TW200815915A - Photosensitive resin composition and bump for controlling liquid crystal alignment using the same - Google Patents
Photosensitive resin composition and bump for controlling liquid crystal alignment using the same Download PDFInfo
- Publication number
- TW200815915A TW200815915A TW096121573A TW96121573A TW200815915A TW 200815915 A TW200815915 A TW 200815915A TW 096121573 A TW096121573 A TW 096121573A TW 96121573 A TW96121573 A TW 96121573A TW 200815915 A TW200815915 A TW 200815915A
- Authority
- TW
- Taiwan
- Prior art keywords
- photosensitive resin
- resin composition
- liquid crystal
- mass
- bump
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 47
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 28
- 239000012860 organic pigment Substances 0.000 claims abstract description 32
- 239000000654 additive Substances 0.000 claims abstract description 3
- 230000000996 additive effect Effects 0.000 claims abstract description 3
- 210000002858 crystal cell Anatomy 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 11
- 239000003999 initiator Substances 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- 238000002156 mixing Methods 0.000 abstract description 3
- 230000001788 irregular Effects 0.000 abstract 1
- -1 ethyl imino group Chemical group 0.000 description 33
- 239000000049 pigment Substances 0.000 description 25
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 239000000178 monomer Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000003822 epoxy resin Substances 0.000 description 10
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 10
- 229920000647 polyepoxide Polymers 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 150000002576 ketones Chemical class 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 229920005596 polymer binder Polymers 0.000 description 8
- 239000002491 polymer binding agent Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002270 dispersing agent Substances 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 4
- 229920000058 polyacrylate Polymers 0.000 description 4
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- VFZKVQVQOMDJEG-UHFFFAOYSA-N 2-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(=O)C=C VFZKVQVQOMDJEG-UHFFFAOYSA-N 0.000 description 3
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 3
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 125000004386 diacrylate group Chemical group 0.000 description 3
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 150000003077 polyols Chemical class 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 238000003971 tillage Methods 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- BVQVLAIMHVDZEL-UHFFFAOYSA-N 1-phenyl-1,2-propanedione Chemical compound CC(=O)C(=O)C1=CC=CC=C1 BVQVLAIMHVDZEL-UHFFFAOYSA-N 0.000 description 2
- IAKGBURUJDUUNN-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)-3-methylbutane-1,4-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(C)C(CO)(CO)CO IAKGBURUJDUUNN-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 2
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 2
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 2
- DAWJJMYZJQJLPZ-UHFFFAOYSA-N 2-sulfanylprop-2-enoic acid Chemical compound OC(=O)C(S)=C DAWJJMYZJQJLPZ-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- NUPSHWCALHZGOV-UHFFFAOYSA-N Decyl acetate Chemical compound CCCCCCCCCCOC(C)=O NUPSHWCALHZGOV-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- HECSYBOCQUVICI-UHFFFAOYSA-N [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1(=CC=CC=C1)NN Chemical group [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1(=CC=CC=C1)NN HECSYBOCQUVICI-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000007519 polyprotic acids Polymers 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- 239000000052 vinegar Substances 0.000 description 2
- 235000021419 vinegar Nutrition 0.000 description 2
- JVHKVSDTBQCQHB-UHFFFAOYSA-N (2-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(O)(C)COC(=O)C=C JVHKVSDTBQCQHB-UHFFFAOYSA-N 0.000 description 1
- XLYMOEINVGRTEX-ONEGZZNKSA-N (e)-4-ethoxy-4-oxobut-2-enoic acid Chemical compound CCOC(=O)\C=C\C(O)=O XLYMOEINVGRTEX-ONEGZZNKSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- YEYQUBZGSWAPGE-UHFFFAOYSA-N 1,2-di(nonyl)benzene Chemical compound CCCCCCCCCC1=CC=CC=C1CCCCCCCCC YEYQUBZGSWAPGE-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- CRSWJOWOXRBLSG-UHFFFAOYSA-N 1-(2-butylphenyl)-2,2,2-trichloroethanone Chemical compound CCCCC1=CC=CC=C1C(=O)C(Cl)(Cl)Cl CRSWJOWOXRBLSG-UHFFFAOYSA-N 0.000 description 1
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 description 1
- MQESVSITPLILCO-UHFFFAOYSA-N 1-(4-butylphenyl)ethanone Chemical compound CCCCC1=CC=C(C(C)=O)C=C1 MQESVSITPLILCO-UHFFFAOYSA-N 0.000 description 1
- VMCRQYHCDSXNLW-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2-dichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)Cl)C=C1 VMCRQYHCDSXNLW-UHFFFAOYSA-N 0.000 description 1
- HUDYANRNMZDQGA-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]ethanone Chemical compound CN(C)C1=CC=C(C(C)=O)C=C1 HUDYANRNMZDQGA-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- LTSWUFKUZPPYEG-UHFFFAOYSA-N 1-decoxydecane Chemical compound CCCCCCCCCCOCCCCCCCCCC LTSWUFKUZPPYEG-UHFFFAOYSA-N 0.000 description 1
- GNIJLZHYBVVHMA-UHFFFAOYSA-N 1-decoxypropan-2-ol Chemical compound CCCCCCCCCCOCC(C)O GNIJLZHYBVVHMA-UHFFFAOYSA-N 0.000 description 1
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- 238000010586 diagram Methods 0.000 description 1
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- SHZIWNPUGXLXDT-UHFFFAOYSA-N ethyl hexanoate Chemical compound CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- WHRIKZCFRVTHJH-UHFFFAOYSA-N ethylhydrazine Chemical compound CCNN WHRIKZCFRVTHJH-UHFFFAOYSA-N 0.000 description 1
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- 239000000796 flavoring agent Substances 0.000 description 1
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- 239000001530 fumaric acid Substances 0.000 description 1
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- 229940005650 monomethyl fumarate Drugs 0.000 description 1
- YWWNNLPSZSEZNZ-UHFFFAOYSA-N n,n-dimethyldecan-1-amine Chemical compound CCCCCCCCCCN(C)C YWWNNLPSZSEZNZ-UHFFFAOYSA-N 0.000 description 1
- GASFVSRUEBGMDI-UHFFFAOYSA-N n-aminohydroxylamine Chemical compound NNO GASFVSRUEBGMDI-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- LBUTZYAMPMBXPT-UHFFFAOYSA-N oxolane-2-carbonyl oxolane-2-carboxylate Chemical compound C1CCOC1C(=O)OC(=O)C1CCCO1 LBUTZYAMPMBXPT-UHFFFAOYSA-N 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229940110337 pigment blue 1 Drugs 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 229920005646 polycarboxylate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- GHJOIQFPDMIKHT-UHFFFAOYSA-N propane-1,2,3-triol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCC(O)CO GHJOIQFPDMIKHT-UHFFFAOYSA-N 0.000 description 1
- RLUCXJBHKHIDSP-UHFFFAOYSA-N propane-1,2-diol;propanoic acid Chemical compound CCC(O)=O.CC(O)CO RLUCXJBHKHIDSP-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- XZHNPVKXBNDGJD-UHFFFAOYSA-N tetradecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCOC(=O)C=C XZHNPVKXBNDGJD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- XOALFFJGWSCQEO-UHFFFAOYSA-N tridecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCOC(=O)C=C XOALFFJGWSCQEO-UHFFFAOYSA-N 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
Abstract
Description
200815915 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種感光性樹脂組成 塊(被設置在複數分割垂直配向方式的液: 使用此組成物所形成的液晶配向控制用凸 【先前技術】 通常,在晝面顯示影像資訊之影像顯 前為止,以布勞恩管顯示裝置(CRT)最常 為與其顯示面積比較時,其體積大且重, 便。因此,開發了顯示面積大但厚度薄、 鬆地使用之液晶顯示裝置(LCD),逐漸地 示裝置。 液晶顯示裝置,係使2片玻璃基板相 其間隙封入液晶而成的結構。在一側的玻 明的共同電極’在另一側的玻璃基板上係 數個透明的像素電極,同時形成用以對各 加電壓之電路。 但是,因為液晶顯示裝置係將上述結 進行顯示,所以會有視野角狹窄的問題。 為了擴大視野角,有提案IPS(板内 Switching)方式、VA(垂直配向;Vertical 等。但是即便在VA方式,顯示中間色調 晶係斜向地朝向相同方向,視野角亦會變 物,用以形成凸 I胞内),及關於 塊。 示裝置之中,目 被使用,但是因 使用時常感到不 在任何場亦可輕 取代布勞恩管顯 向地固定,並在 璃基板上形成透 矩陣狀地形成多 像素電極個別施 構夾入偏光板來 切換;In Plane Alignment)方式 的情況,因為液 為狹窄。 5 200815915 因此,為了消除VA方式在中間色調之視野角的問是 有提案(參照專利文獻 1)揭示一種MVA(多疇垂直配向 Multi-domain VA)方式。該方式係設有範脅控制手段, 得在施加電壓時,斜向配向之液晶的配向方向,在1像 内的不同範缚(domain),可以成為不同方向之方式。範 控制手段只要設置在2片基板中至少一側便可以,且至 一個範缚控制手段係具有斜面。又,具有斜面之範轉控 手段係設置有突起。 [專利文獻1]日本特開2004-252480號公報 【發明内容】 [發明所欲解決之問題] 但是,上述專利文獻1等所記載之範疇控制手段(液 配向劑)之突起,通常係無色。因此,在突起處,由於光 生亂反射,會產生顯示不均等的問題。 鑒於上述的課題,本發明的目的係提供一種感光性 脂組成物,用以形成一種能夠防止光的亂反射、且維持 介電常數之液晶配向控制用凸塊(以下亦稱為「凸 (b u m p)」);及提供使用此組成物所开》成的液晶配向控制 凸塊。 [解決問題之技術手段] 本發明者等為了解決上述問題,著眼於使液晶配向 制用凸塊吸收光而重複專心研究。結果,發現藉由在用 形成凸塊之感光性樹脂組成物中添加有機顏料來將凸塊 使 素 疇 少 制 晶 產 樹 低 塊 用 控 以 著 6 200815915 色,能夠解決上述課題,而完成了本發明。更具體地。本 發明係提供以下之物。 本發明之第一發明係一種感光性樹脂組成物,係用以 形成凸塊(被設置在複數分割垂直配向方式的液晶胞内,且 用來控制該液晶的配向)之感光性樹脂組成物,其含有有機 " 顏料(C)。 . 又,本發明之第二發明係一種液晶配向控制用凸塊, 係由前述感光性樹脂組成物所形成。 〇 [功效] 若依照本發明之感光性樹脂組成物,因為在感光性樹 脂組成物中含有有機顏料,由本發明的感光性樹脂組成物 所形成的液晶配向控制用凸塊能夠吸收光線、防止光的亂 反射。又,因為使用有機顏料,能夠形成介電常數低的凸 塊。 【實施方式】 I; [實施發明的較佳形態] 以下,說明本發明的實施形態。形成用以控制該液晶 的配向之凸塊之本發明的感光性樹脂組成物,含有有機顏 •料。 本發明之感光性樹脂組成物,藉由含有有機顏料,能 夠形成經著色的凸塊。因此,所形成的凸塊能夠吸收光線、 防止光的亂反射。又,因為使用有機顏料作為顏料,能夠 降低所形成凸塊的介電常數,又,能夠提升所形成凸塊的 7 200815915 形狀安定性。 [有機顏料(C)] 此種有機顏料可舉出例如在比色指數(C. I染色師及 著色師學會(The Society of Dyers and Colourists)公司發 行)分類為顏料的化合物,具體上,可以舉出附加下述的比 i 色指數(c.i.)號碼之物。 • C.I.顏料黃1(以下,「C.I.顏料黃」相同,只有記載號 碼)、3、11、12、13、14、15、16、17、20、24、31、53、 〇 55、 60、 61、 65、 71、 73、 74、 81、 83、 86、 93、 95、 97、 98、99、100、101、104、106、108、109、110、113、114、 116、 117、 119、 120、 125、 126、 127、 128 > 129、 137、 138、 139、 147、 148、 150、 151、 152、 153、 154、 155、 156 、 166 、 167 、 168 、 175 、 180 、 185 ; C . I ·顏料橙1 (以下,「C . I ·顏料橙」相同,只有記載號 碼)、5、13、14、16、17、24、34、36、38、40、43、46、 49 、 51 、 55 、 59 、 61 、 63 、 64 、 71 、 73 ; C . I ·顏料紫1 (以下,「C . I.顏料紫」相同,只有記載號 石馬)、19、23、29、30、32、36、37、38、39、40、50; C · I ·顏料紅1 (以下,「C · I ·顏料紅」相同,只有記載號 碼)、2、3、4、5、6、7、8、9、10、11、12、14、15、16、 17、18、19、21、22、23、30、31、32、37、38、40、41、 42 > 48 : 1、48:2、48:3、48:4、49: 1、49:2、50: 1 > 52: 1、53: 1、57、57: 1、 57:2、 58:2、 58:4、 60: 1、 63: 1、63:2、64: 1、81: 1、83、88、90: 1、97、101、 8 Ο u 又 含量以 200815915 102、 104、 105、 106、 108、 112、 113、 114 144、 146、 149、 150、 151、 155、 166、 168 172 > 174、 175' 176、 177、 178、 179、 180 188、 190、 192、 193、 194、 202、 206、 207 215 、 216 、 217 、 220 、 223 、 224 、 226 、 227 242 、 243 、 245 、 254 、 255 、 264 ' 265 ; C.I·顏料藍1(以下,「C.I.顏料藍」相同 碼)、2、15、15: 3、15: 4、15: 6、16、22、 c · I ·顏料綠-7、C . I.顏料綠-3 6、C . I.顏料 C·1·顏料棕23、C.I.顏料棕25、C.I.顏 顏料棕28 ; C·1·顏料黑1、C.I.顏料黑7。 又’有機顏料以組合使用至少2種以上 佳,以組合使用3種以上的有機顏料為更佳 色混合來形成黑色的方式來組合有機顏料為 上、或3種以上有機顏料來使顏色 為吸收之光的波長範圍變為廣闊,能夠更加 射0 有機顏料可舉出的較佳之物,有CI•顏 料红177、。丄顏料黃”9。從吸收光 ,以組合使用此等3種有機顏料中之2 以3種全部使用為特佳。 相對於溶劑以外的總固體成分,前 〕質量%以上60質量%以下為佳, 、122 、 123 、 、170、 171 、 ^ 185' 187 > > 208 > 209 > 、228 、 240 ' ,只有記載號 6 0、6 4、6 6 ; 綠-3 7 ; 14棕 2 6、C丄 的有機顏料為 。而且,以加 更佳。藉由組 成為黑色,因 防止光的亂反 料藍1 5 : 6、 、線> 而& ’在本 種以上為佳, 述有機顏料的 又1 5質量%以 9 200815915 上40質量%以下為更佳。藉由在上述範圍内,所形成的凸 塊’能夠得到需要的〇D值,同時亦能夠得需要的介電常 數0 作為將上述有機顏料分散於組成物中之分散劑,以使 用I乙亞胺系、胺曱酸乙酯(urethane)樹脂系、及丙稀酸樹 脂系的高分子分散劑為佳。 〇200815915 IX. Description of the Invention: [Technical Field] The present invention relates to a photosensitive resin constituent block (a liquid which is disposed in a plurality of divided vertical alignment modes: a liquid crystal alignment control convex formed using the composition [previously Technology] Generally, the Braun tube display device (CRT) is most large and heavy when compared with the display area before the image information of the image information is displayed on the side. Therefore, the display area is large. However, a liquid crystal display device (LCD) which is thin and loosely used is gradually shown. The liquid crystal display device is a structure in which two glass substrates are sealed with liquid crystal in their gaps. On the other side of the glass substrate, a transparent pixel electrode is formed, and a circuit for applying a voltage is formed at the same time. However, since the liquid crystal display device displays the above-mentioned junction, there is a problem that the viewing angle is narrow. Viewing angle, there are proposed IPS (Switching) mode, VA (Vertical Alignment; Vertical, etc.. But even in VA mode, display intermediate color The crystallizing system is oriented obliquely to the same direction, the viewing angle is also changed to form a convex I cell, and the block is used. The device is used, but it is often used in any field. Instead of the Braun tube, it is fixed in a conspicuous manner, and a multi-pixel electrode is formed on the glass substrate to form a multi-pixel electrode, and the polarizing plate is sandwiched and switched; in the case of the In Plane Alignment method, since the liquid is narrow. 5 200815915 Therefore, in order to eliminate the view angle of the VA method at the intermediate color tone, there is a proposal (see Patent Document 1) to disclose an MVA (Multi-domain Vertical Alignment Multi-domain VA) method. In this method, a mode control means is provided, and when the voltage is applied, the alignment direction of the liquid crystals in the oblique alignment can be different in the direction of the different domains within the image. The control means may be provided on at least one of the two substrates, and the one of the control means has a slope. Further, the vane turning control means is provided with a projection. [Problem to be Solved by the Invention] However, the protrusion of the category control means (liquid alignment agent) described in Patent Document 1 or the like is usually colorless. Therefore, at the protrusions, there is a problem that display unevenness occurs due to light reflection. In view of the above problems, an object of the present invention is to provide a photosensitive fat composition for forming a liquid crystal alignment control bump capable of preventing light reflection and maintaining a dielectric constant (hereinafter also referred to as "bump" ))); and providing liquid crystal alignment control bumps using the composition. [Means for Solving the Problems] In order to solve the above problems, the inventors of the present invention have focused on the fact that the liquid crystal alignment bumps absorb light and repeat the intensive research. As a result, it has been found that the above problem can be solved by adding an organic pigment to the photosensitive resin composition for forming a bump to reduce the number of crystal domains to a low crystal grain and to control the above-mentioned problems. this invention. More specifically. The present invention provides the following. The first invention of the present invention is a photosensitive resin composition for forming a photosensitive resin composition which is provided in a liquid crystal cell of a plurality of divided vertical alignment modes and used for controlling the alignment of the liquid crystal. It contains organic "pigment (C). Further, the second invention of the present invention is a liquid crystal alignment control bump formed of the photosensitive resin composition.功效 [Efficacy] According to the photosensitive resin composition of the present invention, since the photosensitive resin composition contains an organic pigment, the liquid crystal alignment control bump formed of the photosensitive resin composition of the present invention can absorb light and prevent light. Chaos reflection. Further, since an organic pigment is used, a bump having a low dielectric constant can be formed. [Embodiment] I; [Best Mode for Carrying Out the Invention] Hereinafter, embodiments of the present invention will be described. The photosensitive resin composition of the present invention which forms a bump for controlling the alignment of the liquid crystal contains an organic pigment. The photosensitive resin composition of the present invention can form colored bumps by containing an organic pigment. Therefore, the formed bumps can absorb light and prevent random reflection of light. Further, since the organic pigment is used as the pigment, the dielectric constant of the formed bump can be lowered, and the shape stability of the formed bump 7 200815915 can be improved. [Organic Pigment (C)] Such an organic pigment may, for example, be classified as a pigment in a colorimetric index (issued by The Society of Dyers and Colourists), and specifically, The item with the following i color index (ci) number is attached. • CI Pigment Yellow 1 (hereinafter, "CI Pigment Yellow" is the same, only the number is recorded), 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 55, 60, 61 , 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116, 117, 119, 120 125, 126, 127, 128 > 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175, 180, 185; I · Pigment Orange 1 (hereinafter, "C. I · Pigment Orange" is the same, only the number is recorded), 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46, 49, 51 , 55, 59, 61, 63, 64, 71, 73; C. I · Pigment Violet 1 (hereinafter, "C. I. Pigment Violet" is the same, only the record number is Shima), 19, 23, 29, 30, 32, 36, 37, 38, 39, 40, 50; C · I · Pigment Red 1 (hereinafter, "C · I · Pigment Red" is the same, only the number is recorded), 2, 3, 4, 5, 6, 7 , 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42 > 48 : 1, 48:2, 48:3, 48:4, 49: 1, 49:2, 50: 1 > 52: 1, 53: 1, 57, 57: 1, 57:2, 58:2, 58:4, 60: 1, 63: 1, 63:2, 64: 1, 81: 1, 83, 88, 90: 1, 97, 101, 8 Ο u The content is 200815915 102, 104, 105, 106, 108, 112, 113, 114 144, 146, 149, 150, 151, 155, 166, 168 172 > 174, 175' 176, 177, 178, 179, 180 188, 190, 192, 193, 194, 202, 206, 207 215, 216, 217, 220, 223, 224, 226, 227 242, 243, 245, 254 , 255 , 264 ' 265 ; CI·Pigment Blue 1 (hereinafter, “CI Pigment Blue” is the same code), 2, 15, 15: 3, 15: 4, 15: 6, 16, 22, c · I · Pigment Green -7, C. I. Pigment Green-3 6, C. I. Pigment C·1·Pigment Brown 23, CI Pigment Brown 25, CI Pigment Brown 28; C·1·Pigment Black 1, CI Pigment Black 7. Further, it is preferable that at least two or more kinds of organic pigments are used in combination, and three or more organic pigments are used in combination to form a black color in a more preferable manner, and the organic pigment is combined with three or more organic pigments to absorb the color. The wavelength range of the light becomes broad, and it is possible to more accurately emit organic pigments, and there are CI•Pigment Red 177.丄Pigment Yellow"9. From the absorption of light, it is particularly preferable to use 2 of these three kinds of organic pigments in combination, and it is particularly preferable to use all of the three kinds of organic pigments, and the total solid content other than the solvent, the former mass% or more and 60 mass% or less.佳, , 122 , 123 , 170 , 171 , ^ 185 ' 187 >> 208 > 209 > , 228 , 240 ' , only the record number 60 , 6 4 , 6 6 ; Green - 3 7 ; 14 Brown 2 6 , C 丄 organic pigment is. And, better to add. By the composition of black, because of the prevention of light chaos blue 1 5: 6, line > and & 'in this species Preferably, 15% by mass of the organic pigment is more preferably 40% by mass or less on 9 200815915. By the above range, the formed bumps can obtain the required 〇D value, and can also be obtained. Dielectric constant 0 As a dispersing agent for dispersing the above-mentioned organic pigment in the composition, it is preferred to use a polymer dispersant such as an ethyl imino group, an urethane resin or an acrylic resin. 〇
該等分散劑可舉出的有例如畢克化學(BYK Chemie) 股份公司製之商品名BYK-16卜162、163、164、166、170、 182、Avecia 公司製之商品名 solsperse S3 000、S9000、 S17000、 S20000、 S27000、 S24000、 S26000、 S28000 等。 前述有機顏料的含量,係調整成使由本發明的感光性 樹脂組成物所形成的凸塊之介電常數為7以下為佳,以調 配成為5以下為更佳。藉由調整在此範圍,能夠防止凸塊 在與電極接觸時產生短路等之不良情況。 又’前述有機顏料的含量係調整成使由本發明的感光 性樹脂组成物所形成的凸塊在膜厚度每1微米之〇D值為 〇·6以上為佳。若是在上述〇d值範圍内,能夠抑制在凸塊 中之光的亂反射。 本發明的感光性樹脂組成物可以是正型感光性樹脂組 成物,亦可以是負型感光性樹脂組成物。 «正型感光性樹脂組成物>> 本發明的感光性樹脂組成物係正型感光性樹脂組成物 時’除了上述有機顏料以外,亦含有鹼可溶性樹脂、及感 10 200815915 光劑。 上述驗可溶性樹脂可舉出例如紛趁清漆樹J3旨。 上述酚醛清漆樹脂,可舉出例如可以在間甲酚、對甲 酚、二甲苯酚、及三甲基苯酚等的酚類中,添加曱醛、及 甲醛和柳醛的混合醛,在酸觸媒下依照常用方法製造所得 到的酚醛清漆樹脂等。 上述感光劑可舉出例如含苯醌二疊氮基之化合物。該 含苯醌二疊氮基之化合物,可舉出:例如使萘醌-1,2 -二疊 氮-4-石黃酿鹵或秦酿-1,2-二豐氣-5-石黃酿鹵、與2,3,4-三經基 二苯基酮、2,3,4,4’ -四羥基二苯基酮等的聚羥基二苯基酮 類、或雙(4-羥基·3,5-二曱基苯基)-2-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-2-羥基苯基甲烷、雙(4-羥基·2,3,5· 三甲基苯基)-2·羥基苯基甲烷、雙(4-羥基-2,3,5-三甲基苯 基)-3-羥基苯基曱烷、雙(4-羥基- 2,3,5-三甲基苯基)-4-羥基 苯基曱烷、雙(4-羥基-2-曱基-5-環己基苯基)-3,4-羥基苯基 甲烷、雙(4-羥基-2-曱基-5-環己基苯基)-4-羥基苯基曱烷、 1-[1-(4-羥基苯基)異丙基]·4-[1,1-雙(4-羥基苯基)乙基]苯 等的三苯酚類,於三乙胺或三乙醇胺等的胺觸媒的存在 下,在二噚烷、7 · 丁内酯等有機溶劑中進行縮合反應,進 行完全酯化或部分酯化所得到的之物等。 <<負型感光性樹脂組成物>> 本發明的感光性樹脂組成物係負型感光性樹脂組成物 時,除了上述有機顏料以外,亦含有光聚合性化合物(Α)、 11 200815915 及光聚合引發劑(B)。 [光聚合性化合物(A)] 光聚合性化合物以具有乙稀性不飽和雙鍵之化合物為 佳。Examples of such a dispersing agent include, for example, BYK Chemie Co., Ltd., trade name BYK-16, 162, 163, 164, 166, 170, 182, trade name solsperse S3 000, S9000 manufactured by Avecia Corporation. , S17000, S20000, S27000, S24000, S26000, S28000, etc. The content of the organic pigment is adjusted so that the dielectric constant of the bump formed of the photosensitive resin composition of the present invention is preferably 7 or less, and more preferably 5 or less. By adjusting this range, it is possible to prevent the bump from being in a short circuit or the like when it comes into contact with the electrode. Further, the content of the above-mentioned organic pigment is adjusted such that the bump formed by the photosensitive resin composition of the present invention preferably has a 〇D value of 〇·6 or more per 1 μm of the film thickness. If it is within the above range of 〇d values, it is possible to suppress the disordered reflection of light in the bumps. The photosensitive resin composition of the present invention may be a positive photosensitive resin composition or a negative photosensitive resin composition. <Positive photosensitive resin composition> When the photosensitive resin composition of the present invention is a positive photosensitive resin composition, an alkali-soluble resin and a light-sensitive agent are contained in addition to the above organic pigment. The above-mentioned soluble resin can be exemplified by the varnish tree J3. The novolac resin may, for example, be a mixture of furfural, formaldehyde, and aldehyde in a phenol such as m-cresol, p-cresol, xylenol or trimethylphenol. The obtained novolak resin and the like are produced in accordance with a usual method under the medium. The sensitizer may, for example, be a compound containing a phenylhydrazine diazide group. The compound containing a phenylhydrazine diazide group may, for example, be a naphthoquinone-1,2-diazide-4-yellow-branched halogen or a broth-1,2-di-aero-5-lithus Brewed halogen, polyhydroxydiphenyl ketone with 2,3,4-trisyldiphenyl ketone, 2,3,4,4'-tetrahydroxydiphenyl ketone, or bis (4-hydroxyl) 3,5-diamidinophenyl)-2-hydroxyphenylmethane, bis(4-hydroxy-2,5-dimethylphenyl)-2-hydroxyphenylmethane, bis(4-hydroxy·2, 3,5·trimethylphenyl)-2.hydroxyphenylmethane, bis(4-hydroxy-2,3,5-trimethylphenyl)-3-hydroxyphenylnonane, bis(4-hydroxyl - 2,3,5-trimethylphenyl)-4-hydroxyphenyldecane, bis(4-hydroxy-2-indolyl-5-cyclohexylphenyl)-3,4-hydroxyphenylmethane, Bis(4-hydroxy-2-indolyl-5-cyclohexylphenyl)-4-hydroxyphenyldecane, 1-[1-(4-hydroxyphenyl)isopropyl]4-[1,1 a trisphenol such as bis(4-hydroxyphenyl)ethyl]benzene, which is carried out in an organic solvent such as dioxane or 7-butyrolactone in the presence of an amine catalyst such as triethylamine or triethanolamine. The condensation reaction is carried out by completely esterifying or partially esterifying. <<Negative photosensitive resin composition>> When the photosensitive resin composition of the present invention is a negative photosensitive resin composition, a photopolymerizable compound (Α), 11 is contained in addition to the above organic pigment. 200815915 and photopolymerization initiator (B). [Photopolymerizable Compound (A)] The photopolymerizable compound is preferably a compound having an ethylenically unsaturated double bond.
具有乙烯性不飽和雙鍵之化合物,可以舉出的有丙烯 酸、甲基丙烯酸、反丁烯二酸、順丁烯二酸、反丁烯二酸 一甲酯、反丁烯二酸一乙酯、丙烯酸2 -羥基乙酯、甲基丙 烯酸2 -羥基乙酯、乙二醇一曱基醚丙烯酸酯、乙二醇一甲 基醚甲基丙烯酸酯、乙二醇一乙基醚丙烯酸酯、乙二醇一 乙基醚甲基丙烯酸酯、甘油丙烯酸酯、甘油甲基丙烯酸酯、 丙烯醯胺、甲基丙烯醯胺、丙烯腈、曱基丙烯腈、丙烯酸 曱酯、曱基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、 丙烯酸異丁酯、曱基丙烯酸異丁酯、丙烯酸2 -乙基己酯、 甲基丙烯酸2 -乙基己酯、丙烯酸苄酯、曱基丙烯酸苄酯、 乙二醇二丙烯酸酯、乙二醇二曱基丙烯酸酯、二甘醇二丙 烯酸酯、三甘醇二丙烯酸酯、三甘醇二曱基丙烯酸酯、四 甘醇二丙烯酸酯、四甘醇二甲基丙烯酸酯、丁二醇二甲基 丙烯酸酯、丙二醇二丙烯酸酯、丙二醇二甲基丙烯酸酯、 三羥曱基丙烧.三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸 酯、四羥甲基丙烷四丙烯酸酯、四羥曱基丙烷四曱基丙烯 酸酯、新戊四醇三丙烯酸酯、新戊四醇三曱基丙烯酸酯、 新戊四醇四丙烯酸酯、新戊四醇四曱基丙烯酸酯、二新戊 四醇五丙烯酸酯、二新戊四醇五曱基丙烯酸酯、二新戊四 醇六丙烯酸酯、二新戊四醇六甲基丙烯酸酯、1,6 -己二醇 12 200815915The compound having an ethylenically unsaturated double bond may, for example, be acrylic acid, methacrylic acid, fumaric acid, maleic acid, monomethyl fumarate or monoethyl fumarate. , 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, ethylene glycol monodecyl ether acrylate, ethylene glycol monomethyl ether methacrylate, ethylene glycol monoethyl acrylate, B Glycol monoethyl ether methacrylate, glycerin acrylate, glycerin methacrylate, acrylamide, methacrylamide, acrylonitrile, mercapto acrylonitrile, decyl acrylate, methyl methacrylate, acrylic acid Ethyl ester, ethyl methacrylate, isobutyl acrylate, isobutyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, benzyl acrylate, benzyl methacrylate, B Diol diacrylate, ethylene glycol dimercapto acrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimercapto acrylate, tetraethylene glycol diacrylate, tetraethylene glycol Acrylate, butanediol dimethacrylate, Propylene glycol diacrylate, propylene glycol dimethacrylate, trihydrocarbyl propyl ketone, triacrylate, trimethylolpropane trimethacrylate, tetramethylolpropane tetraacrylate, tetrahydrocarbyl propane tetraindole Acrylate, neopentyl alcohol triacrylate, neopentyl alcohol tridecyl acrylate, neopentyl alcohol tetraacrylate, neopentyl alcohol tetradecyl acrylate, dipentaerythritol pentaacrylate, two Pentaerythritol pentadecyl acrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, 1,6-hexanediol 12 200815915
二丙烯酸酯、1,6 -己二醇二甲基丙烯酸酯、咔哚環氧二丙 嫦酸酯(cardoepoxy diacrylate)等單體、低聚物類;使由多 元醇類與單元酸或多元酸縮合而成的聚酯預聚物與(曱基) 丙烯酸反應而得到的聚酯型(甲基)丙烯酸酯;使多元醇基 與具有2個異氰酸酯基之化合物反應後,與(曱基)丙烯酸 反應而得到的聚(甲基)丙烯酸胺基甲酸酯;使雙酚A型環 氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、苯酚或 甲酚酚醛清漆型環氧樹脂、可溶酚醛型環氧樹脂、三苯酚 甲烷型環氧樹脂、聚羧酸聚環氧丙酯、多元醇聚環氧丙酯、 脂肪族或脂環族環氧樹脂、胺環氧樹脂、二羥基苯型環氧 樹脂等的環氧樹脂,與(甲基)丙烯酸反應而得到的環氧(甲 基)丙烯酸酯樹脂等。而且,亦可使用前述環氧(曱基)丙烯 酸酯與多元酸酐反應而成的樹脂。因為在此等化合物中導 入丙烯醯基或甲基丙烯醯基,所以能夠提高交聯效率,該 塗膜的耐光性、耐藥品性變為優良。 而且,具有上述乙烯性不飽和雙鍵之化合物,以使用 質量平均分子量為1,〇〇〇以上之物為佳。藉由使質量平均 分子量為1,〇〇〇以上時,能夠使塗膜度均勻。又,質量平 均分子量以1 00,000以下為佳,藉由使質量平均分子量在 1 0 0,0 00以下時,能夠得到更為良好的顯像性。在本發明 係將該質量平均分子量為1,〇〇〇以上之具有乙烯性不飽和 雙鍵之化合物,稱為具有乙烯性不飽和雙鍵之高分子化合 物〇 而且,上述具有乙烯性不飽和雙鍵之高分子化合物, 13 (、Monomers and oligomers such as diacrylate, 1,6-hexanediol dimethacrylate, cardoepoxy diacrylate; and polyols and unit acids or polybasic acids a polyester (meth) acrylate obtained by reacting a condensed polyester prepolymer with (fluorenyl) acrylic acid; reacting a polyol group with a compound having two isocyanate groups, and (mercapto)acrylic acid Poly(meth)acrylic acid urethane obtained by the reaction; bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol or cresol novolak type epoxy Resin, resole type epoxy resin, trisphenol methane type epoxy resin, polycarboxylate polyglycidyl ester, polyol polyglycidyl ester, aliphatic or alicyclic epoxy resin, amine epoxy resin, An epoxy resin such as a dihydroxybenzene type epoxy resin, or an epoxy (meth)acrylate resin obtained by reacting with (meth)acrylic acid. Further, a resin obtained by reacting the above epoxy (fluorenyl) acrylate with a polybasic acid anhydride can also be used. Since the propylene fluorenyl group or the methacryl fluorenyl group is introduced into these compounds, the crosslinking efficiency can be improved, and the light resistance and chemical resistance of the coating film are excellent. Further, the compound having the above ethylenically unsaturated double bond is preferably one having a mass average molecular weight of 1, more than 〇〇〇. When the mass average molecular weight is 1, 〇〇〇 or more, the coating degree can be made uniform. Further, the mass average molecular weight is preferably 100,000 or less, and when the mass average molecular weight is 100 or less, it is possible to obtain more excellent developability. In the present invention, the compound having an ethylene-unsaturated double bond having a mass average molecular weight of 1 or more is referred to as a polymer compound having an ethylenically unsaturated double bond, and the above-mentioned ethylenically unsaturated double bond Key polymer compound, 13 (,
200815915 以組合光聚合性單體而使用為佳。作為該光聚合性單 可舉出的有丙烯酸甲酯、曱基丙烯酸曱酯、丙烯酸2 -乙酯、曱基丙烯酸2 -羥基乙酯、曱基丙烯酸2 -羥基丙 乙二醇二丙烯酸酯、乙二醇二甲基丙烯酸酯、三甘醇 婦酸酯、三甘醇二甲基丙婦酸S旨、四甘醇二丙稀酸S旨 甘醇二甲基丙烯酸酯、丙二醇二丙烯酸酯、丙二醇二 丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥曱基丙烷 基丙烯酸酯、四羥甲基丙烷四丙烯酸酯、四羥甲基丙 甲基丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇三甲 烯酸酯、新戊四醇四丙烯酸酯、新戊四醇四甲基丙烯酿 二新戊四醇五丙烯酸酯、二新戊四醇五甲基丙烯酸酯 新戊四醇六丙烯酸酯、二新戊四醇六曱基丙烯酸酯、 己二醇二丙烯酸酯、苄基丙烯酸酯、苄基曱基丙烯酸 咔哚(car do)環氧二丙烯酸酯、丙烯酸、及甲基丙烯酸 但未受到此等之限定。這些光聚合性單體之中,以多 光聚合性單體為佳。藉由如此地組合具有乙烯性不飽 鍵之高分子化合物與光聚合性單體,能夠提高塗膜的 性、使圖案形成變為容易。 在上述中,作為光聚合性化合物,係舉出其分子 係能夠聚合之物,但是在本發明,作為光聚合性化合 包含高分子黏合劑與光聚合性單體的混合物。 從顯像容易而言,高分子黏合劑以能夠鹼顯像的 劑為佳。 具體上,高分子黏合劑可舉出的有:丙烯酸、曱 體, 羥基 酉旨、 二丙 、 四 甲基 三甲 烧四 基丙 :酯、 、二 1,6-酯、 等, 官能 和雙 硬化 本身 物亦 黏合 基丙 14 200815915200815915 It is preferred to use a photopolymerizable monomer in combination. Examples of the photopolymerizable monomer include methyl acrylate, decyl decyl acrylate, 2-ethyl acrylate, 2-hydroxyethyl methacrylate, and 2-hydroxy propylene glycol diacrylate. Ethylene glycol dimethacrylate, triethylene glycol ester, triethylene glycol dimethyl acetoacetate S, tetraethylene glycol diacrylic acid S, glycol dimethacrylate, propylene glycol diacrylate, Propylene glycol diacrylate, trimethylolpropane triacrylate, trihydroxymethyl propane acrylate, tetramethylolpropane tetraacrylate, tetramethylol propyl methacrylate, neopentyl alcohol triacrylate, Pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethyl propylene brewing dipentaerythritol pentaacrylate, dipentaerythritol penta methacrylate pentaerythritol Acrylate, dipentaerythritol hexamethylene acrylate, hexanediol diacrylate, benzyl acrylate, carbaryl epoxy diacrylate, acrylic acid, and methacrylic acid but Not subject to these restrictions. Among these photopolymerizable monomers, a polyphotopolymerizable monomer is preferred. By combining the polymer compound having an ethylenic unsaturated bond and the photopolymerizable monomer in this manner, the properties of the coating film can be improved and pattern formation can be facilitated. In the above, the photopolymerizable compound is a polymer which can be polymerized. However, in the present invention, a mixture of a polymer binder and a photopolymerizable monomer is contained as a photopolymerizable compound. From the viewpoint of easy development, the polymer binder is preferably an agent capable of causing alkali imaging. Specifically, the polymer binder may be exemplified by acrylic acid, hydrazine, hydroxy hydrazine, dipropylene, tetramethyltrimethyl succinyl ester: ester, dihexamethylene ester, etc., functional and double hardening. The substance itself is also bonded to the base C 14 200815915
烯酸等含有羧基的單體、與丙酸酸甲酯、曱基丙酸酸甲酯、 丙酸酸乙酯、甲基丙酸酸乙酯、丙烯酸2 -羥基乙酯、甲基 丙烯酸2 -羥基乙酯、曱基丙烯酸2 -羥基丙酯、丙烯酸正丁 酯、甲基丙烯酸正丁酯、丙烯酸異丁酯、曱基丙烯酸異丁 酯、丙烯酸苄酯、甲基丙烯酸苄酯、苯氧基丙烯酸酯、苯 氧基曱基丙烯酸酯、丙烯酸酯異崁酯、曱基丙烯酸異崁酯、 曱基丙嫦酸環氧丙酷、苯乙婦、丙稀醯胺、及丙嫦腈等之 共聚物;以及苯酚酚醛清漆型環氧丙烯酯聚合物、苯酚酚 醛清漆型環氧甲基丙烯酯聚合物、甲酚酚醛清漆型環氧丙 烯酸酯聚合物、甲酚酚醛清漆型環氧甲基丙烯酸酯聚合 物、雙酚A型環氧丙烯酸酯聚合物、及雙酚S型環氧丙烯 酸酯聚合物等樹脂。構成前述樹脂之丙烯酸、曱基丙烯酸 等的具有羧基之單體成分的含量,以在5莫耳%以上40莫 耳%以下的範圍為佳。 上述之高分子黏合劑的質量平均分子量,以1,〇〇〇以 上100,000以下為佳。藉由使質量平均分子量在1,000以 上,能夠使塗膜度均勻。又,藉由使質量平均分子量在 1 0 0,0 0 0以下時,能夠得到更為良好的顯像性。 光聚合性化合物係含有高分子黏合劑及光聚合性單體 時,在高分子黏合劑、光聚合性單體及光聚合引發劑之合 計量的每1 00質量份,高分子黏合劑以調配1 〇質量份以上 60質量份以下的範圍為佳。藉由使前述調配量為10質量 份以上,在塗布、乾燥本發明的感光性樹脂組成物時,能 夠容易地形成膜,能夠充分提升硬化後的被覆強度。又, 15 200815915 藉由使調配量為6 0質量份以下,能夠改良顯像性。 又,在高分子黏合劑、光聚合性單體及光聚合引發劑 之合計量的每1 00質量份,光聚合性單體以調配1 5質量份 以上5 0質量份以下的範圍為佳。藉由使前述調配量為1 5 質量份以上,能夠防止光硬化不良、得到充分的耐熱性、 ^ 耐藥品性。又,藉由使調配量為5 0質量份以下,能夠使塗 • 膜形成性能變為良好。 [光聚合引發劑(Β)] 作為光聚合引發劑,可以舉出的有例如:1 -羥基環己 基苯基酮、2·羥基-2-甲基-1-苯基丙烷-1-酮、1-[4-(2-羥基 乙乳基)苯基]·2 -經基-2 -甲基-1-丙烧-1-嗣、1-(4·異丙基· 苯基)-2·經基-2-曱基丙烧-1-嗣、1-(4-十二烧基苯基)-2 -經 基·2-甲基丙烧-1-3同、2,2-二曱氧基-1,2-二苯基乙烧-1_ 酮、雙(4-二甲基胺基苯基)酮、2 -甲基-1·[4-(曱硫)苯基]-2-味琳(morphelino)丙烧rl -酮、2 -苄基-2-二曱基胺基·1·(4· ^ ^ 咮淋苯基)-丁燒-1-銅、1-[9·乙基- 6- (2 -曱基苯曱酸基)-9H_ 咔唑-3-基]-乙酮-1-(0 -乙醯肟)、氧化2,4,6 -三甲基苯甲醯 基二苯基膦、4 -苯甲醯基- 4’-甲基二曱基硫醚、4-二甲基胺 ‘基苯曱酸、4 -二甲基胺基苯曱酸曱酯、4 -二甲基胺基苯甲 ^ 酸乙酯、4 -二甲基胺基苯曱酸丁酯、4 -二甲基胺基-2-乙基 己基苯甲酸、4-二甲基胺基-2_異胺基苯甲酸、苄基- β-曱氧 基乙基縮醛、苄基二甲基縮酮、1-苯基-1,2 -丙二酮- 2-(0-乙氧基羰基)肟、〇 -苯甲醯基苯曱酸曱酯、2,4 -二乙基噻噸 16 200815915 嗣、2-氯0S 嘲酮(2-Chl〇rothioxanthone)、2,4-二甲基嗟嘲 _、 1-氣-4-丙氧基噸酮、售嘲、2 -氯售嘲、2,4 -二乙基售噸、 2 -甲基噻噸、2 -異丙基噻噸、2 ·乙基蒽醌、八甲基蒽醌、 1,2-苯并蒽醌、2,3-二苯基蒽醌、偶氮異丁腈、過氧化苯甲 醯、過氧化枯烯、2 -氫硫基苯并咪唑、2 -氫硫基苯并噚唑 (oxazole)、2-氫硫基苯并嘆峻、2-(鄰氯苯基)-4,5-二(間甲 氧基苯基)-味。坐基二聚物、二苯基酮、2 -氯二苯基酬I、對, 對雙二甲基胺基二苯基酮、4,4’ -雙二乙基胺基二苯基 酮、4,4’-二氯二苯基酮、3,3-二甲基-4 -甲氧基二苯基酮、 苯偶醯、苯偶姻、苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻 異丙基醚、苯偶姻正丁基醚、苯偶姻異丁基醚、笨偶姻丁 基醚、苯乙酮、2,2 -二乙氧基苯乙酮、對二甲基苯乙酮、 對二曱基胺基苯丙酮、二氯苯乙酮、三氯苯乙酮、對第 3 丁基苯乙酮、對二甲基胺基苯乙酮、對第3 丁基三氯苯乙 酮、對第3 丁基二氯苯乙酮、α,α·二氯-4-苯氧基苯乙酮、 噻噸嗣、2 -甲基噻噸酮、2 -異丙基噻噸酮、二苯并環庚酮、 戊基-4-二曱基胺基苯甲酸酯、9-苯基吖啶、1,7-雙(9-吖啶 基)庚烷、1,5-雙(9-吖啶基)戊烷、1,3-雙(9-吖啶基)丙烷、 對曱氧基三哄(triazine)、2,4,6-參(三氯曱基)-s-三畊、2-甲基-4,6-雙(三氯曱基)-3-三哄、2-[2-(5-甲基咬喃-2-基)乙 烯基]_4,6·雙(三氣曱基)-s-三畊、2-[2_(呋喃_2_基)乙烯 基]-4,6-雙(二氣曱基)-5-二哄、2-[2-(4-二乙基胺基-2-曱基 苯基)乙烯基]-4,6-雙(三氯甲基)-s·三阱、2-[2-(3,4-二曱氧 基苯基)乙烯基]-4,6-雙(三氣曱基)-s-三畊、2-(4-甲氧基苯 17 200815915 基)-4,6-雙(三氯曱基)-s-二哄、2-(4·乙氧基苯乙稀基)-4,6-雙(三氯曱基三畊、2-(4-正-丁氧基苯基)-4,6·雙(三氯曱 基)-s -三哄、2,4-雙-三氯曱基-6-(3 -溴-4 -曱氧基)苯基-s-三 畊、2,4-雙-三氯甲基-6-(2-溴_4·甲氧基)苯基-s-三畊、2,4-雙-三氯曱基-6-(3 -溴-4-曱氧基)苯乙稀基苯基-s -三哄、2,4-雙-三氯甲基-6-(2 -漠-4 -曱乳基)苯乙稀基苯基-s-三哄等。 此等光聚合引發劑可單獨或組合使用2種以上。 相對於上述光聚合性化合物及光聚合引發劑合計 1 0 0 質量份,該光聚合引發劑以含有1質量份以上40質量份以 下為佳。 [其他成分] 本發明之感光性樹脂組成物可按照必要調配添加劑。 具體上可舉出的有敏化劑、硬化促進劑、光交聯劑、光敏 化劑、分散劑、分散助劑、填料、黏附促進劑、抗氧化劑、 紫外線吸收劑、防凝聚劑、熱聚合抑制劑、消泡劑、及界 CJ 面活性劑等。 又,本發明之感光性樹脂組成物亦可添加用以稀釋之 溶劑。 在此,作為可添加在感光性樹脂組成物中的溶劑,可 •舉出的有例如乙二醇一甲基醚、乙二醇一乙基醚、乙二醇 一正丙基醚、乙二醇一正丁基醚、二甘醇一曱基醚、二甘 醇一乙基醚、二甘醇一正丙基醚、二甘醇一正丁基醚、三 甘醇一曱基醚、三甘醇一乙基酿、丙二醇一曱基醚、丙二 18 200815915a carboxyl group-containing monomer such as an olefinic acid, and methyl propionate, methyl mercaptopropionate, ethyl propionate, ethyl methacrylate, 2-hydroxyethyl acrylate, methacrylic acid 2- Hydroxyethyl ester, 2-hydroxypropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, benzyl acrylate, benzyl methacrylate, phenoxy Copolymerization of acrylate, phenoxymercapto acrylate, isodecyl acrylate, isodecyl decyl acrylate, decyl propyl acrylate, acetophenone, acrylamide, and acrylonitrile And phenol novolac type epoxy acrylate polymer, phenol novolac type epoxy methacrylate polymer, cresol novolac type epoxy acrylate polymer, cresol novolac type epoxy methacrylate A resin such as a polymer, a bisphenol A epoxy acrylate polymer, or a bisphenol S epoxy acrylate polymer. The content of the monomer component having a carboxyl group such as acrylic acid or mercaptoacrylic acid constituting the above resin is preferably in the range of 5 mol% or more and 40 mol% or less. The above-mentioned polymer binder preferably has a mass average molecular weight of 1, 100 or more. By setting the mass average molecular weight to 1,000 or more, the coating degree can be made uniform. Further, when the mass average molecular weight is 100 or less, it is possible to obtain more excellent developability. When the photopolymerizable compound contains a polymer binder and a photopolymerizable monomer, the polymer binder is formulated for every 100 parts by mass of the total of the polymer binder, the photopolymerizable monomer, and the photopolymerization initiator. The range of 1 part by mass or more and 60 parts by mass or less is preferable. When the photosensitive resin composition of the present invention is applied and dried, the film can be easily formed by coating and drying the photosensitive resin composition of the present invention, and the coating strength after curing can be sufficiently enhanced. Further, 15 200815915, the developing property can be improved by setting the blending amount to 60 parts by mass or less. In addition, the photopolymerizable monomer is preferably blended in an amount of from 15 parts by mass to 50 parts by mass per 100 parts by mass of the total amount of the polymer binder, the photopolymerizable monomer, and the photopolymerization initiator. By setting the compounding amount to 15 parts by mass or more, it is possible to prevent photohardening failure, obtain sufficient heat resistance, and chemical resistance. In addition, by setting the blending amount to 50 parts by mass or less, the coating film formation performance can be improved. [Photopolymerization Initiator] The photopolymerization initiator may, for example, be 1-hydroxycyclohexyl phenyl ketone or 2 hydroxy-2-methyl-1-phenylpropan-1-one. 1-[4-(2-hydroxyethyl)phenyl]·2-trans-yl-2-methyl-1-propen-1-yl, 1-(4.isopropylphenyl)-2 ·Phenyl-2-mercaptopropan-1-yrylate, 1-(4-dodecylylphenyl)-2-transpyridyl 2-methylpropanone-1-3, 2,2-di曱oxy-1,2-diphenylethen-1-one, bis(4-dimethylaminophenyl)one, 2-methyl-1·[4-(indolyl)phenyl]-2 - morphelino propyl-ketone, 2-benzyl-2-didecylamino group·1·(4·^^ 苯基 phenyl)-butylene-1-copper, 1-[9· Ethyl-6-(2-mercaptobenzoyl)-9H-oxazol-3-yl]-ethanone-1-(0-acetamidine), 2,4,6-trimethylbenzene Mercapto diphenylphosphine, 4-benzylidenyl-4'-methyldidecyl sulfide, 4-dimethylamine'phenylbenzoic acid, 4-dimethylaminobenzoic acid decyl ester, 4-dimethylaminobenzoic acid ethyl ester, 4-dimethylaminobenzoic acid butyl ester, 4-dimethylamino-2-ethylhexylbenzoic acid, 4-dimethylamino group -2_isoaminobenzoic acid, benzyl --β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propanedione 2-(0-ethoxycarbonyl) hydrazine, hydrazine-benzonitrile Ethyl pyridinium benzoate, 2,4-diethyl thioxan 16 200815915 嗣, 2-Ch 0 嘲 thio ketone (2-Chl〇rothioxanthone), 2,4-dimethyl oxime _, 1- gas-4 - propoxy ketone, smuggling, 2-chloro smuggling, 2,4-diethyl ton, 2-methyl thioxanthene, 2-isopropyl thioxanthene, 2 · ethyl hydrazine, octa Base, 1,2-benzopyrene, 2,3-diphenylanthracene, azoisobutyronitrile, benzammonium peroxide, cumene peroxide, 2-hydrothiobenzimidazole, 2 -Hexylthiobenzoxazole, 2-hydrothiobenzoin, 2-(o-chlorophenyl)-4,5-di(m-methoxyphenyl)-flavor. Sitrate dimer, diphenyl ketone, 2-chlorodiphenyl valene I, p-p-dimethylaminodiphenyl ketone, 4,4'-bisdiethylaminodiphenyl ketone, 4,4'-Dichlorodiphenyl ketone, 3,3-dimethyl-4-methoxydiphenyl ketone, benzoin, benzoin, benzoin methyl ether, benzoin ethyl Ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, pair Dimethylacetophenone, p-didecylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-butyl acetophenone, p-dimethylaminoacetophenone, pair 3 Butyl trichloroacetophenone, p-tert-butyldichloroacetophenone, α,α·dichloro-4-phenoxyacetophenone, thioxanthene, 2-methylthioxanthone, 2-iso Propyl thioxanthone, dibenzocycloheptanone, pentyl-4-didecylamino benzoate, 9-phenyl acridine, 1,7-bis(9-acridinyl)heptane, 1,5-bis(9-acridinyl)pentane, 1,3-bis(9-acridinyl)propane, p-methoxy triazine, 2,4,6-gin (trichloropurine) Base)-s-three tillage, 2-methyl-4,6-double Trichloroindolyl-3-triazinium, 2-[2-(5-methyl-anthran-2-yl)vinyl]_4,6·bis (triseodecyl)-s-three tillage, 2- [2_(furo-2-yl)vinyl]-4,6-bis(dioxamethyl)-5-diindole, 2-[2-(4-diethylamino-2-mercaptophenyl) ) vinyl]-4,6-bis(trichloromethyl)-s·tripper, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-bis (three) Gas ))-s-three tillage, 2-(4-methoxybenzene 17 200815915 base)-4,6-bis(trichloroindenyl)-s-difluorene, 2-(4.ethoxybenzene Ethyl)-4,6-bis(trichloroindenyl trinyl, 2-(4-n-butoxyphenyl)-4,6-bis(trichloroindenyl)-s-triterpene, 2 ,4-bis-trichloroindolyl-6-(3-bromo-4-indolyloxy)phenyl-s-trin, 2,4-bis-trichloromethyl-6-(2-bromo-4 ·Methoxy)phenyl-s-three-pill, 2,4-bis-trichloroindolyl-6-(3-bromo-4-indolyloxy)styrene-phenyl-s-triterpene, 2 , 4-bis-trichloromethyl-6-(2-di-4, oxime-based) styrene-phenyl-s-triterpene, etc. These photopolymerization initiators may be used alone or in combination of two or more. The photopolymerization is carried out in an amount of 100 parts by mass based on the total of the photopolymerizable compound and the photopolymerization initiator. The hair styling agent is preferably contained in an amount of 1 part by mass or more and 40 parts by mass or less. [Other components] The photosensitive resin composition of the present invention may be formulated with an additive as necessary. Specific examples thereof include a sensitizer, a hardening accelerator, and a photocrossing agent. A coupling agent, a photosensitizer, a dispersing agent, a dispersing aid, a filler, an adhesion promoter, an antioxidant, a UV absorber, an anti-agglomerating agent, a thermal polymerization inhibitor, an antifoaming agent, and a CJ surfactant. Further, the photosensitive resin composition of the present invention may be added with a solvent for dilution. Here, as the solvent which can be added to the photosensitive resin composition, for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, and ethylene are mentioned. Alcohol mono-n-butyl ether, diethylene glycol monodecyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monodecyl ether, three Glycol monoethyl brewing, propylene glycol monodecyl ether, C are 18 18 200815915
醇一乙基謎、丙二醇一正丙基鍵、丙二醇一正丁基鍵、二 伸丙甘醇一曱基醚、二伸丙甘醇一乙基醚、二伸丙甘醇一 正丙基醚、二伸丙甘醇一正丁基醚、三伸丙甘醇一曱基醚、 三伸丙甘醇一乙基醚等的(聚)伸烷基二醇一烷基醚類;乙 二醇一甲基醚乙酸酯、乙二醇一乙基醚乙酸酯、二甘醇一 曱基醚乙酸酯、二甘醇一乙基醚乙酸酯、丙二醇一甲基醚 乙酸酯、丙二醇一乙基醚乙酸酯等的(聚)伸烷基二醇一烷 基醚乙酸酯類;二甘醇二甲基醚、二甘醇甲基乙基醚、二 甘醇二乙基醚、四氫呋喃等其他的醚類;甲基乙基酮、環 己烷、2 -庚酮、3·庚酮等的酮類;2 -羥基丙酸甲酯、2 -羥 基丙酸乙酯等的乳酸烷基酯類;2 -羥基-2 -甲基丙酸乙酯、 3 -甲氧基丙酸曱酯、3 -甲氧基丙酸乙酯、3 -乙氧基丙酸甲 酯、3 -乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、 2 -羥基-3-曱基丁酸曱酯、3 -曱氧基丁基乙酸酯、3 -曱基- 3-甲氧基丁基乙酸酯、3 -甲基-3-曱氧基丁基丙酸酯、乙酸乙 酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、 甲酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸 正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸曱酯、丙酮酸 乙酯、丙酮酸正丙酯、乙醯乙酸曱酯、乙醯乙酸乙酯、2 _ 側氧基丁酸乙酯等其他的酯類;甲苯、二曱苯等的芳香族 烴類;N -曱基吡咯啶酮、N,N-二甲基曱醯胺、及N,N-二甲 基乙醯胺等的醯胺類。此等溶劑可單獨或混合使用2種以 上。 上述溶劑中,因為丙二醇一甲基醚、乙二醇一甲基醚 19 Ο 200815915 乙“、丙一醇一甲基峻乙酸醋、丙 二甘醇二甲基驗、二甘醇甲基乙基鍵 乙基… 基丁基乙酸酯,係對光聚 酮、及3 - J τη 1合性化合物、 示優良的溶解性,同時 光聚合引發^ 時犯夠使顏料等的不 性變為良好,乃是較佳,以 岭〖生成刀之j 使用丙一醇一甲其^ r 3-甲氧基丁基乙酸醋為特 甲基醚乙酸酉 聚人引發~ ^ ^ , 相對於光聚合性化合物、 1引發劑、及者色劑之合計量ι〇〇 — 質量份以上5 0 0質量份以 、里刀,/谷劑可在 貝里伤Μ下之範圍使用。 <液晶配向控制用凸塊的形成〉 首先,將本發明之感光性樹脂组成物 逆輥塗布器及棒塗布器等# 使用輥塗布! ,盗寺接觸轉印型塗布 (旋轉式塗布裝置)、簾流塗、/疋轉 .^ ^ 寺非接觸型塗布裝置, ▼在基板上。基板沒有特別限定。 + 牛出的有例如玻璃韦 石夬板、透明或半透明的樹脂板等。 對塗布後的該感光性樹脂組成物 址# 战物’使其乾燥來形成 光性樹脂層。乾燥方法沒有特別 丨良疋’例如能夠使用以 任一種方法,(1)於熱板上在8〇t以上12〇。〇以下、較佳 9〇t以上1〇(TC以下之溫度’乾_ 6〇秒至12〇秒鐘之 法,⑺在室溫放置麩小時至數天之方法,(3)在溫風加 器或紅外線加熱器中放置數十分至數小時來除去溶劑之 法。 接著,使負型或正型的光罩介於中間,照射紫外線 準分子雷射光等的活性能量線來使感錢脂層部分性 酯、 ?氣 i顯 、散 光 50 器 塗 感 下 方 熱 方 曝 20 200815915 光。所照能量線量係因感光性樹脂組成物的組成而不同, 例如以30mJ/cm2至2000 mJ/cm2左右為佳。 接著,藉由顯像液將曝光後的感光性樹脂層顯像來圖 案化成為需要的形狀。顯像方法沒有特別限定,能夠使用 例如浸潰法、喷灑法等。顯像液可舉出的有一乙醇胺、二 乙醇胺、三乙醇胺等有機系之物、或氫氧化鈉、氫氧化鉀、 碳酸鈉、氨、4級銨鹽等水溶液。 隨後,在 20 01:左右對顯像後的圖案進行後烘焙。藉 由上述方法,能夠形成具有規定形狀之液晶配向控制用凸 塊0 [實施例] [合成例1]Alcohol-ethyl mystery, propylene glycol-n-propyl bond, propylene glycol-n-butyl bond, di-glycolyl-mercaptoether, di-glycolyl-ethyl ether, di-n-glycol-n-propyl ether, two (poly)alkylene glycol monoalkyl ethers such as propylene glycol mono-n-butyl ether, tri-n-propylglycol monodecyl ether, tri-n-ethylene glycol monoethyl ether; Ethyl acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monodecyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol (poly)alkylene glycol monoalkyl ether acetates such as ethyl ether acetate; diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran Other ethers; ketones such as methyl ethyl ketone, cyclohexane, 2-heptanone, and 3·heptanone; alkyl lactate such as methyl 2-hydroxypropionate or ethyl 2-hydroxypropionate Ester; 2-hydroxy-2-methylpropionic acid ethyl ester, 3-methoxypropionate decyl ester, 3-methoxypropionic acid ethyl ester, 3-ethoxypropionic acid methyl ester, 3-ethoxy Ethyl propyl propionate, ethyl ethoxyacetate, ethyl hydroxyacetate, 2-Hydroxy-3-indolyl decanoate, 3-methoxybutyl acetate, 3-mercapto-3-methoxybutyl acetate, 3-methyl-3-decyloxy Butyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate , n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, decyl pyruvate, ethyl pyruvate, n-propyl pyruvate, decyl acetate, ethyl acetate, 2 _ side Other esters such as ethyl oxybutyrate; aromatic hydrocarbons such as toluene and dinonylbenzene; N-mercaptopyrrolidone, N,N-dimethyldecylamine, and N,N-dimethyl Amidoxime such as etidamine. These solvents may be used alone or in combination of two or more. Among the above solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether 19 Ο 200815915 B, propanol monomethyl acetacetic acid vinegar, propylene glycol dimethyl test, diethylene glycol methyl ethyl Key ethyl butyl acetate, which is a photopolymerized ketone and a 3 - J τη 1 conjugated compound, exhibits excellent solubility, and at the same time, photopolymerization is initiated to make the color and the like inferior. , is better, with the 〗 〖Generation knife j using propanol-methyl-r-methoxy-3-acetoxyacetic acid vinegar as the methyl ether acetate 酉 poly-man initiated ~ ^ ^, relative to photopolymerization The total amount of the compound, the initiator, and the coloring agent is ι〇〇—the mass part or more is 500 parts by mass, the inner knife, and the granule can be used under the range of the Berry scar. <Liquid alignment control Formation of the bumps> First, the photosensitive resin composition of the present invention is applied by a roll coater such as a reverse roll coater, a bar coater, etc., and the shoji contact transfer type coating (rotary coating apparatus), curtain flow coating, and/or疋转.^ ^ Temple non-contact type coating device, ▼ on the substrate. The substrate is not particularly limited. Glass stellite slab, transparent or translucent resin board, etc. The photosensitive resin composition address # 战 ' 涂布 涂布 涂布 涂布 涂布 涂布 涂布 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 In any method, (1) on a hot plate at 8 〇t or more 12 〇. 〇 below, preferably 9 〇 t or more 1 〇 (temperature below TC 'dry _ 6 sec to 12 〇 second method (7) Method of placing bran at room temperature for several hours, (3) placing the solvent in a warm air heater or an infrared heater for several tenths to several hours to remove the solvent. Next, making the negative or positive light The cover is in the middle, and the active energy line such as ultraviolet excimer laser light is irradiated to make the partial ester of the lipophore layer, the gas i, and the astigmatism 50, and the heat is exposed to the heat. The composition of the photosensitive resin composition is different, and is preferably, for example, about 30 mJ/cm 2 to about 2000 mJ/cm 2 . Next, the exposed photosensitive resin layer is developed by a developing liquid to be patterned into a desired shape. The method is not particularly limited and can be used, for example, dip The method, the spraying method, etc., may be exemplified by an organic substance such as ethanolamine, diethanolamine or triethanolamine, or an aqueous solution of sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia or a quaternary ammonium salt. The post-baking pattern is post-baked at about 20 01. The liquid crystal alignment control bump 0 having a predetermined shape can be formed by the above method [Example] [Synthesis Example 1]
使56質量份曱基丙烯酸苄酯、36質量份甲基丙烯酸 2 -羥基乙酯、及 7 8質量份甲基丙烯酸環氧丙酯,溶解在 250質量份乙二醇一曱基醚乙酸酯中,並添加2質量份偶 氮雙異丁腈而進行加熱聚合。 隨後,添加40質量份之溶解2質量份甲基氫酿而成的 丙烯酸作為聚合抑制劑而使其進行反應。接著添加42質量 份四氫酞酸酐而使其進行反應,得到樹脂。所得到樹脂之 質量平均分子量為3000。 (實施例1) 使10質量份C.I.顏料紅177、15質量份C.I.顏料藍 1 5 : 6、1 0質量份C · I.顏料黃1 3 9、及7質量份分散劑(製 21 200815915 品名:Solsperse S24000、Avecia公司製),分散在乙酸3-甲氧基丁酯中,來製造固體成分濃度1 5質量%之顏料分散 液A 〇 混合3 0質量份合成例1所合成的樹脂、2 0質量份二 新戊四醇六丙烤酸酯(DPHA)、10質量份作為聚合引發劑 之2-苄基-2-二甲基胺基-1-(4 -味啉苯基)-丁烷-1-酮(製品 名:IRGACURE 3 69、CIBA SPECIALTY CHEMICALS 公司 製)、及20質量份上述顏料分散液A,溶解在丙二醇一甲 基醚乙酸酯(PGMEA)中,並調整成使固體成分濃度為 20 質量%,來製造感光性樹脂組成物。 (實施例2) 混合1 00質量份酚醛清漆樹脂[間甲酚:對曱酚=4 : 6](製品名:Ml、SUMITOMO BAKELITE 公司製)、25 質量 份敏化劑(製品名:P A、本州化學工業公司製)、5 0質量份 感光劑(製品名:MB25、DAITO CHEMIX公司製)、及50 I』 質量份上述顏料分散液a,溶解在丙二醇一甲基謎乙酸酯 (PGMEA)中,並調整成使固體成分濃度為20質量%,來製 造感光性樹脂組成物。 (比較例1) 混合3 0質量份合成例1所合成的樹脂、2 0質量份二 新戊四醇六丙烯酸酯(DPHA)、1 0質量份作為聚合引發劑 之2 -节基-2-二曱基胺基-1-(4 -味琳苯基)-丁烧-1-酮(製品 22 200815915 名:IRGACURE 3 69、CIBA SPECIALTY CHEMICALS 公司 製)、及20質量碳黑分散液(製品名:OCT(碳黑含量22%、 溶劑乙酸3 -甲氧基丁 S旨)、御國色素公司),溶解在丙二醇 一曱基醚乙酸酯(PGMEA)中,並調整成使固體成分濃度為 2 0質量%,來製造感光性樹脂組成物。 " (比較例2) 混合3 0質量份合成例1所合成的樹脂、2 0質量份二56 parts by mass of benzyl methacrylate, 36 parts by mass of 2-hydroxyethyl methacrylate, and 78 parts by mass of glycidyl methacrylate, dissolved in 250 parts by mass of ethylene glycol monodecyl ether acetate The mixture was heated and polymerized by adding 2 parts by mass of azobisisobutyronitrile. Subsequently, 40 parts by mass of acrylic acid obtained by dissolving 2 parts by mass of methyl hydrogen was added as a polymerization inhibitor to carry out a reaction. Then, 42 parts by mass of tetrahydrofurfuric anhydride was added and reacted to obtain a resin. The obtained resin had a mass average molecular weight of 3,000. (Example 1) 10 parts by mass of CI Pigment Red 177, 15 parts by mass of CI Pigment Blue 1 5 : 6, 10 parts by mass of C · I. Pigment Yellow 139, and 7 parts by mass of dispersant (Production 21 200815915 Product Name) :Solsperse S24000, manufactured by Avecia Co., Ltd., dispersed in 3-methoxybutyl acetate to produce a pigment dispersion liquid A having a solid concentration of 15% by mass, and 30 parts by mass of the resin synthesized in Synthesis Example 1, 2 0 parts by mass of dipentaerythritol hexapropanoate (DPHA), 10 parts by mass of 2-benzyl-2-dimethylamino-1-(4-benzoinylphenyl)-butyl as a polymerization initiator Alkan-1-one (product name: IRGACURE 3 69, manufactured by CIBA SPECIALTY CHEMICALS), and 20 parts by mass of the above pigment dispersion A, dissolved in propylene glycol monomethyl ether acetate (PGMEA), and adjusted to solid The photosensitive resin composition was produced by having a component concentration of 20% by mass. (Example 2) 100 parts by mass of novolac resin [m-cresol: p-nonylphenol = 4:6] (product name: Ml, SUMITOMO BAKELITE company), 25 parts by mass of sensitizer (product name: PA, 50 parts by mass of sensitizer (product name: MB25, manufactured by DAITO CHEMIX Co., Ltd.), and 50 I by mass parts of the above pigment dispersion a, dissolved in propylene glycol monomethyl acetate (PGMEA) The photosensitive resin composition was produced by adjusting the solid content concentration to 20% by mass. (Comparative Example 1) 30 parts by mass of the resin synthesized in Synthesis Example 1, 20 parts by mass of dipentaerythritol hexaacrylate (DPHA), and 10 parts by mass of 2-keto-2- as a polymerization initiator were mixed. Dimercaptoamino-1-(4-teranylphenyl)-butan-1-one (product 22 200815915: IRGACURE 3 69, manufactured by CIBA SPECIALTY CHEMICALS), and 20 mass carbon black dispersion (product name) : OCT (carbon black content 22%, solvent acetic acid 3-methoxybutyl S), Royal Chinese pigment company, dissolved in propylene glycol monodecyl ether acetate (PGMEA), and adjusted to a solid concentration of 20% by mass to produce a photosensitive resin composition. " (Comparative Example 2) 30 parts by mass of the resin synthesized in Synthesis Example 1 and 20 parts by mass of two
C I 新戊四醇六丙烯酸酯(DP H A)、1 0質量份作為聚合引發劑 之2·苄基-2-二曱基胺基-1-(4-味啉苯基)-丁烷-1-酮(製品 名:IRGACURE 3 69、CIBA SPECIALTY CHEMICALS 公司 製)、及20質量碳黑分散液(製品名:SK(碳黑含量20%)、 御國色素公司),溶解在丙二醇一甲基醚乙酸酯(PGMEA) 中,並調整成使固體成分濃度為20質量0/〇,來製造感光性 樹脂組成物。 (j [液晶配向控制用凸塊的形成方法] 在形成有銦錫氧化物(ITO)膜之玻璃基板上,使用旋轉 塗布器塗布感光性樹脂組成物,在9 0 °c乾燥2分鐘,來形 成感光性樹脂層。接著透過負型光罩,選擇性地照射 • 5 0mJ/cm2之能量線量的紫外線,來進行部分性曝光。接著 使用氫氧化四甲銨水溶液進行顯像,在220 °C對顯像後的 圖案進行後烘焙,來形成液晶配向控制用凸塊。 23 200815915 (評價) 對上述所形成的凸塊,進行評價介電常數、每膜厚度 1微米之OD值。 介電常數係使用介電常數測定裝置「SSM495」(曰本 SSM公司製)進行測定,OD 值係使用「Gretag Macbeth D-2 0 0-2」(商品名:Macbeth公司製)來測定。CI pentaerythritol hexaacrylate (DP HA), 10 parts by mass of 2·benzyl-2-didecylamino-1-(4-morpholinephenyl)-butane-1 as a polymerization initiator - Ketone (product name: IRGACURE 3 69, manufactured by CIBA SPECIALTY CHEMICALS), and 20 mass carbon black dispersion (product name: SK (carbon black content 20%), Royal Color Co., Ltd.), dissolved in propylene glycol monomethyl ether In the acetate (PGMEA), the photosensitive resin composition was prepared by adjusting the solid content concentration to 20 mass%/〇. (j [Method of Forming Projector for Liquid Crystal Alignment Control] On a glass substrate on which an indium tin oxide (ITO) film was formed, a photosensitive resin composition was applied using a spin coater, and dried at 90 ° C for 2 minutes. A photosensitive resin layer is formed, and then a partial exposure is performed by selectively irradiating ultraviolet rays of an energy amount of 50 mJ/cm 2 through a negative mask, followed by development using an aqueous solution of tetramethylammonium hydroxide at 220 ° C. Post-baking of the developed pattern to form a liquid crystal alignment control bump. 23 200815915 (Evaluation) The dielectric constant and the OD value per film thickness of 1 μm were evaluated for the bump formed as described above. The measurement was performed using a dielectric constant measuring device "SSM495" (manufactured by Sakamoto SSM Co., Ltd.), and the OD value was measured using "Gretag Macbeth D-2 0 0-2" (trade name: manufactured by Macbeth Co., Ltd.).
對使用實施例1、2、比較例1、2的感光性樹脂組成 物所形成的凸塊之評價結果係如表1所示。 [表1] 膜厚度(微米) 介電常數 OD值 實施例1 1.8 4.5 1.0 實施例2 1.8 4.4 1.0 比較例1 1.8 45 2.5 比較例2 1.8 15 1.8 從以上的結果,顯示本發明的感光性樹脂組成物能夠 形成可防止光的反射、且具有低介電常數之液晶配向控制 用凸塊。 【圖式簡單說明】 無 【主要元件符號說明】 無 24The evaluation results of the bumps formed using the photosensitive resin compositions of Examples 1 and 2 and Comparative Examples 1 and 2 are shown in Table 1. [Table 1] Film thickness (micrometer) Dielectric constant OD value Example 1 1.8 4.5 1.0 Example 2 1.8 4.4 1.0 Comparative Example 1 1.8 45 2.5 Comparative Example 2 1.8 15 1.8 From the above results, the photosensitive resin of the present invention was shown. The composition can form a liquid crystal alignment control bump which can prevent reflection of light and has a low dielectric constant. [Simple description of the diagram] None [Key component symbol description] None 24
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| KR101486560B1 (en) * | 2010-12-10 | 2015-01-27 | 제일모직 주식회사 | Photosensitive resin composition and black matrix using the same |
| CN108027561B (en) * | 2015-09-30 | 2021-10-08 | 东丽株式会社 | Negative photosensitive resin composition, cured film, element and display device provided with cured film, and method for producing the same |
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| JP3977513B2 (en) * | 1998-04-28 | 2007-09-19 | 東レ株式会社 | Divided alignment substrate and liquid crystal display device using the same |
| KR100612994B1 (en) * | 2000-05-12 | 2006-08-14 | 삼성전자주식회사 | Liquid crystal display device and substrate used therein |
| JP4171167B2 (en) * | 2000-08-31 | 2008-10-22 | 富士フイルム株式会社 | Photocurable composition and liquid crystal display element |
| JP2002244293A (en) | 2001-02-22 | 2002-08-30 | Nof Corp | Resin composition for alkali developable resist, dry film and resist comprising the cured product thereof |
| JP4660990B2 (en) * | 2001-07-17 | 2011-03-30 | Jsr株式会社 | Radiation-sensitive resin composition, projection material and spacer formed therefrom, and liquid crystal display device comprising the same |
| JP2003295197A (en) * | 2002-04-05 | 2003-10-15 | Toray Ind Inc | Projection for split alignment of liquid crystal, color filter, electrode substrate, and liquid crystal display device using the same |
| KR100870020B1 (en) * | 2002-10-04 | 2008-11-21 | 삼성전자주식회사 | Photosensitive resin composition for controlling dissolution characteristics and pattern formation method of double layer structure using same |
| JP4461683B2 (en) * | 2003-01-17 | 2010-05-12 | セイコーエプソン株式会社 | Electro-optical device substrate, electro-optical device, electronic apparatus, and method for manufacturing electro-optical device substrate |
| WO2005008338A1 (en) | 2003-07-17 | 2005-01-27 | Hitachi Chemical Co., Ltd. | Negative photosensitive resin composition and negative photosensitive element |
| KR20050101920A (en) * | 2004-04-20 | 2005-10-25 | 주식회사 엘지화학 | Photosensitive resin composition for black matrix of liquid crystal display |
| KR101119818B1 (en) * | 2004-12-07 | 2012-03-06 | 주식회사 동진쎄미켐 | Photoresist composition for colour filter and preparation method of liquid crystal display colour filter using the same |
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