201000216 九、發明說明： . 【發明所屬之技術領域】 . 本發明係關於一種液刀設備，尤指一種可提供一均勻流體水幕 至一基板之液刀設備。 【先前技術】 口在薄膜電晶體液晶顯示裝置（TFT_LCD)製程中，濕式姓刻製 程對於液晶面板的顯示品質有著相當重要的影響。 知，液刀設備10係具有至少一 以及一出水間隙14,注水口 12 相對應流體，而出水間隙14則 般而言’濕式_係使用-液刀設備來提供-去離子水或曰 液態化學^液水幕’藉以針對—基板進行清洗或是_，請參= 第1圖，第1圖為先前技術一液刀設備1〇之示意圖。由第工圖可 一注水口 12 (於第1圖中顯示4個）201000216 IX. Description of the invention: [Technical field of the invention] The present invention relates to a liquid knife apparatus, and more particularly to a liquid knife apparatus which can provide a uniform fluid water curtain to a substrate. [Prior Art] In the process of a thin film transistor liquid crystal display device (TFT_LCD), the wet type engraving process has a considerable influence on the display quality of the liquid crystal panel. It is known that the liquid knife device 10 has at least one and one water outlet gap 14, the water injection port 12 corresponds to the fluid, and the water outlet gap 14 is generally provided as a 'wet type' - a liquid knife device - deionized water or helium liquid The chemical liquid screen is used to clean the substrate or _, please refer to Fig. 1, which is a schematic diagram of a prior art one liquid knife device. From the drawing, a water inlet 12 (shown in Figure 1)
6 201000216 . * 彩紋（MURA)的蝕刻缺陷（如第】曰戶厂 產品的顯示品質。此外，若有雜物堵目關 液刀設備1G所產生之流體水幕出 ㈣隙14中，也會使 制缺陷。 &料縣而纽更為明顯之 【發明内容】 本發明係提供-種液刀設備，其係可提供 基板，該液刀設備包含有-導流裝置，具有 -流迢’且韻-流道係與該第二流道平行設置並相互連通 第-流道具有-注水π，用於輪人—流體，該第二絲: 水口，用於排出該流體，在該第二流道與料—流道連通處俾升出 成有-緩衝空間’用於暫存自該第—流道流向該第二流道之紗 體；-第-整流裝置’絲整流進域第—流道之該流體；^ 一第二整流裝置，用來整流進入該第二流道之該流體。 【實施方式】 請參閱第2圖以及第3圖，第2圖為本發明第一實施例—液刀 設備50之示意圖，第3圖為第2圖液刀設備5〇内部結構之放大 示意圖。液刀設備50係用來提供一均勻流體水幕至一基板幻，、夜 刀設備50包含有一導流裝置54、一第一整流裝置56、—第二整 流裝置58，以及一擾流板60，其中由於第一整流裝置56以及第 二整流裝置58之實際結構係會在下列說明中進行詳細之描述，因 此第一整流裝置56以及第二整流裝置58在第3圖中僅以簡示圖 201000216 ^式=製’㈣置54具有—第—流道泣以及—第二流道糾， ' ^飢道62係實質上與第二流道&平行設置並相互連通’由 • * 2圖可知’第—流道62具有至少-注水口 66(於第2圖中顯示 ^ 66係用於輪入一流體，第二流道64具有一出水口 68 ’出水口 68係用於排出該流體，而在第二流道64與第-流道 ^2連通處係形成有—緩衝空間％，用於暫存自第—流道64流向 第一/m道64之3亥流體。第一整流裝置56係設置於第一流道62中。 第一整流裝置58係設置於第二流道64中。擾流板60係連接於第 一/;,L運64之—側壁72 ’擾流板60係與側壁72間具有一夾角Θ， 々此來擾々IL板6〇即可用來改變自出水口 68所溢出之該流體 之流動方向，藉以產生相對應之一流體水幕，上述夾角Θ之度數 係實質上介於145度至165度之間，其較佳值為157.5度，夾角㊀ 度數之決定端視實際應用而定。此外值得一提的是，上述擾流板 60亦可以可擺動之方式連接於第二流道64之側壁 72，如此即可 依據不同的製程需求而改變擾流板6〇與側壁72之間的夾角㊀之 度數，藉以產生不同角度的流體水幕。 首先係針對第一整流裝置56以及第二整流裝置58之結構進行 詳細之說明。請參閱第4圖，第4圖為第3圖第一整流裝置56之 分解示意圖。第一整流裝置56包含有一第一整流隔板74以及一 " 從屬整流隔板76。第一整流隔板74上係形成有複數個整流孔洞 78，而從屬整流隔板76係以可相對移動之方式疊合於第一整流隔 板74之一側，從屬整流隔板76上係形成有對應複數個整流孔洞 8 201000216 78之複數個從屬整流孔洞80，複數個整流孔洞％之尺寸係實質 上相同於複數個從屬整流孔洞80之尺寸，接著請參閱第5圖，第 5圖為第4圖第-整流隔板74疊合於從屬整流隔板76上且從屬整 流隔板76相對第一整流隔板74滑動之示意圖。如第5圖可知， 在從屬整流隔板76相對第一整流隔板74向下滑動一段距離後， 從屬整流隔板76上之複數個從屬整流孔洞8〇係與第一整流隔板 74上之複數個整流孔洞78部份或全部重疊，如此即可縮減該流體 所能通過的流量以及減緩該流體之流動速度，也就是說，第一整 "IL裝置56係可藉由從屬整流隔板76與第一整流隔板％之相對移 動來控制通過第-整流裝置56之該越的流量與流動速度，藉以 達到整流的效果，上述從屬整流隔板76相對第一整流隔板74之 移動里則是依實際細需求*定，意即可依據自注水卩66所注入 之該流體之流量大小而有所增減。此外，從屬整流隔板76之結構 係可不受上述之限制’只要是可用來與第一整流隔板74上之複數 個整流孔洞78部份或全部重疊之結構設計均可應用於本發明之實 施例中’舉例來說’請參閱第6圖，第6圖為本發明另一實施例 第-整流隔板74疊合於—從屬整流隔板82上且從屬整流隔板82 相對第-整流隔板74滑動之示意圖，由第6圖可知，從屬整流隔 板82與從屬整流隔板76不同之處在於結構之設計，相較於從屬 整流隔板76具有複數個從属整流孔洞⑽之結構設計，從屬整流 板82則是改為具有複數個彼此平行排列之擋板糾（於第6圖中 _ 4個）’ #板84之作動與上述實施例相似，在從屬整流隔板 82相對第-整流隔板74向下滑動一段距離後，從屬整流隔板幻 9 201000216 上之複數個私板84係與第一整流隔板％上之複數個整流孔洞％ 部份或全部重疊’如此即可縮_流體職通過的流量以及減緩 該流體之流動速度，也就是說，第一整流裝置兄係可藉由從屬整 流隔板8 2與第-整流祕74之減轉*翻财第—整流裝 置56之該流體的流量與流魄度，藉輯到整流的效果。同理， 明參閱第7圖’第7圖為第3圖第二整流裝置58之分解示意圖， 第mi衣置58包§有一第—整流隔板86以及一從屬整流隔板 88。第一整流隔板86上係形成有複數個整流孔洞9〇,而從屬整流 隔板88係以可相對移動之方式疊合於第二整流隔板％下方，從 屬整流隔板88上係形成有對應複數健流制％之複數個從屬 整流孔洞92 ’複數健流孔洞9〇之尺寸騎f上相陳複數個從 屬整流孔洞92之尺寸，如此一來，第二整流裝置％係可藉由第 二整流隔86以及從屬整流隔板88之相對移動以使第二流道64 中之該流體可均勻地自出水口68溢出，而由於第二整流裝置兄 的作動係與第一整流裝置56相似，故於此不再贅述。此外，上述 第6圖所提及之從屬整流隔板之結構變化亦可_於第二整流裝 置58中。 接下來係針對液刀設備5〇之作_理進辟細之說明。請參 閱第8圖’ _為第3圖液刀設備㈣剖面_，之刹面示意 I ^中由於第-整流裝置56以及第二整流裝置％之實際結構 ^在上述巾詳㈣，耻第—整流裝置％以及第二整流裝 在弟8圖中僅以簡示圖之方辆製，由第8圖可知，上述之 10 201000216 該流體係由位於第一流道62上方之注水口 66注入第一流道62 . 中’而由上述可知，該流體之流動速度係會在該流體在第一流道 62内流經第一整流裝置56後而有所減緩，進而使該流體以較慢之 流動速度進入位於第一流道62以及第二流道64之間的緩衝空間 70中’接下來’在該流體自緩衝空間70流往第二流道64且到達 第二整流裝置58後，在緩衝空間70以及第二流道64内因該流體 流向之改變所產生的紊流即可在該流體通過第二整流裝置5 8後消 除’因此’該流體即可均勻地自第二流道64之出水口 68溢出， 換句話說，於本發明之實施例中，該流體係自注水口 66注入並依 序流經第一流道62、緩衝空間70以及第二流道64，其間因受到 注水口 66之注入位置的影響而產生的壓力不均之現象以及因該流 體之流向改變與過快的流動速度所產生的紊流係可透過第—整流 裝置56以及第二整流裝置58而消除，進而使得該流體係可從第 二流道64之出水口 68均勻地向外溢出，最後在流經與第二流道 l 64之側壁72形成有夾角θ的擾流板6〇後，液刀設備5〇就可以 提供與基板52呈-夾角的一均勻流體水幕至基板52，以進行後續 的I虫刻或清洗流程。 只 第 上述液刀設備之内部結構係可不限於上述實施例之設計，亦， 變更，其他同樣具有整流功能之結構設計，舉例來說，請參閱第 圖，第9圖為本發明第二實施例液刀設備⑽之剖面示音圖， :實施例中所述的元件與第—實施例中所述的元件編號=者， 表不其具有相似的功能或相對位置，於此不再贅述。液刀設備咖 201000216 與第一實施例的液刀設備50不同之處在於整流裝置的設計。液刀 設備100包含有第一流道62、第二流道64、一第一整流裝置102、 一第二整流裝置104，以及擾流板60。第一整流裝置1〇2以及第 二整流裝置104分別包含有複數個導流斜板1〇6、1〇8，由第9圖 可知，複數個導流斜板106、108係分別以向下傾斜且交錯排列之 方式設置於第一流道62以及第二流道64内，如此一來，自第一 流道62之注水口 66注入之流體係可藉由依序流經複數個導流斜 板106、108之方式而減緩其流動速度，進而使該流體同樣可自第 一Lil道64之出水口 68均勻地溢出，換句話說，於第二實施例中， 該流體係自注水口 66注入並依序流經第一流道62、緩衝空間70 以及第一流道64 ’其間因受到注水口 66之注入位置的影響而產生 的液壓不均之現象以及因該流體之流向改變與過快的流動速度所 產生的紊流係可透過第一整流裝置1〇2以及第二整流裝置1〇4中 所分別具有的複數個導流斜板1 〇6、1 〇8而消除，進而使得該流體 係可從第一流道64之出水口 68均勻地向外溢出，最後在流經與 第二流道64之側壁72形成有夾角㊀的擾流板60後，液刀設備 100就可以提供與基板52呈一夾角的一均勻流體水幕至基板52， 以進行後續的蝕刻或清洗流程。上述第一實施例與第二實施例中 所提及之整流裝置之結構設計原則係可相互應用，舉例來說，第 /’IL表置係可設計為整流隔板之結構，而第二整流裝置則是可 設計為具有複數個導流斜板之結構。 最後，請參閱第10圖’第1〇圖為本發明第三實施例液刀設備 12 201000216 150之剖面示意圖，第三實施例中所述的元件與第一實施例中所述 . 的元件編號相同者，表示其具有相似的功能或相對位置，於此不 再贅述。液刀設備150與第一實施例的液刀設備50不同之處在於 第二整流裝置的設計。液刀設備150包含有第一流道62、第二流 道64、第一整流裝置56、一第二整流裝置152，以及擾流板60， 其中由於第一整流裝置56之實際結構係已在上述說明中詳述過， 因此第一整流裝置56在第10圖中僅以簡示圖之方式繪製。由第 10圖可知，第二整流裝置152係為一擋水板，其係延伸形成於第 二流道64之側壁72上，較佳地，第二整流裝置152以及側壁72 之長度加總係約為7公分，而第一流道62之流道長度則約為1〇 公分，也就是說，第二整流裝置152以及側壁72之長度加總係與 第一流道62之流道長度的比例約為7比10。如此一來，自第一流 道62之注水口 66注入之流體係可流經第一整流裝置56後而有所 減緩，進而使該流體以較慢之流動速度進入位於第一流道62以及 第二流道64之間的緩衝空間70中，接下來，在該流體自緩衝空 | ' 間流往第二流道64時，此時，雖無第一實施例中所提及之整 流隔板之結構或是第二實施例中所提及之導流斜板之結構，然而 在緩衝空間70以及第二流道64内因該流體流向之改變所產生的 紊流仍然可以藉由在第二流道64之側壁72上增加擒水板152之 m 设計的方式來消除，藉以使該流體同樣可以從第二流道64之出水 口 68均勻地向外溢出，最後在流經擾流板60後，液刀設備15〇 就可以提供與基板52呈一夾角的一均勻流體水幕至基板52,以進 行後續的蝕刻或清洗流程。 13 201000216 相較於先前麟利敝人壓力以將做彳液或清絲自液刀設 備的出水間隙中喷出的方式，本發明所提供之液刀設備係可利用 =整流51板、導鱗钱是财板之結構設計來親内部流道 中流體的流動速度収善流雜力獨之現㈣及_部流體之 流向改變與過快的流動速度所產生的紊流，如此即可產生勾 之流體水幕朗欲侧或是清洗的紐上，藉明免基板上钱刻 不均勾或7C祕現象的產生’進而提昇基板在濕式糊製程中的 钱刻品質。此外’由於本發明之液刀設備内部流體係自出水口處 均勻溢出，因此不會出現有雜物堵塞出水口之問題，故可避免習 知，刀設備中當有雜物堵塞出水_時所產生之流體水幕分念的 問題。 以上所述僅林發明讀佳實關，凡依本發日种請專利範 圍所做之均等變化與修飾’皆應屬本發明之涵蓋範圍。 【圖式簡單說明】 第1圖為習知技術液刀設備之示意圖。 第2圖為本發明第一實施例液刀設備之示意圖。 第3圖為第2圖液刀設備内部結構之放大示意圖。 第4圖為第3圖第一整流裝置之分解示意圖。 第5圖為第4圖第-整流隔板疊合於從屬整流隔板上且也 流隔板相對第一整流隔板滑動之示意圖。 14 201000216 第6圖為本發明另1施例第一整流隔板疊合於從屬整流隔板 - 上且從驗流㈣相對第-錢隔板滑動之示意圖。 第7圖為第3圖第二整流裝置之分解示意圖。 第8圖為第3圖液刀設備沿剖面線8_8，之剖面示意圖。 第9圖為本發明第二實施例液刀設備之剖面示意圖。 第10圖為本發明第三實施例液刀設備之剖面示音圖。 【主要元件符號說明】 10、50、 液刀設備 12 注水口 100' 150 14 出水間隙 16、52 基板 54 導流裝置 56>102 第一整流裝置 58 、 104 第二整流裝置 60 擾流板 62 第一流道 64 第二流道 66 注水口 68 出水口 70 緩衝空間 72 側壁 74 第一整流隔板 76、 從屬整流隔板 82、88 78、90 整流孔洞 80、92 從屬整流孔洞 84 擋板 86 第二整流隔板 106、 108 導流斜板 152 播水板 156 201000216 . * The etch defect of the color pattern (MURA) (such as the first) the display quality of the products of the Seto Plant. In addition, if there is a debris plugging the liquid water knife device 1G, the fluid water curtain is produced in the (four) gap 14 The invention will provide a liquid-blade device which can provide a substrate, and the liquid-blade device includes a flow guiding device having a flow-flowing device. 'And rhyme-flow channel is arranged parallel to the second flow channel and communicates with each other. The first flow channel has a water injection π for the wheel human-fluid, and the second wire: a water nozzle for discharging the fluid. The flow path of the second flow path and the material-flow path is raised into a buffer space for temporarily storing the yarn body flowing from the first flow path to the second flow path; - the first-rectifier device - the fluid of the flow channel; a second rectifying means for rectifying the fluid entering the second flow path. [Embodiment] Please refer to FIG. 2 and FIG. 3, and FIG. 2 is a first embodiment of the present invention. Example - a schematic view of a liquid knife device 50, and Fig. 3 is an enlarged schematic view of the internal structure of a liquid knife device 5 of Fig. 2. The apparatus 50 is for providing a uniform fluid water curtain to a substrate, and the night knife apparatus 50 includes a flow guiding device 54, a first rectifying device 56, a second rectifying device 58, and a spoiler 60, wherein Since the actual structure of the first rectifying device 56 and the second rectifying device 58 will be described in detail in the following description, the first rectifying device 56 and the second rectifying device 58 are only shown in FIG. 3 as a simplified diagram 201000216 ^ Formula = system '(4) set 54 has - the first flow channel weep and - the second flow path correction, ' ^ 饥 道 62 system is substantially parallel with the second flow channel & and interconnected 'by * * 2 map knows ' The first flow passage 62 has at least a water injection port 66 (shown in Fig. 2 is a system for piping a fluid, and the second flow passage 64 has a water outlet 68' for a water outlet 68 for discharging the fluid. A buffer space % is formed in the communication between the second flow path 64 and the first flow path ^2 for temporarily storing the 3H fluid flowing from the first flow path 64 to the first/m channel 64. The first rectifying device 56 The first rectifying device 58 is disposed in the second flow channel 64. The spoiler 60 is connected In the first/;, L-64-side wall 72, the spoiler 60 has an angle Θ between the side wall 72 and the side wall 72, so that the IL plate 6 can be disturbed to change the fluid overflowing from the water outlet 68. The direction of flow, thereby generating a corresponding fluid water curtain, the degree of the angle Θ is substantially between 145 degrees and 165 degrees, and the preferred value is 157.5 degrees, and the determination of the angle is determined by practical application. In addition, it is worth mentioning that the spoiler 60 can also be swingably connected to the side wall 72 of the second flow path 64, so that the spoiler 6 and the side wall 72 can be changed according to different process requirements. The angle between the angles is a degree to create a fluid curtain at different angles. First, the structure of the first rectifying device 56 and the second rectifying device 58 will be described in detail. Please refer to Fig. 4, which is an exploded perspective view of the first rectifying device 56 of Fig. 3. The first rectifying means 56 includes a first rectifying diaphragm 74 and a " slave rectifying partition 76. A plurality of rectifying holes 78 are formed in the first rectifying partition 74, and the subrective rectifying partitions 76 are superposed on one side of the first rectifying partition 74 so as to be relatively movable, and the subrective rectifying partitions 76 are formed. There are a plurality of subordinate rectifying holes 80 corresponding to a plurality of rectifying holes 8 201000216 78, and the size of the plurality of rectifying holes is substantially the same as the size of the plurality of subordinate rectifying holes 80, and then refer to FIG. 5, and FIG. 4 is a schematic view in which the first rectifying bulkhead 74 is superposed on the slave rectifying partition 76 and the slave rectifying partition 76 is slid relative to the first rectifying partition 74. As can be seen from FIG. 5, after the slave rectifying partition 76 slides downward with respect to the first rectifying partition 74, the plurality of subordinate rectifying holes 8 on the substituting rectifying partition 76 are connected to the first rectifying partition 74. The plurality of rectifying holes 78 are partially or completely overlapped, thereby reducing the flow rate through which the fluid can pass and slowing the flow velocity of the fluid, that is, the first integral "IL device 56 can be used by the slave rectifying baffle The relative movement of 76 with the first rectifying baffle is controlled to control the flow rate and flow velocity through the first rectifying device 56, thereby achieving the rectifying effect, and the subrective rectifying baffle 76 is moved relative to the first rectifying baffle 74. It is determined according to the actual fine demand*, and the meaning can be increased or decreased according to the flow rate of the fluid injected from the water injection tank 66. In addition, the structure of the slave rectifying partition 76 can be free from the above limitations as long as the structural design that can be used to partially or completely overlap the plurality of rectifying holes 78 on the first rectifying partition 74 can be applied to the practice of the present invention. In the example 'see for example', please refer to FIG. 6. FIG. 6 is another embodiment of the present invention. The first rectifier plate 74 is superposed on the slave rectifier plate 82 and the slave rectifier plate 82 is opposite to the first rectifier block. Schematic diagram of the sliding of the plate 74, as seen from Fig. 6, the slave rectifying baffle 82 differs from the slave rectifying baffle 76 in the design of the structure, having a plurality of subrectory rectifying holes (10) compared to the subrective rectifying baffle 76. The slave rectifying plate 82 is changed to have a plurality of baffle corrections arranged in parallel with each other (4 in FIG. 6). The operation of the #板 84 is similar to that of the above embodiment, and the slave rectifying partition 82 is opposite to the first After the rectifying baffle 74 slides down a distance, the plurality of private plates 84 on the subordinate rectifying baffle 9 201000216 partially or completely overlap with the plurality of rectifying holes % of the first rectifying partition %. _ Fluid flow through the flow to And slowing down the flow velocity of the fluid, that is, the flow of the fluid of the first rectifying device brother can be reduced by the substation rectifying diaphragm 82 and the first rectifying device 74 Flow rate, borrowing to the effect of rectification. Similarly, referring to Fig. 7, Fig. 7 is an exploded view of the second rectifying device 58 of Fig. 3, the second package 58 package § has a first rectifying partition 86 and a subrective rectifying partition 88. The first rectifying partition 86 is formed with a plurality of rectifying holes 9 〇, and the sub-rectifying baffle 88 is superposed on the second rectifying baffle % in a relatively movable manner, and the sub-rectifying baffle 88 is formed thereon. The size of the plurality of slave rectifier holes 92 corresponding to the plurality of healthy flow systems is the size of the plurality of slave rectifier holes 92, and the size of the plurality of slave rectifier holes 92 is such that the second rectifier device can be The relative movement of the second rectifying partition 86 and the slave rectifying partition 88 causes the fluid in the second flow passage 64 to uniformly overflow from the water outlet 68, and since the second rectifying device brother is actuated similarly to the first rectifying device 56 Therefore, it will not be repeated here. Further, the structural change of the sub-rectifier spacer mentioned in the above Fig. 6 can also be made in the second rectifying means 58. The next step is to explain the details of the liquid knife equipment. Please refer to Fig. 8 ' _ for the liquid knife device (4) section _ of Fig. 3, the brake surface indicates I ^ because of the actual structure of the first rectifier device 56 and the second rectifier device ^ in the above-mentioned towel details (four), shame - The rectifying device % and the second rectifying device are only shown in the diagram of the drawing, and it can be seen from Fig. 8 that the above-mentioned 10 201000216 is injected into the first stream by the water filling port 66 located above the first flow path 62. Lane 62. In the above, it can be seen that the flow velocity of the fluid is slowed down after the fluid flows through the first rectifying device 56 in the first flow passage 62, thereby allowing the fluid to enter at a slower flow rate. The buffer space 70 located between the first flow path 62 and the second flow path 64 is 'next' in the buffer space 70 after the fluid flows from the buffer space 70 to the second flow path 64 and reaches the second rectifying device 58. The turbulence generated in the second flow path 64 due to the change of the fluid flow direction can be eliminated after the fluid passes through the second rectifying device 58. Therefore, the fluid can uniformly overflow from the water outlet 68 of the second flow path 64. In other words, in an embodiment of the invention, the The system is injected from the water injection port 66 and sequentially flows through the first flow path 62, the buffer space 70, and the second flow path 64, and the uneven pressure due to the injection position of the water injection port 66 and the fluid The turbulence generated by the change in flow direction and the excessively fast flow rate can be eliminated by the first rectifying means 56 and the second rectifying means 58, so that the flow system can be evenly outwardly from the water outlet 68 of the second flow path 64. After overflowing, finally, after flowing through the spoiler 6 with the angle θ formed on the side wall 72 of the second flow path 64, the liquid knife device 5〇 can provide a uniform fluid water curtain at an angle to the substrate 52 to the substrate. 52, for the subsequent I insect engraving or cleaning process. Only the internal structure of the above-mentioned liquid knife device is not limited to the design of the above embodiment, and is also modified, other structural designs having the same rectifying function. For example, please refer to the figure, and FIG. 9 is a second embodiment of the present invention. The cross-sectional diagram of the liquid knife device (10), the components described in the embodiments and the component numbers described in the first embodiment have similar functions or relative positions, and will not be described again. The liquid knife device coffee 201000216 differs from the liquid knife device 50 of the first embodiment in the design of the fairing device. The liquid knife apparatus 100 includes a first flow path 62, a second flow path 64, a first rectifying device 102, a second rectifying device 104, and a spoiler 60. The first rectifying device 1〇2 and the second rectifying device 104 respectively include a plurality of guiding swash plates 1〇6 and 1〇8. As can be seen from FIG. 9, the plurality of guiding swash plates 106 and 108 are respectively downward. The flow system injected from the water injection port 66 of the first flow path 62 can be sequentially flowed through the plurality of flow guiding swash plates 106 in a manner of being inclined and staggered in the first flow path 62 and the second flow path 64. The mode of 108 slows down the flow rate, so that the fluid can also uniformly overflow from the water outlet 68 of the first Lil channel 64. In other words, in the second embodiment, the flow system is injected from the water injection port 66 and The phenomenon of hydraulic unevenness caused by the injection position of the water injection port 66 in the first flow path 62, the buffer space 70, and the first flow path 64', and the flow direction change due to the flow direction of the fluid and the excessively fast flow rate The generated turbulence system can be eliminated by the plurality of guiding swash plates 1 〇6, 1 〇8 respectively in the first rectifying device 1〇2 and the second rectifying device 1〇4, thereby making the flow system Evenly overflowing from the water outlet 68 of the first flow path 64 Finally, after flowing through the spoiler 60 with the angle of the second side of the second flow path 64, the liquid knife device 100 can provide a uniform fluid water curtain at an angle to the substrate 52 to the substrate 52. A subsequent etching or cleaning process is performed. The structural design principles of the rectifying device mentioned in the above first embodiment and the second embodiment can be mutually applied. For example, the /'IL meter can be designed as a rectifying bulkhead and the second rectifying The device is constructed to have a plurality of diverting swash plates. Finally, please refer to FIG. 10, which is a cross-sectional view of a liquid knife device 12 201000216 150 according to a third embodiment of the present invention, the components described in the third embodiment and the component numbers described in the first embodiment. The same means that they have similar functions or relative positions, and will not be described again here. The liquid knife device 150 differs from the liquid knife device 50 of the first embodiment in the design of the second fairing device. The liquid knife device 150 includes a first flow path 62, a second flow path 64, a first rectifying device 56, a second rectifying device 152, and a spoiler 60, wherein the actual structure of the first rectifying device 56 is already in the above As explained in detail in the description, the first rectifying means 56 is drawn only in the form of a simplified diagram in Fig. 10. As can be seen from FIG. 10, the second rectifying device 152 is a water baffle extending from the side wall 72 of the second flow path 64. Preferably, the second rectifying device 152 and the length of the side wall 72 are added. It is about 7 cm, and the length of the flow path of the first flow path 62 is about 1 cm, that is, the length of the second rectifying device 152 and the side wall 72 is proportional to the length of the flow path of the first flow path 62. It is 7 to 10. As a result, the flow system injected from the water injection port 66 of the first flow path 62 can be slowed down after flowing through the first rectifying device 56, thereby allowing the fluid to enter the first flow path 62 and the second at a slower flow speed. In the buffer space 70 between the flow passages 64, next, when the fluid flows from the buffer space |' to the second flow passage 64, at this time, there is no rectifying partition plate mentioned in the first embodiment. The structure is the structure of the swash plate mentioned in the second embodiment, however, the turbulence generated by the change of the fluid flow direction in the buffer space 70 and the second flow path 64 can still be used in the second flow path. The side wall 72 of the 64 is added to the design of the water slab 152 to eliminate, so that the fluid can also uniformly overflow from the water outlet 68 of the second flow path 64, and finally after flowing through the spoiler 60. The liquid knife device 15 can provide a uniform fluid water curtain at an angle to the substrate 52 to the substrate 52 for subsequent etching or cleaning processes. 13 201000216 Compared with the previous Linli people's pressure to spray the sputum or clear wire from the water outlet gap of the liquid knife device, the liquid knife device provided by the present invention can utilize = rectification 51 plate, guide scale money It is the structural design of the financial board to reduce the flow velocity of the fluid in the internal flow channel, to collect the fluid flow, and to change the flow direction of the fluid and the turbulence generated by the excessively fast flow velocity, so that the fluid of the hook can be generated. The water curtain is on the side of the water or on the cleaning, so as to improve the quality of the substrate in the wet paste process by using the unevenness of the money on the substrate or the generation of the 7C secret phenomenon. In addition, since the internal flow system of the liquid knife device of the present invention uniformly overflows from the water outlet, there is no problem that the foreign matter blocks the water outlet, so it is possible to avoid the conventional knowledge that when there is debris in the knife device blocking the water outlet _ The problem of the fluid water curtain produced. In the above, only Lin invented and read Jiashiguan, and all changes and modifications made by the patent scope in accordance with the present invention should be covered by the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view of a conventional liquid knife apparatus. Fig. 2 is a schematic view showing a liquid knife apparatus according to a first embodiment of the present invention. Fig. 3 is an enlarged schematic view showing the internal structure of the liquid knife apparatus of Fig. 2. Fig. 4 is an exploded perspective view of the first rectifying device of Fig. 3. Figure 5 is a schematic view of the fourth embodiment of the first rectifying baffle superposed on the subrective rectifying baffle and also the sliding baffle sliding relative to the first rectifying baffle. 14 201000216 Fig. 6 is a schematic view showing the first rectifying separator superimposed on the subordinate rectifying partition plate - and sliding from the current detecting (4) to the first money partition according to another embodiment of the present invention. Figure 7 is an exploded perspective view of the second rectifying device of Figure 3. Figure 8 is a cross-sectional view of the liquid knife device of Figure 3 taken along section line 8-8. Figure 9 is a cross-sectional view showing a liquid knife apparatus according to a second embodiment of the present invention. Figure 10 is a cross-sectional view showing a liquid knife apparatus according to a third embodiment of the present invention. [Main component symbol description] 10, 50, liquid knife device 12 water injection port 100' 150 14 water discharge gap 16, 52 substrate 54 flow guiding device 56 > 102 first rectifying device 58 , 104 second rectifying device 60 spoiler 62 First-class channel 64 Second channel 66 Water injection port 68 Water outlet 70 Buffer space 72 Side wall 74 First rectifying partition 76, slave rectifying partition 82, 88 78, 90 rectifying hole 80, 92 substation rectifying hole 84 baffle 86 second Rectifier baffle 106, 108 deflector slab 152 water board 15