TW200817836A - Photosensitive resin composition, bump for control of liquid crystal alignment using the same and method for forming bump for control of liquid crystal alignment - Google Patents

Abstract

To provide a photosensitive resin composition for suppressing occurrence of residues after development on an electrode formed on a substrate, bumps for control of liquid crystal alignment formed from the photosensitive resin composition, and a method for forming bumps for control of liquid crystal alignment. The photosensitive resin composition which is disposed in a liquid crystal cell using a multiply divided vertical alignment system and forms bumps for controlling alignment of the liquid crystal on an electrode contains a pigment (C) and a pigment dispersant (D).

Description

200817836 IX. OBJECTS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a photosensitive resin composition ghost (a liquid that is slanted in a plurality of divided vertical alignment modes, and a liquid crystal alignment control bump formed by the composition) And the method of forming a liquid block. [Prior Art] Usually, the image of the image information displayed on the side of the screen is displayed in a large size and heavy when the Braun tube display device (CRT) is most often compared with the display area. Therefore, a liquid crystal display device having a large display area but a small thickness and a gas use has been developed (LCD, a liquid crystal display device), which is a structure in which two glass substrates are sealed in a liquid crystal. The common electrode of the glass on one side has a transparent pixel electrode on the glass substrate on the other side, and a circuit for applying voltage to each is formed at the same time. However, since the liquid crystal display device displays the above-mentioned junction, There is a problem of narrow viewing angle. In order to expand the viewing angle, there are proposed IPS (Switching) mode, VA (Vertical Alignment; Vertieal, etc. But even in VA In the formula, it is shown that the intermediate color crystal system is oriented obliquely in the same direction, and the viewing angle is also changed to form a convex cell, and the crystal alignment control device is used. It is often felt that it is not in any field, and the Braun tube display can be fixed to the ground, and a multi-pixel electrode is formed on the glass substrate to form a multi-pixel electrode, and the polarizing plate is sandwiched and switched; I η P1 ane Alignment) In the case of the method, the liquid is narrow. 5 200817836 Therefore, in order to eliminate the VA mode in the mid-tone field of view sound (see Patent Document 1), an MVA (Multi-domain VA) method is disclosed. The category control is such that when the voltage is applied, the alignment direction of the diagonally aligned liquid crystals, and the different domains within the domain can be controlled in different directions as long as they are disposed on at least one of the two substrates, and a category control means can be used. In addition, a method of providing a slanting surface is provided with a protrusion. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-252480 [Summary of the Invention] ] However, 'visible above-described Patent Document 1 or the like of the control projection with a south agent i) of the' system generally colorless. Therefore, at the protrusions, the reflection is disturbed, which causes a problem of uneven display. In order to prevent the turbulent reflection of light, the liquid crystal alignment control bump (hereinafter also referred to as j coloring is used to absorb light, but the pigment-containing fat composition is used to form liquid crystal alignment control) In the case of using a bump, there is a problem that a residue or the like is formed on the electrode formed after the development. [Means for Solving the Problem] In order to solve the above problems, the inventors of the present invention have focused on the dispersion of the pigment contained in the resin composition. The problem of the dispersing agent is heavy, the direct alignment; the means to make the 1 pixel type. The category, and at least the category control segment (liquid crystal due to the light sensitivity of the light > "bump") photosensitive tree is made in the substrate As a result, it has been found that the above problems can be solved by using a dispersant having a polyester bond, and the present invention has been completed. More specifically, the present invention provides the following. A photosensitive resin composition for forming a bump (provided in a liquid crystal cell of a plurality of divided vertical alignment modes) and used for controlling a liquid A photosensitive resin composition containing a pigment (C) and a pigment dispersant (D) having a polyester bond. Further, the second invention of the present invention is a liquid crystal alignment control bump, 〇 Further, the third invention of the present invention is a method for forming a liquid crystal alignment control bump by applying the photosensitive resin composition onto a substrate on which an electrode is formed. After the photosensitive resin layer is formed, the photosensitive resin layer is selectively exposed, and then alkali development is performed to form a bump on the photosensitive resin layer. [Effect] According to the photosensitive resin composition of the present invention, In the pigment dispersant (D) contained in the photosensitive decene composition, a powder having a polyester bond can be used to sufficiently disperse the pigment in the photosensitive resin composition, and the image can be suppressed. [Embodiment] [Embodiment of the Invention] Hereinafter, an embodiment of the present invention will be described. The present invention for forming a bump for controlling the alignment of the liquid crystal is formed. The photosensitive resin composition contains the pigment (C) and the pigment dispersant (D) having a polyester bond. 7 200817836 [Pigment (C)] The photosensitive resin composition of the present invention contains a pigment by using the pigment The photosensitive resin composition containing a pigment can form a colored bump. Therefore, by the colored bump, it is possible to prevent irregular reflection of light. Further, the pigment can be any of an inorganic pigment and an organic pigment. From the viewpoint of being able to lower the dielectric constant of the formed bumps, it is preferred to use an organic pigment among the above pigments.

(Organic Pigment) Such an organic pigment may, for example, be a compound classified as a pigment in a color index (C·I·; issued by The Society of Dyers and Colourists), and specifically, The following colorimetric index (CI·) number is attached. CI·Pigment Yellow 1 (hereinafter, “CI·Pigment Yellow” is the same, only the number is recorded), 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 55, 60, 61 , 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116, 117, 119, 120 , 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175, 180, 185; c · I ·Pigment Orange 1 (hereinafter, "c · I. Pigment Orange" is the same, only the number is recorded), 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46, 49, 51 55, 59, 61, 63, 64, 71, 73; cl·Pigment Violet 1 (hereinafter, “CI Pigment Violet” is the same, only the number is recorded), 19, 23, 29, 30, 32, 36, 37, 38, 39, 40, 50; 8 200817836 CI Pigment Red 1 (hereinafter, "c · I · Pigment Red" code), 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 17, 18 19, 21, 22, 23, 30, 3 1, 32, 42, 48: 1, 48: 2, 48: 3, 48: 4, 49 : 52:1, 53:1, 57, 57:1, 57: 2, 58: 63:1, 63:2, 64:1, 81:1, 83, 88, 102, 104, 105, 106, 108 , 112, 113, 144, 146, 149 > 150, 151, 155, 166 172, 174, 175, 176, 177, 178, 179, 188, 190 > 192 '193 ' 194 , 202 ' 206 215 , 216 , 217, 220, 223, 224, 226, 242, 243, 245 ' 254 ' 255 ' 264 ' 265 ; CI Pigment Blue 1 (hereinafter, "CI·Pigment Blue" code), 2, 1 5, 1 5 ·· 3,1 5 : 4,1 5 ·· 6,1 6, C · I · Pigment Green-7, C · I · Pigment Green · 3 6, C · I CI · Pigment Brown 23, CI Pigment Brown 25, C Pigment label 2 8 ; CI·Pigment black i, CI pigment black 7. In addition, at least two kinds of organic pigments are used in combination, and three or more organic pigments are used in combination to form a black color, and two or more organic pigments or three or more organic pigments are combined to absorb light. The wavelength range becomes broad and can shoot the same as 0, only the record numbers 12, 14, 15, 16, 37, 38, 40, 41, 1, 49 · 2, 50 · · 1, 2, 58: 4, 60 : 1, 90 : 卜 97, 101, 114, 122, 123, 168, 170, 171, 180, 185, 187, 207 - 208 > 209 > 227 ' 228 ' 240 , same, only record number 22 - 60 > 64 >66; . Pigment Green - 3 7 ; .I · Pigment Brown 2 6, C · I. The above organic pigment is more preferable. Moreover, it is better to add. By setting the color of the group to black, it is more difficult to prevent the light from colliding. 9 200817836 Among the preferred organic pigments, there are C.I. Pigment Blue 15:6, C.I. Pigment Red l77, c"·Pigment Yellow 139. In the present invention, it is preferable to use two or more of the three kinds of organic pigments in combination, and it is preferable to use all of the three types. (Inorganic Pigment) If the inorganic pigment is a light-shielding pigment, it is not limited and f' can be used, and specific examples thereof include carbon black, titanium black, copper, iron, manganese, chromium, nickel, and zinc. Metal oxides, composite oxides, metal sulfides, metal sulfates or metal carbonates, etc. of dance, and silver. (content of the pigment) The content of the pigment is preferably 10% by mass or more and 60% by mass or less, and more preferably 15% by mass or more and 40% by mass or less, based on the total solid content of the solvent. Further, the content of the pigment is adjusted such that the film thickness of the tenon formed by the salty Q resin composition of the present invention has an OD value of 〇 6 or more per 1 μm. When it is within the above range of 0 D values, it is possible to prevent light from being reflected from the convex block. [Pigment Dispersant (D)] The photosensitive resin composition of the present invention, in order to disperse the pigment in the "reactive resin composition", uses a dispersant having a polylactic acid bond to disperse the agent. S is a dispersing agent for the key, and the body is given by, for example, 10 200817836

Solsperse 24000, 37500, 39〇〇〇 (made by Avecia). By using a dispersing agent having a polyester bond, it is possible to suppress generation of residue on the electrode (particularly on the IT0 film) after development. The photosensitive resin composition of the present invention may be a positive photosensitive resin composition or a negative photosensitive resin composition. <<Positive type photosensitive resin composition>> When the photosensitive resin composition of the present invention is a positive photosensitive resin composition, in addition to the pigment (C) and the pigment dispersant (D), It also contains an alkali soluble resin and a sensitizer. The alkali-soluble resin may, for example, be a novolak resin. The novolak resin may, for example, be a mixed aldehyde in which furfural or formaldehyde and salicylaldehyde are added to phenols such as m-nonylphenol, p-nonylphenol, dinonylphenol, and tridecylphenol, in the acid touch. The obtained novolak resin and the like are produced in accordance with a usual method under the medium. The sensitizer may, for example, be a compound containing a phenylhydrazine diazide group. The phenylhydrazine diazide-containing compound may, for example, be naphthoquinone-1,2-diazide-4-sulfonium halide or naphthoquinone-1,2-diazide-5-sulfonium halide. And polyhydroxydiphenyl ketones such as 2,3,4-trihydroxydiphenyl ketone, 2,3,4,4'-tetrahydroxydiphenyl ketone, or bis(4-hydroxy-3,5 - Dinonylphenyl)-2-hydroxyphenyl decane, bis(4-hydroxy-2,5-dimethylphenyl)-2.hydroxyphenylnonane, bis(4-hydroxy-2,3 ,5· tridecylphenyl)-2.hydroxyphenyldecane, bis(4hydroxy-2,3,5-tridecylphenyl)-3.hydroxyphenyldecane, bis(4-hydroxy- 2,3,5-trimethylphenyl)-4-hydroxyphenylmethane, bis(4-hydroxy-2-indolyl-5-cyclohexylphenyl)-3,4-hydroxyphenyl 11

〇200817836 曱, bis(4-diyl-2-indenyl-5-cyclohexylphenyl)-4-| 1-[1-(4-hydroxyphenyl)isopropyl]-4-[l, L-Bis(3-hydroxy-3, etc., trisphenol, under triethylamine or triethanolamine, in a fully esterified or partially esterified organic solvent such as dioxane or T-butyrolactone <<Negative photosensitive resin composition>> The photosensitive resin composition of the present invention contains a photopolymerization and photopolymerization initiator in addition to the above organic pigment in the case of negative photosensitive light. (Β) <<Photopolymerizable compound (Α)>> The photopolymerizable compound has a double ethylenic unsaturated group. The compound having an ethylenically unsaturated double bond can be acid, methacrylic acid or the like. Butenedioic acid, monomethyl maleate, monoethyl fumarate, 2-hydroxyethyl 2-hydroxy enoate, ethylene glycol monomethyl ether acrylate ether methacrylate Ethylene glycol monoethyl ether acrylate ethyl ether decyl acrylate, glycerin acrylate, glycerin gas acrylamide, methacrylamide, acrylonitrile, mercaptopropyl methyl ester, Ethyl decyl acrylate, ethyl acrylate, isobutyl methacrylate, isobutyl methacrylate, 2-ethylhexyl acrylate acrylate, benzyl acrylate, methyl glycol diacrylate, The presence of ethylene glycol dimercapto acrylate i-phenyl decane, phenyl) ethyl aniline catalyst • condensation reaction, the composition of the resin composition (A), the bond compound is exemplified by propylene, Ethyl fumarate, mercaptopropyl, ethylene glycol monomethyl ester, ethylene glycol-7 acrylate, dilute nitrile, ethyl acetoacetate, ethyl 2-acetate, acrylic acid Benzyl ester, diethylene glycol dipropylene 12 200817836

Ethyl ester, triethylene glycol diacrylate, triethylene glycol dimercapto acrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, butanediol dimethacrylate, propylene glycol diacrylate, Propylene glycol dimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, tetramethylolpropane tetrapropionate, tetramethylolpropane tetradecyl acrylate, new Pentaerythritol triacrylate, pentaerythritol tridecyl acrylate, neopentyl alcohol tetraacrylate, neopentyl alcohol tetramethacrylate, dipentaerythritol pentaacrylic acid _, dipentaerythritol five Methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethylene acrylate, hydrazine, 6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, hydrazine a monomer or oligomer such as carboxy-epoXy diacrylate; a polyester prepolymer obtained by condensing a polyhydric alcohol with a unit acid or a polybasic acid and (mercapto)acrylic acid Polyester type (meth) acrylate; making polyol base with 2 After the reaction of the isocyanate group-containing compound, the poly(indenyl) urethane amide obtained by the reaction with (mercapto)acrylic acid; the bisphenol A epoxy resin, the bisphenol F epoxy resin, the bisphenol s type Epoxy resin, benzene or phenolic novolak type epoxy resin, resol type epoxy resin, triphenyl decene type epoxy resin, polycarboxylate polyglycidyl ester, polyol polyepoxy propylene vinegar Epoxy resin obtained by reacting an aliphatic or alicyclic epoxy resin wax, an amine epoxy resin, and a dihydroxybenzene type epoxy resin wax with (meth)propionic acid Base) acrylate resin and the like. Further, a resin obtained by reacting the above epoxy (methyl methacrylate) resin with a polybasic acid field may also be used. Since the propylene fluorenyl group or the methacryl fluorenyl group is introduced into these compounds, the crosslinking efficiency can be improved, and the light resistance and chemical resistance of the coating film are excellent. 13 Ο u 200817836 Further, the compound having the above ethylenically unsaturated double bond has a mass average molecular weight of 1, preferably yttrium or higher. When the mass molecular weight is 1,0 0 or more, the coating film thickness can be made uniform. Further, the average molecular weight is preferably 100 or less, and when the mass is on average less than 100,000, more excellent development performance can be obtained. A compound having ethylene and a double bond having a mass average molecular weight of 1,000 or more is referred to as a high molecular compound having an ethylenically unsaturated double bond. Further, it is preferred that the above-mentioned polymerizable monomer having an ethylenically unsaturated double bond is used in combination with a photopolymerizable monomer. Examples of the photopolymerizability include decyl acrylate, decyl methacrylate, ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxyglycol diacrylate, and ethylene glycol. Methacrylate, triglyceride, triethylene glycol dimethacrylate, tetraethylene glycol diglycolate dimethacrylate, propylene glycol diacrylate, propylene glycol acrylate, trimethylolpropane three Acrylate, trihydroxymethyl propyl acrylate, tetramethylolpropane tetraacrylate, tetramethylol methacrylate, neopentyl alcohol triacrylate, pentaerythritol trienoate, neopentyl Alcohol tetraacrylate, neopentyl alcohol tetradecyl propyl dipentaerythritol pentaacrylate, dipentaerythritol pentamethyl methacrylate pentaerythritol hexaacrylate, dipentaerythritol hexamethylene acrylate Hexanediol diacrylate, benzyl acrylate, benzyl methacrylic acid diacrylate, acrylic acid, and mercapto propylene are not limited by these. Among these photopolymerizable monomers, the average amount of the polymerizable monomers, the mass molecular weight in the present unsaturated compound, the monomer, the 2-di-propyl group, the dipropyl alcohol ester, the tetradecyl alkane trimethylpropane four Methyl propyl "ester, ester, di-, 1,6- _ acid ester, acid, etc., polyfunctional 14 200817836 photopolymerizable monomer is preferred. By combining the polymer compound having an ethylenically unsaturated double bond in this way The photopolymerizable monomer can improve the hardenability of the coating film and facilitate pattern formation. In the above, the photopolymerizable compound is a polymer which can be polymerized by itself, but in the present invention, it is light. The polymerizable compound also contains a mixture of a polymer binder and a photopolymerizable monomer. From the viewpoint of easy development, the polymer binder is preferably an alkali-developable binder.

C

Specific examples of the polymer binder include a carboxyl group-containing monomer such as acrylic acid or methacrylic acid, methyl propionate, methyl mercaptopropionate, ethyl propionate, and mercaptopropionic acid. Ethyl acetate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, methacrylic acid Butyl ester, benzyl acrylate, benzyl methacrylate, phenoxy acrylate, phenoxy methacrylate, isodecyl acrylate, isodecyl methacrylate, glycidyl methacrylate, styrene a copolymer of acrylamide, acrylonitrile, or the like; and a phenol novolac type epoxy acrylate polymer, a phenol novolak type epoxy methacrylate polymer, a nonoxyphenol phenol varnish type epoxy acrylate polymer, Resin such as cresol novolac type epoxy methacrylate polymer, bisphenol A epoxy acrylate polymer, and bisphenol S epoxy acrylate polymer. The content of the monomer component having a carboxyl group such as acrylic acid or mercaptoacrylic acid constituting the above resin is preferably in the range of 5 mol% or more and 40 mol% or less. The above-mentioned polymer binder preferably has a mass average molecular weight of 1,100 or less at 15 200817836. By setting the mass average molecular weight to 1, 〇〇〇 or more, the coating film thickness can be made uniform. Further, when the mass average molecular weight is 1,000,000 or less, more excellent developability can be obtained. When the photopolymerizable compound contains a polymer binder and a photopolymerizable monomer, the polymer binder is used in a total amount of the polymer binder, the photopolymerizable monomer, and the photopolymerizable initiator. It is preferable to mix 10 parts by mass in a range of 60 parts by mass or less. By applying or drying the photosensitive resin composition of the present invention, the film can be easily formed into a film, and the coating strength after curing can be sufficiently enhanced. Moreover, the developing property can be improved by setting the blending amount to 60 parts by mass or less. In addition, the photopolymerizable monomer is preferably blended in a range of 15 parts by mass or more and 50 parts by mass or less per 100 parts by mass of the total amount of the polymer binder, the photopolymerizable monomer, and the photopolymerization initiator. . By setting the compounding amount to 15 parts by mass or more, it is possible to prevent photohardening failure and to obtain sufficient heat resistance and chemical resistance. In addition, by setting the amount of the image to 50 parts by mass or less, the coating film formation performance can be improved. <<Photopolymerization Initiator (B)>> Examples of the photopolymerization initiator include, for example, 1-hydroxycyclohexylyl copper and 2-hydrazino-2-methyl-1. -Phenylpropanone-1 - Brewing I, 1-[4-(2-propionylethoxy)phenyl]-2-yl-yl-2-methyl-1-propan-1-yl, 1- (4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one , 2,2-dimethoxy-1,2-diphenylethane-1-one, bis(4-didecylaminophenyl)one, 2-methyl-1-[4-(曱Thio)phenyl]-2- 16 200817836

C

Morin (morphelino), propyl ketone-1-yl, 2, benzyl-2-didecylamino-1-(4-tylinylphenyl)-butan-1-lan, 1-[9-B 5-(2-methylphenylnonanoate)-9Η-oxazol-3-yl]-ethanone-1-(0-acetamidine), 2,4,6-trimethylphenylhydrazine Diphenylphosphine, 4-benzylidene-4'-methyldimethyl sulfide, 4-dimethylaminobenzoic acid, methyl 4-didecylaminobenzoate, 4-diindole Ethyl benzyl benzoate, butyl 4-didecylaminobenzoate, 4-dimethylamino-2-ethylhexyl benzoic acid, 4-dimethylamino-2-iso Aminobenzoic acid, benzyl-β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propanedione-2-(0-ethoxycarbonyl) hydrazine , methyl phthaloylbenzoate, 2,4-diethyl thioxanthene, 2-Chlorothioxanthone, 2,4-dimethylpyridone, 1-chloro- 4-propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-mercaptothioxanthene, 2-isopropylthioxanthene, 2-ethylhydrazine, Octamethylguanidine, 1,2-benzopyrene, 2,3-diphenylanthracene, azobisisobutyronitrile, benzammonium peroxide, cumene peroxide, 2-Hexylthiobenzimidazole, 2-hydrothiobenzoxazole, 2-hydrothiobenzothiazole, 2-(o-phenyl)-4,5-di(m-methoxyphenyl) - imidazolyl dimer, diphenyl ketone, 2-chlorodiphenyl ketone, p, p, bisdidecylaminodiphenyl ketone, 4,4'-bisdiethylaminodiphenyl hydrazine, 4,4, dichlorodiphenyl fluorene, 3,3-dimethyl-4-decyloxydiphenyl copper, benzoin, benzoin, benzoin decyl ether, benzoin ethyl ether, Benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-quinone Acetophenone, p-didecylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-butyl acetophenone, p-dimethylaminoacetophenone, p-butylene Trichloroacetophenone, p-tert-butyldichloroacetophenone, α,α-dichloro-4-phenoxyacetophenone, thioxanthone, 2- 17 200817836 mercaptothioxanthone, 2-iso Propyl thioxanthone, dibenzocycloheptanone, pentyl-4-dimethylaminobenzoate, 9-phenyl acridine, 1,7-bis(9-acridinyl)heptane, 1,5-double (9-acridine) Pentane, 1,3-bis(9-acridinyl)propane, p-methoxytriazine, 2,4,6-paraxyl (trichloroindenyl)-s-triad, methyl-4,6 - bis(trichloroindenyl)-s-triterpene, 2-[2-(5-methyl-anthran-2-yl)ethtyl]-4,6-bis(trichloromethyl)-s- Triterpenoid, 2-[2-(2:(Nan-2-yl)ethenyl]-4,6-bis(trichloromethyl)-s-dioxin, 2-[2-(4-diethyl) Amino-2-mercaptophenyl)ethenyl]-4,6-bis(trichloromethyl)-s-three tillage, 2-[2-(3,4-dimethoxyphenyl)ethene 4,6-bis(trichloromethyl)-s-tripper, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-tripper, 2 -(4-ethoxystyryl)-4,6-bis(trichloroindenyl)-s-tripper, 2-(4-?-butoxyphenyl)_4,6-bis(trichloro Methyl)_s_three tillage, 2,4_bis-trichloromethyl-6-(3-bromo-4-methoxy)phenyl-s-trisole, 2,4-bis-trichloroindenyl 6-(2-Bromo-4-methoxy)phenyl-s-tripper, 2,4-bis-trichloromethyl-6-(3-bromo-4-indolyl)styrylphenyl -3-triazine, and 2,4-bis-trichloromethyl-6-(2-bromo-4-methoxy)styrylphenyl-s-triterpene. These photopolymerization initiators may be used alone or in combination of two or more. The photopolymerization initiator is preferably contained in an amount of from 1 part by mass to 40 parts by mass per 100 parts by mass of the photopolymerizable compound and the photopolymerization initiator. [Other Components] The photosensitive resin composition of the present invention can be formulated with an additive as necessary. Specific examples thereof include a sensitizer, a hardening accelerator, a photocrosslinking agent, a photosensitizer, a dispersing agent, a dispersing aid, a filler, an adhesion promoter, an antioxidant, 18 200817836 ultraviolet absorber, an anti-agglomerating agent, Thermal polymerization inhibitors, antifoaming agents, and surfactants. Further, the photosensitive resin composition of the present invention may be added with a solvent for dilution. Ο

Here, examples of the solvent which can be added to the photosensitive resin composition include ethylene glycol monodecyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, and ethylene glycol. 1-n-butyl ether, diethylene glycol monodecyl ether, diethylene glycol monoethyl bond, diethylene glycol mono-propyl bond, diethylene glycol mono-n-butyl mystery, triethylene glycol monomethyl ether, triglyceride Alcohol monoethyl ether, propylene glycol monodecyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl bond, di- propylene glycol monodecyl ether, diethylene glycol monoethyl ether, a (poly)alkylene group of dipropylene glycol-n-propyl bond, di-n-propylglycol-n-butyl ether, tri-n-propylglycol monomethyl _, tri- propylene glycol monoethyl ether Alcohol monoalkyl ethers; ethylene glycol monodecyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate vinegar, (poly)alkylene glycol monoalkyl ether acetates such as propylene glycol monodecyl ether acetate, propylene glycol monoethyl ether acetate; diethylene glycol dimethyl ether, diethylene glycol decyl ethyl Ether, diethylene glycol Other ethers such as ethers and tetrahydrofurans; ketones such as mercaptoethyl ketone, cyclohexane, 2-heptanone and 3-heptanone; oxime 2-hydroxypropionate, ethyl 2-hydroxypropionate, etc. Alkyl lactate; ethyl 2-hydroxy-2-mercaptopropionate, decyl 3-methoxypropionate, ethyl 3-methoxyoxypropionate, decyl ethoxy propionate, Ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, decyl 2-hydroxy-3-mercaptobutyrate, 3·methoxybutyl acetate, 3-mercapto 3-methoxybutyl acetate, 3-mercapto-3-methoxybutylpropionate, ethyl acetate 19 200817836 ester, n-propyl acetate, isopropyl acetate, B &amp; n-butyl ester , isobutyl acetate, n-amyl formate, isoamyl acetate, propionic acid, t-butyl, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyrate, butyrate Other esters such as ester, ethyl pyruvate, n-propyl pyruvate, T-acetonitrile, ethyl acetate, 2-ethyloxybutyrate, etc.; @β荣μ-7, xylene Aromatic hydrocarbons; Ν-methylpyrrolidine _, hydrazine... bis-methyl methamine, and酿, Ν-dimercaptoacetamide and other amines... Solvents may be used alone or in combination of two or more kinds of oxime ϋ ϋ ϋ ϋ 一 ϋ 因为 因为 丙 一 一 一 & & & & & & & & & & & & & & & & & & & Ester, propylene glycol monomethyl vinegar acetate, U-resin, internal glycol monoethyl ether acetate, diethylene glycol dimethyl ether, di-glycinase, methyl ethyl surface, cyclohexanone, and 3 -Methoxy butyl acetate exhibits excellent solubility in photopolymerization of a 1:1 material and a photopolymerization initiator, and at the same time, the dispersibility of the insoluble component of the pigment τ can be improved. It is preferred to use didiol monomethyl ether acetate vinegar or 3-methoxybutyl acetate vinegar as a particularly preferred. The solvent may be used in a range of 5 parts by mass or more and 500 parts by mass or less based on 1 part by mass of the total amount of the photopolymerizable compound, the photopolymerization initiator, and the coloring agent. Further, when the liquid crystal alignment control bump is formed by using the photosensitive resin composition of the present invention, the photosensitive resin composition of the present invention is applied onto a glass substrate on which an electrode film such as a ruthenium film is formed, as will be described later. It is dried to form a film. The photosensitive resin composition of the present invention may contain a polymer binder as a binder in addition to the above components. The binder can be appropriately selected for the purpose of improving compatibility such as compatibility, film formability, developability, and adhesion. 20 200817836 <Method of Forming Bumps for Liquid Crystal Alignment Control> A method of forming a bump for liquid crystal alignment control of the present invention, a photosensitive resin composition of the present invention, a technician, a 'reverse roll coater, a bar coating thief, etc. A contactless coating device such as a transfer transfer coating, a M^ or a rotator (rotary coating device) n applicator is applied to the substrate. The substrate is not particularly limited. For example, glass plates, quartz plates, and through

Bright or translucent resin board, etc. Further, an electrode such as an ITO film is formed on the substrate by _ or the like. The method of drying the photosensitive resin composition after application to form a photosensitive resin is not particularly limited. For example, any of the following methods can be used. (1) On a hot plate, 8 (rc or more 12 〇) The following is preferably 9 (TC above 1 〇 (temperature below TC, method of drying 6 sec to 12 sec, (2) method of standing at room temperature for several hours to several days, (3) in warm air Place the heater or infrared heater for a few tenths to several hours to remove the solvent. Then 'make the negative or positive first cover in between, and irradiate the active energy rays such as ultraviolet rays and excimer laser light for partiality. The exposure energy ray is different depending on the composition of the photosensitive resin composition, and is preferably, for example, about 30 mJ/cm 2 to 2000 mJ/cm 2 . Then, the exposed photosensitive resin layer is imaged by a developing solution. The patterning method is not particularly limited, and for example, a dipping method, a spraying method, or the like can be used. The developing solution may be an organic substance such as ethanolamine, diethanolamine or triethanolamine, or hydrogen. Oxygen oxide, potassium hydroxide, 21 2 00817836 An aqueous solution of sodium carbonate, ammonia, or a 4-grade ammonium salt, and the use of tetraammonium hydroxide is particularly preferred in these developing solutions. A good pattern can be formed by using ruthenium tetra-ammonium oxide. Subsequently, at 200°. The pattern after development is post-baked in the vicinity of C. The liquid crystal alignment control bump having a predetermined shape can be formed by the above method. [Examples] [Synthesis Example 1] 506 parts by mass of benzyl methacrylate, 3 parts by mass of 2-hydroxyethyl methacrylate, and 78 parts by mass of glycidyl methacrylate, dissolved in 250 parts by mass of ethylene glycol monomethyl ether acetate, and added with 2 parts by mass of azo The mixture is heated and polymerized by adding 40 parts by mass of acrylic acid obtained by dissolving 2 parts by mass of methylhydroquinone as a polymerization inhibitor, followed by addition of 42 parts by mass of tetrahydrophthalic anhydride. The reaction was carried out to obtain a resin. The obtained resin had a mass average molecular weight of 3,000. (Example 1) 10 parts by mass of CI Pigment Red 177, 15 parts by mass of CI Pigment Blue 15:6, 10 parts by mass of CI Pigment Yellow 139, and 7 The mass fraction has a high score of polyester bond A dispersant (product name: Solsperse S24000, manufactured by Avecia Co., Ltd.) was dispersed in 3-methoxybutyl acetate to prepare a pigment dispersion liquid A having a solid concentration of 15% by mass. Next, 100 parts by mass was mixed. Novolac [m-cresol: p-cresol = 4: 22 200817836 6] (product name: Ml, SUMITOMO BAKELITE company), 25 parts by mass of sensitizer (product name: PA, manufactured by Honshu Chemical Industry Co., Ltd.), 50 A mass sensitizer (product name: MB25, manufactured by DAITO CHEMIX Co., Ltd.), and 5 parts by mass of the above pigment dispersion A were dissolved in propylene glycol monodecyl ether acetic acid (PGMEA) and adjusted to have a solid concentration of 20 A photosensitive resin composition was produced by mass%. (Example 2) 30 parts by mass of the resin synthesized in Synthesis Example 1, 20 parts by mass of dipentaerythritol hexaacrylate (DPΗA), and 10 parts by mass of 2-mercapto-2-dimethyl group as a polymerization initiator were used. Aminoamino-1-(4-teranylphenyl)-butadiene-1-yl (product name: IRGACURE 369, manufactured by CIBA SPECIALTY CHEMICALS), and 20 parts by mass of the above pigment dispersion A, dissolved in propylene glycol-A In the ether ether acetate (PGMEA), the photosensitive resin composition was produced by adjusting the solid content concentration to 2% by mass. (Example 3) 22 parts by mass of carbon black and 5 parts by mass of a polymer dispersant having a polyester bond (product name: Solsperse 24000, manufactured by Avecia Co., Ltd.) were dispersed in 73 parts by mass of 3-nonoxybutyl butylacetate. In the ester, a carbon black dispersion was obtained. 30 parts by mass of the resin synthesized in Synthesis Example 1, 20 parts by mass of dipentaerythritol hexaacrylate (DPHA), and 10 parts by mass of 2-mercapto-2-indenylamino-1- as a polymerization initiator were mixed. (4 - Taste ► Phenyl) - Ding Shao-1 - 嗣 (product name: IRGACURE 369, CIBA SPECIALTY CHEMICALS, Inc. 23, 2008 17836), and 20 mass of the aforementioned carbon black dispersion, dissolved in propylene glycol monomethyl sulphate In the ester (PGMEA), the photosensitive resin composition was prepared by adjusting the solid content concentration to 2% by mass. (Comparative Example 1) A dispersing agent was produced by a method similar to that of Example j using a polyamino phthalate-based dispersing agent (product name: BYK-164, manufactured by BYK Chemie Co., Ltd.). (Comparative Example 2) - A dispersing agent was produced by using a polyamino phthalate-based dispersing agent (product name: BYK-170, manufactured by BYK Chemie Co., Ltd.), and a photosensitive resin composition was produced by the same method as in Example 2. . [Method of Forming Projector for Liquid Crystal Alignment Control] A photosensitive resin composition was applied onto a glass substrate on which a bismuth tin oxide (ITO) film was formed, and dried at 901 for 2 minutes to form a photosensitive resin. Floor. Next, in Example 1 and Comparative Example, a positive-type photomask was passed through, and in Example 2 and Comparative Example 2, a negative-type photomask was passed through, and an ultraviolet ray of 50 mJ/cm 2 was selectively irradiated to carry out partiality. exposure. Subsequent development was carried out using an aqueous solution of tetraammonium hydroxide at 22 Torr.后 Post-baking the developed pattern to form a liquid crystal alignment control bump. (Evaluation) When the bumps were formed by using the photosensitive wax composition 24 200817836 of the above Examples 1 to 3 and Comparative Examples 1 and 2, the presence or absence of residue on the surface of the ITO film after development was confirmed by SEM photograph. Further, for the bumps formed as described above, an OD value of 1 μm per film thickness was evaluated. The OD value was measured using "Gretag Macbeth D-20 0-2" (trade name: manufactured by Macbeth Co., Ltd.). [Table 1] OD value of residue SEM: Photograph Example 1 No 0.60 Fig. 1 Example 2 No 0.65 Fig. 2 Example 3 No 1.25 - Comparative Example 1 There are 0.60 Fig. 3 Fig. 3 Comparative Example 2 There are 0.65 Fig. 4 Referring to Fig. 1 and Fig. 2, in the case of using the photosensitive resin compositions of Examples 1 and 2 having a dispersant of a polyester bond, no residue was generated. In contrast, referring to Figs. 3 and 4, it was found that the photosensitive resin compositions of Comparative Examples 1 and 2 having a dispersing agent having a polyurethane bond and having a polyurethane bond were ruined. From the above results, it was revealed that the photosensitive resin composition of the present invention can prevent generation of residue on the ITO film after development. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a SEM photograph of the surface on the ΙΤ0 film after development using the photosensitive composition of Example 1. Fig. 2 is a SEM photograph of the surface on the ΙΤ0 film after development using the photosensitive composition of Example 2. 25 200817836 Fig. 3 is a SEM photograph of the surface on the ITO film after development using the photosensitive composition of Comparative Example 1. Fig. 4 is a SEM photograph of the surface on the ITO film after development using the photosensitive composition of Comparative Example 2. [Main component symbol description] None 〇 ϋ 26

Claims (1)

200817836 X. Patent application scope: 1 · A photosensitive resin composition for forming a photosensitive resin composition for forming a bump (in a liquid crystal cell of a plurality of divided vertical alignment modes and for controlling alignment of liquid crystals) The pigment (C) and the pigment dispersant (D) having a polyester bond. The photosensitive resin composition according to claim 1, wherein the pigment (C) is an organic pigment. 3. The photosensitive resin composition according to claim 1, wherein the photopolymerizable compound (A) and the photopolymerization initiator (B) are contained. A liquid crystal alignment control bump formed by the photosensitive resin composition according to any one of claims 1 to 3. 5. The liquid crystal alignment control bump according to Item 4 of the patent application, wherein an OD value of a film thickness of 1 μm is 〇·6 or more. A photosensitive resin composition according to any one of claims 1 to 3, wherein a photosensitive resin layer is formed on a substrate on which an electrode is formed, by applying a photosensitive resin composition according to any one of claims 1 to 3. Further, after selectively exposing the photosensitive resin layer, alkali development is performed to form a bump on the photosensitive resin layer. 7. The method for forming a liquid crystal alignment control bump according to claim 6, wherein the developing solution used for the alkali development is tetramethylammonium hydroxide. 27 200817836 VII. Designated representative map: (1) The representative representative of the case is: Figure 1. (2) The representative symbol of the representative figure is a simple description: None 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: