200811409 九、發明說明： 【發明所屬之技術領域】 本叙明係關於一種對液晶顧示裝置用玻璃基板、PDP(電 漿顯示面板）用玻璃基板和半導體晶圓等之薄板狀電子元 件用基板（以下簡稱「基板」）進行燒成處理之基板燒成爐 的供排氣系統。 【先前技術】200811409 IX. Description of the Invention: The present invention relates to a substrate for a thin-plate electronic component such as a glass substrate for a liquid crystal display device, a glass substrate for a PDP (plasma display panel), and a semiconductor wafer. (hereinafter referred to as "substrate") The supply and exhaust system of the substrate firing furnace in which the firing treatment is performed. [Prior Art]
於衫色濾光片之-製造製程中’有對藉由喷墨附著彩色 墨水之玻璃基板進行燒成之製程。此燒成製程藉由在升溫 至預定之燒成溫度的燒成爐中，敎氣環境下，將玻璃基 板保持預定時間而進行。此外，於玻璃基板上形成金屬配 線之情形’於同樣之燒成爐中’於氮氣等惰性氣體環境下 燒成玻璃基板。無論哪種燒成處理製程，均由於包含於玻 璃基板上之彩色墨水等被燒成物中的有機溶劑揮發或氧 化，產生許多有機物並擴散到大氣中。 1乳 风蜒埋甲，於不斷將清潔 中因不行排氣’以使有機物不滯留於細 二=將自燒成爐排出之含有多量有機物的氣_ 之有機物的處理。 了精由洗條.等收集排氣中 另一方面，從節能觀點來看 熱風與新供給至燒成爐之氣體 洗滌器處理燒成爐排出之氣體 多，從而能源效率惡化，因此 ，亦嘗試使自燒成爐排出之 之間進行熱交換。即，若用 ，被帶走之熱能量變得非常 ，此旨試係將排出之氣體與 121897.doc 200811409 新供給之氣體導人熱交換器巾，藉由使其等之間進行熱交 換’回收來自燒成爐之排出熱量。 因右將燒成爐排出之氣體未經處理便導入熱交換器，則 有機物附著於熱交換器内之結構物上而造成網眼堵塞，故 必須於使排出氣體進行觸媒處理且分解有機物之後導入熱 又換器。關於對從爐内排出之排出氣體進行觸媒處理後， ‘入熱父換器之技術，揭示於例如專利文獻1。 [專利文獻1]日本專利特開2001-201271 【發明内容】 [發明所欲解決之問題] 然而，即使對自玻璃基板燒成爐排出之氣體進行觸媒處 里亦無去充分除去有機物，其結果.，於較短時間内熱交換 裔由於附著物而堵塞，結果因無法長時間連續運轉，因此 裝置運行率變低，經濟性差。 因此，實際上大多藉由洗滌器處理自燒成爐排出之氣 體，但是因此情形除上述之低能源效率之外，亦必須對處 理後之廢液進行處理，故存在運行成本變高之問題。 本务明係鑒於上述問題而進行者，其目的在於提供一種 月匕源效率南、並可長斯穩定運行之基板燒成爐之供排氣系 統。 [解決問題之技術手段] 為解決上述問題，請求項丨之發明具備：基板燒成爐， 其具有收容基板並進行燒成處理之爐體、使自前述爐體排 出之熱風循環並再次供給至前述爐體之循環通道、設置於 121897.doc 200811409 月，j述循環通道使熱風循環之風扇、及設置於前述循環通道 使熱風加熱之加熱器的；具有用以使自前述循環通道排出 之熱風中所含之有機物分解之觸媒之觸媒單元；及使自前 述觸媒單排出之熱風與新供給至前述循環通道之氣體進 ^熱2換的熱交換器’於前述循環通道中，從自前述加熱 器到前述爐體之氣體吹出口之加熱後熱風通過區域向前述 觸媒單元排出熱風。 、此外，明求項2之發明係於請求項丨之發明相關之基板燒 成爐的1、排氣系統中’以與前述加熱後熱風通過區域相對 之方式配置前述觸媒單元。 、此外明求項3之發明係於請求項丨之發明相關之基板燒 成爐的供排氣系統中’進而具備：計數收容於前述爐體中 進订k成處理之基板枚數的計數機構；根據藉由前·述計數 j構e十數之基板枚數而控制自前述循環通道之排氣量和向 前=循環通道之供氣量之流量控制機構。 、 S求員4之發明係於請求項1之發明相關之基板燒 成爐的ί、排乳系統中’進而具備：不經由前述熱交換器而 直=前：循環通道進行新供氣之旁通通道。In the process of manufacturing a shirt color filter, there is a process of firing a glass substrate by which ink is adhered by inkjet. This firing process is carried out by holding the glass substrate for a predetermined period of time in a firing furnace which is heated to a predetermined firing temperature in a helium atmosphere. Further, in the case where a metal wiring is formed on a glass substrate, the glass substrate is fired in an inert gas atmosphere such as nitrogen in the same firing furnace. Regardless of the firing treatment process, many organic substances are generated and diffused into the atmosphere due to volatilization or oxidation of the organic solvent in the fired material such as color ink contained on the glass substrate. 1 The milk is immersed in the armor, and the cleaning is prevented from being exhausted, so that the organic matter is not retained in the fineness of the organic matter containing a large amount of organic matter discharged from the firing furnace. On the other hand, from the viewpoint of energy saving, the hot air and the gas scrubber newly supplied to the firing furnace are used to treat the calcining furnace, and the energy is deteriorated. Therefore, it is also tried. The heat exchange is performed between the discharges from the firing furnace. That is, if it is used, the heat energy that is carried away becomes very large. The purpose of this test is to exchange the gas with the gas-guided heat exchanger towel newly supplied by 121897.doc 200811409, by making heat exchange between them. The heat discharged from the firing furnace is recovered. Since the gas discharged from the firing furnace is introduced into the heat exchanger without treatment, the organic matter adheres to the structure in the heat exchanger to cause clogging of the mesh, so it is necessary to subject the exhaust gas to catalyst treatment and decompose the organic matter. Import the heat and change the converter. Regarding the catalyst treatment of the exhaust gas discharged from the furnace, the technique of "into the heat exchanger" is disclosed, for example, in Patent Document 1. [Patent Document 1] Japanese Patent Laid-Open No. 2001-201271 [Disclosure] [Problems to be Solved by the Invention] However, even if the gas discharged from the glass substrate firing furnace is not in the catalyst, the organic matter is not sufficiently removed. As a result, the heat exchanged person was clogged by the deposit in a short period of time, and as a result, the operation was not performed for a long time, so that the operation rate of the device was low and the economy was poor. Therefore, in practice, the gas discharged from the firing furnace is often treated by a scrubber. However, in addition to the above-described low energy efficiency, the treated waste liquid must be treated, so that there is a problem that the running cost becomes high. The present invention has been made in view of the above problems, and an object thereof is to provide an air supply and exhaust system for a substrate firing furnace in which the Moonlight source efficiency is south and the Longs can be stably operated. [Means for Solving the Problems] In order to solve the above problems, the invention of the present invention includes a substrate baking furnace having a furnace body that houses a substrate and is subjected to a baking treatment, and circulates the hot air discharged from the furnace body and supplies the same again. The circulation passage of the furnace body is disposed at 121897.doc 200811409, wherein the circulation passage causes a fan of hot air circulation, and a heater disposed in the circulation passage to heat the hot air; and has a hot air for discharging from the circulation passage. a catalyst unit for decomposing the organic matter contained in the catalyst; and a heat exchanger for replacing the hot air discharged from the catalyst unit with the gas newly supplied to the circulation passage in the aforementioned circulation passage The hot air passing region from the heater to the gas outlet of the furnace body discharges hot air to the catalyst unit. Further, the invention of the invention of claim 2 is that the catalyst unit is disposed in the exhaust system of the substrate firing furnace according to the invention of the present invention, so as to be opposed to the heated hot air passage region. Further, the invention of the invention of claim 3 is directed to the supply and exhaust system of the substrate firing furnace according to the invention of the present invention, and further includes: a counting mechanism for counting the number of substrates accommodated in the furnace body for binding processing And a flow rate control mechanism that controls the amount of exhaust gas from the circulation passage and the air supply amount of the forward = circulation passage according to the number of substrates of the ten-numbered e-number. The invention of the squirrel 4 is in the lacquering system of the substrate firing furnace according to the invention of claim 1, and further includes: without passing through the heat exchanger, straight = front: the circulation passage is next to the new gas supply Through channel.
、匕卜明求項5之發明係於請求項4之發明相關之基板燒 成爐的供排惫I μ I "、’、、、、中，進而具備：檢測自前述觸媒單元排 出而流入前述執六4么时 …、換為之熱風的壓力和自前述熱交換器排 出之熱排氣之壓力沾廢 I力的壓力差之壓力損失檢測機構；於前述 壓力差達到預金#、 、 以上之時點使前述旁通通道動作之供翕 通道切換機構。 …、 121897.doc 200811409 、此外，請求項6之發明係於請求項1之發明相關之基板燒 成爐的，排氣系統中，進而具備：使前述基板燒成爐在惰 氣體衣i兄了進行基板之燒成處理並於前述觸媒單元之入 口側附近供給空氣或氧氣之空氣供給管。 [發明之效果] 右藉由唄求項1之發明，因從自循環通道中之加熱器至 爐體之乳體吹出σ之加熱後熱通風區域向觸媒單元排出熱 =’故精由加熱器加熱後之高溫熱風立刻流入觸媒單元， 仗而可效率佳地分解熱風中所含之有機物，故幾乎所有有 機物都將被分解。其結果，因附著於熱交換器之内部構造 的編被控制在最小限度，故可使熱交換器長期穩定地 運饤，且可提高供排氣系統之能源效率。 此外，右藉由請求項2之發明，則因觸媒單元係以與加 熱後熱風通過區域相對之方式配置，故可使高溫熱風盡可 能地流入觸媒星；，^ _ 啊铄早7L，進一步提高有機物之分解效率。 此外，右藉由請求項3之發明，因根據收容於爐體中進 饤k成處.理之基板的枚數而控制來自循環通道之排氣量和 向循％通道之供氣量，故可保持包含於流入觸媒單元之排 礼氣體中所含之有機物的氣體中濃度大致穩定，使觸媒單 元穩定動作。 此外，若藉由請求項4之發明，因具備不經由熱交換器 而向循％通道直接供氣之旁通管路，故可藉由使新供給之 乳體Μ入旁通通道來停止熱交換，使熱交換器之内部構造 升溫除去附著之有機物。 121897.doc 200811409 此外，若藉由請求項5 泣入埶·^械 、明，因於自觸媒單元排出而 抓入熱父換器之熱風的壓 *兀排出而 壓力之壓力差達到預定 F出之熱排乳的 上之時點，使旁通ii指 故旁通通道於埶交換琴夕向立 方通通道動作， 之時術；： 構造中附著某數量之有機物 之時點動作，可有效去除有機物。 此外’若藉甴請求項 ^ 七明，因在向觸媒單元之進氣 側附近具備供給空氣或氧氣 / 今驊〜τ 一 羊1孔之二乳供應官，故即使於惰性The invention of the invention of claim 5 is directed to the supply and discharge of the substrate firing furnace according to the invention of claim 4, and further comprising: detecting the discharge from the catalyst unit and flowing into the foregoing When the 6th 4th time is changed, the pressure of the hot air and the pressure of the hot exhaust gas discharged from the heat exchanger are the pressure loss detecting mechanism of the pressure difference of the I force; the pressure difference reaches the pre-gold #, , and above The supply channel switching mechanism that operates the aforementioned bypass passage at a time point. Further, the invention of claim 6 is the substrate firing furnace according to the invention of claim 1, and the exhaust system further includes: causing the substrate firing furnace to be in an inert gas coat An air supply tube for supplying air or oxygen to the vicinity of the inlet side of the catalyst unit is performed by baking the substrate. [Effects of the Invention] By the invention of claim 1, the heat is discharged from the heat-ventilated region of the catalyst unit from the heater in the circulation passage to the body of the furnace body, and the heat is discharged to the catalyst unit. The high-temperature hot air heated by the device immediately flows into the catalyst unit, and the organic matter contained in the hot air can be efficiently decomposed, so that almost all the organic matter will be decomposed. As a result, since the knitting of the internal structure attached to the heat exchanger is minimized, the heat exchanger can be stably operated for a long period of time, and the energy efficiency of the air supply and exhaust system can be improved. In addition, according to the invention of claim 2, since the catalyst unit is disposed opposite to the hot air passing region after heating, the high temperature hot air can flow into the catalyst star as much as possible; ^ _ 啊 铄 7L early, Further improve the decomposition efficiency of organic matter. In addition, according to the invention of claim 3, the amount of exhaust gas from the circulation passage and the amount of supply to the passage through the passage are controlled according to the number of substrates accommodated in the furnace body. The concentration of the gas contained in the organic matter contained in the ritual gas flowing into the catalyst unit is substantially stabilized, and the catalyst unit is stably operated. Further, according to the invention of claim 4, since the bypass line for directly supplying the gas to the % passage without passing through the heat exchanger is provided, the heat can be stopped by causing the newly supplied milk to enter the bypass passage. Exchanging, the internal structure of the heat exchanger is heated to remove the attached organic matter. 121897.doc 200811409 In addition, if the pressure of the hot air caught in the hot parent converter is discharged by the discharge of the self-catalyst unit by the request item 5, the pressure difference of the pressure reaches the predetermined F At the time of the hot ejector, the bypass ii refers to the bypass passage on the 埶 琴 琴 向 向 立方 立方 立方 立方 立方 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; . In addition, if the request item ^七明 is used, it is supplied to the vicinity of the intake side of the catalyst unit, even if it is supplied with air or oxygen / 骅 τ τ τ 1 1 1
才…衣兄進订基板燒成處理之情形，亦可於觸媒單元發 生有機物之熱分解和氧化分解，使觸媒單元之出口側溫度 達到高溫，提高熱交換器之熱交換效率。 【實施方式】 以下一邊參照圖式一邊就本發明之實施形態進行詳細說 明。 圖1係顯示本發明相關之基板燒成爐之供排氣系統的重 要部位構成之概略圖。此外，圖2係從上方看基板燒成爐 之斷面圖。基板燒成爐1係燒成搭載有彩色墨水等的方型 玻璃基板W(本發明所稱之基板）之熱風爐。基板燒成爐1具 備·收容玻璃基板w進行燒成處理之爐體1 〇 ;使自爐體J 〇 排出之熱風循環，再次供給至爐體10之循環通道20 ;設置 於循環通道20上使熱風循環之風扇2 1 ;和設置於循環通道 20上，使熱風加熱之加熱器22。 爐體10係基板燒成爐1之本體部，可多階段收容玻璃基 板W(於本實施形態中為40階段）之框體。爐體10之内側為 略呈四方體形之熱處理空間19。於爐體10之内壁面内設有 121897.doc -11 - 200811409 省略圖示之複數個叉子。各叉子係從爐體1〇之内壁面朝向 熱處理空間19沿水平方向延伸設置。沿水平方向並列之複 數個叉子構成i階段之棚架，i該棚架形成為階段。於 各階段棚架上，可以水平姿勢載置一牧玻璃基板w。 於爐體10之正面側（圖2之紙面左側）設置隔栅式之百葉 ® 11。百葉窗11由多階段積層複數個隔柵所構成。於各隔 柵上附設省略圖示之升降驅動機構，使各隔柵可升降。圖 外之搬運機器人對於基板燒成爐i搬出搬入玻璃基板w 時，與該棚架高度幾乎相同之位置的隔柵上升，以僅使與 搬出搬入之棚架相對部位做存取甩開口。若如此，可將玻 璃基板W之搬出搬入時之開口設為所需最小限度，且可將 伴隨搬出搬入之熱能源洩露控制於最小限度。再者，因在 驅動百葉窗11較下部之隔柵時，亦連動驅動該隔栅上階段 之隔栅，故必須設置可獲得與下部之隔柵相當大小之扭矩 之驅動機構。 於爐體10之側面，相對設置有向熱處理空間i 9供給熱風 之吹出口 12及排放熱風之排氣口 14。即，於本實施形態之 基板燒成爐1，從爐體1 〇之一側面供給之熱風沿玻璃基板 W表面，水平方向地流向熱處理空間19内，並流向相對側 側面。吹出口 12及排氣口 14設置於爐體1〇之内壁面中至少 與收容玻璃基板W之整個多階段棚架對應之高度的位置。 故此，可向收容於爐體1 〇内之玻璃基板W均勻供給熱風， 進行均質之熱處理。 於吹出口 12設置對應高溫之耐熱hepa過濾器13。耐熱 121897.doc -12- 200811409 HEPA過濾器13係去除包含於經由循環通道20所送熱風中 之微粒，形成清潔之熱風。另一方面，於排氣口 14，設置 全面配置複數個通氣孔之沖孔金屬15。流經熱處理空間19 之熱風從沖孔金屬1 5之通風孔排向循環通道20。再者，於 爐體10之内壁面中與百葉窗U相對之壁面係由無排氣孔之 構件形成之爐壁。此外，於爐體1 〇之内壁面中，亦可於除 百葉窗11和與之相對之壁面之外之兩方配置與沖孔金屬15 相同者。Only when the brothers order the substrate to be fired, the thermal decomposition and oxidative decomposition of the organic matter may occur in the catalyst unit, so that the temperature on the outlet side of the catalyst unit reaches a high temperature, and the heat exchange efficiency of the heat exchanger is improved. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Fig. 1 is a schematic view showing the configuration of important parts of an air supply and exhaust system of a substrate firing furnace according to the present invention. Further, Fig. 2 is a cross-sectional view of the substrate firing furnace as seen from above. In the substrate firing furnace 1, a hot air furnace in which a rectangular glass substrate W (a substrate referred to in the present invention) such as color ink is mounted is fired. The substrate firing furnace 1 includes a furnace body 1 in which the glass substrate w is housed and subjected to a baking treatment, and the hot air discharged from the furnace body J 循环 is circulated, and is again supplied to the circulation passage 20 of the furnace body 10; The hot air circulation fan 2 1 ; and the heater 22 disposed on the circulation passage 20 to heat the hot air. The furnace body 10 is a main body portion of the substrate firing furnace 1, and can accommodate a frame of a glass substrate W (in the present embodiment, 40 stages) in multiple stages. The inside of the furnace body 10 is a heat treatment space 19 having a substantially square shape. A plurality of forks (not shown) are provided in the inner wall surface of the furnace body 10, 121897.doc -11 - 200811409. Each of the forks extends from the inner wall surface of the furnace body 1 toward the heat treatment space 19 in the horizontal direction. A plurality of forks juxtaposed in the horizontal direction constitute a scaffold of the i stage, i the scaffold is formed into a stage. On each stage of the scaffolding, a grazing substrate w can be placed in a horizontal posture. A barrier type louver ® 11 is provided on the front side of the furnace body 10 (on the left side of the paper surface of Fig. 2). The louver 11 is composed of a plurality of barriers stacked in multiple stages. An elevating drive mechanism (not shown) is attached to each of the grids so that the grilles can be raised and lowered. When the transfer robot i carries out the loading and unloading of the glass substrate w, the transfer robot is raised at a position almost at the same height as the height of the scaffold, so that only the portion opposite to the scaffold that is carried in and out is used as an access opening. In this manner, the opening when the glass substrate W is carried in and out can be minimized, and the leakage of the thermal energy accompanying the loading and unloading can be minimized. Further, since the barrier of the upper stage of the barrier is also driven in conjunction with the lower barrier of the shutter 11, it is necessary to provide a drive mechanism that can obtain a torque equivalent to the barrier of the lower portion. On the side of the furnace body 10, an air outlet 12 for supplying hot air to the heat treatment space i9 and an exhaust port 14 for discharging hot air are disposed opposite to each other. In the substrate firing furnace 1 of the present embodiment, hot air supplied from one side of the furnace body 1 flows horizontally into the heat treatment space 19 along the surface of the glass substrate W, and flows to the opposite side surface. The air outlet 12 and the air outlet 14 are provided at positions on the inner wall surface of the furnace body 1 at least at a height corresponding to the entire multi-stage rack for accommodating the glass substrate W. Therefore, the hot air can be uniformly supplied to the glass substrate W accommodated in the furnace body 1 to perform a homogeneous heat treatment. A heat-resistant hepa filter 13 corresponding to a high temperature is provided at the air outlet 12. Heat resistance 121897.doc -12- 200811409 The HEPA filter 13 removes particles contained in the hot air sent through the circulation passage 20 to form a clean hot air. On the other hand, a punching metal 15 in which a plurality of vent holes are integrally disposed is provided at the exhaust port 14. The hot air flowing through the heat treatment space 19 is discharged from the vent holes of the punched metal 15 to the circulation passage 20. Further, the wall surface opposite to the louver U in the inner wall surface of the furnace body 10 is a furnace wall formed of a member having no vent hole. Further, the inner wall surface of the furnace body 1 may be disposed in the same manner as the punching metal 15 except for the louver 11 and the wall surface opposed thereto.
循環通道20係連通爐體1〇之排氣口 14與吹出口 12之氣體 可通過之通道，且其構成具有於爐體i 〇之外壁面和覆蓋基 板燒成爐1整體之耐熱壁之内壁面之間形成之空間。於基 板燒成爐1之循環通道20，設置有風扇21和加熱器22。於 本貫施形態，於循環通道20之上游側設置風扇2 i，而於下 游側設置加熱器22(P4倒數L16-1 5)。所謂循環通道2〇之上 游側係罪近爐體1 〇之排氣口〗4 一侧，相反地，所謂下游側 係靠近吹出口 12—側。風扇以具體如圖2所示，設置於靠 近亚與排氣口 14相對之部位。風扇21具備電動機2；u和旋 轉葉片21b，藉由電動機21a使旋轉葉片21七旋轉，於循環 通道20中產生從上游側向下游側流動之氣流（即從排氣口 14向吹出口 12之氣流）。再者，於圖2雖然設置^個風扇 21，但是風扇21之設置數為任意。 加熱器22設置於與爐體1G之百葉tn相對之爐壁與基板 燒成爐1之耐熱壁之間。加熱器22對流經循環通道2〇之埶 風進行再次加熱。於本實施形態之基板燒成爐！，藉由循 121897.doc 200811409 下游側之加 環通道2 0之上游側之風扇2 1所送出之氣流藉由 熱器加熱後，藉由耐熱HEPA過濾器13淨化，從吹出口 12 供給至熱處理空間19。然後，從爐體1〇之排氣口 14排出之 熱風再次藉由風扇21送往循環通道2〇之下游側。再者，於 圖2雖然設置3個加熱器22，但是加熱器22之設置數為任 如以上所述，基板燒成爐1作為所謂熱風循環型之燒成 爐構成’在加熱玻璃基板W時’不斷再加熱從爐體1〇排出 之熱風後返回。藉由不斷向爐體1G供給新的熱風，孰處理 空間19之溫度被維持在預定之燒成温度（於本實施形態， 於2〇0°C〜3 00。(：範圍内根據處理進行設定）。 但疋，如上所述，若加熱玻璃基板w，則藉由使玻璃基 板W上之被燒成物（彩色墨水等）所含之有機溶劑揮發或氣 化，而產生很多有機4勿。因於熱處理空間19不斷形成熱風 之氣流’故從玻璃基板赠離出之有機物與氣流同時從排 氣口14流向循環通道2G。若使基板燒成爐丨之熱風循環系 統構成完全關閉之純，則新的有機物的燒成由於大量有 機物而被抑制，以及財熱HEPA過濾器13網眼急速堵塞、 劣化，故於本實施形態，向循環通道20供給新的氣體，並 從循環通道20進行排氣。 作為排氣通道’於循環通道2〇中，於從加熱器Μ至爐體 10之孔體久出口 12之加熱後熱風通過領域與排氣管％ 連通連接。而且，於排氣管3G上配置觸媒單元η。觸媒單 元31内藏有用於分解有機物之白金（Pt)觸媒。此處，於本 121897.doc 14 200811409 實施形態如圖2所示，觸媒單元31係以與加熱後熱風通過 區域20a相對之方式設置於循環通道2〇之加熱器22之後。 即’於形成於基板燒成爐1之框體上、排氣管3〇與循環通 道20連接之分歧連接點上配置觸媒單元3 1。 此外’排氣管3 0之另一端（與循環通道2〇相對側端部）與 熱父換50連通連接。本實施形態之熱交換器5〇係蓄熱部 旋轉之方式的蓄熱式熱交換器，係使高溫氣體與低溫氣體 與旋轉之蓄熱部之元件交替接觸進行熱交換者。作為此等 方式之熱父換器，例如可使用Ljungstrom(註冊商標）式之 熱交換器。 於排氣：3 0，除觸媒單元3 1之外，亦插有流量調節閥3 2 及入口側壓力計33。流量調節闊32調節流經排氣管3〇之排 氣流量。入口側壓力計33檢·測從觸媒單元3丨排出並流入熱 父換器50之熱風的壓力。此外，於將自熱交換器5〇排出之 排氣氣體導入排熱導管等之熱排氣通道3〇a上插有出口侧 力什34°出口側壓力計34檢測自熱交換器5〇排出之熱排 氣的壓力。 另 方面’作為向循環通道2 0之供氣通道，於循環通道 20中之風扇21附近區域連通連接供氣管4〇。更具體言之， 其構成係自供氣管40供給之氣體流入旋轉葉片21b之軸周 圍。於供氣管4〇插有流量調節閥42。流量調節閥42調節流 經供氣官40之供氣流量。供氣管40之另一端側（循環通道 20之相對侧）分支成兩股，一分歧管4〇a與熱交換器5〇連通 連接’同時另一分歧管為不經過熱交換器5〇的旁通管 121897.doc > 15^ 200811409 40b。 此外，於用於向熱交換器5〇供給新 一 惰性氣體）之供氣通道4〇c設 3虱孔等 ^ M--逍閥44。此三福P目+ 與旁通管條連接（P5倒數⑼。切換三通閥彻^⑽亦 供…供給新供給之氣體或者不經由孰交 換器5〇，而經由旁通管 ^ 乂由熱又 心働向供氣管40供氣。於新 氣體通過旁通管40b之愔形，A、s — ''Ό ^The circulation passage 20 is a passage through which the gas passing through the exhaust port 14 of the furnace body 1 and the air outlet 12 can pass, and is formed to have a wall surface outside the furnace body 和 and a heat-resistant wall covering the entire substrate firing furnace 1 A space formed between the walls. The circulation passage 20 of the substrate firing furnace 1 is provided with a fan 21 and a heater 22. In the present embodiment, the fan 2 i is disposed on the upstream side of the circulation passage 20, and the heater 22 is disposed on the downstream side (P4 countdown L16-1 5). The so-called circulation channel 2〇 above the side of the ventilator is close to the exhaust port of the furnace body 1 4 4 side, and conversely, the downstream side is close to the side of the blow port 12 . Specifically, as shown in Fig. 2, the fan is disposed at a portion adjacent to the exhaust port 14 in the vicinity. The fan 21 includes a motor 2; u and a rotary vane 21b, and the rotary vane 21 is rotated by the electric motor 21a to generate an air flow flowing from the upstream side to the downstream side in the circulation passage 20 (i.e., from the exhaust port 14 to the blow port 12). airflow). Further, although the fan 21 is provided in Fig. 2, the number of the fans 21 is arbitrary. The heater 22 is disposed between the furnace wall opposite to the louver tn of the furnace body 1G and the heat-resistant wall of the substrate firing furnace 1. The heater 22 reheats the hurricane flowing through the circulation passage 2〇. The substrate baking furnace of this embodiment! The airflow sent by the fan 2 1 on the upstream side of the looping passage 20 on the downstream side of the 121897.doc 200811409 is heated by a heat heater, purified by the heat-resistant HEPA filter 13, and supplied from the air outlet 12 to the heat treatment. Space 19. Then, the hot air discharged from the exhaust port 14 of the furnace body 1 is again sent to the downstream side of the circulation passage 2 by the fan 21. In addition, although three heaters 22 are provided in FIG. 2, the number of the heaters 22 is set as described above, and the substrate firing furnace 1 is configured as a so-called hot air circulation type firing furnace "When heating the glass substrate W" 'Continuously reheat the hot air discharged from the furnace body 1 and return. By continuously supplying new hot air to the furnace body 1G, the temperature of the helium processing space 19 is maintained at a predetermined firing temperature (in the present embodiment, it is set at 2 〇 0 ° C to 300 00. However, as described above, when the glass substrate w is heated, many organic substances are generated by volatilizing or vaporizing the organic solvent contained in the fired material (color ink or the like) on the glass substrate W. Since the heat treatment space 19 continuously forms a hot air flow, the organic matter and the airflow which are given away from the glass substrate flow from the exhaust port 14 to the circulation passage 2G at the same time. If the hot air circulation system for baking the substrate into a furnace is completely closed, Since the firing of the new organic substance is suppressed by a large amount of organic matter, and the mesh of the heat-generating HEPA filter 13 is rapidly blocked and deteriorated, in the present embodiment, a new gas is supplied to the circulation passage 20, and is discharged from the circulation passage 20. As the exhaust passage 'in the circulation passage 2', the hot air passing through the field from the heater crucible to the long outlet 12 of the furnace body 10 is connected to the exhaust pipe %. Moreover, on the exhaust pipe 3G The catalyst unit η is provided with a platinum (Pt) catalyst for decomposing organic matter. Here, as shown in FIG. 2, the catalyst unit 31 is heated and heated. The rear hot air passing region 20a is disposed opposite to the heater 22 of the circulation passage 2, that is, on the frame formed on the frame of the substrate firing furnace 1, and the exhaust pipe 3 is connected to the circulation passage 20 at a divergent connection point. The catalyst unit 31 is disposed. Further, the other end of the exhaust pipe 30 (the end portion opposite to the circulation passage 2A) is connected to the hot parent 50. The heat exchanger 5 of the present embodiment is configured to rotate the heat storage portion. In the regenerative heat exchanger of the embodiment, the hot gas is exchanged between the high-temperature gas and the low-temperature gas and the elements of the rotating heat accumulating portion, and the heat exchanger is used. For example, the heat of the Ljungstrom (registered trademark) type can be used as the hot parent converter. Exhaust gas: 3 0, in addition to the catalyst unit 3 1 , a flow regulating valve 3 2 and an inlet side pressure gauge 33 are also inserted. The flow regulating width 32 adjusts the exhaust flow rate through the exhaust pipe 3〇 The inlet side pressure gauge 33 detects and measures the catalyst single 3丨 The pressure of the hot air discharged into the hot parent device 50. In addition, the exhaust gas discharged from the heat exchanger 5〇 is introduced into the hot exhaust passage 3〇a of the heat exhaust conduit or the like, and the outlet side force is inserted. The 34° outlet side pressure gauge 34 detects the pressure of the hot exhaust gas discharged from the heat exchanger 5〇. In addition, as the air supply passage to the circulation passage 20, the air supply pipe is connected in the vicinity of the fan 21 in the circulation passage 20. More specifically, the configuration is such that the gas supplied from the air supply pipe 40 flows into the periphery of the shaft of the rotary vane 21b. The flow regulating pipe 42 is inserted into the air supply pipe 4, and the flow regulating valve 42 regulates the flow through the gas supply officer 40. Air flow rate. The other end side of the air supply pipe 40 (opposite side of the circulation passage 20) branches into two, and a branch pipe 4〇a is connected to the heat exchanger 5〇 while the other branch pipe does not pass through the heat exchanger 5. 〇 Bypass 121897.doc > 15^ 200811409 40b. Further, a supply port 4〇c for supplying a new inert gas to the heat exchanger 5 is provided with a boring valve or the like. This Sanfu P mesh + is connected to the bypass pipe (P5 countdown (9). The switching three-way valve is also used to supply the newly supplied gas or not via the helium exchanger 5〇, but by the bypass pipe At the same time, the heart supply air to the air supply pipe 40. The new gas passes through the shape of the bypass pipe 40b, A, s - ''Ό ^
㈡形旁通警4〇b不經由熱交換 50，而發揮直接向循環 、、、又撰态 衣逋道20供乳之旁通通道之作 盔 論新供給之氣體流過哪一通f， … 1通道最終都流入供氣管，苴供 給流量由流量調節閥42調節。 ’、 熱父換器5 0進行從觸媒單元3 1排 卞平兀h排出之熱風和新供給至 壞通道2 0之氣體的熱交換太奋 又秧本貝鈿形癌之熱交換器50係蓄 ，式熱交換器’使自觸媒單元31排出並由排氣管％供給之 问皿熱風’與自供氣通道40c供給之較低溫氣體於蓄埶呷 之元件處相互接觸，介以元件’將排出熱風 量傳 遞給新供給之氣體。 …里傳 此外，於本實施形態之供排氣系統設有控制部9〇。作為 控制部90硬體之構成與普通之電腦相同。即，控制部卯具 備進行各種計算處理之CPU、記憶並讀出基本製程程式2 專用記憶體之ROM、記憶各種資訊並自由讀寫記憶體之 RAM(P6L5-6)及記憶控制用應用及資訊等之磁碟等。控制 部90與流量調節闊32、42及三通閥44電性連接，控制該等 之動作。此外，控制部90亦控制基板燒成爐i之各動作部 (例如風扇21、加熱器22、百葉窗11之升降驅動機構）之動 121897.doc -16- 200811409 作。進而，控制部90與入口側壓力計33、出口側壓力計34 以及後述之基板燒成爐1之計數器91電性連接，接收來自 此等傳感器之檢測信號。 以下，就具有上述構成之基板燒成爐i之供排氣系統之 , 動作内容進行說明。首先，於燒成處理中，搬運機器人以 預定間隔依次將玻璃基板W搬運入爐體1〇，再搬向預定階 丰又之栅架。載置於構成棚架之叉子上的玻璃基板w藉由來 Φ 自吹出口 12之熱風，一直升温到燒成温度。而且，於熱處 理空間19内，經過預定之燒成時間的玻璃基板涿藉由搬運 機器人搬出。再者，如本實施形態所示，當置於玻璃基板 W上之被燒成物為彩色墨水之情形，熱處理空間1 9為空氣 環境（即循環有加熱空氣），但於被燒成物為配線用之墨水 之情形為氮氣等惰性氣體環境（即循環有加熱惰性氣體）。 自爐體1 0之排氣口 14排出之熱排氣藉由風扇2〗以熱風氣 /；lL被送至循環通道20，該氣流藉由加熱器22加熱後，藉〃 • 由耐熱HEPA過濾'器13淨化，從吹出口 12再供給至熱處理 空間19。加熱器22由控制部9〇控制，將藉由風扇21所送出 之氣流加熱到對應於燒成溫度之溫度。再者，於爐體⑺之 熱處理空間19設置溫度傳感器，基於該溫度傳感器之計測 、、口果控制邛90反饋控制加熱器22使熱處理空間19達到與 燒成溫度對應之溫度亦可。 於上述循％過紅中，藉由加熱器22加熱之熱風分為向吹 出之氣’瓜和流向排氣管之氣流。於排氣管30以與加 熱後熱風通過區域2〇a相對之方式設置觸媒單元Η。因 121897.doc -17 - 200811409 此’比精由加熱器22加熱後之燒成溫度高數十。c高溫之熱 風的一部分將立即流入觸媒單元3 1。 藉由加熱A 22加熱後之高溫熱風立即流人觸媒單元m 白金觸媒接觸，則白金觸媒亦變成高溫，包含於自循環通 道20排出之熱風中的有機物將被高效率地分解。此時，於 N f·生乳體％ ^中燒成玻璃基板料，於觸媒單幻1發生有 ^之熱分解，而於空氣環境中燒成時，於觸媒單仙同 日^生有機物之熱分解和氧化分解。其結果，含於從自循 %通道20排放到排氣管3〇之 解為無害之物質。 的有機物幾乎全部被分 於觸媒單元3丨中有機物大 户哥，、” 觸且淨化之熱風通過 抓里凋即閥32,流入熱交換器5〇。 w卜1 # 力方面，於玻璃基板 W上進仃通常之燒成處理時， $ 通閥44，以使新供給 之*1體經過熱交換器5〇。即， 闕閉方通官40b。藉此，於 …、父換益50，於自觸媒單元31排出之 循％通道20之低溫氣體之間進行 辨 政+门n士 排虱軋體溫度下 降之同時，供氣氣體之溫度上升。 、S此時，因包含於自循環 解，有機物幾乎完全被分 解故熱父換态5 0内之元件等的古拖此 讀相有機物附著㈣少，可防 止熱父換态50之網眼堵塞。 通過熱交換器50且溫度降低的排氣氣 3〇a，被排放到外部之排熱管道等 ‘、、、排乳通道 流中亦幾乎不包含有機物。另—方面1疑問’此排氣氣 溫度上升之供氣氣體經由分歧管4。::入通過熱交換器如 机入供氣管40，通過 121897.doc -18- 200811409 流量調節閥42流入循環通道20。因新供給之氣體流入循環 j道20之風扇21附近（即，加熱器22之上游側，故不會令 吹出至熱處理空間！9之熱風溫度下降，而且將藉由加= 22加熱後從吹出口 12供給至熱處理空間19。 、° 右如此，藉由加熱器22加熱後之高溫熱風將立即流入觸 媒單元3丨，且效率佳地分解熱風中包含之有機物，故有機 物成乎王。p被分解。其結果，因於熱交換器5〇之内部構造 附著之有機物被控制在最小限度，故可使熱交換器5〇長= 間穩定地運轉。若能約使用熱交換器5〇進行供氣氣體與排 氣氣體之間之熱交換，則可提高基板燒成爐1之供排氣系 統之能源效率。 /' 此外，特別是於线環境中進行燒成處理之情形，於觸 媒單元31上同時發生有機物之熱分解和氧化分解，其結果 顯示觸媒單元3!之入口側溫度係近似於燒成溫度之溫度， 但於出口側溫度為上升約20(rc之升溫。通常，於埶交換 器高溫側流體之溫度越高，越可獲得良好之熱效率，若約 400°C以上之高溫的排出氣體流入熱交換器5〇，則可獲得 Μ圭之能源效率者^毫無㈣，若從基板燒成爐丨來看= 藉由於觸媒單元31追加分解熱可藉由供氣獲得藉由排氣自 身排放之熱量以上的熱量。 此外，於基板燒成爐！設置計數收容於爐體竭進行声 成處理之玻璃基板W之枚㈣計數作為該計數= 9卜可係檢測玻璃基板|是否載.置於各個棚架上之光學傳 感器等的硬體計數機構，亦可係識別從處理流程收容於爐 121897.doc -19- 200811409 體w之玻璃基板w之枚數的軟體計數機構。藉由計數器9} 叶數之處理中的玻璃基板w的牧數以電信號被傳輪至控制 部9〇。然後，控制部90根據藉由計數器91計數之玻璃基板 W之枚數而控制流量調節閥32及流量調節閥42，調節自循 %通道20之排氣量及向循環通道2〇之供氣量。具體言之， 進行燒成處理之玻璃基板W的枚數越多，與之成正比發生 之有機物量亦變多，故控制部9〇控制流量調節閥32、42， 使來自循環通道20的排氣量及供給循環通道2〇之供氣量變 多。若如此，因於流入觸媒單元31中之排氣氣體中包含= 有機物的氣體中濃度大致穩定，故白金觸媒穩定地發揮作 用。此外，當進行燒成處理之玻璃基板|的枚數少時，可 減少供排氣量，降低從基板燒成爐i之循環通道20帶走之 ，能佥相反地，玻璃基板W之枚數多時，可增加供排氣 Ϊ，儘可能於早期排出已產生之有機物。 制㈣控制流量調節閥32、42，使自循環通道 比向循環通道2G之供氣量多_些。若如此，爐 一之内部不斷形成對於外部大氣為若f 扒4机U ’ 右卞員屡狀態，即# 於搬入搬出玻璃基板放百葉 向爐外㈣和熱擴散。 ，亦可抑制有機物 若藉由本實施形態之供排氣系統，有 ^ 熱交換器5〇之元件等的内部結構，但是，、、'不附著於 行’仍不可避免地會慢慢發生有機物之附著連績運 者於熱交換器50之内部構造，-有機物附 產生壓力損失。為此其於 斤明，·同眼堵塞狀態， ‘ &以口_力計33及出口側屡力 121897.doc •20. 200811409 計34之壓力檢測結果，控制 1 y〇對自觸媒單元31排出並流 入熱交換器50之熱風的壓力鱼 一 L刀與自熱父換器5〇排出之熱排氣 壓力之壓力差進行檢測。然後，者 田其Μ力差超過所規定之 閾值以上時，控制部9〇切換二通 通閥44，使新供給之氣體通 過旁通管40b。於此狀態下，新 啊仏、、Ό之軋體不會通過熱交 換器50。於是，於熱交換器5〇，一 ^ 方面回 >皿之排氣氣體持 績流入，另一方面因不再供給低溫氣體，故不再發生熱交 換，熱交換器50之元件等的溫度 一 开具結果，附著於熱 父換器50之内部構造的有機物 初猎由熱里而再度昇華並被排 。即，藉由使新供給之氣體流人旁通f4()bn交換 器5〇之内部構造去除有機物，實施清潔處理。但是，、因進 行此清潔處理時不完全進行熱交換而能源效率降低，故控 制部切換三通閥44,以使入口側壓力計33舆出口侧壓力 計34之壓力差達到不^敎值時，新供給之氣體再次通過 熱交換器50。 參 以上’就本發明之實施形態進行了說 要不脫離其宗旨，除上述以外，可進行種種之 如，與本發明相關之供排氣系统亦可係圖3所示者。於圖3 中，就與圖1相同之要素標註相同符號。圖3中之供排氣系 =與圖i不同者係於觸媒單元31中冑置供給空氣（或氧氣k 空氣供給管60。空氣供給管60通過熱交換器5〇，與排氣管 3〇之觸媒單元31之人口側附近連料接。再者，為實現^ 構成，於圖3之系統中，於排氣管3〇中自加熱後熱風通過 &域20a稍距離之位置配置觸媒單元31。即，於排氣管π 12I897.doc -21 - 200811409 與循環通箱連接之分錢接點與觸料元3i之間連通連 接空氣供氣管60。 於圖3之系統中，自供氣管40供給氮氣等惰性氣體，循 環通道2 0及爐體i 〇之内部為惰性氣體環境。自與之不同通 道之空氣供氣管60向排氣管3〇之觸媒單元3ι入口侧附近供 給於熱交換器5G升溫之空氣（或氧氣）。再者，因係於排氣 管3〇之最上游位置供給空氣’所以，可防止該空氣倒流， 流入惰性氣體環境之循環通道2卜當高溫空氣被供給至觸 媒單元31之人口咖近時，與於线環境下進行燒成處理 之情形相同’於觸媒單元31同時發生有機物之熱分解盥氧 :分解，觸媒單元31之出口侧溫度變得比入口侧溫度還 八’Ό果可&尚熱父換器5 0之熱交換效率，使能源效 率更佳。再者，毫無疑問地，圖3之系、㈣亦可適用於從 供氣管4G供給空氣並進行玻璃基板w之大氣燒成處理者。 此外，循環通道20之構成並非限定於如圖2所示之形態 者，而係連通爐體10之排氣口 14和吹出口 12之氣體可通過 之流路’於其上游側設置風扇21，於下游側設置加熱器之 構成即可®此’例如為使基板燒成爐丨之外壁面板易於 開放，亦可於爐體1〇之底部配置加熱器22。 此外’使用旁通管40b之熱交換器5〇的清潔處理亦可與 入口側壓力計3 3與出口侧壓力計3 4之壓力差無關地隔一定 間隔實行。 卜於熱父換器5 〇之清潔處理中，亦可藉由使用旁通 吕40b，進而一起使用於排氣入口另行設置之例如噴出高 121897.doc -22- 200811409 溫、高壓之過熱蒸氣的過熱蒸氣噴嘴，以較短時間提高清 潔程度。 此外，熱父換器50並非限定於蓄熱式熱交換器者，亦可 係帶有供排氣父替通過之通道的板式熱交換器等。 此外，可收容於基板燒成爐1之爐體〗〇内之玻璃基板W 的枚數並非限定於40牧者，可為任意數量。 此外，藉由具備本發明相關之供排氣系統之基板燒成爐 之燒成處理對象之基板，並非限定於玻璃基板|者，亦可 是半導體晶圓。此外，被燒成物之墨水亦可係跑道用、 ITO電極（銦錫氧化物之透明電極)用等。 【圖式簡單說明】 圖1係顯示本發明相關之基板燒成爐供排氣系統之重要 部份結構的概略圖。 圖2係從上方所見基板燒成爐之斷面圖。 圖3係顯示本發明相關之基板燒成爐之供排氣系統之其 他例之概要圖。 【主要元件符號之說明】 1 基板燒成爐 10 爐體 12 吹出口 13 耐熱HEPA過濾器 14 排氣口 20 循環通道 20a 加熱後熱風通過區域 121897.doc -23- 200811409 21 風扇 22 加熱器 3 0 排氣管 31 觸媒單元 32、42 流量調節閥 33 入口側壓力計 34 出口側壓力計 40 供氣管 40b 旁通管 β 50 熱交換器 90 控制部 91 計數器 W 玻璃基板 121897.doc -24-(2) The side-by-side police 4〇b does not pass through the heat exchange 50, but exerts a direct supply to the circulation, and the cloaking channel of the clothing channel 20, which is the new supply of gas flowing through which ... The 1 channel eventually flows into the air supply pipe, and the 苴 supply flow is regulated by the flow regulating valve 42. ', the hot parent converter 50 performs the heat exchange of the hot air discharged from the catalyst unit 3 1 and the gas supplied to the bad passage 20, and the heat exchanger 50 of the shellfish cancer The heat exchanger of the type "heated air" that is discharged from the catalyst unit 31 and supplied by the exhaust pipe % and the lower temperature gas supplied from the air supply passage 40c are in contact with each other at the components of the storage unit, The component 'transmits the amount of hot air discharged to the newly supplied gas. In addition, the air supply and exhaust system of this embodiment is provided with a control unit 9A. The configuration of the hardware of the control unit 90 is the same as that of a normal computer. In other words, the control unit includes a CPU that performs various calculation processes, a ROM that memorizes and reads the basic memory of the basic process program 2, a RAM that stores various kinds of information and freely reads and writes the memory (P6L5-6), and an application and information for memory control. Wait for the disk and so on. The control unit 90 is electrically connected to the flow regulating widths 32 and 42 and the three-way valve 44 to control the operations. Further, the control unit 90 also controls the operation of each of the operating units (e.g., the fan 21, the heater 22, and the louver 11) of the substrate firing furnace i. 121897.doc -16-200811409. Further, the control unit 90 is electrically connected to the inlet side pressure gauge 33, the outlet side pressure gauge 34, and the counter 91 of the substrate firing furnace 1 to be described later, and receives detection signals from the sensors. Hereinafter, the operation and exhaust system of the substrate firing furnace i having the above configuration will be described. First, in the firing process, the transfer robot sequentially transports the glass substrate W into the furnace body 1 at predetermined intervals, and then moves it to the predetermined stage grid. The glass substrate w placed on the fork constituting the scaffold is heated up to the firing temperature by the hot air from the air outlet 12 . Further, in the heat treatment space 19, the glass substrate 经过 which has passed the predetermined firing time is carried out by the transport robot. Further, as shown in the present embodiment, when the burned material placed on the glass substrate W is a color ink, the heat treatment space 19 is an air atmosphere (that is, heated air is circulated), but the burned material is The case of the ink for wiring is an inert gas atmosphere such as nitrogen (that is, a heated inert gas is circulated). The hot exhaust gas discharged from the exhaust port 14 of the furnace body 10 is sent to the circulation passage 20 by the fan 2 with hot air/lL, and the air flow is heated by the heater 22, and is filtered by heat-resistant HEPA. The device 13 is purified and supplied from the air outlet 12 to the heat treatment space 19. The heater 22 is controlled by the control unit 9 to heat the airflow sent by the fan 21 to a temperature corresponding to the firing temperature. Further, a temperature sensor is provided in the heat treatment space 19 of the furnace body (7), and based on the measurement of the temperature sensor, the feedback control heater 22 controls the heater 22 so that the heat treatment space 19 reaches a temperature corresponding to the firing temperature. In the above-mentioned % over red, the hot air heated by the heater 22 is divided into a gas stream which is blown toward the gas and a gas flow to the exhaust pipe. The catalyst unit 设置 is disposed in the exhaust pipe 30 so as to oppose the hot air passing region 2〇a after heating. Because of the 121897.doc -17 - 200811409, the firing temperature after heating by the heater 22 is several tens higher. c A part of the hot air will immediately flow into the catalyst unit 31. When the high-temperature hot air heated by heating A 22 immediately flows into the human catalyst unit m and the platinum catalyst contacts, the platinum catalyst also becomes high temperature, and the organic matter contained in the hot air discharged from the circulation passage 20 is efficiently decomposed. At this time, the glass substrate material is fired in Nf·raw milk %^, and the thermal decomposition of the catalyst is caused by the single crystal 1 , and when it is fired in the air environment, the organic matter is produced on the same day. Thermal decomposition and oxidative decomposition. As a result, it is contained in a substance which is discharged from the passage of the % passage 20 to the exhaust pipe 3, and is harmless. Almost all of the organic matter is divided into the large organic matter in the catalyst unit 3, "The hot air that is touched and purified passes through the valve 32 and flows into the heat exchanger 5〇. w Bu 1 # force, on the glass substrate W When the upper 仃 is normally fired, the valve 44 is opened, so that the newly supplied body 1 passes through the heat exchanger 5 〇. That is, the 方 方 通 通 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 40 The temperature of the gas supply gas rises while the temperature of the hot gas passing through the % channel 20 discharged from the catalyst unit 31 is decreased, and the temperature of the gas supply gas rises. S, at this time, is included in the self-circulation Solution, the organic matter is almost completely decomposed, so the heat of the father is in the state of 50. The ancient drag of this reading phase is less (4), which prevents the mesh of the hot parent 50. It passes through the heat exchanger 50 and the temperature is lowered. Exhaust gas 3〇a, discharged into the external heat exhaust pipe, etc., and the milk discharge channel flow also contains almost no organic matter. Another aspect 1 doubts that the exhaust gas temperature rises the gas supply through the manifold 4.:: Pass through the heat exchanger, such as the machine into the air supply pipe 40, through 121897.doc -1 8- 200811409 The flow regulating valve 42 flows into the circulation passage 20. Since the newly supplied gas flows into the vicinity of the fan 21 of the circulation j-channel 20 (i.e., on the upstream side of the heater 22, the hot air temperature is not blown out to the heat treatment space! And, after being heated by adding 22, it is supplied from the air outlet 12 to the heat treatment space 19. In this case, the high-temperature hot air heated by the heater 22 immediately flows into the catalyst unit 3丨, and the hot air is efficiently decomposed. The organic matter contained in the organic matter is such that the organic matter becomes king. The p is decomposed. As a result, the organic matter attached to the internal structure of the heat exchanger 5 is controlled to a minimum, so that the heat exchanger 5 can be made long and stable. If the heat exchange between the supply gas and the exhaust gas can be performed using the heat exchanger 5, the energy efficiency of the supply and exhaust system of the substrate firing furnace 1 can be improved. In the case where the firing treatment is performed in the environment, thermal decomposition and oxidative decomposition of the organic substance occur simultaneously on the catalyst unit 31, and as a result, the temperature at the inlet side of the catalyst unit 3! is approximately the temperature at the firing temperature, but is discharged. The side temperature is increased by about 20 (the temperature rise of rc. Generally, the higher the temperature of the fluid on the high temperature side of the helium exchanger, the better the thermal efficiency is obtained, and if the high temperature exhaust gas of about 400 ° C or higher flows into the heat exchanger 5, In the case of the substrate firing furnace, it is possible to obtain the heat of the heat discharged by the exhaust gas itself by the supply of the gas by the additional heat of decomposition of the catalyst unit 31. In addition, in the substrate firing furnace, the number of the glass substrates W that are stored in the furnace body to perform the sonication process is counted (four) as the count = 9 can be used to detect the glass substrate | whether or not the optical is placed on each scaffold The hardware counting mechanism such as a sensor may be a software counting mechanism that recognizes the number of glass substrates w that are accommodated in the furnace 121897.doc -19- 200811409. The number of pastures of the glass substrate w in the processing of the number of leaves of the counter 9} is transmitted to the control unit 9 by an electric signal. Then, the control unit 90 controls the flow rate adjusting valve 32 and the flow rate adjusting valve 42 based on the number of glass substrates W counted by the counter 91, and adjusts the amount of exhaust gas from the % channel 20 and the amount of gas supplied to the circulation channel 2'. Specifically, the larger the number of the glass substrates W subjected to the baking treatment, the larger the amount of organic substances that are proportional to the number of the organic substrates, so that the control unit 9 controls the flow rate adjusting valves 32 and 42 to align the rows from the circulation passage 20. The amount of gas supplied by the gas volume and the supply circulation passage 2 is increased. In this manner, since the concentration of the gas containing the organic substance in the exhaust gas flowing into the catalyst unit 31 is substantially stable, the platinum catalyst stably functions. Further, when the number of the glass substrates| to be subjected to the firing treatment is small, the amount of supply and exhaust can be reduced, and the number of glass substrates W can be reduced by the removal of the circulation passage 20 from the substrate firing furnace i. For a long time, it can increase the supply and exhaust enthalpy, and discharge the organic matter that has been produced as early as possible. (4) Control the flow regulating valves 32, 42 so that the self-circulating passage has more air supply than the circulating passage 2G. If so, the inside of the furnace is continuously formed for the external atmosphere if the 扒4 machine U ’ 卞 屡 屡 屡 屡 屡 屡 屡 屡 屡 屡 屡 屡 屡 屡 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬 搬It is also possible to suppress the internal structure of the organic material by the supply and exhaust system of the present embodiment, and the element of the heat exchanger 5, but the organic matter is inevitably generated when it is not attached to the line. The adhesion is carried out in the internal structure of the heat exchanger 50, and the organic matter is attached to generate a pressure loss. For this reason, Yu Jinming, · the same state of obstruction, ' & with the mouth _ force meter 33 and the exit side of the force 121897.doc • 20. 200811409 34 pressure test results, control 1 y 〇 to the self-catalyst unit The pressure difference between the pressure fish-L knife discharged from the hot air discharged into the heat exchanger 50 and the hot exhaust pressure discharged from the self-heating parent exchanger 5 is detected. Then, when the difference between the force and the field exceeds the predetermined threshold value, the control unit 9 switches the two-way valve 44 to pass the newly supplied gas through the bypass pipe 40b. In this state, the rolled body of the new 仏, Ό, does not pass through the heat exchanger 50. Therefore, in the heat exchanger 5, the exhaust gas of the dish is inflow, and the low-temperature gas is no longer supplied, so that the heat exchange does not occur, and the temperature of the element of the heat exchanger 50 or the like is not generated. As a result of the opening, the organic matter attached to the internal structure of the hot parent exchanger 50 is re-sublimated and discharged by the heat. That is, the organic material is removed by the internal structure of the newly supplied gas flowing through the f4 () bn exchanger 5, and the cleaning process is performed. However, since the energy efficiency is lowered due to incomplete heat exchange during the cleaning process, the control unit switches the three-way valve 44 so that the pressure difference between the inlet side pressure gauge 33 and the outlet side pressure gauge 34 is not high. The newly supplied gas passes through the heat exchanger 50 again. The above embodiments have been described with respect to the embodiments of the present invention. Other than the above, various types of exhaust and exhaust systems related to the present invention may be used as shown in Fig. 3. In FIG. 3, the same elements as those in FIG. 1 are denoted by the same reference numerals. The supply and exhaust system in Fig. 3 is different from Fig. i in that the supply unit (or the oxygen k air supply pipe 60) is disposed in the catalyst unit 31. The air supply pipe 60 passes through the heat exchanger 5, and the exhaust pipe 3 In the system of FIG. 3, in the system of FIG. 3, the hot air passes through the & field 20a at a slight distance in the exhaust pipe 3〇. The catalyst unit 31. That is, the air supply pipe 60 is connected between the money transfer contact and the contact element 3i connected to the circulation box at the exhaust pipe π 12I897.doc -21 - 200811409. In the system of Fig. 3, An inert gas such as nitrogen gas is supplied from the gas supply pipe 40, and the inside of the circulation passage 20 and the furnace body i is an inert gas atmosphere. The air supply pipe 60 of the different passage is supplied to the vicinity of the inlet side of the catalyst unit 31 of the exhaust pipe 3〇. The air (or oxygen) heated by the heat exchanger 5G. Further, since the air is supplied to the most upstream position of the exhaust pipe 3', the air can be prevented from flowing backward, and the circulation passage 2 flowing into the inert gas environment is high. When the air is supplied to the population of the catalyst unit 31, the line is close to the line. In the case where the firing treatment is performed in the same environment, the thermal decomposition of the organic substance is simultaneously caused by the catalyst unit 31. The oxygen is decomposed, and the temperature on the outlet side of the catalyst unit 31 becomes eight more than the temperature on the inlet side. The heat exchange efficiency of the parent exchanger 50 makes the energy efficiency better. Furthermore, the system of FIG. 3 and (4) can also be applied to the air supply from the air supply pipe 4G and the air baking treatment of the glass substrate w. Further, the configuration of the circulation passage 20 is not limited to the one shown in Fig. 2, and the gas which is connected to the exhaust port 14 and the outlet port 12 of the furnace body 10 through which the gas can pass is provided with a fan on the upstream side thereof. 21, the heater can be arranged on the downstream side. This can be used to make the substrate wall of the furnace being easily opened. For example, the heater 22 can be disposed at the bottom of the furnace body. In addition, the bypass tube 40b is used. The cleaning process of the heat exchanger 5〇 may be performed at regular intervals regardless of the pressure difference between the inlet side pressure gauge 3 3 and the outlet side pressure gauge 34. In the cleaning process of the hot parent converter 5 , By using the bypass Lu 40b, and then using it together A superheated steam nozzle that is separately disposed at the exhaust gas inlet, for example, which discharges a high temperature and high pressure superheated vapor of 121897.doc -22-200811409, improves the degree of cleanliness in a short period of time. Further, the hot parent exchanger 50 is not limited to the regenerative heat exchange. The number of the glass substrates W that can be accommodated in the furnace body of the substrate firing furnace 1 is not limited to 40. In addition, the substrate to be fired by the substrate firing furnace having the supply and exhaust system according to the present invention is not limited to the glass substrate, and may be a semiconductor wafer. The ink of the burned material may be used for a runway, an ITO electrode (a transparent electrode of indium tin oxide), or the like. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the configuration of an important part of a substrate firing furnace supply and exhaust system according to the present invention. Fig. 2 is a cross-sectional view of the substrate firing furnace seen from above. Fig. 3 is a schematic view showing another example of the supply and exhaust system of the substrate firing furnace according to the present invention. [Description of main component symbols] 1 Substrate firing furnace 10 Furnace body 12 Air outlet 13 Heat-resistant HEPA filter 14 Exhaust port 20 Circulation passage 20a Hot air passage area after heating 121897.doc -23- 200811409 21 Fan 22 Heater 3 0 Exhaust pipe 31 Catalyst unit 32, 42 Flow regulating valve 33 Inlet side pressure gauge 34 Outlet side pressure gauge 40 Air supply pipe 40b Bypass pipe β 50 Heat exchanger 90 Control section 91 Counter W Glass substrate 121897.doc -24-