display device for the organic EL device using the tUf, the display surface is formed in the pattern of the Hd, and the electrode is formed into a fine pattern 'and the light-wall is 11 by the above-mentioned On the pattern (Photolithography), the surface is surrounded by a plurality of partition walls, and the drain is exposed, and the region becomes a pixel region. In each pixel region, an organic light-emitting layer having a thickness of about 100 nm is formed, and rain is performed. There is a method of vacuum evapotranium (vacuum evaPorati〇n) method, which is used to form a layer (film formation) with high precision and high efficiency. Therefore, 4 201002136 3iUU2pit.doc wet coating method is used. In the wet coating method, 'the organic luminescent material is dissolved in the dissolution* to be coated; ^, and the miscellaneous coating surface is selected to be disposed in the above pixel region. The selective coating towel can be used by the relief printing method = inkjet Printing (inkjetprinting) method, etc. Printing method (for example, & document 1). Patent Document 1: Japanese Patent Laid-Open No. Hei. No. 2006-286243, the entire disclosure of which is incorporated herein by reference. The method can efficiently coat the organic EL element, but it has been found by the inventors of the present invention that the following problems are still to be solved. 士:: : The purpose is to prevent electricity flow between different pixels: and gas insulation (Hereinafter, it may be referred to as "insulating property"; ^The coating liquid can be held in each pixel region, and the organic light-emitting layer can be applied by coating. In order to ensure the pixel region between pixels, it is preferable to make the partition wall The width dimension = the opposite requirement of the above, the partition wall is designed and formed into two; ^ and divided into the pixel area as large as possible. If the shape of the self: 离: from the literature 1 but the partition wall but the resulting Ideally, the shape of the domain is not described in detail, and the corner of the corner is relatively flat. The pixel area is formed into a shape of a pixel area that is not surrounded. The reason is that the shape is a corner by the partition wall. In the case, when the ink is applied to 201002136 j I UU2piI.doc, the organic light-emitting ink may not be able to reach ft卩, resulting in an uncoated region remaining in the corner portion. 未 ΐ 残留 残留 残留 ΐ ΐ ΐ ΐ ΐ ΐ In the pixel region, there is a portion that is not covered by the organic light-emitting layer, which may cause poor light emission in the pixel region. Therefore, in the conventional organic EL device, the pixel region of the pixel region is separated from the wall. As a result, the actually designed pixel area is smaller than the occupied area of the ideal pixel area, and the area of the equal phase is found to be the area of the corner portion which is reduced by the flat inner wall surface. The above problems are particularly apparent when using an inkjet printing method as a printing method. For example, in an active matrix type organic EL device, it is desirable to use a thin film transistor (Thin Film TFT) device as shown in FIG. Wiring (not shown) is covered by the insulating partition wall 1, and a region excluding the insulating spacers is formed as a pixel. On the bottom surface of the pixel region 2 partitioned by the partition wall 1, the pole 3' is exposed to constitute the pixel electrode 3a. The ratio of the pixel area to the arrangement of the organic bismuth parts is preferably as high as possible. = The higher the opening ratio, the larger the illuminance per unit area, and as a result, the amount of luminescence of the entire device having a plurality of organic EL elements is increased. The shape of the pixel area 2 divided by the partition wall 1 is larger than the largest possible area except for TFT reading. According to the ^ overlay, the pixel area 2 is as shown in Fig. 1, and most of the simple shapes, such as a soap setting or an ellipse, are rectangular shapes.
201002136 31002pif.doc 成為連接著小面積矩形的特殊形狀。如 2的特殊形狀,可絲為整體具有多個角部素區域 然而,由於與上述原因相同的原因,如 ^ =多個上述角部c的像素區域2印刷有機發:由: ’則?素區域2的多個角部c會殘留為未塗佈油墨的部分= 故而,若對角部進行倒角處理而使其變得平° =率降低,但先前即使於主動矩陣型有機EL元件的产二 離壁劃分成的像素區域的形狀通常亦形成為:有 千緩内壁面的無角部的形狀。 巧八另 【發明内容] 本發明是鑒於上述先前技術的情況而研製,苴 於提供一種不會產生未塗佈部分且能增大開口率的有機 =元件的製造方法、以及藉由該製造方法而獲得的有機 tL元件及顯示裝置。 如為解決上述問題,本發明者反覆進行銳意的實驗及研 九、、、σ果备現,通常難以在不產生未塗佈部分的情況下對 具有角部的像素區域塗佈有機發光油墨,但若自多種塗佈 去中選擇使用凸版印刷法來塗佈含有機發光材料及溶劑的 有機發光油墨,則可在不產生未塗佈部分的情況下對具有 角部的像素區域塗佈有機發光油墨。 本發明為解決上述問題,而基於上述觀點來提供採用 如下構成的有機電致發光元件的製造方法、有機電致發光 元件以及顯示裝置。 [1]一種有機電致發光元件的製造方法,該有機電致發 7 201002136 31UU2pii.doc 光^牛是在基板上至少積層陰極、陽極、及 有機發光層而構成,該有機電致發光= η在於包括以下步驟:隔離壁形成步驟,於 極的基板上,由隔離壁割分成具有角部的形狀的 設置的隔離===,於包圍像素區域而 本,^\上+蝴中所述之有機電致發光元件的製造方 /,/、中上述有機發光油墨中使用濟點溫度大於等於· °c的溶劑,而且將上述凸版印刷中制的版的凸面的寬度 尺寸设定成小於上述像素區域的寬度尺寸。 [3]如上述[2]中所述之有機電致發光元件的製造方 法,其巾將上述凸版印刷巾使用的版的凸㈣寬度尺寸^ 没疋成上述像素區域的寬度尺寸的〜%%。 、[4]如上述[1]中所述之有機電致發光元件的製造方 法,其中上述有機發光油墨中使用沸點溫度低於2㈨。C的 溶劑,而且將上述凸版印刷中使用的版的凸面的 設定成大於上述像素區域的寬度尺寸。 又 [5] 如上述[4]中所述之有機電致發光元件的製造方 法’其中將上述凸版印刷中使用的版的凸面的寬度尺寸h 設定成大於上述像素區域的寬度尺寸L2、且小於丨(上述 寬度尺寸1^) + (上述隔離壁的寬度尺寸乙2) /2}。 [6] 如上述[1]〜[5]中任一項所述之有機電致發光元件 的製造方法,其中上述凸版印刷中使用的版的凸面 著 201002136 310U2pif.doc 依序按壓至被印刷物上的方向而形成為條紋(strip〇狀。 [7] 如上述[1]〜[6]中任一項所述之有機電致發光元件 的製造方法,其中有機發光層形成步驟中,將與多色相對 應的多種油墨作為上述有機發光油墨而選擇性地塗佈於規 定的隔離壁内,從而分別形成至少構成紅、綠、鉉二 素的有機發光層。 | 一 [8] —種有機電致發光元件,其是使用上述[1]〜201002136 31002pif.doc becomes a special shape that connects a small area rectangle. For example, the special shape of 2 may have a plurality of angular regions as a whole. However, for the same reason as described above, for example, ^ = pixel regions 2 of the plurality of corners c are printed organic: by: ' The plurality of corner portions c of the prime region 2 remain as the portion where the ink is not applied. Therefore, if the corner portion is chamfered to be flattened, the rate is lowered, but previously even the active matrix type organic EL element The shape of the pixel region divided by the wall is usually also formed into a shape having no corners of the inner wall surface. </ RTI> The present invention has been made in view of the above-described prior art, and provides a method for manufacturing an organic element capable of increasing an aperture ratio without generating an uncoated portion, and by the method of manufacturing The obtained organic tL element and display device. In order to solve the above problems, the inventors have repeatedly conducted intensive experiments and researched ninth, and sigma, and it is generally difficult to apply an organic luminescent ink to a pixel region having corners without generating an uncoated portion. However, if a co-printing method is used to coat an organic light-emitting ink containing an organic light-emitting material and a solvent from among a plurality of coatings, the pixel region having the corner portion can be coated with organic light-emitting without generating an uncoated portion. Ink. In order to solve the above problems, the present invention provides a method for producing an organic electroluminescence device, an organic electroluminescence device, and a display device having the following configuration. [1] A method for producing an organic electroluminescence device, wherein the organic electroluminescence is formed by stacking at least a cathode, an anode, and an organic light-emitting layer on a substrate, and the organic electroluminescence = η The method includes the following steps: a partition wall forming step, on the substrate of the pole, the isolation of the partitioned wall is divided into a shape having a corner shape ===, which surrounds the pixel region, and is described in the above In the production method of the organic electroluminescence device, the organic light-emitting ink uses a solvent having a gas point temperature of equal to or higher than °C, and the width of the convex surface of the plate made in the relief printing is set to be smaller than the pixel. The width dimension of the area. [3] The method for producing an organic electroluminescence device according to [2] above, wherein the width of the convex (four) width of the plate used for the relief printing roll is not reduced to ~%% of the width of the pixel region. . [4] The method for producing an organic electroluminescence device according to the above [1], wherein a boiling point temperature of the organic light-emitting ink is less than 2 (nine). The solvent of C is set to be larger than the width of the above-mentioned pixel region by the convex surface of the plate used in the above-described relief printing. [5] The method for producing an organic electroluminescence device according to the above [4], wherein the width dimension h of the convex surface of the plate used in the relief printing is set to be larger than the width dimension L2 of the pixel region and smaller than丨 (the above width dimension 1^) + (the width of the above partition wall is B 2) /2}. [6] The method for producing an organic electroluminescence device according to any one of the above [1], wherein the convex surface of the plate used in the relief printing is sequentially pressed onto the printed matter by 201002136 310U2pif.doc. [7] The method for producing an organic electroluminescence device according to any one of the above [1] to [6] wherein the organic light-emitting layer forming step is more A plurality of inks corresponding to the color are selectively applied to the predetermined partition walls as the organic light-emitting inks to form at least an organic light-emitting layer constituting red, green, and quinone. [1] Light-emitting element, which is using the above [1]~
任一項所述之製造方法而獲得。 光元=卜種齡裝置,其包含上述附所述之有機電致發 L赞明之效果] 根據本發明之製造方法,例如,杏 率而Γ為具有角部的形狀的像素區域塗;有機發: 根據本發明,能獲得—種發光面^因t ==積的發-增大 構進行說明:、然後,對本的有機EL元件的結 進行更詳細的說明。此外 ^機EL元件的製造方法 比例有時與實際不同。 =明的圖式中,各構件的 有機EL元件上亦存在電極 9 201002136 jwuzpn.doc 的導線(lead)等構件,作苴萆 係,故省略相關記载及圖;關 明中亦同樣。 q武及其說 ^所述’本發明之有機EL元件的製造 基板上勿別至少積層陰極、陽極、及位於 :於 之間的有機發光層”造有機電致發光元件,接 ,件,方法的特徵在於包括有機發光層形成步有:BL 步射’於自基板的厚度方向的一方觀察時包 1 素區域而設置的隔離壁内,利法 ====== 域是由隔離壁的内周面規定的區域。、 像素區 (基板) 機物輸反只要於形成電極、形成有 ^物料不會抑即可,例如可制 膜、石夕基板、將上述物f積層而成的 進 使用對塑膠、高分子膜等實施低透水;^二2其亦可 上返基板可使用市售的基板,亦可按照公知的方法^: (電極及發光層) 極EL元件是至少積層陽極、陰極、及位於上述陽 極中而構成。另外,至少陽極及陰 ㈣:二=::成。上述發光層 有機EL元件中,亦可於陽極與之間設置多㈣ 10 201002136 31002pif.doc 亦可设置發光層以外的層。以下,有時將設於陰 層之間的層稱作陰極側中間層(inter layer),將 ° 又於2極,發光層之間的層稱作陽極側中間層。 、 ;~極與發光層之間的陽極侧中間層,可列舉電洞 3電〆同傳輸層、電子阻擔層(electron blocking layer) Γ 的功^ ί m層是具有改善來自陰極的電洞注入效率 声或老η上述電洞傳輸層是指具有改善來自電洞注入 4: 3極更近的層(電洞傳輸層)的電洞注入的功 電洞注人層或者電洞傳輸層具有阻止傳 二止傳的SI將該些層稱作電子阻擋層。當具 元件,根效, 層’電子 的功自陰極的電子注入效率 層或者距離陰極更近的層 _ = 4自電子注入 能的層。另外,層)的電子注入的功 電洞的功能時,;二將輸層具有阻止傳輸 阻止傳輪電_魏時,例如可製作僅 curr==件,輯該電流_減少來確雛 列舉:與陰極之間的各層的積層構成,可 於%極與發先層之間設置電祠傳輸層的構成、於陰 201002136 31002pif.doc 極與發光層之間設置電子傳輸層的構成、於陰極與發光芦 之間設置電子傳輸層且於陽極與發光層之間設置電^傳^ 層的構成等。例如,具體而言可列舉以下a)〜d)的積^ a) 陽極/發光層/陰極 b) 陽極/電洞傳輸層/發光層/陰極 c) 陽極/發光層/電子傳輸層/陰極 d) 陽極/電洞傳輸層/發光層/電子傳輪層/陰極 (此處’/表示各層相鄰接地積層。以下相同。) 上述構成中,如上所述,發光層是指具有發 層’電洞傳輸層純具有傳輸電洞的功能的層, 層是指具有傳輸電子的功能的層。此外,有時亦將電子^ 輸層與電洞傳輸層統稱為電荷傳輸層1光層、電 層、電子傳輸層可分別獨立地使用兩層或兩層以上。另外剛 在與電極相鄰接而設的電荷傳輸層中,有時將具有改善來 自電極的電荷注人效率的功能、具有降低元件的驅動^ 的效果的電荷傳輸層特別稱作電荷注入層(電 電子注入層)。 m、 —進而,可為了提高與電極的密著性或改善來自電極 ,而與電極相鄰接地設置上述電荷注人層或者膜 4於2 nm的絕緣層,另外亦可為了提高界面的密 3、防錢合等,而於電荷傳輸層或發光層的界面插入 孕:涛的緩衝層(bufferlayer)。關於層的 及各層的厚度,可考慮到發光效率及元件壽4適 201002136 3 lUU2pif.doc 定。 的有= 设置著電荷注人層(電子注人層、電洞注入層) 爲」70件’可列舉與陰極相鄰接而設置著電荷注曰入 機EL TL件、與陽極相鄰接而置著電 有機EL元件。你丨‘曰舰 屯^王入層的 結構。 ^如’具體而言可列舉以下的e)〜p)的 Ο,極/電荷注入層/發光層/陰極 f)=極/發光層/電荷注入層/陰極 陽極/電荷注入層/發光層/電荷注入層/陰極 ,極/電荷 >主入層/電洞傳輸層/發光層/陰極 1、,極/電洞傳輸層/發光層/電荷注入層/陰極 陰極J陽極/電何注入層/電洞傳輪層/發光層/電荷注入層/ t /電荷注入層/發光層/電荷傳輸層/陰極 l) 祕/發光層/電子傳輸層/電荷注入層/陰極Obtained by any of the manufacturing methods described. The light element=the seed ageing device, which comprises the effect of the above-mentioned organic electroluminescence L praising] According to the manufacturing method of the present invention, for example, the apricot ratio is coated with a pixel region having a corner shape; According to the present invention, it is explained that the light-emitting surface is formed by the t == product, and then the structure of the organic EL element is described in more detail. In addition, the manufacturing method ratio of the EL element is sometimes different from the actual one. In the figure of the figure, the elements of the electrode 9 201002136 jwuzpn.doc are also present on the organic EL element of each member, and the related descriptions and drawings are omitted. The same is true in the description. In the manufacturing substrate of the organic EL device of the present invention, the organic electroluminescent device, the device, and the method for forming an organic light-emitting layer between the cathode and the anode are not laminated. The method comprises the steps of: forming an organic light-emitting layer: the BL step is formed in a partition wall provided by one side of the thickness direction of the substrate, and the method is provided by the partition wall. The area defined by the inner peripheral surface. The pixel area (substrate) is only required to form an electrode and form a material. For example, a film can be formed, a stone substrate can be formed, and the material f can be laminated. Use a low-permeability water for plastics, polymer films, etc.; 2 or 2, which can be used as a substrate, or a commercially available substrate, or according to a known method: (electrode and luminescent layer) The EL element is at least a laminated anode. The cathode and the anode are formed in the anode. At least the anode and the cathode (four): two =::. In the organic EL element of the light-emitting layer, a plurality of (4) may be provided between the anode and the anode. 10 201002136 31002 pif.doc a layer other than the light-emitting layer. The layer disposed between the negative layers is referred to as the cathode side inter layer, and the layer between the light emitting layers and the light emitting layer is referred to as the anode side intermediate layer. The anode side intermediate layer, which can be exemplified by the hole 3, the electron transport layer, the electron blocking layer, and the electron blocking layer, has the effect of improving the hole injection efficiency from the cathode or the above-mentioned hole transmission. The layer refers to a power hole hole injection layer or a hole transmission layer having a hole injection for improving a layer (hole transport layer) which is closer to the 4:3 pole of the hole injection, and has a SI which prevents the transfer of the second pass. The layer is called an electron blocking layer. When it has a component, the root effect, the layer 'electron works from the cathode electron injection efficiency layer or the layer closer to the cathode _ = 4 from the electron injection energy layer. In addition, the layer) electron injection The function of the power hole, when the second layer will block the transmission to prevent the transmission of electricity _Wei time, for example, can only make curr== pieces, the current _ reduction is categorized: the layers between the cathode and the cathode The layered structure can be used to set the electrophoretic transport layer between the % pole and the first layer. Cheng Yuyin 201002136 31002pif.doc A structure in which an electron transport layer is provided between the electrode and the light-emitting layer, an electron transport layer is provided between the cathode and the light-emitting reed, and an electro-transmission layer is provided between the anode and the light-emitting layer. For example, specifically, the following products a) to d) a) anode/light emitting layer/cathode b) anode/hole transport layer/light emitting layer/cathode c) anode/light emitting layer/electron transport layer/cathode d Anode/hole transport layer/light-emitting layer/electron transport layer/cathode (herein '/ indicates that each layer is adjacent to the ground layer. The same applies hereinafter.) In the above configuration, as described above, the light-emitting layer means having a layer of electricity The hole transport layer has a layer having a function of transmitting a hole, and a layer means a layer having a function of transmitting electrons. Further, the electron transport layer and the hole transport layer are collectively referred to as a charge transport layer. The light layer, the electric layer, and the electron transport layer may be used independently of two or more layers, respectively. Further, in the charge transport layer provided adjacent to the electrode, a charge transport layer having a function of improving the charge injection efficiency from the electrode and having a function of reducing the drive of the element is sometimes referred to as a charge injection layer ( Electron injection layer). m, in addition, in order to improve adhesion to the electrode or to improve the electrode from the electrode, the charge injection layer or the film 4 may be provided adjacent to the electrode at an insulating layer of 2 nm, or may be used to improve the density of the interface. The anti-money combination is inserted into the buffer layer of the pregnant: Tao at the interface of the charge transport layer or the light-emitting layer. Regarding the thickness of the layer and each layer, the luminous efficiency and the component life can be considered. 201002136 3 lUU2pif.doc. There is = a charge injection layer (electron injection layer, hole injection layer) is set as "70 pieces", and a charge injection device EL TL is disposed adjacent to the cathode, and is adjacent to the anode. An electric organic EL element is placed. You 丨 ‘the structure of the ship’s 屯^ king. ^ Specifically, the following e): p), pole/charge injection layer/light-emitting layer/cathode f)=pole/light-emitting layer/charge injection layer/cathode anode/charge injection layer/light-emitting layer/ Charge injection layer/cathode, pole/charge>main entry layer/hole transport layer/light-emitting layer/cathode 1, pole/hole transport layer/light-emitting layer/charge injection layer/cathode cathode J anode/electrical injection layer / hole transmission layer / luminescent layer / charge injection layer / t / charge injection layer / luminescent layer / charge transport layer / cathode l) secret / luminescent layer / electron transport layer / charge injection layer / cathode
L m) 喊•注人树⑽電子傳輸桃荷注入層/ 陰極 陰極 η )陽極、何〉主入層/電洞傳輪層/發光層,電荷傳輸層/ 〇)陽極/電洞傳輸層/發光層/電子傳輸層/電荷注入層/ 電荷極^注人胸洞傳細發光層/電子傳輸層/ (陽極) 13 201002136 Jiuuzpif.doc 上述陽極中,例如透明電極或者半透明電極可使用導 電率較高的金屬氧化物、金屬硫化物或金屬的薄膜,適宜L m) shouting • injection tree (10) electron transport peach charge injection layer / cathode cathode η) anode, He > main entry layer / hole transfer layer / luminescent layer, charge transport layer / 〇) anode / hole transport layer / Light-emitting layer/electron transport layer/charge injection layer/charge electrode injection hole-transmission layer/electron transport layer/(anode) 13 201002136 Jiuuzpif.doc Conductivity can be used in the above anode, for example, transparent electrode or translucent electrode Higher metal oxide, metal sulfide or metal film, suitable
使用透過率較高的薄膜,且可根據所使用的有機層而適;J 地選擇使用。具體而言,可使用例如由氧化銦、氧化辞: 氧化錫、銦錫氧化物(Indium Tin 〇xide :簡稱為IT〇)、 銦鋅氧化物(Indium Zinc Oxide :簡稱為ΙΖ〇)、金、麵、 銀、及銅等形成的薄膜,其中,較好的是汀〇、 、、 化錫。 仏。、氣 ^ 該陽極可使用例如聚笨胺(P〇lyaniline) 衍生物、聚噻吩(polythiophene:)或其衍生物^、 膜。此外,亦可將由含有如下材料的混合 j 白勺缚膜用於陽極中,上述材料是選自上财機透明^ 中使用的材料、金屬氧化物、金屬硫化物、金 、 米管(c—nano-tube)等碳材料所組成的族群中^奈 —種或一種以上。 r的至少 進而,該陽極中亦可使用能反射光的材 好的是功函數大於等於3.。〜的金屬、 ::材料較 硫化物。 蜀羊U匕物、金屬 陽極的製作方法,例如可列舉真空墓 (sputtering)法、離子電鍛( 梦^ ;錢錢 法等。 鍍敷(Plating) 陽極的膜厚可考慮到光的透過性及 擇’例如為5nm〜!0 ,較好的是如適當地選 好的是20 nm〜500 nm D A m,更 14A film having a high transmittance can be used, and it can be used depending on the organic layer to be used; Specifically, for example, indium oxide, oxidized: tin oxide, indium tin oxide (Indium Tin 〇xide: IT 〇), indium zinc oxide (Indium Zinc Oxide: ΙΖ〇), gold, Thin films formed of surface, silver, and copper, among which, tin, tin, and tin are preferred. Hey. , gas ^ The anode can be used, for example, a P〇lyaniline derivative, a polythiophene: or a derivative thereof, a membrane. In addition, a mixed j-binding film containing a material selected from the following materials, a metal oxide, a metal sulfide, a gold, a rice tube (c-) may also be used. A group of carbon materials such as nano-tubes or more or more than one species. Further, at least r, a material capable of reflecting light may be used in the anode. Preferably, the work function is greater than or equal to 3. ~ Metal, :: material is more sulfide. Examples of the method for producing the U-shaped object and the metal anode include a vacuum sputtering method, an ion electric forging method, a dream method, a money method, and the like. Plating The film thickness of the anode can be considered in consideration of light permeability. And the choice 'for example, 5 nm ~! 0, preferably, as appropriate, is 20 nm to 500 nm DA m, and 14
201002136 31UU2pxf.doc (陽極侧中間層) 如上所述,於上述陽極與發光層之 電洞注入層、電洞傳輸層等陽極側中間層。視而要而積層 (電洞注入層) H 可如上所述’設於陽極與電洞傳輸層之 二= 光層之間。電润注入層的形成材料可適 田也使用么知的材料,並無特別限制。例如可列舉:苯基 匕(广:,㈣系、星爆狀胺(-——Ο系、酞 化青(phthai〇cyanine)系、腙(hydraz〇ne)衍生物、吟唑 (c—e)衍生物、三唑(triaz〇le)衍生物、咪唑 (mndazole)衍生物、具有胺基的噁二唑(_dia址)衍 生物:氧她、氧她、氧化鎢、氧化錮、氧摘、氧化 鋁等氧化物、非晶形碳(am〇rph〇us carb〇n)、聚苯胺、聚 噻吩衍生物等。 另外,上述電洞注入層的厚度較好的是5 nm〜3〇〇 nm 左右。當此厚度小於5 nm時,則有難以製造的傾向;另 方面,當此厚度超過3〇〇 nm時,則有驅動電壓及施加 於電洞注入層的電壓增大的傾向。 (電洞傳輸層) 電洞傳輸層的構成材料並無特別限制,例如可列舉: N,N'-二苯基-N,N'-二(3-甲基苯基)4,4'_二胺基聯苯 (N,N'-diphenyl-N,N,-di(3-methylphenyl)4,4,-diaminobiphen yl,TPD )、4W-雙[N-(l-萘基)-N-苯基胺基]聯笨 (4,4'-bis[N-(l-naphthyl)-N-phenylamino]biphenyl ^ NPB ) 15 201002136 l uuzpn'.doc 等芳香族贿生物、聚⑽十域其衍生物、聚魏或其 衍生物、側鏈或主鏈上具有芳香族胺的聚矽氧烷衍生物、 吡唑啉(pyrazoline)衍生物、芳胺(arylamine)衍生物、 1二苯乙稀(stiibene >衍生物、三苯基二胺 (tnphenylchamine)衍生物、聚苯胺或其衍生物、聚噻吩 或其衍生物、聚芳胺或其衍生物、聚吡咯(p〇1rr〇ie) 或其衍生物、聚對苯乙炔或其衍生物、或者聚(2,5_噻吩乙 炔)(poly(2,5-thienylenevinylene))或其衍生物等。 上述材料中,電洞傳輸層中使用的電洞傳輸材料,較 好的是聚乙烯咔唑或其衍生物、聚矽烷或其衍生物、側鏈 或^主鏈上具有芳香族胺化合物基團的聚矽氧烷衍生物、聚 笨胺或其衍生物、聚噻吩或其衍生物、聚芳胺或其 聚對苯乙炔或其衍生物、或者聚(2,5_噻吩乙炔)或其衍生物 等的高分子電洞傳輸材料,更好的是聚乙烯咔唑或其衍生 物:聚魏或其衍生物、觸或线±具有料族胺的聚 了氧烧衍生物。當採用低分子的電洞傳輪材料時,較好的 疋分散於高分子黏合劑(binder)中而使用。 電洞倾層厚度並錢別_,可根的設計而 、當變更’較好的是1麵〜_麵左右。若該厚度小於 ^述下限值,财難以製造、或者紐獲得充分的電洞傳 ,效果等傾向;另―方面,若該厚度超過上述上限值,則 有驅動電壓及施加於電洞傳輸層的電壓增大的傾向。故 而’電洞傳輸層的厚度如上所述,較好的是}腿〜誦 聰,更好的是2腦〜50。腿,更好的是5麵〜·腿。 16 201002136 31UU2pif.doc (有機發光層) 有機發光層通常主要含有發出螢光或者碟光 (低分子化合物及高分子化合物)。此外,亦可更含有 (d〇P ant)材料。本發明中可使用的有機發光層的形』鉍 ,’例如可列舉以下的色素系材料、金屬錯合物系材料、 高分子系材料、及摻雜材料等。201002136 31UU2pxf.doc (Anode-side intermediate layer) As described above, the anode-side intermediate layer such as the hole injection layer or the hole transport layer of the anode and the light-emitting layer described above. The layer (hole injection layer) H may be disposed between the anode and the hole transport layer = the light layer as described above. The material for forming the electrowetting injecting layer can be used as a material, and is not particularly limited. For example, phenyl hydrazine (wide:, (four) system, starburst amine (--Ο, phthai〇cyanine, hydraz〇ne derivative, carbazole (c-e) a derivative, a triazole derivative, a mdazole derivative, an oxadiazole derivative having an amine group: oxygen, oxygen, tungsten oxide, cerium oxide, oxygen extraction, An oxide such as alumina, amorphous carbon (am〇rph〇us carb〇n), polyaniline, polythiophene derivative, etc. Further, the thickness of the above-mentioned hole injection layer is preferably about 5 nm to 3 〇〇 nm. When the thickness is less than 5 nm, it tends to be difficult to manufacture. On the other hand, when the thickness exceeds 3 〇〇 nm, the driving voltage and the voltage applied to the hole injection layer tend to increase. Transport layer) The constituent material of the hole transport layer is not particularly limited, and examples thereof include: N,N'-diphenyl-N,N'-bis(3-methylphenyl)4,4'-diamino group Biphenyl (N,N'-diphenyl-N,N,-di(3-methylphenyl)4,4,-diaminobiphenyl,TPD), 4W-bis[N-(l-naphthyl)-N-phenylamine (4,4'-bis[N-(l-naphthyl)-N-phenylamino ]biphenyl ^ NPB ) 15 201002136 l uuzpn'.doc and other aromatic bribery organisms, poly(10) decyl derivatives, poly-Wei or its derivatives, polyoxane derivatives with aromatic amines in the side chain or main chain , pyrazoline derivative, arylamine derivative, 1 diphenylethylene (stiibene > derivative, triphenyl diamine (tnphenylchamine) derivative, polyaniline or its derivative, polythiophene Or a derivative thereof, a polyarylamine or a derivative thereof, polypyrrole (p〇1rr〇ie) or a derivative thereof, polyparaphenylenevinylene or a derivative thereof, or poly(2,5-thiopheneacetylene) (poly(2) , 5-thienylenevinylene)) or a derivative thereof, etc. Among the above materials, the hole transporting material used in the hole transport layer is preferably polyvinyl carbazole or a derivative thereof, polydecane or a derivative thereof, and a side chain. Or a polyoxyalkylene derivative having an aromatic amine compound group in the main chain, polyphenylamine or a derivative thereof, polythiophene or a derivative thereof, polyarylamine or polyparaphenylenevinylene or a derivative thereof, or a polymer hole transport material such as poly(2,5-thiopheneacetylene) or a derivative thereof, more preferably a polymer Enoxazol or a derivative thereof: polywei or a derivative thereof, a touch or a wire; a polyoxylated derivative having a steroid amine. When a low molecular hole transport material is used, a good ruthenium is dispersed in a high Used in molecular binders. The thickness of the hole is not _, the design of the root can be changed, and it is better to have one side ~ _ side. If the thickness is less than the lower limit value, it is difficult to manufacture, or the hole is sufficient to obtain a sufficient hole transmission, effect, etc., and if the thickness exceeds the above upper limit value, there is a driving voltage and is applied to the hole transmission. The tendency of the voltage of the layer to increase. Therefore, the thickness of the transmission layer of the hole is as described above, preferably the leg ~ 诵 聪, and the better is 2 brain ~ 50. The legs are better 5 sides ~ legs. 16 201002136 31UU2pif.doc (Organic light-emitting layer) The organic light-emitting layer usually contains mainly fluorescent or dish light (low molecular compound and high molecular compound). In addition, it may contain more (d〇P ant) materials. The shape of the organic light-emitting layer which can be used in the present invention is, for example, the following pigment-based material, metal-based compound material, polymer-based material, and dopant material.
上述色素系材料,例如可列舉:甲環戊丙胺 (cyclopentamine )衍生物、四苯基丁二烯(她叩^吻 butadiene)衍生物化合物、三苯基胺衍生物、噁二唑衍生 物、°比°坐幷啥琳(Pyrazoloquinoline)衍生物、二苯乙稀其 苯(distyryl benzene )衍生物、二苯乙烯基芳烴 Uistyrylarylene)衍生物、喹σ丫啶酮(quinacrid〇ne)衍生 物、香豆素(coumarin)衍生物、吡咯(pyrrole)衍生物、 噻吩環(thiophene ring)化合物、吼啶環(pyridinering) 化合物、紫環酮(perinone)衍生物、花(perylene)衍生 物、募聚噻吩(oligothiophene)衍生物、噁二唑二聚物 (oxadiazole dimer)、咣唑啉二聚物(pyraz〇iine dimer)等。 上述金屬錯合物系材料,例如可列舉:銥錯合物、鉑 錯合物等具有自三重激發態(triplet excited state )之發光 的金屬錯合物、經基喧琳紹(alurniquinolinol)錯合物、經 基本并啥♦鈹(benzoquinolinol beryllium)錯合物、苯并 。惡唑鋅錯合物、苯并噻唑鋅錯合物、偶氮曱基鋅錯合物、 卟淋鋅(porphyrin zinc)錯合物、銪錯合物等金屬錯合物 等,該些金屬錯合物的中心金屬為Al、Zn、Be等或者Tb、 17 201002136 31 UU2pif.docExamples of the pigment-based material include a cyclopentamine derivative, a tetraphenylbutadiene derivative compound, a triphenylamine derivative, and an oxadiazole derivative. Pyrazoloquinoline derivative, distyryl benzene derivative, distyryl aromatic hydrocarbon Uistyrylarylene derivative, quinacrid〇ne derivative, couma bean A coumarin derivative, a pyrrole derivative, a thiophene ring compound, a pyridinering compound, a perinone derivative, a perylene derivative, and a polythiophene ( An oligothiophene) derivative, an oxadiazole dimer, a pyrazolium dimer, or the like. The metal complex-based material may, for example, be a metal complex having luminescence from a triplet excited state such as a ruthenium complex or a platinum complex, which is agglomerated by aurniquinolinol. The substance, the basic 啥 铍 铍 (benzoquinolinol beryllium) complex, benzo. a metal complex such as a zinc oxazole complex, a benzothiazole zinc complex, an azo hydrazinium zinc complex, a porphyrin zinc complex, a ruthenium complex, etc., which are The central metal of the compound is Al, Zn, Be, etc. or Tb, 17 201002136 31 UU2pif.doc
Eu、Dy等稀土類金屬,而配位基上具有σ惡二唾、隹二唾 (thiadiazole)、苯基吼n定(phenyl pyridine)、笨基苯并咪 口坐(phenyl benzo imidazole)、喧琳(qUin〇line)結構等。 上述高分子系材料,例如可列舉:聚對笨乙炔衍生物、 聚噻吩衍生物、聚對苯衍生物、聚矽烷衍生物、聚乙炔衍 生物、聚芴(polyfluorene)衍生物、聚乙烯咔唑衍生物、 上述色素體或金屬錯合物系發光材料加以高分子化 的材料等。 于 上述有機發光層形成材料中發出藍色光的材料,例如 可歹]舉.一表乙稀基芳煙衍生物、喔二峻衍生物、及其等 =合物、聚乙稀十績生物、聚對苯衍生物、聚苟衍生 ^寺。其t,較好的是屬於高分子材料的聚乙射 物、聚對苯衍生物及聚芴衍生物等。 生 料,Cl卜二上,機發光層形成材料中發出綠色光的材 ' Ο如可列舉:啥口丫唆酉同衍生物、香豆素衍生物里 較:U對苯乙块街生物、聚苟衍生物等。其中: 物等。'疋屬於^子材料的聚對苯乙块衍生物、聚苟衍生 如可::;述tT成材料中發出紅色光· 物J 9五素衍生物、噻吩環化合物、及i等的取人 物' 聚對苯乙块衍生物、聚嗔 初U的水合 其中,較好物、聚苟衍生物等。 # 乂好的疋屬於尚分子材料的 嗟吩竹生物、聚苟衍生物等。才本乙炔何生物、聚 上述有機發光層中,亦可為了提高發光效率或改變其 18 201002136 31UU2pit.doc ,光波長等目的而添加摻賴。上麟雜劑例如可列舉: 茈衍生物、香豆素衍生物、紅螢婦(rubrene)衍生物、喹 十疋=魅物、角㈣鑌(squalilium)衍生物、。卜琳衍生 物苯乙稀系色素、稠四苯(tetracene)衍生物“比唾琳 酮(pyrazolone)衍生物、十環烯(decacyclene)、吩噁嗪 酮(phenoxazone)等。 此外,上述有機發光層的厚度通常為2 nm〜200 nm。 (陰極側中間層) 如上所述,於上述發光層與後述之陰極之間,視需要 而積層電子注入層、電子傳輸層等的陰極側中間層。 (電子傳輸層) 電子傳輸層的形成材料可使用公知的材料,例如可列 舉心一坐竹生物、葱酉昆二曱烧(anthraquinodimethane ) 或其衍生物、苯醌(benzoquinone )或其衍生物、萘醌 (naphthoquinone )或其衍生物、蒽酿^ ( anthraqUin〇ne )或 其竹生物、四氧基葱酉昆二曱烧(沾raCyan〇 anthraquinodimethane)或其衍生物、苟_ (f[u〇ren〇ne)衍 生物、二苯基二氰乙烯(diphenyl dicyanoethylene)或其衍 生物、聯苯酿(diphenoquinone)衍生物、或者8-經基口奎 琳或其竹生物的金屬錯合物、聚啥琳或其衍生物、聚b奎嗔 啉(polyquinoxaline)或其衍生物、聚芴或其衍生物等。 上述材料中’較好的是噁二唑衍生物、苯醌或其衍生 物、恩醒或其衍生物、或者8_經基喧琳或其衍生物的金屬 錯合物、聚喹琳或其衍生物、聚喹噁琳或其衍生物、聚芴 19 201002136j i uu^pn.doc 或其衍生物,更好的是2-(4-聯苯基)_5_ (心第三丁 基)-U,44二唾、苯!昆、®醌、三㈣基賴;、2 淋。 土 (電子注入層) 電子注入層如上所述,設於電子频層轉極 或者發光層與陰極之間。電子注入層例如_種 類,可列舉:驗金屬或驗土金屬,或者含有_種^2 =上述金屬的合金,或者上述金屬的氧化物、南化 石厌酸化物,或者上述物質的混合物等。 勿及 上驗金屬或者其氧倾、自化物、魏錄的 列如可列舉:鐘、鈉、卸、勤、铯、氧化鍾、氣化鋰& 二氟化鉀、氧化鉀、氟化鉀、氧化铷、氟化 : 铯、氟化絶、碳酸鐘等。 、’軋化 子,2 =者物、"化物、碳酸化物的例 化舞、氟化』頷,:氧化鎮、氟化鎮、氧 鎂等。 羊貝、氟化鋇、氧化銘、氟化錦、碳酸 化合物、及有屬、金屬氧化物、金屬鹽的有機金屬 可㈣電子注入物化合物、或者其等的現合物亦 積層結具有由兩層或兩層以上積層而成的 藉由蒸鍍、1 可列舉Ll/Ca^。該電子注入芦可 該Ϊ法、鱗法、印刷法等而形成。 了 兔子左入層的膜厚較好的是lnm〜1 _左右。 20 201002136 31002pif.doc U罢極;) 陰極的材料較好的是功 電子的材料及/或導電率 j 作光層注入 高的材料。上雜心;i 6材料及/或可見光反射率較 氧化物、合金材料,具體而言可列舉:金屬ίΪ f; c 化辞(蝴等或者石墨層間化合物、: 屬或屬n::r屬、過渡金 m鋪二=、锡,鏡、銳、辞、-、 金:少一種上述金屬的合 終銘合金等。^金、鋰·鎂合金,·銦合金、 極可視需要而設為翻電極或半透明電極,上述電 ^=例如可列舉:氧化銦、氧化鋅、氧化錫、γγο、肋 聚苯胺或其衍生物、料吩或其衍生物 此外’亦可將陰極設為兩層或兩層以上的積層結構。 另外,有時亦將電子注人層用作陰極。 、陰極的膜厚可考慮到導電率或耐久性而通當選擇,例 如為lOnm〜1〇 ,較好的是,更好的 是 5〇nm〜500 nm。 21 201002136 31002pii.doc (上部密封膜) 當以上述方法形成陰極之後,為了保護具有陽極-發光 層-陰極的基本結構的發光功能部,而形成用於將該發光功 能部雄、封的上部密封膜。該上部密封膜通常具有至少一個 無機層及至少一個有機層。積層數可視需要而決定,基本 上疋無機層與有機層交替地積層。 此外,當使用塑膠基板作為上述基板時,即便發光功 能部被基板及上部㈣膜包覆,與翻基板概,塑膠基 板的氣體及液體的透過性亦更高,有機發光層等的發光物 質更易氧化,且接觸水後更容易劣化,因此於塑膠基板上 積層對氣體及液體的阻擋性較高的下部密封膜,然後,再 於該下部密封膜之上積層上述發光功能部。該下部密封膜 通常是以與上述上部密賊相同的構成、相_材料而形 成。 [有機EL元件的製造方法] 以下,對本發明之有機EL元件的製造方法進行更詳 細的說明。 (陽極形成步驟) 準備由上述的任-種基板材料形成的基板。當使 體及液體祕雜較高_縣板時,視需要而於 ^ 形成下部密封膜。 接著’於的Ϊ板上,使用上述的任-種陽極材料 來對陽極形成圖尔。㊂將該陽極作為透明電極時,如上 述,使用lT〇、IZ〇、氧化锡、氧化鋅、氧化銦、鋅魄 22 201002136 31 UU2pif.doc 合氧化物等的透明電極材料。 =叫利用罐於 然後利用光微影技術將其形成為線(line)狀圖安。、、 (隔離壁形成步驟) 木 2狀陽極形成之後,於形成著陽極的基板上塗佈感 光阻膜積層。該感光性材料(光阻组成物; 2佈’例如可制使用旋轉塗佈機(spin 、棒塗 佈機(barC0ater)、輥塗佈機(r〇llc〇齡)、模 —、凹版塗佈機(gravure c〇ater)、狹縫塗⑽Eu, Dy and other rare earth metals, and the ligand has σ oxadipine, thiadiazole, phenyl pyridine, phenyl benzo imidazole, 喧Lin (qUin〇line) structure and so on. Examples of the polymer material include polyparaphenylene acetylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polydecane derivatives, polyacetylene derivatives, polyfluorene derivatives, and polyvinylcarbazole. A derivative, a pigment or a metal complex-based luminescent material, or the like. a material which emits blue light in the above-mentioned organic light-emitting layer forming material, for example, a phenanthrene-based aromatic derivative, a ruthenium derivative, and the like, a polyethylene derivative, Polyparaphenylene derivative, polyfluorene derivative ^ Temple. The t is preferably a polyelectron ray, a polyparaphenylene derivative or a polyfluorene derivative which is a polymer material. Raw material, Cl Bu 2, the material that emits green light in the material of the light-emitting layer of the machine', for example, the same as the derivative of the sputum, the coumarin derivative: U-p-B-block, Polyfluorene derivatives and the like. Among them: things and so on. '疋 聚 疋 疋 的 的 聚 聚 、 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 'Poly-p-phenylene block derivative, hydrazine U hydrated, better, polyfluorene derivative and the like. # 乂 疋 疋 belongs to the 分子 竹 bamboo organism, poly 苟 derivative and so on. The acetylene and the organic light-emitting layer may also be added to the purpose of improving the luminous efficiency or changing the wavelength of the light, such as the wavelength of light. Examples of the lining agent include an anthracene derivative, a coumarin derivative, a rubrene derivative, a quinone oxime, a squalilium derivative, and a squalilium derivative. The phenanthrene derivative styrene pigment, a tetracene derivative "pyrazolone derivative, decacyclene, phenoxazone, etc." The thickness of the layer is usually from 2 nm to 200 nm. (Cathode-side intermediate layer) As described above, a cathode-side intermediate layer such as an electron injecting layer or an electron transporting layer is laminated between the above-mentioned light-emitting layer and a cathode to be described later. (Electron Transport Layer) The material for forming the electron transport layer may be a known material, and examples thereof include a heart-shaped bamboo organism, anthraquinodimethane or a derivative thereof, benzoquinone or a derivative thereof, Naphthoquinone or its derivative, anthraqUin〇ne or its bamboo organism, tetraoxy onion, ra2曱(raCyan〇anthraquinodimethane) or its derivative, 苟_ (f[u〇 a derivative of ren〇ne, diphenyl dicyanoethylene or a derivative thereof, a diphenoquinone derivative, or a metal complex of 8-meryl quinine or its bamboo organism, poly Yu Lin or a derivative thereof, polyquinoxaline or a derivative thereof, polyfluorene or a derivative thereof, etc. Among the above materials, 'preferably an oxadiazole derivative, a benzoquinone or a derivative thereof, an awake or its a derivative, or a metal complex of querigrin or a derivative thereof, polyquinolin or a derivative thereof, polyquinoxaline or a derivative thereof, polyfluorene 19 201002136j i uu^pn.doc or a derivative thereof What is more, 2-(4-biphenyl)_5_ (heart tributyl)-U, 44 di-saliva, benzene, quinone, hydrazine, tris(tetra) lysine; 2 leaching. Layer) The electron injecting layer is provided between the electron frequency layer rotating electrode or the light emitting layer and the cathode as described above. The electron injecting layer may be, for example, a metal or a soil-checking metal, or may contain a metal or a metal. The alloy, or the oxide of the above metal, the anaerobic material of the south fossil, or a mixture of the above substances, etc., and the column of the metal or its oxygen tilting, self-chemical, and Wei Lu can be cited as: clock, sodium, unloading, Diligent, antimony, oxidized clock, vaporized lithium & potassium difluoride, potassium oxide, potassium fluoride, antimony oxide, fluorination: antimony, fluorination , carbonic acid clock, etc., 'rolling, 2 = object, " compound, carbonate, instantiation, fluorination" 颔, oxidized town, fluorinated town, magnesium oxide, etc. , oxidized melamine, fluorinated bromine, carbonic acid compound, and organic metal having a genus, a metal oxide, or a metal salt. (4) an electron injecting compound, or a composite thereof, or a layered layer having two or more layers It is formed by vapor deposition, and 1 is Ll/Ca^. The electron injecting reed can be formed by a ruthenium method, a scale method, a printing method, or the like. The film thickness of the rabbit left into the layer is preferably about 1 nm to 1 _. 20 201002136 31002pif.doc U strikes;) The material of the cathode is preferably the material and/or conductivity of the work electrons. On the upper side; i 6 material and / or visible light reflectivity compared with oxides, alloy materials, specifically, for example: metal Ϊ Ϊ f; c 辞 ( (butterfly or other graphite intermetallic compounds,: genus or genus n::r genus , transition gold m shop two =, tin, mirror, sharp, remarks, -, gold: less of a combination of the above metal alloys, etc. ^ gold, lithium · magnesium alloy, · indium alloy, extremely visible needs The electrode or the semi-transparent electrode, for example, indium oxide, zinc oxide, tin oxide, γγο, rib polyaniline or a derivative thereof, a phenanthrene or a derivative thereof, and the cathode may be set to two layers or In addition, the electron injecting layer is sometimes used as a cathode. The film thickness of the cathode can be selected in consideration of conductivity or durability, for example, lOnm to 1 〇, preferably More preferably, it is 5 〇 nm to 500 nm. 21 201002136 31002 pii.doc (upper sealing film) After the cathode is formed by the above method, it is formed to protect the luminescent function portion having the basic structure of the anode-light-emitting layer-cathode. The upper portion of the light-emitting function portion is sealed and sealed. The upper sealing film usually has at least one inorganic layer and at least one organic layer. The number of layers can be determined as needed, and the inorganic layer and the organic layer are alternately laminated. Further, when a plastic substrate is used as the substrate, even if the light-emitting function portion is The substrate and the upper part (4) are coated with the film, and the substrate and the substrate are more transparent. The luminescent material such as the organic light-emitting layer is more oxidized and is more likely to deteriorate after contact with water, so that the plastic substrate is laminated. a lower sealing film having high barrier properties against gas and liquid, and then stacking the above-mentioned light-emitting function portion on the lower sealing film. The lower sealing film is usually of the same composition and phase material as the upper thief. [Manufacturing Method of Organic EL Element] Hereinafter, a method of manufacturing the organic EL element of the present invention will be described in more detail. (Anode forming step) A substrate formed of any of the above-described substrate materials is prepared. When the secret is high _ county plate, the lower sealing film is formed as needed on the ^. Next, on the raft, use the above - an anode material to form a catalyst for the anode. When the anode is used as a transparent electrode, as described above, lT 〇, IZ 〇, tin oxide, zinc oxide, indium oxide, zinc lanthanum 22 201002136 31 UU2pif.doc oxide A transparent electrode material, etc. = a tank is used and then formed into a line pattern by photolithography. (, partition wall forming step) After the wood 2-shaped anode is formed, the substrate is formed on the anode The photosensitive resist film is coated thereon. The photosensitive material (photoresist composition; 2 cloth' can be used, for example, by a spin coater (spin, bar coater, roll coater). ), die-, gravure coater (gravure c〇ater), slit coating (10)
相㈣絲進行。接著,對該紘_用光微影 技術來進案化處理,從而形成具有絕緣性的隔離壁。 該隔離壁形成過程中的圖案化處王里中所使用的光罩 ^Photomask) ’是設計出用以獲得使像素電極的開口率儘 里大的像素區域的隔離壁形狀,且基於此而製作的。通常, 由隔離壁tj分成的像素區域成為矩形,但當作為製作對象 的有機EL元件是用於主動矩陣型基板中的元件時,依據 上述標準所設計的像素區域的形狀通常成為如圖i或者圖 2所示的具有多個角部c的特殊形狀。上述具有多個角部ε 的特殊形狀的區域則成為像素區域2 ,由該像素區域2所 規定的像素電極3a的開口率經設計成在進行配線及TFT 兀件的絕緣被覆、以及電極間絕緣等必要絕緣的條件下成 為最大值。 形成上述絕緣性隔離壁1的絕緣性感光性材料,可使 用正型光阻劑、負型光阻劑中的任一種。隔離壁重要的是 201002136 31002pif.doc 具有絕緣性,當不具有絕緣性時,有 的像素間流通電流而產生齡不良有導致相互不同 •構,隔離壁1的感光性材料’具體而言,例如可列 胺系:丙烯酸樹脂系、酚酸清漆樹脂系的各感 光性化合物。此外,為了提高有機EL元件的顯干 該感光性材料中亦可含有表現出遮光性的材料。13 、 -為了使該絕緣性隔離壁i的表面具有斥墨性,亦可向 隔離壁形成㈣紐材料幡加斥紐物f。或者,亦可 於形成絕緣㈣離壁之後,於其表面覆蓋斥墨性物質了藉 此使隔離壁表面具有斥墨性。該斥墨性較好的是對後述^ 中間層用的油墨、及有機發光制的油墨均具有排斥性。 向上述感光性材料中添加斥墨性物質時使用的斥黑性 化合物,可使_如⑪氧系化合物或者含氟化合物。ς些 斥墨性化合物對後述之有機發光層形成時所使用的有機發 光油墨(塗佈液)、及用於電洞傳輸層等中間層的有機材料 油墨(塗佈液)兩者均表現出斥墨性,故而可適宜使用。 、+在隔離壁1形成之後於隔離壁1的表面上形成斥墨性 被膜的方法,例如可列舉:將含有斥墨性成分的塗佈^塗 ,於隔離壁表面的方法、藉由將隔離壁表面的有機材料的 Β此基以氟取代而對表面進行改性的方法、使斥墨性成分 氣化後堆積於隔離壁表面的方法等。具體而言,$列舉將 Cp4氣體用作導入氣體的電漿處理。與基板及電極等相 比’有機物的隔離壁容易被CF4氣體氟化,可藉由電漿處 理來選擇性地對隔離壁表面進行斥墨化處理。 24 201002136 j i wuzpif.doc (陽極側中間層形成步驟) 電洞 於絕緣性隔離壁形成 傳輸層等的有機材料屏^視而要而升y成上迷的 材4層(陽極側中間層)。 險和侧中間層的成膜方法 的方法。科,就黏合綱齡溶液而成膜 成膜的方法。1材糾言’例如可列舉由溶液而The phase (four) wire is carried out. Next, the 纮_using photolithography technique is used to carry out the processing to form an insulating barrier wall. The mask "Photomask" used in the patterning portion of the partition wall forming process is a partition wall shape designed to obtain a pixel region in which the aperture ratio of the pixel electrode is as large as possible, and is produced based on this. In general, the pixel region divided by the partition wall tj becomes a rectangle, but when the organic EL element to be fabricated is used for an element in an active matrix type substrate, the shape of the pixel region designed according to the above criteria generally becomes as shown in FIG. A special shape having a plurality of corners c as shown in FIG. The region of the special shape having the plurality of corner portions ε is the pixel region 2, and the aperture ratio of the pixel electrode 3a defined by the pixel region 2 is designed to be insulated and covered between the wiring and the TFT, and between the electrodes. The maximum value is obtained under the condition of necessary insulation. Any of the positive photoresist and the negative photoresist can be used as the insulating photosensitive material forming the insulating partition wall 1. It is important that the partition wall is 201002136 31002pif.doc. It is insulative. When there is no insulation, some of the pixels flow current and the age is different. The photosensitive material of the partition wall 1 is specifically different. The conjugated amine system is a photosensitive compound of an acrylic resin type and a phenolic acid varnish resin type. Further, in order to improve the drying of the organic EL element, the photosensitive material may contain a material exhibiting light blocking properties. 13 - In order to impart ink repellent properties to the surface of the insulating partition wall i, a (four) material may be added to the partition wall to add the repellent f. Alternatively, after the insulating (four) is formed from the wall, the surface of the insulating wall is covered with an ink repellent material, whereby the surface of the partition wall has ink repellency. The ink repellency is preferably such that it is repellent to both the ink for the intermediate layer described later and the ink for organic light emission. The blackening-reducing compound used when the ink repellent material is added to the photosensitive material may be, for example, an 11-oxygen compound or a fluorine-containing compound. The ink repellent compound exhibits both an organic light-emitting ink (coating liquid) used for forming an organic light-emitting layer to be described later and an organic material ink (coating liquid) used for an intermediate layer such as a hole transport layer. It is suitable for use because it is ink repellent. And a method of forming an ink repellent film on the surface of the partition wall 1 after the partition wall 1 is formed, and for example, a method of applying a coating containing an ink repellent component to the surface of the partition wall, by isolating A method of modifying the surface of the organic material on the wall surface by fluorine substitution, a method of vaporizing the ink repellent component, and depositing on the surface of the partition wall. Specifically, $ enumerates the use of Cp4 gas as a plasma treatment for introducing gas. The partition wall of the organic material is more easily fluorinated with the CF4 gas than the substrate and the electrode, and the surface of the partition wall can be selectively subjected to ink repellent treatment by plasma treatment. 24 201002136 j i wuzpif.doc (Anode-side intermediate layer forming step) The hole is formed in the insulating partition wall to form an organic material such as a transport layer, which is raised into a layer 4 (anode-side intermediate layer). The method of film formation of the dangerous and side intermediate layers. Branch, a method of forming a film by bonding a solution of a solution. 1 material ambiguity' can be exemplified by a solution
芦二時使用的溶劑只要能溶解上述陽極侧中間 曰用的材騎可,並鋪職制。上述溶 氣仿、二氯甲烷、二蔔 / 〜平. 一氯烷專虱糸溶劑,四氳呋喃等醚系 甲本、H等芳香族煙系溶劑,丙酮 = 乙酸⑽、乙酸丁_、乙基溶纖劑乙酸; 寻酯糸溶劑。 、上述由溶液成朗方法,例如可列舉:利用溶液的旋 轉塗佈(spm Coat)法、洗鑄(casting)法、微凹版塗佈 (micro-gravure coat)法、凹版塗佈法、棒塗佈法、輕塗 佈法、線棒塗佈(wirebarc〇at)法、浸潰塗佈法、狹縫塗 佈(slit coat)法、毛細管塗佈(capiilary⑶泔)法、喷塗 (spray coat)法、噴嘴塗佈(nozziec〇at)法等的塗佈法, 及凹版印刷、網版(screen)印刷法、柔版(flex〇)印刷 法、套版(offset)印刷法、反轉印刷法、噴墨印刷法等的 印刷法等的塗佈法。自容易形成圖案的方面考慮,較好的 是凹版印刷法、網版印刷法、柔版印刷法、套版印刷法、 反轉印刷法、喷墨印刷法等的印刷法,其中,特別好的是 25 201002136 31UU2pii.doc 於形成後述之有機發光層時用於塗佈有機發光油墨的凸麻 印刷。 所混合的高分子黏合劑較好的是不會嚴重阻礙電荷得 輸的黏合劑丄另外,對可見光的吸收並不強的黏合劑適多 使用。上述高分子黏合劑,例如可列舉:聚碳㈣、聚兩 稀酸醋、聚丙稀酸甲s旨、聚甲基丙烯酸甲醋、聚苯乙稀、 聚氣乙烯'聚矽氧烷等。 當利用上述塗佈方法將㈣液塗佈於基板整個面> %,有時塗佈液會㈣於上相_上,但糾,隔離寥 士液會被隔離壁的表面排斥,而落入由隔離壁· m域内,從而於各像素區域内形成為塗佈膜。斧 素區域内的塗佈膜藉由乾燥而成 揮其功能。 (有機發光層形成步驟) 接著,實施有機發光層的形成步驟。 的成於由上述_-== 使用r 像素區域㈣麵發光油墨,拆 使用=印刷法。該凸版印刷更好的是柔版印刷。 兩二二凸具體順序較好的是使用下- 述較好的凸版印獅第—方法巾,上述有機菸#、由 墨令使用彿點溫度大於等於贿的,先油 的寬度尺寸。具㈣言,如圖3所示,像素區域 田為了於形成有圖 26 201002136 3IUU2pif.doc 案的電極(陽極或者陰極中的任一個)3的基板W 所述形成隔離壁i所獲得的像素區域2塗佈有機 Μ 4’而進行凸版印刷時,將使用的凸版^的凸部^凸= ❿的寬度尺寸i】設定成上述像素區域2的寬度尺寸 99%〜50%。此處.,所謂凸面12a的寬 序按壓至被印刷物(基板)的方向垂直的方向上凸的版^依 例如,當凸版11為圓筒狀且圍繞軸線旋轉時,上 =的寬度是指與該凸版u的關方向垂直_線方向上 、見又。另外’所謂像素區域2的寬度是指 墨的印刷方向垂直的寬度。 ’機發九油 u 當使用含有沸點大於等於200t的高濟點溶劑來 有機發光油墨4之溶劑的乾燥速度較慢的柔版印刷用油黑 時,如上所述,將凸版印刷版„的凸面12a的寬度尺二 定成小於像素區域2的寬度尺寸L〗,如圖4所示,使^ ,凸版印刷版11將有機發光油墨4塗佈於像素區域2 者於凸版印刷版11的凸面12a上的有機發光油墨4接觸於 像素區域2的底面,且由像素區域2的底面與上述凸面12a 夾住,如圖5所示,被按壓擴散於包括所有角部^在 整個像素區域2。結果,遍及整悔素區域2上均塗 油墨4。錢’如圖6所示’當凸版印刷版11離開基板, 則油墨4的表面藉由表面張力而變得平緩。而且,即使 由之後的乾燥(溶劑的蒸發),油墨4的黏度亦會增高,因曰 此油墨4與像素區域2的接觸線幾乎不移動,而形成良好 的有機發光層。 27 201002136 31U02pit'.doc 上述較好的凸版印刷的第一方法中’上述有機發光油 墨中使用沸點温度低於200°C的溶劑,而且將凸版印刷中 使用的版的凸面的寬度尺寸設定成大於上述像素區域的寬 度尺寸。具體而言,如圖7所示,將凸版印刷中使用的版 21的凸部22的凸面22a的寬度尺寸丨2設定成大於上述像 素區域2的寬度尺寸,且小於{(上述寬度尺寸Li) + (上述隔離壁1的寬度尺寸L2) /2}。 當使用含有沸點低於200〇C的低沸點溶劑來作為有機 發光油墨4之溶劑的乾燥速度較快的有機發光油墨時,如 上所述’將凸版印刷版21的凸面22a的寬度尺寸設定成大 於像素區域2的寬度尺寸Ll,然後如圖8所示,使用上述 凸版印刷版21將有機發光油墨4塗佈於像素區域2。附著 於凸版印刷版21的凸面22a上的有機發光油墨4接觸於像 素區域2的底面,且被像素區域2的底面及上述凸面2仏 夾住,如圖5所示,被按壓擴散於包括所有角部e在内的 整個像素區域2。結果,與上述第—方法相 區域2均塗滿油墨4。 王们像素 孩万法中,與上述第一方法不同,版21的凸面2 i的生塗佈至像素區域2之前成為半乾燥狀 心口此油墨4的延展性下降,故而將凸面2 尺寸丨2設定成大於像素區域2的寬度尺寸Μ。 I度 於半乾燥狀態㈣至像素區域2上的油墨 &即便 降’亦因凸面22a較寬而將油墨4按壓擴散於敕:士下 域2。然後,於半乾燥狀態下高黏度的油墨 28 201002136 j _zpii.doc 變緩,故而溶劑蒸發時接觸線幾 的有機發光層。 h衫動,從而形成良好 上述有機發光油墨是藉由將有機笋 地分散於溶劑中而製備。溶解或分材料溶解或穩定 劑,例如可列舉:甲笨、二1、欲該有機發光材料的溶 基綱、甲基異丁基酉同、環己酮等的甲謎、甲基乙 合溶劑。其中,甲苯、―早獨洛劑或者其等的混 對有機發光材料具有良好_:甲香族有機溶劑 上述溶劑中,沸點大於等於20〇m。… -(^ΐιη)^己基苯等,她_2⑻t滿 -甲本、苯甲峻等。上述第]〜本 發光油墨的溶劑中所占的「沸點方法中使用的有機 的調配量,可根據所使用 光材= 20〇c的溶劑」 狀等條件而適_切枓或像素區域的形 ο 用的有機發;二:所=第:凸版印刷方法中使 劑」的調配量,可拼的沸點低於200°C的溶 的形狀等條件而適當決定。用的有機發紐料或像素區域 此外,有機發光油墨中,市可、目+# 劑:氧節劑、紫二 加界面活性 凸版印刷中;=====好的是使用上述 201002136 31002pif.doc 例如,當凸版為圓筒狀且圍繞軸線旋轉時,該凸版的圓周 方向相當於依序按壓至被印刷物上的方向,各凸面使上述 圓周方向與各凸面的長邊方向大致一致,而沿著圓周方向 配置成條紋狀。 另外,於有機發光層形成步驟中,較好的是將與 相對應的多種油墨作為上述有機發光油墨而選擇性地塗佈 於規定的隔離壁内,從而分別形成至少構成紅、綠、該三 的有,,層。具體而言,例如可利用凸版印“ 有機發光油墨,接著利用凸版印刷來塗 It ϊ 的有機發光油墨,然後再利用凸版印刷來塗 綠、梦亦从女地 戈者亦可使分別發出紅、 轉印;光油墨附著於凸版的規定凸面上,進而 轉印有機發光油墨。 < (陰極側中間層形成步驟) 房式:上述有機發光層形成之後’視需要而形成電子傳輸 曰或电子>主入層等陰極側中間層。 ‘=側=層的形成方法於電子傳輸層的情形時並 艮制,就低分子電子傳輸材料而言,可例二V 末的真空蒸鐘法、或去 」例不利用叔 而就向分子電子傳輸材料而言,可、勺方法 用4=。!输或者炫融狀態成膜時,刪 用I 由洛液形成電子傳輸層的成膜方、X播 〃、上述由溶液形成電洞傳輪層 、彳 法。 7珉瞑方法相同的成膜 30 201002136 ^ 1 uuzpif.doc 另外’於電子注入層的情形時,可使用例如蒸链法、 濺鍍法、印刷法等而形成。 (陰極形成步驟) 陰極是使用上述的任一種材料,利用例如真空蒸鍍 法、濺鍍法、化學氣相沈積(Chemical Vapor Deposition, CVD)法、離子電鍵法、雷射剝蝕法(iaserabiati〇n)法、 以及對金屬薄膜進行壓接的層壓(laminate)法等而形成。The solvent used in the second phase of the reed can be used as long as it can dissolve the material used for the middle side of the anode side. The above-mentioned dissolved gas imitation, methylene chloride, dibu/pentane, monochloropropane special solvent, tetrahydrofuran and other ether-based methyl esters, H and other aromatic flue-based solvents, acetone = acetic acid (10), acetic acid D, _ B Base cellosolve acetic acid; ester-seeking solvent. The above method for forming a solution includes, for example, a spin coating method using a solution, a casting method, a micro-gravure coating method, a gravure coating method, and a bar coating method. Fabrication, light coating method, wire bar coating method, impregnation coating method, slit coating method, capillary coating method, spray coating Coating method such as method, nozzle coating (nozziec〇at) method, gravure printing, screen printing method, flex printing method, offset printing method, reverse printing method A coating method such as a printing method such as an inkjet printing method. From the viewpoint of easy formation of a pattern, a printing method such as a gravure printing method, a screen printing method, a flexographic printing method, a plate printing method, a reverse printing method, an inkjet printing method, or the like is preferable, and particularly preferable It is 25 201002136 31UU2pii.doc A embossing printing for coating an organic luminescent ink when forming an organic light-emitting layer described later. The polymer binder to be mixed is preferably a binder which does not seriously hinder the charge generation. In addition, a binder which does not strongly absorb visible light is suitably used. Examples of the polymer binder include polycarbo (four), polydiacetic acid vinegar, polyacrylic acid methyl s, polymethyl methacrylate, polystyrene, and polystyrene ethylene polyoxyalkylene. When the (four) liquid is applied to the entire surface of the substrate by the above coating method, the coating liquid may (4) be applied to the upper phase, but the barrier liquid may be repelled by the surface of the partition wall and fall into the surface. The coating film is formed in each of the pixel regions by the partition wall and the m domain. The coating film in the axe area is dried by its function. (Organic Light Emitting Layer Forming Step) Next, a step of forming an organic light emitting layer is carried out. The result is from the above _-== using the r pixel area (four) surface luminescent ink, and the use of the = printing method. The relief printing is more preferably flexographic printing. The specific order of the two two two convex is better to use the lower-described preferred letterpress lion-method, the organic smoke #, the ink used by the ink point is greater than or equal to the bribe, the width of the first oil. (4), as shown in FIG. 3, the pixel area obtained by forming the partition wall i for the substrate W on which the electrode (the anode or the cathode) of the electrode of FIG. 26 201002136 3IUU2pif.doc is formed is formed. 2 When the organic enamel 4' is applied and the relief printing is performed, the width dimension i of the convex portion of the relief plate used is set to be 99% to 50% of the width dimension of the pixel region 2. Here, the wide-order pressing of the convex surface 12a is convex to the direction perpendicular to the direction of the printed matter (substrate). For example, when the relief 11 is cylindrical and rotates about the axis, the width of the upper= means The closing direction of the relief u is perpendicular to the _ line direction, see again. Further, the width of the so-called pixel region 2 means a width perpendicular to the printing direction of the ink. '机发九油u When using a high-point solvent having a boiling point of 200t or more to dry the solvent black of the organic light-emitting ink 4 with a slow drying speed, as described above, the relief of the relief printing plate „ The width rule 2 of 12a is set to be smaller than the width dimension L of the pixel region 2, and as shown in FIG. 4, the relief printing plate 11 applies the organic light-emitting ink 4 to the pixel region 2 to the convex surface 12a of the relief printing plate 11. The upper organic light-emitting ink 4 is in contact with the bottom surface of the pixel region 2, and is sandwiched by the bottom surface of the pixel region 2 from the convex surface 12a, as shown in FIG. 5, and is pressed and diffused to include all the corner portions in the entire pixel region 2. The ink 4 is applied over the entire repentant area 2. The money 'as shown in Fig. 6' When the relief printing plate 11 leaves the substrate, the surface of the ink 4 becomes gentle by the surface tension. Moreover, even after drying (Evaporation of the solvent), the viscosity of the ink 4 is also increased because the contact line of the ink 4 and the pixel region 2 hardly moves to form a good organic light-emitting layer. 27 201002136 31U02pit'.doc The above-mentioned better relief printing First In the method, a solvent having a boiling point temperature of less than 200 ° C is used in the above organic light-emitting ink, and the width dimension of the convex surface of the plate used in the relief printing is set to be larger than the width dimension of the pixel region. Specifically, as shown in FIG. The width dimension 丨2 of the convex surface 22a of the convex portion 22 of the plate 21 used in the relief printing is set to be larger than the width dimension of the pixel region 2, and is smaller than {(the above-described width dimension Li) + (the width of the above-mentioned partition wall 1) Size L2) /2} When a low-boiling solvent containing a boiling point of less than 200 〇C is used as a solvent for drying the organic light-emitting ink 4, the convexity of the relief printing plate 21 is as described above. The width dimension of 22a is set larger than the width dimension L1 of the pixel region 2, and then the organic light-emitting ink 4 is applied to the pixel region 2 using the above-described relief printing plate 21 as shown in Fig. 8. Attached to the convex surface 22a of the relief printing plate 21. The organic light-emitting ink 4 is in contact with the bottom surface of the pixel region 2, and is sandwiched by the bottom surface of the pixel region 2 and the convex surface 2仏. As shown in FIG. 5, it is pressed and diffused to include all the corners e. The entire pixel area 2 is obtained. As a result, the first method phase region 2 is coated with the ink 4. In the pixel method, unlike the first method described above, the convex surface 2 i of the plate 21 is applied to the pixel region 2 The ductility of the ink 4 is reduced to a semi-dry core, so the convex dimension 2 is set to be larger than the width dimension of the pixel region 2. The degree of ink in the semi-dry state (four) to the pixel region 2 is lowered. 'Because the convex surface 22a is wider, the ink 4 is pressed and diffused to the 敕: 士下域 2. Then, in the semi-dry state, the high-viscosity ink 28 201002136 j _zpii.doc is slowed down, so the solvent is evaporated when the contact line is organic Light-emitting layer. h shirting, thereby forming well The above organic light-emitting ink is prepared by dispersing organic bamboo shoots in a solvent. Examples of the dissolution or dispersion of the material or the stabilizer include, for example, a solution of a solvent such as a solvent, a methyl isobutyl hydrazine or a cyclohexanone. Among them, the mixed organic light-emitting material of toluene, "previously sulcata" or the like has a good _: a fragrant organic solvent. In the above solvent, the boiling point is 20 〇m or more. ... - (^ΐιη) ^ hexyl benzene, etc., her _2 (8) t full - A Ben, Benja Jun and so on. In the solvent of the above-mentioned luminescent ink, the amount of the organic compound used in the boiling point method can be appropriately determined depending on conditions such as the solvent used for the light material = 20 〇c or the shape of the pixel region. ο Organic hair; 2: ==: The amount of the agent in the letterpress printing method can be appropriately determined by the conditions such as the shape of the melt at a boiling point of less than 200 °C. Organic hair or pixel area used in addition, in the organic light-emitting ink, the city can be, the target + # agent: oxygen agent, purple two plus interface active letterpress printing; ===== good use the above 201002136 31002pif. For example, when the relief is cylindrical and rotates about the axis, the circumferential direction of the relief corresponds to the direction of pressing onto the object to be printed, and each convex surface makes the circumferential direction substantially coincide with the longitudinal direction of each convex surface. The circumferential direction is arranged in a stripe shape. Further, in the organic light-emitting layer forming step, it is preferred that a plurality of corresponding inks are selectively applied as the organic light-emitting ink to a predetermined partition wall to form at least red, green, and the third. There are, layers. Specifically, for example, a letterpress printing "organic luminescent ink, followed by letterpress printing to coat the ITO organic luminescent ink, and then using letterpress printing to smear green, and dreams from the female genre may also cause red, respectively. Transfer; the light ink adheres to the predetermined convex surface of the relief, and further transfers the organic light-emitting ink. < (Cathode side intermediate layer forming step) Room type: After the above organic light-emitting layer is formed, 'Electronic transmission electrons or electrons are formed as needed> The cathode side intermediate layer such as the main entry layer. The method of forming the '= side layer is formed in the case of the electron transport layer, and in the case of the low molecular electron transport material, the vacuum steaming method at the end of the V, or To "do not use the uncle to the molecular electron transport material, the method of scooping 4 =. ! In the case of film formation in the state of being transferred or glazed, the film formation side of the electron transport layer formed by the Lok solution, the X seeding, the above-mentioned hole forming layer by the solution, and the ruthenium method are deleted. The film formation method of the same method is the same as in the case of the electron injection layer, for example, by a vapor chain method, a sputtering method, a printing method, or the like. (Cathode Formation Step) The cathode is formed using any of the above materials by, for example, vacuum evaporation, sputtering, chemical vapor deposition (CVD), iontophoresis, and laser ablation (iaserabiati〇n). The method is formed by a method of laminating a metal thin film or the like.
如上所述,當陰極形成之後,為保護具有陽極_發光層 -陰極的基本結構的發光功能部,而形成上部密封膜。該上 部密封膜視需要而由至少一個無機層及至少一個有機層構 成。該些層的積層數可視需要而決定,基本上是無機層與 有機層交替地積層。 〃 、本實施形態中的有機EL元件,可用作面狀光源、段 式顯不裝置(segment display device )及點矩陣(d〇t matrix ) 顯示裝置的光源、以及液晶顯示裝置的背光源(㈣As described above, after the cathode is formed, an upper sealing film is formed to protect the light-emitting function portion having the basic structure of the anode-light-emitting layer-cathode. The upper sealing film is composed of at least one inorganic layer and at least one organic layer as needed. The number of layers of these layers can be determined as needed, and basically the inorganic layer and the organic layer are alternately laminated.有机 The organic EL device of the present embodiment can be used as a light source for a planar light source, a segment display device, a dot matrix display device, and a backlight of a liquid crystal display device ((4)
段弋:二^二:成王圖案狀發光的有機el元件來作為 門面狀光源的表面上 :部位的有機物層形成為極厚蚊其 將陽極及陰極中的至少任-電極形成為圖 31 201002136 31W2pil.doc 法。利用該些方法形成呈圖案狀發光的有機_ 、 且以能對若干電極選擇性地施加電壓的方式進行二j 此,亦能實現可顯示數字、文字及簡單符號等的段式 裝置°為了將上述有機a元件作為點轉顯示裝置的来' 源,例如只要將陽極及陰極分別形成為條紋狀,且以自 層方向的-方觀察時其等成相互正交的方式配置即可。、 此外,為了實現能進行部分彩色顯示、多色 (multi-c〇l〇r)顯示的點矩陣顯示裝置,例如只要採用區 分塗佈發光色不同的多種發光材料的方法、以及使用彩色 濾光片(color filter)以及螢光轉換濾光片等的方法即^。 點矩陣顯示裝置可為被動(passive)驅動,亦可與TF丁等 組合而主動驅動。 上述顯示裝置可用作電腦(c〇mputer )、電視 (tdeV1S1〇n )、移動終端、行動電話、汽車導航(car navigation )、攝像機(video camera)的取景器(脇打) 等的顯示裝置。 進而,上述面狀光源是較薄的自發光型光源,可用作 液晶I頁示裝置的背光源、或者面狀的照明用光源。另外, 亦可藉由使用可撓性(f|exibIe)基板而用作曲面狀的光源 或顯示裝置。 實施例 以下,對本發明的實施例進行說明,但以下所述的實 靶例僅疋用於對本發明進行說明的較佳例示,並非對本發 明進行任何限定。 32Duan Wei: Two ^ two: the organic EL element that lights up into a pattern of the king as the surface of the facade light source: the organic layer of the part is formed into a very thick mosquito, which forms at least any of the anode and the cathode as FIG. 31 201002136 31W2pil.doc method. By using these methods to form the organic light in the form of a pattern, and to selectively apply a voltage to a plurality of electrodes, it is also possible to realize a segment device capable of displaying numbers, characters, simple symbols, etc. As the source of the dot-to-earth display device, the organic a-element may be formed by, for example, forming an anode and a cathode in a stripe shape, and arranging them so as to be orthogonal to each other when viewed from the layer direction. Further, in order to realize a dot matrix display device capable of performing partial color display and multi-color display, for example, a method of distinguishing a plurality of types of light-emitting materials having different light-emitting colors, and using color filter are used. The method of color filter and fluorescent conversion filter is ^. The dot matrix display device can be a passive drive or can be actively driven in combination with a TF or the like. The display device described above can be used as a display device such as a computer (c〇mputer), a television (tdeV1S1〇n), a mobile terminal, a mobile phone, a car navigation, a viewfinder of a video camera, and the like. Further, the planar light source is a thin self-luminous light source, and can be used as a backlight of a liquid crystal I page display device or a planar light source for illumination. Alternatively, it can be used as a curved light source or display device by using a flexible (f|exibIe) substrate. EXAMPLES The examples of the present invention are described below, but the following examples are intended to illustrate the preferred embodiments of the present invention and are not intended to limit the invention. 32
201002136 iuu^pif.d〇C 以下所示的實施例中是以主 ^ % ^ -fc^ Αό -ir 車支有機EL元件作201002136 iuu^pif.d〇C The following example shows the main ^ % ^ -fc^ Αό -ir vehicle-mounted organic EL element
為對象而貫細,但本每明之有機EL 限定於該驅動方式的有機EL 〕臬以方法並不 矩陣型等其他驅動方式的有機^件元件職亦可適用於被動 (實施例1 ) (基板的準備及陽極的形成) 首先,準備於200 mm (縱)X200酿!(横)x0 7匪 (厚)的透明玻璃板上形成著TFT陣列及陽極(^電 ^基板。形成ΠΧ)薄膜,進而進行圖案化處理,從而形成 i卞紋狀陽極。陽極的重複間隔(間距)為⑽鋒,陽極 (線寬)為70 相對於此,陽極間的間隔(間 隙見度)為10鋒(線/間隙=7〇雖/1〇輝)。自基板 的厚度方向的-方婦時,形成著像素的像耗域,於沿 们方向延伸的ιτο薄膜上沿著上述一個方向且隔著規定 的間隔而設置成島狀。 (隔離壁的形成) 接著,於上述基板的整個面上,使用旋轉塗佈法塗佈 正型光阻(東京應化工業(股)製造,商品名「OFPR-800」), 使該塗膜乾燥後,形成膜厚為1 //m的光阻層。 、然後,將於覆蓋TFT元件及其他配線的條件下使像素 區域達到最大的方式而設計的光罩,配置於上述光阻層之 上’使用對準曝光機(Alignment Exposure Machine)(大 日本網屏製造公司製造,商品名「MA1300」)且經由上述 41¾向上述光阻層照射紫外線(曝光步驟)。 33 201002136 31UU2pii.doc 、,fe上述曝先步驟之後,使用光阻 業(股)製造,商品名「_·3 ^ 光部(顯影步驟)。 」)除去上返先阻層的曝 接著,將上述玻璃基板置於加熱板(h ===㈣,使增觸蝴完全加熱固 猎由上述一糸列的光微影步驟而形成包圍形 的像素區域的隔離壁(有機絕緣層),於該隔離壁内部露出 陽極。所得的隔離壁線的寬度尺寸為20 ,高度尺寸 為1 #m。另外,各像素區域是具有多個角部且最大寬度 50 //mx最大長度150 /zm的特殊形狀。 置(SAMC0 對隔離壁進 然後’使用利用CF4氣體的真空電漿穿 InternationaUnc.製造,商品名「虹£_2〇〇乙」) 行斥液處理。 (陽極側中間層的形成) 接著,製備聚(3,4-二氧乙基嗟吩)/聚苯乙稀石黃酸 公司製造,商品名「BaytronP AI4083」)的懸浮液,且使 用0.2 //m的薄膜過濾器(membrane flher)來對該懸浮 液進行過濾。使用喷嘴塗佈法將該過濾液塗佈於上述^素 區域。接著’將該塗佈層以20〇t加熱處理2〇分鐘,從而 形成厚度為60 nm的電洞注入層。 (有機發光層的形成) 將作為有機發光材料的雨分子發光材料(公 司製造,商品名「RP158」)溶解於由苯甲醚及環己美苯以 34 201002136 jiuuzpif.doc 7 . 3的重量比混合而成的混合溶劑中,從而 油墨(高分子發光材料的濃度··〗重量百分比^卜x 使用的混合溶劑中的環已基苯的濟點大於等於n 苯甲醚的沸點低於2〇〇。〇。 ' L 且 將所使用的柔版印刷版(材質:聚醋系樹月旨’凸版凸 二的條紋形狀之凸部的凸面的寬度尺 開口部的寬度)5。㈣60%,即3。鋒== 且=ίο版)印:裝置(曰本寫真印刷公司製造,商品名 上1娜,以伽著於凸版的凸部上的 ^有機發光油墨對準像素區域,從而進行印刷 :像:上述凸面的按壓而擴散,且特殊形狀 即便===面均被有機發光油墨覆蓋’ 關於上述漏塗部的有無, :::製造’商品名「〇_二鏡:率= 認。於各^素區域内的有機發光層的形狀而進行確 及陽極侧“機發光油墨_分像素區域的隔離壁 角部在二光層成膜於包括所有 (陰極的形成) 舞來上、ί有機發光層^上’以ι〇0 α的厚度蒸錢 衣成,、有底部發光(bottom emission)結 35 201002136 31002pif.doc 構的有機EL元件。 當使以上述方法而獲得的有機EL元件發光時,可確 整個發光面的發光強度都均句,且私前產品相比, 單位面積的發光量亦得到提高。 (實施例2) /自準備基板起,直至藉由形成隔離壁來形成像素區域 而开/成電洞庄入層為止,均以與上述實施例相同的方式實 施,故而省略該些步驟的詳細說明,以下,對之後的有機 發光層的形成及後續步驟進行說明。 (有機發光層的形成) _ ,將作為有機發光材料的高分子發光材料(§_触公 司,造’商品名「RP158」)溶解於由二甲苯單獨構成的溶 劑中,而製成有機發光油墨(濃度:丨重量百分比,黏度: 10 cp)。此外,所使用的二甲苯的濟點低於2〇〇它。 立f所使用的柔版印刷版(材質:聚酉旨系樹脂,凸版凸 部的高度:100 /zm)的條紋形狀之凸部的凸面的寬度尺 寸'^疋成大於上述各像素區域的最大寬度(像素 口部的寬度)5〇_的60轉。使用該凸版,且】^ ,印刷I置(日本寫真印刷公司製造,商品名「舰_ =行位置調整,以使_於凸版的凸部上的上述有機^ 墨對準像素區域的電極露出部,從而進行印刷 ^有機發光油墨受到上述凸面的按壓而擴散,特殊形狀 、像素區域内的像素電極整個面均被有機發光油 即便乾燥後亦未產生漏塗部。 设幾, 36It is fine for the object, but the organic EL of the present invention is limited to the organic EL of the driving method. The organic component of the other driving methods such as the method and the matrix type can also be applied to the passive (Example 1) (substrate) Preparation and anode formation) First, prepare for 200 mm (vertical) X200! On the transparent glass plate of (horizontal) x0 7 匪 (thickness), a TFT array and an anode (a substrate) were formed, and further patterned to form an i-shaped anode. The repeating interval (pitch) of the anode is (10) front, and the anode (line width) is 70. In contrast, the interval between the anodes (viscosity) is 10 (line/gap = 7 / / 1 〇 )). When the image is in the thickness direction of the substrate, the image consumption area of the pixel is formed, and the film is formed in an island shape along the one direction and at a predetermined interval in the film ιτο extending in the direction. (Formation of the partition wall) Next, a positive-type resist (manufactured by Tokyo Ohka Kogyo Co., Ltd., trade name "OFPR-800") is applied to the entire surface of the substrate by a spin coating method to form the coating film. After drying, a photoresist layer having a film thickness of 1 //m was formed. Then, a photomask designed to maximize the pixel area under the condition of covering the TFT element and other wirings is disposed on the photoresist layer. Using an Alignment Exposure Machine (Daily Network) The screen manufacturing company, trade name "MA1300"), irradiates the photoresist layer with ultraviolet rays via the above-mentioned 412⁄4 (exposure step). 33 201002136 31UU2pii.doc ,, after the above exposure steps, using the photoresist industry (stock), the trade name "_·3 ^ light part (development step).") remove the upper return layer of the exposure layer, will The glass substrate is placed on a heating plate (h === (4), so that the sensitization butterfly completely heats up the partition wall (organic insulating layer) of the surrounding pixel region by the light lithography step of the above-mentioned array, and the isolation is performed. The anode is exposed inside the wall. The resulting barrier wall has a width dimension of 20 and a height dimension of 1 #m. In addition, each pixel region is a special shape having a plurality of corners and a maximum width of 50 // mx and a maximum length of 150 /zm. Set (SAMC0 enters the partition wall and then uses a vacuum plasma using CF4 gas to be manufactured by Internationa Unc., trade name "Hong Ba 2〇〇 B"). It is treated with a liquid repellency. (Formation of the anode side intermediate layer) Next, preparation of a polymer A suspension of (3,4-dioxyethyl porphin)/polystyrene yellow acid company, trade name "Baytron P AI4083", and using a 0.2 //m membrane flher The suspension was filtered. This filtrate was applied to the above-mentioned region by a nozzle coating method. Next, the coating layer was heat-treated at 20 Torr for 2 Torr to form a hole injection layer having a thickness of 60 nm. (Formation of organic light-emitting layer) A rain molecular light-emitting material (manufactured by the company, trade name "RP158") as an organic light-emitting material was dissolved in a weight ratio of anisole and cyclohexylbenzene to 34 201002136 jiuuzpif.doc 7.3 In the mixed solvent, the ink (concentration of the polymer luminescent material · · · weight percentage ^ ^ x The ratio of the cyclohexylbenzene in the mixed solvent used is greater than or equal to n The boiling point of the anisole is less than 2〇 〇.〇. ' L and the flexographic printing plate used (material: the width of the width of the opening of the convex surface of the convex portion of the stripe convex shape of the convex embossed convex) is 5. (4) 60%, that is 3. Front == and = ίο version) Printing: The device (manufactured by Sakamoto Photo Printing Co., Ltd., the product name is 1 Na, and the organic light-emitting ink glazed on the convex portion of the relief plate is aligned with the pixel area to perform printing: For example, the above-mentioned convex surface is diffused by the pressing, and the special shape is covered by the organic light-emitting ink even if the === surface. ' Regarding the presence or absence of the above-mentioned leak-coating portion, :::Manufacture' product name "〇_二镜: rate = recognition. The shape of the organic light-emitting layer in each region is determined And the anode side "machine illuminating ink _ sub-pixel area of the corner of the partition wall in the two-photo layer film formation on all including (the formation of the cathode) dance, ί organic light-emitting layer ^ on the thickness of ι〇0 α When the organic EL element obtained by the above method is caused to emit light, it is confirmed that the luminous intensity of the entire light-emitting surface is uniform, and the light-emitting intensity of the entire light-emitting surface is uniform. Compared with the private product, the amount of light per unit area is also improved. (Embodiment 2) / From the preparation of the substrate, until the pixel region is formed by forming the partition wall, and the hole is formed into the layer, Since the above-described embodiment is carried out in the same manner, the detailed description of the steps will be omitted. Hereinafter, the formation of the subsequent organic light-emitting layer and the subsequent steps will be described. (Formation of an organic light-emitting layer) _ , a polymer which is an organic light-emitting material The luminescent material (§_contact company, manufactured by the trade name "RP158") was dissolved in a solvent composed of xylene alone to prepare an organic luminescent ink (concentration: 丨 weight percent, viscosity: 10 cp) In addition, the xylene used has a point of less than 2 。. The stripe shape of the flexographic printing plate (material: polythene resin, height of the relief convex portion: 100 / zm) used in the vertical f The width dimension of the convex surface of the convex portion is greater than 60 rpm of the maximum width (width of the pixel mouth portion) of each of the pixel regions. Using the relief, and ^, printing I set (Japanese photo printing company) Manufactured, the product name "ship_= row position adjustment" is such that the organic ink on the convex portion of the relief is aligned with the electrode exposed portion of the pixel region, and the organic light-emitting ink is diffused by the convex surface. The entire surface of the pixel electrode in the special shape and the pixel region is not leaked by the organic light-emitting oil even after drying. Set a few, 36
201002136 31002pif.doc 康公h偏舰學顯微鏡(尼 二於各像素區域_有機發光層的形狀而進“ 間:=光油墨被劃分像素區域的隔心 角部在—像=光層成膜於包括所有 (弟一電極的形成) 舞來ίϊ第^述有機發光層之上,以刚1的厚度蒸鍍 ’、 電極(陰極),進而,以2000 A的厚 1呂來作為氧化鱗層。藉此,製成具有底部發 emission)結構的有機EL元件。 二使以上述方法而獲得的有機EL元件發光時,可確 =整個發絲的發光都均勻,且與先前產品相比, 早位面積的發光量亦得到提高。 [產業上之可利用性] 如上所述’本發明之有機EL元件的製造方法可製造 出有機舍光層不會產生塗佈不均、像素電極的開口率增大 的有2 EL凡件。藉由使用本發明之有機EL元件的製造方 法,_能獲得單位面積的發光量增大的發光特性優良的有機 EL元件及顯示裝置。 λ雖然本發明已以實施例揭露如上,然其並非用以限定 本發明,任何所屬技術領域中具有通常知識者,在不脫離 f發明之精神和範圍内,當可作些許之更動與潤飾,故本 毛明之保魏圍當視後附之t請專職H所界定者為準。 37 201002136 31002pif.doc 【圖式簡單說明】 圖1是表示有機EL元件製造過程中,當以使像素電 極的開口率達到最大的方式而設計絕緣性隔離壁的圖案時 所獲得的像素區域的形狀的—例的隔離壁形成面的平面構 成圖。 圖2是圖1的主要部分放大圖。 圖3用於說明當使用乾燥速度較慢的有機發光油墨、 =版印刷版的凸部的凸面的寬度設定成小於像素區域 的九度尺寸來進行本發明之有機a元件的製造方法中的 有機發光層形成步驟時的印刷步驟,而且圖中表示黑 接觸於像素區域之前的狀態。 土 圖4用於說明當使用乾燥速度較慢的有機發光油墨、 ^柔版印刷版的凸部的凸面的寬度設定成小於像素區域 ^見度尺寸來進行本發明之有機虹元件的製造方法中的 有機發光層形成步驟時的印刷步驟,而且,圖中表示使油 接觸於像素區域、以印刷版的凸面來按壓像素區域的 狀態。 圖5疋表不繼圖4所示的步驟之後的油墨塗佈狀態的 像素區域的平面圖。 圖6是表示繼圖4所示的步驟之後,柔版印刷版 且油墨已乾_狀態的有機a元件的基板賴剖面圖。 圖7用於況明田使用乾燥速度較快的有機發光油墨、 且將柔版印刷版的凸部的凸面的寬度設定成大於像素區域 的寬度尺寸來進行本發R有機a元件的製造方法中的 38 201002136 31002pif.doc 而且’圖中表示使油 有機發光層形成步驟時的印刷步驟 墨接觸於像素_之前的狀態。 且將:==1=燥速度較快的有機發光油墨、 的寬度尺寸來社技奴鼓於像素區域 有機發光層形成;驟;EL元件的製造方法中的 墨接觸於像素區域、且以£广驟’而且’圖中表不使油 狀綠/ 且以印刷版的凸面來按壓像素區域的 【主要元件符號說明】 1 :絕緣性隔離壁 2 :像素區域 3 :第一電極(陽極) 3a =像素電極 4:有機發光油墨 10 : 基板 11、 21 :凸版印刷版 12、 22 :凸版印刷版的凸部 12a、22a :凸部的凸面 c·像素區域的角部 1!、丨2 :凸版印刷中使用的版的凸面的寬度尺寸 L】:像素區域的寬度尺寸 & L2 :絕緣性隔離壁的寬度尺寸 39201002136 31002pif.doc Kang Gongh stern-ship microscope (Ni Er in the shape of each pixel area _ organic light-emitting layer into the "between: = light ink is divided into the pixel area of the corner of the corner in the image = optical layer filming Including all of the formation of the electrode (the formation of the electrode), the electrode is deposited on the organic light-emitting layer, and the electrode (cathode) is deposited to a thickness of just one, and further, a thickness of 2000 A is used as the oxidized scale layer. Thereby, an organic EL element having a bottom emission structure is formed. 2. When the organic EL element obtained by the above method emits light, it is confirmed that the light emission of the entire hair is uniform, and the early position is compared with the previous product. [Industrial Applicability] As described above, the method for producing an organic EL device of the present invention can produce an organic polishing layer without uneven coating, and an increase in aperture ratio of a pixel electrode. By using the method for producing an organic EL device of the present invention, an organic EL device and a display device having excellent light-emitting characteristics per unit area of light emission can be obtained. λ Although the present invention has been implemented Example disclosed above However, it is not intended to limit the invention, and any person having ordinary knowledge in the art can make some changes and refinements without departing from the spirit and scope of the invention. t Please refer to the definition of full-time H. 37 201002136 31002pif.doc [Simplified Schematic] Figure 1 shows the design of insulating isolation when the aperture ratio of the pixel electrode is maximized during the manufacturing process of the organic EL device. Fig. 2 is an enlarged view of a main portion of Fig. 1. Fig. 3 is an enlarged view of a main portion of Fig. 1. Fig. 3 is a view for explaining an organic light-emitting ink which is slow in drying speed when a pattern of a pixel is obtained in a pattern of a pixel region. The width of the convex surface of the convex portion of the printing plate is set to be smaller than the nine-dimensional size of the pixel region to perform the printing step in the organic light-emitting layer forming step in the method for producing an organic a device of the present invention, and the black contact is shown in the drawing. The state before the pixel area. The soil map 4 is used to illustrate that when the organic light-emitting ink having a slow drying speed is used, the width of the convex surface of the convex portion of the flexographic printing plate is set to The printing step in the organic light-emitting layer forming step in the method for fabricating the organic rainbow element of the present invention is performed in the pixel region, and the figure shows that the oil is brought into contact with the pixel region, and the pixel is pressed by the convex surface of the printing plate. Fig. 5 is a plan view showing a pixel region of the ink application state after the step shown in Fig. 4. Fig. 6 is a view showing the flexographic printing plate after the step shown in Fig. 4 and the ink is dried _ FIG. 7 is a cross-sectional view of the substrate of the organic a-element in the state. FIG. 7 is for using the organic light-emitting ink having a relatively fast drying speed, and setting the width of the convex surface of the convex portion of the flexographic printing plate to be larger than the width of the pixel region. 38 201002136 31002 pif.doc in the method for producing the R organic a device, and the figure shows the state before the ink in the printing step of the oil organic light-emitting layer forming step is brought into contact with the pixel_. And: = = = the speed of the organic light-emitting ink having a faster drying speed, the width dimension of the organic light-emitting layer is formed in the pixel region organic light-emitting layer; the ink in the EL element manufacturing method is in contact with the pixel region, and Widely 'and' in the figure does not make oily green / and press the pixel area with the convex surface of the printing plate. [Main component symbol description] 1 : Insulating partition wall 2 : Pixel area 3 : First electrode (anode) 3a = pixel electrode 4: organic light-emitting ink 10: substrate 11, 21: relief printing plates 12, 22: convex portions 12a, 22a of relief printing plate: convex surface of convex portion c. corner portion of pixel region 1!, 丨 2: relief The width dimension of the convex surface of the plate used in printing L: width dimension of the pixel area & L2: width dimension of the insulating partition wall 39
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| JP2008091565A JP2009245776A (en) | 2008-03-31 | 2008-03-31 | Method of manufacturing organic electroluminescent element, and organic electroluminescent device, and display |
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| JP (1) | JP2009245776A (en) |
| TW (1) | TW201002136A (en) |
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| JP5488101B2 (en) * | 2010-03-25 | 2014-05-14 | 凸版印刷株式会社 | Letterpress for printing, electronic device using the same, and method for producing organic electroluminescence element |
| WO2011128035A1 (en) * | 2010-04-12 | 2011-10-20 | Merck Patent Gmbh | Composition and method for preparation of organic electronic devices |
| JP5699511B2 (en) * | 2010-09-30 | 2015-04-15 | 凸版印刷株式会社 | Letterpress for printing, letterpress printing apparatus using the same, and method for producing organic electroluminescence element |
| TW201403905A (en) * | 2012-06-01 | 2014-01-16 | Sony Corp | Organic electric field illuminating device, manufacturing method thereof, and electronic device |
| WO2022149713A1 (en) * | 2021-01-08 | 2022-07-14 | 삼성전자주식회사 | Display apparatus |
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| JP2001155858A (en) * | 1999-11-24 | 2001-06-08 | Sharp Corp | Manufacturing method of organic EL element |
| JP5315586B2 (en) * | 2005-09-28 | 2013-10-16 | 凸版印刷株式会社 | Manufacturing method of electronic device using relief printing plate for high definition and organic EL element |
| JP2007250298A (en) * | 2006-03-15 | 2007-09-27 | Toppan Printing Co Ltd | Organic electroluminescence device and method for manufacturing the same |
| JP4742977B2 (en) * | 2006-05-12 | 2011-08-10 | 凸版印刷株式会社 | Manufacturing method of organic EL display panel |
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