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TW200845838A - Unit for acquiring align image information and apparatus and method for bonding printed circuit on FPD panel - Google Patents

Unit for acquiring align image information and apparatus and method for bonding printed circuit on FPD panel Download PDF

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Publication number
TW200845838A
TW200845838A TW97117370A TW97117370A TW200845838A TW 200845838 A TW200845838 A TW 200845838A TW 97117370 A TW97117370 A TW 97117370A TW 97117370 A TW97117370 A TW 97117370A TW 200845838 A TW200845838 A TW 200845838A
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TW
Taiwan
Prior art keywords
substrate
platform
printed circuit
vacuum
pressure welding
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TW97117370A
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Chinese (zh)
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TWI364247B (en
Inventor
Myeong-Chul Jin
Original Assignee
Sfa Engineering Corp
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Priority claimed from KR1020070046459A external-priority patent/KR100913579B1/en
Priority claimed from KR1020070046458A external-priority patent/KR20080100582A/en
Application filed by Sfa Engineering Corp filed Critical Sfa Engineering Corp
Publication of TW200845838A publication Critical patent/TW200845838A/en
Application granted granted Critical
Publication of TWI364247B publication Critical patent/TWI364247B/en

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  • Pressure Welding/Diffusion-Bonding (AREA)

Abstract

An apparatus for bonding a printed circuit includes a stage having an upper surface supporting a substrate to which the printed circuit is to be bonded and transferring and drawing out the substrate to a bonding process position. a pressure head provided at the bonding process position capable of elevating, absorbing the printed circuit, and pressing the absorbed printed circuit against the substrate to bond the printed circuit to the substrate, and a unit for acquiring align image information photographing at least one chip mark formed on the printed circuit absorbed and at least one glass mark formed on the substrate together to acquire align image information of marks. Thus, the printed circuit is bonded to the substrate in a simple and convenient method and simultaneously a tact time for the bonding process is reduced and a high speed of the bonding process is embodied.

Description

200845838 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種用以獲取校準影像資訊裝置以及用 以將印刷電路壓銲在平板顯示器面板上的設備及方法,特 別是指一種可以一簡單且方便的方法,同時地縮短一壓銲 流程的加工時間,以實現高速度之壓銲流程的獲取校準影 像貢訊裝置以及將印刷電路壓銲在平板顯示器面板上的設 ^ 備及方法。 【先前技術】 一般而言,例如電漿顯示面板(plasma display panel,PDP)、液晶顯示器(iiqUid crystal display,匕⑶) 以及有機發光二極體(organic light emiuing di〇de, OLED)專專的平板顯示器(panei diSpiay,fpd), 係逐漸地製造的更薄、更輕。於是,不同的印刷電路係直 ( 接連接到平板顯示器且製造成一種整合性產品。在下列的 敘述中,平板顯示器係表示液晶顯示器基板(lcd substrate) ° 印刷電路包括可撓性印刷電路(flexible printed circuit,FPC)、捲帶式晶片載體封裂(tape啦心 package,TCP)與一般成批的軟性電路板,以及驅動積體 電路(driver 1C)。這些印刷電路係直接連接到一基板, 以便不需要一複雜的佈線,也因此使得組裝、保養與維修 、交得奋易❿且’既(然不需要分隔的佈線空間,印刷電路 可以適合於使產品小型化與㈣化,以便獲得有品質的產 5 路了相谷不同的佈線,因此印刷電 而不會受到基板的使用與規格所影200845838 IX. Description of the Invention: [Technical Field] The present invention relates to an apparatus and method for acquiring a calibration image information device and for pressing a printed circuit on a flat panel display panel, in particular, a simple And a convenient method to simultaneously shorten the processing time of a pressure welding process to obtain a high-speed pressure welding process for obtaining a calibration image information device and a device and method for pressure-welding the printed circuit on the flat panel display panel. [Prior Art] In general, for example, a plasma display panel (PDP), a liquid crystal display (iiqUid crystal display, 匕(3)), and an organic light emiuing di〇de (OLED) Flat panel displays (panei diSpiay, fpd) are gradually made thinner and lighter. Thus, different printed circuits are connected directly to the flat panel display and fabricated into an integrated product. In the following description, the flat panel display indicates a liquid crystal display substrate (lcd substrate) ° The printed circuit includes a flexible printed circuit (flexible printed circuit (flexible) Printed circuit (FPC), tape-and-roll wafer carrier (tape package), and general batches of flexible boards, and driver integrated circuits (driver 1C). These printed circuits are directly connected to a substrate. In order to avoid the need for a complicated wiring, and thus make assembly, maintenance and repair, and to make it easy and 'both (without the need for separate wiring space, the printed circuit can be adapted to miniaturize and (4) the product, in order to obtain The quality of the production of 5 roads has different wirings, so the printing is not affected by the use and specifications of the substrate.

200845838 品。再者,既然印刷電 路可以被廣泛地使用, 響。 印刷^ΐ用以將—印刷電路直接地壓銲到-基板上之 在最:係續不斷地進行著。特別是’ 銲流程。-種實程中的完全自動模組屢 法,係介紹如下 元全自動模組料流程的壓銲方 =考圖卜係表示―般習知的完全自純組壓鮮流 曰㈤1巾’所相完全自動模組Μ銲流程區分成一破 离復日日(chip-on-glass,c〇G)壓銲流程以及一玻璃上膜 (film-on-glass,F〇G)壓銲流程。 、 在玻璃伋日日(COG)壓銲流程的敘述中,印刷電路係 以驅動積體電路表示。在玻璃覆晶(⑽)壓銲流程中,1、 t流程目標的基板係置放在-平台上,而且-異方性導電 膠膜(anisotropic conductive filra,ACF)係圖案化並 連接到在基板上供驅動積體電路連接的位置。 驅動積體電路係使用如同一搬運機的一運送設備,而 從一用以容納驅動積體電路的供給托盤抓取,並在異方性 導電膠膜圖案化的位置將驅動積體電路作預壓銲(在此之 後,係代表預先按壓或者是預先壓銲)。之後,驅動積體電 路係藉由加熱以及加壓在基板及驅動積體電路而進行完全 地壓銲(在此之後,係代表主要地按壓)。為了確認驅動積 體電路是否正確地壓銲到基板,則利用一用以確認驅動積 6 200845838 以及一用以確認是否 體電路是否正確地連接的壓痕檢查, 產生裂縫的裂縫檢查來實現。 :玻璃覆晶壓銲流裎之後所進 銲流程相同。也就是;係大致與破璃覆晶壓 电路連接亚认到基板的流程者,财璃上膜 程為 Ο200845838 products. Furthermore, since the printed circuit can be widely used, it is loud. The printing is used to directly bond the printed circuit to the substrate. Especially the 'welding process. - The complete automatic module method in the real process, the introduction of the following elementary automatic module material flow of the welding side = Kao Tubu said that "the general self-pure group of fresh pressure rogue (five) 1 towel ' The phase-complete automatic module soldering process is divided into a chip-on-glass (c〇G) pressure welding process and a film-on-glass (F〇G) pressure welding process. In the description of the daytime (COG) pressure welding process, the printed circuit is represented by a drive integrated circuit. In the glass flip-chip (10) pressure welding process, the substrate of the 1, t flow target is placed on the platform, and an anisotropic conductive filra (ACF) is patterned and connected to the substrate. The position on which the drive integrated circuit is connected. The driving integrated circuit is grasped from a supply tray for accommodating the driving integrated circuit by using a conveying device such as the same carrier, and the driving integrated circuit is pre-positioned at a position where the anisotropic conductive film is patterned. Pressure welding (after this, it means pre-pressing or pre-welding). Thereafter, the integrated integrated circuit is completely pressure-bonded by heating and pressurizing the substrate and driving the integrated circuit (hereinafter, it is mainly referred to as pressing). In order to confirm whether or not the driving integrated circuit is properly soldered to the substrate, it is realized by a crack inspection for confirming the driving product 6 200845838 and an indentation inspection for confirming whether or not the body circuit is properly connected. : The welding process is the same after the glass flip-chip welding. That is to say; it is generally connected to the broken crystal pressure circuit to recognize the substrate, and the film process is Ο

壓鲜例如—由薄膜形成的可撓性印刷電路或是導電壓膜 (conductive bondlng film)的流程,而且此可換 =或是導電壓膜係連接在玻璃覆晶壓銲流程中的驅動積 體电路以及-印刷電路板(printed ci加t b〇咐,㈣。 在玻璃上膜壓銲流程中’印刷電路係以可挽性印刷電路為 代表。 請再參考圖1,在異方性導電膠膜黏貼到基板之後, 已校準在基板上的可撓性印刷電路係預先按壓在異方性導 電膠膜上。因此可撓性印刷電路與基板則已經相2校準完 成。在預先按壓完成之後,基板與可撓性印刷電路係藉由 加熱與加壓而相互進行完全地壓銲(主要地按壓)。之後, 即進行用以確認基板與可撓性印刷電路是否適當地結合在 一起的壓痕檢查,以及用以確認裂縫是否產生在基板的裂 縫檢查。當玻璃覆晶壓銲流程以及玻璃上膜壓銲流程完成 時,會進行如一電性測試的輔助流程,再進行一最終封装 流程,因此而完成了所述的完全自動模組壓銲流程。 以如上所述的壓銲流程索完成的液晶顯示器基板 中,已進行的玻璃覆晶壓銲流程的液晶顯示器基板包括一 上玻璃或一彩色濾光玻璃,以及一下玻璃或是一薄膜電晶 7 200845838 • 豸聽,其部分的表面配置為液晶係灌注在上玻璃與下玻 璃之間,且上偏光片與下偏光片係分別黏貼到上玻璃及下 玻璃的外表面。 在上玻璃中用以形成一彩色影像的區域,係小於在下 _中用⑽成1色影像的區域。而未與上玻璃重疊的 非重&區段係汉置在下玻璃上表面的一側,即對應於上述 的驅動機體電路。 ^ 補習知驅動機體電賴銲縣板關銲流程,為了 I &㈣銲絲機體電路必須置放在基板上的一料 位置。在這種狀况下,當一壓頭降下來按壓驅動機體電路 時,才能獲得所欲的品質。因此,在壓銲流程之前,驅動 機體電路與基板之間需要有一相對應的校準流程。 麵耗體電職基板之_騎的校準流程,一習 知的壓銲設備係包括二攝影機。此二攝影機用來拍攝並獲 取形成在驅動機體電路上的二晶片標記,與形成在基板上 的標記的影像°之後’支撐基板的平台係在χ、γ轴 ^ 又以相對應二晶片標記進行校準。最後,使用壓 頭將驅動機體電路壓銲到基板。 、明苓考圖2,係表示用以解釋一習知壓銲印刷電路之 方t的桃耘圖。如圖2所示,當用以提供一驅動機體電 路白士供給手臂,運送到位在-壓銲位置的壓頭之下部區 域日^壓頭係下降到一拿取位置(步驟sm)。在壓頭即 升工以便壓頊可以拿取驅動機體電路(步驟12)。 當拿起驅動機體電路時,壓頭即上升到一離開位置(步驟 1 卩)〇 8 200845838 • 静上升_開位置時’移動供給手臂,意即所述 的下部區域離開(步驟_。此時, ξι, ' 达在供給手臂運送之後,壓頭即下降 白攝位置(步驟S115)。二攝影機即拍攝由壓頭以直 動機體電路之二晶片標記(步驟su6)。在完 的拍攝之後’下降到拍攝位置的壓頭即上升 回到離開位置(步驟SI 17 )。 〇 將一支撐基板的平台運送到—壓銲流程位置(牛驟 重支^ iff述的非重《區段),係設置在所述_銲流程位置。 虽平。運㈣鱗流餘料,將 台與辅助工具所支撐(步驟S119)。 板]由千 ^己=大:'二攝影機即拍攝形成在基板上的二玻璃 ^己(力驟S12G)。在完成二破璃標 基板的平台即在Χ、γ軸及Θ角, =支撐 片標記進行校準(步驟S121)。 μ别 、一日日 當完成平台的校準時,Μ頭即下降到 (步驟S122)並進行預壓銲流程(步驟犯^ 麼銲流程之後,將壓頭升起__ =成, 平台往上移動之後(步驟S125),則移出平台;步驟=在 當供給手臂移動時(步驟S127),則 ~ S127的操作。 旻乂驟sill到步驟 玻璃二==技術’由於二晶片標記的拍攝與二 ==:;=;r到步驟⑽每- 進订❿疋獨自進行,因此在將 200845838 機體電路壓鲜到基板的加工時間之降低,會有一定的限 制。因此,需要一改進的方法。 而且,在習知的壓銲設備中,由於平台的支撐表面係 支撐黏貼到下玻璃之下表面的一下偏光片區域,以及辅助 工具的支撐表面係直接地支撐下玻璃未黏貼到下偏光片的 區域,如所述的非重疊區段,因此平台的支撐表面以及輔 助工具的支#表面並未在同一表面,以便產生與下偏光片 A 厚度相同的高度差。換句話說,基板大致上並未支撐在一 ^ 完全平坦的狀態。 當壓銲設備按壓基板上的驅動機體電路區域,而且基 板並未支撐在一完全平坦狀態時,在基板上即產生一彎曲 的動力。在重要的案例中,由於過度的彎曲動力而可能使 基板損傷或是使基板產生裂痕。 為了避免在基板上產生損傷或是裂痕,平台的支撐表 面以及輔助工具的支撐表面需要盡可能地設置在同一平面 上。然而,由於下偏光片的厚度而不容易達成平台的支撐 " 表面以及辅助工具的支撐表面在同一平面上。即使平台的 支撐表面以及輔助工具的支撐表面並未位在同一平面上, 當基板的厚度不是太薄時,在基板上就會產生損傷或是裂 痕。 實際上,由於目前在移動終端的液晶顯示器基板的每 上玻璃及下玻璃,係使用〇 5mm的厚度,因此當驅動機 體電路壓銲在具有上述厚度的基板上時,即使平台的支撐 表面以及輔助工具的支撐表面並未位在同一平面上,在基 板上可能會產生損傷或是裂痕。 200845838 不過,根據正在發展或是未來希望去發展的使用者規 格’每一上玻璃及下破璃的已知厚度會是〇· 25mm。當基板 的厚度縮減到此一程度時,若是平台的支撐表面及從機版 的底部以支樓基板的輔助工具大致上並未位在同一^平面的 話,在驅動機體電路的壓銲流程期間,於基板上極有可能 會產生損傷或是裂痕,而因此無法獲得在壓銲流程中的品 質。 因此,當基板的摩度漸漸地縮減而變薄時,則需要有 用以校準平台及輔助工具之支樓表面的一測量設備。然 而,不僅由於產品製造商不想購買昂責而技術複雜的結構 之測量設備,也因為校準平台的支撐表面與輔助工具的支 撐表面之時間增加,而造成加工時間無法避免地增加的難 題0 【發明内容】 為了解決上述的問題,本發明係提供一種用以獲取校 準影像資訊的裝置以及用以將一印刷電路壓銲在一平板顯 示态上的設備與方法,係藉以一簡單且方便的方法將一印 刷包路壓銲到一基板,且同時降低壓銲流程的加工時間, 以實現高速度的壓銲流程。 本發明提供一種用以獲取校準影像資訊的裝置以及 用以f一印刷電路壓銲在一平板顯示器上的設備與方法, 係可藉由使用簡單的結構與方法有效地支撐基板,以避免 印刷電路壓銲流程期間,在基板上產生損傷或是裂痕,甚 11 200845838 ^是當基板的厚度比以f知技術所使用的基板厚度更薄 4,亦可避免在基板上產生損傷或是裂痕。 ^ m康本&明之一目的’在用以印刷電路與基板之間的 =所獲得印刷電路與基板上的校準影像資訊的裂置中, 獲取影像資訊的裝置係—體成型,且將形成在印 記拍摄=至少—晶片標記與形成在基板上至少—玻璃標 η 在一起,以獲取這些標記的校準影像資訊。 設備ίΓΓ月的另―目的’―種用以壓銲—印刷電路的 基板運、:,、平台’具有支撐—基板的—上表面,且將 到該χΓ並取㈣—祕流錄置,而該印刷電路係壓銲 該印刷=1 S頭,係設置在該壓銲流程位置,而可以將 板,以i 吸起,且按壓該被吸起的印刷電路到該基 資訊的電路壓_該基板;以及—獲取校準影像 片;、置,係將形成在該被吸起的印刷電路之至少一曰 以雜=與形成在該基板上之至少一玻璃標記拍攝在一起, ^唼等標記的校準影像資訊。 方法根t本發明的再—目的,—種用以壓銲—印刷電路的 位置.i括將—用以支撐—基板的平台運送到—壓銲流成 時地括拿起—印刷電路的壓頭下降到—拍攝位置;同 該基板的形成在該印刷電路上的至少一晶片標記與形成在 訊;依播至少—玻璃標記’以獲取該等標記的校準影像資 該基柄在該等標記上所獲取的校準影像資訊,將支擇有 的下降的平台相對於該晶片標記進行校準;以及藉由壓頭 ,將該印刷電路壓銲到該基板。 、 12 200845838 ΟPressurization, for example, a flexible printed circuit formed of a film or a process of a conductive bond film, and this can be replaced or a conductive film connected to a driving integrated body in a glass flip chip bonding process. Circuit and printed circuit board (printed ci plus tb〇咐, (4). In the glass film bonding process, the printed circuit is represented by a printable printed circuit. Please refer to Figure 1, in the anisotropic conductive film. After being adhered to the substrate, the flexible printed circuit that has been calibrated on the substrate is pre-pressed on the anisotropic conductive film. Therefore, the flexible printed circuit and the substrate are already calibrated. After the pre-pressing is completed, the substrate is The flexible printed circuit is completely pressure-bonded (mainly pressed) to each other by heating and pressurization. Thereafter, an indentation inspection for confirming whether the substrate and the flexible printed circuit are properly combined is performed. And the crack inspection to confirm whether the crack is generated on the substrate. When the glass flip chip bonding process and the glass film bonding welding process are completed, an auxiliary process such as an electrical test is performed. And then performing a final packaging process, thereby completing the fully automatic module pressure welding process. In the liquid crystal display substrate completed by the pressure welding process as described above, the liquid crystal display of the glass flip chip bonding process has been performed. The substrate comprises an upper glass or a color filter glass, and a lower glass or a thin film electro-crystal 7 200845838. The surface of the portion is configured such that the liquid crystal is infused between the upper glass and the lower glass, and the upper polarizer is The lower polarizers are respectively adhered to the outer surfaces of the upper glass and the lower glass. The area for forming a color image in the upper glass is smaller than the area where the image is formed by (10) in the lower image, but not overlapped with the upper glass. The non-heavy & section is placed on the side of the upper surface of the lower glass, which corresponds to the above-mentioned driving body circuit. ^ The programming of the body is based on the welding process of the electric board, in order to I & (4) the wire body circuit must be Placed in a material position on the substrate. Under this condition, when a pressure head is lowered and pressed to drive the body circuit, the desired quality can be obtained. Therefore, before the pressure welding process A corresponding calibration process is required between the driving body circuit and the substrate. The calibration process of the surface power consumption circuit board, the conventional pressure welding equipment includes two cameras. The two cameras are used to capture and acquire the formation. Driving the two wafer marks on the body circuit, and after the image of the mark formed on the substrate, the platform supporting the substrate is calibrated on the χ, γ axis and corresponding to the two wafer marks. Finally, the body is driven by the indenter. The circuit is pressure-welded to the substrate. Figure 2 is a diagram showing the square of a conventional pressure-welded printed circuit. As shown in Figure 2, when used to provide a driving body circuit, the white supplier supplies The arm is transported into the lower portion of the indenter at the position of the pressure welding. The pressure head is lowered to a take-up position (step sm). The press head is lifted so that the pressure can be taken to drive the body circuit (step 12). . When picking up the drive body circuit, the pressure head rises to an exit position (step 1 卩) 〇 8 200845838 • When the static rise _ open position 'moves the supply arm, meaning that the lower area leaves (step _. , ξι, ' After the delivery arm is transported, the indenter is lowered to the white camera position (step S115). The second camera captures the two wafer marks of the straight body circuit by the indenter (step su6). After the completion of the shooting' The head that has been lowered to the shooting position is raised back to the leaving position (step SI 17). 运送 A platform supporting the substrate is transported to the position of the pressure welding process (the non-heavy "section" of the bull It is set at the position of the welding process. Although it is flat, the (four) scale flow residual material is supported by the table and the auxiliary tool (step S119). The board is composed of thousands of cameras = large: 'two cameras are formed on the substrate Two glass ^ ^ (force S12G). In the completion of the two broken glass substrate platform is in the Χ, γ axis and Θ angle, = support sheet mark for calibration (step S121). When calibrating, the hoe is lowered to (step S122) and performed. The pre-welding process (after the step of the welding process, the indenter is raised __ = , after the platform is moved upward (step S125), the platform is removed; step = when the supply arm moves (step S127), Then ~ S127 operation. Step sill to step glass two == technology 'because the shooting of the two wafer marks and two ==:;=;r to step (10) per-subscription ❿疋 alone, so in the 200845838 body There is a certain limit to the reduction of the processing time of the circuit to the substrate. Therefore, an improved method is needed. Moreover, in the conventional pressure welding equipment, since the support surface of the platform is supported and adhered to the lower surface of the lower glass. The lower polarizer area, and the support surface of the auxiliary tool directly support the area where the lower glass is not adhered to the lower polarizer, such as the non-overlapping section, so the support surface of the platform and the support #surface of the auxiliary tool are not On the same surface, in order to produce the same height difference as the thickness of the lower polarizer A. In other words, the substrate is not substantially supported in a completely flat state. When the pressure welding device presses the driving body on the substrate In the circuit area, and the substrate is not supported in a completely flat state, a bending power is generated on the substrate. In an important case, the substrate may be damaged or cracked due to excessive bending power. Damage or cracks are generated on the substrate, and the support surface of the platform and the support surface of the auxiliary tool need to be disposed on the same plane as much as possible. However, the support of the platform is not easily achieved due to the thickness of the lower polarizer. The support surfaces are on the same plane. Even if the support surface of the platform and the support surface of the auxiliary tool are not located on the same plane, when the thickness of the substrate is not too thin, damage or cracks may occur on the substrate. In fact, since each of the upper glass and the lower glass of the liquid crystal display substrate of the mobile terminal is used with a thickness of 〇5 mm, when the driving body circuit is pressure-welded on the substrate having the above thickness, even the supporting surface of the platform and the auxiliary The support surfaces of the tool are not located on the same plane, and damage or cracks may occur on the substrate. 200845838 However, according to the user specifications that are being developed or hoped to develop in the future, the known thickness of each of the upper and lower glass will be 〇·25mm. When the thickness of the substrate is reduced to such a degree, if the supporting surface of the platform and the auxiliary tool of the supporting substrate of the slave plate are not substantially in the same plane, during the pressure welding process of driving the body circuit, There is a high possibility of damage or cracks on the substrate, and thus the quality in the pressure welding process cannot be obtained. Therefore, when the friction of the substrate is gradually reduced and thinned, a measuring device for calibrating the surface of the platform of the platform and the auxiliary tool is required. However, not only because the product manufacturer does not want to purchase the measuring device of the technically complicated structure, but also because the time of the supporting surface of the calibration platform and the supporting surface of the auxiliary tool increases, the processing time is inevitably increased. In order to solve the above problems, the present invention provides a device for acquiring calibration image information and a device and method for pressure welding a printed circuit on a flat display state, which is a simple and convenient method. A printing package is pressure welded to a substrate while reducing the processing time of the pressure welding process to achieve a high speed pressure welding process. The present invention provides an apparatus for acquiring calibration image information and an apparatus and method for pressure welding a printed circuit on a flat panel display, which can effectively support the substrate by using a simple structure and method to avoid the printed circuit. During the pressure welding process, damage or cracks are generated on the substrate. Even when the thickness of the substrate is thinner than the thickness of the substrate used in the technique, the damage or crack on the substrate can be avoided. ^m Kangben & Ming's purpose 'in the crack between the printed circuit and the substrate = the obtained printed circuit and the calibration image information on the substrate, the device for acquiring image information is formed and formed. At the imprinting = at least - the wafer marks are formed with at least the glass marks η on the substrate to obtain the calibrated image information of the marks. The other purpose of the device ΓΓ ― ― 种 种 种 用以 用以 用以 压 压 压 压 压 压 压 压 压 压 压 压 压 印刷 印刷 印刷 印刷 印刷 印刷 印刷 — 印刷 印刷 — 印刷 印刷 印刷 印刷 印刷 印刷 — — — — — — — — — — The printed circuit is pressure-welded to the printing=1 S head, and is disposed at the position of the pressure welding process, and the board can be sucked up by i, and the circuit voltage of the sucked printed circuit is pressed to the base information. a substrate; and - obtaining a calibration image; and placing, at least one of the formed printed circuits is photographed together with at least one glass mark formed on the substrate, Calibrate image information. Method root t The purpose of the invention is to use a pressure welding-printing circuit position. The support is used to support the substrate of the substrate to be transported to - the pressure welding flow is taken up - the pressure of the printed circuit The head is lowered to a photographing position; at least one of the wafers formed on the printed circuit is marked and formed with the substrate; at least one of the glass marks is used to obtain the calibration image of the marks, and the base handle is at the mark The calibration image information obtained thereon calibrates the selected descending platform relative to the wafer mark; and press-bonds the printed circuit to the substrate by the indenter. , 12 200845838 Ο

依據本發明的再-目的,—種用以壓銲一印刷電路的 设備’包括-平m以運送—基板,且將該基板取出 到-印刷電路的料流成位置及將縣板從該印刷電路的 壓銲流程位置取出,該基板具有—上玻璃及—下玻璃,而 若干上偏光片及下偏光片係分別黏貼到該上玻璃及該下玻 璃的外表©、—_工具’係設置在該料流程位置,而 可以升,’亚可藉由將該印刷電路按壓職基板之下玻璃 的非重&區#又之一上表面,而將印刷電路壓銲到該基板, 該下玻璃的非重疊區段係在該壓銲流程位置並未與該上玻 璃重疊;以及一辅助工具,係分離地設置在遠離該平台處, a亥輔助工具係在该壓銲流程位置從其較低側支樓該非重疊 區段,並具有至少一真空孔,以使在該壓銲工具的壓銲期 間吸取該基板。 根據本發明的再一目的,一種壓鮮一印刷電路的方 法,包括將一基板吸取到一平台上,該平台係可產生真空 並將該被吸取的基板運送到該印刷電路的壓銲流程位置, 該基板具有上玻璃及下玻璃,而上偏光片及下偏光片係分 別黏貼到該上玻璃及該下玻璃的外表面;提供該下玻璃並 未與該上玻璃重疊的一非重疊區段,而使其在設置在該壓 銲流程位置的一輔助工具之一支撐表面上;在輔助工具上 產生真空,並從該非重疊區段的下側吸取該非重疊區段; 移除產生在該平台的真空,以及藉由將該壓鋒工具下降到 該基板之上,而將該印刷電路壓銲到該非重疊區段的上表 面。 以下在實施方式中詳細敘述本發明之詳細特徵以及優 13 200845838 解本發明之技術 之内容、申請專 易地理解本發明 點,其内容足以使任何熟習相關技藝者了 内容並據以實施,且根據本說明書所揭露 利範圍及圖示,住何熟習相關技藝者可輕 相關之目的及優點。 【實施方式】 圖式,係為了能審 以及達到本發明所 將參考所附圖式以 相同的元件編號係According to still another object of the present invention, an apparatus for pressure welding a printed circuit 'includes a flat m to transport a substrate, and the substrate is taken out to a flow of the printed circuit to a position and the county plate is removed from the The position of the pressure welding process of the printed circuit is taken out, the substrate has an upper glass and a lower glass, and a plurality of upper polarizing sheets and a lower polarizing film are respectively adhered to the outer glass and the outer surface of the lower glass. At the material flow position, it can be raised, and the sub-batter can press the printed circuit to the substrate by pressing the printed circuit on the upper surface of the non-heavy & region # of the glass under the substrate. The non-overlapping section of the glass is not overlapped with the upper glass at the position of the pressure welding process; and an auxiliary tool is separately disposed away from the platform, and the auxiliary tool is located at the position of the pressure welding process The non-overlapping section of the low side support and having at least one vacuum aperture to draw the substrate during the bonding of the bonding tool. According to still another object of the present invention, a method of embossing a printed circuit includes drawing a substrate onto a platform that generates a vacuum and transports the drawn substrate to a pressure welding process location of the printed circuit The substrate has an upper glass and a lower glass, and the upper polarizer and the lower polarizer are respectively adhered to the outer surfaces of the upper glass and the lower glass; and a non-overlapping section in which the lower glass is not overlapped with the upper glass is provided And causing it to be on a support surface of an auxiliary tool disposed at the position of the pressure welding process; generating a vacuum on the auxiliary tool and sucking the non-overlapping section from the lower side of the non-overlapping section; removing the generated on the platform The vacuum and the printed circuit are pressure bonded to the upper surface of the non-overlapping section by lowering the pressure tool onto the substrate. The detailed description of the present invention and the details of the technology of the present invention will be described in detail in the following description of the present application, and the content of the present invention is sufficient to enable anyone skilled in the art to implement and implement the present invention. According to the scope and illustrations disclosed in the specification, it is possible to understand the purpose and advantages of those skilled in the art. [Embodiment] The drawings are based on the same component numbers in order to be able to review and achieve the present invention.

本發明用以圖解較佳實施例所附的 查委員更加了解本發明、其中的優點, 實現的目的。本發明在下列的敘述中, 詳加說明本發明的較佳實施例。其中, 表示相同的元件。 根據本發明的一實施例中,一種用以 的設備及料,可使时將印刷電_ ==卩刷電路 平板顯示器(FPD)的美杯匕,此印屈ιίφ、'(預先壓銲)到 電路(FPC)、捲;土 電路例如可撓性印刷 电峪捲咿式晶片載體封裝(τ 性電路板(CBF)以及驅動積體電路uriv、—二成批的軟 顯示器係例如電襞顯示器面板(PDP)、、夜Γ/),而平板 :及有機發光二極體咖)。 =器训 移動終端上SC:驅動積體電路壓鮮到使用在如手機的 β Α 從日示器基板。 明苓考圖3,係表示本發明一驅 :夜二顯示器基板的立體圖。如 =路壓銲到- =括:上玻璃(或-彩色2:晶== 顿電晶體面板)3,液晶(圖未示^及一:玻璃(或 J係灌注在上玻璃2 14 200845838 及下玻璃3的部分表面之間,而且一上偏光片4及一下偏 光片5係分別地黏貼到上玻璃3及下玻璃3的外表面。 在上玻璃2形成一彩色影像的區域,係小於在下玻璃 3的區域。因此,在上玻璃2未重疊在下玻璃3的一非重 疊區段Η係存在下玻璃3之上表面的一侧。一驅動積體電 路6係壓銲到非重疊區段Η的上表面。在本實施例中,雖 然係將一單一驅動積體電路壓銲到非重疊區段Η,但並不 以此為限,意即亦可壓銲二個或更多個驅動積體電路。 如圖3所示,上偏光片4係大致地黏貼到上玻璃2大 部分的上表面。然而,下偏光片5係黏貼到下玻璃3的下 表面除了非重疊區段Η的部分。 驅動積體電路6係需要正確地置放在基板1上,也就 是說,置放在非重疊區段Η之上表面上的一正當位置。在 此狀況下,將在後面詳述的一壓頭30係降下來以按壓驅動 積體電路6而獲得一所欲的品質。因此,在一壓銲流程之 前,需要有在驅動積體電路6與基板1之間的一比較的校 準流程。雖然比較的校準流程將於後詳述,而為了要進行 此流程,係如圖3所示,二玻璃標記1 a、1 b係形成在基板 1上,且二晶片標記6a、6b係行程在驅動積體電路6上。 請參考圖4,係表示本發明用以壓銲一印刷電路的設 備結構之一實施例示意圖。請參考圖5,係表示本發明圖4 中用以獲取校準影像資訊之裝置的立體圖。請參考圖6, 表示本發明圖5中用以獲取校準影像資訊之裝置的平面 圖。請參考圖7到圖9,係表示本發明圖4中用以壓銲一 印刷電路之設備的操作步驟分解圖。 15 200845838 如圖4到圖9所示,依據本發明一實施例的一壓銲設 備,係包括一平台10、一備用工具20、一壓頭30、一校 準影像資訊獲取裝置40、一供給手臂50、以及一控制上述 元件的控制單元(圖未示)。 基板1係包括上玻璃2及下玻璃3,以及如上所述的 分別黏貼到上玻璃2及下玻璃3的上偏光片4及下偏光片 5。平台10將基板1運送到驅動積體電路6的一壓銲流程 位置W,或者是將已經完成一壓銲流程的基板1取出。亦 ^ 即,平台10大致上與一運送裝置的功能相同,係用以運送 基板1。在某些狀況下,當已經進行壓銲流程時,平台10 係支撐基板1之下部位的部分。 平台10係包括一支撐表面11,具有一至少大於基板 1的區域,而易於將基板1支撐在一平坦的狀態。然而, 如上所述,雖然平台10支撐著基板1,但平台10支撐著 除了非重疊區段Η以外的基板1之其他區域。因此,可以 說平台10的支撐表面11係支撐基板1的下偏光片5的區 k 域。 雖然並未詳細地圖解,複數個用以吸取基板1的真空 孔(圖未示)係設置在平台10的支撐表面11。在平台10 可更進一步設置一用以控制產生在平台10之真空的開/關 與強度的真空控制裝置(圖未示)。 備用工具20係在壓銲流程期間,與平台10 —起支撐 基板1。當平台10的支撐表面11支撐著基板1的大部分 區域時,備用工具20的支撐表面21係部份地僅支撐著非 16 200845838 重疊區段Η。一真空孔 的支撐表面21,以吸取 二)可以形成在備用工具20 當形成在備用工具2 〇工狀態下的非重疊區段Η。 空狀態下的非重疊區段、Η栌,、支撐表面21之真空孔吸取在 有利的,這原因係敘述如^移除形成在平台10的真空是 當基板1的表面被平Α ΟThe present invention is intended to illustrate the invention, its advantages, and the objects of the invention. DETAILED DESCRIPTION OF THE INVENTION In the following description, preferred embodiments of the invention are described in detail. Where, represents the same component. According to an embodiment of the invention, a device and a material are used for printing a _== 电路 电路 电路 电路 平板 FP FP 匕 匕 匕 匕 匕 匕 匕 匕 匕 匕 匕 匕 匕 匕 ι ι ι ι ι ι ι ι ι ι ι ι ι ι ι To circuit (FPC), coil; earth circuit such as flexible printed electric coiled wafer carrier package (τF circuit board (CBF) and drive integrated circuit uriv, two batches of soft display system such as electric display Panel (PDP), Nightingale/), and Flat: and Organic Light Emitters). = Instructor on the mobile terminal SC: Drive the integrated circuit to be used up to the β Α from the display substrate, such as a mobile phone. 3 is a perspective view of a second display substrate of the present invention. Such as = road pressure welding to - = include: upper glass (or - color 2: crystal == Dian crystal panel) 3, liquid crystal (not shown ^ and one: glass (or J-line perfusion in the upper glass 2 14 200845838 and Between a part of the surface of the lower glass 3, and an upper polarizer 4 and a lower polarizer 5 are respectively adhered to the outer surfaces of the upper glass 3 and the lower glass 3. The area where the upper glass 2 forms a color image is smaller than the lower The area of the glass 3. Therefore, a non-overlapping section in which the upper glass 2 is not overlapped is present on one side of the upper surface of the lower glass 3. A driving integrated circuit 6 is pressure-bonded to the non-overlapping section. In the present embodiment, although a single driving integrated circuit is pressure-welded to the non-overlapping section, it is not limited thereto, that is, two or more driving products may be pressure-welded. As shown in Fig. 3, the upper polarizer 4 is substantially adhered to the upper surface of most of the upper glass 2. However, the lower polarizer 5 is adhered to the lower surface of the lower glass 3 except for the non-overlapping section. The driving integrated circuit 6 needs to be correctly placed on the substrate 1, that is, placed in the non-overlapping area. A proper position on the upper surface of the crucible. Under this condition, a ram 30, which will be described in detail later, is lowered to press the driving integrated circuit 6 to obtain a desired quality. Therefore, in a pressure welding process Previously, there was a need for a comparative calibration process between the drive integrated circuit 6 and the substrate 1. Although the comparison calibration process will be detailed later, in order to perform this process, as shown in Figure 3, the two glass marks are shown. 1 a, 1 b are formed on the substrate 1 , and the two wafer marks 6 a , 6 b are stroked on the driving integrated circuit 6 . Referring to FIG. 4 , it is one of the device structures of the present invention for pressure welding a printed circuit. BRIEF DESCRIPTION OF THE DRAWINGS Referring to Figure 5, there is shown a perspective view of the apparatus for obtaining calibration image information of Figure 4 of the present invention. Referring to Figure 6, there is shown a plan view of the apparatus for obtaining calibration image information of Figure 5 of the present invention. Referring to Figures 7 through 9, there is shown an exploded view of the operational steps of the apparatus for pressure welding a printed circuit of Figure 4 of the present invention. 15 200845838 A pressure welding according to an embodiment of the present invention is shown in Figures 4 through 9. Equipment, including a platform 10, a a spare tool 20, a ram 30, a calibration image information acquiring device 40, a supply arm 50, and a control unit (not shown) for controlling the above components. The substrate 1 includes an upper glass 2 and a lower glass 3, and The upper polarizer 4 and the lower polarizer 5 are respectively adhered to the upper glass 2 and the lower glass 3. The platform 10 transports the substrate 1 to a pressure welding process position W of the driving integrated circuit 6, or will have completed one The substrate 1 of the pressure welding process is taken out. That is, the platform 10 is substantially the same function as a transport device for transporting the substrate 1. In some cases, when the pressure welding process has been performed, the platform 10 supports the substrate. A portion of the lower portion of the platform 1. The platform 10 includes a support surface 11 having a region at least larger than the substrate 1, and the substrate 1 is easily supported in a flat state. However, as described above, although the stage 10 supports the substrate 1, the stage 10 supports other areas of the substrate 1 except for the non-overlapping sections. Therefore, it can be said that the support surface 11 of the stage 10 supports the region k domain of the lower polarizer 5 of the substrate 1. Although not illustrated in detail, a plurality of vacuum holes (not shown) for sucking the substrate 1 are provided on the support surface 11 of the stage 10. A vacuum control device (not shown) for controlling the on/off and intensity of the vacuum generated in the platform 10 can be further disposed on the platform 10. The spare tool 20 supports the substrate 1 together with the platform 10 during the pressure welding process. When the support surface 11 of the platform 10 supports most of the area of the substrate 1, the support surface 21 of the spare tool 20 partially supports only the non-16 200845838 overlap section Η. A support surface 21 of a vacuum hole for suctioning b) can be formed in the non-overlapping section 备用 of the spare tool 20 when formed in the standby state of the spare tool 2. The vacuum hole suction of the non-overlapping section, the crucible, and the support surface 21 in the empty state is advantageous, for the reason that the vacuum formed on the stage 10 is removed when the surface of the substrate 1 is flat.

空吸取,且基板1的非舌田〇的支撐表面11大部分地真 面21上升時,若是壓f區段Η從備用工具20的支撐表 區域者,會因為在平來按壓驅動積體電路6的 支撐表面21之間有:相對的的切/面11與備用工具2〇的 損傷或是祕。 向度差,騎在基板1上產生 然而,如上所述,當僅Η甘L , 用工且卯从士产主 僅疋基板的非重疊區段11以備 1/、2G的支撐表面21的真空吸取而支稽,且基板i係 保持在從平台iG的支撐表面u上升的狀態下時,若是降 下壓頭30且進行將驅動積體電路6壓銲到基板丨的壓鮮流 私者’貫際上按壓的壓頭30、傷用工具2〇及備用工具2〇 的支撐表面21係形成在一平面,以便可以避免產生在基板 1的損傷及裂痕。然而,本發明並不以此為限。 備用工具20係分離地設置在遠離平台1〇處。在本實 知例中,備用工具2(M系提供來可以升高到驅動積體電路6 之壓銲流程位置W的區域。然而,由於本發明並不以此 限,因此備用工具20可以固定地設置在壓銲流程位置1的 任何區域。 200845838 壓頭30係大致地將驅動積體電路6壓銲到基板1的 非重疊區段Η之上表面。於是,壓頭20係設置在壓銲流程 位置W,而可以在此一位置升高。 由於壓頭30的升高,壓頭30需要一用以上升的滾筒 以及一用以熱壓的電熱線。然而,在此省略對壓頭30的詳 細敘述,而若是需要者係可使用隸屬申請人之已申請的專 利申請案所揭露的技術。 所述的校準影像資訊獲取裝置40係藉由拍攝如圖3 所不形成在驅動積體電路6上的二晶片標記6a、6b’以及 如圖3所示形成在基板1上的二玻璃標記la、lb,以獲取 在標記la、lb、6a以及6b之間相對應的校準影像資訊。 因此,依據傳統的壓銲設備,由於二晶片標記la、lb 的拍攝以及二玻璃標記6a、6b的拍攝,係使用二攝影機(圖 未示)分開進行的,除了分開拍攝標記1 a、1 b、6a、6b的 時間之外,更進一步需要壓頭30上升以及移動平台10以 拍攝標記1 a、1 b、6a、6b的時間,也因此在縮減加工時間 上會有所限制。 然而,在與傳統技術像比較之下,在本實施例中,藉 由採用校準影像資訊裝置40,而可以縮減加工時間,此校 準影像資訊裝置40係可以同時地拍攝如圖3所示形成在驅 動積體電路6上的二晶片標記6a、6b,以及如圖3所示形 成在基板1上的二玻璃標記la、lb。 所以,當同時地拍攝標記1 a、1 b、6a、6b時,可減 少壓頭30升高操作的部分以及用以拍攝標記la、lb、6a、 6b之平台10的移動操作,以便可以縮減加工時間。 18 200845838 .如圖5及圖6所示的校準影像資訊獲取裝置40,係包 括一稜鏡區塊41,具有四個用以同時拍攝二晶片標記6a、 6b及二玻璃標記la、lb的拍攝視窗41a ;四個空麵合區塊 42,其中每兩個空耦合區塊42係分別連接到稜鏡區塊41 的相對侧;複數個稜鏡(圖未示)係設置在稜鏡區塊41與 四個空耦合區塊42中,以將光線的方向折射到朝四拍攝視 窗41a ;四筒體43,係分別地耦合到四空耦合區塊42 ;以 及四攝影鏡片單元44,係分別地耦合到四筒體43的端部。 稜鏡區塊41係由二相互分隔的子區塊所形成。每二 拍攝視窗41a係以相同的間隔而緊鄰地設置在每一分隔的 子區塊上。一用以支撐每一拍攝鏡片單元44的鏡片支撐座 45,係設置在四拍攝鏡片單元44與四筒體43之間,換句 話說,係在二拍攝鏡片單元44及二筒體43之間。鏡片支 撐座45係為每一拍攝鏡片單元44與每一筒體43所組合的 結構。四個分別耦合到四筒體43而將光線發射到四筒體 43的照明單元46,係設置在四筒體43之下。 L 參考上,在本實施例中,由於四拍攝視窗41 a係以相 同的間隔而相鄰地相互設置在其間,因此可以同時地拍攝 如圖3所示形成在驅動積體電路6上的二晶片標記6a、6b, 以及如圖3所示形成在基板1上的二玻璃標記6a、6b。也 就是說,由於稜鏡區塊41、四空耦合區塊42、四筒體43、 四拍攝鏡片單元44、二鏡片支撐座45以及四照明單元46 的結構特性,甚至是當四拍攝視窗41a係相互地緊靠設 置,因此非常地相互緊靠設置的標記la、lb、6a、6b可以 充分地同時被拍攝。然而,若是簡易地設置四個攝影機的 19 200845838 話,四個非常地相互緊靠上置的標記la、lb、6a、6b則由 於攝影機本身的體積,而無法同時拍攝。 詳細地說,四個標記la、lb、6a、6b可以使用獨立 設置的攝影機進行拍攝。在此一狀態下,為了避免攝影機 之間的相互的干擾,晶片標記6a、6b及玻璃標記la、lb 必須相互分隔一相當的距離。因此,由於平台10需要移動 一相當的距離以同時地拍攝四個標記1 a、1 b、6a、6b,會 因為平台10的移動而耗費大量時間,也因此無法實實地縮 減加工時間,或是因為沿著平台10移動的路徑很複雜,而 不可能進行校準。然而,如在本實施例中,當採用了可以 同時地拍攝晶片標記6a、6b及玻璃標記1 a、1 b,以及四 拍攝視窗41a緊鄰地設置在一單一本體中的校準影像資訊 裝置40時,則可以縮減平台10的移動時間,而且移動的 路徑不會複雜,也因此校準的進行不會顯得困難。 供給手臂50係將驅動積體電路6供給到壓頭30的下 部區域,以便壓頭30可以拿起或是吸起驅動積體電路6。 因此,供給手臂50可以看作是一供給驅動積體電路6的機 械裝置。 控制單元係控制壓頭30、平台10、備用工具20,以 及校準影像資訊獲取裝置40。特別的是,在本實施例中, 控制單元係依據藉由校準影像資訊裝置40,所獲取在標記 la、lb、6a、6b之間的相對應的校準影像資訊,以控制基 板1相對於驅動積體電路6之相對應的校準。也就是說, 控制單元在X、Y軸及Θ角校準用以支撐基板1的平台10, 以便控制基板1相對於驅動積體電路6之相對應的校準。 20 200845838 - 然而,在使用控制單元以校準平台10的流程中,在 平台10被運送到壓銲流程位置w並下降之前,~則平台1〇 即被控制在X、γ軸及0角而進行校準,以便基板1的一部 分可以由備用工具20的支撐表面所支撐。 根據本實施例的壓銲驅動積體電路6之方法,係如圖 7到圖10所示,以控制單元的控制流程作敘述Y首先,: 圖7所示,當用以運送驅動積體電路6的供給手臂5〇,移 Ο 動到位在壓銲流程位置W之壓頭30的下部區^域時,則壓頭 30係下降到一拿取位置u (步驟S11)。 人當在壓頭30提供真空時,壓頭30係從供給手臂5〇 拿,驅動積體電路6 (步驟S12)。當驅動積體電路6被拿 起日守壓頭30係升起到一離開位置L2 (步驟S13)。值到 現在戶^述的操作,係大致地與如圖2所示的f知技術相同。 當壓頭30上升到離開位置L2時,供給手臂5〇.則移 動到原始位置。在習知技術中,雖然供給手臂5〇在此操作 (I:單獨移動,而在本實施例中,支撐基板1的平台10係 舁供給手臂50 一起移動到壓銲流程位置f (步驟S14)。 $再者,如圖8所示,壓頭30係下降到一拍攝位置L3。 根據白知技術,在此操作中,僅壓頭下降到拍攝位置 =二而其他操作則並未一起進行。然而,在本實施例中, 當壓頭30下降到拍攝位置L3時,平台1〇係下降一預定距 離(步驟S15)。 、立田平σ 下降一預定距離時,基板1之非重疊區段η 的^分可以被支撐在位在壓銲流程位置w之備用工具2〇 的支撐表面21上。在此狀態下,在步驟S15的操作中,基 21 200845838 板1並未完全地校準在一正當位置,且平台10仍是需要朝 備用工具20而向左、向右、向上及向下移動。 當壓頭30下降到拍攝位置L3,且平台1〇下降以便將 基板1之非重疊區段Η的一部分,支撐在備用工具20的支 撐表面21時,校準影像資訊獲取裝置4〇係同時地拍攝如 圖3所示形成在驅動積體電路6上的二晶片標記6a、6b, 以及如圖3所示形成在基板丨上的二破璃標記la、lb (步 驟 S16)〇 然後,平台10更進一步朝向備用工具2〇移動一預定 距離,以完全地位在壓銲流程位置w。同時地,支撐基板i 的平台10係藉由拍攝而獲取標記la、lb、6a、6b的影像 貢訊,以在X、Y軸及0角進行相對於影像資訊的校準(步 驟 S17)〇 將平台10降下來以便基板1可以完全地被支撐在平 台10的支撐表面U以及備用工具2G的支撐表面21 (步When the suction surface is not sucked, and the support surface 11 of the non-tongue of the substrate 1 is mostly raised by the true surface 21, if the pressure f section is pulled from the support surface area of the spare tool 20, the integrated circuit is driven by pressing in the flat state. Between the support surfaces 21 of 6 is: the opposite cut/face 11 and the damage of the spare tool 2 或是 or secret. The difference in orientation, riding on the substrate 1 is produced. However, as described above, when only the L-L, the vacuum is applied, and the non-overlapping section 11 of the substrate is only used to prepare the vacuum of the support surface 21 of 1/2G. When the substrate i is held in a state of rising from the support surface u of the stage iG, if the embossing head 30 is lowered and the driving integrated circuit 6 is pressure-welded to the substrate 丨, the embossing is performed. The pressing head 30, the insulting tool 2, and the supporting surface 21 of the spare tool 2 are formed on a flat surface so that damage and cracks generated in the substrate 1 can be avoided. However, the invention is not limited thereto. The spare tool 20 is separately disposed away from the platform 1〇. In the present embodiment, the spare tool 2 (M system is provided to be raised to the region of the pressure welding process position W of the drive integrated circuit 6. However, since the present invention is not limited thereto, the spare tool 20 can be fixed. It is disposed at any area of the pressure welding process position 1. 200845838 The indenter 30 is substantially pressure welded to the drive integrated circuit 6 to the upper surface of the non-overlapping section 基板 of the substrate 1. Thus, the ram 20 is placed in the pressure welding The flow position W can be raised at this position. Due to the rise of the ram 30, the ram 30 requires a roller for raising and a heating wire for hot pressing. However, the nip 30 is omitted here. A detailed description of the method disclosed in the applicant's patent application filed by the applicant. The calibration image information acquisition device 40 is not formed in the drive integrated circuit by photographing as shown in FIG. Two wafer marks 6a, 6b' on 6 and two glass marks la, lb formed on the substrate 1 as shown in FIG. 3 to obtain calibration image information corresponding between the marks la, lb, 6a, and 6b. According to the traditional pressure welding equipment, The photographing of the two wafer marks la, lb and the photographing of the two glass marks 6a, 6b are performed separately using two cameras (not shown), except for the time when the marks 1 a, 1 b, 6a, 6b are separately photographed. It is further required that the ram 30 is raised and the time when the platform 10 is moved to take the marks 1 a, 1 b, 6a, 6b, and thus there is a limit in reducing the processing time. However, in comparison with the conventional technology, In this embodiment, the processing time can be reduced by using the calibration image information device 40. The calibration image information device 40 can simultaneously capture the two wafer marks 6a formed on the driving integrated circuit 6 as shown in FIG. 6b, and two glass marks la, lb formed on the substrate 1 as shown in Fig. 3. Therefore, when the marks 1a, 1b, 6a, 6b are simultaneously photographed, the portion in which the indenter 30 is raised can be reduced and The moving operation of the platform 10 for taking the marks la, lb, 6a, 6b so that the processing time can be reduced. 18 200845838. The calibration image information acquiring device 40 shown in FIG. 5 and FIG. 6 includes a block of blocks. 41, with four A photographing window 41a for photographing the two wafer marks 6a, 6b and the two glass marks la, lb; four empty facing blocks 42, wherein each of the two empty coupling blocks 42 is connected to the opposite side of the meandering block 41, respectively. A plurality of turns (not shown) are disposed in the meandering block 41 and the four empty coupling blocks 42 to refract the direction of the light to the four shot windows 41a; the four cylinders 43 are coupled separately The four vacant coupling blocks 42 and the four photographic lens units 44 are respectively coupled to the ends of the four cylinders 43. The cymbal block 41 is formed by two mutually separated sub-blocks. They are placed next to each separated sub-block at the same interval. A lens support 45 for supporting each of the photographing lens units 44 is disposed between the four photographing lens units 44 and the four cylinders 43 , in other words, between the two photographing lens units 44 and the two cylinders 43 . . The lens holder 45 is a structure in which each lens unit 44 is combined with each barrel 43. Four illumination units 46, respectively coupled to the four cylinders 43 to emit light to the four cylinders 43, are disposed below the four cylinders 43. In the present embodiment, since the four photographing windows 41a are adjacently disposed adjacent to each other at the same interval, the two formed on the driving integrated circuit 6 as shown in FIG. 3 can be simultaneously photographed. Wafer marks 6a, 6b, and two glass marks 6a, 6b formed on the substrate 1 as shown in FIG. That is, due to the structural characteristics of the meandering block 41, the four-space coupling block 42, the four cylinders 43, the four lens unit 44, the two lens holders 45, and the four illumination units 46, even when the four shot windows 41a They are placed in close proximity to each other, so that the marks la, lb, 6a, 6b which are placed very close to each other can be sufficiently photographed at the same time. However, if it is simple to set up four cameras 19 200845838, the four marks la, lb, 6a, 6b which are very close to each other are due to the volume of the camera itself, and cannot be taken at the same time. In detail, the four markers la, lb, 6a, 6b can be photographed using a separately provided camera. In this state, in order to avoid mutual interference between the cameras, the wafer marks 6a, 6b and the glass marks la, lb must be separated from each other by a considerable distance. Therefore, since the platform 10 needs to move a considerable distance to simultaneously capture the four marks 1 a, 1 b, 6a, 6b, it takes a lot of time due to the movement of the platform 10, and thus the processing time cannot be substantially reduced, or Because the path along the platform 10 is complex, it is not possible to calibrate. However, as in the present embodiment, when the wafer image marks 6a, 6b and the glass marks 1a, 1b can be simultaneously captured, and the four image capturing windows 41a are disposed in close proximity to the calibration image information device 40 disposed in a single body, , the movement time of the platform 10 can be reduced, and the path of the movement is not complicated, and therefore the calibration is not difficult. The supply arm 50 supplies the drive integrated circuit 6 to the lower region of the ram 30 so that the ram 30 can pick up or suck up the drive integrated circuit 6. Therefore, the supply arm 50 can be regarded as a mechanical device that supplies the integrated circuit 6. The control unit controls the ram 30, the platform 10, the spare tool 20, and the calibration image information acquiring device 40. In particular, in the present embodiment, the control unit controls the substrate 1 relative to the drive according to the corresponding calibration image information acquired between the marks la, lb, 6a, and 6b by the calibration image information device 40. The corresponding calibration of the integrated circuit 6. That is, the control unit calibrates the platform 10 for supporting the substrate 1 at the X, Y axis and the corner to control the corresponding calibration of the substrate 1 with respect to the drive integrated circuit 6. 20 200845838 - However, in the process of using the control unit to calibrate the platform 10, before the platform 10 is transported to the pressure welding process position w and lowered, the platform 1 is controlled at the X, γ axis and 0 angle. The calibration is such that a portion of the substrate 1 can be supported by the support surface of the spare tool 20. According to the method of the pressure welding driving integrated circuit 6 of the present embodiment, as shown in FIG. 7 to FIG. 10, the control flow of the control unit is described. First, FIG. 7 is used to transport the integrated circuit. When the supply arm of 6 is moved to the lower portion of the indenter 30 at the position W of the welding process, the indenter 30 is lowered to a take-up position u (step S11). When the vacuum is supplied from the ram 30, the ram 30 is taken from the supply arm 5 to drive the integrated circuit 6 (step S12). When the drive integrated circuit 6 is picked up, the keeper 30 is raised to an exit position L2 (step S13). The operation of the value to the current user is substantially the same as the technique of the technique shown in Fig. 2. When the indenter 30 is raised to the exit position L2, the supply arm 5 is moved to the original position. In the prior art, although the supply arm 5 is operated here (I: separately moving, in the present embodiment, the platform 10 of the support substrate 1 is moved by the supply arm 50 to the pressure welding flow position f (step S14). Further, as shown in Fig. 8, the indenter 30 is lowered to a shooting position L3. According to the white technology, in this operation, only the indenter is lowered to the shooting position = two and the other operations are not performed together. However, in the present embodiment, when the indenter 30 is lowered to the photographing position L3, the platform 1 is lowered by a predetermined distance (step S15). When the Litian flat σ is lowered by a predetermined distance, the non-overlapping section η of the substrate 1 The sub-section can be supported on the support surface 21 of the spare tool 2〇 at the position of the press-welding process w. In this state, in the operation of step S15, the base 21 200845838 board 1 is not completely calibrated in a proper Position, and the platform 10 still needs to move left, right, up, and down toward the spare tool 20. When the ram 30 is lowered to the shooting position L3, and the platform 1 〇 is lowered to align the non-overlapping sections of the substrate 1 Part of the support surface of the spare tool 20 At 21 o'clock, the calibration image information acquiring device 4 simultaneously photographs the two wafer marks 6a, 6b formed on the driving integrated circuit 6 as shown in FIG. 3, and the two broken glass formed on the substrate as shown in FIG. Marks la, lb (step S16) 〇 then, the platform 10 is further moved a predetermined distance toward the spare tool 2 to be fully positioned at the pressure welding process position w. Simultaneously, the platform 10 supporting the substrate i is acquired by photographing The image information of la, lb, 6a, 6b is marked to perform calibration with respect to image information at the X, Y axis and 0 angle (step S17), and the platform 10 is lowered so that the substrate 1 can be completely supported on the platform 10. Support surface U and support surface 21 of spare tool 2G (step

:S18)。在步驟S18的操作中’備用工具2〇可以向上移 取到一空狀態時,移除❹才单了―將非㈣區段^及 請參考圖9 一=? 1〇的空狀態是有利的。 係下降到平台1〇的校準流程時,壓頭 ' 干 (步驟幻9 ),並進行一預壓銲汽裎 (步驟S20)。當完成預輯流 丁 = 離開位置L2。在習知技偏&碩3G係上升回到 L2,3〇 、未同進仃。然而,在本實施 22 200845838 例中,當麼頭30上升到離開位置[2時,係—同進行升起 平台ίο的操作或是降下備用工具20的操作(步驟s2i)。 平台10係被取出。在此操作中,並不像習知技術, 由於平台10已被取出’供給手臂5〇係同時地將一新的驅 動積體電路(圖未示)運送到壓頭3G的下部區域(步驟 S22)。之後即重覆上述步驟su到步驟沿2的操作。 依據上述的壓銲方法,再與習知技術比較,由於在前 一步驟操作完成以及個別的步驟操作同時地進行之後,許 多步驟的操作並不需要進行,因此可以縮短加 而 可以使壓銲流程進行得更快。 依據本實施例,驅動積體電路6係可以—簡單及方便 二方=銲ί基板1,且可以縮短用以壓銲流程的加工時 間,而可以貫現高速度的壓銲流程。 頭亦可在中’雖然壓賴祕賴銲流程,壓 頭亦了以使用在主要的壓銲流程。而且 訊獲取裝置適用於用以壓_ c 雖…、枝準影像貝:S18). In the operation of step S18, when the spare tool 2 can be moved up to an empty state, it is advantageous to remove the non-(four) segment ^ and refer to FIG. 9 for an empty state of 1 = 1 〇. When the calibration process is lowered to the stage 1〇, the indenter 'drys (step 9) and a pre-welded steam is performed (step S20). When completing the pre-streaming D = leave the position L2. In the conventional technology, the 3G system has risen back to L2, 3〇, and has not entered the same. However, in the example of the embodiment 22 200845838, when the head 30 is raised to the leaving position [2, the operation of raising the platform ί or the operation of lowering the spare tool 20 is performed (step s2i). The platform 10 is taken out. In this operation, unlike the prior art, since the platform 10 has been taken out of the 'supply arm 5', a new drive integrated circuit (not shown) is simultaneously transported to the lower region of the indenter 3G (step S22). ). Then repeat the above steps su to the operation along step 2. According to the above-mentioned pressure welding method, compared with the prior art, since the operation of the plurality of steps does not need to be performed after the completion of the previous step operation and the individual step operations, the press welding process can be shortened and the pressure welding process can be shortened. Going faster. According to the present embodiment, the driving integrated circuit 6 can be simple and convenient. The two sides = the welding substrate 1, and the processing time for the pressure welding process can be shortened, and the high-speed welding process can be realized. The head can also be in the middle. Although the welding process is under pressure, the pressure head is also used in the main pressure welding process. And the acquisition device is suitable for pressing _ c

气择ΐΐΐ 卩職_設備,校準影像 1 亦可以適用在不同㈣備,例如-檢查設備。 二终相1W絲示本發明—實施例在進行—壓鲜流 =v用以壓銲一印刷電路之設備結構的示意圖。請參 if」2 ’縣示本發明另—實施例在壓銲流程期間,用以 [、干印刷電路之設備結構的*意圖。請參相13,係表 圖11及圖12所示的辅助工具之結構的示意圖。 0考圖14’係表示本發明另—實施例,用以壓銲一印刷 電路之方法的流程圖。 200845838 如圖11到圖14所示,依據本實施例的一壓銲設備, 係包括一平台l〇a、一備用工具20a、一壓銲工具30,以 及一控制上述元件的控制單元(圖未示)。基板1包含上玻 璃2及下玻璃3,以及如上所述,分別黏貼到上玻璃及下 玻璃之外表面的上偏光片4及下偏光片5。平台10a係將 基板1移動到驅動積體電路6的一壓銲流程位置W,或者 是將已完成一壓銲流程的基板1取出。也就是說,平台l〇a 係大致地運作得如同用以移動基板1的一移動單元。 平台10a係包括一支撐表面11a,支撐表面11a係具 有一至少大於基板1的區域,以容易地將基板1支撐在一 平坦的狀態。然而,如上所述,雖然平台l〇a係支撐基板 1,平台10a亦支撐基板1上除了非重疊區段Η之外的的區 域。因此,可以說是平台10a的支撐表面11a係支撐基板 1之下偏光片5的區域。 雖然並未詳細地圖解,用以吸起基板1的複數個真空 孔(圖未示)係設置在平台l〇a的支撐表面11a。一真空 控制單元12係可更進一步設置在平台10a,而用以控制產 生在平台10a之真空的開/關與強度。而真空控制單元12 係由控制單元所控制。僅有在當平台l〇a將基板1移動到 驅動積體電路6的壓銲流程位置W,或者是將已經完成壓 銲流程的基板1取出的時候,在控制單元的控制之下可以 經由真空孔產生真空。也就是說,當藉由壓銲工具30實際 地進行壓銲流程時,係將真空移除。 支撐基板1的大部分區域時,備用工具20a係僅部分 地支撐非重疊區段Η。備用工具20a係與平台10a相分離 24 200845838 地設置。在本實施例中,備用工具20a係固定地設置在驅 動積體電路6之壓銲流程位置W的區域。由於本發明並不 以此為限,因此備用工具20a係可以形成能如平台10a之 移動。 備用工具20a包括一主體25、一形成在主體25表面 上與從主體25下侧支撐非重疊區段Η的支撐表面21a、複 數個形成在支撐表面21a並分類成三個群組Gl、G2、G3的 真空孔22、三條分別相對應地設置在三群組Gl、G2、G3 的真空線23,以及三個分別地設置在三真空線23且可選 擇地將每一真空線23的一開口開啟/關閉的檢測閥24。 在本實施例中,用以將形成在支撐表面21a的真空孔 22分類成三個群組Gl、G2、G3的原因,係為了符合可以 將基板1支撐在支撐表面21a上的尺寸。舉例來說如圖13 所示,當基板1的尺寸小於支撐表面21a,而使基板1的 非重疊區段Η僅足夠藉由第二群組G2所支撐時,若是第一 群組G1與第三群組G3其他部位的所有真空孔22產生真空 的話,就會發生流程損耗。 在本實施例中,三真空線23係設置在每一群組G1、 G2、G3,使得三真空線23的開口係選擇性地藉由三檢測閥 24而開啟或關閉。由於本發明並不以此為限,因此真空孔 22之群組的數量可以是數量” 2”或是數量” 4”或者是更 多,亦或者是如果需要的話可以不需將真空孔22分類成不 同群組。 在習知技術中,如圖11所示,由於基板1大部分的 表面係大致地藉由平台10a的支撐表面11a所真空吸起並 25 200845838 支撐著,且基板1的非重疊區域Η係從備用工 撐表面21a升起,若是在此狀態下,壓銲工具3〇降 壓驅動積體電路6的區域,會因為在平台1〇a的支浐=文 1 la與備用工具20a的支撐表面21a之間的一相對高芽产^面 而可能在基板1上產生損傷與裂痕。 阿又差’Gas selection 卩 卩 _ equipment, calibration image 1 can also be applied to different (four) preparation, for example - inspection equipment. The two final phase 1W wire shows the schematic of the structure of the apparatus for performing a pressure-pressed flow = v for welding a printed circuit. Please refer to the "2" county to show the other embodiment of the invention during the pressure welding process, [for the purpose of the dry printed circuit device structure *. Please refer to Fig. 13 for a schematic diagram of the structure of the auxiliary tool shown in Figs. 11 and 12. Figure 1 is a flow chart showing a method of pressure welding a printed circuit in accordance with another embodiment of the present invention. As shown in FIG. 11 to FIG. 14, a pressure welding apparatus according to this embodiment includes a platform 10a, a spare tool 20a, a pressure bonding tool 30, and a control unit for controlling the above components (not shown). Show). The substrate 1 includes an upper glass 2 and a lower glass 3, and as described above, the upper polarizer 4 and the lower polarizer 5 are adhered to the outer surfaces of the upper glass and the lower glass, respectively. The stage 10a moves the substrate 1 to a pressure welding process position W of the drive integrated circuit 6, or takes out the substrate 1 from which a pressure welding process has been completed. That is, the platform 10a operates substantially like a mobile unit for moving the substrate 1. The stage 10a includes a support surface 11a having a region at least larger than the substrate 1 to easily support the substrate 1 in a flat state. However, as described above, although the stage 10a supports the substrate 1, the stage 10a also supports an area on the substrate 1 other than the non-overlapping section 。. Therefore, it can be said that the support surface 11a of the stage 10a is a region that supports the polarizer 5 under the substrate 1. Although not illustrated in detail, a plurality of vacuum holes (not shown) for sucking up the substrate 1 are provided on the support surface 11a of the stage 10a. A vacuum control unit 12 can be further disposed on the platform 10a to control the on/off and intensity of the vacuum generated at the platform 10a. The vacuum control unit 12 is controlled by the control unit. Only when the platform l〇a moves the substrate 1 to the pressure welding flow position W of the drive integrated circuit 6, or when the substrate 1 that has completed the pressure welding process is taken out, it can be vacuumed under the control of the control unit. The holes create a vacuum. That is, when the pressure welding process is actually performed by the pressure welding tool 30, the vacuum is removed. When supporting most of the area of the substrate 1, the spare tool 20a only partially supports the non-overlapping sections Η. The spare tool 20a is separated from the platform 10a 24 200845838. In the present embodiment, the spare tool 20a is fixedly disposed in the region where the welding process position W of the integrated circuit 6 is driven. Since the present invention is not limited thereto, the spare tool 20a can be formed to be movable as the platform 10a. The spare tool 20a includes a main body 25, a support surface 21a formed on the surface of the main body 25 and supporting the non-overlapping section 从 from the lower side of the main body 25, a plurality of formed on the support surface 21a and classified into three groups G1, G2. The vacuum hole 22 of G3 and the three vacuum lines 23 respectively corresponding to the three groups G1, G2, and G3, and three openings respectively disposed on the three vacuum lines 23 and optionally each vacuum line 23 The detection valve 24 is opened/closed. In the present embodiment, the reason for classifying the vacuum holes 22 formed in the support surface 21a into three groups G1, G2, G3 is to conform to the size at which the substrate 1 can be supported on the support surface 21a. For example, as shown in FIG. 13, when the size of the substrate 1 is smaller than the support surface 21a, and the non-overlapping sections 基板 of the substrate 1 are only enough to be supported by the second group G2, if the first group G1 and the first group Flow loss occurs when all vacuum holes 22 in other parts of the three groups G3 generate a vacuum. In the present embodiment, three vacuum lines 23 are provided in each of the groups G1, G2, G3 such that the openings of the three vacuum lines 23 are selectively opened or closed by the three detection valves 24. Since the present invention is not limited thereto, the number of groups of the vacuum holes 22 may be the number "2" or the number "4" or more, or the vacuum holes 22 may not be classified if necessary. Into different groups. In the prior art, as shown in FIG. 11, since most of the surface of the substrate 1 is substantially vacuumed by the support surface 11a of the stage 10a and supported by 25 200845838, and the non-overlapping regions of the substrate 1 are The backup work surface 21a is raised, and if it is in this state, the pressure welding tool 3 is stepped down to drive the area of the integrated circuit 6, because of the support surface of the platform 1A and the supporting surface of the spare tool 20a. A relatively high bud formation between 21a may cause damage and cracks on the substrate 1. Ah is bad

^然而,在本實施例中,如圖12所示,基板丨係從平 台10a的支撐表面lla所升起(因為已經移除真空),= 有基板1的非重疊區域Η藉由備用工具20a的支 而真空吸起並支撐著。在此狀態下,當壓銲工具下降二 且驅動積體電路β的壓銲流程相對於基板丨而進行時, 於提供壓力的壓銲工具30、基板1,以及備用工具2〇a的 支撐表面21a係大致上形成在相同平面,所以可以避免在 基板1上產生損傷及裂痕。 壓銲工具3〇係大致地將驅動積體電路6壓銲到基板工 之非重疊區段Η的上表面。壓銲工具3〇係設置在壓 位置[而能夠上升到一預定位置。 认“玉 因為壓銲工具30的上升操作,一用以上升的滾筒設 備以及一用以熱壓的電熱線,係設置在壓銲工具3〇上。由 於壓銲工具30的技術以揭露在某些專利中請案上,因此省 略對壓#干工具3 〇的詳細敎述。 控制單兀係控制平台l〇a及備用工具2〇a,進而可以 控制壓銲工具30。特別的是,在本實施例中,控制單元可 選擇性地控制真空的狀態,舉例來言兒,即真空的開啟/關閉 與真空的強度等,而真空係依據壓銲工具3〇的上升操作, 而產生在每一平台l〇a及備用工具2〇a。 26 200845838 特另】的疋控制單元係控制於基板1移動盘取出翻 間,在平台此的真空孔13產生的真空以吸起基板工出;J 及於壓銲工具30的按壓期間,從平台10a的真空孔13移 =真空。當產生在每一平台1〇a及備用工具服的真空狀 態係適當地由㈣單元所控制時,於驅動積體電路6的壓 銲流程期間,可以避免在基板1上產生損傷及裂痕。 在控制單元的操作之下,當基板i係第一次移動 銲流程位置1時,控制單元在平台i〇a上產生真空。於是, 位在平台」0a之支撐表面11a上的基板1,尤其是下^光 片5係藉由平台10a之支撐表面na將其真空吸起。因 此,甚至是當平台l〇a移動時,係可避免基板丨從平台ι〇 分離。 口 當平台10a到達壓銲流程位置w時,平台1〇a係定位 在緊鄰固定在壓銲流程位置w的備用工具2〇a。而移動的 基板1之非重疊區域Η係被搭載在備用工具2〇a的支严 面21a上。 ^當基板1之非重疊區域Η係被搭載在備用工具2〇a的 支撐表面21a上時,控制單元係降低產生在平台1〇a的真 空強度,以形成一微弱的空狀態。相反地,控制單元在備 用工具20a產生真空,以便將基板i的非重疊區段H從基 板1的下表面吸起。然後,控制單元移除產生在平台 的真空。 口 a 結果是,基板1係大致地僅藉由備用工具2〇a的支撐 表面2la而吸起。在此狀態下,當在壓銲工具3〇下降而進 行相對應於基板1的驅動積體電路6的壓銲流程時,由於 27 200845838 提供壓力的壓銲工具30、基板丨,以及備用工具2〇&的支 撐表面21a係大致地形成相同平面,因此可以避免在基板 1上產生損傷及裂痕。 ^ 當完成壓銲流程且升起壓銲工具3〇時,控制單元係 移除產生在備用工具20a的真空,且在平台1〇a產生真空, 如同初始狀態,以便吸起基板丨及取出基板1。 請參考圖14,用以壓銲如上述結構之驅動積體電路6 D 的方法,係詳述如下。當在壓銲流程中的基板丨裝载在平 台10a上時,在平台10a上產生真空(步驟S31)。而基板 1係穩固地且固定地被吸起在平台l〇a上。 當基板1係穩固地且固定地被吸起在平台1〇a上時, 係藉由用以移動平台10a的分離式移動單元,將平台i〇a 移動到壓銲流程位置W (步驟S32)。如圖u所示,當平台 l〇a到達壓銲流程位置W時,平台1〇a係定位在緊臨固^ 地位在壓銲流程位置E的備用工具2〇a。被移動之基板丄 的非重疊區段Η係被搭載在備用工具的支撐表面21a上 驟 S33)。 當基板1的非重疊區段Η係被搭載在備用工具的支撐 表面21a上時,控制單元係降低產生在平台i〇a的真空強 度,以形成一微弱的空狀態(步驟S34)。相反地,在備用 工具20a產生真空以從非重疊區段η的下側吸起非重疊區 丰又Η(步驟S35 )。而移除產生在平台i〇a的真空(步驟836 )。 再者,降下壓銲工具30 (步驟S37)且進行將驅動積體電 路6壓銲到非重疊區段η之上表面的壓銲流程(步驟S38)。 28 200845838 藉由供應熱度及壓力到驅動積體電路,而將驅動積體電路 6壓銲到基板1。 在習知技術中,如圖11所示,由於基板丨的大部分 表面,大致地藉由平台l〇a的支撐表面Ua索真空吸起及 ^撐著,且基板1的非重疊區域Η係從備用工具2〇a的支 攆表面21a升起,在此狀態下,若是壓銲工具別下降並按 壓驅動積體電路6的區域者,會因為在平台1〇a的支撐表 面1 la與備用工具2〇a的支撐表面21a之間的一相對的高 度差,使得在基板1上很有可能地產生損傷及裂痕。门 (. ^ 然而,在本實施例中,如圖12所示,基板1係從平 ^」〇a的支撐表面lla升起,且僅有基板丨的非重疊區段 #藉由備用工具2〇a的表支撐表面2ia所真空吸起並支樓 著。在此狀態下,當壓銲工具3〇下降且相對於基板丨而^ 仃驅動積體電路6的壓銲流程時,由於提供壓力的壓銲工 ,30、基板卜以及備用工具2〇a的支撐表面21&係形成 相同H,因此可以避免在基板丨上產生損傷及裂痕。 δ凡成壓銲流程時,壓銲工具30係上升到原始位 (步驟S39)。當升起壓銲工具3〇時,係可相對應地移除 一生在備用工具2〇a的真空(步驟S4〇)。當控制單元 ,個檢測目24其中之-時,即可以移除產生在備用= 的真空。 次產產生在備用工具2 〇a的真空時,在平台10 a再 ^ 二工,以便藉由平台10a吸起基板1 (步驟S41)。 虽移動平台l〇a時,即取出已完成壓銲流程的基板丨(步 29^ However, in the present embodiment, as shown in Fig. 12, the substrate tether is lifted from the support surface 11a of the stage 10a (because the vacuum has been removed), = there is a non-overlapping area of the substrate 1 by the spare tool 20a The vacuum is sucked up and supported. In this state, when the pressure welding tool is lowered and the pressure welding process for driving the integrated circuit β is performed with respect to the substrate, the pressure-welding tool 30, the substrate 1, and the support surface of the spare tool 2A are provided. Since 21a is formed substantially on the same plane, damage and cracks on the substrate 1 can be avoided. The pressure bonding tool 3 is used to roughly weld the drive integrated circuit 6 to the upper surface of the non-overlapping section 基板 of the substrate. The bonding tool 3 is placed at the pressing position [and can be raised to a predetermined position. It is recognized that "the jade is used for the ascending operation of the pressure-welding tool 30, a roller device for ascending, and a heating wire for hot pressing are disposed on the pressure-welding tool 3. The technique of the pressure-welding tool 30 is disclosed in a certain In some patents, the detailed description of the pressing tool #3 is omitted. The control unit l〇a and the spare tool 2〇a are controlled, and the pressure welding tool 30 can be controlled. In particular, In this embodiment, the control unit can selectively control the state of the vacuum, for example, the opening/closing of the vacuum and the strength of the vacuum, etc., and the vacuum is generated according to the rising operation of the pressure welding tool 3〇. A platform l〇a and a spare tool 2〇a. 26 200845838 The special control unit is controlled by the substrate 1 to move the disk to take out the turn, and the vacuum generated by the vacuum hole 13 of the platform is used to suck up the substrate; During the pressing of the bonding tool 30, the vacuum hole 13 of the platform 10a is moved to a vacuum. When the vacuum state generated in each of the platforms 1a and the spare tool suit is appropriately controlled by the (4) unit, the driving product is During the pressure welding process of the body circuit 6, Damage and cracking on the substrate 1 can be avoided. Under the operation of the control unit, when the substrate i is moved for the first time in the welding process position 1, the control unit generates a vacuum on the platform i〇a. Thus, the platform is located. The substrate 1 on the support surface 11a of 0a, particularly the lower film 5, is vacuumed by the support surface na of the stage 10a. Therefore, even when the platform l〇a moves, the substrate 避免 can be prevented from being separated from the platform. Port When the platform 10a reaches the pressure welding process position w, the platform 1〇a is positioned adjacent to the spare tool 2〇a fixed at the pressure welding process position w. The non-overlapping region of the moving substrate 1 is mounted on the support surface 21a of the spare tool 2A. When the non-overlapping region of the substrate 1 is mounted on the support surface 21a of the spare tool 2A, the control unit reduces the vacuum intensity generated at the stage 1a to form a weak empty state. Conversely, the control unit generates a vacuum at the spare tool 20a to suck the non-overlapping section H of the substrate i from the lower surface of the substrate 1. The control unit then removes the vacuum created at the platform. As a result, the substrate 1 is sucked up substantially only by the support surface 21a of the spare tool 2A. In this state, when the pressure welding tool 3 is lowered to perform the pressure welding process corresponding to the driving integrated circuit 6 of the substrate 1, the pressure bonding tool 30, the substrate 丨, and the spare tool 2 are provided as a result of 27 200845838. The support surfaces 21a of the 〇& are formed substantially in the same plane, so that damage and cracks on the substrate 1 can be avoided. ^ When the pressure welding process is completed and the bonding tool 3 is raised, the control unit removes the vacuum generated in the spare tool 20a, and generates a vacuum on the stage 1〇a, as in the initial state, in order to suck up the substrate and take out the substrate. 1. Referring to Fig. 14, a method for pressure welding the drive integrated circuit 6 D of the above structure will be described in detail below. When the substrate 丨 in the pressure welding process is loaded on the stage 10a, a vacuum is generated on the stage 10a (step S31). The substrate 1 is firmly and fixedly sucked up on the stage 10a. When the substrate 1 is firmly and fixedly sucked up on the stage 1A, the stage i〇a is moved to the pressure welding flow position W by the separate moving unit for moving the platform 10a (step S32). . As shown in Fig. u, when the platform l〇a reaches the position W of the pressure welding process, the platform 1〇a is positioned in the standby tool 2〇a immediately adjacent to the position E of the pressure welding process. The non-overlapping section of the substrate 丄 to be moved is mounted on the support surface 21a of the spare tool (S33). When the non-overlapping section of the substrate 1 is mounted on the support surface 21a of the spare tool, the control unit reduces the vacuum intensity generated at the stage i〇a to form a weak empty state (step S34). Conversely, a vacuum is generated at the standby tool 20a to suck up the non-overlapping region from the lower side of the non-overlapping section η (step S35). The vacuum generated at the platform i〇a is removed (step 836). Further, the bonding tool 30 is lowered (step S37) and a pressure welding process for pressing the driving integrated circuit 6 to the upper surface of the non-overlapping section η is performed (step S38). 28 200845838 The drive integrated circuit 6 is pressure-bonded to the substrate 1 by supplying heat and pressure to drive the integrated circuit. In the prior art, as shown in FIG. 11, since most of the surface of the substrate , is vacuumed and supported by the support surface Ua of the platform 10a, and the non-overlapping regions of the substrate 1 are tied Lifting from the support surface 21a of the spare tool 2A, in this state, if the pressure welding tool is lowered and pressed to drive the area of the integrated circuit 6, it will be due to the support surface 1 la and standby on the platform 1A A relative height difference between the support surfaces 21a of the tool 2A is such that damage and cracks are likely to occur on the substrate 1. Door (. ^ However, in the present embodiment, as shown in Fig. 12, the substrate 1 is lifted from the support surface 11a of the flat surface, and only the non-overlapping section # of the substrate 藉 is provided by the spare tool 2 The table support surface 2ia of 〇a is vacuumed up and supported. In this state, when the pressure welding tool 3〇 is lowered and the pressure welding process of the integrated circuit 6 is driven relative to the substrate, the pressure is supplied. The welder 30, the substrate, and the support surface 21& of the spare tool 2〇a form the same H, so that damage and cracks on the substrate can be avoided. δ When the pressure welding process is performed, the pressure welding tool 30 is raised. Go to the original position (step S39). When the pressure welding tool 3 is raised, the vacuum of the spare tool 2〇a can be correspondingly removed (step S4〇). When the control unit, the detection unit 24 When it is time, the vacuum generated at the standby = can be removed. When the vacuum is generated in the vacuum of the spare tool 2 〇a, the platform 10a is again erected to suck up the substrate 1 by the platform 10a (step S41). When the mobile platform l〇a, the substrate that has completed the pressure welding process is taken out (step 29)

而且 轹上所述 200845838 驟S42)。在上述的方法中,另一基板(圖未示)的麼銲流 程係可以連續地進行。 如上所述,依據本發明,由於係以一簡單且方便的結 構及方法而有效地支撐基板1,也因為基板具有一比習知 技術更薄的厚度,因此在驅動積體電路6的壓銲流程期 間,可以避免在基板上產生損傷與裂痕。特別的是,在本 實施例中’甚至是當上偏光片2及下偏光片3的厚度並不 大於0.25随冑’更是可以避免在基板i上產生損傷鱼裂 痕,且可以容易地進行驅動積體電路6 的方法而壓銲到基板,同時地縮減用在壓銲流程的加 間,也因而實現了高速度的壓銲流程。 甚至疋當與習知技術比較起來,具有更薄之厚 ;=二在印刷電路的壓銲流程期間,藉由使用-簡單 的結構與方法而有效地支撐基板, 3早 損傷及裂痕。 W魏結板上產生 J惶圮戰尽勉月為呈現解決問用 技術手段之難實财式或實施⑻已,並判 勺 發明專利實施之範圍。即凡與本發明專财請範圍= 符,或依本發明專利範圍所做的岣等變化盥修比才 發明專利範圍所涵蓋。 _白為本 【圖式簡單說明】And the above mentioned 200845838 (S42). In the above method, the welding process of another substrate (not shown) can be continuously performed. As described above, according to the present invention, since the substrate 1 is efficiently supported by a simple and convenient structure and method, since the substrate has a thinner thickness than the conventional technique, the pressure welding of the integrated circuit 6 is driven. Damage and cracks on the substrate can be avoided during the process. In particular, in the present embodiment, even when the thickness of the upper polarizer 2 and the lower polarizer 3 is not more than 0.25, it is possible to avoid damage to fish cracks on the substrate i and to be easily driven. The method of the integrated circuit 6 is pressure-bonded to the substrate, and at the same time, it is reduced in the application process of the pressure welding process, thereby realizing a high-speed pressure welding process. Even when compared with conventional techniques, it has a thinner thickness; = two effectively supports the substrate, 3 early damage and cracks during the pressure welding process of the printed circuit by using a simple structure and method. On the W Weijie board, J惶圮 惶圮 惶圮 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为 为That is to say, the scope of the invention is not limited to the scope of the patent for the invention, or the variation of the scope of the invention according to the scope of the invention. _ white for this [simplified description]

係表示在-種用以壓銲一印刷電路㈣ 完全自動模組壓銲流程圖; 習知的 30 200845838 圖2係表示一種習知用以壓銲一印刷電路的方法; 圖3係表示本發明一驅動積體電路壓銲到一液晶顯示器基 板的立體圖; 圖4係表示本發明用以壓銲一印刷電路的設備結構之一實 施例示意圖; 圖5係表示本發明圖4中用以獲取校準影像資訊之裝置的 立體圖; 圖6係表示本發明圖5中用以獲取校準影像資訊之裝置的 平面圖, 圖7至圖9係表示本發明圖4中用以壓銲一印刷電路之設 備的操作步驟分解圖; 圖10係表示依據本發明用以壓銲一印刷電路版的方法之 一貫施例的流程圖, 圖11係表示本發明一實施例在進行一壓銲流程之前,用以 壓銲一印刷電路之設備結構的示意圖; 圖12係表示本發明另一實施例在壓銲流程期間,用以壓銲 ^ 印刷電路之設備結構的不意圖, 圖13係表示本發明圖11及圖12所示的輔助工具之結構的 不意圖,以及 圖14係表示本發明另一實施例,用以壓銲一印刷電路之方 法的流程圖。 【主要元件符號說明】 5111 壓頭下降到一拿取位置 5112 在壓頭即形成真空以便壓頭可以拿取驅動機 31 200845838 體電路 SI 13 壓頭即上升到一離開位置 5114 移動供給手臂 5115 壓頭下降到一拍攝位置 5116 二攝影機即拍攝由壓頭以真空吸取的驅動機 體電路之二晶片標記 5117 壓頭上升回到離開位置 5118 將一支撐基板的平台運送到一壓銲流程位置 5119 將平台降下 5120 二攝影機即拍攝形成在基板上的二玻璃標記 5121 平台在X、Y轴及6»角進行校準 5122 壓頭下降到壓銲流程位置 5123 進行預壓銲流程 5124 將壓頭升起到離開位置 5125 將平台升起 5126 取出平台 5127 移動供給手臂 1 液晶顯不為基板 la 玻璃標記 lb 玻璃標記 2 上玻璃 3 下玻璃 4 上偏光片 5 下偏光片 6 驅動積體電路 32 200845838 6a 晶片標記 6b 晶片標記 10 平台 11 支撐表面 20 備用工具 21 支#表面 30 壓頭/壓銲工具 40 校準影像資訊獲取裝置 Ο 41 稜鏡區塊 41a 拍攝視窗 42 空耦合區塊 43 筒體 44 攝影鏡片單元 45 鏡片支撐座 46 照明單元 50 供給手臂 (丨 H 非重疊區段 LI 拿取位置 L2 離開位置 L3 拍攝位置 L4 壓銲位置 W 壓銲流程位置 Sll 壓頭下降到一拿取位置 S12 壓頭提供真空,以拿起 S13 將壓頭升起到一離開位 33 200845838 514 將支撐基板的平台與供給手臂移動到壓銲流 程位置 515 將壓頭下降到拍攝位置,並降下平台 516 同時地拍攝二晶片標記及二玻璃標記 517 當平台進行校準流程時,移動平台到壓銲流 程位置 518 降下平台或是升起備用工具 519 將壓頭下降到一壓銲位置 520 進行一預壓銲流程 521 壓頭上升到離開位置/降下平台或是升起備 用工具 522 取出平台且移動供給手臂 10a 平台 11a 支撐表面 12 真空控制單元 13 真空孔 20a 備用工具 21a 支樓表面 22 真空孔 23 真空線 24 檢測閥 25 主體 G1 群组 G2 群組 G3 群組 34 200845838 S31 在平台上產生真空 S32 將平台移動到壓銲流程位置 S33 將被移動之基板的非重豐區段搭載在備用工 具的支撐表面上 S34 降低產生在平台的真空強度 S35 在備用工具產生真空 S36 移除產生在平台的真空 S37 降下壓銲工具 S38 進行壓銲流程 S39 升起壓銲工具 S40 移除產生在備用工具的真空 S41 在平台產生真空 S42 取出已完成壓鲜流程的基板 35A method for pressure welding a printed circuit (4) full automatic module pressure welding; a conventional 30 200845838 FIG. 2 shows a conventional method for pressure welding a printed circuit; FIG. 3 shows the present invention FIG. 4 is a schematic view showing an embodiment of an apparatus structure for pressure welding a printed circuit of the present invention; FIG. 5 is a schematic view showing the calibration of the apparatus for controlling a printed circuit of the present invention; FIG. 6 is a plan view showing the apparatus for acquiring calibration image information in FIG. 5 of the present invention, and FIGS. 7 to 9 are diagrams showing the operation of the apparatus for pressure welding a printed circuit of FIG. 4 of the present invention. Figure 10 is a flow chart showing a consistent embodiment of a method for pressure welding a printed circuit board according to the present invention, and Figure 11 is a view showing a pressure welding process prior to performing a pressure welding process according to an embodiment of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 12 is a schematic view showing the structure of an apparatus for pressure welding a printed circuit during a pressure welding process according to another embodiment of the present invention, and FIG. 13 is a view showing the present invention. It is not intended to aid the structure shown in FIGS. 11 and 12, and 14 are diagrams of another embodiment of the present invention, a flow chart of a method of bonding a printed circuit. [Main component symbol description] 5111 The pressure head is lowered to a take-up position 5112. The vacuum is formed at the pressure head so that the pressure head can take the driver 31 200845838 The body circuit SI 13 The pressure head rises to an exit position 5114 The movement supply arm 5115 pressure The head is lowered to a shooting position 5116. The second camera is photographed by the indenter to vacuum the drive body circuit. The second wafer mark 5117 is raised back to the exit position 5118. A platform supporting the substrate is transported to a pressure welding process position 5119. Lowering the 5120 camera, the two glass markers formed on the substrate are mounted on the substrate. The platform is calibrated at the X, Y axis and 6» angle. 5122 The pressure head is lowered to the pressure welding process position 5123. The pre-welding process 5124 is used to raise the pressure head. Position 5125 Lift the platform 5126 Remove the platform 5127 Move the supply arm 1 LCD display is not the substrate la Glass mark lb Glass mark 2 Upper glass 3 Lower glass 4 Upper polarizer 5 Lower polarizer 6 Drive integrated circuit 32 200845838 6a Wafer mark 6b Wafer mark 10 platform 11 support surface 20 spare tool 21 support #surface 30 indenter / pressure welding 40 calibrated image information acquiring device Ο 41 稜鏡 block 41a shooting window 42 vacant coupling block 43 cylinder 44 photographic lens unit 45 lens support 46 illumination unit 50 supply arm (丨H non-overlapping section LI take position L2 Leaving position L3 Shooting position L4 Pressure welding position W Pressure welding flow position Sll Indenter down to a picking position S12 The indenter provides vacuum to pick up S13 to raise the indenter to a dead position 33 200845838 514 Platform to support the substrate Move the supply arm to the pressure welding process position 515 to lower the pressure head to the shooting position, and lower the platform 516 to simultaneously capture the two wafer marks and the two glass marks 517. When the platform performs the calibration process, move the platform to the pressure welding process position 518 to lower the platform. Or raise the spare tool 519 to lower the indenter to a pressure welding position 520 to perform a pre-welding process 521. The indenter rises to the exit position/lower platform or raises the spare tool 522. The platform is removed and the supply arm 10a platform 11a is supported. Surface 12 vacuum control unit 13 vacuum hole 20a spare tool 21a 22 Vacuum hole 23 Vacuum line 24 Detection valve 25 Main body G1 Group G2 Group G3 Group 34 200845838 S31 Vacuum is generated on the platform S32 Move the platform to the pressure welding flow position S33 Mount the non-heavy section of the substrate to be moved S34 on the support surface of the spare tool reduces the vacuum strength generated on the platform S35. The vacuum is generated in the spare tool. S36 is removed. The vacuum generated on the platform is lowered. S37 is lowered. The pressure welding tool S38 is pressed. The welding process S39 is raised. The pressure welding tool S40 is removed. The vacuum S41 of the spare tool generates a vacuum on the platform S42. The substrate 35 that has completed the freshening process is taken out.

Claims (1)

200845838 h、申請專利範圍: .種在一印刷電路與— 影像資訊之裝置,1由土 ▲上&取其間相互校正的校準 一體成型,並將至少=取校準影像資訊之裝置係 ,以及至少一形在該印刷電路上的晶片標記 從β t成在该基板上的破璃沪々门从媒 獲得該等標記的校準影像#訊。〕朗同拍攝,以 €) .依據申請專利範圍第丨項 置,更進一步地包含:、义的心取校準影像資訊之裝 ^ 個㈣至少—W標 複數個二心 表面而相互正對設置^ ^私鏡區塊的每一相對 複數個稜鏡,係設置在& 内,以將光線的方向^區塊及該等空搞合區塊 複數個筒體,係分別地與哕士,朝向該等拍攝視窗; 複數個攝影鏡片單元,係荨空耦合區塊耦合;以及 部。 μ ^別地耦合到該等筒體的端 依據申請專利範圍第2項 、 置,更進一步地包含: I、獲取校準影像資訊之裝 複數個鏡片支撐座,係設 等筒體之間:以j叹在該等攝影鏡片單元及該 複數個照明單元,係分 線發射到該等筒^。地連接到該等筒體,並將光 依據申請專利範圍第2項 置,其中,該稜鏡區塊係以獲取校準影像資訊之裝 、纟且相互分離的子區塊所形 200845838 成的,而且每二個該等攝影視窗,係分別地在該等攝影 視窗之間以一相同間隔,而相互接近地設置在每一分離 的子區塊上。 5. —種用以壓銲一印刷電路的設備,該設備包括: 一平台,具有支撐一基板的一上表面,以壓銲該印刷 電路,且將該基板運送並取出到一壓銲流程位置; 一壓頭,係設置在該壓銲流程位置,而可以升高並吸 起該印刷電路,以及向著該基板按壓該已被吸起 的印刷電路,以將該印刷電路壓銲在該基板上; 以及 一用以獲取校準影像資訊之裝置,係將至少一形成在 該已被吸起的印刷電路上的元件標記,與至少一 形成在該基板上的玻璃標記兩者一同攝影,以獲 取該等標記的校準影像資訊。 6. 依據申請專利範圍第5項所述之設備,其中,該用以獲 取校準影像資訊之裝置係一體成型。 7. 依據申請專利範圍第5項所述之設備,其中,每一個在 該印刷電路的至少一晶片標記與在該基板的至少一玻璃 標記,其數量為二,且該用以獲取校準影像資訊之裝置 係同時拍攝出二晶片標記以及二玻璃標記。 8. 依據申請專利範圍第5項所述之設備,其中,該用以獲 取校準影像資訊之裝置包括: 一稜鏡區塊,係具有複數個將該至少一晶片標記與該 至少一玻璃標記同時拍攝的拍攝視窗; 37 200845838 .複數個空耦合區塊,係連接到該棱鏡區塊的每一相對 表面而相互正對設置; 複數個稜鏡,係設置在該稜鏡區塊及該等空耦合區塊 内,以將光線的方向折射到朝向該等拍攝視窗; 複數個筒體,係分別地與該等空粞合區塊耦合;以及 複數個攝影鏡片單元,係分別地耦合到該等筒體的端 部。 9. 依據申請專利範圍第8項所述之設備,其中,該用以獲 C 取校準影像資訊之裝置包括: 複數個鏡片支撐座’係設置在該等攝影鏡片早元及該 等筒體之間;以及 複數個照明單元,係分別地連接到該等筒體,並將光 線發射到該等筒體。 10. 依據申請專利範圍第8項所述之設備,其中,該稜鏡區 塊係以一組相互分離的子區塊所形成的,而且每二個該 等攝影視窗,係分別地在該等攝影視窗之間以一相同間 t 隔,而相互接近地設置在每一分離的子區塊上。 11. 依據申請專利範圍第5項所述之設備,更進一步地包括 一控制單元,係依據藉由該用以獲取校準影像裝置而獲 得之標記的校準影像資訊,以控制該平台相對於該印刷 電路進行校準。 12. 依據申請專利範圍第11項所述之設備,更進一步地包 括一備用工具,係遠離該平台而設置,且在該壓銲流程 位置從該基板的下侧以支撐該基板的一部分,其中,在 該平台運移動到該壓銲流程位置且該基板的一部分支撐 38 200845838 在该備用工具的一支撐表面上之前,該控制單元係依據 該用以獲取校準影像資訊的装置之影像資訊,控制該平 台在X、γ軸及0角上進行校準。 13·依據申請專利範圍第5項所述之設備,其中,該基板係 用在一移動終端的一液晶顯米器(LCD)基板,且該印刷 %路係為一驅動積體電路。200845838 h, the scope of application for patents: . A device for printing circuit and image information, 1 is integrated with the calibration of the soil ▲ & and will be at least = the device for calibrating the image information, and at least A wafer mark on the printed circuit is obtained from the β t into a calibrated image of the mark on the substrate. 〕 Langtong shooting, to €). According to the scope of the patent application scope, further includes:, the heart of the right to take the calibration image information installed ^ (four) at least - W standard multiple two-heart surface and set up each other ^ ^ Each relative number of 私 of the private mirror block is set in & to separate the direction of the light and the block of the space into a plurality of cylinders, respectively, with the gentleman, Facing the shooting windows; a plurality of photographic lens units are coupled by a hollow coupling block; and a portion. The end of the cylinder is coupled to the end of the cylinder according to the second item of the patent application scope, and further includes: I. Acquiring a plurality of lens support seats for obtaining calibration image information, and connecting the cylinders between the cylinders: j sighs in the photographic lens unit and the plurality of illumination units, and the sub-line is emitted to the tubes ^. The ground is connected to the cylinders, and the light is placed according to item 2 of the scope of the patent application, wherein the block is formed by the sub-blocks that are used to obtain the image information of the calibration, and are separated from each other by 200845838. And each of the two photographic windows is disposed at a same interval between the photographic windows, respectively, on each of the separate sub-blocks. 5. An apparatus for pressure welding a printed circuit, the apparatus comprising: a platform having an upper surface supporting a substrate for pressure welding the printed circuit, and transporting and removing the substrate to a pressure welding process position An indenter is disposed at the position of the bonding process, and the printed circuit can be raised and sucked, and the printed circuit that has been sucked is pressed against the substrate to press-weld the printed circuit on the substrate And a device for obtaining calibration image information, wherein at least one component mark formed on the sucked printed circuit is photographed together with at least one glass mark formed on the substrate to obtain the The calibration image information of the mark. 6. The device of claim 5, wherein the means for obtaining calibration image information is integrally formed. 7. The device according to claim 5, wherein each of the at least one wafer in the printed circuit is marked with at least one glass on the substrate, the number of which is two, and the information for obtaining calibration image is obtained. The device simultaneously captures two wafer marks and two glass marks. 8. The device of claim 5, wherein the means for obtaining calibration image information comprises: a plurality of blocks having a plurality of at least one wafer mark and the at least one glass mark Shooting window; 37 200845838. A plurality of empty coupling blocks are connected to each opposite surface of the prism block and arranged opposite each other; a plurality of 稜鏡 are arranged in the 稜鏡 block and the space Coupling the light in the coupling block toward the shooting window; a plurality of cylinders respectively coupled to the air-combining blocks; and a plurality of photographic lens units coupled to the respective photographic lens units The end of the barrel. 9. The device of claim 8, wherein the means for obtaining C calibration image information comprises: a plurality of lens holders disposed in the photographic lens and the cylinders And a plurality of lighting units respectively connected to the cylinders and emitting light to the cylinders. 10. The apparatus of claim 8, wherein the 稜鏡 block is formed by a group of mutually separated sub-blocks, and each of the two photographic windows is respectively The photographic windows are separated by an identical interval t and placed adjacent to each other on each of the separated sub-blocks. 11. The device of claim 5, further comprising a control unit for controlling the platform relative to the printing based on the calibration image information obtained by the calibration image device The circuit is calibrated. 12. The apparatus of claim 11, further comprising a spare tool disposed away from the platform and at a position from the underside of the substrate to support a portion of the substrate at the bonding flow location, wherein Before the platform moves to the position of the pressure welding process and a portion of the substrate supports 38 200845838 on a support surface of the spare tool, the control unit controls the image information of the device for acquiring calibration image information. The platform is calibrated on the X, γ and 0 angles. The device according to claim 5, wherein the substrate is used in a liquid crystal display (LCD) substrate of a mobile terminal, and the printing % circuit is a driving integrated circuit. 14·—種用以壓銲一印刷電路的方法,該方法包括: 將支撐一基板的_平台移動到一壓銲流程位置; 將拿取一印刷電路到一拍攝位置的一壓頭降下; 同日可地拍攝形成在該印刷電路板上之至少一晶片標 §己’及形成在該基板上之至少一玻璃標記 取在該等標記上的校準影像資訊; 依據在該等標記上所獲取的校準影像資訊,將支撐該 ^ 基板的平台校準到該晶片標記;以及 15藉由降下該壓頭,將該印刷電路壓銲到該基板。 又據申睛專利範圍第14項所述之方法,其中,該拿取 =刷電路到一拍攝位置的一壓頭的下降,係同時地與 的二下降一預定距離,或將支撐該基板之一非重疊區段 行僑用工具,而從該基板的一下侧升起的操作—同進 申睛專利範圍第14項所述之方法,其中,哕二 =準係同時地與再將該平台朝該備用卫具移動」預& π.依據舰完純找壓銲流程位置。 括在1 申 關第14項所述之方法,更進—步地包 μ印刷電路的壓銲之後,將該壓頭升起到—離開位 39 200845838 置,其中,該壓頭到該離開位置的升起,係同時地與將 該平台升起,或是將該備用工具下降的操作一同進行。 18. 依據申請專利範圍第14項所述之方法,更進一步地包 括在該壓頭到該離開位置的升起之後,將該平台取出, 其中,該平台的取出係與使用一供給手臂,將一新的印 刷電路移動該壓頭的一下部之操作,同時地進行。 19. 一種用以壓鲜一印刷電路的設備’該設備包括: 一平台,係用以將一基板移動到一印刷電路的一壓銲 流程位置,及將該基板從該印刷電路的壓銲流 程位置取出,而該基板具有至少一上玻璃及至 少一下玻璃,其中,至少一上偏光片與至少一 下偏光片係分別地黏貼到該上玻璃及該下玻璃 的外表面; 一壓銲工具,係、設置在壓銲流程位置,且可以升起, 而藉由向著該下玻璃之一非重疊區段的一上表 面而按壓該印刷電路,在該壓銲流程位置將該 印刷電路壓銲到該基板,該下玻璃的非重疊區 段係未與該上玻璃重疊之處;以及 一備用工具,係分離地設置在遠離該平台之處,以從 該非重疊區段的下侧支撐該非重疊區段,而且該 備用工具係具有至少一真空孔,在該壓銲工具的 按壓期間,用以吸起該基板。 20. 依據申請專利範圍第19項所述之設備,其中,在該平 台上形成複數個真空孔,以在該基板的移動及取出期間 ,吸起該基板。 200845838 , 21.依據申請專利範圍第19項所述之設備,其中,在該備 用工具係形呈複數個真空孔,而且該備用工具係包括: 一主體; 一支撐表面,係形成在該主體上,用以從該非重疊區 段的下侧支撐該非重疊區段,且該支撐表面具有 若干區分成至少二群組的真空孔; 複數個真空線,係設置在該主體内,每一真空線係相 對於每一群組設置,且在每一群組個別地產生真 Θ 空;以及 一檢測閥,係設置在每一真空線,且可選擇性地開啟 及關閉每一真空線的開口。 22. 依據申請專利範圍第20項所述之設備,更進一步地包 括一控制單元,係控制產生在該平台及該備用工具上之 真空的開啟/關閉與強度,以避免在該壓銲工具的按壓期 間’在該基板上產生裂痕。 23. 依據申請專利範圍第22項所述之設備,其中,該控制 I 單元係在該基板的移動與取出期間,控制在該平台之真 空孔的真空之產生,以吸起該該基板,以及在該壓銲工 具的壓銲期間,控制該平台之真空孔的真空之移除。 24. 依據申請專利範圍第19項所述之設備,其中,該備用 工具係固定在該壓銲流程位置的一區域。 25. —種用以壓銲一印刷電路的方法,該方法包括: 將在一產生真空之平台上的一基板吸起,且將該被吸 起的基板移動到該印刷電路的一壓銲流程位置, 該基板具有至少一上玻璃及至少一下玻璃,其 41 200845838 中,在該上玻璃及該下玻璃的外表面,係分別黏 貼有至少一上偏光片及至少一下偏光片; 將該下玻璃的一非重疊區段搭載在設置在該壓銲流 程位置之備用工具的一支撐表面,該下玻璃的非 重疊區段係未與該上玻璃重疊之處; 在該備用工具產生真空,且從該非重疊區段的下侧將 該非重疊區段吸起; 移除在該平台上的真空;以及 藉由降下位在該基板上方的壓銲工具,將該印刷電路 版壓銲到該非重疊區段的一上表面。 26. 依據申請專利範圍第25項所述之方法,更進一步地包 括在該備用工具產生真空之前,降低產生在該平台上的 真空強度。 27. 依據申請專利範圍第27項所述之方法,更進一步地包 括: 當完成壓銲流程之後升起該壓銲工具時,移除產生在 該備用工具的真空; 在該平台產生真空,且吸起該基板;以及 藉由該平台將該基板取出。 4214. A method for pressure welding a printed circuit, the method comprising: moving a platform supporting a substrate to a pressure welding process position; taking a printed circuit to a pressing position of a shooting position; Capturing at least one of the wafers formed on the printed circuit board and at least one of the glass marks formed on the substrate to obtain calibration image information on the marks; according to the calibration obtained on the marks Image information, aligning the platform supporting the substrate to the wafer mark; and 15 pressing the printed circuit to the substrate by lowering the ram. The method of claim 14, wherein the step of taking the brush circuit to a position of a photographic head is simultaneously lowered by a predetermined distance from the second, or the substrate is supported. a non-overlapping section of the overseas Chinese tool, and the operation of lifting from the lower side of the substrate - the method described in claim 14 of the patent application, wherein the second level = the same level as the platform Move towards the alternate guard. Pre- & π. According to the ship's pure position to find the pressure welding process. Included in the method of claim 14, after further step-by-step welding of the printed circuit, the indenter is raised to - leave position 39 200845838, wherein the head is to the exit position The rise is carried out simultaneously with the lifting of the platform or the operation of lowering the spare tool. 18. The method of claim 14, further comprising removing the platform after the raising of the indenter to the exit position, wherein the removal of the platform is performed using a supply arm, The operation of a new printed circuit to move the lower portion of the indenter is performed simultaneously. 19. A device for pressing a printed circuit'. The device comprises: a platform for moving a substrate to a bonding process location of a printed circuit, and a bonding process of the substrate from the printed circuit Positioning, and the substrate has at least one upper glass and at least one lower glass, wherein at least one upper polarizer and at least one lower polarizer are respectively adhered to the upper surface of the upper glass and the lower glass; Provided at a position of the pressure welding process, and can be raised, and the printed circuit is pressed to an upper surface of a non-overlapping section of the lower glass, and the printed circuit is pressure-bonded to the bonding welding process. a substrate, where the non-overlapping section of the lower glass is not overlapped with the upper glass; and a spare tool disposed separately away from the platform to support the non-overlapping section from a lower side of the non-overlapping section And the spare tool has at least one vacuum hole for sucking up the substrate during pressing of the bonding tool. 20. The apparatus of claim 19, wherein a plurality of vacuum holes are formed in the platform to pick up the substrate during movement and removal of the substrate. The apparatus of claim 19, wherein the spare tool is in the form of a plurality of vacuum holes, and the spare tool comprises: a body; a support surface formed on the body The support surface has a plurality of vacuum holes divided into at least two groups; a plurality of vacuum lines are disposed in the body, each vacuum line system With respect to each group setting, and each group individually produces a true vacancy; and a detection valve is provided at each vacuum line, and the opening of each vacuum line can be selectively opened and closed. 22. The apparatus according to claim 20, further comprising a control unit for controlling the opening/closing and strength of the vacuum generated on the platform and the spare tool to avoid the pressure welding tool A crack is generated on the substrate during pressing. 23. The apparatus according to claim 22, wherein the control unit is configured to control the generation of a vacuum in the vacuum hole of the platform during the movement and removal of the substrate to suck up the substrate, and During the pressure welding of the pressure welding tool, the vacuum of the vacuum hole of the platform is controlled. 24. The apparatus of claim 19, wherein the spare tool is attached to an area of the pressure welding process location. 25. A method for pressure welding a printed circuit, the method comprising: sucking a substrate on a vacuum generating platform and moving the picked up substrate to a bonding process of the printed circuit Positioning, the substrate has at least one upper glass and at least one lower glass, wherein in the upper surface of the upper glass and the lower glass, at least one upper polarizer and at least one lower polarizer are respectively adhered to the substrate; a non-overlapping section mounted on a support surface of the spare tool disposed at the position of the press-welding process, the non-overlapping section of the lower glass is not overlapped with the upper glass; a vacuum is generated in the spare tool, and a lower side of the non-overlapping section aspirating the non-overlapping section; removing a vacuum on the platform; and pressure welding the printed circuit board to the non-overlapping section by lowering a pressure bonding tool positioned above the substrate One of the upper surfaces. 26. The method of claim 25, further comprising reducing the intensity of the vacuum generated on the platform prior to creating a vacuum in the spare tool. 27. The method of claim 27, further comprising: removing the vacuum generated in the spare tool when the pressure welding tool is raised after the completion of the pressure welding process; generating a vacuum on the platform, and Aspirating the substrate; and removing the substrate by the platform. 42
TW97117370A 2007-05-14 2008-05-12 Apparatus and method for bonding printed circuit TWI364247B (en)

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KR1020070046459A KR100913579B1 (en) 2007-05-14 2007-05-14 Bonding device for driving circuit board and its method
KR1020070046458A KR20080100582A (en) 2007-05-14 2007-05-14 Bonding device for driving circuit board and its method

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI402014B (en) * 2010-09-02 2013-07-11 Au Optronics Corp Mounting device and operating method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI402014B (en) * 2010-09-02 2013-07-11 Au Optronics Corp Mounting device and operating method thereof

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