TW200816294A - Apparatus for fluid treatment - Google Patents

Abstract

A non-contact support apparatus for fluid treatment of a stationary or traveling object while supporting the object without contact by fluid-cushion induced forces. The apparatus comprises: one or two substantially opposite non-contact platforms having support surfaces, each support surface comprising at least one of a plurality of basic cells each cell having a plurality of pressure outlets and a plurality of fluid-evacuation channels. Each of the pressure outlets is fluidically connected through a flow restrictor to a high-pressure fluid supply, the pressure outlets providing pressurized fluid for generating pressure induced forces, maintaining a fluid-cushion between the object and the support surface of the platform. The flow restrictor characteristically exhibits fluidic return spring behavior. Each of said at least one of a plurality of fluid-evacuation channels have an inlet and outlet, for locally balancing mass flow for said at least one of a plurality of basic cells. At least one or more zones of the platform support surface are designated as treatment zones linked to a fluid reservoir providing treatment fluid necessary for treating the object through pressure outlets and evacuating fluid through the fluid evacuation channels.

Description

200816294 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to fluid processing of objects, particularly flat substrates. The fluid treatment includes, for example, but not limited to, such wet and dry cleaning, water washing, drying, chemical etching and planarization, coating, sterilization, and other fluid treatments. Although the application of the large system described below with respect to the field of flat objects such as a TFT or LCD-based Shi Xi wafer, a flat panel display (ρρρ), and a computer hard disk, a compact disc (CD) 'DVD and the like, the present invention It can also be used to process non-flat objects, and in fact can handle objects of various shapes and sizes. "Fluid" in the context of the present invention includes liquids, gases, gels or combinations thereof, including two-phase streams (such as liquids having small particles). More specifically, the present invention relates to a device for fluid processing. [Previous Technology] In the process of manufacturing silicon wafers, flat panel displays (FPDs), and computer hard disks, compact discs (CDs), DVDs, and the like, some fluid processes are involved. In particular, a 'manufacturing process Involving wet cleaning and chemical treatment. Recently, great attention has been paid to the choice of using non-contact devices to support, clamp or transport products in the manufacturing process. In particular, such non-contact devices have a high impact on the production of extremely easy to direct contact. The technology industry has a unique appeal. This is especially important in the semiconductor industry during the manufacturing stages of germanium wafers and flat panel displays (FPD) and similar products. Non-contact devices can also be advantageously used in the manufacturing phase of optical devices and In the field of printing. By using non-contact devices, many of the 115485.doc 200816294 gates associated with the manufacturing phase can be solved and directly Production yield. Some advantages of using a non-contact system without derogation in general include: (a) Eliminating or greatly reducing mechanical damage, including, for example, collisions, squeezing 'but most importantly can lead to Any friction that stretches. (b) / removes or greatly reduces contact contamination, a very important feature of semiconductor wafers for germanium wafers and FPDs. (C) Eliminates or greatly reduces electrostatic discharge (ESD). Serious ESD problems are found in semiconductor production lines for FPD and germanium wafers. (d) When non-contact devices are used, the non-flatness of local properties found in contact devices is essentially balanced. Additional benefits of the device: (e) Transporting the product by moving only the product, thus avoiding the need to also move the holding station, which may be much heavier than the product itself, which is typically found in the FpD market and the semiconductor industry as well as in the printing field. (f) Accurately transport the product, where accuracy can be provided only at a small unique area or along a narrow line (where the product travels or is point-to-point) The process is performed continuously. This is relevant in the stepper widely used in the semiconductor and FpD industries, where the manufacturing of the FPD is performed when a wafer is rotated during inspection or when linear motion is applied in one direction. Highly accurate planar (χ, γ) motion is required in the line. (g) Flattening objects that are not flat by pure moments without contact so that the surface of the object and the processing tool (such as the optical head) Provide an accurate distance between the dry cleaning head or the slit coating nozzle (for example, when focusing the optical instrument on the surface of the object). This must be provided for the 115485.doc 200816294 standard or thin wafer to provide Accuracy and/or uniformity of the spoon FPD and the semiconductor industry are important. This is also important in the field of printing that involves direct digital writing on different media. In most of these examples, the focal length involved must be very accurate optical or optical imaging. Throughout, systems involving non-contact processing include a platform having one (or more) effective surfaces (flat in most cases) that create a mucus cushion to support the object. Such a platform is provided with a plurality of holes for providing a pressurized fluid to maintain the fluid cushion. A fluid cushion is formed when a flat surface is placed over the effective surface of the platform at a close distance in most cases. The fluid cushion support can be preloaded by the weight of the object, by pressure (again configuration) or by vacuum. In light weight conditions (as in many of the above products), high performance fluid cushion supports pressure or vacuum preloading methods to provide stability, accuracy and uniformity in many situations. Many of the fluid cushion-based non-contact support and transport platforms currently in use provide limited performance in many aspects. These limited performance profiles are primarily related to relatively high mass flow or energy consumption (associated with the system), high risk heterogeneity including local contact (because it is not locally balanced), and accuracy performance (with fluids) The aerodynamic rigidity and flattening ability of the cushion are directly related to). The non-contact support and transport technology associated with the present invention implements various types of fluid cushions using a plurality of flow restrictors (used as "fluid recovery cartridges,") and is extremely low relative to conventional non-contact devices. Mass flow consumption provides efficient high-performance fluid cushion support. H5485.doc 200816294 当 ' When using a non-contact platform where the effective area is much larger than the opposite surface of the supported object and most of the platform's effective area is not covered The use of a flow restrictor provides an efficient and cost effective non-contact platform in terms of performance compared to mass flow consumption. For the purposes of the present invention, the flow restrictor is individually mounted to the pressurized fluid in the active area of the non-contact platform ( Air, other gases or fluids are fed into each of the conduits. The active area in this specification means the area of the support surface where the feed enthalpy is distributed. For the purposes of the present invention, an adaptive segmented aperture (SAS〇) is preferred. The spray is used as a more in-flow limiter to effectively generate a fluid return spring effect. Figure 17 illustrates a typical SASO flow limiter. The crucible device has a basic two-dimensional configuration comprising a conduit having an inlet 2 and an outlet 3 having a plurality of fins configured in two arrays 4, 4a (generally in the conduit wall 5) , the opposite faces of the interior of 5a, as illustrated in Figure 17. The two fin arrays are disposed in a relatively displaced position with two consecutive fins relative to the first fin array (except The gap formed between the two end fins, there is a relative fin of the second array, thus creating a typical asymmetrical configuration that is characteristic of the SASO pipe. Thus, two asymmetry are formed a unit of arrays, each unit being bounded by two consecutive fins of the same array and a portion of the pipe wall between the two fins. Thus defining a cavity in which a fluid flows through the pipe A large eddy current is formed in the cavity. When the driving pressure is supplied, the internal configuration of the SASO pipe governs the unique vortex flow field pattern generated inside the pipe as the fluid flows through it. The 115545.doc 200816294 fin Each of them Further from the tip of the fin, one of the downstream flows is separated. Further downstream, a large fluid structure, a vortex is generated in each of the cavities. The flow pattern creates a restriction when the pipe is not covered. a flowable effective aerodynamic barrier mechanism. In effect, one of the two opposite rows of vortices 6, 6a is formed with a flow pattern and the pattern is asymmetrically arranged as shown in Figure 17. Each vortex is oriented toward an opposite fin Within a cavity, the vortices (and especially when formed with an almost closed streamline) actually block flow through the conduit. Thus, a very thin core stream 7 is formed between the barrier fin and the vortex. It may have a relatively high downstream velocity and be bounded by eddy currents on both sides without contacting the conduit walls. The description of the SASO device given in Figure 17 should be considered as a cross section of an actual device. PCT/IL00/00500, filed as APPARATUS FOR INDUCING FORCES BY FLUID INJECTION, published as WO 01/14752, and now U.S. Patent No. 6,523,574 (see also WO 01/14782 and WO 01/195 72, now US Patent , No. The (SASO) flow control device includes a fluid conduit having an inlet and an outlet having two opposing sets of fins mounted on the interior of the conduit, each of the two fins and the inner wall of the conduit being A portion between the two fins defines a cavity and the opposing sets of fins are positioned opposite the cavity such that a substantially stationary vortex is formed in the cavity as fluid flows through the conduit, The vortex is present at least temporarily during the flow, thus forming an aerodynamic barrier that allows a center flow between the vortex and the tip of the opposing set of fins and suppresses the flow in a one-dimensional manner, thus limiting The mass flow rate and maintain a significant pressure drop within the pipe. It exhibits the following characteristics of the SASO nozzle: (a) When a pressurized fluid is supplied to the SASO nozzle at the inlet and the outlet is blocked by an object but not completely closed, a fluid return spring effect is generated to allow the fluid to A portion of the supply pressure is lowered in each of the SASO nozzles and the residual pressure is introduced into the narrow space between the "effective surface of the platform having the 8-8 nozzle outlet and the contact surface of the object The manner in which the fluid cushion flows out through the outlet 'so forces the object onto the object to raise the object. The pressure introduced into the fluid cushion increases as the gap decreases and decreases as the gap increases. If, for example, the object is supported by a fluid cushion, the force creates a force that balances the weight of the object. The object floats on the effective surface of the non-contact platform in an adaptive manner, wherein (in this case, the mouth) is defined as a floating distance of the μ body buffering gap so that the upward total force acting on the floating object is equal to the gravity. When attempting to change the equilibrium condition, a fluid return spring behavior is obtained: when attempting to close the gap, the pressure at the fluid cushion increases and pushes the object up to the balanced fluid cushion gap, and when attempting to open the gap, the fluid The pressure at the cushion is reduced and gravity pulls the object down to the balanced fluid cushion gap. This simple example is provided to clarify the functionality of the fluid return spring, but in general it can be implemented in a variety of ways as will be discussed below. (b) When the SASO nozzle outlet is not closed, an aerodynamic barrier is obtained 115485.doc -10- 200816294 冓 In fact, the SAS0 nozzle has a large physical scale in the lateral direction to prevent mechanical obstruction caused by π-stained particles. And when it is completely covered (the aerodynamic barrier is eliminated when the flow stops), it introduces pressure or vacuum at the effective surface of the platform and has a loss. However, when the SASO nozzle is out of alpha and is in the presence of a flow, it has a dynamic behavior of a small orifice controlled by a WH2 aerodynamic barrier. This behavior is important because the mass flow rate is dynamically reduced when a non-contact platform supports or transports a small object and most of its effective surface is uncovered. The SASO nozzle is a flow control device with an adaptive nature that is completely based on an aerodynamic mechanism and does not have any moving parts or any control members. It is insensitive to contamination barriers due to its large object scale in the lateral direction. When a plurality of SASO nozzles are used to feed a well-functioning fluid cushion fluid, it has a localized behavior that provides a homogeneous fluid cushion. A recent publication published by the inventors of the present invention (WO 03/060961, I, High performance non-contact support platforms", July 24, 2003 and incorporated herein by reference) discloses a The fluid cushion senses pressure to support a non-contact support platform for a stationary or traveling object. The platform includes a support surface or substantially opposite two support surfaces, the support surface including at least one of a plurality of pressure outlets and a plurality of fluid withdrawal passages. Each of the pressure outlets is fluidly coupled to a high pressure reservoir by a pressure flow restrictor. The pressure outlets provide pressurized fluid to create a fluid for maintaining a flow between the object and the support surface. The pressure sensing force of the cushion, the pressure 115485.doc -11 - 200816294 force flow limiter characterizes the fluid returning bouncing behavior. The fluid extraction passages have - population and σ, the person π remains at ambient pressure or lower pressure, maintained under vacuum conditions to locally discharge mass flow, thus obtaining uniform support and localized property response. This publication describes various versions of the non-contact support surface. The flow restrictor described in U.S. Patent No. 6,523,574 has a particular attraction for use in connection with the aforementioned non-contacting platform. It is an object of the present invention to provide a novel fluid processing apparatus and method using one or more non-contact platforms having flow restrictor nozzles. Another object of the present invention is to provide such a fluid processing apparatus and method wherein the nozzles are used as non-contact or non-contact clamping of an object to be treated and/or for introducing a treatment fluid and for withdrawing a treatment fluid. Other objects and advantages of the present invention are presented above. SUMMARY OF THE INVENTION Accordingly, a preferred embodiment of the present invention provides a non-contact support apparatus for fluid processing of a stationary or traveling object and supporting the object by a fluid cushion inductive force without contact, The apparatus includes: at least one of two generally opposing non-contact platforms having a support surface - each support surface comprising at least one of a plurality of base units, each unit having at least one of a plurality of pressure outlets And at least one of the plurality of fluid withdrawal passages, each of the pressure outlets being fluidly coupled to a high pressure fluid supply by a first-class S limiter, the pressure outlets providing pressurized fluid for generating a a pressure sensing force of the fluid cushion between the object and the support surface of the platform, the flow restrictor characteristically exhibiting a fluid return spring behavior; the at least one of the plurality of fluid extraction passages Each of the population has a population and an outlet for locally balancing the quality of the at least one of the plurality of basic units And wherein at least one or more zones of the platform support surface comprising one or more base units are designated as a processing zone coupled to a fluid reservoir, the fluid reservoir providing a pressure outlet for providing the object for processing The treatment fluid draws fluid through the fluid extraction channels.

Further in accordance with some preferred embodiments of the present invention, the apparatus includes two opposing platforms having a support surface. Moreover, in accordance with some preferred embodiments of the present invention, at least one of the processing zones is defined at a restricted area of the support surface of one of the two opposing platforms. Further, at least one of the processing regions according to the present invention is spread over at least the entire supporting surface of one of the two opposing platforms. Moreover, in accordance with the preferred embodiment of the at least one of the at least one of the present invention, the plurality of extraction channels are maintained at an ambient pressure. In the preferred embodiment, the at least one of the plurality of extractions is maintained at a low pressure (vacuum) condition. Furthermore, in accordance with the preferred embodiment of the present invention, a flow restrictor i is provided for each extraction channel in one step. Further, in accordance with the present invention, the embodiment of the second embodiment of the present invention, the flow restrictor j comprises a body pipe having an inlet and a 屮Γ7ΛΑ4, the pipe being provided in two: 115485.doc -13- 200816294 a plurality of fins mounted on the inner wall of the pipe in a displaced manner such that a cavity defined between one row of continuous fins and one of the second column of fins is placed in each cavity Opposite. Further, in accordance with some preferred embodiments of the present invention, the at least one support surface is flat. Moreover, in accordance with some preferred embodiments of the present invention, the at least one support surface is curved. Further, in accordance with some preferred embodiments of the present invention, the apparatus has a circular configuration. Moreover, in accordance with some preferred embodiments of the present invention, the apparatus has a rectangular configuration. Further, in accordance with some preferred embodiments of the present invention, the fluid required to treat the object is also used to support the object in the form of a fluid cushion. Further, according to some preferred embodiments of the present invention, the apparatus further has a heater for heating the treatment fluid or for heating the fluid cushion. Further, in accordance with some preferred embodiments of the present invention, more than one processing zone is provided on either side of the object. Further, in accordance with some preferred embodiments of the present invention, an isolation system is provided to isolate one or more processing zones on the object. Further, in accordance with some preferred embodiments of the present invention, the isolation includes physical isolation. Moreover, in accordance with some preferred embodiments of the present invention, the isolation includes dynamic isolation provided by the fluid dynamics. Further, in accordance with some preferred embodiments of the present invention, at least one of the two substantially opposite flats has a peripheral inlet to provide dynamic isolation by the fluid-absorbent member. Moreover, in accordance with some preferred embodiments of the present invention, at least one of the two substantially opposing platforms has a peripheral outlet for providing dynamic isolation by the fluid injection member. Moreover, in accordance with some preferred embodiments of the present invention, the dynamic isolation creates a dynamically closed fluid processing environment. Moreover, in accordance with some preferred embodiments of the present invention, the apparatus further has a mechanism for landing. Moreover, in accordance with some preferred embodiments of the present invention, the apparatus further has a sealed outer casing. Moreover, in accordance with some preferred embodiments of the present invention, the sealed enclosure further includes an opening mechanism for permitting loading or unloading of the object. Moreover, in accordance with some preferred embodiments of the present invention, the apparatus is coupled to a wheel loader for transporting the object on the apparatus. The transporter is mechanical, in addition, in accordance with some preferred embodiments of the present invention. The object is further supported by a fluid cushion support force in accordance with some preferred embodiments of the present invention. Further, according to the present invention, the material processing area is merged with a bridge. Furthermore, according to one embodiment of the invention, the bridge is movable 0 115485.doc • 15· 200816294 Furthermore, according to the invention, the bridge is movable. Furthermore, according to the invention on the object. Some preferred embodiments of some preferred embodiments are suitable for floating in the bridge. In addition, according to the present embodiment, a driving system is provided to facilitate the (four) processing area. - relative motion with the object. - Line I: According to some preferred embodiments of the present invention, the drive system provides

The drive system provides, in addition, a circular motion in accordance with the present invention. Some preferred embodiments - preferred embodiments of the drive system include, in addition, in accordance with some preferred embodiments of the present invention, the apparatus is further provided with a control box for controlling the operation.

Further, 'in accordance with some preferred embodiments of the present invention, the common control box is adapted to at least some of the following: a supply of the treatment fluid, heating: pressure control, substantially opposite of the object to the two The change in distance between the surfaces, the switching of the treatment fluid, the transport of the object, the loading and unloading of the object. Further, in accordance with some preferred embodiments of the present invention, the common control box is adapted to control a multi-stage fluid processing process. According to some preferred embodiments of the present invention, the apparatus is provided in a plurality of workstations forming a multi-station fluid processing line. Moreover, in accordance with some preferred embodiments of the present invention, a non-contact fluid treatment for a stationary or traveling object of an I15485.doc -16 - 200816294 is provided and supported by a fluid cushion inductive force without contact Method, the method comprising: providing a device comprising at least one of two substantially opposing non-contact platforms having a support surface, each support surface comprising at least one of a plurality of base units, each The unit has at least one of a plurality of pressure outlets and at least one of a plurality of fluid withdrawal passages, each of the pressure outlets being fluidly coupled to a high pressure fluid supply by a flow restrictor, the pressure outlets Providing a pressurized fluid to generate a pressure sensing force for maintaining a fluid cushion between the object and the support surface, the flow restrictor characteristically exhibiting a fluid return spring behavior; the plurality of fluid extraction passages Each of the at least one has an inlet and an outlet for locally balancing the at least one of the plurality of basic units At least one or more zones containing one or more base elements of the platform support surface are designated as a processing zone connected to a fluid reservoir, the μ body reservoir passing a pressure outlet providing a treatment fluid required to treat the object and withdrawing fluid through the fluid extraction channels; placing the object against the processing zones; and applying the treatment zone to the object and from the object Remove the treatment fluid. Moreover, in accordance with some preferred embodiments of the present invention, the fluid cushion is of a ΡΑ type. Moreover, in accordance with some preferred embodiments of the present invention, the fluid cushion is of a PV type. Moreover, in accordance with some preferred embodiments of the present invention, the fluid cushion is 115485.doc • 17-200816294 - a pp type. Further, in accordance with some preferred embodiments of the present invention, the fluid cushion maintains the object In addition to the at least one of the two counties, the distance is less than 1 mm. Further, according to some preferred embodiments of the present invention, the fluid cushion maintains the Wuhai object with two Φ; The at least one of the surfaces is less than 0·1 mm apart.

Further in accordance with the present invention, the fluid buffering device has an adjustable gap provided by controlling the pressures introduced into the air buffer. Further, processing is performed on one of the aspects of the present invention. Further, processing is carried out according to one aspect of the present invention. Further, 'in accordance with one of the present invention. Further ' an inert fluid according to one of the inventions. Preferred embodiments, the system is in a preferred embodiment, the system is in two preferred embodiments, the treatment fluid is cut into preferred embodiments, and the treatment fluid is switched in addition to _ ^ Some preferred embodiments of the month, the processing fluid is a preferred embodiment according to the present invention, the processing fluid is an embodiment of the present invention, which is intended to be used in a fluid processing process. Fluids 115485.doc -18- 200816294 Equipment and methods. One aspect of the present invention resides in a combination of fluid handling and high performance non-contact platform technology, as described in detail in the Abstract 〇3/〇6〇961 incorporated herein by reference. The ability to hold an object (especially a flat substrate) very close to a non-contact support surface (such as the partially balanced fluid cushion described in WO 03/060961) has a particular appeal when considering fluid handling. In many current fluid processing processes, and specifically in the manufacture of silicon wafers, flat panel displays (FPDs), printed circular panels (PcB), and computer hard drives, compact discs (CDs), DVDs, and the like. Chemical processing, grinding (including CMP), physical and chemical wet or dry cleaning, water washing, drying, and the like, performing the processes in a large chamber and using a large volume of fluid (primarily liquid or more precisely) For chemicals). This seems to be a waste of the material, and of course it will cause significant pollution problems. In several advantages of the present invention, the present invention generally reduces the amount of fluid used because the volume involved is orders of magnitude smaller. The present invention makes it possible to implement a very efficient chemical re-jujube process, thereby saving expensive chemicals and avoiding contamination problems. In some preferred embodiments of the invention, the non-contact support platform promotes local balance of fluid processing without any global effect relative to the size of the substrate. In particular, it is extremely important for a wide substrate such as FpD which can have a glass of 〇·7 mm or less and a size of more than 2x2 meters. The locally balanced fluid buffer 塾 provides a uniform height control of the local nature and helps to further reduce the amount of fluid used, while allowing liquid handling to be incorporated into the production line in a tight manner, Rather than being incorporated into one (as is the case with fluid handling techniques). It must be emphasized that this non-contact platform is a platform that supports universal fluid handling processes, such as chemical processing processes that allow the use of a commonly used standard chemical. Prior to entering the details of some preferred embodiments of the present invention, some aspects of the non-contact support fluid cushion are discussed below. One of the important configurations of the non-contact support platform is that the fluid cushion is effective by one of the platforms, the contact surface is provided and the system thereon is supported without movement or without contact. Transported on the platform. In the absence of derogatory generality, the configuration is generally referred to in most cases, but other possible configurations are considered to be encompassed by the present invention, wherein the flat is passive and has one A floating object of itself, an effective surface" (generating a fluid cushion) creates a fluid cushion, such as a cleaning bridge that applies a fluid treatment as it travels over a flat substrate (such as an FPS) and is produced from above the substrate A fluid cushion support between the surface and the opposite effective surface of the bridge. This second configuration is referred to below as a self-supporting bridge configuration. Non-contact platforms or processing and transport devices utilize various types of fluid buffers. A single aerodynamic building block connects various types of fluid cushions. That is, 'using a plurality of fluid return springs (such as SASO nozzles) to produce a high-performance non-contact platform. I have determined that for the better performance of the fluid cushion support system 'by the platform' effective surface, the entire area is partially It is important to draw fluid out to create a partially balanced fluid cushion. In the absence of derogation generality, some types of fluid cushions are mentioned herein, and each 115485.doc -20-200816294 produces a partial extraction of fluid in a different manner: Atmospheric pressure (PA) type fluid cushion PA type The fluid cushion is created using an effective surface having a plurality of pressure ports and suction ports, wherein fluid is allowed to be drawn into the environment at the extraction port. The PA type fluid cushion is preloaded by the weight of the object, and one of the objects is supported by a non-contact platform of balanced gravity. The PA type platform provides non-contact support in two situations, which are flat and/or thin under common conditions and/or have a wide range of objects supported to be stationary or when the object is transported by any drive mechanism. The lateral dimension of the object is typically much larger than the size of the base unit''"Bodypreload" means the fluid dynamic stiffness of a PA-type fluid buffer 在一 at a predetermined equilibrium floating gap (hereinafter referred to as the fluid cushion nominal gap, indicated by %) (hereinafter will be referred to as The FD stiffness depends on the weight of the object. "FD rigid" means a certain amount of force generated by the fluid cushion in an adaptive manner when attempting to change the nominal gap (between the lower surface of the object and the effective surface of the non-contact platform). , Ming, measure the fd rigidity in units of gram/cm2~m. ^ PA type fluid cushion is generated in a narrow gap between the effective surface of the platform and the lower surface of the supported object. A plurality of pressures of a device (such as a SASO nozzle) are introduced into the fluid cushion, preferably in a two-dimensional manner, or in a repeatable format in which the pressures are mixed with the plurality of extraction holes, as appropriate. The excess fluid is drawn through the plurality of extraction holes to a reservoir that is maintained at atmospheric pressure. The size of the basic unit is selected relative to the lateral dimension of the object to be suspended, and the pressure and the extraction port are generally desired (herein referred to as The resolution of the hole is such that the multiple holes are covered by the suspended object at any given time. In order to obtain the local support of the raw shell, it is better to The mode assigns a plurality of basic elements (each of the basic elements have local equilibrium properties with respect to mass flow balance) to support the object. It must be emphasized that the "resistor for the flow limiter in the drawing The details of the embodiment of the symbol "only symbolic and flow restrictor (such as a preferred SASO nozzle (see Figure 17)) are incorporated herein by reference in WO 01/14782, w〇〇1 It is described in /14752 and w〇01/19572. Other flow restrictors that exhibit the same characteristics can also be used. A PA type non-contact platform is preloaded by the weight of the object. Overall, the pressure introduced into the fluid cushion is higher. The 'FD rigidity is enhanced. This means that when the weight of the object is 'obtained', a non-contact flat, m-controlled platform that works well in terms of fluid cushion rigidity, and a relatively high driving pressure must be introduced into the fluid buffer. To balance gravity. However, when supporting a thin substrate (such as 'a large silicon wafer wafer with a weight of about 0.2 gram per square centimeter or = PD), the - ΡΑ type fluid cushion is relative to each area. It The high turbulent pressure operation of the weight of the object is extremely important. The pA type fluid buffer 操作 can be operated, for example, at a driving pressure of rn mbar, which is a value 500 times larger than the weight of the substrate. This is achieved by a special design in which the partial withdrawal holes significantly reduce the 2 buffers at the nominal fluid buffer gaps and 'drops' and drop most of the supply table inside the flow limiter. Any dynamic force or static The force causes the substrate to face non-contact, and when the surface moves, a large restoring force _ u movement relative to the weight of the substrate occurs and the substrate is protected very strongly and quickly from any H5485.doc -22-200816294 contact. Vacuum pressure (pv) type fluid cushion PV type k body buffer 塾 is a vacuum preloaded fluid buffer 由 which has a plurality of pressure enthalpy and an effective surface connected to a vacuum outlet (meaning low pressure) source outlet Produced, so excess fluid is withdrawn by the vacuum. The PV-type fluid cushion is a vacuum preloaded fluid cushion in which the object is accurately supported in a stationary state or transported by a PV-type fluid cushion. The F D stiffness of a pv type fluid cushion inherently has a bidirectional nature and may not depend on the weight of the object. Bidirectional FD rigidity means that in an attempt to push an object toward the effective surface of the non-contact platform or when attempting to pull the object away from the surface, the pressure can be forced back in an adaptive manner by a much greater amount of pressure than the body of the object. To balance the nominal gap. The mass flow rate is protected by the flow 2 used at the pressure and discharge ports (the flow limiter is used at the outlet at most in the absence of derogation, when the level is fully covered by the substrate) The bottom is invalid), so the object size can be much smaller than the effective surface of the platform. Therefore, we will state that the effective area means the area where the object exists on the effective surface of the platform. Pv-type fluid cushions typically include two types of conduits, the pressure conduit, the outlet, and the sigma of the vacuum suction conduit. The pressure conduits are typically individually equipped with a flow meter (preferably a SASO nozzle) to provide local frs (fluid return spring) behavior of the non-contact platform and to implement aerodynamic barriers in the event that the effective surface of the platform is not fully covered. The uniformity of the mechanism protection pressure supply: the vacuum line can be a simple cylindrical hole or it can be equipped with a separate melon limiter (such as SAS〇 nozzle), but it is relative to the pressure flow limiter 115485.doc -23- 200816294 There must be a lower FD resistance to protect the vacuum level by the aerodynamic blocking mechanism in the uncovered area during at least a portion of the effective operational duration when the non-contact platform is not fully covered. It is possible to provide a flow restrictor in the fluid extraction port fluidly connected to the ambient atmospheric pressure without being connected to a vacuum source, so that the pressure of the fluid cushion and hence the lift below the object is increased. These two-quantity limiters are referred to as "extracted flow restrictors," which is natural, but for simplicity, the terminology used throughout this specification, vacuum flow restrictor, also refers to the withdrawal of flow restrictors. pv-type fluid cushions The functionality of the (vacuum preloaded fluid cushion) does not depend on gravity. In a balanced clamping state (εη), the object is supported by a pv-type fluid cushion, wherein the channel formed in the pressure limiter (preferably SAS〇) The total pressure GFP) around each outlet of the nozzle) has each outlet formed with a flow restrictor (preferably a SASO nozzle) formed in a vacuum conduit (which may be provided differently (than pressure flow restrictor)) The total opposite vacuum force around the π.) is of the same order of magnitude. The two opposing forces can be greater than the object weight by 1〇 or 1〇〇 and 夕倍, and the differential force (EFP-EFV) balances the gravity. The PV-type fluid cushion is not related to mFD rigidity and therefore the functionality relative to flatness performance is not related to the weight of the object and the direction of gravity toward the ground. It must be emphasized again that the PV-type fluid cushion is essentially There are two-way FD stiffness that does not depend on the weight of the object, and it is one of the most important properties of the Pv-type platform because it means two when trying to push an object towards the effective surface of the platform or trying to pull it off the surface. In this case, the fluid cushion rapidly generates a large opposing pressure in an adaptive and local manner to return the object to its equilibrium position. H5485.doc -24- 200816294 Similar to the PA type fluid cushion, Pv type fluid cushion It is characterized by the balance property (relative to the very important nature of the present invention), because the PV-type fluid cushion has a similar basic unit, but the suction outlet can be connected to a vacuum or by a flow restrictor as appropriate. The low air pressure source provides enhanced extraction relative to the PA type fluid cushion and is capable of introducing a low air pressure pullback force when the object or a partial portion thereof is moved away from the effective surface of the platform by an external force. Thus, bidirectional FD rigidity is generated.

Pressure Preload (PP) Type Fluid Cushion The PP type fluid cushion is a two-sided configuration created by the use of two relatively effective surfaces from two faces of an object. Each effective surface (similar to the active surface of the pA type fluid cushion) produces an opposite force in the direction relative to the other effective surface and supports, for example, a flat substrate from both sides. Thus, the PP type fluid The cushion is a pressure preloading platform in which the object is supported in a stationary state or transported without contact (because the FM forces of both faces act), so the pp-type non-contact platform is unconditionally stabilized. The relatively effective surface of the PP-type platform is preferably phase (four) having a plurality of pressure, flow 4 limiters (such as SAS0 nozzles) and typically having a greater number of extraction holes' to produce a well-functioning FRS mechanism and thus Achieve high performance with respect to FM stiffness and accuracy, large support forces (caused by approximately half of the drive pressure and another half maintained inside the flow restrictor) and produce a locally balanced support with no global effect. The two relatively effective surfaces of the 平台-type platform are assembled substantially in parallel, and the same effective surface is aligned in parallel in a manner that is mirrored to 115485.doc -25 - 200816294. The plane of symmetry is essentially an imaginary medium-sized object that is established between two opposing effective surfaces in a thin (cross-sectional) and wide (lateral) space to create two opposing fluids when inserted between two relatively effective surfaces. Cushion. The gap between the two opposing fluid cushions shares the difference between the width of the object and the distance between the relatively effective surfaces in an adaptive manner. If the two effective surfaces are similar and operate under the same operating conditions, the εη at the two fluid buffer pads will be equal. The distance between the two opposing surfaces must be adjusted to equal the width of the intended supporting object plus twice the desired % clearance. Therefore, when it is desired to clamp an object having a different width, the ρp-type non-contact platform must include a "plate width adjustment" mechanism that allows adjustment of the distance between two relatively effective surfaces. When attempting to offset the position of the substrate toward one of the active surfaces, the force at the nearer effective surface is significantly increased and the force on the other side of the substrate is significantly increased. This is the meaning of a vacuum preloaded fluid buffer that exhibits high flattening performance. Similarly, it is possible to apply a PV-type effective surface to create a fluid-type buffer. There is a significant difference between a PP-type fluid cushion and a PV_PV-type fluid cushion: the PP-type double-sided platform is subjected to an opposing force formed between fluid buffers separated by a (floating) substrate in an equilibrium position, and PV- The PV type double sided platform is not loaded by the fluid cushion (in equilibrium position). Another practical version of the fluid cushion is a PM-type fluid cushion, wherein an effective surface having a base unit similar to a PP-type fluid cushion (less extraction) results in a pressure on a flat substrate. Supported from the other side in contact by, for example, a vacuum or electrostatic chuck. In this case, the PM type is used as a non-contact pressing surface so that the substrate is flattened against the opposite surface of the chuck. There are many practical implementations of the above-described types of fluid buffers for non-contact platforms used in the fluid processing process of the present invention. A basic distinction based on the functionality of a non-contact platform will be made below without derogating from the generality: During the process of the melon body treatment, it is only used to support the object (in this case, air or any other air will be used) A non-contact platform of compatible inert gas or liquid) or a sector thereof. Γ Only used to introduce a non-contact platform or a sector of a fluid (such as a chemical or cleaning liquid) for a fluid processing process. A non-contact platform or a sector of a fluid for use in a fluid handling process, and the fluid cushion is also used to support an object to be treated. Strong; the use of a fluid buffer of the type described above with an in-machine limiter is relatively important, and the benefits of the non-contact platform of the fluid handling apparatus of the present invention are extremely important. It is safe to create a non-a-J non-hoisting and uniform fluid handling environment by using a flow restrictor that has a fluid-recovery venting re-explosive (such as SASO piping). The term "π-safety" means the contact between the surface of the supporting surface of the substrate and the contact surface of the object when there is no support for the substrate. Any risk of this is because when trying to close the gap between them, the force is quickly generated, thus preventing any contact. With the example, when a PV fluid cushion supports a 300 mm When the wafer is wafered, the wafer is moved by an adaptive self-balancing floating gap (moving toward or away from the flat table "岔, ^雕十室" only a few micrometers, the air cushion can produce 10 kg The fluid 撼Μ 攱 body mechanical recovery. This brute force ensures that there is no contact, so it provides the option to create a stress-free, tight fluid handling environment. The term ''tight') relates to a small distance or gap between the support surface of the platform and the contact surface of the object (eg, a gap of less than i mm or even less than 〇l mm). This means applying fluid treatment to the surface of the object. The upper fluid cushion contains a very small amount of fluid (eg, a chemical fluid for surface cleaning). Thus, such a thin fluid processing environment provides significantly lower process costs. For example, when a 300 mm crystal When the circle floats approximately 1 μm above the fluid cushion that is also applied to the fluid treatment, only 7 cm3 of treatment fluid is contained in such a thin fluid treatment environment. The term "uniform" relates to all of the above types of fluid cushions. A local equilibrium behavior in which fluid is locally supplied and extracted in each of the relatively small (relative to the size of the object) repeatable base unit, thus locally balancing the mass flow without any global effect. The recirculating fluid pattern within each of the base units provides lateral fluid motion proximate to the contact surface of the object, thus A very local approach provides a dynamic mechanism to improve process uniformity and a dynamic mixing mechanism that uniformly increases fluid. Reference is now made to the drawings. Figure 1 illustrates a single-sided non-contact support platform in accordance with some preferred embodiments of the present invention. A schematic cross-sectional view of a fluid handling apparatus. The apparatus 100 shown in the figures includes a non-contacting platform 11 having an active surface 112. The active surface 112 is provided with a pressurized fluidly coupled to the integrated pressure manifold 122. The fluid supply port 120, wherein the manifold 122 provides a pressurized fluid to the pressure on the active surface through a flow restrictor 124 (eg, a SASO pipe) 115485.doc -28-200816294 force outlet. Connectable under the condition of a PV-type platform The extraction enthalcium 130 to a vacuum source (shown) is returned via the inlet assigned to the active surface, and the fluid is withdrawn from the head, and the fluid is supplied to the holding pressure by the extraction manifold 132 (PA type or pp type platform). Or low-pressure (pv-type platform) conditions of the reservoir hole as the case (mainly under the condition that the platform is not completely covered), the flow rate is limited to two, 134 (again, preferably SAS〇 Channel) provided in the withdrawal conduit. Internet unit 101 is a substantially covers the active surface can be repeated units, the single

The element 101 includes a pressure hole and a vacuum hole. An object 10 (such as a wafer, ^PD or other such substrate) is supported on the active surface U2 without contact while being processed by the fluid. Here, the back surface 12 of 1G is treated and the opposing surface 14 is unaffected. The edge 16 of the object can be freely or physically engaged to an external tool (e.g., a holder). The gap formed by the fluid cushion between the active surface 112 and the treated surface 12 of the object is shown. This configuration creates a very thin fluid layer between the surface 12 and the surface 112, a very thin fluid layer | - a tight volume relative to the amount of fluid required to maintain a highly economical fluid handling process (eg, a tight cleaning chamber) . The basic unit of the platform 〇1〇1 is a repeatable unit covering the effective surface of the & 亥 单元 unit including a few pressure outlets of 124 and 134 vacuum inlets (124 and 134 are not necessarily the same number) and one A reproducible small volume of thin fluid-fluid buffer. The base unit provides local behavior and is balanced with respect to the mass flow rate, which means that in each unit, the amount of fluid introduced into the unit by a small number 124 and the amount of fluid extracted from the unit by passage 134 (5) Basically similar. Thus the recoverable method eliminates any global effects and therefore there are no practical limitations to processing a wide substrate. By using a flat $110 for the fluid processing process, a continuous multi-stage 115485.doc -29-200816294 process can be applied. The multi-stage process can be implemented during a well-defined controlled process by switching the fluid while supporting the object 10 without contact during the entire cycle. For example, water washing and drying are performed after performing a chemical process (meaning that it is also possible to switch from liquid to gas). Figure 2 illustrates a schematic cross-sectional view of a fluid processing apparatus having a double-sided non-contact support platform in accordance with some preferred embodiments of the present invention. Here, the two opposing surfaces of the object 10 are processed, or one of the two faces is processed. The apparatus 2A shown in the drawing comprises two relatively non-contact platforms 210, 21A, each platform having an effective surface provided with a pressurized fluid supply port (220 and 220a, respectively), each supply The helium is fluidly coupled to the integrated pressure manifold, wherein the manifold supplies pressurized fluid to a pressure outlet on the active surface through a flow restrictor (eg, so moss track). In the case of a PV-type platform, the extraction enthalpy (230 and 230a, respectively), which can each be connected to a vacuum source (not shown), draws the fluid from the effective surface such as the raft through an inlet assigned to the effective surface, and extracts the fluid through the extraction. The manifold provides the fluid to a reservoir that is maintained at atmospheric pressure (PA or PP type platform) or low pressure (PV type platform) conditions. The treatment object 1 is supported between the surfaces of the discharge surface when processed by the fluid. Here, the two opposite surfaces of the object are processed. Alternatively to one of the devices of Figure 2, only one face of the object 1〇 is processed/so one face of the fluid cushion is only used to support the object 1〇, and the fluid, the other side of the pad (eg feed has chemistry) The reaction fluid) provides a fluid 43⁄4 on the associated contact surface of 1 Torr. It is therefore necessary to use two different types of flow = 〆 and it can be, for example, a support fluid cushion (where the fluid is nitrogen or jade) or an inert fluid cushion, and at another chemically active surface of 1 供115485.doc 200816294 Give a chemical reaction fluid. In some applications, two types of fluid cushions (for example, fluid cushions operating with two different cushion gaps ε ΐ, ε 2 ) can be used, so that one fluid cushion is dominant and relatively The fluid cushion is primarily responsible for the fluid handling process. 3 illustrates a schematic cross-sectional view of a non-contact fluid processing apparatus having a two-sided configuration in which the object to be processed 10 is held by a pressure that presses it against the opposing support surface, in accordance with some preferred embodiments of the present invention. . When only one active surface (such as a 平台-type platform) is placed against a flat object and a non-effective platform is positioned on the other side of the object, the fluid buffer 挤压 presses against the non-effective surface to squeeze the object. This article refers to this platform as a platform. The apparatus 300 shown in the figures includes a non-contact platform 3 10 having an active surface having a pressurized fluid supply port 320 fluidly coupled to an integral pressure manifold, wherein the manifold is provided by a flow restrictor Pressurize the fluid to a pressure outlet on the active surface of 310. An extraction port 330 that can be connected to a reservoir that is maintained at atmospheric pressure (ΡΑ-type or ΡΡ-type platform) or low-pressure (ρν-type platform) condition is distributed on the effective surface (as the case may be used in the extraction port The inlet of each of the outlets draws fluid from the effective surface by withdrawing manifold 330. The back side of the object to be treated 1 is pressed by the fluid cushion to completely contact the platform 37, while the fluid cushion is maintained between the effective surface and the front side of the object (relative to the top of the figure), The fluid processing process is performed therebetween. Optionally, platform 370 is a vacuum chuck that is coupled to a vacuum source via vacuum manifold 380, wherein vacuum manifold 380 is coupled to inlet 384 on the surface of platform 37 through integral manifold 382. 115485.doc 31 200816294 Fluids of Preferred Embodiments Figures 4a through 4e illustrate some configurations and orientations of a device according to the present invention.

Figure 4a is a schematic cross-sectional view of a fluid processing apparatus having a double-sided non-contact-receiving platform in a vertical direction. Here, the two relatively non-contact platforms 4H) are only used to establish a fluid buffer on either side of the object 1〇. The object 10 can be held by the holder 411 as appropriate, wherein the holder 411 can be, for example, a robot arm that inserts the object into the (four) between the platforms and removes the object after processing the object . Or 'element 411(s) may be a limiter that prevents vertical movement of the object. Further, when the object 10 is laterally held in the vertical direction by 410, 41〇a, the element 411 can rotate the object 10 (for example) to improve processing uniformity. Figure 4b is a schematic cross-sectional view of a fluid processing apparatus having a single-sided non-joint support + table in a vertical direction. Here, a platform 420 (pv type) holds the object 10 and simultaneously fluidly processes its surface, with an optional gripper 421 for introducing objects into the platform and removing them from the platform (for comparison with respect to element 421) For more details, see Figure 4 & similar element 411). Figure 4c is a schematic cross-sectional view of a fluid processing apparatus having a single-sided non-contact support platform 上下 with an upside down orientation. The PV fluid cushion hangs the object ίο against gravity. A gripper 431 that prevents lateral movement of 10 is applied and can rotate the object as appropriate. Figure 4d is a schematic cross-sectional view of a fluid processing apparatus having a undulating non-contact support surface. The platform 440 is provided with a concave effective surface to accommodate the protruding object 10a. The far effective surface is designed to match the treated surface of the intended object to be treated and it can take any form (the concave surface is only an example). 115485.doc -32- 200816294 Figure 46 is a schematic cross-sectional view of a fluid handling platform 450 having two substantially perpendicular non-contact support surfaces for holding an object (10) having a matching vertical surface. Figures 5a through 5m illustrate several sealing options for a one-piece processing apparatus in accordance with some preferred embodiments of the present invention. Figure 5a is a schematic cross-sectional view (partial view of an edge region of the platform) for isolating a contact seal of a fluid cushion between a platform and a substrate of a fluid handling device having a single-sided non-contact support platform. The platform is provided with a sealing strip around the edge of the platform that is made of a material that does not allow the passage of fluids of the type used, such as enamel-based soft materials. The seal ring (which may also have a circular cross-section such as a 0-ring) preferably has some flexibility to provide a soft contact for the object placed thereon. The object 10 is placed to contact the sealing strip at its edge 11 (especially by the wafer or the periphery of the chip) π). Figure 5b is for isolating the fluid with a double-sided non-contact support platform A schematic cross-sectional view of a contact seal of a fluid cushion between a cleaning platform of a processing apparatus and a substrate (a partial view of an edge region of the platform). Here, the two platforms 52 and 520a supporting the object 10 each have a A sealing strip 570 that surrounds the edges of the platforms and the sealing strip 57A has similar details as described with respect to the sealing strip 570 of the figure. Figure 5c is a schematic cross-sectional view of a contact seal for a fluid cushion between a cleaning platform and a substrate for isolating a fluid treatment having a single-sided non-contact support platform. Here, the two opposing platforms 53A and 530a are both non-contact platforms. The platform 53A has an extension 531a which forms a corner with the remaining 115485.doc -33-200816294 portion of the platform 53A, wherein the corner sealing member (for example, the 0 ring) which is in contact with the edge of the object 10 is placed. In the corner. Figure 5d is a schematic cross-sectional view of another embodiment of a fluid processing apparatus that achieves dynamic isolation by applying local fluid injection at the circumference of the object. It must be emphasized that the dynamic isolation of the alternative physical isolation in the non-contact platform is such that it energizes the relative motion between the supported object and the support platform. In the apparatus a non-contact platform 540 is provided with an edge nozzle 580 which may in fact be an annular outlet around the edge of the object. A peripheral (substantially two-dimensional) nozzle 580 is used to inject fluid for use as a fluid isolation barrier. The direction may be pre-programmed to cause the flow to be drawn outward (as shown), or the flow may be directed under the object and withdrawn through an extraction channel within the platform or the device. The splint 598 can be used to prevent the object from sliding, or to move or rotate the object, as appropriate. Figure 5e is a schematic cross-sectional view of a dynamic isolation of a fluid processing apparatus by applying local fluid extraction at the circumference of the object. In the platform 550 of the apparatus, the dynamic isolation is created by the use of a vacuum suction slit to force fluid near the vacuum slit 59 (meaning edge leakage from the fluid cushion) to be drawn through the slit 59. The suction caused by the five columns effectively creates a fluid barrier barrier. The splint 598 can be used to prevent an object from slipping, or to move or rotate the object, as appropriate. Figure 5f is a schematic cross-sectional view of another embodiment of a fluid processing apparatus for achieving dynamic isolation by applying local fluid aspiration at the circumference of a double plane. Here, physical isolation is merged with dynamic isolation. Platforms 560 and 560a define a cavity therebetween, wherein upper platform 56A can be moved up 115485.doc -34-200816294 to enable loading and unloading of objects to be processed. The platform 560a is provided with an extension that forms a corner against the remainder of the platform against the spacer 599 (e.g., an ankle ring). By using a seal "❹, the interior space of the double-sided platform is isolated from the external space, thus preventing, for example, toxic gases, and further the inlet 590a is provided in the extension of the platform 560a and is expected to be at the edge of the object 10 being placed Oppositely, the inlet 5 is used to extract a local fluid under the action of a vacuum force, establishing a circumferential dynamic isolation between the upper and lower air surfaces of the air cushion environment. Figures 6a to 6d illustrate some of the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT Several embodiments of fluid handling & preparation of a multi-zone non-contact platform. Figure 6a illustrates a non-contact transport platform having a fluid processing zone (shown at the center of the figure). Passing the platform 62 and the platform 620a (both are non-contact platforms), and the fluid processing platform is between the platform 620 and the platform 620a. The pressurized air supply 622 feeds the platform "❹, then the pressurized air supply 622a feeds the platform 62〇a to establish a pA type transport zone. The pressurized fluid supply port 632 is fed to the fluid processing platform, and the extraction port 633 draws fluid from the fluid processing platform to create a pv-type fluid treatment zone. A suction channel 631 can be provided to extract any residual fluid to prevent contamination and can also be considered as a transport platform 62〇, 62〇a for the loading and unloading portions of the configuration. Since the substrate 1 〇 self-loading position reaches the unloading position by locally applying the central portion of the fluid processing process with respect to 10, the fluid processing process is dynamically performed. Figure 6b illustrates a fluid handling apparatus similar to that described above (Figure 6a), but with mechanical wheel transporters 640, 640a so that only the fluid handling zone is a non-contacting platform. 115485.doc -35- 200816294 Figure 6c illustrates a non-contact device similar to that of Figure 6a, but having a plurality of continuous fluid processing zones (650, 660, 670) that can, for example, provide the necessary or desired different types of fluid processing. 680). Various fluid treatments can include, for example, physical cleaning, chemical cleaning, water washing, drying, and other processes involving fluid processing, including thermal platforms for heating or cooling the traveling substrate. Figure 6d illustrates the details of a closed loop of one of the fluid treatment zones, which is not based on a fluid buffer but also creates a dynamic closed environment. In the fluid treatment chamber 690, fluid is introduced through conduit 692 and extracted through extraction passage 693 without being used as a fluid cushion. The object can be independently supported by a non-contact support platform or by a solid support. Figures 7a through 7g illustrate several alternative movements of a fluid handling device relative to an object being processed in accordance with some preferred embodiments of the present invention. Figure 7a illustrates a fluid processing apparatus having a substrate supported (contacted) by a rotating table equipped with a floating fluid processing unit. The stage 710 (e.g., the vacuum table) that physically supports the object 10 can be provided with a rotational motion, one of which floats over a relatively wide stationary fluid handling bridge 712 above the object 10 (the top surface of which is being processed). Figure 7b illustrates a fluid processing apparatus having a substrate supported (contacted) by a rotating table equipped with a fixed fluid processing unit. Here, the support table 720 can also rotate. A stationary hard fluid treatment bridge 722 is secured over the object 10 (the top surface of which is being processed). Figure 7C illustrates a fluid processing apparatus in which the substrate is supported by a non-contact stationary platform. The non-contact stationary platform 730 supports the object 1〇. A stationary hard fluid handling bridge 732 is secured over the object 10 (the top surface of which is being processed). This '115485.doc -36- 200816294 circle) keeps the contact at the edge, and is rotated by a relative rotation with a circular object ιο (for example, a wheel drive 73 8 . Figure 7d illustrates a fluid processing device in which the substrate is The non-contact rigid fluid processing bridge 742 provides a linear drive for the gantry support. Here, the top surface of the object 10 is treated linearly. Figure 7e illustrates a fluid handling apparatus having a rectangular, stationary, non-contact support platform. The substrate 10 is linearly transported above the platform. A stationary hard fluid processing bridge 752 is secured over the travel substrate 1 ,, wherein a portion of the substrate 10 below the fluid processing bridge receives fluid processing. Figure 7f illustrates a rectangle A fluid processing apparatus is provided having a traveling rigid fluid handling bridge 762 and a stationary non-contacting platform 76 for supporting the substrate 1 (which remains stationary during the process). Figure 7g illustrates a rectangular disposed fluid treatment Apparatus having a traveling fluid handling bridge 772 (having a local fluid treatment 774 that is movable along the bridge) and having a support for The stationary non-contact platform 77A of the substrate 1 (which remains stationary during the process). This arrangement allows for point-to-point fluid processing, such as a cleaning unit that removes the identification particles after the information about the particle position is collected by the optical inspection system. Figures 8a and 8b illustrate a dynamic closure concept in accordance with some preferred embodiments of the present invention. Figure 8a illustrates a dynamic closed environment for a stationary fluid processing device 8

concept. The non-contact support platform 11 is intermittently provided with a pressurized fluid outlet and an extraction inlet 134 which promotes a reversible fluid handling unit covering 11 gentlemen 4*丄-balanced 8〇1 Π 5485.doc -37- 200816294 The length 805 between a and b is locally balanced with respect to the mass flow, whereas dynamic isolation is applied at the edge of the object 10 using a vacuum slot (or injection slot, depending on the type of dynamic isolation selected) 820. Figure 8b illustrates the concept of a dynamic closed environment with respect to a fluid handling device 85A traveling on a stationary substrate. Here, the support platform 83A is only used to support the substrate 10', however the traveling fluid processing bridge 840 is dynamically isolated at the edge (842) to form an effective closed chamber 841 in which the fluid processing process is performed. FIGS. 9a-9c A number of enclosed fluid treatment devices for ambient isolation in accordance with some preferred embodiments of the present invention are illustrated. Figure 9a illustrates a fluid handling device 9〇2 having a drain chamber. The non-contact fluid processing platform 11 for the pedestal substrate 1 〇 is enclosed in the outer casing 920 and supported by the support 922. Excess fluid is discharged through the drain 924. Figure 9b illustrates a fluid processing apparatus 904 having a drain chamber merged with a fluid processing platform. The fluid treatment platform 110 merges with the outer casing leaving the side drain channels connected to the drain 944. Optionally, the platform 11 is provided with a landing mechanism 946 (for loading and unloading the substrate 1) or it can be applied to the center or edge of the platform. Figure 9c illustrates an isolated double-sided fluid processing chamber device 906 having a drain. Here, two relatively non-contact support platforms 110, 110a (PV or PP type) integrated into the outer casing are provided, wherein the outer casings are each comprised of two opposing portions 960 and 960a that can be brought together to form a closed environment. Here, the lower half of the device (110+960) can be moved up and down (970) to load and unload the object 10, while the upper half of the device (110a+960a) is fixed. When the object 10 is treated internally in 115485.doc -38-200816294, the seal 962 ensures that no liquid or gas (which may have flaws) 3⁄4 leaks out of the casing and ensures that the object cannot be removed. Each of the fluid handling platforms may include physical isolation (966a) or dynamic isolation (966b), as appropriate. Figure 10 illustrates a general view of the overall system setup of a circular fluid processing apparatus 1000 in accordance with a preferred embodiment of the present invention. The device shown is a single-sided circular non-contact fluid handling platform primarily for use in wafer applications (or similar applications for round flat and thin objects). Here, the fluid processing process is performed by the bottom surface of the object (when the wafer is supported without contact, for example, the supporting fluid cushion at the patterned surface of the wafer (back side of the wafer)) . This fluid processing is performed in a gap (8) between the object 10 and the platform 110. As shown in the previous figures, the object can be rested by 11G (thus restraining or clamping the element to prevent lateral movement) or being rotated. Any other details that must be described earlier in the figure can be related to device 10(8). The pressurized fluid supply port 12G and the draw 13G (respectively) supply fluid to the apparatus 1000 and the self-exertion 1000 to extract fluid and the supply port 12 and the extraction port are connected to the common control box 1010. The common control box 1〇1〇 can perform several functions. Some functions can be: control pressure and low pressure level, manage fluid, timing, thermal management (for example, operating heater 1〇20 or supplying preheating fluid to heat assisted process) ), sensing, communicating with an external controller or other component of the device's global manufacturing process. Figure 11 illustrates a circular fluid at another preferred embodiment of the invention in accordance with the present invention. Also prepared for the entire system of 1100 set up the general map of Dong. The device shown in the figure is a single-sided non-contact fluid processing device, I_ Μ mouth and w 〒 on the top surface of the substrate 10 applied 115485.doc -39- 200816294. Fluid processing is performed locally by a fluid handling bridge i 125 that is fixed (or floated) over the object 10 (coupled to the base 1120 that includes the fluid supply and extraction channels). The wheel drive 1130 rotates the object 1〇, thus facilitating coverage of the entire top surface of the object. The object 1 is supported by a non-contact platform 11 制 during the process, wherein the platform is connected to the supply and extraction ports 120, 130 to the common control box 1110 (same as 1010). The platform 可1〇 can be operated by using an air cushion or by using any other inert fluid (liquid or gas). Figure 12 illustrates a general view of the overall system rectangular arrangement of a fluid processing apparatus 1200 in accordance with another preferred embodiment of the present invention. The apparatus is similar to the apparatus 1 wherein a substrate 10 is statically held from a bottom surface of the substrate 1 by a fluid cushion (generated by the platform 110) and the fluid cushion is also applied to a bottom surface of the substrate 1 Process. The common control box 121〇 (same as 1〇1〇) is connected to the platform 11〇 via the ports 120 and 130. Figure 13 is a general view showing the entire rectangular configuration of a fluid processing apparatus 130 in accordance with another preferred embodiment of the present invention. In this arrangement, a fluid cushion (e.g., an air cushion) generated by the flat chamber 11 静止 holds the substrate 1 (e.g., FPS glass) from the bottom surface of the substrate 1 , wherein a traveling fluid processing bridge 1330 is provided. The top surface of the stationary substrate 10 is processed. The common control box 1310 (same as 1〇1) is connected to the platform 110 via the 埠12〇 and 埠130 and is also connected to the fluid handling bridge 1330 suspended by the linear drive support 1320 (to control process and motion), thus fluid handling Bridge 133 is traveling over substrate 1 to achieve the process. Figure 14 is a general view showing the entire system rectangular arrangement of a fluid processing apparatus 1400 in accordance with another preferred embodiment of the present invention. The substrate 10 travels on the platform 110 115485.doc -40- 200816294 (toward the unloading area lla). The linear transporter 1420 transports the substrate 10 on the platform while the substrate 10 is also supported by an air buffer created by 110 and 110a. One of the central portions of the platform is designated as a fluid processing zone 143 0 (see also, for example, Figures 6a, 6b, and 6c). A common control box 1410 (same as 1) is connected to the fluid processing zone and to the entire flat' to facilitate non-contact support of the traveling substrate 1 and acts on the substrate 1 at the designated area 1430. Part of the fluid treatment of the bottom surface. When the substrate 1 is driven by the transport 1420 to move on the platform, the process is implemented on the entire bottom surface of the substrate 10. Figure 15 illustrates a general view of the overall system rectangular arrangement of a fluid processing apparatus 1500 in accordance with another preferred embodiment of the present invention. This is in fact a mixture of the devices shown in Figures 13 and 14. Linear transporter 1520 (same as 1420) transports substrate 1 on support flat 110, wherein a fluid treatment is provided on the top surface of substrate 1 by a stationary fluid processing bridge 1530. The platform ι1〇 and the bridge 153〇 are connected to the common control box 1510 (same as 1〇1〇). Figure 16 illustrates a multi-station fluid processing system in accordance with a preferred embodiment of the present invention. The object to be processed is transported from one workstation to the next. The workstations are various fluid handling devices. Loading plate 161 receives the object and transports the object to workstation 162 (e.g., 'back mechanical cleaning') on transporter 1699a (transporter 1699a and similar transporters 1699b through 1699f preferably non-contact transporters). The object is then transported on the transporter 1699b to the workstation 1630 (e.g., front side chemical cleaning). The object is transported from the workstation 1630 to the workstation 164 (eg, heat treated) on the transporter 1699c. It is then transferred to the workstation 1650 on the transporter 1699d (eg, final 115485.doc -41 - 200816294 water wash or drying station), after which the object is transferred to the unloading plate 1660 on the transport device 169%, thus completing the fluid treatment . The unloading plate 166A may be provided with a process control member to make it possible, if necessary, to repeat the process by the conveyor 1699f. It is generally noted that according to the present invention, support for an object to be processed can be achieved by the same fluid processing platform or by a dedicated support platform. The fluid cushion can be accurately controlled, and it can be set to any value that varies within a range of several tens of micrometers to several millimeters for many practical reasons (the present invention is not limited to the equivalent). The fluid cushion can be used for support, for processing or for support and handling. In a preferred embodiment of the invention, the fluid is switchable from a gas to a liquid during the action and is switched from an inert fluid to an active fluid. In some preferred embodiments of the invention, fluid handling equipment in accordance with the present invention may use different types of fluids for different types of fluid treatment. The fluid processing process of the present invention may be a wet or dry surface cleaning (back and/or front surface) of a substrate similar to a stone wafer or FPD glass without detracting generality, wherein a cleaning process may be performed Essentially - a cleaning process, or a cleaning process in which the force 4 is applied to the adhesive particles to remove it, as well as washing and drying. The fluid treatment is exemplified by an etching and chemical planarization process in which a layer is etched from the surface of the substrate and a coating process such as electrolytic coating. . . Some of these processes may be thermally enhanced by including a heater and/or fluid heating module in a platform structure. 115485.doc -42 - 200816294 The fluid used in the fluid treatment process can be, for example, SC-1, SC-2, Piranha, HF, NF3, CF4, HC1 (with wet wash or without derogation generality). Dry cleaning, associated with UPDI rinsing), chemicals like CF4, HF, H3P04, ΗΝ03 (associated with etching) and Cus〇4, H2S〇4 (associated with wet or dry copper coating). The materials of construction for the fluid treatment apparatus associated with the present invention should be selected relative to the particular chemical used in the process. In the absence of derogation generality, 'typical construction materials can be similar to stainless steel 3丨6, Hastelloy, nickel-based alloys, titanium-based alloys, nickel-coated metals or polymers such as fluoropolymers. Non-generic materials (similar to PTFE, FEP, PFA), elastomers similar to those used in males, sealed Vit〇I1, Kalrez, Chemraz, and ceramic materials like alumina, SiC, and quartz. It is apparent that the description of the embodiments and the drawings set forth in the specification are only for the purpose of understanding the invention and not limiting the scope of the invention. It is also apparent to those skilled in the art that the drawings and the above-described embodiments may be modified or modified by the present invention. In addition, the details and features described in connection with the embodiments illustrated herein with reference to the drawings herein may be <RTI ID=0.0> BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic cross-sectional view of a fluid processing apparatus having a single-sided non-contact support platform in accordance with some preferred embodiments of the present invention. Figure 2 illustrates a schematic cross-sectional view of a fluid processing apparatus having a double-sided non-contact support platform in accordance with some preferred embodiments of the present invention. 3 illustrates a schematic cross-sectional view of a fluid processing apparatus in which a substrate is in contact with a support platform of 115485.doc-43 - 200816294, in which the object to be processed is squeezed by a support, in accordance with some preferred embodiments of the present invention. The pressure on the surface of the building is maintained. Figures 4a through 4e illustrate some configurations and orientations of fluid processing apparatus in accordance with some preferred embodiments of the present invention. Figure 4a is a schematic cross-sectional view of a basic fluid processing apparatus having a double-sided non-contact support platform in a vertical direction. Figure 4b is a schematic cross-sectional view of a basic fluid processing apparatus having a single-sided, non-contact support platform in a vertical direction. r C. Figure 4c is a schematic cross-sectional view of a basic fluid processing apparatus having a single-sided, non-contact support platform with an upside down orientation. Figure 4d is a schematic cross-sectional view of a basic fluid processing apparatus having a undulating non-contact support surface. Figure 4e is a schematic cross-sectional view of a basic fluid processing apparatus having two substantially vertical non-contact abutment surfaces. Figures 5a through 5f illustrate several sealing options for a fluid processing apparatus in accordance with some preferred embodiments of the present invention. Figure 5a is a schematic cross-sectional view (partial view of an edge region of the platform) for isolating a fluid-buffered-isolated contact seal between a cleaning platform and a substrate of a fluid handling device having a single-sided non-contact support platform. Figure 5b is a schematic cross-sectional view of a contact seal for the isolation of a cleaning platform and a substrate of a fluid handling device having a dual non-contact support platform (the edge region of the platform) Partial view). Figure 5c is a schematic illustration of contact closure for a fluid cushion 115485.doc 44-200816294 for isolating a fluid treatment e with a double # + π ^ F contact support platform and another embodiment of cleaning cleaning Sex cross-sectional map). < Part of the edge region Figure 5d is a view of the circumference of the device (partial view of the edge region of the platform) by applying a local fluid injection to the single-sided non-contact branch. Schematic cross-sectional view of the circumference of the device of the unintentional cross-sectional view of the platform. Figure 5e shows a partial view of the edge region by applying local fluid extraction at a single-sided non-contact branch. ). Circumferential cross-sectional view of the apparatus of the table Figure 5f shows the dynamic isolation (partial view of the edge region of the flat chamber) by suction with a double-sided non-contact support flat = μ with adjacent fluid. Figures 6a through 6d illustrate several embodiments of a multi-zone non-contact platform of a f-face fluid processing apparatus in accordance with the present invention. Figure 6a illustrates a platform for a fluid handling apparatus having a non-contact transporter and a central non-contact fluid handling zone wherein the substrate is transported during processing.

Figure 6b shows a platform of a fluid processing apparatus having a mechanical wheel transporter and a central non-contact fluid treatment zone, wherein the substrate is transported during the process. Figure 6c has a non-contact carrier and A platform for a fluid processing apparatus having a plurality of continuous fluid processing zones, wherein the substrate 0 is transported during processing. Figure 6d illustrates details of a closed loop of one of the fluid processing zones. Figures 7a through 7g illustrate several alternative movements of a top surface fluid processing platform relative to the configuration of the substrate to be processed 115485.doc-45-200816294. Figure 7a illustrates a fluid processing apparatus having a substrate supported (contacted) by a rotating table equipped with a floating fluid processing bridge. Figure 7b illustrates a fluid processing apparatus having a substrate supported (contacted) by a rotating table equipped with a fixed fluid processing bridge. Figure 7c illustrates a fluid processing apparatus having a substrate supported (not in contact) by a rotating table equipped with a fixed fluid processing bridge. Figure 7d illustrates a fluid processing apparatus having a substrate supported (not contacted) by a fixed stage equipped with a linearly moving fluid handling bridge. Figure 7e illustrates a rectangular configuration of a fluid processing apparatus having a transported substrate supported by a non-contact platform and having a fixed fluid processing bridge. Figure 7f illustrates a rectangular configuration of a fluid processing apparatus having a fixed substrate supported by a non-contact platform and having a linearly moving fluid handling bridge. Figure 7g illustrates a fluid processing apparatus of a rectangular configuration having a fluid processing unit movable on a fixed substrate supported by a non-contact platform and moving in two lateral directions. Figures 8a and 8b illustrate a dynamic closed environment concept. Figure 8a illustrates the concept of a dynamic closed environment with respect to a stationary back fluid handling apparatus having a stationary substrate. Figure 8b illustrates the concept of a dynamic closed environment suitable for use in a top surface fluid handling mobile bridge in which a stationary substrate is supported by a non-contact platform. Figures 9a through 9c illustrate a plurality of housings for fluid isolation of the fluid treatment apparatus. H5485.doc-46-200816294 Figure 9a illustrates a fluid processing chamber having a drain. Figure 9 is a fluid processing chamber having a drain channel merged with a fluid handling platform. Figure 9c illustrates an isolated double-sided fluid processing chamber having a drain. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A is a general view showing a back surface fluid processing apparatus in accordance with a circular configuration of a preferred embodiment of the present invention. Figure 11 illustrates a general view of a frontal fluid processing apparatus in a circular configuration in accordance with another preferred embodiment of the present invention. Figure 12 illustrates a general view of a backside fluid processing apparatus in a rectangular configuration in accordance with another preferred embodiment of the present invention. Figure 13 illustrates a general view of a frontal fluid processing apparatus in a rectangular configuration in accordance with another preferred embodiment of the present invention. Figure 14 illustrates a general view of a backside fluid processing apparatus in a rectangular configuration in accordance with another preferred embodiment of the present invention. Figure 15 illustrates a general view of a frontal fluid processing apparatus in a rectangular configuration in accordance with another preferred embodiment of the present invention. Figure 16 illustrates a multi-station fluid processing system in accordance with a preferred embodiment of the present invention. Figure 17 schematically illustrates a typical SASO nozzle. [Main component symbol description] 1 Pipe 2 Entrance 3 Exit 4, 4a Array 115485.doc -47- 200816294 5, 5a 6 ^ 6a 7 10, 10a, 10b 11 , 16 , 842 12 14 100 ^ 200 > 300 ( 101 110, 210 \ 210a, 310, 410 > 410a, 540 110a 112 120 > 220 '220a ' 320 , 632 122 124 130 , 230 > 230a, 330 , 633 132 134 370 , 420 > 440 ' 510 , 520 > 520a, pipe wall full flow core flow object (substrate) edge back surface relative surface equipment basic unit non-contact platform unloading zone (non-contact support platform) effective surface pressurized fluid supply 埠 pressure manifold flow restrictor (pressurized fluid Outlet) extraction 埠 extraction manifold flow restrictor (extraction inlet) platform 115485.doc -48- 200816294 530, 530a, 550, 560, 560a, 620 > 620a 380 vacuum 埠 382 manifold 384, 590a inlet 411, 421, 431 holder 430 non-contact support platform 450, 630 '690 fluid treatment platform 570 sealing tape 580 edge nozzle 590 vacuum slit 598 splint 599 isolation strip 622, 622a pressurized air for 631 suction groove 640 ^ 640a mechanical wheel transport device 650 > 660 ^ 670 > fluid treatment zone 680, 1430 692 pipe 693 extraction channel 712, 722 '732 ' fluid treatment bridge 742, 752 '762, 772, 840, 1125, 115485.doc -49- 200816294 1330 > 1530 738, 1130 wheel drive 774, 801 fluid handling unit 800, 850, 902, 904 > 1000, 1100, 1200, 1300, 1400, 1500 fluid handling equipment 805 length f 820 vacuum Slot 830 support platform 841 closed chamber 906 fluid processing chamber device 920 housing 922 support 924 > 944 drain 946 landing mechanism l 960 ^ 960a portion 962 seal 966a solid isolation 966b dynamic isolation 1210, 1310, 1510 common control box 1320 Linear drive support 1420, 1520 linear transport 1699a, 1699b, 1699c, 1699d, 1699e, 1699f transport 115485.doc -50-

Claims (1)

200816294 X. Patent Application Range: 1 · A non-contact support device for fluid treatment of a stationary or traveling object and supporting the object by fluid cushion inductive force without contact, the device comprising: having a support surface At least one of the two substantially opposite non-contact platforms, each support surface comprising at least one of a plurality of base units, the parent unit having at least one of a plurality of dust outlets and a plurality of fluid extractions At least one of the channels, each of the pressure outlets Fluidly coupled to a high pressure fluid supply by a flow restrictor that provides pressurized fluid to create a pressure sensing force for maintaining a fluid cushion between the object and a support surface of the platform, The flow restrictor is characterized by a fluid returning bouncing behavior; each of the at least one of the plurality of fluid extraction ramps having a population and an outlet for locally balancing the at least one of the plurality of base units The mass flow rate of one of the platform support surfaces including at least one or more of the basic units is designated as a treatment zone connected to a fluid reservoir, and the cough fluid misplacer provides treatment through the pressure outlet The body (4) required for the object is drawn through the fluid extraction channels. 2.= Clear item! The device' includes two relatively flat, π-T having a support surface, at least one of the two opposing platforms. A limitation of the surface of the abutment i 115485.doc 200816294 4. The device of the request, wherein at least one of the treatment zones, is spread over the entire support surface of one of the two opposing platforms. 5. If the equipment of the requester's at least one of the plurality of withdrawal channels is maintained at an ambient pressure. The apparatus of month 1 wherein the inlet of the at least one of the plurality of extraction channels is maintained at a low pressure (vacuum) condition. 7. The device of the item is called the item, and a flow limiter is further provided in each of the extraction channels. The C ^ month claim 1 is further provided with the flow restrictor comprising a fluid conduit having an inlet and an outlet, the conduit having a plurality of rows mounted on the inner wall of the conduit in a displacement manner in the two columns The fins are such that the boundary entangles the cavity between the fins and the fins of the second column are placed opposite each cavity. 9. The device of claim 1, wherein the at least one support surface is flat. The device of claim 1, wherein the at least one support surface is curved. 11. The device of claim 1, wherein the device has a circular configuration. 12. The device of claim 1, wherein the device has a rectangular configuration. 13. The device of claim 1, wherein the fluid required to process the object is also used to support the object in the form of a fluid cushion. 14. The apparatus of claim 1, further comprising a heater for heating the treatment fluid or for heating the fluid cushion. 16. As claimed in the device, one or more of the processing zones are provided on either side of the object 115485.doc 200816294. The device of claim 1, wherein the isolation is provided to isolate one or more processing zones on the object. 18. The device of claim 17, wherein the isolation comprises physical isolation. 19. The device of claim 17, wherein the isolation comprises dynamic isolation provided by the fluid moving component. 20. The device of claim 19, wherein at least one of the two substantially opposing platforms has a peripheral inlet that is dynamically isolated by the fluid extraction member. The apparatus of claim 19, wherein at least one of the two substantially opposite platforms has a peripheral outlet that is dynamically isolated by the fluid injection member. 22. The device of claim 19, wherein the dynamic isolation produces a dynamically closed fluid processing environment. 23. The device of claim 1 further comprising a mechanism. 24. The device of claim 1 further comprising a sealed outer casing. The device of claim 24, wherein the sealed housing further comprises an opening mechanism for permitting loading or unloading of the object. 26. The apparatus of claim 1 coupled to a transporter for transporting the object on the apparatus. 27. The device of claim 26, wherein the transporter is mechanical. 28. The device of claim 27, wherein the system is further supported by a fluid buffer 支撑 support force. 29. The device of claim 1, wherein the processing zones are merged with a bridge. 115485.doc 200816294 where the bridge is mobile. Wherein the processing zones are movable on the bridge. 32. The device of claim 29, wherein the bridge is adapted to float on the object. 33. As requested by the device', a drive system is provided to facilitate a relative movement between the processing zones and the object. 34. The device of claim 33, wherein the drive system provides a linear motion. 35. The device of claim 33, wherein the drive system provides a circular motion. 36. The device of claim 33, wherein the drive system includes a holder for clamping the object. 3 7 _If you ask for it! It is not ready, it further has a common control box for controlling the operation of the device. 3. The device of claim 29, wherein the device of claim 37 is the device of claim 37, wherein the common control box is adapted to control at least some of: the supply of the processing fluid , heating, pressure control 'change in the distance between the object and the at least one of the two substantially opposite surfaces, switching of the treatment fluid, transporting the object, loading and unloading of the object. 39. The device of claim 37, wherein the common control box is adapted to control a multi-stage fluid processing process. 40. The apparatus of claim 1 which is provided in a plurality of workstations forming a multi-station fluid processing line. 41. A method for non-contact fluid treatment of a stationary or traveling object and supporting the object by a fluid cushion inductive force without contact. The method comprises: 115485.doc 200816294 providing a device comprising At least one of two substantially opposite non-contact platforms having a support surface, each support surface comprising at least one of a plurality of basic singles, each unit having at least one of a plurality of pressure outlets and a plurality At least one of the fluid extraction passages each of the pressure outlets is fluidly coupled to a high pressure fluid supply via a flow restrictor, the pressure outlets providing pressurized fluid for generating a a pressure sensing force of the fluid cushion between the support surfaces, the flow restrictor characteristically exhibiting a fluid return spring behavior; each of the at least one of the plurality of fluid extraction passages having an inlet and an outlet for use Mass balancing the mass flow of the at least one of the plurality of basic units, wherein the platform supports the surface of the At least one or more zones of the base unit are designated as a treatment zone coupled to a fluid reservoir, the fluid reservoir providing a process fluid required to treat the object through the pressure outlet and withdrawing fluid through the fluid extraction channels; The objects are placed against the processing zones; and the processing zones are used to apply and remove processing fluid from the processing fluid. The method of claim 41, wherein the fluid cushion is of a pA type. 43. The method of claim 41, wherein the fluid cushion is a sputum type. The method of claim 41, wherein the fluid cushion is of a PP type. The method of claim 41, wherein the fluid cushion maintains the object at less than 1 mm from the at least one of the two support surfaces. The method of claim 41, wherein the fluid cushion maintains the object at 115485.doc 200816294 mm. A method of claim 41, wherein the fluid cushion has an adjustable gap provided by a pressure introduced to the air buffer dam by a method of controlling the at least one of the two tower surfaces to be less than 〇 1 47. 48. The method of claim 41, wherein the system is processed on one side. 49. The method of claim 4, wherein the system is processed on two sides. The method of claim 41, wherein the processing fluid is switched. The method of claim 41, wherein the treatment fluid switches the inert fluid. The method of claim 41, wherein the treatment fluid is a gas. The method of claim 41, wherein the treatment fluid is a liquid. 115485.doc