TW200914800A - Multiple dimension position sensor - Google Patents

Abstract

An apparatus including a controller, a workpiece transport in communication with the controller having a movable portion and a transport path and a multi-dimensional position measurement device including at least one field generating platen attached to the movable portion and at least one sensor group positioned along the transport path and in communication with the controller, where the field generating platen is configured for both position measurement and propelling the movable portion, wherein the at least one sensor group is configured to sense a field generated by the at least one field generating platen and the controller is configured calculate a multi-dimensional position of the movable portion based on an output of one of the at least one sensor group, where the multi-dimensional position includes at least a planar position and a gap between the workpiece transport and the at least one sensor group.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a position sensor, and more particularly to a position sensor for multi-dimensionally detecting the position of an object. [Prior Art] Brief Description of Related Development There are many methods for locating moving objects, such as a traffic command system that uses a radar signal in combination with a road zebra to determine the position of the vehicle, and other positioning systems that utilize radio communication. However, these two systems require a power source to be mounted on a moving object, and the radio waves are also susceptible to interference from buildings and electrical signals. The position can also be determined by, for example, a linear differential transformer (LVDT), which is a displacement function converter that is wound on a cylindrical bobbin with a primary winding and two secondary windings, a movable nickel-iron alloy core or electric The pivot is fixed in the winding and the position of the moving object is determined by measuring the movement of the alloy core. The Hall effect sensor also uses a similar theoretical approach to determine displacement. LVDTs and Hall effect sensors are commonly used to measure finite displacements, such as linear actuator and piston displacement. For high-precision positioning systems, such as stepping, floating, and/or scanning stations, traditional position measurement methods utilize capture, induction, optics, and laser sensors. These sensors typically feature high resolution and low positioning noise, but the high total cost, limited range of motion, and freedom requirements reduce their range of applications. Usually in most position feedback devices, such as sinusoidal signals and cosine signals, etc. are generated by sensors, the signals are sent to devices such as digital converters in the motor controller, and the signals are processed in the digital domain to determine the object. Bit 5 200914800 set. However, the sine/cosine period and ADC resolution may not be sufficient to generate the required position resolution, necessitating a redesign of the motor controller or replacement of a more expensive decoder. This is advantageous for determining the two-dimensional position and gap width using the same sensor and magnet measurements, and also facilitates the use of cost-effective, high-resolution decoders. At the same time, it is advantageous to increase the resolution of the feedback device in the analog domain without using corrections such as motor controllers and/or decoders. SUMMARY OF THE INVENTION AND EMBODIMENT Figure 1 is a schematic illustration of a sensor 100 for use in ranging along a plurality of directional axes in an exemplary instrument. Although we will illustrate the demonstration of the instrument, we should be aware of the number of women's demonstration instruments, and any suitable size, shape, any type of element or material can be applied.

:::: Brother:: Any two! The direction of travel of the displacement (eg (4) measuring disk "fe 6 *4· _

The transfer position, while measuring the pitch width such as the Y-axis of the magnetic platen 170, can be used for demonstration analysis, on the 200914800 axis, including but not limited to the axis of rotation. It should also be clear that the demonstration sensor can sense any suitable moving object, including but not limited to one-way or multi-directional moving objects such as conveyors, actuators, and other drive system components. The position measurement sensor produces a signal for motor commutation to drive, for example, a conveyor or any other moving object to move from the first position to the second position. It is to be understood that the exemplary embodiments described herein are not limited to use in conjunction with an electric motor and can be used with any device that requires single or multi-directional position information. As shown in FIG. 1, in one exemplary embodiment, sensor 100 includes a magnetic platen 170 and one or more sensor groups 130a-130n. The sensor group includes one or more sensors, which are described below. The magnetic platen 170 includes one or more magnets 140, 150, the magnets are arranged in a row or a grid, and the magnets are arranged in a polar interaction (e.g., north, south, north, south, etc.), as shown in FIG. The alternating polarity arrangement of the magnets 140, 150 produces a wave 160, such as when the magnet passes through the sensor 130 to produce a sine or cosine wave, as explained further below. Magnets 140 and 150 can be any magnet having a suitable field strength. The magnets in the exemplary embodiment may be permanent magnets, the magnetic platen 170 may be converted to the platen 170 without any source of power, and the magnets in the preparation may be electromagnets. The platen 170 in other alternative embodiments includes any suitable magnetic field generating device that can be sensed by the sensors 130a-130n. Platen 170 can also be comprised of any suitable number of magnets having suitable configurations. For example, the magnets mentioned above may be arranged in a straight line, and may be arranged in a plurality of rows and/or in a column shape, and the magnets may be arranged in a crosswise manner, and the platen 170 may be fixed to the object to be tested 120. The platen 170 and the object 120 in alternative embodiments may be the same. Object 120 can be any object including, but not limited to, a transport vehicle, a piston/piston rod, an actuator, an automated mechanical end effector, a drive shaft, a motor 200914800 rotor, or any other object body that requires position measurement. The sensor 13Ga-13()n can be any suitable sensor and is not limited to - an ear effect sensor, an inductive sensor, and/or a capacitive sensor. The sensor (10) several ^^ objects run in the direction of the arrangement, it should be noted that the running direction may have = two = χ, γ, ζ direction in the Karl coordinate system (or several of them ^) or R in the polar coordinate system , e direction (or any orientation). Borrowing ί ί. 'The row direction can be associated with any suitable coordinate system. Any suitable number, the thief can be arranged in the running direction, and the sensor ΐ3 〇 "3 〇 n is arranged within a predetermined distance along the direction of the object, whereby the position of the object 12 就能 can be determined and described in detail. The sensor is connected to the control object 120: ^ for receiving the output of the sensor and based on the sensor output, the two-dimensional position of the body in the running direction and the sensor ma_i3 A computer program that outputs signals based on information such as magnetic field strength (such as flux density), such as a platen m and/or a sensory signal, and a computer embedded with a processing program and instructions. Reading medium) implementation of the meter tr displacement ===== precise positioning - short distance of an object body = two =, in other exemplary embodiments, the position measurement system material processing system transmits U components, the object is in the device An exemplary configuration of the sensor 1GG in the exemplary embodiment of the present invention is shown in FIG. 2, which is a schematic configuration of the pair of sensors in the embodiment of the present invention. The detector 200Α-200η may be arranged in a straight line or The running directions are collinearly arranged. For example, the magnetic sensors 200Α, 200Β form a first pair of stripping pairs, 2〇〇c and 200D form a second pair, and so on. In an alternative embodiment, the sensor 2〇 〇Α·2〇〇η are staggered along the running direction, some sensors will be arranged above or below other sensors. In other exemplary embodiments, the sensor 2〇〇Α_2〇〇η may have other Suitable structures. The sensor 200A-200n can be any suitable sensor including, but not limited to, the Hall effect sensor, the inductive sensor, and the capacitive sensor described above. In an exemplary embodiment Each pair of sensors or sensors is spaced apart by a predetermined spacing or apex, each sensor pair being separated by a distance that is approximately four times the vertex Ρ or 4 。. In an alternative embodiment The sensors 2〇〇Α-200η have appropriate spacing. The sensor pairs in the sensors 200Α-200η are carried by the pole pieces or magnets 210A-210D, 220A-220D fixed on the sensor. Different magnetic ' or different parts of the moving object 120 with different magnetic properties. It is recognized that any suitable magnetic field generator is available, and the magnet does not have to have north and south poles. In this example, the magnetic poles of the magnets 210A-10D, 220A-220D corresponding to the sensors 200Α-200n are arranged in interaction. In the structure, for example, the north pole of the magnets 210A-210D corresponds to the sensor 200Α-200η, and the south pole of the magnets 220A-220D corresponds to the sensor 200Α-200η when the magnets 210A-210D, 220A-220D act on the sensor 200A-200n When the movement occurs, the alternating magnetic poles of the pole pieces 210A-210D, 220A-220D produce a sinusoidal sensor output. In alternative embodiments, the magnets may be arranged in any suitable configuration. In this exemplary embodiment, the magnets 210A-210D, 220A-220D are separated by a distance that is approximately twice the point P or 2P from approximately 200914800. In alternative embodiments, the pole pieces 210A-210D, 220A-220D can have any suitable spacing. The spacing of the above-described sensors 200A-200n and magnets 210A-210D, 220A-220D can produce a sine/cosine relationship in the two sensor output signals that make up each sensor, as seen in Figures 2B and 2C. As a non-limiting example, sensor 200A generates a sine wave as in 2B, while sensor 200A produces a cosine wave as shown in Figure 2C, and vice versa. The sensor output signal can be inserted into the position of the object 200 according to the sensors 200A-200n. For example, when the arc tangent angle of the ratio of the two signals is determined, the interpolation position of the object 120 is determined to be proportional to the distance between 4p and the sensor pair. Since each sensor pair is mounted at a predetermined pitch, the interpolation position can be subtracted or added from the preset pitch to obtain the position of the object 1200. For example, if the spacing of the sensor pairs 200A and 200B is C, the interpolation distance between the sensor pair 200A, 200B and the sensor pair 200C, 200D is twice the pitch, then the position of the object 120 may be the spacing c The sum of the gaps G with the 2 times pitch (ie C + 2P ) 〇 sensors 200A-200n and the pole pieces 210A-210D, 220A-220D (by (j this object 120) can be calculated by calculating each sensor pair The square root of the sum of the squares of the two sensed signal output values is determined and the magnetic flux density of the sensor in the spacing is obtained. In an alternative embodiment, any suitable calculation can be used to calculate - the pitch flux density can be used to determine The gap g between the sensors 200A-200n and the pole pieces 210A-210D, 220A-220D. In an alternative embodiment, the gap width G can be calculated and determined by any other method. For example, the width of the magnetic gap G can pass Several methods are available, including (but not limited to): look-up table method, including the flux value measured by the spacing and the sensitivity of the sensor to the fluctuation of the magnet operating point on the demagnetization 10 200914800. The calculation of the gap G will be described in more detail below. = Root Calculated by the number of sensors 200A-200n and the sensor 丨〇〇, according to the following N-bit sensor calculation formula: ° to resolution

4P W Π] f where 'N represents the resolution of the position measurement system described in the number of bits in the ambient-like noise and system output ratio Wei (analog/digit^ uncertainty measurement. Sensor hired_2_ The spacing between the spacing P or the pitch of the pair of pairs and the spacing between the pair and the pair 4p) and the spacing between the magnets 2 and 2^20^22GD will increase or decrease proportionally from the resolution of the sensor 100. The generation gate is reduced. The continuous sweep = over the second: second, the -2' arrangement line is controlled by the controller 19. Even--, the sensors are also scanned, such as the sensor 200A, & = / port_1, the basic spacing of the sneak sweep line 〇 A_ Cheng can get the object i2n s Shi Yi A w evaluation r Tian The result. Absolute position residual with south resolution or maximum resolution Refer to the schematic diagram of Figure 1 and jgj 2 —, — just, . Sensors shown as an exemplary embodiment The sensors 300A-300n in the embodiment are arranged in the 盥 direction of the object, and the sensors 300A-300n are likely to be arranged in a straight line or two: square = collinear arrangement. In an alternative embodiment, the sensors 3 〇〇 A_3 〇〇 n are staggered along the direction of the supply. Some sensors may be located above the other sensors. In other alternative embodiments, the 'r' sensors 300A-300n may be arranged in any suitable configuration 11 200914800. The sensors 300A-300n may be any suitable sensors including, but not limited to, the above-described Hall Effect sensor, inductive sensor, and capacitive sensor. As shown in FIG. 3, the sensors 300A-300n are spaced apart by a predetermined pitch or pitch P in the direction of travel, and the sensor in an alternative embodiment may Having any suitable spacing. The sensors 300A, 300B, 300E are the first type of sensor, which is less expensive. The position of the object being tracked over a longer period of time depends on the sensor 100 that forms the other part of the system. Geometric distribution characteristics, the second sensors 300C and 300D (ie a pair of sensors) on the sensor distribution line, at the position of the first sensor (see Figure 3), compared to the first A sensor type 300A, 300B, 300E has characteristics such as high cost and high sensitivity. In an alternative embodiment, the second sensor is used in an amount greater or less than two. In other alternative embodiments, all of the sensors (including the sensor and sensor pairs) are all low cost sensors or high cost sensors. At the same time, the sensor can be secured between the low cost and high cost sensors in any suitable manner. A low-cost sensor in combination with one or more sensor pairs forms a low-cost position measurement accuracy system that can track a rough position of an object (such as accuracy) through a single sensor or sensor single line Below the position measured with the sensor pair, the sensor pair is used to accurately measure the position of the object in the highly focused area of the position. By tracking the object with a single sensor, the sensor pair can also be used to calibrate the position of the object, but the first sensor may produce deviations and changes in the measurement of the object. The high cost sensors 300C and 300D are spaced apart by a predetermined pitch which is about 1-4 times the pitch or 1/4 pitch, so the sensors 300C and 300D generate a sine/cosine relationship output signal, substantially The manners shown in Figures 2B and 2C above are similar. The sensors 300A-300I1 are oppositely magnetic due to their attachment to the moving object 120 or their composition 12 200914800 partial pole piece or magnet 320A-320n. It is important to recognize that any suitable magnetic field generator is available and that the magnet does not have to have a north and south pole. The magnetic poles corresponding to the sensors 300Α-300η are arranged in an alternating structure, the north pole of the magnet 320Α '320C '320Ε '320G is in contact with the sensor 300Α-300η, the south pole of the magnet 320Β, 320D '320F and the sensor 300Α-300η Contact When the sensor 300Α·300η drives the magnet 320Α_320η, the alternating magnetic poles of the pole piece 320Α-320η generate a sinogram, as shown in FIG. In the alternating body, the magnets may be arranged in any suitable configuration. In this example, when the magnet passes through a single sensor 300 Α, 300 Β, 300 Ε, a sinusoidal sense output SW will be produced. When the magnet passes the sensor pair 300C, 300D, the sensor 300C will generate a sinusoidal output SW, and the sensor 300D will generate a cosine output CW, which is related to the output or spacing 感 of the sensor 300C (ie sine / Cosine relationship). In this exemplary embodiment, the magnets 320Α-320η are spaced apart from one another by a spacing of approximately twice the pitch Ρ or 2Ρ. In the alternating body, the distance between the magnets 320Α-320η is either greater or less than 2Ρ. The output signal of the sensor 300Α-300η can be mathematically determined to determine the position of the object within a base circular pitch (Ρ in this example). As described above, since the position of each of the sensors 300A-300n is known, in the base pitch Ρ, the exact position of the object 玎 passes through two of the sensors 300Α-300η The known position of the sensor is added and subtracted, thereby obtaining the position of the object 120. The gap G can be calculated using a similar method as described above, which we will discuss in more detail below in conjunction with Figure 7 and the parallel field method. In an alternative embodiment, the gap G can be determined by other methods including, but not limited to, the methods described herein. The output signal of the sensor 300Α-300Ι1 is used for the inter-object distance interpolation between the sensors 13 200914800. During operation, sensors 300A-300n are continuously scanned for output by controller 190 while the first sensor is also scanned, such as sensor 300A, to determine the base distance along the sensor scan line. The scan results of the sensors 300A-300n may result in absolute position measurements of the object 120 having a high resolution or maximum resolution. In one exemplary embodiment, the exemplary sensor configuration shown in FIG. 3A may be used for low cost accuracy Position long-distance moving objects, such as manufacturing units or FABS, as described in more detail below. The sensor configuration of another exemplary embodiment shown in Fig. 3A can be used for ranging in components where object transfer occurs in any suitable device. Similar equipment includes semiconductor processing equipment, motorized product production equipment, or any other equipment, such as mechanized material processing equipment. Referring to the schematic view of the magnetic platen 400 of Figure 4, the sensors S1-S4 are visible. In the exemplary embodiment, the magnetic platen 400 includes four rows of pole pieces stacked in the Z direction and arranged in 7 rows in the X direction. Note that the pole piece shown in Figure 4 is only a portion of the magnet in the platen 400. In the alternating body, the platen 400 may contain an appropriate number of pole pieces and/or columns. In this example, the rows of pole pieces have alternating magnetic poles that are staggered or spaced apart from each other by a distance of about P/2, see Figure 4. Similarly, the pole pieces also have alternating magnetic poles that are staggered or spaced apart from each other by about P/2. The pitch between the two magnets in either row or column is P. In the alternating body, the arrangement and spacing of the pole pieces are arbitrary.

The four sensors S1-S4 in the exemplary embodiment are positioned in a symmetrical magnetic field generated by the magnetic platen 400, and in the alternating body, four or more sensors can be applied. Sensors S1-S4 are similar to the sensor characteristics described in Figures 2A and 3A. As shown in Fig. 4, the sensors S1 and S2 are first pair of sensors which are arranged in line in the direction of X 14 200914800 with a pitch of about P/2 or a half pitch between them. The sensors S3 and S4 constitute a second pair of sensors which are also substantially collinearly arranged in the X direction with a pitch of about P/2 pre-positioned therebetween. The S3 and S4 sensor pairs are offset in the X direction by a distance from the S1 and S2 sensors, about p/4, and the sensor pairs S3 and S4 are offset in the X direction by the S1 and S2 sensor pairs. /4 distance. In an alternative embodiment, the sensor distribution in the sensor pair has any suitable spacing. In other alternating bodies, there is also any suitable spacing between pairs of sensors. In this exemplary embodiment, the sensor S1_S4 responds to the magnetic field composition, which is normal for the plane of the pole piece (ie, the normal field method of measuring position). The sensor provides output signals to S1, S2 and S3, S4, and the signal is presented. The sine/cosine relationship is actually similar to that described in Figures 2B and 2C. For example, in this exemplary embodiment, the signal obtained by subtracting the signal of sensor S2 from the ss of sensor S2 is proportional to the sine of the displacement produced along the X axis. The signal ' proportional to the sine of the pitch along the X-axis is repeated in a spatial period equivalent to the pitch P of the magnet, and the signal of the sensor S4 is subtracted from the signal of the sensor S3, and the resulting signal is obtained in the axial direction. The cosine of the spacing is proportional. A signal proportional to the cosine of the pitch along the X-axis is repeated in a spatial period equivalent to the pitch P of the magnet. In addition to measuring the position along the X-axis, the sensors S1-S4 and the platen 4〇〇 can also be used for position measurement in the z-axis. For example, if the signal of sensor S2 is plus the signal of ^, the resulting signal result is proportional to the sine of the spacing in the Z-axis. The signal proportional to the sinusoidal spacing of the Z-axis is equivalent to the pitch of the magnet p, and the inter-process cycle is repeated. 'The signal of the sensor S3 plus the signal of the sensor S4 is obtained. The cosine of the spacing is proportional. The signal proportional to the cosine of the pitch along the z-axis 15 200914800 is repeated in a spatial period equivalent to the pitch p of the magnet. The sine and cosine signals can generate angles ranging from twentieth to 360 degrees in a pitch equal to the magnetic pitch, which determines the exact position of the sensor array relative to the array of magnets, and vice versa. Referring to Figure 5, the position measuring system of Figure 4 will be discussed in detail below. The positions of the sensor pairs SI ’ S2, S3 ′ S4 are different from each other. For example, the sensor pairs S3, S4 in Figure 5 are located below the sensor pair si, S2, while in Figure 4, the sensor pair S3'S4 is located above the sensor pair si, S2. In an alternative embodiment, the pairs of sensors have an appropriate configuration and/or are spaced apart from one another such that there is a sine/cosine relationship between the pairs of sensors. As seen in Fig. 5, the sensor group 53A is constituted by the sensors S1-S4 adjacent to or closest to the magnetic platen 540 including the magnetic pole units 51A and 52A. As shown in FIG. 5, the magnetic pole units are arranged in an interactive structure in which the north pole of the magnetic pole unit 510 is in contact with the sensor group 53 ,, and the south pole of the magnetic pole early element 520 is in contact with the sensing state group 53 ,, the magnetic pole unit The distance is similar to that shown in Figure 4 above. In an alternative embodiment, the pole units 51A and 52A have appropriate spacing. In the present exemplary embodiment, the four sensors S1_S4 generate two sets of signals, and the # of the two groups is in a sine/cosine relationship (ie, the output signal of the sensor S1 is in a sine/cosine relationship, the sensor The output signals of S3 and S4 are in sine/cosine relationship). As described above, the structure of the sensors s 1-S4 shown in Fig. 5 is such that the sensor can sense a magnetic field perpendicular to the magnetic platen 54A as shown in the explanation of the exemplary coordinate system 5A. Figures 6A and 9A show a three-dimensional map of a magnetic field generated by the magnetic platen 540, wherein the intensity of the magnetic field in the drawn Y-axis is opposite to the position along the X-axis and the Z-axis 16 200914800. Figures 6B and 9B show two-dimensional views of sensor outputs plotted according to the magnetic field 'intensity plots of Figures 6A and 9A, respectively. In the position measurement normal field method shown in Figs. 4 and 5, the sine and cosine relations of the two sensor pairs SI, S2 and S3, S4 are used to calculate the position of the object 120 fixed to the magnetic platen 540. For example, the sine value of the sensed signal along the X-axis can be calculated by the following formula: sin, S1-S2 [2] The cosine of the sensed signal along the X-axis can be calculated by the following formula: S3-S4 [3] pitch In P, the position of the object 120 in the Z-axis can be calculated by sinz and cosz, as follows: X = arctan - [4] COS / where X is proportional to the spacing along the magnetic pitch, due to the sensor group There is a certain preset distance between each sensor in 530, and the position of the object 120 can be obtained by subtracting or adding the interpolation position Dx corresponding to X by the preset distance. For example, assuming that the preset distance of the 530 sensor group along the X axis is C and the interpolation position Dx is equal to P/3, the position of the object 120 on the X axis may be the spacing C plus Dx (gp C+P/3 ). 17 200914800 The position similar to the z-axis can be determined by calculating the sine and cosine values of the z-axis sensing signal as follows: [5] 51 + 52 ~2~~ cos, S3 + S4 [6] Pitch P, object The position of 120 in the Z-axis can be calculated by sinz and cosz as follows: m Z = arctan S1-z cos, where Z is proportional to the partial spacing along the magnetic pitch, and each sense in sensor group 530 The detector has a certain preset distance along the Z axis. Therefore, the position of the object 120 can be obtained by subtracting or adding the spacing Dz corresponding to Z by the preset distance. For example, assuming that the preset distance of the 530 sensor group along the Z axis is B and the interpolation position Dz is equal to P/3, the position of the object 120 on the Z axis may be the spacing B plus Dz (ie, B+P/3). Calculate the square root of the sum of the squares of the sine and cosine, and the flux density can be determined. The magnetic flux density is proportional to the spacing G between the magnet assembly or platen 540 and the sensor 530, such that the gap G between the sensor group 530 and the magnetic platen 540 (i.e., the position in the Y-axis) can pass through Determine:

Gap = t*ln A ) [8]

vVsin H-cos J 18 200914800 where t and A are constants determined by the distribution of the magnets. As shown in Fig. 7, the position measuring system is composed of a sensor group 73A and a magnetic dust plate 74A. The magnetic platen 740 is substantially identical to the platen described in Fig. 5 and includes a magnetic pole unit 710 (North Pole unit) '720 (South Pole unit), 71 〇 and 720 arranged in a dialogue mode, see Fig. 7. The sensor group 73 in the exemplary embodiment contains four sensors S1-S4. In an alternative embodiment, sensor group 73A may be comprised of any suitable amount of sensors, S1-S4 may be any suitable type of sensor including, but not limited to, Hall effect sensors, inductive sensing Or capacitive sensor. The sensor SI ’ S2 constitutes the first sensor pair, S3 and constituting the second pair. The sensors S1 and S2 are arranged substantially collinearly on the Z-axis (see from the exemplary coordinate system representing 7〇〇) and are spaced apart from each other by a distance corresponding to about 1/4 of the pitch of the magnet. The sensors S3 and S4 are substantially collinearly arranged on the X-axis, and are also spaced apart from each other by a distance corresponding to the magnet screw T171. In the alternative embodiment, the spacing between the sensors can be considered. As shown in Fig. 7, in the x-axis, the sensors S1, S2 are located between and S4, and in the z-axis, the sensors S3, S4 are located between S1 and S2. In an alternative embodiment, the empty cookers of the sensors S1, S2 and S3'S4

A two-dimensional map of the sensory outputs of senses S3 and S4 and si and S2 can be seen. S2 is a sine/cosine relationship from Fig. 8B. 19 200914800 These positive/cosine relations can determine the position of the magnetic platen 74 0 relative to the sensor group 73 0 along the X and Ζ axes. The sine/cosine relationship between the sensor outputs can also be used to calculate the gap G in the x-axis between the platen 740 and the sensor group 730. For example, the position of the platen 740 along the X-axis can be calculated as follows: Z = arctan - [9]

S4 L J where X is proportional to the spacing along the magnetic pitch. Since there is a certain preset distance between each sensor group 730, the position of the pressure plate 740 relative to the sensor 730 can be obtained by subtracting or adding the interpolation position Dx corresponding to X by the preset distance (and fixing) The position of the object 120 on the platen 740). For example, assuming that the preset distance of the 730 sensor group along the X axis is C and the interpolation position Dx is equal to P/3, the position of the object 120 on the X axis may be the spacing C plus Dx (ie, C+P/3). The position of the platen 740 along the Z-axis can be calculated as follows: Z = arctan - [10] 52 where Z is proportional to the spacing along the magnetic pitch, since each sensor group 730 has a certain preset The position of the platen 740 relative to the sensor 730 (and the position of the object 120 to which the platen 740 is attached) can be obtained by subtracting or adding the interpolation position Dz corresponding to Z by the preset distance. For example, assuming that the preset distance of the 730 sensor group along the X axis is B and the interpolation position Dz is equal to P/3, the position of the object 120 on the X axis may be the spacing B plus Dz (ie, B+P/3). . The gap between the sensor group 730 and the magnetic platen 740 (i.e., the position in the Y-axis) can be calculated as follows: 20 200914800

Gap = / * In

TsfTs? [11] where t and A are constants determined by the distribution of the magnets. r\ see Fig. 2 6 - 3 4 'The position measuring system in the exemplary embodiment consists of a magnetic array m (including magnetic pole units 2601, 2602) 'first sensor group ai_a5, second sensor group B1-B5, Analog electronics 263〇 and analog-to-digital converter 264〇, 2645. Note that analog electronics 2630 and analog to digital converters 264, 2645 are components of controller (10). In an alternative embodiment, the analog electronic hall and analog to digital converter measurements, 2645 are independent of each other, but are connected to the controller. In other alternative implementations, the sensors A1-A5, B1-B5 are used to provide a digital output. In the present exemplary embodiment, each of the two sensors in each of the sensor groups has a pitch equal to the magnetic pitch of the magnets in the magnetic array. The ratio to the =η of each sensor in the set or P / n, where p is the magnetic pitch and n is the number of sensors per sensor. In the commissioning embodiment, the spacing between the sensors in each sensor group is not necessarily equal to ρ/η, and the two sensor groups are offset by about D/2. The spacing of the sensors in each group, as well as the two senses, and the offset between them are arbitrary. As described above, when the magnetic array turns in a direction, such as when the axis moves axially through the sensor, the sensor groups Α1-Α5, Β1-Β5 generate periodic signals. In the implementation of the show, the sensor AM is very close to the magnetic transfer train, so each sensed poem reaches fullness: the exemplary signal generated by Α5 is shown in Figure 27-31, the sinusoidal signal is measured, and the saturation side is reached. 'The 敎 or level of the hand indicates that each sensor has reached the saturation limit. Similar to Figure 27·31, the sensor m_B5 reaches its 21 200914800 saturation limit. (Although the output changes along the x-axis and other axes) analog electronics 2630 sums the output signals of sensors A1-A5 to generate signal A, see Figure 32. Analogy electrons sum the output signals of sensors B1-B5 to generate signal B, see Fig. 33. In an alternative embodiment, the sensor generates a digital output, and the analog electrons can be replaced with digital electrons. Note · When summing the sensor signals, some signals such as those generated from the sensors A2 and A4 (such as every two interval sensing signals) can be reversed. In an alternative embodiment, the sensing signals of any of the sensors may be opposite. In other alternative embodiments, the signal cannot be reversed. As shown in Figures 32 and 33, for each of the sensor groups A1-A5 and B1-B5, the sum of the saturation signals produces a sawtooth signal 3200, 3300 that moves in a phase. Signals A3200, B3300 are used to determine the position of the magnetic array or platen Μ relative to sensors A1-A5 and B1-B5, as discussed in detail below. We further note that compared to the pair of unsaturated sine/cosine waves shown in Figure 34, the waveform generated by the saturation signal has a shorter period, which determines the response rate of the sensor to the magnetic array 较高 is higher and improves. Sensor resolution. We have realized that there are certain errors in the measurement process for a number of reasons, including uneven magnetic fields. The error produced by the normal field measurement method may be caused by the magnetic field generated by the motor coil. It may also be caused by the magnetic plate itself. Position measurement errors due to inhomogeneous magnetic fields, etc., can be corrected in a number of ways, including but not limited to methods such as adding sensors, look-up tables, and/or magnet optimization. Additional sensors are added to the position measurement system and the pitch between the sensors is reduced to increase sensor resolution and immunity. Taking the normal field measurement method as an example, after adding two sensors, you can calculate the four combinations of angles or tangent. 22 200914800 Within a pitch, these three angles produce four cycles of tangent, see Figure 12A. Similarly, if four additional sensors are installed into the sensor groups 530 and 730, one magnetic pitch will produce a tangent of eight cycles. The correction factor is also used to provide increased immunity and improve sensor accuracy. For example, in the parallel field method, referring to Fig. 12C, the sensors SI_S4 display data (Fig. 12C, element 1200), and the initial position measurement method is calculated using the following formula (Fig. 12C, element 1200):

+ SJ a = arctan— [12] [13] 51 = arctan — 52 where α represents the uncorrected position of the X-axis and β represents the uncorrected position of the Z-axis. The correction factors δ ΐ, δ2, δ3, δ4.··δη are obtained from the lookup table (Fig. 12C, element 1200). The correction factor δ ΐ - δ η can be any correction factor obtained by experiment, sensor sensitivity information, magnet operating point on the demagnetization curve, and/or other information. The correction factor δ ΐ - δ η is used to calculate the corrected sensor output value Sl'-S4' (see Figure 12C, component 1230) as follows:

Sr=dl*Sl [14] S2'=a2*S2 [15] S3'=33* S3 [16] S4,=d4*S4 [17] Correction position along the X and Z axes and sensor group 73 The correction gap between 0 and the magnetic platen 740 can be calculated using the following formula: (Fig. 12C, component 1240) 23 200914800 X = arct3xi - S4f [18] sv Z = arctan_ [19] f dnn a f * In —- ---— A u(四) + (S2,)2 > where t and A are constants determined by the distribution of the magnets. Figures 13 and 14 show exemplary plots of gap measurement and Ζ axial measurement after applying the correction factor. Although the application of the correction factor is discussed by taking the parallel field method as an example, the correction factor can also be applied to the normal field method, and the application method is basically the same as the above method. As described above, the accuracy of the position measurement system can be improved after the magnet is optimized. In the exemplary embodiment shown in the figures, the magnets on the magnetic platen are circular or diamond shaped. However, the magnets can be in any suitable shape including, but not limited to, squares, diamonds, ellipses, rectangles, trapezoids, circles, triangles, and the like. Applying the minimum error caused by the uneven magnetic field to the measurement process, the shape of the magnet on the magnetic platen can be optimized to generate a sinusoidal wave or the like. The optimization of the magnet will be described below in terms of diamond and circular magnets, and the optimization method described herein can be applied to magnets of any suitable shape. An exemplary magnetic platen is shown in Figures 15A-15C. As can be seen from Figure 15, the non-optimized magnetic platen comprises a circular array or a cylindrical magnet. Fig. 15] 3 and 15C show an optimized form of a cylindrical magnet in which each of the magnets has a conical shape (having a flat top). Fig. 15B shows a magnet having a 50 degree side or a balance angle, and Fig. 15C shows a magnet having a 60 degree side or a pitch angle. Figure 16A shows a diamond magnet in a non-optimized structure, and Figure 16B shows an optimized diamond shaped magnet having a 5 degree edge or a pitch 24 200914800 angle. The magnet in an alternate embodiment may have any suitable angle. The magnets in other alternative embodiments may be of any suitable shape, rather than a circular cone. Figure 17 shows a sinusoidal wave generated by a non-optimized cylindrical magnet such as that shown in Figure 15A as the platen passes the sensor. As can be seen from Figure 17, the sine wave is not smooth and the waveforms along all axial directions (X, Z and magnetic field strength axes) fluctuate. For diamond magnets, Figures 19A-19C show the signals generated by the non-optimized magnetic platen 1900 (see also Figure 16A), which further illustrates the parallel field method. As can be seen from 1910 and 1920 in Fig. 19A, the magnetic field strengths of the X-axis and the Z-axis are plotted along the opposite positions of the X-axis and the Z-axis, with uneven peaks and troughs. These non-uniform peaks and troughs are also present in the two-dimensional map 1930, where the magnetic field strength is plotted based on the X-axis and Z-axis positions. When the position along the X-axis or the Z-axis is determined, the graph drawn from the position result is as shown in Fig. 19B, and the position data points obtained from the angle of the sinusoidal wave are distributed on both sides of the best fit line 1950. Similarly, the gap distance map between the drawn magnetic platen and the sensor is not the same pitch measurement as shown in Fig. 19C. Figure 18 illustrates the sinusoidal waves generated by the optimized magnets as shown in Figures 15B, 15C and 16B as the platen passes the sensor. As can be seen from Figure 18, the sine wave is smooth, so the accuracy of the position measurement obtained from the optimized sine wave is higher than that from the non-optimized sine wave. Fig. 20A shows an exemplary optimized magnetic platen 2000 having a structure substantially the same as that described in Fig. 4. As can be seen from Fig. 20A, when the magnetic field strength is plotted along the X-axis, the Z-axis, or the opposite directions of the X-axis and the Z-axis, the resulting sinusoidal waves 2010, 2020, 2030 are smoother, so the measurement error is minimized. As can be seen from Fig. 20B, the position data points obtained from the sinusoidal waves are substantially along the 25 200914800 line 2050. Similarly, the gap distance map between the magnetic platen and the sensor is plotted, not the same pitch measurement as shown in Figure 2GC. Magnetic field optimization can be achieved by the edges of a single magnet such as a modified magnetic platen. The value of the pitch angle can be determined using the standard deviation σ, which represents the magnetic field deformation in the sensing region. For example, see Figure 22. When the edge angle of the diamond magnet is around % (see point J) or the edge angle of the conical magnet is about degrees (see point "Κ"), the standard ^ is close to 〇. As can be seen from Fig. 21, when the rake angle of the rhombic magnet is about 50 degrees or the pitch angle of the conical magnet is about 60 degrees, the normalized power of the magnetic field strength is the largest, wherein the normalized power is defined as: ne=¥^§^ [21 The clothing is not adjusted, the weight represents the weight of the magnetic platen, and the RMS represents the root mean square of the magnetic field strength (the value in Figure 5). Figure 23 further shows the relationship between the magnetic field strength and the magnet spacing of the magnetic raft, while Figure 24 shows the magnetic field effect of a non-optimized (four) magnet with optimized diamond and conical magnets. In the alternative implementation of the financial "simplified optimization can be called (four) # material to achieve. In another exemplary embodiment, the position sensing resolution enhancer (psRE) = is sufficient to increase the resolution of the position feedback device, such as the analogy region described herein.

In the two non-secret embodiments, the PRSE can be leveled between one or more sensor outputs and the input of one motor controller. In an alternative embodiment, the PRSE: generates a signal by locating at any appropriate recording to correct the sensing (4). It is important to note that when the motor controller is used in this example, the controller can be a controller that can receive position sensor signals. In the exemplary embodiment, the micro E 26 200914800 ' ^ long or octave multiplication, division and double, quadruple amplification, etc. processing position sensing = number ★ the frequency of the sinusoidal distribution such as the position line number can pass the factor

〇 etc. increase the position sensing resolution. In other exemplary embodiments, the PSRE is optimized for monitoring the amplitude of the signal. This type of optimization monitoring is a rotor-stabilizer alternative. The signal amplitude optimization monitoring can be used for rotation or = secret. Any use of the towel, such as (but limited to) those applications described herein. In the "unclear embodiment", the sine and cosine values of the sensor signal are derived from the derivation domain. These signals are also sinusoidal signals, but the periodic division is — the half of the original ^ period, in this case. In the middle, the resolution of the sensor is doubled. However, the 'digital converter type device that varies with the magnetic sense caused by varying the gap and/or temperature generally produces a smaller ratio. The vibrating seed bit has & small amplitude, which effectively reduces the position resolution. The signal generated by the change and love must be compensated by the value proportional to the amplitude. In order to avoid the problem caused by the change (four), the demonstration The embodiment segments the signal amplitude, which is known as the sum of the square of the hard and cosine signals and the sum of the squares of the amplitudes. The amplitude variation can be regarded as the division of the gentleman beer, the τ 士, and thus, the phase The square of the amplitude is basically dependent on her... Holding in the range of the digital converter's to provide an unconstrained resolution doubling. _ As mentioned above, the continuous signal squared makes the bit magnetic sense to 'if the amplitude of the sensor is used To deal with things like induction Equation, the square of the amplitude signal can be processed in the analog region to get the optimal linearity and resolution within the desired range. 27 200914800 Figure 35 shows the resolution enhancement described above. In the example, the sensor induces a magnetic field. The resulting signal is distributed in a sinusoidal curve, and the signal is squared and compensated to obtain the desired value of the direct current, which is twice the resolution of the signal (4 times, etc.) As can be seen from Fig. 35, the line 50100 represents the initial sensing signal. Line 50101 represents the doubled signal, which will be described below. As can be seen from the figure, the period of the double signal 50101 is half of the initial signal 50100, and FIG. 35 is a structural diagram of the exemplary processing procedure. A sensor resolution is doubled and quadrupled. In an alternative embodiment, the resolution of the sensor can be doubled (4 times, etc.) increased by any suitable method. In Figure 36, S1 And S2 represents the initial sensing signal, as shown in Figure 37, where:

Sl = A sin(x) [22] and S2 = Asin(x + (p) [23] where Φ represents a fixed phase change between the two signals and A represents the amplitude. In an exemplary embodiment, Φ It is possible that the phase change is determined by hardware. In an alternative embodiment, the value of Φ can be determined by any suitable method. To simplify the explanation, the position associated with the sinusoidal signal distribution will be referenced in this article by the concept of "frequency". In an exemplary embodiment, to obtain a 4x sine and cosine signal, the Φ value is approximately equal to 22.5. In an alternative embodiment, the Φ value can be any suitable value to achieve the desired frequency. 36, SI2, S22 represent the signals SI, S2 after compensation and correction of the square. The frequency of SI2, S22 is the value after double multiplication. 28 200914800 Note: In an exemplary embodiment, the offset can be based on the initial sin ( The x) and sin (χ+Φ) signals are corrected by constructing the cosine signal. The mathematical relationship between them is: sin(x + Φ) = sin π cos Φ + cos X sin Φ [24] where sinO and cosO are Known constant coefficients determined by the sensing pitch. In the embodiment, sin < I > cosO and may be any value.

The physical meaning of the above exemplary equation [24] is: A sin(x + Φ) = sin x cos Φ + cos x sin Φ [25] where A represents the amplitude of the voltage sloshing signal. Similarly, A cos(x) A sin(x + Φ) - ^ sin(x) cos(O) $ίη(Φ) [26] sin ( x ) and cos ( x ) can be calculated after squared, as follows Formula: A2 sin2(x) + A2 cos2(x) = A2 [27] This amplitude is used for offset correction and signal conditioning, such as dividing the signal by A2 to make the amplitude optimal for further processing. 4sm2(x)=sin2(;c) [28] _42Α,.,= “(Χ + Φ) [29] thus producing a signal independent of amplitude variation. Second offset correction and multiplication of two sine/cosine signals After that, the quadruple frequency can be obtained according to the initial input signal S1, 29 200914800 S2 (shown in Figure 39). It should be noted that the signal can be repeatedly adjusted multiple times to obtain the required accuracy, as shown in Fig. 36. The double signal S12, S22 is doubled again to obtain quadruple signal (S12) 2, (S22) 2. Under ideal signal conditions (as shown in Fig. 40), the frequency multiplication described herein causes an increase in positional accuracy. As can be seen in Figure 40, both lines 50200 and 50201 represent arctangent (inverse function of sine/cosine) equations for position calculation. The expected line 50200 is a signal of frequency f (or pitch p), while line 50201 is a frequency of 4f. The signal (pitch P/4) is seen in Figure 40. The exemplary embodiment actually reduces the pitch and increases the resolution of the position sensor, which is also true for the sensors described herein. The stability will be discussed in accordance with Figure 41-44. In the following example Randomly Generated Interference of Correlated Input Signals In the example, Figure 41 shows an input signal with an error of 5%, and Figure 42 shows its corresponding output signal. As described above, if double-squared is used for the channel of the sensing signal, any accessory miscellaneous The signal is multiplied by 4. The power automation gain control matches the single amplitude and digital converter range and optimizes the digital inherent error, which can reduce the noise amplification. The noise high frequency band can be filtered out before the signal processing operation, crossing the corresponding channel (such as Amplitude calculation) to attenuate the synchronization residual noise and associated non-synchronous residual noise, at least to some extent, to find a quadruple position resolution. In an alternative embodiment, the noise amplification can be reduced by any suitable method. Note that in some cases, the noise introduced by the sensing electrons can be ignored. According to an exemplary embodiment, the position resolution of the position feedback system can be estimated using a sinusoidal equation. For example: the feedback system uses two fixed Huo The ear effect sensor locates the 1/4 pitch (ie, 90° phase shift) and senses the shaft with the permanent magnet/ The sinusoidal magnetic field generated by the plate. In an alternative embodiment, the system can use any suitable number or type of sensors, 30 200914800. It is recognized that the two sensors generate a sinusoidal signal for the shaft/platen (eg sine/cosine signal) Calculate the tangent of the ratio of the values of the two signals. a = arctan [30] ^cos ) The periodic position of the motor can be determined. The sine and cosine in equation [30] represent the signal, Instead of a function, the feedback system in an alternative embodiment uses a suitable number of sensors to determine the position of the motor within a certain measurement unit. To calculate the position resolution error εα, the partial derivative 3/3sin is obtained by equation [30]. δ/Scos is as follows:

d δ sin r sin * 5 arctan , cosJ + ^C0S% 5 cos arctan , cosJ

[31] where ssin and sC0S represent sinusoidal and cosine signal errors, respectively. Use the following simplification:

D_ dx [arctan(i/(x))] = 丄, l + U2 dx [32] d sin d sin cos

Cos [33] sin cos2 d sin cos [cos can be found that εα is equal to 31 [34] [35] 200914800

If you use sine and cosine functions [35] instead of sine and cosine signals, the equation can be written as:

*[ A cos a ) 〇 氺 f Asina 彳 V.A^sina2 +A2cosa2 J ^COS lA^sina^ +A2cosa2 J

A A2(sina^ +cosa2) *[ε sin *cosa-scos *sina]

*cosa-ffc〇s*sina] [36] where A represents the amplitude of the signal. Assuming that the analog converter's analog quantity range is equivalent to 2A (volts) (that is, using the full range of the digital converter analogy), the signal uncertainty error is mainly compared to the digital conversion resolution N (bit) = (2xA) /2N (volts), the linear position resolution ^ can be expressed as follows:

2η 2π A ^2n ±fc〇sa ^ [(± cos a) - (+ sin a)] [37]

T private small stop, cosine # number cycle (such as pitch). The analogy and the digital converter analog quantity are connected by the resolution multiplier, as shown in the structure diagram of Fig. 47 (Note: Fig. 47 shows 32 200914800 does not mean. Increase $' in the alternative embodiment The multiplier can have appropriate structure and components to achieve the signal multiplication described herein. The output signal noise level of the multiplier should not exceed the resolution of the digital converter analog. The noise based on the number of times the signal is multiplied can be expressed as: Only S = sin2*n =^>

Q

Ss^SsiD *^η*ήη2^ [38] ... where 11 is not a multiplier. As described above, the square of the sinusoidal function generates a sinusoidal function with double frequency (for example, a half period), whereby the linear position resolution εχ can be written as: Ρ £χ =^^T(^*[(±c〇sa) )-(±sina)] [39] where p represents the period of the initial signal. Each additional signal multiplier is twice the linear resolution of the feedback device. It is important to recognize that the above function indicates that the linear position resolution is only As a typical example, the position resolution can be obtained by any suitable function. The position resolution of the non-standard embodiment enhances the amplitude variation of the signal, such as gap variation, noise, and incomplete magnetic field (or other factors). When the input signal changes, the resolution enhancement described above normalizes the signal within its amplitude and produces a non-distorted sine/cosine output signal. For example, Figure 43 shows the application and input amplitude with 2〇% The input signal of the noise Figure 44 shows the signal output of Figure 43 after being processed by the resolution enhancer. The gap size or other information can determine the calculated signal amplitude (Figure 44). The resolution enhancer can increase the resolution of the gap size. For example, once the gap range determines the full analogy of the 'digital converter, it can only be used to analyze the determined gap range. As a non-limit For example, if the gap is not less than 5 ηηπι and not more than 8 mm, the digital converter analog quantity range can be used to analyze the 5 mm to 8 mm area. As described above, the amplitude of the sinusoidal signal is determined by the gap value, and the gap can be defined as

Gap = t*ln[| \ =t * In B ) ) LVsin2 + cos2 ^ [40] where B and t are hardware-dependent constants, sin and (10) represent sinusoidal signals (non-function), and A represents the amplitude of the signal . ^ and ^ in alternative embodiments may be any suitable constant value. Partial differentiation of equation [40], the gap resolution sG is: ' '

Where gsi, d 5 sin a 5 cos ( t*ln

B in VVsin +cos B /sin^ + cos2 [41] The simplified formula 'ε5ίη and sc()S represent the error of the sine and cosine signals, respectively, as d dU(x) 34 [42] [43]200914800 —h{ x)n]= n*Un~l *fHi) do dx d , *In "BV 1 5 sin tVsin2+c〇s2 y Vsin2 + cos2 *- 1 L 5 sin _Vsin2+ cos2 ^Vsin +cos 5 sin2 9 sin In + cos [44] -r * sin sin2 + cos2 [45] The resolution of the gap size can be expressed by the following formula: _ -/*sin r ^=iTn2+cos2Kn%Sin+^s*cos] Assuming the digital converter analogy The range is equivalent to 2A (volts) (for example, using the full range of digital converter analogy), the main source of signal uncertainty / error is the digital converter analog quantity, N (bit) = (2xA) / 2N (volts) , function [45] can ^ t sin + cos' soil 2* A ~¥~ cos [46] If the sine and cosine signals are replaced by sine and cosine functions, then -t A2 sin2 α + A2 cos2 α [(+ sin a)+(+ cos a)] '土^/*Asina) + (±^i*AC〇sa [47] or 35 200914800 = [(+sin a)+(+ cos α)ί [48] The above-mentioned position resolution is similar to 'equation [48], indicating that the resolution of the total gap is 45, 135, 225, and 315 degrees. A periodic function of the value. When the sensing is connected to the digital converter by the resolution enhancement, the gap information can be obtained from the amplitude of the sine and cosine signals derived/preprocessed in the analog region. The signal amplification can be converted to gap information 'compressed into the region of interest and sent to the digital converter analogy. In this case, the gap resolution can be approximated as: where AG represents the region of interest Area Note that the above example is introduced in conjunction with double the signal (such as double or multiplied signal of the initial signal), and the exemplary embodiment can also be used for the initial # number or for other multiplication factors (eg 1, 2) , 3, 4, etc.) The multiplied signal obtained is multiplied. As described above, the exemplary position measuring system can be used in any suitable device with a mechanical transport system, such as transferring products from one location to another. Problem, the operation of the demonstration position measurement system will be combined with the semiconductor processing equipment to introduce, but need to pay attention to , The exemplary position measurement systems described above can be applied to any suitable apparatus. Referring to Fig. 48, an exemplary semiconductor substrate processing apparatus 351() is applied to the non-standard embodiment. The processing device 3510 is coupled to an Environmental Front End Module (EFEM) 3514, which includes a number of loads 2009 36 200914800 3512. The Load Tan 3512 can support a certain amount of substrate storage tanks, such as conventional FOUP tanks, and other suitable types. The EFEM 3514 communicates with the processing device via load lock 3516, which is associated with the processing device. The EFEM3514 (open to the environment) has a substrate transfer device (shown) that transfers the substrate from the load 珲3512 to the load lock 3516. The EFEM3514 also features substrate correction, group processing, substrate and carrier validation, and more. . For alternative embodiments, the load lock 3516 is in direct contact with the load port 3512 in the event that the load lock has a batch processing function or direct transfer of the wafer from the FOUP to the lock. Some of the similar devices are disclosed in U.S. Patent Nos. 6,071,821, 6,071,059, 6, 375, 925, 6, 461, 094, 5, 588, 789, 5, 613, 821, 5, 607, 276, 5, 644, 925, 5, 954, 472, 6, 120, 229, and U.S. Patent Application Serial No. 10/200,218, filed on Jul. 22, 2002. , all of which are incorporated herein by reference. Alternative embodiments may use other load locks. Still referring to FIG. 48, the processing device 3510 is referred to above for processing a semiconductor substrate (eg, a 200/300 mm wafer or other suitable size wafer), a flat panel display substrate or other type of substrate, constituting a transfer chamber 3518, a processing module 3520, and at least A substrate transfer device 3522, the substrate transfer device 3522 is integrated with the chamber 3518. In this exemplary embodiment, the process modules are mounted on both sides of the chamber 3518. In other exemplary embodiments, the module 3520 can be disposed in One side of chamber 3518 is shown in FIG. Figure 48 shows that the processing modules 3520 are opposite each other, placed in the row Yb or vertical. In other alternative embodiments, the processing modules may be staggered on opposite sides of the transfer chamber or stacked one on another in the vertical direction. The transport device 3522 includes a transport vehicle 3522C that is moved in the chamber 3518 to transfer the substrate between the load lock and the processing chamber 3520. The instrument shown is only equipped with the car 3522C, and in the alternative real 37 200914800 «I, w = 35i8 ^ and there are two: (four): & read, or have a clearing environment, m its internal combination] cultivating application substrate transfer equipment 3522 treats the processing module in a Cartesian process; ^ π 'the base is parallel to the substrate or the row and column parallel. This result ==: the injury is more compact than the traditional processing equipment (ie has the same number of processing modes, see Figure 54. In addition, the transmission chamber section length, and any number of processing modules attached, thus increasing the instrument The processing capacity of the state is as follows: 曰 曰 曰 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输 传输The processing device's processing capacity becomes a limited processing, and the non-leiched operation communication processing capacity can be increased by the above-described processing ribs and the same-platform opening; AS, the transmission chamber 3518 in the exemplary embodiment is Ordinary moment lengths, the transmission chamber in the embodiment can have other shapes. The transmission chamber is much finer than the width, and defines the linear transmission t of the transmission device. The transfer chamber (10) has a radial side wall 3518S, the side wall 3518S has a transfer port or 埠 35180, and the transfer line 3 51RD έΛ p _u l is sized to ensure that the substrate can pass through the wide door) and enters and exits the transfer chamber. As can be seen from Fig. 48, the exemplary embodiment of the module is mounted on the outside of the side wall 3518S, and the transfer cassette 35180 is arranged in a straight line in the chamber (10). The periphery of the transfer cassette 35(4) is placed against the side wall 3 of the transfer chamber 3518. A vacuum turntable for the transfer of the i 3518 is asked. Each processing module 3520 has a «' control by means of -^, turning off the transmission 珲Μ· when needed. 38 200914800 Transmission 埠 35180 are all on the same level. Correspondingly, the processing modules 3520 in the transfer chamber 3518 are also arranged on the same horizontal plane. The transport ports 35180 in alternative embodiments are arranged on different levels. As shown in Fig. 48, in this exemplary embodiment, the load lock 3516 is mounted on the transfer chamber side walls 3518S of the two forwardmost transfer ports 35180, which ensures that the load lock 3516 is located opposite the processing device. EFEM3514 is adjacent. In an alternate embodiment, the load lock 3516 can be mounted on the other 35180 transfer ports of the transfer chamber 3518, see Figure 5A. The hexahedral shape of the transfer chamber 3518 allows the length of the transfer chamber 3518 to be a desired length to mount the desired number of processor modules. (For example, Figures 49, 51-53 show other exemplary embodiments. The length of the transmission chamber is sufficient to accommodate the installation of a sufficient number of processors, as previously mentioned, in the transmission chamber of the exemplary embodiment shown in Figure 48.

There is a substrate transmission device containing a transmission car 3522C, 3522. The transmission device 3522 is integrated in the transmission chamber towel, and the axle transmission vehicle 3522 (: moves back and forth between the front position 3518F and the rear position 3 in the transmission room. The transmission device welcomes the transport vehicle 3522C with a last job, which can drive - One or more substrates move. The transport vehicle 3522C also has an articulated arm or a movable transport mechanism to a, which is used to expand and shrink the end effector to achieve the processing module or the negative solution 3516. The load material is collected (4), the substrate is placed, and the transmission is set in the module/holding internal positioning end (4), which is used to carry out the base transmission device 3522, as shown in Fig. 48, which has a transmission vehicle 3522C, as shown, a representative transmission. The mounting is controlled by a linear support/drive rod. The transmission 39 200914800 device is substantially identical to the magnetic levitation transmission device described in U.S. Patent Publication No. 2004/151562, but other transmission devices can be used. The linear support/drive rod is mounted on the side wall 318S, The bottom or top surface of the transfer chamber can extend the length of the transfer chamber. This ensures that the transport vehicle 3522C and the device can traverse the length of the transfer chamber. The transport vehicle 3522C has support The frame of the arm 'the frame also supports the corner wheel chassis or platen 3522B that moves with the frame or relative to the frame. Other suitable motors, such as a continuous synchronous linear motor, drive the platen 3522B and thereby drive the transport vehicle 3522C. In the exemplary embodiment, the articulated arm is coupled to the pressure plate 3522B by a suitable coupling/transmission, such that when the pressure plate 3522B is moved by the drive, the articulated arm extends or contracts. For example, after installing the transmission, when When the pressure plate 3522B is moved apart from each other along the rod, the hinge arm extends to the left, and when moved back, the hinge arm is contracted from the left. The pressure plate 3522B can also be operated by a linear motor to extend/contract the hinge arm 3522A toward/from the right side. When driving, the movement control of the pressure plate 3522B by the slide bar, the position sensing of the pressure plate 3522B and the transport vehicle 3522C, and the extended/contracted position of the articulated arm can be realized by the position measuring system described above. With the magnetic pressure plate MP For example, for example, the exemplary pressure plate 400 is fixed on the transmission platen 3522B or each transmission platen 3522 The components of B, whereby the magnetic field generated by the platen MP is directed to the side wall 3518S in the transfer chamber 3518 (Fig. 55, block diagram 4200). Sensor group Q (each sensor group contains a sensor group) (as shown in Figures 4, 5, and 7), the sensor pair (as shown in Figures 2A and 3A), a single sensor (shown in Figure 3A), or any combination between them) with one of the above The mode is placed along the side wall 3518S, and the transfer chamber 3518 is arranged along the running path of the transport vehicle 3522C and the transport platens 3522A, 3522B. Note: For clarity of expression, only a small number of sensor groups Q can be used in the same position. The position of the 3522C can be combined individually or in part. see. It should also be noted that it is not used to accurately determine the transmission vehicle.

The 359G is used to scan the sensor Q group, the first scanning sensor at the point 358G, and the position of the wheel carrier 3522C is positioned back to the point to generate the king position measurement (Fig. 55 'Structure diagram 421〇). As described above, the position of each of the sensor groups q is at a predetermined interval from the reference point transmitted to 35丨8, and the position of the magnetic platen can be roughly determined when the magnetic platen passes through the sensor 4'. The more precise position of the magnetic platen Mp and the transmission, car = 22C can be determined mathematically by the above-described sensing output (Fig. 55, block diagram 4220). In this example, since each platen 3522B includes a magnetic platen MP, the position of each platen 3 5 22B can be determined separately, whereby all of the platens 3522B can be simultaneously activated in the same direction, thereby allowing the entire transfer vehicle/equipment to be in the transfer chamber. The inner portion of the 3518 is moved radially; or the pressure plate is driven separately, and the hinged arm 3522A carried by the transport vehicle 3522C is elongated or contracted. It should be noted that the position of the transport vehicle 3522C corresponding to the wall of the transmission chamber (such as the gap between the chamber wall and the vehicle) can be measured and adjusted accordingly, and the position of the vehicle 3522C between the two chamber walls 3518S is determined. The predetermined location can handle the exact layout of the substrate of the module 3520. Fig. 49 shows another substrate processing apparatus 3510' which is substantially the same as 3510. In the exemplary embodiment, transmission chamber 3518' has two transport devices 3622A and 3622B. Transmission device 3622A' 3622B is substantially identical to 3522 described above, see FIG. The transfer devices 3622A, 3622B are all supported by a common set of radial slide bars. The platen of the transfer car corresponding to each transmission device is driven by the same linear motor. The different drive zones of the linear motor allow for independent actuation of a single platen on each of the transport cars 3622A, 3622B, so that a single transport car 3622A, 3622B can also be independently driven by 41 200914800. It will be appreciated that the linear motor can be operated independently (in a manner similar to that described above) and the hinged arms of each device can be independently extended/contracted. However, in this case, the substrate transfer devices 3 622A, 3 622B cannot pass each other in the transfer chamber unless an independent taxi system is applied. As described above, each of the platens that are transported includes a magnetic platen MP that is coupled to a sensor group Q that is fixed to the chamber wall 35 18 . In the exemplary embodiment, the processing modules are arranged along the length of the transfer chamber 3518' such that the substrates are transferred to the processing module 3518' for processing, which prevents the transmission devices 3622A, 3622B from interfering with each other. For example, the processing module for the coating is positioned prior to the heating module, and the cooling module and the etching module are finally positioned. However, the transfer chamber 3518 contains two additional transfer regions 3518A' and 3518B that allow the two transport devices to traverse each other (similar to a side pole, a split rod or a magnetic levitation region that does not require a support rod). Next, other transmission areas can be positioned above or below the panel where the processing module is located. Each of the transmission areas 351 and 3518B' has its own sensor group q, so that the transport cars 3622A, 3622B can be independently tracked when the transport vehicles are in respective transmission areas 3518A' and 3518B, respectively. The transport device in the exemplary embodiment has two slide bars, one for each transfer device. One slide bar is positioned on the bottom or side wall of the transfer chamber and the other slide bar is positioned on top of the transfer chamber. In an alternative embodiment, the linear drive system is used to simultaneously drive and suspend the transport vehicle, and the transport vehicle will independently move horizontally or vertically, thereby transferring or transporting the substrates independently of each other. It should be noted that the sensor group 卩 combined with the magnetic platen MP can be used to track the vertical position of the 3622A, 3622b each transport vehicle 'they pass above/below each other to avoid collision, this collision may break The substrate carried by the ring transport vehicle or transport vehicle ^ In all instruments using electric windings, the windings can also be used as 42 in the case of heating and degassing (such as water vapor removal) in the transmission chamber. A dedicated linear drive motor is driven or driven in the dedicated drive area where the transport vehicle is located. The clamp = 2 counts and / 3 are shown in other exemplary embodiments, and other substrate processing apparatuses are provided with an integrated map of the additional system. As can be seen from Figures 52 and 53, the transmission chamber is elongated to be connected to: transmission: Group diagram The apparatus shown in Figure 52 has 12 processing modules, each of which is connected to the transfer chamber and is in the group of the molds ^ Set (shown as two devices) with 4 as an example, %备所~人#... The number of modules in the general example is only for the ten people in the Yuhan area. The number of modules can be arbitrary, as before Said. The surface is similar, the processing module is arranged in Cartesian along both sides of the transmission chamber. The number of round=module columns is greatly increased (as shown in Figure 52, 6 rows, to know the row). Figure 52 In the exemplary embodiment shown, the 丽 can be detached and the load 直接 can be directly connected to the load lock. In Figures 52 and 53 = there are multiple transmission devices (ie, three in Figure 52, Figure 53 6), can lock and the substrate in the processing chamber. The number of transmission devices shown is only an example, the actual number of devices can be more or less. The transmission device is generally the same on the disk, including - An articulated arm and a transport vehicle, wherein the material position and the extension/retraction multi-dimensional position measuring system of the articulated arm are longitudinal. The transport vehicle is driven by a linear motor on the side wall of the transmission chamber, and the linear motion drive transmission vehicle is in two. Orthogonal coordinate axes (ie, radial and vertical translation in the transmission chamber. Correspondingly, the transmission devices can pass each other in the transmission chamber. The transmission chamber has the "mechanical" (4) located above and/or below the processing module (10). Domain 'transport device needs to set route (4) free transport The substrate in the phase processing module or the transmission device operates in the opposite direction. The substrate transmission device can control the movement of the plurality of substrate transfer devices. 43 200914800 Still referring to Fig. 53, the substrate processing devices 3918A and 3918B are directly The controller 3900 is coupled. It can be seen from Figures 49, 50, 52-53 that the transfer chamber 3518 can extend as desired across the processing device PF. As seen in Figure 53 and further discussion below, the transfer chamber is associated with various components or Compartment, 3918A, 1918B processing equipment PF, such as storage, "lithography tools, metal deposition tools or other suitable tool compartments to connect and communicate. The compartments that are not connected to the transfer chamber 3518 can also be configured as a program compartment or a 3918A, f, 3918B program. Each compartment has the required tools (such as photolithography, metal deposition, hot dip, cleaning, cleaning) to complete a given semiconductor workpiece fabrication process. In each case, the processing modules in transfer chamber 3518 are communicatively coupled to various tools in the equipment compartment to ensure that semiconductor workpieces are transferred between the transfer chamber and the processing module. Thus, the transfer chamber has different environmental conditions along its length, such as atmosphere, vacuum, high vacuum, gas injection or other conditions associated with different processing modules connected to the transfer chamber. Accordingly, a given program's transfer chamber component 3518P1, or an interval 3518A, 3518B, or a portion of the interval, may have one environmental condition (e.g., atmosphere), while the other component 3518P2, 3518P3 may have a different environmental condition. As mentioned earlier, the components 3518Ρ1, 3518Ρ2, 3518Ρ3 with different environmental conditions are located in different compartments of the equipment, or both are in the same compartment. Fig. 53 shows a transfer chamber having three * members 3518Ρ1, 3518Ρ2, 3518Ρ3, wherein the three components are different in environmental conditions, and are merely exemplified. The chamber 3518 in the exemplary embodiment has different components depending on the environment. Each of the components 3918A, 3918Β, 3518Ρ1, 3518Ρ2, 3518Ρ3 has a sensor group Q that is positioned along the sidewall of the transmission member. For transmission components that do not require a high-precision position of the transmission 3266Α, such as the 3518Ρ2, the sensor configuration shown in Figure 3Α can be used, so that the cost of the transmission 3266 is reduced and can be accurately tracked. In an alternate embodiment, any combination of exemplary position measuring devices can be applied to any of the 3918A, 3918B, 3518P1, 3518P2, 3518P3 transmission components. As can be seen from Figure 53, a transmission device similar to the 3622A (see Figure 49) in the transmission bay 3518 enables switching between different environments between the 3518P1, 3518P2, 3518P3 components. Thus, as seen in Figure 53, transmission device 3622A utilizes a acquisition substrate to move a semiconductor workpiece from a program in a processing device or a tool in interval 3518A to another tool having a different environment or a tool in interval 3518A. For example, the transmission device 3622A collects a substrate from the processing module 3901, which may be an atmospheric module, a lithography module, an etch module, or other required processing module in the component 3518P1, and the transmission device 3622A is oriented in the direction of the arrow. Moving, Figure 53 shows moving from component 3518P1 of the transfer chamber to 3518P3. In component 3518P1, transport device 3622A places the substrate in the desired processing module 3902. As can be seen from Fig. 53, the transfer chamber may be a module which is connected to the chamber module to form a transfer chamber 3518. The module includes an inner wall of 35181, similar to the walls 3518F, 3518R in Fig. 48, for separating the transfer chamber. The components 3518P1, 3518P2, 3518P3, 3518P4 inner wall 35181 include a grooved valve or other suitable valve to ensure that components 3518P1, 3518P4 can be communicatively coupled to one or more adjacent components. The groove valve 3518V is sized to ensure that one or more transfer vehicles can pass through the valve and run from the components 3518P1, 3518P4 to other components. In this way, the car 3622A can be moved anywhere in the transfer chamber 3518. When the valve is closed, the components 3518P1, 3518P2, 3518P3, and 3518P4 can be separated so that different components can contain different environments. Further, the inner wall of the transfer chamber module is fixed to form a load lock 3518P4, see Fig. 48. The load lock 3518P4 (only one of the 45 200914800 in Figure 53 for illustration) is positioned in the chamber 3518 and has the required number of transport vehicles. Referring to Figure 54, an exemplary manufacturing apparatus diagram is shown using an automated material transport system (AMHS) 4120. In this exemplary embodiment, the AMHS workpiece is transferred from the hopper 4130 to one or more processing tools 4110, the AMHS includes one or more transport vehicles 4125 and a transport trace 4135, and the transport trajectory 4130 can be any suitable path. The transmission path includes sensor groups Q, Q distributed along the trajectory as described above. The transport cart 4125 includes one or more magnetic platens MP that interact with the sensor group Q to provide position measurements for the 4125. The position of the object 120 to be tested or tracked can be tracked using a sensor that is closer to the end of the object 120, so the controller can allow multiple objects to move along the same transmission path, it tracks each object to avoid between objects contact. In an alternative embodiment, if the length of the object is known, the object 120 is tracked using a sensor near the end of the object 120, where the controller uses the positional measurement of the position of the first end of the object plus or minus The length of the object is removed to determine the spatial distance that the object produces along the transmission path. It is to be understood that the exemplary embodiments discussed herein are described with reference to a linear drive system, and the exemplary embodiments can be applied to a rotary drive system as modified. For example, the exemplary embodiment can be used to track the rotational speed and axial position of an object within a cylinder while measuring the distance between the rotating object and an inner wall of the cylinder. The exemplary embodiment described herein is equipped with a position measuring system capable of measuring an infinite length of movement along a first axis and simultaneously measuring positions along the second and third axes. The position measurement system can be integrated into any suitable transmission device. While the exemplary embodiment described herein is capable of simultaneously measuring three axial object positions, one measurement system 46 200914800 can be used in conjunction to measure more than three axial positions. Conversely, the demonstration can also be applied or constructed as a measurement system capable of measuring 3 or less axial positions. It will also be appreciated that the 'exemplary embodiments' can be used individually or in combination. The position measuring line of the exemplary embodiment can obtain the position information of the object without assigning the dynamic force of the movable object. However, although the exemplary embodiment has the magnetic pressure plate fixed on the movable object, the magnetic pressure plate is also It can be fixed on the fixed surface of the object; the sensor is fixed on the movable object. It should also be understood that the 'exemplary embodiments may be used singly or in combination with one another. 'Others' are merely illustrative of the exemplary embodiment process and the nature month b. Different selections and modifications can be made to the exemplary embodiments using art techniques. Correspondingly, the tf exemplary embodiment design tends to encompass all selections, modifications, and differences within the scope of the description. [FIG. 1 illustrates a portion of a position measurement system in accordance with an exemplary embodiment. 2A is a partial schematic view of a position measuring system of an exemplary embodiment; FIGS. 2B and 2C show sensor component signals of the position measuring system of FIG. 2; FIG. 3A shows another exemplary implementation. Figure 3B shows the output signal of the sensor component of the position measuring system of Figure 3A, 47 200914800 Figure 4 shows a magnetic platen and sensor construction diagram of an exemplary embodiment Figure 5 is a view showing a configuration of a magnetic platen and a sensor of another exemplary embodiment; Figures 6A and 6B are graphs showing magnetic field strengths generated by the magnetic platen sensed by the sensor of Figure 5; A magnetic platen and sensor configuration diagram drawn by another exemplary embodiment; FIGS. 8A and 8B are graphs showing magnetic field strengths generated by the magnetic platen sensed by the sensor of FIG. 7; FIGS. 9A and 9B are diagrams. Sensor output graph of an exemplary embodiment; Figures 10A-11B show sensor output plots of an exemplary embodiment; Figures 12A and 12B show different numbers of sensor locations within one magnetic pitch in an exemplary embodiment The resulting sensing period; Figure 12C shows a working flow diagram of an exemplary embodiment; Figures 13 and 14 show a corrected position measurement map of an exemplary embodiment; Figures 15A-15C show magnetics of a plurality of exemplary embodiments Figure 16A and 16B show the magnetic platen configuration of other exemplary embodiments; Figure 17 shows the magnetic field curve produced by a non-optimized magnetic platen; Figure 18 shows the magnetic field curve produced by an optimized magnetic platen. Figures 19A-19C show magnetic field geometry produced by a non-optimized magnetic platen of an exemplary embodiment; Figures 20A-20C show magnetic field geometry produced by an optimized magnetic platen of an exemplary embodiment; Figure 21- 25 shows a magnetic platen optimized chart of an exemplary embodiment and 48 200914800 picture; FIG. 26 is a partial schematic view of a position measuring system which is not an exemplary embodiment; FIG. 27di main - The wheel-out curve of the sensor of the exemplary embodiment is shown; Figures 32-33 show the output graph of the additional sensor of the exemplary embodiment; Figure 34 is not the output of the sensor of another exemplary embodiment FIG. 35 is an exemplary signal multiplication of an exemplary embodiment; FIG. 36 is a signal multiplication block diagram of an exemplary embodiment;

37-39 show signal multiplication of an exemplary embodiment; Fig. 40 shows a frequency multiplication signal of an exemplary embodiment; and Figs. 41-44 show an input and output signal of an exemplary embodiment signal error; Figs. 45 and 46, respectively </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; 55 represents a workflow diagram of an exemplary embodiment. ~, [Key component symbol description] 100 Sensor 140, 150 Magnet 180 Designated surface 500 Coordinate system 120 Object to be tested 170 Magnetic platen 190 Controller 510, 520 magnetic pole unit 49

Claims (1)

200914800 X. Patent application scope: 1 · A kind of equipment, including: a controller; a workpiece transmission device communicatively connected with the controller, the controller has a moving part and a transmission path; and a multi-dimensional position measuring device, including at least _ The magnetic field generating station, which is positioned on the movable portion, is at least one sensing 11 group located along the transmission path and connected to the controller. The magnetic field generating station is used for position measurement and driving the movable P piece to 〉 A sensor group is used to sense the magnetic field generated by at least one magnetic field generation A. It is used to calculate the multi-pure component of the (4) component, and calculate the output of the two sensors, 'and the sensors. The multi-dimensional position comprises at least one planar position and a gap between the workpiece transfer and the at least one sensor group. 2. As set forth in claim i, at least—(d) difficult groups are used to sense to a plane position as an absolute position measurement. 3. If requested! The apparatus in which at least one of the magnetic field generating stages is formed of a magnet of a certain shape, the wire providing a sinusoidal curve of the magnetic material substantially *distorted. 4. The apparatus of claim 3 wherein the magnet is comprised of a diamond magnet having an edge angle of about 50 degrees or a conical magnet having an edge angle of about 5G or 6G degrees. The device of n θ month length item 1, wherein at least one sensor group is mounted for the normal component of the magnetic field generated by the magnetic field generating station, wherein the normal component is perpendicular to a surface of the magnetic field generating station of 50 200914800. 6. As set in the request item, the magnetic field generated by the induced magnetic field generating station (four) / to the m sense group is used for the parallel component of the magnetic field generating table, wherein the parallel component is parallel to the measured two =: two in the middle::- The _ group consists of a single-sensor pair (four) sensor that relies on its ... for the composition, the / domain 'of which at least one of the sensor groups consists of the sensor cosine relationship. The output signal provided by the sensor of the centering center is a device in the sine/sense 9 item i, wherein at least one of the sensor groups is composed of a first and a first sensor pair, wherein A salty test residue department is located above the second sense (four) pair. "4 - the sine / cosine off for the parent error; the deficiencies in the t item 9" wherein the output signal of the first sensor pair is cosine, and the output signal of the second sensor pair has a sine/cosine relationship. The sensor 1 St salt 1:, the injury, wherein at least one of the sensor groups consists of the first system is located in the second residual pair, wherein the 'first-sensor pair is orthogonally closed to the measured pair Between the sensors. 51 200914800 A device according to the U, wherein the output signal of the first sensor pair smoke (four)* is sinusoidal [cosine relationship] The output signal of the second sensor pair is sinusoidal/cosine in the first moving axis. C. As in the device of claim 1, the position detector of at least one of the magnetic field generating stations reaches the saturation limit. At least one of the sensor groups is positioned to be connected, and the sense in at least one of the sensor groups is added The device of item 1, wherein the control 11 can determine the movable object;:::= the position of the second axis, which is calculated by calculating the ratio of the output signals of at least one of the sensors. a value in which the output sine and cosine relationship, the inverse tangent value and the pitch of the magnetic field generator are intervening in the device of the month 15, wherein the square root of the sum of the squares of the at least one sensor is configured Another controller purchases the position of the =::: direction, where the square root of the sum of squares is proportional to the spacing between the sense group and the magnetic field. 52 200914800 17. The device of claim 1, wherein at least one of the sensor groups consists of a certain number of sensor groups 'these sensor groups are separated from each other by a pitch corresponding to a base circle. a pitch, a configuration The controller is configured to continuously scan the output of the complex sensor group, wherein the first sensor group corresponds to the base spacing along the scan line of the sensor group, thereby obtaining the position of the movable component within a base circle pitch Absolute measurement. 18. The device of claim 1, wherein the configured controller is operative to adjust a sinusoidal period of the output received from the at least one sensor group, the position measurement obtained from the adjustment signal is greater than the unadjusted sinusoid The value obtained by the output of the cycle is more accurate. 19. A position measuring system for measuring the position of a system of a moving object transmitted by a material transport system in a predetermined area, the position measuring system comprising: a moving object comprising a magnetic field generating station; a sensor unit that interacts with the magnetic field generating station; a second position measuring component that includes a sensing stolen group that interacts with the magnetic field generating station; The controller connected to the sensor unit and the sensor group can receive the position determination signal generated by the sense==body and the sense n group, and is used to calculate the position measurement obtained by the second position measurement component. The value is more accurate than the first position measuring component. 53. The position measuring system of claim 19, wherein the position measuring system is integrated in a material transfer system, and the second position measuring component is comprised of a complex measuring system &quot;~ 21. a position measuring system, including : A magnetic field generating station on a moving object; a number of sensors spaced apart from each other by a predetermined distance, the number of dampers being used to generate a sinusoidal given signal corresponding to the magnetic field generated by the magnetic field generating station. —y A controller connected to a number of sensors. The controller is used to adjust the sinusoidal output signal. The predetermined factor multiplies the frequency of the sinusoidal output signal. The resolution of the position measurement system can be increased by the equivalent of the pre-factor. . 22. The position measurement system of claim 21, wherein the sinusoidal output is adjusted&apos; also increases the resolution of the position measurement system in the analogy region. 23. The position measurement system of claim 21, wherein the controller is operative to determine a multi-dimensional position of the moving object based on the sinusoidal output, wherein the multi-dimensional position includes a gap measurement. 24. A method comprising: L passing a magnetic field generating station to generate a magnetic field, the magnetic field generating station partially driving an object fixed thereto; 54 200914800 sensing a component of at least one magnetic field by a certain number of sensor groups; The output of the number of sensors determines at least one three-dimensional position of the object. 25. The method of claim 24, wherein the at least one magnetic field generating station is comprised of a shaped magnet that provides a substantially undistorted sinusoidal curve of the magnetic field. The method of claim 24, wherein the method for determining the three-dimensional position comprises: ^ calculating the arctangent of the ratio of the output signals of the sensor group along each of the axial outputs.........the axial position, wherein the output signal In a sine/cosine relationship, the inverse tangent value is proportional to the small-to-small spacing between the magnets. 4 students. And at least one sensor group by means of the quantitative sensor group output signal, the position of the moving part along the third axial direction, the square root of the basin, and the displacement The square root of the sum of squares is proportional to the magnetic field generation: and to the ==string/cosine relationship' spacing. The method of claim 2, wherein the method of sensing the magnetic field generating the magnetic field generated by the at least one magnetic field component is perpendicular to the surface of the magnetic field generating station; The component 'where the normal component sag the magnetic field generated by the magnetic field generating station is parallel to the surface of the magnetic field generating station. In the file, wherein the parallel component is flat 55 200914800 28. The method of claim 24 includes continuously scanning the output of the quantitative sensor group, the position of the magnetic field generating station being positioned back to the first sensing of the scanning sensor group. Group, used to give an absolute position measurement. 29. In the method of claim 24, the output is a sinusoidal output, the method comprising adjusting the period of the sinusoidal output, the bit f obtained from the adjusted signal, the measured value being compared to the output of the unadjusted sinusoidal period The value obtained is more accurate. \ 56