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TW200801806A - Method of fabricating a mold - Google Patents

Method of fabricating a mold

Info

Publication number
TW200801806A
TW200801806A TW095150087A TW95150087A TW200801806A TW 200801806 A TW200801806 A TW 200801806A TW 095150087 A TW095150087 A TW 095150087A TW 95150087 A TW95150087 A TW 95150087A TW 200801806 A TW200801806 A TW 200801806A
Authority
TW
Taiwan
Prior art keywords
resin layer
mold
pattern
substrate
fabricating
Prior art date
Application number
TW095150087A
Other languages
English (en)
Other versions
TWI345135B (en
Inventor
Jin-Wuk Kim
Yeon-Heui Nam
Original Assignee
Lg Philips Lcd Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Philips Lcd Co Ltd filed Critical Lg Philips Lcd Co Ltd
Publication of TW200801806A publication Critical patent/TW200801806A/zh
Application granted granted Critical
Publication of TWI345135B publication Critical patent/TWI345135B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/40—Plastics, e.g. foam or rubber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
TW095150087A 2006-06-30 2006-12-29 Method of fabricating a mold TWI345135B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060061020A KR101284943B1 (ko) 2006-06-30 2006-06-30 몰드의 제조방법

Publications (2)

Publication Number Publication Date
TW200801806A true TW200801806A (en) 2008-01-01
TWI345135B TWI345135B (en) 2011-07-11

Family

ID=37671726

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095150087A TWI345135B (en) 2006-06-30 2006-12-29 Method of fabricating a mold

Country Status (6)

Country Link
US (1) US8480936B2 (zh)
JP (1) JP4625445B2 (zh)
KR (1) KR101284943B1 (zh)
CN (1) CN101097399B (zh)
GB (1) GB2439600B (zh)
TW (1) TWI345135B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
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NL2005263A (en) * 2009-09-29 2011-03-30 Asml Netherlands Bv Imprint lithography.
US8651849B2 (en) * 2011-01-10 2014-02-18 Xerox Corporation Digitally prepared stamp masters and methods of making the same
JP5754965B2 (ja) * 2011-02-07 2015-07-29 キヤノン株式会社 インプリント装置、および、物品の製造方法
CN104345966A (zh) * 2014-05-31 2015-02-11 深圳市骏达光电股份有限公司 一种触摸屏用感应组件及其制作方法
CN105856888B (zh) 2016-04-01 2018-11-30 京东方科技集团股份有限公司 一种转印方法和重复转印方法
KR102233625B1 (ko) * 2016-08-23 2021-03-31 캐논 가부시끼가이샤 3차원 조형 장치 및 3차원 조형물의 제조 방법
KR101941640B1 (ko) * 2017-11-30 2019-01-24 서강대학교산학협력단 고분자 공진 구조물 및 그 제조방법

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Also Published As

Publication number Publication date
JP2008015462A (ja) 2008-01-24
GB2439600B (en) 2008-06-04
JP4625445B2 (ja) 2011-02-02
US8480936B2 (en) 2013-07-09
US20080001332A1 (en) 2008-01-03
TWI345135B (en) 2011-07-11
KR101284943B1 (ko) 2013-07-10
GB2439600A (en) 2008-01-02
CN101097399A (zh) 2008-01-02
KR20080002288A (ko) 2008-01-04
GB0624072D0 (en) 2007-01-10
CN101097399B (zh) 2012-01-04

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