200817260 九、發明說明： -【發明所屬之技術領域】 本發明係有關一種基板搬送 搬送半導體晶圓或平板面n 其，關一種用以 置。本申請用玻璃板之基板搬送裝 • 卞仏依據2006年月5日所申請之日立直士 特願2006-274360號主張優先權. 、 【先前技術】 （先私’亚在此援用其内容。 製：半導體裝置之工廠’及製造液晶襄置、咖、豇 =置寻之=板面板顯示器之4等所設置之基板搬送裝 曰门上 败微I衣置形成之搬送路徑來搬送半導妒 日日圓或玻璃板等之基板，而使用 、 ;Uh)’在薄膜形成裝置、蝕刻裝置、_置 4各種處理裳置與搬送路徑之間進行基板之交接。在如、上 2 =理裝ί中’基板一般係以收容在可收容複數張 土板之匣是之狀悲被搬送（參照專利文獻^)。 而近年來’伴隨液晶電視等之平板面板顯示器之大晝 面化等，基板亦大型化。因此，用以收容基板之匣： 大型化、重量化’而隨之產生搬送速度下降之結果，且招 致例如在製品庫存⑽rkinPrc)Cess)之增大等，而使有^ 率的搬送變得困難。 〆 因此，將基板一張一張地高速進行搬送之單片式 係受到矚目。 (專利文獻1)曰本特開平9 —58844號公報 【發明内容】 318984 5 200817260 :人處：二單片式搬送之基板係不限於依搬送順序搬 例如，在如上述所 < —& 疼理裝置時，由於夂步饰壯$ 牡微i硌仫併汉稷數個 時間不回&_、、/ 口免衣置_所進行之處理内容及處理 待時間二，、：：：：’因此當在預定之處理裝置中產生等 理束置J先丨，宜將之後搬送來之基板且欲搬入另-處 衣置者先予以搬送之情況。 上之^變更ί送而來之基板的順序、或未停止搬送路徑 Α而使等待搬人之基板待機，能抑制在搬送路徑上 之基板的搬送停止’且能提高基板處縣置之處理效率。 尤其，將基板進行單以搬送之情況，與藉㈣ 行搬送之情況相比較，由 凰 运之個體數增加，因此推測 基板之順序變更及待機之要求會進—步的提高。 其$目刚為止，將基板單片式搬送之搬送裝置中， =基板之搬送順序、或未停止搬送路徑上之流動而使等 待▲入之基板待機之技術係尚未被提案，㈣ 技術之提案。 〜 本發明係有鑑於上述問題點而研創者，其目的在提供 一種抑制在搬送路徑上之基板搬送停止，藉此可謀求處理 放率較高的基板處理裝置之基板搬送裝置。· [解決課題的手段] —為達成上述㈣，本發明具備··搬送部，係將基板進 订早片式搬送；以及緩衝部，係設置在藉由該搬送部形成 之搬送路徑之中途部位，並且將藉由上述搬送部所搬送之 上述基板暫時累積後予以搬出，上述緩衝部具備：基板厘 318984 6 200817260 :盒，係以多段之方式具備可將複數片上述基板以水平姿勢 .收納之收納部；以及基板搬出入部，係可存取任意之上述 收納部，並且於上述基板g盒與上述搬送部之間進行上述 基板之交接。 「各根據：有如上述特徵之本發明，具備有可存取於基板 彳〜收、、内"卩之基板搬出入部的缓衝部，係設置在基 反路徑之中途部位。因此，能將搬送於搬送路徑之基 H納在緩衝部之任意的收納部，且能在每一基板之 任思的時間點予以取出。 又’於本發明中，能採用上述 成，該手部係藉由 l備手权構 往祚H 1 /、丄乩暴扳之搬迗方向正交之方向之 述基㈣盒進行插人/拔出 搌廷上述基板之搬送滾輪。 /、有了 &又，於本發明中，能採用於上述緩衝部具備可將上述 基板以非接觸方式支持之支持部的構成。 將上述 逆路/又，於本發明’能採用複數個上述緩衝部相對上述搬 廷路#並聯連接之構成。 丨料上核 [發明效果] 緩衝部之任:搬路:之基板暫時收納* 予以取出。因而，可樹爭其匕在母一基板之任意的時間點 路徑上之流動而使等=基板之搬送順序，或未停止搬送 路徑上之基板之搬之基板待機，且可抑制在搬送 【實施方式】 318984 7 200817260 以下，參照圖式說明本發明基板搬送裝置之一實施步 態。此外，於以下之圖式，為了使各構件作為可辨二 小，而適當變更各構件之比例尺寸。 •第1圖係顯示具備本實施形態之基板搬送裝置丨與製 程裝置P1至P4之基板處理裝置s之概略構造的俯視圖: 如第1圖所示，基板處理裝置8係具備：搬送玻璃板 P之基板搬送裝置1;對玻璃板p進行預定處理之製程裝置 P1至P4;以及在基板搬送裝置1與製程裝置P1至Μ之間 進行玻璃板Ρ之交接之裝載器L1至L4。 第2圖係顯示基板處理裝f !之冑能構造的方塊圖。 如第2圖所示，基板處理裝置s係具備基板搬送裝置工、 製程裝置P1至P4以及與裝載器L1至L4電性連接之控制 部c。又，基板處理裝置s全體之動作係藉由控制部c加 以控制。 基板搬送裝置1係具備：輸送帶裝置2(搬送部），係 形成玻璃板p之搬送路徑；以及複數個（本實施形態4' 個）緩衝裝置3(緩衝部3A至3D)，係在搬送路徑之中途部 位隔I載益（基板交接部）4A至4D而相對於輸送帶裝置 2(搬送路徑）成並聯連接。 此處，參知、第3圖至第6圖詳細說明緩衝裝置3。 第3圖係顯示缓衝裝置3之要部的俯視圖。此外，第 4圖係緩衝裝置3之前視圖。如該等圖式所示，缓衝裝置3 係具備基板E盒31 ;具有搬送滾輪324及手仏⑽们部326 之搬送滾輪單元32 ;以及匣盒升降機構33。 318984 8 200817260 ， 二基板匣盒31係於基板搬送方向（第3圖之白色箭頭） •之前侧及後侧形成作為玻璃板P之搬入口 311a及搬出口 311b之箱形形狀，並在其内空部以上下方向多數形成有將 琴璃板p以水平姿勢搬出入及用以收納之架段3ιι(收納 部）。 ' 構成各架段之基板支持部312係由水平延伸於與基板 搬运方向正交之方向（亦即基板寬度方向）之例如金屬線等 所構成，且每一架段311於基板搬送方向隔著預定之間隔 配設有複數個（本實施形態為5個）基板支持部312。 藉由以上之構成，基板g盒31係將玻璃板p以基板支 持部312保持為水平姿勢，且形成為於上下方向可 納之形態。 又 基板E盒31係構成為能相對於被支持於上下方向之 固定位置之搬送滾輪324及握柄部326，進行升降之形態， 以便可將玻璃板P搬入基板匣盒31内之任意的架段，或^能 '將玻璃板P從基板匣盒31内之任意的架段搬出。因此，如 第5圖所示，匣盒升降機構33係構成為具備··托架μ】， 係用以支持基板匣盒31之底部331c;滾珠螺桿332，係藉 由伺服驅動使托架331上下運動；導軌333，係用以引導 托架331之上下運動；以及感測器，係使用於基板匣盒3ι 之上下方向之位置設定。此外，第5圖中，係省略搬送滾 輪單元32之圖式。 搬送滾輪單元32係具備一對基座321，該基座係與作 為搬送物之玻璃板P之寬度方向、換言之於與破璃基板之 318984 9 200817260 般方向正父之方向隔著間隔相對向配置，在各基座321 .係於基板搬送方向隔著間隔固定有複數個（本實施形態為 4個）輸送帶框架322。 :在輸送，框架322係透過軸承等軸支持具323而旋轉 自★地支锊搬送滾輪324，並且在此該等搬送滾輪324更 偏向與基板搬运方向正交之方向（基板之寬度方向）的中央 邛侧，知以平面看來呈長方形狀之板狀手部以令其長 度方向沿伸於與基板搬送方向正交之方向之方加以I 持。 ，搬达滾輪324係對於每一個輸送帶框架322於基板搬 送方向隔著間隔並設有複數個（本實施形態為6個）。手部 326係以-端支持之狀態被支持於輸送帶框架⑽，以使前 述手部326位於比該等搬送滾㉟324梢微低的位置。 、又，搬+送滾輪324及手部326往基板匣盒31内之插入 /拔出，係碏由使一體固定於各輸送帶框架322之基座 朝Jc平方向且與基板搬送方向正交之方向前進及後退之滾 輪往復動機構（省略圖示）來達成。 如第6圖所示，搬送滾輪似係具備：圓柱轴狀滚輪 本版324a，以及刀&外插於其前端部及基端部之基板搬送 部M4b與滾輪驅動齒輪325,來自驅動馬達（省略圖示）之 疋^驅動力#透過_滾輪驅動齒輪挪傳達至搬送滾輪 324。基板搬送力係藉由該搬送滾輪324旋轉時所產生之美 板搬送部難與玻璃板p之摩擦力而產生，因此基_ 部324b之材質係選定相對於玻璃板p可獲得預定之摩擦力 318984 10 200817260 者0 ' 此外’基板搬送部324b係並不限於如第δ圖所示^ m ，狀者，而為於軸方向隔著間隔配設之Q型環轉性圓 •如弟3圖及第6圖所示，在手部32β之内部係 面之,之複數個嗔出孔咖，及連通於該等. 现之長度方向（與基板搬送方向正交之方向）之大=面 長以寻_多數形成’並且沿該長度方向成！列 群係以複數列（本實施形態為5列）並列於上面纖之寬^ 方向（基板搬送方向）。 、又 盘、、，326之基端係透過搞合器等之連接手段連接有 與达氣鼓風機或壓縮機連接之管路。 有 供庫:使达!1政風扇運轉時，經過管路及輕合器而 ’、心 邛26之壓縮空氣係通過噴出孔327a朝上方喷 I™ 其板^ m(亦即以搬送滾輪324所支持之部分）更靠近 基板中央之部分Pe以非接觸的方式被支持。 耸、卓卜：亦可設成在複數個手部326之任-個設耦合器 其而八且在其他手部326透過延伸自搞合器之分配 s /刀，來自送氣鼓風機之壓縮空氣之形態。 接著，如以上構成之緩衝裝置3 搬入基板之任意的架段時之一順序 其中’基板ϋ盒31係位在最上升之位置，此外，搬送 318984 11 200817260 滚輪324及手部326係位在拔出基板昆盒31外之位置。 從該狀態起’首先’驅動£盒升降機構3 3而升降基板 E盒31以使欲搬入玻璃板p之架段（以下稱搬送預定段） 位在搬送滾輪324及手部326之前進移動目的地。此時， 對應搬人預定段之餘支持部312，係定位成比搬送滾輪 324稍低。 一繼之，驅動滚輪往復機構，使搬送滾輪324及手部326 前進以插入基板匣盒31内。 〃然後，自送氣鼓風機經過管路及輕合器將屋縮空氣送 氣至手部326時，該壓縮空氣係自開口於手部326上面 3·之噴出孔327a朝上方喷射。藉此，被搬入之玻璃板p ’、手邛326上面326A之間形成有空氣浮上層，被搬入之玻 增板P之中’比被搬送滾輪324所支持之下面兩側緣部200817260 IX. INSTRUCTIONS: - [Technical Field to Which the Invention Is Applicable] The present invention relates to a substrate for transporting and transporting a semiconductor wafer or a flat surface n. In the present application, the substrate is transported using a glass plate. 卞仏 According to the Japanese Patent Application No. 2006-274360 filed on the 5th of May, 2006, the priority is given. [Prior Art] (First privately, the content is used here. System: The factory of the semiconductor device and the manufacturing of the liquid crystal device, the coffee maker, the 豇 = the search = the panel display 4, etc., the substrate transporting the door, the transport path formed by the micro-I garment, and the semi-guided transport In the case of a substrate such as a Japanese yen or a glass plate, the substrate is transferred between the film forming apparatus, the etching apparatus, and the transfer path between the film forming apparatus, the etching apparatus, and the U.sub.4. In the case of the above, the substrate is generally transported in a state where it can be accommodated in a plurality of sheets (see Patent Document ^). In recent years, the number of substrates has increased as the size of flat panel displays such as liquid crystal televisions has increased. Therefore, in order to accommodate the substrate, the size of the substrate is increased, and the weight is reduced. As a result, the transport speed is lowered, and the product stock (10) rkinPrc) Cess) is increased, for example, and the transfer is difficult. . 〆 Therefore, the single-chip type in which the substrates are transported one by one at a high speed has attracted attention. (Patent Document 1) Japanese Patent Laid-Open Publication No. Hei 9-58844 [Summary of the Invention] 318984 5 200817260: Person: The substrate to be transported in a single chip is not limited to being carried in the order of transport, for example, as described above <&&;; In the case of a painful device, due to the squatting of the $$ 牡 微 硌仫 硌仫 硌仫 硌仫 硌仫 稷 稷 稷 稷 稷 稷 稷 稷 稷 稷 稷 稷 稷 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ : 'Therefore, when the predetermined processing device is used to generate the first beam, it is preferable to transfer the substrate afterwards and move it to another device to be transported first. In the order of the substrate, or the substrate is not stopped, the substrate waiting for the transfer is stopped, and the transfer stop of the substrate on the transfer path can be suppressed, and the processing efficiency of the substrate at the substrate can be improved. . In particular, when the substrate is transported in a single unit, the number of individuals to be transported increases as compared with the case of transport by the (four) line. Therefore, it is estimated that the order change of the substrate and the standby request are further improved. In the transfer device that transports the substrate in a single piece, the technology of the substrate transfer order or the flow of the substrate is not stopped, and the technology waiting for the substrate is not yet approved. (4) Technical proposal . The present invention has been made in view of the above problems, and an object of the invention is to provide a substrate transfer apparatus for a substrate processing apparatus having a high processing rate, which is capable of suppressing substrate transfer stop on a transport path. [Means for Solving the Problem] - In order to achieve the above (4), the present invention includes a transport unit that feeds a substrate in an early form, and a buffer portion that is provided in a middle of a transport path formed by the transport unit. And the substrate that has been transported by the transport unit is temporarily accumulated and then carried out, and the buffer unit includes a substrate 318984 6 200817260: a plurality of pieces of the substrate can be stored in a horizontal position. The storage unit and the substrate loading/unloading unit can access any of the storage units, and the substrate can be transferred between the substrate g and the transfer unit. According to the present invention as described above, the buffer portion having the substrate carrying-in/out portion that can be accessed to the substrate 收 收 收 收 收 收 收 收 收 收 收 收 收 收 收 收The base H that is transported to the transport path is accommodated in any of the accommodating portions of the buffer portion, and can be taken out at a time point of thinking of each of the substrates. In the present invention, the above-described method can be employed. l Prepare the right hand to the 祚H 1 /, the direction of the direction of the 迗 扳 之 正交 ( ( ( ( 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四 四In the present invention, the buffer unit may be configured to include a support portion that can support the substrate in a non-contact manner. The reverse path and the present invention can employ a plurality of the buffer portions relative to the moving road. #结构连接的组成。 The material is nucleated [invention effect] The buffer unit is: the moving: the substrate is temporarily stored* and taken out. Therefore, it can be used to circulate the flow at any point in the path of the mother substrate. And let the = substrate transfer order, or not The substrate on which the substrate on the transport path is stopped is in standby, and it is possible to suppress the implementation of one of the substrate transport apparatuses of the present invention by referring to the following description of the embodiment of the present invention: 318984 7 200817260. Further, in the following drawings, The size of each member is appropriately changed, and the scale of each member is appropriately changed. Fig. 1 is a plan view showing a schematic structure of a substrate processing apparatus s including the substrate transfer apparatus 本 and the process apparatuses P1 to P4 of the present embodiment: As shown in Fig. 1, the substrate processing apparatus 8 includes a substrate transfer apparatus 1 that transports a glass sheet P, processing apparatuses P1 to P4 that perform predetermined processing on the glass sheet p, and a substrate transfer apparatus 1 and a process apparatus P1 to Μ Loaders L1 to L4 for the transfer of the glass sheets are carried out. Fig. 2 is a block diagram showing the structure of the substrate processing apparatus. As shown in Fig. 2, the substrate processing apparatus s is provided with a substrate transfer apparatus. The process devices P1 to P4 and the control unit c electrically connected to the loaders L1 to L4. The operation of the entire substrate processing device s is controlled by the control unit c. The substrate transfer device 1 The conveyor belt device 2 (transporting unit) is a transport path for forming the glass sheet p, and a plurality of (fourth embodiment) buffer devices 3 (buffer portions 3A to 3D) are separated in the middle of the transport path. I carriers (substrate delivery units) 4A to 4D are connected in parallel to the conveyor device 2 (transport path). Here, the buffer device 3 will be described in detail with reference to Figs. 3 to 6 . A plan view of a main part of the cushioning device 3. Further, Fig. 4 is a front view of the cushioning device 3. As shown in the drawings, the cushioning device 3 is provided with a substrate E cassette 31; and has a transporting roller 324 and a handcuff (10). The transport roller unit 32 of the portion 326; and the cassette elevating mechanism 33. 318984 8 200817260 , the two substrate cassette 31 is in the substrate transport direction (the white arrow in Fig. 3) • The front side and the rear side are formed as the loading of the glass sheet P The box shape of the port 311a and the outlet 311b is formed in a frame section 3 ι (accommodating portion) for carrying in and out of the glass sheet p in a horizontal posture in the inner and outer portions. The substrate supporting portion 312 constituting each of the shelf segments is constituted by, for example, a metal wire extending horizontally in a direction orthogonal to the substrate conveying direction (that is, in the substrate width direction), and each shelf 311 is interposed in the substrate conveying direction. A plurality of (five in this embodiment) substrate supporting portions 312 are disposed at predetermined intervals. According to the above configuration, the substrate g cassette 31 holds the glass sheet p in a horizontal posture by the substrate supporting portion 312, and is formed in a form that is slidable in the vertical direction. Further, the substrate E cassette 31 is configured to be movable up and down with respect to the transport roller 324 and the grip portion 326 which are supported at a fixed position in the vertical direction, so that the glass sheet P can be carried into any of the racks in the substrate cassette 31. The segment, or ^ can 'take the glass sheet P out of any of the shelf segments in the substrate cassette 31. Therefore, as shown in Fig. 5, the cassette elevating mechanism 33 is configured to include a bracket μ for supporting the bottom portion 331c of the substrate cassette 31, and a ball screw 332 for driving the bracket 331. The upper and lower movements; the guide rail 333 is for guiding the upper and lower movements of the bracket 331; and the sensor is used for setting the position of the upper and lower sides of the substrate cassette 3 ι. Further, in Fig. 5, the drawing of the transport roller unit 32 is omitted. The transport roller unit 32 includes a pair of pedestals 321 which are arranged to face each other in the width direction of the glass sheet P as a transport object, in other words, in the direction of the positive direction of the glass substrate 318984 9 200817260 In each of the pedestals 321, a plurality of (four in the present embodiment) conveyor belt frames 322 are fixed at intervals in the substrate conveying direction. In the conveyance, the frame 322 is rotated by the support shaft 323 of the bearing and rotated by the support roller 324, and the transfer roller 324 is further biased in the direction orthogonal to the substrate conveyance direction (the width direction of the substrate). On the side of the crotch, it is known that the plate-like hand having a rectangular shape in plan view is held such that its longitudinal direction extends in a direction orthogonal to the direction in which the substrate is conveyed. The transport roller 324 is provided with a plurality of (in the present embodiment, six) intervals in the substrate transport direction for each of the transport belt frames 322. The hand 326 is supported by the conveyor belt frame (10) in a state of being supported by the end, so that the hand 326 is located slightly lower than the tip of the conveyance roller 35324. Further, the insertion/extraction of the loading/feeding roller 324 and the hand 326 into the substrate cassette 31 is performed by the base integrally fixed to each of the conveyor belt frames 322 in the direction of Jc and orthogonal to the substrate conveying direction. The roller reciprocating mechanism (not shown) that advances and retreats in the direction is achieved. As shown in Fig. 6, the transport roller is similarly provided with a cylindrical shaft-shaped roller guide plate 324a, and a blade transfer device M4b which is externally inserted into the front end portion and the base end portion, and a roller drive gear 325 from the drive motor ( The driving force # is omitted and transmitted to the conveying roller 324 through the _ roller driving gear. Since the substrate conveyance force is generated by the frictional force between the sheet conveying portion and the glass sheet p generated when the conveying roller 324 rotates, the material of the base portion 324b is selected to obtain a predetermined frictional force with respect to the glass sheet p 318984. 10 200817260 0' In addition, the substrate transfer unit 324b is not limited to the shape shown in the δ diagram, but is a Q-shaped ring that is disposed at intervals in the axial direction. As shown in Fig. 6, the plurality of cutout holes in the inner surface of the hand 32β are connected to the length direction of the current length direction (the direction orthogonal to the substrate transport direction). Find _ majority formation 'and become along this length! The column group is arranged in a plurality of columns (in this embodiment, five columns) in the width direction of the upper fiber (substrate transfer direction). Further, the base end of the disk, and 326 is connected to a pipe connected to the air blower or the compressor through a connection means such as a fitting device. There is a library: when the 1st political fan is running, the compressed air of the heart and the heart is passed through the pipe and the lighter, and the ITM is sprayed upward through the discharge hole 327a (ie, the transfer roller 324) The portion supported by the portion closer to the center of the substrate is supported in a non-contact manner. Shrub, Zhuobu: It can also be set up in a plurality of hand 326 - a coupler and eight and in the other hand 326 through the extension of the self-assembler s / knife, compressed air from the air blower form. Next, when the buffer device 3 configured as described above is loaded into any of the rack sections of the substrate, the order of the substrate cassette 31 is in the most raised position, and the transporting 318984 11 200817260 is carried out by the roller 324 and the hand 326. The position outside the substrate box 31 is taken out. From this state, the cassette elevating mechanism 3 is driven first to raise and lower the substrate E cassette 31 so that the frame to be carried into the glass sheet p (hereinafter referred to as a predetermined transport stage) is moved before the transport roller 324 and the hand 326. Ground. At this time, the support portion 312 corresponding to the transfer scheduled portion is positioned slightly lower than the transport roller 324. First, the roller reciprocating mechanism is driven to advance the transport roller 324 and the hand 326 to be inserted into the substrate cassette 31. Then, when the air blower blows the contracted air to the hand 326 through the pipe and the light combiner, the compressed air is ejected upward from the discharge hole 327a which is opened on the upper surface of the hand 326. Thereby, an air floating upper layer is formed between the glass plate p' carried in and the upper surface 326A of the handcuffs 326, and the lower side edges of the glass plate P that are carried in are supported by the lower side than the conveyed roller 324.
Pa、Pb更罪近基板中央之部分pc，即可透過該空氣浮上層 而以非接觸的方式被支持。 之後，驅動驅動馬達，將該旋轉驅動力透過滾輪驅動 =奶傳達至搬送滾輪324，使搬送滾輪似繞著其轴 如此f夕达至基板ϋ盒31之上流側之玻璃才反p，係藉 由搬送滾輪324對於玻璃板p之下面兩側緣部〜抑之接 觸，產生之摩擦力，而被賦予朝搬送方向前方之搬送力並 被搬入基板匣盒31内。 此時’玻璃板P之下面兩側緣部Pa、pb，係藉由對之 旋轉自如地接觸之搬送滾輪324而由下方直接予以支持。 318984 12 200817260 .相對於此，比搬送滾輪324與下面兩側緣部pa、扑 .之接觸部分更靠近基板中央之部分卜，係藉由將供應至手 部326之壓縮空氣從噴出子匕327a+以喷射，而隔著形成在 搬送滾輪3 2 4之頂部與設在比其稍低位置之手部3 2 6之上 面326A之間的段差所產生之間隙裡的空氣浮上層而以非 接觸的方式被支持。 當玻璃板p完全搬入基板g盒31時，驅動厘盒升降機 構33以使基板昆盒31上升，將業已被搬入之玻璃板？放 置至基板E盒31之基板支持部312，並且遮斷自送氣鼓風 機至手部326之送氣。 上然後，在玻璃板P自搬送滾輪3 2 4分離時，（亦即將玻 璃板P完全放置至基板支持部3i2時）驅動滾輪往復動機 構，使搬送滾輪324及手部326後退以自基板£盒31拔 出。以上為搬入動作之一例。 板 接著’說明將儲存在基板£盒31内之任意架段的玻璃 予以搬出時之順序。 首先，驅動E盒升降機構33而升降基板£盒31，以 使儲存有預定搬出之玻璃板p之架段（以下稱搬出預定 位在搬送滾輪324及手部326之前進移動目的地。此時， 對應於搬㈣定段之基板支持部312係定位成比搬送滾輪 接著，驅動滾輪往復動機構，使搬送滾輪似及 326前進以插入基板£盒31内後，開始送氣，並驅動厘: 升降機構33以使基板£盒31下降，而將預定搬出之破$ 318984 13 200817260 •板=下面兩側緣部Pa、P}^置至搬送滾輪似。 ‘手部:二:鼓風機經過管路及•合器而將I縮空氣送氣至Pa and Pb are more sinful to the part of the pc near the center of the substrate, and can be supported in a non-contact manner by floating the upper layer of the air. After that, the driving motor is driven to transmit the rotational driving force to the conveying roller 324 through the roller driving=milk, so that the conveying roller seems to be wound around the axis of the substrate, so that the glass on the upstream side of the substrate cassette 31 is reversed. The conveyance roller 324 is brought into the substrate cassette 31 by the frictional force generated by the contact between the lower side edges of the glass sheet p and the contact force in the forward direction. At this time, the lower side edges Pa and pb of the glass plate P are directly supported by the lower side by the transfer rollers 324 which are rotatably contacted. 318984 12 200817260. In contrast, the portion closer to the center of the substrate than the portion of the transfer roller 324 and the lower side edge portions pa and the bottom portion of the substrate is made by ejecting the compressed air supplied to the hand 326 from the ejection port 327a+ By spraying, the air is superposed in the gap formed by the step formed between the top of the conveying roller 3 24 and the upper surface 326A of the hand 3 26 which is disposed at a slightly lower position. The way is supported. When the glass sheet p is completely loaded into the substrate g cassette 31, the PCT box lift mechanism 33 is driven to raise the substrate pack 31 to the glass sheet which has been loaded. The substrate support portion 312 of the substrate E cassette 31 is placed, and the air supply from the air supply blower to the hand 326 is blocked. Then, when the glass sheet P is separated from the transport roller 3 2 4 (that is, when the glass sheet P is completely placed to the substrate supporting portion 3i2), the roller reciprocating mechanism is driven to retract the transport roller 324 and the hand 326 from the substrate. The box 31 is pulled out. The above is an example of the loading operation. The board next 'describes the order in which the glass of any of the shelves stored in the substrate cassette 31 is carried out. First, the E-box elevating mechanism 33 is driven to elevate and lower the substrate cassette 31 so that the rack portion in which the glass sheet p to be carried out is stored (hereinafter referred to as the carry-out pre-positioning position before the transport roller 324 and the hand 326 are moved to the destination. The substrate supporting portion 312 corresponding to the moving (fourth) segment is positioned closer to the conveying roller, and the roller reciprocating mechanism is driven to advance the conveying roller and the 326 to be inserted into the substrate 31, and then the air supply is started, and the driving is performed: The mechanism 33 causes the substrate to be lowered, and the predetermined unloading is broken by $318984 13 200817260. The plate = the lower side edges Pa, P} are placed on the conveying roller. 'Hand: 2: The blower passes through the pipeline and • Combine the air to the air
夕一 ^ °亥晷鈿空氣係自開口於手部326上面326A 之贺出孔327a朝上方嗆射。茲μ 板Ρ盘手邱32fi少 由於在預定搬出之玻璃 被去;= 上面326A之間形成空氣浮上層，因此比 被支^寸在搬送滾輪q 9 ^ ώ 中都、D 24的下面兩侧緣部h、Pb更靠近基板 ,N C係透過该空氣浮上層以非接觸的方式被支 持在手部326 ^ 日士键之六後/驅動驅動馬達而使搬送滾輪324繞著其軸旋轉 二储:在基板£盒31内之預定搬出玻璃板p便藉由搬送 =324對於玻璃板p之下面兩側緣部之接觸所產 至令摩擦力’而被職予朝搬送方向前方之搬送力並被搬出 土板f盒31外。此時，玻璃板p之下面兩侧緣部 係错由滾動於該緣部而接觸之搬送滾輪跑而自下方 ΐίΐ持’而比搬送滾輪與下面兩側緣部Pa、Pb之接觸部 '、罪近基板中央之部分Pc，係藉由將供應至手部326之 ，縮空氣利用喷出孔㈣加以喷射，而透過空氣浮上層以 非接觸的方式被支持。 曰 士當玻璃板P完全搬出至基板£盒31外時，遮斷自送氣 ^風機往手部326之送氣，並且驅動滾輪往復動機構，使 般运滾輪324及手部326後退以自基板g盒 上 為搬出動作之一例。 扱出以上 根據如上述之緩衝裝置3，，以能夠將搬送滾輪犯4 及手部326拔出/插入欲搬出入玻璃板p之架段之方式，使 318984 14 200817260 用升降機構33對合基板厘盒31與搬送滾輪似之高度仅 置後，將搬送滾輪324往基板匣盒31之外内以水平方向拔 出/插入’藉此，即使不使用多關節機器人，亦能相對於基 板收納節距較㈣基板g盒將玻璃板p任意地搬出入。土 .亚且’該搬出入中，係始終以手部326使玻璃板^之 靠近基板中央之部分Pc藉空氣浮上而以非接觸的方式予 以支持，因此對於玻璃板P之接觸係形成為僅限於插人有 搬达滾輪324的下面兩侧緣部Pa、pb。再者，玻璃板？並 非僅藉由搬送滾輪324予以支持，尚藉由比其更長的手部 326以非接觸的方式予以支持，因此亦能極力縮短直接接 觸於玻璃板p之搬送滾輪324之長度。 如上述所示，於本實施形態中，藉由g盒升降機構 33、搬送滾輪324及手冑326，可將玻璃板p收納於任音 之架段且可存取，並亦可於基㈣盒31與輸送帶裝置2 ^透過裝載器鄕至41))將玻璃板？進行交接。亦即， 猎由E盒升降機構33、搬送滾輪324及手部犯 發明之基板搬出入部。 又’手部326係亦具有可作為以非接觸之方式支持玻 璃板P之支持部的功能。 …：到第1圖’製程裝置P1 iP4係為洗淨裝置、薄膜 形成裝置、㈣裝置及試驗裝置等各種處理裝置。 各製程裝置P1至P4係各在同一高产呈右 、 回度具有將處理前之玻璃 板P抵I入之基板搬入口，與將虛 /、肝慝理後之玻璃板P搬出之基 板搬出口。又，各製程裝置P1 厂1主之基板搬入口及基板 318984 15 200817260 :搬出口係透過裝載器U至u命认、， 料，各基板搬入口*其：：：帶裝置2相連接。 可，為不同亦可。不為同二;板;=部為同-高度亦 由未圖示之升降機構為而升降之槎:扣#1至L4則為可藉 入口及基板搬出口與輸送帶、藉此迠在各基板搬 ，…基板搬入口與基= 係因應各高度而將輸送帶裝置於複數為同—時， 置，藉此亦能提高搬送效率。此日士又方向錯開設 下侧輪送帶裝置之間設置可交在f側輸送帶裝置與 可。 接玻璃板p之升降輸送帶亦 板搬=之if:裝置Pi至P4設置兼具基板搬入口盘美 為王㈣一南度亦可，不為同—亦可。 以口 具有如上述構成之基板處理裝置s中，梠。 置P1至P4之要求及預先自外部取得之破=衣私叙 ;?即判斷是否將緩衝裝置3之上流側搬送而：= 卞=收納在任一緩衝裝置3A至3D之任一的架段3 根據该判斷將破璃板p收納在緩衝裝置3 。， 璃板p搬出’並自基板搬入口透過裝载器L1 =預定之製程装置…。此外，於各製程裝置二 至ϊ4ί理後之玻璃板p，係自基板搬出口透過裝載器L1 乂接至輸送帶裝置2後，予以搬送至外部。 根據如上述本實施形態之基板搬送裳置1，能將搬送 318984 16 200817260 :=置2之玻璃板P，暫時收納在緩衝裝置3之任 •又能將每一玻璃板？在任意的時點 衣置Π至P4所要求之時點）取出。因而，可變 = 順序，或不停一徑上之流動而使等:二p 止璃板P待機，而可抑制在搬送路徑上之破璃板p搬送停 又，根據本發明之基板搬送裝置1，複數個緩衝穿 相對於輸送帶裝置2而並列連接。闵μ 、置3 之.………/ 例如因應所搬入 衣饪衣置Ρ1至Ρ4的種類來分配玻璃板ρ等能 的進行玻璃板Ρ之搬送。此外，# 早十 可暫時堆積更多之玻璃板，= 之玻璃板ρ搬送停止。 且了更抑^在搬送路徑上 f置二:雖一面參照圖式一面說明了本發明之基板搬送 衣直之較佳的實施形態，但本發明當然並未限定於上述· =二於上述實施形態所示之各構成構件之諸形狀及二 求等可為夂錄〜 月主曰之耗圍而根據設計要 厂 ^ /^v 矛蕾 '^2 ° 且右於上述實施形態中，說明了手部挪係構成為 “有作為可將玻璃板P非接觸地支持的支持部之功能。然 而’本發明係並未限定於此，例如，如第 ^各㈣U之基板支持部312構成為板狀，自= :反支才寸4 312之嘴出孔327a喷射壓縮空氣之構成亦 °。如上述之情況，係變成基板支持部312係作為可將玻 肖反P非接觸地支持的支持部而作用。此外，如上述之情 318984 17 200817260 ‘況，如弟7圖所示，未設置手部326 •定在輸送帶框架亦可。 板迗滾輪324固 .又，上述實施形態中，說明了使用破 例。铁而，太恭日Η及"扳作為基板之 體晶圓二2。係亚非限定於此者， 為二之緩衝裝置3數量係並非限定為4個，而 為1至3或4個以上亦可。 _ [產業上之可利用性] 根據本發明，將基板單片式搬送之基板搬晉 可變更基板之搬送順序，或未停止搬送路徑上之;動而伟 之基，。結果，可抑制在搬送路徑= 搬达停止，且提高基板處理裝置之處理效去。 土板 【圖式簡單說明】 卞 之顯示具備本發明一實施形態之基板 置 之基板處理裝置之概略構造的俯視圖。 、衣置 之美Llf1示具備本發明—實施形態之基板搬送裝置 之基板處理i置之功能構造的方塊圖。 衣置 第3圖係顯示缓衝裝置之要部的俯視圖。 第4圖係緩衝裝置之前視圖。 第5圖係緩衝裝置之側視圖。 第6圖係搬送滾輪之要部放大剖視圖。 第7圖係顯示緩衝裝置之變形例的俯視圖。 【主要元件符號說明】 i基板搬运裊置 2 I送帶裝置(輸送部） 318984 18 200817260 :3(3A至3D) 緩衝裝置（緩衝部） 4(4A至4D) 滾輪（基板交接部） 31 基板匣盒 32 搬送滾輪單元 33 匣盒升降機構 311 架段（收納部） 311a 搬入口 311b 搬出口 311c 底部 312 基板支持部 321 基座 322 輸送帶框架 323 轴支持具 324 搬送滾輪 324 a 滚輪本體 324b 基板搬送部 325 滾輪驅動齒輪 326 手部 326A 握部之上面 327a 喷出孑L 327b 空氣通路 331 托架 332 滾珠螺桿 333 導軌 C 控制部 L1至 L4 裝載器 P 玻璃板 Pa、Pb 下面兩侧緣 Pc 靠近基板中央之部分 PI至 P4 製程裝置 S 基板處理裝置 19 318984On the other hand, the air system is opened upward from the opening 327a of the 326A above the hand 326. Μμ Ρ Ρ 邱 邱 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 32 The edge portions h and Pb are closer to the substrate, and the NC system is supported in the non-contact manner by the air floating upper layer in the hand 326 ^ sigma key 6 / drive drive motor to rotate the transfer roller 324 around its axis : The predetermined carrying-out of the glass sheet p in the substrate cassette 31 is carried out by the conveyance=324 to the frictional force of the contact between the lower side edges of the glass sheet p, and is transferred to the front side in the transport direction. It is moved out of the soil board f box 31. At this time, the lower edge portions of the lower surface of the glass sheet p are erroneously moved by the transport roller that is rolled in contact with the edge portion, and are contacted from below by the contact portion of the transport roller and the lower side edge portions Pa and Pb. The portion Pc near the center of the substrate is injected by the ejection hole (4) by the supply to the hand 326, and is supported in a non-contact manner by the air floating upper layer. When the glass plate P is completely carried out to the outside of the substrate 31, the gentleman intercepts the air supply from the air supply fan to the hand 326, and drives the roller to reciprocate the mechanism, so that the normal roller 324 and the hand 326 are retracted from the substrate g. The box is an example of a carry-out action. According to the buffer device 3 as described above, the transfer roller 4 and the hand 326 can be pulled out/inserted into the frame to be carried out into the glass sheet p, and the 318984 14 200817260 is used to align the substrate with the lifting mechanism 33. The height of the PCT box 31 and the transport roller are only rearward, and the transport roller 324 is pulled out/inserted in the horizontal direction outside the substrate cassette 31, thereby allowing the section to be accommodated with respect to the substrate even without using a multi-joint robot. The glass plate p is arbitrarily carried out from the (four) substrate g box. In the case of the loading and unloading, the portion Pc of the glass plate near the center of the substrate is always supported by the hand 326 by air floating, so that the contact system for the glass plate P is formed only. It is limited to the insertion of the lower side edges Pa and pb of the roller 324. Furthermore, the glass plate? Not only is it supported by the transport roller 324, but it is supported in a non-contact manner by the longer hand 326, so that the length of the transport roller 324 directly contacting the glass plate p can be minimized. As described above, in the present embodiment, the glass plate p can be stored in the frame of the sound and can be accessed by the g-box elevating mechanism 33, the transport roller 324, and the handcuff 326, and can also be used in the base (four). Box 31 and conveyor belt 2^ through the loader 鄕 to 41)) to the glass plate? Hand over. In other words, the E-box elevating mechanism 33, the transport roller 324, and the hand-in-hand substrate are moved in and out. Further, the hand 326 has a function as a support portion for supporting the glass sheet P in a non-contact manner. ...: to Fig. 1 'Processing device P1 iP4 is a various processing device such as a cleaning device, a film forming device, a (four) device, and a test device. Each of the processing apparatuses P1 to P4 has a substrate with the same high yield and a right side, and has a substrate carrying inlet for the glass sheet P before the processing, and a substrate carrying port for removing the glass sheet P after the virtual/hepatic treatment. . In addition, the substrate transfer port and the substrate of the main processing device P1 factory 1 are 318984 15 200817260 : the transfer port passes through the loaders U to u, and the materials are transferred to the respective substrates. *:: The tape devices 2 are connected. Yes, it can be different. It is not the same as the second; the board; the part is the same-height and is also raised and lowered by the lifting mechanism not shown: the buckles #1 to L4 are the inlets and the substrate carrying outlets and the conveyor belts, The substrate transfer, ... the substrate transfer inlet and the base = the conveyor belts are placed at the same time for each height, thereby improving the transport efficiency. This Japanese priest is also set in the wrong direction. The lower side belt conveyor is provided between the belt conveyors on the f side. The lifting conveyor belt connected to the glass plate p is also loaded = if: the device Pi to P4 is set to have both the substrate and the entrance plate. It is king (four) one can also be south, not the same - can also be. The mouth has the substrate processing apparatus s having the above configuration, and is used. The requirements of P1 to P4 and the pre-existing breaks are obtained from the outside; that is, whether or not the flow side of the buffer device 3 is transported: = 卞 = the rack section 3 accommodated in any of the buffer devices 3A to 3D According to this judgment, the glass frit p is accommodated in the shock absorber 3. The glass plate p is carried out and passes through the loader L1 from the substrate transfer inlet = a predetermined process device. Further, the glass sheet p after the processing of each of the processing apparatuses is transferred from the substrate carrying port to the conveyor device 2 through the loader L1, and then conveyed to the outside. According to the substrate transfer skirt 1 of the above-described embodiment, the glass plate P for transporting 318984 16 200817260 := can be temporarily stored in the buffer device 3 and each glass plate can be placed. At any point in time, the clothes are placed at the point required by P4). Therefore, the variable=order, or the flow of the non-stop path, and the like: the two p glass plate P is in standby, and the glass plate p on the transport path can be prevented from being transported and stopped. The substrate transfer device according to the present invention 1. A plurality of buffers are connected in parallel with respect to the conveyor device 2.闵μ 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 In addition, #早十 can temporarily stack more glass plates, = glass plate ρ transport stops. Further, the second embodiment of the present invention is described with reference to the drawings. However, the present invention is not limited to the above embodiment. The shapes and the two dimensions of each of the constituent members shown may be the consumption of the 〜 〜 月 月 月 而 而 根据 根据 根据 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ The system is configured to have a function as a support portion that can support the glass plate P in a non-contact manner. However, the present invention is not limited thereto, and for example, the substrate support portion 312 of the fourth (four) U is configured in a plate shape. , from : = : : : : : : : : : : : , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , In addition, as described above, 318984 17 200817260 'conditions, as shown in Figure 7, the hand 326 is not provided. • It is also fixed in the conveyor belt frame. The slab roller 324 is fixed. In the above embodiment, the description is made. Use an exception. Iron, too respectful and " The body of the wafer is not limited to this, and the number of the buffer devices 3 is not limited to four, but may be one to three or four or more. _ [Industrial availability] According to the present invention, the substrate transported by the substrate can be changed to change the substrate transfer order, or the transfer path is not stopped; the result is that the transport path = the stop is stopped, and Improvement of the processing efficiency of the substrate processing apparatus. [Embodiment of the drawings] A plan view showing a schematic structure of a substrate processing apparatus provided with a substrate according to an embodiment of the present invention is shown in the drawings. Fig. 3 is a plan view showing the main part of the cushioning device. Fig. 4 is a front view of the cushioning device. Fig. 5 is a side of the cushioning device. Fig. 6 is an enlarged cross-sectional view of a main part of the transport roller. Fig. 7 is a plan view showing a modified example of the buffer device. [Description of main components] i-substrate transport device 2 I-feed device (transport unit) 3189 84 18 200817260 : 3 (3A to 3D) Buffer device (buffer unit) 4 (4A to 4D) Roller (substrate delivery unit) 31 Substrate cassette 32 Transfer roller unit 33 Cassette lifting mechanism 311 Rack (storage unit) 311a Port 311b Outlet 311c Bottom 312 Substrate Support Section 321 Base 322 Conveyor Belt Frame 323 Shaft Support 324 Transfer Roller 324 a Roller Body 324b Substrate Transfer Section 325 Roller Drive Gear 326 Hand 326A Upper Part 327a of the Grip 孑L 327b Air passage 331 Bracket 332 Ball screw 333 Guide rail C Controls L1 to L4 Loader P Glass plate Pa, Pb Lower side edge Pc Close to the center of the substrate PI to P4 Process unit S Substrate processing unit 19 318984