TW200714857A - Heat treatment apparatus - Google Patents
Heat treatment apparatusInfo
- Publication number
- TW200714857A TW200714857A TW095123564A TW95123564A TW200714857A TW 200714857 A TW200714857 A TW 200714857A TW 095123564 A TW095123564 A TW 095123564A TW 95123564 A TW95123564 A TW 95123564A TW 200714857 A TW200714857 A TW 200714857A
- Authority
- TW
- Taiwan
- Prior art keywords
- heat treatment
- treatment apparatus
- produced gas
- shutter
- changing part
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title abstract 7
- 238000001816 cooling Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/0006—Details, accessories not peculiar to any of the following furnaces
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
- F27D7/02—Supplying steam, vapour, gases or liquids
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
- F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Furnace Details (AREA)
Abstract
To provide a heat treatment apparatus capable of suppressing leakage of produced gas generated following heat treatment of an object to be heated, and the so-called sublimate generated by cooling of the produced gas. The heat treatment apparatus has a changing part 6 for putting a substrate in a heat treatment chamber 12 and taking it out therefrom. An air nozzle 75, and a suction opening 74a connected to an exhaust duct 74 are provided in a position adjacent to a shutter 10 provided on the changing part 6. The produced gas and the sublimate generated in the heat treatment chamber 12 are blocked by an air curtain A1, and leakage to an exterior of the heat treatment apparatus 1 is prevented even when the shutter 10 is opened and closed.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005205960A JP4915981B2 (en) | 2005-07-14 | 2005-07-14 | Heat treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200714857A true TW200714857A (en) | 2007-04-16 |
| TWI354763B TWI354763B (en) | 2011-12-21 |
Family
ID=37785376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095123564A TWI354763B (en) | 2005-07-14 | 2006-06-29 | Heat treatment apparatus |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4915981B2 (en) |
| KR (1) | KR101283377B1 (en) |
| TW (1) | TWI354763B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104685312A (en) * | 2012-10-03 | 2015-06-03 | 夏普株式会社 | Substrate firing device |
| TWI739646B (en) * | 2020-11-03 | 2021-09-11 | 創意電子股份有限公司 | Testing apparatus |
| CN114441931A (en) * | 2020-11-03 | 2022-05-06 | 创意电子股份有限公司 | Test equipment |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5015541B2 (en) * | 2006-10-07 | 2012-08-29 | 昭和鉄工株式会社 | Heat treatment equipment |
| TWI498988B (en) | 2008-02-20 | 2015-09-01 | Tokyo Electron Ltd | A gas supply device, a film forming apparatus, and a film forming method |
| JP5518303B2 (en) | 2008-05-21 | 2014-06-11 | エスペック株式会社 | Heat treatment equipment |
| KR101129279B1 (en) * | 2009-01-28 | 2012-03-26 | 현대제철 주식회사 | Furnace including shielding apparatus |
| JP5922534B2 (en) * | 2012-09-10 | 2016-05-24 | 光洋サーモシステム株式会社 | Heat treatment equipment |
| KR101581538B1 (en) * | 2014-03-27 | 2015-12-31 | 현대제철 주식회사 | Door apparatus of heating furnace |
| JP6391061B2 (en) | 2014-06-17 | 2018-09-19 | インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Machines Corporation | How to write a file on tape |
| KR101677342B1 (en) * | 2014-12-03 | 2016-11-18 | 주식회사 포스코 | Heating furnace |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6457089A (en) * | 1987-08-27 | 1989-03-03 | Fujitsu Ltd | Heating treater |
| JPH055124A (en) * | 1991-06-26 | 1993-01-14 | Nippon Steel Corp | Low dew point heat treatment furnace |
| JP2971771B2 (en) * | 1995-01-23 | 1999-11-08 | タバイエスペック株式会社 | Heat treatment equipment with sublimate removal function |
| JPH11264665A (en) * | 1998-03-19 | 1999-09-28 | Toppan Printing Co Ltd | Oven for baking colored resist |
| JP2000018832A (en) * | 1998-06-30 | 2000-01-18 | Koyo Thermo System Kk | Heat treatment device |
| JP3934281B2 (en) * | 1999-07-02 | 2007-06-20 | 三菱電機株式会社 | Conveyor furnace |
| JP2002075888A (en) * | 2000-09-04 | 2002-03-15 | Sony Corp | Method for preventing entrapment of oxygen gas in diffusion device, diffusion device and fork device suitable for use therein |
| JP3667270B2 (en) * | 2001-10-12 | 2005-07-06 | 松下電器産業株式会社 | Substrate heat treatment method and furnace equipment therefor |
| JP3904955B2 (en) * | 2002-03-19 | 2007-04-11 | 日本電熱計器株式会社 | Reflow soldering equipment |
| JP4410043B2 (en) * | 2004-06-29 | 2010-02-03 | エスペック株式会社 | Heat treatment equipment |
-
2005
- 2005-07-14 JP JP2005205960A patent/JP4915981B2/en not_active Expired - Fee Related
-
2006
- 2006-06-29 TW TW095123564A patent/TWI354763B/en not_active IP Right Cessation
- 2006-07-14 KR KR1020060066152A patent/KR101283377B1/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104685312A (en) * | 2012-10-03 | 2015-06-03 | 夏普株式会社 | Substrate firing device |
| CN104685312B (en) * | 2012-10-03 | 2016-12-28 | 夏普株式会社 | Substrate firing device |
| TWI739646B (en) * | 2020-11-03 | 2021-09-11 | 創意電子股份有限公司 | Testing apparatus |
| CN114441931A (en) * | 2020-11-03 | 2022-05-06 | 创意电子股份有限公司 | Test equipment |
| US11703244B2 (en) | 2020-11-03 | 2023-07-18 | Global Unichip Corporation | Testing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070009455A (en) | 2007-01-18 |
| TWI354763B (en) | 2011-12-21 |
| KR101283377B1 (en) | 2013-07-08 |
| JP4915981B2 (en) | 2012-04-11 |
| JP2007024378A (en) | 2007-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |