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TW200801100A - Polymerizable composition, resin composition with high index of refraction and optical application using the same - Google Patents

Polymerizable composition, resin composition with high index of refraction and optical application using the same

Info

Publication number
TW200801100A
TW200801100A TW096114972A TW96114972A TW200801100A TW 200801100 A TW200801100 A TW 200801100A TW 096114972 A TW096114972 A TW 096114972A TW 96114972 A TW96114972 A TW 96114972A TW 200801100 A TW200801100 A TW 200801100A
Authority
TW
Taiwan
Prior art keywords
refraction
resin composition
high index
composition
same
Prior art date
Application number
TW096114972A
Other languages
English (en)
Inventor
Nobuhiko Ueno
Takeshi Otsu
Katsuya Amako
Original Assignee
Mitsubishi Chem Corp
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp, Sony Corp filed Critical Mitsubishi Chem Corp
Publication of TW200801100A publication Critical patent/TW200801100A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • C08F228/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/256—Heavy metal or aluminum or compound thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
TW096114972A 2006-04-28 2007-04-27 Polymerizable composition, resin composition with high index of refraction and optical application using the same TW200801100A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006126430 2006-04-28
JP2007110687A JP2007314773A (ja) 2006-04-28 2007-04-19 高屈折率粒子含有樹脂組成物

Publications (1)

Publication Number Publication Date
TW200801100A true TW200801100A (en) 2008-01-01

Family

ID=38655492

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096114972A TW200801100A (en) 2006-04-28 2007-04-27 Polymerizable composition, resin composition with high index of refraction and optical application using the same

Country Status (4)

Country Link
US (1) US20090220770A1 (zh)
JP (1) JP2007314773A (zh)
TW (1) TW200801100A (zh)
WO (1) WO2007125966A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109716172A (zh) * 2016-09-16 2019-05-03 康宁股份有限公司 高折射率纳米复合物

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JP5272217B2 (ja) * 2007-03-22 2013-08-28 ホーヤ レンズ マニュファクチャリング フィリピン インク 重合性組成物、重合体およびプラスチックレンズ
WO2009032072A2 (en) * 2007-08-31 2009-03-12 Cabot Corporation Method of preparing a nanoparticle dispersion of a modified metal oxide
JP5037393B2 (ja) * 2008-03-12 2012-09-26 富士フイルム株式会社 金属酸化物微粒子分散液及び成形体
EP2360195B1 (en) 2008-12-15 2013-02-20 Asahi Glass Company, Limited Photo-curing material manufacturing method, and photo-curing material and article
JP2010241985A (ja) * 2009-04-07 2010-10-28 Olympus Corp 有機−無機ハイブリッド樹脂組成物、それを用いた光学素子、及び該組成物の製造方法
JP5498089B2 (ja) * 2009-08-12 2014-05-21 国立大学法人北海道大学 複合組成物及び光学プラスチック製品
JP5350294B2 (ja) * 2010-03-04 2013-11-27 ホーヤ レンズ マニュファクチャリング フィリピン インク 重合性組成物、重合体組成物およびプラスチックレンズ
KR20130088037A (ko) 2010-06-23 2013-08-07 니폰 가세이 가부시키가이샤 무기 유기 하이브리드 재료 및 그것을 사용한 광학 재료 그리고 무기 유기 복합재 조성물
JP2013122643A (ja) * 2011-12-09 2013-06-20 Nippon Shokubai Co Ltd 樹脂組成物及び面状成形体
DE102012103159A1 (de) * 2012-04-12 2013-10-17 Osram Opto Semiconductors Gmbh Strahlung emittierendes Bauelement, transparentes Material und Füllstoffpartikel sowie deren Herstellungsverfahren
EP3083842B1 (en) * 2013-12-20 2017-11-29 Essilor International (Compagnie Générale D'Optique) Liquid polymerizable composition comprising an anhydride derivative monomer and mineral nanoparticles dispersed therein, and its use to manufacture an optical article
JP6727643B2 (ja) * 2015-05-11 2020-07-22 学校法人神奈川大学 化合物、表面処理剤、及び表面処理方法
CN110945090A (zh) 2017-07-26 2020-03-31 3M创新有限公司 可固化的高折射率油墨组合物和由油墨组合物制备的制品
JP2020132760A (ja) * 2019-02-19 2020-08-31 オーウエル株式会社 光硬化性組成物、硬化物、及びレンズ
JP7284590B2 (ja) * 2019-02-21 2023-05-31 三菱瓦斯化学株式会社 硬化性複合材料及びそれを用いたインプリント方法
JP2021031669A (ja) * 2019-08-28 2021-03-01 東京応化工業株式会社 硬化性インク組成物、硬化物、及びナノコンポジット
KR102738121B1 (ko) 2019-11-28 2024-12-06 도쿄 오카 고교 가부시키가이샤 감광성 잉크 조성물, 경화물, 디스플레이 패널, 및 경화물의 제조 방법
CN114761498B (zh) * 2019-11-28 2023-06-23 东京应化工业株式会社 感光性油墨组合物、固化物、显示面板、及固化物的制造方法
JPWO2021106805A1 (zh) * 2019-11-28 2021-06-03
IT202100010316A1 (it) * 2021-04-23 2022-10-23 Roberta Civilia Dispositivo per la proiezione e riproduzione di immagini tridimensionali caratterizzato da un bassissimo spessore e flessibilità, portatile ed indossabile

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JPH07247306A (ja) * 1994-03-10 1995-09-26 Kureha Chem Ind Co Ltd 紫外線硬化性組成物
US6329058B1 (en) * 1998-07-30 2001-12-11 3M Innovative Properties Company Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers
US6261700B1 (en) * 1998-12-30 2001-07-17 3M Innovative Properties Co Ceramer containing a brominated polymer and inorganic oxide particles
US6387981B1 (en) * 1999-10-28 2002-05-14 3M Innovative Properties Company Radiopaque dental materials with nano-sized particles
US6376590B2 (en) * 1999-10-28 2002-04-23 3M Innovative Properties Company Zirconia sol, process of making and composite material
WO2001030307A1 (en) * 1999-10-28 2001-05-03 3M Innovative Properties Company Dental materials with nano-sized silica particles
JP3932866B2 (ja) * 2001-11-07 2007-06-20 三菱化学株式会社 重合性液体組成物
JP2003183414A (ja) * 2001-12-13 2003-07-03 Mitsubishi Chemicals Corp 超微粒子を含有する架橋樹脂組成物成形体
JP4008246B2 (ja) * 2002-01-28 2007-11-14 住友ベークライト株式会社 複合体組成物、及びこれを架橋させてなる成形硬化物
TWI334492B (en) * 2003-03-05 2010-12-11 Fujifilm Corp High refractive index layer, production process of curable coating composition, antireflection film, polarizing plate and image display device using thereof
KR20060112189A (ko) * 2003-07-23 2006-10-31 코니카 미놀타 옵토 인코포레이티드 촬상 렌즈 및 촬상 장치
US7169375B2 (en) * 2003-08-29 2007-01-30 General Electric Company Metal oxide nanoparticles, methods of making, and methods of use
US7074463B2 (en) * 2003-09-12 2006-07-11 3M Innovative Properties Company Durable optical element
JP2005314661A (ja) * 2004-03-30 2005-11-10 Mitsubishi Chemicals Corp 樹脂成形体
US7491441B2 (en) * 2004-12-30 2009-02-17 3M Innovative Properties Company High refractive index, durable hard coats
JP2006273709A (ja) * 2005-03-03 2006-10-12 Mitsubishi Chemicals Corp 高屈折率を有するナノ粒子

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109716172A (zh) * 2016-09-16 2019-05-03 康宁股份有限公司 高折射率纳米复合物
TWI730170B (zh) * 2016-09-16 2021-06-11 美商康寧公司 高折射率奈米複合物
CN109716172B (zh) * 2016-09-16 2022-09-02 康宁股份有限公司 高折射率纳米复合物

Also Published As

Publication number Publication date
JP2007314773A (ja) 2007-12-06
US20090220770A1 (en) 2009-09-03
WO2007125966A1 (ja) 2007-11-08

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